JP2024085652A - Polyimide Resin Precursor - Google Patents

Abstract

To provide a photosensitive resin composition which gives a polyimide resin having a low dielectric loss tangent and excellent chemical resistance and is excellent in photolithographic characteristics, and to provide methods for producing a patterned resin film and a patterned polyimide resin film using the photosensitive resin composition.SOLUTION: In a polyimide resin precursor having an unsaturated group, a main chain comprises a divalent constituent unit derived from a specific diamine compound, a trivalent constituent unit derived from a specific triamine compound, and a tetravalent constituent unit derived from a specific tetraamine compound.SELECTED DRAWING: None

Description

The present invention relates to a polyimide resin precursor, a photosensitive resin composition containing the polyimide resin precursor, a patterned resin film using the photosensitive resin composition, and a method for producing a patterned polyimide resin film.

Polyimide resins and polyamide resins have excellent heat resistance, mechanical strength, insulating properties, low dielectric constant, and other properties, and are therefore widely used as insulating and protective materials in electrical and electronic components such as various elements and electronic substrates such as multilayer wiring boards.

In recent years, communication devices such as mobile phones have become increasingly higher in frequency, which has led to demand for insulating parts that insulate metal wiring in communication devices to be able to handle higher frequencies.
Here, the higher the frequency, the greater the transmission loss, and the greater the transmission loss, the greater the attenuation of the electrical signal. Therefore, for resins such as polyimide resins and polyamide resins, there is a demand for a lower dielectric tangent and a lower dielectric constant in the high frequency range in order to further reduce transmission loss as the frequency increases.

In response to the above demands, a photosensitive resin composition (see Patent Document 1, Examples) has been proposed that contains an aromatic polyamide resin of a specific structure having a structural unit with a 4,4'-dioxybiphenyl skeleton derived from 4,4'-bis(4-aminophenoxy)biphenyl, and a photopolymerization initiator, as a composition capable of forming a resin film that exhibits good dielectric properties in the high frequency range.

International Publication No. 2019/044874

When the photosensitive resin composition described in Patent Document 1 is used, a polyimide resin film having a relatively low dielectric tangent can be formed. On the other hand, further improvements are required for the photosensitive resin composition described in Patent Document 1 in terms of the photolithography properties and the chemical resistance of the polyimide resin film formed.

The present invention has been made in consideration of the above problems, and aims to provide a polyimide resin precursor that gives a polyimide resin with a low dielectric tangent and excellent chemical resistance, and a photosensitive resin composition with excellent photolithography properties, a photosensitive resin composition containing the polyimide resin precursor as a polymerizable resin (A), a patterned resin film using the photosensitive resin composition, and a method for producing a patterned polyimide resin film.

The present invention has been made in consideration of the above problems, and aims to provide a photosensitive resin composition that provides a polyimide resin with a low dielectric tangent and excellent chemical resistance, and has excellent photolithography properties, a patterned resin film that uses the photosensitive resin composition, and a method for producing a patterned polyimide resin film.

The present inventors have discovered that the above problems can be solved by forming the main chain of a polyimide resin precursor having an unsaturated group from a divalent structural unit derived from a specific diamine compound, a trivalent structural unit derived from a specific triamine compound, and a tetravalent structural unit derived from a specific tetraamine compound, and have thus completed the present invention. More specifically, the present invention provides the following:

（式（１－１）中、Ｘ^Ａ１は、炭素原子数４以上４０以下の４価の有機基であり、Ｙ^Ａ１は、炭素原子数４以上４０以下の２有機基であり、
Ｒ^Ａ１、及びＲ^Ａ２は、それぞれ独立に、水素原子、又は炭素原子数１以上３０以下の有機基であり、Ｒ^Ａ１、及びＲ^Ａ２としての前記有機基は、Ｃ－Ｏ結合を介して、エステル結合中の酸素原子に結合する。）

（式（１－２）中、Ｘ^Ａ１、Ｒ^Ａ１、及びＲ^Ａ２は、式（１－１）中のＸ^Ａ１、Ｒ^Ａ１、及びＲ^Ａ２と同様であり、Ｙ^Ａ２は、炭素原子数４以上４０以下の３価の有機基である。）

（式（１－３）中、Ｘ^Ａ１、Ｒ^Ａ１、及びＲ^Ａ２は、式（１－１）中のＸ^Ａ１、Ｒ^Ａ１、及びＲ^Ａ２と同様であり、Ｙ^Ａ３は、炭素原子数４以上５０以下の４価の有機基である。） The first aspect of the present invention comprises a structural unit (1-1) represented by the following formula (1-1), a structural unit (1-2) represented by the following formula (1-2), and/or a structural unit (1-3) represented by the following formula (1-3):
The polyimide resin precursor is one in which the organic groups represented by R ^A1 and R ^A2 contain an unsaturated group having an ethylenically unsaturated double bond and having 3 to 30 carbon atoms.

In formula (1-1), X ^represents a tetravalent organic group having 4 to 40 carbon atoms, and Y ^represents a divalent organic group having 4 to 40 carbon atoms.
R ^A1 and R ^A2 are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, and the organic group represented by R ^A1 and R ^A2 is bonded to an oxygen atom in the ester bond via a C—O bond.

(In formula (1-2), X ^A1 , R ^A1 , and R ^A2 are the same as X ^A1 , R ^A1 , and R ^A2 in formula (1-1), and Y ^A2 is a trivalent organic group having 4 to 40 carbon atoms.)

(In formula (1-3), X ^A1 , R ^A1 , and R ^A2 are the same as X ^A1 , R ^A1 , and R ^A2 in formula (1-1), and Y ^A3 is a tetravalent organic group having 4 to 50 carbon atoms.)

The second aspect of the present invention is a photosensitive resin composition that includes a polymerizable resin (A), a photoradical polymerization initiator (C), and a solvent (S), and the polymerizable resin (A) is the polyimide resin precursor according to the first aspect.

A third aspect of the present invention is a method for producing a composition comprising the steps of:
Coating a substrate with the photosensitive resin composition according to the second aspect to form a coating film;
exposing the coating film to a position-selective light;
developing the exposed coating film;
The present invention relates to a method for producing a patterned resin film, comprising the steps of:

A fourth aspect of the present invention is a method for producing a patterned polyimide resin film, which includes heating the patterned resin film produced by the production method according to the third aspect to produce a polyimide resin derived from a polyimide resin precursor.

The present invention can provide a polyimide resin with a low dielectric tangent and excellent chemical resistance, a photosensitive resin composition with excellent photolithography properties, a patterned resin film using the photosensitive resin composition, and a method for producing a patterned polyimide resin film.

<Polyimide resin precursor>
The polyimide resin precursor comprises a structural unit (1-1) represented by the following formula (1-1), a structural unit (1-2) represented by the following formula (1-2), and/or a structural unit (1-3) represented by the following formula (1-3).
The organic group represented by R ^A1 and R ^A2 contains an unsaturated group having an ethylenically unsaturated double bond and having 3 to 30 carbon atoms.
In the polyimide resin precursor, the molar ratio of the above-mentioned unsaturated groups to the molar ratio of the organic groups represented by R ^A1 and R ^A2 is preferably 60 mol % or more.

（式（１－１）中、Ｘ^Ａ１は、炭素原子数４以上４０以下の４価の有機基であり、Ｙ^Ａ１は、炭素原子数４以上４０以下の２有機基であり、
Ｒ^Ａ１、及びＲ^Ａ２は、それぞれ独立に、水素原子、又は炭素原子数１以上３０以下の有機基であり、Ｒ^Ａ１、及びＲ^Ａ２としての前記有機基は、Ｃ－Ｏ結合を介して、エステル結合中の酸素原子に結合する。）

（式（１－２）中、Ｘ^Ａ１、Ｒ^Ａ１、及びＲ^Ａ２は、式（１－１）中のＸ^Ａ１、Ｒ^Ａ１、及びＲ^Ａ２と同様であり、Ｙ^Ａ２は、炭素原子数４以上４０以下の３価の有機基である。）

（式（１－３）中、Ｘ^Ａ１、Ｒ^Ａ１、及びＲ^Ａ２は、式（１－１）中のＸ^Ａ１、Ｒ^Ａ１、及びＲ^Ａ２と同様であり、Ｙ^Ａ３は、炭素原子数４以上５０以下の４価の有機基である。）

In formula (1-1), X ^represents a tetravalent organic group having 4 to 40 carbon atoms, and Y ^represents a divalent organic group having 4 to 40 carbon atoms.
R ^A1 and R ^A2 are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, and the organic group represented by R ^A1 and R ^A2 is bonded to an oxygen atom in the ester bond via a C—O bond.

(In formula (1-2), X ^A1 , R ^A1 , and R ^A2 are the same as X ^A1 , R ^A1 , and R ^A2 in formula (1-1), and Y ^A2 is a trivalent organic group having 4 to 40 carbon atoms.)

(In formula (1-3), X ^A1 , R ^A1 , and R ^A2 are the same as X ^A1 , R ^A1 , and R ^A2 in formula (1-1), and Y ^A3 is a tetravalent organic group having 4 to 50 carbon atoms.)

The above polyimide resin precursor gives a photosensitive resin composition having excellent photolithography properties.
The molecular chains of the polyimide resin precursor can be crosslinked by exposure to light in the presence of a photoradical polymerization initiator (C) described later. By heating the polyimide resin precursor in a state in which the molecular chains are crosslinked, a polyimide resin having a low dielectric tangent and excellent chemical resistance is formed.

In the polyimide resin precursor, the ratio of the total number of moles of the structural units (1-2) and (1-3) to the total number of moles of the structural units (1-1), (1-2), and (1-3) is preferably 1 mol % or more and 13 mol % or less, and more preferably 3 mol % or more and 10 mol % or less.
In other words, in the polyimide resin precursor, ^the ratio of the total number of moles of trivalent groups represented by Y ^A2 and the total number of moles of tetravalent groups represented by Y ^A3 to the total number of moles of divalent groups represented by Y A1, trivalent groups represented by Y ^A2 , and tetravalent groups represented by Y ^A3 is preferably 1 mol % or more and 13 mol % or less, more preferably 3 mol % or more and 10 mol % or less.

The polyimide resin precursor is typically a polymer of a diamine compound, a triamine compound, and/or a tetraamine compound, and a dicarboxylic acid which is a reaction product of a tetracarboxylic dianhydride and an alcohol.
However, the diamine compound, triamine compound, and/or tetraamine compound, dicarboxylic acid, tetracarboxylic dianhydride, and alcohols are selected so that the polyimide resin precursor satisfies the above-mentioned predetermined requirements.

[Diamine Compound]
The diamine compound gives a structural unit (1-1) represented by formula (1-1). The diamine compound is represented by the following formula (A2a).
H ₂ N-Y ^A1 -NH ₂ ... (A2a)
(In formula (A2a), Y ^A1 represents a divalent organic group.)

Y ^A1 is a divalent organic group having from 4 to 40 carbon atoms. Y ^A1 may have one or more substituents in addition to the two amino groups.
Preferred examples of the substituent include a fluorine atom, an alkyl group having from 1 to 6 carbon atoms, an alkoxy group having from 1 to 6 carbon atoms, a fluorinated alkyl group having from 1 to 6 carbon atoms, a fluorinated alkoxy group having from 1 to 6 carbon atoms, a carboxy group, or a hydroxy group.
When the substituent is a fluorinated alkyl group or a fluorinated alkoxy group, it is preferably a perfluoroalkyl group or a perfluoroalkoxy group.

The lower limit of the number of carbon atoms in the organic group represented by Y ^A1 is 4, and preferably 6, and the upper limit is 40, and preferably 30.
Y ^A1 may be an aliphatic group, but is preferably an organic group containing one or more aromatic rings.

When Y ^A1 is an organic group containing one or more aromatic rings, the organic group may be one aromatic group itself, or may be a group in which two or more aromatic groups are bonded via an aliphatic hydrocarbon group, a halogenated aliphatic hydrocarbon group, or a bond containing a heteroatom such as an oxygen atom, a sulfur atom, or a nitrogen atom. Examples of the bond containing a heteroatom such as an oxygen atom, a sulfur atom, or a nitrogen atom contained in ^{Y A1} include -CONH-, -NH-, -N=N-, -CH=N-, -COO-, -O-, -CO-, -SO-, -SO ₂ -, -S-, and -S-S-, and -COO-, -O-, -CO-, and -S- are preferred.

The aromatic ring in Y ^A1 bonded to the amino group is preferably a benzene ring. When the ring bonded to the amino group in Y ^A1 is a condensed ring containing two or more rings, the ring bonded to the amino group in the condensed ring is preferably a benzene ring.
The aromatic ring contained in ^A1 may be an aromatic heterocycle.

When ^Y is an organic group containing an aromatic ring, from the viewpoint of improving the electrical and mechanical properties of a polyimide resin formed using the polyimide resin precursor, the organic group is preferably at least one of the groups represented by the following formulas (21) to (24).

In (21) to (24), R ¹¹¹ represents one selected from the group consisting of a hydrogen atom, a fluorine atom, a carboxy group, a sulfonic acid group, a hydroxy group, an alkyl group having from 1 to 4 carbon atoms, and a halogenated alkyl group having from 1 to 4 carbon atoms. In formula (24), Q ¹ represents a 9,9'-fluorenylidene group, or a group represented by the formula: -C ₆ H ₄ -, -C ₆ H ₄ -C ₆ H ₄ -, -O-C ₆ H ₄ -C ₆ H ₄ -O-, -O-C ₆ H ₄ -CO-C ₆ H ₄ -O- _{, -O-C 6 H 4 -C(CH 3 ) 2 -C 6 H 4 -O-, -OCO-C 6 H 4 -COO- , -OCO- , -O- , -CO- , -C} (CF ₃ ) _{2 -} , -C(CH ₃ ) ₂ -, -CH ₂ -, -O-C ₆ H ₄ This represents one type selected from the group consisting of groups _represented by _-SO2 - _{C6H4 -} O-, -C( _CH3 ) ₂ - _C6H4 -C( _CH3 ) _2- , -O- _C10H6- O-, -O- _{C6H4 - O-} , -O- _CH2 -O-, and -O-( _CH2 ) _n -O-.

In the examples of ^Q1 , _-C6H4- is a _phenylene group, preferably an m-phenylene group or _a p-phenylene group, more preferably a p-phenylene group, and _-C10H6- is a naphthalenediyl group, preferably a naphthalene-1,2-diyl group, a naphthalene-1,4-diyl group, a naphthalene-2,3-diyl group, a naphthalene-2,6-diyl group, or a naphthalene-2,7-diyl group, more preferably a naphthalene-1,4-diyl group, or a naphthalene-2,6-diyl group.
In the examples of ^Q1 , n is an integer of 1 or more, preferably an integer of 1 to 20, more preferably an integer of 1 to 12, and even more preferably an integer of 1 to 6.

As the diamine compound containing a group represented by formula (24) as Y ^A1 , a compound represented by the following formula (a2) is preferable: n in formula (a2) is as described for Q ¹ in formula (24).

From the viewpoint of improving the electrical properties of the resin film to be formed, R ¹¹¹ in formulas (21) to (24) is more preferably a hydrogen atom, a fluorine atom, a methyl group, an ethyl group, or a trifluoromethyl group, and particularly preferably a hydrogen atom or a trifluoromethyl group.

In terms of the electrical and mechanical properties of the resin film to be formed, ^Q1 in formula (24) may be any of _-C6H4 - _{C6H4- ,} -O- _C6H4 -C6H4 _{- O- ,} -O- _{C6H4- CO -} C6H4 _- O-, -O- _C6H4- C( _CH3 ) ₂ -C6H4-O- _{, -OCO} - _C6H4 - _COO- , -OCO _{- C6H4} - _{C6H4 - COO-} , -OCO-, -O-, _{-CO-, -C(CF3)2- , -C} ( _CH3 ) _{2- ,} -CH2-, _{-O-C6H4 - SO2 - C6H4} Preferred are —O—, —C(CH ₃ ) ₂ —C ₆ H ₄ —C(CH ₃ ) ₂ —, —O—C ₁₀ H ₆ —O—, —O—C ₆ H ₄ —O—, —O—CH ₂ —O—, —O—(CH ₂ ) ₂ —O—, —O—(CH ₂ ) ₃ —O—, —O—(CH ₂ ) ₄ —O—, —O—(CH ₂ ) ₅ —O—, and —O—(CH ₂ ) ₆ —O—. From the viewpoint of improving the electrical properties and mechanical properties of the polyimide resin formed using the polyimide resin precursor, Q ¹ in formula (24) is more preferably —O—C ₆ H ₄ —C ₆ H ₄ —O— or —O—C ₆ H ₄ —C(CH ₃ ) ₂ —C ₆ H ₄ —O—, and particularly preferably a group represented by —O—C ₆ H ₄ —C ₆ H ₄ —O— in which both —C ₆ H ₄ — are p-phenylene groups.

When an aromatic diamine compound is used as the diamine compound represented by formula (A2a), for example, the aromatic diamine compounds shown below can be suitably used.
That is, examples of the aromatic diamine compound include p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, 4,4'-diaminobiphenyl, 3,3'-diaminobiphenyl, 3,4'-diaminobiphenyl, 1,5-diaminonaphthalene, 2,6-diaminonaphthalene, 9,10-diaminoanthracene, 9,10-bis(4-aminophenyl)anthracene, 4,4'-diamino-2,2'-bis(trifluoromethyl)biphenyl, 4,4'-diaminobenzophenone, 3,3'-diaminobenzophenone, 3,4'-diaminobenzophenone, 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, and 3,4'-diaminodiphenyl sulfone. , 4,4'-diaminodiphenyl sulfide, 3,3'-diaminodiphenyl sulfide, 3,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl methane, 3,3'-diaminodiphenyl methane, 3,4'-diaminodiphenyl methane, 2,2-bis(4-aminophenyl)propane, bis(3-amino-4-hydroxyphenyl)methane, 2,2-bis(3-amino-4-hydroxyphenyl)propane, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, 2,2'-bis[N-(3-aminobenzoyl)-3-amino-4-hydroxyphenyl]propane, 2,2'-bis bis[N-(4-aminobenzoyl)-3-amino-4-hydroxyphenyl]propane, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 3,3'-diaminodiphenyl ether, 3-carboxy-4,4'-diaminodiphenyl ether, 3-sulfo-4,4'-diaminodiphenyl ether, 4,4'-diaminobenzanilide, 3,3'-diaminobenzanilide, 1,4-bis(4-aminophenyl)benzene, 1,3-bis(4-aminophenyl)benzene, 1,4-bis(4-aminophenoxy)benzene, 1,3-bis(4-aminophenoxy)benzene, 1,3-bis(3-aminophenoxy)benzene, 1,2-bis(4-aminophenoxy) )ethane, 1,3-bis(4-aminophenoxy)propane, 1,4-bis(4-aminophenoxy)butane, 1,5-bis(4-aminophenoxy)pentane, 1,6-bis(4-aminophenoxy)hexane, bis(3-amino-4-hydroxyphenyl)ether, bis[4-(4-aminophenoxy)phenyl]ether, bis[4-(3-aminophenoxy)phenyl]ether, 4,4'-bis(4-aminophenoxy)biphenyl, 3,4'-bis(4-aminophenoxy)biphenyl, 3,3'-bis(4-aminophenoxy)biphenyl, bis(3-amino-4-hydroxyphenyl)sulfone, bis(4-aminophenoxyphenyl)sulfone, bis(3-aminophenoxy phenyl)sulfone, bis[4-(4-aminophenoxy)phenyl]sulfone, bis[4-(3-aminophenoxy)phenyl]sulfone, bis[N-(3-aminobenzoyl)-3-amino-4-hydroxyphenyl]sulfone, bis[N-(4-aminobenzoyl)-3-amino-4-hydroxyphenyl]sulfone, bis[4-(4-aminophenoxy)phenyl]ketone, 2,2-bis[4-{4-amino-2-(trifluoromethyl)phenoxy}phenyl]hexafluoropropane, 9,9-bis(4-aminophenyl)fluorene, 9,9-bis(4-amino-3-methylphenyl)fluorene, 9,9-bis(3-amino-4-hydroxyphenyl)fluorene, 9,9-bis [N-(3-aminobenzoyl)-3-amino-4-hydroxyphenyl]fluorene, 9,9-bis[N-(4-aminobenzoyl)-3-amino-4-hydroxyphenyl]fluorene, 2,7-diaminofluorene, 2-(4-aminophenyl)-5-aminobenzoxazole, 2-(3-aminophenyl)-5-aminobenzoxazole, 2-(4-aminophenyl)-6-aminobenzoxazole, 2-(3-aminophenyl)-6-aminobenzoxazole, 1,4-bis(5-amino-2-benzoxazolyl)benzene, 1,4-bis(6-amino-2-benzoxazolyl)benzene, 1,3-bis(5-amino-2-benzoxazolyl)benzene, 1,3-bis( 6-amino-2-benzoxazolyl)benzene, 2,6-bis(4-aminophenyl)benzobisoxazole, 2,6-bis(3-aminophenyl)benzobisoxazole, bis[(3-aminophenyl)-5-benzoxazolyl], bis[(4-aminophenyl)-5-benzoxazolyl], bis[(3-aminophenyl)-6-benzoxazolyl], bis[(4-aminophenyl)-6-benzoxazolyl], N,N'-bis(3-aminobenzoyl)-2,5-diamino-1,4-dihydroxybenzene, N,N'-bis(4-aminobenzoyl)-2,5-diamino-1,4-dihydroxybenzene, N,N'-bis(4-aminobenzoyl)-4,4'-diamino-3, Examples of the dihydroxybiphenyl include 3-dihydroxybiphenyl, N,N'-bis(3-aminobenzoyl)-3,3'-diamino-4,4-dihydroxybiphenyl, N,N'-bis(4-aminobenzoyl)-3,3'-diamino-4,4-dihydroxybiphenyl, 3,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfide, 4,4'-[1,4-phenylenebis(1-methylethane-1,1-diyl)]dianiline, 3,5-diaminobenzoic acid, 3,4-diaminobenzoic acid, 4-aminobenzoic acid 4-aminophenyl ester, 1,3-bis(4-anilino)tetramethyldisiloxane, 1,4-bis(3-aminopropyldimethylsilyl)benzene, and ortho-tolidine sulfone. Among these, 4,4'-bis(4-aminophenoxy)biphenyl, 3,4'-bis(4-aminophenoxy)biphenyl, and 3,3'-bis(4-aminophenoxy)biphenyl are preferred from the viewpoint of improving electrical properties and mechanical properties.

Furthermore, as Y ^A1 , a silicon-containing group which may have a chain-like aliphatic group and/or an aromatic ring can be used. As such a silicon-containing group, typically, the following groups can be used.

Specific examples of compounds having amino groups at both ends and silicon atom-containing groups include methylphenyl silicones having amino groups at both ends (e.g., X-22-1660B-3 (number average molecular weight of about 4,400) and X-22-9409 (number average molecular weight of about 1,300) manufactured by Shin-Etsu Chemical Co., Ltd.), dimethyl silicones having amino groups at both ends (e.g., X-22-161A (number average molecular weight of about 1,600), X-22-161B (number average molecular weight of about 3,000) and KF8012 (number average molecular weight of about 4,400) manufactured by Shin-Etsu Chemical Co., Ltd.; BY16-835U (number average molecular weight of about 900) manufactured by Dow Corning Toray; and Silaplane FM3311 (number average molecular weight of about 1000) manufactured by JNC Corporation).

As the diamine compound represented by formula (A2a), a diamine having an oxyalkylene group can also be preferably used. Preferred examples of the oxyalkylene group include an ethyleneoxy group and a propyleneoxy group (-C( _CH3 ) _-CH2 - _O- , _-CH2- C( _CH3 )-O-, or _{-CH2CH2CH2 -} O-).
The diamine having an oxyalkylene group may contain two or more kinds of oxyalkylene groups in combination. When the diamine having an oxyalkylene group contains two or more kinds of oxyalkylene groups, the two or more kinds of oxyalkylene groups may be contained in the diamine in a block manner or random manner.
The diamine having an oxyalkylene group preferably does not contain a cyclic group, and more preferably does not contain an aromatic group.
Specific examples of diamines having an oxyalkylene group include JEFFAMINE (registered trademark) KH-511, JEFFAMINE (registered trademark) ED-600, JEFFAMINE (registered trademark) ED-900, JEFFAMINE (registered trademark) ED-2003, JEFFAMINE (registered trademark) EDR-148, JEFFAMINE (registered trademark) EDR-176, JEFFAMINE (registered trademark) D-200, JEFFAMINE (registered trademark) D-400, JEFFAMINE (registered trademark) D-2000, and JEFFAMINE (registered trademark) D-4000, as well as 1-(2-(2-(2-aminopropoxy)ethoxy)propoxy)propan-2-amine, and 1-(1-(1-(2-aminopropoxy)propan-2-yl)oxy)propan-2-amine, all of which are manufactured by HUNTSUMAN Corporation.

In view of the excellent solubility of the polyimide resin precursor in an organic solvent and the excellent dielectric properties in the high frequency band of the polyimide resin formed using the polyimide resin precursor, the diamine compound is preferably one or more selected from the group consisting of diamine compound (A-1) represented by formula (A2a) and Y ^A1 being a group represented by formula (A1-1) below, diamine compound (A-2) represented by formula (A2a) and Y ^A1 having a partial structure represented by formula (A2-1) described later and not corresponding to diamine compound (A-1), diamine compound (A-3) having a partial structure represented by formula (A3) described later and not corresponding to diamine compound (A-1) and diamine compound (A-2), and dimer diamine compound (A-4). Among these, diamine compound (A-1) and diamine compound (A-2) are preferred.

（式（Ａ１－１）中、Ｘは、炭素原子数１以上１００以下の有機基であり、Ｒ^ａ１は、ヒドロキシ基、カルボキシ基、又はハロゲン原子であり、Ｒ^ａ２は、炭素原子数１以上２０以下の脂肪族基、ヒドロキシ基、カルボキシ基、スルホン酸基、又はハロゲン原子であり、Ａｒは、Ｒ^ａ２で置換されていてもよいフェニル基、又はＲ^ａ２で置換されていてもよいナフチル基であり、ｍａ１は、０以上１０以下の整数であり、ｍａ２は、０以上７以下の整数であり、ｍａ３は、１以上１０以下の整数である。） (Diamine Compound (A-1))
The diamine compound (A-1) is a diamine compound represented by formula (A2a) in which Y ^A1 is a group represented by the following formula (A1-1).

(In formula (A1-1), X is an organic group having 1 to 100 carbon atoms, R ^a1 is a hydroxy group, a carboxy group, or a halogen atom, R ^a2 is an aliphatic group having 1 to 20 carbon atoms, a hydroxy group, a carboxy group, a sulfonic acid group, or a halogen atom, Ar is a phenyl group which may be substituted with R ^a2 , or a naphthyl group which may be substituted with R ^a2 , ma1 is an integer of 0 to 10, ma2 is an integer of 0 to 7, and ma3 is an integer of 1 to 10.)

In formula (A1-1), Ar is a phenyl group which may be substituted with R ^a2 , or a naphthyl group which may be substituted with R ^a2 . Ar is preferably a phenyl group or a naphthyl group. That is, in formula (A1), ma2 is preferably 0.

In formula (A1-1), R ^a2 is an aliphatic group having from 1 to 20 carbon atoms, a hydroxy group, a carboxy group, a sulfonic acid group, or a halogen atom. The organic group represented by R ^a2 may contain a heteroatom such as O, N, S, P, B, Si, or a halogen atom.
The aliphatic group represented by R ^a2 preferably has 1 or more and 12 or less, and more preferably has 1 or more and 6 or less, carbon atoms.

Examples of the aliphatic group represented by R ^a2 include chain alkyl groups such as a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, an n-hexyl group, an n-heptyl group, an n-octyl group, a 2-ethylhexyl group, an n-nonyl group, an n-decyl group, an n-undecyl group, an n-tridecyl group, an n-tetradecyl group, an n-pentadecyl group, an n-hexadecyl group, an n-heptadecyl group, an n-octadecyl group, an n-nonadecyl group, and an n-icosyl group; a vinyl group, a 1-propenyl group, Chain alkenyl groups such as 2-n-propenyl group (allyl group), 1-n-butenyl group, 2-n-butenyl group, and 3-n-butenyl group; cycloalkyl groups such as cyclopropyl group, cyclobutyl group, cyclopentyl group, cyclohexyl group, and cycloheptyl group; chloromethyl group, dichloromethyl group, trichloromethyl group, bromomethyl group, dibromomethyl group, tribromomethyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, 2,2,2-trifluoroethyl group, pentafluoroethyl group, heptafluoropropyl group, pafluoromethyl group, phenyl ... halogenated linear alkyl groups such as perfluorobutyl group, perfluoropentyl group, perfluorohexyl group, perfluoroheptyl group, perfluorooctyl group, perfluorononyl group, and perfluorodecyl group; halogenated cycloalkyl groups such as 2-chlorocyclohexyl group, 3-chlorocyclohexyl group, 4-chlorocyclohexyl group, 2,4-dichlorocyclohexyl group, 2-bromocyclohexyl group, 3-bromocyclohexyl group, and 4-bromocyclohexyl group; hydroxymethyl group, 2-hydroxyethyl group, 3-hydroxyethyl group, hydroxycycloalkyl groups such as 2-hydroxycyclohexyl group, 3-hydroxycyclohexyl group, and 4-hydroxycyclohexyl group; methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butyloxy group, isobutyloxy group, sec-butyloxy group, tert-butyloxy group, n-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, 2-ethylhexyloxy group, n-butyloxy group, chain alkoxy groups such as nyloxy group, n-decyloxy group, n-undecyloxy group, n-tridecyloxy group, n-tetradecyloxy group, n-pentadecyloxy group, n-hexadecyloxy group, n-heptadecyloxy group, n-octadecyloxy group, n-nonadecyloxy group, and n-icosyloxy group; chain alkenyloxy groups such as vinyloxy group, 1-propenyloxy group, 2-n-propenyloxy group (allyloxy group), 1-n-butenyloxy group, 2-n-butenyloxy group, and 3-n-butenyloxy group; methoxy Alkoxyalkyl groups such as a methyl group, an ethoxymethyl group, an n-propoxymethyl group, a 2-methoxyethyl group, a 2-ethoxyethyl group, a 2-n-propoxyethyl group, a 3-methoxy-n-propyl group, a 3-ethoxy-n-propyl group, a 3-n-propoxy-n-propyl group, a 4-methoxy-n-butyl group, a 4-ethoxy-n-butyl group, and a 4-n-propoxy-n-butyl group; a methoxymethoxy group, an ethoxymethoxy group, an n-propoxymethoxy group, a 2-methoxyethoxy group, a 2-ethoxyethoxy group, a 2-n-propoxyethoxy group, a 3 -alkoxyalkoxy groups such as methoxy-n-propoxy group, 3-ethoxy-n-propoxy group, 3-n-propoxy-n-propoxy group, 4-methoxy-n-butyloxy group, 4-ethoxy-n-butyloxy group, and 4-n-propoxy-n-butyloxy group; aliphatic acyl groups such as formyl group, acetyl group, propionyl group, butanoyl group, pentanoyl group, hexanoyl group, heptanoyl group, octanoyl group, nonanoyl group, and decanoyl group; methoxycarbonyl group, ethoxycarbonyl group, n-propoxycarbonyl group, n-butanoyl group, chain alkyloxycarbonyl groups such as n-butyloxycarbonyl group, n-pentyloxycarbonyl group, n-hexyloxycarbonyl group, n-heptyloxycarbonyl group, n-octyloxycarbonyl group, n-nonyloxycarbonyl group, and n-decyloxycarbonyl group; and aliphatic acyloxy groups such as formyloxy group, acetyloxy group, propionyloxy group, butanoyloxy group, pentanoyloxy group, hexanoyloxy group, heptanoyloxy group, octanoyloxy group, nonanoyloxy group, and decanoyloxy group.

In formula (A1-1), ma3 is an integer of 1 or more and 10 or less. The value of ma3 is not particularly limited as long as it is 1 or more and 10 or less, and is appropriately selected depending on the structure of X. The value of ma3 is preferably 1 or more and 4 or less, and more preferably 1 or 2.

In formula (A1-1), X is an organic group having 1 to 100 carbon atoms. The number of carbon atoms in the organic group represented by X is preferably 2 to 80, more preferably 6 to 50. The organic group represented by X may contain heteroatoms such as O, N, S, P, B, Si, and halogen atoms. In the compound represented by formula (A1-1), the two amino groups are each bonded to a carbon atom in the organic group represented by X.

The organic group represented by X may be an aliphatic group, an aromatic group, or a combination of an aliphatic group and an aromatic group. The organic group represented by X may be a group bonded via a bond containing a heteroatom such as an oxygen atom, a sulfur atom, or a nitrogen atom. Examples of bonds containing a heteroatom such as an oxygen atom, a sulfur atom, or a nitrogen atom contained in the organic group represented by X include -CONH-, -NH-, -N=N-, -CH=N-, -COO-, -O-, -CO-, -SO-, -SO ₂ -, -S-, and -S-S-, and the like are preferred.

When the organic group represented by X is an aliphatic group, the aliphatic group may be a saturated aliphatic group or an unsaturated aliphatic group. When the organic group represented by X is an aliphatic group, the aliphatic group is preferably an aliphatic hydrocarbon group. When the organic group represented by X is an aliphatic group, the aliphatic group may be linear, cyclic, or a combination of a linear aliphatic group and a cyclic aliphatic group. The linear aliphatic group may be branched.

When the organic group represented by X is an aliphatic group, the aliphatic group is preferably a group in which (ma1+ma3+2) hydrogen atoms have been removed from an alkylene group having 1 to 20 carbon atoms, more preferably a group in which (ma1+ma3+2) hydrogen atoms have been removed from an alkylene group having 1 to 16 carbon atoms, and even more preferably a group in which (ma1+ma3+2) hydrogen atoms have been removed from an alkylene group having 1 to 12 carbon atoms.

When the organic group represented by X is a group containing an aromatic group, examples of the group composed of X, Ar, R ^a1 , and R ^a2 in formula (A1-1) include groups represented by the following formulae (11) to (15).

In formula (11) to formula (15), Ar, R ^a1 , R ^a2 , ma1, ma2, and ma3 are the same as those in formula (A1). In formula (13), ma4 and ma5 are each independently an integer of 0 to 4. ma6 and ma7 are each independently an integer of 0 to 4, and the sum of ma6 and ma7 is 1 to 8. In formula (14), ma8, ma9, and ma10 are each independently an integer of 0 to 4. The sum of ma8, ma9, and ma10 is 0 to 10. ma11, ma12, and ma13 are each independently an integer of 0 to 4. The sum of ma11, ma12, and ma13 is 1 to 10. In formula (15), ma14 is an integer of 0 or more and 3 or less. ma15 is an integer of 0 or more and 5 or less. The sum of ma14 and ma15 is 0 or more and 8 or less. ma16 is an integer of 0 or more and 3 or less. ma17 is an integer of 0 or more and 5 or less. The sum of ma16 and ma17 is 1 or more and 8 or less.

In formula (11), ma1 is preferably 0, ma2 is preferably 0, and ma3 is preferably 1 or 2.
In formula (12), ma1 is preferably 0, ma2 is preferably 0, and ma3 is preferably 1 or 2.
In formula (13), ma2 is preferably 0, ma4 and ma5 are each preferably 0, ma6 and ma7 are each preferably 0, 1, or 2, and the sum of ma6 and ma7 is preferably 1 or more and 4 or less.
In formula (14), ma2 is preferably 0; ma8, ma9, and ma10 are each preferably 0; ma11, ma12, and ma13 are each preferably 0, 1, or 2; and the sum of ma11, ma12, and ma13 is preferably 1 or more and 6 or less.
In formula (15), ma2 is preferably 0, ma14 and ma15 are each preferably 0, ma16 and ma17 are each preferably 0, 1, or 2, and the sum of ma16 and ma17 is preferably 1 or more and 4 or less.

In formula (11) to formula (15), R ^a3 is a single bond or a divalent linking group. However, the divalent linking group is not a group containing an aromatic group. Examples of the divalent linking group include an aliphatic hydrocarbon group having 1 to 20 carbon atoms, -CONH-, -NH-, -N=N-, -CH=N-, -COO-, -O-, -CO-, -SO-, -SO ₂ -, -S-, and -S-S-, and a group combining two or more selected from these groups. The number of carbon atoms in the linking group is preferably 1 to 20, more preferably 1 to 12, and even more preferably 1 to 6. The aliphatic hydrocarbon group as the linking group may have one or more unsaturated bonds, may have a branch, or may contain a ring structure. Specific examples of the aliphatic hydrocarbon group as the linking group include a methylene group, an ethane-1,2-diyl group (ethylene group), an ethane-1,1-diyl group, a propane-1,3-diyl group, a propane-1,2-diyl group, a propane-1,1-diyl group, a propane-2,2-diyl group, a butane-1,4-diyl group, a pentane-1,5-diyl group, a hexane-1,6-diyl group, a heptane-1,7-diyl group, an octane-1,8-diyl group, a nonane-1,9-diyl group, a decane-1,10-diyl group, an undecane-1,1 Examples of the alkyl group include a 1-diyl group, a dodecane-1,12-diyl group, a tridecane-1,13-diyl group, a tetradecane-1,14-diyl group, a pentadecane-1,15-diyl group, a hexadecane-1,16-diyl group, a heptadecane-1,17-diyl group, an octadecane-1,18-diyl group, a nonadecane-1,19-diyl group, an icosane-1,20-diyl group, an ethene-1,2-diyl group (vinylene group), a propene-1,3-diyl group, an ethyne-1,2-diyl group, and a propyne-1,3-diyl group.

Preferred examples of the linking group include alkylene groups having 1 to 6 carbon atoms, alkenylene groups having 2 to 6 carbon atoms, alkynylene groups having 2 to 6 carbon atoms, alkyleneoxy groups having 1 to 6 carbon atoms, alkenyleneoxy groups having 2 to 6 carbon atoms, alkynyleneoxy groups having 2 to 6 carbon atoms, alkylenethio groups having 1 to 6 carbon atoms, alkenylenethio groups having 2 to 6 carbon atoms, alkynylenethio groups having 2 to 6 carbon atoms, alkyleneamino groups having 1 to 6 carbon atoms, alkenyleneamino groups having 2 to 6 carbon atoms, alkynyleneamino groups having 2 to 6 carbon atoms, -CONH-, -NH-, -COO-, -O-, -CO-, -SO-, -SO ₂ -, -S-, -OCONH-, and -OCOO-.

（式（Ａ１－２）中、Ｒ^ａ１、Ｒ^ａ２、Ａｒ、ｍａ１、ｍａ２、及びｍａ３は、式（Ａ１－１）中のこれらと同様であり、Ｙ^ａ１は、炭素原子数１以上２０以下の有機基、又は単結合であり、Ｙ^ａ２は、炭素原子数１以上２０以下の有機基であり、ｎａ１は０又は１であり、ｎａ２は０又は１である。ｎａ１が１である場合、Ｙａ１は、単結合でない。） Of the divalent groups represented by formula (A1-1), a divalent group represented by the following formula (A1-2) is preferred, since a polyimide resin formed using the polyimide resin precursor exhibits a low dielectric tangent and good mechanical properties.

(In formula (A1-2), R ^a1 , R ^a2 , Ar, ma1, ma2, and ma3 are the same as those in formula (A1-1), Y ^a1 is an organic group having 1 to 20 carbon atoms or a single bond, Y ^a2 is an organic group having 1 to 20 carbon atoms, na1 is 0 or 1, and na2 is 0 or 1. When na1 is 1, Ya1 is not a single bond.)

In formula (A1-2), the organic group represented by Y ^a1 may contain a heteroatom such as O, N, S, P, B, Si, or a halogen atom. The organic group represented by Y ^a1 is preferably a hydrocarbon group. The hydrocarbon group represented by Y ^a1 may be an aliphatic hydrocarbon group, an aromatic hydrocarbon group, or a combination of an aliphatic hydrocarbon group and an aromatic hydrocarbon group. The hydrocarbon group represented by Y ^a1 is preferably an aromatic hydrocarbon group, and more preferably a phenylene group or a naphthalenediyl group. Specific preferred examples of the aromatic hydrocarbon group represented by Y ^a1 include p-phenylene, m-phenylene, o-phenylene, naphthalene-1,4-diyl, naphthalene-1,2-diyl, naphthalene-1,3-diyl, naphthalene-1,5-diyl, naphthalene-1,6-diyl, naphthalene-1,7-diyl, naphthalene-1,8-diyl, naphthalene-2,6-diyl, naphthalene-2,7-diyl, and naphthalene-2,3-diyl. Of these aromatic hydrocarbon groups, p-phenylene and m-phenylene are preferred, and p-phenylene is more preferred.

In formula (A1-2), it is preferable that na2 is 1, and it is more preferable that na1 and na2 are both 1 and Y ^a1 is an organic group. In this case, due to the high steric freedom of the ether bond, it is considered that the structural units derived from the diamine compound (A-1) having the divalent group represented by formula (A1-2) are easily packed well, and it is easy to obtain a polyimide resin precursor that gives a polyimide resin excellent in mechanical properties, thermal properties, electrical properties, etc.

In formula (A1-2), ma1 is preferably 0, ma2 is preferably 0, and ma3 is preferably 1 or 2.

Specific examples of the diamine compound (A-1) described above include the following compounds.

（式（Ａ２－１）中、Ｒ^ａ３及びＲ^ａ４は、それぞれ独立に、炭素原子数１以上４以下のアルキル基、炭素原子数１以上４以下のアルコキシ基、又はハロゲン原子であり、ｍａ４及びｍａ５は、それぞれ独立に０以上４以下の整数である。） (Diamine compound (A-2))
The diamine compound (A-2) has a partial structure represented by the following formula (A2-1) and is a diamine compound not corresponding to the diamine compound (A-1).

(In formula (A2-1), R ^a3 and R ^a4 each independently represent an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, or a halogen atom, and ma4 and ma5 each independently represent an integer of 0 to 4.)

In formula (A2-1), examples of the alkyl group having 1 to 4 carbon atoms as R ^a3 and R ^a4 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a tert-butyl group. Of these alkyl groups, a methyl group and an ethyl group are preferred, and a methyl group is more preferred.
In formula (A2-1), examples of the alkoxy group having 1 to 4 carbon atoms as R ^a3 and R ^a4 include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, and a tert-butyloxy group. Of these alkoxy groups, a methoxy group and an ethoxy group are preferred, and a methoxy group is more preferred.
In formula (A2-1), examples of the halogen atom represented by R ^a3 and R ^a4 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these halogen atoms, a chlorine atom and a bromine atom are preferred.

In formula (A2-1), ma4 and ma5 are each independently an integer of 0 or more and 4 or less. Because diamine compound (A-2) is easily available, ma4 and ma5 are each preferably an integer of 0 or more and 2 or less, more preferably 0.

（式（Ａ２－２）中、Ｘ^１及びＸ^２は、それぞれ独立に、炭素原子数１以上４以下のアルキル基、炭素原子数１以上４以下のアルコキシ基、及びハロゲン原子からなる群より選択される１以上の基で置換されていてもよい芳香族炭化水素基である。Ｒ^ａ３、Ｒ^ａ４、ｍａ４、及びｍａ５は、式（Ａ２－１）中のこれらと同様である。ただし、式（Ａ２－２）で表される２価の基の炭素原子数の上限は４０である。） Preferred examples of the divalent group having the partial structure represented by formula (A2-1) include divalent groups represented by the following formula (A2-2).

(In formula (A2-2), ^X1 and ^X2 each independently represent an aromatic hydrocarbon group which may be substituted with one or more groups selected from the group consisting of an alkyl group having from 1 to 4 carbon atoms, an alkoxy group having from 1 to 4 carbon atoms, and a halogen atom. R ^a3 , R ^a4 , ma4, and ma5 are the same as those in formula (A2-1). However, the upper limit of the number of carbon atoms in the divalent group represented by formula (A2-2) is 40.)

In formula (A2-2), ^X1 and ^X2 each independently represent a divalent aromatic hydrocarbon group which may be substituted with one or more groups selected from the group consisting of an alkyl group having from 1 to 4 carbon atoms, an alkoxy group having from 1 to 4 carbon atoms, and a halogen atom.
Examples of the alkyl group having 1 to 4 carbon atoms as a substituent include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a tert-butyl group. Among these alkyl groups, a methyl group and an ethyl group are preferred, and a methyl group is more preferred.
Examples of the alkoxy group having 1 to 4 carbon atoms as a substituent include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, and a tert-butyloxy group. Among these alkoxy groups, a methoxy group and an ethoxy group are preferred, and a methoxy group is more preferred.
Examples of the halogen atom as a substituent include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these halogen atoms, a chlorine atom and a bromine atom are preferred.

The number of carbon atoms in the aromatic hydrocarbon group represented by ^X1 and ^X2 is not particularly limited, so long as the number of carbon atoms in the divalent group represented by formula (A2-2) is 40 or less. The number of carbon atoms in the aromatic hydrocarbon group does not include the number of carbon atoms in the substituent.
The aromatic hydrocarbon group as X ¹ and X ² is preferably a phenylene group such as an o-phenylene group, an m-phenylene group, or a p-phenylene group; a naphthalene-diyl group such as a naphthalene-1,4-diyl group, a naphthalene-1,3-diyl group, a naphthalene-2,6-diyl group, or a naphthalene-2,7-diyl group; or a biphenyldiyl group such as a biphenyl-4,4'-diyl group, a biphenyl-3,4'-diyl group, or a biphenyl-3,3'-diyl group.

X ¹ and X ² are preferably a p-phenylene group, an m-phenylene group, a naphthalene-1,4-diyl group, and a biphenyl-4,4'-diyl group, more preferably a p-phenylene group and a biphenyl-4,4'-diyl group, and further preferably a p-phenylene group.

Specific examples of the diamine compound (A-2) having a divalent group having the partial structure represented by formula (A2-1) explained above include the following compounds.

（式（Ａ３）中、Ｒ^ａ５及びＲ^ａ６は、それぞれ独立に、炭素原子数１以上４以下のアルキル基、炭素原子数１以上４以下のアルコキシ基、又はハロゲン原子であり、ｍａ６及びｍａ７は、それぞれ独立に０以上４以下の整数であり、Ｒ^ａ７及びＲ^ａ８は、それぞれ独立に、水素原子、炭素原子数１以上４以下のアルキル基、炭素原子数１以上４以下のハロゲン化アルキル基、又はフェニル基であり、Ｒ^ａ７とＲ^ａ８とは互いに結合して環を形成してもよい。） (Diamine compound (A-3))
The diamine compound (A-3) has a partial structure represented by the following formula (A3) and is a diamine compound that does not fall under the category of the diamine compound (A-1) or the diamine compound (A-2).

(In formula (A3), R ^a5 and R ^a6 each independently represent an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, or a halogen atom; ma6 and ma7 each independently represent an integer of 0 to 4; R ^a7 and R ^a8 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a halogenated alkyl group having 1 to 4 carbon atoms, or a phenyl group; and R ^a7 and R ^a8 may be bonded to each other to form a ring.)

In formula (A3), examples of the alkyl group having 1 to 4 carbon atoms as R ^a5 and R ^a6 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a tert-butyl group. Among these alkyl groups, a methyl group and an ethyl group are preferred, and a methyl group is more preferred.
In formula (A3), examples of the alkoxy group having 1 to 4 carbon atoms as R ^a5 and R ^a6 include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, and a tert-butyloxy group. Among these alkoxy groups, a methoxy group and an ethoxy group are preferred, and a methoxy group is more preferred.
In formula (A3), examples of the halogen atom represented by R ^a5 and R ^a6 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these halogen atoms, a chlorine atom and a bromine atom are preferred.

In formula (A3), ma6 and ma7 are each independently an integer of 0 or more and 4 or less. Because diamine compound (A-3) is easily available, ma6 and ma7 are each preferably an integer of 0 or more and 2 or less, more preferably 0.

In formula (A3), examples of the alkyl group having 1 to 4 carbon atoms as R ^a7 and R ^a8 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a tert-butyl group.
In formula (A3), examples of the halogenated alkyl group having 1 to 4 carbon atoms as R ^a7 and R ^a8 include a chloromethyl group, a dichloromethyl group, a trichloromethyl group, a bromomethyl group, a dibromomethyl group, a tribromomethyl group, a fluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a 1,1-difluoroethyl group, and a 1,1,2,2,2-pentafluoroethyl group.
As R ^a7 and R ^a8 in the formula (A3), a hydrogen atom, a methyl group, an ethyl group, a trifluoromethyl group, and a phenyl group are preferable, because the polyimide resin precursor has good solubility in an organic solvent and the diamine compound (A-3) is easily available.
It is also preferred that R ^a7 and R ^a8 combine with each other to form a cycloalkylidene group having 5 to 8 carbon atoms, such as a cyclopentylidene group, a cyclohexylidene group, a cycloheptylidene group, or a cyclooctylidene group.

Preferred specific examples of the partial structure represented by formula (A3) include the following structures.

（式（Ａ３－１）中、Ｘ^３及びＸ^４は、それぞれ独立に、炭素原子数１以上４以下のアルキル基、炭素原子数１以上４以下のアルコキシ基、及びハロゲン原子からなる群より選択される１以上の基で置換されていてもよい芳香族炭化水素基である。Ｒ^ａ５、Ｒ^ａ６、Ｒ^ａ７、Ｒ^ａ８、及びｍａ６、及びｍａ７は、式（Ａ３）中のこれらと同様である。） A compound suitable as the diamine compound (A-3) is a compound represented by the following formula (A3-1).

(In formula (A3-1), ^X3 and ^X4 each independently represent an aromatic hydrocarbon group which may be substituted with one or more groups selected from the group consisting of an alkyl group having from 1 to 4 carbon atoms, an alkoxy group having from 1 to 4 carbon atoms, and a halogen atom. R ^a5 , R ^a6 , R ^a7 , R ^a8 , and ma6 and ma7 are the same as those in formula (A3).)

In formula (A3-1), ^X3 and ^X4 each independently represent a divalent aromatic hydrocarbon group which may be substituted with one or more groups selected from the group consisting of an alkyl group having from 1 to 4 carbon atoms, an alkoxy group having from 1 to 4 carbon atoms, and a halogen atom.
Examples of the alkyl group having 1 to 4 carbon atoms as a substituent include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a tert-butyl group. Among these alkyl groups, a methyl group and an ethyl group are preferred, and a methyl group is more preferred.
Examples of the alkoxy group having 1 to 4 carbon atoms as a substituent include a methoxy group, an ethoxy group, an n-propyloxy group, an isopropyloxy group, an n-butyloxy group, an isobutyloxy group, a sec-butyloxy group, and a tert-butyloxy group. Among these alkoxy groups, a methoxy group and an ethoxy group are preferred, and a methoxy group is more preferred.
Examples of the halogen atom as a substituent include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these halogen atoms, a chlorine atom and a bromine atom are preferred.

The number of carbon atoms in the aromatic hydrocarbon group represented by ^X3 and ^X4 is not particularly limited, and is, for example, preferably from 6 to 50, and more preferably from 6 to 20. The number of carbon atoms in the aromatic hydrocarbon group does not include the number of carbon atoms of the substituent.
The aromatic hydrocarbon group represented by ^X3 and ^X4 is preferably a phenylene group such as an o-phenylene group, an m-phenylene group, or a p-phenylene group; a naphthalene diyl group such as a naphthalene-1,4-diyl group, a naphthalene-1,3-diyl group, a naphthalene-2,6-diyl group, or a naphthalene-2,7-diyl group; or a biphenyl diyl group such as a biphenyl-4,4'-diyl group, a biphenyl-3,4'-diyl group, or a biphenyl-3,3'-diyl group.

^X3 and ^X4 are preferably a p-phenylene group, an m-phenylene group, a naphthalene-1,4-diyl group, or a biphenyl-4,4'-diyl group, more preferably a p-phenylene group or a biphenyl-4,4'-diyl group, and even more preferably a p-phenylene group.

Specific examples of the diamine compound (A-3) represented by the formula (A3) described above include the following compounds.

(Dimer diamine compound (A-4))
As the diamine compound, a dimer diamine compound (A-4) is also preferred because it is easy to obtain a polyimide resin precursor that gives a polyimide resin with a low dielectric constant and dielectric tangent in a high frequency band. The dimer diamine compound (A-4) is a diamine compound in which two terminal carboxy groups of a dimer acid are substituted with an aminomethyl group or an amino group. Dimer acid is a known dibasic acid obtained by an intermolecular polymerization reaction of an unsaturated fatty acid. The industrial production process for producing dimer acid is almost standardized. Typically, dimer acid is obtained by dimerizing an unsaturated fatty acid having 11 to 22 carbon atoms in the presence of a clay catalyst or the like. The dimer acid obtained industrially is mainly composed of a dibasic acid having 36 carbon atoms obtained by dimerizing an unsaturated fatty acid having 18 carbon atoms, such as oleic acid, linoleic acid, and linolenic acid. Industrially obtained dimer acid may contain any amount of monomer acid having 18 carbon atoms, trimer acid having 54 carbon atoms, and other polymerized fatty acids having from 20 to 54 carbon atoms, depending on the degree of purification.
The diamine compound (A-4) is preferably a diamine compound represented by the following formula (31).

In formula (31), e, f, g, and h are each an integer of 0 or more. e+f is an integer of 6 or more and 17 or less, and g+h is an integer of 8 or more and 19 or less. In formula (31), the wavy line represents a carbon-carbon single bond or a carbon-carbon double bond.

Furthermore, the diamine compound represented by formula (31) is preferably a compound represented by the following formula (32), since it is easy to obtain a polyimide resin precursor capable of forming a polyimide resin having excellent elongation.

Commercially available products of the diamine compound represented by formula (31) include Versamine 551 (manufactured by BASF) and Priamine 1074 (manufactured by Croda Japan), which contain a compound represented by the following formula (33), and Versamine 552 (manufactured by BASF), Priamine 1073 (manufactured by Croda Japan), and Priamine 1075 (manufactured by Croda Japan), which contain a compound represented by the above formula (32). Such commercially available dimer diamine compounds (A-4) are usually mixtures containing multiple types of amine compounds.

In addition, the diamine compound represented by formula (31) is reacted with an acid halide derived from trimellitic anhydride to obtain a tetracarboxylic dianhydride represented by the following formula (34). It is also preferable to use the tetracarboxylic dianhydride represented by the following formula (34) as a raw material for producing a polyimide resin precursor.
In formula (34), i, j, k, and l are each an integer of 0 or greater. i+j is an integer of 6 or greater and 17 or less, and k+l is an integer of 8 or greater and 19 or less. In formula (34), the wavy line portion represents a carbon-carbon single bond or a carbon-carbon double bond.

The ratio of the number of moles of one or more compounds selected from the group consisting of diamine compound (A-1), diamine compound (A-2), diamine compound (A-3), and dimer diamine compound (A-4) to the total number of moles of the diamine compounds is preferably 10 mol% or more and 100 mol% or less, more preferably 15 mol% or more and 100 mol% or less, and even more preferably 20 mol% or more and 100 mol% or less.

[Triamine Compound]
The triamine compound gives the structural unit (1-2) represented by formula (1-2). The triamine compound is represented by the following formula (A2b). The triamine compound represented by formula (A2b) is condensed with a dicarboxylic acid described below to produce the structural unit (1-2) represented by formula (1-2).
Y ^A2 -(NH ₂ ) ₃ ... (A2b)
(In formula (A2b), Y represents a trivalent organic ^group having 4 to 40 carbon atoms.)

Y ^A2 is a trivalent organic group having from 4 to 40 carbon atoms. Y ^A2 may have one or more substituents in addition to the three amino groups.
Preferred examples of the substituent include a fluorine atom, an alkyl group having from 1 to 6 carbon atoms, an alkoxy group having from 1 to 6 carbon atoms, a fluorinated alkyl group having from 1 to 6 carbon atoms, a fluorinated alkoxy group having from 1 to 6 carbon atoms, a carboxy group, or a hydroxy group.
When the substituent is a fluorinated alkyl group or a fluorinated alkoxy group, it is preferably a perfluoroalkyl group or a perfluoroalkoxy group.

The lower limit of the number of carbon atoms in the organic group represented by Y ^A2 is 4, and more preferably 6, and the upper limit is 40, and more preferably 30.
Y ^A2 may be an aliphatic group, but is preferably an organic group containing one or more aromatic rings.

When Y ^A2 is an organic group containing one or more aromatic rings, the organic group may be one aromatic group itself, or may be a group in which two or more aromatic groups are bonded via an aliphatic hydrocarbon group, a halogenated aliphatic hydrocarbon group, or a bond containing a heteroatom such as an oxygen atom, a sulfur atom, or a nitrogen atom. Examples of the bond containing a heteroatom such as an oxygen atom, a sulfur atom, or a nitrogen atom contained in ^{Y A2} include -CONH-, -NH-, -N=N-, -CH=N-, -COO-, -O-, -CO-, -SO-, -SO ₂ -, -S-, and -S-S-, and the like are preferred.

The aromatic ring in Y ^A2 bonded to the amino group is preferably a benzene ring. When the ring bonded to the amino group in Y ^A2 is a condensed ring containing two or more rings, the ring bonded to the amino group in the condensed ring is preferably a benzene ring.
The aromatic ring contained in Y ^A2 may be an aromatic heterocycle.

In terms of the mechanical properties, heat resistance, chemical resistance, etc. of the polyimide resin formed using the polyimide resin precursor, aromatic triamines containing aromatic groups are preferred as triamine compounds.

Suitable examples of aliphatic triamines that do not have an aromatic group include tris(2-aminoethyl)amine, tris(3-aminopropyl)amine, tris(2-aminopropylamine), and 1,3,5-tris(aminomethyl)cyclohexane.

Suitable examples of aromatic triamines include triamino-substituted compounds such as biphenyl, diphenyl ether, benzophenone, diphenyl sulfide, diphenyl sulfone, diphenyl methane, 2,2-diphenyl propane, and 2,2-diphenyl hexafluoropropane.

Specific examples of such aromatic triamines include triaminobiphenyls such as 2,3',4-triaminobiphenyl, 2,4,4'-triaminobiphenyl, 3,3',4-triaminobiphenyl, 3,3',5-triaminobiphenyl, 3,4,4'-triaminobiphenyl, and 3,4',5-triaminobiphenyl; triaminodiphenyl ethers such as 2,3',4-triaminodiphenyl ether, 2,4,4'-triaminodiphenyl ether, 3,3',4-triaminodiphenyl ether, 3,3',5-triaminodiphenyl ether, 3,4,4'-triaminodiphenyl ether, and 3,4',5-triaminodiphenyl ether; 2,3',4-triaminobenzophenone, 2,4,4'-triaminobenzophenone, and 3,3',4-triaminobenzophenone. triaminobenzophenones such as 2,3',4-triaminodiphenyl sulfide, 2,4,4'-triaminodiphenyl sulfide, 3,3',5-triaminodiphenyl sulfide, 3,4,4'-triaminodiphenyl sulfide, and 3,4',5-triaminodiphenyl sulfide; triaminodiphenyl sulfides such as 2,3',4-triaminodiphenyl sulfide, 2,4,4'-triaminodiphenyl sulfide, 3,3',5-triaminodiphenyl sulfide, 3,4,4'-triaminodiphenyl sulfide, and 3,4',5-triaminodiphenyl sulfide; 2,3',4-triaminodiphenyl sulfone, 2,4,4'-triaminodiphenyl sulfone, 3,3',4-triaminodiphenyl sulfone, 3,3',5-triaminodiphenyl sulfone, 3,4,4'-triaminodiphenyl sulfone, and Triaminodiphenylsulfones such as 3,4',5-triaminodiphenylsulfone; triaminodiphenylmethanes such as 2,3',4-triaminodiphenylmethane, 2,4,4'-triaminodiphenylmethane, 3,3',4-triaminodiphenylmethane, 3,3',5-triaminodiphenylmethane, 3,4,4'-triaminodiphenylmethane, and 3,4',5-triaminodiphenylmethane; 2-(2,4-diaminophenyl)-2-(3-aminophenyl)propane, 2-(2,4-diaminophenyl)-2-(4-aminophenyl)propane, 2-(3,4-diaminophenyl)-2-(3-aminophenyl)propane, 2-(3,5-diaminophenyl)-2-(3-aminophenyl)propane, 2-(3,4-diaminophenyl)-2-(4-aminophenyl ) propane, and triamino-2,2-diphenylpropane such as 2-(3,5-diaminophenyl)-2-(4-aminophenyl)propane; triamino-2,2-diphenylhexafluoropropane such as 2-(2,4-diaminophenyl)-2-(3-aminophenyl)hexafluoropropane, 2-(2,4-diaminophenyl)-2-(4-aminophenyl)hexafluoropropane, 2-(3,4-diaminophenyl)-2-(3-aminophenyl)hexafluoropropane, 2-(3,5-diaminophenyl)-2-(3-aminophenyl)hexafluoropropane, 2-(3,4-diaminophenyl)-2-(4-aminophenyl)hexafluoropropane, and 2-(3,5-diaminophenyl)-2-(4-aminophenyl)hexafluoropropane.

Furthermore, the aromatic triamine may preferably be a triaminobenzene such as 1,3,5-triaminobenzene or 1,3,4-triaminobenzene, 2,4,6-triamino-1,3,5-triazine (melamine), or a compound represented by the following formulae (A2b-1) to (A2b-7): In the following formula (A2b-1), R ^X is a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a halogenated alkyl group having 1 to 4 carbon atoms, a halogenated alkoxy group having 1 to 4 carbon atoms, or a cyano group.

Specific examples of suitable aromatic triamines represented by formula (A2b-1) include 1,3,5-tri(4-aminophenyl)benzene, 1,3,5-tri(3-methyl-4-aminophenyl)benzene, 1,3,5-tri(3-methoxy-4-aminophenyl)benzene, 1,3,5-tri(2-methyl-4-aminophenyl)benzene, 1,3,5-tri(2-methoxy-4-aminophenyl)benzene, 1,3,5-tri(3-ethyl-4-aminophenyl)benzene, 1,3,5-tri(3-aminophenyl)benzene, etc.

Specific examples of suitable aromatic triamines represented by formula (A2b-2) include 3,5-di(4-aminophenoxy)aniline, 3,5-di(3-methyl-4-aminophenoxy)aniline, 3,5-di(3-methoxy-4-aminophenoxy)aniline, 3,5-di(2-methyl-4-aminophenoxy)aniline, 3,5-di(2-methoxy-4-aminophenoxy)aniline, 3,5-di(3-ethyl-4-aminophenoxy)aniline, and 3,5-di(3-aminophenyl)aniline.

Specific examples of suitable aromatic triamines represented by formula (A2b-3) include 1,3,5-tri(4-aminophenoxy)benzene, 1,3,5-tri(3-methyl-4-aminophenoxy)benzene, 1,3,5-tri(3-methoxy-4-aminophenoxy)benzene, 1,3,5-tri(2-methyl-4-aminophenoxy)benzene, 1,3,5-tri(2-methoxy-4-aminophenoxy)benzene, 1,3,5-tri(3-ethyl-4-aminophenoxy), and 1,3,5-tri(3-aminophenoxy)benzene.

Specific examples of suitable aromatic triamines represented by formula (A2b-4) include 1,3,5-tri(4-aminophenylamino)benzene, 1,3,5-tri(3-methyl-4-aminophenylamino)benzene, 1,3,5-tri(3-methoxy-4-aminophenylamino)benzene, 1,3,5-tri(2-methyl-4-aminophenylamino)benzene, 1,3,5-tri(2-methoxy-4-aminophenylamino)benzene, 1,3,5-tri(3-ethyl-4-aminophenylamino)benzene, and 1,3,5-tri(3-aminophenylamino)benzene.

Specific examples of suitable aromatic triamines represented by formula (A2b-5) include tri(4-aminophenyl)amine, tri(3-methyl-4-aminophenyl)amine, tri(3-methoxy-4-aminophenyl)amine, tri(2-methyl-4-aminophenyl)amine, tri(2-methoxy-4-aminophenyl)amine, tri(3-ethyl-4-aminophenyl)amine, and tri(3-aminophenyl)amine.

Specific examples of suitable aromatic triamines represented by formula (A2b-6) include tris(4-(4-aminophenoxy)phenyl)methane, tris(4-(3-methyl-4-aminophenoxy)phenyl)methane, tris(4-(3-methoxy-4-aminophenoxy)phenyl)methane, tris(4-(2-methyl-4-aminophenoxy)phenyl)methane, tris(4-(2-methoxy-4-aminophenoxy)phenyl)methane, tris(4-(3-ethyl-4-aminophenoxy)phenyl)methane, and tris(4-(3-aminophenoxy)phenyl)methane.

Specific examples of suitable aromatic triamines represented by formula (A2b-7) include 1,1,1-tris(4-(4-aminophenoxy)phenyl)ethane, 1,1,1-tris(4-(3-methyl-4-aminophenoxy)phenyl)ethane, 1,1,1-tris(4-(3-methoxy-4-aminophenoxy)phenyl)ethane, 1,1,1-tris(4-(2-methyl-4-aminophenoxy)phenyl)ethane, 1,1,1-tris(4-(2-methoxy-4-aminophenoxy)phenyl)ethane, 1,1,1-tris(4-(3-ethyl-4-aminophenoxy)phenyl)ethane, and 1,1,1-tris(4-(3-aminophenoxy)phenyl)ethane.

[Tetraamine Compounds]
The tetraamine compound gives a structural unit (1-3) represented by formula (1-3). The tetraamine compound is represented by the following formula (A2c). The structural unit (1-3) represented by formula (1-3) is produced by condensing the tetraamine compound represented by formula (A2c) with a dicarboxylic acid described below.
Y ^A3 -(NH ₂ ) ₄ ... (A2c)
(In formula (A2c), Y represents ^{a tetravalent} organic group having 4 to 50 carbon atoms.)

Y ^A3 is a tetravalent organic group having from 4 to 50 carbon atoms. Y ^A3 may have one or more substituents in addition to the four amino groups.
Preferred examples of the substituent include a fluorine atom, an alkyl group having from 1 to 6 carbon atoms, an alkoxy group having from 1 to 6 carbon atoms, a fluorinated alkyl group having from 1 to 6 carbon atoms, a fluorinated alkoxy group having from 1 to 6 carbon atoms, a carboxy group, or a hydroxy group.
When the substituent is a fluorinated alkyl group or a fluorinated alkoxy group, it is preferably a perfluoroalkyl group or a perfluoroalkoxy group.

The lower limit of the number of carbon atoms in the organic group represented by Y ^A3 is 4, and more preferably 6, and the upper limit is 50, and more preferably 40.
Y ^A3 may be an aliphatic group, but is preferably an organic group containing one or more aromatic rings.

When Y ^A3 is an organic group containing one or more aromatic rings, the organic group may be one aromatic group itself, or may be a group in which two or more aromatic groups are bonded via an aliphatic hydrocarbon group, a halogenated aliphatic hydrocarbon group, or a bond containing a heteroatom such as an oxygen atom, a sulfur atom, or a nitrogen atom. Examples of the bond containing a heteroatom such as an oxygen atom, a sulfur atom, or a nitrogen atom contained in ^{Y A3} include -CONH-, -NH-, -N=N-, -CH=N-, -COO-, -O-, -CO-, -SO-, -SO ₂ -, -S-, and -S-S-, and -COO-, -O-, -CO-, and -S- are preferred.

The aromatic ring in Y ^A3 bonded to the amino group is preferably a benzene ring. When the ring bonded to the amino group in Y ^A3 is a condensed ring containing two or more rings, the ring bonded to the amino group in the condensed ring is preferably a benzene ring.
The aromatic ring contained in Y ^A3 may be an aromatic heterocycle.

In terms of the mechanical properties, heat resistance, and chemical resistance of the polyimide resin formed using the polyimide resin precursor, aromatic tetraamines containing aromatic groups are preferred as the tetraamine compound.

Specific examples of aromatic tetraamines include 1,2,4,5-tetraaminobenzene, 1,2,5,6-tetraaminonaphthalene, 2,3,6,7-tetraaminonaphthalene, 3,3',4,4'-tetraaminodiphenylmethane, 3,3',4,4'-tetraamino-1,1-diphenylethane, 3,3',4,4'-tetraamino-2,2-diphenylpropane, 3,3'4,4'-tetraaminodiphenylether, 3,3'4,4'-tetraaminodiphenylsulfide, and 3,3',4,4'-tetraaminodiphenylsulfone, and 1,1,2,2-tetra(4-aminophenyl)ethylene.

[Dicarboxylic acids obtained by reaction of tetracarboxylic dianhydrides with alcohols]
Dicarboxylic acids are reaction products of tetracarboxylic dianhydrides and alcohols.
The polymerizable resin (A) essentially has, as R ^A1 and R ^A2 in the above formula (1), an unsaturated group having an ethylenically unsaturated double bond and having 3 to 30 carbon atoms.
For this reason, at least a part of R ^A1 and R ^A2 in the above formula (1) is an organic group, and not all of R ^A1 and R ^A2 in the above formula (1) are hydrogen atoms.
The ratio of the number of moles of unsaturated groups having 3 to 30 carbon atoms to the number of moles of organic groups as R ^A1 and R ^A2 is preferably 60 mol % or more, more preferably 70 mol % or more, even more preferably 80 mol % or more, and particularly preferably 90 mol % or more.

When ^R and ^R in formula (1) are unsaturated groups, the unsaturated group is preferably one or more groups selected from a chain aliphatic hydrocarbon group having an ethylenically unsaturated double bond and a (meth)acryloyl group-containing group, and more preferably a chain aliphatic hydrocarbon group having an ethylenically unsaturated double bond.

A dicarboxylic acid having an organic group as R ^A1 and R ^A2 can be obtained by reacting an alcohol having a structure corresponding to the structure of the organic group with a tetracarboxylic dianhydride.
Hereinafter, in this specification, unless otherwise specified, the term "dicarboxylic acid" refers to a dicarboxylic acid which is a reaction product between a tetracarboxylic dianhydride and the above-mentioned alcohols.
The tetracarboxylic dianhydride and the alcohol will be described below.

（式（Ａ３）中、Ｘ^Ａ１は炭素原子数４以上４０以下の４価の有機基である。） (Tetracarboxylic acid dianhydride)
The tetracarboxylic dianhydride is not particularly limited as long as the desired effect is not impaired. As the tetracarboxylic dianhydride, typically, a tetracarboxylic dianhydride that has been conventionally used in the production of polyamic acid and polyimide resins can be used.
The tetracarboxylic dianhydride may be a compound represented by the following formula (A3).

(In formula (A3), X ^A1 is a tetravalent organic group having 4 to 40 carbon atoms.)

In formula (A3), X ^A1 is a tetravalent organic group having 4 to 40 carbon atoms, and may have one or more substituents in addition to the two acid anhydride groups represented by -CO-O-CO- in formula (A3).
Preferred examples of the substituent include a fluorine atom, an alkyl group having from 1 to 6 carbon atoms, an alkoxy group having from 1 to 6 carbon atoms, a fluorinated alkyl group having from 1 to 6 carbon atoms, and a fluorinated alkoxy group having from 1 to 6 carbon atoms. The compound represented by formula (A3) may contain a carboxy group or a carboxylate group in addition to the acid anhydride group.
When the substituent is a fluorinated alkyl group or a fluorinated alkoxy group, it is preferably a perfluoroalkyl group or a perfluoroalkoxy group.
The same can be said about the above-mentioned substituents for one or more substituents that the aromatic group described below may have on the aromatic ring.

The number of carbon atoms constituting X ^A1 is preferably 8 or more, more preferably 12 or more. The number of carbon atoms constituting X ^A1 is preferably 30 or less. X ^A1 may be an aliphatic group, an aromatic group, or a group combining these structures. X ^A1 may contain a halogen atom, an oxygen atom, a nitrogen atom, and a sulfur atom in addition to a carbon atom and a hydrogen atom. When X ^{A1 contains an oxygen atom, a nitrogen atom, or a sulfur atom, the oxygen atom, the nitrogen atom, or the sulfur atom may be included in X A1} as a group selected from a nitrogen-containing heterocyclic group, -CONH-, -NH-, -N=N-, -CH=N-, -COO-, -O-, -CO-, -SO-, -SO ₂ -, -S-, and -S-S-, and is more preferably included ^{in X A1 as} a group selected from -O-, -CO-, -S-, and.

The tetracarboxylic acid dianhydride represented by formula (A3) may be an aliphatic tetracarboxylic acid dianhydride having two dicarboxylic acid anhydride groups bonded to an aliphatic group, or an aromatic tetracarboxylic acid dianhydride having at least one dicarboxylic acid anhydride group bonded to an aromatic group.
The aromatic tetracarboxylic dianhydride preferably has two dicarboxylic anhydride groups bonded to the aromatic group.

The aliphatic tetracarboxylic dianhydride may contain an alicyclic structure. The alicyclic structure may be polycyclic. An example of an aliphatic tetracarboxylic dianhydride that does not have an alicyclic structure is 1,2,3,4-tetracarboxylic dianhydride (e.g., Rikacid BT-100, manufactured by New Japan Chemical Co., Ltd.).
Examples of the aliphatic tetracarboxylic dianhydride having an alicyclic structure include cyclobutane tetracarboxylic dianhydride, cyclopentane-1,2,3,4-tetracarboxylic dianhydride, cyclohexane-1,2,4,5-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclopentanone-α'-spiro-2″-norbornane-5,5″,6,6″-tetracarboxylic dianhydride (e.g., Enehyde (registered trademark) CpODA, manufactured by Eneos Corporation), 2,2-bis(2, 3-dicarboxyphenoxy)hexafluoropropane dianhydride [5,5'-(1,4-phenylene)bisnorbornane]-2,2',3,3'-tetracarboxylic dianhydride (e.g., Enehyde (registered trademark) BzDA, manufactured by Eneos Corporation), 1,3,3a,4,5,9b-hexahydro-5(tetrahydro-2,5-dioxo-3-furanyl)naphtho[1,2-C]furan-1,3-dione (e.g., Rikacid TDA-100, manufactured by New Japan Chemical Co., Ltd.), etc.

Examples of aromatic tetracarboxylic dianhydrides represented by formula (A3) and having two dicarboxylic anhydride groups bonded to an aromatic group include pyromellitic dianhydride, 1,4-bis(3,4-dicarboxyphenoxy)benzene dianhydride, 4,4'-oxydiphthalic dianhydride, 3,3',4,4'-biphenyl tetracarboxylic dianhydride, 2,3,3',4'-biphenyl tetracarboxylic dianhydride, 3,3',4,4'-benzophenone tetracarboxylic dianhydride, 2,2',3,3'-benzophenone tetracarboxylic dianhydride, 3,3',4,4'-diphenylsulfone tetracarboxylic dianhydride, 3,3',4,4'-diphenylsulfide tetracarboxylic dianhydride, trimellitic (3,4-dicarboxyphenyl) dianhydride, 1,2,5,6-naphthalene tetracarboxylic dianhydride, 2,3,6,7-naphthalene tetracarboxylic dianhydride, Examples of suitable dianhydrides include carboxylic acid dianhydrides, 2,3,5,6-pyridinetetracarboxylic acid dianhydride, 3,4,9,10-perylenetetracarboxylic acid dianhydride, bis(2,3-dicarboxyphenoxy)methane dianhydride, 1,1-bis(2,3-dicarboxyphenoxy)ethane dianhydride, 2,2-bis[4-(3,4-dicarboxyphenyloxy)phenyl]propane dianhydride, 4,4'-bis(3,4-dicarboxyphenylcarbonyloxy)biphenyl dianhydride, 2,6-bis(3,4-dicarboxyphenylcarbonyloxy)naphthalene dianhydride, 1,2-bis(3,4-dicarboxyphenylcarbonyloxy)ethane dianhydride (e.g., Rikacid TMEG100, manufactured by New Japan Chemical Co., Ltd.), and 1,10-bis(3,4-dicarboxyphenylcarbonyloxy)decane dianhydride (e.g., 10BTA, manufactured by Kurogane Chemical Co., Ltd.).
Among these aromatic tetracarboxylic acid dianhydrides, 2,2-bis[4-(3,4-dicarboxyphenyloxy)phenyl]propane dianhydride, 4,4'-bis(3,4-dicarboxyphenylcarbonyloxy)biphenyl dianhydride, 4,4'-bis(3,4-dicarboxyphenyloxy)biphenyl dianhydride, 2,6-bis(3,4-dicarboxyphenylcarbonyloxy)naphthalene dianhydride, and α,ω-bis(3,4-dicarboxyphenylcarbonyloxy)alkane dianhydride are preferred, as they are likely to form a cured product with excellent electrical properties.
α,ω-bis(3,4-dicarboxyphenylcarbonyloxy)alkane dianhydride is a compound represented by the following formula (a1).

n in formula (a1), which is the number of carbon atoms in the linear alkylene group in the α,ω-bis(3,4-dicarboxyphenylcarbonyloxy)alkane dianhydride, is an integer of 1 or more, preferably 1 to 20, and more preferably 2 to 12. Specific examples of suitable α,ω-bis(3,4-dicarboxyphenylcarbonyloxy)alkane dianhydrides include 1,2-bis(3,4-dicarboxyphenylcarbonyloxy)ethane dianhydride (e.g., Rikacid TMEG100, manufactured by New Japan Chemical Co., Ltd.) and 1,10-bis(3,4-dicarboxyphenylcarbonyloxy)decane dianhydride (e.g., 10BTA, manufactured by Kurogane Chemical Co., Ltd.).

In addition, the aromatic tetracarboxylic dianhydride is also preferably biphenyltetracarboxylic dianhydride, from the viewpoints of suppressing warping of a polyimide resin film formed using a composition containing a polyimide resin precursor, and of providing good photolithography properties to a composition containing a polyimide resin precursor when the composition is imparted with photosensitivity.
Examples of the biphenyltetracarboxylic dianhydride include 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,3,3',4'-biphenyltetracarboxylic dianhydride, and 2,2',3,3'-biphenyltetracarboxylic dianhydride, and 3,3',4,4'-biphenyltetracarboxylic dianhydride is preferred.

The aromatic tetracarboxylic dianhydride may also be, for example, a compound represented by the following general formulas (a3-2) to (a3-4).

In the above formulae (a3-2) and (a3-3), R ^a01 , R ^a02 and R ^a03 each represent an aliphatic group optionally substituted with halogen, an oxygen atom, a sulfur atom, an aromatic group having one or more divalent elements bonded thereto, or a divalent group constituted by a combination thereof. R ^a02 and R ^a03 may be the same or different.
That is, R ^a01 , R ^a02 and R ^a03 may contain a carbon-carbon single bond, a carbon-oxygen-carbon ether bond or a halogen element (fluorine, chlorine, bromine, iodine). Examples of the compound represented by formula (a3-2) include 2,2-bis(3,4-dicarboxyphenoxy)propane dianhydride, bis(3,4-dicarboxyphenoxy)methane dianhydride, 1,1-bis(3,4-dicarboxyphenoxy)ethane dianhydride, 1,3-bis(3,4-dicarboxyphenoxy)benzene, 2,2-bis(3,4-dicarboxyphenoxy)hexafluoropropane dianhydride and 1,4-bis(3,4-dicarboxyphenoxy)benzene dianhydride.

In the formula (a3-4), R ^a04 and R ^a05 are either an aliphatic group which may be substituted with halogen, an aromatic group via one or more divalent elements, or a halogen, or a monovalent substituent constituted by a combination thereof. R ^a04 and R ^a05 may be the same or different. As the compound represented by formula (a3-4), difluoropyromellitic dianhydride, dichloropyromellitic dianhydride, etc. can also be used.

式（ａ３－５）～式（ａ３－７）における、Ｒ^ａ０１、Ｒ^ａ０２、及びＲ^ａ０３は、前述の式（ａ３－２）、式（ａ３－３）、及び式（ａ３－４）における、Ｒ^ａ０１、Ｒ^ａ０２、及びＲ^ａ０３と同様である。
式（ａ３－５）、式（ａ３－６）、及び式（ａ３－７）における、Ｒ^ａ０６は、ラジカル重合性基含有基である。ラジカル重合性基含有基については後述する。 The polyimide resin precursor preferably has a radical polymerizable group-containing group on its molecular chain in addition to the residue derived from the alcohol described above.
For this reason, the tetravalent organic group ^A2 in formula (A3) may be a group represented by the following formulae (a3-5) to (a3-7).

In formulae (a3-5) to (a3-7), R ^a01 , R ^a02 , and R ^a03 are the same as R ^a01 , R ^a02 , and R ^a03 in the above-mentioned formulae (a3-2), (a3-3), and (a3-4).
In formulae (a3-5), (a3-6), and (a3-7), R ^a06 represents a radically polymerizable group-containing group, which will be described later.

(Alcohol)
As described above, the dicarboxylic acid is a reaction product between a tetracarboxylic dianhydride and an alcohol.
The alcohols include alcohols in which a hydroxyl group is bonded to the aforementioned unsaturated group.

As described above, when ^R and ^R in formula (1) are unsaturated groups, the unsaturated group is preferably one or more groups selected from a chain aliphatic hydrocarbon group having an ethylenically unsaturated double bond and a (meth)acryloyl group-containing group.
Hereinafter, alcohols will be described by referring to a chain aliphatic hydrocarbon group having an ethylenically unsaturated double bond as the "unsaturated group G1", an alcohol having the unsaturated group G1 as the "alcohol AG1", a (meth)acryloyl group-containing group as the "(meth)acryloyl group-containing group G2", and an alcohol having the (meth)acryloyl group-containing group G2 as the "alcohol AG2".

・Alcohol AG1
The alcohol AG1 is an alcohol that does not contain a (meth)acryloyl group and has a hydroxyl group bonded to an unsaturated group G1 having 3 to 30 carbon atoms and one or more ethylenically unsaturated double bonds. Therefore, the number of carbon atoms in the alcohol AG1 is also 3 to 30.
The number of carbon atoms of the unsaturated group G1 is preferably from 3 to 30, more preferably from 4 to 30, even more preferably from 5 to 30, and particularly preferably from 5 to 25. Accordingly, the number of carbon atoms of the alcohol AG1 is also preferably from 3 to 30, more preferably from 4 to 30, even more preferably from 5 to 30, and particularly preferably from 5 to 25.

The alcohol AG1 and the unsaturated group G1 may have a linear or branched structure. The alcohol AG1 and the unsaturated group G1 may contain a cyclic group. The cyclic group may be an alicyclic group or an aromatic group.
The unsaturated group G1 of the alcohol AG1 may contain heteroatoms such as O, N, S, P, B, Si and halogen atoms, to the extent that the desired effect is not impaired.

The number of ethylenically unsaturated double bonds in the alcohol AG1 and the unsaturated group G1 is not particularly limited. The number of ethylenically unsaturated double bonds is preferably 1 or more and 4 or less, more preferably 1 or 2.

The unsaturated group G1 constituting the alcohol AG1 is preferably an unsaturated aliphatic hydrocarbon group, more preferably a chain unsaturated aliphatic hydrocarbon group, and even more preferably a straight-chain unsaturated aliphatic hydrocarbon group. The number of carbon atoms in the unsaturated aliphatic hydrocarbon group is preferably 5 or more and 30 or less.

Specific examples of preferred alcohols AG1 include allyl alcohol; butenols such as but-3-en-1-yl alcohol and but-2-en-1-yl alcohol; pentenols such as pent-4-en-1-yl alcohol, pent-3-en-1-yl alcohol, and pent-2-en-1-yl alcohol; hexenols such as hex-5-en-1-yl alcohol, hex-4-en-1-yl alcohol, hex-3-en-1-yl alcohol, and hex-2-en-1-yl alcohol; hept-6-en-1-yl alcohol, hept-5-en-1-yl alcohol, and hept-4-en-1-yl alcohol, Heptenols such as hept-3-en-1-yl alcohol and hept-2-en-1-yl alcohol; octenols such as oct-7-en-1-yl alcohol, oct-6-en-1-yl alcohol, oct-5-en-1-yl alcohol, oct-4-en-1-yl alcohol, oct-3-en-1-yl alcohol, and oct-2-en-1-yl alcohol; non-8-en-1-yl alcohol, non-7-en-1-yl alcohol, non-6-en-1-yl alcohol, non-5-en-1-yl alcohol, non-4-en-1-yl alcohol, non-3-en-1-yl alcohol, and non- Nonenols such as 2-en-1-yl alcohol; decenols such as dec-9-en-1-yl alcohol, dec-8-en-1-yl alcohol, dec-7-en-1-yl alcohol, dec-6-en-1-yl alcohol, dec-5-en-1-yl alcohol, dec-4-en-1-yl alcohol, dec-3-en-1-yl alcohol, and dec-2-en-1-yl alcohol; undecenols such as undec-10-en-1-yl alcohol; dodecenols such as dodec-11-en-1-yl alcohol; tridecenols such as tridec-12-en-1-yl alcohol; tetradec-13-en-1-yl alcohol, etc. tetradecenols such as pentadec-14-en-1-yl alcohol; hexadecenols such as hexadecan-15-en-1-yl alcohol; heptadecenols such as heptadec-16-en-1-yl alcohol; octadecenols such as octadec-17-en-1-yl alcohol and octadec-9-en-1-yl alcohol (oleyl alcohol); nonadecenols such as nonadecan-18-en-1-yl alcohol; icosenols such as icosan-19-en-1-yl alcohol; and octadienols such as octadecan-9,12-dien-1-yl alcohol (linoleyl alcohol).

Specific examples of suitable unsaturated groups G1 include allyl groups; butenyl groups such as but-3-en-1-yl and but-2-en-1-yl groups; pentenyl groups such as pent-4-en-1-yl, pent-3-en-1-yl, and pent-2-en-1-yl groups; hexenyl groups such as hex-5-en-1-yl, hex-4-en-1-yl, hex-3-en-1-yl, and hex-2-en-1-yl groups; hept-6-en-1-yl, hept-5-en-1-yl, hept-4-en-1-yl, hept- heptenyl groups such as 3-en-1-yl group and hept-2-en-1-yl group; octenyl groups such as oct-7-en-1-yl group, oct-6-en-1-yl group, oct-5-en-1-yl group, oct-4-en-1-yl group, oct-3-en-1-yl group, and oct-2-en-1-yl group; nona-8-en-1-yl group, nona-7-en-1-yl group, nona-6-en-1-yl group, nona-5-en-1-yl group, nona-4-en-1-yl group, nona-3-en-1-yl group, and nona-2-en-1-yl group. nonenyl groups such as the group; decenyl groups such as dec-9-en-1-yl, dec-8-en-1-yl, dec-7-en-1-yl, dec-6-en-1-yl, dec-5-en-1-yl, dec-4-en-1-yl, dec-3-en-1-yl, and dec-2-en-1-yl groups; undecenyl groups such as undec-10-en-1-yl; dodecenyl groups such as dodec-11-en-1-yl; tridecenyl groups such as tridec-12-en-1-yl; tetradecenyl groups such as tetradec-13-en-1-yl; Examples of such groups include pentadecenyl groups such as pentadec-14-en-1-yl; hexadecenyl groups such as hexadecenyl groups such as hexadecenyl groups such as hexadecenyl groups such as hexadecenyl groups such as hexadecenyl groups such as heptadec-16-en-1-yl; octadecenyl groups such as octadec-17-en-1-yl and octadec-9-en-1-yl (oleyl) groups; nonadecenyl groups such as nonadecenyl groups such as nonadecenyl groups such as nonadecenyl groups such as nonadecenyl groups such as icosan-19-en-1-yl; and octadienyl groups such as octadeca-9,12-dien-1-yl (linoleyl) groups.

・Alcohol AG2
The alcohol AG2 is an alcohol in which a hydroxyl group is bonded to the (meth)acryloyl group-containing group G2.
The structure and number of carbon atoms of the alcohol AG2 and the (meth)acryloyl group-containing group G2 are not particularly limited as long as the desired effects are not impaired.
The number of carbon atoms of the (meth)acryloyl group-containing group G2 is preferably 3 or more and 30 or less, more preferably 3 or more and 25 or less, and even more preferably 4 or more and 20 or less. Accordingly, the number of carbon atoms of the alcohol AG2 is also preferably 3 or more and 30 or less, more preferably 3 or more and 25 or less, and even more preferably 4 or more and 20 or less.

The structure of the alcohol AG2 and the (meth)acryloyl group-containing group G2 may be linear or branched. The alcohol AG2 and the (meth)acryloyl group-containing group G2 may contain a cyclic group. The cyclic group may be an alicyclic group or an aromatic group.
The (meth)acryloyl group-containing group G2 of the alcohol AG2 may contain heteroatoms such as O, N, S, P, B, Si and halogen atoms, to the extent that the desired effects are not impaired.

The number of (meth)acryloyl groups contained in the alcohol AG2 and the (meth)acryloyl group-containing group G2 is not particularly limited. The number of (meth)acryloyl groups is preferably 1 to 4, more preferably 1 or 2.

In terms of ease of forming a polyimide resin with a low dielectric tangent, it is preferable that alcohol AG2 is an alcohol having a combination of a secondary hydroxyl group and a (meth)acryloyl group, or includes an alcohol having a combination of a methylol group and a (meth)acryloyl group. Hereinafter, alcohols having a combination of a secondary hydroxyl group and a (meth)acryloyl group, and alcohols having a combination of a methylol group and a (meth)acryloyl group, are also referred to as "alcohol AG2-1." Alcohols that fall under alcohol AG2 but not alcohol AG2-1 are also referred to as "alcohol AG2-1."

In the specification of this application, a methylol group is defined as a hydroxymethyl group that is bonded to a secondary carbon atom, a tertiary carbon atom, a carbon atom bonded to one carbon atom and one heteroatom, a carbon atom bonded to two heteroatoms, or a carbon atom in an aromatic ring.
For example, a hydroxyethyl group is composed of a hydroxymethyl group and a methylene group. However, according to the above definition, in the specification and claims of this application, the hydroxymethyl group bonded to the primary carbon atom in the methylene group contained in the hydroxyethyl group does not fall under the category of a methylol group.

When producing the alcohol AG2-1, a mixture containing the alcohol AG2-2 together with the alcohol AG2-1 may be inevitably produced due to the production method.
For example, when a polyol having a secondary hydroxyl group or a methylol group and a primary hydroxyl group is reacted with a (meth)acrylic acid halide or the like to produce an alcohol AG2-1, an alcohol having a (meth)acryloyl group may be by-produced together with the primary hydroxyl group.
As long as a desired amount of dicarboxylic acid containing an ester group derived from the alcohol AG2-1 can be produced, a mixture containing the alcohol AG2-2 together with the alcohol AG2-1 produced by such a method can be used as the alcohol to be reacted with the tetracarboxylic dianhydride.

The alcohol AG2-1 may have two or more hydroxyl groups in combination. The alcohol AG2-1 may have a secondary hydroxyl group and a methylol group in combination.
The alcohol AG2-1 preferably has one secondary hydroxyl group or one methylol group.

When the alcohol AG2-1 has two or more (meth)acryloyl groups, the alcohol AG2-1 is preferably, for example, a (meth)acrylate of glycerin, trimethylolpropane, pentaerythritol, dipentaerythritol, or the like.
Specific examples of suitable alcohols AG2-1 having two or more (meth)acryloyl groups include glycerin-1,3-di(meth)acrylate, glycerin-1,2-di(meth)acrylate, trimethylolpropane di(meth)acrylate, pentaerythritol tri(meth)acrylate, and dipentaerythritol penta(meth)acrylate. These compounds may have an acryloyl group and a methacryloyl group in combination.

When the alcohol AG2-1 has one (meth)acryloyl group, the alcohol AG2-1 is preferably at least one selected from the compounds represented by the following formula (I) and the compounds represented by the following formula (II).
CH= ^CR1 -CO-O- ^R2 - ^CHR3 -OH (I)
CH= ^CR1 -CO-O- ^R4 - _CH2 -OH (II)
(In formula (I), R ¹ is a hydrogen atom or a methyl group, R ² is a divalent organic group bonded to the oxygen atom in the ester bond via a C-O bond and bonded to the carbon atom to which R ³ is bonded via a C-C bond, R ³ is a monovalent organic group bonded to the carbon atom to which R ³ is bonded via a C-C bond, and R ² and R ³ may be bonded to form a ring,
In formula (II), R ¹ is a hydrogen atom or a methyl group, and R ⁴ is a divalent organic group that is bonded to the oxygen atom in the ester bond via a C-O bond and to the methylol group in formula (II) via a C-C bond.

In the above formula (I), ^R2 is a divalent organic group that is bonded to the oxygen atom in the ester bond via a C-O bond and to the carbon atom to which ^R3 is bonded via a C-C bond. The divalent organic group may be a group containing a heteroatom such as a halogen atom, O, S, or N.
The number of carbon atoms of the divalent organic group represented by ^R2 in formula (I) is not particularly limited. The number of carbon atoms of the divalent organic group is, for example, preferably 1 or more and 20 or less, more preferably 1 or more and 12 or less, and further preferably 1 or more and 8 or less.

The divalent organic group represented by ^R2 in formula (I) is preferably a divalent hydrocarbon group. The divalent hydrocarbon group may contain a cyclic group. The cyclic group may be an aliphatic ring, an aromatic ring, or a condensed ring in which an aliphatic ring and an aromatic ring are condensed. The divalent hydrocarbon group represented by ^R2 is preferably an alkylene group.

Suitable examples of the alkylene group include a methylene group, an ethane-1,2-diyl group (ethylene group), an ethane-1,1-diyl group, a propane-1,3-diyl group, a propane-1,2-diyl group, a propane-1,1-diyl group, a butane-1,4-diyl group, a pentane-1,5-diyl group, a hexane-1,6-diyl group, a heptane-1,7-diyl group, and an octane-1,8-diyl group.
Of these, a methylene group, an ethane-1,2-diyl group (ethylene group), a propane-1,3-diyl group, a butane-1,4-diyl group, and a pentane-1,5-diyl group are preferred.

In formula (I), ^R3 is a monovalent organic group bonded to the carbon atom to which ^R3 is bonded via a C-C bond. The monovalent organic group may be a group containing a heteroatom such as a halogen atom, O, S, or N.
The number of carbon atoms of the monovalent organic group represented by ^R3 in formula (I) is not particularly limited. The number of carbon atoms of the monovalent organic group is, for example, preferably 1 or more and 20 or less, more preferably 1 or more and 12 or less, and further preferably 1 or more and 8 or less.

The monovalent organic group represented by ^R3 in formula (I) may be a chain aliphatic group, a cyclic group, or a group consisting of a chain aliphatic group and a cyclic group. The cyclic group may be an aliphatic ring, an aromatic ring, or a condensed ring in which an aliphatic ring and an aromatic ring are condensed.

Specific examples of the monovalent organic group as R ³ in formula (I) include alkyl groups such as a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, an n-hexyl group, an n-heptyl group, and an n-octyl group; a methoxymethyl group, an ethoxymethyl group, an n-propyloxymethyl group, an n-butyloxymethyl group, a 2-methoxyethyl group, a 2-ethoxyethyl group, a 2-n-propyloxyethyl group, a 2-n-butyloxyethyl group, a 3-methoxypropyl group, a 3-ethoxypropyl group, a 3-n-propyloxypropyl group, a 3-n-butyloxypropyl group, a 4-methoxybutyl group, a 4-ethoxybutyl group, a 4-n-propyloxybutyl group, and aryloxyalkyl groups such as phenoxymethyl, 2-phenoxyethyl, 3-phenoxypropyl, and 4-phenoxybutyl groups; and cycloalkyloxyalkyl groups such as cyclopentyloxymethyl, 2-cyclopentyloxyethyl, 3-cyclopentyloxypropyl, 4-cyclopentyloxybutyl, cyclohexyloxymethyl, 2-cyclohexyloxyethyl, 3-cyclohexyloxypropyl, 4-cyclohexyloxybutyl, cycloheptyloxymethyl, 2-cycloheptyloxyethyl, 3-cyclohexyloxypropyl, 4-cyclohexyloxybutyl, cycloheptyloxymethyl, 2-cycloheptyloxyethyl, 3-cycloheptyloxypropyl, and 4-cycloheptyloxybutyl groups.

Specific preferred examples of the divalent group represented by -R ² -CHR ³ - in formula (I) include the following groups. In the specific examples below, * is the end of the bond bonding to the oxygen atom in the ester bond in formula (I). ** is the end of the bond bonding to the hydroxyl group in formula (I).
In addition, since the polyimide resin formed using the polyimide resin precursor exhibits a low dielectric tangent value and excellent chemical resistance, it is preferable that the divalent group represented by -R ² -CHR ³ - in formula (I) contains a cyclic group. Such a cyclic group may be an aromatic group, an alicyclic group, or a fused cyclic group in which an aromatic ring and an aliphatic ring are condensed.

Preferable specific examples of the compound represented by formula (I) include the following compounds.

In the above formula (II), ^R4 is a divalent organic group that is bonded to the oxygen atom in the ester bond via a C-O bond and to the methylol group in formula (II) via a C-C bond. The divalent organic group may be a group containing a heteroatom such as a halogen atom, O, S, or N.
The number of carbon atoms of the divalent organic group represented by ^R4 in formula (II) is not particularly limited. The number of carbon atoms of the divalent organic group is, for example, preferably 1 or more and 20 or less, more preferably 1 or more and 12 or less, and further preferably 1 or more and 8 or less.

The divalent organic group represented by ^R4 in formula (II) may be a chain aliphatic group, a cyclic group, or a group consisting of a chain aliphatic group and a cyclic group. The cyclic group may be an aliphatic ring, an aromatic ring, or a condensed ring in which an aliphatic ring and an aromatic ring are condensed.

Specific preferred examples of the divalent group represented by ^R4 in formula (II) include the following groups. In the specific examples below, * is the end of the bond bonding to the oxygen atom in the ester bond in formula (II). ** is the end of the bond bonding to the methylol group in formula (II).

Preferable specific examples of the compound represented by formula (II) include the following compounds.

・Alcohol AG3
Alcohol AG3 is an alcohol that does not fall under Alcohol AG1 or Alcohol AG2. The alcohols may contain Alcohol AG3 to the extent that the desired effect is not impaired.
Therefore, the polyimide resin precursor may contain, as the organic groups R ^A1 and R ^A2 , an organic group G3 that is an organic group other than the unsaturated group G1 and the (meth)acryloyl group-containing group G2.

The structure of alcohol AG3 is not particularly limited as long as the desired effect is not impaired.

Examples of alcohol AG3 include alkane monools such as methanol, ethanol, n-propanol, isopropanol, n-butanol, n-pentanol, and n-hexanol; phenols or naphthols such as phenol, p-cresol, m-cresol, o-cresol, α-naphthol, and β-naphthol; monoethers of glycols such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, 1,3-propanediol monomethyl ether, 1,3-propanediol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, dipropylene glycol monomethyl ether, and dipropylene glycol monoethyl ether; and alcohols having a radical polymerizable group that do not fall under alcohol AG1 and alcohol AG2.

(Production of dicarboxylic acid)
A dicarboxylic acid can be obtained by reacting the above-described tetracarboxylic dianhydride with an alcohol. The alcohol reacts with the carboxylic anhydride group to generate a carboxy group and an ester group.

A dicarboxylic acid can be obtained by reacting the above-mentioned tetracarboxylic dianhydride with an alcohol represented by R ^a21 -OH.
R ^a21 is a residue obtained by removing a hydroxyl group from the above-mentioned alcohols.
Such a dicarboxylic acid has two pairs of a carboxy group and a group represented by --CO--O--R ^a21 , which are located on adjacent carbon atoms in the dicarboxylic acid.

The above dicarboxylic acid having two pairs of a carboxy group and a group represented by -CO-O-R ^a21 may have isomers in which the position of the carboxy group and the position of the group represented by -CO-O-R ^a21 are different. As the above dicarboxylic acid, one of such isomers may be used alone, or two or more of them may be used in combination.
In the specification and claims of the present application, it is permitted that the polyimide resin precursor contains a plurality of types of constitutional units derived from a plurality of isomers of a dicarboxylic acid.

As an example, for a dicarboxylic acid corresponding to pyromellitic dianhydride, there exist isomers of a compound represented by the following formula (a4-a1) and a compound represented by the following formula (a4-a2). Also, for a dicarboxylic acid corresponding to 1,4-bis(3,4-dicarboxyphenoxy)benzene dianhydride, there exist isomers of a compound represented by the following formula (a4-b1), a compound represented by the following formula (a4-b2), and a compound represented by the following formula (a4-b3).
In the following formulae (a4-a1), (a4-a2), and (a4-b1) to (a4-b3), R ^a21 is as defined above.

Examples of dicarboxylic acids corresponding to the tetracarboxylic dianhydrides represented by the above formulae (a3-2) to (a3-4) include compounds represented by the following formulae (a4-2a) to (a4-2c), (a4-3a) to (a4-3c), and (a4-4a) to (a4-4c). In the formulae (a4-2a) to (a4-2c), (a4-3a) to (a4-3c), and (a4-4a) to (a4-4c), R ^a01 to R ^a05 are the same as those in the formulae (a3-2) to (a3-4). In the formulae (a4-2a) to (a4-2c), (a4-3a) to (a4-3c), and (a4-4a) to (a4-4c), R ^a21 is as described above.

Examples of dicarboxylic acids corresponding to the tetracarboxylic dianhydrides represented by the above formulas (a3-5) to (a3-7) include compounds represented by the following formulas (a4-5a) to (a4-5c), (a4-6a) to (a4-6c), (a4-7a), and (a4-7b). In formulas (a4-5a) to (a4-5c), (a4-6a) to (a4-6c), (a4-7a), and (a4-7b), R ^a01 to R ^a03 , R ^a06 , m1, and m2 are the same as those in formulas (a3-5) to (a3-7). In formulae (a4-5a) to (a4-5c), (a4-6a) to (a4-6c), (a4-7a), and (a4-7b), R ^a21 is as defined above.

The reaction between the tetracarboxylic dianhydride and the alcohols is usually carried out in an organic solvent. The organic solvent used in the reaction between the tetracarboxylic dianhydride and the alcohols is not particularly limited as long as it can dissolve the tetracarboxylic dianhydride and the alcohols and does not react with the tetracarboxylic dianhydride and the alcohols. The organic solvent can be used alone or in a mixture of two or more kinds.

Examples of organic solvents used in the reaction of tetracarboxylic dianhydride with alcohols include nitrogen-containing polar solvents such as N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, N,N-dimethylacetamide, N,N-dimethylpropionamide, N,N-dimethylisobutyramide, N,N-diethylacetamide, N,N-dimethylformamide, N,N-diethylformamide, N,N-dimethylisobutyric acid amide, methoxy-N,N-dimethylpropionamide, butoxy-N,N-dimethylpropionamide, N-methylcaprolactam, N,N'-dimethylpropyleneurea, N,N,N',N'-tetramethylurea, and pyridine; dimethylsulfoxide; sulfolane; γ-butyrolactone, γ-valerolactone, δ-valerolactone, esters such as methyl acetate, ethyl acetate, butyl acetate, and diethyl oxalate; carbonates such as ethylene carbonate and propylene carbonate; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; acetonitrile; ethers such as ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, dioxane, and tetrahydrofuran; halogenated hydrocarbons such as dichloromethane, 1,2-dichloroethane, 1,4-dichlorobutane, chlorobenzene, and o-dichlorobenzene; hexane, heptane, benzene, toluene, and xylene.
These organic solvents may be used alone or in combination of two or more.

Among these organic solvents, nitrogen-containing polar solvents such as N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-diethylacetamide, N,N-dimethylformamide, N,N-diethylformamide, N-methylcaprolactam, and N,N,N',N'-tetramethylurea are preferred.

The temperature at which the tetracarboxylic dianhydride is reacted with the alcohol is not particularly limited as long as the reaction proceeds well. Typically, the reaction temperature between the tetracarboxylic dianhydride and the alcohol is preferably from -5°C to 120°C, more preferably from 0°C to 80°C, and particularly preferably from 0°C to 50°C. The time for reacting the tetracarboxylic dianhydride with the alcohol varies depending on the reaction temperature, but typically, it is preferably from 30 minutes to 20 hours, more preferably from 1 hour to 8 hours, and particularly preferably from 2 hours to 6 hours.

A small amount of a polymerization inhibitor may be used to prevent crosslinking between ethylenically unsaturated double bonds during the reaction between the tetracarboxylic dianhydride and the alcohol. Examples of polymerization inhibitors include phenols such as hydroquinone, 4-methoxyphenol, tert-butylpyrocatechol, and bis-tert-butylhydroxytoluene, and phenothiazine. The amount of polymerization inhibitor used is preferably, for example, 0.01 mol % or more and 5 mol % or less based on the number of moles of the ethylenically unsaturated double bonds.

The reaction between the tetracarboxylic dianhydride and the alcohol may be carried out in the presence of an organic base such as pyridine, triethylamine, diisopropylethylamine, 4-dimethylaminopyridine, or 1,4-azabicyclo[2.2.2]octane. These bases may be used alone or in combination of two or more.

The amount of alcohol used is preferably 1.8 moles or more and 2.2 moles or less, and more preferably 2 moles or more and 2.1 moles or less, per mole of tetracarboxylic dianhydride.

In the production of dicarboxylic acids, depending on the production conditions, only one of the dicarboxylic anhydride groups may react with an alcohol to produce a monocarboxylic acid compound having a dicarboxylic anhydride group, or a part of the tetracarboxylic dianhydride may react with moisture in the reaction system to produce a tetracarboxylic acid compound or a tricarboxylic acid compound.
As long as the desired effects are not impaired, a dicarboxylic acid containing at least one selected from the above-mentioned monocarboxylic acid compounds, tricarboxylic acid compounds, and tetracarboxylic acid compounds can be used in the production of a polyimide resin precursor.
When the dicarboxylic acid contains at least one selected from the above monocarboxylic acid compounds, tricarboxylic acid compounds, and tetracarboxylic acid compounds as an impurity, the content of the at least one selected from the above monocarboxylic acid compounds, tricarboxylic acid compounds, and tetracarboxylic acid compounds as an impurity in the dicarboxylic acid is preferably 30 mass% or less, more preferably 10 mass% or less, still more preferably 5 mass% or less, and particularly preferably 1 mass% or less, based on the mass of the dicarboxylic acid including the mass of the impurities.

[Method for producing polyimide resin precursor]
The method for producing the polyimide resin precursor is not particularly limited as long as it is a method capable of polycondensing the above-mentioned diamine compound, triamine compound, and/or tetraamine compound with a dicarboxylic acid until the weight average molecular weight of the polyimide resin precursor increases to a desired level.
A preferred method is to condense the above-mentioned diamine compound, triamine compound, and/or tetraamine compound with a dicarboxylic acid in the presence of a condensing agent. If necessary, it is also preferable to use a condensation auxiliary together with the condensing agent.
The condensing agent and the condensation assistant are not particularly limited as long as they are compounds that have been conventionally used for condensation of a dicarboxylic acid and a diamine compound.

Preferred condensation agents include at least one selected from the group consisting of dicyclohexylcarbodiimide, diisopropylcarbodiimide, 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide, diisopropylcarbodiimide, 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride, 1-cyclohexyl-3-(2-morpholinoethyl)-carbodiimide methotoluenesulfonate, 1,3-bis(2,2-dimethyl-1,3-dioxolan-4-ylmethyl)carbodiimide, polymer-supported 1-benzyl-3-cyclohexylcarbodiimide, and polymer-supported 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide.

The amount of the condensing agent used is not particularly limited as long as a polyimide resin precursor having a desired molecular weight can be obtained. The amount of the condensing agent used is typically preferably 1 mol or more and 5 mol or less, more preferably 2 mol or more and 4 mol or less, and even more preferably 2 mol or more and 3 mol or less, relative to 1 mol of the dicarboxylic acid.
Furthermore, the ratio of the amount of dicarboxylic acid to the amount of diamine compound, triamine compound, and tetraamine compound when producing a polyimide resin precursor is not particularly limited as long as a polyimide resin precursor having a desired molecular weight can be produced.
When the polyimide resin precursor has an amino group terminal, the raw material ratio represented by (the number of moles of carboxy groups in the dicarboxylic acid)/(the number of moles of amino groups in the diamine compound, triamine compound, and tetraamine compound) is preferably adjusted within the range of 0.5/1 to 0.95/1, more preferably 0.55/1 to 0.80/1. The smaller the value of (the number of moles of carboxy groups in the dicarboxylic acid)/(the number of moles of amino groups in the diamine compound, triamine compound, and tetraamine compound), the more difficult it is for the molecular chain of the polyimide resin precursor to elongate, and the easier it is to obtain a polyimide resin precursor with a low molecular weight.
When the polyimide resin precursor has a terminal carboxy group, the raw material ratio represented by (the number of moles of amino groups possessed by the diamine compound, triamine compound, and tetraamine compound)/(the number of moles of carboxy groups possessed by the dicarboxylic acid) is preferably adjusted within the range of 0.5/1 to 0.95/1, more preferably 0.55/1 to 0.80/1. The smaller the value of (the number of moles of amino groups possessed by the diamine compound, triamine compound, and tetraamine compound)/(the number of moles of carboxy groups possessed by the dicarboxylic acid), the more difficult it is for the molecular chain of the polyimide resin precursor to elongate, and the more likely it is that a polyimide resin precursor with a low molecular weight is obtained.

Specifically, a dicarboxylic acid, a diamine compound, a triamine compound, and/or a tetraamine compound are reacted in an organic solvent in the presence of the above-mentioned condensing agent at, for example, a temperature of from -20°C to 150°C, preferably from 0°C to 50°C, for 30 minutes to 24 hours, preferably from 1 hour to 4 hours.

As the solvent used in carrying out the polycondensation, the above-mentioned solvents which can be used in the reaction between the tetracarboxylic dianhydride and the alcohol can be used.
The amount of the solvent used is preferably 50 parts by mass or more and 10,000 parts by mass or less, more preferably 100 parts by mass or more and 2,000 parts by mass or less, and even more preferably 150 parts by mass or more and 1,000 parts by mass or less, relative to 100 parts by mass of the total of the mass of the dicarboxylic acid, the mass of the diamine compound, and the mass of the triamine compound and/or the tetraamine compound.

The amounts of dicarboxylic acid, diamine compound, triamine compound, and/or tetraamine compound used when producing a polyimide resin precursor are not particularly limited, but it is preferable to use 0.8 to 1.2 moles of diamine compound, triamine compound, and/or tetraamine compound in total per mole of dicarboxylic acid, more preferably 0.9 to 1.1 moles, and particularly preferably 0.95 to 1.05 moles.

From the viewpoint of facilitating the production of a polyimide resin precursor that gives a polyimide resin that exhibits excellent dielectric properties in the high frequency band, the polyimide resin precursor preferably contains a divalent aliphatic hydrocarbon group having from 2 to 50 carbon atoms, more preferably from 3 to 40 carbon atoms.
The position of such a divalent aliphatic hydrocarbon group in the molecular chain of the polyimide resin precursor is not particularly limited.
Examples of the monomer that imparts a divalent aliphatic hydrocarbon group having 2 to 50 carbon atoms in the molecular chain include the above-mentioned dimer diamine compound (A-4) and the above-mentioned α,ω-bis(3,4-dicarboxyphenylcarbonyloxy)alkane dianhydride.

（式（ａ１）、及び（ａ２）中、ｎは、１以上の整数である。） From the viewpoint of facilitating the production of a polyimide resin precursor that gives a polyimide resin that exhibits excellent dielectric properties in the high frequency band, it is preferred that the polyimide resin composition contains a structural unit derived from a carboxylic acid derived from a tetracarboxylic dianhydride represented by the following formula (a1) and/or a structural unit derived from a diamine compound represented by the following formula (a2): The tetracarboxylic dianhydride represented by formula (a1) and the diamine compound represented by formula (a2) are as described above.

(In formulas (a1) and (a2), n is an integer of 1 or more.)

The weight average molecular weight of the polyimide resin precursor may be appropriately set according to its application. The weight average molecular weight of the polyimide resin precursor may be measured as a weight average molecular weight in terms of polystyrene by GPC (gel permeation chromatography). The weight average molecular weight of the polyimide resin precursor is, for example, 5000 or more in terms of the above polystyrene, preferably 15000 or more, and more preferably 250,000,000 or more, from the viewpoint of obtaining a resin film with good mechanical properties. On the other hand, the weight average molecular weight of the obtained polyimide resin precursor is, for example, 100,000 or less in terms of the above polystyrene, preferably 80,000 or less, and more preferably 50,000 or less, from the viewpoint of solubility in organic solvents.
The weight average molecular weight can be set to the above value by adjusting the amounts of the dicarboxylic acid, diamine compound, triamine compound, and/or tetraamine compound mixed, and reaction conditions such as the solvent and reaction temperature.

The main chain terminals of the polyimide resin precursor may be capped with a terminal capping agent for the purpose of improving the storage stability of the photosensitive resin composition containing the polyimide resin precursor, further improving the mechanical properties of the polyimide resin film, improving the reproducibility of polymerization when producing the polyimide resin precursor, etc. Examples of the terminal capping agent include monoamines, acid anhydrides, monocarboxylic acids, monoacid halides, and monoactive ester compounds.
The monoamine used for terminal blocking may be a known compound. Examples of the monoamine include aromatic monoamines such as aniline, 2-ethynylaniline, 3-ethynylaniline, 4-ethynylaniline, 3-hydroxyaniline, 4-hydroxyaniline, 3-aminothiophenol, and 4-aminothiophenol, aliphatic monoamines having 3 to 20 carbon atoms and which may have a branched structure, such as hexylamine and octylamine, monoamines having an alicyclic structure, such as cyclohexylamine, and aminosilanes, such as trimethoxyaminopropylsilane and triethoxyaminopropylsilane.
Among the acid anhydrides, monoacid halides, and monoactive ester compounds used as end-capping agents, acid anhydrides are preferred. As the acid anhydride, known acid anhydrides and derivatives thereof can be used. Examples include phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, xo-3,6-epoxy-1,2,3,6-tetrahydrophthalic anhydride, succinic anhydride, maleic anhydride, nadic anhydride, and derivatives thereof.
From the viewpoint of excellent mechanical properties of the formed polyimide resin film, the introduction rate of the terminal blocking agent in the polyimide resin precursor is preferably 40 mol % or less, more preferably 20 mol % or less, and even more preferably 10 mol % or less, based on the number of moles of all monomers.

The polyimide resin precursor produced in the above manner is used in the production of polyimide resins in the form of a solution or suspension, or after being separated and recovered from the reaction liquid by a well-known method.

<Polyimide resin>
The polyimide resin precursor is imidized to obtain a polyimide resin, which exhibits a low dielectric tangent in the high frequency band and excellent chemical resistance.
The method for imidizing the polyimide resin precursor is not particularly limited. The imidization may be performed by heating or by using an imidizing agent.

When imidization is carried out by heating, heating may be performed on a solution or suspension of the polyimide resin precursor, or on a solid polyimide resin precursor.
When the solution of the polyimide resin precursor is heated to perform imidization, it is preferable to carry out the heating while removing water generated as a by-product during the imidization.
The heating conditions for imidization are not particularly limited as long as the polyimide resin precursor is not decomposed and the imidization proceeds satisfactorily.
When a solution of a polyimide resin precursor is heated, typically, the heating temperature is preferably 80° C. or more and 220° C. or less, more preferably 100° C. or more and 200° C. or less, and particularly preferably 120° C. or more and 180° C. or less. When a solid polyimide resin precursor is heated, typically, the heating temperature is preferably 180° C. or more and 400° C. or less, and more preferably 200° C. or more and 350° C. or less.
The heating time varies depending on the heating temperature, but is typically preferably from 1 hour to 24 hours, more preferably from 2 hours to 12 hours.

When the polyimide resin precursor is imidized with an imidizing agent, the imidization is usually carried out by adding the imidizing agent to a solution or suspension of the polyimide resin precursor. As an organic solvent that can be used when imidizing with an imidizing agent, for example, the same organic solvent that can be used for preparing the polyimide resin precursor can be used.
When imidization is performed using an imidizing agent, the concentration of the polyimide resin precursor in the solution or suspension of the polyimide resin precursor is not particularly limited. Typically, the concentration of the polyimide resin precursor in the solution or suspension of the polyimide resin precursor is preferably 5% by mass or more and 50% by mass or less, more preferably 10% by mass or more and 30% by mass or less.
The amount of the imidizing agent used is not particularly limited, and is selected depending on the type of the imidizing agent so that the polyimide resin precursor is imidized to a desired degree.
The reaction temperature when imidization is performed using an imidizing agent is not particularly limited, and is preferably, for example, 0° C. or higher and 100° C. or lower, and more preferably 5° C. or higher and 50° C. or lower.
The time for the imidization reaction when an imidizing agent is used is not particularly limited. The imidization reaction is preferably carried out for about 30 minutes to 24 hours, more preferably for 1 hour to 12 hours, and even more preferably for 2 hours to 6 hours, depending on the type of the imidizing agent.

Imidizing agents include dehydrating agents such as acetic anhydride, propionic anhydride, benzoic anhydride, trifluoroacetic anhydride, acetyl chloride, tosyl chloride, mesyl chloride, ethyl chloroformate, triphenylphosphine and dibenzimidazolyl disulfide, dicyclohexylcarbodiimide, carbodiimidazole, 2-ethoxy-1-ethoxycarbonyl-1,2-dihydroquinoline, and oxalic acid N,N'-disuccinimidyl ester, and basic compounds such as pyridine, picoline, 2,6-lutidine, collidine, triethylamine, N-methylmorpholine, 4-N,N'-dimethylaminopyridine, isoquinoline, triethylamine, 1,4-diazabicyclo[2.2.2]octane, and 1,8-diazabicyclo[5.4.0]-7-undecene.

<Photosensitive resin composition>
The photosensitive resin composition contains a polymerizable resin (A), a photoradical polymerization initiator (C), and a solvent (S). The polymerizable resin (A) is the above-mentioned polyimide resin precursor.
The photosensitive resin composition can be used to form a patterned polyimide resin film by the method described below. The polyimide resin formed using the photosensitive resin composition exhibits a low dielectric tangent in the high frequency band and has excellent chemical resistance.

The photosensitive resin composition may contain a monomer compound (B) having a radical polymerizable group.

Below, we will explain the essential and optional components that the photosensitive resin composition contains.

<Polymerizable resin (A)>
The polymerizable resin (A) is the above-mentioned polyimide resin precursor.

<Monomer Compound (B)>
The photosensitive resin composition may contain, as the monomer compound (B), a monomer compound having an ethylenically unsaturated double bond as a radical polymerizable group. Such a monomer compound (B) may be a monofunctional monomer compound or a polyfunctional monomer compound, and is preferably a polyfunctional monomer compound.

Examples of monofunctional monomer compounds include (meth)acrylamide, methylol (meth)acrylamide, methoxymethyl (meth)acrylamide, ethoxymethyl (meth)acrylamide, propoxymethyl (meth)acrylamide, butoxymethoxymethyl (meth)acrylamide, N-methylol (meth)acrylamide, N-hydroxymethyl (meth)acrylamide, (meth)acrylic acid, fumaric acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, crotonic acid, 2-acrylamido-2-methylpropanesulfonic acid, tert-butylacrylamidosulfonic acid, methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, Examples of the monomers include 2-ethylhexyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 2-phenoxy-2-hydroxypropyl (meth)acrylate, 2-(meth)acryloyloxy-2-hydroxypropyl phthalate, glycerin mono(meth)acrylate, tetrahydrofurfuryl (meth)acrylate, dimethylamino (meth)acrylate, glycidyl (meth)acrylate, 2,2,2-trifluoroethyl (meth)acrylate, 2,2,3,3-tetrafluoropropyl (meth)acrylate, and half (meth)acrylate of phthalic acid derivatives. These monofunctional photopolymerizable monomers can be used alone or in combination of two or more.

Polyfunctional monomer compounds include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, 1,3-butylene glycol di(meth)acrylate, and 1,4-butylene glycol di(meth)acrylate. , neopentyl glycol di(meth)acrylate, 1,6-hexane glycol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, 1,10-decanediol di(meth)acrylate, dimethyloltricyclodecane di(meth)acrylate, trimethylolpropane di(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimethylolethane tri(meth)acrylate, trimethylolpropane tri(3-(meth)acryloyloxypropane tri(meth)acrylate of glycerin ethylene oxide (EO) adduct, tri(meth)acrylate of glycerin propylene oxide (PO) adduct, tri(meth)acrylate of glycerin EO/PO co-adduct, tri(meth)acrylate of trimethylolpropane ethylene EO adduct, tri(meth)acrylate of trimethylolpropane PO adduct, tri(meth)acrylate of trimethylolpropane EO/PO co-adduct, tri(meth)acrylate of trimethylolpropane ethylene EO adduct, tri(meth)acrylate of trimethylolpropane PO adduct, tri(meth)acrylate of trimethylolpropane EO/PO co-adduct, tri(meth)acrylate of trimethylolethane EO adduct, tri(meth)acrylate of trimethylolethane PO adduct, tri(meth)acrylate of trimethylolethane EO/PO co-adduct, pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, tripentaerythritol hepta(meth)acrylate, tri(meth)acrylate, tripentaerythritol octa(meth)acrylate, tetrapentaerythritol nona(meth)acrylate, tetrapentaerythritol deca(meth)acrylate, pentapentaerythritol undeca(meth)acrylate, pentapentaerythritol dodeca(meth)acrylate, dimethylol-tricyclodecane di(meth)acrylate, 1,3-adamantanediol di(meth)acrylate, 1,3,5-adamantanetriol di(meth)acrylate acrylate, 1,3,5-adamantanetriol tri(meth)acrylate, 1,4-cyclohexanedimethanol di(meth)acrylate, 2,2-bis(4-(meth)acryloxydiethoxyphenyl)propane, 2,2-bis(4-(meth)acryloxypolyethoxyphenyl)propane, 2-hydroxy-3-(meth)acryloyloxypropyl(meth)acrylate, 9,9-bis[4-(2-(meth)acryloyloxyethoxy)phenyl]fluorene, 9,9-bis[4-(2- (meth)acryloyloxypropoxy)-3-methylphenyl]fluorene, 9,9-bis[4-(2-(meth)acryloyloxyethoxy)-3,5-dimethylphenyl]fluorene, ethylene glycol diglycidyl ether di(meth)acrylate, diethylene glycol diglycidyl ether di(meth)acrylate, phthalic acid diglycidyl ester di(meth)acrylate, glycerin triacrylate, glycerin polyglycidyl ether poly(meth)acrylate, urethane ( Examples of the polyfunctional monomer compounds include polyfunctional monomer compounds such as tri(meth)acrylate (i.e., tolylene diisocyanate), a reaction product of trimethylhexamethylene diisocyanate, hexamethylene diisocyanate, and 2-hydroxyethyl (meth)acrylate, tri((meth)acryloyloxyethyl)isocyanurate, methylene bis(meth)acrylamide, (meth)acrylamide methylene ether, and a condensation product of a polyhydric alcohol and N-methylol (meth)acrylamide, as well as triacrylformal. These polyfunctional monomer compounds can be used alone or in combination of two or more.

Also, urethane (meth)acrylates described in JP-B-48-41708, JP-B-50-6034, and JP-A-51-37193; polyester (meth)acrylates described in JP-A-48-64183, JP-B-49-43191, and JP-A-52-30490; epoxy (meth)acrylates which are reaction products of epoxy resins and (meth)acrylic acid; compounds described in paragraphs [0254] to [0257] of JP-A-2008-292970; epoxy groups such as glycidyl (meth)acrylate and ethylenically unsaturated alkyl groups in polyfunctional carboxylic acids; Polyfunctional (meth)acrylates obtained by reacting a compound having a group; compounds and cardo resins having a fluorene ring and two or more groups having an ethylenically unsaturated bond, as described in JP-A-2010-160418, JP-A-2010-129825, and Japanese Patent No. 4364216, etc.; unsaturated compounds described in JP-B-43946, JP-B-1-40337, and JP-B-1-40336; vinylphosphonic acid compounds described in JP-A-2-25493; compounds containing a perfluoroalkyl group described in JP-A-61-22048; and photopolymerizable monomers and oligomers described in the Journal of the Japan Adhesion Association, vol. 20, No. 7, pp. 300-308 (1984) are also preferably used.

Among these monomer compounds (B) having an ethylenically unsaturated double bond, polyfunctional monomer compounds having three or more functionalities are preferred, polyfunctional monomer compounds having four or more functionalities are more preferred, and polyfunctional monomer compounds having five or more functionalities are even more preferred, because they tend to increase the adhesion of the polyimide resin film to the substrate and the strength of the polyimide resin film.

The content of the monomer compound (B) in the photosensitive resin composition is not particularly limited as long as it does not impair the object of the present invention. The content of the monomer compound (B) in the photosensitive resin composition is preferably 0.1 parts by mass or more and 50 parts by mass or less, more preferably 0.5 parts by mass or more and 40 parts by mass or less, and particularly preferably 1 part by mass or more and 25 parts by mass or less, when the mass of the photosensitive resin composition excluding the mass of the solvent (S) described below is taken as 100 parts by mass.

<Photoradical Polymerization Initiator (C)>
The photoradical polymerization initiator (C) is not particularly limited, and any conventionally known photopolymerization initiator can be used.

Specific examples of the photoradical polymerization initiator (C) include 1-hydroxycyclohexyl phenyl ketone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-[4-(2-hydroxyethoxy)phenyl]-2-hydroxy-2-methyl-1-propan-1-one, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-1-one, 2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl -propionyl)-benzyl]phenyl}-2-methyl-propan-1-one, 1-(4-dodecylphenyl)-2-hydroxy-2-methylpropan-1-one, 2,2-dimethoxy-1,2-diphenylethan-1-one, bis(4-dimethylaminophenyl)ketone, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenanthren-1-one, 1-phenyl-1,2-propanedione-2-(O-ethoxycarbonyl)oxime, 1-phenyl-1,2-propanedione-2-(O-methoxycarbonyl)oxime, 1-phenyl-2-(benzoyloximiimino)-1-propanone, 1-phenyl-1,2-butadione-2-(o-methylphenyl)-1-propanone, 2-(4-methylbenzyl)-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, 1-phenyl-1,2-propanedione-2-(O-ethoxycarbonyl)oxime, 1-phenyl-1,2-propanedione-2-(O-methoxycarbonyl)oxime, 1-phenyl-2-(benzoyloximiimino)-1-propanone, 1-phenyl-1,2-butadione-2-(o-methylphenyl)-1-propanone, -methoxycarbonyl)oxime, 1,3-diphenylpropanetrione-2-(o-ethoxycarbonyl)oxime, ethanone, 1-phenyl-1,2-propanedione-2-(o-benzoyl)oxime, 1-phenyl-3-ethoxypropanetrione-2-(o-benzoyl)oxime, O-acetyl-1-[6-(2-methylbenzoyl)-9-ethyl-9H-carbazol-3-yl]ethanone oxime (Irgacure OXE02, manufactured by BASF Japan Co., Ltd.), (9-ethyl-6-nitro-9H-carbazol-3-yl)[4-(2-methoxy-1-methylethoxy)-2-methylphenyl]methanone O-acetyloxime, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-,1-(O-acetyloxime), 2-(benzoyloxyimino)-1-[4-(phenylthio)phenyl]-1-octanone (Irgacure OXE01, manufactured by BASF Japan), NCI-831 (manufactured by ADEKA), NCI-930 (manufactured by ADEKA), OXE-03 (manufactured by BASF Japan), OXE-04 (manufactured by BASF Japan), 2,4,6-trimethylbenzoyldiphenylphosphine oxide, bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, bis(2,6-dimethoxybenzoyl)-2,4,4-trimethylpentylphosphine oxide, 4-benzoyl-4'-methyldimethylsulfide, 4-dimethylaminobenzoic acid, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, butyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid 2-Isoamyl anthraquinone, ethyl 4-diethylbenzoate, benzyl β-methoxyethyl acetal, benzyl dimethyl ketal, 1-phenyl-1,2-propanedione-2-(O-ethoxycarbonyl)oxime, methyl o-benzoylbenzoate, methyl benzoylformate, ethyl benzoylformate, 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-dimethylthioxanthone, 1-chloro-4-propoxythioxanthone, thioxanthene, 2-chlorothioxanthene, 2,4-diethylthioxanthene, 2-methylthioxanthene, 2-isopropylthioxanthene, anthraquinone, 2-ethylanthraquinone, 2-tert-butylanthraquinone, octamethylanthraquinone, 2-aminoanthraquinone Quinones, β-chloroanthraquinone, 1,2-benzanthraquinone, 2,3-diphenylanthraquinone, anthrone, benzanthrone, dibenzsuberone, methyleneanthrone, azobisisobutyronitrile, benzoyl peroxide, cumene hydroperoxide, 2-mercaptobenzimidazole, 2-mercaptobenzoxazole, 2-mercaptobenzothiazole, 2-(o-chlorophenyl)-4,5-di(m-methoxyphenyl)-imidazolyl dimer, benzophenone, 2-chlorobenzophenone, p,p'-bisdimethylaminobenzophenone, 4,4'-bisdiethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3-dimethyl-4-methoxybenzophenone, 4-hydroxybenzophenone, Benzophenone, 4-phenylbenzophenone, fluorenone, benzil, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin-n-butyl ether, benzoin isobutyl ether, acetophenone, 2,2-diethoxyacetophenone, p-dimethylacetophenone, p-dimethylaminopropiophenone, 2-hydroxy-2-methylpropiophenone, dichloroacetophenone, trichloroacetophenone, p-tert-butylacetophenone, 2-phenylacetophenone, p-dimethylaminoacetophenone, p-tert-butyltrichloroacetophenone, p-tert-butyldichloroacetophenone, α,α-dichloro-4-phenoxy Acetophenone, thioxanthone, 2-methylthioxanthone, 2-isopropylthioxanthone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2-chlorothioxanthone, 2,4-dichlorothioxanthone, 2-hydroxy-3-(3,4-dimethyl-9-oxo-9H-thioxanthen-2-yloxy)-N,N,N-trimethyl-1-propanaminium chloride, 4-azidobenzalacetophenone, 2,6-bis(p-azidobenzylidene)cyclohexane, 2,6-bis(p-azidobenzylidene)-4-methylcyclohexanone, dibenzosuberone, pentyl-4-dimethylaminobenzoate, 9-phenylacridine, 1,7-bis-(9-acridinyl)heptane, 1,5-bis -(9-acridinyl)pentane, 1,3-bis-(9-acridinyl)propane, p-methoxytriazine, 2,4,6-tris(trichloromethyl)-s-triazine, 2-methyl-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(5-methylfuran-2-yl)ethenyl]-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(furan-2-yl)ethenyl]-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(4-diethylamino-2-methylphenyl)ethenyl]-4,6-bis(trichloromethyl)-s-triazine, 2-[2-(3,4-dimethoxyphenyl)ethenyl]-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxyphenyl )-4,6-bis(trichloromethyl)-s-triazine, 2-(4-ethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-n-butoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2,4-bis-trichloromethyl-6-(3-bromo-4-methoxy)phenyl-s-triazine, 2,4-bis-trichloromethyl-6-(2-bromo-4-methoxy)phenyl-s-triazine, 2,4-bis-trichloromethyl-6-(3-bromo-4-methoxy)styrylphenyl-s-triazine, 2,4-bis-trichloromethyl-6-(2-bromo-4-methoxy)styrylphenyl-s-triazine, 4-benzoyl-4'-methyldiphenyl ketone, dibenzyl ketone t, 4-benzoyl-4'-methyl-diphenyl sulfide, alkylated benzophenone, 3,3',4,4'-tetra(t-butylperoxycarbonyl)benzophenone, 4-benzoyl-N,N-dimethyl-N-[2-(1-oxo-2-propenyloxy)ethyl]benzenemethanaminium bromide, (4-benzoylbenzyl)trimethylammonium chloride, 2-hydroxy-3-(4-benzoylphenoxy)-N,N,N-trimethyl-1-propeneaminium chloride monohydrate, naphthalenesulfonyl chloride, quinolinesulfonyl chloride, N-phenylthioacridone, benzthiazole disulfide, triphenylphosphine, carbon tetrabromide, tribromophenyl sulfone, etc. These photoradical polymerization initiators (C) can be used alone or in combination of two or more.
From the viewpoint of good sensitivity, the photoradical polymerization initiator (C) is preferably an oxime ester-based photopolymerization initiator.

Among the photoradical polymerization initiators (C), oxime ester compounds are preferred in terms of the sensitivity of the photosensitive resin composition.
The oxime ester compound is preferably a compound having a partial structure represented by the following formula (c1).

（式（ｃ１）中、
ｎ１は、０、又は１であり、
Ｒ^ｃ２は、一価の有機基であり、
Ｒ^ｃ３は、水素原子、置換基を有してもよい炭素原子数１以上２０以下の脂肪族炭化水素基、又は置換基を有してもよいアリール基であり、
＊は結合手である。）

(In formula (c1),
n1 is 0 or 1,
R ^c2 is a monovalent organic group;
R ^c3 is a hydrogen atom, an aliphatic hydrocarbon group having from 1 to 20 carbon atoms which may have a substituent, or an aryl group which may have a substituent,
* is a bond.)

The content of the photoradical polymerization initiator (C) in the photosensitive resin composition is not particularly limited as long as the photosensitive resin composition has the desired photolithography properties. The content of the photoradical polymerization initiator (C) in the photosensitive resin composition is typically 0.01 to 20 parts by mass, preferably 0.1 to 15 parts by mass, more preferably 1 to 10 parts by mass, per 100 parts by mass of the total of the polymerizable resin (A) and the monomer compound (B).

<Thiol compound (D)>
The photosensitive resin composition may contain a thiol compound (D), which makes it easy to form a polyimide resin having excellent elongation and tensile strength using the photosensitive resin composition.
The number of mercapto groups in the thiol compound (D) is not particularly limited. The number of mercapto groups in the thiol compound (D) is preferably 2 or more, more preferably 2 or more and 10 or less, and even more preferably 2 or more and 6 or less.

Specific examples of compounds having two or more mercapto groups include 1,2-benzenedithiol, 1,3-benzenedithiol, 1,4-benzenedithiol, 1,2-bis(mercaptomethyl)benzene, 1,3-bis(mercaptomethyl)benzene, 1,4-bis(mercaptomethyl)benzene, 1,2-bis(mercaptoethyl)benzene, 1,3-bis(mercaptoethyl)benzene, 1,4-bis(mercaptoethyl)benzene, 1,2,3-trimercaptobenzene, 1,2,4-trimercaptobenzene, 1,3,5-trimercaptobenzene, 1,2,3-tris(mercaptomethyl)benzene, 1,2,4-tris(mercaptomethyl)benzene, 1,3,5-tris(mercaptomethyl)benzene, 1,2,3-tris(mercaptoethyl)benzene, 1,2,4-tris(mercaptoethyl)benzene, 1,3,5-tris(mercaptomethyl)benzene, bis(mercaptoethyl)benzene, 2,5-toluenedithiol, 3,4-toluenedithiol, 1,3-di(p-methoxyphenyl)propane-2,2-dithiol, 1,3-diphenylpropane-2,2-dithiol, phenylmethane-1,1-dithiol, 2,4-di(p-mercaptophenyl)pentane, 1,2-bis(mercaptoethylthio)benzene, 1,3-bis(mercaptoethylthio)benzene, 1,4-bis(mercaptoethylthio)benzene, 1,2,3-tris(mercaptomethylthio)benzene, 1,2,4-tris(mercaptomethylthio)benzene, 1,3,5-tris(mercaptomethylthio)benzene, 1,2,3-tris(mercaptoethylthio)benzene, 1,2,4-tris(mercaptoethylthio)benzene, and 1,3,5-tris(mercaptoethylthio)benzene.

As the thiol compound (D) having two or more mercapto groups, a mercaptoalkanoate of a polyol having two or more hydroxyl groups is preferred from the viewpoints of ease of availability or synthesis, and of dissolution stability in the curable composition.
The mercaptoalkanoate of a polyol having two or more hydroxyl groups may have a hydroxyl group, but preferably has no hydroxyl group.

The number of carbon atoms in the mercaptoalkanoic acid that gives the mercaptoalkanoate is not particularly limited, but is preferably 2 or more and 6 or less, and more preferably 3 or 4. Specific examples of mercaptoalkanoic acids that give the mercaptoalkanoate include thioglycolic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, 2-mercaptobutanoic acid, 3-mercaptobutanoic acid, 4-mercaptobutanoic acid, 2-mercaptopentanoic acid, 3-mercaptopentanoic acid, 4-mercaptopentanoic acid, 5-mercaptopentanoic acid, 2-mercaptohexanoic acid, 3-mercaptohexanoic acid, 4-mercaptohexanoic acid, and 5-mercaptohexanoic acid.
Of these, 2-mercaptopropionic acid and 3-mercaptobutanoic acid are preferred.

The polyols which provide the mercaptoalkanoates may contain aromatic groups.
Examples of polyols not containing an aromatic group include ethylene glycol, 1,3-propanediol, propylene glycol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, 1,7-heptanediol, 1,8-octanediol, 1,9-nonanediol, 1,10-decanediol, diethylene glycol, triethylene glycol, tetraethylene glycol, dipropylene glycol, tripropylene glycol, tetrapropylene glycol, 1,4-cyclohexanediol, 1,3-cyclohexanediol, 1,2-cyclohexanediol, 1,4-cyclohexanedimethanol, hydrogenated bisphenol A, glycerin, diglycerin, triglycerin, trimethylolethane, trimethylolpropane, pentaerythritol, dipentaerythritol, sorbitol, mannitol, sorbitan, sucrose, glucose, mannose, methyl glucoside, and tris(2-hydroxyethyl)isocyanuric acid.
Examples of aromatic polyols include benzenediols such as hydroquinone, resorcinol, and catechol; benzenetriols such as phloroglucinol, pyrogallol, and 1,2,4-benzenetriol; naphthalenediols such as 1,2-naphthalenediol, 1,3-naphthalenediol, 1,4-naphthalenediol, 1,5-naphthalenediol, 1,6-naphthalenediol, 1,7-naphthalenediol, 1,5-naphthalenediol, 2,3-naphthalenediol, 2,6-naphthalenediol, and 2,7-naphthalenediol; and 1,4,5-naphthalenetriol and 1,2,4-naphthalenetriol. naphthalene triols such as 1,3,8-naphthalene triol and 1,2,7-naphthalene triol; bisphenols such as bisphenol A, bisphenol AP, bisphenol AF, bisphenol B, bisphenol BP, bisphenol C, bisphenol E, bisphenol F, bisphenol S and bisphenol Z; tetrahydroxybiphenyls such as 3,3',4,4'-tetrahydroxybiphenyl and 3,3',5,5'-tetrahydroxybiphenyl;calixarenes; and novolak resins such as phenol novolak, cresol novolak and naphthol novolak.

Of the above polyols, ethylene glycol, 1,3-propanediol, propylene glycol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, diethylene glycol, dipropylene glycol, glycerin, diglycerin, trimethylolethane, trimethylolpropane, pentaerythritol, dipentaerythritol, and tris(2-hydroxyethyl)isocyanuric acid are preferred, and 1,4-butanediol, trimethylolethane, trimethylolpropane, pentaerythritol, and tris(2-hydroxyethyl)isocyanuric acid are more preferred.

The mercaptoalkanoates of the polyols described above include 1,4-butanediol di(2-mercaptopropionate), 1,4-butanediol di(3-mercaptobutanoate), trimethylolethane tri(2-mercaptopropionate), trimethylolethane tri(3-mercaptobutanoate), trimethylolpropane tri(2-mercaptopropionate), trimethylolpropane tri(3-mercaptobutanoate), pentaerythritol tetra(2-mercaptopropionate), pentaerythritol tetra(3-mercaptobutanoate). 1,4-butanediol di(3-mercaptobutanoate), trimethylolethane tri(3-mercaptobutanoate), trimethylolpropane tri(3-mercaptobutanoate), pentaerythritol tetra(3-mercaptobutanoate) and tris(2-hydroxyethyl)isocyanuric acid tri(3-mercaptobutanoate) are preferred, and 1,4-butanediol di(3-mercaptobutanoate), trimethylolethane tri(3-mercaptobutanoate), trimethylolpropane tri(3-mercaptobutanoate), pentaerythritol tetra(3-mercaptobutanoate) and tris(2-hydroxyethyl)isocyanuric acid tri(3-mercaptobutanoate) are more preferred.

The amount of the thiol compound (D) used is not particularly limited as long as it does not impair the object of the present invention. The amount of the thiol compound (D) used is preferably 0.1 parts by mass or more and 20 parts by mass or less, more preferably 0.5 parts by mass or more and 15 parts by mass or less, and even more preferably 1 part by mass or more and 12 parts by mass or less, relative to 100 parts by mass of the total of the mass of the polymerizable resin (A) and the mass of the monomer compound (B).

<Solvent (S)>
The photosensitive resin composition usually contains a solvent (S) for the purpose of adjusting the coating property, etc. The type of the solvent (S) is not particularly limited as long as the polymerizable resin (A) and other components are well dissolved in the solvent (S). An organic solvent is usually used as the solvent (S).

Specific examples of the solvent (S) that have good solubility for the polymerizable resin (A) include nitrogen-containing polar solvents such as N,N-dimethylformamide, N,N-dimethylacetamide, N,N-diethylformamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, hexamethylphosphoramide, 1,3-dimethyl-2-imidazolidinone, N,N-dimethylisobutyric acid amide, 3-methoxy-N,N-dimethylpropionamide, 3-butoxy-N,N-dimethylpropionamide, N,N-dimethylpropionamide, N,N-dimethylisobutyramide, N,N-dimethylethyleneurea, N,N-dimethylpropyleneurea, N,N,N',N'-tetramethylurea, N,N,N',N'-tetraethylurea, and N,N,N',N'-tetrabutylurea; acetone. ketones such as methyl ethyl ketone, methyl isobutyl ketone, 2-heptanone, 3-heptanone, diisobutyl ketone, cyclopentanone, cyclohexanone, and isophorone; γ-butyrolactone, γ-valerolactone, δ-valerolactone, γ-caprolactone, ε-caprolactone, α-methyl-γ-butyrolactone, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, n-propyl acetate, n-butyl acetate, isobutyl acetate, isopentyl acetate, n-pentyl formate, n-butyl propionate, isopropyl butyrate, ethyl butyrate, n-butyl butyrate, methyl methoxyacetate, ethyl methoxyacetate, n-butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionate, methyl 2-methoxypropionate, ethyl 3-ethoxypropionate, methyl 2-methoxypropionate, ethyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, methyl 2-methoxy-2-methylpropionate, methyl 2-ethoxy-2-methylpropionate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, 3-methyl-3-methoxybutyl acetate, methyl cellosolve acetate, ethyl cellosolve acetate, and other esters; diacetone alcohol; alcohols such as ethanol and 3-methyl-3-methoxybutanol; glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, diethylene glycol dimethyl ether; aromatic ethers such as anisole; cyclic ethers such as dioxane and tetrahydrofuran; cyclic esters such as ethylene carbonate and propylene carbonate; aromatic solvents such as anisole, toluene, and xylene; aliphatic hydrocarbons such as limonene; and sulfoxides such as dimethyl sulfoxide.

The amount of solvent (S) used is not particularly limited as long as a uniform liquid photosensitive resin composition can be prepared. The photosensitive resin composition may be in the form of a suspension or a solution, and is preferably a solution. Typically, the solvent (S) is used so that the solids concentration of the photosensitive resin composition is preferably 15% by mass or more and 50% by mass or less, more preferably 20% by mass or more and 45% by mass or less.

<Other ingredients>
The photosensitive resin composition may contain various additives other than the above-described components, if necessary. Examples of additives include colorants, dispersants, sensitizers, adhesion promoters, polymerization inhibitors, antioxidants, UV absorbers, aggregation inhibitors, defoamers, surfactants, imidization promoters, nitrogen-containing heterocyclic compounds as adhesion improvers, and silane coupling agents. The photosensitive resin composition may also contain various fillers or reinforcing materials, if necessary.

As the sensitizer, known compounds can be used. Examples of the sensitizer include bis(dimethylamino)benzophenone, bis(diethylamino)benzophenone, diethylthioxanthone, N-phenyldiethanolamine, N-phenylglycine, 7-diethylamino-3-benzoylcoumarin, 7-diethylamino-4-methylcoumarin, N-phenylmorpholine, and derivatives thereof.

As the polymerization inhibitor, known compounds can be used. Examples of the polymerization inhibitor include compounds having a phenolic hydroxyl group, nitroso compounds, N-oxide compounds, quinone compounds, N-oxyl compounds, and phenothiazine compounds. More specifically, the polymerization inhibitor is preferably Irganox 1010, Irganox 1035, Irganox 1098, Irganox 1135, Irganox 245, Irganox 259, Irganox 3114 (all manufactured by BASF Japan), 2,6-di-tert-butyl-p-cresol, and 4-methoxyphenol, and more preferably Irganox 1010, 2,6-di-tert-butyl-p-cresol, and 4-methoxyphenol.

When the photosensitive resin composition contains a photoradical polymerization initiator (C), in order to achieve both excellent developability of the photosensitive resin composition and a good antioxidant effect, the amount of the polymerization inhibitor used is preferably 0.005% by mass or more and 1% by mass or less, more preferably 0.01% by mass or more and 0.5% by mass or less, and even more preferably 0.03% by mass or more and 0.3% by mass or less, relative to the mass of the polymerizable resin (A).

The nitrogen-containing heterocyclic compound stabilizes the metal surface by coordinating with the metal surface, thereby improving the adhesion of the resin film formed using the photosensitive resin composition to the metal surface. Known compounds can be used as the nitrogen-containing heterocyclic compound. Examples of the nitrogen-containing heterocyclic compound include imidazole, pyrazole, indazole, carbazole, triazole, pyrazoline, pyrazolidine, tetrazole, pyridine, piperidine, pyrimidine, pyrazine, triazine, cyanuric acid, isocyanuric acid, and derivatives thereof. Specific examples of nitrogen-containing heterocyclic compounds that are preferable in terms of coordination with metals include triazoles such as 1H-benzotriazole, 4-methyl-1H-methylbenzotriazole, 5-methyl-1H-methylbenzotriazole, 4-carboxy-1H-methylbenzotriazole, and 5-carboxy-1H-methylbenzotriazole, and triazoles such as 1H-tetrazole, 5-methyl-1H-tetrazole, and 5-phenyl-1H-tetrazole.

From the viewpoint of achieving both excellent developability of the photosensitive resin composition and improved adhesion of the polyimide resin film formed using the photosensitive resin composition to a substrate or the like, the amount of the nitrogen-containing heterocyclic compound used is preferably 0.01% by mass or more and 5% by mass or less, and more preferably 0.05% by mass or more and 3% by mass or less, based on the mass of the polymerizable resin (A).

By blending a silane coupling agent in a photosensitive resin composition, the adhesiveness of a resin film formed using the photosensitive resin composition to a substrate or the like can be improved. A known compound can be used as the silane coupling agent. Examples of the silane coupling agent include 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-mercaptopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 2-(epoxycyclohexyl)ethyltrimethoxysilane, 2-(epoxycyclohexyl)triethoxysilane, tris(3-trimethoxysilylpropyl)isocyanurate, tris(3-triethoxysilylpropyl)isocyanurate, a reaction product of 3-aminopropyltrimethoxysilane and an acid anhydride, and a reaction product of 3-aminopropyltriethoxysilane and an acid anhydride.
Examples of acid anhydrides to be reacted with 3-aminopropyltrimethoxysilane or 3-aminopropyltriethoxysilane include succinic anhydride, maleic anhydride, nadic anhydride, 3-hydroxyphthalic anhydride, pyromellitic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 2,2',3,3'-benzophenonetetracarboxylic dianhydride, and 4,4'-oxydiphthalic dianhydride.

The amount of the silane coupling agent used is preferably 0.01% by mass or more and 10% by mass or less relative to the mass of the polymerizable resin (A).

By adding a surfactant to the photosensitive resin composition, the coatability of the photosensitive resin composition is improved, and the wettability of the photosensitive resin composition with the substrate is also improved. Known compounds can be used as the surfactant. Examples of the surfactant include fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone-based surfactants.

The amount of surfactant used is preferably 0.001% by mass or more and 1% by mass or less relative to the mass of the polymerizable resin (A).

The polymerizable resin (A) can be converted to a polyimide resin by heating. For this reason, the photosensitive resin composition may contain a cyclization promoter. The cyclization promoter promotes the formation of a polyimide resin by cyclization of a polyamide resin containing a structural unit derived from a polyamic acid or a dicarboxylic acid compound that can be synthesized by the reaction of a tetracarboxylic dianhydride with an alcohol.
When the photosensitive resin composition contains a cyclization accelerator, the mechanical properties and weather resistance reliability of the resin film formed while generating a polyimide resin by cyclization using the photosensitive resin composition are improved. As the cyclization accelerator, a known thermal base generator or thermal acid generator is used.

The amount of each additive used is not particularly limited as long as it does not impede the object of the present invention. The amount of additives not described above may be appropriately adjusted within a range of, for example, 0.001% by mass to 60% by mass, and preferably 0.01% by mass to 5% by mass, based on the mass of the solid content of the photosensitive resin composition.

<Method for preparing photosensitive resin composition>
The photosensitive resin composition can be prepared by uniformly mixing the essential components and optional components as described above in desired amounts. The mixing method is not particularly limited. In order to remove foreign matter from the photosensitive resin composition, it is preferable to filter the photosensitive resin composition through a filter.

<Photosensitive dry film>
The photosensitive dry film has a base film and a photosensitive layer formed on the surface of the base film, and the photosensitive layer is made of the above-mentioned photosensitive resin composition.

The substrate film is preferably one that is light-transmitting. Specific examples include polyethylene terephthalate (PET) film, polypropylene (PP) film, and polyethylene (PE) film, with polyethylene terephthalate (PET) film being preferred due to its excellent balance of light transmittance and breaking strength.

The above-mentioned photosensitive resin composition is applied onto a substrate film to form a photosensitive layer, thereby producing a photosensitive dry film.
When forming a photosensitive layer on a base film, the photosensitive resin composition is applied onto the base film using an applicator, a bar coater, a wire bar coater, a roll coater, a curtain flow coater, or the like, so that the film thickness after drying is preferably 0.5 μm or more and 300 μm or less, more preferably 1 μm or more and 300 μm or less, and particularly preferably 3 μm or more and 100 μm or less, and then dried.

The photosensitive dry film may further have a protective film on the photosensitive layer. Examples of such a protective film include a polyethylene terephthalate (PET) film, a polypropylene (PP) film, and a polyethylene (PE) film.

<Resin film formation method>
A coating step of coating a photosensitive resin composition on a substrate to form a coating film;
A resin film containing the polyimide resin precursor can be formed by a method including a drying step of drying the applied film to obtain a resin film.

The substrate is not particularly limited, and any conventionally known substrate can be used, such as a substrate for electronic components or a substrate on which a predetermined wiring pattern is formed. The substrate can also be a silicon substrate or a glass substrate.

After applying a liquid photosensitive resin composition onto a substrate to form a coating film, the solvent is removed from the applied photosensitive resin composition to form a coating film of the desired thickness. The thickness of the coating film is not particularly limited, but is preferably 0.5 μm or more, more preferably 0.5 μm to 300 μm, particularly preferably 1 μm to 150 μm, and most preferably 3 μm to 100 μm.

Methods that can be used to apply the photosensitive resin composition onto a substrate include spin coating, slit coating, roll coating, screen printing, and applicator methods.

The method for drying the photosensitive resin composition applied on the substrate is not particularly limited. Preferably, the drying is performed by heating. The heating conditions during drying vary depending on the type and blending ratio of each component in the photosensitive resin composition, the coating film thickness, etc., but are usually 70° C. to 200° C., preferably 80° C. to 150° C., and about 2 minutes to 120 minutes.
In this manner, a resin film containing the polyimide resin precursor is formed.

<Method for forming a patterned resin film>
A coating step of coating the photosensitive resin composition on a substrate to form a coating film;
an exposure step of exposing the coating film to actinic rays or radiation in a position-selective manner;
and a developing step of developing the exposed coating film to obtain a patterned resin film. The patterned resin film contains the polyimide resin precursor described above.

The substrate and the method for applying the photosensitive resin composition are as described above in relation to the resin film forming method.
The photosensitive resin composition applied on the substrate is usually dried to form a coating film. The method for drying the photosensitive resin composition applied on the substrate is not particularly limited. Preferably, the drying is performed by heating. The heating conditions during drying vary depending on the type and blending ratio of each component in the photosensitive resin composition, the coating film thickness, etc., but are usually 70° C. or higher and 200° C. or lower, preferably 80° C. or higher and 150° C. or lower, and about 2 minutes or longer and 120 minutes or shorter.

The coating film formed as described above is exposed by irradiating it with actinic rays or radiation in a position-selective manner. Selective exposure is usually performed by irradiating it with actinic rays or radiation, for example, ultraviolet rays or visible light with a wavelength of 300 nm or more and 500 nm or less, in a position-selective manner through a mask with a predetermined pattern.

Examples of radiation sources that can be used include low-pressure mercury lamps, high-pressure mercury lamps, ultra-high pressure mercury lamps, metal halide lamps, argon gas lasers, etc. Radiation includes microwaves, infrared rays, visible light, ultraviolet rays, X-rays, gamma rays, electron beams, proton beams, neutron beams, ion beams, etc. The radiation dose varies depending on the composition of the resin film-forming photosensitive resin and the film thickness of the photosensitive layer, but is, for example, 100 mJ/ ^cm2 or more and 10,000 mJ/cm2 or ^less when an ultra-high pressure mercury lamp is used.

The exposed coating film is then developed according to a conventional method, and unnecessary portions are dissolved and removed to form a resin film patterned in a predetermined shape. In this case, a developer appropriate to the components contained in the photosensitive resin composition is used. When the polyimide resin precursor is a resin having an alkali-soluble group such as a carboxy group, an alkaline aqueous solution can be used as the developer. The aforementioned solvent (S) can also be used as the developer.

Examples of alkaline developers include aqueous solutions of alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, aqueous ammonia, ethylamine, n-propylamine, diethylamine, di-n-propylamine, triethylamine, methyldiethylamine, dimethylethanolamine, triethanolamine, tetramethylammonium hydroxide (tetramethylammonium hydroxide), tetraethylammonium hydroxide, pyrrole, piperidine, 1,8-diazabicyclo[5,4,0]-7-undecene, and 1,5-diazabicyclo[4,3,0]-5-nonane. In addition, aqueous solutions of the above-mentioned alkaline solutions to which an appropriate amount of a water-soluble organic solvent such as methanol or ethanol or a surfactant has been added can also be used as the developer.

The development time varies depending on the composition of the photosensitive resin composition and the thickness of the coating film, but is usually between 1 minute and 30 minutes. The development method may be any of the puddle method, dipping method, paddle method, spray development method, etc.

After development, washing is performed for 30 to 90 seconds as necessary, and the patterned resin film is dried using an air gun, oven, or the like. In this way, a resin film patterned into the desired shape is formed on the surface of the substrate. There are no particular limitations on the cleaning solvent. For example, water or alcohols can be used as the cleaning solvent in the case of alkaline development. When development is performed with solvent (S), the solvent (S) can be used to the extent that solvent shock does not occur.

The polyimide resin precursor contained in the resin film can be imidized by heating. Therefore, after development, the developed coating film can be baked as necessary to imidize the polyimide resin precursor in the resin film. The conditions for converting the polyimide resin precursor into a polyimide resin by heating are as described above. In addition, baking is preferably performed under an inert gas atmosphere such as nitrogen or argon, from the viewpoint of preventing oxidation of the resin film and obtaining a resin film with good mechanical properties.

The patterned polyimide resin film formed as described above is preferably used, for example, as an insulating film for a semiconductor device, an interlayer insulating film for a rewiring layer, or an insulating film or protective film in a touch panel display or an organic electroluminescent display panel, etc. Since the above-mentioned photosensitive resin composition has good resolution, the patterned resin film formed as described above can be preferably used, in particular, as an interlayer insulating film for a rewiring layer in a three-dimensional packaging device.
Furthermore, the patterned resin film formed as described above can also be suitably used as a photoresist, a galvanic (electrolytic) resist, an etching resist, a solder top resist, and the like for electronics.
Furthermore, the patterned resin film formed as described above can also be used for producing printing plates such as offset printing plates or screen printing plates, for forming etching masks when etching molded parts, for producing protective lacquers and dielectric layers in electronic parts, especially microelectronic parts, etc.

（式（１－１）中、Ｘ^Ａ１は、炭素原子数４以上４０以下の４価の有機基であり、Ｙ^Ａ１は、炭素原子数４以上４０以下の２有機基であり、
Ｒ^Ａ１、及びＲ^Ａ２は、それぞれ独立に、水素原子、又は炭素原子数１以上３０以下の有機基であり、Ｒ^Ａ１、及びＲ^Ａ２としての前記有機基は、Ｃ－Ｏ結合を介して、エステル結合中の酸素原子に結合する。）

（式（１－２）中、Ｘ^Ａ１、Ｒ^Ａ１、及びＲ^Ａ２は、式（１－１）中のＸ^Ａ１、Ｒ^Ａ１、及びＲ^Ａ２と同様であり、Ｙ^Ａ２は、炭素原子数４以上４０以下の３価の有機基である。）

（式（１－３）中、Ｘ^Ａ１、Ｒ^Ａ１、及びＲ^Ａ２は、式（１－１）中のＸ^Ａ１、Ｒ^Ａ１、及びＲ^Ａ２と同様であり、Ｙ^Ａ３は、炭素原子数４以上５０以下の４価の有機基である。）
（２） Ｒ^Ａ１、及びＲ^Ａ２としての有機基のモル数に対する、不飽和基のモル数が、６０モル％以上である、（１）に記載のポリイミド樹脂前駆体。
（３） 不飽和基が、エチレン性不飽和二重結合を有する鎖状脂肪族炭化水素基、及び（メタ）アクリロイル基含有基から選択される１種以上の基である、（１）又は（２）に記載のポリイミド樹脂前駆体。
（４） Ｙ^Ａ１、Ｙ^Ａ２、及びＹ^Ａ３のモル数の合計に対する、Ｙ^Ａ２、及びＹ^Ａ３のモル数の合計の比率が、１モル％以上１３モル％以下である、（１）～（３）のいずれか１つに記載のポリイミド樹脂前駆体。
（５） Ｙ^Ａ１として、下記式（Ａ１－１）で表される基を含む、（１）～（４）のいずれか１項に記載のポリイミド樹脂前駆体。

（式（Ａ１－１）中、Ｘは、４価の有機基であり、Ｒ^ａ１は、ヒドロキシ基、カルボキシ基、又はハロゲン原子であり、Ｒ^ａ２は、炭素原子数１以上２０以下の脂肪族基、ヒドロキシ基、カルボキシ基、スルホン酸基、又はハロゲン原子であり、Ａｒは、Ｒ^ａ２で置換されていてもよいフェニル基、又はＲ^ａ２で置換されていてもよいナフチル基であり、ｍａ１は、０以上１０以下の整数であり、ｍａ２は、０以上７以下の整数であり、ｍａ３は、１以上１０以下の整数である。）
（６） Ｙ^Ａ１として、下記式（Ａ２－１）で表される部分構造を有する２価の基を含む、（１）～（４）のいずれか１つに記載のポリイミド樹脂前駆体。

（式（Ａ２－１）中、Ｒ^ａ３及びＲ^ａ４は、それぞれ独立に、炭素原子数１以上４以下のアルキル基、炭素原子数１以上４以下のアルコキシ基、又はハロゲン原子であり、ｍａ４及びｍａ５は、それぞれ独立に０以上４以下の整数である。）
で表される部分構造を有する２価の基を含む、（１）～（５）のいずれか１つに記載のポリイミド樹脂前駆体。
（７） 重合性樹脂（Ａ）と、光ラジカル重合開始剤（Ｃ）と、溶媒（Ｓ）とを含み、重合性樹脂（Ａ）が、（１）～（６）のいずれか１つに記載の前記ポリイミド樹脂前駆体である、感光性樹脂組成物。
（８） 基板上に、（７）に記載の感光性樹脂組成物を塗布して、塗布膜を形成することと、
塗布膜を位置選択的に露光することと、
露光された塗布膜を現像することと、
を含む、パターン化された樹脂膜の製造方法。
（９） （８）に記載の製造方法により製造されたパターン化された樹脂膜を加熱することにより、ポリイミド樹脂前駆体に由来するポリイミド樹脂を生成させることを含む、パターン化されたポリイミド樹脂膜の製造方法。 As described above, the present inventors provide the following (1) to (9).
(1) A structural unit (1-1) represented by the following formula (1-1), a structural unit (1-2) represented by the following formula (1-2), and/or a structural unit (1-3) represented by the following formula (1-3),
A polyimide resin precursor, wherein the organic groups represented by R ^A1 and R ^A2 each contain an unsaturated group having an ethylenically unsaturated double bond and having 3 to 30 carbon atoms.

In formula (1-1), X ^represents a tetravalent organic group having 4 to 40 carbon atoms, and Y ^represents a divalent organic group having 4 to 40 carbon atoms.
R ^A1 and R ^A2 are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, and the organic group represented by R ^A1 and R ^A2 is bonded to an oxygen atom in the ester bond via a C—O bond.

(In formula (1-2), X ^A1 , R ^A1 , and R ^A2 are the same as X ^A1 , R ^A1 , and R ^A2 in formula (1-1), and Y ^A2 is a trivalent organic group having 4 to 40 carbon atoms.)

(In formula (1-3), X ^A1 , R ^A1 , and R ^A2 are the same as X ^A1 , R ^A1 , and R ^A2 in formula (1-1), and Y ^A3 is a tetravalent organic group having 4 to 50 carbon atoms.)
(2) The polyimide resin precursor according to (1), in which the number of moles of unsaturated groups relative to the number of moles of organic groups as R ^A1 and R ^A2 is 60 mol % or more.
(3) The polyimide resin precursor according to (1) or (2), wherein the unsaturated group is one or more groups selected from a chain aliphatic hydrocarbon group having an ethylenically unsaturated double bond and a (meth)acryloyl group-containing group.
(4) The polyimide resin precursor according to any one of (1) to (3), wherein the ratio of the total number of moles of Y ^A2 and Y ^A3 to the ^total number of moles of Y ^A1 , Y ^A2 , and Y A3 is 1 mol % or more and 13 mol % or less.
(5) The polyimide resin precursor according to any one of (1) to (4), wherein Y ^A1 contains a group represented by the following formula (A1-1):

(In formula (A1-1), X is a tetravalent organic group, R ^a1 is a hydroxy group, a carboxy group, or a halogen atom, R ^a2 is an aliphatic group having 1 to 20 carbon atoms, a hydroxy group, a carboxy group, a sulfonic acid group, or a halogen atom, Ar is a phenyl group which may be substituted with R ^a2 , or a naphthyl group which may be substituted with R ^a2 , ma1 is an integer of 0 to 10, ma2 is an integer of 0 to 7, and ma3 is an integer of 1 to 10.)
(6) The polyimide resin precursor according to any one of (1) to (4), wherein Y ^A1 contains a divalent group having a partial structure represented by the following formula (A2-1):

(In formula (A2-1), R ^a3 and R ^a4 each independently represent an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, or a halogen atom, and ma4 and ma5 each independently represent an integer of 0 to 4.)
The polyimide resin precursor according to any one of (1) to (5), which contains a divalent group having a partial structure represented by:
(7) A photosensitive resin composition comprising a polymerizable resin (A), a photoradical polymerization initiator (C), and a solvent (S), wherein the polymerizable resin (A) is the polyimide resin precursor according to any one of (1) to (6).
(8) applying the photosensitive resin composition according to (7) onto a substrate to form a coating film;
position-selectively exposing the coating film;
developing the exposed coating film;
A method for producing a patterned resin film, comprising:
(9) A method for producing a patterned polyimide resin film, comprising heating the patterned resin film produced by the production method according to (8) to produce a polyimide resin derived from a polyimide resin precursor.

The present invention will be described in detail below with reference to examples, but the scope of the present invention is not limited to these examples.

[Examples 1 to 13 and Comparative Examples 1 to 11]
In the examples and comparative examples, the following diamine compounds DA1 to DA4 were used.

In the examples and comparative examples, the following TA1, TA2, and TA3 were used as triamine compounds. In the examples and comparative examples, the following TA4 was used as a tetraamine compound.
TA1: 1,3,5-tri(4-aminophenyl)benzene TA2: 2,4,6-triamino-1,3,5-triazine (melamine)
TA3: Tris(2-aminoethyl)amine TA4: 1,1,2,2-tetra(4-aminophenyl)ethylene

In the examples and comparative examples, the following tetracarboxylic dianhydrides TC1 to TC4 were used.

In the examples and comparative examples, the following alcohols A1 to A3 were used to react with the tetracarboxylic dianhydride.
A1: Dec-9-en-1-yl alcohol A2: Octadec-9-en-1-yl alcohol (oleyl alcohol)
A3: 2-hydroxyethyl methacrylate

(Production of dicarboxylic acid)
0.0322 mol of a tetracarboxylic dianhydride of the type shown in Table 1 was dissolved in 23.33 g of N-methyl-2-pyrrolidone (NMP). 0.068 mol of an alcohol of the type shown in Table 1 and 0.068 mol of pyridine were added to the resulting solution. The resulting solution was stirred at room temperature for 16 hours to obtain a dicarboxylic acid, which is a reaction product of the tetracarboxylic dianhydride and the alcohol.

(Production of polyimide resin precursor)
The obtained solution containing dicarboxylic acid was cooled to 0° C. A condensing agent solution in which 0.068 mol of dicyclohexylcarbodiimide was dissolved in 9.74 g of NMP, and a solution in which an amine compound containing a diamine compound of the type shown in Table 1 and a triamine compound or tetraamine compound of the type shown in Table 1 in the ratio shown in Table 1 was dissolved in 17.53 g of NMP were each added dropwise to the cooled solution.
The solution of the amine compounds contained an amount of the amine compounds such that the total amount of amino groups was 0.0322 moles.
The ratio of the diamine compound and the ratio of the tetraamine compound in the amine compound were as shown in Table 1.
The ratio of the diamine compound shown in Table 1 is the ratio of the number of moles of the amino group in the diamine compound to the total number of moles of the amino group in the diamine compound and the number of moles of the amino group in the triamine compound or the tetraamine compound.
The ratio of the triamine compound or the tetraamine compound shown in Table 1 is the ratio of the number of moles of the amino group contained in the diamine compound, the triamine compound, or the tetraamine compound to the sum of the number of moles of the amino group contained in the diamine compound and the number of moles of the amino group contained in the triamine compound or the tetraamine compound.
When the ratio of the diamine compound to the triamine compound or the tetraamine compound based on the amount of amino groups in the solution of the amine compound is 95/5, the solution contains 0.03059 moles of the diamine compound and 0.00107 moles of the triamine compound or the tetraamine compound.
When the ratio of the diamine compound to the triamine compound or the tetraamine compound based on the amount of amino groups in the solution of the amine compound is 90/10, the solution contains 0.02898 moles of the diamine compound and 0.00215 moles of the triamine compound or the tetraamine compound.
When the ratio of the diamine compound to the triamine compound or the tetraamine compound based on the amount of amino groups in the solution of the amine compound is 97/3, the solution contains 0.03123 moles of the diamine compound and 0.00064 moles of the triamine compound or the tetraamine compound.
In the comparative example, a triamine compound or a tetraamine compound was not used, and only a diamine compound was used.

After the dropwise addition was completed, the resulting reaction solution was stirred at room temperature for 4 hours to condense the dicarboxylic acid and diamine compound.

After the reaction was completed, 1.92 g of methanol was added to the reaction solution. The precipitated by-products were removed by filtration, and the filtrate containing the polyimide resin precursor was then dripped into a large amount of an aqueous solution of isopropyl alcohol. After dripping, the polyimide resin precursor precipitated in the aqueous solution of isopropyl alcohol was recovered by filtration. The recovered precipitate was washed three times with isopropyl alcohol. The washed precipitate was dried under reduced pressure to obtain the polyimide resin precursor used in the preparation of the photosensitive resin composition in each of the Examples and Comparative Examples.

(Production of photosensitive resin composition)
The obtained polyimide resin precursor was dissolved in N,N,N',N'-tetramethylurea to a concentration of 30 mass%. In the obtained solution, 0.5 mass% of a photoradical polymerization initiator (Irgacure OXE-02, manufactured by BASF Japan) relative to the mass of the polyimide resin precursor and 0.5 mass% of a multifunctional thiol compound (D) (pentaerythritol tetrakis(3-mercaptobutyrate), Karenz MT (registered trademark) PE1, manufactured by Showa Denko K.K.) relative to the mass of the polyimide resin precursor were uniformly dissolved to obtain photosensitive resin compositions of each Example and Comparative Example.

A polyimide resin film was formed using the obtained photosensitive resin composition, and the dielectric tangent and chemical resistance of the obtained polyimide resin film were evaluated according to the following method. In addition, the photolithography properties of the obtained photosensitive resin composition were evaluated according to the following method. The evaluation results are shown in Table 1.

<Dielectric tangent evaluation>
After the photosensitive resin composition was applied onto a silicon wafer by a spin coater, the thin film of the photosensitive resin composition was baked at 90°C for 240 seconds. The baked coating film was exposed to light with an integrated light dose of 2000 mJ/ ^cm2 using a high-pressure mercury lamp. The exposed film was heated to 230°C at a heating rate of 5°C/min in a nitrogen atmosphere in an inert oven, and the coating film was heated at the same temperature for 1 hour. When the temperature dropped to 100°C, the wafer was taken out and immersed in a hydrofluoric acid aqueous solution with a concentration of 2% by mass for 5 to 30 minutes, and the resin film was peeled off from the wafer to obtain a polyimide resin film. The thickness of the resin film after peeling was 10 μm.

The dielectric loss tangent (tan δ) of the obtained film was measured by the method described in "Study on evaluation of millimeter wave complex dielectric constant of photosensitive insulating film by cylindrical cavity resonator method" (Kohei Takahagi (Utsunomiya University), Kazuaki Ebisawa (Tokyo Ohka Kogyo Co., Ltd.), Yoshinori Kogami (Utsunomiya University), Takashi Shimizu (Utsunomiya University)) in IEICE Technical Report vol. 118, no. 506, MW2018-158, pp. 13-18, March 2019. Using a network analyzer HP8510C (manufactured by Keysight Corporation), the measurement was performed by the cavity resonator method under the conditions of room temperature 25 ° C, humidity 50%, frequency 36 GHz, and sample thickness 10 μm. Based on the measured value of the dielectric loss tangent, the dielectric loss tangent was evaluated according to the following criteria.
⊚: Dielectric tangent value is less than 0.15.
Good: The dielectric tangent value is 0.15 or more and less than 0.20.
×: Dielectric tangent value is 0.20 or more.

<Chemical resistance>
After the photosensitive resin composition was applied onto a silicon wafer by a spin coater, the thin film of the photosensitive resin composition was baked at 90°C for 240 seconds. The baked coating film was exposed to an integrated light dose of 2000 mJ/ ^cm2 using a high-pressure mercury lamp. The exposed film was heated to 230°C at a heating rate of 5°C/min in a nitrogen atmosphere in an inert oven, and the coating film was heated at the same temperature for 1 hour. When the temperature dropped to 100°C, the wafer was removed. The wafer was cut into 5 cm square test pieces, which were then immersed in a sulfuric acid aqueous solution with a concentration of 30% by mass at 25°C for 60 minutes. The appearance of the test pieces after immersion was checked for any change from the appearance of the test pieces before immersion. The case where there was no change in appearance was judged as ◯. The case where there was a change in appearance was judged as ×.

<Photolithography characteristic (PL characteristic) evaluation>
The photolithography properties of the photosensitive resin composition were confirmed by the following method.
The photosensitive resin composition was applied by a spin coater onto a silicon wafer on which a copper sputtered film had been formed. The film made of the photosensitive resin composition was then baked at 80° C. for 300 seconds to obtain a coating film having a thickness of 10 μm. The coating film was exposed to light using a GHI line exposure machine (manufactured by Ultratech) through a negative mask capable of forming via holes with an opening diameter of 50 μm. The exposed coating film was developed by immersing it in cyclopentanone for 60 seconds.
As a result of development, when a pattern of the desired size and shape could be formed at an exposure dose of 2000 mJ/ ^cm2 or less, it was judged as ◯. When a pattern of the desired size and shape could not be formed at an exposure dose of more than 2000 mJ/ ^cm2 , it was judged as ×.

According to the examples, it is clear that a photosensitive resin composition containing a polyamide resin precursor which is composed of the aforementioned structural unit (1-1), structural unit (1-2), or structural unit (1-3) and has an unsaturated group having 3 to 30 carbon atoms and which has an ethylenically unsaturated double bond in a side chain, gives a polyimide resin which has a low dielectric tangent and excellent chemical resistance, and has excellent photolithography properties.
On the other hand, it is found that a photosensitive resin composition containing a polyamide resin precursor having only the above-mentioned structural unit (1-1) has poor photolithography properties and does not provide a polyimide resin having both a low dielectric tangent and excellent chemical resistance.

Claims (9)

The copolymer comprises a structural unit (1-1) represented by the following formula (1-1), a structural unit (1-2) represented by the following formula (1-2), and/or a structural unit (1-3) represented by the following formula (1-3):
A polyimide resin precursor, wherein the organic groups represented by R ^A1 and R ^A2 each contain an unsaturated group having an ethylenically unsaturated double bond and having 3 to 30 carbon atoms.

In formula (1-1), X ^represents a tetravalent organic group having 4 to 40 carbon atoms, and Y ^represents a divalent organic group having 4 to 40 carbon atoms.
R ^A1 and R ^A2 are each independently a hydrogen atom or an organic group having 1 to 30 carbon atoms, and the organic group represented by R ^A1 and R ^A2 is bonded to an oxygen atom in the ester bond via a C—O bond.

(In formula (1-2), X ^A1 , R ^A1 , and R ^A2 are the same as X ^A1 , R ^A1 , and R ^A2 in formula (1-1), and Y ^A2 is a trivalent organic group having 4 to 40 carbon atoms.)

(In formula (1-3), X ^A1 , R ^A1 , and R ^A2 are the same as X ^A1 , R ^A1 , and R ^A2 in formula (1-1), and Y ^A3 is a tetravalent organic group having 4 to 50 carbon atoms.) 2. The polyimide resin precursor according to claim 1, wherein the number of moles of the unsaturated group relative to the number of moles of the organic groups represented by R ^A1 and R ^A2 is 60 mol % or more. The polyimide resin precursor according to claim 1 or 2, wherein the unsaturated group is one or more groups selected from a chain aliphatic hydrocarbon group having an ethylenically unsaturated double bond and a (meth)acryloyl group-containing group. 3. The polyimide resin precursor according to claim 1, wherein a ratio of a total number of moles of the Y ^A2 and the Y ^A3 to a total number of moles of the Y ^A1 , the Y ^A2 , and the Y ^A3 is 1 mol % or more and 13 mol % or less. 3. The polyimide resin precursor according to claim 1, wherein the Y ^A1 contains a group represented by the following formula (A1-1):

(In formula (A1-1), X is a tetravalent organic group, R ^a1 is a hydroxy group, a carboxy group, or a halogen atom, R ^a2 is an aliphatic group having 1 to 20 carbon atoms, a hydroxy group, a carboxy group, a sulfonic acid group, or a halogen atom, Ar is a phenyl group which may be substituted with R ^a2 , or a naphthyl group which may be substituted with R ^a2 , ma1 is an integer of 0 to 10, ma2 is an integer of 0 to 7, and ma3 is an integer of 1 to 10.) 3. The polyimide resin precursor according to claim 1, wherein the Y ^A1 contains a divalent group having a partial structure represented by the following formula (A2-1):

(In formula (A2-1), R ^a3 and R ^a4 each independently represent an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, or a halogen atom, and ma4 and ma5 each independently represent an integer of 0 to 4.)
The polyimide resin precursor according to claim 1 or 2, which contains a divalent group having a partial structure represented by the following formula: A photosensitive resin composition comprising a polymerizable resin (A), a photoradical polymerization initiator (C), and a solvent (S), the polymerizable resin (A) being the polyimide resin precursor according to claim 1 or 2. Coating a substrate with the photosensitive resin composition according to claim 7 to form a coating film;
exposing the coating film to a position-selective light;
developing the exposed coating film;
A method for producing a patterned resin film, comprising: A method for producing a patterned polyimide resin film, comprising heating the patterned resin film produced by the method of claim 8 to generate a polyimide resin derived from the polyimide resin precursor.