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JP2022038039A - Fine projection for optical element - Google Patents

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JP2022038039A
JP2022038039A JP2020142322A JP2020142322A JP2022038039A JP 2022038039 A JP2022038039 A JP 2022038039A JP 2020142322 A JP2020142322 A JP 2020142322A JP 2020142322 A JP2020142322 A JP 2020142322A JP 2022038039 A JP2022038039 A JP 2022038039A
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optical element
structure portion
antireflection
optical
base material
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成紀 細谷
Shigeki Hosoya
潔 李
Jie Li
俊矢 福井
Toshiya Fukui
照房 國定
Terufusa Kunisada
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Tamron Co Ltd
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Tamron Co Ltd
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Abstract

To provide a fine projection for an optical element having a reflection preventing characteristic in a wide range, and an optical element with a reflection preventing structure having the fine particle for an optical element.SOLUTION: In order to achieve the above object, there is provided a fine projection for an optical element formed in a surface of an optical element base material to obtain a reflection preventing effect. The fine projection for an optical element includes a first structure part with a top end flat part and a second structure part in the shape of a ring protrusion formed along the outer edge of the top end flat part of the first structure part.SELECTED DRAWING: Figure 1

Description

本件発明は、反射防止特性を有する光学素子用微細突起、光学素子用微細突起を備えた反射防止構造付光学素子及び光学系、及び反射防止構造付光学素子の製造方法に関する。 The present invention relates to fine protrusions for an optical element having antireflection characteristics, an optical element and an optical system having an antireflection structure provided with fine protrusions for an optical element, and a method for manufacturing an optical element with an antireflection structure.

ガラス、プラスチックなどの光透過性材料を用いた光学素子は、入射光の表面反射による透過光の損失を低減させるため、光入射面および光出射面に反射防止膜を設けるなどの表面処理が施されている。この反射防止膜は、光学素子を構成する基材より低屈折率の物質からなる単層膜、又は、低屈折率の物質と高屈折率の物質とが交互に積層した多層膜であり、蒸着法、スパッタリング法、塗装法などにより形成されている。 Optical elements made of light-transmitting materials such as glass and plastic are subjected to surface treatment such as providing antireflection films on the light incident surface and light emitting surface in order to reduce the loss of transmitted light due to surface reflection of incident light. Has been done. This antireflection film is a single-layer film made of a substance having a lower refractive index than the substrate constituting the optical element, or a multilayer film in which a substance having a low refractive index and a substance having a high refractive index are alternately laminated, and is vapor-deposited. It is formed by a method, a sputtering method, a painting method, or the like.

このような反射防止膜の反射防止効果を向上させるためには、精密な膜厚の制御が必要である。そのため、反射防止膜の製造においては、精密な膜厚の制御が可能な高精度プロセスを用いる場合があり、製造コストが上昇する要因となっている。 In order to improve the antireflection effect of such an antireflection film, precise film thickness control is required. Therefore, in the production of the antireflection film, a high-precision process capable of precisely controlling the film thickness may be used, which is a factor of increasing the production cost.

また、反射防止膜の反射防止効果は、各膜の表面及び界面で発生する反射光の干渉を利用するものであることから、反射防止膜の反射防止性能には波長依存性がある。このため、デジタルカメラやプロジェクター装置など広い波長帯域を用いる光学機器に対し、良好な反射防止効果を提供することは困難である。さらに、反射防止膜は光の入射角度依存性を有するため、レンズ等の曲率を持つ光学素子に対しては、光入射面及び光出射面の全体で良好な反射防止効果を得ることが困難である。 Further, since the antireflection effect of the antireflection film utilizes the interference of the reflected light generated at the surface and the interface of each film, the antireflection performance of the antireflection film is wavelength-dependent. Therefore, it is difficult to provide a good antireflection effect for optical devices such as digital cameras and projector devices that use a wide wavelength band. Further, since the antireflection film has a light incident angle dependence, it is difficult to obtain a good antireflection effect on the entire light incident surface and light emitting surface for an optical element having a curvature such as a lens. be.

そこで、以上に述べた反射防止膜に代わる反射防止手段として、入射光の波長以下の大きさを持つ微細凹凸構造を光学素子表面に設ける方法が検討されてきた。この微細凹凸構造の突起形状として、基材側から空気層に近づくにつれて徐々に断面積が小さくなるような円錐や四角錐等の錐形状を採用すると、空気層と光学素子表面との界面における急激な屈折率の変化を抑制できる。その結果、波長帯域特性や入射角度特性に優れた反射防止性能が期待できるためである。 Therefore, as an antireflection means instead of the antireflection film described above, a method of providing a fine concavo-convex structure having a size equal to or smaller than the wavelength of the incident light on the surface of the optical element has been studied. If a cone shape such as a cone or a quadrangular pyramid whose cross-sectional area gradually decreases as it approaches the air layer from the base material side is adopted as the protrusion shape of this fine uneven structure, the interface between the air layer and the surface of the optical element suddenly decreases. It is possible to suppress a change in the refractive index. As a result, antireflection performance with excellent wavelength band characteristics and incident angle characteristics can be expected.

ここで、この微細突起は、入射光の波長以下の大きさであることから非常に微細である。さらに、空気層と光学素子表面との界面で屈折率を滑らかに変化させるために、この微細突起は、先端ほど細く尖った構造である。このことから、物理的な接触によって破損しやすく、耐擦傷性が悪かった。 Here, the fine protrusions are very fine because they have a size equal to or smaller than the wavelength of the incident light. Further, in order to smoothly change the refractive index at the interface between the air layer and the surface of the optical element, the fine protrusions have a structure as thin and sharp as the tip. For this reason, it was easily damaged by physical contact and had poor scratch resistance.

そこで、特許文献1には、可視光以下の間隔で配置された微細突起において、構造を円錐台および角錐台とし、微細突起の上端を平面化した微細突起が開示されている。 Therefore, Patent Document 1 discloses a fine protrusion having a structure of a truncated cone and a pyramid base and flattening the upper end of the fine protrusion in the fine protrusions arranged at intervals of visible light or less.

特開2009-75539号公報Japanese Unexamined Patent Publication No. 2009-75539

しかしながら、特許文献1に記載の微細突起構造は、その構造体の先端に平面部を備えているため、空気層と微細突起の平面部との界面において屈折率が急に変化する。そのため、屈折率の連続的で滑らかな変化が不十分であり、反射防止性能が十分ではない。また、先端の平面部と、微細突起間の平面部との2層の反射光からなる干渉によっても反射防止効果を得ているが、反射防止効果があるのは、特定の波長に限られるため、広帯域に反射防止効果を得ることができない。 However, since the fine protrusion structure described in Patent Document 1 has a flat surface portion at the tip of the structure, the refractive index suddenly changes at the interface between the air layer and the flat surface portion of the fine protrusions. Therefore, the continuous and smooth change of the refractive index is insufficient, and the antireflection performance is not sufficient. In addition, the antireflection effect is also obtained by the interference consisting of two layers of reflected light between the flat surface portion at the tip and the flat surface portion between the fine protrusions, but the antireflection effect is limited to a specific wavelength. , The antireflection effect cannot be obtained in a wide band.

本件発明は、上記に鑑みてなされたものであって、広帯域に反射防止特性を有する光学素子用微細突起、及び光学素子用微細突起を備えた反射防止構造付光学素子を提供することを目的とする。 The present invention has been made in view of the above, and an object of the present invention is to provide a microprojection for an optical element having antireflection characteristics in a wide band and an optical element having an antireflection structure provided with the microprojection for an optical element. do.

上述した課題を解決するために、鋭意研究の結果、以下の発明に想到した。
本件発明に係る光学素子用微細突起は、光学素子基材の表面に設け反射防止効果を得るための光学素子用微細突起であって、前記光学素子用微細突起は、先端平面部が形成された第1構造体部と、前記第1構造体部の前記先端平面部の外縁に沿って形成された環状突起である第2構造体部とからなることを特徴としている。
As a result of diligent research, we came up with the following inventions in order to solve the above-mentioned problems.
The fine protrusion for an optical element according to the present invention is a fine protrusion for an optical element provided on the surface of an optical element base material to obtain an antireflection effect, and the fine protrusion for an optical element has a tip flat portion formed therein. It is characterized by comprising a first structure portion and a second structure portion which is an annular protrusion formed along the outer edge of the tip plane portion of the first structure portion.

本件発明に係る光学素子用微細突起は、先端平面部が形成された第1構造体部と、第1構造体部の先端平面部の外縁に沿って形成された環状突起である第2構造体部とからなることによって、光学素子用微細突起が存在する界面において、屈折率を滑らかに変化する。そして、本件発明に係る反射防止構造付光学素子は、当該光学素子用微細突起を光学面に複数備えることにより、広帯域に反射率を低減させることが可能である。 The fine protrusions for optical elements according to the present invention are a first structure portion in which a tip flat portion is formed and a second structure which is an annular protrusion formed along the outer edge of the tip plane portion of the first structure portion. By forming the portion, the refractive index is smoothly changed at the interface where the fine protrusions for the optical element are present. The optical element with an antireflection structure according to the present invention can reduce the reflectance over a wide band by providing a plurality of fine protrusions for the optical element on the optical surface.

光学素子上に形成された本実施の形態における複数の光学素子用微細突起の一部を抽出した縦断面の略図である。It is a schematic of the vertical cross section which extracted a part of the fine protrusions for a plurality of optical elements in this embodiment formed on an optical element. 第2構造体が環状突起であることを示す略立体図である。It is a schematic three-dimensional view which shows that the 2nd structure is an annular projection. 光学素子用微細突起の構造を説明するための略断面図である。It is a schematic sectional drawing for demonstrating the structure of the microprojection for an optical element. 本件発明に係る光学素子の一例を示す略断面図である。It is a schematic sectional drawing which shows an example of the optical element which concerns on this invention. 本実施の形態の反射防止構造付光学素子を示す略断面図である。It is a schematic cross-sectional view which shows the optical element with an antireflection structure of this embodiment. 実施例及び比較例における反射率特性の評価結果である。It is the evaluation result of the reflectance characteristic in an Example and a comparative example.

以下、本件発明に係る光学素子用微細突起、反射防止構造付光学素子及び反射防止構造付光学素子の製造方法の実施の形態を説明する。 Hereinafter, embodiments of a method for manufacturing a microprojection for an optical element, an optical element with an antireflection structure, and an optical element with an antireflection structure according to the present invention will be described.

1.光学素子用微細突起の構造における実施の形態
本件発明に係る光学素子用微細突起は、光学素子基材の表面に設け反射防止効果を得るための光学素子用微細突起であって、前記光学素子用微細突起は、先端平面部が形成された第1構造体部と、第1構造体部の先端平面部の外縁に沿って形成された環状突起である第2構造体部とからなることを特徴としている。図1に、光学素子上に形成された本実施の形態における複数の光学素子用微細突起から抽出した一部の光学素子用微細突起であって、当該光学素子用微細突起の縦断面の略図を示す。
1. 1. Embodiment in the structure of the optical element microprojection The optical element microprojection according to the present invention is an optical element microprojection provided on the surface of the optical element base material to obtain an antireflection effect, and is used for the optical element. The microprojection is characterized by comprising a first structure portion in which the tip plane portion is formed and a second structure portion which is an annular projection formed along the outer edge of the tip plane portion of the first structure portion. It is supposed to be. FIG. 1 shows a schematic view of a vertical cross section of a part of the optical element microprojections extracted from a plurality of optical element microprojections formed on the optical element according to the present embodiment. show.

なお、本明細書においては、第1構造体部の、基材と接触する面とは反対側の面を、第1構造体部の「先端平面部」というものとする。そして、第1構造体部の基材と接触する境界面を、第1構造体部の「底面部」というものとする。また、「縦断面」を次のように定義する。光学素子の光学中心を通り光軸に平行な直線を含む平面であって、かつ、当該平面が第1構造体部の先端平面部の中心点を含むとき、当該平面によって切り取られる光学素子用微細突起又は第1構造体部の断面を「縦断面」というものとし、光学素子用微細突起の「縦断面」、第1構造体部の「縦断面」というように用いるものとする。 In the present specification, the surface of the first structure portion on the side opposite to the surface in contact with the base material is referred to as the "tip flat portion" of the first structure portion. The boundary surface that comes into contact with the base material of the first structure portion is referred to as a "bottom surface portion" of the first structure portion. In addition, the "vertical section" is defined as follows. When the plane includes a straight line passing through the optical center of the optical element and parallel to the optical axis, and the plane includes the center point of the tip plane portion of the first structure portion, the fine details for the optical element cut by the plane. The cross section of the protrusion or the first structure portion is referred to as a "longitudinal cross section", and is used as a "vertical cross section" of a fine protrusion for an optical element and a "longitudinal cross section" of the first structure portion.

光学素子を形成する基材11は光学材料を用いて形成されたものであれば、ガラス製であってもよいし、プラスチック製であってもよく、その材質に特に限定はない。そして、基材11の表面には、先端平面部が形成された突起状の第1構造体部21と、第1構造体部21の先端平面部の外縁に沿って形成された環状突起である第2構造体部22とからなる複数の光学素子用微細突起20が設けられている。 The base material 11 on which the optical element is formed may be made of glass or plastic as long as it is formed by using an optical material, and the material thereof is not particularly limited. Then, on the surface of the base material 11, there are a protrusion-shaped first structure portion 21 on which the tip flat portion is formed, and an annular protrusion formed along the outer edge of the tip flat portion of the first structure portion 21. A plurality of fine protrusions 20 for optical elements including the second structure portion 22 are provided.

第1構造体部21は、第1構造体部21の光軸方向に対して垂直な断面における断面積が、基材側から空気層に近づくにつれて徐々に小さくなるように変化する形状である。そして、先端面に平面部、すなわち先端平面部が形成された円錐台状又は角錐台状であることが好ましい。第1構造体部21の先端が尖っていると、先端平面部の面積が極端に狭くなるので、第2構造体部の形成が困難になる。また、円錐台状又は角錐台状である第1構造体部21の錐台の斜面の変化の程度は、線形であっても良いし、2次関数などで表される曲線状であっても良い。 The first structure portion 21 has a shape in which the cross-sectional area of the first structure portion 21 in a cross section perpendicular to the optical axis direction gradually decreases as it approaches the air layer from the base material side. Then, it is preferable that the tip surface has a flat surface portion, that is, a truncated cone shape or a pyramidal trapezoidal shape in which the tip flat portion is formed. If the tip of the first structure portion 21 is sharp, the area of the tip plane portion becomes extremely narrow, which makes it difficult to form the second structure portion. Further, the degree of change in the slope of the frustum of the first structure portion 21 having a frustum shape or a pyramid shape may be linear or curved by a quadratic function or the like. good.

さらに、第1構造体部21の先端平面部の外縁に沿って環状突起である第2構造体部22が形成されている。図2に、第1構造体部21が円錐台状である場合の、第2構造体部22が環状突起であることを示す略立体図を示す。第2構造体部22は、図2に示すように、第1構造体部21の平面部の外縁に沿って形成された環状の突起である。 Further, a second structure portion 22 which is an annular protrusion is formed along the outer edge of the tip plane portion of the first structure portion 21. FIG. 2 shows a schematic three-dimensional diagram showing that the second structure portion 22 is an annular protrusion when the first structure portion 21 has a truncated cone shape. As shown in FIG. 2, the second structure portion 22 is an annular protrusion formed along the outer edge of the flat surface portion of the first structure portion 21.

第2構造体部22は、第1構造体部21の先端平面部の外縁に沿って形成される環状突起であることから、第2構造体部22の第1構造体部との接触面は環状となる。そして、第2構造体部22の第1構造体部との接触面の外周の形状と大きさは、第1構造体部の先端平面部の外周と同じ形状と大きさになる。また、第2構造体部22の第1構造体部との接触面の内周形状は、当該外周形状の略相似形である。第2構造体部の当該外周と当該内周とによって形成される環状突起の光軸方向に対して垂直な面における断面において、当該断面の断面積は、第1構造体部と接触する面側から空気層に近づくにつれて徐々に小さくなるように変化する。 Since the second structure portion 22 is an annular protrusion formed along the outer edge of the tip plane portion of the first structure portion 21, the contact surface of the second structure portion 22 with the first structure portion is It becomes a ring. The shape and size of the outer periphery of the contact surface of the second structure portion 22 with the first structure portion are the same as the outer circumference of the tip flat portion of the first structure portion. Further, the inner peripheral shape of the contact surface of the second structure portion 22 with the first structure portion is substantially similar to the outer peripheral shape. In a cross section on a plane perpendicular to the optical axis direction of the annular projection formed by the outer periphery and the inner circumference of the second structure portion, the cross-sectional area of the cross section is the surface side in contact with the first structure portion. It gradually becomes smaller as it approaches the air layer.

第1構造体部21の先端平面部に第2構造体部22が無く、すべて平面である場合、主に第1構造体部21の先端平面部と、複数の光学素子用微細突起の間における平面部との、2層の反射光による干渉によってのみ反射防止効果を得るため、広帯域に反射防止効果を得ることができない。第1構造体部21の先端平面部に第2構造体部22を設けることによって、光学素子用微細突起20の先端部分においても、屈折率が連続的になめらかに変化する。これによって、第1構造体部21の先端平面部に第2構造体部が無く、すべて平面である場合に比べ、広帯域に反射防止の効果を得ることができる。また、光学素子用微細突起20における第1構造体部21の先端平面部に第2構造体部22を設けているため、光学素子用微細突起20の先端が針状の構造と比べて破損しにくく、耐擦傷性が高い。 When the second structure portion 22 does not exist in the tip plane portion of the first structure portion 21 and is all flat, it is mainly between the tip plane portion of the first structure portion 21 and the fine protrusions for a plurality of optical elements. Since the antireflection effect is obtained only by the interference of the two layers of reflected light with the flat surface portion, the antireflection effect cannot be obtained in a wide band. By providing the second structure portion 22 on the tip plane portion of the first structure portion 21, the refractive index is continuously and smoothly changed even at the tip portion of the fine protrusion 20 for the optical element. As a result, the antireflection effect can be obtained in a wide band as compared with the case where the tip flat portion of the first structure portion 21 does not have the second structure portion and is all flat. Further, since the second structure portion 22 is provided on the tip flat portion of the first structure portion 21 in the fine protrusion 20 for the optical element, the tip of the fine protrusion 20 for the optical element is damaged as compared with the needle-shaped structure. It is difficult and has high scratch resistance.

また、第1構造体部21及び第2構造体部22からなる光学素子用微細突起20は、本実施形態では後述するように金型により基材11の光学有効面(有効光束を通過させる光学面)の成形と同時に当該光学有効面に成形されることから、基材11と同一の光学材料からなることが好ましい。 Further, in the present embodiment, as will be described later, the optical element microprojection 20 composed of the first structure portion 21 and the second structure portion 22 has an optically effective surface (optical light passing through the effective light flux) of the base material 11 by a mold. Since the surface) is formed on the optically effective surface at the same time, it is preferably made of the same optical material as the base material 11.

1-1.第1構造体部
図3を用いて第1構造体部及び第2構造体部の構造を説明する。図3の破線Opは光軸方向を表しており、当該光学素子の曲率の中心軸に平行な直線である。ここで、図3(a)は基材11の表面と光軸方向Opとが垂直の関係にある場合の第1構造体部21及び第2構造体部22からなる光学素子用微細突起20の縦断面を示している。そして、図3(b)は基材11の表面と光軸方向Opとが垂直以外の関係にある場合の第1構造体部21及び第2構造体部22からなる光学素子用微細突起20の縦断面を示している。このとき、上述の第1構造体部21は、以下の条件式(1)、(2)のうち、少なくとも1つの条件式を満たすことが好ましい。
1-1. First Structure Part The structures of the first structure part and the second structure part will be described with reference to FIG. The broken line Op in FIG. 3 represents the optical axis direction, and is a straight line parallel to the central axis of the curvature of the optical element. Here, FIG. 3A shows a microprojection 20 for an optical element composed of a first structure portion 21 and a second structure portion 22 when the surface of the base material 11 and the optical axis direction Op are in a vertical relationship. The vertical cross section is shown. 3 (b) shows the optical element microprojection 20 composed of the first structure portion 21 and the second structure portion 22 when the surface of the base material 11 and the optical axis direction Op are in a relationship other than vertical. The vertical cross section is shown. At this time, it is preferable that the above-mentioned first structure portion 21 satisfies at least one conditional expression among the following conditional expressions (1) and (2).

まず、条件式(1)について説明する。以下に示す条件式(1)は第1構造体部21の構造を特定するための、第1構造体部21の先端平面部の幅と投影面の幅との比を規定する式である。なお、本明細書においては、第1構造体部を光軸方向に投影した面を「投影面」というものとする。
0.20≦W1/W2≦0.75 ・・・(1)
但し、W1:第1構造体部21の先端平面部の幅。
W2:第1構造体部21の投影面の幅。
First, the conditional expression (1) will be described. The conditional expression (1) shown below is an expression that defines the ratio between the width of the tip plane portion of the first structure portion 21 and the width of the projection surface for specifying the structure of the first structure portion 21. In this specification, the surface on which the first structure portion is projected in the optical axis direction is referred to as a “projection surface”.
0.20 ≤ W1 / W2 ≤ 0.75 ... (1)
However, W1: the width of the tip plane portion of the first structure portion 21.
W2: The width of the projection plane of the first structure portion 21.

W1/W2が0.20未満である場合、後述の第2構造体部の形成が困難になるため好ましくない。また、W1/W2が0.75を越える場合、反射防止効果が低くなるため好ましくない。 If W1 / W2 is less than 0.20, it becomes difficult to form the second structure portion described later, which is not preferable. Further, when W1 / W2 exceeds 0.75, the antireflection effect is lowered, which is not preferable.

なお、条件式(1)の下限値は、0.38であることが好ましく、0.41であることがより好ましい。また、条件式(1)の上限値は、0.52であることが好ましく、0.47であることがより好ましい。 The lower limit of the conditional expression (1) is preferably 0.38, more preferably 0.41. The upper limit of the conditional expression (1) is preferably 0.52, more preferably 0.47.

次に、条件式(2)について説明する。以下に示す条件式(2)は第1構造体部21の構造を特定するための、第1構造体部21における構造体の高さと底面部の幅との比を規定する式である。
0.4≦H/W2<2.0 ・・・(2)
但し、H:第1構造体部21の先端平面部の中心から底面部までの光軸に平行な直線の長さ。
Next, the conditional expression (2) will be described. The conditional expression (2) shown below is an expression that defines the ratio between the height of the structure and the width of the bottom surface portion in the first structure portion 21 for specifying the structure of the first structure portion 21.
0.4 ≤ H / W2 <2.0 ... (2)
However, H: the length of a straight line parallel to the optical axis from the center of the tip plane portion of the first structure portion 21 to the bottom surface portion.

H/W2が0.4未満である場合、反射防止効果が十分でなくなるため好ましくない。また、H/W2が2.0以上である場合、構造体が破損しやすくなるため好ましくない。 If H / W2 is less than 0.4, the antireflection effect is not sufficient, which is not preferable. Further, when H / W2 is 2.0 or more, the structure is easily damaged, which is not preferable.

なお、条件式(2)の下限値は、0.56であることが好ましく0.65であることがより好ましい。また、条件式(2)の上限値は、0.95であることが好ましく、0.75であることが更に好ましい。 The lower limit of the conditional expression (2) is preferably 0.56, more preferably 0.65. The upper limit of the conditional expression (2) is preferably 0.95, more preferably 0.75.

更に、第1構造体部21は、条件式(1)、(2)の全てを満たすことによって、より反射防止効果が高くなる。 Further, the first structure portion 21 has a higher antireflection effect by satisfying all of the conditional expressions (1) and (2).

1-2.第2構造体部
図3における第2構造体部22は、以下の条件式(3)、(4)のうち、少なくとも1つの条件式を満たすことが好ましい。
1-2. Second Structure Part 22 The second structure part 22 in FIG. 3 preferably satisfies at least one conditional expression among the following conditional expressions (3) and (4).

条件式(3)について説明する。以下に示す条件式(3)は第2構造体部22の構造を特定するための、第2構造体部22の第1構造体部との接触面の内周形状の幅と、第1構造体部21における先端平面部の幅との比を規定する式である。
0<X1/W1≦0.95 ・・・(3)
但し、X1:第2構造体部22の、第1構造体部との接触面における内周の幅。
The conditional expression (3) will be described. The conditional expression (3) shown below is the width of the inner peripheral shape of the contact surface of the second structure portion 22 with the first structure portion and the first structure for specifying the structure of the second structure portion 22. It is an equation which defines the ratio with the width of the tip plane part in the body part 21.
0 <X1 / W1 ≦ 0.95 ・ ・ ・ (3)
However, X1: the width of the inner circumference of the second structure portion 22 on the contact surface with the first structure portion.

第2構造体22は環状突起であることから、X1/W1は0を超える数値となる。またX1/W1が0.95を越える場合、第2構造体部22の第1構造体部との接触面において、外周の大きさと内周の大きさとの差が少なくなることから、厚みの少ない環状突起となり、破損しやすくなるため好ましくない。 Since the second structure 22 is an annular projection, X1 / W1 has a numerical value exceeding 0. Further, when X1 / W1 exceeds 0.95, the difference between the size of the outer circumference and the size of the inner circumference on the contact surface of the second structure portion 22 with the first structure portion becomes small, so that the thickness is small. It is not preferable because it becomes an annular protrusion and is easily damaged.

なお、空気層と光学素子用微細突起との界面における屈折率の変化を滑らかにできることから、X1/W1はより小さいのが望ましい。 It is desirable that X1 / W1 is smaller because the change in the refractive index at the interface between the air layer and the fine protrusions for the optical element can be smoothed.

次に、条件式(4)について説明する。以下に示す条件式(4)は第2構造体部22の構造を特定するための、第2構造体部22の第1構造体部との接触面と第2構造体部22の先端部とを結ぶ光軸に平行な直線の長さと、第1構造体部21における先端平面部の幅との比を規定する式である。
0.3≦Z/W1≦1.0 ・・・(4)
但し、Z:第2構造体部22の第1構造体部との接触面と、第2構造体部22の先端部とを結ぶ光軸に平行な直線の長さ。
Next, the conditional expression (4) will be described. The conditional expression (4) shown below includes a contact surface of the second structure portion 22 with the first structure portion and a tip portion of the second structure portion 22 for specifying the structure of the second structure portion 22. It is an equation which defines the ratio of the length of the straight line parallel to the optical axis connecting
0.3 ≤ Z / W1 ≤ 1.0 ... (4)
However, Z: the length of a straight line parallel to the optical axis connecting the contact surface of the second structure portion 22 with the first structure portion and the tip end portion of the second structure portion 22.

Z/W1が0.3未満である場合、反射防止効果が不十分なため好ましくない。またZ/W1が1.0を越える場合、製造が困難になるうえ、破損しやすくなるため好ましくない。 If Z / W1 is less than 0.3, the antireflection effect is insufficient, which is not preferable. Further, when Z / W1 exceeds 1.0, it is not preferable because it is difficult to manufacture and it is easily damaged.

なお、条件式(4)の下限値は、0.35であることが好ましく、0.40であることがより好ましく、0.45であることがさらに好ましい。また、条件式(4)の上限値は、0.7であることが好ましく、0.6であることがより好ましい。 The lower limit of the conditional expression (4) is preferably 0.35, more preferably 0.40, and even more preferably 0.45. The upper limit of the conditional expression (4) is preferably 0.7, more preferably 0.6.

更に、第1構造体部21は、条件式(3)、(4)の全てを満たすことによって、より反射防止効果が高くなる。 Further, the first structure portion 21 has a higher antireflection effect by satisfying all of the conditional expressions (3) and (4).

2.反射防止構造付光学素子の構造における実施の形態
本件発明において、光学素子は特に限定されたものではなく、レンズ、フィルタ、ミラー等、種々のものを用いることができる。本実施形態に用いる光学素子の一例として、図4にメニスカスレンズである光学素子10を示す。光学素子10の基材11の光学面の形状は平面でも非平面でも構わない。非平面であれば、形状は、球面、非球面、自由曲面などどんな形状でも良い。そして、基材11は、結像に寄与する有効光束を通過させる光学面12および光学面13を備えている。一方、基材11の外周部はコバ部14となっている。また、破線Oは光学素子10の曲率の中心軸を示している。
2. 2. Embodiment in the structure of an optical element with an antireflection structure In the present invention, the optical element is not particularly limited, and various objects such as a lens, a filter, and a mirror can be used. As an example of the optical element used in this embodiment, FIG. 4 shows an optical element 10 which is a meniscus lens. The shape of the optical surface of the base material 11 of the optical element 10 may be flat or non-planar. The shape may be any shape such as a spherical surface, an aspherical surface, and a free curved surface as long as it is a non-planar surface. The base material 11 includes an optical surface 12 and an optical surface 13 that allow an effective luminous flux that contributes to image formation to pass through. On the other hand, the outer peripheral portion of the base material 11 is the edge portion 14. Further, the broken line O indicates the central axis of the curvature of the optical element 10.

本件発明に係る反射防止構造付光学素子は、上述の光学素子用微細突起20を基材の表面の少なくともいずれかの光学面に複数備えることが好ましい。図5に、本実施の形態の反射防止構造付光学素子30の略断面図を示す。光学面12及び光学面13の表面に、本件発明に係る光学素子用微細突起20を設けている。光学素子用微細突起20の屈折率が微細突起の先端から基材側にかけて連続的に変化すれば反射率は低減することから、光学素子用微細突起20の配置は、一定の間隔に従って配置しても良いし、六方配置でも良いし、間隔が不規則に配置しても良い。 It is preferable that the optical element with an antireflection structure according to the present invention is provided with a plurality of the above-mentioned fine protrusions 20 for an optical element on at least one of the optical surfaces of the surface of the base material. FIG. 5 shows a schematic cross-sectional view of the optical element 30 with an antireflection structure according to the present embodiment. The optical element microprojections 20 according to the present invention are provided on the surfaces of the optical surface 12 and the optical surface 13. Since the reflectance decreases if the refractive index of the fine protrusions 20 for the optical element changes continuously from the tip of the fine protrusions to the substrate side, the fine protrusions 20 for the optical element are arranged according to a certain interval. It may be arranged in six directions, or it may be arranged irregularly.

本件発明に係る反射防止構造付光学素子30の基材11の表面に光学素子用微細突起20を複数配置する場合、隣り合う光学素子用微細突起20同士の間隔はλ/5以上λ/2以下であることが好ましい。但し、λは入射光の波長(nm)である。隣り合う光学素子用微細突起20同士の間隔がλ/5未満であった場合、微細突起構造を形成するのが困難となるため好ましくない。隣り合う微細突起同士の間隔がλ/2を越える場合、不要な回折光が発生し、好ましくない。 When a plurality of optical element microprojections 20 are arranged on the surface of the base material 11 of the optical element 30 with an antireflection structure according to the present invention, the distance between adjacent optical element microprojections 20 is λ / 5 or more and λ / 2 or less. Is preferable. However, λ is the wavelength (nm) of the incident light. If the distance between the adjacent fine protrusions 20 for optical elements is less than λ / 5, it becomes difficult to form the fine protrusion structure, which is not preferable. When the distance between adjacent fine protrusions exceeds λ / 2, unnecessary diffracted light is generated, which is not preferable.

また、本件発明に係る反射防止構造付光学素子30は、基材11と光学素子用微細突起20、すなわち第1構造体部21と第2構造体部22とを形成する材料が同一であることが好ましい。基材11と光学素子用微細突起20とを形成する材料が同一であることによって、複数の光学素子用微細突起20を設けた反射防止構造付光学素子30を一体として成形することができる。 Further, in the optical element 30 with an antireflection structure according to the present invention, the material forming the base material 11 and the fine protrusions 20 for the optical element, that is, the first structure portion 21 and the second structure portion 22 is the same. Is preferable. Since the material for forming the base material 11 and the optical element fine protrusions 20 is the same, the optical element 30 with an antireflection structure provided with a plurality of optical element fine protrusions 20 can be integrally molded.

3.反射防止構造体付光学素子の特性における実施の形態
3-1.第1構造体部
本実施形態の第1構造体部21においては、先端平面部における第1構造体部21と空気の占有比は空気が大きく、基材と接触する部分での第1構造体部21と空気の占有比は第1構造体部21が大きい。そのため、第1構造体部21の先端平面部から底面部にかけて、屈折率が連続的になめらかに変化し、屈折率が大きく変化する部分がない。したがって、第1構造体部21からなる反射防止構造体は反射率が低く、透過率が高い。
3. 3. Embodiment 3-1 in the characteristics of the optical element with the antireflection structure. First Structure Part In the first structure part 21 of the present embodiment, the occupancy ratio of the air with the first structure part 21 in the tip plane part is large in air, and the first structure in the part in contact with the base material. The occupancy ratio of the portion 21 and the air is large in the first structure portion 21. Therefore, the refractive index changes continuously and smoothly from the tip flat portion to the bottom surface portion of the first structure portion 21, and there is no portion where the refractive index changes significantly. Therefore, the antireflection structure composed of the first structure portion 21 has a low reflectance and a high transmittance.

3-2.第2構造体部
本実施形態の第1構造体部21の先端平面部には第2構造体部22を設けている。第1構造体部21の先端平面部に第2構造体部22が無く、すべて平面である場合、入射光が反射し反射防止効果を損なう。一方、第1構造体部21の平面部に第2構造体部22を設けることによって、第1構造体部21の先端平面部に形成された第2構造体部22においても屈折率が連続的になめらかに変化する。これによって、第1構造体部21の先端平面部に第2構造体部22が無くすべて平面である場合に比べ、光学素子用微細突起20の反射防止効果が改善する。
3-2. Second Structure Part A second structure part 22 is provided on the tip plane portion of the first structure part 21 of the present embodiment. When the second structure portion 22 is not present in the tip plane portion of the first structure portion 21 and is all flat, the incident light is reflected and the antireflection effect is impaired. On the other hand, by providing the second structure portion 22 on the flat surface portion of the first structure portion 21, the refractive index is continuous also in the second structure portion 22 formed on the tip plane portion of the first structure portion 21. It changes smoothly. As a result, the antireflection effect of the fine protrusions 20 for the optical element is improved as compared with the case where the tip flat portion of the first structure portion 21 does not have the second structure portion 22 and is all flat.

また、第1構造体部21の先端平面部に形成されたる第2構造体部22は、第1構造体部21よりも小さいことから、第1構造体部21で効果のある波長よりも短い波長領域での反射防止効果にも寄与する。したがって、第1構造体部21のみである場合と比べて、光学素子用微細突起20の反射防止効果を発揮する波長帯域が広くなる。 Further, since the second structure portion 22 formed on the tip plane portion of the first structure portion 21 is smaller than the first structure portion 21, it is shorter than the wavelength effective in the first structure portion 21. It also contributes to the antireflection effect in the wavelength region. Therefore, as compared with the case where only the first structure portion 21 is used, the wavelength band in which the antireflection effect of the fine protrusions 20 for the optical element is exhibited becomes wider.

さらに、環状突起である第2構造体部22の内側は、第1構造体部21の先端平面部の一部が空気層に露出している。この、第2構造体部22の内側に露出した第1構造体部21の先端平面部の一部と、基材11の表面に複数配置された隣り合う光学素子用微細突起20の間の平面部とにおいて、それぞれの平面部からの反射光の干渉効果による反射防止効果も得ることができる。 Further, on the inside of the second structure portion 22 which is an annular protrusion, a part of the tip plane portion of the first structure portion 21 is exposed to the air layer. A plane between a part of the tip plane portion of the first structure portion 21 exposed inside the second structure portion 22 and a plurality of adjacent microprojections for optical elements 20 arranged on the surface of the base material 11. It is also possible to obtain an antireflection effect due to the interference effect of the reflected light from the respective flat surface portions.

3-3.反射防止構造体付光学素子
本実施形態の反射防止構造体付光学素子30は、光学素子の基材11の表面の少なくともいずれかの光学面に、上述の反射防止構造体である光学素子用微細突起20を複数備えている。そのため、反射率が低く、透過率が高い。この光学素子用微細突起20は、光学薄膜を用いた干渉効果による反射低減方法とは異なり、空気と光学素子との境界面において屈折率が連続的になめらかに変化する特性によって反射を低減する。主に、干渉効果を利用しないため、反射低減効果が及ぶ波長範囲が広く、光の入射角度が変化しても反射率の増加が少ない。
3-3. Optical element with antireflection structure The optical element 30 with antireflection structure of the present embodiment has the above-mentioned fine antireflection structure for an optical element on at least one optical surface of the surface of the base material 11 of the optical element. It is provided with a plurality of protrusions 20. Therefore, the reflectance is low and the transmittance is high. The fine projection 20 for an optical element reduces reflection due to the characteristic that the refractive index continuously and smoothly changes at the interface between air and the optical element, unlike the method of reducing reflection by the interference effect using an optical thin film. Mainly, since the interference effect is not used, the wavelength range covered by the reflection reduction effect is wide, and the increase in reflectance is small even if the incident angle of light changes.

そして、光学素子基材11、第1構造体部21及び第2構造体部22のそれぞれの屈折率は、以下の条件式(5)を満たすことが好ましい。条件式(5)を満たすことによって、広帯域で良好な反射防止効果を得ることができる。
第1構造体部の屈折率≦第2構造体部の屈折率≦光学素子基材の屈折率・・・(5)
The refractive index of each of the optical element base material 11, the first structure portion 21, and the second structure portion 22 preferably satisfies the following conditional expression (5). By satisfying the conditional expression (5), a good antireflection effect can be obtained in a wide band.
Refractive index of the first structure part ≤ Refractive index of the second structure part ≤ Refractive index of the optical element base material ... (5)

なお、光学素子基材11、第1構造体部21及び第2構造体部22のそれぞれの屈折率は、同じであることがより好ましい。光学素子基材11と第1構造体部21と、第2構造体部22との光学材料を同一とすることができるからである。 It is more preferable that the refractive indexes of the optical element base material 11, the first structure portion 21, and the second structure portion 22 are the same. This is because the optical materials of the optical element base material 11, the first structure portion 21, and the second structure portion 22 can be the same.

4.反射防止構造体付光学素子を備えた光学系における実施の形態
本件発明に係る光学系は、本件発明に係る反射防止構造付光学素子30を備えることが好ましい。光学系とは、光の反射や屈折などの性質を利用して物体の像をつくる器具や装置のことであり、カメラや望遠鏡、レーザー機器など光を扱う光学機器の構成要素である。本件発明に係る光学系は、本件発明に係る反射防止構造体付光学素子30を備えるため、広い波長の範囲で低反射率であり、光の入射角度が変化しても反射率の増加が少ない。また、反射防止構造体である光学素子用微細突起20は、第1構造体部21の先端平面部に第2構造体部22を設けているため、耐擦傷性が高い。
4. Embodiment in an Optical System with an Optical Element with an Antireflection Structure It is preferable that the optical system according to the present invention includes the optical element 30 with an antireflection structure according to the present invention. An optical system is an instrument or device that creates an image of an object by utilizing properties such as reflection and refraction of light, and is a component of optical equipment that handles light such as cameras, telescopes, and laser equipment. Since the optical system according to the present invention includes the optical element 30 with the antireflection structure according to the present invention, the reflectance is low in a wide wavelength range, and the increase in reflectance is small even if the incident angle of light changes. .. Further, the microprojection 20 for an optical element, which is an antireflection structure, has a second structure portion 22 provided on the tip flat portion of the first structure portion 21, and therefore has high scratch resistance.

5.反射防止構造体付光学素子の製造方法における実施の形態
5-1.金型
本件発明に係る金型は、上述した反射防止構造付光学素子30の反転形状を備えていることが好ましい。金型の材料は、硬さがHRC51以上であり、ドライエッチング可能なものであれば良く、炭化タングステン、SiC、グラッシーカーボン、NiPメッキ、窒化ケイ素などが好ましい。部材の離型性を向上させる目的で、金型表面に貴金属、および炭素膜を施しても良い。光学素子用微細突起を形成するためのパターンニング前の金型の製作は、特定の方法に限定されない。
5. Embodiment 5-1 in the method for manufacturing an optical element with an antireflection structure. Mold The mold according to the present invention preferably has the inverted shape of the above-mentioned optical element 30 with an antireflection structure. The mold material may be any material as long as it has a hardness of HRC51 or higher and can be dry-etched, and tungsten carbide, SiC, glassy carbon, NiP plating, silicon nitride and the like are preferable. A precious metal and a carbon film may be applied to the surface of the mold for the purpose of improving the releasability of the member. The production of the mold before patterning for forming the fine protrusions for the optical element is not limited to a specific method.

次に、金型に光学素子用微細突起を形成するためのパターンニングを行う。例えば、フォトリソグラフィ法を用いて、金型基材にフォトレジストを塗布し、タルボ干渉を利用した露光を用いてパターンを露光する。これを現像したのち、フォトレジストのパターンをもとにドライエッチングで金型にパターンを加工することで、本件発明に係る金型を作成することができる。 Next, patterning is performed to form fine protrusions for optical elements on the mold. For example, a photoresist is applied to the mold substrate using a photolithography method, and the pattern is exposed using exposure using Talbot interference. After developing this, the mold according to the present invention can be produced by processing the pattern into a mold by dry etching based on the photoresist pattern.

なお、金型へのパターンニング層の形成は、上述の方法に限定されるものではなく、例えば、次のようなナノインプリントを用いた方法で形成してもよい。まず、表面に光学素子用微細突起の配置パターンを施した平面のマスターモールドから、例えばPDMS(ポリジメチルシロキサン)などの柔らかい樹脂製のレプリカモールドを熱またはUVインプリントで作成する。次に、作成する光学素子の反転形状の金型に、UV硬化性のインプリントレジストをスピンコートする。そして、空圧によるプレス機構を持つインプリント装置を用いて、インプリントレジストを塗布した金型にレプリカモールドを圧着し、レプリカモールドを圧着後のインプリントレジストをUV硬化させた後、レプリカモールドを剥離する。そして、圧着で薄く残存したインプリントレジストをドライエッチングを用いて除去する。 The formation of the patterning layer on the mold is not limited to the above method, and may be formed by, for example, the following method using nanoimprint. First, a replica mold made of a soft resin such as PDMS (polydimethylsiloxane) is produced by heat or UV imprint from a flat master mold having an arrangement pattern of fine protrusions for optical elements on the surface. Next, a UV-curable imprint resist is spin-coated on the inverted mold of the optical element to be produced. Then, using an imprint device having a pneumatic press mechanism, the replica mold is crimped to the mold coated with the imprint resist, the replica mold is crimped, the imprint resist is UV-cured, and then the replica mold is formed. Peel off. Then, the imprint resist remaining thinly by crimping is removed by dry etching.

5-2.製造方法
本件発明に係る反射防止構造付光学素子の製造方法は、上述の反射防止構造体を形成可能であればどのような方法を用いても構わないが、射出成形、又はガラスモールド法と呼ばれる熱プレス成形を用いるのが好ましい。そして本件発明に係る反射防止構造付光学素子の製造に使用する金型は、本件発明に係る金型を用いるのが好ましい。
5-2. Manufacturing Method The manufacturing method of the optical element with an antireflection structure according to the present invention may be any method as long as the above-mentioned antireflection structure can be formed, but is called an injection molding method or a glass molding method. It is preferable to use hot press molding. The mold used for manufacturing the optical element with the antireflection structure according to the present invention is preferably the mold according to the present invention.

また、上述のように、基材11と第1構造体部21と第2構造体部22とを形成する材料が同一であることが好ましい。同一の材料を使用することによって、基材11と光学素子用微細突起20とを上述の製造方法で同時に成形が可能である。なお、本件発明はこれに限定されるものではなく、例えば基材11とは別の光学材料で形成された光学素子用微細突起20を備える光学素子を基材11と接合する構成を採用することもできる。 Further, as described above, it is preferable that the materials forming the base material 11, the first structure portion 21, and the second structure portion 22 are the same. By using the same material, the base material 11 and the fine protrusions 20 for optical elements can be simultaneously molded by the above-mentioned manufacturing method. The present invention is not limited to this, and for example, a configuration is adopted in which an optical element provided with fine protrusions 20 for an optical element formed of an optical material different from the base material 11 is joined to the base material 11. You can also.

以上説明した本件発明に係る実施の形態は、本件発明の一態様であり、本件発明の趣旨を逸脱しない範囲で適宜変更可能である。また、以下実施例を挙げて本件発明をより具体的に説明するが、本件発明は、以下の実施例に限定されるものではない。 The embodiment of the present invention described above is one aspect of the present invention and can be appropriately changed without departing from the spirit of the present invention. Further, the present invention will be described in more detail with reference to the following examples, but the present invention is not limited to the following examples.

A.光学素子用微細突起
実施例における反射防止構造付光学素子に設ける光学素子用微細突起は、図1が示すように、第1構造体部と第2構造体部とからなっている。
A. Fine protrusions for optical elements As shown in FIG. 1, the fine protrusions for optical elements provided in the optical element with an antireflection structure in the embodiment are composed of a first structure portion and a second structure portion.

B.非球面
反射防止構造付光学素子の光学面12は、有効径が13.62mmの非球面である。ここで、光軸に垂直に距離R離れた位置での光軸方向の面位置(サグ量)をSag(R)としたときの非球面の定義式を数式1に示す。
B. The optical surface 12 of the optical element with an aspherical antireflection structure is an aspherical surface having an effective diameter of 13.62 mm. Here, the definition formula of the aspherical surface when the surface position (sag amount) in the optical axis direction at a position perpendicular to the optical axis and away from the optical axis is Sag (R) is shown in Equation 1.

Figure 2022038039000002
但し、r:曲率半径。
K:円錐常数。
A3~A12:非球面多項式の高次係数。
Figure 2022038039000002
However, r: radius of curvature.
K: Conical constant.
A3 to A12: Higher-order coefficients of aspherical polynomials.

このとき、光学面12は、数式1において、以下の数値を満足する形状である。そして、この面の最大傾斜角は36.8°である。 At this time, the optical surface 12 has a shape that satisfies the following numerical values in Equation 1. The maximum inclination angle of this surface is 36.8 °.

r=12.1367
k=-10.0000
A3=-1.9184E-3
A4=2.5495E-3
A5=-9.0719E-4
A6=2.2378E-4
A7=-2.9361E-5
A8=6.0856E-7
A9=2.5801E-7
A10=-9.3494E-9
A11=-2.6479E-9
A12=1.8505E-10
r = 12.1367
k = -10.0000
A3 = -1.9184E-3
A4 = 2.5495E-3
A5 = -9.0719E-4
A6 = 2.2378E-4
A7 = -2.9361E-5
A8 = 6.0856E-7
A9 = 2.5801E-7
A10 = -9.3494E-9
A11 = -2.6479E-9
A12 = 1.8505E-10

反射防止構造付光学素子の光学面13は、有効径が8.95mmの非球面である。このとき、光学面13は、数式1において、以下の数値を満足する形状である。そして、この面の最大傾斜角は17.6°である。 The optical surface 13 of the optical element with an antireflection structure is an aspherical surface having an effective diameter of 8.95 mm. At this time, the optical surface 13 has a shape that satisfies the following numerical values in Equation 1. The maximum inclination angle of this surface is 17.6 °.

r=13.2858
k=0.6453
A3=0.0
A4=4.029E-5
A5=0.0
A6=1.1353E-5
A7=0.0
A8=-9.7868E-7
A9=0.0
A10=4.7507E-8
A11=0.0
A12=-1.0466E-9
r = 13.2858
k = 0.6453
A3 = 0.0
A4 = 4.029E-5
A5 = 0.0
A6 = 1.1353E-5
A7 = 0.0
A8 = -9.7868E-7
A9 = 0.0
A10 = 4.7507E-8
A11 = 0.0
A12 = -1.0466E-9

C.金型
反射防止構造付光学素子の製造に用いる金型の製造について説明する。まず、金型母材としてSUS鋼材を用い、上述で説明した光学素子の各面の反転形状となるよう加工する。具体的には、円筒材料のSUS鋼材を研削加工機で光学駒の形状に加工を行ったのち、光学面のみ無電解NiPめっきを施した。そして、制御分解能1nmの非球面切削加工機で、上述の光学面となるよう加工した。その後、光学面の光学研磨を行い、最後に有機溶剤での洗浄を行った。このようにして得られた金型母材の表面粗さはZygo Corporation製走査型白色干渉計でRa1.0nmであった。
C. Mold The manufacture of a mold used for manufacturing an optical element with an antireflection structure will be described. First, a SUS steel material is used as a mold base material, and processing is performed so that each surface of the optical element described above has an inverted shape. Specifically, SUS steel, which is a cylindrical material, was processed into the shape of an optical piece by a grinding machine, and then electroless NiP plating was performed only on the optical surface. Then, it was machined with an aspherical surface cutting machine having a control resolution of 1 nm so as to have the above-mentioned optical surface. Then, the optical surface was optically polished, and finally washed with an organic solvent. The surface roughness of the mold base material thus obtained was Ra 1.0 nm with a scanning white interferometer manufactured by Zygo Corporation.

次に、金型表面に、CVD法によって、エッチング層となるSiN層を2000nm成膜した。このとき成膜法は、特にCVD法に限るものではなく、スパッタ法などであっても構わない。その後、SiN膜表面にレジスト膜によるパターンニング層を形成した。パターンニング層の形成方法は特に限定されないが、ここでは、以下のように実施した。まず、ポジ型フォトレジストをSiN膜表面にスピンコートした。次にマスクからのタルボ干渉光を統合できるよう制御された干渉露光装置にピッチ340nmで六方配置に配列されたφ330nmのパターンを持つ位相マスクをセットし、金型上面から露光を行った。最後に現像し、感光部を溶解することで、SiN膜表面に340nmピッチで六方配置された330nmの穴径分布をもつレジスト膜によるパターンニング層を形成した。 Next, a SiN layer to be an etching layer was formed on the surface of the mold by a CVD method at 2000 nm. At this time, the film forming method is not particularly limited to the CVD method, and may be a sputtering method or the like. Then, a patterning layer made of a resist film was formed on the surface of the SiN film. The method for forming the patterning layer is not particularly limited, but here, it was carried out as follows. First, a positive photoresist was spin-coated on the surface of the SiN film. Next, a phase mask having a φ330 nm pattern arranged in a hexagonal arrangement at a pitch of 340 nm was set in an interference exposure device controlled so that the Talbot interference light from the mask could be integrated, and exposure was performed from the upper surface of the mold. Finally, by developing and dissolving the photosensitive portion, a patterning layer made of a resist film having a hole diameter distribution of 330 nm arranged in six directions at a pitch of 340 nm was formed on the surface of the SiN film.

以上のようにしてレジストのパターニング層を形成した金型に対し、ドライエッチング装置にて、ドライエッチングを行う。ドライエッチング装置で、CHF3、CF4ガス下で4分間エッチングを行った。そののち、不要なレジスト膜のパターニング層を除去し、実施例における金型を作成した。 The mold on which the patterning layer of the resist is formed as described above is dry-etched by a dry etching apparatus. Etching was performed for 4 minutes under CHF3 and CF4 gas with a dry etching apparatus. After that, an unnecessary patterning layer of the resist film was removed, and a mold in the example was prepared.

D.成形
実施例における反射防止構造付光学素子は、前述の金型を用いた射出成形によって成形する。射出成形装置は、ファナック株式会社製の射出成型機を用いた。射出成形に用いる光学樹脂は、ガラス転移温度が145℃のポリカーボネートである。また、射出成形時の金型温度は155℃、保圧95MPとした。この金型温度を保持した状態で離形を行うことによって、離形中に金型と樹脂との界面において樹脂の変形が起こり、第1構造体部の平面部の外縁に沿って環状突起である第2構造体部が形成された。
D. Molding The optical element with antireflection structure in the embodiment is molded by injection molding using the above-mentioned mold. As the injection molding apparatus, an injection molding machine manufactured by FANUC Corporation was used. The optical resin used for injection molding is polycarbonate having a glass transition temperature of 145 ° C. The mold temperature at the time of injection molding was 155 ° C. and the holding pressure was 95 MP. By performing the mold release while maintaining the mold temperature, the resin is deformed at the interface between the mold and the resin during the mold release, and the annular protrusion is formed along the outer edge of the flat surface portion of the first structure portion. A second structural part was formed.

この構造体の断面形状をAFM(Atomic Force Microscope:原子間力顕微鏡)を用いて測定したところ、円錐台状の構造体の上に、円環状の構造体を持つ構造であった。そして、当該光学素子用微細突起の第1構造体部は、底面の径が330nm、上面の径が220nm、高さが200nmであった。このとき、条件式(1)におけるW1/W2の値は0.67、条件式(2)におけるH/W2の値は0.606であった。また、第2構造体部である環状突起の高さは100nm、幅は10nmであり、環状突起の断面形状は放物線状であった。このとき、条件式(3)におけるX1/W1は0.91、条件式(4)におけるZ/W1は0.455であった。 When the cross-sectional shape of this structure was measured using an AFM (Atomic Force Microscope), it was a structure having an annular structure on a truncated cone-shaped structure. The first structure portion of the fine protrusion for the optical element had a bottom surface diameter of 330 nm, a top surface diameter of 220 nm, and a height of 200 nm. At this time, the value of W1 / W2 in the conditional expression (1) was 0.67, and the value of H / W2 in the conditional expression (2) was 0.606. The height of the annular projection, which is the second structure portion, was 100 nm, the width was 10 nm, and the cross-sectional shape of the annular projection was parabolic. At this time, X1 / W1 in the conditional expression (3) was 0.91, and Z / W1 in the conditional expression (4) was 0.455.

このようにして作成した反射防止構造付光学素子は、使用波長が905nmであり、反射防止構造付光学素子の光学面に、平面部を有する第1構造体部と、第1構造体部の平面部の外縁に沿って設けた環状突起である第2構造体部とからなる光学素子用微細突起を複数備えたものである。そして、光学素子基材と、第1構造体部と、第2構造体部とを形成する材料が同一である。すなわち、光学素子基材、第1構造体部及び第2構造体部のそれぞれの屈折率も同じ値である。 The optical element with an antireflection structure thus produced has a working wavelength of 905 nm, and has a first structure portion having a flat surface portion on the optical surface of the optical element with the antireflection structure and a flat surface of the first structure portion. It is provided with a plurality of fine protrusions for an optical element, which are composed of a second structure portion which is an annular protrusion provided along the outer edge of the portion. The material forming the optical element base material, the first structure portion, and the second structure portion is the same. That is, the refractive indexes of the optical element base material, the first structure portion, and the second structure portion have the same value.

〔比較例〕
比較例では、光学素子の形状及び材質は実施例と同一のものとした。また、金型も実施例と同じ条件で作成した。そして、実施例と同じように、金型を用いた射出成形によって反射防止構造体付光学素子を成形した。このとき、射出成形装置は、実施例と同様にファナック株式会社製の射出成型機を用いているが、金型温度を任意に制御できるように温調機を取り付けた。次に、金型温度を155℃、保圧95MPで成型したのち、金型温度を135℃まで下げたうえで離形を行った。金型温度を95℃にすることによって、離形時における上述のような金型と樹脂との界面における樹脂の変形が起こらないようにした。
[Comparative example]
In the comparative example, the shape and material of the optical element are the same as those in the embodiment. The mold was also created under the same conditions as in the examples. Then, as in the embodiment, the optical element with the antireflection structure was molded by injection molding using a mold. At this time, the injection molding apparatus uses an injection molding machine manufactured by FANUC Corporation as in the embodiment, but a temperature controller is attached so that the mold temperature can be arbitrarily controlled. Next, the mold was molded at a mold temperature of 155 ° C. and a holding pressure of 95 MP, and then the mold temperature was lowered to 135 ° C. and then mold release was performed. By setting the mold temperature to 95 ° C., deformation of the resin at the interface between the mold and the resin as described above at the time of mold release was prevented from occurring.

このようにして作成した反射防止構造付光学素子は、その光学面に、先端平面部を有する第1構造体部のみからなる光学素子用微細突起を複数備えたものである。この構造体の断面形状をAFMを用いて測定したところ、円錐台状の構造であり、底面の径は330nm、上面の径は220nm、高さは200nmだった。 The optical element with an antireflection structure thus produced is provided with a plurality of fine protrusions for an optical element having only a first structure portion having a tip flat portion on the optical surface thereof. When the cross-sectional shape of this structure was measured using AFM, it was a truncated cone-shaped structure, and the diameter of the bottom surface was 330 nm, the diameter of the top surface was 220 nm, and the height was 200 nm.

〔評価結果〕
実施例及び比較例で記載した反射防止構造付光学素子の反射率を、大塚電子株式会社製膜厚測定機FE3000で測定した。図6に、実施例及び比較例における反射率特性の評価結果を示す。図6の横軸は波長(nm)、縦軸は反射率(%)を示す。図6から、実施例の反射防止構造付光学素子は優れた反射率特性を有していることが明らかとなった。一方、比較例の反射防止構造付光学素子は、実施例の反射防止構造付光学素子と比べ、反射率特性が劣っていることが明らかとなった。したがって、本件発明に係る反射防止構造付光学素子は、その光学面に、先端平面部を有する第1構造体部と、第1構造体部の先端平面部の外縁に沿って設けた環状突起である第2構造体部とからなる光学素子用微細突起を複数備えることによって、良好な反射率特性を有することが明らかとなった。
〔Evaluation results〕
The reflectance of the optical element with an antireflection structure described in Examples and Comparative Examples was measured by a film thickness measuring machine FE3000 manufactured by Otsuka Electronics Co., Ltd. FIG. 6 shows the evaluation results of the reflectance characteristics in Examples and Comparative Examples. The horizontal axis of FIG. 6 shows the wavelength (nm), and the vertical axis shows the reflectance (%). From FIG. 6, it was clarified that the optical element with the antireflection structure of the embodiment has excellent reflectance characteristics. On the other hand, it was clarified that the optical element with the antireflection structure of the comparative example was inferior in the reflectance characteristic to the optical element with the antireflection structure of the example. Therefore, the optical element with an antireflection structure according to the present invention has a first structure portion having a tip flat portion and an annular protrusion provided along the outer edge of the tip flat portion of the first structure portion on the optical surface thereof. It has been clarified that it has good reflectance characteristics by providing a plurality of fine protrusions for an optical element composed of a certain second structure portion.

本件発明に係る光学素子用微細突起は、先端平面部を有する第1構造体部と、第1構造体部の先端平面部の外縁に沿って設けた環状突起である第2構造体部とからなることによって、屈折率が連続的になめらかに変化する特性を有し、かつ、耐擦傷性が高い。また、上述の特性を有する光学素子用微細突起を光学面に複数備える本件発明に係る反射防止構造付光学素子は、広い帯域幅において良好な反射防止効果を有し、射出成形などによって作成可能であるため生産性が高い。したがって、車載機器のパネルや光学機器、その他耐擦傷性を必要とされる機器に好適である。 The fine protrusion for an optical element according to the present invention is composed of a first structure portion having a tip plane portion and a second structure portion which is an annular protrusion provided along the outer edge of the tip plane portion of the first structure portion. As a result, the refractive index has the property of continuously and smoothly changing, and the scratch resistance is high. Further, the optical element with an antireflection structure according to the present invention, which has a plurality of fine protrusions for an optical element having the above-mentioned characteristics on the optical surface, has a good antireflection effect in a wide bandwidth and can be produced by injection molding or the like. Because of this, productivity is high. Therefore, it is suitable for panels of in-vehicle devices, optical devices, and other devices that require scratch resistance.

10 光学素子
11 基材
12 光学面
13 光学面
14 コバ部
20 光学素子用微細突起
21 第1構造体部
22 第2構造体部
30 反射防止構造体付光学素子
10 Optical element 11 Base material 12 Optical surface 13 Optical surface 14 Edge part 20 Fine protrusion for optical element 21 First structure part 22 Second structure part 30 Optical element with antireflection structure

Claims (13)

光学素子基材の表面に設け反射防止効果を得るための光学素子用微細突起であって、
前記光学素子用微細突起は、先端平面部が形成された第1構造体部と、前記第1構造体部の前記先端平面部の外縁に沿って形成された環状突起である第2構造体部とからなることを特徴とする光学素子用微細突起。
It is a fine protrusion for an optical element provided on the surface of an optical element base material to obtain an antireflection effect.
The fine protrusions for optical elements are a first structure portion in which a tip flat portion is formed, and a second structure portion which is an annular protrusion formed along the outer edge of the tip flat portion of the first structure portion. A fine protrusion for an optical element, which is characterized by being composed of.
前記第1構造体部の形状は、円錐台状又は角錐台状である請求項1に記載の光学素子用微細突起。 The fine protrusion for an optical element according to claim 1, wherein the shape of the first structure portion is a truncated cone shape or a pyramidal cone shape. 前記第1構造体部は、以下の条件式を満たす、請求項1又は請求項2に記載の光学素子用微細突起。
0.20≦W1/W2≦0.75 ・・・(1)
0.4≦H/W2<2.0 ・・・(2)
但し、W1:前記第1構造体部の前記先端平面部の幅。
W2:前記第1構造体部の光軸方向の投影面の幅。
H:前記第1構造体部の前記先端平面部の中心から底面部までの光軸に平行な直線の長さ。
The fine protrusion for an optical element according to claim 1 or 2, wherein the first structure portion satisfies the following conditional expression.
0.20 ≤ W1 / W2 ≤ 0.75 ... (1)
0.4 ≤ H / W2 <2.0 ... (2)
However, W1: the width of the tip plane portion of the first structure portion.
W2: The width of the projection surface in the optical axis direction of the first structure portion.
H: The length of a straight line parallel to the optical axis from the center of the tip plane portion of the first structure portion to the bottom surface portion.
前記第2構造体部は、以下の条件式を満たす、請求項1から請求項3のいずれか一項に記載の光学素子用微細突起。
0<X1/W1≦0.95 ・・・(3)
0.3≦Z/W1≦1.0 ・・・(4)
但し、X1:前記第2構造体部の前記第1構造体部との接触面における内周の幅。
Z:前記第2構造体部の前記第1構造体部との接触面と、前記第2構造体部の先端部とを結ぶ光軸に平行な直線の長さ。
The fine protrusion for an optical element according to any one of claims 1 to 3, wherein the second structure portion satisfies the following conditional expression.
0 <X1 / W1 ≦ 0.95 ・ ・ ・ (3)
0.3 ≤ Z / W1 ≤ 1.0 ... (4)
However, X1: the width of the inner circumference of the second structure portion on the contact surface with the first structure portion.
Z: The length of a straight line parallel to the optical axis connecting the contact surface of the second structure portion with the first structure portion and the tip end portion of the second structure portion.
前記光学素子基材、前記第1構造体部及び前記第2構造体部のそれぞれの屈折率は、以下の条件式を満たす、請求項1から請求項4のいずれか一項に記載の光学素子用微細突起。
第1構造体部の屈折率≦第2構造体部の屈折率≦光学素子基材の屈折率・・・(5)
The optical element according to any one of claims 1 to 4, wherein the refractive index of each of the optical element base material, the first structure portion, and the second structure portion satisfies the following conditional expression. For fine protrusions.
Refractive index of the first structure part ≤ Refractive index of the second structure part ≤ Refractive index of the optical element base material ... (5)
請求項1から請求項5のいずれか一項に記載の光学素子用微細突起を、前記光学素子基材の表面の少なくともいずれかの光学面に複数備えることを特徴とする反射防止構造付光学素子。 An optical element with an antireflection structure, characterized in that a plurality of fine protrusions for an optical element according to any one of claims 1 to 5 are provided on at least one optical surface of the surface of the optical element substrate. .. 請求項6に記載の反射防止構造付光学素子であって、複数の前記光学素子用微細突起の間隔がλ/5以上λ/2以下である反射防止構造付光学素子。
但し、λ:入射光の波長(nm)。
The optical element with an antireflection structure according to claim 6, wherein the distance between the plurality of fine protrusions for the optical element is λ / 5 or more and λ / 2 or less.
However, λ: wavelength of incident light (nm).
前記光学素子基材と前記第1構造体部と前記第2構造体部とを形成する材料が同一である請求項6又は請求項7に記載の反射防止構造付光学素子。 The optical element with an antireflection structure according to claim 6 or 7, wherein the material forming the optical element base material, the first structure portion, and the second structure portion is the same. 前記光学素子基材の前記光学面の形状が非平面である、請求項6から請求項8のいずれか一項に記載の反射防止構造付光学素子。 The optical element with an antireflection structure according to any one of claims 6 to 8, wherein the shape of the optical surface of the optical element base material is non-planar. 請求項6から請求項9のいずれか一項に記載の反射防止構造付光学素子を備えることを特徴とする光学系。 An optical system comprising the optical element with an antireflection structure according to any one of claims 6 to 9. 請求項6に記載の反射防止構造付光学素子の反転形状を備えることを特徴とする金型。 A mold comprising an inverted shape of the optical element with an antireflection structure according to claim 6. 請求項6から請求項9のいずれか一項に記載の反射防止構造付光学素子の製造方法であって、
射出成形又は熱プレス成形を用いることを特徴とする反射防止構造付光学素子の製造方法。
The method for manufacturing an optical element with an antireflection structure according to any one of claims 6 to 9.
A method for manufacturing an optical element with an antireflection structure, which comprises using injection molding or hot press molding.
成形に請求項11に記載の金型を用いる、請求項12に記載の反射防止構造付光学素子の製造方法。 The method for manufacturing an optical element with an antireflection structure according to claim 12, wherein the mold according to claim 11 is used for molding.
JP2020142322A 2020-08-26 2020-08-26 Fine projection for optical element Pending JP2022038039A (en)

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