JP2022068167A - 固有の形態を有する立方晶窒化ホウ素粒子 - Google Patents
固有の形態を有する立方晶窒化ホウ素粒子 Download PDFInfo
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- 239000002245 particle Substances 0.000 title claims abstract description 185
- 229910052582 BN Inorganic materials 0.000 title claims abstract description 30
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims abstract description 30
- 229910052751 metal Inorganic materials 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 29
- 239000008188 pellet Substances 0.000 claims abstract description 27
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- 238000004519 manufacturing process Methods 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 31
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 24
- 238000000576 coating method Methods 0.000 claims description 21
- 229910052782 aluminium Inorganic materials 0.000 claims description 17
- 239000011248 coating agent Substances 0.000 claims description 17
- 239000013078 crystal Substances 0.000 claims description 7
- 238000009826 distribution Methods 0.000 claims description 2
- 239000004615 ingredient Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 abstract description 26
- 230000002708 enhancing effect Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 description 23
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 21
- 239000003082 abrasive agent Substances 0.000 description 15
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- 238000006243 chemical reaction Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 6
- 230000014759 maintenance of location Effects 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 5
- 239000010936 titanium Substances 0.000 description 5
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- 230000004580 weight loss Effects 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
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- 150000002739 metals Chemical class 0.000 description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
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- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
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- 239000000243 solution Substances 0.000 description 2
- 238000010792 warming Methods 0.000 description 2
- 229910052580 B4C Inorganic materials 0.000 description 1
- 239000004484 Briquette Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
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- 229910003465 moissanite Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000005453 pelletization Methods 0.000 description 1
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- 238000010298 pulverizing process Methods 0.000 description 1
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- 230000009467 reduction Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
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- 239000004575 stone Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
- C01B21/0648—After-treatment, e.g. grinding, purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/072—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with aluminium
- C01B21/0722—Preparation by direct nitridation of aluminium
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
- C09K3/1445—Composite particles, e.g. coated particles the coating consisting exclusively of metals
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
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- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
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Abstract
Description
本出願は、2012年10月3日に「固有の形態を有する立方晶窒化ホウ素粒子」という発明の名称で出願された仮出願第61/709,250号の優先権を主張する。
さよりも少なくなる可能性がある。
う。当業者には、本発明の範囲を逸脱することなく、又は本発明のいかなる利点も犠牲にすることなく、方法のバリエーションが明らかになるであろう。
本発明の明細書と請求項では、次の用語を以下に示す定義に従って用いる。
表面粗さ=凸周囲長/周囲長
真球度=4πA/p2
性と再現性がある方法であることが認識されている。ここではCLEMEX画像分析装置を利用したが、データを再現する同様の装置を利用できる。
は、圧縮された物体を、未焼結体として一体に保持するのにも役立つ。
酸を用いるか、追加の溶解処理が必要となる可能性がある。次に、例えば水の中でCBN粒子を洗浄して酸と残留物を除去する。その後、CBN粒子を、炉の中で、大気中で、マイクロ波乾燥で、又は公知の他の乾燥法で乾燥させる。
本発明をいくつかの実施態様に関して説明してきたが、当業者には、開示した発明に関し、上に提示した詳細な説明と矛盾しない多くの代替例、改変、及びバリエーションが可能であることが明らかであろう。また、当業者には、開示したさまざまな実施態様のいくつかの特徴を、開示した他の任意の実施態様又はその代替例の特徴と組み合わせて利用して、この明細書には明示的に説明しなかったが、本発明が組み込まれ、かつ想定する用途又は性能条件にさらによく合致した追加の実施態様を生み出せることも明らかであろう。したがって本発明の精神に含まれるそのような代替例、改変、及びバリエーションはすべて、添付の請求項の範囲に包含されるものとする。
Claims (20)
- 不規則な表面を有する立方晶窒化ホウ素粒子であって、前記粒子の表面粗さが約0.95未満である粒子。
- 前記粒子の表面粗さが約0.50~約0.80である、請求項1に記載の粒子。
- 前記粒子の真球度が約0.70未満である、請求項1又は2に記載の粒子。
- 前記粒子の表面積が、同じ粒径分布を有する従来の立方晶窒化ホウ素粒子よりも約20%大きい、請求項1~3のいずれか1項に記載の粒子。
- 前記粒子のサイズが約0.1~約500μmである、請求項1~4のいずれか1項に記載の粒子。
- 前記粒子が1つ以上のスパイクを有する、請求項1~5のいずれか1項に記載の粒子。
- 前記粒子が1つ以上のピットを備える、請求項1~6のいずれか1項に記載の粒子。
- 前記ピットの深さが、前記粒子の最大長の約5%~約70%の範囲である、請求項7に記載の粒子。
- 前記ピットの深さが、前記粒子の最大長の約40%~約60%の範囲である、請求項8に記載の粒子。
- 前記粒子が金属被覆を有する、請求項1~9のいずれか1項に記載の粒子。
- 真球度が約0.70未満である立方晶窒化ホウ素粒子。
- 前記粒子の真球度が約0.2~約0.5である、請求項11に記載の粒子。
- 前記粒子の真球度が約0.25~約0.4である、請求項11に記載の粒子。
- 下記のステップを含む、固有の表面形態を有する研磨粒子の製造方法:
複数の研磨粒子を提供するステップ;
反応性金属粉末を前記研磨粒子と混合するステップ;
混合した成分を圧縮してペレットにするステップ;
前記ペレットを加熱するステップ;及び
改質された研磨粒子を回収するステップ。 - 前記研磨粒子が立方晶窒化ホウ素粒子である、請求項14に記載の方法。
- 前記立方晶窒化ホウ素粒子が単結晶CBN粒子である、請求項15に記載の方法。
- 前記反応性金属粉末がアルミニウムである、請求項14~16のいずれか1項に記載の方法。
- 前記加熱ステップが、金属で被覆された前記粒子を、少なくとも約1200℃に加熱することを含む、請求項14~17のいずれか1項に記載の方法。
- 金属粉末と研磨粒子の比が1:10~10:1である、請求項14~18のいずれか1項に記載の方法。
- 前記改質された研磨粒子が、前記方法で処理されていない従来の研磨粒子と比べて、重量損失の約5%を超える平均重量損失を有する、請求項14~19のいずれか1項に記載の方法。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261709250P | 2012-10-03 | 2012-10-03 | |
| US61/709,250 | 2012-10-03 | ||
| JP2020116404A JP2020183342A (ja) | 2012-10-03 | 2020-07-06 | 固有の形態を有する立方晶窒化ホウ素粒子 |
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| JP2020116404A Division JP2020183342A (ja) | 2012-10-03 | 2020-07-06 | 固有の形態を有する立方晶窒化ホウ素粒子 |
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| JP2022068167A true JP2022068167A (ja) | 2022-05-09 |
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| JP2015535671A Active JP6820657B2 (ja) | 2012-10-03 | 2013-09-17 | 固有の形態を有する立方晶窒化ホウ素粒子 |
| JP2020116404A Pending JP2020183342A (ja) | 2012-10-03 | 2020-07-06 | 固有の形態を有する立方晶窒化ホウ素粒子 |
| JP2022010010A Pending JP2022068167A (ja) | 2012-10-03 | 2022-01-26 | 固有の形態を有する立方晶窒化ホウ素粒子 |
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| JP2020116404A Pending JP2020183342A (ja) | 2012-10-03 | 2020-07-06 | 固有の形態を有する立方晶窒化ホウ素粒子 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20140090309A1 (ja) |
| EP (1) | EP2904063B1 (ja) |
| JP (3) | JP6820657B2 (ja) |
| KR (1) | KR101845141B1 (ja) |
| CN (1) | CN104704080B (ja) |
| ES (1) | ES2918458T3 (ja) |
| WO (1) | WO2014055230A1 (ja) |
| ZA (1) | ZA201501908B (ja) |
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| IL299114A (en) * | 2015-10-06 | 2023-02-01 | Hope City | Chimeric antigen receptors targeting PSCA |
| TWI875711B (zh) * | 2018-09-17 | 2025-03-11 | 美商戴蒙創新公司 | 具有高蝕刻粒子表面及高韌性指數的立方氮化硼粒子群 |
| US11208324B2 (en) * | 2019-02-28 | 2021-12-28 | Sumitomo Electric Hardmetal Corp. | Polycrystalline cubic boron nitride and method for manufacturing the same |
| CN110484206B (zh) * | 2019-08-23 | 2021-08-20 | 河南富莱格超硬材料有限公司 | 一种立方氮化硼磨料表面处理方法 |
| JP2022104437A (ja) * | 2020-12-28 | 2022-07-08 | 株式会社三洋物産 | 遊技機 |
| CN116867732A (zh) * | 2021-03-30 | 2023-10-10 | 株式会社德山 | 氮化铝颗粒状粉末以及树脂组合物 |
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| ZA781390B (en) * | 1978-03-09 | 1979-04-25 | De Beers Ind Diamond | The metal coating of abrasive particles |
| US4389223A (en) * | 1981-02-09 | 1983-06-21 | General Electric Company | Surface characteristics of boron rich cubic boron nitride |
| US4647546A (en) * | 1984-10-30 | 1987-03-03 | Megadiamond Industries, Inc. | Polycrystalline cubic boron nitride compact |
| DE3625743A1 (de) * | 1986-07-30 | 1988-02-11 | Winter & Sohn Ernst | Verfahren zum bearbeiten von diamantkoernern |
| JP2739139B2 (ja) * | 1989-03-06 | 1998-04-08 | 昭和電工株式会社 | 六角板状立方晶窒化ほう素及びその合成方法 |
| US4951427A (en) * | 1989-05-30 | 1990-08-28 | General Electric Company | Refractory metal oxide coated abrasives and grinding wheels made therefrom |
| HUT62831A (en) * | 1991-09-12 | 1993-06-28 | Gen Electric | Method for producing covered cubed leather-nitride abrasive grain, abrasive grain and grinding tool by using the same |
| ATE260140T1 (de) * | 1999-11-19 | 2004-03-15 | Element Six Pty Ltd | Cluster von kubischem bornitrid |
| US7261752B2 (en) * | 2002-09-24 | 2007-08-28 | Chien-Min Sung | Molten braze-coated superabrasive particles and associated methods |
| JP3908259B2 (ja) * | 2003-02-03 | 2007-04-25 | 昭和電工株式会社 | 立方晶窒化ホウ素合成用触媒 |
| JP2006088243A (ja) * | 2004-09-22 | 2006-04-06 | Toyoda Mach Works Ltd | 砥粒及び砥石 |
| WO2006032982A1 (en) * | 2004-09-23 | 2006-03-30 | Element Six (Pty) Ltd | Coated abrasive materials and method of manufacture |
| US7562858B2 (en) * | 2005-03-16 | 2009-07-21 | Diamond Innovations, Inc. | Wear and texture coatings for components used in manufacturing glass light bulbs |
| AU2006307587A1 (en) * | 2005-10-28 | 2007-05-03 | Element Six (Production) (Pty) Ltd | Cubic boron nitride compact |
| KR101441153B1 (ko) * | 2006-12-13 | 2014-09-17 | 다이아몬드 이노베이션즈, 인크. | 피삭성이 향상된 연마 콤팩트 |
| KR20110076924A (ko) * | 2008-09-16 | 2011-07-06 | 다이아몬드 이노베이션즈, 인크. | 특유의 형태를 갖는 연마제 입자 |
| CN102209766A (zh) * | 2008-09-16 | 2011-10-05 | 戴蒙得创新股份有限公司 | 具有独特特征部分的磨粒 |
| US8927101B2 (en) * | 2008-09-16 | 2015-01-06 | Diamond Innovations, Inc | Abrasive particles having a unique morphology |
-
2013
- 2013-09-17 US US14/028,965 patent/US20140090309A1/en not_active Abandoned
- 2013-09-17 CN CN201380052054.6A patent/CN104704080B/zh active Active
- 2013-09-17 ES ES13766871T patent/ES2918458T3/es active Active
- 2013-09-17 JP JP2015535671A patent/JP6820657B2/ja active Active
- 2013-09-17 EP EP13766871.1A patent/EP2904063B1/en active Active
- 2013-09-17 WO PCT/US2013/060095 patent/WO2014055230A1/en not_active Ceased
- 2013-09-17 KR KR1020157008580A patent/KR101845141B1/ko active Active
-
2015
- 2015-03-19 ZA ZA2015/01908A patent/ZA201501908B/en unknown
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2020
- 2020-07-06 JP JP2020116404A patent/JP2020183342A/ja active Pending
-
2022
- 2022-01-26 JP JP2022010010A patent/JP2022068167A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| ZA201501908B (en) | 2020-02-26 |
| JP2015536891A (ja) | 2015-12-24 |
| WO2014055230A1 (en) | 2014-04-10 |
| KR20150059755A (ko) | 2015-06-02 |
| US20140090309A1 (en) | 2014-04-03 |
| EP2904063B1 (en) | 2022-06-01 |
| KR101845141B1 (ko) | 2018-04-03 |
| JP6820657B2 (ja) | 2021-01-27 |
| EP2904063A1 (en) | 2015-08-12 |
| CN104704080A (zh) | 2015-06-10 |
| JP2020183342A (ja) | 2020-11-12 |
| ES2918458T3 (es) | 2022-07-15 |
| CN104704080B (zh) | 2017-04-26 |
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