JP2021111443A - Vacuum valve - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a vacuum valve in which radiant heat of an arc discharge is accumulated and a portion inside the vacuum valve is prevented from being deformed when the vacuum valve is miniaturized.
SOLUTION: In the vacuum valve 100 according to the present disclosure, a wavelength selective heat radiation absorber 13c that absorbs electromagnetic waves in a preset wavelength range is arranged on the surface of an internal portion which is an internal portion of the vacuum valve. The internal portion is directly or indirectly connected to the external portion, which is the external portion of the vacuum valve, and constitutes a heat dissipation path from the wavelength-selective heat radiation absorber 13c to the surface of the external portion.
[Selection diagram] Fig. 2

Description

This disclosure relates to a vacuum valve in which a fixed side electrode and a movable side electrode are arranged in an insulating container made of ceramics, for example, to cut off and connect a circuit.

A conventional vacuum valve is provided with a movable energizing shaft extending from the inside to the outside of the vacuum valve, and further, a radiating fin is provided on a portion of the movable energizing shaft extending to the outside of the vacuum valve.
With this structure, the heat generated inside the vacuum valve is conducted to the movable current-carrying shaft and further dissipated from the heat radiation fins to the space outside the vacuum valve. Thereby, the inside of the vacuum valve can be cooled (for example, Patent Document 1).
The heat generated inside the vacuum valve is Joule heat generated by being energized between the movable energizing shaft and the fixed energizing shaft when the movable energizing shaft and the fixed energizing shaft are connected in a closed pole state. Or, during the opening operation in which the movable current-carrying shaft and the fixed current-carrying shaft are separated from each other, an arc discharge is generated, and there is radiant heat radiated by the arc discharge.

Japanese Unexamined Patent Publication No. 2009-9894

In a conventional vacuum valve, the heat generated inside the vacuum valve conducts the movable energizing shaft, so that the cooling performance depends on the cross-sectional area of the movable energizing shaft.
If the diameter of the movable energizing shaft is reduced in order to reduce the size of the vacuum valve, the cross-sectional area of the movable energizing shaft is reduced. Therefore, there is a possibility that the thermal conductivity is lowered and the desired cooling performance cannot be obtained.
In particular, when an arc discharge occurs during the opening operation, the inside of the vacuum valve is rapidly heated by the radiant heat of the arc discharge, so that the inside part of the vacuum valve is not cooled and the inside part of the vacuum valve is not cooled. , There is a concern that heat storage will lead to deformation.
That is, when trying to reduce the size of the vacuum valve, it becomes difficult to dissipate heat by conventional heat conduction, radiant heat of arc discharge is accumulated, and there is a problem that the internal portion of the vacuum valve is deformed.

This disclosure has been made in order to solve these problems, and an object of this disclosure is to provide a vacuum valve that efficiently dissipates the radiant heat of an arc discharge generated inside the vacuum valve to the outside.

The vacuum valve according to this disclosure includes a tubular insulating container, a fixed side end plate that closes one end of the insulating container, a fixed side energizing shaft that penetrates the fixed side end plate, and a fixed side energizing shaft. A movable side that penetrates the fixed side electrode placed at the tip, the movable side end plate that closes the other end of the insulating container, and the movable side end plate, and can move on the same axis as the fixed side energizing shaft. The current-carrying shaft, the movable-side electrode arranged at the tip of the movable-side current-carrying shaft, and the movable-side electrode that can be contacted and separated from the fixed-side electrode, and the movable-side current-carrying shaft are arranged so as to surround the movable-side end plate on the side of the movable-side end plate. A telescopic bellows to which the end is connected, a bellows shield connected to the end on the side of the fixed side end plate of the bellows, surrounding the bellows and the movable side current-carrying shaft, and a bellows shield attached to the movable side current-carrying shaft, and a movable side electrode and It is provided with an arc shield that surrounds and arranges a fixed side electrode.
Further, in the vacuum valve according to the present disclosure, a wavelength-selective thermal radiation absorber that absorbs electromagnetic waves in a preset wavelength range is arranged on the surface of an internal portion that is an internal portion of the vacuum valve, and the internal portion is: It is directly or indirectly connected to the external part, which is the external part of the vacuum valve, and constitutes a heat dissipation path from the wavelength-selective heat radiation absorber to the surface of the external part.

According to this disclosure, even when the size of the vacuum valve is reduced, the radiant heat of the arc discharge generated inside the vacuum valve is efficiently dissipated to prevent deformation of the internal part of the vacuum valve due to heat storage, and reliability is achieved. High vacuum valve can be provided.

It is a layout drawing of the vacuum circuit breaker 1000 which mounts the vacuum valve 100 which concerns on Embodiment 1 for carrying out this disclosure. It is sectional drawing of the vacuum valve 100 which concerns on Embodiment 1. FIG. It is a perspective view of the fragment of the wavelength selective thermal radiation absorber 13. It is a perspective view of the micropores 13h of a wavelength selective heat radiation absorber 13. It is sectional drawing of the fragment of the wavelength selective thermal radiation absorber 13. This is an example of the electromagnetic wave absorption characteristics of the wavelength-selective thermal radiation absorber 13. It is sectional drawing of the vacuum valve 100 during the opening operation. It is sectional drawing of the vacuum valve 101 which concerns on Embodiment 2 of this disclosure. It is sectional drawing of the vacuum valve 102 which concerns on Embodiment 3 of this disclosure. It is a perspective view of the fragment of the wavelength selective thermal radiation absorber 13D which concerns on Embodiment 4 of this disclosure. It is a perspective view of the fragment of the wavelength selective thermal radiation absorber 13E which concerns on Embodiment 4 of this disclosure. It is sectional drawing of the fragment of the wavelength selective thermal radiation absorber 13F which concerns on Embodiment 5 of this disclosure.

Embodiment 1.
Hereinafter, the first embodiment will be described in detail with reference to the drawings.
The structure of the vacuum valve 100 according to the first embodiment and the configuration of the vacuum breaker 1000 equipped with the vacuum valve 100 will be described with reference to FIGS. 1 to 2, and the vacuum will be described with reference to FIGS. 3 to 6. The structure of the wavelength-selective heat radiation absorber 13 arranged inside the valve 100 and the electromagnetic wave absorption characteristics will be described. Further, with reference to FIG. 7, the effect of the wavelength-selective heat radiation absorber 13 arranged inside the vacuum valve 100 will be described.

First, the structure of the vacuum valve 100 and the vacuum circuit breaker 1000 on which the vacuum valve 100 is mounted will be described with reference to FIGS. 1 and 2.
FIG. 1 is a layout view of the vacuum circuit breaker 1000, and the portion of the vacuum valve 100 includes the axis A and shows a cross section viewed from the vertical direction of the axis A. Similarly, FIG. 2 is a cross-sectional view showing the internal structure of the vacuum valve 100 in detail, including the axis A, and shows a cross section viewed from the vertical direction of the axis A.

In FIGS. 1 and 2, the vacuum valve 100 includes a tubular insulating container 1, a fixed side end plate 3 that closes one end of both ends of the insulating container 1, and a fixed side end plate 3. The fixed-side energizing shaft 5 that penetrates, the fixed-side electrode 7 arranged at the fixed-side energizing shaft tip 5t that is the tip of the fixed-side energizing shaft, and the other end of both ends of the insulating container 1 The movable side end plate 2 to be closed, the movable side energization shaft 4 that penetrates the movable side end plate 2 and can move on the same axis A as the fixed side energization shaft 5, and the tip of the movable side energization shaft 4. The movable side electrode 6 which is arranged at the tip end portion 4t of the movable side energizing shaft and can be brought into contact with and detached from the fixed side electrode 7 and the fixed side energizing shaft 5 are arranged so as to surround the movable side end plate 2 and the end portion on the side of the direction X. The telescopic bellows 9 to which the bellows 9 is connected, the bellows shield 10 which is connected to the end opposite to the direction X of the bellows 9, and the bellows 9 and the movable side energizing shaft 4 can be attached to the movable side energizing shaft 4, and the movable side. An arc shield 12 is provided so as to surround the electrode 6 and the fixed side electrode 7.
Further, in the vacuum valve 100, a wavelength-selective heat radiation absorber 13 that absorbs electromagnetic waves in a preset wavelength range is arranged on the surface of the valve inner portion Vnp of the vacuum valve inner Vn of the vacuum valve 100, and the valve inner portion. The Vnp is directly or indirectly connected to the valve outer portion Vup of the vacuum valve outer Vu, and constitutes a heat dissipation path H from the wavelength-selective heat radiation absorber 13 to the surface of the valve outer portion Vup.

The axis A is a flow line of the movable side electrode 6 when the fixed side electrode 7 and the movable side electrode 6 are connected and disconnected, and is an extension line of this flow line.
Further, the direction X indicated by the arrow in the drawing is a direction parallel to the axis A, and indicates a direction in which the movable side electrode 6 is separated from the fixed side electrode 7. In other words, the direction is from the side of the fixed side end plate 3 toward the side of the movable side end plate 2.
Further, in the following description, the "direction X side" means that the parts constituting the vacuum circuit breaker 1000 have both ends in a direction parallel to the axis A, and one of the both ends is a fixed side end. The position of the plate 3 and the position of the movable end plate 2 are relatively compared to indicate that the position is "the side of the movable end plate 2".
Similarly, "the side opposite to the direction X" means that the parts constituting the vacuum circuit breaker 1000 have both ends in a direction parallel to the axis A, and one of the both ends is the fixed side end plate 3. A relative comparison between the position and the position of the movable side end plate 2 indicates that the position is “the side of the fixed side end plate 3”.

Further, the direction Y indicated by the arrow and the direction Z indicated by the arrow are directions perpendicular to the direction X, and the direction Y and the direction Z are orthogonal to each other.
The space surrounded by the insulating container 1, the movable side end plate 2, and the fixed side end plate 3 is the inside of the vacuum valve 100, and is the Vn inside the vacuum valve. Further, contrary to the Vn inside the vacuum valve, the open space that is not surrounded by the insulating container 1, the movable side end plate 2 and the fixed side end plate 3 is the outside of the vacuum valve 100, and is referred to as the outside Vu of the vacuum valve. ..
^{The Vn inside the vacuum valve is kept in a vacuum state of 1 × 10 -3} pascals or less in order to maintain a high insulation state, while the Vu outside the vacuum valve is in the atmosphere.
Further, among the parts of the vacuum valve 100, the part arranged on the outer Vu of the vacuum valve and the wavelength selective heat radiation absorber 13 arranged on the surface or the surface part thereof is collectively referred to as the inner part Vnp of the valve, and the vacuum valve 100 Of these parts, the part that is arranged on the outer Vu of the vacuum valve and is directly or indirectly connected to the inner part Vnp of the valve or the surface part thereof is collectively referred to as the outer part Vup of the valve.

Further, the closed pole state of the vacuum valve 100 indicates a state in which the movable side electrode 6 and the fixed side electrode 7 configured so as to be contactable and detachable are connected and the movable side electrode 6 is stopped.
Further, the open state of the vacuum valve 100 indicates a state in which the movable side electrode 6 and the fixed side electrode 7 are separated and electrically insulated, and the movable side electrode 6 ends its operation and stops.
Further, the opening operation of the vacuum valve 100 means an operation of shifting from the closed pole state to the open pole state, and the closing operation of the vacuum valve 100 means an operation of shifting from the open pole state to the closed pole state.

The diameter twice the radius r is an example of the maximum width described in the claims, the valve inner portion Vnp is the internal portion described in the claims, and the valve outer portion Vup is the patent claim. It is the external part described in the range.

The configuration of the vacuum circuit breaker 1000 will be described with reference to FIG.
The vacuum circuit breaker 1000 is composed of a vacuum valve 100 and parts connected to the vacuum valve 100.
The fixed-side energizing shaft 5 of the vacuum valve 100 is made of a metal such as copper and has both ends, and the end of the fixed-side energizing shaft 5 opposite to the direction X is a conductor made of a metal such as copper. The end of the fixed-side energizing shaft 5 on the direction X side connected to 800 is referred to as the fixed-side energizing shaft tip 5t, and the fixed-side electrode 7 is arranged at the fixed-side energizing shaft tip 5t.
Further, the movable side energizing shaft 4 of the vacuum valve 100 is made of a metal such as copper and has both ends, and the end portion of the movable side energizing shaft 4 on the direction X side is the direction of the insulating insulator 802. The end opposite to X is connected. Further, the end portion of the insulator 802 on the direction X side is connected to the drive device 803. The drive device 803 has a drive capability for moving the insulator 802 to the side of direction X and to the side opposite to direction X. Further, the movable side energizing shaft 4 is connected to the flexible conductor 801 having flexibility by the vacuum valve outer Vu.

Further, the fixed side electrode 7 and the movable side electrode 6 are configured to be separable. The fixed side electrode 7 and the movable side electrode 6 in FIG. 1 are connected, and the vacuum valve 100 is in a closed pole state. When the drive device 803 drives the insulator 802 in the direction X, the movable side electrode 6 connected to the insulator 802 moves in the direction X via the movable side energizing shaft 4, and is movable with the fixed side electrode 7. The vacuum valve 100 is separated from the side electrode 6 and reaches the open pole state. Further, when the drive device 803 drives the insulator 802 in the direction opposite to the direction X, the movable side electrode 6 connected to the insulator 802 moves in the direction opposite to the direction X via the movable side energizing shaft 4. Then, the fixed side electrode 7 and the movable side electrode 6 are connected, and the vacuum valve 100 reaches a closed pole state.

It is assumed that the conductor 800 is connected to a power supply device (not shown), and the flexible conductor 801 is connected to a load such as a motor (not shown). Since the vacuum valve 100 is in a closed electrode state, it is assumed that a current flows between the conductor 800 and the flexible conductor 801 via the movable side electrode 6 and the fixed side electrode 7.

Next, the structure of the vacuum valve 100 will be described in detail with reference to FIG.
In FIG. 2, a part of the movable side energizing shaft 4 and the fixed side energizing shaft 5 on the Vu outside the vacuum valve is omitted. Further, the vacuum valve 100 in FIG. 2 is in a closed pole state.
The movable electrode side insulating cylinder 1a and the fixed electrode side insulating cylinder 1b are made of an insulating member such as a tubular ceramic having both ends. Further, the end portion of the movable electrode side insulating cylinder 1a opposite to the direction X and the end portion of the fixed electrode side insulating cylinder 1b on the direction X side are a part of the arc shield 12 made of a metal such as copper. Is sandwiched and connected, and the insulating container 1 is composed of the movable electrode side insulating cylinder 1a, the fixed electrode side insulating cylinder 1b, and the arc shield 12.

The movable side end plate 2 is attached so as to close the end portion of the movable electrode side insulating cylinder 1a on the direction X side. Further, the end of the movable bellows 9 on the X-direction side is attached to the movable end plate 2 along the axis A, and the bellows shield 10 is attached to the end of the bellows 9 on the opposite side of the direction X.
Further, the movable side energizing shaft 4 penetrates the bellows shield 10, and the bellows shield 10 is attached to the movable side energizing shaft 4. Further, a movable side electrode 6 made of a metal such as copper is arranged at the tip end portion 4t of the movable side energizing shaft, which is an end portion opposite to the direction X of the movable side energizing shaft 4. Further, a movable side shield 8 is attached to the movable side end plate 2 so as to surround the movable side energizing shaft 4 between the end portion of the movable side end plate 2 and the movable side energizing shaft 4.
The movable side end plate 2, the bellows 9, the bellows shield 10, and the movable side shield 8 are made of a metal such as stainless steel. Further, the movable side end plate 2, the bellows 9, the bellows shield 10, the movable side shield 8, the movable side energizing shaft 4, and the movable side electrode 6 are electrically connected.

On the other hand, the fixed side end plate 3 is attached so as to close the end portion of the fixed electrode side insulating cylinder 1b on the side opposite to the direction X. Further, a fixed-side energizing shaft 5 made of a metal such as copper is attached to the fixed-side end plate 3 so as to penetrate the fixed-side end plate 3, and the end of the fixed-side energizing shaft 5 on the direction X side. A fixed-side electrode 7 made of a metal such as copper is arranged at the tip of the fixed-side energizing shaft 5t, which is a portion. Further, a fixed-side shield 11 is attached to the fixed-side end plate 3 so as to surround the fixed-side energizing shaft 5 between the end of the fixed-side end plate 3 and the fixed-side energizing shaft 5.
The fixed side end plate 3 and the fixed side shield 11 are made of a metal such as stainless steel. Further, the fixed side end plate 3, the fixed side energizing shaft 5, the fixed side electrode 7, and the fixed side shield 11 are electrically connected.

Further, the arc shield 12 is arranged so as to surround the movable side electrode 6 and the fixed side electrode 7, and when an arc discharge D is generated between the movable side electrode 6 and the fixed side electrode 7, it is movable by the heat of the arc discharge D. It is installed to protect other parts from metal vapor and metal particles scattered from the side electrode 6 and the fixed side electrode 7.

Next, the arrangement of the wavelength selective heat radiation absorber 13 will be described.
The wavelength-selective thermal radiation absorber 13 has a property of absorbing electromagnetic waves in a preset wavelength range and converting them into heat. When the wavelength-selective heat radiation absorbers 13a, 13b1, 13b2, and 13c are generally described, the wavelength-selective heat radiation absorber 13 is used. Further, also in the case where the wavelength-selective heat radiant absorbers 13c1 and 13c2 shown in the third embodiment are generally described, the wavelength-selective heat radiant absorber 13 is used.

The wavelength-selective heat radiation absorber 13a is arranged on the bellows shield surface 10n, which is the surface of the bellows shield 10 of the Vn inside the vacuum valve. That is, the wavelength-selective heat radiation absorber 13a is in close contact with the bellows shield surface 10n. Further, the bellows shield 10 in this case is one of the valve inner portions Vnp.
Further, as described above, the bellows shield 10 has a surface opposite to the bellows shield surface 10n to which the wavelength-selective heat radiation absorber 13a is in close contact, and the end portion on the opposite side to the direction X of the bellows 9 is connected to the bellows 9 The end portion on the direction X side of the movable side end plate 2 is connected to the surface opposite to the direction X of the movable side end plate 2. With this structure, the heat generated by the wavelength-selective heat radiation absorber 13a absorbing electromagnetic waves is conducted to the movable side end plate 2 via the bellows shield 10 and the bellows 9, and the vacuum of the movable side end plate 2 is obtained. Heat is dissipated from the movable side end plate outer surface 2u, which is the surface on the valve outer Vu side. The movable side end plate 2 is one of the valve outer portion Vup.
In other words, the wavelength-selective heat radiation absorber 13a is arranged on the bellows shield surface 10n, which is the surface of the valve inner portion Vnp, and the bellows shield surface 10n is on the movable side end plate outer surface 2u, which is the surface of the valve outer portion Vup. Indirectly connected. That is, the heat dissipation path H2 from the wavelength-selective heat radiation absorber 13a to the outer surface 2u of the movable end plate is configured.

Further, the wavelength-selective heat radiation absorber 13b1 is arranged on the fixed-side end plate inner surface 3n, which is the surface of the fixed-side end plate 3 of the vacuum valve internal Vn. That is, the wavelength-selective heat radiation absorber 13b1 is in close contact with the inner surface 3n of the fixed side end plate.
Further, the surface opposite to the fixed side end plate inner surface 3n to which the wavelength-selective heat radiation absorber 13b1 is in close contact is the fixed side end plate outer surface 3u on the vacuum valve outer Vu. With this structure, the heat generated by the wavelength selective heat radiation absorber 13b1 absorbing electromagnetic waves is conducted to the fixed side end plate 3, and the fixed side, which is the surface of the fixed side end plate 3 on the Vu side outside the vacuum valve. Heat is dissipated from the outer surface 3u of the end plate. The fixed side end plate 3 in this case is one of the valve inner portion Vnp and one of the valve outer portion Vup.
In other words, the wavelength selective heat radiation absorber 13b1 is arranged on the inner surface 3n of the fixed side end plate which is the surface of the inner part Vnp of the valve, and the inner surface 3n of the fixed side end plate is the fixed side end which is the surface of the outer part Vup of the valve. It is directly connected to the plate outer surface 3u. That is, the heat dissipation path H3 from the wavelength-selective heat radiation absorber 13b1 to the fixed side end plate outer surface 3u is configured.

Then, the wavelength-selective heat radiation absorber 13b2 is arranged on the fixed-side shield surface 11n, which is the surface of the fixed-side shield 11 of the vacuum valve internal Vn. That is, the wavelength-selective heat radiation absorber 13b2 is in close contact with the fixed-side shield surface 11n. Further, the fixed side shield 11 in this case is one of the valve inner portions Vnp.
Further, as described above, the end portion of the fixed side shield 11 opposite to the direction X is connected to the fixed side end plate inner surface 3n of the fixed side end plate 3. With this structure, the heat generated by the wavelength selective heat radiation absorber 13b2 absorbing the electromagnetic wave is conducted to the movable side end plate 2 via the fixed side shield 11, and is one of the valve outer portion Vup. It is conducted to the fixed side end plate 3 and radiates heat from the fixed side end plate outer surface 3u.
In other words, the wavelength-selective heat radiation absorber 13b2 is arranged on the fixed-side shield surface 11n, which is the surface of the bulb inner portion Vnp, and the fixed-side shield surface 11n is the fixed-side end plate outer surface, which is the surface of the bulb outer portion Vup. Indirectly connected to 3u. That is, the heat dissipation path H11 from the wavelength-selective heat radiation absorber 13b2 to the fixed side end plate outer surface 3u is configured.

Further, the wavelength-selective heat radiation absorber 13c is arranged on the inner surface 12n of the arc shield, which is the surface of the arc shield 12 of the Vn inside the vacuum valve. That is, the wavelength-selective heat radiation absorber 13c is in close contact with the inner surface 12n of the arc shield.
Further, in the arc shield 12, the surface opposite to the arc shield inner surface 12n to which the wavelength-selective heat radiation absorber 13c is in close contact is the arc shield outer surface 12u on the vacuum valve outer Vu. With this structure, the heat generated by the wavelength selective heat radiation absorber 13c absorbing electromagnetic waves is conducted to the arc shield 12 and dissipated from the arc shield outer surface 12u on the surface of the arc shield 12 on the Vu side outside the vacuum valve. Will be done. The arc shield 12 in this case is one of the valve inner portion Vnp and one of the valve outer portion Vup.
In other words, the wavelength-selective thermal radiation absorber 13c is arranged on the arc shield inner surface 12n which is the surface of the valve inner portion Vnp, and the arc shield inner surface 12n is directly on the arc shield outer surface 12u which is the surface of the valve outer portion Vup. Connected to. That is, the heat dissipation path H12 from the wavelength-selective heat radiation absorber 13c to the arc shield outer surface 12u is configured.

That is, the wavelength-selective heat radiation absorber 13 is arranged on the surface of each valve inner portion Vnp, and each valve inner portion Vnp is directly or indirectly connected to each valve outer portion Vup, and the wavelength-selective heat radiation is emitted. A heat dissipation path H from the absorber 13 to the surface of each valve outer portion Vup is formed.

Next, based on Technical Document 1 (J. Phys. D: Appl. Phy. 50 (2017) 365601, Shinichiro Tsuda, Katsushiko Horinouchi, Hiroo Yugami), with reference to FIGS. 3 to 6, wavelength selective thermal radiation The structure and function of the absorber 13 will be described.
FIG. 3 is a perspective view of a fragment of the wavelength-selective heat radiant absorber 13, FIG. 4 is a perspective view of the micropores 13h of the wavelength-selective heat radiant absorber 13, and FIG. 5 is a wavelength-selective heat. It is sectional drawing of the fragment of a radiation absorber 13. Further, FIG. 6 shows an example of the electromagnetic wave absorption characteristics of the wavelength-selective heat radiation absorber 13 using copper or aluminum as a base material, and a plate-shaped copper to be compared with the electromagnetic wave absorption characteristics of the wavelength-selective heat radiation absorber 13. This is an example of the electromagnetic absorption characteristics with aluminum.

In FIGS. 3 to 5, the wavelength-selective heat radiation absorber 13 is made of a metal such as copper or aluminum. The surface of the wavelength-selective thermal radiation absorber 13 has a large number of micropores 13h. The micropores 13h are cylindrical micropores, which are formed on the surface of the wavelength-selective heat radiation absorber 13 at a preset interval p, a preset radius r, and a preset depth d. Will be done. In other words, the vertical and horizontal lines connecting the center of the micropore 13h and the center of the adjacent micropore 13h are arranged so as to form a continuous square. That is, the micropores 13h are arranged in a grid pattern.
The method for forming the fine pores 13h includes a machining method and an etching method.

The wavelength-selective thermal radiation absorber 13 has a maximum absorption coefficient wavelength f, which is a wavelength indicating the maximum value of the absorption coefficient. The maximum absorption coefficient wavelength f can be obtained from the interval p, the radius r, and the depth d by the following equation.

数式１において、πは、円周率であり、μは、比磁性率であり、εは、比誘電率である。また、αは、電磁波のモードに依存する値であり、例えば、α＝１．８４１である。

In Equation 1, π is the pi, μ is the relative magnetic coefficient, and ε is the relative permittivity. Further, α is a value depending on the mode of the electromagnetic wave, and for example, α = 1.841.

FIG. 6 shows the electromagnetic wave absorption characteristics of the wavelength-selective thermal radiation absorber 13 and the electromagnetic wave absorption characteristics of copper and aluminum. The horizontal axis of FIG. 6 is the wavelength of the electromagnetic wave irradiated to the wavelength-selective thermal radiation absorber 13, and the vertical axis is the absorption coefficient. The absorption coefficient indicates the ratio of absorption of the amount of irradiated electromagnetic waves. For example, if the absorption coefficient of a particular electromagnetic wave is zero, all electromagnetic waves of this wavelength are reflected. If the absorption coefficient of a specific electromagnetic wave is 1, all electromagnetic waves of this wavelength are absorbed and converted into heat. Furthermore, if the absorption coefficient of a particular electromagnetic wave is 0.5, half the amount of electromagnetic waves of this wavelength is absorbed and converted to heat, and half the amount of electromagnetic waves of this wavelength is reflected. Will be done.

In the figure, the electromagnetic wave absorption characteristic Al shown by a solid line and described as Al is the electromagnetic wave absorption characteristic of plate-shaped aluminum, and the electromagnetic wave absorption characteristic Cu shown by a dotted line and described as Cu is the electromagnetic wave absorption characteristic of plate-shaped copper. It is a characteristic.
Further, the electromagnetic wave absorption characteristic AlPhA shown by a single point chain line and described as AlPhA has a wavelength of a plate-shaped aluminum under the conditions of an interval p = 0.69 μm, a radius r = 0.32 μm, and a depth d = 4.8 μm. This is an electromagnetic wave absorption characteristic when the selective heat radiation absorber 13 is formed. Further, the electromagnetic wave absorption characteristic CuPhA shown by a dotted line and described as CuPhA is obtained by selecting a wavelength of plate-shaped copper under the conditions of an interval p = 0.69 μm, a radius r = 0.32 μm, and a depth d = 4.8 μm. This is an electromagnetic wave absorption characteristic when the sex heat radiation absorber 13 is formed.
In most of the wavelength range of electromagnetic waves of 0.2 μm to 10.0 μm, the electromagnetic wave absorption characteristics AlPhA and the electromagnetic wave absorption characteristics CuPhA have higher electromagnetic wave absorption characteristics than the electromagnetic wave absorption characteristics Cu and the electromagnetic wave absorption characteristics Al. In other words, the above-mentioned predetermined wavelength-selective heat radiation absorber 13 formed on the plate-shaped aluminum and the plate-shaped copper exhibits significantly higher electromagnetic wave absorption characteristics than the plate-shaped aluminum and the plate-shaped copper. ..

Next, when an arc discharge D is generated while the vacuum valve 100 is in the opening operation, the wavelength region of the electromagnetic wave radiated by the arc discharge D will be described.
When an arc discharge D is generated while the vacuum valve 100 is in the opening operation, the movable side electrode 6 and the fixed side electrode 7 are heated by the arc discharge D. When the members of the movable side electrode 6 and the fixed side electrode 7 are copper, electromagnetic waves having a wavelength caused by copper are radiated. Further, since the copper of the members of the movable side electrode 6 and the fixed side electrode 7 is vaporized and floats in the Vn inside the vacuum valve, electromagnetic waves having a wavelength caused by copper are radiated from the floating copper atoms and ions. ..

Technical Document 2 (IEEE Trans. Plasma Sci., Vol. 25, no. 4, August pp. 598-602, 1997, Kenichi Koyama, Yasushi Nakahayama, Takashi Hi, Takeshi Ohi, Takeshi Ohi The wavelength of the electromagnetic wave produced depends on the transition of the orbital electrons of copper to different energy ranks.
The maximum value of the main wavelength radiated from ^copper, 4 _{2 P 3/2} orbit due to the fact that due to the transition to ⁴ 2 _{S 1/2} track from ^{324.8nm, 4} _{2 P 3/2} 4 from the track 2 D 510.6nm accompanying transition to _5/2 track, and ⁴ 578.2Nm with from 2 P _1/2 orbit transition to ⁴ 2 D _3/2 trajectory is considered. Therefore, it is considered that the electromagnetic wave having a wavelength in the range of 0.2 μm or more and 0.8 μm or less including these wavelength regions is the wavelength range of the main electromagnetic wave radiated from the arc discharge D.

On the other hand, the average value of the absorption coefficient in the range of 0.2 μm or more and 0.8 μm or less of the electromagnetic wave absorption characteristic shown in FIG. 6 is 0.09 in the case of the electromagnetic wave absorption characteristic Al, and 0.09 in the case of the electromagnetic wave absorption characteristic Cu. , 0.36. Further, in the case of AlPhA, the average value of the absorption coefficient in the range of 0.2 μm or more and 0.8 μm or less is 0.78, and similarly, in the case of the electromagnetic wave absorption characteristic CuPhA, it is 0.86.
That is, the absorption rate of the electromagnetic waves radiated from the arc discharge D is 78% when the wavelength-selective heat radiation absorber 13 is formed of a plate-shaped aluminum, and the wavelength-selective heat radiation absorber 13 is made of a plate-shaped aluminum. When formed of copper, it is 86%. In other words, most of the electromagnetic waves radiated from the arc discharge D are not reflected by the wavelength-selective heat radiant absorber 13, but are converted into heat by the wavelength-selective heat radiant absorber 13 and absorbed.

Next, with reference to FIG. 7, the effect of the wavelength-selective heat radiant absorber 13 arranged inside the vacuum valve 100 will be described.
As described above, in FIGS. 1 and 2, it is assumed that the vacuum valve 100 is in a closed pole state and a current flows through the movable side electrode 6 and the fixed side electrode 7.
The opening operation is executed when the driving device 803 starts moving the movable side electrode 6 in the direction X by an execution command from the outside.
FIG. 7 shows a state during the opening operation during the transition from the closed state to the open state of the vacuum valve 100 of FIG. Note that FIG. 7 is a cross-sectional view showing the internal structure of the vacuum valve 100, and is a cross-sectional view including the axis A as in FIG. 2 and viewed from the vertical direction of the axis A.

Further, since a voltage is applied between the movable side electrode 6 and the fixed side electrode 7, an arc discharge D may occur between the movable side electrode 6 and the fixed side electrode 7. .. FIG. 7 shows a state in which a current is flowing between the movable side electrode 6 and the fixed side electrode 7 via the arc discharge D. The arc discharge D shown in FIG. 7 indicates the current due to the arc discharge D and the trajectory of the arc discharge D.

The electromagnetic wave E, which is an electromagnetic wave that is radiated due to the arc discharge D and is directly or indirectly irradiated to the wavelength-selective heat radiation absorber 13, will be described.
The electromagnetic wave E that is directly irradiated to the wavelength-selective heat radiation absorber 13 is an electromagnetic wave that is radiated from the arc discharge D, propagates in the space of Vn inside the vacuum valve, and is irradiated to the wavelength-selective heat radiation absorber 13. It is a component of. Further, the electromagnetic wave E indirectly irradiated to the wavelength-selective heat radiation absorber 13 is radiated from the arc discharge D, reflected at least once by the Vn inside the vacuum valve, and then the wavelength-selective heat radiation absorber 13. It is a component of electromagnetic waves radiated to.
Further, the electromagnetic wave E is radiated by the excitation of the copper of the members of the movable side electrode 6 and the fixed side electrode 7 by the arc discharge D, and the copper floating in the vacuum valve internal Vn by the arc discharge D is excited. This includes radiation.
The electromagnetic wave E2, the electromagnetic wave E12, the electromagnetic wave E11, and the electromagnetic wave E3 shown by the dotted lines in the drawing are referred to as the electromagnetic wave E when they are generally described.
Further, the electromagnetic wave E is absorbed by the wavelength-selective heat radiant absorber 13 and converted into heat, and the heat released to the Vu outside the vacuum valve is defined as heat T.
The heat T2, the heat T12, the heat T11, and the heat T3 shown by the alternate long and short dash line in the figure are referred to as the heat T when they are generally described.

Each process in which each electromagnetic wave E radiated from the arc discharge D generated in the vacuum valve internal Vn is radiated to the vacuum valve external Vu as each heat T will be described.
The electromagnetic wave E2 is radiated from the arc discharge D, is incident on the wavelength-selective heat radiation absorber 13a, and is converted into heat by the wavelength-selective heat radiation absorber 13a. Further, this heat propagates to the movable side end plate 2 via the bellows shield 10 and the bellows 9, and is released as heat T2 from the movable side end plate outer surface 2u to the vacuum valve outer Vu.
As described above, since the bellows shield 10, the bellows 9, and the movable side end plate 2 are made of metal, they have high heat propagation and are generated by the wavelength-selective heat radiation absorber 13a. The heat is quickly dissipated as heat T2 from the outer surface 2u of the movable end plate. In other words, the heat generated by the wavelength-selective heat radiant absorber 13a is rapidly dissipated as heat T2 via the heat dissipation path H2.

Further, the electromagnetic wave E3 is radiated from the arc discharge D, is incident on the wavelength-selective heat radiation absorber 13b1, and is converted into heat by the wavelength-selective heat radiation absorber 13b1. Further, this heat propagates to the fixed side end plate 3 and is released as heat T3 from the fixed side end plate outer surface 3u to the vacuum valve outer Vu. In other words, the heat generated by the wavelength-selective heat radiant absorber 13b1 is rapidly dissipated as heat T3 via the heat dissipation path H3.
Further, the electromagnetic wave E11 is radiated from the arc discharge D, is incident on the wavelength-selective heat radiation absorber 13b2, and is converted into heat by the wavelength-selective heat radiation absorber 13a. Further, this heat propagates to the fixed side end plate 3 via the fixed side shield 11, and is released as heat T11 from the fixed side end plate outer surface 3u to the vacuum valve outer Vu. In other words, the heat generated by the wavelength-selective heat radiant absorber 13b2 is rapidly dissipated as heat T11 via the heat dissipation path H11.
As described above, since the fixed side end plate 3 and the fixed side shield 11 are made of metal, heat propagation is high.

Next, the electromagnetic wave E12 is radiated from the arc discharge D, is incident on the wavelength-selective heat radiation absorber 13c, and is converted into heat by the wavelength-selective heat radiation absorber 13c. Further, this heat propagates to the arc shield 12, and is discharged from the outer surface 12u of the arc shield as heat T12 to the outside Vu of the vacuum valve.
As described above, since the arc shield 12 is made of metal, the heat propagation is high, and the heat generated by the wavelength-selective heat radiation absorber 13c is generated from the arc shield outer surface 12u to the heat T12. It is quickly dissipated as. In other words, the heat generated by the wavelength-selective heat radiant absorber 13c is rapidly dissipated as heat T12 via the heat dissipation path H12.

That is, according to the first embodiment, even when the arc discharge D is generated in the opening operation of the vacuum valve 100, the wavelength selective heat radiation absorber 13 is arranged on the surface of the valve inner portion Vnp. Further, the valve inner portion Vnp is directly or indirectly connected to the valve outer portion Vup of the vacuum valve outer Vu. That is, the heat dissipation path H from the wavelength-selective heat radiation absorber 13 to the valve outer portion Vup is configured. Therefore, the radiant heat associated with the arc discharge D can be efficiently dissipated.
Therefore, even when the vacuum valve 100 is miniaturized, it is possible to prevent deformation of the internal portion of the vacuum valve due to heat storage and provide a highly reliable vacuum valve.

Embodiment 2.
In the first embodiment, a mode in which a part of the arc shield 12 is sandwiched between the movable electrode side insulating cylinder 1a and the fixed electrode side insulating cylinder 1b to form the insulating container 1 has been described.
In the second embodiment, the movable electrode side insulating cylinder 1a and the fixed electrode side insulating cylinder 1b sandwich the support 14 to form the insulating container 1C, and the support 14 supports the arc shield 12B. Will be explained.

The structure of the vacuum valve 101 according to the second embodiment will be described with reference to FIG. 8, and then the effects of the arc shield 12B and the support 14 will be described.
FIG. 8 is a cross-sectional view of the vacuum valve 101 according to the second embodiment, and it is assumed that the vacuum valve 101 shows a state in which the pole is open and an arc discharge D is generated, as in FIG. 7. Further, FIG. 8 is a cross-sectional view showing the internal structure of the vacuum valve 101, and is a cross-sectional view including the axis A as in FIG. 7 and viewed from the vertical direction of the axis A.
Since the same symbols and the same symbols as those in FIGS. 1 to 7 in the drawings are the same as or equivalent to those in the first embodiment, detailed description thereof will be omitted. Further, since the operation of the vacuum valve 101 is the same as that of the vacuum valve 100, detailed description of the operation of the vacuum valve 101 will be omitted.

First, the structure of the vacuum valve 101 according to the second embodiment will be described with reference to FIG.
The support 14 made of a metal such as stainless steel is sandwiched between the end of the movable electrode side insulating cylinder 1a on the direction X side and the end of the fixed electrode side insulating cylinder 1b on the opposite side of the direction X. NS. The movable electrode side insulating cylinder 1a, the fixed electrode side insulating cylinder 1b, and the support 14 constitute an insulating container 1C.
Further, the arc shield 12B is arranged so as to surround the movable side electrode 6 and the fixed side electrode 7. Like the arc shield 12, the arc shield 12B is installed to protect other parts from metal vapor and metal particles scattered from the movable side electrode 6 and the fixed side electrode 7 due to the heat of the arc discharge D. Further, the position of the arc shield 12B is connected to the support 14 and is supported by the support 14. The support 14 is one of the valve outer portion Vup.
Further, the wavelength selective heat radiation absorber 13c is arranged on the arc shield inner surface 12Bn which is the surface of the arc shield 12B of the vacuum valve internal Vn. That is, the wavelength-selective heat radiation absorber 13c is in close contact with the inner surface 12Bn of the arc shield.

Next, the effects of the arc shield 12B and the support 14 will be described.
The electromagnetic wave E12 is radiated from the arc discharge D, is incident on the wavelength-selective heat radiation absorber 13c, and is converted into heat by the wavelength-selective heat radiation absorber 13c. Further, this heat propagates to the support 14 via the arc shield 12B, and is released as heat T12 from the support outer surface 14u, which is the surface of the valve outer portion Vup, to the vacuum valve outer Vu.
In other words, the wavelength selective heat radiation absorber 13c is arranged on the arc shield inner surface 12Bn which is the surface of the valve inner portion Vnp, and the arc shield inner surface 12Bn is indirectly connected to the support outer surface 14u. That is, the heat dissipation path H12 from the wavelength-selective heat radiation absorber 13c to the support outer surface 14u is configured.
As described above, since the arc shield 12B and the support 14 are made of metal, the heat propagation is high, and the heat generated by the wavelength-selective heat radiant absorber 13c is the outer surface of the arc shield. Heat is quickly dissipated from 12u as heat T12.

That is, according to the second embodiment, the wavelength-selective heat radiation absorber 13 is arranged on the surface of the valve inner portion Vnp, and the valve inner portion Vnp is directly or indirectly placed on the valve of the vacuum valve outer Vu. It is connected to the external valve. That is, the heat dissipation path H from the wavelength-selective heat radiation absorber 13 to the valve outer portion Vup is configured. Therefore, even when the arc discharge D is generated in the opening operation of the vacuum valve 101, the radiant heat accompanying the arc discharge D can be efficiently dissipated.
Therefore, even when the vacuum valve 101 is miniaturized, it is possible to prevent deformation of the internal portion of the vacuum valve due to heat storage and provide a highly reliable vacuum valve.

Embodiment 3.
In the second embodiment, the embodiment in which the wavelength-selective heat radiation absorber 13c is arranged on substantially the entire surface of the arc shield inner surface 12Bn of the arc shield 12B has been described.
In the third embodiment, the wavelength-selective heat radiation absorber 13c is avoided to be arranged at a position where the wavelength-selective heat radiation absorber 13c is likely to be close to or in contact with the arc discharge D, and is located at a predetermined position of the arc shield inner surface 12Bn of the arc shield inner surface 12Bn. A mode in which the wavelength-selective heat radiation absorber 13c1 and the wavelength-selective heat radiation absorber 13c2 are arranged will be described. As a result, the micropores 13h of the wavelength-selective heat radiant absorber 13c1 and the wavelength-selective heat radiant absorber 13c2 are prevented from being damaged such as deformed or extinguished by the high heat accompanying the arc discharge D.

The structure of the vacuum valve 102 according to the third embodiment will be described with reference to FIG. 9, and then the effects of the arc shield 12B, the wavelength-selective heat radiation absorber 13c1, and the wavelength-selective heat radiation absorber 13c2 will be described. do.
FIG. 9 is a cross-sectional view of the vacuum valve 102 according to the third embodiment, and the vacuum valve 102 is in an open pole state.
Since the same symbols and the same reference numerals as those in FIGS. 1 to 8 in the drawings are the same as or equivalent to those in the first and second embodiments, detailed description thereof will be omitted. Further, since the operation of the vacuum valve 102 is the same as that of the vacuum valve 100, detailed description of the operation of the vacuum valve 102 will be omitted.

First, the structure of the vacuum valve 102 according to the third embodiment will be described with reference to FIG.
The arrangement of the wavelength-selective heat radiant absorber 13 on the inner surface 12Bn of the arc shield is different between the vacuum valve 102 according to the third embodiment and the vacuum valve 101 according to the second embodiment.
The wavelength-selective thermal radiation absorber 13c1 is arranged from the end of the inner surface 12Bn of the arc shield on the side of the direction X to a predetermined position on the side opposite to the direction X. The cross section L1 shown by the dotted line in the figure is a plane perpendicular to the axis A, and the intersection of the cross section L1 and the inner surface 12Bn of the arc shield is the position of the end portion of the wavelength selective heat radiation absorber 13c1 opposite to the direction X. Matches.

The wavelength-selective thermal radiation absorber 13c2 is arranged from the end of the inner surface 12Bn of the arc shield opposite to the direction X to a predetermined position in the direction X. The cross section L2 shown by the dotted line in the figure is a plane perpendicular to the axis A, and the intersection of the cross section L2 and the arc shield inner surface 12Bn coincides with the position of the end portion of the wavelength selective heat radiation absorber 13c2 in the direction X. ..
Further, the wavelength-selective heat radiation absorber 13c1 and the wavelength-selective heat radiation absorber 13c2 are separated from each other. In other words, the cross section L1 and the cross section L2 are spaced along the direction X, and the wavelength selective heat radiation absorber 13 is arranged on the arc shield inner surface 12Bn between the cross section L1 and the cross section L2. do not have.

Next, the effects of the arc shield 12B, the wavelength-selective heat radiation absorber 13c1, and the wavelength-selective heat radiation absorber 13c2 will be described.
The positions of the cross section L1 and the cross section L2 are set so as to be between the movable side electrode 6 and the fixed side electrode 7 when the vacuum valve 102 is in the opening operation and the opening state. That is, since the arc discharge D is generated between the movable side electrode 6 and the fixed side electrode 7, the wavelength selective heat radiation absorber 13 is arranged at a position where the arc discharge D is likely to be close to or in contact with the arc discharge D. You can avoid doing it.

For example, the position of the cross section L1 is set so that the surface opposite to the direction X of the movable side electrode 6 when the vacuum valve 102 is in the open state coincides, and the position of the cross section L2 is set by the vacuum valve 102. Make sure that the planes of the fixed side electrodes 7 in the direction X in the open pole state coincide with each other.

Further, the wavelength-selective heat radiant absorber 13c1 and the wavelength-selective heat radiant absorber 13c2 are arranged on the inner surface 12Bn of the arc shield, which is the surface of the inner portion Vnp of the valve, as described in the second embodiment, and the arc shield The inner surface 12Bn is indirectly connected to the support outer surface 14u. That is, the heat radiation path H12 from the wavelength-selective heat radiation absorber 13c1 and the wavelength-selective heat radiation absorber 13c2 to the outer surface 14u of the support is configured.
Therefore, the heat generated by the wavelength-selective heat radiant absorber 13c1 and the wavelength-selective heat radiant absorber 13c2 is rapidly dissipated as heat T12 from the outer surface 12u of the arc shield.

That is, according to the third embodiment, in addition to the effects of the first embodiment and the second embodiment, the effect of suppressing damage to the wavelength-selective heat radiant absorber 13 is provided.
Therefore, even when the vacuum valve 102 is miniaturized, it has the effect of preventing deformation of the internal portion of the vacuum valve due to heat storage and further suppressing damage to the wavelength-selective heat radiant absorber 13, which is reliable. A high vacuum valve can be provided.

Embodiment 4.
In the first to third embodiments, the micropores 13h formed in the wavelength-selective heat radiation absorber 13 are cylindrical, and the micropores 13h are arranged in a grid pattern.
In the fourth embodiment, a form in which the micropores 13m are in the shape of a regular quadrangular prism and a form in which the micropores 13h are arranged alternately and regularly are described.

The width w is an example of the maximum width described in the claims.

FIG. 10 is a perspective view of a fragment of the wavelength-selective heat radiant absorber 13D according to the fourth embodiment, and FIG. 11 is a different form from the wavelength-selective heat radiant absorber 13D according to the fourth embodiment. It is a perspective view of the fragment of the wavelength selective thermal radiation absorber 13E of.
Since the same symbols and the same symbols as those in FIGS. 1 to 9 in the drawings are the same as or equivalent to those in the first to third embodiments, detailed description thereof will be omitted.
Further, the wavelength-selective heat radiation absorber 13D and the wavelength-selective heat radiation absorber 13E are mounted on the vacuum valves 100 to 102 in place of the wavelength-selective heat radiation absorber 13. Therefore, the operation of the vacuum valve equipped with the wavelength-selective heat radiation absorber 13D or the wavelength-selective heat radiation absorber 13E is the same as that of the vacuum valve 100. Therefore, the wavelength-selective heat radiation absorber 13D or the wavelength-selective heat A detailed description of the operation of the vacuum valve equipped with the radiation absorber 13E will also be omitted.

First, the structure of the wavelength-selective thermal radiation absorber 13D will be described with reference to FIG.
The wavelength-selective thermal radiation absorber 13D has regular quadrangular prism-shaped micropores 13m instead of cylindrical micropores 13h. Further, the micropores 13m are formed on the surface of the wavelength selective thermal radiation absorber 13D at a preset interval p, a preset width w, and a preset depth d. The method for forming the micropores 13 m includes a machining method and an etching method.
By substituting r = w / 2 into Equation 1, the maximum absorption coefficient wavelength f can be obtained, and the performance equivalent to that of the wavelength-selective thermal radiation absorber 13 can be provided.

Next, the structure of the wavelength-selective thermal radiation absorber 13E will be described with reference to FIG.
Explaining the arrangement of the micropores 13h in detail, the direction in which the micropores 13h on the surface of the wavelength selective heat radiation absorber 13E are lined up in a straight line is defined as the direction Lc, and the micropores 13h intersect the direction Lc at right angles, and the micropores 13h are straight lines. The direction in which they are arranged in a shape is defined as the direction Ln.
A straight line parallel to the direction Ln and lined with fine holes 13h is defined as a straight line Ln1, and a straight line adjacent to the straight line Ln1 and further parallel to the direction Ln and lined with fine holes 13h is defined as a straight line Ln2. , Shall be arranged alternately.
Further, a straight line parallel to the direction Lc and lined with the fine holes 13h is defined as a straight line Lc1, and a straight line adjacent to the straight line Lc1 and further parallel to the direction Lc and lined with the fine holes 13h is defined as a straight line Lc2. And are arranged alternately.

Further, the distance p between the line Ln1 in the direction Lc and the straight line Ln2 closest to the line Ln1 is set in advance, and similarly, the distance between the line Lc1 in the direction Ln and the straight line Lc1 closest to it is also the distance p, and the straight line Lc2 and the straight line Lc2 closest to it are also close to each other. The distance from the straight line Lc2 is also the distance p. Further, it is assumed that the distance s between the straight line Lc1 in the direction Ln and the straight line Lc2 that is in close contact with the straight line Lc1 is set in advance. Note that s is greater than zero and less than p.
In other words, the micropores 13h on the wavelength selective thermal radiation absorber 13E have alternating and regularly displaced arrangements. That is, the micropores 13h are arranged in a staggered pattern.
With these settings, the wavelength-selective heat radiation absorber 13E can have the same performance as the wavelength-selective heat radiation absorber 13.

That is, the wavelength-selective heat radiation absorber 13D or the wavelength-selective heat radiation absorber 13E is arranged on the surface of the valve inner portion Vnp, and the valve inner portion Vnp is directly or indirectly of the vacuum valve outer Vu. It is connected to the outer part of the valve, Vup. That is, the heat dissipation path H from the wavelength-selective heat radiation absorber 13D or the wavelength-selective heat radiation absorber 13E to the valve outer portion Vup is configured.
In other words, even when the arc discharge D occurs in the opening operation of the vacuum valve equipped with the wavelength-selective heat radiant absorber 13D or the wavelength-selective heat radiant absorber 13E, the radiant heat associated with the arc discharge D is efficient. It can dissipate heat well.
Therefore, according to the fourth embodiment, even when the vacuum valves 100 to 102 are miniaturized, it is possible to prevent deformation of the internal portion of the vacuum valve due to heat storage and provide a highly reliable vacuum valve. ..

Embodiment 5.
In the first to third embodiments, the form in which the wavelength-selective heat radiant absorber 13 is arranged in close contact with the surface of the inner portion Vnp of the bulb has been described.
In the fifth embodiment, a mode in which the micropores 13h are directly formed on the surface of the valve inner portion Vnp will be described.

FIG. 12 is a cross-sectional view of a fragment of the bulb inner portion Vnp forming the wavelength selective heat radiation absorber 13F according to the fifth embodiment.
Since the same symbols and the same symbols as those in FIGS. 1 to 9 in the drawings are the same as or equivalent to those in the first to third embodiments, detailed description thereof will be omitted.
Further, the wavelength-selective heat radiant absorber 13F is mounted on the vacuum valves 100 to 102 in place of the wavelength-selective heat radiant absorber 13. Therefore, the operation of the vacuum valve equipped with the wavelength-selective heat radiant absorber 13F is the same as that of the vacuum valve 100. Therefore, the operation of the vacuum valve equipped with the wavelength-selective heat radiant absorber 13F will also be described in detail. Omit.

First, the structure of the wavelength-selective thermal radiation absorber 13F will be described with reference to FIG.
The wavelength-selective thermal radiation absorber 13F has a structure in which micropores 13h are directly formed on the surface of the inner portion Vnp of the bulb. The method for forming the micropores 13 m includes a machining method and an etching method.
Therefore, by forming the wavelength-selective heat radiation absorber 13F directly on the inner portion of the valve Vnp, the wavelength-selective heat radiation absorber 13 is compared with the case where the wavelength-selective heat radiation absorber 13 is brought into close contact with the surface of the inner portion of the valve Vnp. The thermal resistance between the heat radiation absorber 13F and the inner portion Vnp of the valve becomes low.

In other words, the wavelength-selective thermal radiation absorber 13F is formed on the surface of the valve inner portion Vnp, and the valve inner portion Vnp is directly or indirectly connected to the valve outer portion Vup of the vacuum valve outer Vu. .. That is, the heat dissipation path H from the wavelength-selective heat radiation absorber 13F to the valve outer portion Vup is configured.
Therefore, according to the fifth embodiment, even when the vacuum valves 100 to 102 are miniaturized, it is possible to prevent deformation of the internal portion of the vacuum valve due to heat storage and provide a highly reliable vacuum valve. ..

In the first to fifth embodiments, even when an arc discharge D is generated in the opening operation of the vacuum valves 100 to 102, the valves are separated from the wavelength-selective heat radiation absorbers (13, 13D, 13E, 13F). It has been explained that the heat dissipation path H to the external valve is configured and the radiant heat associated with the arc discharge D can be efficiently radiated.
Wavelength-selective thermal radiation absorbers (13, 13D, 13E) if the spacing p, radius r, and depth d of the micropores 13h, or the spacing p, width w, and depth d of the micropores 13m are set appropriately. , 13F) can select the wavelength region of the electromagnetic wave to be absorbed.
Therefore, the micropores 13h or the micropores 13m are set so as to absorb the wavelength region of the electromagnetic wave caused by Joule heat generated by energizing between the movable energizing shaft and the fixed energizing shaft in the closed pole state. Then, Joule heat can be efficiently dissipated.

Further, in this disclosure, each embodiment can be freely combined, and each embodiment can be appropriately changed or omitted within the scope of the disclosure.
For example, the wavelength-selective heat radiation absorber 13 and the wavelength-selective heat radiation absorber 13F may be mixed and mounted on the vacuum valve.
Further, wavelength-selective thermal radiation absorbers 13, 13D, 13E, or 13F having different absorption wavelength regions may be mixed and mounted on the vacuum valve.

The bellows shield 10, the arc shield (12, 12B), the fixed side end plate 3, and the fixed side are placed on the bulb inner portion Vnp where the wavelength-selective thermal radiation absorbers (13, 13D, 13E, 13F) are arranged. Although the shield 11 has been illustrated, the present disclosure does not limit the valve inner portion Vnp to these.

Further, the movable side end plate 2, the arc shield 12, the fixed side end plate 3, and the support outer surface 14u are exemplified as the valve outer part Vup that is directly or indirectly connected to the valve inner part Vnp. , The valve outer portion Vup is not limited to these.

1, 1C Insulated vessel, 1a Movable electrode side insulating cylinder, 1b Fixed electrode side insulating cylinder, 2 Movable side end plate, 2u Movable side end plate outer surface, 3 Fixed side end plate, 3u Fixed side end plate outer surface, 3n fixed Inner surface of side end plate, 4 Movable side energizing shaft, 4t Movable side energizing shaft tip, 5 Fixed side energizing shaft, 5t Fixed side energizing shaft tip, 6 Movable side electrode, 7 Fixed side electrode, 8 Movable side shield, 9 Bellows 10, 10 bellows shield, 11 fixed side shield, 11n fixed side shield surface, 12, 12B arc shield, 12n, 12Bn arc shield inner surface, 12u arc shield outer surface, 13, 13a, 13b1, 13b2, 13c, 13c1, 13c2, 13D, 13E, 13F Wave Selective Heat Radiation Absorber, 13h, 13m Micropores, 14 Support, 14u Support Outer Surface, 100-102 Vacuum Valve, A Axis, H, H2, H3, H11, H12 Heat Dissipation Path, Vn Vacuum Valve Inside, inside Vnp valve, outside Vu vacuum valve, outside Vup valve.

Claims (14)

Cylindrical insulating container and
A fixed-side end plate that closes one end of the insulating container,
A fixed-side energizing shaft that penetrates the fixed-side end plate,
The fixed side electrode arranged at the tip of the fixed side energizing shaft and
A movable end plate that closes the other end of the insulating container,
A movable side energizing shaft that penetrates the movable side end plate and can move on the same axis as the fixed side energizing shaft.
A movable side electrode arranged at the tip of the movable side energizing shaft and capable of contacting and separating from the fixed side electrode,
A telescopic bellows arranged so as to surround the movable side energizing shaft and to which an end portion on the side of the movable side end plate is connected to the movable side end plate.
A bellows shield that connects to the end of the bellows on the side of the fixed end plate, surrounds the bellows, and is attached to the movable side current-carrying shaft.
A vacuum valve including an arc shield that surrounds and arranges the movable side electrode and the fixed side electrode.
A wavelength-selective thermal radiation absorber that absorbs electromagnetic waves in a preset wavelength range is arranged on the surface of the internal portion, which is an internal portion of the vacuum valve.
The internal portion is directly or indirectly connected to an external portion which is an external portion of the vacuum valve, and a heat dissipation path from the wavelength-selective heat radiant absorber to the surface of the external portion is formed. A vacuum valve featuring. It is provided with a fixed-side shield that surrounds the fixed-side energizing shaft and is attached to the fixed-side end plate.
The wavelength-selective heat radiation absorber is arranged on the surface of the fixed-side shield which is the internal portion, and the surface of the movable side end plate which is the external portion from the wavelength-selective heat radiation absorber on the outer side. The vacuum valve according to claim 1, wherein the heat radiation path to is configured. The wavelength-selective heat radiant absorber is arranged on the inner surface of the fixed-side end plate which is the inner portion, and the fixed-side end which is the outer portion from the wavelength-selective heat radiant absorber. The vacuum valve according to claim 1 or 2, wherein the heat dissipation path to the outer surface of the plate is configured. The wavelength-selective heat radiant absorber is arranged on the surface of the bellows shield, which is the internal portion, and from the wavelength-selective heat radiant absorber to the outer surface of the movable side end plate, which is the external portion. The vacuum valve according to claim 1 or 2, wherein the heat radiation path of the above is configured. The insulating container includes a fixed electrode side insulating cylinder which is an insulating cylinder connected to the fixed side end plate and a movable electrode side insulating cylinder which is an insulating cylinder connected to the movable end plate. It is configured by sandwiching a part of the arc shield.
The wavelength-selective heat radiant absorber is arranged on the inner surface of the arc shield which is the inner portion, and the arc shield which is the outer portion from the wavelength-selective heat radiant absorber is said. The vacuum valve according to claim 1 or 2, wherein the heat dissipation path to the surface on the outer side is configured. The insulating container includes a fixed electrode side insulating cylinder which is an insulating cylinder connected to the fixed side end plate and a movable electrode side insulating cylinder which is an insulating cylinder connected to the movable end plate. It is configured by sandwiching a support that is connected to the arc shield and supports the arc shield.
The wavelength-selective heat radiant absorber is arranged on the inner surface of the arc shield, which is the inner portion, and is the outer portion of the support, which is the outer portion from the wavelength-selective heat radiant absorber. The vacuum valve according to claim 1 or 2, wherein the heat dissipation path to the surface on the side of the surface is configured. The wavelength-selective thermal radiation absorber is located in a preset range of the movable end plate from the end of the surface of the arc shield on the side of the fixed end plate, or the movable surface of the arc shield. The vacuum valve according to claim 6, wherein the valve is arranged in a preset range of the fixed side end plate from the side end portion of the side end plate. The surface of the wavelength-selective thermal radiation absorber has a large number of micropores.
The fine hole according to any one of claims 1 to 7, wherein the micropores are formed at a preset interval, a preset maximum width, and a preset depth. Vacuum valve. The vacuum valve according to claim 8, wherein the micropores have a cylindrical shape and the maximum width is a preset diameter. The vacuum valve according to claim 8, wherein the micropores have a regular quadrangular prism shape. The vacuum valve according to any one of claims 8 to 10, wherein the micropores are arranged in a grid pattern. The vacuum valve according to any one of claims 8 to 10, wherein the micropores are arranged in a staggered pattern. The vacuum valve according to any one of claims 8 to 12, wherein the wavelength-selective heat radiant absorber is formed on a plate-shaped metal member and is arranged on the surface of the internal portion. .. The vacuum valve according to any one of claims 8 to 12, wherein the wavelength-selective thermal radiation absorber is formed on the surface of an internal portion.

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