JP2019220691A - 較正ジグ - Google Patents
較正ジグ Download PDFInfo
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- JP2019220691A JP2019220691A JP2019111014A JP2019111014A JP2019220691A JP 2019220691 A JP2019220691 A JP 2019220691A JP 2019111014 A JP2019111014 A JP 2019111014A JP 2019111014 A JP2019111014 A JP 2019111014A JP 2019220691 A JP2019220691 A JP 2019220691A
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- JP
- Japan
- Prior art keywords
- transparent plate
- calibration jig
- edge ring
- calibration
- height
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- H10P72/50—
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
- H01J37/32642—Focus rings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/3288—Maintenance
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
- H01J37/32908—Utilities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/3299—Feedback systems
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- H10P72/0606—
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- H10P72/53—
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- H10P72/7606—
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- H10P72/7611—
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- H10P72/7612—
-
- H10P95/00—
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
本開示の例は、概して、基板(例えば、半導体基板)を処理するための装置及び方法に関する。より具体的には、較正ジグ及びその使用方法が開示されている。
基板(例えば、半導体基板及びディスプレイパネル)の処理において、基板は処理チャンバ内の支持体上に配置される一方で、適切な処理条件を処理チャンバ内に維持して基板の表面上に堆積し、エッチングし、層を形成し、又はその他の方法で処理する。エッチングプロセス中、エッチングプロセスを駆動するプラズマが基板表面全体に均一に分配されないことがある。不均一性は、基板表面のエッジにおいて特に明白である。この不均一性は不十分な加工結果の一因となる。したがって、いくつかの処理チャンバでは、プロセスキットリングとも呼ばれるエッジリングが使用される。プラズマの均一性を向上させ、プロセスの歩留まりを改善するために、これらのエッジリングを利用してプラズマシースを基板表面のエッジ上に広げることができる。
Claims (15)
- 基準面に対してエッジリングを位置決めするための較正ジグであって、
透明プレートと、
前記透明プレートの第1の面に結合された複数のモーションセンサと、
前記透明プレートの対向する第2の面に結合された複数のコンタクトパッドとを備え、前記コンタクトパッドは前記透明プレートを前記基準面から離間させるように構成され、前記複数のモーションセンサはモーションコントローラに結合するように構成される、較正ジグ。 - 前記透明プレートは貫通して形成された複数の開口部を含み、前記透明プレートに形成された前記複数の開口部のそれぞれは前記基準面に形成されたそれぞれの開口部と一列に整列する、請求項1に記載の較正ジグ。
- 前記透明プレートはアラインメントインジケータを更に含む、請求項1に記載の較正ジグ。
- 前記アラインメントインジケータは、チャンバ本体内での較正ジグの適切な位置合わせを支援する、請求項3に記載の較正ジグ。
- 前記透明プレートはスクライブラインを含む、請求項1に記載の較正ジグ。
- 前記複数のモーションセンサのそれぞれは、前記スクライブラインの半径方向外側に配置される、請求項5に記載の較正ジグ。
- 前記透明プレートは、前記スクライブラインの直径よりも大きい直径を含む、請求項5に記載の較正ジグ。
- 前記透明プレートはハンドルを含む、請求項1に記載の較正ジグ。
- 前記透明プレートは、アラインメントインジケータとスクライブラインとのうちの一方又はそれらの組合せを備えるアラインメントフィーチャを含む、請求項1に記載の較正ジグ。
- 基準面に対してエッジリングを位置決めするための較正ジグであって、
貫通して形成された複数の開口部を含む透明プレートと、
前記透明プレートの第1の面に結合された複数のモーションセンサと、
前記透明プレートの対向する第2の面に結合された複数のコンタクトパッドとを備え、
前記透明プレートは貫通して形成された複数の開口部を含み、前記透明プレートに形成された前記複数の開口部のそれぞれは前記基準面に形成されたそれぞれの開口部と一列に整列し、
前記コンタクトパッドは、前記透明プレートを前記基準面から離間させるように構成され、
前記複数のモーションセンサはモーションコントローラに結合するように構成される、較正ジグ。 - 前記透明プレートはアラインメントインジケータを備えるアラインメントフィーチャを含む、請求項10に記載の較正ジグ。
- 前記透明プレートはスクライブラインを備えるアラインメントフィーチャを含む、請求項10に記載の較正ジグ。
- 前記複数のモーションセンサのそれぞれは前記スクライブラインの半径方向外側に配置される、請求項12に記載の較正ジグ。
- 前記透明プレートは前記スクライブラインの直径よりも大きい直径を含む、請求項12に記載の較正ジグ。
- 前記透明プレートは一対のハンドルを含む、請求項10に記載の較正ジグ。
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201862685004P | 2018-06-14 | 2018-06-14 | |
| US62/685,004 | 2018-06-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2019220691A true JP2019220691A (ja) | 2019-12-26 |
| JP6820972B2 JP6820972B2 (ja) | 2021-01-27 |
Family
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Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019111014A Active JP6820972B2 (ja) | 2018-06-14 | 2019-06-14 | 較正ジグ |
| JP2019002157U Active JP3222783U (ja) | 2018-06-14 | 2019-06-14 | 較正ジグ |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019002157U Active JP3222783U (ja) | 2018-06-14 | 2019-06-14 | 較正ジグ |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US11935773B2 (ja) |
| JP (2) | JP6820972B2 (ja) |
| KR (1) | KR102267396B1 (ja) |
| CN (2) | CN209747490U (ja) |
| TW (2) | TWI738004B (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2024084789A (ja) * | 2020-03-23 | 2024-06-25 | ラム リサーチ コーポレーション | 基板処理システムにおける中間リング腐食補償 |
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| JP6888007B2 (ja) | 2016-01-26 | 2021-06-16 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | ウェハエッジリングの持ち上げに関する解決 |
| US10790123B2 (en) | 2018-05-28 | 2020-09-29 | Applied Materials, Inc. | Process kit with adjustable tuning ring for edge uniformity control |
| US11935773B2 (en) * | 2018-06-14 | 2024-03-19 | Applied Materials, Inc. | Calibration jig and calibration method |
| US11289310B2 (en) | 2018-11-21 | 2022-03-29 | Applied Materials, Inc. | Circuits for edge ring control in shaped DC pulsed plasma process device |
| US11393663B2 (en) * | 2019-02-25 | 2022-07-19 | Tokyo Electron Limited | Methods and systems for focus ring thickness determinations and feedback control |
| US12009236B2 (en) | 2019-04-22 | 2024-06-11 | Applied Materials, Inc. | Sensors and system for in-situ edge ring erosion monitor |
| US11935728B2 (en) * | 2020-01-31 | 2024-03-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Apparatus and method of manufacturing a semiconductor device |
| US11057972B1 (en) * | 2020-04-01 | 2021-07-06 | Infineon Technologies Ag | Controlling LED intensity based on a detected photocurrent value |
| KR102585286B1 (ko) * | 2020-10-15 | 2023-10-05 | 세메스 주식회사 | 기판 처리 장치 및 소모성 부품의 마모도 측정 방법 |
| KR102711869B1 (ko) * | 2020-12-28 | 2024-10-04 | 세메스 주식회사 | 기판 처리 장치 |
| KR20240178711A (ko) * | 2023-06-23 | 2024-12-31 | 피에스케이 주식회사 | 기판 처리 장치 및 유전체 판 교체 방법 |
| CN121011526A (zh) * | 2024-05-21 | 2025-11-25 | 台积电(中国)有限公司 | 监测系统及其操作方法 |
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| US11935773B2 (en) | 2024-03-19 |
| TWI738004B (zh) | 2021-09-01 |
| US20240178035A1 (en) | 2024-05-30 |
| TWM587362U (zh) | 2019-12-01 |
| KR102267396B1 (ko) | 2021-06-18 |
| CN110610890B (zh) | 2024-10-25 |
| CN209747490U (zh) | 2019-12-06 |
| JP3222783U (ja) | 2019-08-22 |
| CN110610890A (zh) | 2019-12-24 |
| JP6820972B2 (ja) | 2021-01-27 |
| US12148645B2 (en) | 2024-11-19 |
| TW202002150A (zh) | 2020-01-01 |
| KR20190141603A (ko) | 2019-12-24 |
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