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JP2019120491A - Method for inspecting defects and defects inspection system - Google Patents

Method for inspecting defects and defects inspection system Download PDF

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JP2019120491A
JP2019120491A JP2017252743A JP2017252743A JP2019120491A JP 2019120491 A JP2019120491 A JP 2019120491A JP 2017252743 A JP2017252743 A JP 2017252743A JP 2017252743 A JP2017252743 A JP 2017252743A JP 2019120491 A JP2019120491 A JP 2019120491A
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小西 孝明
Takaaki Konishi
孝明 小西
亮介 小林
Ryosuke Kobayashi
亮介 小林
潤一郎 長沼
Junichiro Naganuma
潤一郎 長沼
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Hitachi GE Nuclear Energy Ltd
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    • GPHYSICS
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    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
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    • GPHYSICS
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Abstract

【課題】欠陥の目視検査がしやすいように、欠陥の撮影機器の配置を制御すること。【解決手段】欠陥検査システムは、撮像機21が撮像した取得画像91から、欠陥12の写っている欠陥領域92を抽出する欠陥抽出処理部52と、欠陥種類データ51aの特徴情報を参照して、欠陥抽出処理部52により抽出された欠陥領域92内の欠陥12の種類を分類する欠陥判定処理部53と、機器制御データ51bを参照して、欠陥判定処理部53が分類した欠陥12の種類に対応する撮像機21の配置を決定し、その決定した配置になるように撮像機21を制御する機器配置制御部54と、機器配置制御部54により制御された撮像機21が撮像する取得画像91を表示装置60に表示させる表示制御部55とを有する。【選択図】 図1An object of the present invention is to control the arrangement of photographing devices for defects so that visual inspection of defects is easy. A defect inspection system refers to a defect extraction processing unit that extracts a defect area in which a defect is captured from an acquired image captured by an imaging device, and refers to characteristic information of defect type data. A defect determination processing unit 53 for classifying the type of the defect 12 in the defect area 92 extracted by the defect extraction processing unit 52; and a type of the defect 12 classified by the defect determination processing unit 53 with reference to the device control data 51b. Is determined, and a device arrangement control unit 54 that controls the image pickup device 21 so that the arrangement is determined, and an acquired image captured by the image pickup device 21 controlled by the device position control unit 54 And a display control unit 55 for displaying 91 on the display device 60. [Selection diagram] Fig. 1

Description

本発明は、欠陥検査方法、および、欠陥検査システムに関する。   The present invention relates to a defect inspection method and a defect inspection system.

トンネルなどの社会インフラ構造物や発電プラントにおいては、構造物の健全性を検査する方法として、目視検査(VT:Visual Testing)が適用されることがある。目視検査は、検査員が検査対象領域を直接的に視認するか、またはカメラなどの撮像機により取得された映像を表示装置から間接的に視認して、対象領域上の検出対象欠陥の有無を判定するものである。
検査対象構造物が、高所や狭隘部分、または、高温や高放射線環境などの過酷環境にあり、直接検査対象を視認することが難しい場合には、遠隔操作装置に搭載された撮像機により取得された映像を用いる。これにより、検査員は離れた場所から映像を視認して目視検査を行うことができる。
In a social infrastructure structure such as a tunnel or a power plant, visual inspection (VT) may be applied as a method of checking the soundness of the structure. In the visual inspection, the inspector directly visually recognizes the area to be inspected or indirectly visually recognizes the image acquired by the imaging device such as a camera from the display device, and detects the presence or absence of the detection target defect on the object area. It is to judge.
When the structure to be inspected is in a harsh environment such as high places or narrow parts or high temperature or high radiation environment, and it is difficult to visually recognize the object to be inspected directly, it is acquired by the imaging device mounted on the remote control device Use the video that has been As a result, the inspector can visually inspect the image from a distant place.

目視検査用に取得された映像は、欠陥の性状や検査対象構造物の表面状態、撮像機や併用する照明の条件などによって、撮像映像における欠陥の視認性が異なる。そこで、撮像システムの視認性を定量的に評価する手法が提案されている。
例えば、特許文献1には、予め定めた空間解像度を持つ対象を撮像システムで撮像しコントラストを評価する手法が記載されている。
The images obtained for visual inspection differ in the visibility of the defects in the captured image depending on the nature of the defect, the surface condition of the structure to be inspected, the imaging device, and the conditions of illumination used in combination. Therefore, a method for quantitatively evaluating the visibility of an imaging system has been proposed.
For example, Patent Document 1 describes a method of imaging an object having a predetermined spatial resolution with an imaging system and evaluating the contrast.

特開2008−197087号公報JP, 2008-197087, A

目視検査において欠陥を確実に検出するには、欠陥を撮像する機器の配置を欠陥が明瞭に視認できる条件に調整することが望まれる。同じ欠陥を撮像した画像データであっても、機器の配置が異なると、画像データに写る欠陥の形状や表面状態、コントラストなどが異なって見えるからである。   In order to reliably detect a defect in visual inspection, it is desirable to adjust the arrangement of equipment for imaging the defect under conditions that allow the defect to be clearly visible. This is because, even if the image data is obtained by imaging the same defect, if the arrangement of the devices is different, the shape of the defect, the surface state, the contrast, and the like appearing in the image data may be different.

そのため、特許文献1などの欠陥の視認性を評価するシステムよりは、欠陥の視認性を良くするために機器の配置を積極的に制御するような支援システムがあると便利である。なお、壁に対して深い傷を刻む亀裂と、壁に対して浅い傷である剥がれとでは、欠陥を見やすい撮影機器の配置が異なることもある。よって、欠陥の具体的な内容に対応して、撮影機器の配置を最適化することが望まれる。   Therefore, it is more convenient if there is a support system that positively controls the arrangement of the device to improve the visibility of the defect than the system for evaluating the visibility of the defect as in Patent Document 1 or the like. In addition, the arrangement of the imaging device in which the defect is easy to see may be different between the crack that cuts a deep flaw on the wall and the peeling that is a shallow flaw on the wall. Therefore, it is desirable to optimize the arrangement of the imaging device in accordance with the specific content of the defect.

そこで、本発明は、欠陥の目視検査がしやすいように、欠陥の撮影機器の配置を制御することを、主な課題とする。   Then, this invention makes it a main subject to control arrangement | positioning of the imaging | photography apparatus of a defect so that it may be easy to carry out the visual inspection of a defect.

前記課題を解決するために、本発明の欠陥検査方法は、以下の特徴を有する。
本発明は、欠陥検査システムが、データベースと、欠陥抽出処理部と、欠陥判定処理部と、機器配置制御部と、表示制御部とを備えており、
前記データベースには、構造物に関する欠陥の種類ごとにその特徴情報を対応付けている欠陥種類データと、前記欠陥の種類ごとに見やすい撮影機器の配置を規定した機器制御データとが対応付けて登録されており、
前記欠陥抽出処理部が、撮像機が撮像した撮像画像から、前記欠陥の写っている欠陥領域を抽出し、
前記欠陥判定処理部が、前記欠陥種類データの特徴情報を参照して、前記欠陥抽出処理部により抽出された前記欠陥領域内の前記欠陥の種類を分類し、
前記機器配置制御部が、前記機器制御データを参照して、前記欠陥判定処理部が分類した前記欠陥の種類に対応する前記撮像機の配置を決定し、その決定した配置になるように前記撮像機を制御し、
前記表示制御部が、前記機器配置制御部により制御された前記撮像機が撮像する前記撮像画像を表示装置に表示させることを特徴とする。
その他の手段は、後記する。
In order to solve the above-mentioned subject, the defect inspection method of the present invention has the following features.
According to the present invention, the defect inspection system includes a database, a defect extraction processing unit, a defect determination processing unit, a device arrangement control unit, and a display control unit.
In the database, defect type data in which feature information is associated with each type of defect relating to a structure, and device control data defining an arrangement of an easy-to-see imaging device in association with each type of defect are associated and registered. Yes,
The defect extraction processing unit extracts a defect area in which the defect is shown from a captured image captured by an imaging device,
The defect determination processing unit refers to the feature information of the defect type data to classify the type of the defect in the defect area extracted by the defect extraction processing unit;
The device placement control unit refers to the device control data to determine the placement of the imaging device corresponding to the type of the defect classified by the defect determination processing unit, and performs the imaging so as to be the determined placement. Control the machine,
The display control unit causes the display device to display the captured image captured by the image capturing device controlled by the device arrangement control unit.
Other means will be described later.

本発明によれば、欠陥の目視検査がしやすいように、欠陥の撮影機器の配置を制御することができる。   According to the present invention, the arrangement of imaging devices for defects can be controlled to facilitate visual inspection of the defects.

本発明の一実施形態に関する欠陥検査システムの全体構成図である。BRIEF DESCRIPTION OF THE DRAWINGS It is a whole block diagram of the defect inspection system regarding one Embodiment of this invention. 本発明の一実施形態に関する欠陥検査システムの処理を示すフローチャートである。It is a flow chart which shows processing of a defect inspection system about one embodiment of the present invention. 本発明の一実施形態に関する欠陥検査システムの3次元の座標系を説明するための斜視図である。It is a perspective view for explaining the three-dimensional coordinate system of the defect inspection system concerning one embodiment of the present invention. 本発明の一実施形態に関する検査対象領域の正面から見たときのxy平面図である。It is xy top view when it sees from the front of the area | region to be examined regarding one Embodiment of this invention. 本発明の一実施形態に関する図4の撮像機の断面図である。5 is a cross-sectional view of the imager of FIG. 4 in accordance with an embodiment of the present invention. 本発明の一実施形態に関する図4の照明の断面図である。FIG. 5 is a cross-sectional view of the illumination of FIG. 4 in accordance with an embodiment of the present invention. 本発明の一実施形態に関する画像撮像処理における欠陥検査システムの位置関係を示す斜視図である。It is a perspective view which shows the positional relationship of the defect inspection system in the image imaging process regarding one Embodiment of this invention. 本発明の一実施形態に関する図7の亀裂に着目した側面図である。FIG. 8 is a side view focusing on the crack of FIG. 7 according to an embodiment of the present invention. 本発明の一実施形態に関する検査対象領域を正面から撮影した取得画像を示す画面図である。It is a screen figure showing an acquired image which photoed an inspection object field concerning an embodiment of the present invention from the front. 本発明の一実施形態に関する図9の取得画像内の輝度分布グラフである。10 is a luminance distribution graph in the acquired image of FIG. 9 according to an embodiment of the present invention. 本発明の一実施形態に関する欠陥種類判定処理を説明する構成図である。It is a block diagram explaining the defect kind determination processing regarding one Embodiment of this invention. 本発明の一実施形態に関する各機器の方位θに着目した配置決定処理を示す斜視図である。It is a perspective view which shows the arrangement | positioning determination processing which paid its attention to azimuth (theta) of each apparatus regarding one Embodiment of this invention. 本発明の一実施形態に関する亀裂に対する各機器の角度φに着目した配置決定処理を示す斜視図である。It is a perspective view which shows the arrangement | positioning determination processing which paid its attention to the angle (phi) of each apparatus with respect to the crack concerning one Embodiment of this invention. 本発明の一実施形態に関する表面層の剥がれに対する各機器の角度φに着目した配置決定処理を示す斜視図である。It is a perspective view which shows the arrangement | positioning determination processing which paid its attention to angle (phi) of each apparatus with respect to peeling of the surface layer concerning one Embodiment of this invention.

以下、本発明の一実施形態を、図面を参照して詳細に説明する。   Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings.

図1は、欠陥検査システムの全体構成図である。欠陥検査システムは、撮像機駆動機構20と、照明駆動機構30と、PC50と、表示装置60とを備えている。
撮像機駆動機構20は、撮像機21と自己位置測定機22とを保持して移動させる。照明駆動機構30は、照明31と相対位置測定機32とを保持して移動させる。撮像機駆動機構20および照明駆動機構30は、人間によるリモコン操作などの手動指令または、PC50による自動指令により、それぞれ遠隔制御される。
FIG. 1 is an overall configuration diagram of a defect inspection system. The defect inspection system includes an imaging machine drive mechanism 20, an illumination drive mechanism 30, a PC 50, and a display device 60.
The imaging device drive mechanism 20 holds and moves the imaging device 21 and the self-position measuring device 22. The illumination drive mechanism 30 holds and moves the illumination 31 and the relative position measuring device 32. The imaging device drive mechanism 20 and the illumination drive mechanism 30 are respectively remotely controlled by manual commands such as remote control operation by a human or automatic commands by the PC 50.

なお、撮像機駆動機構20および照明駆動機構30には、例えば複数のスラスタを用いて水中位置および姿勢が制御される水中移動装置として構成される。または、水中移動装置の代わりに、ドローンのような飛行装置としてもよいし、車輪を搭載した走行装置としてもよい。
さらに、図1では、撮像機駆動機構20と照明駆動機構30とを別々に移動する2つの装置として図示する例を示したが、2つの機構は一体化されて構成されていてもよい。例えば、撮像機駆動機構20が照明駆動機構30を支持するアームを有しており、照明駆動機構30の位置を撮像機駆動機構20からの相対位置により自在に移動させてもよい。
The imaging device drive mechanism 20 and the illumination drive mechanism 30 are configured as an underwater moving device in which the underwater position and posture are controlled using, for example, a plurality of thrusters. Alternatively, instead of the underwater moving device, a flying device such as a drone may be used, or a traveling device equipped with wheels may be used.
Furthermore, although the example illustrated in FIG. 1 as two devices for moving the imaging device drive mechanism 20 and the illumination drive mechanism 30 separately, the two mechanisms may be integrated and configured. For example, the imaging machine drive mechanism 20 may have an arm supporting the illumination drive mechanism 30, and the position of the illumination drive mechanism 30 may be freely moved by the relative position from the imaging machine drive mechanism 20.

撮像機21は、検査対象領域11上の欠陥12を撮像する。照明31は、検査対象領域11上の欠陥12に向けて光を照射する。
自己位置測定機22は、撮像機21の位置を測定する。相対位置測定機32は、撮像機21に対する照明31の位置を測定する。自己位置測定機22および相対位置測定機32には、例えばレーザ距離計を利用した周辺構造物を基準とする位置測定装置が用いられる。
The imaging device 21 images the defect 12 on the inspection target area 11. The illumination 31 emits light toward the defect 12 on the inspection target area 11.
The self-position measuring device 22 measures the position of the imaging device 21. The relative position measuring device 32 measures the position of the illumination 31 with respect to the imaging device 21. For the self-position measuring machine 22 and the relative position measuring machine 32, for example, a position measuring device based on a surrounding structure using a laser range finder is used.

なお、撮像機21および照明31それぞれの空間上の位置測定手段として、単独で自身の位置を計測可能な自己位置測定機22と、他の機器から見たときの自身の相対的な位置を計測可能な相対位置測定機32とを組み合わせる一例を示した。一方、照明31の位置測定に自己位置測定機を用い、撮像機21の位置測定に相対位置測定機を用いてもよいし、撮像機21および照明31の位置測定にそれぞれ自己位置測定機を用いてもよい。   In addition, as a position measurement means in the space of each of the imaging device 21 and the illumination 31, it measures the relative position of the self position measurement machine 22 which can measure its own position alone, and itself when seen from other devices An example has been shown in combination with a possible relative position measuring machine 32. On the other hand, a position measuring machine may be used to measure the position of the illumination 31, and a relative position measuring machine may be used to measure the position of the imaging device 21, or a position measuring machine may be used to measure the positions of the imaging device 21 and the illumination 31. May be

さらに、撮像機21および照明31の位置測定手段は、以下に例示する手法を適宜採用してもよい。
・レーザ距離測定により周辺構造物との位置関係を推定する手法
・カメラにより周辺構造物の距離画像を取得し位置を推定する手法
・マーカ位置をレーザで追跡により相対位置を推定する手法
・電波や超音波を利用した位置推定手法
Furthermore, the position measuring unit of the imaging device 21 and the illumination 31 may appropriately adopt the method illustrated below.
-Method of estimating the positional relationship with surrounding structures by laser distance measurement-Method of acquiring a distance image of the surrounding structures with a camera and estimating the position-Method of estimating the relative position by tracking the marker position with a laser-Radio wave or Position estimation method using ultrasound

PC50は、欠陥抽出処理部52と、欠陥判定処理部53と、機器配置制御部54と、表示制御部55と、データベース51とを内蔵し、表示装置60と接続されている。PC50は、CPU(Central Processing Unit)と、メモリと、ハードディスクなどの記憶手段(記憶部)と、ネットワークインタフェースとを有するコンピュータとして構成される。
このコンピュータは、CPUが、メモリ上に読み込んだプログラム(アプリケーションや、その略のアプリとも呼ばれる)を実行することにより、各処理部により構成される制御部(制御手段)を動作させる。
The PC 50 incorporates the defect extraction processing unit 52, the defect determination processing unit 53, the device arrangement control unit 54, the display control unit 55, and the database 51, and is connected to the display device 60. The PC 50 is configured as a computer having a CPU (Central Processing Unit), a memory, a storage unit (storage unit) such as a hard disk, and a network interface.
The computer operates a control unit (control means) configured of each processing unit by the CPU executing a program (also called an application or an abbreviation of the application) read into the memory.

データベース51は、欠陥種類データ51aと機器制御データ51bとを対応付けて格納している。欠陥種類データ51aは、「亀裂」、「表面層の剥がれ」などの欠陥の種類を分類するためのデータである。機器制御データ51bは、欠陥を見やすくする撮像機21および照明31の位置を特定するデータである。例えば、欠陥が「亀裂」なら、機器制御データ51bとして、亀裂の奥まで見やすいように、撮像機21を表面層に対して高さ方向(垂直方向)寄りに配置する旨が定義される。   The database 51 stores defect type data 51a and device control data 51b in association with each other. The defect type data 51 a is data for classifying types of defects such as “cracks” and “peeling of the surface layer”. The device control data 51 b is data for specifying the positions of the imaging device 21 and the illumination 31 that make the defect easy to see. For example, if the defect is a "crack", it is defined that the imaging device 21 is arranged closer to the surface layer in the height direction (vertical direction) as the device control data 51b so that the depth of the crack can be easily viewed.

欠陥抽出処理部52は、撮像機21の撮像画像データ23を取得画像91として受信すると、その取得画像91内の欠陥領域92を抽出する。
欠陥判定処理部53は、欠陥領域92に写っている欠陥12を、データベース51に登録されている欠陥種類データ51aと照合することで、欠陥12の種類を判定する。
機器配置制御部54は、データベース51に登録されている機器制御データ51bを参照して、欠陥判定処理部53が判定した欠陥12の種類ごとに適した撮像機21および照明31の配置を決定し、その配置に従って撮像機駆動機構20および照明駆動機構30を制御する。
表示制御部55は、撮像機21からの取得画像91を表示装置60に画面表示するように制御する。これにより、検査員は、自身で撮像機21や照明31の位置を手動で操作しなくても、自動的に欠陥12に適した位置で撮影された取得画像91を画面表示から視認できる。よって、検査員は、欠陥12の表示内容に集中できるので、欠陥12の目視検査を素早く安定して実行できる。
When the defect extraction processing unit 52 receives the captured image data 23 of the imaging device 21 as the acquired image 91, the defect extraction processing unit 52 extracts the defect area 92 in the acquired image 91.
The defect determination processing unit 53 determines the type of the defect 12 by collating the defect 12 shown in the defect area 92 with the defect type data 51 a registered in the database 51.
The device arrangement control unit 54 refers to the device control data 51 b registered in the database 51 to determine the arrangement of the imaging device 21 and the illumination 31 suitable for each type of defect 12 determined by the defect determination processing unit 53. And controls the imaging device drive mechanism 20 and the illumination drive mechanism 30 according to the arrangement.
The display control unit 55 controls the display device 60 to display the acquired image 91 from the imaging device 21 on the screen. Thereby, the inspector can visually recognize from the screen display the acquired image 91 photographed at the position suitable for the defect 12 automatically without manually operating the positions of the imaging device 21 and the illumination 31 by himself. Therefore, since the inspector can concentrate on the display content of the defect 12, the visual inspection of the defect 12 can be performed quickly and stably.

図2は、欠陥検査システムの処理を示すフローチャートである。
S101の機器移動処理では、各機器(撮像機駆動機構20、照明駆動機構30)は、検査対象領域11に向けて移動する。
S102の検査対象領域到達処理では、S101の各機器は、検査対象領域11内の欠陥12を撮影可能な程度に近づく位置まで到達する。
S103の画像撮像処理では、撮像機21は、欠陥12を含む検査対象領域11を、撮像画像データ23として撮像する(詳細は図7,図8)。
S104の欠陥抽出処理では、欠陥抽出処理部52は、撮像機21から撮像画像データ23を取得画像91として受信し、その取得画像91から欠陥12が写っている欠陥領域92と、その他の表面領域93とを抽出する(詳細は図9,図10)。
FIG. 2 is a flowchart showing processing of the defect inspection system.
In the device movement process of S101, each device (imager drive mechanism 20, illumination drive mechanism 30) moves toward the inspection target area 11.
In the inspection target area attainment process at S102, each device at S101 reaches a position approaching the extent to which the defect 12 in the inspection target area 11 can be photographed.
In the image pickup process of S103, the image pickup machine 21 picks up the inspection object area 11 including the defect 12 as the pickup image data 23 (details are shown in FIGS. 7 and 8).
In the defect extraction process of S104, the defect extraction processing unit 52 receives the captured image data 23 from the imaging device 21 as the acquired image 91, and the defect area 92 where the defect 12 appears from the acquired image 91 and other surface areas. And 93 are extracted (for details, see FIGS. 9 and 10).

S111の欠陥あり判定処理では、欠陥抽出処理部52は、S104の結果として、取得画像91の中に欠陥領域92が存在するか否かを判定する。S111でYesならS112に進み、NoならS115に進む。
S112の欠陥種類判定処理では、欠陥判定処理部53は、欠陥領域92の画像データを検索キーとして、データベース51に格納されている欠陥種類データ51aを参照することで、欠陥領域92に写っている欠陥12の種類を判定(特定)する(詳細は図11)。
In the defect existence determination process of S111, the defect extraction processing unit 52 determines whether or not the defect area 92 exists in the acquired image 91 as a result of S104. If YES in S111, the process proceeds to S112, and if NO, the process proceeds to S115.
In the defect type determination process of S112, the defect determination processing unit 53 uses the image data of the defect area 92 as a search key and refers to the defect type data 51a stored in the database 51 to be reflected in the defect area 92. The type of defect 12 is determined (specified) (details are shown in FIG. 11).

S113の欠陥視認可判定処理では、欠陥判定処理部53は、S112で判定した欠陥領域92に写っている欠陥12に対して、予め定めた欠陥視認性パラメータで評価することにより、欠陥12が視認可能か(人間が見やすいか)否かを判定する。この判定処理は、例えば、欠陥視認性パラメータが所定のしきい値を超えたときに、視認可能と判定される処理である。S113でYesならS114に進み、NoならS121に進む。   In the defect visual recognition determination process of S113, the defect determination processing unit 53 visually recognizes the defect 12 by evaluating the defect 12 shown in the defect area 92 determined in S112 using a predetermined defect visibility parameter. Determine whether it is possible (whether human beings are easy to see). This determination process is, for example, a process that is determined to be viewable when the defect visibility parameter exceeds a predetermined threshold. If YES in step S113, the process advances to step S114. If NO in step S113, the process advances to step S121.

S114の欠陥画像表示処理では、表示制御部55は、欠陥12の撮像結果として取得画像91を表示装置60に表示させる。
S115の全領域検査完了判定処理では、欠陥抽出処理部52は、計画した検査対象領域11の全ての撮像が完了したか否かを判定する。S115でYesなら図2の処理を終了し、NoならS101に戻って各機器は次の(残りの)撮像位置まで移動する。
In the defect image display process of S114, the display control unit 55 causes the display device 60 to display the acquired image 91 as an imaging result of the defect 12.
In the whole area inspection completion determination process of S115, the defect extraction processing unit 52 determines whether or not imaging of all of the planned inspection area 11 is completed. If Yes in S115, the process of FIG. 2 is ended, and if No, the process returns to S101 and each device moves to the next (remaining) imaging position.

S121の機器配置決定処理では、機器配置制御部54は、S112で判定した欠陥種類データ51aに対応する機器制御データ51bを参照し、欠陥12の種類によって定められた機器配置を決定する(詳細は図12〜図14)。後記するように、機器配置制御部54は、位置だけでなくその位置から見たときの各機器の姿勢(向き)も併せて決定してもよい。
S122の機器位置調整処理では、機器配置制御部54は、S121で決定した機器配置に従い、各機器(撮像機駆動機構20、照明駆動機構30)の位置を調整する。つまり、機器配置制御部54は、自己位置測定機22および相対位置測定機32による測定位置が、S121で決定した各機器の位置と一致するように、撮像機駆動機構20および照明駆動機構30に対して、駆動の指令信号を送信する。そして、処理をS103に戻す。
In the device arrangement determination process of S121, the device arrangement control unit 54 refers to the device control data 51b corresponding to the defect type data 51a determined in S112, and determines the device arrangement determined by the type of defect 12 (details will be described) 12-14). As described later, the device placement control unit 54 may determine not only the position but also the posture (orientation) of each device when viewed from that position.
In the device position adjustment process of S122, the device arrangement control unit 54 adjusts the position of each device (the imaging device drive mechanism 20 and the illumination drive mechanism 30) in accordance with the device arrangement determined in S121. That is, the device placement control unit 54 causes the imaging device drive mechanism 20 and the illumination drive mechanism 30 to have the positions measured by the self-position measuring device 22 and the relative position measuring device 32 coincide with the positions of the devices determined in S121. In response, a drive command signal is transmitted. Then, the process returns to S103.

以下、図3〜図6を参照して、欠陥検査システムの3次元の座標系を定義する。
図3は、欠陥検査システムの3次元の座標系を説明するための斜視図である。欠陥検査システムの3次元空間は、検査対象領域11の平面を(x,y)とし、その検査対象領域11の平面からの垂直線13をz軸とする(x,y,z)座標系として定義される。
また、3次元位置(x,y,z)は、検査対象領域11と垂直線13との交点(欠陥12の略中心位置)を原点とした極座標系(方位θ,角度φ,距離L)としても定義される。
つまり、撮像機21の3次元位置は、(方位θ1,角度φ1,距離L1)である。同様に、照明31の3次元位置は、(方位θ2,角度φ2,距離L2)である。
Hereinafter, a three-dimensional coordinate system of the defect inspection system will be defined with reference to FIGS.
FIG. 3 is a perspective view for explaining a three-dimensional coordinate system of the defect inspection system. In the three-dimensional space of the defect inspection system, the plane of the inspection area 11 is (x, y), and the vertical line 13 from the plane of the inspection area 11 is z axis (x, y, z) It is defined.
In addition, the three-dimensional position (x, y, z) is a polar coordinate system (bearing θ, angle φ, distance L) whose origin is the intersection point between the inspection object area 11 and the vertical line 13 (substantially central position of the defect 12). Is also defined.
That is, the three-dimensional position of the imaging device 21 is (azimuth θ1, angle φ1, distance L1). Similarly, the three-dimensional position of the illumination 31 is (azimuth θ2, angle φ2, distance L2).

ここで、検査対象領域11が曲面や凹凸のある面などの平面ではない場合は、欠陥12の位置からの垂直線13に垂直な平面を基準xy平面と定めてよい。また、欠陥12に対する撮像機21や照明31の位置情報は、極座標系(方位θ,角度φ,距離L)で表現する代わりに、ワールド座標系(x,y,z)としてもよいし、3次元空間上での位置が定まる任意のパラメータ3つによって位置を定めてよい。   Here, when the inspection target area 11 is not a flat surface such as a curved surface or an uneven surface, a plane perpendicular to the vertical line 13 from the position of the defect 12 may be defined as the reference xy plane. Further, instead of expressing the positional information of the imaging device 21 and the illumination 31 with respect to the defect 12 in the polar coordinate system (azimuth θ, angle φ, distance L), it may be a world coordinate system (x, y, z), or 3 The position may be determined by three arbitrary parameters whose position in the dimensional space is determined.

図4は、検査対象領域11の正面から見たときのxy平面図である。検査対象領域11を基準平面(xy平面)とすると、方位θはx軸を0度とした左回りの角度である。
撮像機21が位置する方位θ1に沿った断面線14L−14Rと、照明31が位置する方位θ2に沿った断面線15L−15Rとを図示する。これらの断面線に沿った断面図を、以下で説明する。
FIG. 4 is an xy plan view when viewed from the front of the inspection target area 11. Assuming that the inspection target area 11 is a reference plane (xy plane), the azimuth θ is a counterclockwise angle with the x axis set to 0 degrees.
A cross-sectional line 14L-14R along the azimuth θ1 at which the imaging device 21 is located and a cross-sectional line 15L-15R along the azimuth θ2 at which the illumination 31 is located are illustrated. Cross sectional views along these cross sectional lines are described below.

図5は、図4の撮像機21の断面線14L−14Rにおける断面図である。角度φ1は、垂直線13に対して、断面線14L−14Rの方向にどれだけ傾いた位置に撮像機21が存在するかを示す。
図6は、図4の照明31の断面線15L−15Rにおける断面図である。角度φ2は、垂直線13に対して、断面線15L−15Rの方向にどれだけ傾いた位置に照明31が存在するかを示す。
FIG. 5 is a cross sectional view taken along a cross sectional line 14L-14R of the imaging device 21 of FIG. The angle φ1 indicates how much the imaging device 21 is present at a position inclined with respect to the vertical line 13 in the direction of the cross-sectional line 14L-14R.
6 is a cross-sectional view of the illumination 31 of FIG. 4 at cross-sectional line 15L-15R. The angle φ2 indicates how much the illumination 31 is present at a position inclined with respect to the vertical line 13 in the direction of the cross-sectional line 15L-15R.

次に、図7,図8を参照して、S103の画像撮像処理を説明する。
図7は、S103の画像撮像処理における欠陥検査システムの位置関係を示す斜視図である。撮像機21は、照明31の光が当てられている状態で、欠陥12を含む検査対象領域11を撮像画像データ23として撮像する。
欠陥12の一例である亀裂は、構造物表面において経時により発生し、検査対象面に対して、開口幅W、開口長さL、深さDを持つ形状をしている。
図8は、図7の欠陥12である亀裂に着目した側面図である。深さDが深くなるほど照明31からの光が当たりづらくなるので、撮像画像データ23には、欠陥位置において画像の濃淡が発生する。
Next, with reference to FIG. 7 and FIG. 8, the image pickup process of S103 will be described.
FIG. 7 is a perspective view showing the positional relationship of the defect inspection system in the image capturing process of S103. The imaging device 21 captures the inspection target area 11 including the defect 12 as the captured image data 23 in a state where the light 31 of the illumination 31 is applied.
A crack which is an example of the defect 12 occurs with time on the surface of the structure, and has a shape having an opening width W, an opening length L, and a depth D with respect to the surface to be inspected.
FIG. 8 is a side view focusing on the crack which is the defect 12 of FIG. As the depth D is deeper, the light from the illumination 31 is less likely to hit, so that in the captured image data 23, shading of the image occurs at the defect position.

さらに、図9,図10を参照して、S104の欠陥抽出処理を説明する。
図9は、撮像画像データ23の一例として、検査対象領域11を正面から撮影した取得画像91を示す画面図である。取得画像91の縦方向を大文字のY軸とし、横方向を大文字のX軸とする。
取得画像91において、欠陥12のない表面領域93には照明光が照射されて輝度が高く(白く)、欠陥12のある欠陥領域92は照明光の照射量が減り輝度が低く(黒く)なる。なお、図10の説明用に、欠陥領域92を中心にして表面領域93を横切る断面線94L−94Rも図示した。
Further, with reference to FIGS. 9 and 10, the defect extraction process of S104 will be described.
FIG. 9 is a screen view showing an acquired image 91 obtained by imaging the inspection target area 11 from the front as an example of the imaged image data 23. The vertical direction of the acquired image 91 is a Y-axis of upper case, and the horizontal direction is a X-axis of upper case.
In the acquired image 91, illumination light is irradiated to the surface area 93 without the defect 12 and the luminance is high (white), and the defect area 92 with the defect 12 decreases the irradiation amount of the illumination light and the luminance becomes low (black). In addition, the cross-sectional line 94L-94R which cross | intersects the surface area 93 centering on the defect area | region 92 was shown in figure for description of FIG.

図10は、図9の取得画像91内の断面線94L−94Rにおける輝度分布グラフである。このグラフの横軸が取得画像91のX軸を示し、縦軸がX軸の各位置の輝度値を示す。
欠陥抽出処理部52は、取得画像91に画像処理を実施し、輝度の低い欠陥領域92を抽出する。具体的には、欠陥抽出処理部52は、濃淡情報である輝度値に任意の欠陥閾値を設定し、二値化処理を適用することで、欠陥閾値を下回る領域を欠陥として抽出する。
なお、欠陥抽出処理部52は、輝度の低い欠陥領域を抽出する方法であれば二値化処理に限らず、例えばエッジ抽出処理を用いて欠陥境界部分を抽出し、欠陥領域92か表面領域93かを分類してもよい。
FIG. 10 is a luminance distribution graph at the section line 94L-94R in the acquired image 91 of FIG. The horizontal axis of this graph indicates the X axis of the acquired image 91, and the vertical axis indicates the luminance value at each position of the X axis.
The defect extraction processing unit 52 performs image processing on the acquired image 91 to extract a defect area 92 with low luminance. Specifically, the defect extraction processing unit 52 sets an arbitrary defect threshold to the luminance value which is gray-scale information and applies a binarization process to extract an area below the defect threshold as a defect.
Note that the defect extraction processing unit 52 is not limited to binarization processing as long as it is a method of extracting a defect area having low luminance, and for example, a defect boundary portion is extracted using edge extraction processing. You may classify it.

なお、図10の輝度分布グラフは、欠陥の有無判定(S104の欠陥抽出処理)だけでなく、欠陥が有るときの視認性の判定(S113の欠陥視認可判定処理)にも役立つ。欠陥判定処理部53は、欠陥領域92の輝度平均値をL1、表面領域93の輝度平均値をL2、表面領域93の輝度ばらつき幅をNとした場合に、2つの領域のコントラストC=(L2−L1)/Nを欠陥視認性パラメータとして計算する。
そして、欠陥判定処理部53は、C>2(所定のしきい値)の場合に、欠陥領域と表面領域を視認した場合に明確に分類できると判定する。なお、判定の計算方法はこれに限らず、欠陥領域と表面領域の視認性を定量的に表し、計算結果をしきい値判定できる方法であればよい。
なお、この欠陥視認性パラメータCを良くするためには、例えば、欠陥領域92の輝度平均値をL1をより低くする、表面領域93の輝度平均値をL2をより高くする、表面領域93の輝度ばらつき幅Nを小さくするように、各機器の配置を変更すればよい。
The luminance distribution graph of FIG. 10 is useful not only for determining the presence or absence of a defect (defect extraction processing of S104), but also for determining the visibility when there is a defect (defect visual approval determination processing of S113). The defect determination processing unit 53 sets the contrast C of the two areas C = (L 2), where L 1 is the average luminance value of the defect area 92, L 2 is the average luminance value of the surface area 93, and N is the luminance variation width of the surface area 93. Calculate L1) / N as the defect visibility parameter.
Then, in the case of C> 2 (predetermined threshold value), the defect determination processing unit 53 determines that the defect area and the surface area can be clearly classified when they are visually recognized. The calculation method of the determination is not limited to this, as long as the visibility of the defect area and the surface area is quantitatively represented and the calculation result can be threshold-determined.
In order to improve the defect visibility parameter C, for example, the average luminance value of the defect area 92 is made lower than L1, and the average luminance value of the surface area 93 is made higher than L2, the luminance of the surface area 93 is made higher. The arrangement of each device may be changed so as to reduce the variation width N.

図11は、S112の欠陥種類判定処理を説明する構成図である。
欠陥判定処理部53は、欠陥領域92を囲むように所定の形状を当てはめることにより、欠陥領域92に写っている欠陥の種類を判定する。そのため、欠陥判定処理部53は、所定の形状と欠陥種類との対応データである欠陥種類データ51aを参照する。
なお、欠陥種類データ51aの一例として、図11では、細長い楕円を所定の形状として、その細長い楕円に当てはまる欠陥を「亀裂」と判定する場合を示している。細長い楕円とは、例えば、長径a/短径bの比が所定値(5など)より大きいため、長径aが短径bよりもかなり長く、引き延ばされた形状である。
欠陥判定処理部53は、欠陥領域92の欠陥12に外接する最少の楕円形状を求め、その長径a、短径b、座標系に対する長軸傾きθを算出する。そして、欠陥判定処理部53は、算出したθから、撮像機21および照明31の配置方位を、長径aと短径bの比a/bから、撮像機21および照明31の配置角度を決定する。
FIG. 11 is a configuration diagram for explaining the defect type determination process of S112.
The defect determination processing unit 53 determines the type of defect shown in the defect area 92 by applying a predetermined shape so as to surround the defect area 92. Therefore, the defect determination processing unit 53 refers to defect type data 51a which is correspondence data between a predetermined shape and a defect type.
Note that, as an example of the defect type data 51a, FIG. 11 shows a case where an elongated ellipse has a predetermined shape, and a defect that fits the elongated ellipse is determined as a "crack". The elongated ellipse is, for example, an elongated shape in which the major diameter a is considerably longer than the minor diameter b because the ratio of the major diameter a / the minor diameter b is larger than a predetermined value (such as 5).
The defect determination processing unit 53 obtains the minimum elliptical shape circumscribing the defect 12 of the defect area 92, and calculates the major axis a, the minor axis b, and the major axis inclination θ with respect to the coordinate system. Then, the defect determination processing unit 53 determines the arrangement orientation of the imaging device 21 and the illumination 31 from the calculated θ, and the arrangement angle of the imaging device 21 and the illumination 31 from the ratio a / b of the major diameter a to the minor diameter b. .

以下に示すように、本実施形態の対象となる欠陥は、亀裂に限らず、参照光を照射し撮像した際に、表面形状の不連続部分において画像の濃淡が発生する形状を持つ欠陥であればよく、例えば、膨らみや異物付着、表面層の剥がれなどを検出対象としてよい。
例えば、当てはめる所定の形状の別の一例として、亀裂に当てはめる細長い楕円よりも長径a/短径bの比が小さい(真円に近い)形状に当てはまる場合に、欠陥を「表面層の剥がれ」とするような欠陥種類データ51aを用いてもよい。
さらに、検査対象領域11のxy平面に対して、欠陥領域92がz軸の高さ方向に出っ張っている(凸型になっている)形状に当てはまる場合に、欠陥を「膨らみ」または「異物付着」とするような欠陥種類データ51aを用いてもよい。このように、欠陥種類データ51aとして、楕円に当てはめる方法に限らず、欠陥領域の方向性および方位を算出できる方法であれば、他の方法を用いてもよい。
As described below, the defect targeted by the present embodiment is not limited to a crack, but may be a defect having a shape in which image density is generated at discontinuous portions of the surface shape when irradiated with reference light and imaged. For example, swelling, adhesion of foreign matter, peeling of the surface layer, or the like may be detected.
For example, as another example of the predetermined shape to be applied, the defect is “peeling of the surface layer” when the ratio of the major axis a / minor axis b is smaller (closer to a perfect circle) than the elongated ellipse for the crack. The defect type data 51a may be used.
Furthermore, in the case where the defect area 92 corresponds to a shape in which the defect area 92 protrudes in the z-axis height direction (is convex) with respect to the xy plane of the inspection object area 11, the defect is “bulged” or "Defect type data 51a" may be used. As described above, the defect type data 51a is not limited to the method of fitting to an ellipse, and any other method may be used as long as it can calculate the directionality and orientation of the defect area.

以下、図12〜図14を参照して、機器制御データ51bに基づくS121の機器配置決定処理を説明する。
撮像機21の距離L1は、欠陥幅に対する分解能を予め設定し、撮像機の画素数、画素サイズより決定される。または、撮像機21の距離L1は、欠陥12にピントが合うように、既存のオートフォーカス機構により決定してもよい。
照明31の距離L2は、必要となる表面領域輝度と照明の照度より決定される。
The device arrangement determination process of S121 based on the device control data 51b will be described below with reference to FIGS.
The distance L1 of the imaging device 21 sets the resolution for the defect width in advance, and is determined by the number of pixels of the imaging device and the pixel size. Alternatively, the distance L1 of the imaging device 21 may be determined by the existing auto-focusing mechanism so that the defect 12 is in focus.
The distance L2 of the illumination 31 is determined by the required surface area luminance and the illumination intensity.

図12は、各機器の方位θに着目した配置決定処理を示す斜視図である。
欠陥視認性パラメータCを改善するための機器配置として、例えば、照明31の方位θ2を欠陥領域92の長軸に垂直な方位となるようにする。これにより、欠陥領域92の輝度をより低くすることで、欠陥12の内部断面に照射される光量を減らせばよい。
一方、撮像機21の方位θ1は、欠陥領域92の長軸に垂直な方位で、照明31と対向する方位とする。これにより、欠陥12の内部断面から反射または拡散して撮像機21に入射する光量を減らすことで、欠陥領域92の輝度を低くすればよい。
このように、機器制御データ51bは、欠陥種類データ51aで定義される欠陥12が存在する方位を基準とし、その欠陥12が見やすいように機器の方位を決定するデータとして定義されていてもよい。
FIG. 12 is a perspective view showing a placement determination process focusing on the orientation θ of each device.
As an apparatus arrangement for improving the defect visibility parameter C, for example, the direction θ2 of the illumination 31 is made to be the direction perpendicular to the long axis of the defect area 92. Thereby, the amount of light irradiated to the inner cross section of the defect 12 may be reduced by lowering the luminance of the defect area 92.
On the other hand, the azimuth θ1 of the image pickup device 21 is an azimuth perpendicular to the long axis of the defect area 92 and an azimuth facing the illumination 31. Thus, the luminance of the defect area 92 may be lowered by reducing the amount of light which is reflected or diffused from the inner cross section of the defect 12 and is incident on the image pickup device 21.
As described above, the device control data 51b may be defined as data for determining the direction of the device so that the defect 12 can be easily viewed based on the direction in which the defect 12 defined by the defect type data 51a is present.

図13は、亀裂に対する各機器の角度φに着目した配置決定処理を示す斜視図である。
照明31の角度φ2は、欠陥傾斜角度=tan(短径b/長径a)よりも狭い(垂直線13側の)角度とする。図13では欠陥傾斜を太線で示し、欠陥傾斜角度は、3点(垂直線13上の点Pd、欠陥12の最奥点Pc、欠陥12の表面点Pb)のなす角度である。このように、照明31の角度φ2を亀裂のほぼ真上に配置し、欠陥12の最奥点Pcに向けて入射光が届くようにほぼ真下に向けることで、欠陥12の内部断面からの反射光を抑え、コントラストを高めることができる。
なお、欠陥傾斜角度と照明角度との関係は、例えば、予め定めた角度差以上とし、照明が検査対象と干渉しない範囲で決定する。なお、欠陥の傾斜角度については、「tan(短径b/長径a)」から求める一例を示したが、推定方法はこれに限らず、同様の効果が得られる別の手段を用いてもよい。
FIG. 13 is a perspective view showing an arrangement determination process focusing on the angle φ of each device with respect to a crack.
The angle φ2 of the illumination 31 is an angle narrower (on the vertical line 13 side) than the defect inclination angle = tan (short diameter b / long diameter a). In FIG. 13, the defect inclination is indicated by a thick line, and the defect inclination angles are angles formed by three points (a point Pd on the vertical line 13, a deepest point Pc of the defect 12, and a surface point Pb of the defect 12). In this manner, the angle φ 2 of the illumination 31 is disposed almost directly above the crack and directed almost directly downward so that the incident light can reach toward the deepest point Pc of the defect 12 so that the reflection from the internal cross section of the defect 12 It can reduce light and enhance contrast.
The relationship between the defect inclination angle and the illumination angle is, for example, equal to or greater than a predetermined angle difference, and is determined in a range in which the illumination does not interfere with the inspection object. In addition, about the inclination angle of a defect, although an example calculated | required from "tan (short diameter b / long diameter a)" was shown, the estimation method is not restricted to this, you may use another means with which the same effect is acquired. .

一方、撮像機21の角度φ1は、表面領域93が鏡面である場合には、撮像機21および照明31の設置角度を同角とする。つまり、欠陥傾斜角度である3点(垂直線13上の点Pd、欠陥12の最奥点Pc、欠陥12の表面点Pa)のなす角度よりも狭い(垂直線13側の)角度を撮像機21の角度φ1とする。これにより、照明31からの正反射光を撮像機21に入射させることで、表面領域93の輝度を高くすることができ、コントラストを高くすることができる。
また、表面領域93が粗面である場合には、撮像機21の配置角度によって表面領域93からの拡散光は等法的であるため、欠陥12の影領域となる部分を多く撮像できるように欠陥の真上方向(垂直線13の方向)に撮像機21を配置することで、欠陥の視認性を高くすることができる。
On the other hand, when the surface area 93 is a mirror surface, the angle φ1 of the image pickup device 21 makes the installation angles of the image pickup device 21 and the illumination 31 equal. That is, the imaging device has an angle (on the side of the vertical line 13) narrower than an angle formed by three points (point Pd on the vertical line 13, the deepest point Pc of the defect 12 and surface point Pa of the defect 12) It is assumed that the angle φ1 is 21 degrees. Thereby, by causing the specular reflection light from the illumination 31 to be incident on the imaging device 21, the brightness of the surface area 93 can be increased, and the contrast can be increased.
In addition, when the surface area 93 is a rough surface, the diffused light from the surface area 93 is isometric depending on the arrangement angle of the imaging device 21, so that it is possible to image a large number of portions to be the shadow area of the defect 12. By arranging the imaging device 21 in the direction immediately above the defect (in the direction of the vertical line 13), the visibility of the defect can be increased.

図14は、表面層の剥がれに対する各機器の角度φに着目した配置決定処理を示す斜視図である。図13の亀裂と異なり、図14の剥がれは、検査対象領域11のxy平面に沿って機器を寝かせる方向に配置したほうが、剥がれの様子が見やすくなる。
そこで、撮像機21の角度φ1は、剥がれ底面点Pfと剥がれ表面点Paとの延長線上に設定される。同様に、欠陥12の角度φ1は、剥がれ底面点Peと剥がれ表面点Pbとの延長線上に設定される。
FIG. 14 is a perspective view showing a placement determination process focusing on the angle φ of each device with respect to peeling of the surface layer. Unlike the cracks in FIG. 13, the peeling in FIG. 14 can be seen more easily by arranging the device in a direction to lay the device along the xy plane of the inspection target area 11.
Therefore, the angle φ1 of the imaging device 21 is set on the extension of the peeling bottom point Pf and the peeling surface point Pa. Similarly, the angle φ1 of the defect 12 is set on the extension of the peeling bottom point Pe and the peeling surface point Pb.

以上説明したように、機器配置制御部54は、欠陥判定処理部53が判定した欠陥12の種別(亀裂、剥がれなど)に応じて、欠陥視認性を良くするように、撮像機21の位置(方位θ1,角度φ1,距離L1)と、照明31の位置(方位θ2,角度φ2,距離L2)とを決定する。
また、機器配置制御部54は、撮像機21および照明31の姿勢(向き)についても、決定された位置から見て、欠陥12が存在する位置を向くように決定すればよい。
As described above, the device placement control unit 54 sets the position of the imaging device 21 to improve defect visibility according to the type (crack, peeling, etc.) of the defect 12 determined by the defect determination processing unit 53. The azimuth θ1, the angle φ1, the distance L1) and the position of the illumination 31 (the azimuth θ2, the angle φ2, the distance L2) are determined.
In addition, the device placement control unit 54 may also determine the orientation (direction) of the imaging device 21 and the illumination 31 so as to face the position where the defect 12 exists as viewed from the determined position.

以上説明した本実施形態では、欠陥抽出処理部52が撮像機21から受信した取得画像91から、欠陥12の写っている欠陥領域92を抽出する。そして、欠陥判定処理部53が欠陥領域92内の欠陥12の形状や濃淡度などの特徴情報から欠陥種類を分類する。さらに、機器配置制御部54が分類された欠陥種類データ51aに対応する機器制御データ51bをデータベース51から読み出し、撮像機駆動機構20や照明駆動機構30に対して制御を行う。
ここで、欠陥種類データ51aと機器制御データ51bとは、欠陥12の種類ごとに見やすい撮影機器の配置があらかじめ定義されているため、配置が制御された撮像機21を介して、欠陥視認性の高い取得画像91を撮影することができる。よって、検査員の属人性(スキルのばらつき)があっても、安定した欠陥判定を効率的に実行させることができる。
In the embodiment described above, the defect extraction processing unit 52 extracts the defect area 92 in which the defect 12 is shown from the acquired image 91 received from the imaging device 21. Then, the defect determination processing unit 53 classifies the defect type on the basis of feature information such as the shape and density of the defect 12 in the defect area 92. Furthermore, the device control data 51b corresponding to the classified defect type data 51a is read out from the database 51, and control is performed on the imaging device drive mechanism 20 and the illumination drive mechanism 30.
Here, the defect type data 51a and the device control data 51b are defined in advance for the arrangement of the easy-to-see imaging devices for each type of defect 12. A high acquired image 91 can be taken. Therefore, stable defect determination can be efficiently performed even if there is a personality (variation in skill) of the inspector.

なお、本発明は前記した実施例に限定されるものではなく、様々な変形例が含まれる。例えば、前記した実施例は本発明を分かりやすく説明するために詳細に説明したものであり、必ずしも説明した全ての構成を備えるものに限定されるものではない。
また、ある実施例の構成の一部を他の実施例の構成に置き換えることが可能であり、また、ある実施例の構成に他の実施例の構成を加えることも可能である。
また、各実施例の構成の一部について、他の構成の追加・削除・置換をすることが可能である。また、上記の各構成、機能、処理部、処理手段などは、それらの一部または全部を、例えば集積回路で設計するなどによりハードウェアで実現してもよい。
また、前記の各構成、機能などは、プロセッサがそれぞれの機能を実現するプログラムを解釈し、実行することによりソフトウェアで実現してもよい。
The present invention is not limited to the embodiments described above, but includes various modifications. For example, the above-described embodiments are described in detail in order to explain the present invention in an easy-to-understand manner, and are not necessarily limited to those having all the described configurations.
Also, part of the configuration of one embodiment can be replaced with the configuration of another embodiment, and the configuration of another embodiment can be added to the configuration of one embodiment.
In addition, with respect to a part of the configuration of each embodiment, it is possible to add, delete, and replace other configurations. Further, each of the configurations, functions, processing units, processing means, etc. described above may be realized by hardware, for example, by designing part or all of them with an integrated circuit.
Further, each configuration, function, and the like described above may be realized by software by a processor interpreting and executing a program that realizes each function.

各機能を実現するプログラム、テーブル、ファイルなどの情報は、メモリや、ハードディスク、SSD(Solid State Drive)などの記録装置、または、IC(Integrated Circuit)カード、SDカード、DVD(Digital Versatile Disc)などの記録媒体に置くことができる。
また、制御線や情報線は説明上必要と考えられるものを示しており、製品上必ずしも全ての制御線や情報線を示しているとは限らない。実際にはほとんど全ての構成が相互に接続されていると考えてもよい。
さらに、各装置を繋ぐ通信手段は、無線LANに限定せず、有線LANやその他の通信手段に変更してもよい。
Information such as programs, tables, and files that realize each function is a memory, a hard disk, a recording device such as a solid state drive (SSD), an integrated circuit (IC) card, an SD card, a digital versatile disc (DVD), etc. Can be placed on the
Further, control lines and information lines indicate what is considered to be necessary for the description, and not all control lines and information lines in the product are necessarily shown. In practice, almost all configurations may be considered to be mutually connected.
Furthermore, the communication means connecting the respective devices is not limited to the wireless LAN, and may be changed to a wired LAN or other communication means.

11 検査対象領域
12 欠陥
13 垂直線
20 撮像機駆動機構
21 撮像機
22 自己位置測定機
23 撮像画像データ
30 照明駆動機構
31 照明
32 相対位置測定機
50 PC
51 データベース
51a 欠陥種類データ
51b 機器制御データ
52 欠陥抽出処理部
53 欠陥判定処理部
54 機器配置制御部
55 表示制御部
60 表示装置
91 取得画像
92 欠陥領域
93 表面領域
11 inspection target area 12 defect 13 vertical line 20 image pickup machine drive mechanism 21 image pickup machine 22 self-position measuring machine 23 picked-up image data 30 illumination drive mechanism 31 illumination 32 relative position measurement machine 50 PC
51 database 51a defect type data 51b device control data 52 defect extraction processing unit 53 defect determination processing unit 54 device arrangement control unit 55 display control unit 60 display device 91 acquired image 92 defect area 93 surface area

Claims (5)

欠陥検査システムは、データベースと、欠陥抽出処理部と、欠陥判定処理部と、機器配置制御部と、表示制御部とを備えており、
前記データベースには、構造物に関する欠陥の種類ごとにその特徴情報を対応付けている欠陥種類データと、前記欠陥の種類ごとに見やすい撮影機器の配置を規定した機器制御データとが対応付けて登録されており、
前記欠陥抽出処理部は、撮像機が撮像した撮像画像から、前記欠陥の写っている欠陥領域を抽出し、
前記欠陥判定処理部は、前記欠陥種類データの特徴情報を参照して、前記欠陥抽出処理部により抽出された前記欠陥領域内の前記欠陥の種類を分類し、
前記機器配置制御部は、前記機器制御データを参照して、前記欠陥判定処理部が分類した前記欠陥の種類に対応する前記撮像機の配置を決定し、その決定した配置になるように前記撮像機を制御し、
前記表示制御部は、前記機器配置制御部により制御された前記撮像機が撮像する前記撮像画像を表示装置に表示させることを特徴とする
欠陥検査方法。
The defect inspection system includes a database, a defect extraction processing unit, a defect determination processing unit, a device placement control unit, and a display control unit.
In the database, defect type data in which feature information is associated with each type of defect relating to a structure, and device control data defining an arrangement of an easy-to-see imaging device in association with each type of defect are associated and registered. Yes,
The defect extraction processing unit extracts a defect area in which the defect is shown from a captured image captured by an imaging device,
The defect determination processing unit refers to the feature information of the defect type data to classify the type of the defect in the defect area extracted by the defect extraction processing unit.
The device placement control unit refers to the device control data to determine the placement of the imaging device corresponding to the type of the defect classified by the defect determination processing unit, and performs the imaging so as to be the determined placement. Control the machine,
The defect inspection method, wherein the display control unit causes the display device to display the captured image captured by the imaging device controlled by the device placement control unit.
前記データベースには、前記欠陥の種類として構造物の平面に対する亀裂が登録され、
前記欠陥判定処理部は、亀裂の前記欠陥種類データを参照して、前記欠陥領域に外接する楕円形状の長径と短径との比が所定値より大きいときに、前記欠陥領域に写っている前記欠陥の種類を亀裂と判定し、
前記機器配置制御部は、亀裂の前記機器制御データを参照して、亀裂の最奥点が視認可能な程度に構造物の平面に対する角度が高い位置に、前記撮像機を配置することを特徴とする
請求項1に記載の欠陥検査方法。
In the database, a crack for the plane of the structure is registered as the type of the defect;
The defect determination processing unit refers to the defect type data of a crack, and when the ratio of the major axis to the minor axis of the elliptical shape circumscribing the defect area is larger than a predetermined value, the defect determination processing unit reflects the defect area. Determine the type of defect as a crack,
The device placement control unit places the image pickup device at a position where the angle with respect to the plane of the structure is high enough to make the deepest point of the crack visible with reference to the device control data of the crack. The defect inspection method according to claim 1.
前記機器配置制御部は、構造物の平面座標における亀裂に向けて光を照射する照明機の位置と、亀裂を撮影する前記撮像機の位置関係について、亀裂に外接する楕円形状の長径との垂線上の一方の端点に前記照明機を配置し、他方の端点に前記撮像機を配置することを特徴とする
請求項2に記載の欠陥検査方法。
The device placement control unit is a drooping of the major axis of the elliptical shape circumscribing the crack, regarding the position of the illuminator that emits light toward the crack in the plane coordinates of the structure, and the positional relationship of the imaging device that photographs the crack. The defect inspection method according to claim 2, wherein the illuminator is disposed at one end point on a line, and the image pickup device is disposed at the other end point.
前記データベースには、前記欠陥の種類として構造物の平面に対する剥がれが登録され、
前記欠陥判定処理部は、剥がれの前記欠陥種類データを参照して、前記欠陥領域に外接する楕円形状の長径と短径との比が所定値より小さいときに、前記欠陥領域に写っている前記欠陥の種類を剥がれと判定し、
前記機器配置制御部は、剥がれの前記機器制御データを参照して、剥がれの底面点と構造物の表面点との延長線上の位置に、前記撮像機を配置することを特徴とする
請求項1に記載の欠陥検査方法。
In the database, peeling of the structure with respect to the plane is registered as the type of the defect;
The defect determination processing unit refers to the defect type data of peeling and reflects the defect area when the ratio of the major axis to the minor axis of the elliptical shape circumscribing the defect area is smaller than a predetermined value. Determine the type of defect as peeling,
The device placement control unit places the imaging device at a position on an extension of a bottom point of peeling and a surface point of a structure with reference to the device control data of peeling. The defect inspection method described in.
構造物に関する欠陥の種類ごとにその特徴情報を対応付けている欠陥種類データと、前記欠陥の種類ごとに見やすい撮影機器の配置を規定した機器制御データとが対応付けて登録されるデータベースと、
撮像機が撮像した撮像画像から、前記欠陥の写っている欠陥領域を抽出する欠陥抽出処理部と、
前記欠陥種類データの特徴情報を参照して、前記欠陥抽出処理部により抽出された前記欠陥領域内の前記欠陥の種類を分類する欠陥判定処理部と、
前記機器制御データを参照して、前記欠陥判定処理部が分類した前記欠陥の種類に対応する前記撮像機の配置を決定し、その決定した配置になるように前記撮像機を制御する機器配置制御部と、
前記機器配置制御部により制御された前記撮像機が撮像する前記撮像画像を表示装置に表示させる表示制御部とを有することを特徴とする
欠陥検査システム。
A database in which defect type data in which feature information is associated with each type of defect relating to a structure, and device control data defining an arrangement of an easy-to-see imaging device in association with each type of defect are associated with each other;
A defect extraction processing unit that extracts a defect area in which the defect appears from a captured image captured by an imaging device;
A defect determination processing unit that classifies types of the defects in the defect area extracted by the defect extraction processing unit with reference to feature information of the defect type data;
The arrangement control of the image pickup device is performed to determine the arrangement of the image pickup device corresponding to the type of the defect classified by the defect determination processing unit with reference to the device control data, and control the image pickup device to be the determined arrangement. Department,
A defect inspection system comprising: a display control unit that causes a display device to display the captured image captured by the image capturing device controlled by the device placement control unit.
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