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JP2019110010A - Vacuum valve - Google Patents

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JP2019110010A
JP2019110010A JP2017241702A JP2017241702A JP2019110010A JP 2019110010 A JP2019110010 A JP 2019110010A JP 2017241702 A JP2017241702 A JP 2017241702A JP 2017241702 A JP2017241702 A JP 2017241702A JP 2019110010 A JP2019110010 A JP 2019110010A
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vacuum
electron emission
secondary electron
emission coefficient
layer
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JP7109911B2 (en
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亙 坂口
Wataru Sakaguchi
亙 坂口
直紀 浅利
Naoki Asari
直紀 浅利
昂 大坊
Akira Daibo
昂 大坊
丹羽 芳充
Yoshimitsu Niwa
芳充 丹羽
淳一 近藤
Junichi Kondo
淳一 近藤
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Toshiba Corp
Toshiba Infrastructure Systems and Solutions Corp
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Toshiba Infrastructure Systems and Solutions Corp
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Abstract

【課題】真空絶縁容器の沿面耐電圧の高い真空バルブを提供する。
【解決手段】セラミックからなり両端に開口部を有する筒状の真空絶縁容器と、前記真空絶縁容器内に収容され、離接可能な一対の電極と、前記真空絶縁容器の両端の前記開口部をそれぞれ閉塞する蓋体と、前記真空絶縁容器の両端の内壁面に夫々形成され、前記セラミックより二次電子放出係数が低い材料からなる低二次電子放出係数層と、を具備した真空バルブ。
【選択図】図1
An object is to provide a vacuum valve having a high creeping withstand voltage of a vacuum insulating container.
A cylindrical vacuum insulating container made of ceramic and having openings at both ends, a pair of electrodes housed in the vacuum insulating container and capable of coming into contact with each other, and the openings at both ends of the vacuum insulating container A vacuum valve comprising: a lid closing each of the lids; and a low secondary electron emission coefficient layer respectively formed on inner wall surfaces of both ends of the vacuum insulating container and made of a material having a secondary electron emission coefficient lower than that of the ceramic.
[Selected figure] Figure 1

Description

本発明の実施形態は、真空バルブに関する。   Embodiments of the present invention relate to vacuum valves.

真空遮断器の電流遮断部分である真空バルブのセラミック製の真空絶縁容器(絶縁物容器)の内面は、非通電時には高電界が印加される。真空絶縁容器の沿面が高電界に耐えられない時に、真空絶縁容器の沿面で絶縁破壊が発生する。真空絶縁容器の沿面は真空自体より絶縁耐力が小さいため、真空絶縁容器の沿面の耐電圧を向上することが求められている。   A high electric field is applied to the inner surface of the ceramic vacuum insulation container (insulator container) of the vacuum valve, which is the current interrupting portion of the vacuum circuit breaker, when no current is applied. When the surface of the vacuum insulation container can not withstand a high electric field, dielectric breakdown occurs on the surface of the vacuum insulation container. Since the creepage surface of the vacuum insulation container has smaller dielectric strength than the vacuum itself, it is required to improve the withstand voltage of the creepage surface of the vacuum insulation container.

特に、真空バルブをエポキシ樹脂で覆い、その外周を接地電位とした固体絶縁スイッチギヤは、気中絶縁スイッチギヤと比較して接地電位が真空バルブ付近に存在する。このため、真空バルブの真空絶縁容器の沿面には高い電界が印加されるので、その耐電圧を向上する必要性がさらに高くなる。このため、従来から各種の対策が提案されている。   In particular, in the solid insulated switchgear in which the vacuum valve is covered with an epoxy resin and the outer periphery thereof is grounded, a ground potential exists near the vacuum valve as compared to the air insulated switchgear. For this reason, since a high electric field is applied to the creeping surface of the vacuum insulating container of the vacuum valve, the need to improve the withstand voltage thereof is further heightened. Therefore, various measures have conventionally been proposed.

特開2014−17220号公報JP, 2014-17220, A

上記のように、真空バルブにおいては、従来から真空絶縁容器の沿面耐電圧を高くすることが要求されていた。   As described above, in the vacuum valve, conventionally, it has been required to increase the creeping withstand voltage of the vacuum insulating container.

本発明が解決しようとする課題は、真空絶縁容器の沿面耐電圧の高い真空バルブを提供することにある。   The problem to be solved by the present invention is to provide a vacuum valve having a high creeping withstand voltage of a vacuum insulating container.

実施形態の真空バルブは、セラミックからなり両端に開口部を有する筒状の真空絶縁容器と、前記真空絶縁容器内に収容され、離接可能な一対の電極と、前記真空絶縁容器の両端の前記開口部をそれぞれ閉塞する蓋体と、前記真空絶縁容器の両端の内壁面に夫々形成され、前記セラミックより二次電子放出係数が低い材料からなる低二次電子放出係数層と、を具備している。   The vacuum valve according to the embodiment includes a cylindrical vacuum insulating container made of ceramic and having openings at both ends, a pair of electrodes that can be separated and contacted, housed in the vacuum insulating container, and the above-mentioned both ends of the vacuum insulating container. A lid for closing the opening and a low secondary electron emission coefficient layer respectively formed on inner wall surfaces of both ends of the vacuum insulating container and made of a material having a secondary electron emission coefficient lower than that of the ceramic There is.

第1実施形態に係る真空バルブの縦断面構成を模式的に示す図。BRIEF DESCRIPTION OF THE DRAWINGS The figure which shows typically the longitudinal cross-section structure of the vacuum valve which concerns on 1st Embodiment. 図1の真空バルブの電界緩和シールドの先端周辺の状態を模式的に示す図。The figure which shows typically the state of the front-end | tip periphery of the electric field relaxation shield of the vacuum valve of FIG. 低二次電子放出係数層の形成パターンの例を模式的に示す図。FIG. 6 schematically shows an example of a formation pattern of a low secondary electron emission coefficient layer. 低二次電子放出係数層の形成パターンの他の例を模式的に示す図。FIG. 7 schematically shows another example of the formation pattern of the low secondary electron emission coefficient layer. 第2実施形態に係る真空バルブの縦断面構成を模式的に示す図。The figure which shows typically the longitudinal cross-section structure of the vacuum valve which concerns on 2nd Embodiment. 絶縁破壊電圧の測定方法を説明するための図。The figure for demonstrating the measuring method of a dielectric breakdown voltage. 絶縁破壊電圧の測定結果を示すグラフ。The graph which shows the measurement result of dielectric breakdown voltage. 低二次電子放出係数層が無い場合の電界緩和シールドの先端周辺の状態を模式的に示す図。FIG. 7 is a view schematically showing a state around the tip of the electric field relaxation shield when there is no low secondary electron emission coefficient layer.

以下、実施形態の真空バルブを、図面を参照して説明する。   Hereafter, the vacuum valve of embodiment is demonstrated with reference to drawings.

図1は、第1実施形態に係る真空バルブ100の縦断面構成を模式的に示す図である。図1に示すように、真空バルブ100は、セラミックからなり、両端に開口部を有する筒状の真空絶縁容器101を具備している。真空絶縁容器101の内部には、固定側電極102と、可動側電極103とからなる一対の電極が離接可能に配設されている。固定側電極102には、固定側通電軸104が接続されている。また、可動側電極103には、可動側通電軸105が接続されている。   FIG. 1 is a view schematically showing a longitudinal sectional configuration of the vacuum valve 100 according to the first embodiment. As shown in FIG. 1, the vacuum valve 100 comprises a cylindrical vacuum insulating container 101 made of ceramic and having openings at both ends. Inside the vacuum insulation container 101, a pair of electrodes consisting of the fixed side electrode 102 and the movable side electrode 103 are disposed so as to be capable of coming into and coming out of contact with each other. The stationary side conductive shaft 104 is connected to the stationary side electrode 102. Further, the movable side conductive shaft 105 is connected to the movable side electrode 103.

固定側電極102と可動側電極103の周囲には、これらを囲むようにアークシールド106が配設されている。また、真空絶縁容器101の頂部と底部には、真空絶縁容器101の開口部を覆う蓋体として、それぞれ板状のフランジ107,108が配設されている。   An arc shield 106 is disposed around the fixed electrode 102 and the movable electrode 103 so as to surround them. Further, plate-like flanges 107 and 108 are disposed on the top and bottom of the vacuum insulation container 101 as lids covering the opening of the vacuum insulation container 101, respectively.

固定側通電軸104は、フランジ107を貫通して真空絶縁容器101の外部まで延在している。また、可動側通電軸105は、フランジ108を貫通して真空絶縁容器101の外部まで延在しており、可動側通電軸105とフランジ108との間には、これらの間を気密に封止するとともに、可動側通電軸105をその軸方向に沿って移動可能とするベローズ109が配設されている。   The stationary side conduction shaft 104 extends through the flange 107 to the outside of the vacuum insulation container 101. Further, the movable side energization shaft 105 extends through the flange 108 to the outside of the vacuum insulating container 101, and between the movable side energization shaft 105 and the flange 108, the space between them is hermetically sealed. In addition, a bellows 109 is provided which allows the movable side energizing shaft 105 to move along the axial direction.

フランジ107,108の周縁部には、真空絶縁容器101の内部に向けて突出し、先端側が真空絶縁容器101の側壁側に向けて折り曲げられた形状の電界緩和シールド110,111が配設されている。また、真空バルブ100の要部を拡大して示した図2に示すように、真空絶縁容器101の端面には、フランジ107,108と接合するためのメタライズ層112が形成されている。   At the periphery of the flanges 107 and 108, electric field relaxation shields 110 and 111 having a shape protruding toward the inside of the vacuum insulation container 101 and bent at the tip end side wall side of the vacuum insulation container 101 are disposed. . Further, as shown in FIG. 2 which is an enlarged view of the main part of the vacuum valve 100, a metallized layer 112 for joining to the flanges 107 and 108 is formed on the end face of the vacuum insulating container 101.

真空絶縁容器101の内壁面のうち、メタライズ層112を含む両側端部から電界緩和シールド110,111と対向する部位、及びさらにその内側に延在するように、二次電子放出係数が低い材料からなる低二次電子放出係数層113が形成されている。この低二次電子放出係数層113は、真空絶縁容器101の内壁面のうち、特に電界強度が高くなる部位に配設することが好ましい。なお、低二次電子放出係数層113は、真空絶縁容器101に凸部等を設けることなくその内壁面に形成されており、容易に形成することができる。   From the material having a low secondary electron emission coefficient so as to extend from the both end portions including the metallized layer 112 to the region facing the electric field relaxation shields 110 and 111 and further to the inside of the inner wall surface of the vacuum insulation container 101 A low secondary electron emission coefficient layer 113 is formed. The low secondary electron emission coefficient layer 113 is preferably disposed on the inner wall surface of the vacuum insulation vessel 101, particularly at a portion where the electric field strength is high. The low secondary electron emission coefficient layer 113 is formed on the inner wall surface of the vacuum insulation container 101 without providing a convex portion or the like, and can be easily formed.

例えば、真空絶縁容器101においては、フランジ107,108と接合された軸方向における両側端部の電界強度が高くなる傾向にある。このため、真空絶縁容器101の軸方向における両側端部には、電界緩和シールド110,111が配設されている。このように電界緩和シールド110,111を有する構成の場合、これらの電界緩和シールド110,111の先端部と対向する真空絶縁容器101の内壁面部分の電界強度が高くなる傾向となる。   For example, in the vacuum insulation container 101, the electric field strength of both end portions in the axial direction joined to the flanges 107 and 108 tends to be high. For this reason, electric field relaxation shields 110 and 111 are provided at both end portions in the axial direction of the vacuum insulation container 101. In the case of the configuration having the electric field relaxation shields 110 and 111 as described above, the electric field strength of the inner wall surface portion of the vacuum insulating container 101 opposed to the tips of the electric field relaxation shields 110 and 111 tends to be high.

したがって、低二次電子放出係数層113は、メタライズ層112を含む真空絶縁容器101の端部から、電界緩和シールド110,111の対向する真空絶縁容器101の内壁面部分を含み、電界緩和シールド110,111の先端部と対向する部位からさらに内側方向に例えば数cm程度(例えば、1−3cm程度)延在するように形成することが好ましい。なお、後述するように、低二次電子放出係数層113は、真空絶縁容器101の内壁面全面に形成するのではなく、少なくともその軸方向において不連続となるように形成する。   Therefore, the low secondary electron emission coefficient layer 113 includes the inner wall surface portion of the vacuum insulation container 101 opposed to the electric field relaxation shields 110 and 111 from the end of the vacuum insulation container 101 including the metallized layer 112. Preferably, it is formed so as to extend, for example, about several cm (for example, about 1 to 3 cm) further inward from a portion facing the tip end portion of H.111. As described later, the low secondary electron emission coefficient layer 113 is not formed on the entire inner wall surface of the vacuum insulating container 101, but is formed to be discontinuous at least in the axial direction.

低二次電子放出係数層113を構成するための、二次電子放出係数が低い材料としては、例えば、V、Cr、C、Fe、SiC、Cu、Mo、TiN、Cr等を用いることができる。この材料としては、二次電子放出係数が低ければよく、その抵抗値については、特に限定されない。 As a material having a low secondary electron emission coefficient for forming the low secondary electron emission coefficient layer 113, for example, V, Cr, C, Fe, SiC, Cu, Mo, TiN, Cr 2 O 3 or the like is used. be able to. The material may have a low secondary electron emission coefficient, and its resistance value is not particularly limited.

上記のように、低二次電子放出係数層113が形成されていると、図2に示すように、真空バルブ100の真空絶縁容器101の内壁面(低二次電子放出係数層113)に一次電子301が衝突した際に、二次電子302の放出を抑制することができる。   As described above, when the low secondary electron emission coefficient layer 113 is formed, as shown in FIG. 2, the inner wall surface (low secondary electron emission coefficient layer 113) of the vacuum insulating container 101 of the vacuum valve 100 is primary. When the electrons 301 collide, the emission of secondary electrons 302 can be suppressed.

なお、図8に示すように、真空絶縁容器101の内壁面に低二次電子放出係数層113が形成されておらず、真空絶縁容器101のセラミックの内壁面に直接一次電子301が衝突した場合、Al等のセラミックは、二次電子放出係数が高いため、多くの二次電子302が放出される。そして、一次電子301が衝突した際に多くの二次電子302が放出されると、真空絶縁容器101の内壁面が帯電して沿面耐電圧が低下する。これに対して、本実施形態の真空バルブ100では、二次電子302の放出が抑制されることによって、帯電が抑制され、沿面耐電圧を向上させることができる。 In the case where the low secondary electron emission coefficient layer 113 is not formed on the inner wall surface of the vacuum insulating container 101 as shown in FIG. 8 and the primary electrons 301 directly collide with the ceramic inner wall surface of the vacuum insulating container 101. Since ceramics such as Al 2 O 3 have a high secondary electron emission coefficient, many secondary electrons 302 are emitted. Then, when a large number of secondary electrons 302 are emitted when the primary electrons 301 collide, the inner wall surface of the vacuum insulation container 101 is charged and the creeping withstand voltage is lowered. On the other hand, in the vacuum valve 100 of the present embodiment, the discharge of the secondary electrons 302 is suppressed, whereby the charging is suppressed, and the creeping withstand voltage can be improved.

しかし、一般に二次電子放出係数が低い材料は、導体であることが多い。このため、真空絶縁容器101の内壁全面に一様に成膜を行うと、二次電子放出係数を下げると共に、抵抗値が大きく低下してしまい絶縁物としての役割を果たせなくなる。そこで、本実施形態では、フランジ107,108の周辺及び電界緩和シールド110,111周辺等の電界が高い個所にのみ、低二次電子放出係数層113が形成されている。これにより、電界が高い個所で発生する二次電子放出を抑制するが、真空絶縁容器101全体としての抵抗値を大きく低下させることがない。   However, in general, materials having a low secondary electron emission coefficient are often conductors. Therefore, if film formation is uniformly performed on the entire inner wall of the vacuum insulation container 101, the secondary electron emission coefficient is lowered, and the resistance value is greatly reduced, so that it can not function as an insulator. Therefore, in the present embodiment, the low secondary electron emission coefficient layer 113 is formed only at a portion where the electric field is high, such as around the flanges 107 and 108 and around the electric field relaxation shields 110 and 111. Although this suppresses secondary electron emission generated at a portion where the electric field is high, the resistance value of the vacuum insulating container 101 as a whole is not greatly reduced.

なお、真空絶縁容器101全体としての抵抗値を大きく低下させないためには、夫々の低二次電子放出係数層113は、真空絶縁容器101の軸方向に沿った長さが、真空絶縁容器101の全長に対して10%以内程度の範囲に形成することが好ましく、5%以内とすることがさらに好ましい。例えば、真空絶縁容器101の全長が100cm程度の場合、1つの低二次電子放出係数層113の軸方向に沿った長さが10cm以内とすることが好ましく、5cm以内とすることがさらに好ましい。   In order to prevent the resistance value of the vacuum insulating container 101 as a whole from being greatly reduced, the length of each low secondary electron emission coefficient layer 113 along the axial direction of the vacuum insulating container 101 is equal to that of the vacuum insulating container 101. It is preferable to form in about 10% or less range with respect to a full length, and it is further more preferable to be 5% or less. For example, when the overall length of the vacuum insulation container 101 is about 100 cm, the length along one axial direction of the low secondary electron emission coefficient layer 113 is preferably 10 cm or less, and more preferably 5 cm or less.

低二次電子放出係数層113は、真空絶縁容器101の内壁面に沿って帯状に形成する他、例えば、図3に示すように、間隔をあけて斑状に形成してもよく、また、図4に示すように、間隔をあけて縞状に形成してもよい。このように、低二次電子放出係数層113を、真空絶縁容器101の軸方向に間隔をあけて形成することによって、真空絶縁容器101の抵抗値の低下を抑制することができ、また、局所的に二次電子放出係数を低下させることができる。なお、図3、図4において、低二次電子放出係数層113の形成部位には、ハッチングを付してその他の部位と区別して示してある。   The low secondary electron emission coefficient layer 113 may be formed in a band shape along the inner wall surface of the vacuum insulating container 101, for example, as shown in FIG. As shown in 4, it may be formed in stripes at intervals. As described above, by forming the low secondary electron emission coefficient layer 113 at intervals in the axial direction of the vacuum insulating container 101, it is possible to suppress a decrease in the resistance value of the vacuum insulating container 101, and also locally It is possible to lower the secondary electron emission coefficient. In FIG. 3 and FIG. 4, the portions where the low secondary electron emission coefficient layer 113 is formed are hatched to be distinguished from the other portions.

次に、図5を参照して、第2実施形態の真空バルブ200の構成について説明する。図5は、第2実施形態に係る真空バルブ200の縦断面構成を模式的に示す図である。この第2実施形態に係る真空バルブ200では、セラミックス製の真空絶縁容器101の外側が、エポキシ樹脂等の固体絶縁物層201で覆われ、固体絶縁物層201の周囲には接地電位に接続される接地電位層202が設けられている。なお、他の構成については、第1実施形態の真空バルブ100と同様であるので、対応する部分には、同一の符号を付して重複した説明は省略する。   Next, the configuration of the vacuum valve 200 of the second embodiment will be described with reference to FIG. FIG. 5 is a view schematically showing a longitudinal sectional configuration of a vacuum valve 200 according to a second embodiment. In the vacuum valve 200 according to the second embodiment, the outside of the ceramic vacuum insulation container 101 is covered with a solid insulator layer 201 such as epoxy resin, and the periphery of the solid insulator layer 201 is connected to the ground potential. A ground potential layer 202 is provided. In addition, about another structure, since it is the same as that of the vacuum valve 100 of 1st Embodiment, the same code | symbol is attached | subjected to a corresponding part and the duplicate description is abbreviate | omitted.

上記構成の真空バルブ200では、接地電位層202による接地電位が、真空絶縁容器101の近傍に存在するため、真空絶縁容器101の沿面に印加される電界が上昇する。したがって、真空バルブ100の場合と比べて、より沿面で絶縁破壊が発生しやすい構造となっている。このため、低二次電子放出係数層113を設けることによって、沿面耐電圧を向上させることがより重要となる。   In the vacuum valve 200 configured as described above, the ground potential due to the ground potential layer 202 is present in the vicinity of the vacuum insulation container 101, so the electric field applied to the surface of the vacuum insulation container 101 is increased. Therefore, compared with the case of the vacuum valve 100, it has a structure in which dielectric breakdown is more likely to occur on the surface. For this reason, it is more important to improve the creeping withstand voltage by providing the low secondary electron emission coefficient layer 113.

次に、二次電子放出係数が低い材料の膜を形成した場合の効果について、絶縁破壊電圧を測定することによって実施した実験の結果について説明する。絶縁破壊電圧の測定は、図6に示すように、電極間の距離(L)を15mmとした高圧電極220の間に、表面に各種の膜を形成した直径(D)が20mmのセラミック(Al)製の円柱部材230を配設し、絶縁破壊の起きる電圧を測定することによって行った。 Next, the effects of forming a film of a material having a low secondary electron emission coefficient will be described with reference to the results of experiments conducted by measuring the dielectric breakdown voltage. The dielectric breakdown voltage was measured, as shown in FIG. 6, by using a ceramic (Al) having a diameter (D) of 20 mm in diameter (D) between which various films were formed between high-voltage electrodes 220 with a distance (L) of 15 mm. A cylindrical member 230 made of 2 O 3 ) was disposed, and the voltage at which dielectric breakdown occurred was measured.

形成した膜の材質は、V(二次電子放出係数:1.3)、C(二次電子放出係数:0.8)、SiC(二次電子放出係数:2)、Cr(二次電子放出係数:1.4)とした。成膜は、イオンプレーティングにより行った。また、膜厚は数ナノメートル程度であった。比較のために、表面に膜を形成しないAl(二次電子放出係数:7)製の円柱部材についても測定を行った。 The material of the formed film is V (secondary electron emission coefficient: 1.3), C (secondary electron emission coefficient: 0.8), SiC (secondary electron emission coefficient: 2), Cr 2 O 3 (two The next electron emission coefficient: 1.4). The film formation was performed by ion plating. Moreover, the film thickness was about several nanometers. For comparison, the measurement was also performed on a cylindrical member made of Al 2 O 3 (secondary electron emission coefficient: 7) without forming a film on the surface.

上記の絶縁破壊電圧の測定結果を図7のグラフに示す。なお、縦軸は、平均絶縁破壊電圧を示しており、表面に膜を形成しないAl製の円柱部材の場合を1.0として、相対値によって示してある。図7に示すように、Al製の円柱部材の表面に、Alより二次電子放出係数が低い材料の膜を形成することによって、絶縁破壊電圧が高くなることが分かる。また、この場合、二次電子放出係数が低い材料の膜として、SiC、V、Crを用いると、膜を形成しない場合に比べて絶縁破壊電圧を1.5倍以上に向上させることができた。 The measurement result of said dielectric breakdown voltage is shown on the graph of FIG. The vertical axis represents the average dielectric breakdown voltage, and is indicated by a relative value, with the case of a cylindrical member made of Al 2 O 3 and having no film formed on the surface as 1.0. As shown in FIG. 7, the surface of the Al 2 O 3 made of columnar member, by the Al 2 O 3 than the secondary electron emission coefficient to form a film of low material, it can be seen that the breakdown voltage is increased. In this case, if SiC, V, or Cr 2 O 3 is used as a film of a material having a low secondary electron emission coefficient, the dielectric breakdown voltage is improved by 1.5 times or more as compared to the case where the film is not formed. It was possible.

以上、本発明のいくつかの実施形態を説明したが、これらの実施形態は、例として提示したものであり、発明の範囲を限定することは意図していない。これら新規な実施形態は、その他の様々な形態で実施されることが可能であり、発明の要旨を逸脱しない範囲で、種々の省略、置き換え、変更を行うことができる。これら実施形態やその変形は、発明の範囲や要旨に含まれるとともに、特許請求の範囲に記載された発明とその均等の範囲に含まれる。   While certain embodiments have been described, these embodiments have been presented by way of example only, and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other forms, and various omissions, substitutions, and modifications can be made without departing from the scope of the invention. These embodiments and modifications thereof are included in the scope and the gist of the invention, and are included in the invention described in the claims and the equivalent scope thereof.

100,200……真空バルブ、101……真空絶縁容器、102……固定側電極、103……可動側電極、104……固定側通電軸、105……可動側通電軸、106……アークシールド、107,108……フランジ、109……ベローズ、110,111……電界緩和シールド、112……メタライズ層、113……低二次電子放出係数層、201……固体絶縁物層、202……接地電位層、301……一次電子、302……二次電子。   100, 200: vacuum valve, 101: vacuum insulating container, 102: fixed electrode, 103: movable electrode, 104: fixed conductive shaft, 105: movable conductive shaft, 106: arc shield 107, 108: flange, 109: bellows, 110, 111: electric field relaxation shield, 112: metalized layer, 113: low secondary electron emission coefficient layer, 201: solid insulator layer, 202: ...... Ground potential layer, 301: primary electron, 302: secondary electron.

Claims (7)

セラミックからなり両端に開口部を有する筒状の真空絶縁容器と、
前記真空絶縁容器内に収容され、離接可能な一対の電極と、
前記真空絶縁容器の両端の前記開口部をそれぞれ閉塞する蓋体と、
前記真空絶縁容器の両端の内壁面に夫々形成され、前記セラミックより二次電子放出係数が低い材料からなる低二次電子放出係数層と、
を具備したことを特徴とする真空バルブ。
A cylindrical vacuum insulating container made of ceramic and having openings at both ends;
A pair of electrodes housed in the vacuum insulating container and capable of coming and going together;
Lids that close the openings at both ends of the vacuum insulation container;
A low secondary electron emission coefficient layer formed on inner wall surfaces of both ends of the vacuum insulation container and made of a material having a secondary electron emission coefficient lower than that of the ceramic;
The vacuum valve characterized by having.
前記真空絶縁容器の両端の内壁面と対向するように配設された電界緩和シールドを具備し、前記低二次電子放出係数層は、少なくとも前記電界緩和シールドと対向する部分に夫々配設されている
ことを特徴とする請求項1に記載の真空バルブ。
An electric field relaxation shield disposed so as to face the inner wall surfaces of both ends of the vacuum insulation container, wherein the low secondary electron emission coefficient layer is disposed at least at a portion facing the electric field relaxation shield The vacuum valve according to claim 1.
夫々の前記低二次電子放出係数層は、前記真空絶縁容器の軸方向に沿った長さが、前記真空絶縁容器の全長に対して10%以内の範囲に形成されている
ことを特徴とする請求項1又は2に記載の真空バルブ。
Each of the low secondary electron emission coefficient layers is characterized in that the length along the axial direction of the vacuum insulation container is formed within a range of 10% or less with respect to the entire length of the vacuum insulation container. The vacuum valve according to claim 1 or 2.
前記真空絶縁容器の両端の端面には、前記蓋体と接続するためのメタライズ層が形成され、前記低二次電子放出係数層は、前記メタライズ層の内側面にも形成されている
ことを特徴とする請求項1乃至3何れか1項に記載の真空バルブ。
A metallized layer for connection to the lid is formed on the end surfaces of both ends of the vacuum insulation container, and the low secondary electron emission coefficient layer is also formed on the inner side surface of the metallized layer. The vacuum valve according to any one of claims 1 to 3, wherein
前記セラミックより二次電子放出係数が低い材料は、V、Cr、C、Fe、SiC、Cu、Mo、TiN、Crのいずれかである
ことを特徴とする請求項1乃至4何れか1項に記載の真空バルブ。
The material having a secondary electron emission coefficient lower than that of the ceramic is any one of V, Cr, C, Fe, SiC, Cu, Mo, TiN, and Cr 2 O 3 . The vacuum valve according to item 1.
前記低二次電子放出係数層は、前記真空絶縁容器の軸方向に間隔をあけて非連続に前記真空絶縁容器の内壁面に斑状又は縞状に形成されている
ことを特徴とする請求項1乃至5何れか1項に記載の真空バルブ。
The low secondary electron emission coefficient layer is discontinuously formed on the inner wall surface of the vacuum insulating container at intervals in the axial direction of the vacuum insulating container. 5. A vacuum valve according to any one of the preceding claims.
前記真空絶縁容器の周囲を覆う固体絶縁物層と、
前記固体絶縁物層の周囲に配設され、接地電位に接続される接地電位層と、
を具備したことを特徴とする請求項1乃至6何れか1項に記載の真空バルブ。
A solid insulator layer covering the periphery of the vacuum insulation container;
A ground potential layer disposed around the solid insulator layer and connected to the ground potential;
The vacuum valve according to any one of claims 1 to 6, further comprising:
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023090344A (en) * 2021-12-17 2023-06-29 株式会社東芝 vacuum valve
JP7766855B1 (en) * 2025-02-21 2025-11-10 三菱電機株式会社 Vacuum valve and its manufacturing method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5939846U (en) * 1982-09-08 1984-03-14 株式会社東芝 vacuum valve
JPS60100324A (en) * 1983-11-05 1985-06-04 株式会社東芝 Vacuum bulb
JPH052956A (en) * 1990-08-03 1993-01-08 Hitachi Ltd Vacuum circuit breaker
JP2010015919A (en) * 2008-07-07 2010-01-21 Toshiba Corp Vacuum valve
JP2011048997A (en) * 2009-08-26 2011-03-10 Toshiba Corp Mold vacuum valve

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5939846U (en) * 1982-09-08 1984-03-14 株式会社東芝 vacuum valve
JPS60100324A (en) * 1983-11-05 1985-06-04 株式会社東芝 Vacuum bulb
JPH052956A (en) * 1990-08-03 1993-01-08 Hitachi Ltd Vacuum circuit breaker
JP2010015919A (en) * 2008-07-07 2010-01-21 Toshiba Corp Vacuum valve
JP2011048997A (en) * 2009-08-26 2011-03-10 Toshiba Corp Mold vacuum valve

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023090344A (en) * 2021-12-17 2023-06-29 株式会社東芝 vacuum valve
JP7766855B1 (en) * 2025-02-21 2025-11-10 三菱電機株式会社 Vacuum valve and its manufacturing method

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