JP2019109515A - Laminated structure, and electronic device and display device including the same - Google Patents

Abstract

An object of the present invention is to provide a laminated structure capable of realizing improved light efficiency and improved color reproducibility. The laminated structure according to the present invention includes a light emitting layer including a quantum dot polymer composite, a light absorbing layer disposed on the light emitting layer and including an absorption type color filter material, and a light emitting layer. A silicon-containing layer interposed between the light absorbing layers, wherein the quantum dot polymer composite comprises a first polymer matrix and a plurality of quantum dots dispersed in the first polymer matrix. A plurality of quantum dots, wherein the plurality of quantum dots are configured to absorb excitation light and emit light having a wavelength longer than the wavelength of the excitation light, and the absorption type color filter material is disposed in a second polymer matrix. It is configured to absorb the excitation light dispersed and passed through the light emitting layer and transmit the light emitted from the plurality of quantum dots. [Selection diagram] Fig. 1

Description

  The present invention relates to a laminated structure, an electronic device including the same, and a display device, and more particularly, to a laminated structure capable of realizing improved light efficiency and improved color reproduction rate, an electronic device including the same, and a display device.

  Semiconductor nanocrystal particles, also called quantum dots, are crystalline materials of several nano-sizes, and because they are very small in size, they have a large surface area per unit volume and exhibit quantum confinement effects. Show different physical properties from the properties of bulk material of the same composition.

  The quantum dots absorb light from an excitation source to become an energy excited state, and release energy corresponding to the energy band gap.

  Development of light emitting elements and display devices using quantum dots is in progress, and improvement of their characteristics, quality, and the like has become an issue.

Accordingly, the present invention has been made in view of the problems in the above-described conventional quantum dots, and an object of the present invention is to provide a layered structure (layered structure) capable of realizing improved light efficiency and improved color reproduction rate. ) To provide.
Another object of the present invention is to provide an electronic device including the above laminated structure.
Still another object of the present invention is to provide a display element (for example, a liquid crystal display element) including the above-mentioned laminated structure.

  The layered structure according to the present invention made to achieve the above object comprises a light emitting layer comprising a quantum dot polymer composite and a light disposed on the light emitting layer and comprising an absorbing color filter material. A layered structure having a light absorption layer and a silicon containing layer interposed between the light emitting layer and the light absorbing layer, wherein the quantum dot polymer composite is A first polymer matrix and a plurality of quantum dots dispersed in the first polymer matrix, wherein the plurality of quantum dots absorb excitation light and emit light having a wavelength longer than that of the excitation light Configured such that the absorbing color filter material is It is characterized in that it is configured to be dispersed in a primer matrix, to absorb the excitation light having passed through the light emitting layer, and to transmit the light emitted from the plurality of quantum dots.

The silicon-containing layer includes a first surface in contact with the light emitting layer and a second surface facing the first surface, and the light absorbing layer is disposed directly on the second surface of the silicon-containing layer Preferably.
The light absorbing layer includes a first surface facing the light emitting layer, and a second surface facing the first surface, and the stacked structure is the second of the light absorbing layer. It is preferable to further include a translucent substrate disposed on the surface.
Preferably, the quantum dot polymer complex comprises one or more repeating sections configured to emit light having a predetermined wavelength.
The repetitive section includes a first section that emits a first light and a second section that emits a second light different from the first light, and the light absorbing layer includes the first section and the second section. Patterned to have a first absorbing zone and a second absorbing zone respectively corresponding to a zone, said first absorbing zone transmitting at least said first light, and said second absorbing zone being at least said second Preferably, it is configured to transmit light.
Preferably, the first polymer matrix comprises a crosslinked polymer, a carboxylic acid containing binder polymer, or a combination thereof.
The crosslinked polymer preferably comprises a thiolene resin, a crosslinked poly (meth) acrylate, a crosslinked polyurethane, a crosslinked epoxy resin, a crosslinked vinyl polymer, a crosslinked silicone resin, or a combination thereof.
The carboxylic acid-containing binder polymer comprises a first monomer containing a carboxylic acid group and a carbon-carbon double bond, and a second monomer containing a carbon-carbon double bond and a hydrophobic residue and not containing a carboxylic acid group. A linear copolymer of a monomer combination comprising a third monomer having a carbon-carbon double bond, a hydrophilic residue, and no carboxylic acid group, as selected; two in the main chain Embedded image having a skeleton structure in which the aromatic ring of is bonded to a quaternary carbon atom which is a constituent atom of another cyclic residue, and containing a carboxylic acid group (—COOH), or a combination thereof It is preferable to include.
The quantum dot is a group II-VI compound, a group III-V compound, a group IV-VI compound, a group IV element or compound, an I-III-VI group compound, an I-II-IV-VI group compound, or the like It is preferred to include a combination.
The absorptive color filter material preferably comprises an organic pigment, an organic dye, an inorganic pigment, an inorganic dye, or a combination thereof.

The second polymer matrix preferably comprises (meth) acrylic polymer, thiolene polymer, polyurethane, epoxy polymer, vinyl polymer, silicon polymer, imide polymer, or a combination thereof.
The silicon-containing layer is an organosilicon containing a residue represented by SiO _x (x is 1 to 2) or “* -Si-0-Si- *” (* is a portion connected to an adjacent atom) It is preferred to include a compound, or a combination thereof.
The silicon-containing layer preferably includes a vapor-deposited silica layer, a porous silica layer, a plurality of silica particles, or a combination thereof.
The silicon-containing layer comprises a crosslinked polymer, and one or more of the vapor deposited silica layer, the porous silica layer, and the plurality of silica particles are disposed on the layer of the crosslinked polymer, or It is preferred to be dispersed in the crosslinked polymer.
The silicon-containing layer may include a first layer containing a crosslinked polymer, and an SiO _x (x is 1 to 2) -containing layer disposed on one side of the first layer. The SiO _x -containing layer may comprise a deposited silica layer, a porous silica layer, or a combination thereof.
The organosilicon compound preferably contains a silsesquioxane compound. The silsesquioxane compound is [RSiO _3/2 ] _n (where n is 1 to 20, R is hydrogen, C1 to C30 substituted or unsubstituted aliphatic residue, C3 to C30 A substituted or unsubstituted alicyclic residue, a C6 to C30 substituted or unsubstituted aromatic residue, or a combination thereof), and a cage structure, a ladder structure, a polymer structure, or these It is preferred to include silsesquioxane structural units having a combination.
The organosilicon compound preferably contains at least two of the silsesquioxane structural units linked by a linker group containing a bond between sulfur and carbon.
The silicon-containing layer preferably has a silicon content of 10% by weight or more based on its total weight.
The thickness of the silicon-containing layer is preferably 100 nm or more and 3 μm or less.
The silicon-containing layer preferably has a lower refractive index than the light emitting layer and the light absorbing layer.
The laminated structure may be configured to exhibit a color reproduction rate of 80% or more and a light conversion efficiency (CE) of 20% or more based on Digital Cinema Standards (DCI).

  An electronic device according to the present invention made to achieve the above object is characterized by having the laminated structure of the present invention.

  The electronic device may be a display device, an organic electroluminescent device, a micro LED (LED) device, a light emitting device (LED), an image sensor, or an IR sensor.

  A display device according to the present invention made to achieve the above object is a display device including a light source and a self-emission color filter layer disposed on the light source, wherein the self-emission color filter layer is a laminate of the present invention The light source may be configured to provide incident light to the self-emitting color filter layer.

The light source includes a plurality of light emitting units respectively corresponding to the first section and the second section, and the light emitting units include first and second electrodes facing each other, and the first and second electrodes. Preferably, the light emitting layer is disposed between the two.
The light source may further include a charge transport layer between the first electrode and the light emitting layer, between the second electrode and the light emitting layer, or all of them.
The display device may further include a lower substrate, an upper substrate, a polarizing plate disposed under the lower substrate, and a liquid crystal layer interposed between the upper and lower substrates, and the self-emission color filter layer may be the upper substrate The liquid crystal layer is preferably disposed to face the liquid crystal layer thereon.
The light source may include a light emitting element (eg, an LED) and optionally a light guide plate.
Preferably, a polarizer is further included between the liquid crystal layer and the self-emission color filter layer.
The display device preferably exhibits a color reproduction rate of 80% or more and a light conversion efficiency of 20% or more based on a Digital Cinema Initiatives (DCI) standard.

  The layered structure according to the present invention, the electronic device including the same, and the display device can simultaneously achieve improved color purity and contrast, and thus achieve improved light conversion rate and wide wide viewing angle. Also, improved process stability can be achieved.

FIG. 1 is a cross-sectional view schematically illustrating a cross section of a laminated structure according to an embodiment of the present invention. FIG. 1 is a cross-sectional view schematically illustrating a cross section of a laminated structure according to an embodiment of the present invention. FIG. 1 is a cross-sectional view schematically illustrating a cross-section of a laminated structure including a pattern according to an embodiment of the present invention. FIG. 1 is a cross-sectional view schematically illustrating a cross-section of a laminated structure including a pattern according to an embodiment of the present invention. It is the schematic sectional drawing which showed typically various forms of the cross section of Si containing layer. FIG. 6 is a flow chart for explaining a process of forming a self-emission layer including a quantum dot-polymer composite pattern on a substrate in the layered structure according to one embodiment of the present invention. FIG. 1 is a schematic cross-sectional view of a display device according to an embodiment of the present invention. FIG. 1 is a schematic cross-sectional view of a display device according to a non-limiting embodiment of the present invention. FIG. 1 is a schematic cross-sectional view of a display (including a liquid crystal layer) according to a non-limiting embodiment of the present invention. It is a graph which shows a "TOF SIPMS" analysis result in example 1 of an experiment. It is an image which shows an HAADF analysis result in example 1 of an experiment. It is a graph which shows the light emission spectrum of the laminated structure (a light absorption layer is included) of Comparative Example 1 and the laminated structure (a light absorption layer is not included) of Comparative Example 6 which were measured in Experimental example 2.

  Next, specific examples of the laminated structure, the electronic device including the same, and the display device according to the present invention will be described with reference to the drawings.

The advantages and features of the invention, and the manner of achieving them, will be apparent with reference to the embodiments described in detail below in conjunction with the accompanying drawings.
However, the invention is not limited to the embodiments disclosed below, but is realized in various forms different from one another, and the present embodiment is merely for the purpose of perfecting the disclosure of the invention, and a technique to which the invention belongs. It is provided to fully inform the scope of the invention to those of ordinary skill in the field, and the invention is defined only by the scope of the claims.
Thus, in some embodiments, well-known techniques are not specifically described to avoid obscuring the invention. Unless otherwise defined, all terms (including technical and scientific terms) used herein have meanings as commonly understood by one of ordinary skill in the art to which the invention belongs It can be done.
Also, terms defined in commonly used dictionaries are not to be interpreted as ideal or excessive unless explicitly defined otherwise.
When it is referred to as "comprising" certain components throughout the specification, this is meant to be further inclusive of other components rather than excluding other components unless specifically stated to the contrary. Do.
In addition, singular forms also include plural forms unless specifically stated otherwise.

In the following, unless otherwise defined, "substituted" means that the hydrogen in the compound is a C1 to C30 alkyl group, a C1 to C30 alkenyl group, a C2 to C30 alkynyl group, a C6 to C30 aryl group, C7 -C30 alkylaryl group, C1-C30 alkoxy group, C1-C30 heteroalkyl group, C3-C30 heteroalkylaryl group, C3-C30 cycloalkyl group, C3-C15 cycloalkenyl group, C6-C30 cycloalkynyl group, a heterocycloalkyl group of C2 to C30, halogen (-F, -Cl, -Br or -I), hydroxy (-OH), an a nitro group _(-NO 2), a cyano group (-CN) , an amino group (-NRR ', wherein, R and R' is independently hydrogen or C1~C6 alkyl group together.), azido group _(-N 3), a Jinomoto _{(-C (= NH) NH 2} ), hydrazino group (-NHNH _2), hydrazono group (= N _(NH 2), an aldehyde group (-C (= O) H) , carbamoyl group (carbamoyl group, - C (O) _NH 2), thiol group (-SH), an ester group (-C (= O) oR, where, R is C1~C6 alkyl or C6~C12 aryl group.), a carboxyl group (-COOH) or a salt thereof (-C (= O) OM, wherein, M is an organic or inorganic cation.), sulfonic group _(-SO 3 H) or a salt thereof _(-SO 3 M, Here, M is an organic or inorganic cation), a phosphoric acid group (-PO ₃ H ₂ ) or a salt thereof (-PO ₃ MH or -PO ₃ M ₂ , where M is an organic or inorganic) From positive ions) and their combinations It means that it was substituted by the selected substituent.

Here, the “monovalent organic functional group” means a C1 to C30 alkyl group, a C2 to C30 alkenyl group, a C2 to C30 alkynyl group, a C6 to C30 aryl group, a C7 to C30 alkyl aryl group, C1-C30 alkoxy group, C1-C30 heteroalkyl group, C3-C30 heteroalkyl aryl group, C3-C30 cycloalkyl group, C3-C15 cycloalkenyl group, C6-C30 cycloalkynyl group, or C2 -C30 heterocycloalkyl group is meant.
In addition, unless otherwise defined below, "hetero" means one containing at least one (for example, 1 to 3) heteroatoms selected from N, O, S, Si and P.

As used herein, an "alkylene group" is a linear or branched saturated aliphatic hydrocarbon group having two or more valences which selectively includes one or more substituents.
In the present specification, unless otherwise defined, an "arylene group" selectively includes one or more substituents, and more than one formed by removal of at least two hydrogens in one or more aromatic rings. Means a functional group having a valence of
In the present specification, unless otherwise defined, the "heteroarylene group" may optionally include one or more substituents within the range not exceeding the valence number, and N, O, S, Si and P And one or more heteroaromatic or aliphatic rings containing at least one (for example, 1 to 3) hetero atoms selected from and having a valence of 2 or more formed by removing at least two hydrogens. Means

Further, "aliphatic organic group" means a C1 to C30 linear or branched alkyl group, a C2 to C30 linear or branched alkenyl group, or a C2 to C30 linear or branched alkynyl group. , "Aromatic organic group" means a C6 to C30 aryl group or a C2 to C30 heteroaryl group, and "alicyclic organic group" is a C3 to C30 cycloalkyl group, C3 to C30 cycloalkenyl Means a group and a C3-C30 cycloalkynyl group.
In the present specification, “(meth) acrylate” is referred to as including acrylate and / or methacrylate.

The thickness is shown enlarged in order to clearly show the plurality of layers and regions in the drawings. Similar parts are denoted by the same reference numerals throughout the specification.
When a part such as a layer, membrane, area or plate is "above" another part, this is not only when "directly above" the other part, but also when there is another part in between Including. Conversely, when one part is "directly above" another, it means that there is no other part in between.

As used herein, "hydrophobic residue" refers to a residue that can cause the compound to tend to exclude water.
For example, the hydrophobic residue may be an aliphatic hydrocarbon group having 2 or more carbon atoms (such as alkyl, alkenyl or alkynyl), an aromatic hydrocarbon group having 6 or more carbon atoms (such as phenyl, naphthyl or aralkyl group), or carbon It may also contain several or more alicyclic hydrocarbon groups (such as cyclohexyl, norbornene and norbornane).
Hydrophobic residues are not mixed because they virtually lack the ability to form hydrogen bonds with the surrounding medium or they do not match in polarity.

Here, "visible light" can be said to be, for example, light with a wavelength of approximately 400 nm to 700 nm.
Here, “UV” may be, for example, light having a wavelength of about 200 nm or more and less than 400 nm.
Here, the conversion efficiency (CE,%) refers to the ratio of emitted light to incident light.
For example, the light conversion ratio is the ratio of the amount of luminescence of the quantum dot polymer complex to the quantity of light absorbed by the quantum dot polymer complex from excitation light (eg, blue light).

The total light quantity (B) of the excitation light is determined by integration of the PL spectrum of the excitation light, the PL spectrum of the quantum dot composite film is measured, and the light quantity of green or red wavelength light emitted from the quantum dot composite film (A And the quantity of light (B ') of the excitation light that has passed through the quantum dot complex, and then the light conversion ratio is determined according to Formula 1 shown below.
(1)
A / (B-B ') x 100 = light conversion ratio (%) Formula 1

  Here, the “dispersion liquid” may be a colloidal dispersion in which the dispersion or dispersed phase has a dimension of 1 nm to several micrometers (eg, 1 μm or less, 2 μm or less, or 3 μm or less).

As used herein, "Group" refers to a group of the Periodic Table of the Elements.
Here, “Group II” may include Groups IIA and IIB, and examples of Group II metals include, but are not limited to, Cd, Zn, Hg and Mg.
"Group III" may include Groups IIIA and IIIB, and examples of Group III metals include, but are not limited to, Al, In, Ga, and Tl.
"Group IV" may include Groups IVA and IVB, and examples of Group IV metals may include, but are not limited to, Si, Ge, Sn.
As used herein, the term "metal" may also include semimetals such as Si.
"Group I" may include Groups IA and IB, including, but not limited to Li, Na, K, Rb, Cs.
"Group V" includes Group VA and includes, but is not limited to, nitrogen, phosphorus, arsenic, antimony, and bismuth.
"Group VI" includes Group VIA and includes, but is not limited to, sulfur, selenium, tellurium.

The emission characteristics of quantum dots can be applied to various electronic devices such as display devices.
It is preferred to try to replace the absorbing color filters with quantum dot based color filters (e.g. self-emitting color filters) in various electronic devices.
Therefore, development of techniques for improving the light emission properties of quantum dot-based color filters is preferred.

1 and 2 are cross-sectional views schematically showing cross sections of a laminated structure according to an embodiment of the present invention.
A laminated structure according to an embodiment of the present invention includes a light emitting layer including a quantum dot polymer complex, a light absorbing layer disposed on the light emitting layer and including an absorptive color filter material, and a light emitting layer and a light absorbing layer. And a silicon-containing layer interposed therebetween.

Referring to FIG. 1, in one non-limiting embodiment, the light absorbing layer 3 is disposed on the light emitting layer 1 and the silicon-containing layer 2 is interposed therebetween.
The silicon-containing layer 2 has a first surface in contact with the light emitting layer 1 and a second surface opposite to the first surface, and the light absorbing layer 3 is disposed directly on the second surface of the silicon-containing layer .
The light absorbing layer has a first surface facing the light emitting layer and a second surface facing the first surface.
A transmissive substrate is disposed on the second surface of the light absorbing layer.

Referring to FIG. 2, the light absorbing layer 3 is disposed on the light emitting layer 1, and the silicon-containing layer 2 is interposed between them, and the first surface of the light absorbing layer faces the light emitting layer. The light transmitting substrate 4 is disposed on the second surface opposite to the first surface.
The translucent substrate can be a substrate including an insulating material.
The translucent substrate may be transparent to visible light.
Here, "transparent" means that the transmittance to light is 80% or more, for example, 85% or more, 90% or more, or 95% or more.

Translucent substrates include silica-based glass, polyesters such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), various polymers such as polyimide, polyamide-imide, polycarbonate, poly (meth) acrylate, etc., polysiloxanes (eg, , PDMS), Al ₂ O ₃ , inorganic materials such as ZnO, or combinations thereof, but is not limited thereto.
The thickness of the translucent substrate is appropriately selected in consideration of the substrate material and the like, and is not particularly limited.
The light transmitting substrate may be flexible.
A substrate is disposed directly on the second surface of the light absorption layer.
The refractive index of the light transmitting substrate may be lower than that of the light absorbing layer.

The quantum dot polymer complex included in the light emitting layer may include one or more repeating sections configured to emit light having a predetermined wavelength.
In one embodiment, the repeating sections comprise a first section (R) that emits a first light (eg, red light) and a second section (G) that emits a second light (eg, green light) different from the first light. And the light absorbing layer may be patterned to have a first absorbing section, a second absorbing section, or all of them corresponding to the first section, the second section, or all of them.
The first absorbing section and the second absorbing section may be configured to transmit at least first light and at least second light, respectively.
For example, the first absorption section transmits the first light (for example, red light) and blocks the light (for example, green light and / or blue light) of wavelengths other than the later-described wavelength range of the first light. Configured
The second absorption section is configured to transmit the second light (for example, green light) and to block the light (for example, red light and / or blue light) of wavelengths other than the later-described wavelength range of the second light Ru.

FIGS. 3a and 3b are cross sectional views schematically showing cross sections of a laminated structure including a pattern according to an embodiment of the present invention.
Referring to FIGS. 3a and 3b, the light emitting layer includes an R section of the quantum dot polymer complex emitting red light and a G section of the quantum dot polymer complex emitting green light, and the light absorbing layer includes R It may be patterned to correspond to the compartments and G compartments, or to correspond to both the R and G compartments.
The light emitting layer comprises the B section of the quantum dot polymer complex that emits blue light.
Alternatively, the light emitting layer may not include quantum dots in a portion corresponding to the B section so as to transmit blue light (excitation light).

The first light may have a first peak wavelength (e.g., maximum emission peak wavelength) in the range of 580 nm to 650 nm (e.g., 620 nm to 650 nm).
The first compartment may be an R compartment that emits red light.
The second light may have a second peak wavelength in the range of 480 nm to 580 nm (e.g., 500 nm to 560 nm).
The second compartment may be a G compartment that emits green light.
The light emitting layer may include a third section for emitting / passing the third light.
The third section may or may not include quantum dots.
The third light may have a third peak wavelength in the range of 380 nm to 480 nm (e.g., 440 nm to 480 nm).
The third light may be excitation light, but is not limited thereto.

Quantum dots have a theoretical quantum efficiency (QY) of 100% and can emit light of high color purity (eg, half bandwidth of 40 nm or less).
Quantum dot polymer composites or patterns thereof and laminate structures comprising the same can find potential utility as self-emitting color filters in color filters, for example, various electronic devices such as liquid crystal displays.

Prior art liquid crystal display devices include a backlight, a liquid crystal layer, and an absorbing color filter.
In such a device, white light emitted from the backlight passes through the liquid crystal layer to reach the absorptive color filter, and light having a predetermined wavelength through the color filter (RGB) formed corresponding to each pixel Only the remaining light is absorbed, and a predetermined color can be realized in each pixel.
Absorption-type color filters, in principle, can not avoid a substantial decrease in light efficiency.
In addition, since the light travels straight through the liquid crystal, there is a limit to the achievable viewing angle.

A display (for example, a liquid crystal display) device employing a quantum dot-based self-emission color filter is an excitation light (for example, blue) in which an external light source (for example, a backlight unit) can excite quantum dots instead of white light A self-emitting color filter configured to emit light or UV and including quantum dots is disposed on the panel top of the display element (e.g. on a liquid crystal layer or upper substrate), each pixel having light of a predetermined wavelength discharge.
Since light conversion by quantum dots occurs at the top of the panel, light that has become rectilinear while passing through the liquid crystal can travel in all directions while passing through the color filter, a display device based on an absorption type color filter It is possible to overcome the wide viewing angle limit of
In addition, it is expected that the light loss due to the absorption type color filter can be avoided.

Displays that use quantum dot-based color filters require an “in-cell polarizer” (ICP) structure in which a polarizer is placed between the color filter and the liquid crystal layer as the converted light travels forward. It can be done.
A display with a quantum dot based color filter may not be converted by the color filter, and the emission of excitation light traveling to the front of the upper substrate may be a problem, so the color reproducibility may be significantly reduced And it may even be impossible to achieve the desired color.
There is a need to develop a technology for achieving the level of color reproducibility required for a quantum dot-based color filter as a display device.

In order to solve such a problem, there has been an attempt to prevent / suppress emission of excitation light (for example, blue light) using a blue light blocking filter (BCF).
However, most such blue light blocking filters comprise a stack of layers of materials (eg, inorganic materials) having different refractive indices that are configured to reflect blue light.
Since such a blue light blocking filter requires a process of laminating multiple high quality (ie defect free) inorganic thin film layers and patterning it, it is possible to use a quantum dot-based color filter. There is a risk of rapidly increasing manufacturing costs.
In addition, the blue light blocking filter having such a multilayer structure may substantially reduce the contrast of the display element in order to enhance reflection by external light, which may lead to a problem of lowering the definition of the display element. .

A laminated structure according to an embodiment of the present invention has the above-described structure and solves such problems.
In the laminated structure according to one embodiment of the present invention, the light absorbing layer containing the absorptive color filter material is disposed on the light emitting layer containing the quantum dot polymer complex, and between the light emitting layer and the light absorbing layer The silicon-containing layer intervenes in the
The absorbing color filter material dispersed in the second polymer matrix is configured to absorb the unconverted excitation light that has passed through the light emitting layer and to transmit the light emitted from the plurality of quantum dots.

  By having such a structure, the laminated structure according to an embodiment of the present invention can simultaneously achieve improved color purity and contrast, and the technical effects (for example, improvement) of the quantum dot-based color filter can be achieved. Light efficiency and wide wide viewing angle).

The quantum dot polymer composite included in the light emitting layer includes a first polymer matrix and a plurality of quantum dots dispersed in the first polymer matrix.
The plurality of quantum dots absorb excitation light (for example, blue light with a maximum emission peak wavelength of 430 nm to 470 nm or green light with a maximum emission peak wavelength of 510 nm to 550 nm) and have a wavelength longer than that of the excitation light It is configured to emit light (for example, the first light and the second light, etc.) (of lower energy than the energy of excitation light).

The first polymer matrix may comprise a crosslinked polymer, a carboxylic acid containing binder polymer, or a combination thereof.
The crosslinked polymer may be a polymer crosslinked by light.
The crosslinked polymer can be a thiolene resin, a crosslinked poly (meth) acrylate, a crosslinked polyurethane, a crosslinked epoxy resin, a crosslinked vinyl polymer, a crosslinked silicone resin, or a combination thereof.
The crosslinked polymer may be a copolymer.

The crosslinked polymer has one or more, for example, two, three or four, photopolymerizable functional groups (for example, carbon-carbon double bonds such as (meth) acrylate groups or vinyl groups, epoxy groups, etc.) It may be a polymerization product of a combination including polymerizable compounds (for example, monomers or oligomers) containing five, six, or more.
The photopolymerizable compound may be a photopolymerizable monomer or oligomer generally used in a photosensitive resin composition.

In one embodiment, the photopolymerizable compound is an acrylate monomer, an ethylenically unsaturated monomer such as a vinyl monomer, a reactive oligomer having two or more photopolymerizable residues (for example, an epoxy group, a vinyl group, etc.) For example, ethylene oligomers, alkylene oxide oligomers, etc.), copolymers of reactive oligomers and ethylenically unsaturated monomers, urethane oligomers having two or more photopolymerizable residues (eg, acrylate residues), two photopolymerizable residues It may contain one or more siloxane oligomers or a combination thereof.
The photopolymerizable compound may further include a thiol compound having two or more thiol groups at both ends.
The photopolymerizable compounds are commercially available or can be synthesized by known methods.
The crosslinked polymer can be the polymerization product of a mixture comprising a photopolymerizable compound.

The (meth) acrylate monomer may comprise a monofunctional or polyfunctional ester of (meth) acrylic acid having one or more carbon-carbon double bonds.
The acrylate monomer can comprise a di (meth) acrylate compound, a tri (meth) acrylate compound, a tetra (meth) acrylate compound, a penta (meth) acrylate compound, a hexa (meth) acrylate compound, or a combination thereof.
Examples of acrylate monomers are alkyl (meth) acrylates, ethylene glycol di (meth) acrylates, triethylene glycol di (meth) acrylates, diethylene glycol di (meth) acrylates, 1,4-butanediol di (meth) acrylates, 1,1 6-hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol di (meth) Acrylate, dipentaerythritol tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, bis Enol A epoxy acrylate, bisphenol A di (meth) acrylate, trimethylol propane tri (meth) acrylate, novolak epoxy (meth) acrylate, ethyl glycol monomethyl ether (meth) acrylate, tris (meth) acryloyloxyethyl phosphate, dipropylene glycol It may be di (meth) acrylate, tripropylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, but is not limited thereto.

The multiple thiol compound having two or more thiol groups at both ends may be a compound represented by Chemical Formula 1 shown below.

Here, R ¹ is hydrogen, a substituted or unsubstituted C1 to C30 linear or branched alkyl group, a substituted or unsubstituted C6 to C30 aryl group, a substituted or unsubstituted C7 to C30 arylalkyl Group, substituted or unsubstituted C3-C30 heteroaryl group, substituted or unsubstituted C3-C30 heteroarylalkyl group, substituted or unsubstituted C3-C30 cycloalkyl group, substituted or unsubstituted C2-C30 Heterocycloalkyl group, C1 to C10 alkoxy group, hydroxy group, -NH ₂ , substituted or unsubstituted C1 to C30 amine group (-NRR ', wherein R and R' each independently represent hydrogen Or a C1 to C30 linear or branched alkyl group but simultaneously not hydrogen), an isocyanate group, a halogen, -ROR '(wherein R is a substituted or unsubstituted C1 C20 alkylene group, R ′ is hydrogen or a C1-20 straight or branched alkyl group), an acyl halide (—RC (= O) X, where R is substituted or non-substituted) A substituted alkylene group, X is a halogen), -C (= O) OR '(wherein R' is hydrogen or a C1-C20 linear or branched alkyl group) , -CN, -C (= O) NRR '(wherein R and R' are each independently hydrogen or a C1-C20 linear or branched alkyl group), -C (= O). ) ONRR ′ (wherein R and R ′ are, independently of each other, hydrogen or a C1-C20 linear or branched alkyl group), or a combination thereof,
L ₁ represents a carbon atom, a substituted or unsubstituted C1 to C30 alkylene group, one or more methylene (-CH _2- ) sulfonyl (-SO _2- ), carbonyl (CO), ether (-O-) , Sulfide (-S-), sulfoxide (-SO-), ester (-C (= O) O-), amide (-C (= O) NR-) (wherein R is hydrogen or C1 to C10) Or a substituted or unsubstituted C 1 to C 30 alkylene group, a substituted or unsubstituted C 3 to C 30 cycloalkylene group, or a substituted or unsubstituted C 6 to C 30 arylene. A substituted or unsubstituted C3-C30 heteroarylene group, or a substituted or unsubstituted C3-C30 heterocycloalkyl group;
Y ₁ is a direct bond, a substituted or unsubstituted C1 to C30 alkylene group, a substituted or unsubstituted C2 to C30 alkenylene group, at least one methylene (-CH _2- ) is sulfonyl (-S (= O) _2- ), carbonyl (-C (= O)-), ether (-O-), sulfide (-S-), sulfoxide (-S (= O)-), ester (-C (= O) O- ), Amide (-C (= O) NR-) (wherein R is hydrogen or a C1-C10 linear or branched alkyl group), imine (-NR-) (where R is Is a hydrogen or a C1 to C10 linear or branched alkyl group) or a substituted or unsubstituted C2 to C30 alkylene group or a substituted or unsubstituted C3 to C30 alkenylene substituted by these or combinations thereof And
m is an integer of 1 or more,
k1 is an integer of 0 or 1 or more, k2 is an integer of 1 or more,
The sum of m and k2 is an integer of 3 or more,
When Y ₁ is not a direct bond, m does not exceed the valence of Y ₁ , and the sum of k 1 and k 2 does not exceed the valence of L ₁ .

The multiple thiol compound may include a compound having a chemical formula (1-1) shown below.

Here, L ₁ ′ is carbon, substituted or unsubstituted C 2 to C 20 alkylene group, substituted or unsubstituted C 6 to C 30 arylene group, substituted or unsubstituted C 3 to C 30 heteroarylene group, substituted or unsubstituted A substituted C3 to C30 cycloalkylene group, a substituted or unsubstituted C3 to C30 heterocycloalkylene group,
Y _{a to} Y _d each independently represent a direct bond, a substituted or unsubstituted C 1 to C 30 alkylene group, a substituted or unsubstituted C 2 to C 30 alkenylene group, or at least one methylene (—CH ₂ —) group Sulfonyl (-S (= O) _2- ), carbonyl (-C (= O)-), ether (-O-), sulfide (-S-), sulfoxide (-S (= O)-), ester ( -C (= O) O-), amide (-C (= O) NR-) (wherein R is hydrogen or a C1-C10 linear or branched alkyl group), imine (- NR—) (wherein R is hydrogen or a C1 to C10 linear or branched alkyl group) or a substituted or unsubstituted C2 to C30 alkylene group substituted by a combination of these, or a substitution Or unsubstituted C3 to C30 alkenylene group ,
R _{a to} R _d are each independently R ¹ or SH of the chemical formula 1, and two or more of R _{a to} R _d are SH.

The multiple thiol compounds can be dithiol compounds, trithiol compounds, tetrathiol compounds, or combinations thereof.
The multiple thiol compounds may be ethoxylated pentaerythritol tetra (3-mercaptopropionate), trimethylolpropane tri (3-mercaptopropionate), trimethylolpropane tri (2-mercaptoacetate), glycol di-3-mercaptoproto. Peonate, polypropylene glycol di 3-mercapto propionate, ethoxylated trimethylpropane tri (3-mercapto propionate), glycol dimercapto acetate, ethoxylated glycol dimercapto acetate, 1,4-bis (3-mercaptobutyryl Oxy) butane, trimethylolpropane tris (3-mercaptopropionate), tris [2- (3-mercaptopropionyloxy) ethyl] isocyanurate, 1,3,5-tris (3- Captobutyloxyethyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, pentaerythritol tetrakis (3-mercaptopropionate), pentaerythritol tetrakis (2-mercaptoacetate) , 1,6-hexanedithiol, 1,3-propanedithiol, 1,2-ethanedithiol, polyethylene glycol dithiol containing 1 to 10 ethylene glycol repeating units, or a combination thereof.
The reaction between the thiol compound and the ethylenically unsaturated monomer can form a thiolene resin.

The carboxylic acid-containing binder polymer comprises a first monomer comprising a carboxylic acid group and a carbon-carbon double bond, a second monomer having a carbon-carbon double bond and a hydrophobic residue, and no carboxylic acid group, and A linear copolymer of a monomer combination comprising a third monomer having a carbon-carbon double bond, a hydrophilic residue and no carboxylic acid group according to
In the main chain, it has a backbone structure in which two aromatic rings are bonded to quaternary carbon atoms that are constituent atoms of other cyclic residues, and contains multiple aromatic rings containing a carboxylic acid group (—COOH) It may comprise a polymer, or a combination thereof.

Examples of the first monomer include, but are not limited to, acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, 3-butenonic acid, vinyl acetate compounds such as vinyl acetate and vinyl benzoate, etc. .
The first monomer may be one or more compounds.

Specific examples of the second monomer are styrene, alpha-methylstyrene, alkenyl toluene such as vinyl toluene, vinyl benzyl methyl ether, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, benzyl Unsaturated carboxylic acid ester compounds such as acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl acrylate Unsaturated carboxylic acid aminoalkyl esters such as methacrylate, N-phenyl maleimide N-benzyl maleimide or maleimides such as N-alkyl maleimide, glycidyl acrylate, glycidyl acrylate, unsaturated carboxylic acid glycidyl esters such as glycidyl methacrylate, acrylonitrile, methacrylonitrile vinyl cyanide such as methacrylonitrile, acrylamide, methacrylamide unsaturated Amides include, but are not limited to, amides.
One or more compounds may be used as the second monomer.

Examples of the third monomer include, but are not limited to, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxybutyl acrylate, 2-hydroxybutyl methacrylate.
One or more compounds may be used as the third monomer.

The copolymer may comprise a first repeat unit derived from a first monomer, a second repeat unit derived from a second monomer, and a third repeat unit optionally derived from a third monomer.
In the copolymer, the content of the first repeating unit may be 10 mol% or more, for example, 15 mol% or more, 25 mol% or more, or 35 mol% or more.
In the carboxylic acid polymer, the content of the first repeating unit is 90 mol% or less, for example, 89 mol% or less, 80 mol% or less, 70 mol% or less, 60 mol% or less, 50 mol% or less, 40 mol% Hereinafter, it may be 35 mol% or less, or 25 mol% or less.
In the copolymer, the content of the second repeating unit may be 10 mol% or more, for example, 15 mol% or more, 25 mol% or more, or 35 mol% or more.
In the binder polymer, the content of the second repeating unit is 90 mol% or less, for example, 89 mol% or less, 80 mol% or less, 70 mol% or less, 60 mol% or less, 50 mol% or less, 40 mol% or less , 35 mol% or less, or 25 mol% or less.

In the carboxylic acid-containing binder polymer, when present, the content of the third repeating unit may be 1 mol% or more, for example, 5 mol% or more, 10 mol% or more, or 15 mol% or more.
In the binder polymer, the content of the third repeating unit may be 30 mol% or less, for example, 25 mol% or less, 20 mol% or less, 18 mol% or less, 15 mol% or less, or 10 mol% or less.

The copolymer may be a copolymer of (meth) acrylic acid and one or more second / third monomers selected from aryl or alkyl (meth) acrylates, hydroxyalkyl (meth) acrylates and styrene.
For example, the binder polymer may be methacrylic acid / methyl methacrylate copolymer, methacrylic acid / benzyl methacrylate copolymer, methacrylic acid / benzyl methacrylate / styrene copolymer, methacrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer And methacrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer.

The carboxylic acid containing binder polymer may comprise multiple aromatic ring containing polymers.
The multiple aromatic ring-containing polymer has a backbone structure in which two aromatic rings are bonded to a quaternary carbon atom which is a constituent atom of another cyclic residue in the main chain (for example, in the main chain) Containing) a carboxylic acid group (-COOH).

In the multiple aromatic ring-containing polymer, the backbone structure may include a unit represented by the chemical formula A shown below.

Here, * is a moiety linked to the adjacent atom of the binder main chain, and Z ¹ is any of the linking residues represented by the chemical formulas (A-1) to (A-6) shown below In the chemical formulas (A-1) to (A-6), * is a moiety linked to an aromatic residue.
(Here, R ^a is a hydrogen atom, an ethyl group, C ₂ H ₄ Cl, C ₂ H ₄ OH, CH ₂ CH = CH ₂ or a phenyl group.)

The multi-aromatic ring-containing polymer may include structural units represented by Chemical Formula B shown below.

Here, Z ¹ is any one of the linking residues represented by chemical formulas (A-1) to (A-6),
L has a direct bond, a C1 to C10 alkylene, a C1 to C10 alkylene having a substituent containing a carbon-carbon double bond, a C1 to C10 oxyalkylene, or a substituent containing a carbon-carbon double bond C1 to C10 oxyalkylene,
R ¹ and R ² are each independently a hydrogen atom, a halogen atom or a substituted or unsubstituted C ¹ -C 20 alkyl group,
m1 and m2 are each independently an integer of 0 to 4,
A is -NH-, -O-, or C1-C10 alkylene;
Z ² is an aromatic organic group C6～C40.

In Formula B, Z ² may be any one of the following Formula (B-1), Formula (B-2), and Formula (B-3).
Here, * is a moiety linked to the adjacent carbonyl carbon,
Where * is the moiety linked to the carbonyl carbon,
Here, * is a moiety linked to the carbonyl carbon, and L is a direct bond, -O-, -S-, -C (= O)-, -CH (OH)-, -S (= O ) _2- , -Si (CH ₃ ) _2- , (CH ₂ ) _p (where, 1 p p) 10), (CF ₂ ) _q (where, 1 q q 10 10), -CR _2- ( Here, each R independently represents hydrogen, a C1 to C10 aliphatic hydrocarbon group, a C6 to C20 aromatic hydrocarbon group, or a C6 to C20 alicyclic hydrocarbon group.), -C _{(CF 3) 2 -, -} C (CF 3) (C 6 H 5) -, or -C (= O) is NH-.

The multiple aromatic ring-containing polymer may include a structural unit represented by Chemical Formula C shown below.
Here, R ¹ and R ² are each independently a hydrogen atom or a substituted or unsubstituted (meth) acryloyloxyalkyl group,
R ³ and R ⁴ are each independently a hydrogen atom, a halogen atom or a substituted or unsubstituted C ^{1 to} C 20 alkyl group,
Z ¹ is one residue selected from the linking residues represented by chemical formulas (A-1) to (A-6),
Z ² is an aromatic organic group, for example, as described above,
m1 and m2 are each independently an integer of 0 to 4,
* Is a moiety linked to an adjacent atom.

In some embodiments, the multiple aromatic ring containing polymer can be an acid adduct of bisphenol fluorene epoxy acrylate.
For example, bisphenol fluorene epoxy acrylate is obtained by reacting 4,4- (9-fluorenylidene) -diphenol with epichlorohydrin to obtain an epoxy compound having a fluorene residue, and reacting the epoxy compound with acrylic acid to obtain hydroxy. After obtaining a fluorenyl epoxy acrylate having a group, it is obtained by reacting it with biphenyl dianhydride and / or phthalic anhydride again.
Such a reaction equation can be summarized as follows.

The multiple aromatic ring-containing polymer may include a functional group represented by Formula D shown below at at least one of both ends.

In Chemical Formula D, Z ³ is a residue represented by any one of Chemical Formulas (D-1) to (D-7) shown below, and * is a moiety linked to an adjacent atom It is.
(Wherein R ^b and R ^c each independently represent a hydrogen atom, a substituted or unsubstituted ^C 1 to ^{C 20} alkyl group, or one or more methylenes replaced with an ester group, an ether group, or a combination thereof) A substituted or unsubstituted C1-C20 alkyl group)
(Here, R ^d is O, S, NH, a substituted or unsubstituted C1-C20 alkylene group, a C1-C20 alkylamine group or a C2-C20 alkenylamine group.)

Multiple aromatic ring containing polymers are synthesized by known methods or are commercially available (eg, from Nippon Steel Chemical Co., Ltd.).
In a non-limiting example, the multi-aromatic ring containing polymer is 9,9-bis (4-hydroxyphenyl) fluorene, 9,9-bis (4-amino) Phenyl) fluorene (9,9-bis (4-aminophenyl) fluorene), 9,9-bis [4- (glycidyloxy) phenyl] fluorene (9,9-bis [4- (glycidyloxy) phenyl] fluorene), 9 9-bis [4- (2-hydroxyethoxy) phenyl] fluorene (9,9-Bis [4- (2-hydroxyethoxy) phenyl] fluorene) and 9,9-bis- (3,4-dicarboxyphenyl) Full orange anhydride (9,9-bis- Fluorene compounds selected from 3,4-dicarboxyphenyl) fluorene dianhydrides, and appropriate compounds capable of reacting with these fluorene compounds (for example, pyromellitic anhydride (PDMA), biphenyl tetracarboxylic acid dianhydride (BPDA) , An aromatic acid dianhydride selected from benzophenol tetracarboxylic acid dianhydride and naphthalene tetracarboxylic acid dianhydride, a C 2 to C 30 diol compound, epichlorohydrin etc.) It may contain residues.
Fluorene compounds, acid dianhydrides and diol compounds are commercially available, and conditions for reaction between them are also known.

The carboxylic acid-containing polymer (binder) may have an acid value of 50 mg KOH / g or more.
For example, the carboxylic acid polymer is 60 mg KOH / g or more, 70 mg KOH / g, 80 mg KOH / g, 90 mg KOH / g, 100 mg KOH / g, 110 mg KOH / g or more, 120 mg KOH / g or more, 125 mg KOH / g or more, or 130 mg KOH / g or more possible.
The acid value of the polymer is, for example, 250 mg KOH / g or less, such as 240 mg KOH / g or less, 230 mg KOH / g or less, 220 mg KOH / g or less, 210 mg KOH / g or less, 200 mg KOH / g or less, 190 mg KOH / g or less, 180 mg KOH / g or less And 160 mg KOH / g or less, but is not limited thereto.

The quantum dots (hereinafter, also referred to as semiconductor nanocrystals) disposed (for example, dispersed) in the first polymer matrix are not particularly limited, and are known or commercially available.
For example, the quantum dot may be a group II-VI compound, a group III-V compound, a group IV-VI compound, a group IV element or compound, a group I-III-VI compound, an I-II-IV-VI group It may comprise a compound, or a combination of these.
The quantum dots may not contain cadmium, lead, and combinations thereof.

The II-VI group compound is a binary compound selected from the group consisting of CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, MgSe, MgS and mixtures thereof, CdSeS, CdSeTe, CdSTe, ZnSeS H, ZnSeTe, ZnTe, HgSeS, HgSeTe, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgS, CdHgTe, HgZnS, HgZnSe, HgZnTe, MgZnSe, MgZnS, and a mixture of these, HZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe and It may be selected from the group consisting of classical element compound selected from the group consisting of al.
The II-VI compounds can also further comprise a Group III metal.

The Group III-V compound is a bielement compound selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and a mixture thereof, GaNP, GaNAs, GaNSb , GaAlPs, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, and trielement compounds selected from the group consisting of GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNAs, InNSb, InPAs, InPSb, and mixtures thereof GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNPs, InAlNAs, InAlNAs, InAlNSb, InAlPAs, InAlPSb, InZnP, and It may be selected from the group consisting of classical element compound selected from the group consisting of mixtures.
Group III-V compounds can also further comprise a Group II metal (eg, InZnP).

  The IV-VI group compound is a binary compound selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe and mixtures thereof, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe And trielement compounds selected from the group consisting of these mixtures, and tetraelement compounds selected from the group consisting of SnPbSSe, SnPbSeTe, SnPbSTe, and mixtures thereof.

Examples of group I-III-VI _{compound, CuInSe 2, CuInS 2, CuInGaSe} , and including CuInGaS, but is not limited thereto.
Examples of Group I-II-IV-VI-VI compounds include, but are not limited to, CuZnSnSe and CuZnSnS.
The Group IV element or compound may be selected from the group consisting of a single element selected from the group consisting of Si, Ge and mixtures thereof, and a dielement compound selected from the group consisting of SiC, SiGe and mixtures thereof.

The two-element compound, the three-element compound or the four-element compound may be present in the particles at a uniform concentration, or may be present in the same particle in a state where the concentration distribution is partially different.
The semiconductor nanocrystal has a core / shell structure in which a second semiconductor nanocrystal having a composition different from that of the first semiconductor nanocrystal is disposed on a core including the first semiconductor nanocrystal.
An alloy interlayer may or may not be present at the core-shell interface.
When including an alloy interlayer, the core-shell interface may have a concentration gradient in which the concentration of elements present in the shell varies radially (e.g. becomes lower or higher toward the core) .
The shell may include two or more layers of multi-layer shells.
In a multi-layered shell, each layer may be a single composition, an alloy, or a composition having a concentration gradient, but is not limited thereto.

Core-shell semiconductor nanocrystals have a larger energy band gap in the shell than the core, or the opposite structure.
Also in the case of constructing a multi-layered shell, the shell located on the outer side of the core may have a larger energy band gap than the shell closer to the core, but is not limited thereto.
The quantum dots may have a size of about 1 nm to about 100 nm (for particle size or non-spherical particles, the particle size calculated from the two dimensional area confirmed by electron microscopy analysis).

In one embodiment, the quantum dots may have a particle size (the largest part size if not spherical) of about 1 nm to about 20 nm, for example 2 nm (or 3 nm) to 15 nm.
In one embodiment, the quantum dots can be about 2 nm or more, 3 nm or more, 4 nm or more, or 5 nm or more.
The quantum dots may be 50 nm or less, 45 nm or less, 35 nm or less, 30 nm or less, 25 nm or less, 20 nm or less, 15 nm or less, 10 nm or less, 9 nm or less, 8 nm or less, or 7 nm or less.

In addition, the form of the quantum dot is a form generally used in the art, and is not particularly limited.
For example, the quantum dots can include spherical, elliptical, pyramidal, multi-arm, or cubic nanoparticles, nanotubes, nanowires, nanofibers, nanosheets, or combinations thereof.
Also, quantum dots are commercially available or may be synthesized in any manner.
For example, several nano-sized quantum dots can be synthesized through a wet chemical process.

In the chemical wet method, precursor substances are reacted in an organic solvent to grow crystal particles, and at this time, crystal growth is controlled by the organic solvent or ligand compound spontaneously coordinating to the surface of the quantum dot. can do.
Specific types of organic solvents and ligand compounds are known. Since the organic solvent thus coordinated to the surface of the quantum dot may affect the stability in the device, the excess organic substance not coordinated to the surface of the nanocrystal is an excess of non-solvent (non-solvent). And the resulting mixture can be removed through the process of centrifuging.
Specific types of non-solvents include, but are not limited to, acetone, ethanol, methanol, and the like.

Quantum dots have an organic ligand attached to the surface.
Organic ligands can have hydrophobic residues.
In one embodiment, the organic _{ligand, RCOOH, RNH 2, R 2} NH, R 3 N, RSH, R 3 PO, R 3 P, ROH, RCOOR ', RPO (OH) 2, RHPOOH, R 2 POOH ( here And R and R ′ each independently represent a substituted or unsubstituted C5-C24 aliphatic hydrocarbon group, for example, a substituted or unsubstituted alkyl or alkenyl, or a substituted or unsubstituted C6-C20 aromatic It may comprise hydrocarbon groups, for example aryl groups), polymeric organic ligands, or combinations thereof.

Examples of organic ligand compounds include methanethiol, ethanethiol, propanethiol, butanethiol, pentanethiol, hexanethiol, octanethiol, dodecanethiol, hexadecanethiol, hexadecanethiol, octadecanethiol, thiol compounds such as benzylthiol, methaneamine, ethaneamine, propane Amine, butanamine, pentylamine, hexylamine, octylamine, nonylamine, decylamine, dodecylamine, hexadecylamine, octadecylamine, dimethylamine, diethylamine, diethylamine, dipropylamine, amines such as tributylamine, trioctylamine, methane acid, Ethanoic acid, propanoic acid, butanoic acid, pentanoic acid, hexanoic acid, heptanoic acid, octanoic acid, dodecanoic acid, hexadecanoic acid, octoic acid Decane compounds such as decanoic acid, oleic acid, carboxylic acid compounds such as benzoic acid, methyl phosphine, ethyl phosphine, propyl phosphine, butyl phosphine, pentyl phosphine, octyl phosphine, dioctyl phosphine, tributyl phosphine, trioctyl phosphine, etc. Phosphine compounds such as methyl phosphine oxide, ethyl phosphine oxide, propyl phosphine oxide, butyl phosphine oxide, pentyl phosphine oxide, tributyl phosphine oxide, octyl phosphine oxide, dioctyl phosphine oxide, trioctyl phosphine oxide or oxide compounds thereof, diphenyl phosphine, triphenyl Phosphine compounds or oxide compounds thereof, hexylphos C5-C20 alkylphosphinic acids such as phosphoric acid, octylphosphinic acid, dodecanephosphinic acid, tetradecanephosphinic acid, hexadecanephosphinic acid, octadecanephosphinic acid, C5-C20 alkyl phosphonic acids, etc., It is not limited to this.
The quantum dot may contain the organic ligand alone or in a mixture of one or more.

The quantum dots have a quantum efficiency of about 10% or more, for example about 30% or more, about 50% or more, about 60% or more, about 70% or more, about 90% or more, or about 100%. obtain.
Also, quantum dots can have a narrow light emission spectrum.
For example, the quantum dots can have a half-width of the emission wavelength spectrum of about 45 nm or less, such as about 40 nm or less, or about 30 nm or less.

Quantum dots can vary in size and composition to emit light in the ultraviolet to visible or even near infrared or higher wavelength range.
For example, quantum dots can emit light in the range of 300 nm to 700 nm, such as light in the range of 400 nm to 700 nm or light of wavelengths of 700 nm or more, but is not limited thereto.
For example, the quantum dot can absorb a third light (eg, blue light) and emit (eg, be excited by the third light) the first light or the second light.

If necessary, the quantum dot polymer complex can further include metal oxide microparticles.
The metal oxide particles may comprise titanium oxide, silicon oxide, barium oxide, zinc oxide, or a combination thereof.
The metal oxide fine particles may include TiO ₂ , SiO ₂ , BaTiO ₃ , Ba ₂ TiO ₄ , ZnO, ZrO ₂ , or a combination thereof.
The average particle size of the metal oxide fine particles may be 100 nm or more and 500 nm or less, but is not limited thereto.
The metal oxide particles can perform the function of light diffusion / scattering.

In the quantum dot polymer complex, the content of the quantum dot is not particularly limited, and can be appropriately adjusted.
The quantum dot content is 1% by weight or more based on the total weight of the complex, for example, 2% by weight or more, 3% by weight or more, 4% by weight or more, 5% by weight or more, 6% by weight or more, 7% by weight 8% by weight, 9% by weight, 10% by weight, 11% by weight, 12% by weight, 13% by weight, 14% by weight, 15% by weight, 16% by weight, 17% by weight 18% by weight, 19% by weight, 20% by weight, 21% by weight, 22% by weight, 23% by weight, 24% by weight, 25% by weight, 26% by weight, 27% by weight Above, 28 weight% or more, 29 weight% or more, or 30 weight% or more may be sufficient.
The content of the quantum dots is 70% by weight or less, for example, 65% by weight or less, 60% by weight or less, 55% by weight or less, 50% by weight or less, 45% by weight or less, based on the total weight of the composite % Or less, 35% by weight or less, 30% by weight or less, 25% by weight or less, 20% by weight or less, 19% by weight or less, 17% by weight or less, or 15% by weight or less.

In the quantum dot polymer composite, when present, the content of the metal oxide fine particles is 0.1% by weight or more, 0.5% by weight or more, 1% by weight or more, 2% by weight based on the total weight of the complex Above, 3 weight% or more, 4 weight% or more, 5 weight% or more, 6 weight% or more, 7 weight% or more, 8 weight% or more, or 9 weight% or more.
The metal oxide fine particles are 50 wt% or less, 40 wt% or less, 30 wt% or less, 25 wt% or less, 20 wt% or less, 19 wt% or less, 18 wt% or less, based on the total weight of the composite. It may be at most wt%, at most 16 wt%, or at most 15 wt%.

The thickness of the light emitting layer in the laminated structure can be appropriately selected.
For example, the thickness of the light emitting layer is 2 micrometers (micrometer, μm) or more, for example, 3 μm or more, 4 μm or more and 12 μm or less, for example 10 μm or less, 9 μm or less, 8 μm or less, 7 μm or less, or 6 μm or less obtain.

A light absorbing layer disposed on the light emitting layer and comprising an absorbing color filter material, wherein the absorbing color filter material is dispersed within the second polymer matrix, and the absorbing color filter material passes through the light emitting layer Configured to absorb the excitation light and transmit the light emitted from the plurality of quantum dots.
In one embodiment, the light absorbing layer arranged in the structure can achieve improved color purity without contrast degradation of the display element, unlike blue light blocking filters comprising multilayer inorganic films.

In one embodiment, the light absorbing layer is configured to absorb excitation light and transmit light (eg, first light and / or second light) emitted from the quantum dot.
If the light emitting layer has repeating sections, the light absorbing layer is patterned to have a first absorbing section and the second absorbing section corresponding to the first and second sections respectively, and the first absorbing section is Absorbs the excitation light, transmits at least the first light, and the second absorption section is configured to absorb the excitation light and transmit at least the second light.

In one embodiment, if the excitation light is blue light (having a central wavelength at 430-470 nm), the absorbing color filter material absorbs blue light and light at 470 nm-650 nm (e.g., centered at 510 nm-550 nm) It may be a yellow color filter material that transmits green light having a wavelength and red light having a central wavelength between 570 nm and 640 nm.
The absorptive color filter material may be a green color filter material that absorbs blue light and red light and transmits green light.
The absorptive color filter material may be a red color filter material that absorbs blue light and green light and transmits red light.
The absorptive color filter material may comprise organic pigments, organic dyes, inorganic pigments, inorganic dyes, or combinations thereof.
The type of organic / inorganic pigment / dye [hereinafter, also referred to as a colorant) for the absorption type color filter substance is not particularly limited, and should be appropriately selected in consideration of the wavelength range of the blocking light and the transmitting light. Can.

  Examples of organic pigments are "Pigment Red 122", "Pigment Red 202" and "Pigment Red 206" classified by the color index (C.I.) issued by "The Society of Dyers and Colors Co." “Pigment Red 209”, “Pigment Red 177”, “Pigment Red 254”, “Pigment Yellow 13”, “Pigment Yellow 55”, “Pigment Yellow 119”, “Pigment Yellow 138”, “Pigment Yellow 139”, "Pigment Yellow 168", "Pigment Green 7", "Pigment Green 3" Those having a Color Index number ", or derivatives thereof.

Examples of inorganic pigments include titanium oxide, barium sulfate, calcium carbonate, zinc oxide, lead sulfate, yellow lead, zinc yellow, bengala, cadmium red, ultramarine blue, bitumen, chromium oxide green, cobalt green, amber, etc. Not limited to this.
For example, examples of red (R) dyes include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, isoindoline pigments, isoindolinone pigments, or combinations thereof There is no limitation to this.
Examples of the green (G) dye include halogen polysubstituted phthalocyanine pigments, halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, isoindoline pigments, isoindolinone pigments, or a combination of these. But not limited to.

The second polymer matrix may be a (meth) acrylate polymer, a thiolene polymer, a urethane polymer, an epoxy polymer, a vinyl polymer, a silicone polymer, an imide polymer, an amide polymer, or combinations thereof (e.g. Mixtures, etc.).
The second polymer matrix may comprise a crosslinked polymer.
The crosslinked polymer is as described for the first polymer matrix.

In the light absorbing layer, the content of the absorbing color filter material can be appropriately adjusted.
For example, the content of the absorbent color filter substance is 10% by weight or more, for example, 15% by weight or more, 20% by weight or more, 25% by weight or more, 30% by weight or more, 35% by weight, based on the total weight of the absorbent layer It may be 40% by weight or more.
The content of the absorbing type color filter substance is 90% by weight or less, for example, 85% by weight or less, 80% by weight or less, 75% by weight or less, 70% by weight or less, 65% by weight or less based on the total weight of the absorbing layer , 60 wt% or less, or 55 wt% or less.

In the light absorbing layer, the content of the second polymer matrix can be appropriately adjusted.
For example, the content of the polymer matrix is 10% by weight or more, for example, 15% by weight or more, 20% by weight or more, 25% by weight or more, 30% by weight or more, 35% by weight or more based on the total weight of the light absorption layer Or 40% by weight or more. The content of the second polymer matrix is 90 wt% or less, for example, 85 wt% or less, 80 wt% or less, 75 wt% or less, 70 wt% or less, 65 wt%, based on the total weight of the light absorbing layer Below, it may be 60 weight% or less, or 55 weight% or less.

The thickness of the light absorption layer can be appropriately selected in consideration of the degree of absorption of excitation light (eg, blue light).
For example, the thickness of the light absorbing layer may be 0.1 μm or more, for example, 0.2 μm or more, 0.3 μm or more, 0.4 μm or more, and 0.5 μm or more.
The thickness of the light absorbing layer may be 3 μm or less, such as 2.5 μm or less, 2 μm or less, or 1.5 μm or less.

Although the light absorbing layer described above can be made to achieve improved color purity while maintaining good contrast, the laminated structure according to one embodiment of the present invention substantially reduces the loss of excitation light. And may cause degradation of the light emitting layer.
When the light emitting layer is disposed directly on the light transmitting substrate (for example, glass) without the light absorbing layer, at least a portion of the unconverted excitation light emitted to the light transmitting substrate side is the light emitting layer In some cases, internal total reflection (ITR) may occur at the interface of the light-transmissive substrate and at the interface between the light-transmissive substrate and air.
Such total internal reflection can allow optical recycling of the excitation light to increase light conversion efficiency.
However, when the light absorbing layer is disposed on the light emitting layer, total reflection of unconverted excitation light hardly occurs even if the light transmitting substrate is disposed on the light absorbing layer, and the light conversion ratio is remarkable. It can be low.

Moreover, according to the present inventors' confirmation, the light absorption layer may be a cause of chemical / thermal degradation of the light emitting layer.
The process of forming the pattern of the light emitting layer on the light transmitting substrate may involve heat treatment at a relatively high temperature, but during such heat treatment, the material at the interface between the light absorbing layer and the light emitting layer Migration / diffusion of (for example, components in the quantum dot polymer complex and one component in the organic-inorganic dye) may occur, which results in significant chemical / thermal degradation of the quantum dot polymer complex There is.
Degradation (deterioration in stability) of the quantum dot polymer complex can lead to a significant decrease in the luminous efficiency of the light emitting layer.
As a result, a laminated structure having a light emitting layer and a light absorbing layer may exhibit significantly reduced luminous efficiency.
For example, the luminous efficiency of the laminated structure having the light emitting layer and the light absorbing layer may be 77% or less of the luminous efficiency of the structure having no light absorbing layer.

The laminated structure according to an embodiment of the present invention includes a silicon-containing layer interposed between the light emitting layer and the light absorbing layer.
Laminated structures according to one embodiment of the present invention can achieve improved luminous efficiency with improved color reproduction.
While not wishing to be bound by any particular theory, the interposition of the silicon-containing layer may cause total internal reflection of unconverted excitation light at the interface between the light emitting layer and the silicon-containing layer.
Such total internal reflection can contribute to optical recycling.
In addition, the silicon-containing layer interposed between the light emitting layer and the light absorbing layer blocks movement of substances that may occur between the light emitting layer and the light absorbing layer during heat treatment to suppress / decrease the deterioration of the light emitting layer. It can contribute to / prevent.

The silicon-containing layer may be free of the aforementioned quantum dots and the aforementioned absorptive color filter material.
The silicon-containing layer may contain (or consist of) silicon oxide.
Silicon oxide is an organic substance containing a residue represented by SiO _x (x is a number from 1 to 2), “* -Si-0-Si- *” (* is a portion linked to an adjacent atom) It may contain a silicon organosilicon compound, or a combination thereof.
The silicon-containing layer may comprise a vapor deposited silica layer, a porous silica layer, an organosilicon compound layer, a plurality of silica particles, or a combination thereof.
The silicon-containing layer comprises a crosslinked polymer and may comprise silica particles dispersed within the crosslinked polymer.
The silicon-containing layer may include a first layer containing a crosslinked polymer and an SiO _x (x is 1 to 2) -containing layer disposed on one side of the first layer.
The SiO _x containing layer may comprise a vapor deposited silica layer, a porous silica layer, or a combination thereof.

The organosilicon compound may have "* -Si-0-Si- *" bond and "tetrahedral Si vertices".
The organosilicon compound is [RSiO _3/2 ] _n (where n is 1 to 20, R is hydrogen, C1 to C30 substituted or unsubstituted aliphatic residue, C3 to C30 substituted or It is represented by an unsubstituted alicyclic residue, a C6-C30 substituted or unsubstituted aromatic residue, or a combination thereof, and has a cage structure, a ladder structure, a polymer structure (polymeric structure) Or silsesquioxane (SSQ) structural units having these combinations.
The aforementioned Si-containing layer (for example, a layer containing SSQ) can chemically block between the light emitting layer and the light absorbing layer while having a lower refractive index than the light absorbing layer.

For example, silsesquioxane has a porous structure with silicon oxide-based micropores, and can achieve a lower refractive index than a crosslinked polymer.
Therefore, total internal reflection suppressed by the light absorption layer can occur between the light emitting layer and the Si-containing layer, and the recirculation ratio of excitation light can be increased, which results in a laminated structure before high-temperature heat treatment. It can confirm by the luminous efficiency which the thing improved.
Further, the Si-containing layer described above can suppress deterioration at the interface between the light absorption layer and the light emitting layer which occurs during high temperature heat treatment of the laminated structure, which is confirmed by the process retention rate after high temperature heat treatment. be able to.
Thus, the laminated structure according to an embodiment of the present invention can exhibit increased luminous efficiency while achieving improved color reproduction and high contrast ratio.

In one embodiment, the organosilicon compound may comprise at least two silsesquioxane structural units linked by a linker group comprising a bond between sulfur and carbon.
The linker group comprises at least a silsesquioxane compound containing two or more terminal thiol groups (hereinafter referred to as a thiol-substituted silsesquioxane compound) and a carbon-carbon unsaturated bond (for example, a double bond or a triple bond) at the end It may be formed by the reaction between ene compounds having one, for example, two or more.
In a non-limiting example, the thiol-substituted silsesquioxane compound is [RSiO _3/2 ] _n (wherein R is hydrogen, —SH, C 1 to C 40 substituted or unsubstituted aliphatic hydrocarbon, C 6 to C 6 C 40 substituted or unsubstituted aromatic hydrocarbon, C 3 to C 40 substituted or unsubstituted alicyclic hydrocarbon, or a combination thereof, wherein at least two of R are —SH, n is 6 , 8, 10 or 12).

In another non-limiting example, the thiol-substituted silsesquioxane compound can have the chemical structure shown below.
Here, R represents hydrogen, -SH, a C1-C40 substituted or unsubstituted aliphatic hydrocarbon, a C6-C40 substituted or unsubstituted aromatic hydrocarbon, a C3-C40 substituted or unsubstituted alicyclic hydrocarbon Or a combination thereof, wherein at least two (for example, three, four, five, six, seven or eight) of R are -SH.

The ene compound having a carbon-carbon unsaturated bond may be represented by the chemical formula 2 shown below.

Here, X is an aliphatic organic group having a C 2-30 carbon-carbon unsaturated bond (eg, a double bond or a triple bond), an aromatic organic group having a C 6-30 carbon-carbon unsaturated bond, Or an alicyclic organic group having a C 3-30 carbon-carbon unsaturated bond, R ² is hydrogen, a substituted or unsubstituted C 1 to C 30 linear or branched alkyl group, a substituted or unsubstituted A C6 to C30 aryl group, a substituted or unsubstituted C3 to C30 heteroaryl group, a substituted or unsubstituted C3 to C30 cycloalkyl group, a substituted or unsubstituted C3 to C30 heterocycloalkyl group, C1 to C10 Alkoxy group, hydroxy group, NH ₂ , substituted or unsubstituted C 1 to C 30 amine group (—NRR ′, wherein R and R ′ are each independently hydrogen or C 1 to C 30 linear or branched It is a chain alkyl group ), Isocyanate group, halogen, -ROR '(where R is a substituted or unsubstituted C1-C20 alkylene group, R' is hydrogen or a C1-C20 linear or branched alkyl group Acyl halide (-RC (= O) X, wherein R is a substituted or unsubstituted C1-C20 alkylene group, and X is a halogen), -C (= O ) OR '(wherein R' is hydrogen or a C1-C20 linear or branched alkyl group), -CN, or -C (= O) ONRR '(where R and R' Are, independently of one another, selected from hydrogen or C1 to C20 linear or branched alkyl groups).
L ₂ represents a carbon atom, a substituted or unsubstituted C1 to C30 alkylene group, one or more methylene (-CH _2- ) sulfonyl (-SO _2- ), carbonyl (CO), ether (-O-) , Sulfide (-S-), sulfoxide (-SO-), ester (-C (= O) O-), amide (-C (= O) NR-) (wherein R is hydrogen or C1 to C10) Or a substituted or unsubstituted C 2 to C 30 alkylene group, a substituted or unsubstituted C 6 to C 30 cycloalkylene group, a substituted or unsubstituted C 6 to C 30 arylene. Or a substituted or unsubstituted C3-C30 heteroarylene group, a substituted or unsubstituted C6-C30 heterocycloalkylene group, or a combination thereof,
Y ₂ is a single bond, a substituted or unsubstituted C 1 to C 30 alkylene group, a substituted or unsubstituted C 2 to C 30 alkenylene group, or at least one methylene (—CH ₂ —) is sulfonyl (—S (= O) _2- ), carbonyl (-C (= O)-), ether (-O-), sulfide (-S-), sulfoxide (-S (= O)-), ester (-C (= O) O-), amide (-C (= O) NR-) (wherein R is hydrogen or a C1-C10 linear or branched alkyl group), imine (-NR-) (wherein , R is hydrogen or a C1 to C10 linear or branched alkyl group) or a substituted or unsubstituted C2 to C30 alkylene group or a substituted or unsubstituted C3 to C30 substituted by these or a combination thereof Is an alkenylene group, and n is an integer of 1 or more Ri,
k3 is an integer of 0 or 1 or more, k4 is an integer of 1 or more,
The sum of n and k4 is an integer of 3 or more,
When Y ₂ is not a single bond, n does not exceed the valence of Y ₂ ,
The sum of k3 and k4 is, does not exceed the valence of _{L 2.}

The ene compound having a carbon-carbon unsaturated bond may include a compound represented by a chemical formula (2-1) or a chemical formula (2-2) shown below, or a chemical formula (2-3).
In Chemical Formulas (2-1) and (2-2), Z _{1 to} Z ₃ are the same or different, and each independently corresponds to “* -Y _2- (X) _n ” of Chemical Formula 2,

Here, L ₂ ′ is carbon, a substituted or unsubstituted C 1 to C 30 alkylene group, a substituted or unsubstituted C 2 to C 30 alkenylene group, at least one methylene (—CH ₂ —) is sulfonyl (—S (S = O) _2- ), carbonyl (-C (= O)-), ether (-O-), sulfide (-S-), sulfoxide (-S (= O)-), ester (-C (= O) ) O-), amido (-C (= O) NR-) (wherein R is hydrogen or a C1-C10 linear or branched alkyl group), imine (-NR-) (wherein In which R is hydrogen or a C1 to C10 linear or branched alkyl group), a C6 to C10 cycloalkylene group, or a substituted or unsubstituted C2 to C30 alkylene substituted by a combination thereof group, at least one methylene (-CH ₂ - There sulfonyl _{(-S (= O) 2 -} ), carbonyl (-C (= O) -) , ether (-O-), sulfide (-S-), sulfoxide -S (= O) -), ester ( -C (= O) O-), amide (-C (= O) NR-) (wherein R is hydrogen or a C1-C10 linear or branched alkyl group), imine (- NR—) (wherein R is hydrogen or a C 1 to C 10 straight or branched alkyl group), a C 6 to C 10 cycloalkylene group, or a substituted or unsubstituted group substituted by a combination of these C3 to C30 alkenylene group, substituted or unsubstituted C6 to C30 arylene group, substituted or unsubstituted C3 to C30 heteroarylene group, substituted or unsubstituted C3 to C30 cycloalkylene group, or substituted or unsubstituted C3-C30 heterocyclo Is an alkylene group,
Y _{a to} Y _d each independently represent a direct bond, a substituted or unsubstituted C 1 to C 30 alkylene group, a substituted or unsubstituted C 2 to C 30 alkenylene group, or at least one methylene (—CH ₂ —) group Sulfonyl (-S (= O) _2- ), carbonyl (-C (= O)-), ether (-O-), sulfide (-S-), sulfoxide (-S (= O)-), ester ( -C (= O) O-), amide (-C (= O) NR-) (wherein R is hydrogen or a C1-C10 linear or branched alkyl group), imine (- NR—) (wherein R is hydrogen or a C 1 to C 10 linear or branched alkyl group) or a substituted or unsubstituted C 2 to C 30 alkylene group or a substitution or substituted by these combinations Unsubstituted C3-C30 alkenylene group, and ,
R ′ _{a to} R ′ _d are R ² or X of the chemical formula 2, and at least two of R ′ _{a to} R ′ _d are X of the chemical formula 2.

Examples of the ene compound having a carbon-carbon unsaturated bond include a compound of the chemical formula (2-4), a compound of the chemical formula (2-5), a compound of the chemical formula (2-6) and a compound of the chemical formula (2-7) , A compound of the chemical formula (2-8), a compound of the chemical formula (2-9), a compound of the chemical formula (2-10), a compound of the chemical formula (2-11), a compound of the chemical formula (2-12), a chemical formula (2- 13), a compound of the chemical formula (2-14), a compound of the chemical formula (2-15), a compound of the chemical formula (2-16), or a mixture thereof.

In the chemical formula (2-7), R ₁ is a direct bond, a C ₁ to C 20 alkylene group, or one or more methylenes (—CH ₂ —) is sulfonyl (—S (OO) ₂ —), carbonyl (— C (= O)-), ether (-O-), sulfide (-S-), sulfoxide (-S (= O)-), ester (-C (= O) O-), amide (-C (-C (= O)) = O) NR—) (wherein R is hydrogen or a C1 to C10 linear or branched alkyl group), imine (—NR—) (wherein R is hydrogen or C1 to C10) of a straight or branched chain alkyl group.), or an alkylene group of C1~C20, which is replaced by a combination thereof, R ₂ is hydrogen or a methyl group.

In the chemical formula (2-8), R is hydrogen or a C1-C10 alkyl group,
In the chemical formula (2-9), A is hydrogen, a C1 to C10 alkyl group, or a hydroxy group, R ₁ is a direct bond, a C1 to C20 alkylene group, one or more methylenes (-CH _2- ) Is sulfonyl (-S (= O) _2- ), carbonyl (-C (= O)-), ether (-O-), sulfide (-S-), sulfoxide (-S (= O)-), Ester (-C (= O) O-), amide (-C (= O) NR-) (wherein R is hydrogen or C1 to C10 linear or branched alkyl group), imine (-NR-) (wherein R is hydrogen or a C1-C10 linear or branched alkyl group) or a C2-C20 alkylene substituted with a combination thereof, and R ₂ is It is hydrogen or a methyl group.

In the chemical formula (2-10), R ₁ is a direct bond, a C1-C20 alkylene, or one or more methylenes (-CH _2- ) is sulfonyl (-S (= O) _2- ), carbonyl (-C (= O)-), ether (-O-), sulfide (-S-), sulfoxide (-S (= O)-), ester (-C (= O) O-), amide (-C (= O) NR-) (wherein R is hydrogen or a C1-C10 linear or branched alkyl group), imine (-NR-) (wherein R is hydrogen or C1-C10) And C2 to C20 alkylene substituted with a linear or branched alkyl group or a combination thereof, and R ₂ is hydrogen or a methyl group.

In the formula (2-11), R is a direct bond, alkylene of C1 to C20, or one or more methylene (-CH ₂ -) sulfonyl _{(-S (= O) 2 -} ), carbonyl (-C ( = O)-), ether (-O-), sulfide (-S-), sulfoxide (-S (= O)-), ester (-C (= O) O-), amide (-C (= O) ) NR-) (wherein R is hydrogen or a C1-C10 straight or branched alkyl group), imine (-NR-) (wherein R is hydrogen or a C1-C10 straight) It is a C2 to C20 alkylene substituted with a chain or branched alkyl group) or a combination thereof.

In the formula (2-12), R is a direct bond, alkylene of C1 to C20, or one or more methylene (-CH ₂ -) sulfonyl _{(-S (= O) 2 -} ), carbonyl (-C ( = O)-), ether (-O-), sulfide (-S-), sulfoxide (-S (= O)-), ester (-C (= O) O-), amide (-C (= O) ) NR-) (wherein R is hydrogen or a C1-C10 linear or branched alkyl group), imine (-NR-) (wherein R is hydrogen or a C1-C10 straight) It is a C2 to C20 alkylene substituted with a chain or branched alkyl group) or a combination thereof.

Here, L is a direct bond, alkylene of C1 to C20, or one or more methylene (-CH ₂ -) sulfonyl _{(-S (= O) 2 -} ), carbonyl (-C (= O) -) , Ether (-O-), sulfide (-S-), sulfoxide (-S (= O)-), ester (-C (= O) O-), amide (-C (= O) NR-) ( Here, R is hydrogen or a C1 to C10 linear or branched alkyl group), imine (-NR-) (wherein R is hydrogen or a C1 to C10 linear or branched chain) And C 2 -C 20 alkylene substituted with an alkyl group) or a combination thereof,
R is the same or different and each is independently hydrogen or a methyl group.

The linker group is formed between an R-substituted Si-containing compound (for example, a silsesquioxane compound) containing two or more carbon-carbon double bonds at the end and a multiple thiol compound having two or more thiol groups at the end Formed by the reaction of
The multiple thiol compound may include the compound represented by Formula 1 described above.
The details of the multiple thiol compound are as described above.
In the formation of the linker group, the ratio between the thiol group and the ene group can be appropriately adjusted.
For example, the molar ratio between the thiol group and the ene group may be 1: 2 (= number of thiols: number of ene) to 2: 1.
For example, the content of ene group per mole of thiol group may be 0.5 mole or more, or 0.6 mole or more.
For example, the content of ene group per mole of thiol group may be 2 moles or less, 1.8 moles or less, 1.5 moles or less, or 1.3 moles or less.

FIG. 4 is a schematic cross-sectional view schematically showing various forms of the cross section of the Si-containing layer.
In one embodiment, the silicon-containing layer may consist of the silicon oxide described above (see: (A) in FIG. 4).
For example, the silicon-containing layer can comprise a vapor deposited silica layer, or a layer of an organosilicon compound, a porous silica layer, or a combination thereof.
In other embodiments, the silicon-containing layer can comprise a crosslinked polymer.
When the silicon-containing layer comprises a crosslinked polymer, the layer comprising a crosslinked polymer may be disposed on one side of a layer comprising (for example, consisting of) the above-mentioned silicon oxide.

In the (laminated type) silicon-containing layer having a multilayer structure, the cross-linked polymer layer faces the first surface of the light absorption layer, and the light absorption is performed so that the silicon oxide layer (for example, porous silica layer) faces the light emitting layer It is disposed on the layer (see: FIG. 4 (C)).
For example, the crosslinked polymer layer is disposed (eg, contacted) on the first surface of the light absorbing layer, and the silicon oxide layer (porous silica layer) is disposed (eg, contacted) on the crosslinked polymer layer, silicon oxide The light emitting layer may be disposed (eg, contacted) on the object layer (porous silica layer).

Alternatively, the layered silicon-containing layer may be disposed on the light absorbing layer such that the silicon oxide layer faces the first surface of the light absorbing layer and the cross-linked polymer faces the light emitting layer.
For example, a silicon oxide layer (porous silica layer) is disposed (eg, contacted) on a light absorbing layer and a crosslinked polymer layer is disposed (eg, contacted) on a silicon oxide layer (porous silica layer) A light emitting layer may be disposed (eg, contacted) on the crosslinked polymer.
The crosslinked polymer layer and the silicon-containing layer may be in contact with each other.
When the silicon-containing layer contains a crosslinked polymer, a plurality of silica particles may be dispersed in the matrix of the crosslinked polymer (see: (B) in FIG. 4), and the type of crosslinked polymer is as described above.

The thickness of the silicon-containing layer is not particularly limited, and can be appropriately selected in consideration of the light transmission, the stability of the subsequent steps, and the like.
In one embodiment, the thickness of the silicon-containing layer may be 100 nm or more, for example 200 nm or more, 300 nm or more, 400 nm or more, or 500 nm or more and 3 μm or less, for example 2 μm or less, or 1 μm or less.
The silicon-containing layer may have a lower refractive index than the light emitting layer and the light absorbing layer.
For example, the silicon-containing layer may have a refractive index of 1.2 or more, eg, 1.3 or more.
The silicon-containing layer may have a refractive index of 1.5 or less, for example 1.45 or less.

The Si content of the silicon-containing layer may be 5 wt% or more, for example, 10 wt% or more, 20 wt% or more, 30 wt% or more, or 40 wt% or more based on the total weight of the silicon-containing layer.
The Si content of the silicon-containing layer is 90% by weight or less, for example, 80% by weight or less, 70% by weight or less, 60% by weight or less, 50% by weight or less, 45% by weight or less based on the total weight of the silicon-containing layer possible.
The Si content of the silicon-containing layer can be confirmed by ICP, EDS, XRF analysis or the like.

Laminated structures according to one embodiment of the present invention may be manufactured by any suitable method.
In one non-limiting embodiment, a method of making a laminated structure comprises forming a light absorbing layer (eg, on a light transmissive substrate), forming a silicon-containing layer on the light absorbing layer, silicon Forming a layer of quantum dot polymer complex on the containing layer.
If necessary, the resulting laminated structure may be patterned.
The contents of the translucent substrate are as described above.

The step of forming a light absorbing layer is a step of obtaining a composition for a light absorbing layer comprising a combination of a precursor (for example, a monomer) for the second polymer matrix and an absorption type color filter material, which is used as a light transmitting substrate. Applying in a suitable manner to obtain the film, curing the film (eg, by light and / or heat).
Thermal curing may be performed at temperatures of 100 ° C. or higher, but is not limited thereto.
The monomer combination for the second polymer matrix can be appropriately selected according to the type of polymer.
For example, the precursor combination is a precursor for (meth) acrylic monomers, multiple thiol compounds, vinyl monomers, epoxy compounds, urethane compounds, silicon compounds, polyimides or polyimide amides (eg, aromatic or aliphatic tetracarboxylic acids) It may comprise a mixture of an acid dianhydride and an aromatic or aliphatic diamine, a polyamic acid compound, or all of these) or combinations thereof.
These monomers / compounds are commercially available or can be synthesized by known methods.

The method of forming the silicon-containing layer on the light absorbing layer may vary depending on the components of the silicon-containing layer.
For example, when the silicon-containing layer contains vapor deposited SiO _x (x is 1 to 2), the silicon-containing layer can be formed by vapor deposition.
Physical vapor deposition can be performed by thermal vacuum, sputtering, and / or electron beam techniques.
Physical vapor deposition can be performed by commercially available equipment and known methods in consideration of the type and thickness of the vapor deposition material.
The deposition atmosphere, temperature, target material, and degree of vacuum can be appropriately selected and are not particularly limited.
The type of chemical vapor deposition is also not particularly limited, and can be selected appropriately.
The chemical vapor deposition may be performed by atmospheric pressure CVD, low pressure CVD, ultra-high vacuum CVD, plasma CVD, etc., but is not limited thereto.
Chemical vapor deposition can be performed by commercially available equipment and known methods in consideration of the type and thickness of the vapor deposition material and the like.
The atmosphere, temperature, type of gas and degree of vacuum of the deposition can be appropriately selected and is not particularly limited.

When the silicon-containing layer contains an organosilicon compound, a composition containing a suitable precursor (for example, a silsesquioxane precursor) is prepared, and the composition is applied on a light absorption layer to obtain a film, The membrane can be produced, for example, by curing.
When the organosilicon compound contains at least two silsesquioxane structural units linked by a linker group containing a bond between sulfur and carbon, the above-mentioned thiol-substituted (or containing a carbon-carbon unsaturated bond) silsesquioxane structural unit A composition comprising an oxane compound and an ene compound (or a multiple thiol compound) can be prepared and used.

  The formation of the light emitting layer containing the quantum dot polymer complex on the silicon-containing layer includes forming a plurality of quantum dots, a photopolymerizable compound containing two or more polymerizable residues, and a carboxylic acid linear polymer (for example, , A binder), a photoinitiator, and an organic solvent (hereinafter referred to as “QD PR” composition), and the “QD PR” composition is applied onto the silicon-containing layer to form “QD Obtaining a PR "film, exposing the resulting" QD PR "film, and crosslinking polymerizing in the exposed areas to form a layer of quantum dot polymer composite dispersed within the polymer matrix.

To obtain a pattern of quantum dot polymer complexes, a predetermined area of the resulting film is exposed (eg, under a mask) and then the unexposed area is removed from the film using an aqueous alkaline solution. Quantum dot-polymer complex patterns can be obtained.
The obtained pattern can be optionally heated to a predetermined temperature (eg, a temperature of 160 ° C. or higher).
The composition can be applied onto the light transmissive substrate in a suitable manner (eg, spin coating, etc.) to form a film.
The formed film is prebaked by selection.

Pre-baking can be performed at a temperature of 130 ° C. or less, for example, a temperature of 90 ° C. to 120 ° C.
The pre-bake time is not particularly limited, and can be appropriately selected.
For example, pre-baking may be performed for 1 minute or more and 60 minutes or less, but is not limited thereto.
The pre-baking may be performed under a predetermined atmosphere (for example, in an air, an atmosphere containing no oxygen, an inert gas atmosphere), but is not particularly limited.

In the exposed areas, crosslinking polymerization takes place to form quantum dot-polymer complexes dispersed within the polymer matrix.
The quantum dot polymer composite membrane is treated with an aqueous alkaline solution to remove the unexposed areas from the membrane and to obtain a pattern of quantum dot polymer composite.
The "QD PR" composition is developable with an aqueous alkaline solution and can form a quantum dot-polymer complex pattern without the use of an organic solvent developer.
The contents for the quantum dot, the photopolymerizable compound, the carboxylic acid polymer (binder), the translucent substrate, the polymer matrix, and the quantum dot-polymer complex are as described above.

A non-limiting method for patterning is described with reference to FIG.
FIG. 5 is a flow chart illustrating a process of forming a self-emission layer including a quantum dot-polymer composite pattern on a substrate according to an embodiment of the present invention.
First, the composition is applied on a structure including a substrate / light absorption layer / Si-containing layer to a predetermined thickness (for example, a thickness of 3 to 30 μm) using an appropriate method such as spin coating or slit coating. Then, a film is formed (step S51).

The formed film is subjected to the above-described pre-baking by selection (step S53).
The formed (or selectively prebaked) film is exposed to light having a predetermined wavelength under a mask having a predetermined pattern (step S55).
The wavelength and intensity of the light can be selected in consideration of the type and content of the photoinitiator, the type and content of the quantum dot, and the like.
The exposed film is treated (for example, dipped or sprayed) with an alkaline developer to dissolve the unexposed portion in the film, thereby forming a quantum dot polymer composite pattern (step S57).
Finally, post-baking is performed (step S59).
Specifically, the obtained pattern is, for example, at a temperature of 150 ° C. to 230 ° C. for a predetermined time (for example, 10 minutes or more, or 20 minutes) to improve the crack resistance and solvent resistance of the pattern as needed. Minutes) can be post-baked (POB).
If necessary, the patterning process may be repeated two or more times such that the quantum dot polymer composite pattern of the self-emissive layer has a plurality of compartments (e.g., a first compartment, a second compartment, or optionally a third compartment) It is also good.

The light absorbing layer composition, the organosilicon compound-containing composition, and the quantum dot composition (hereinafter also referred to as a composition) may include a photoinitiator.
The type of photoinitiator is not particularly limited, and can be appropriately selected.
For example, usable photoinitiators may include, but are not limited to, triazine compounds, acetophenone compounds, benzophenone compounds, thioxanthone compounds, benzoin compounds, oxime compounds, or combinations thereof.

  Examples of triazine compounds are 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis (trichloromethyl) -s-triazine, 2- (3 ', 4'-dimethoxystyryl)- 4,6-bis (trichloromethyl) -s-triazine, 2- (4'-methoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6 -Bis (trichloromethyl) -s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -triazine, 2-biphenyl-4,6-bis (trichloromethyl) -triazine 2,4-bis (trichloromethyl) -6-styryl-s-triazine, 2- (naphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4) Methoxynaphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2,4-trichloromethyl (piperonyl) -6-triazine, 2,4-trichloromethyl (4'-methoxystyryl)- Including, but not limited to, 6-triazine.

  Examples of acetophenone compounds are: 2,2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, p-t-butyltrichloroacetophenone, p-t-butyldichloromethane Acetophenone, 4-chloroacetophenone, 2,2'-dichloro-4-phenoxyacetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholinopropan-1-one, 2-benzyl-2-dimethyl Examples include, but not limited to, amino-1- (4-morpholinophenyl) -butan-1-one and the like.

Examples of benzophenone compounds are benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis (dimethylamino) benzophenone, 4,4'-dichlorobenzophenone, Examples include, but are not limited to, 3,3'-dimethyl-2-methoxybenzophenone and the like.
Examples of thioxanthone compounds include, but are not limited to, thioxanthone, 2-methyl thioxanthone, 2-isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2-chlorothioxanthone and the like.

Examples of benzoin compounds include, but are not limited to, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyl dimethyl ketal and the like.
Examples of oxime compounds are 2- (o-benzoyloxime) -1- [4- (phenylthio) phenyl] -1,2-octanedione and 1- (o-acetyloxime) -1- [9-ethyl- 6- (2-Methylbenzoyl) -9H-carbazol-3-yl] ethanone including, but not limited to.
Besides the photoinitiator, carbazole compounds, diketone compounds, sulfonium borate compounds, diazo compounds, biimidazole compounds and the like can also be used as the photoinitiator.

The composition may comprise a solvent.
The solvent has an affinity with other components (for example, a carboxylic acid polymer, a photopolymerizable compound, a photoinitiator, other additives, etc.) in the composition, (if necessary, an affinity with an alkaline developer) And the boiling point etc. can be considered appropriately.
The composition may contain the solvent in the remaining amount excluding the desired solid content (non-volatile content) content.

  Examples of the solvent include ethyl 3-ethoxypropionate, ethylene glycol, ethylene glycol such as diethylene glycol and polyethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol monomethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether and the like Glycol ethers, ethylene glycol acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate, glycol ether acetates such as diethylene glycol monobutyl ether acetate, propylene glycols such as propylene glycol, propylene glycol monomethyl ether, propylene ether Propylene glycol ethers such as glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol monobutyl ether, propylene glycol dimethyl ether, dipropylene glycol dimethyl ether, propylene glycol diethyl ether, dipropylene glycol diethyl ether, propylene glycol monomethyl ether acetate (PGMEA) Propylene glycol ether acetates such as dipropylene glycol monoethyl ether acetate, amides such as N-methylpyrrolidone, dimethylformamide, dimethylacetamide, ketones such as methyl ethyl ketone (MEK), methyl isobutyl ketone (MIBK), cyclohexanone, toluene , Xylene, Rubentonafusa (Solvent naphtha) oil such as, including ethyl acetate, butyl acetate, esters such as ethyl sulfate, diethyl ether, dipropyl ether, Eteru such as butyl ether and mixtures thereof.

The composition may further contain various additives such as a light diffusing agent, a leveling agent, and a coupling agent, as necessary, in addition to the components described above.
The additive content is not particularly limited, and can be appropriately adjusted within a range that does not negatively affect the photosensitive composition and the pattern produced therefrom.
The content of each component in the composition is not particularly limited, and can be appropriately adjusted in consideration of the desired composition of the light absorbing layer, the silicon-containing layer, and the quantum dot polymer composite.

Another embodiment relates to an electronic device comprising the laminated structure described above.
The electronic device may be a display (eg, a liquid crystal display or an OLED display), an organic electroluminescent device, a micro LED device, a light emitting device (LED), an image sensor, or an IR sensor.

Another embodiment relates to a display including the above-described laminated structure.
FIG. 6a is a schematic cross-sectional view of a display device according to an embodiment of the present invention.
The display device includes a light source (e.g., a light emitting module) and a self-emission color filter layer disposed on the light source.
The self-emission color filter layer includes the above-described laminated structure.
A light source (eg, a light emitting module) is configured to provide incident light to the self-emitting color filter layer (see: FIG. 6a).
The display device may exhibit a color reproduction rate of 80% or more and a light conversion efficiency of 20% or more based on a Digital Cinema Initiatives (DCI) standard.

The display device may be a display device including an electroluminescent element (for example, an organic light emitting diode) as a light source (for example, a light emitting module).
FIG. 6 b is a schematic cross-sectional view of a display according to one non-limiting embodiment of the present invention.
In this case, the light emitting module includes a plurality of light emitting units respectively corresponding to the first section and the second section, and the light emitting units are between the first electrode and the second electrode facing each other, and between the first electrode and the second electrode (See: FIG. 6 b).
Each light emitting unit of the light emitting module provides excitation light (for example, blue light) to the self-emission color filter layer, and the first section (for example, R section) and the second section (for example, G section) of the self-emission color filter layer ) Emits the first light (R light) and the second light (G light), respectively.
Each light emitting unit can be controlled by an individual thin film transistor (TFT) (not shown) to individually emit light, but is not limited thereto.
The structure and material of the thin film transistor are not particularly limited, and known ones can be adopted.

The light source (e.g., light emitting module) is a charge auxiliary layer (e.g., charge transport layer, charge injection layer, or a combination thereof) between the first electrode and the light emitting layer, between the second electrode and the light emitting layer, or all of them. ) May be further included.
If the first electrode is a cathode, the second electrode may be an anode.
If the first electrode is an anode, the second electrode may be a cathode.
The organic light emitting diode includes two or more pixel electrodes (for example, first electrodes) formed on a substrate, a pixel defining film formed between adjacent pixel electrodes, and organic light emission formed on the respective pixel electrodes. The layer may include a common electrode layer (e.g., a second electrode) formed on the organic light emitting layer.

The type of charge auxiliary layer may vary depending on the type of electrode.
An electron transport layer, an electron injection layer, a hole blocking layer, or a combination thereof may be provided between the cathode and the light emitting layer.
A hole transport layer, a hole injection layer, an electron blocking layer, or a combination thereof may be disposed between the anode and the light emitting layer.
Each light emitting unit of the light emitting module may comprise an organic electroluminescent diode.
The structure and material of the organic electroluminescent diode are not particularly limited, and may include known structures and materials.
Such a device may be manufactured by combining the above-described laminated structure and (e.g., blue light emitting) OLED after separately manufacturing.
Alternatively, the device may be fabricated by directly forming a light emitting layer (eg, a pattern of quantum dot polymer complexes including R and G sections) on the OLED (eg, directly on the second electrode) it can.

In another embodiment, the display may be a liquid crystal display.
FIG. 6 c is a schematic cross-sectional view of a liquid crystal display according to one non-limiting embodiment of the present invention.
The liquid crystal display device further includes a lower substrate, an upper substrate, a polarizing plate disposed under the lower substrate, and a liquid crystal layer interposed between the upper and lower substrates, and the self-emission layer is a liquid crystal layer on the upper substrate. A light source is disposed below the polarizer.
The light source may include a light emitting element (eg, a light emitting diode (LED)) and optionally a light guide plate.
The display may further include a polarizer between the lower substrate and the self-emission color filter layer.

FIG. 6c shows a cross-sectional view of a liquid crystal display according to an embodiment of the present invention, and referring to FIG. 6c, a liquid crystal panel 200 according to an embodiment of the present invention is a liquid crystal panel 200; A polarizing plate 300 disposed below the panel 200 and a backlight unit (BLU) disposed below the polarizing plate 300 are included.
The backlight unit comprises a light source 110 (e.g. blue).
The backlight unit may further include the light guide plate 120, or the backlight unit may not include the light guide plate.
The liquid crystal panel 200 includes a lower substrate 210, an upper substrate 260, a liquid crystal layer 220 interposed between the upper and lower substrates, and a self-emission color filter layer provided on the upper substrate.
The self-emission color filter layer includes the above-described laminated structure.

The lower substrate 210, also referred to as an array substrate, is a transparent insulating material substrate (eg, glass substrate, polyethylene terephthalate (PET), polyester such as polyethylene naphthalate (PEN), polycarbonate, and / or polyacrylate). Inorganic material substrates such as Polysiloxane, Al ₂ O ₃ , ZnO, etc.).
A wiring board 211 is provided on the upper surface of the lower substrate 210.
The wiring board 211 includes a number of gate lines (not shown) and data lines (not shown) that define pixel areas, thin film transistors provided adjacent to intersections of the gate lines and data lines, and pixel circuits of each pixel area. Pixel electrodes may be included, but is not limited thereto.
The specific content of such a wiring board is known and is not particularly limited.

A liquid crystal layer 220 is provided on the wiring board 211.
The liquid crystal layer 220 includes an alignment film 221 above and below the layer for initial alignment of the liquid crystal substance contained therein.
The specific content (for example, liquid crystal substance, alignment film material, liquid crystal layer forming method, thickness of liquid crystal layer, etc.) for the liquid crystal substance and the alignment film is known and is not particularly limited.
A lower polarizer is provided under the lower substrate.
The material and structure of the polarizing plate 300 are known and are not particularly limited.
A backlight unit is provided under the polarizing plate 300 (for example, emitting blue light).

An upper optical element or polarizing plate 300 may be provided between the liquid crystal layer 220 and the upper substrate 260, but is not limited thereto.
For example, the upper polarizer may be disposed between the liquid crystal layer 220 or the common electrode 231 and the light emitting layer 230.
Polarizer 300 may be any polarizer that can be used in a liquid crystal display device.
The polarizing plate may be, but not limited to, triacetyl cellulose (TAC) having a small thickness of 200 μm or less.
In another embodiment, the upper optical element may be a refractive index adjusting coating without polarization function.

The backlight unit may include a light emitting element (eg, an LED) that emits excitation light.
In one embodiment, the backlight unit may be edge-type.
For example, the backlight unit may be provided on a reflector (not shown), a reflector, a light guide (not shown) for supplying a surface light source to the liquid crystal panel 200, and / or a top of the light guide. It may include one or more optical sheets (not shown), such as, but not limited to, a diffuser, a prism sheet, and the like.
In another embodiment, the backlight unit may be direct lighting.
For example, the backlight unit has a reflector (not shown) and has a plurality of fluorescent lamps disposed at regular intervals on the top of the reflector, or an LED drive substrate on which a large number of LEDs are disposed. And optionally one or more optical sheets on it.
The details of such a backlight unit (for example, the details of each component such as a light guide plate, various optical sheets, and a reflector) are known and are not particularly limited.

The upper substrate 260 may be the translucent substrate described above. The above-described laminated structure is provided on the bottom of the upper substrate.
For example, the light absorbing layer 250 described above is disposed on the bottom surface of the upper substrate, the Si-containing layer 240 is disposed on the light absorbing layer, and the light emitting layer 230 is disposed on the Si-containing layer.
A black matrix 232 is provided which includes an opening on the Si-containing layer and covers gate lines, data lines, thin film transistors and the like of the wiring board provided on the lower substrate.
For example, the black matrix 232 may have a grid shape.
A first section (R) which emits light (for example, red light) in a first wavelength range and a second section (G) which emits light (for example, green light) of a second peak wavelength to the opening of the black matrix 232 And a third section (B) that emits / transmits, for example, blue light.

If desired, the self-emitting color filter layer may further include one or more fourth sections.
The fourth section may include quantum dots that emit different colors (e.g., cyan, magenta, and yellow) from the light emitted from the first to third sections.
The sections forming the pattern in the self-emission color filter layer may be repeated corresponding to the pixel areas formed on the lower substrate.
A transparent common electrode 231 may be provided on the self-emission color filter layer.
The third section (B) transmitting / emitting blue light may be a transparent color filter which does not change the emission spectrum of the light source.
In this case, the blue light emitted from the backlight unit may be incident as it is polarized through the polarizing plate and the liquid crystal layer and may be emitted as it is.
If necessary, the third compartment may comprise quantum dots emitting blue light.

The display element is disposed between the light emitting layer and the liquid crystal layer (for example, between the light emitting layer and the upper polarizer), transmits at least a part of the third light (for example, excitation light), and transmits the first light And / or may further include an optical filter layer (eg, red / green light or yellow light recycling layer) that reflects at least a portion of the second light.
The second optical filter layer can reflect light having a wavelength range of more than 500 nm.
The first light may be green (or red) light, the second light may be red (or green) light, and the third light may be blue light.

Hereinafter, specific examples of the invention will be presented.
However, the embodiments described below are merely for specifically illustrating or explaining the invention, and the scope of the invention should not be limited thereby.

<< Example >>
Measuring method:
[1] The luminous efficiency (QY), the light conversion rate (CE) and the process maintenance rate are determined by the following method.
The blue light conversion rate of the laminated structure is about 45 cm by driving the TV by inserting the manufactured laminated structure between a 60-inch TV light guide plate and an optical sheet mounted with a blue LED having a peak wavelength of 449 nm. The emission characteristics are analyzed previously with a spectroradiometer (Konica minolta, CS-2000) to obtain a light emission spectrum of the emitted light.
The total light quantity (B) of the excitation light is determined by integrating the PL spectrum of the excitation light, the PL spectrum of the quantum dot composite film is measured, and the light quantity (A) of the green light emitted from the quantum dot composite film and blue Determine the amount of light (B ').
The luminous efficiency and the light conversion ratio are determined by the following equations.
A / B x 100 = luminous efficiency (QY,%)
A / (B-B ') x 100 = light conversion rate (%)

[2] The process maintenance rate is the ratio of the light conversion rate (CE,%) after the process is performed to the light conversion rate (CE,%) before the process is performed.
[3] “Time-of-Flight Secondary Ion Mass Spectrometry” (TOF-SIMS) Analysis TOF-SIMS analysis is performed using TOF-SIMS V (ION-TOF GmbH, Germany) equipped with a 25 keV Bi ⁺ ion gun.
[4] "Scanning Transmission Electron Microscope" (STEM) "High Angle Regular Dark Field" (HAADF) analysis HAADF analysis is performed using STEM (TITAN-80-300, FEI).

Reference Example 1: Production of Quantum Dots
(1) 0.2 mmol of indium acetate, 0.6 mmol of palmitic acid, and 10 mL of 1-octadecene are charged into a reactor and heated to 120 ° C. under vacuum.
After one hour, the atmosphere in the reactor is converted to nitrogen.
After heating to 280 ° C., a mixed solution of 0.1 mmol of tris (trimethylsilyl) phosphine (tris (trimethylsilyl) phosphine: TMS3P) and 0.5 mL of trioctylphosphine is rapidly injected and reacted for 20 minutes.
Acetone is added to the reaction solution which is rapidly cooled at room temperature, and the precipitate obtained by centrifugation is dispersed in toluene.
The obtained InP semiconductor nanocrystal exhibits a UV first absorption maximum wavelength of 420 to 600 nm.

0.3 mmoL (0.056 g) of zinc acetate (zinc acetate), 0.6 mmol (0.189 g) of oleic acid, and 10 mL of trioctylamine are placed in a reaction flask and vacuum is applied at 120 ° C. for 10 minutes. To process.
After displacing the reaction flask with N ₂ , the temperature is raised to 220 ° C.
The toluene dispersion (OD: 0.15) of the InP semiconductor nanocrystals prepared above and 0.5 mmol of S / TOP are put in a reaction flask, heated to 280 ° C., and reacted for 30 minutes.
After completion of the reaction, the reaction solution is rapidly cooled at room temperature to obtain a reactant containing InP / ZnS semiconductor nanocrystals.

(2) Excess ethanol is added to the reaction product containing InP / ZnS semiconductor nanocrystals and centrifuged.
After centrifugation, the supernatant is discarded, and the precipitate is dried and dispersed in chloroform or toluene to obtain a quantum dot solution (hereinafter, QD solution).
The "UV-vis" absorption spectrum of the resulting QD solution is measured.
The manufactured quantum dots absorb light of 350 to 500 nm wavelength and emit light of 520 to 550 nm wavelength (green light).

<Reference Example 2>
“Pigment Yellow” (Pigment Yellow 138) is dispersed in a (meth) acrylate monomer to obtain a composition for forming a light absorption layer (hereinafter referred to as a YPR composition).
The content of "Pigment Yellow" is 50% by weight based on the weight of the total composition.
A glass substrate is spin coated with YPR composition at 500 rpm for 10 seconds to obtain a film.
The resulting film is dried on a hot plate at 100 ° C. for 2 minutes, photocured with 80 mJ UV, and additionally heat cured at 230 ° C. for 30 minutes, to form a yellow dye-acrylate polymer composite on a glass substrate A structure (hereinafter referred to as YPR / glass) in which the body layer (thickness: 1 μm) is formed is obtained.

Reference Example 3 Production of Composition for Forming Si-Containing Layer I
SSQ (MW: 1780, manufacturer: Gelest) having a thiol group at a predetermined substitution degree (for example, 12), 1.7 g of triallyl isocyanurate (TTT) (MW: 249.27, manufacturer: Sigma Aldrich) 0 A composition for forming a silicon-containing layer (hereinafter referred to as a barrier preparation solution A) is produced by dissolving .66 g and 0.024 g of "Irgacure TPOL" in 0.78 g of PGMEA (propylene glycol monomethyl ether acetate).

Reference Example 4 Production of Composition for Forming Si-Containing Layer II
The barrier liquid preparation was carried out in the same manner as in Reference Example 3, except that tetraallylsilane (TAS) (MW: 192.38, manufacturer: Gelest) having 4 vinyl groups was used instead of TTT. Manufacture B.

<Reference Example 5: Production of a composition for forming an Si-free layer I>
A barrier preparation solution C is manufactured in the same manner as in Reference Example 3, except that 0.94 g of "Glykol Di" (3-mercaptopropionate) (GDMP) manufactured by Thiocure Inc. is used instead of SSQ.

Reference Example 6 Production of Composition for Forming Quantum Dot-Polymer Complex>
[1] Preparation of Quantum Dot-Binder Dispersion A chloroform dispersion of quantum dots (InP / ZnS core shell, green light emission) synthesized in Reference Example 1 containing oleic acid as a hydrophobic organic ligand on the surface is prepared.
Chloroform dispersion containing 50 g of quantum dots as a binder (methacrylic acid, benzyl methacrylate, hydroxyethyl methacrylate, and quaternary copolymer of styrene, acid value: 130 mg KOH / g, number average molecular weight: 8000, methacrylic acid: benzyl methacrylate: Quantum dot-binder dispersion mixed with 100 g (polypropylene glycol monomethyl ether acetate concentration) solution of hydroxyethyl methacrylate: styrene (molar ratio) = 61.5%: 12%: 16.3%: 10.2%) Produce a solution.
It is confirmed that the quantum dots are uniformly dispersed in the manufactured quantum dot-binder dispersion.

[2] Production of Photosensitive Composition In the quantum dot binder dispersion liquid produced in [1], 100 g of hexaacrylate having a structure shown below as a photopolymerizable monomer, 1 g of an oxime ester compound as an initiator, and light diffusion A composition (hereinafter referred to as a QDPR composition) is prepared by mixing 30 g of TiO ₂ (average particle size: 200 nm) and 300 grams of PGMEA as an agent.
It is confirmed that the produced composition forms a dispersion free from the aggregation phenomenon due to the addition of quantum dots.

«Manufacture of laminated structure»
Example 1
After coating barrier coating solution A at 4000 rpm for 5 seconds on YPR / glass manufactured in Reference Example 2, after photocuring with 80 mJ UV, solvent drying at 180 ° C. for 10 minutes, a silicon-containing layer (thickness: 1 μm) Form).
The “QD PR” composition prepared in Reference Example 6 is spin-coated at 160 rpm for 5 seconds on the formed silicon-containing layer, and heat treated (PRB) on a hot plate at 100 ° C.
The PRB-treated film is photocured with 80 mJ UV and heat treated (POB) for 30 minutes at 180 ° C. under N ₂ atmosphere.
A laminated structure (QD-PR (6 μm) / Si-containing layer (1 μm) / YPR (1 μm) / glass) in which a light emitting layer (6 μm thick) including a quantum dot polymer complex is formed is obtained.

Example 2
Laminated structure (QD-PR (6 μm) / Si-containing layer (1 μm) / YPR (1 μm) / in the same manner as in Example 1 except that the barrier liquid preparation B is used instead of the barrier liquid preparation A get the glass).

Example 3
Sputtering of SiO ₂ layer (thickness: 500 nm) on YPR / glass manufactured in Reference Example 2 instead of using barrier solution A (temperature: normal temperature, atmosphere: oxygen, target: SiO2, purity 99.99% The laminated structure (QD-PR (6 μm) / Si-containing layer (500 nm) / YPR (1 μm) / glass) is obtained in the same manner as in Example 1 except that the film is formed by

Example 4
Instead of using the barrier liquid preparation A, laminating in the same manner as in Example 1 except that a laminated silicon-containing layer is formed on the YPR / glass manufactured in Reference Example 2 in the following manner A structure (QD-PR (6 μm) / Si-containing layer (1 μm) / YPR (1 μm) / glass) is obtained.
A coating solution containing a polyfunctional acrylate monomer is spin-coated on YPR / glass prepared in Reference Example 2 to obtain a film, and the film obtained is heat-treated at 100 ° C. for 2 minutes and then photocured with 80 mJ UV Thermal cure at 180 ° C. for 30 minutes to form a crosslinked polymer.
A TEOS-containing silica precursor solution is spin-coated on the obtained crosslinked polymer and heat-treated at 140 ° C. for 30 minutes to form a low refractive layer to obtain a laminated silicon-containing layer (thickness: 1 μm).

Example 5
In the same manner as in Example 1, except that the TEOS-containing silica precursor solution is spin coated, heat treated and cured at 140 ° C. for 30 minutes to obtain a porous silica layer, instead of using the barrier preparation solution A. A laminated structure (QD-PR (6 μm) / Si-containing layer (1 μm) / YPR (1 μm) / glass) is obtained.

Comparative Example 1
A light emitting layer containing a quantum dot polymer composite was formed on the YPR / glass produced in Reference Example 2 in the same manner as in Example 1 except that barrier preparation solution A was not used to form a silicon-containing layer. A laminated structure (QD-PR (6 μm) / YPR (1 μm) / glass) is obtained.

Comparative Example 2
Sputtering a ZnO layer (thickness: 500 nm) on the YPR / glass manufactured in Reference Example 2 instead of using the barrier solution A (temperature: normal temperature, atmosphere: oxygen, target: ZnO, purity 99.99%) The laminated structure (QD-PR (6 .mu.m) / ZnO containing layer (500 nm) / YPR (1 .mu.m) / glass) is obtained in the same manner as in Example 1 except for forming by the following.

Comparative Example 3
Sputtering TiO ₂ layer (thickness: 500 nm) on YPR / glass manufactured in Reference Example 2 instead of using barrier solution A (temperature: normal temperature, atmosphere: oxygen, target: TiO ₂ , purity 99.99) %) except that formed by the obtain a laminated structure in the same manner as in example 1 (QD-PR (6μm) / TiO 2 containing layer (500nm) / YPR (1μm) / glass).

Comparative Example 4
Laminated structure (QD-PR (6 μm) / Si-free thiolene crosslinked polymer layer (1 μm) /) in the same manner as in Example 1 except that the barrier liquid preparation C is used instead of the barrier liquid preparation A Obtain YPR (1 μm) / glass).

Comparative Example 6
The “QD PR” composition is spin coated on a glass substrate at 160 rpm for 5 seconds and heat treated (PRB) on a hot plate at 100 ° C.
The PRB-treated film is photocured with 80 mJ UV and heat treated (POB) for 30 minutes at 180 ° C. under N ₂ atmosphere.
A laminated structure (QD-PR (6 μm) / glass) in which a light emitting layer (6 μm in thickness) including the quantum dot polymer composite is formed is obtained.

«Confirmation of the current state of chemical / thermal deterioration of the light emitting layer by introducing YPR»
Experimental Example 1
After POB manufactured in Comparative Example 1, “Time-of-Flight Secondary Ion Mass Spectrometry” was measured using TOF-SIMS V (ION-TOF GmbH, Germany) equipped with a 25 keV Bi ⁺ ion gun to the cross section of the laminated structure. (TOF-SIMS) analysis and High Angle Annular Dark Field (HAADF analysis).
The results are shown in FIG. 7 and FIG.

FIG. 7 is a graph showing the “TOF SIPMS” analysis results in Experimental Example 1, and FIG. 8 is an image showing the HAADF analysis results in Experimental Example 1.
From the results of FIG. 7 and FIG. 8, the dye component of the light absorbing layer is diffused to the light emitting layer in the laminated structure of Comparative Example 1 by the POB heat treatment, and the sulfur component derived from the light emitting layer is diffused to the light absorbing layer Make sure.
Mass transfer at such an interface can negatively affect the emission characteristics of the quantum dots dispersed in the light emitting layer.

«Emission characteristic evaluation of laminated structure»
<Experimental Example 2>
[1] The photoconversion ratio after PRB and POB is measured on the laminated structures manufactured in Comparative Example 1 and Comparative Example 6.
FIG. 9 is a graph showing the light emission spectra of the laminated structure (including the light absorption layer) of Comparative Example 1 and the laminated structure (not including the light absorption layer) of Comparative Example 6 measured in Experimental Example 2. .
The light emission spectrum obtained after PRB is shown in FIG.
From the results of FIG. 9, although the laminated structure (W / YPR) of Comparative Example 1 hardly emits blue light, the laminated structure (w / o YPR) of Comparative Example 6 emits remarkable blue light. Make sure to show.
From the above results, it can be predicted that the laminated structure of Comparative Example 6 hardly emits light of desired color coordinates.
From the above results, it is confirmed that although the color reproduction ratio that the laminated structure of Comparative Example 1 can realize is about 87%, the color reproduction ratio that the laminated structure of Comparative Example 6 can realize is only 41.2%. Do.

[2] Measure the luminous efficiency of the laminated structure after PRB.
It is confirmed that the luminous efficiency after PRB of the laminated structure manufactured in Comparative Example 1 is only about 77% of the luminous efficiency after PRB of the laminated structure manufactured in Comparative Example 6.
Such results suggest that the light absorbing layer may cause significant optical loss.
[3] The photoconversion rate of the laminated structure after PRB and the photoconversion rate of the laminated structure after POB are measured to calculate the process maintenance rate for POB.
It is confirmed that the process retention rate of the laminated structure produced in Comparative Example 1 is only about 88% of the process retention rate of the laminated structure produced in Comparative Example 6.
[4] It is confirmed that the luminous efficiency after POB of the laminated structure manufactured in Comparative Example 1 is only about 70% of the luminous efficiency after POB of the laminated structure manufactured in Comparative Example 6.
From these results, it can be seen that the light absorption layer can significantly reduce the thermal and chemical stability of the laminated structure.

<Experimental Example 3>
[1] The luminous efficiency after PRB is measured for the laminated structures manufactured in Comparative Examples 1 to 5 and Examples 1 to 4.
The difference in luminous efficiency was calculated based on the luminous efficiency of Comparative Example 1 and summarized in Table 1 below.

It is confirmed that the laminated structure of the example can improve the luminous efficiency (initial luminous efficiency) after PRB as compared with Comparative Example 1 in which YPR is introduced without the Si-containing layer.
These results suggest that the optical loss due to the introduction of the light absorption layer is reduced / suppressed in the laminated structure of the example.
The laminated structure of Comparative Example 2 to Comparative Example 4 includes barrier layers of other compositions instead of the Si-containing layer, but in this case, there is little improvement in optical loss, and in the case of a titanium oxide layer. , Confirm that the optical loss can be more increased.

[2] The luminous efficiency after POB is measured on the laminated structures manufactured in Comparative Examples 1 to 4 and Examples 1 to 4.
Based on the luminous efficiency of Comparative Example 1, the difference in luminous efficiency is calculated and summarized in Table 1.
The photoconversion ratio of the laminate structure after PRB and the photoconversion ratio of the laminate structure after POB are measured with respect to the laminate structures manufactured in Comparative Examples 1 to 4 and Examples 1 to 4 to maintain the process for POB Calculate the rate. The results are summarized in Table 2 below.

The laminated structure of the example confirms that the process maintenance rate and the luminous efficiency after POB (final luminous efficiency) are significantly improved as compared with Comparative Example 1 in which YPR is introduced without the Si-containing layer.
Such a result suggests that, in the case of the laminated structure of the example, the chemical / thermal deterioration phenomenon caused by the introduction of the light absorption layer and the decrease in luminous efficiency thereby are reduced / relaxed / suppressed.
From the results in Table 2, the laminated structures of Comparative Examples 2 to 4 include barrier layers of other compositions instead of the Si-containing layers, but the chemical / thermal degradation phenomenon still occurs at a serious level. I know that I can get it.

  The present invention is not limited to the embodiments and examples described above. Various modifications can be made without departing from the technical scope of the present invention.

1 light emitting layer 2 silicon containing layer 3 light absorbing layer 4 light transmitting substrate 110 light source 120 light guide plate 200 liquid crystal panel 210 lower substrate 211 wiring board 220 liquid crystal layer 221 alignment film 230 light emitting layer 231 common electrode 232 black matrix 240 containing Si Layer 250 Light absorption layer 260 Upper substrate 300 Polarizer

Claims (25)

A laminated structure,
A light emitting layer comprising a quantum dot polymer complex,
A light absorbing layer disposed on the light emitting layer and comprising an absorbing color filter material;
A laminated structure comprising: the light emitting layer; and a silicon-containing layer interposed between the light absorbing layer,
The quantum dot-polymer complex includes a first polymer matrix and a plurality of quantum dots dispersed in the first polymer matrix, and the plurality of quantum dots absorb excitation light and have a wavelength of the excitation light. Configured to emit light of longer wavelength,
The absorption type color filter material is dispersed in a second polymer matrix, configured to absorb the excitation light having passed through the light emitting layer and to transmit the light emitted from the plurality of quantum dots. Laminated structure characterized by The silicon-containing layer includes a first surface in contact with the light emitting layer and a second surface opposite to the first surface,
The laminated structure according to claim 1, wherein the light absorption layer is disposed directly on the second surface of the silicon-containing layer. The light absorbing layer includes a first surface facing the light emitting layer, and a second surface facing the first surface,
The laminated structure according to claim 1, further comprising a translucent substrate disposed on the second surface of the light absorption layer.   The layered structure of claim 1, wherein the quantum dot polymer complex comprises one or more repeating sections configured to emit light having a predetermined wavelength. The repeating section includes a first section that emits a first light and a second section that emits a second light different from the first light,
The light absorbing layer is patterned to have a first absorbing section and a second absorbing section respectively corresponding to the first section and the second section;
The first absorbing section transmits at least the first light,
The laminated structure according to claim 4, wherein the second absorbing section is configured to transmit at least the second light.   The laminated structure according to claim 1, wherein the first polymer matrix comprises a crosslinked polymer, a carboxylic acid-containing binder polymer, or a combination thereof.   The cross-linked polymer is characterized in that it comprises a thiolene resin, cross-linked poly (meth) acrylate, cross-linked polyurethane, cross-linked epoxy resin, cross-linked vinyl polymer, cross-linked silicone resin, or a combination thereof. The laminated structure according to claim 6. The carboxylic acid-containing binder polymer comprises a first monomer containing a carboxylic acid group and a carbon-carbon double bond, and a second monomer containing a carbon-carbon double bond and a hydrophobic residue and not containing a carboxylic acid group. A linear copolymer of a monomer combination comprising a third monomer having a carbon-carbon double bond, a hydrophilic residue, and no carboxylic acid group, as selected.
In the main chain, it has a backbone structure in which two aromatic rings are bonded to quaternary carbon atoms that are constituent atoms of other cyclic residues, and contains multiple aromatic rings containing a carboxylic acid group (—COOH) The laminated structure according to claim 6, comprising a polymer, or a combination thereof.   The quantum dot is a group II-VI compound, a group III-V compound, a group IV-VI compound, a group IV element or compound, an I-III-VI group compound, an I-II-IV-VI group compound, or the like The laminated structure according to claim 1, comprising a combination.   The laminated structure according to claim 1, wherein the absorptive color filter material comprises an organic pigment, an organic dye, an inorganic pigment, an inorganic dye, or a combination thereof.   The laminated structure according to claim 1, wherein the second polymer matrix comprises (meth) acrylic polymer, thiolene polymer, polyurethane, epoxy polymer, vinyl polymer, silicone polymer, imide polymer, or a combination thereof. object. The silicon-containing layer is an organosilicon containing a residue represented by SiO _x (x is 1 to 2) or “* -Si-0-Si- *” (* is a portion connected to an adjacent atom) The laminated structure according to claim 1, comprising a compound, or a combination thereof.   The laminated structure according to claim 1, wherein the silicon-containing layer comprises a vapor-deposited silica layer, a porous silica layer, a plurality of silica particles, or a combination thereof. The silicon-containing layer comprises a crosslinked polymer,
One or more of the vapor-deposited silica layer, the porous silica layer, and the plurality of silica particles may be disposed on the layer of the crosslinked polymer, or may be dispersed in the crosslinked polymer. The laminated structure according to claim 13. The organosilicon compound is [RSiO _3/2 ] _n (where n is 1 to 20, R is hydrogen, C 1 to C 30 substituted or unsubstituted aliphatic residue, C 3 to C 30 substituted Or a substituted or unsubstituted alicyclic residue, a C6 to C30 substituted or unsubstituted aromatic residue, or a combination thereof, and a cage structure, a ladder structure, a polymer structure, or a combination thereof The laminated structure according to claim 12, comprising a silsesquioxane structural unit.   The layered structure according to claim 15, wherein the organosilicon compound comprises at least two of the silsesquioxane structural units linked by a linker group containing a bond between sulfur and carbon.   The laminated structure according to claim 1, wherein the silicon-containing layer has a silicon content of 10% by weight or more based on its total weight.   The laminated structure according to claim 1, wherein a thickness of the silicon-containing layer is 100 nm or more and 3 μm or less.   The laminated structure according to claim 1, wherein the silicon-containing layer has a lower refractive index than the light emitting layer and the light absorbing layer.   An electronic device comprising the laminated structure according to claim 1. A display device comprising a light source and a self-emission color filter layer disposed on the light source, the display device comprising:
The self-emission color filter layer includes the laminated structure according to any one of claims 1 to 19,
The display device, wherein the light source is configured to provide incident light to the self-emission color filter layer. The repeating section includes a first section that emits a first light and a second section that emits a second light different from the first light,
The light source includes a plurality of light emitting units respectively corresponding to the first section and the second section,
The display device according to claim 21, wherein the light emitting unit includes a first electrode and a second electrode facing each other, and a light emitting layer disposed between the first electrode and the second electrode. The display device further includes a lower substrate, an upper substrate, a polarizing plate disposed under the lower substrate, and a liquid crystal layer interposed between the upper and lower substrates.
22. The display device of claim 21, wherein the self-emission color filter layer is disposed on the upper substrate to face the liquid crystal layer.   The display device according to claim 23, further comprising a polarizer between the liquid crystal layer and the self-emission color filter layer. The display device according to claim 23, wherein the display device has a color reproduction rate of 80% or more and a light conversion efficiency of 20% or more based on a Digital Cinema Initiatives (DCI) standard.