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JP2019008989A - Socket and inspection jig - Google Patents

Socket and inspection jig Download PDF

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Publication number
JP2019008989A
JP2019008989A JP2017123757A JP2017123757A JP2019008989A JP 2019008989 A JP2019008989 A JP 2019008989A JP 2017123757 A JP2017123757 A JP 2017123757A JP 2017123757 A JP2017123757 A JP 2017123757A JP 2019008989 A JP2019008989 A JP 2019008989A
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Japan
Prior art keywords
insulating support
contact probe
socket
inspection
inspection substrate
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JP2017123757A
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Japanese (ja)
Inventor
山本 次男
Tsugio Yamamoto
次男 山本
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Yokowo Co Ltd
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Yokowo Co Ltd
Yokowo Mfg Co Ltd
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Priority to JP2017123757A priority Critical patent/JP2019008989A/en
Priority to TW107115044A priority patent/TW201906258A/en
Priority to PCT/JP2018/022431 priority patent/WO2018235676A1/en
Publication of JP2019008989A publication Critical patent/JP2019008989A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/46Bases; Cases
    • H01R13/52Dustproof, splashproof, drip-proof, waterproof, or flameproof cases
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R33/00Coupling devices specially adapted for supporting apparatus and having one part acting as a holder providing support and electrical connection via a counterpart which is structurally associated with the apparatus, e.g. lamp holders; Separate parts thereof
    • H01R33/74Devices having four or more poles, e.g. holders for compact fluorescent lamps
    • H01R33/76Holders with sockets, clips, or analogous contacts adapted for axially-sliding engagement with parallely-arranged pins, blades, or analogous contacts on counterpart, e.g. electronic tube socket

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Measuring Leads Or Probes (AREA)
  • Connecting Device With Holders (AREA)
  • Connector Housings Or Holding Contact Members (AREA)

Abstract

To eliminate inconvenience caused by moisture thereby to stabilize an electrical connection between a contact probe of a socket and an electrode of an inspection substrate.SOLUTION: A socket 1 includes contact probes 20 and an insulating support 10 to support the contact probes. A recessed portion 15 where a plunger 22 of each contact probe 20 projects is provided in an arrangement region of the contact probes 20 on an inspection substrate mounting side of the insulating support 10. The recessed portion 15 opens to an outer surface other than a surface on the inspection substrate mounting side of the insulating support 10, and is a gap S3 for ventilation.SELECTED DRAWING: Figure 1

Description

本発明は、半導体等を検査するためのコンタクトプローブを備えたソケット及び検査治具に関する。   The present invention relates to a socket provided with a contact probe for inspecting a semiconductor or the like, and an inspection jig.

図11は従来例のソケット及び検査治具の概略拡大断面図、図12は平面図、図13は図12のXIII−XIII断面図、図14は図12のXIV−XIV断面図、図15は側面図、図16は底面図である。これらの図に示すように、ソケット50は、ピンブロック61、ピンプレート62及びガイド63で構成される絶縁支持体60と、絶縁支持体60で支持される複数のコンタクトプローブ20とを備える。ガイド63は検査対象物としての半導体(IC、LSI等)40を所定の測定位置にガイドし、位置決めするものである。検査治具70は、ソケット50と検査用基板30(コンタクトプローブ20と測定装置とを接続するための基板)とを備え、検査用基板30は絶縁支持体60の基板取付面に密着固定されている。   11 is a schematic enlarged sectional view of a conventional socket and inspection jig, FIG. 12 is a plan view, FIG. 13 is a sectional view taken along line XIII-XIII in FIG. 12, FIG. 14 is a sectional view taken along line XIV-XIV in FIG. A side view and FIG. 16 are bottom views. As shown in these drawings, the socket 50 includes an insulating support 60 composed of a pin block 61, a pin plate 62 and a guide 63, and a plurality of contact probes 20 supported by the insulating support 60. The guide 63 guides and positions a semiconductor (IC, LSI, etc.) 40 as an inspection object at a predetermined measurement position. The inspection jig 70 includes a socket 50 and an inspection substrate 30 (a substrate for connecting the contact probe 20 and the measuring device), and the inspection substrate 30 is closely fixed to the substrate mounting surface of the insulating support 60. Yes.

測定時において、コンタクトプローブ20の第1プランジャ21は半導体40の電極41に接続し、コンタクトプローブ20の第2プランジャ22が検査用基板30の電極31に接続する。検査用基板30の電極31は測定装置に接続されているから、検査治具70を介して半導体40の電極41が、測定装置に接続される。   At the time of measurement, the first plunger 21 of the contact probe 20 is connected to the electrode 41 of the semiconductor 40, and the second plunger 22 of the contact probe 20 is connected to the electrode 31 of the inspection substrate 30. Since the electrode 31 of the inspection substrate 30 is connected to the measurement apparatus, the electrode 41 of the semiconductor 40 is connected to the measurement apparatus via the inspection jig 70.

従来例のソケット50及び検査治具70では、ピンブロック61とピンプレート62間に通気用隙間S2が設けられていて、絶縁支持体60の側面に開口している。しかし、ピンプレート62と検査用基板30間には通気手段は設けられていない。   In the socket 50 and the inspection jig 70 of the conventional example, a ventilation gap S <b> 2 is provided between the pin block 61 and the pin plate 62, and opens on the side surface of the insulating support 60. However, no ventilation means is provided between the pin plate 62 and the inspection substrate 30.

ところで、半導体検査においては、その半導体の使用環境を想定した温度試験が通常的に行われており、半導体検査用のソケット50及び検査治具70においても、同様の温度試験環境で使用することとなる。具体的には、検査治具70のソケット50が試験槽内側となるように検査用基板30を試験槽に取り付ける。このとき、検査用基板30は試験槽の内部雰囲気と外気とを仕切る壁となる。その場合の問題点として、温度試験槽の状態を高温(常温)→低温→高温(常温)→低温等に変化させることによるソケット50、コンタクトプローブ20、検査用基板30での結露、凍露、霜の発生がある。これは、温度変化にともない飽和水蒸気量が変化し水蒸気が液体化または個体化する現象に起因する。温度試験での各温度条件の目安は、高温>50℃ 常温≒25℃ 低温<0℃である。   By the way, in the semiconductor inspection, a temperature test assuming the use environment of the semiconductor is normally performed, and the socket 50 and the inspection jig 70 for semiconductor inspection are used in the same temperature test environment. Become. Specifically, the inspection substrate 30 is attached to the test tank so that the socket 50 of the inspection jig 70 is inside the test tank. At this time, the test substrate 30 serves as a wall that partitions the internal atmosphere and the external air of the test tank. Problems in that case include dew condensation, freezing dew on the socket 50, contact probe 20, and inspection substrate 30 by changing the state of the temperature test chamber from high temperature (normal temperature) → low temperature → high temperature (normal temperature) → low temperature, etc. There is frost generation. This is due to a phenomenon in which the amount of saturated water vapor changes with temperature change and the water vapor becomes liquid or solidifies. The standard of each temperature condition in the temperature test is high temperature> 50 ° C. normal temperature≈25 ° C. low temperature <0 ° C.

また、結露、霜の発生原因は試験槽の温度変化によるものだけでは無く、コンタクトプローブ20への通電によるコンタクトプローブ自体の温度変化や、断熱材を介さず検査用基板自体が外気と温度試験槽の遮蔽物となる温度試験槽構造が原因となる場合もある。   In addition, the cause of condensation and frost is not only due to the temperature change of the test tank, but also the temperature change of the contact probe itself due to the energization of the contact probe 20 or the inspection substrate itself without the heat insulating material. It may be caused by the temperature test tank structure that becomes the shield of the material.

発生した結露、凍露、霜は、検査用基板30とソケット50との設置面や、コンタクトプローブ20のプランジャ22とソケット孔(ピンプレート62の貫通孔62a)との隙間に入り込みリーク不良(微小電流が流れる不良)やショート不良(短絡不良)を発生させ、またその水分が低温状態で凍結することでオープン不良(プランジャが動けなくなる不良)を発生させる(例えば図11の領域A)。   The generated dew condensation, frost dew, and frost enter the gap between the installation surface of the test substrate 30 and the socket 50 and the plunger 22 of the contact probe 20 and the socket hole (the through hole 62a of the pin plate 62). A defect in which a current flows) and a short-circuit defect (short-circuit defect), and an open defect (a defect in which the plunger cannot move) is generated by freezing the moisture in a low temperature state (for example, region A in FIG. 11).

この水分の結露・凍露・霜問題に対し従来は、温度試験開始前に温度試験槽全体を高温、乾燥状態にして一旦装置全体の水分を除去している。または、ソケットや検査用基板を取り外し長時間高温乾燥状態に放置する方法もある。但し、これらの方法は除湿乾燥直後の接点性能に問題は無いものの、長時間の温度試験環境により発生した水分が装置内部に発生、堆積することにより、再びリーク・ショート・オープン不良を発生させてしまう。   Conventionally, with respect to the moisture condensation, freezing dew, and frost problems, the entire temperature test tank is heated to a high temperature and dried before the temperature test is started to temporarily remove moisture from the entire apparatus. Alternatively, there is a method in which the socket and the inspection substrate are removed and left in a high temperature dry state for a long time. However, although these methods have no problem with the contact performance immediately after dehumidification and drying, moisture generated by the long-term temperature test environment is generated and deposited inside the device, which causes leak, short, and open defects again. End up.

また、半導体検査と同時に行う除湿対策として、半導体検査中にソケット内(半導体とソケットの間、ピンブロックとピンプレートの間)に乾燥した空気を吹き込み除湿する方法(例えば従来例の通気用隙間S2に強制送風する方法)もあるが、検査用基板とソケットの設置面や、コンタクトプローブのプランジャとソケット穴の隙間に入り込んだ水分に対しては、十分に除湿できないという問題がある。  Further, as a dehumidifying measure performed simultaneously with the semiconductor inspection, a method of dehumidifying by blowing dry air into the socket (between the semiconductor and the socket, between the pin block and the pin plate) during the semiconductor inspection (for example, a ventilation gap S2 in the conventional example) However, there is a problem in that it cannot sufficiently dehumidify moisture that has entered the surface between the inspection board and the socket and the gap between the contact probe plunger and the socket hole.

特開2016−207511号公報 特許文献1は半導体検査用ソケットの一例である。JP, 2006-207511, A Patent document 1 is an example of a socket for semiconductor inspection.

上述のように、温度試験に伴う結露、凍露、霜は、検査用基板とソケットとの設置面や、コンタクトプローブのプランジャとソケット孔との隙間に入り、リーク・ショート・オープン不良を発生させてしまう。   As described above, condensation, frost dew, and frost accompanying the temperature test enter the gap between the inspection board and socket and the contact probe plunger and socket hole, causing leakage, short circuit, and open defects. End up.

本発明はこうした状況を認識してなされたものであり、その目的は、湿気に起因する不都合を除去し、コンタクトプローブと検査用基板の電極との電気的接続の安定化を図ることが可能なソケット及び検査治具を提供することにある。   The present invention has been made in view of such a situation, and an object of the present invention is to eliminate inconvenience due to moisture and to stabilize electrical connection between the contact probe and the electrode of the inspection substrate. To provide a socket and an inspection jig.

本発明のある態様はソケットである。このソケットは、コンタクトプローブと、前記コンタクトプローブを支持する絶縁支持体と、を備え、
前記絶縁支持体の検査用基板装着側における前記コンタクトプローブの配置領域に、前記コンタクトプローブが突出する凹部が設けられていて、前記凹部が前記絶縁支持体の前記検査用基板装着側の面以外の外面に開口していることを特徴とする。
One aspect of the present invention is a socket. The socket includes a contact probe and an insulating support that supports the contact probe,
A concave portion from which the contact probe protrudes is provided in a region where the contact probe is disposed on the inspection substrate mounting side of the insulating support, and the concave portion is a surface other than the surface of the insulating support on the inspection substrate mounting side. It is characterized by opening on the outer surface.

前記凹部が送風経路となっているとよい。   It is preferable that the concave portion serves as a ventilation path.

前記凹部に吸湿材又は断熱材が配置されているとよい。   A hygroscopic material or a heat insulating material may be disposed in the recess.

前記絶縁支持体の検査用基板に接する面と、前記凹部の底面との高低差が、0.15mm以上で0.2mm以下であるとよい。   The height difference between the surface of the insulating support that is in contact with the inspection substrate and the bottom surface of the recess is preferably 0.15 mm or more and 0.2 mm or less.

本発明のもう一つの態様は検査治具である。この検査治具は、コンタクトプローブと、前記コンタクトプローブを支持する絶縁支持体と、前記絶縁支持体の一方の側に装着される検査用基板と、を備え、
前記絶縁支持体の検査用基板装着側における前記コンタクトプローブの配置領域に、前記コンタクトプローブが突出する凹部が設けられていて、前記凹部が前記絶縁支持体の側面に開口していることを特徴とする。
Another embodiment of the present invention is an inspection jig. The inspection jig includes a contact probe, an insulating support that supports the contact probe, and an inspection substrate that is mounted on one side of the insulating support,
A concave portion from which the contact probe protrudes is provided in an arrangement region of the contact probe on the inspection substrate mounting side of the insulating support, and the concave portion opens on a side surface of the insulating support. To do.

なお、以上の構成要素の任意の組合せ、本発明の表現を方法やシステムなどの間で変換したものもまた、本発明の態様として有効である。   It should be noted that any combination of the above-described constituent elements, and those obtained by converting the expression of the present invention between methods and systems are also effective as aspects of the present invention.

本発明によれば、コンタクトプローブを支持する絶縁支持体の検査用基板装着側における前記コンタクトプローブの配置領域に、前記コンタクトプローブのプランジャが突出する凹部を設け、この凹部を外気に連通させることで、湿気に起因する不都合を除去して、前記コンタクトプローブと検査用基板の電極との電気的接続の安定化を実現できる。   According to the present invention, the contact probe placement region on the inspection substrate mounting side of the insulating support that supports the contact probe is provided with a recess from which the plunger of the contact probe protrudes, and the recess is communicated with the outside air. It is possible to eliminate the inconvenience due to moisture and to stabilize the electrical connection between the contact probe and the electrode of the inspection substrate.

本発明に係るソケット及び検査治具の実施の形態1を示す概略拡大断面図。1 is a schematic enlarged cross-sectional view showing a first embodiment of a socket and an inspection jig according to the present invention. 実施の形態1の平面図。FIG. 3 is a plan view of the first embodiment. 図2のIII−III断面図。III-III sectional drawing of FIG. 図2のIV−IV断面図。IV-IV sectional drawing of FIG. 実施の形態1の側面図。FIG. 3 is a side view of the first embodiment. 同底面図。The bottom view. 実施の形態1の作用効果を説明する概略拡大断面図。FIG. 3 is a schematic enlarged cross-sectional view for explaining the effect of the first embodiment. 本発明の実施の形態2を示す概略拡大断面図。FIG. 4 is a schematic enlarged cross-sectional view showing a second embodiment of the present invention. 本発明の実施の形態3を示す概略拡大断面図。FIG. 5 is a schematic enlarged cross-sectional view showing a third embodiment of the present invention. 本発明の実施の形態4を示す概略拡大断面図。FIG. 6 is a schematic enlarged cross-sectional view showing a fourth embodiment of the present invention. ソケット及び検査治具の従来例の概略拡大断面図。The general enlarged sectional view of the conventional example of a socket and an inspection jig. 従来例の平面図。The top view of a prior art example. 図12のXIII−XIII断面図。XIII-XIII sectional drawing of FIG. 図12のXIV−XIV断面図。XIV-XIV sectional drawing of FIG. 従来例の側面図。The side view of a prior art example. 同底面図。The bottom view.

以下、図面を参照しながら本発明の好適な実施の形態を詳述する。なお、各図面に示される同一または同等の構成要素、部材、処理等には同一の符号を付し、適宜重複した説明は省略する。また、実施の形態は発明を限定するものではなく例示であり、実施の形態に記述されるすべての特徴やその組み合わせは必ずしも発明の本質的なものであるとは限らない。   Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. In addition, the same code | symbol is attached | subjected to the same or equivalent component, member, process, etc. which are shown by each drawing, and the overlapping description is abbreviate | omitted suitably. In addition, the embodiments do not limit the invention but are exemplifications, and all features and combinations thereof described in the embodiments are not necessarily essential to the invention.

<実施の形態1>
図1は本発明に係るソケット及び検査治具の実施の形態1を示す概略拡大断面図、図2は平面図、図3は図2のIII−III断面図、図4は図2のIV−IV断面図、図5は側面図、図6は底面図、図7は作用効果を説明する概略拡大断面図である。これらの図に示すように、ソケット1は、ピンブロック11、ピンプレート12及びガイド13を一体化した構造の絶縁支持体10と、絶縁支持体10で支持される複数のコンタクトプローブ20とを備える。また、検査治具2は、ソケット1と絶縁支持体10のガイド13の反対側に装着される検査用基板30とを備える。検査用基板30は絶縁支持体10の基板取付面に密着固定されている。後で詳述するが、絶縁支持体10と検査用基板30間に通気用隙間S3が形成されている。
<Embodiment 1>
1 is a schematic enlarged sectional view showing a first embodiment of a socket and an inspection jig according to the present invention, FIG. 2 is a plan view, FIG. 3 is a sectional view taken along line III-III in FIG. 2, and FIG. IV sectional view, FIG. 5 is a side view, FIG. 6 is a bottom view, and FIG. As shown in these drawings, the socket 1 includes an insulating support 10 having a structure in which a pin block 11, a pin plate 12 and a guide 13 are integrated, and a plurality of contact probes 20 supported by the insulating support 10. . The inspection jig 2 includes a socket 1 and an inspection substrate 30 that is mounted on the opposite side of the guide 13 of the insulating support 10. The inspection substrate 30 is tightly fixed to the substrate mounting surface of the insulating support 10. As will be described later in detail, a ventilation gap S <b> 3 is formed between the insulating support 10 and the inspection substrate 30.

コンタクトプローブ20は、導体金属のチューブ23と、その両端部にそれぞれ設けられる第1プランジャ21及び第2プランジャ22と、導体金属のチューブ23内に設けられたコイルスプリング24とを有する。コイルスプリング24は第1プランジャ21及び第2プランジャ22を互いに離間する方向に付勢し、第1プランジャ21及び第2プランジャ22の先端はチューブ23の両端からそれぞれ突出している。   The contact probe 20 includes a conductive metal tube 23, first and second plungers 21 and 22 provided at both ends thereof, and a coil spring 24 provided in the conductive metal tube 23. The coil spring 24 biases the first plunger 21 and the second plunger 22 in a direction away from each other, and the tips of the first plunger 21 and the second plunger 22 protrude from both ends of the tube 23, respectively.

絶縁支持体10のガイド13は、検査対象物としての半導体(IC、LSI等)40を所定の測定位置にガイドし、位置決めするものであり、ピンブロック11のガイド保持部11eによってピンブロック11の一方の側に隙間S1の範囲内で移動自在に保持される。ピンブロック11及びピンプレート12は貫通孔11a,12aを有し、貫通孔11a,12aに配置されたコンタクトプローブ20を脱落しないように保持している。ガイド13にも貫通孔11a,12aに対応する貫通孔13aが形成されている。半導体40の測定時において、ガイド13は、半導体40の電極41を第1プランジャ21に押し当てるように、隙間S1が縮小する向きに移動される。なお、半導体40は図示しない押え部材によって上方から押えられて、ガイド13に保持される。   The guide 13 of the insulating support 10 guides and positions a semiconductor (IC, LSI, etc.) 40 as an object to be inspected at a predetermined measurement position. The guide holding portion 11e of the pin block 11 allows the pin block 11 to It is held movably on one side within the range of the gap S1. The pin block 11 and the pin plate 12 have through holes 11a and 12a, and hold the contact probes 20 arranged in the through holes 11a and 12a so as not to drop off. The guide 13 also has through holes 13a corresponding to the through holes 11a and 12a. During measurement of the semiconductor 40, the guide 13 is moved in a direction in which the gap S1 is reduced so as to press the electrode 41 of the semiconductor 40 against the first plunger 21. The semiconductor 40 is held from above by a holding member (not shown) and is held by the guide 13.

ピンブロック11の他方の側にはピンプレート12を配置するための凹部11bが形成されており、ここにピンプレート12が配置、固定される。また、ピンブロック11とピンプレート12間に通気用隙間S2が形成され、絶縁支持体10の側面に開口している。通気用隙間S2は貫通孔11a,12a及びチューブ23周辺の除湿のために設けられている。   On the other side of the pin block 11, a recess 11b for arranging the pin plate 12 is formed, and the pin plate 12 is arranged and fixed therein. Further, a ventilation gap S <b> 2 is formed between the pin block 11 and the pin plate 12, and is opened on the side surface of the insulating support 10. The ventilation gap S2 is provided for dehumidification around the through holes 11a and 12a and the tube 23.

また、検査用基板30を密着させて取り付けるためのピンブロック11の基板取付面11dから凹部11bのピンプレート取付面11cに至る深さ(コンタクトプローブ20の軸方向でみた深さ)がピンプレート12の厚みよりも大きいため、絶縁支持体10の検査用基板装着側におけるコンタクトプローブ20の配置領域に、第2プランジャ22が突出する凹部15が設けられることになる。つまり、絶縁支持体10に検査用基板30を装着したときに、絶縁支持体10と検査用基板30間に通気用隙間S3が形成され、通気用隙間S3は絶縁支持体10の側面に開口している。   Further, the depth from the substrate mounting surface 11d of the pin block 11 for mounting the inspection substrate 30 in close contact to the pin plate mounting surface 11c of the recess 11b (the depth seen in the axial direction of the contact probe 20) is the pin plate 12. Therefore, the concave portion 15 from which the second plunger 22 protrudes is provided in the arrangement region of the contact probe 20 on the inspection substrate mounting side of the insulating support 10. That is, when the inspection substrate 30 is mounted on the insulating support 10, a ventilation gap S <b> 3 is formed between the insulating support 10 and the inspection substrate 30, and the ventilation gap S <b> 3 opens on the side surface of the insulating support 10. ing.

図3乃至図5のように、ピンブロック11の基板取付面11dには位置決めピン16が立設固定されており、位置決めピン16が検査用基板30の位置決め穴に嵌合することで、検査用基板30はピンブロック11の基板取付面11d(つまり絶縁支持体10の基板取付面)に位置決め、固定される。   As shown in FIGS. 3 to 5, positioning pins 16 are erected and fixed to the board mounting surface 11 d of the pin block 11, and the positioning pins 16 are fitted into the positioning holes of the inspection board 30, so that they are used for inspection. The substrate 30 is positioned and fixed to the substrate mounting surface 11d of the pin block 11 (that is, the substrate mounting surface of the insulating support 10).

なお、絶縁支持体10の検査用基板30に接する基板取付面11dと、凹部15の底面(ピンプレート12の検査用基板30への対向面12b)との高低差は、0.15mm以上で0.2mm以下に設定される。前記高低差は、第2プランジャ22のストローク等に配慮して決められるが、0.15mm未満では通気効果が少なく、0.2mmより大きいと第2プランジャ22の位置決め精度が低下する。   The difference in height between the substrate mounting surface 11d of the insulating support 10 that contacts the inspection substrate 30 and the bottom surface of the recess 15 (the surface 12b of the pin plate 12 facing the inspection substrate 30) is 0.15 mm or more and 0. .2 mm or less is set. The height difference is determined in consideration of the stroke of the second plunger 22 and the like, but if it is less than 0.15 mm, the ventilation effect is small, and if it is more than 0.2 mm, the positioning accuracy of the second plunger 22 decreases.

測定時において、半導体40は図示しない押え部材によって上方から押えられて、ガイド13に保持され、コンタクトプローブ20の第1プランジャ21は半導体40の電極41に接続し、コンタクトプローブ20の第2プランジャ22が検査用基板30の電極31に接続する。検査用基板30の電極31は測定装置に接続されているから、検査治具2を介して半導体40の電極41が、測定装置に接続される。   At the time of measurement, the semiconductor 40 is pressed from above by a pressing member (not shown) and held by the guide 13, the first plunger 21 of the contact probe 20 is connected to the electrode 41 of the semiconductor 40, and the second plunger 22 of the contact probe 20. Is connected to the electrode 31 of the inspection substrate 30. Since the electrode 31 of the inspection substrate 30 is connected to the measuring device, the electrode 41 of the semiconductor 40 is connected to the measuring device via the inspection jig 2.

本実施の形態によれば、下記の効果を奏することができる。   According to the present embodiment, the following effects can be achieved.

(1) 絶縁支持体10と検査用基板30間に通気用隙間S3を設けることで、コンタクトプローブ20と検査用基板30の電極31との接触部分を開放し(通気用隙間S3に対して露出させ)、第2プランジャ22と貫通孔12aの隙間部分への水分の流れ込みを防止することができる。 (1) By providing a ventilation gap S3 between the insulating support 10 and the inspection substrate 30, the contact portion between the contact probe 20 and the electrode 31 of the inspection substrate 30 is opened (exposed to the ventilation gap S3). It is possible to prevent moisture from flowing into the gap between the second plunger 22 and the through hole 12a.

(2) 通気用隙間S3を設けることで、コンタクトプローブ20と検査用基板30の電極31との接触部分を開放し、試験環境雰囲気へ水分を蒸発させることができる。 (2) By providing the ventilation gap S3, the contact portion between the contact probe 20 and the electrode 31 of the inspection substrate 30 can be opened, and moisture can be evaporated to the test environment atmosphere.

(3) 通気用隙間S3を乾燥空気の経路として利用し、乾燥空気を強制送風することで、コンタクトプローブ20と検査用基板30の電極31との接触部分を直接的に乾燥させることが可能である。また、乾燥空気を強制送風することで、図7に示すコンタクトプローブ20の摺動部分から発生する摺動異物C(ゴミ、カス)を送風によって除去することも可能である。 (3) By using the ventilation gap S3 as a path for dry air and forcibly blowing dry air, the contact portion between the contact probe 20 and the electrode 31 of the inspection substrate 30 can be directly dried. is there. Further, by forcedly blowing dry air, it is also possible to remove the sliding foreign matter C (dust, debris) generated from the sliding portion of the contact probe 20 shown in FIG. 7 by blowing.

(4) 以上のことから、温度試験に伴う結露、凍露、霜による悪影響を除去でき、コンタクトプローブ20と検査用基板30の電極との電気的接続の安定化を実現できる。さらに、通気用隙間S3を設けたことで、ソケット1の検査用基板30への接触面が小さくなり、通気用隙間S3がソケット1と検査用基板30間の直接的熱伝導を遮ることができる。これによって、ソケット1を有する検査治具2を試験槽に取り付けた温度試験において、試験槽が高温状態の場合に検査用基板30のソケット取付面の反対面から試験槽の熱が逃げることを防ぐことができ、試験槽が低温状態の場合に検査用基板30のソケット取付面の反対面から外気の熱が入ることを防ぐことが可能になる。この結果、温度試験時における試験槽の温度を安定的にかつ効率よく保持することができる。 (4) From the above, it is possible to remove the adverse effects due to dew condensation, frost dew, and frost associated with the temperature test, and to stabilize the electrical connection between the contact probe 20 and the electrode of the inspection substrate 30. Furthermore, by providing the ventilation gap S3, the contact surface of the socket 1 with the inspection board 30 is reduced, and the ventilation gap S3 can block direct heat conduction between the socket 1 and the inspection board 30. . Thereby, in the temperature test in which the inspection jig 2 having the socket 1 is attached to the test tank, the heat of the test tank is prevented from escaping from the opposite surface of the socket mounting surface of the inspection substrate 30 when the test tank is in a high temperature state. It is possible to prevent the outside air from entering from the opposite side of the socket mounting surface of the inspection substrate 30 when the test tank is in a low temperature state. As a result, the temperature of the test tank during the temperature test can be stably and efficiently maintained.

<実施の形態2>
図8は本発明の実施の形態2を示す概略拡大断面図であり、絶縁支持体の全体の外形は実施の形態1と実質的に同じであるが、分割構造が異なっている。実施の形態2において、絶縁支持体10Aは、ピンブロック11A、ピンプレート12A及びガイド13を一体化した構造であるが、ピンプレート12Aが検査用基板30とピンブロック11A間に介在している。つまり、ピンブロック11Aに、凹部15を有するピンプレート12Aが重ねて一体化され、検査用基板30はピンプレート12Aの基板取付面12dに密着固定され、凹部15を設けた所が通気用隙間S3となる。絶縁支持体10Aの外形は絶縁支持体10と実質的に同じになる。その他の構成は実施の形態1と同様であり、同一又は相当部分に実施の形態1と同じ符号を付して説明を省略する。
<Embodiment 2>
FIG. 8 is a schematic enlarged cross-sectional view showing the second embodiment of the present invention. The overall outer shape of the insulating support is substantially the same as that of the first embodiment, but the divided structure is different. In the second embodiment, the insulating support 10A has a structure in which the pin block 11A, the pin plate 12A, and the guide 13 are integrated, but the pin plate 12A is interposed between the inspection substrate 30 and the pin block 11A. That is, the pin plate 12A having the recess 15 is integrated with the pin block 11A, the inspection substrate 30 is closely fixed to the substrate mounting surface 12d of the pin plate 12A, and the place where the recess 15 is provided is the ventilation gap S3. It becomes. The outer shape of the insulating support 10A is substantially the same as that of the insulating support 10. Other configurations are the same as those of the first embodiment, and the same or corresponding parts are denoted by the same reference numerals as those of the first embodiment and description thereof is omitted.

この実施の形態2によっても、実施の形態1と同様の作用効果を得ることができる。   Also according to the second embodiment, the same effect as that of the first embodiment can be obtained.

<実施の形態3>
図9は本発明の実施の形態3を示す概略拡大断面図であり、絶縁支持体の全体の外形は実施の形態1と実質的に同じであるが、分割構造が異なっている。実施の形態3において、絶縁支持体10Bは、ピンブロック11B、ピンプレート12B及びスペーサ14及びガイド13を一体化した構造である。つまり、実施の形態2の凹部15を有するピンプレート12Aの代わりに、平板状のピンプレート12Bとスペーサ14との積層構造とし、スペーサ14には積層時に凹部15となる透孔19が予め形成されている。ピンプレート12Bと検査用基板30間にスペーサ14を介在させて検査用基板30が絶縁支持体10Bに固定されている。これにより、スペーサ14の透孔19(絶縁支持体10Bの凹部15)を設けた所が通気用隙間S3となる。絶縁支持体10Bの外形は絶縁支持体10と実質的に同じになる。その他の構成は実施の形態1と同様であり、同一又は相当部分に実施の形態1と同じ符号を付して説明を省略する。
<Embodiment 3>
FIG. 9 is a schematic enlarged cross-sectional view showing Embodiment 3 of the present invention. The overall outer shape of the insulating support is substantially the same as that of Embodiment 1, but the divided structure is different. In the third embodiment, the insulating support 10B has a structure in which the pin block 11B, the pin plate 12B, the spacer 14, and the guide 13 are integrated. That is, instead of the pin plate 12A having the recess 15 of the second embodiment, a laminated structure of the flat pin plate 12B and the spacer 14 is formed, and the through hole 19 that becomes the recess 15 at the time of stacking is formed in the spacer 14 in advance. ing. The inspection substrate 30 is fixed to the insulating support 10B with the spacer 14 interposed between the pin plate 12B and the inspection substrate 30. Thereby, the place which provided the through-hole 19 (the recessed part 15 of the insulation support body 10B) of the spacer 14 becomes the clearance gap S3. The outer shape of the insulating support 10B is substantially the same as that of the insulating support 10. Other configurations are the same as those of the first embodiment, and the same or corresponding parts are denoted by the same reference numerals as those of the first embodiment and description thereof is omitted.

この実施の形態3によっても、実施の形態1と同様の作用効果を得ることができる。   Also according to the third embodiment, the same effect as that of the first embodiment can be obtained.

<実施の形態4>
図9は本発明の実施の形態4を示す概略拡大断面図であり、実施の形態1の構成に加えて、絶縁支持体1の凹部15に吸湿材(除湿材)又は断熱材16が設けられている。吸湿材又は断熱材16にはコンタクトプローブ20の第2プランジャ22と検査用基板30の電極31との接触を妨げないように第2プランジャ22を貫通させる構造となっている。その他の構成は実施の形態1と同様であり、同一又は相当部分に実施の形態1と同じ符号を付して説明を省略する。
<Embodiment 4>
FIG. 9 is a schematic enlarged sectional view showing a fourth embodiment of the present invention. In addition to the configuration of the first embodiment, a moisture absorbing material (dehumidifying material) or a heat insulating material 16 is provided in the recess 15 of the insulating support 1. ing. The hygroscopic material or the heat insulating material 16 has a structure in which the second plunger 22 is penetrated so as not to prevent contact between the second plunger 22 of the contact probe 20 and the electrode 31 of the inspection substrate 30. Other configurations are the same as those of the first embodiment, and the same or corresponding parts are denoted by the same reference numerals as those of the first embodiment and description thereof is omitted.

絶縁支持体1の凹部15に吸湿材又は断熱材16を設けたことで、コンタクトプローブ20の第2プランジャ22と検査用基板30との接触部分周辺に結露、凍露、霜が発生するのを抑え、コンタクトプローブ20と検査用基板30間の電気的接続の安定化が可能である。   By providing the hygroscopic material or the heat insulating material 16 in the recess 15 of the insulating support 1, condensation, frost dew, and frost are generated around the contact portion between the second plunger 22 of the contact probe 20 and the test substrate 30. The electrical connection between the contact probe 20 and the inspection substrate 30 can be stabilized.

また、凹部15に断熱材16を設けた場合には、断熱材16がソケット1と検査用基板30間の直接的熱伝導を遮ることになり、これによって、ソケット1を有する検査治具2を試験槽に取り付けた温度試験において、試験槽が高温状態の場合に検査用基板30のソケット取付面の反対面から試験槽の熱が逃げることを防ぐことができ、試験槽が低温状態の場合に検査用基板30のソケット取付面の反対面から外気の熱が入ることを防ぐことが可能になる。この結果、温度試験時における試験槽の温度を安定的にかつ効率よく保持することができる。   Further, when the heat insulating material 16 is provided in the concave portion 15, the heat insulating material 16 blocks direct heat conduction between the socket 1 and the inspection substrate 30, whereby the inspection jig 2 having the socket 1 is formed. In the temperature test attached to the test tank, when the test tank is in a high temperature state, it is possible to prevent the heat of the test tank from escaping from the opposite side of the socket mounting surface of the inspection substrate 30 and when the test tank is in a low temperature state. It becomes possible to prevent heat of outside air from entering from the opposite surface of the socket mounting surface of the inspection substrate 30. As a result, the temperature of the test tank during the temperature test can be stably and efficiently maintained.

以上、実施の形態を例に本発明を説明したが、実施の形態の各構成要素や各処理プロセスには請求項に記載の範囲で種々の変形が可能であることは当業者に理解されるところである。以下、変形例について触れる。   The present invention has been described above by taking the embodiment as an example. However, it is understood by those skilled in the art that various modifications can be made to each component and each processing process of the embodiment within the scope of the claims. By the way. Hereinafter, modifications will be described.

各実施の形態において、コンタクトプローブと、コンタクトプローブを支持する絶縁支持体の構造は、検査対象物の種類に応じて適宜変更可能である。   In each embodiment, the structure of the contact probe and the insulating support that supports the contact probe can be appropriately changed according to the type of the inspection object.

各実施の形態において、絶縁支持体に設けられた通気用隙間S2,S3の開口は絶縁支持体の4側面に設けられるが、通気用隙間S2,S3に強制送風する場合には、開口を給気側と排気側の2箇所に限定してもよい。   In each embodiment, the openings of the ventilation gaps S2 and S3 provided in the insulating support are provided on the four side surfaces of the insulation support. However, when forced air is supplied to the ventilation gaps S2 and S3, the openings are supplied. You may limit to two places, an air side and an exhaust side.

1,50 ソケット
2,70 検査治具
10,10A,10B,60 絶縁支持体
15 凹部
16 吸湿材(除湿材)又は断熱材
20 コンタクトプローブ
30 検査用基板
31,41 電極
40 半導体
S2,S3 通気用隙間
1,50 Socket 2,70 Inspection jig 10, 10A, 10B, 60 Insulating support 15 Recess 16 Resorbing material (dehumidifying material) or heat insulating material 20 Contact probe 30 Inspection substrate 31, 41 Electrode 40 Semiconductor S2, S3 For ventilation Gap

Claims (5)

コンタクトプローブと、
前記コンタクトプローブを支持する絶縁支持体と、を備え、
前記絶縁支持体の検査用基板装着側における前記コンタクトプローブの配置領域に、前記コンタクトプローブが突出する凹部が設けられていて、前記凹部が前記絶縁支持体の前記検査用基板装着側の面以外の外面に開口していることを特徴とするソケット。
A contact probe;
An insulating support for supporting the contact probe,
A concave portion from which the contact probe protrudes is provided in a region where the contact probe is disposed on the inspection substrate mounting side of the insulating support, and the concave portion is a surface other than the surface of the insulating support on the inspection substrate mounting side. A socket characterized by opening on the outer surface.
前記凹部が送風経路となっている請求項1に記載のソケット。   The socket according to claim 1, wherein the recess serves as a ventilation path. 前記凹部に吸湿材又は断熱材が配置されていることを特徴とする請求項1に記載のソケット。   The socket according to claim 1, wherein a hygroscopic material or a heat insulating material is disposed in the recess. 前記絶縁支持体の検査用基板に接する面と、前記凹部の底面との高低差が、0.15mm以上で0.2mm以下であることを特徴とする請求項1乃至3のいずれか一項に記載のソケット。   4. The height difference between the surface of the insulating support that is in contact with the inspection substrate and the bottom surface of the concave portion is 0.15 mm or more and 0.2 mm or less. 5. The listed socket. コンタクトプローブと、
前記コンタクトプローブを支持する絶縁支持体と、
前記絶縁支持体の一方の側に装着される検査用基板と、を備え、
前記絶縁支持体の検査用基板装着側における前記コンタクトプローブの配置領域に、前記コンタクトプローブが突出する凹部が設けられていて、前記凹部が前記絶縁支持体の側面に開口していることを特徴とする検査治具。
A contact probe;
An insulating support for supporting the contact probe;
An inspection substrate mounted on one side of the insulating support,
A concave portion from which the contact probe protrudes is provided in an arrangement region of the contact probe on the inspection substrate mounting side of the insulating support, and the concave portion opens on a side surface of the insulating support. Inspection jig to do.
JP2017123757A 2017-06-23 2017-06-23 Socket and inspection jig Pending JP2019008989A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2017123757A JP2019008989A (en) 2017-06-23 2017-06-23 Socket and inspection jig
TW107115044A TW201906258A (en) 2017-06-23 2018-05-03 Socket and testing tool
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