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JP2019089044A - Glass plate manufacturing method - Google Patents

Glass plate manufacturing method Download PDF

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JP2019089044A
JP2019089044A JP2017220939A JP2017220939A JP2019089044A JP 2019089044 A JP2019089044 A JP 2019089044A JP 2017220939 A JP2017220939 A JP 2017220939A JP 2017220939 A JP2017220939 A JP 2017220939A JP 2019089044 A JP2019089044 A JP 2019089044A
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glass plate
liquid
drying
chamber
cleaning
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薫 鑑継
Kaoru Kankei
薫 鑑継
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Nippon Electric Glass Co Ltd
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Nippon Electric Glass Co Ltd
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Priority to JP2017220939A priority Critical patent/JP2019089044A/en
Priority to PCT/JP2018/038684 priority patent/WO2019097943A1/en
Priority to TW107137838A priority patent/TW201922365A/en
Publication of JP2019089044A publication Critical patent/JP2019089044A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00Other surface treatment of glass not in the form of fibres or filaments

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

To provide a glass plate having excellent surface quality in such a manner that adhesion of a fine particle onto a surface of the glass plate is prevented or suppressed as much as possible.SOLUTION: This glass plate manufacturing method comprises: a cleaning process S2 in which first liquid 19, 20 is supplied to a glass plate G, thereby cleaning the glass plate G; and a drying process S3 in which a gas 26 is blown to the glass plate G which is introduced into a drying treatment chamber 12 and is transported on a prescribed transport path L in the drying treatment chamber 12, thereby removing the first liquid 19, 20 from the glass plate G. In a state that second liquid 32 is located at a bottom of the drying treatment chamber 12, the gas 26 is blown to the glass plate G, thereby performing draining and drying.SELECTED DRAWING: Figure 2

Description

本発明は、ガラス板の製造方法に関し、特にガラス板を洗浄した後、洗浄液を除去してガラス板を乾燥させる際、ガラス板表面への微粒子の付着を防止する技術に関する。   The present invention relates to a method for producing a glass plate, and more particularly to a technique for preventing adhesion of fine particles to the surface of the glass plate when the glass plate is removed by washing the glass plate and then drying the glass plate.

例えば液晶ディスプレイ用のガラス基板をはじめとするガラス板を製造するに際しては、成形したガラス原板(成形原板)から切り出されたガラス板に端面加工などの加工を施した後、当該ガラス板を洗浄すると共に、洗浄時にガラス板の表面に付着した洗浄液をエアナイフなどによるエアの吹き付けにより除去して(液切りして)、ガラス板を乾燥させることが行われている(例えば、特許文献1を参照)。また、これら一連の作業を経た後、得られたガラス板に残存(付着)する異物の有無を検査している。   For example, when manufacturing a glass plate including a glass substrate for a liquid crystal display, the glass plate cut out from a molded glass plate (formed plate) is subjected to processing such as end face processing, and then the glass plate is washed. At the same time, the cleaning liquid adhering to the surface of the glass plate at the time of cleaning is removed by blowing air with an air knife or the like (liquid removal) to dry the glass plate (see, for example, Patent Document 1) . In addition, after passing through these series of operations, the presence or absence of foreign substances remaining (adhering) on the obtained glass plate is inspected.

特開2014-38914号公報JP 2014-38914 A

このように、検査工程では、ガラス板の表面に付着したガラス粉などの異物の有無が検査されており、また異物の数の測定が行われることもある。ここで、測定対象となる異物は、そのサイズに応じて複数の水準に分類されており、この中でも、最小水準(1.0μm未満)の異物(以後、本明細書では、単に微粒子と称する。)が多く検出される傾向にある。この種の微粒子は、検査工程までの間に完全に除去することが難しく、例えば特許文献1に記載のように、ガラス板の表面を洗浄した後、エアナイフで液切り乾燥した場合であっても、乾燥後のガラス板の中には、決して無視できない数の微粒子が表面に付着しているものが存在していた。当然ながら、微粒子の付着はガラス板の表面品位を低下させる要因となるため、微粒子の付着は回避すべきである。   As described above, in the inspection step, the presence or absence of foreign matter such as glass powder adhering to the surface of the glass plate is inspected, and the number of foreign matter may be measured. Here, the foreign matter to be measured is classified into a plurality of levels according to its size, and among them, the foreign matter of the minimum level (less than 1.0 μm) (hereinafter, referred to simply as fine particles in the present specification). ) Tend to be detected. It is difficult to completely remove this kind of fine particles before the inspection step, and for example, as described in Patent Document 1, even if the surface of the glass plate is washed and then it is drained and dried by an air knife. Among the glass plates after drying, there were those in which an extremely large number of fine particles were attached to the surface. As a matter of course, the adhesion of the fine particles is a factor that reduces the surface quality of the glass plate, so the adhesion of the fine particles should be avoided.

以上の事情に鑑み、本明細書では、ガラス板表面への微粒子の付着を低減して、表面品位に優れたガラス板を提供することを、本発明により解決すべき技術課題とする。   In view of the above circumstances, in the present specification, it is a technical problem to be solved by the present invention to provide a glass plate excellent in surface quality by reducing adhesion of fine particles to the surface of the glass plate.

前記課題の解決は、本発明に係るガラス板の製造方法により達成される。すなわち、この製造方法は、ガラス板に第一の液体を供給して、ガラス板を洗浄する洗浄工程と、乾燥処理室内に搬入され、乾燥処理室内の所定の搬送経路上を搬送されるガラス板に気体を吹き付けて、ガラス板から第一の液体を除去する乾燥工程とを備えるガラス板の製造方法であって、乾燥処理室の底部に第二の液体が配置されている状態で、ガラス板に気体を吹き付ける点をもって特徴付けられる。   The solution to the above problems is achieved by the method for producing a glass sheet according to the present invention. That is, in this manufacturing method, the first liquid is supplied to the glass plate to wash the glass plate, and the glass plate carried in the drying processing chamber and transported on a predetermined transport path in the drying processing chamber. And a drying step of removing the first liquid from the glass plate, wherein the glass plate is formed in a state where the second liquid is disposed at the bottom of the drying processing chamber. It is characterized by the point which blows a gas on.

本発明者が、上述した洗浄と液切り乾燥を行うに際して、乾燥処理室内における気流と微粒子の挙動との関係について調査した結果、以下の知見を得るに至った。すなわち、上述した洗浄後の乾燥を乾燥処理室内で実施する場合、乾燥処理室内に配設されたエアナイフなどの気体吹付け装置により、乾燥処理室内に搬入されたガラス板の液切り(洗浄液やリンス液等の除去)が行われる。この際、気体吹付け装置からガラス板に供給された気体が、乾燥処理室内に乱流を引き起こし、この乱流によって、第一の液体(洗浄液等)と共にガラス板の表面から除去され、乾燥処理室の底部に沈降していた微粒子が舞い上がることが判明した。以上より、ガラス板表面への微粒子の付着は、ガラス板への気体の吹き付けにより乾燥処理室内に生じた不規則な流れ(乱流)によるものと推察される。   As a result of investigating the relationship between the air flow and the behavior of the fine particles in the drying processing chamber when the present inventor performs the above-described cleaning and draining and drying, the following findings have been obtained. That is, when the drying after the cleaning described above is carried out in the drying processing chamber, the glass plate carried into the drying processing chamber is drained (cleaning liquid or rinse) by a gas blowing device such as an air knife disposed in the drying processing chamber. Removal of liquid etc.) is performed. At this time, the gas supplied from the gas blowing device to the glass plate causes turbulent flow in the drying processing chamber, and this turbulent flow is removed from the surface of the glass plate together with the first liquid (cleaning liquid etc.) It was found that the fine particles that had settled to the bottom of the chamber soak up. From the above, it is inferred that the adhesion of the fine particles to the surface of the glass plate is due to the irregular flow (turbulence) generated in the drying processing chamber by the blowing of the gas onto the glass plate.

本発明は、以上の知見に基づきなされたもので、第一の液体によるガラス板の洗浄と乾燥を行うに際し、乾燥処理室の底部に捕捉用の第二の液体が配置された状態でガラス板に気体を吹き付けるようにした。このように、ドライ環境に設定されるべき乾燥処理室の底部に第二の液体が配置された環境下で気体の吹き付けによる液切りを行うことによって、洗浄液等と共にガラス板から除去された微粒子が、第二の液体によって捕捉される。よって、気体の吹き付けに起因する乱流が乾燥処理室内で生じたとしても、沈降した微粒子が乱流に乗って舞い上がりにくくなる。従って、乾燥処理室内で効率よく洗浄液を除去してガラス板を乾燥しつつも、微粒子の付着を低減して、表面品位に優れたガラス板を提供することが可能となる。また、乾燥処理室の底部に第二の液体を供給しているので、ガラス板と第二の液体とが接する機会を極力排除することができる。よって、第二の液体を乾燥処理室内に配置することに起因したガラス板の表面品位の低下を可及的に防止することができる。なお、第二の液体による捕捉以外の手段として、例えば乾燥処理室内の気体を排気して、排気した気体を所定のフィルタに通して微粒子を排除した後、再び乾燥処理室内に戻す手段なども考えられるが、この方法だと、多大な排気能力が必要となり、排気設備の複雑化、高コスト化が避けられない。これに対して、本発明に係る微粒子捕捉手段によれば、乾燥処理室の底部に第二の液体を配置した状態を維持するだけで、ガラス板表面への微粒子の付着を低減できるので、簡素な設備で済む。以上より、本発明によれば、コストアップを回避しつつ、ガラス板の表面品位を向上させることが可能となる。なお、第一の液体とは、洗浄工程でガラス板に供給される液体を意味し、後述の実施形態では、洗浄液及びリンス液が第一の液体に該当する。   The present invention has been made based on the above findings, and in performing cleaning and drying of the glass plate with the first liquid, the glass plate in a state in which the second liquid for capture is disposed at the bottom of the drying processing chamber. I tried to blow the gas. As described above, the fine particles removed from the glass plate together with the cleaning liquid and the like are removed by performing the liquid removal by blowing the gas under the environment where the second liquid is disposed at the bottom of the drying processing chamber to be set in the dry environment , By the second liquid. Therefore, even if the turbulent flow resulting from the blowing of the gas occurs in the drying processing chamber, the settled fine particles hardly get on the turbulent flow and fly up. Therefore, it is possible to provide a glass plate excellent in surface quality by reducing adhesion of fine particles while drying the glass plate efficiently by removing the cleaning solution in the drying processing chamber. In addition, since the second liquid is supplied to the bottom of the drying treatment chamber, the opportunity for the glass plate to come into contact with the second liquid can be eliminated as much as possible. Therefore, it is possible to prevent, as much as possible, the deterioration of the surface quality of the glass plate caused by disposing the second liquid in the drying processing chamber. In addition, as means other than the capture by the second liquid, for example, after exhausting the gas in the drying processing chamber and passing the exhausted gas through a predetermined filter to remove particulates, a means for returning it back to the drying processing chamber is also considered. However, with this method, a large amount of exhaust capacity is required, and complicated exhaust systems and high cost can not be avoided. On the other hand, according to the particle capturing means of the present invention, the adhesion of the particles to the surface of the glass plate can be reduced only by maintaining the state in which the second liquid is disposed at the bottom of the drying processing chamber. It is not necessary equipment. As mentioned above, according to this invention, it becomes possible to improve the surface quality of a glass plate, avoiding cost increase. In addition, a 1st liquid means the liquid supplied to a glass plate at a washing | cleaning process, and in below-mentioned embodiment, a washing | cleaning liquid and a rinse liquid correspond to a 1st liquid.

また、本発明に係るガラス板の製造方法においては、乾燥処理室内の底部が第一の液体及び第二の液体で覆われている状態で、ガラス板に気体を吹き付けてもよい。   Moreover, in the manufacturing method of the glass plate which concerns on this invention, you may spray gas on a glass plate in the state by which the bottom part in a drying process chamber is covered with a 1st liquid and a 2nd liquid.

このように乾燥処理室内の底部を第一の液体及び第二の液体で覆うことにより、乾燥処理室内で沈降した微粒子を漏れなくかつ確実に捕捉することができる。また、乱流等の影響により第二の液体が上昇してガラス板に触れる事態も確実に防止することができる。以上より、本構成によれば、ガラス板への微粒子の付着をさらに低減しつつ、ガラス板を乾燥させることができる。   By covering the bottom in the drying processing chamber with the first liquid and the second liquid in this manner, fine particles settled in the drying processing chamber can be captured without leakage and reliably. In addition, it is possible to reliably prevent the second liquid from rising due to the influence of turbulent flow or the like and touching the glass plate. As mentioned above, according to this structure, a glass plate can be dried, reducing adhesion of the microparticles | fine-particles to a glass plate further.

また、本発明に係るガラス板の製造方法において、第二の液体は、純水であってもよい。   In the method of manufacturing a glass plate according to the present invention, the second liquid may be pure water.

乾燥処理室は、洗浄処理室に比べて清浄度を高く管理しているのが一般的である。よって、第二の液体に純水を用いることで、乾燥処理室内雰囲気の清浄度を悪化させることなく、雰囲気中に浮遊し、沈降する微粒子を捕捉して、ガラス板表面への付着を低減することが可能となる。   It is general that the drying processing room manages the cleanliness higher than the cleaning processing room. Therefore, by using pure water as the second liquid, the fine particles floating and settling in the atmosphere are captured without deteriorating the cleanliness of the atmosphere in the drying processing room, and the adhesion to the surface of the glass plate is reduced. It becomes possible.

また、本発明に係るガラス板の製造方法においては、第二の液体の乾燥処理室内への供給及び乾燥処理室外への排出により、底部に配置した第二の液体を入れ替えてもよい。   In the method of manufacturing a glass plate according to the present invention, the second liquid disposed at the bottom may be replaced by supplying the second liquid into the drying processing chamber and discharging the second liquid out of the drying processing chamber.

このように、乾燥処理室の底部に配置される液体を入れ替えることで、補足された微粒子を第二の液体と共に排出することができる。これにより、乾燥処理室の清浄度を高い状態で維持できる。   Thus, by replacing the liquid disposed at the bottom of the drying processing chamber, the captured microparticles can be discharged together with the second liquid. Thereby, the cleanliness of the drying processing chamber can be maintained in a high state.

以上に述べたように、本発明によれば、ガラス板表面への微粒子の付着を低減して、表面品位に優れたガラス板を提供することが可能となる。   As described above, according to the present invention, it is possible to provide a glass plate excellent in surface quality by reducing adhesion of fine particles to the surface of the glass plate.

本発明の第一実施形態に係るガラス板の製造方法の手順を示すフローチャートである。It is a flowchart which shows the procedure of the manufacturing method of the glass plate which concerns on 1st embodiment of this invention. 本発明の第一実施形態に係るガラス板の洗浄乾燥装置の側面図である。It is a side view of the washing and drying device of the glass board concerning a first embodiment of the present invention. 本発明との比較に用いるガラス板の洗浄乾燥装置の側面図である。It is a side view of the washing and drying apparatus of the glass plate used for comparison with this invention. 本発明の第二実施形態に係るガラス板の洗浄乾燥装置の側面図である。It is a side view of the washing and drying device of the glass board concerning a second embodiment of the present invention. 図4に示す洗浄乾燥装置のA−A断面図である。It is AA sectional drawing of the washing-drying apparatus shown in FIG.

以下、本発明の第一実施形態を、図1〜図3を参照して説明する。   Hereinafter, a first embodiment of the present invention will be described with reference to FIGS. 1 to 3.

本実施形態に係るガラス板の製造方法は、図1に示すように、ガラス板に所定の加工を施す加工工程S1と、所定の加工が施されたガラス板を洗浄する洗浄工程S2と、洗浄したガラス板に付着した洗浄液を除去してガラス板を乾燥させる乾燥工程S3と、乾燥後のガラス板の表面に付着した微粒子等の異物の有無を検査する検査工程S4とを備える。加工工程S1では、例えば砥石によってガラス板の端面に加工が施される。加工工程S1の前工程として、成形原板から所望のサイズのガラス板を切り出す切断工程を設けてもよい。以下、洗浄工程S2と乾燥工程S3を中心に説明する。   In the method of manufacturing a glass plate according to the present embodiment, as shown in FIG. 1, a processing step S1 of performing predetermined processing on the glass plate, a cleaning step S2 of cleaning the glass plate subjected to the predetermined processing, and cleaning And drying step S3 of drying the glass plate by removing the cleaning liquid adhering to the glass plate, and inspection step S4 of inspecting the presence or absence of foreign matter such as fine particles adhering to the surface of the glass plate after drying. In the processing step S1, the end face of the glass plate is processed, for example, by a grindstone. As a pre-process of processing process S1, you may provide the cutting process which cuts out the glass plate of a desired size from a shaping | molding original plate. The following description will focus on the washing step S2 and the drying step S3.

図2は、洗浄工程S2及び乾燥工程S3に使用する洗浄乾燥装置10の全体構成を示す側面図である。図2に示すように、この洗浄乾燥装置10は、洗浄処理室11と乾燥処理室12とを備え、ガラス板Gの搬送経路Lは、洗浄処理室11及び乾燥処理室12を横断するように設けられる。この場合、洗浄処理室11と乾燥処理室12内には、ガラス板Gを搬送経路Lに沿って搬送する搬送装置13,14が配設される。各搬送装置13,14は、例えばローラコンベアで構成される。   FIG. 2 is a side view showing the overall configuration of the washing and drying apparatus 10 used in the washing step S2 and the drying step S3. As shown in FIG. 2, the cleaning and drying apparatus 10 includes a cleaning processing chamber 11 and a drying processing chamber 12, and the transport path L of the glass plate G crosses the cleaning processing chamber 11 and the drying processing chamber 12. Provided. In this case, transport apparatuses 13 and 14 for transporting the glass sheet G along the transport path L are disposed in the cleaning processing chamber 11 and the drying processing chamber 12. Each of the transfer devices 13 and 14 is configured by, for example, a roller conveyor.

本実施形態では、洗浄処理室11は、第一洗浄室15と第二洗浄室16とを有する。このうち第一洗浄室15は、ガラス板Gの表面Ga,Gaを擦って表面Ga,Gaに付着した異物等の汚れを除去する洗浄ローラ17を有する。本実施形態では、上下一対の洗浄ローラ17,17がガラス板Gの搬送経路Lを介して対向する位置に配設されている。洗浄ローラ17は、ガラス板Gとの接触部をスポンジ等の弾性材料で形成したものであってもよく、ブラシで形成したものであってもよい。前者の場合、洗浄ローラ17はスポンジローラとなり、後者の場合、洗浄ローラ17はブラシローラとなる。   In the present embodiment, the cleaning processing chamber 11 has a first cleaning chamber 15 and a second cleaning chamber 16. Among these, the first cleaning chamber 15 has a cleaning roller 17 that rubs the surfaces Ga and Ga of the glass plate G to remove dirt such as foreign matter attached to the surfaces Ga and Ga. In the present embodiment, the pair of upper and lower cleaning rollers 17 is disposed at a position facing each other via the conveyance path L of the glass sheet G. The cleaning roller 17 may be one in which the contact portion with the glass plate G is formed of an elastic material such as a sponge, or may be formed by a brush. In the former case, the cleaning roller 17 is a sponge roller, and in the latter case, the cleaning roller 17 is a brush roller.

また、第一洗浄室15内には、洗浄液供給装置18が配設される。この場合、搬送経路L上を通るガラス板Gの表面Ga,Ga全域に洗浄液19(第一の液体)が供給されるように、洗浄液供給装置18の供給口(図示は省略)の向きや幅方向寸法、供給流量などが設定されている。ここで、本明細書における「幅方向」とは、搬送経路L上を搬送されるガラス板Gの幅方向と一致する方向をいうものとする。なお、洗浄液19には、例えば純水を使用することができ、必要に応じて洗剤や界面活性剤、アルカリイオン水、次亜塩素酸ソーダ等を添加してもよい。   Further, in the first cleaning chamber 15, a cleaning solution supply device 18 is disposed. In this case, the direction and width of the supply port (not shown) of the cleaning liquid supply device 18 so that the cleaning liquid 19 (first liquid) is supplied to the entire surface Ga of the glass plate G passing on the transport path L. Direction dimensions, supply flow rate, etc. are set. Here, the “width direction” in the present specification refers to a direction coincident with the width direction of the glass sheet G transported on the transport path L. In addition, for example, pure water can be used as the cleaning solution 19, and a detergent, a surfactant, alkaline ionized water, sodium hypochlorite, etc. may be added as needed.

第二洗浄室16は、第一洗浄室15よりも搬送経路Lの下流側に位置し、第一洗浄室15から第二洗浄室16内に搬入されたガラス板Gの表面Ga,Gaに第一の液体であるリンス液(すすぎ液)20を供給するリンス液供給装置21を有する。この場合も、搬送経路L上を通るガラス板Gの表面Ga,Ga全域にリンス液20が供給されるように、リンス液供給装置21の供給口(図示は省略)の向きや幅方向寸法、供給流量などが設定されている。なお、リンス液20には、純水など公知の種類のリンス用液体を使用することが可能である。   The second cleaning chamber 16 is located downstream of the first cleaning chamber 15 on the transport path L, and the surfaces Ga and Ga of the glass plate G carried from the first cleaning chamber 15 into the second cleaning chamber 16 It has the rinse liquid supply apparatus 21 which supplies the rinse liquid (rinse liquid) 20 which is one liquid. Also in this case, the direction and width direction dimension of the supply port (not shown) of the rinse liquid supply device 21 so that the rinse liquid 20 is supplied to the entire surface Ga, Ga of the glass plate G passing above the transport path L. Supply flow rate etc. are set. As the rinse solution 20, it is possible to use a known type of rinse liquid such as pure water.

なお、第一洗浄室15の底部15aには、ガラス板Gに供給された洗浄液19が流れ落ちる。そのため、図示は省略するが、底部15aには、流れ落ちた洗浄液19をドレインするためのドレイン口が底部15aに設けられている。また、第二洗浄室16の底部16aには、ガラス板Gに供給された洗浄液19及びリンス液20が流れ落ちる。そのため、図示は省略するが、底部16aには、流れ落ちる洗浄液19及びリンス液20をドレインするためのドレイン口が底部16aに設けられている。   The cleaning solution 19 supplied to the glass plate G flows down to the bottom portion 15 a of the first cleaning chamber 15. Therefore, although not shown, the bottom portion 15a is provided with a drain port for draining the cleaning solution 19 that has flowed out, in the bottom portion 15a. Further, the cleaning liquid 19 and the rinse liquid 20 supplied to the glass plate G flow down to the bottom portion 16 a of the second cleaning chamber 16. Therefore, although not shown, the bottom portion 16a is provided with a drain port for draining the cleaning solution 19 and the rinse liquid 20, which flow down, in the bottom portion 16a.

乾燥処理室12は、液切り室22と、液切り室22よりも搬送経路Lの下流側に位置する第一乾燥室23とを有する。本実施形態では、乾燥処理室12は、第一乾燥室23よりも搬送経路Lの下流側に第二乾燥室24をさらに有する。液切り室22と第一乾燥室23との間には仕切り25が設けられている。これにより、液切り室22の雰囲気等が第一乾燥室23に流入するのを制限する。なお、液切り室22に搬入されるガラス板Gには、洗浄工程で供給された洗浄液19及びリンス液20が残留しているので、液切り室22の底部22aには、リンス液20等が流れ落ちる。このため、液切り室22の底部22aはリンス液20等で覆われ、ウェットな状態となる。この際、図示は省略するが、流れ落ちるリンス液20等をドレインするためのドレイン口を底部22aに設けてもよい。   The drying processing chamber 12 has a liquid removal chamber 22 and a first drying chamber 23 located downstream of the liquid removal chamber 22 on the transport path L. In the present embodiment, the drying processing chamber 12 further includes a second drying chamber 24 on the downstream side of the transport path L than the first drying chamber 23. A partition 25 is provided between the liquid removal chamber 22 and the first drying chamber 23. This limits the flow of the atmosphere or the like of the liquid removal chamber 22 into the first drying chamber 23. Since the cleaning solution 19 and the rinse solution 20 supplied in the cleaning step remain on the glass plate G carried into the solution removal chamber 22, the rinse solution 20 and the like are removed at the bottom 22 a of the solution removal chamber 22. run down. For this reason, the bottom 22 a of the liquid removal chamber 22 is covered with the rinse liquid 20 or the like to be in a wet state. Under the present circumstances, although illustration is abbreviate | omitted, you may provide the drain port for draining the rinse solution 20 grade which flows down in the bottom part 22a.

第一乾燥室23には、第一乾燥室23内に搬入されるガラス板Gの表面Ga,Gaに向けて所定の気体26(例えば、クリーンドライエアなど)を吹き付けるための気体吹付け装置27が配設される。本実施形態では、気体吹付け装置27は、上下一対のエアナイフ28,28であり、これら一対のエアナイフ28,28間にガラス板Gの搬送経路Lが位置している。ここで、各エアナイフ28の供給口28aの幅方向寸法は、一対のエアナイフ28,28間を通過するガラス板Gの表面Ga,Ga全域に気体26を吹き付け得る大きさに設定されている。また、各エアナイフ28の供給口28aの角度は、第一乾燥室23側から液切り室22側に向けて気体26をガラス板Gの表面Gaに吹き付け得る大きさに設定されている。なお、図示例では、液切り室22と第一乾燥室23との境界位置(仕切り25の位置)よりも液切り室22に近い位置で、ガラス板Gの表面Ga,Gaに気体26が吹き付けられるように、一対のエアナイフ28,28が配置されているが、液切り室22と第一乾燥室23との境界位置(上下の仕切り25,25間)で気体26が表面Gaに吹き付けられるように一対のエアナイフ28,28を配置してもよい。   In the first drying chamber 23, a gas spraying device 27 for spraying a predetermined gas 26 (for example, clean dry air etc.) toward the surfaces Ga and Ga of the glass plate G carried into the first drying chamber 23 is provided. It is arranged. In the present embodiment, the gas spraying device 27 is a pair of upper and lower air knives 28, and the transport path L of the glass sheet G is located between the pair of air knives 28, 28. Here, the dimension in the width direction of the supply port 28 a of each air knife 28 is set to such a size that the gas 26 can be sprayed over the entire surface Ga, Ga of the glass plate G passing between the pair of air knives 28, 28. Further, the angle of the supply port 28a of each air knife 28 is set to such a size that the gas 26 can be sprayed onto the surface Ga of the glass plate G from the first drying chamber 23 side toward the liquid removal chamber 22 side. In the illustrated example, the gas 26 is sprayed to the surfaces Ga and Ga of the glass plate G at a position closer to the liquid removal chamber 22 than the boundary position between the liquid removal chamber 22 and the first drying chamber 23 (the position of the partition 25). The pair of air knives 28, 28 are disposed so that the gas 26 is sprayed on the surface Ga at the boundary position between the liquid removing chamber 22 and the first drying chamber 23 (between the upper and lower partitions 25, 25). A pair of air knives 28, 28 may be disposed in

第一乾燥室23と第二乾燥室24との間には仕切り29が設けられている。これにより、第一乾燥室23の内部空間と、第二乾燥室24の内部空間とが区画されるので、第一乾燥室23の雰囲気等が第二乾燥室24に流入するのを制限する。このため、第二乾燥室24の清浄度を第一乾燥室23の清浄度よりも高くできる。   A partition 29 is provided between the first drying chamber 23 and the second drying chamber 24. As a result, the internal space of the first drying chamber 23 and the internal space of the second drying chamber 24 are partitioned, so that the atmosphere or the like of the first drying chamber 23 is limited to flow into the second drying chamber 24. For this reason, the cleanliness of the second drying chamber 24 can be made higher than the cleanliness of the first drying chamber 23.

第二乾燥室24には、第二乾燥室24内に搬入されるガラス板Gの表面Ga,Gaに向けて所定の気体26を吹き付けるための気体吹付け装置30が配設される。本実施形態では、気体吹付け装置30は、上下一対のエアナイフ31,31であり、これら一対のエアナイフ31,31間にガラス板Gの搬送経路Lが位置している。ここで、各エアナイフ31の供給口31aの幅方向寸法は、一対のエアナイフ31,31間を通過するガラス板Gの表面Ga,Ga全域に気体26を吹き付け得る大きさに設定されている。また、各エアナイフ31の供給口31aの角度は、第二乾燥室24側から第一乾燥室23側に向けて気体26をガラス板Gの表面Gaに吹き付け得る大きさに設定されている。なお、各エアナイフ31の供給口31aの角度は、第一乾燥室23内の各エアナイフ28の供給口28aの角度と同じでもよいし、異なっていてもよい。また、図示例では、第一乾燥室23と第二乾燥室24との境界位置(仕切り29の位置)よりも第一乾燥室23に近い位置でガラス板Gの表面Ga,Gaに気体26が吹き付けられるように、一対のエアナイフ31,31が配置されているが、第一乾燥室23と第二乾燥室24との境界位置(上下の仕切り29,29間)で気体26が表面Gaに吹き付けられるように、一対のエアナイフ31,31を配置してもよい。あるいは、境界位置よりも第二乾燥室24に近い位置で気体26が表面Gaに吹き付けられるように、一対のエアナイフ31,31を配置してもよい。   In the second drying chamber 24, a gas spraying device 30 for spraying a predetermined gas 26 toward the surfaces Ga and Ga of the glass plate G carried into the second drying chamber 24 is disposed. In the present embodiment, the gas spraying device 30 is a pair of upper and lower air knives 31 and 31, and the transport path L of the glass sheet G is located between the pair of air knives 31 and 31. Here, the dimension in the width direction of the supply port 31 a of each air knife 31 is set to such a size that the gas 26 can be sprayed over the entire surface Ga, Ga of the glass plate G passing between the pair of air knives 31, 31. Further, the angle of the supply port 31a of each air knife 31 is set to a size that allows the gas 26 to be sprayed onto the surface Ga of the glass plate G from the second drying chamber 24 side toward the first drying chamber 23 side. The angle of the supply port 31 a of each air knife 31 may be the same as or different from the angle of the supply port 28 a of each air knife 28 in the first drying chamber 23. In the illustrated example, the gas 26 is applied to the surfaces Ga and Ga of the glass plate G at a position closer to the first drying chamber 23 than the boundary position (the position of the partition 29) between the first drying chamber 23 and the second drying chamber 24. A pair of air knives 31, 31 are arranged to be sprayed, but the gas 26 is sprayed on the surface Ga at the boundary position between the first drying chamber 23 and the second drying chamber 24 (between the upper and lower partitions 29, 29). A pair of air knives 31, 31 may be arranged to be able to Alternatively, the pair of air knives 31 and 31 may be arranged such that the gas 26 is blown to the surface Ga at a position closer to the second drying chamber 24 than the boundary position.

第一乾燥室23の底部23a及び第二乾燥室24の底部24aには、微粒子捕捉用の液体32(第二の液体)が配置されている。本実施形態では、第一乾燥室23の底部23a及び第二乾燥室24の底部24aが層状の液体32で覆われた状態にある。この液体32は、ガラス板Gに残留するリンス液20等の第一の液体が流れ落ちたものでなく、別途、第一乾燥室23の底部23a及び第二乾燥室24の底部24aに供給されたものである。   At the bottom 23 a of the first drying chamber 23 and the bottom 24 a of the second drying chamber 24, a liquid 32 (second liquid) for capturing particles is disposed. In the present embodiment, the bottom 23 a of the first drying chamber 23 and the bottom 24 a of the second drying chamber 24 are covered with the layered liquid 32. The liquid 32 is not a drop of the first liquid such as the rinse liquid 20 remaining on the glass plate G, but is separately supplied to the bottom 23 a of the first drying chamber 23 and the bottom 24 a of the second drying chamber 24. It is a thing.

この微粒子捕捉用の液体32には、微粒子33を捕捉可能な限りにおいて任意の種類の液体が使用可能であり、例えばイオン交換水、蒸留水、工業用純水など各種の純水が使用可能である。あるいは、微粒子33の捕捉能力の更なる向上を目的として、液体32に、界面活性剤を添加してもよい。具体的には、上述の純水に界面活性剤を添加したものを液体32として使用してもよい。   As the liquid 32 for trapping fine particles, any kind of liquid can be used as long as the fine particles 33 can be captured. For example, various pure waters such as ion exchanged water, distilled water, industrial pure water, etc. is there. Alternatively, a surfactant may be added to the liquid 32 for the purpose of further improving the trapping ability of the microparticles 33. Specifically, one obtained by adding a surfactant to the above-described pure water may be used as the liquid 32.

次に、上記構成の洗浄乾燥装置10を用いた洗浄工程S2と乾燥工程S3の一例を、本発明の作用効果と共に説明する。   Next, an example of the washing step S2 and the drying step S3 using the washing and drying apparatus 10 configured as described above will be described together with the operation and effects of the present invention.

(S2)洗浄工程
この工程では、加工工程S1で所定の加工(端面加工、表面処理などのうち少なくとも一つ以上)を施したガラス板Gが、搬送経路Lの最も上流側に位置する洗浄乾燥装置10の第一洗浄室15内に搬入されると、搬送装置13により搬送経路L上を搬送されるガラス板Gの表面Ga,Gaに向けて洗浄液供給装置18,18から洗浄液19を供給する。これにより、ガラス板Gの表面Ga,Gaは洗浄液19で濡れた状態となる。そして、この状態のガラス板Gを、洗浄液供給装置18,18よりも下流側に位置する一対の洗浄ローラ17,17まで搬送し、ガラス板Gの表面Ga,Gaを洗浄ローラ17,17で擦る。これにより、表面Ga,Gaに付着した微粒子33などの異物を擦り取る。然る後、ガラス板Gを搬送装置13により第二洗浄室16内に搬入する。第二洗浄室16内では、搬送装置13により搬送経路L上を搬送されるガラス板Gの表面Ga,Gaに向けてリンス液供給装置21からリンス液20を供給し、ガラス板Gの表面Ga,Ga上の洗浄液19と異物を洗い流す。然る後、ガラス板Gは搬送装置13により第二洗浄室16外へと排出される。
(S2) Cleaning Step In this step, the glass plate G which has been subjected to predetermined processing (at least one or more of end surface processing, surface treatment, etc.) in the processing step S1 is washed and dried so that the most upstream side of the transport path L is located. When carried into the first cleaning chamber 15 of the apparatus 10, the cleaning apparatus 19 supplies the cleaning solution 19 from the cleaning solution supply apparatuses 18 and 18 toward the surfaces Ga and Ga of the glass plate G transported on the transport path L by the transport apparatus 13. . As a result, the surfaces Ga and Ga of the glass plate G become wet with the cleaning liquid 19. Then, the glass sheet G in this state is conveyed to the pair of cleaning rollers 17 located on the downstream side of the cleaning liquid supply devices 18, and the surfaces Ga of the glass sheet G are rubbed with the cleaning rollers 17. . As a result, foreign substances such as fine particles 33 attached to the surfaces Ga and Ga are scraped off. After that, the glass plate G is carried into the second cleaning chamber 16 by the transfer device 13. In the second cleaning chamber 16, the rinse liquid 20 is supplied from the rinse liquid supply device 21 toward the surfaces Ga and Ga of the glass plate G conveyed on the conveyance path L by the conveyance device 13. , Ga wash away the cleaning solution 19 and foreign matter. After that, the glass plate G is discharged by the transfer device 13 out of the second cleaning chamber 16.

(S3)乾燥工程
搬送装置13により第二洗浄室16外へ排出されたガラス板Gは、続いて搬送装置14により乾燥処理室12内、正確には液切り室22内に搬入される。そして、液切り室22から第一乾燥室23に搬入される直前にガラス板Gの表面Ga,Gaに向けて、気体吹付け装置27としての一対のエアナイフ28,28から気体26を吹き付ける。これにより、ガラス板Gの表面Ga,Ga上に残存していたリンス液20(場合によっては少量の洗浄液19も)と微粒子33を含む異物とを吹き飛ばす。吹き飛ばされた微粒子33は、液切り室22の底部22a、あるいは第一乾燥室23の底部23aに向けて沈降する。
(S3) Drying Step Subsequently, the glass plate G discharged to the outside of the second cleaning chamber 16 by the transfer device 13 is subsequently carried into the drying processing chamber 12 by the transfer device 14, more precisely, into the liquid removal chamber 22. Then, the gas 26 is sprayed from the pair of air knives 28 and 28 as the gas spraying device 27 toward the surfaces Ga and Ga of the glass plate G immediately before being carried from the liquid removal chamber 22 to the first drying chamber 23. As a result, the rinse liquid 20 (also a small amount of the washing liquid 19 in some cases) remaining on the surfaces Ga and Ga of the glass plate G and the foreign matter containing the fine particles 33 are blown away. The blown particles 33 settle toward the bottom 22 a of the drainage chamber 22 or the bottom 23 a of the first drying chamber 23.

このようにして液切りがなされたガラス板Gは引き続き搬送装置14により第一乾燥室23内を搬送され、第一乾燥室23から第二乾燥室24に搬入される直前にガラス板Gの表面Ga,Gaに向けて、気体吹付け装置30としての一対のエアナイフ31,31から気体26を吹き付ける。これにより、ガラス板Gの表面Ga,Ga上に残存していたリンス液20等と微粒子33を含む異物を吹き飛ばす。吹き飛ばされた微粒子33は、第一乾燥室23の底部23a、あるいは第二乾燥室24の底部24aに向けて沈降する。以上のようにしてリンス液20等と微粒子33を含む異物とを除去することで、ガラス板Gの表面Ga,Gaは乾いた状態となる。   The glass sheet G thus drained is subsequently conveyed in the first drying chamber 23 by the conveying device 14, and the surface of the glass sheet G immediately before being carried from the first drying chamber 23 to the second drying chamber 24. A gas 26 is blown toward Ga and Ga from a pair of air knives 31 and 31 as the gas blowing device 30. As a result, foreign substances including the rinse liquid 20 and the like and the particles 33 remaining on the surfaces Ga and Ga of the glass plate G are blown away. The blown particles 33 settle toward the bottom 23 a of the first drying chamber 23 or the bottom 24 a of the second drying chamber 24. As described above, the surfaces Ga and Ga of the glass plate G are in a dry state by removing the rinse solution 20 and the like and the foreign matter containing the fine particles 33.

ここで、例えば図3に示すように、乾燥処理室12の第一乾燥室23内及び第二乾燥室24内に、液体32が配置されていない場合、エアナイフ28,28よりも上流側に、ガラス板Gに供給されたリンス液20等の大部分が流れ落ちるので、エアナイフ28,28よりも下流側にはリンス液20等が僅かしか流れ落ちない。このため、第一乾燥室23の底部23a及び第二乾燥室24の底部24aの大部分は、ドライ状態となる。   Here, for example, as shown in FIG. 3, in the case where the liquid 32 is not disposed in the first drying chamber 23 and the second drying chamber 24 of the drying processing chamber 12, on the upstream side of the air knives 28, 28, Most of the rinse liquid 20 and the like supplied to the glass plate G flows down, so that the rinse liquid 20 and the like only slightly flow downstream of the air knives 28 and 28. Therefore, most of the bottom 23a of the first drying chamber 23 and the bottom 24a of the second drying chamber 24 are in a dry state.

一対のエアナイフ28,28(31,31)でリンス液20等と共に吹き飛ばされた微粒子33は沈降し、液体32と接触することなく第一乾燥室23の底部23a上、あるいは第二乾燥室24の底部24a上に堆積する。一方、一対のエアナイフ28,28(31,31)からガラス板Gに向けて気体26を吹き付けることで、第一乾燥室23内、あるいは第二乾燥室24内に乱流34が引き起こされることがある。この乱流34によって、ガラス板Gの表面Ga,Gaから吹き飛ばされ、ドライ状態の底部23a,24a上の微粒子33が舞い上がり、ガラス板Gの表面Ga,Gaに再付着する。   The fine particles 33 blown off with the rinse liquid 20 and the like by the pair of air knives 28, 28 (31, 31) settle, and do not contact with the liquid 32 on the bottom 23a of the first drying chamber 23 or in the second drying chamber 24. Deposit on the bottom 24a. On the other hand, when the gas 26 is blown toward the glass plate G from the pair of air knives 28, 28 (31, 31), turbulence 34 is caused in the first drying chamber 23 or the second drying chamber 24. is there. The turbulent flow 34 blows away from the surfaces Ga and Ga of the glass plate G, so that the fine particles 33 on the bottoms 23 a and 24 a in the dry state fly up and reattach to the surfaces Ga and Ga of the glass plate G.

これに対して、本発明に係るガラス板の製造方法では、乾燥処理室12の底部に液体32が配置された状態で、ガラス板Gに気体26を吹き付けるようにした(図2を参照)。この場合、乾燥処理室12の底部が液体32によってウェットな状態となる。このため、微粒子33がガラス板Gから除去されて沈降した際、液体32によって捕捉される。よって、気体26の吹き付けに起因する乱流34(図3を参照)が第一乾燥室23又は第二乾燥室24内で生じたとしても、沈降した微粒子33が乱流34に乗って舞い上がりにくくなる。従って、効率よく洗浄液19及びリンス液20を除去してガラス板Gを液切り乾燥しつつも、微粒子33の付着を低減して、表面品位に優れたガラス板Gを提供することが可能となる。また、乾燥処理室12の底部に微粒子33捕捉用の液体32を配置しているので、ガラス板Gと液体32とが接する機会を極力排除することができる。よって、液体32を乾燥処理室12内に配置することに起因したガラス板Gの表面品位の低下を可及的に防止することができる。また、この方法だと、乾燥処理室12の底部に液体32を配置するだけで微粒子33の付着を低減できるので、簡素な設備で済む。以上より、本発明によれば、コストアップを回避しつつ、ガラス板Gの表面品位を向上させることが可能となる。   On the other hand, in the method of manufacturing a glass plate according to the present invention, the gas 26 is sprayed to the glass plate G in a state where the liquid 32 is disposed at the bottom of the drying processing chamber 12 (see FIG. 2). In this case, the bottom of the drying processing chamber 12 is wetted by the liquid 32. For this reason, when the fine particles 33 are removed from the glass plate G and sedimented, they are captured by the liquid 32. Therefore, even if the turbulent flow 34 (see FIG. 3) due to the blowing of the gas 26 is generated in the first drying chamber 23 or the second drying chamber 24, the settled fine particles 33 are less likely to fly up by the turbulent flow 34. Become. Therefore, it is possible to provide the glass plate G excellent in surface quality by reducing the adhesion of the fine particles 33 while removing the cleaning solution 19 and the rinse solution 20 efficiently and draining and drying the glass plate G. . Further, since the liquid 32 for capturing the fine particles 33 is disposed at the bottom of the drying processing chamber 12, the opportunity for the glass plate G and the liquid 32 to be in contact can be eliminated as much as possible. Therefore, it is possible to prevent, as much as possible, the deterioration of the surface quality of the glass plate G caused by disposing the liquid 32 in the drying processing chamber 12. Further, according to this method, the adhesion of the particles 33 can be reduced only by disposing the liquid 32 at the bottom of the drying processing chamber 12, so that simple equipment is required. As mentioned above, according to this invention, it becomes possible to improve the surface quality of the glass plate G, avoiding cost increase.

また、本実施形態では、液切り室22の底部をリンス液20等で覆うと共に、第一及び第二乾燥室23,24の底部23a,24aを液体32で覆っている(図2を参照)。このため、乾燥処理室12の底部は、第一の液体(洗浄液19やリンス液20)及び第二の液体32で覆われた状態となり、乾燥処理室12の底部に沈降した微粒子33を漏れなくかつ確実に捕捉することができる。以上より、ガラス板Gへの微粒子33の付着をさらに低減しつつ、当該ガラス板Gを液切り乾燥することができる。従って、ガラス板Gの表面品位をばらつきなく向上させることが可能となる。   Further, in the present embodiment, the bottom of the liquid removal chamber 22 is covered with the rinse liquid 20 or the like, and the bottoms 23a and 24a of the first and second drying chambers 23 and 24 are covered with the liquid 32 (see FIG. 2) . Therefore, the bottom of the drying processing chamber 12 is covered with the first liquid (the cleaning liquid 19 and the rinse liquid 20) and the second liquid 32, and the fine particles 33 precipitated in the bottom of the drying processing chamber 12 are not leaked. And it can be captured reliably. From the above, it is possible to drain and dry the glass plate G while further reducing the adhesion of the fine particles 33 to the glass plate G. Therefore, the surface quality of the glass plate G can be improved without variation.

(S4)検査工程
上述のように洗浄乾燥を施したガラス板Gは検査工程へ搬送され、所定の検査装置によりガラス板Gの表面Gaに残存する異物の有無及び数を測定、評価する。異物の有無及び数の測定には、微粒子33の数の測定も含まれる。そして、例えば測定された微粒子33の数(単位面積当たりの数)がしきい値以下であれば、出荷基準を満たすものとして梱包、出荷工程へと搬送される。
(S4) Inspection Step The glass plate G subjected to the cleaning and drying as described above is transported to the inspection step, and the presence and number of foreign substances remaining on the surface Ga of the glass plate G are measured and evaluated by a predetermined inspection device. The measurement of the presence and the number of foreign substances also includes the measurement of the number of microparticles 33. Then, for example, if the number of particles 33 (the number per unit area) measured is equal to or less than the threshold value, it is transported to the packing and shipping process as satisfying the shipping standard.

以上、本発明の第一実施形態を説明したが、もちろん本発明に係るガラス板の製造方法は上記例示の形態には限定されない。当該製造方法は、本発明の範囲内で種々の形態をとることが可能である。   As mentioned above, although 1st embodiment of this invention was described, of course, the manufacturing method of the glass plate which concerns on this invention is not limited to the form of the said illustration. The manufacturing method can take various forms within the scope of the present invention.

図4は、本発明の第二実施形態に係る洗浄乾燥装置40の全体構成を示す側面図である。この洗浄乾燥装置40は、第一及び第二乾燥室23,24に液体32を入れ替えるための構成を設けた点において、図2に示す第一実施形態と相違する。具体的に、第一乾燥室23の側部の下方には、液体32を底部23a上に供給するための供給口41が一又は複数設けられると共に、底部23aには、液体32を排出するための排出口42が一又は複数設けられる。そして、排出口42はろ過装置43に接続されており、排出口42から第一乾燥室23外に排出された液体32はろ過装置43でろ過されるようになっている。そして、ろ過により微粒子33等の異物が取り除かれた液体32は、図5に示すように、ポンプ44で供給口41に向けて圧送され、再び底部23a上に供給される構造となっている。第二乾燥室24にも、第一乾燥室23と同様、供給口41と、排出口42と、ろ過装置43、及びポンプ44とからなる液体32の入れ替え構造が設けられている。なお、ろ過装置43とポンプ44の配置は入れ替えてもよく、言い換えると、ポンプ44から吐出される液体32をろ過装置43に通過させた後、供給口41を介して底部23a上に供給してもよい。   FIG. 4 is a side view showing the overall configuration of a washing and drying apparatus 40 according to a second embodiment of the present invention. The washing and drying apparatus 40 is different from the first embodiment shown in FIG. 2 in that the first and second drying chambers 23 and 24 are provided with a configuration for replacing the liquid 32. Specifically, one or more supply ports 41 for supplying the liquid 32 onto the bottom portion 23a are provided below the side portions of the first drying chamber 23, and the liquid 32 is discharged to the bottom portion 23a. One or more exhaust ports 42 are provided. The discharge port 42 is connected to the filtration device 43, and the liquid 32 discharged from the discharge port 42 to the outside of the first drying chamber 23 is filtered by the filtration device 43. Then, as shown in FIG. 5, the liquid 32 from which foreign matter such as fine particles 33 and the like has been removed by filtration is pressure-fed by the pump 44 toward the supply port 41, and is again supplied onto the bottom 23a. Similar to the first drying chamber 23, the second drying chamber 24 is also provided with an exchange structure of the liquid 32 including the supply port 41, the outlet 42, the filtering device 43, and the pump 44. The arrangement of the filtration device 43 and the pump 44 may be interchanged. In other words, after the liquid 32 discharged from the pump 44 is allowed to pass through the filtration device 43, it is supplied onto the bottom 23a through the supply port 41. It is also good.

このように、第一及び第二乾燥室23,24の底部に供給される液体32を入れ替えることで、液体32と共に捕捉された微粒子33を排出することができる。これにより、第一及び第二乾燥室23,24の清浄度を高い状態で維持できる。特に、図5に示すように、液体32を、供給口41と排出口42、及びろ過装置43とポンプ44とからなる入れ替え構造により、底部23a(24a)上に循環供給することにより、必要最小限の設備及び液体32の量でもって、第一及び第二乾燥室23,24の清浄度を高い状態で維持できる。   As described above, by replacing the liquid 32 supplied to the bottom of the first and second drying chambers 23 and 24, it is possible to discharge the particulates 33 captured together with the liquid 32. Thereby, the cleanliness of the first and second drying chambers 23 and 24 can be maintained in a high state. In particular, as shown in FIG. 5, the liquid 32 is circulated and supplied onto the bottom portion 23a (24a) by the exchange structure including the supply port 41 and the discharge port 42, and the filtering device 43 and the pump 44. With the limited amount of equipment and the amount of liquid 32, the cleanliness of the first and second drying chambers 23, 24 can be maintained at a high level.

なお、液体32の配置形態としては、図2等で例示した層状に配置する形態に限定されない。例えば、滴状の液体32を乾燥処理室12の底部に散布することで斑状に液体32を配置してもよい。また、滴状の液体32を乾燥処理室12の底部に散布することで層状に液体32を配置してもよい。ガラス板Gへの微粒子33の付着をさらに低減する観点では、液体32を層状に配置することが好ましい。また、液体32の配置領域は、乾燥処理室12の底部のうち、ドライ状態の領域(リンス液20等の第一の液体が流れ落ちない領域)とすればよい。   In addition, as an arrangement | positioning form of the liquid 32, it is not limited to the form arrange | positioned in the layer illustrated in FIG. 2 etc. For example, the liquid 32 may be arranged in a spotted manner by spraying the liquid 32 in the form of droplets onto the bottom of the drying processing chamber 12. Alternatively, the liquid 32 may be disposed in a layered manner by spraying the liquid drop 32 in the bottom of the drying processing chamber 12. In order to further reduce the adhesion of the fine particles 33 to the glass plate G, it is preferable to arrange the liquid 32 in a layer form. Further, the arrangement area of the liquid 32 may be an area in the dry state (an area where the first liquid such as the rinse liquid 20 does not flow) in the bottom of the drying processing chamber 12.

また、乾燥処理室12の底部を第一の液体及び第二の液体で覆う場合、上記実施形態のような、液切り室22の底部22aをリンス液20等の第一の液体で覆い、第一乾燥室23の底部23a及び第二乾燥室24の底部24aを第二の液体32で覆う形態に限定されない。例えば、乾燥処理室12の底部の一部又は全部が第一の液体と、第二の液体32の混合液で覆われてもよい。   When the bottom of the drying processing chamber 12 is covered with the first liquid and the second liquid, the bottom 22a of the liquid removal chamber 22 is covered with the first liquid such as the rinse liquid 20 as in the above embodiment. It is not limited to the form which covers the bottom 23a of the first drying room 23 and the bottom 24a of the second drying room 24 with the second liquid 32. For example, a part or all of the bottom of the drying processing chamber 12 may be covered with a mixture of the first liquid and the second liquid 32.

10,40 洗浄乾燥装置
11 洗浄処理室
12 乾燥処理室
13,14 搬送装置
15 第一洗浄室
16 第二洗浄室
17,17 洗浄ローラ
18 洗浄液供給装置
19 洗浄液(第一の液体)
20 リンス液(第一の液体)
21 リンス液供給装置
22 液切り室
23 第一乾燥室
23a 底部
24 第二乾燥室
24a 底部
25 仕切り
26 気体
27,30 気体吹付け装置
28,31 エアナイフ
32 液体(第二の液体)
33 微粒子
34 乱流
41 供給口
42 排出口
43 ろ過装置
44 ポンプ
G ガラス板
Ga 表面
L 搬送経路
10, 40 Cleaning and Drying Device 11 Cleaning Processing Chamber 12 Drying Processing Chamber 13, 14 Conveying Device 15 First Cleaning Chamber 16 Second Cleaning Chamber 17, 17 Cleaning Roller 18 Cleaning Liquid Supply Device 19 Cleaning Liquid (First Liquid)
20 Rinsing fluid (first fluid)
21 rinse liquid supply device 22 liquid removing chamber 23 first drying chamber 23a bottom 24 second drying chamber 24a bottom 25 partition 26 gas 27, 30 gas sprayer 28, 31 air knife 32 liquid (second liquid)
33 fine particles 34 turbulent flow 41 supply port 42 outlet 43 filtration device 44 pump G glass plate Ga surface L transport path

Claims (4)

ガラス板に第一の液体を供給して、前記ガラス板を洗浄する洗浄工程と、
乾燥処理室内に搬入され、前記乾燥処理室内の所定の搬送経路上を搬送されるガラス板に気体を吹き付けて、前記ガラス板から前記第一の液体を除去する乾燥工程とを備えるガラス板の製造方法であって、
前記乾燥処理室の底部に第二の液体が配置されている状態で、前記ガラス板に前記気体を吹き付けるガラス板の製造方法。
Supplying a first liquid to the glass plate to wash the glass plate;
A drying step of blowing a gas onto a glass plate carried into a drying treatment chamber and conveyed on a predetermined conveyance path in the drying treatment chamber to remove the first liquid from the glass plate Method,
The manufacturing method of the glass plate which sprays the said gas on the said glass plate in the state by which the 2nd liquid is arrange | positioned at the bottom part of the said drying process chamber.
前記乾燥処理室内の底部が前記第一の液体及び前記第二の液体で覆われている状態で、前記ガラス板に前記気体を吹き付ける請求項1に記載のガラス板の製造方法。   The manufacturing method of the glass plate of Claim 1 which sprays the said gas on the said glass plate in the state by which the bottom part in the said drying process chamber is covered with the said 1st liquid and the said 2nd liquid. 前記第二の液体は、純水である請求項1又は2に記載のガラス板の製造方法。   The method according to claim 1, wherein the second liquid is pure water. 前記第二の液体の前記乾燥処理室内への供給及び前記乾燥処理室外への排出により、前記底部に配置した前記第二の液体を入れ替える請求項1〜3の何れか一項に記載のガラス板の製造方法。   The glass plate according to any one of claims 1 to 3, wherein the second liquid disposed in the bottom portion is replaced by supplying the second liquid into the drying processing chamber and discharging the second liquid out of the drying processing chamber. Manufacturing method.
JP2017220939A 2017-11-16 2017-11-16 Glass plate manufacturing method Pending JP2019089044A (en)

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JPH083001Y2 (en) * 1990-08-31 1996-01-29 大日本スクリーン製造株式会社 Substrate drainer
JP2003124184A (en) * 2001-10-18 2003-04-25 Sumitomo Precision Prod Co Ltd Substrate processing equipment

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