JP2019072700A - Thin film manufacturing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a thin film manufacturing apparatus capable of efficiently forming a thin film on a long base material. SOLUTION: In a nozzle body 65 of a nozzle 60 for ejecting raw material mist, a bottom surface portion 64 forming a cavity portion 68 has a raw material mist supply port 61 in the center and downwards from the raw material mist supply port 61 to the end. It has an inclined surface shape. The raw material mist ejection nozzle 60 further includes an agglomerated raw material discharge pipe 62 connected to the end of the bottom surface portion 64, and the agglomerated raw material discharge pipe 62 has an agglomerated raw material discharge passage 63 penetrating inside. One end of the discharge passage 63 is connected to the end of the bottom surface 64, and the other end is provided with a mounting jig 83 that can be connected to the outside. [Selection diagram] Fig. 2

Description

  The present invention relates to a thin film manufacturing apparatus for forming a thin film on a base material by ejecting a raw material mist onto a long base material such as a long substrate film.

  When a thin film is formed on a substrate by employing the mist method, it is general to use a thin film manufacturing apparatus which forms a raw material solution into a mist to obtain a raw material mist and ejects the raw material mist onto the substrate with a carrier gas to form a film. is there.

  Generally, the thin film manufacturing apparatus adopting the mist method described above receives the raw material mist generated by the raw material mist generator and the raw material mist generator that generates the raw material mist, and ejects the raw material mist onto the substrate And a nozzle (film forming nozzle).

  The raw material mist spray nozzle is provided for the purpose of uniformly forming the film thickness of the thin film to be formed on the substrate, supplies the raw material mist obtained from the mist generator from the raw material mist supply port, and enters the hollow portion inside. After passing the raw material mist, the raw material mist is finally ejected onto the substrate from the raw material mist jet port. As such a raw material mist ejection nozzle, for example, a raw material solution ejection nozzle portion used in a mist ejection head portion of a film forming apparatus disclosed in Patent Document 1 can be mentioned.

  On the other hand, in recent years, when forming a thin film on a long base material such as a long substrate film, it is required to adopt a mist method.

  FIG. 5: is explanatory drawing which shows typically schematic structure of the conventional thin film manufacturing apparatus which forms a thin film on a elongate board | substrate film using a mist method. FIG. 6 is an explanatory view showing a cross-sectional structure of the raw material mist jet nozzle 70 shown in FIG. An XYZ orthogonal coordinate system is shown in FIGS. 5 and 6, respectively.

  As shown in FIG. 5, the long substrate film 40 is conveyed by the main roller 41 and the plurality of sub-rollers 42, and the side direction of the main roller 41 (in FIG. 5) as in the coating unit using a conventional knife coater. The raw material mist jet nozzle 70 is disposed on the left side, and the raw material mist 7 obtained from the mist generator (not shown) is jetted toward the right in the figure toward the substrate film 40 on which the main roller 41 is wound. The thin film is formed on the substrate film 40.

  As shown in FIG. 6, the raw material mist ejection nozzle 70 is provided with a raw material mist supply port 71 and a raw material mist ejection port 79, and includes a nozzle main body 75 having a hollow portion 78 inside as a main component. Then, the raw material mist supply port 71 is disposed below the raw material mist jet port 79 (in the −X direction).

  The plurality of flow straightening units 76 provided in the hollow portion 78 are a plurality of flow straightening plates (three flow straightening plates are shown in FIG. 6), and are provided to adjust the flow of the raw material mist 7 in the hollow portion 78. .

  The upper protruding portion 77 provided so as to surround the upper surface along the outer periphery of the upper portion of the nozzle body 75 functions as a cover for preventing diffusion of the raw material mist 7 ejected from the raw material mist ejection port 79 to the periphery.

  The raw material mist ejection nozzle 70 having such a configuration supplies the raw material mist 7 generated from the mist generator (not shown) from the raw material mist supply port 71, and the raw material mist 7 is supplied by the plurality of flow straighteners 76 in the hollow portion 78. After rectifying, finally, the raw material mist 7 is jetted from the raw material mist jet port 79 toward the substrate film 40 on the main roller 41 along the + X direction.

International Publication No. 2017/068625

  A conventional thin film manufacturing apparatus for thin film formation on a long substrate film 40 has generally been configured as described above.

  However, a part of the raw material mist 7 ejected from the raw material mist ejection port 79 of the raw material mist ejection nozzle 70 is not used for forming a thin film on the substrate film 40 around which the main roller 41 is wound, in the −X direction. When backflowing and returning to the hollow portion 78 from the raw material mist jet port 79 and generating the liquid aggregation raw material 45 in which the raw material mist 7 is condensed, the side surface of the aggregation raw material 45 forming the hollow portion 78 as shown in FIG. Deposits on top and remains.

  As described above, in the conventional thin film manufacturing apparatus, since the aggregation raw material 45 remains in the hollow portion 78, the flow of the raw material mist 7 in the hollow portion 78 is inhibited. 7 has a problem that the thin film can not be formed efficiently on the substrate film 40 due to the deterioration of the jet processing capability 7.

  The present invention has been made to solve the above problems, and it is an object of the present invention to obtain a thin film manufacturing apparatus capable of efficiently forming a thin film on a long base material.

  A thin film manufacturing apparatus according to a first aspect of the present invention is a thin film manufacturing apparatus for forming a thin film on the base material by jetting a raw material mist onto the long base material, and a roller for transporting the base material. And a mist generator that generates the raw material mist by forming the raw material solution into mist in the mist formation space, and a mist generator that jets the raw material mist by the carrier gas, disposed immediately below the roller, and jetted from the mist generator A film forming nozzle for supplying a raw material mist from a raw material mist supply port and directing the raw material mist upward from the raw material mist jet port toward the substrate wound around the roller; When a thin film material is coagulated inside by the backflow of the raw material mist from the roller via the raw material mist jet port during the film formation of a thin film, the raw material is discharged to the outside And having a discharge mechanism for out.

  In the thin film manufacturing apparatus of the present invention according to the present invention, since the film forming nozzle has the discharge mechanism having the above structure, even if the material mist flows back into the film forming nozzle, the aggregation material is inside the film forming nozzle. It does not remain in For this reason, the thin film manufacturing apparatus of the present invention can efficiently form a thin film on a substrate without impeding the process of ejecting the raw material mist onto the substrate due to the generation of the aggregation raw material.

BRIEF DESCRIPTION OF THE DRAWINGS It is explanatory drawing which shows typically schematic structure of the thin film manufacturing apparatus which is Embodiment 1 of this invention. It is explanatory drawing which shows the cross-section of the nozzle for raw material mist ejection shown in FIG. FIG. 13 is an explanatory view showing a configuration of a mist generator used in the thin film manufacturing apparatus of Embodiment 2. It is explanatory drawing which shows the periphery of the mist supply passage in the mist generator shown in FIG. 3, and the aggregation raw material collection passage. It is explanatory drawing which shows typically schematic structure of the conventional thin film manufacturing apparatus. It is explanatory drawing which shows the cross-section of the nozzle for raw material mist ejection shown in FIG.

Embodiment 1
FIG. 1 is an explanatory view schematically showing a schematic configuration of a thin film manufacturing apparatus according to a first embodiment of the present invention. FIG. 2 is an explanatory view showing a cross-sectional structure of the raw material mist jet nozzle 60 (film forming nozzle) shown in FIG. An XYZ orthogonal coordinate system is shown in FIGS. 1 and 2, respectively.

  As shown in FIG. 1, the long substrate film 40 (long substrate) is conveyed by the main roller 41 and the plurality of sub rollers 42, and the raw material mist jet nozzle 60 is disposed directly below the main roller 41. By blowing the raw material mist 7 obtained from the mist generator (not shown) upward (in the + Z direction) toward the substrate film 40 on which the main roller 41 is wound, a thin film is formed on the substrate film 40 under normal temperature conditions. I am forming a film.

  As shown in FIG. 2, the raw material mist jet nozzle 60, which is a film forming nozzle, is provided with a raw material mist supply port 61 and a raw material mist jet port 69 each connected to the outside, and a nozzle main body 65 having a hollow portion 68 inside. Is included as the main component. The raw material mist supply port 61 is disposed below the raw material mist jet port 69 (in the −Z direction).

  The plurality of flow straightening units 66 provided in the hollow portion 68 inside the nozzle body 65 are a plurality of flow straightening plates (three flow straightening plates are shown in FIG. 2), and the flow of raw material mist 7 in the hollow portion 68 is adjusted. Provided in Specifically, a plurality of rectangular rectifiers 13 are formed in plan view on the XY plane along the XY plane from a pair of opposite side surfaces facing each other in the cavity 68 to define the XZ plane. Are arranged alternately. At this time, the plurality of flow straightening units 13 are configured such that a gap is formed between the side surfaces facing each other without reaching the side surfaces facing each other.

  The upper protruding portion 67 provided so as to surround the upper surface along the outer periphery of the upper portion of the nozzle main body 65 functions as a cover for preventing diffusion of the raw material mist 7 jetted from the raw material mist jet port 69 around the periphery.

  The raw material mist ejection nozzle 60 configured as described above is supplied from the raw material mist supply port 61 by the raw material mist supply port 61 generated by the mist generator (not shown) and conveyed by the carrier gas, and the plurality of flow straightening units 66 in the hollow portion 68 After rectifying the raw material mist 7, finally, the raw material mist 7 is jetted upward (along the + Z direction) from the raw material mist jet port 69 toward the substrate film 40 on the main roller 41.

  Further, the bottom surface portion 64 forming the hollow portion 68 in the nozzle main body 65 is formed substantially along the XY plane, and has the raw material mist supply port 61 at the central portion. The bottom surface portion 64 has an inclined surface shape that gently inclines downward (in the −Z direction) from the raw material mist supply port 61 to the end portion.

  In addition, the planar shape on the XY plane of the bottom surface portion 64 may be, for example, a rectangular shape having a long side in the X direction and a short side in the Y direction, and in the case of such a rectangular shape, both ends in the X direction. The short side extending in the Y direction is the end.

  Further, the planar shape of the bottom surface portion 64 on the XY plane may be circular, and in this case, the inclined surface shape is provided radially about the raw material mist supply port 61.

  The raw material mist jet nozzle 60 further includes a coagulated raw material discharge pipe 62 (discharge pipe) connected to the end of the bottom surface portion 64, and the coagulated raw material discharge pipe 62 has a coagulated raw material discharge passage 63 penetrating inside. One end of the aggregated material discharge passage 63 is connected to an end of the bottom surface portion 64, and a mounting jig 83 connectable to the outside is provided at the other end.

  The aggregation raw material 45 on the end of the bottom surface portion 64 can be discharged to the outside through the aggregation raw material discharge passage 63. Then, by the attachment jig 83 provided at the other end of the aggregation raw material discharge pipe 62, the aggregation raw material discharge passage 63 and the aggregation raw material relay pipe (not shown) can be connected in communication with each other.

  As described above, when the raw material mist ejection nozzle 60 generates the liquid aggregation raw material 45 in the hollow portion 68 by the combination of the bottom portion 64 having the above-described inclined surface shape and the aggregation raw material discharge pipe 62, the aggregation raw material A discharge mechanism for discharging 45 to the outside is realized. Hereinafter, this point will be described in detail.

  Here, a part of the raw material mist 7 jetted from the raw material mist jet nozzle 69 of the raw material mist jet nozzle 60 is not used for forming a thin film on the substrate film 40 on which the main roller 41 is wound. Consider the case of backflow in the Z direction).

  In this case, the backflowing raw material mist 7 returns to the inside of the hollow portion 68 inside the raw material mist ejection nozzle 60 via the raw material mist jet port 69, and most of the raw material mist 7 is finally hollow via the plurality of flow straightening portions 66. It will remain temporarily as the aggregation raw material 45 on the bottom face part 64 which forms the part 68.

  However, since the bottom surface portion 64 exhibits the above-described inclined surface shape, even if the aggregation raw material 45 temporarily remains on the bottom surface portion 64, the liquid aggregation raw material 45 is directed from the central portion to the end portion of the bottom surface portion 64 The coagulated raw material 45 which has moved and reached the end of the bottom portion 64 finally passes through the coagulated raw material discharge passage 63 of the coagulated raw material discharge pipe 62, so that the outside of the raw material mist jet nozzle 60 (aggregated raw material discharge pipe 62 The aggregation raw material 45 can be discharged naturally to the outside of the other end side of

  As described above, since the raw material mist ejection nozzle 60, which is a film forming nozzle in the thin film manufacturing apparatus according to the first embodiment, has the above-described discharge mechanism formed of a combination of the bottom portion 64 and the aggregation raw material discharge pipe 62, the raw material Even if the mist 7 flows back into the raw material mist ejection nozzle 60, the aggregation raw material 45 does not remain in the hollow portion 68 of the raw material mist ejection nozzle 60 for a long time.

  Therefore, the thin film manufacturing apparatus according to the first embodiment can efficiently thin the thin film in the temperature environment of normal temperature without deteriorating the jet processing capability of the raw material mist 7 to the substrate film 40 by the generation of the aggregation raw material 45. A film can be formed on a substrate film 40 which is a base material.

  Furthermore, the thin film manufacturing apparatus according to the first embodiment uses a discharge mechanism with a relatively simple structure including the bottom portion 64 having the above-described inclined surface shape and the aggregation raw material discharge pipe 62 connected to the end of the bottom portion 64. The coagulated raw material 45 can be reliably discharged to the outside of the raw material mist jet nozzle 60 which is a film forming nozzle.

  In addition, one end of the aggregation raw material relay pipe is connected to the attachment jig 83 of the aggregation raw material discharge pipe 62, and the raw material mist 7 (aggregation raw material 45) is returned to the inside of the mist generator from the other end of the aggregation raw material relay pipe. When the aggregation raw material collection | recovery structure connected is employ | adopted, the raw material mist 7 can be generated by reusing the aggregation raw material 45 as a raw material solution in a mist generator. In addition, as for the said aggregation raw material collection | recovery structure, it is desirable to make it not affect generation | occurrence | production of the raw material mist 7 from a mist generator.

  In addition, the mist generator of Embodiment 1 should just be a structure which atomizes a raw material solution in misting space, generates the raw material mist 7, and ejects a raw material mist by carrier gas, and the Embodiment 2 mentioned later The mist generator 100 to be used or the existing mist generator can be used as the mist generator for the first embodiment.

  At this time, it is conceivable that the raw material mist 7 generated from the mist generator is supplied to the raw material mist supply port 61 of the raw material mist ejection nozzle 60 via the raw material mist relay pipe. And in order to take in the raw material mist 7 which ejects from a mist generator efficiently in the nozzle 60 for raw material mist ejection, it is desirable to arrange a mist generator immediately under the nozzle 60 for raw material mist ejection. Furthermore, the raw material mist 7 ejected from the mist generator may be directly supplied from the raw material mist supply port 61 without passing through the raw material mist relay pipe.

Second Embodiment
FIG. 3 is an explanatory view showing the configuration of a mist generator 100 used in the thin film manufacturing apparatus of the second embodiment. An XYZ orthogonal coordinate system is shown in FIG. The schematic configuration of the thin film manufacturing apparatus of the second embodiment is the same as the schematic configuration shown in FIG. 1 of the first embodiment, and as a film forming nozzle used for the thin film manufacturing apparatus of the second embodiment, FIG. The raw material mist ejection nozzle 60 of the first embodiment shown is used as it is.

  As shown in FIG. 3, the mist generator 100 used in the second embodiment includes a device container 1, an ultrasonic oscillator 2, an internal cavity structure 3, a gas supply unit 4 and a raw material solution storage container 8 as main components. ing.

  The device container 1 may have any shape as long as a space is formed inside. In the mist generator 100 illustrated in FIG. 3, the main part of the device container 1 has a substantially cylindrical shape, and a space surrounded by the inner circumferential side surface is formed in the device container 1.

  In addition, the ultrasonic oscillator 2 in the mist generator 100 applies the ultrasonic wave to the raw material solution 15 stored in the raw material solution storage container 8 provided at the lower part in the apparatus container 1 to form the misting space 3H. In the inside, the raw material solution 15 is misted (atomized) to generate the raw material mist 7.

  The internal cavity structure 3 is a structure having a cavity inside. An opening is formed at the center of the upper surface of the device container 1, and as shown in FIG. 3, the internal hollow structure 3 is disposed so as to be inserted into the device container 1 through the opening. It is set up. Here, in the state where the internal cavity structure 3 is inserted through the opening, the space between the internal cavity structure 3 and the device container 1 is sealed. That is, the space between the inner cavity structure 3 and the opening of the device container 1 is sealed.

  The shape of the internal cavity structure 3 may be any shape as long as a cavity is formed therein. In the configuration example of FIG. 3, the internal cavity structure 3 has a flask shape without a bottom surface. More specifically, in the internal cavity structure 3 shown in FIG. 3, it is comprised from the pipe part 3A, the truncated cone part 3B, and the cylindrical part 3C.

  The pipe portion 3A is a cylindrical pipe portion, and the pipe portion 3A extends from the outside of the device container 1 into the device container 1 so as to be inserted from the upper surface of the device container 1. More specifically, the pipe portion 3A is divided into an upper pipe portion disposed outside the device container 1 and a lower pipe portion disposed inside the device container 1. The upper pipe portion is attached from the upper surface outer side of the device container 1, and the lower pipe portion is attached from the upper surface inner side of the device container 1, and in the state where they are attached, the upper pipe portion and the lower pipe portion And communicate with each other through an opening disposed on the top surface of the apparatus container 1. One end of the pipe portion 3A is connected to the raw material mist supply port 61 of the raw material mist ejection nozzle 60 via the raw material mist relay pipe which exists outside the apparatus container 1, for example. On the other hand, the other end of the pipe portion 3A is connected to the upper end side of the truncated cone portion 3B in the apparatus container 1.

  The frusto-conical portion 3B has a frusto-conical shape in appearance (side wall surface), and a cavity is formed inside. The truncated cone portion 3B is open at the top and bottom (that is, has no top and bottom that closes the cavity formed therein). The truncated cone portion 3B exists in the apparatus container 1, and the upper end side of the truncated cone portion 3B is connected (communicated) with the other end of the pipe portion 3A as described above, and the truncated cone portion 3B The lower end portion side of the is connected to the upper end side of the cylindrical portion 3C.

  Here, the truncated cone portion 3B has a diverging cross-sectional shape from the upper end side to the lower end side. That is, the diameter of the side wall on the upper end side of the truncated cone portion 3B is the smallest (the same as the diameter of the tube portion 3A), and the diameter of the side wall on the lower end side of the truncated cone portion 3B is the largest (the same as the diameter of the cylindrical portion 3C), The diameter of the side wall of the truncated cone portion 3B smoothly increases from the upper end side to the lower end side.

  The cylindrical portion 3C is a portion having a cylindrical shape, and the height of the cylindrical portion 3C is smaller than the height of the truncated cone portion 3B. As described above, the upper end side of the cylindrical portion 3C is connected (communicated) with the lower end side of the truncated cone portion 3B, and the lower end side of the cylindrical portion 3C is separated by the carrier gas inlet 5 and the raw material solution container 8 Is provided.

  The internal hollow structure 3 having the above-described shape is disposed to be inserted into the inside of the device container 1, whereby the inside of the device container 1 is divided into two spaces. In other words, the cavity formed inside the internal cavity structure 3 (a space surrounded by the inner side surface of the internal cavity structure 3 and referred to as the misting space 3H), the inner surface of the device container 1 and the internal cavity structure The interior of the device container 1 is partitioned into a space (hereinafter referred to as a gas supply space 1H) formed by the outer surface of the body 3. In addition, the raw material solution 15 accommodated in the raw material solution container 8 shall be included in the mist formation space 3H.

  Further, a carrier gas injection port 5 is formed which is a gap for communicating the mist formation space 3H with the gas supply space 1H. In the configuration example of FIG. 3, the carrier gas inlet 5 is disposed on the lower end side of the internal cavity structure 3. That is, in the configuration example of FIG. 3, the carrier gas inlet 5 is a gap formed between the lower end portion of the internal hollow structure 3 and the upper surface of the raw material solution storage container 8. Here, the opening dimension in the vertical direction of the carrier gas inlet 5 is about 0.1 mm to 10 mm.

  Further, in the configuration example of FIG. 3, the gas supply space 1H is the widest at the top of the device container 1 and the lower side of the device container 1 as can be seen from the shape of the internal cavity structure 3 and the shape of the device container 1. It is getting narrower as you move on. That is, the gas supply space 1H in the portion surrounded by the outer side surface of the pipe portion 3A and the inner side surface of the apparatus container 1 is the widest, and the gas supply in the portion surrounded by the outer side surface of the cylindrical portion 3C and the inner side surface of the device container 1 Space 1H is the narrowest.

  As shown in FIG. 3, the gas supply unit 4 is disposed on the upper surface of the apparatus container 1. The carrier gas 9 is supplied from the gas supply unit 4, and the carrier gas 9 transports the raw material mist 7 in which the raw material solution 15 is misted to the outside through the pipe portion 3A of the internal cavity structure 3. Supplied to For example, a high concentration of inert gas can be employed as the carrier gas 9.

  The carrier gas 9 supplied from the gas supply unit 4 is supplied into the gas supply space 1H, filled in the gas supply space 1H, and then introduced into the misting space 3H through the carrier gas inlet 5 Be done. Here, the carrier gas 9 is supplied to the mist formation space 3H through the narrow carrier gas inlet 5 after being filled in the gas supply space 1H, so that the carrier gas 9 output from the gas supply unit 4 can be used. The gas velocity of the carrier gas 9 output from the carrier gas inlet 5 is higher than the gas velocity of. In other words, even if the carrier gas 9 is slowly output from the gas supply unit 4, the carrier gas 9 is vigorously supplied from the carrier gas inlet 5 to the mist formation space 3H.

  As described above, in the mist generator 100, the raw material solution storage container 8 for storing the raw material solution 15 is disposed between the bottom surface of the device container 1 and the lower end side of the internal hollow structure 3.

  In the mist generator 100 having such a configuration, ultrasonic waves are applied to the raw material solution 15 contained in the raw material solution holding container 8 by the ultrasonic oscillator 2 to finely atomize the raw material solution 15 for raw material Mist 7 can be generated. When the raw material mist 7 is generated, the liquid column 6 may rise from the liquid surface of the raw material solution 15. Further, the raw material solution 15 is appropriately supplied by a solution supply unit (not shown) so as to secure a fixed amount in the raw material solution storage container 8.

  The generated raw material mist 7 fills the misting space 3H in the internal cavity structure 3. Then, the raw material mist 7 is carried on the carrier gas 9 outputted from the carrier gas inlet 5 and is outputted to the outside of the mist generator 100 through the mist supply passage 11 of the pipe portion 3A of the internal hollow structure 3 For example, it is supplied to the raw material mist supply port 61 of the raw material mist ejection nozzle 60 via a raw material mist relay pipe (not shown).

  As described above, in the mist generator 100, the carrier gas 9 output from the carrier gas inlet 5 in the mist forming space 3H fills up the raw material mist 7 in the upward direction (+ Z direction) from the bottom of FIG. Lift towards. Then, the raw material mist 7 is carried on the carrier gas 9, and is output to the outside of the mist generator 100 through the mist supply passage 11 of the pipe portion 3A of the internal cavity structure 3.

  FIG. 4 is an explanatory view showing the periphery of the mist supply passage 11 and the aggregation raw material recovery passage 12 in the mist generator 100 shown in FIG. 3, wherein FIG. 4 (a) is a sectional view and FIG. 4 (b) is a plan view. . The XYZ orthogonal coordinate system is shown in FIGS. 4 (a) and 4 (b), respectively.

  As shown in FIG. 4, the tube portion 3A of the internal hollow structure 3 is provided with two passages of the mist supply passage 11 and the aggregation raw material recovery passage 12 provided around the mist supply passage 11. That is, as shown in FIG. 4 (b), the pipe portion 3A is formed separately in two pipes (the mist supply passage 11 and the aggregation raw material recovery passage 12) of the concentric double structure, and one pipe is supplied with the material mist 7 The other pipe is used as the aggregation raw material recovery passage 12 for recovering the liquid aggregation raw material 45, as the mist supply passage 11 for use.

  As described above, the pipe portion 3A is connected separately from the misting space 3H to the outside, and provided separately from the mist supply passage 11 and the mist supply passage 11 for ejecting the raw material mist 7 to the outside, and is externally connected to the misting space 3H. It is connected, and it has the aggregation raw material collection passage 12 for collecting the aggregation raw material 45.

  The mist supply passage 11 is a passage for putting the raw material mist 7 mainly generated in the mist formation space 3H on the carrier gas 9 and jetting it out to the outside. For example, the raw material mist 7 generated in the mist generator 100 can be converted into the raw material mist by connecting the mist supply passage 11 and the raw material mist supply port 61 of the raw material mist ejection nozzle 60 via the raw material mist relay pipe (not shown). The raw material mist can be supplied into the hollow portion 68 of the raw material mist jet nozzle 60 through the supply port 61.

  The aggregation raw material recovery passage 12 is a path for recovering the aggregation raw material 45 discharged from the aggregation raw material discharge pipe 62 of the raw material mist ejection nozzle 60 and returning it to the mist formation space 3H.

  Then, as schematically shown in FIG. 4 (b), the mist supply passage 11 and the raw material mist supply port 61 are connected to communicate with each other via, for example, the raw material mist relay pipe 21, and for raw material mist ejection The aggregation raw material discharge passage 63 of the nozzle 60 and the aggregation raw material recovery passage 12 are connected so as to communicate with each other via the attachment jig 83 and the aggregation raw material relay pipe 22, for example.

  In the thin film manufacturing apparatus according to the second embodiment, as in the first embodiment, a part of the raw material mist 7 ejected from the raw material mist ejection port 69 of the raw material mist ejection nozzle 60 is a substrate film on which the main roller 41 is wound. A case is considered where backflow is made downward (-Z direction) without being used for thin film formation on the 40.

  In this case, the backflowing raw material mist 7 returns to the inside of the hollow portion 68 inside the raw material mist ejection nozzle 60 via the raw material mist jet port 69, and most of the raw material mist 7 is finally hollow via the plurality of flow straightening portions 66. It will remain temporarily as the aggregation raw material 45 on the bottom face part 64 which forms the part 68.

  In the thin film manufacturing apparatus according to the second embodiment, as in the first embodiment, since the raw material mist jetting nozzle 60 has the above-described discharge mechanism consisting of the combination of the bottom portion 64 and the coagulated raw material discharge pipe 62, the raw material mist Even if 7 flows back into the raw material mist ejection nozzle 60, the aggregation raw material 45 does not remain in the hollow portion 68 of the raw material mist ejection nozzle 60 for a long time.

  Therefore, in the thin film manufacturing apparatus according to the second embodiment, as in the first embodiment, the generation efficiency of the raw material mist 7 to the substrate film 40 is not deteriorated by the generation of the aggregation raw material 45 under the temperature environment of normal temperature. Thin film can be formed on the substrate film.

  Furthermore, in the thin film manufacturing apparatus according to the second embodiment, as in the first embodiment, the discharge mechanism of the relatively simple structure by the bottom portion 64 and the aggregation material discharge pipe 62 ensures that the aggregation material 45 is reliably formed by the film forming nozzle. It can be discharged to the outside of a certain raw material mist jet nozzle 60.

  In addition, in the thin film manufacturing apparatus according to the second embodiment, for example, the aggregation raw material recovery passage 12 provided in the mist generator 100 and the raw material mist ejection nozzle 60 (film forming nozzle) are provided via the aggregation raw material relay pipe 22. A cohesive raw material recovery configuration is realized by connecting the cohesive raw material discharge passages 63 provided in communication with each other.

  Therefore, the thin film manufacturing apparatus according to the second embodiment is configured to recover the aggregation raw material 45 discharged from the raw material mist ejection nozzle 60 by the aggregation raw material recovery configuration at the time of generation of the aggregation raw material 45 into the misting space 3H of the mist generator 100. In the mist generator 100, the aggregation raw material 45 can be reused for raw material mist production | generation.

  At this time, since the pipe portion 3A separates and forms the mist supply passage 11 and the aggregation raw material recovery passage 12, the recovery processing of the aggregation raw material 45 via the aggregation raw material recovery passage 12 is a raw material mist via the mist supply passage 11. It does not affect the 7 squirting process. That is, according to the aggregation raw material recovery configuration (aggregation raw material recovery passage 12 + aggregation raw material relay pipe 22 + aggregation raw material discharge passage 63) in the second embodiment, the ejection processing capability of the raw material mist 7 is not deteriorated.

  In addition, the aggregation raw material 45 returned to the mist formation space 3H of the mist generator 100 will be recycled as the raw material solution 15 in the downward direction of the mist formation space 3H. Unlike the film forming process by the CVD method, the film forming process by the mist method is a film forming process performed at normal temperature without heating, and the material concentration in the material mist 7 (aggregation material 45) does not change so much Therefore, the aggregated raw material 45 collected in the mist generator 100 can be reused as the raw material solution 15 without any problem.

  In the second embodiment, the raw material mist 7 generated from the mist generator 100 is supplied to the raw material mist supply port 61 of the raw material mist ejection nozzle 60 through the raw material mist relay pipe 21. In this case, it is desirable that the mist generator 100 be disposed immediately below the raw material mist ejection nozzle 60 so that the raw material mist 7 ejected from the mist generator 100 can be efficiently taken into the raw material mist ejection nozzle 60. Furthermore, the raw material mist 7 jetted from the mist generator 100 may be directly supplied from the raw material mist supply port 61 without passing through the raw material mist relay pipe 21.

  In the present invention, within the scope of the invention, each embodiment can be freely combined, or each embodiment can be appropriately modified or omitted.

DESCRIPTION OF SYMBOLS 1 apparatus container 2 ultrasonic oscillator 3 internal cavity structure 3H misting space 4 gas supply part 7 raw material mist 8 raw material solution storage container 9 carrier gas 11 mist supply passage 12 aggregation raw material collection passage 15 raw material solution 40 substrate film 41 main roller 42 Secondary roller 60, 70 Nozzle for raw material mist ejection 61, 71 Raw material mist supply port 62 Aggregated raw material discharge pipe 63 Aggregation raw material discharge passage 64 Bottom portion 65 Nozzle main body 69 Raw material mist jet port 100 Mist generator

Claims (3)

A thin film manufacturing apparatus which ejects a raw material mist onto a long base material to form a thin film on the base material,
A roller for conveying the substrate;
A mist generator that generates a raw material mist by forming a raw material solution into a mist in a mist forming space, and ejects the raw material mist by a carrier gas;
The raw material mist disposed immediately below the roller and ejected from the mist generator is supplied from the raw material mist supply port, directed toward the base material wound around the roller, and upward from the raw material mist jet port. And a film forming nozzle for ejecting the raw material mist;
When the film forming nozzle generates a flocculating material that is internally flocculated by the reverse flow of the material mist from the roller via the material mist ejection port when forming a thin film, the aggregation material is discharged to the outside Characterized by having a discharge mechanism for discharging
Thin film manufacturing equipment. The thin film manufacturing apparatus according to claim 1, wherein
The film forming nozzle includes a nozzle body provided with the raw material mist supply port and the raw material mist jet port and having a hollow portion inside, and the raw material mist supply port is disposed below the raw material mist jet port.
The nozzle body includes a bottom portion having a central portion of the raw material mist supply port, and the bottom portion has an inclined surface shape which is inclined downward from the raw material mist supply port to an end portion.
The discharge mechanism is
The bottom portion exhibiting the inclined surface shape;
A discharge pipe connected to an end of the bottom portion and moving the inclined surface shape of the bottom portion from the center to the end of the bottom portion to discharge the coagulated raw material reaching the end to the outside In addition,
Thin film manufacturing equipment. The thin film manufacturing apparatus according to claim 2, wherein
The mist generator is
A mist supply passage connected to the outside from the mist formation space to eject the raw material mist to the outside;
It is provided separately from the mist supply passage, and is connected to the mist formation space from the outside, and has an aggregation raw material recovery passage for recovering the aggregation raw material,
The discharge pipe is connected with the end of the bottom portion to the outside, and has an aggregation material discharge passage for discharging the aggregation material to the outside,
The agglomerated material recovery passage and the agglomerated material discharge passage are connected in communication with each other.
Thin film manufacturing equipment.

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