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JP2019043788A - Method and apparatus for growing single crystal - Google Patents

Method and apparatus for growing single crystal Download PDF

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JP2019043788A
JP2019043788A JP2017165670A JP2017165670A JP2019043788A JP 2019043788 A JP2019043788 A JP 2019043788A JP 2017165670 A JP2017165670 A JP 2017165670A JP 2017165670 A JP2017165670 A JP 2017165670A JP 2019043788 A JP2019043788 A JP 2019043788A
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liquid interface
control unit
single crystal
shape
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JP6969230B2 (en
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勝彦 岡野
Katsuhiko Okano
勝彦 岡野
英一郎 西村
Eiichiro Nishimura
英一郎 西村
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Sumitomo Metal Mining Co Ltd
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Abstract

【課題】単結晶育成中の固液界面形状を制御可能とする。【解決手段】単結晶育成方法は、坩堝1の内部に配置された種結晶3及び単結晶原料4を融解する融解ステップS4と、融解ステップS4にて生成された坩堝1内の融液に固液界面制御部11を挿入し、坩堝1内部の固液界面の直上に固液界面制御部11を配置する配置ステップS5と、配置ステップS5にて固液界面の直上に配置された固液界面制御部11により固液界面を加熱して、固液界面の形状を制御する形状制御ステップS6と、を含む。固液界面制御部11は、固液界面の中央部分を加熱する円柱状制御部6と、固液界面の周縁部分を加熱する円筒状制御部7の少なくとも一方を有する。【選択図】図1PROBLEM TO BE SOLVED: To control a solid-liquid interface shape during single crystal growth. SOLUTION: The single crystal growing method is solidified in a melting step S4 for melting a seed crystal 3 and a single crystal raw material 4 arranged inside a pit 1 and a melt in the pit 1 generated in the melting step S4. The arrangement step S5 in which the liquid interface control unit 11 is inserted and the solid-liquid interface control unit 11 is arranged directly above the solid-liquid interface inside the pit 1 and the solid-liquid interface arranged directly above the solid-liquid interface in the arrangement step S5. A shape control step S6 for controlling the shape of the solid-liquid interface by heating the solid-liquid interface by the control unit 11 is included. The solid-liquid interface control unit 11 has at least one of a cylindrical control unit 6 that heats the central portion of the solid-liquid interface and a cylindrical control unit 7 that heats the peripheral portion of the solid-liquid interface. [Selection diagram] Fig. 1

Description

本開示は、単結晶育成方法及び単結晶育成装置に関する。   The present disclosure relates to a single crystal growth method and a single crystal growth apparatus.

単結晶の育成方法には、一般的にチョクラルスキー法(回転引き上げ法)が代表される。その他の育成法としてEFG法(Edge−defined Film−fed Growth Method:リボン状結晶成長法)に代表される、融液から単結晶を引上げて固化させる引き上げ法、垂直ブリッジマン法(垂直温度勾配凝固法)やVGF法(Vertical Gradient Freeze Method:垂直式温度傾斜凝固法)に代表される、融液を坩堝中で固化させる方法(一方向凝固結晶成長法)などがある。   The Czochralski method (rotational pulling method) is generally represented as a method of growing a single crystal. Another growth method is exemplified by the EFG method (Edge-defined Film-fed Growth Method: ribbon-like crystal growth method), a pulling method for pulling and solidifying a single crystal from a melt, vertical Bridgman method (vertical temperature gradient solidification) And the VGF method (Vertical Gradient Freeze Method: Vertical temperature gradient solidification method), there are a method of solidifying the melt in a crucible (directional solidification crystal growth method) and the like.

このうち、引き上げ法は、育成された単結晶を引き上げるためのスペースとその装置が必要であり、結晶育成装置が大型化せざるを得ず、初期投資費用が大きくなる。これに対して、ブリッジマン法などは、育成された単結晶を引き上げる必要がないため、結晶育成装置の小型化や簡略化が可能であり、初期投資費用を抑えることができる。   Among these, the pulling method requires a space and a device for pulling the grown single crystal, and the size of the crystal growing apparatus must be increased, and the initial investment cost becomes large. On the other hand, in the Bridgman method and the like, since it is not necessary to pull up the grown single crystal, it is possible to miniaturize and simplify the crystal growth apparatus, and it is possible to suppress the initial investment cost.

一方、垂直ブリッジマン法などの一方向凝固結晶成長法では、坩堝中で固化させながら育成を行うが、得ようとする結晶の直径が大きくなるにつれ、結晶径内の中央部と外周部の温度差も大きくなる。その際、育成時の固液界面形状は極端な凸形状や凹形状になる場合がある。固液界面形状が凸形状になると、結晶の内部応力差でクラックが発生しやすくなり、また凹形状では種結晶からの転位もしくは育成時に発生する転位などが結晶中央に集中し、結晶欠陥の増大により、結晶の歩留りが低下する傾向にある。   On the other hand, in the unidirectional Bridgman crystal growth method such as the vertical Bridgman method, the growth is carried out while solidifying in the crucible, but as the diameter of the crystal to be obtained becomes larger, the temperatures of the central part and the outer peripheral part in the crystal diameter The difference also increases. At that time, the solid-liquid interface shape during growth may be an extremely convex shape or a concave shape. When the solid-liquid interface shape is convex, cracks easily occur due to the internal stress difference of the crystal, and in the concave shape, dislocations from the seed crystal or dislocations generated at the time of growth concentrate in the crystal center and increase of crystal defects As a result, the yield of crystals tends to decrease.

この問題に対して、例えば特許文献1では、坩堝底にある支持棒に設けられるヒータによって坩堝の底面を加熱して温度制御を行い、所望の固液界面形状を得る単結晶育成方法が提案されている。また特許文献2では、坩堝の底部より下方に断熱材などの遮蔽部材を設け、遮蔽部材により坩堝底部での低温側からの輻射熱の影響を受けなくすることにより、坩堝の中心と壁面の温度勾配をより均一にして、所望の固液界面形状を得る手法が提案されている。   To address this problem, for example, Patent Document 1 proposes a method of growing a single crystal to obtain a desired solid-liquid interface shape by controlling the temperature by heating the bottom of the crucible by a heater provided on a support rod at the bottom of the crucible. ing. Moreover, in patent document 2, the temperature gradient of the center of a crucible and a wall surface is provided by providing shielding members, such as a heat insulating material, below the bottom of a crucible, and making it not receive to the influence of the radiant heat from the low temperature side in a crucible bottom by a shielding member. There is proposed a method of obtaining a desired solid-liquid interface shape by making the.

特開2011−195375号公報JP, 2011-195375, A 特開2012−240895号公報JP, 2012-240895, A

しかし、特許文献1の手法では、温度制御する坩堝底位置がシーディング直後の育成初期と坩堝を降下させた育成終盤の時とでは大きく異なる。すなわち一定の温度勾配でないことから、育成途中で固液界面形状が変化する可能性が高く、安定した結晶成長が出来ない問題がある。   However, in the method of Patent Document 1, the bottom position of the temperature control is greatly different between the initial stage of growth immediately after seeding and the final stage of growth after lowering the pod. That is, since the temperature gradient is not constant, there is a high possibility that the solid-liquid interface shape may change during growth, and there is a problem that stable crystal growth can not be performed.

また、特許文献2のように育成炉内に配備されている保温材や耐火物などで作り上げた固液界面形状は、育成を繰り返すことで、保温材などやヒータの劣化により固液界面形状が崩れてしまうため、その都度、高価な保温材や耐火物を作製しなければならず、コスト高となっている。   In addition, the solid-liquid interface shape made up of the heat insulating material and the refractory placed in the growth furnace as in Patent Document 2 has a solid-liquid interface shape due to deterioration of the heat insulating material and the heater by repeating the growth. Since it collapses, expensive heat insulating materials and refractories have to be produced each time, resulting in high cost.

本開示は、垂直ブリッジマン法やVGF法などの一方向凝固結晶成長法において、単結晶育成中の固液界面形状を制御可能とする単結晶育成方法及び単結晶育成装置を提供することを目的とする。   The present disclosure aims to provide a single crystal growth method and a single crystal growth apparatus capable of controlling the solid-liquid interface shape during single crystal growth in a directionally solidified crystal growth method such as vertical Bridgman method or VGF method. I assume.

本発明の実施形態の一観点に係る単結晶育成方法は、坩堝の内部に配置された種結晶及び単結晶原料を融解する融解ステップと、前記融解ステップにて生成された前記坩堝内の融液に固液界面制御部を挿入し、坩堝内部の固液界面の直上に前記固液界面制御部を配置する配置ステップと、前記配置ステップにて固液界面の直上に配置された前記固液界面制御部により前記固液界面を加熱して、前記固液界面の形状を制御する形状制御ステップと、を含み、前記固液界面制御部は、前記固液界面の中央部分を加熱する円柱状制御部と、前記固液界面の周縁部分を加熱する円筒状制御部の少なくとも一方を有する、単結晶育成方法。   A single crystal growth method according to one aspect of an embodiment of the present invention includes a melting step of melting a seed crystal and a single crystal raw material disposed inside a crucible, and a melt in the crucible generated in the melting step. A solid-liquid interface control unit inserted in the solid-liquid interface, and the solid-liquid interface controller disposed immediately above the solid-liquid interface in the crucible, and the solid-liquid interface disposed immediately above the solid-liquid interface in the arranging step. Controlling the shape of the solid-liquid interface by heating the solid-liquid interface by the control unit; and controlling the shape of the solid-liquid interface, the solid-liquid interface control unit heating the central part of the solid-liquid interface A method for growing a single crystal, comprising at least one of a portion and a cylindrical control portion for heating the peripheral portion of the solid-liquid interface.

同様に、本発明の実施形態の一観点に係る単結晶育成方法は、単結晶原料を収容する坩堝と、前記坩堝の外周側に配置されるヒータと、前記坩堝内部の固液界面の直上に配置され、前記固液界面を加熱して前記固液界面の形状を制御する固液界面制御部と、を備え、前記固液界面制御部は、前記固液界面の中央部分を加熱する円柱状制御部と、前記固液界面の周縁部分を加熱する円筒状制御部の少なくとも一方を有する。   Similarly, in the single crystal growth method according to one aspect of the embodiment of the present invention, a crucible for containing a single crystal raw material, a heater disposed on the outer peripheral side of the crucible, and a solid-liquid interface inside the crucible directly above. And a solid-liquid interface control unit arranged to heat the solid-liquid interface to control the shape of the solid-liquid interface, the solid-liquid interface control unit heating a central portion of the solid-liquid interface It has at least one of a control part and a cylindrical control part which heats the peripheral part of the solid-liquid interface.

本開示によれば、垂直ブリッジマン法やVGF法などの一方向凝固結晶成長法において、単結晶育成中の固液界面形状を制御可能とする単結晶育成方法及び単結晶育成装置を提供することができる。   According to the present disclosure, it is possible to provide a single crystal growth method and a single crystal growth apparatus capable of controlling the solid-liquid interface shape during single crystal growth in a direction solidification crystal growth method such as vertical Bridgman method or VGF method. Can.

本実施形態に係る単結晶育成装置の概略構成を示す断面図である。It is a sectional view showing a schematic structure of a single crystal growing device concerning this embodiment. 図1中の円柱状制御部の内部構成を示す断面図である。It is sectional drawing which shows the internal structure of the column-shaped control part in FIG. 図1中の円筒状制御部の内部構成を示す断面図である。It is sectional drawing which shows the internal structure of the cylindrical control part in FIG. 本実施形態に係る単結晶育成方法のフローチャートである。It is a flow chart of the single crystal growth method concerning this embodiment. 固液界面が極端な凸形状のときの円柱状制御部による形状制御を示す模式図である。It is a schematic diagram which shows shape control by the cylindrical control part in case solid-liquid interface is extremely convex shape. 固液界面が極端な凹形状のときの円筒状制御部による形状制御を示す模式図である。It is a schematic diagram which shows the shape control by a cylindrical control part in case solid-liquid interface is extremely concave shape.

以下、添付図面を参照しながら実施形態について説明する。説明の理解を容易にするため、各図面において同一の構成要素に対しては可能な限り同一の符号を付して、重複する説明は省略する。   Hereinafter, embodiments will be described with reference to the accompanying drawings. In order to facilitate understanding of the description, the same constituent elements in the drawings are denoted by the same reference numerals as much as possible, and redundant description will be omitted.

まず本実施形態に係る単結晶育成方法及び単結晶育成装置を着想した経緯について説明する。   First, the process of having conceived the single crystal growth method and the single crystal growth apparatus according to the present embodiment will be described.

本発明者らは、結晶育成時の結晶径内の温度差が小さい3インチ以下の結晶は、固液界面形状に大きな差は見られないが、4インチ以上については結晶径が大きくなるにつれ、結晶径の内外差の温度も大きくなることが分かり、坩堝外周部(結晶外周部)を覆うように熱源となるヒータが配置されていることから、熱源から最も離れる結晶中央部の温度が結晶外周部より小さくなることで、固液界面が凸形状になると知見を得た。   The inventors of the present invention found no significant difference in the shape of the solid-liquid interface with crystals having a temperature difference of 3 inches or less having a small temperature difference within the crystal diameter during crystal growth, but as the crystal diameter increased for 4 inches or more, It can be seen that the temperature of the difference between the crystal diameter and the crystal diameter also increases, and the heater serving as the heat source is disposed to cover the crucible outer peripheral portion (crystal outer peripheral portion). It became clear that the solid-liquid interface had a convex shape by being smaller than the part.

本発明者は、この知見を出発点として、単結晶育成方法について鋭意研究を重ねた結果、結晶外周部からの熱が伝わりにくい結晶中央部に、側面のヒータからだけではなく、上方から新たに円柱状のヒータによっても熱を加えて結晶中央部を加熱することを試みた。その結果、結晶径内の温度差は小さくなり、固液界面形状をフラットに近い凸形状とすることができた。   Starting from this knowledge, the present inventor has conducted intensive studies on a method of growing a single crystal. As a result, not only from the heater on the side but also from the top to the center of the crystal where heat from the crystal outer periphery is hard to be transmitted. Heat was also applied by a cylindrical heater to try to heat the central part of the crystal. As a result, the temperature difference in the crystal diameter became small, and the solid-liquid interface could be made into a convex shape close to flat.

また、炉内構造や坩堝形状などが異なるケースでは、坩堝側面からの輻射熱の影響等で結晶外周より結晶中央の方の温度が高くなることによって、固液界面が凹形状となるとの知見も得た。本発明者らは、結晶外周に合わせたリング状(円筒状)のヒータを用いて上方から熱を加えて結晶外周を加熱することで、固液界面形状をフラットに近い凸形状とすることができた。また、円柱や円筒状のヒータのどちらか一つで所望の固液界面形状が得られなかった場合は、円柱と円筒状のヒータの両方を組み合わせたり、ヒータ出力や円柱と円筒状の位置を調整することで、所望の固液界面形状を得ることができた。本実施形態はこのような経緯で完成に至ったものである。   In addition, in cases where the furnace internal structure and crucible shape are different, it is also known that the solid-liquid interface has a concave shape due to the temperature in the center of the crystal becoming higher than the crystal outer periphery due to the effects of radiant heat from the crucible side. The The inventors of the present invention can form a solid-liquid interface near a flat convex shape by heating the crystal periphery by applying heat from above using a ring-shaped (cylindrical) heater fitted to the crystal periphery. did it. Also, if the desired solid-liquid interface shape can not be obtained with either a cylindrical or cylindrical heater, combine both the cylindrical and cylindrical heaters, or the heater output or the cylindrical and cylindrical position. By adjusting, the desired solid-liquid interface shape could be obtained. The present embodiment has been completed in this manner.

[実施形態]
図1〜図3を参照して本実施形態に係る単結晶育成装置10について説明する。図1は、本実施形態に係る単結晶育成装置10の概略構成を示す断面図である。
[Embodiment]
A single crystal growth apparatus 10 according to the present embodiment will be described with reference to FIGS. 1 to 3. FIG. 1 is a cross-sectional view showing a schematic configuration of a single crystal growth apparatus 10 according to the present embodiment.

本実施形態に係る単結晶育成装置10は、基本的には、固液界面制御部11を備える点を除いて、従来のVGF法用や垂直ブリッジマン法用の育成炉と同様の構成である。   The single crystal growth apparatus 10 according to the present embodiment basically has the same configuration as the conventional growth furnace for VGF method or vertical Bridgman method except that the solid-liquid interface control unit 11 is provided. .

図1に示すように、単結晶育成装置10は、図示しないチャンバや断熱材の内側に、筒状のヒータ5が配置される。結晶育成時には、チャンバ内はアルゴンガスなどの不活性ガスで満たされ、ヒータ5の内部側にホットゾーン9が形成される。また、ヒータ5は、高さ方向の上側から下側に沿って上段ヒータ5a、中段ヒータ5b、下段ヒータ5cを有し、これらの各ヒータ5a,5b,5cへの投入電力を調整することにより、ホットゾーン9内の温度勾配を制御することができる。例えばヒータ5の上側が高く、下側が低い温度勾配とする。   As shown in FIG. 1, in the single crystal growth apparatus 10, a cylindrical heater 5 is disposed inside a chamber and a heat insulating material (not shown). At the time of crystal growth, the inside of the chamber is filled with an inert gas such as argon gas, and a hot zone 9 is formed inside the heater 5. Further, the heater 5 has an upper heater 5a, a middle heater 5b, and a lower heater 5c along the upper side to the lower side in the height direction, and by adjusting the power supplied to these heaters 5a, 5b, 5c. , The temperature gradient in the hot zone 9 can be controlled. For example, the upper side of the heater 5 is high, and the lower side is a low temperature gradient.

坩堝1は、ホットゾーンに配置される坩堝台2の上に載置される。坩堝台2は、支持軸8などによって上下方向に移動可能、または、回転可能に構成することができる。坩堝1は、例えば有底の容器であり、結晶育成前の設置時には、下部に種結晶3が配置され、種結晶3の上に単結晶原料4が配置される。   The crucible 1 is placed on a pedestal 2 placed in the hot zone. The gantry 2 can be configured to be vertically movable or rotatable by a support shaft 8 or the like. The crucible 1 is, for example, a bottomed container, and at the time of installation before crystal growth, the seed crystal 3 is disposed at the lower portion, and the single crystal raw material 4 is disposed on the seed crystal 3.

ホットゾーン9の上部には固液界面制御部11が設けられる。固液界面制御部11は、坩堝1内の固液界面を加熱して固液界面の形状を制御する。固液界面制御部11は、例えば育成初期に坩堝1が最も高温の上段ヒータ5aの位置にあるときに、坩堝1の内部の溶融した単結晶原料4に沈み、固液界面の直上に配置されるように配置される。   A solid-liquid interface control unit 11 is provided above the hot zone 9. The solid-liquid interface control unit 11 heats the solid-liquid interface in the crucible 1 to control the shape of the solid-liquid interface. For example, when the crucible 1 is at the position of the highest temperature upper heater 5a at the initial stage of growth, the solid-liquid interface control unit 11 sinks into the molten single crystal raw material 4 inside the crucible 1 and is disposed right above the solid-liquid interface Are arranged to

固液界面制御部11は、固液界面の中央部分を加熱する円柱状制御部6と、固液界面の周縁部分を加熱する円筒状制御部7とを有する。円柱状制御部6と円筒状制御部7は、下面が同一平面上となるように配置される。また、円柱状制御部6と円筒状制御部7は、それぞれの中心軸が一致する同心円状に配置されている。円柱状制御部6と円筒状制御部7は、中心軸が坩堝1の中心軸と一致するよう配置されるのが好ましい。   The solid-liquid interface control unit 11 includes a cylindrical control unit 6 that heats the central portion of the solid-liquid interface, and a cylindrical control unit 7 that heats the peripheral portion of the solid-liquid interface. The cylindrical control unit 6 and the cylindrical control unit 7 are arranged such that the lower surfaces thereof are on the same plane. Moreover, the cylindrical control part 6 and the cylindrical control part 7 are arrange | positioned in the concentric form which each central axis corresponds. The cylindrical control unit 6 and the cylindrical control unit 7 are preferably arranged such that the central axis coincides with the central axis of the crucible 1.

固液界面制御部11は、例えば図示しない移動手段によって上下方向に移動可能に構成される。   The solid-liquid interface control unit 11 is configured to be movable in the vertical direction, for example, by a moving unit (not shown).

図2は、図1中の円柱状制御部6の内部構成を示す断面図である。図3は、図1中の円筒状制御部7の内部構成を示す断面図である。図2、図3では、(a)は切断線が鉛直方向の鉛直断面図であり、(b)は切断線が水平方向の水平断面図である。   FIG. 2 is a cross-sectional view showing an internal configuration of the cylindrical control unit 6 in FIG. FIG. 3 is a cross-sectional view showing an internal configuration of the cylindrical control unit 7 in FIG. In FIG. 2 and FIG. 3, (a) is a vertical sectional view in which the cutting line is in the vertical direction, and (b) is a horizontal sectional view in which the cutting line is in the horizontal direction.

図2に示すように、円柱状制御部6は、円柱形状の外殻6aと、この外殻6aの内部に収容される発熱体6bとを有する。発熱体6bは、例えば複数個から成り、円柱形状の外殻6aの底面に対して略均等に配置される。発熱体6bは、例えば、図2(b)に示すように、底面の中心周りに同心円状に略等間隔で配置される。   As shown in FIG. 2, the cylindrical control unit 6 has a cylindrical outer shell 6 a and a heating element 6 b housed inside the outer shell 6 a. The heating element 6b is, for example, a plurality of heating elements, and is disposed substantially equally to the bottom surface of the cylindrical outer shell 6a. For example, as shown in FIG. 2B, the heating elements 6b are arranged concentrically at substantially equal intervals around the center of the bottom surface.

図3に示すように、円筒状制御部7は、円筒形状の外殻7aと、この外殻7aの内部に収容される発熱体7bとを有する。外殻7aは、内周面と外周面との間に内部空間を有し、この内部空間に発熱体7bが収容される。発熱体7bは、例えば複数個から成り、円筒形状の外殻7aの底面に対して略均等に配置される。発熱体7bは、例えば、図3(b)に示すように、外殻7aの円環状の内部空間の周方向に沿って略等間隔で配置される。   As shown in FIG. 3, the cylindrical control part 7 has the cylindrical-shaped outer shell 7a and the heat generating body 7b accommodated in the inside of this outer shell 7a. The outer shell 7a has an internal space between the inner peripheral surface and the outer peripheral surface, and the heat generating body 7b is accommodated in the internal space. The heating element 7b is, for example, a plurality of heating elements, and is disposed substantially equally to the bottom surface of the cylindrical outer shell 7a. For example, as shown in FIG. 3 (b), the heating elements 7b are arranged at substantially equal intervals along the circumferential direction of the annular inner space of the outer shell 7a.

外殻6a,7aは例えば金属など熱伝導率の高い材料で形成される。発熱体6b、7bは、例えばカーボンまたは二珪化モリブデンで形成される。   The outer shells 6a and 7a are formed of, for example, a material having high thermal conductivity, such as metal. The heating elements 6b, 7b are formed of, for example, carbon or molybdenum disilicide.

図4を参照して本実施形態に係る単結晶育成方法を説明する。図4は、本実施形態に係る単結晶育成方法のフローチャートである。本実施形態に係る単結晶育成方法も、基本的には、固液界面制御部11を用いる点を除いて、従来の一方向凝固法による単結晶の製造方法と同様である。   A single crystal growth method according to the present embodiment will be described with reference to FIG. FIG. 4 is a flowchart of the single crystal growth method according to the present embodiment. The single crystal growth method according to the present embodiment is basically the same as the conventional method for producing a single crystal by the unidirectional solidification method, except that the solid-liquid interface control unit 11 is used.

本実施形態に係る単結晶育成方法では、まず、坩堝1を坩堝台2の上に置き(ステップS1)、上部の開口からから坩堝1の底に種結晶3を収容する(ステップS2)。   In the single crystal growth method according to the present embodiment, first, crucible 1 is placed on pedestal 2 (step S1), and seed crystal 3 is accommodated from the opening at the top to the bottom of crucible 1 (step S2).

種結晶3の上には、同じく上部の開口から顆粒状もしくは単結晶を粉砕した単結晶原料4(例えばサファイア)を必要量配置する(ステップS3)。   A necessary amount of single crystal raw material 4 (for example, sapphire) obtained by crushing granular or single crystal from the opening at the top is disposed on the seed crystal 3 (step S3).

次に、坩堝1の周りのヒータ5を作動して、坩堝1の内部で単結晶を育成する。まずは、ヒータ5を用いて、種結晶3及び単結晶原料4が収納された坩堝1を高さ方向の上方が高く、下方が低い温度分布となるように加熱する。この状態で炉内の温度を種結晶3が高さ方向の上半分位まで融解するまで昇温し、シーディングを行う(ステップS4:融解ステップ)。結晶育成時には炉内はアルゴンガスを使用して不活性雰囲気となる。   Next, the heater 5 around the crucible 1 is operated to grow a single crystal inside the crucible 1. First, by using the heater 5, the crucible 1 in which the seed crystal 3 and the single crystal raw material 4 are stored is heated so that the temperature distribution is high at the upper side in the height direction and low at the lower side. In this state, the temperature in the furnace is raised until the seed crystal 3 melts to the upper half of the height direction, and seeding is performed (step S4: melting step). At the time of crystal growth, the inside of the furnace is inert atmosphere using argon gas.

次に、固液界面制御部11を坩堝1内の融液に挿入させて固液界面の近傍まで近づけ、固液界面制御部11を固液界面の直上に配置する(ステップS5:配置ステップ)。例えば、図示しない移動手段によって固液界面制御部11を上方から坩堝1に近づけることによって固液界面制御部11を坩堝1内に挿入する。固液界面制御部11は、円柱状制御部6と円筒状制御部7の中心軸が坩堝1の中心軸と一致するよう配置される。   Next, the solid-liquid interface control unit 11 is inserted into the melt in the crucible 1 and brought close to the solid-liquid interface, and the solid-liquid interface control unit 11 is arranged directly above the solid-liquid interface (step S5: arrangement step) . For example, the solid-liquid interface control unit 11 is inserted into the crucible 1 by moving the solid-liquid interface control unit 11 closer to the crucible 1 from the upper side by moving means (not shown). The solid-liquid interface control unit 11 is disposed such that the central axes of the cylindrical control unit 6 and the cylindrical control unit 7 coincide with the central axis of the crucible 1.

次に、固液界面の直上に配置された固液界面制御部11により、固液界面を加熱して、固液界面の形状を所望の形状に制御する(ステップS6:形状制御ステップ)。   Next, the solid-liquid interface is heated by the solid-liquid interface control unit 11 disposed immediately above the solid-liquid interface to control the shape of the solid-liquid interface to a desired shape (step S6: shape control step).

ステップS6では、ヒータ5により生成される固液界面の形状が凸形状か凹形状かに応じて、固液界面制御部11の円柱状制御部6及び円筒状制御部7の一方を用いて固液界面を加熱する。例えば固液界面の形状が極端な凸形状である場合には、円柱状制御部6により固液界面の中央部を加熱することで、所望の凸形状の固液界面に制御できる。また、固液界面の形状が極端な凹形状である場合には、円筒状制御部7により固液界面の外周部を加熱することで、所望の凸形状の固液界面に制御できる。   In step S6, depending on whether the shape of the solid-liquid interface generated by the heater 5 is convex or concave, the solid-liquid interface control section 11 solidifies using one of the cylindrical control section 6 and the cylindrical control section 7. Heat the liquid interface. For example, when the shape of the solid-liquid interface is an extremely convex shape, heating to the central portion of the solid-liquid interface by the cylindrical control unit 6 can control the solid-liquid interface having a desired convex shape. In addition, when the shape of the solid-liquid interface is an extremely concave shape, by heating the outer peripheral portion of the solid-liquid interface by the cylindrical control unit 7, it is possible to control the solid-liquid interface with a desired convex shape.

ヒータ5により生成される固液界面の形状が凸形状か凹形状かに応じて、固液界面制御部11の円柱状制御部6及び円筒状制御部7の一方を事前に加熱しておいてもよい。なお、ヒータ5により生成される固液界面の形状が極端は凸形状や凹形状でなく所望の凸形状の場合には、本ステップでは固液界面制御部11による固液界面の加熱を行わなくてもよい。   Depending on whether the shape of the solid-liquid interface generated by the heater 5 is convex or concave, one of the cylindrical control unit 6 and the cylindrical control unit 7 of the solid-liquid interface control unit 11 is heated in advance It is also good. If the shape of the solid-liquid interface generated by the heater 5 is not a convex shape or a concave shape but a desired convex shape, heating of the solid-liquid interface by the solid-liquid interface control unit 11 is not performed in this step. May be

次に、炉内温度勾配を維持しながら、坩堝台2の支持軸8を用いて坩堝1を下方に降下させて、すべての融液を固化させた後、所定速度で冷却を行う(ステップS7)。   Next, while maintaining the temperature gradient in the furnace, the crucible 1 is lowered downward using the support shaft 8 of the pedestal 2 to solidify all the melt, and then cooling is performed at a predetermined speed (step S7 ).

次に、炉内温度が室温程度になったことを確認した後、育成された単結晶が入った坩堝1を坩堝台2から取り外し、坩堝1の上部開口から育成された単結晶を取り出す(ステップS8)。   Next, after confirming that the temperature in the furnace has reached about room temperature, the crucible 1 containing the grown single crystal is removed from the pedestal 2 and the grown single crystal is taken out from the upper opening of the crucible 1 (step S8).

図5、図6を参照して本実施形態の効果を説明する。図5は、固液界面が極端な凸形状のときの円柱状制御部6による形状制御を示す模式図である。図6は、固液界面が極端な凹形状のときの円筒状制御部7による形状制御を示す模式図である。   The effects of the present embodiment will be described with reference to FIGS. 5 and 6. FIG. 5 is a schematic view showing shape control by the cylindrical control unit 6 when the solid-liquid interface has an extremely convex shape. FIG. 6 is a schematic view showing shape control by the cylindrical control unit 7 when the solid-liquid interface has an extremely concave shape.

図5に示すように、ステップS4においてヒータ5により形成される固液界面の形状が極端な凸形状であれば、結晶中央部が結晶外周部より温度が低い。このため、結晶中央部に加熱された円柱状制御部6を固液界面に近づけることで、結晶中央部と外周部との温度差が緩和されて、フラットに近い凸形状の固液界面が得られる。   As shown in FIG. 5, if the shape of the solid-liquid interface formed by the heater 5 in step S4 is an extremely convex shape, the temperature of the crystal central portion is lower than that of the crystal outer peripheral portion. For this reason, the temperature difference between the central portion and the outer peripheral portion of the crystal is alleviated by bringing the cylindrical control portion 6 heated to the central portion of the crystal closer to the solid-liquid interface, and a solid liquid interface with a convex shape close to flat is obtained. Be

図6に示すように、ステップS4においてヒータ5により形成される固液界面の形状が極端な凹形状であれば、図6の凸形状とは逆に結晶外周部が結晶中央部より温度が低い。このため、結晶外周部に加熱された円筒状制御部7に近づけることで、結晶中央部と外周部との温度差が緩和されて、同様にフラットに近い凸形状の固液界面が得られる。   As shown in FIG. 6, if the shape of the solid-liquid interface formed by the heater 5 at step S4 is an extremely concave shape, the temperature of the crystal outer peripheral portion is lower than that of the crystal central portion contrary to the convex shape of FIG. . For this reason, the temperature difference between the crystal central portion and the outer peripheral portion is alleviated by bringing it close to the cylindrical control portion 7 heated to the crystal outer peripheral portion, and a convex-shaped solid-liquid interface similar to a flat can be obtained similarly.

なお円柱状制御部6と円筒状制御部7の両方を組み合わせたり、加熱出力や固液界面からの距離を調整することで所望の固液形状を形成することも可能である。   It is also possible to form a desired solid-liquid shape by combining both the cylindrical control unit 6 and the cylindrical control unit 7 or adjusting the heating output and the distance from the solid-liquid interface.

このように、本実施形態では、固液界面制御部11より固液界面を加熱することによって、一方向凝固結晶成長法において単結晶育成中の固液界面形状を任意に制御することが可能となる。育成初期に固液界面制御部11によって固液界面形状を所望の形状に制御することによって、育成初期から終盤まで略一定の固液界面形状で育成が行うことができる。これにより、内部応力が小さく、また結晶欠陥が少ない結晶を安定して得られることができる。また保温材などやヒータの経時劣化による固液界面形状が崩れるケースに対しても対応できることから、保温材などやヒータの寿命延長ができ、コスト低減にもつながる。   As described above, in the present embodiment, by heating the solid-liquid interface by the solid-liquid interface control unit 11, it is possible to arbitrarily control the solid-liquid interface shape during single crystal growth in the unidirectional solidification crystal growth method. Become. By controlling the solid-liquid interface shape to a desired shape by the solid-liquid interface control unit 11 at the initial stage of growth, the growth can be performed with a substantially constant solid-liquid interface shape from the initial stage of growth to the final stage. Thereby, a crystal with small internal stress and few crystal defects can be stably obtained. In addition, since it is possible to cope with the case where the solid-liquid interface shape is broken due to the deterioration with time of the heat insulating material and the heater, the life of the heat insulating material and the heater can be extended, leading to cost reduction.

また、配置ステップS4において、円柱状制御部6と円筒状制御部7の中心軸が坩堝1の中心軸と一致するよう配置される。これにより、円柱状制御部6が正確に結晶中央部を加熱でき、また、円筒状制御部7が正確に結晶外周部を加熱できるので、固液界面をより所望の形状に制御できる。   Further, in the arranging step S4, the central axes of the cylindrical control unit 6 and the cylindrical control unit 7 are arranged to coincide with the central axis of the crucible 1. As a result, the cylindrical control unit 6 can accurately heat the crystal central portion, and the cylindrical control unit 7 can accurately heat the crystal outer peripheral portion, so that the solid-liquid interface can be controlled to a more desired shape.

また、円柱状制御部6及び円筒状制御部7はそれぞれ、外殻6a,7aと、外殻6a,7aの内部に収容される発熱体6b,7bと、を有する。これにより、発熱体6b、7bが結晶の融液に直接触れて反応することを防止できる。また、外殻6a,7aを介して発熱体6b,7bが発した熱を放射するので、円柱状制御部6及び円筒状制御部7の表面の温度分布をより均一にできる。   The cylindrical control unit 6 and the cylindrical control unit 7 respectively have outer shells 6a and 7a, and heating elements 6b and 7b housed inside the outer shells 6a and 7a. As a result, it is possible to prevent the heating elements 6b and 7b from directly touching and reacting with the crystal melt. Further, since the heat generated by the heating elements 6b and 7b is radiated through the outer shells 6a and 7a, the temperature distribution on the surfaces of the cylindrical control unit 6 and the cylindrical control unit 7 can be made more uniform.

なお、固液界面制御部11は、円柱状制御部6または円筒状制御部7の一方のみを有する構成でもよい。   The solid-liquid interface control unit 11 may be configured to have only one of the cylindrical control unit 6 and the cylindrical control unit 7.

以下、サファイア育成での実施例を用いて本発明を詳細に説明する。   Hereinafter, the present invention will be described in detail using an example of sapphire growth.

(実施例1)
図1に示す単結晶育成装置10を用いて、図4に示す単結晶育成方法の手順で単結晶の育成を行った。
Example 1
Using the single crystal growth apparatus 10 shown in FIG. 1, single crystals were grown in the procedure of the single crystal growth method shown in FIG.

Mo(モリブデン)、W(タングステン)、またはMo50%とW50%の合金からなる、4インチ結晶が得られるサイズ(外径150mm、高さ400mm、内径110〜130mm、取り出し口のテーパ角2°)の坩堝1を用意した。坩堝台2に坩堝1を置き、坩堝1内の底に外径110mm、高さ30mmの種結晶3を収納した。その上に顆粒もしくは結晶を粉砕した単結晶原料4を必要量入れた。   Size (outside diameter 150 mm, height 400 mm, inside diameter 110-130 mm, taper angle 2 ° of outlet) consisting of Mo (molybdenum), W (tungsten) or an alloy of Mo 50% and W 50% We prepared bowl 1 of. The crucible 1 was placed on the pedestal 2 and the seed crystal 3 having an outer diameter of 110 mm and a height of 30 mm was housed at the bottom of the crucible 1. A necessary amount of single crystal raw material 4 obtained by grinding granules or crystals was placed thereon.

坩堝1の周りにはカーボン製のヒータ5があり、このヒータ5は上方が高く、下方が低い温度分布となるよう整備し、炉内はアルゴンガスを使用して不活性雰囲気で行った。この状態で炉内の温度を単結晶原料4および種結晶3が高さ半分位まで融解するよう坩堝1を上昇させ、シーディングを行った。   There was a heater 5 made of carbon around the crucible 1, and the heater 5 was maintained so that the temperature distribution was high at the top and low at the bottom, and the inside of the furnace was performed in an inert atmosphere using argon gas. In this state, the crucible 1 was raised so that the single crystal raw material 4 and the seed crystal 3 were melted to about half the temperature in the furnace, and seeding was performed.

そこから本実施形態に係る固液界面制御部11を事前に加熱しておき、ゆっくりと坩堝1内の融液に挿入させ、固液界面の近傍まで近づけた。今回は極端な凸形状(結晶外周部から結晶中央部まで高さ35mm)をフラットに近い凸形状(結晶外周部から結晶中央部まで高さ5〜10mm)となるよう制御するため、カーボン製の発熱体6bを内部に有する円柱状制御部6(円柱径φ50mm)を用いた。   From there, the solid-liquid interface control unit 11 according to the present embodiment was heated in advance, and was slowly inserted into the melt in the crucible 1 and brought close to the vicinity of the solid-liquid interface. This time, it is made of carbon in order to control the extremely convex shape (35 mm in height from the crystal outer peripheral part to the crystal central part) to be a flat convex shape (5 to 10 mm in height from the crystal outer peripheral part to the crystal central part) The cylindrical control part 6 (cylindrical diameter φ 50 mm) having the heating element 6b inside was used.

その後、育成を行うため、坩堝1を5mm/hの速度で降下させるが、円柱状制御部6についてはシーディングと同じ位置で固定させておく。坩堝1を所定位置まで降下させ、すべての融液を固化させた後、50℃/hの速度で冷却を行った。同時に円柱状制御部6の加熱出力を落とし、所定の位置まで上昇移動させた。取り出せる温度を確認した後、坩堝1から結晶が取り出し、シーディング位置の固液界面形状をX線トポグラフィーで確認できるようにウエハ状に加工した。このような単結晶の育成を20ロット行い、結晶端部から結晶中央部までの固液界面の高さを測定し、クラックの発生率を算出した。   After that, the crucible 1 is lowered at a speed of 5 mm / h for the purpose of growing, but the cylindrical control unit 6 is fixed at the same position as the seeding. After the crucible 1 was lowered to a predetermined position and all the melt was solidified, cooling was performed at a rate of 50 ° C./h. At the same time, the heating output of the cylindrical control unit 6 was dropped and moved up to a predetermined position. After confirming the temperature which can be taken out, the crystal was taken out from the crucible 1 and processed into a wafer shape so that the solid-liquid interface shape at the seeding position could be confirmed by X-ray topography. Twenty lots of such single crystals were grown, the height of the solid-liquid interface from the crystal end to the crystal center was measured, and the incidence of cracks was calculated.

(比較例1)
固液界面制御部11(円柱状制御部6)を用いた固液界面の形状の制御を行わなかった点以外は、実施例1と同様の手法で単結晶の育成を20ロット行い、結晶端部から結晶中央部までの固液界面の高さを測定し、クラックの発生率を算出した。
(Comparative example 1)
Twenty lots of single crystals are grown by the same method as in Example 1 except that the shape of the solid-liquid interface is not controlled using solid-liquid interface controller 11 (cylindrical controller 6), and the crystal edge The height of the solid-liquid interface from the part to the central part of the crystal was measured to calculate the incidence of cracks.

実施例1、比較例1の固液界面高さとクラック発生率を比較したものを表1に示す。
What compared the solid-liquid interface height and crack generation rate of Example 1 and Comparative Example 1 is shown in Table 1.

(実施例2)
固液界面が極端な凹形状をフラットに近い凸形状(結晶外周部から結晶中央部まで高さ5〜10mm)となるよう制御するため、カーボン製の発熱体7bを内部に有する円筒状制御部7を用いた点以外は、実施例1と同様の手法で単結晶の育成を行った。結晶長250mmに対して育成初期、中盤、終盤のエリアをウエハ状に加工し、EPD(転位密度)を算出した。
(Example 2)
A cylindrical control unit having a carbon heating element 7b in order to control the solid-liquid interface to have an extremely concave shape with a convex shape close to a flat (5 to 10 mm in height from the crystal outer peripheral portion to the crystal central portion) The single crystal was grown in the same manner as in Example 1 except that 7 was used. Areas of the initial stage of growth, the middle stage and the last stage were processed into a wafer shape with respect to a crystal length of 250 mm, and EPD (dislocation density) was calculated.

(比較例2)
固液界面制御部11(円筒状制御部7)を用いた固液界面の形状の制御を行わなかった点以外は、実施例2と同様の手法で単結晶の育成を行い、結晶長250mmに対して育成初期、中盤、終盤のエリアをウエハ状に加工し、EPD(転位密度)を算出した。
(Comparative example 2)
The single crystal is grown in the same manner as in Example 2 except that the shape of the solid-liquid interface is not controlled using the solid-liquid interface controller 11 (cylindrical controller 7), and the crystal length is 250 mm. On the other hand, areas in the initial stage of growth, in the middle and in the last stage were processed into wafers, and EPD (dislocation density) was calculated.

実施例2、比較例2の固液界面高さと転位密度を比較したものを表2に示す。
What compared the solid-liquid interface height and dislocation density of Example 2 and Comparative Example 2 is shown in Table 2.

(評価)
表1の比較例1(制御無)は、固液界面高さが40mmで、クラックの発生率が20%に対し、実施例1(制御有)は、固液界面高さが8mmで、クラック発生率が5%であった。これらの差は固液界面高さが示すとおり、比較例1は結晶端部と内部との温度差が大きいことで、結晶の内部応力も大きくなり、クラックが発生しやすくなったと考えられる。
(Evaluation)
Comparative Example 1 (controlled) in Table 1 has a solid-liquid interface height of 40 mm and a crack generation rate of 20%, while Example 1 (controlled) has a solid-liquid interface height of 8 mm and cracked The incidence was 5%. As the solid-liquid interface height indicates, the difference in temperature between the crystal end and the inside is large in Comparative Example 1, and the internal stress of the crystal is also large, and it is considered that cracks easily occur.

表2は転位密度について調査した結果である。育成初期は種結晶から伝播される転位やシーディング時に起因した転位が発生するため、比較例2(制御無)と実施例2(制御有)に差は見られないが、結晶が成長する育成中盤、終盤については、比較例2は転位密度が徐々に増える傾向にある。要因として固液界面が凹形状であることから育成初期では見られなかった結晶外周部に潜んでいた転位が結晶成長することで中央部に集まって、転位密度が増加したと考えられる。一方、実施例2については、固液界面が凸形状であることから、転位は外周部へ抜けるため、転位密度は減少したと考えられる。   Table 2 shows the results of investigation of dislocation density. In the initial stage of the growth, dislocations propagated from the seed crystal and dislocations caused by seeding are generated, so no difference is observed between Comparative Example 2 (with no control) and Example 2 (with control). In the middle stage and the last stage, in Comparative Example 2, the dislocation density tends to gradually increase. The factor is that the solid-liquid interface has a concave shape, and it is believed that the dislocations lurking at the outer periphery of the crystal, which were not seen in the initial stage of the growth, gather in the central part by crystal growth and the dislocation density increases. On the other hand, in Example 2, since the solid-liquid interface has a convex shape, dislocations fall out to the outer peripheral part, so it is considered that the dislocation density is reduced.

実施例1,2及び比較例1,2に示す結果より、本実施形態による、固液界面制御部11を用いて育成初期に固液界面を加熱する手法は、一方向凝固結晶成長法において単結晶育成中の固液界面形状を任意に制御できる点で極めて有効であることが示された。また、これにより育成時の固液界面形状が極端な凸形状になる場合の単結晶のクラック発生や、育成時の固液界面形状が極端な凹形状になる場合の単結晶の転位密度の増加を抑制でき、単結晶の歩留まり低下を抑制できることが示された。   From the results shown in Examples 1 and 2 and Comparative Examples 1 and 2, according to the present embodiment, the method of heating the solid-liquid interface at the initial stage of growth using the solid-liquid interface control unit 11 is simple in the unidirectional solidification crystal growth method. It has been shown to be extremely effective in that the solid-liquid interface shape during crystal growth can be arbitrarily controlled. In addition, single crystal cracks are generated when the solid-liquid interface shape during growth becomes an extremely convex shape, and the dislocation density of the single crystal increases when the solid-liquid interface shape during growth becomes an extremely concave shape. It has been shown that it is possible to suppress the reduction of the yield of single crystals.

以上、具体例を参照しつつ本実施形態について説明した。しかし、本開示はこれらの具体例に限定されるものではない。これら具体例に、当業者が適宜設計変更を加えたものも、本開示の特徴を備えている限り、本開示の範囲に包含される。前述した各具体例が備える各要素およびその配置、条件、形状などは、例示したものに限定されるわけではなく適宜変更することができる。前述した各具体例が備える各要素は、技術的な矛盾が生じない限り、適宜組み合わせを変えることができる。   The present embodiment has been described above with reference to the specific example. However, the present disclosure is not limited to these specific examples. Those appropriately modified in design by those skilled in the art are also included in the scope of the present disclosure as long as the features of the present disclosure are included. The elements included in the above-described specific examples, and the arrangement, conditions, and shapes thereof are not limited to those illustrated, but can be appropriately modified. The elements included in the above-described specific examples can be appropriately changed in combination as long as no technical contradiction arises.

1 坩堝
3 種結晶
4 単結晶原料
5 ヒータ
10 単結晶育成装置
11 固液界面制御部
6 円柱状制御部
6a 外殻
6b 発熱体
7 円筒状制御部
7a 外殻
7b 発熱体
Reference Signs List 1 3 seed crystal 4 single crystal raw material 5 heater 10 single crystal growth apparatus 11 solid-liquid interface control unit 6 cylindrical control unit 6a outer shell 6b heating element 7 cylindrical control unit 7a outer shell 7b heating element

Claims (5)

坩堝の内部に配置された種結晶及び単結晶原料を融解する融解ステップと、
前記融解ステップにて生成された前記坩堝内の融液に固液界面制御部を挿入し、前記坩堝内部の固液界面の直上に前記固液界面制御部を配置する配置ステップと、
・前記配置ステップにて固液界面の直上に配置された前記固液界面制御部により前記固液界面を加熱して、前記固液界面の形状を制御する形状制御ステップと、
を含み、
前記固液界面制御部は、前記固液界面の中央部分を加熱する円柱状制御部と、前記固液界面の周縁部分を加熱する円筒状制御部の少なくとも一方を有する、単結晶育成方法。
A melting step of melting a seed crystal and a single crystal raw material disposed inside the crucible;
Placing a solid-liquid interface control unit in the melt in the crucible generated in the melting step, and arranging the solid-liquid interface control unit directly above the solid-liquid interface in the crucible;
A shape control step of controlling the shape of the solid-liquid interface by heating the solid-liquid interface by the solid-liquid interface controller disposed immediately above the solid-liquid interface in the disposing step;
Including
The single crystal growth method, wherein the solid-liquid interface control unit includes at least one of a cylindrical control unit that heats a central portion of the solid-liquid interface and a cylindrical control unit that heats a peripheral portion of the solid-liquid interface.
前記配置ステップにおいて
前記円柱状制御部と前記円筒状制御部の中心軸が前記坩堝の中心軸と一致するよう配置される、
請求項1に記載の単結晶育成方法。
In the arranging step, central axes of the cylindrical control unit and the cylindrical control unit are arranged to coincide with a central axis of the weir.
A method of growing a single crystal according to claim 1.
前記円柱状制御部及び前記円筒状制御部は、外殻と、前記外殻の内部に収容される発熱体とを有する、
請求項1または2に記載の単結晶育成方法。
The cylindrical control unit and the cylindrical control unit have an outer shell and a heating element housed inside the outer shell.
The single crystal growth method according to claim 1.
前記発熱体は、カーボンまたは二珪化モリブデンである、
請求項3に記載の単結晶育成方法。
The heating element is carbon or molybdenum disilicide.
The single crystal growth method according to claim 3.
単結晶原料を収容する坩堝と、
前記坩堝の外周側に配置されるヒータと、
前記坩堝内部の固液界面の直上に配置され、前記固液界面を加熱して前記固液界面の形状を制御する固液界面制御部と、
を備え、
前記固液界面制御部は、前記固液界面の中央部分を加熱する円柱状制御部と、前記固液界面の周縁部分を加熱する円筒状制御部の少なくとも一方を有する、
単結晶育成装置。
A weir containing single crystal raw materials,
A heater disposed on an outer peripheral side of the crucible;
A solid-liquid interface control unit disposed immediately above the solid-liquid interface inside the crucible and heating the solid-liquid interface to control the shape of the solid-liquid interface;
Equipped with
The solid-liquid interface control unit includes at least one of a cylindrical control unit that heats a central portion of the solid-liquid interface and a cylindrical control unit that heats a peripheral portion of the solid-liquid interface.
Single crystal growth system.
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