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JP2018193279A - Method for manufacturing glass fine particle deposit, method for manufacturing glass preform and glass fine particle deposit - Google Patents

Method for manufacturing glass fine particle deposit, method for manufacturing glass preform and glass fine particle deposit Download PDF

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JP2018193279A
JP2018193279A JP2017099100A JP2017099100A JP2018193279A JP 2018193279 A JP2018193279 A JP 2018193279A JP 2017099100 A JP2017099100 A JP 2017099100A JP 2017099100 A JP2017099100 A JP 2017099100A JP 2018193279 A JP2018193279 A JP 2018193279A
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glass
raw material
fine particle
particulate deposit
burner
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真澄 伊藤
Masumi Ito
真澄 伊藤
正敏 早川
Masatoshi Hayakawa
正敏 早川
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Sumitomo Electric Industries Ltd
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Sumitomo Electric Industries Ltd
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Priority to JP2017099100A priority Critical patent/JP2018193279A/en
Priority to CN201810473732.0A priority patent/CN108947212B/en
Publication of JP2018193279A publication Critical patent/JP2018193279A/en
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/14Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415Reactant delivery systems
    • C03B19/1423Reactant deposition burners
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/14Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413Reactant delivery systems
    • C03B37/0142Reactant deposition burners
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00Glass deposition burners
    • C03B2207/30For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/34Liquid, e.g. mist or aerosol
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Thermal Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)

Abstract

To provide a method for manufacturing a glass fine particle deposit without generating air bubbles in the inside of a glass preform obtained by the subsequent clarification step; a method for manufacturing a glass preform; and the glass fine particle deposit.SOLUTION: A method for manufacturing a glass fine particle deposit includes a deposition process of comprising: arranging a start rod 11 and a glass fine particle formation burner 22 in a reaction vessel 2; introducing a glass raw material into the burner 22; decomposing and reacting the glass raw material in flame formed by the burner 22 to form glass particles 30; depositing the formed glass particles 30 on the start rod 11 to prepare a glass fine particle deposit M. The content of organic based foreign matter included in the glass fine particle deposit M is 2 ppm or less.SELECTED DRAWING: Figure 1

Description

本発明は、ガラス微粒子堆積体の製造方法、ガラス母材の製造方法及びガラス微粒子堆積体に関する。   The present invention relates to a method for producing a glass particulate deposit, a method for producing a glass base material, and a glass particulate deposit.

シロキサンを原料として用い、気相合成法により、ガラス微粒子を出発ロッドに堆積させて、ガラス微粒子堆積体を製造する方法において、以下の先行文献がある。
特許文献1には、高沸点不純物の濃度が低いシロキサン原料を用いてガラス微粒子堆積体を形成することが記載されている。
特許文献2には、原料シロキサンを液体のまま火炎分解反応させることが記載されている。
特許文献3には、エンドキャッピング化合物を原料環状シロキサンに加えることにより、環構造が開いた部位に結合し、更なるシロキサン同士の重合を防ぐことが記載されている。
There is the following prior literature in a method for producing a glass fine particle deposit by using siloxane as a raw material and depositing glass fine particles on a starting rod by a gas phase synthesis method.
Patent Document 1 describes that a glass particulate deposit is formed using a siloxane raw material having a low concentration of high-boiling impurities.
Patent Document 2 describes that a raw material siloxane is subjected to a flame decomposition reaction in a liquid state.
Patent Document 3 describes that by adding an end-capping compound to a raw material cyclic siloxane, it is bonded to a site where the ring structure is opened to prevent further polymerization between siloxanes.

特開平9−156947号公報JP-A-9-156947 特表2000−502040号公報Special Table 2000-502040 特表2001−502312号公報JP-T-2001-50312

しかしながら、特許文献1〜3に記載の技術を採用しても、ガラス微粒子堆積体を形成した後の透明化工程により得られるガラス母材の内部に気泡が見られる事例が発生していた。
そこで、本発明は、後の透明化工程により得られるガラス母材の内部に気泡が発生しない、ガラス微粒子堆積体の製造方法、ガラス母材の製造方法及びガラス微粒子堆積体を提供することを目的とする。
However, even when the techniques described in Patent Documents 1 to 3 are employed, there have been cases in which bubbles are observed inside the glass base material obtained by the transparentizing step after forming the glass fine particle deposit.
Accordingly, an object of the present invention is to provide a method for producing a glass particulate deposit, a method for producing a glass preform, and a glass particulate deposit, in which bubbles are not generated inside a glass preform obtained by a subsequent transparency step. And

本発明のガラス微粒子堆積体の製造方法は、
反応容器内に出発ロッドとガラス微粒子生成用バーナーを配置し、前記バーナーにガラス原料を導入し、前記バーナーが形成する火炎内でガラス原料を火炎分解反応させてガラス微粒子を生成し、生成したガラス微粒子を前記出発ロッドに堆積させてガラス微粒子堆積体を作製する堆積工程を有するガラス微粒子堆積体の製造方法であって、
前記ガラス微粒子堆積体に含まれる有機系異物の含有量を2ppm以下とする。
また、本発明のガラス母材の製造方法は、前記のガラス微粒子堆積体の製造方法によってガラス微粒子堆積体を製造し、当該製造したガラス微粒子堆積体を加熱して透明なガラス母材を製造する透明化工程を有する。
また、本発明のガラス微粒子堆積体は、有機系異物の含有量が2ppm以下である。
The method for producing a glass particulate deposit according to the present invention comprises:
A starting rod and a glass fine particle generating burner are placed in a reaction vessel, a glass raw material is introduced into the burner, a glass raw material is subjected to a flame decomposition reaction in a flame formed by the burner to generate glass fine particles, and the generated glass A method for producing a glass particulate deposit comprising a deposition step of depositing particulate on the starting rod to produce a glass particulate deposit,
The content of organic foreign matter contained in the glass particulate deposit is set to 2 ppm or less.
Further, the method for producing a glass base material of the present invention produces a glass fine particle deposit by the method for producing a glass fine particle deposit, and heats the produced glass fine particle deposit to produce a transparent glass preform. It has a transparency process.
In the glass fine particle deposit of the present invention, the content of organic foreign matter is 2 ppm or less.

本発明によれば、後の透明化工程により得られるガラス母材の内部に気泡が発生しない、ガラス微粒子堆積体を提供することが可能となる。   ADVANTAGE OF THE INVENTION According to this invention, it becomes possible to provide the glass fine particle deposit body from which a bubble does not generate | occur | produce inside the glass base material obtained by a subsequent transparentization process.

本発明の一態様に係るガラス微粒子堆積体の製造方法を実施する製造装置の一形態を示す構成図である。It is a block diagram which shows one form of the manufacturing apparatus which enforces the manufacturing method of the glass fine particle deposit body which concerns on 1 aspect of this invention.

[本発明の実施形態の説明]
最初に本発明の実施形態の内容を列記して説明する。
本発明の一態様に係るガラス微粒子堆積体の製造方法は、
(1)反応容器内に出発ロッドとガラス微粒子生成用バーナーを配置し、前記バーナーにガラス原料を導入し、前記バーナーが形成する火炎内でガラス原料を火炎分解反応させてガラス微粒子を生成し、生成したガラス微粒子を前記出発ロッドに堆積させてガラス微粒子堆積体を作製する堆積工程を有するガラス微粒子堆積体の製造方法であって、
前記ガラス微粒子堆積体に含まれる有機系異物の含有量を2ppm以下とする。
この構成によれば、後の加熱(焼結)による透明化工程を経て得られるガラス母材を、気泡、異常点の無い(極めて微少な)ものとすることができる。
[Description of Embodiment of the Present Invention]
First, the contents of the embodiment of the present invention will be listed and described.
A method for producing a glass particulate deposit according to an aspect of the present invention includes:
(1) A starting rod and a glass fine particle generating burner are arranged in a reaction vessel, a glass raw material is introduced into the burner, and a glass raw material is subjected to a flame decomposition reaction in a flame formed by the burner to generate glass fine particles, A method for producing a glass particulate deposit comprising a deposition step of depositing the generated glass particulate on the starting rod to produce a glass particulate deposit,
The content of organic foreign matter contained in the glass particulate deposit is set to 2 ppm or less.
According to this structure, the glass base material obtained through the transparentization process by subsequent heating (sintering) can be made free of bubbles and abnormal points (very small).

(2)前記有機系異物の含有量を1ppm以下とすることが好ましい。
この構成によれば、後の加熱(焼結)による透明化工程を経て得られるガラス母材を、より気泡、異常点の無い(極めて微少な)ものとすることができる。
(3)前記有機系異物の含有量を0.5ppm以下とすることが好ましい。
この構成によれば、後の加熱(焼結)による透明化工程を経て得られるガラス母材を、さらに気泡、異常点の無い(極めて微少な)ものとすることができる。
(4)前記ガラス原料としてシロキサンを用いることが好ましい。
この構成によれば、腐食性のハロゲンを含まない原料であるため、排ガスによる製造装置等の腐食の問題をなくすことができる。また、排ガスの処理装置が不要となる。
(5)前記シロキサンとしてオクタメチルシクロテトラシロキサン(OMCTS)を用いることが好ましい。
この構成によれば、使用原料が、工業的に容易に入手でき、保管や取扱いも容易である。
(6)前記バーナーから噴出するガラス原料を液体噴霧状態とすることが好ましい。
この構成によれば、ガラス原料の火炎分解反応を促進することができる。
(7)前記バーナーから噴出するガラス原料をガス状態とすることが好ましい。
この構成によれば、ガラス原料の火炎分解反応を促進することができる。
(2) It is preferable to make content of the said organic type foreign material into 1 ppm or less.
According to this structure, the glass base material obtained through the transparentization process by subsequent heating (sintering) can be made free of bubbles and abnormal points (very small).
(3) The content of the organic foreign matter is preferably 0.5 ppm or less.
According to this structure, the glass base material obtained through the transparentization process by subsequent heating (sintering) can be further free of bubbles and abnormal points (very small).
(4) It is preferable to use siloxane as the glass raw material.
According to this configuration, since the raw material does not contain corrosive halogen, it is possible to eliminate the problem of corrosion of a manufacturing apparatus or the like caused by exhaust gas. Further, an exhaust gas treatment device is not required.
(5) It is preferable to use octamethylcyclotetrasiloxane (OMCTS) as the siloxane.
According to this configuration, the raw materials used can be easily obtained industrially, and can be stored and handled easily.
(6) It is preferable to make the glass raw material ejected from the burner into a liquid spray state.
According to this configuration, the flame decomposition reaction of the glass raw material can be promoted.
(7) It is preferable to make the glass raw material ejected from the burner into a gas state.
According to this configuration, the flame decomposition reaction of the glass raw material can be promoted.

(8)また、本発明の一態様に係るガラス母材の製造方法は、上記の(1)〜(7)のいずれかのガラス微粒子堆積体の製造方法によってガラス微粒子堆積体を製造し、当該製造したガラス微粒子堆積体を加熱して透明なガラス母材を製造する透明化工程を有する。
この構成によれば、気泡、異常点の無い(極めて微少な)ガラス母材とすることができる。
(8) Moreover, the manufacturing method of the glass base material which concerns on 1 aspect of this invention manufactures a glass particulate deposit by the manufacturing method of the glass particulate deposit in any one of said (1)-(7), It has the transparentization process which heats the manufactured glass fine particle deposit body and manufactures a transparent glass base material.
According to this structure, it can be set as a glass base material without a bubble and an abnormal point (very small).

(9)また、本発明の一態様に係るガラス微粒子堆積体は、有機系異物の含有量が2ppm以下である。
この構成によれば、後の加熱(焼結)による透明化工程を経て得られるガラス母材を、気泡、異常点の無い(極めて微少な)ものとすることができる。
(9) Further, in the glass fine particle deposit according to one embodiment of the present invention, the content of the organic foreign matter is 2 ppm or less.
According to this structure, the glass base material obtained through the transparentization process by subsequent heating (sintering) can be made free of bubbles and abnormal points (very small).

[本発明の実施形態の詳細]
〔製法及び使用装置の概要等〕
以下、本発明の実施形態に係るガラス微粒子堆積体の製造方法およびガラス母材の製造方法の実施形態の例を添付図面に基づいて説明する。なお、以下に示す製造方法としては、OVD(Outside Vapor Deposition)法を例に説明するが、本発明はOVD法に限定されるものではない。OVD法と同様にガラス原料から火炎熱分解反応を利用してガラスを堆積させる方法、例えば、VAD(Vapor Phase Axial Deposition)法やMMD(Multiburner Multilayer Deposition)法等に本発明を適用することも可能である。
[Details of the embodiment of the present invention]
[Outline of manufacturing method and equipment used]
Hereinafter, an example of an embodiment of a manufacturing method of a glass particulate deposition object and a manufacturing method of a glass base material concerning an embodiment of the present invention is described based on an accompanying drawing. As a manufacturing method shown below, an OVD (Outside Vapor Deposition) method will be described as an example, but the present invention is not limited to the OVD method. Similar to the OVD method, the present invention can be applied to a method of depositing glass from a glass raw material using a flame pyrolysis reaction, for example, VAD (Vapor Phase Axial Deposition) method, MMD (Multiburner Multilayer Deposition) method, etc. It is.

図1は、本実施形態のガラス微粒子堆積体の製造方法を実施する製造装置1の構成図である。製造装置1は、反応容器2と、昇降回転装置3と、原料供給装置21と、ガラス微粒子生成用のバーナー22と、各部の動作を制御する制御部5を備えている。   FIG. 1 is a configuration diagram of a manufacturing apparatus 1 that performs the method for manufacturing a glass fine particle deposit according to the present embodiment. The production apparatus 1 includes a reaction vessel 2, an elevating and rotating device 3, a raw material supply device 21, a glass particle producing burner 22, and a control unit 5 that controls the operation of each unit.

反応容器2は、ガラス微粒子堆積体Mが形成される容器であり、容器の側面に取り付けられた排気管12を備えている。
昇降回転装置3は、支持棒10および出発ロッド11を介してガラス微粒子堆積体Mを昇降動作、および回転動作させる装置である。昇降回転装置3は、制御部5から送信されてくる制御信号に基づいて支持棒10の動作を制御している。昇降回転装置3は、ガラス微粒子堆積体Mを回転させながら昇降させる。
The reaction container 2 is a container in which the glass particulate deposit M is formed, and includes an exhaust pipe 12 attached to a side surface of the container.
The lifting / lowering rotation device 3 is a device that moves the glass particulate deposit M up and down and rotates via the support rod 10 and the starting rod 11. The lifting / lowering rotation device 3 controls the operation of the support bar 10 based on a control signal transmitted from the control unit 5. The elevating and rotating device 3 elevates and lowers the glass particulate deposit M while rotating it.

支持棒10は、反応容器2の上壁に形成された貫通穴を挿通して配置されており、反応容器2内に配置される一方の端部(図1において下端部)には出発ロッド11が取り付けられている。支持棒10は、他方の端部(図1において上端部)を昇降回転装置3により把持されている。
出発ロッド11は、ガラス微粒子が堆積されるロッドであり、支持棒10に取り付けられている。
排気管12は、出発ロッド11およびガラス微粒子堆積体Mに付着しなかったガラス微粒子等を反応容器2の外部に排出する管である。
The support rod 10 is disposed through a through hole formed in the upper wall of the reaction vessel 2, and a starting rod 11 is provided at one end portion (lower end portion in FIG. 1) disposed in the reaction vessel 2. Is attached. The other end (upper end in FIG. 1) of the support bar 10 is held by the elevating and rotating device 3.
The starting rod 11 is a rod on which glass fine particles are deposited, and is attached to the support rod 10.
The exhaust pipe 12 is a pipe for discharging glass fine particles and the like that have not adhered to the starting rod 11 and the glass fine particle deposit M to the outside of the reaction vessel 2.

バーナー22には、原料を原料供給装置21により供給する。なお、図1において、火炎形成用ガスを供給するガス供給装置は省略されている。
原料供給装置21は、液体原料23を貯留する原料容器24と、原料ガスの供給流量を制御するMFC(Mass Flow Controller)25と、原料をバーナー22へ導く供給配管26と、原料容器24とMFC25と供給配管26の一部を所定温度以上に保つ温調ブース27からなる。
The raw material is supplied to the burner 22 by the raw material supply device 21. In FIG. 1, the gas supply device that supplies the flame forming gas is omitted.
The raw material supply device 21 includes a raw material container 24 that stores the liquid raw material 23, an MFC (Mass Flow Controller) 25 that controls the supply flow rate of the raw material gas, a supply pipe 26 that guides the raw material to the burner 22, a raw material container 24, and an MFC 25. And a temperature control booth 27 for maintaining a part of the supply pipe 26 at a predetermined temperature or higher.

原料容器24内の液体原料23は、温調ブース27内で沸点(例えば、OMCTSの場合の標準沸点は175℃)以上の温度に制御され、原料容器24内で気化される。気化された原料ガスは、MFC25により、バーナー22への供給量が制御される。なお、MFC25による原料ガス供給量の制御は、制御部5からの指令値に基づき行われる。   The liquid raw material 23 in the raw material container 24 is controlled to a temperature equal to or higher than the boiling point (for example, the standard boiling point in the case of OMCTS is 175 ° C.) in the temperature control booth 27 and is vaporized in the raw material container 24. The supply amount of the vaporized source gas to the burner 22 is controlled by the MFC 25. Note that the control of the supply amount of the source gas by the MFC 25 is performed based on a command value from the control unit 5.

供給配管26の材質については、通常フッ素樹脂などが用いられるが、200℃以上の温度で保持する場合は、SUS等の金属性のものを用いるのが好ましい。また、温調ブース27からバーナー22までの供給配管26の外周には発熱体であるテープヒータ28などが巻き付けられ、供給配管26が加熱されることが好ましい。   As for the material of the supply pipe 26, a fluororesin or the like is usually used. However, when the supply pipe 26 is held at a temperature of 200 ° C. or higher, it is preferable to use a metallic material such as SUS. Further, it is preferable that a tape heater 28 or the like as a heating element is wound around the outer periphery of the supply pipe 26 from the temperature control booth 27 to the burner 22 so that the supply pipe 26 is heated.

制御部5は、昇降回転装置3、原料供給装置21等の各動作を制御している。制御部5は、昇降回転装置3に対して、ガラス微粒子堆積体Mの昇降速度および回転速度を制御する制御信号を送信している。また、制御部5は、原料供給装置21のMFC25に対して、バーナー22から出射する原料ガスの流量を制御する制御信号を送信している。   The control unit 5 controls each operation of the elevating and rotating device 3, the raw material supply device 21, and the like. The controller 5 transmits a control signal for controlling the ascending / descending speed and the rotating speed of the glass particulate deposit M to the ascending / descending rotation device 3. Further, the control unit 5 transmits a control signal for controlling the flow rate of the raw material gas emitted from the burner 22 to the MFC 25 of the raw material supply device 21.

そして、ガラス微粒子堆積体Mに含まれる有機系異物の含有量が2ppm以下となるように、各種製造条件を設定する。
ガラス微粒子堆積体Mに含まれる有機系異物の含有量を2ppm以下とするための手法としては、特に限定されないが、例えば、火炎形成用ガスの組成、流量等を適切に設定することが挙げられる。具体的には、水素を十分供給して酸水素火炎を形成することが、シロキサンを火炎分解反応させるために必要であり、酸水素火炎が十分に形成できないと、シロキサンの活性化が進まない。また、酸素はシロキサンを酸化させて、シリカを形成するために必要であり、酸素が不足すると、シリカへの変換が不十分となる。一方で、水素も酸素も供給過多になると、火炎内の反応を阻害する要因となる。
また、ガラス微粒子堆積体Mに含まれる有機系異物の含有量は、後の透明化工程を経て得られるガラス母材の気泡、異常点をより少なくすることができるという点から、1ppm以下が好ましく、0.5ppm以下がより好ましい。
なお、ガラス微粒子堆積体Mに含まれる有機系異物としては、ガラス原料を火炎分解反応させてガラス微粒子を生成する際に未反応で残存したガラス原料成分や、ガラス原料と後述の火炎形成用ガス等から予期せず生成される炭化水素系の副生成物等が相当する。
また、ガラス微粒子堆積体Mに含まれる有機系異物の含有量の測定方法としては、特に限定されないが、ガスクロマトグラフィー質量分析(GCMS)法にて行うことが好ましい。
And various manufacturing conditions are set so that content of the organic type foreign material contained in the glass particulate deposit M may be 2 ppm or less.
The technique for setting the content of the organic foreign matter contained in the glass fine particle deposit M to 2 ppm or less is not particularly limited, but for example, appropriately setting the composition, flow rate, etc. of the flame forming gas. . Specifically, it is necessary to sufficiently supply hydrogen to form an oxyhydrogen flame in order to cause the siloxane to undergo a flame decomposition reaction. If the oxyhydrogen flame cannot be sufficiently formed, activation of the siloxane does not proceed. Oxygen is necessary to oxidize siloxane to form silica. If oxygen is insufficient, conversion to silica becomes insufficient. On the other hand, if hydrogen and oxygen are excessively supplied, it becomes a factor that inhibits the reaction in the flame.
Further, the content of the organic foreign matters contained in the glass fine particle deposit M is preferably 1 ppm or less from the viewpoint that the bubbles and abnormal points of the glass base material obtained through the subsequent transparentization step can be reduced. 0.5 ppm or less is more preferable.
The organic foreign matter contained in the glass fine particle deposit M includes a glass raw material component that remains unreacted when a glass raw material is subjected to a flame decomposition reaction to produce glass fine particles, and a glass raw material and a flame forming gas described later. This corresponds to a hydrocarbon-based by-product that is unexpectedly generated from the like.
Further, the method for measuring the content of the organic foreign matter contained in the glass fine particle deposit M is not particularly limited, but it is preferably performed by a gas chromatography mass spectrometry (GCMS) method.

なお、火炎形成用ガスは、ガラス原料を火炎分解反応させてガラス微粒子を生成するためにバーナーが火炎を形成できるものであれば、特に限定されない。一般的には、可燃性ガスである水素(H2)と助燃性ガスである酸素(O2)とを適宜混合し、さらにシールガスとして窒素等を混合して形成することができる。この場合、水素、酸素、窒素をそれぞれ別個の噴出ポートから噴出させ、噴出後に混合させることが好ましい。 The flame forming gas is not particularly limited as long as the burner can form a flame in order to cause the glass raw material to undergo a flame decomposition reaction to generate glass fine particles. In general, hydrogen (H 2 ), which is a combustible gas, and oxygen (O 2 ), which is an auxiliary combustion gas, are mixed as appropriate, and nitrogen or the like is further mixed as a seal gas. In this case, it is preferable that hydrogen, oxygen, and nitrogen are ejected from separate ejection ports and mixed after ejection.

次に、ガラス微粒子堆積体およびガラス母材の製造方法の手順について説明する。
〔堆積工程〕
OVD法(外付け法)によってガラス微粒子の堆積を行い、ガラス微粒子堆積体Mを製造する。先ず、図1に示すように、昇降回転装置3に支持棒10を取り付け、さらに支持棒10の下端部に出発ロッド11を取り付けた状態で、出発ロッド11および支持棒10の一部を反応容器2内に納める。
続いて、MFC25は、制御部5から送信されてくる制御信号に基づき、供給量を制御しながら原料ガスをバーナー22に供給する。
バーナー22に、原料ガスおよび火炎形成用ガスを供給し、原料を火炎内で酸化反応させることでガラス微粒子30を生成する。
そして、バーナー22は、火炎内で生成したガラス微粒子30を回転および昇降する出発ロッド11に継続的に堆積させていく。
昇降回転装置3は、制御部5からの制御信号に基づいて、出発ロッド11および出発ロッド11に堆積されたガラス微粒子堆積体Mを昇降及び回転させる。
Next, the procedure of the method for producing the glass fine particle deposit and the glass base material will be described.
[Deposition process]
Glass fine particles are deposited by the OVD method (external method) to produce a glass fine particle deposit M. First, as shown in FIG. 1, with the support rod 10 attached to the elevating and rotating device 3, and with the start rod 11 attached to the lower end of the support rod 10, a part of the start rod 11 and the support rod 10 are placed in the reaction vessel. Put it in 2.
Subsequently, the MFC 25 supplies the source gas to the burner 22 while controlling the supply amount based on the control signal transmitted from the control unit 5.
The raw material gas and the flame forming gas are supplied to the burner 22, and the glass fine particles 30 are generated by oxidizing the raw material in the flame.
The burner 22 continuously deposits the glass particles 30 generated in the flame on the starting rod 11 that rotates and moves up and down.
The elevating and rotating device 3 moves up and down and rotates the starting rod 11 and the glass particulate deposit M deposited on the starting rod 11 based on a control signal from the control unit 5.

〔透明化工程〕
次に、得られるガラス微粒子堆積体Mを不活性ガスと塩素ガスの混合雰囲気中で1100℃に加熱した後、He雰囲気中で1550℃に加熱して透明ガラス母材を得る。このようなガラス母材の製造を繰り返し行う。
[Transparency process]
Next, the obtained glass fine particle deposit M is heated to 1100 ° C. in a mixed atmosphere of an inert gas and a chlorine gas, and then heated to 1550 ° C. in a He atmosphere to obtain a transparent glass base material. Such a glass base material is repeatedly manufactured.

〔各種製造条件〕
なお、上述した態様は、液体であったガラス原料をガス状態にしてバーナー22から噴出するものであるが、ガラス原料をガス状態にしないで液体噴霧の状態でバーナー22から噴出する態様としても良い。ガラス原料を液体噴霧の状態でバーナー22から噴出する態様においては、バーナー22の図示しない液体原料用ポートから噴出した液体原料に、図示しない噴出ガスポートから噴出したガスを当てることによって霧化する。前記噴出ガスポートから噴出させるガスとしては、例えば、窒素(N2)、酸素(O2)、アルゴン(Ar)等が挙げられ、それぞれ単体で、もしくは混合されて噴出される。
[Various manufacturing conditions]
In addition, although the aspect mentioned above makes the glass raw material which was a liquid gas state, and it ejects from the burner 22, it is good also as an aspect which ejects from the burner 22 in the state of a liquid spray, without making a glass raw material gas state. . In a mode in which the glass raw material is ejected from the burner 22 in a liquid spray state, the liquid raw material ejected from the liquid raw material port (not shown) of the burner 22 is atomized by applying a gas jetted from a jet gas port (not shown). Examples of the gas to be ejected from the ejection gas port include nitrogen (N 2 ), oxygen (O 2 ), argon (Ar), and the like, and each is ejected alone or mixed.

また、ガラス原料としては、上述した態様で火炎分解反応させてガラス微粒子を生成しえるものであれば、特に限定されない。例としては、四塩化ケイ素(SiCl)、シロキサン等が挙げられる。その中でもシロキサンは、SiClと比較して使用した結果塩素等の腐食性のガスを発生することがないので好ましい。また、シロキサンの中でも、工業的に容易に入手でき、保管や取扱いも容易である点で、環状のものが好ましく、そのなかでもOMCTSがより好ましい。 Further, the glass raw material is not particularly limited as long as it is capable of generating glass fine particles by the flame decomposition reaction in the above-described embodiment. Examples include silicon tetrachloride (SiCl 4 ), siloxane, and the like. Among them, siloxane is preferable because it does not generate corrosive gas such as chlorine as a result of using it in comparison with SiCl 4 . Of the siloxanes, cyclic ones are preferred from the viewpoint of industrial availability and easy storage and handling. Among them, OMCTS is more preferred.

〔作用効果〕
ガラス原料中に高沸点不純物が存在すると、供給配管及びバーナー自体の内側にゲル状物質が生じることがある。また、液体のガラス原料をガス状態にする過程でゲル状物質が生成することがある。さらに、ガラス原料としてOMCTSのような環状シロキサンを用いた場合は、環構造が開くことにより、開環したシロキサン同士が結合しゲル状物質となることがある。このようなゲル状物質がガラス微粒子堆積体に付着すると、後の透明化工程により得られるガラス母材の気泡の原因になる。
[Function and effect]
When high boiling point impurities are present in the glass raw material, a gel-like substance may be generated inside the supply pipe and the burner itself. Moreover, a gel-like substance may be produced in the process of turning a liquid glass raw material into a gas state. Furthermore, when a cyclic siloxane such as OMCTS is used as the glass raw material, the ring-opened siloxanes may be bonded together to form a gel-like substance due to the opening of the ring structure. When such a gel-like substance adheres to the glass fine particle deposit, it causes bubbles in the glass base material obtained by a subsequent transparentization process.

前述の特許文献1〜3等では、ガラス原料を高沸点不純物の濃度が低いものとする、ガラス原料を液体のまま火炎分解反応させる、ガラス原料にエンドキャッピング化合物を加える、等を行うことにより、ゲル状物質の生成を抑えることが検討されていた。
しかしながら、上記の技術で得られたガラス微粒子堆積体においても、後の透明化工程により得られるガラス母材内部に気泡が見られる事例が発生していた。
これは、ガラス原料を火炎分解反応させてガラス微粒子を生成する際に、未反応で残存したガラス原料成分や、ガラス原料と火炎形成用ガス等から予期せず副生成される炭化水素系異物がガラス微粒子堆積体に付着するためと推測される。
In the aforementioned Patent Documents 1 to 3 and the like, by making the glass raw material have a low concentration of high-boiling impurities, causing the glass raw material to undergo a flame decomposition reaction while being in a liquid state, adding an end-capping compound to the glass raw material, etc. It has been studied to suppress the formation of gel-like substances.
However, even in the glass fine particle deposit obtained by the above-described technique, there has been an example in which bubbles are observed inside the glass base material obtained by the subsequent clarification process.
This is because when a glass raw material is subjected to a flame decomposition reaction to produce glass fine particles, unreacted glass raw material components, and hydrocarbon-based foreign matters that are unexpectedly by-produced from the glass raw material and flame forming gas, etc. It is estimated that it adheres to the glass particulate deposit.

そこで、本発明の実施形態では、ガラス微粒子堆積体に含まれる有機系異物の含有量を2ppm以下とすることにより、後の透明化工程により得られるガラス母材の内部の気泡発生を抑制することができた。   Therefore, in the embodiment of the present invention, by controlling the content of the organic foreign matter contained in the glass fine particle deposit to 2 ppm or less, the generation of bubbles inside the glass base material obtained by the subsequent clearing step is suppressed. I was able to.

以下、本発明に係る実施例及び比較例を用いた評価試験の結果を示し、本発明をさらに詳細に説明する。なお、本発明はこれら実施例に限定されるものではない。   Hereinafter, the results of evaluation tests using examples and comparative examples according to the present invention will be shown, and the present invention will be described in more detail. The present invention is not limited to these examples.

図1に示す製造装置を使用してOVD法によってガラス微粒子の堆積、すなわちガラス微粒子堆積体Mの製造を行う[堆積工程]。また、得られるガラス微粒子堆積体Mを不活性ガスと塩素ガスとの混合雰囲気中で1100℃に加熱した後、He雰囲気中で1550℃に加熱して透明ガラス化を行う[透明化工程]。   1 is deposited by the OVD method, that is, the glass particulate deposit M is produced [deposition step]. Further, the obtained glass fine particle deposit M is heated to 1100 ° C. in a mixed atmosphere of an inert gas and a chlorine gas, and then heated to 1550 ° C. in a He atmosphere to perform transparent vitrification [translucent step].

出発ロッド11として純石英ガラスを用いる。
反応容器2内に出発ロッド11とガラス微粒子生成用バーナー22を配置し、バーナー22にガラス原料としてOMCTSをガス状で導入した。バーナー22が形成する火炎内でOMCTSを火炎分解反応させてガラス微粒子を生成し、生成したガラス微粒子30を出発ロッド11に堆積させてガラス微粒子堆積体Mを作製した。この時、火炎分解反応条件として、バーナーへ供給する各ガスの流量を変えた、異なる5種の条件(No.1〜5、下記表1の通り)を検討した。作製された5種のガラス微粒子堆積体Mについてそれぞれガスクロマトグラフィー質量分析(GCMS)を行ったところ、未反応のOMCTSと炭化水素系異物の含有量は、下記表1に示す通りであった。
なお、GCMSによる測定では、No.1〜5のガラス微粒子堆積体からガラス微粒子をサンプリングし、300℃で5分間加熱して、発生するガス状物質を分析した。
また、作製された5種のガラス微粒子堆積体Mを加熱して透明なガラス母材を作製した。作製したガラス母材について、気泡や異常点の評価を行ったところ、下記表1に示す通りであった。
なお、気泡、異常点の評価では、ガラス母材の側面からハロゲンランプ光を照射し、目視にてガラス母材内部を観察し、大きさ1mm以上の気泡と、目視で確認できる有色異物の数を計測し、線引きした際の換算長100kmあたりのガラス母材に含まれる気泡や異常点の数で評価した。
なお、下記表1中、No.1〜3が実施例で、No.4〜5が比較例である。
Pure quartz glass is used as the starting rod 11.
A starting rod 11 and a glass fine particle producing burner 22 were disposed in the reaction vessel 2, and OMCTS was introduced into the burner 22 as a glass raw material in a gaseous state. The OMCTS was subjected to a flame decomposition reaction in the flame formed by the burner 22 to generate glass particles, and the generated glass particles 30 were deposited on the starting rod 11 to produce a glass particle deposit M. At this time, as flame decomposition reaction conditions, five different conditions (Nos. 1 to 5, as shown in Table 1 below) in which the flow rate of each gas supplied to the burner was changed were examined. When gas chromatography mass spectrometry (GCMS) was performed on each of the five kinds of glass fine particle deposits M produced, the contents of unreacted OMCTS and hydrocarbon-based foreign matters were as shown in Table 1 below.
In the measurement by GCMS, no. Glass particulates were sampled from 1 to 5 glass particulate deposits and heated at 300 ° C. for 5 minutes to analyze the generated gaseous substances.
Further, the produced five kinds of glass fine particle deposits M were heated to produce a transparent glass base material. When the produced glass base material was evaluated for bubbles and abnormal points, it was as shown in Table 1 below.
In the evaluation of bubbles and abnormal points, halogen lamp light is irradiated from the side surface of the glass base material, the inside of the glass base material is visually observed, and the number of bubbles having a size of 1 mm or more and colored foreign matters that can be visually confirmed. Was evaluated by the number of bubbles and abnormal points contained in the glass base material per 100 km converted length when the line was drawn.
In Table 1 below, no. 1 to 3 are examples. 4 to 5 are comparative examples.

Figure 2018193279
Figure 2018193279

上記表1のNo.1〜3は、酸素、水素ガスを十分に供給して酸水素火炎を形成し、OMCTSを分解することができたため、ガラス微粒子堆積体中のOMCTS及び炭化水素系異物の含有量が2ppm以下となり、その後に作製されたガラス母材には気泡や異常点の発生はほとんどなかった。
これに対して、上記表1のNo.4〜5は、酸素の供給量が不足し、また、十分な酸水素火炎を形成することができなかったため、ガラス微粒子堆積体中のOMCTS及び炭化水素系異物の含有量が2ppmを超え、その後に作製されたガラス母材には気泡や異常点が比較的多く見られた。
No. in Table 1 above. 1-3 were able to sufficiently supply oxygen and hydrogen gas to form an oxyhydrogen flame and decompose OMCTS, so that the content of OMCTS and hydrocarbon-based foreign matter in the glass particulate deposit was 2 ppm or less. Thereafter, there were almost no bubbles or abnormal points in the glass base material produced thereafter.
In contrast, No. 1 in Table 1 above. 4-5, since the supply amount of oxygen was insufficient and a sufficient oxyhydrogen flame could not be formed, the content of OMCTS and hydrocarbon-based foreign matter in the glass particulate deposit exceeded 2 ppm, and thereafter A relatively large number of bubbles and abnormal points were observed in the glass base material prepared in the above.

1:製造装置
2:反応容器
3:昇降回転装置
5:制御部
10:支持棒
11:出発ロッド
21:原料供給装置
22:バーナー
23:液体原料
24:原料容器
25:MFC
26:供給配管
27:温調ブース
28:テープヒータ
30:ガラス微粒子
M:ガラス微粒子堆積体
1: Manufacturing device 2: Reaction vessel 3: Lifting and rotating device 5: Control unit 10: Support rod 11: Starting rod 21: Raw material supply device 22: Burner 23: Liquid raw material 24: Raw material container 25: MFC
26: Supply piping 27: Temperature control booth 28: Tape heater 30: Glass particulate M: Glass particulate deposit

Claims (9)

反応容器内に出発ロッドとガラス微粒子生成用バーナーを配置し、前記バーナーにガラス原料を導入し、前記バーナーが形成する火炎内でガラス原料を火炎分解反応させてガラス微粒子を生成し、生成したガラス微粒子を前記出発ロッドに堆積させてガラス微粒子堆積体を作製する堆積工程を有するガラス微粒子堆積体の製造方法であって、
前記ガラス微粒子堆積体に含まれる有機系異物の含有量を2ppm以下とするガラス微粒子堆積体の製造方法。
A starting rod and a glass fine particle generating burner are placed in a reaction vessel, a glass raw material is introduced into the burner, a glass raw material is subjected to a flame decomposition reaction in a flame formed by the burner to generate glass fine particles, and the generated glass A method for producing a glass particulate deposit comprising a deposition step of depositing particulate on the starting rod to produce a glass particulate deposit,
A method for producing a glass particulate deposit, wherein the content of organic foreign matter contained in the glass particulate deposit is 2 ppm or less.
前記有機系異物の含有量を1ppm以下とする請求項1に記載のガラス微粒子堆積体の製造方法。   The method for producing a glass particulate deposit according to claim 1, wherein the content of the organic foreign matter is 1 ppm or less. 前記有機系異物の含有量を0.5ppm以下とする請求項2に記載のガラス微粒子堆積体の製造方法。   The method for producing a glass particulate deposit according to claim 2, wherein the content of the organic foreign matter is 0.5 ppm or less. 前記ガラス原料としてシロキサンを用いる請求項1〜請求項3のいずれか1項に記載のガラス微粒子堆積体の製造方法。   The method for producing a glass particulate deposit according to any one of claims 1 to 3, wherein siloxane is used as the glass raw material. 前記シロキサンとしてオクタメチルシクロテトラシロキサン(OMCTS)を用いる請求項4に記載のガラス微粒子堆積体の製造方法。   The method for producing a glass particulate deposit according to claim 4, wherein octamethylcyclotetrasiloxane (OMCTS) is used as the siloxane. 前記バーナーから噴出するガラス原料を液体噴霧状態とする請求項1〜請求項5のいずれか1項に記載のガラス微粒子堆積体の製造方法。   The method for producing a glass particulate deposit according to any one of claims 1 to 5, wherein the glass raw material ejected from the burner is in a liquid spray state. 前記バーナーから噴出するガラス原料をガス状態とする請求項1〜請求項5のいずれか1項に記載のガラス微粒子堆積体の製造方法。   The method for producing a glass particulate deposit according to any one of claims 1 to 5, wherein the glass raw material ejected from the burner is in a gas state. 請求項1〜請求項7のいずれか1項に記載のガラス微粒子堆積体の製造方法によってガラス微粒子堆積体を製造し、当該製造したガラス微粒子堆積体を加熱して透明なガラス母材を製造する透明化工程を有するガラス母材の製造方法。   A glass particulate deposit is produced by the method for producing a glass particulate deposit according to any one of claims 1 to 7, and the produced glass particulate deposit is heated to produce a transparent glass base material. The manufacturing method of the glass base material which has a transparency process. 有機系異物の含有量が2ppm以下であるガラス微粒子堆積体。   A glass particulate deposit having an organic foreign matter content of 2 ppm or less.
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