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JP2018148075A - Semiconductor light emitting device and method for manufacturing semiconductor light emitting device - Google Patents

Semiconductor light emitting device and method for manufacturing semiconductor light emitting device Download PDF

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JP2018148075A
JP2018148075A JP2017042880A JP2017042880A JP2018148075A JP 2018148075 A JP2018148075 A JP 2018148075A JP 2017042880 A JP2017042880 A JP 2017042880A JP 2017042880 A JP2017042880 A JP 2017042880A JP 2018148075 A JP2018148075 A JP 2018148075A
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light emitting
light
emitting device
phosphor layer
emitting element
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JP7046493B2 (en
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原田 光範
Mitsunori Harada
光範 原田
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Stanley Electric Co Ltd
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Abstract

【課題】光変換部材の搭載精度を向上させることにより、発光する光の偏り及び色度のばらつきを抑制し、延いては製造歩留まりを向上させる。【解決手段】発光素子と、該発光素子の下面に設けられた裏面電極と、前記発光素子の上面に設けられた第1の蛍光体層と、前記発光素子及び前記第1の蛍光体層の側面を覆う光制御部材と、を備え、前記発光素子の下面及び前記裏面電極の少なくとも下面が、前記光制御部材に覆われずに露出している半導体発光装置を提供する。【選択図】図1PROBLEM TO BE SOLVED: To suppress a bias of emitted light and a variation in chromaticity by improving the mounting accuracy of an optical conversion member, and to improve the manufacturing yield. A light emitting element, a back surface electrode provided on the lower surface of the light emitting element, a first phosphor layer provided on the upper surface of the light emitting element, and the light emitting element and the first phosphor layer. Provided is a semiconductor light emitting device including a light control member that covers a side surface, and the lower surface of the light emitting element and at least the lower surface of the back surface electrode are exposed without being covered by the light control member. [Selection diagram] Fig. 1

Description

本発明は、発光素子から照射された光を波長変換部材により変換して所望の波長の光を照射する半導体発光装置及び半導体発光装置の製造方法に関する。   The present invention relates to a semiconductor light emitting device that converts light emitted from a light emitting element with a wavelength conversion member and emits light of a desired wavelength, and a method for manufacturing the semiconductor light emitting device.

発光素子からの光の一部を、波長変換部材により所望波長の光に変換して発光させる半導体発光装置が知られている。このような半導体発光装置の例として、例えば、特許文献1には、発光素子と、発光素子からの光を波長変換する光変換部材と、光反射性材料を含む被覆部材とを備える発光装置が開示されている。特許文献1の発光装置では、光変換部材が、外部に露出する発光面と発光面から連続する側面とを有し、被覆部材が光変換部材の側面を被覆するので、実質的に発光面のみを発光装置における光の放出領域として、正面輝度を向上させている。また、特許文献2には、基板上に導電部材を介して設けられた発光素子の上面に波長変換部材及び透光性部材を順に配置すると共に、発光素子の側面から波長変換部材の周縁下面に亘って側面導光部材を設け、少なくとも、波長変換部材、透光性部材及び側面導光部材のそれぞれの側面に光反射部材を配置した半導体発光装置が開示されている。   2. Description of the Related Art A semiconductor light emitting device that emits light by converting a part of light from a light emitting element into light having a desired wavelength by a wavelength conversion member is known. As an example of such a semiconductor light emitting device, for example, Patent Document 1 discloses a light emitting device including a light emitting element, a light conversion member that converts the wavelength of light from the light emitting element, and a covering member that includes a light reflective material. It is disclosed. In the light emitting device of Patent Document 1, the light conversion member has a light emitting surface exposed to the outside and a side surface continuous from the light emitting surface, and the covering member covers the side surface of the light converting member. Is used as the light emission region in the light emitting device to improve the front luminance. Further, in Patent Document 2, a wavelength conversion member and a translucent member are sequentially arranged on the upper surface of a light emitting element provided on a substrate via a conductive member, and from the side surface of the light emitting element to the peripheral lower surface of the wavelength conversion member. A semiconductor light emitting device is disclosed in which a side light guide member is provided and a light reflecting member is disposed on each side of at least the wavelength conversion member, the translucent member, and the side light guide member.

特許5526782号公報Japanese Patent No. 5526782 特開2016−72515号公報JP-A-2006-72515

しかしながら、上述した特許文献1及び特許文献2に開示された半導体発光装置のような従来の半導体発光装置は、実装基板上に発光素子を搭載し、その上に光変換部材、側面に光反射性部材を順次実装していくことで製造される。このため、製造時、特に光変換部材等を搭載する際に、搭載位置がずれてしまう虞がある。光変換部材等の搭載位置がずれると、半導体発光装置から照射される光に偏りが生じ、色度がばらついてしまう。色度がばらついた半導体発光装置は検査装置にて目標とする色度に応じてランク分けされるところ、目標とする色度から外れた半導体発光装置は出荷することができず、製造歩留まりが低下してしまう。   However, a conventional semiconductor light emitting device such as the semiconductor light emitting devices disclosed in Patent Document 1 and Patent Document 2 described above has a light emitting element mounted on a mounting substrate, a light conversion member thereon, and a light reflective property on a side surface. Manufactured by sequentially mounting components. For this reason, when mounting a light conversion member etc. especially at the time of manufacture, there exists a possibility that a mounting position may shift | deviate. When the mounting position of the light conversion member or the like is shifted, the light emitted from the semiconductor light emitting device is biased and the chromaticity varies. Semiconductor light-emitting devices with varying chromaticity are ranked according to the target chromaticity in the inspection device. However, semiconductor light-emitting devices that deviate from the target chromaticity cannot be shipped, and the manufacturing yield decreases. Resulting in.

本発明は、上記事情に鑑みてなされたものであり、光変換部材の搭載精度を向上させることにより、発光する光の偏り及び色度のばらつきを抑制し、延いては製造歩留まりを向上させることを目的とする。   The present invention has been made in view of the above circumstances, and by improving the mounting accuracy of the light conversion member, it is possible to suppress the deviation of the emitted light and the variation in chromaticity, thereby improving the manufacturing yield. With the goal.

本発明の一態様は、発光素子と、該発光素子の下面に設けられた裏面電極と、前記発光素子の上面に設けられた第1の蛍光体層と、前記発光素子及び前記第1の蛍光体層の側面を覆う光制御部材と、を備え、前記発光素子の下面及び前記裏面電極の少なくとも下面が、前記光制御部材に覆われずに露出している半導体発光装置を提供する。
このように構成された半導体発光装置は、以下のように製造される。
矩形状の凹部を有する離型冶具を用い、該離型冶具の底面に第1の蛍光体層を嵌め込み、該第1の蛍光体層の上に、発光素子の上面と前記第1の蛍光体層とが接するように前記発光素子を搭載して、前記第1の蛍光体層と前記発光素子とを接合し、光制御部材を、前記凹部と前記第1の蛍光体層の側面及び前記発光素子の側面と前記凹部との間に塗布形成し、硬化させる。
このようにして製造された半導体発光装置は、光変換部材を搭載する際の搭載位置ずれを抑制することができるため、発光する光の偏り及び色度のばらつきを抑制し、延いては製造歩留まりを向上させることができる。
One embodiment of the present invention is a light-emitting element, a back electrode provided on a lower surface of the light-emitting element, a first phosphor layer provided on an upper surface of the light-emitting element, the light-emitting element, and the first fluorescence. And a light control member that covers a side surface of the body layer, and at least a lower surface of the light emitting element and at least a lower surface of the back electrode are exposed without being covered by the light control member.
The semiconductor light emitting device configured as described above is manufactured as follows.
A release jig having a rectangular recess is used, a first phosphor layer is fitted on the bottom surface of the release jig, and the upper surface of the light emitting element and the first phosphor are placed on the first phosphor layer. The light-emitting element is mounted so that the layer is in contact, the first phosphor layer and the light-emitting element are joined, and a light control member is provided as the concave portion, the side surface of the first phosphor layer, and the light emission. It is applied and formed between the side surface of the element and the concave portion and cured.
Since the semiconductor light emitting device manufactured in this way can suppress the mounting position shift when mounting the light conversion member, it suppresses the deviation of the emitted light and the variation in chromaticity, and thus the manufacturing yield. Can be improved.

本発明によれば、光変換部材の搭載精度を向上させることにより、発光する光の偏り及び色度のばらつきを抑制し、延いては製造歩留まりを向上させることができる。   According to the present invention, by improving the mounting accuracy of the light conversion member, it is possible to suppress the deviation of the emitted light and the variation in chromaticity, thereby improving the manufacturing yield.

本発明の第1の実施形態に係る半導体発光装置の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the semiconductor light-emitting device concerning the 1st Embodiment of this invention. 本発明の第1の実施形態の変形例に係る半導体発光装置の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the semiconductor light-emitting device which concerns on the modification of the 1st Embodiment of this invention. 本発明の第1の実施形態の変形例に係る半導体発光装置の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the semiconductor light-emitting device which concerns on the modification of the 1st Embodiment of this invention. 本発明の第2の実施形態に係る半導体発光装置の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the semiconductor light-emitting device concerning the 2nd Embodiment of this invention. (a)〜(f)は、本発明の第2の実施形態に係る半導体発光装置の製造方法に係る工程を示す断面図である。(A)-(f) is sectional drawing which shows the process which concerns on the manufacturing method of the semiconductor light-emitting device concerning the 2nd Embodiment of this invention. 本発明の第2の実施形態の変形例1に係る半導体発光装置の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the semiconductor light-emitting device which concerns on the modification 1 of the 2nd Embodiment of this invention. (a)〜(d)は、本発明の第2の実施形態の変形例1に係る半導体発光装置を実装する場合の工程を示す断面図である。(A)-(d) is sectional drawing which shows the process in the case of mounting the semiconductor light-emitting device which concerns on the modification 1 of the 2nd Embodiment of this invention. 本発明の第2の実施形態の変形例2に係る半導体発光装置の概略構成を示す断面図である。It is sectional drawing which shows schematic structure of the semiconductor light-emitting device which concerns on the modification 2 of the 2nd Embodiment of this invention. (a)〜(f)は、本発明の第2の実施形態の変形例2に係る半導体発光装置の製造方法に係る工程を示す断面図である。(A)-(f) is sectional drawing which shows the process which concerns on the manufacturing method of the semiconductor light-emitting device which concerns on the modification 2 of the 2nd Embodiment of this invention. (a)及び(b)は、本発明の各実施形態に係る半導体発光装置の製造方法の変形例を説明する断面図である。(A) And (b) is sectional drawing explaining the modification of the manufacturing method of the semiconductor light-emitting device which concerns on each embodiment of this invention.

以下、本発明の一実施形態について図面を参照して説明する。なお、以下に示す図面において、理解の容易及び視認性向上のため、断面図であってもハッチングを適宜省略している。以下の説明において、同一の構成には同一の符号を付し、その説明を省略する。   Hereinafter, an embodiment of the present invention will be described with reference to the drawings. In the drawings shown below, hatching is appropriately omitted even in a cross-sectional view for easy understanding and improved visibility. In the following description, the same components are denoted by the same reference numerals, and the description thereof is omitted.

(第1の実施形態)
本発明の第1の実施形態に係る半導体発光装置について説明する。
図1に示すように、本実施形態に係る半導体発光装置10は、裏面電極11bが設けられた発光素子11、発光素子11の上面に設けられた第1の蛍光体層12、第1の蛍光体層の上面に設けられた光透過性基板13、発光素子11及び第1の蛍光体層12の側面を覆う第2の蛍光体層14、第2の蛍光体層を覆う光反射部材(光制御部材)15と、を備えている。
(First embodiment)
A semiconductor light emitting device according to a first embodiment of the present invention will be described.
As shown in FIG. 1, the semiconductor light emitting device 10 according to this embodiment includes a light emitting element 11 provided with a back electrode 11b, a first phosphor layer 12 provided on the upper surface of the light emitting element 11, and a first fluorescent light. A light transmissive substrate 13 provided on the upper surface of the body layer, the second phosphor layer 14 covering the side surfaces of the light emitting element 11 and the first phosphor layer 12, and a light reflecting member (light) covering the second phosphor layer. Control member) 15.

発光素子11は、発光層11aからの光を発光させる発光面を上面及び側面に有するフリップチップ型の半導体発光素子を適用している。発光素子11の下面に形成された1対の素子電極(裏面電極)11bは光反射部材14に覆われておらず、発光素子11の裏面と接触している部分以外の全てが外部に露出している。   As the light emitting element 11, a flip chip type semiconductor light emitting element having a light emitting surface for emitting light from the light emitting layer 11a on the upper surface and side surfaces is applied. The pair of element electrodes (back surface electrodes) 11b formed on the lower surface of the light emitting element 11 is not covered with the light reflecting member 14, and everything except the portion in contact with the rear surface of the light emitting element 11 is exposed to the outside. ing.

第1の蛍光体層12は、発光素子11の上面に配置され、発光素子11と同等の大きさとなっている。光透過性基板13は、第1の蛍光体層12よりもやや大きな矩形状をなし、第1の蛍光体層の上面に配置されている。第2の蛍光体層14は、発光素子11および第1の蛍光体層12の側面、及び光透過性基板13の下面の第1の蛍光体層12から露出した周縁部を覆うように設けられている。第2の蛍光体層14の側面は、発光素子11の側面と光透過性基板13の側面の下端を結ぶ傾斜面になっている。光反射部材15は、光透過性基板13の側面と第2の蛍光体層14の側面とを覆うように設けられている。   The first phosphor layer 12 is disposed on the upper surface of the light emitting element 11 and has the same size as the light emitting element 11. The light transmissive substrate 13 has a rectangular shape slightly larger than the first phosphor layer 12 and is disposed on the upper surface of the first phosphor layer. The second phosphor layer 14 is provided so as to cover the side surfaces of the light emitting element 11 and the first phosphor layer 12 and the peripheral edge exposed from the first phosphor layer 12 on the lower surface of the light-transmitting substrate 13. ing. The side surface of the second phosphor layer 14 is an inclined surface connecting the side surface of the light emitting element 11 and the lower end of the side surface of the light transmissive substrate 13. The light reflecting member 15 is provided so as to cover the side surface of the light transmissive substrate 13 and the side surface of the second phosphor layer 14.

図2に示すように光反射部材15を設けない構造とすることもできる。このような構造にすることで、側面光も利用することができるので、発光の広がりが大きくなり、下地が白色系の基板に実装することで照明効率を向上させることができる。図2のような半導体発光装置は、主として、一般照明、Chip On Boad(COB)光源、LED電球等に適している。また、半導体発光装置を実装する際に、近接実装を可能とするため、間隙の暗線を目立たなくすることができる。
また、図3に示すように、光透過性基板13および第2の蛍光体層14を設けない構造とすることもできる。このような構造にすることで、発光素子サイズに近い光源サイズにできる(チップサイズパッケージ:CSP)他、半導体発光装置の正面輝度を向上させることができる。正面輝度が向上した半導体発光装置は、例えば、ヘッドランプやDRLなどに適用することができる。
As shown in FIG. 2, the light reflecting member 15 may not be provided. With such a structure, side light can also be used, so that the spread of light emission is increased, and lighting efficiency can be improved by mounting the base on a white substrate. The semiconductor light emitting device as shown in FIG. 2 is mainly suitable for general lighting, a chip on board (COB) light source, an LED bulb, and the like. Further, when mounting the semiconductor light emitting device, close mounting is possible, so that dark lines in the gap can be made inconspicuous.
Moreover, as shown in FIG. 3, it can also be set as the structure which does not provide the transparent substrate 13 and the 2nd fluorescent substance layer 14. As shown in FIG. With such a structure, the light source size close to the light emitting element size can be obtained (chip size package: CSP), and the front luminance of the semiconductor light emitting device can be improved. A semiconductor light-emitting device with improved front luminance can be applied to, for example, a headlamp or a DRL.

(第2の実施形態)
図4に示すように、第2の実施形態に係る半導体発光装置は、発光素子11に、発光層11aを貫通するビア電極を複数配置(図示せず)し、発光層11aからの光を発光させる発光面を上面及び側面に有するフリップチップ型半導体発光素子を適用している。このような半導体発光素子を適用することで、第1の実施形態におけるフリップチップ型の発光素子を適用する場合に比して、非発光部が小さく、電流拡散効率が良く、裏面電極パターンを段差なく対称に配置することができる。このため、Auバンプ接合工法を必要とせず、共晶接合など、より安価な実装が可能となる。また、第1の実施形態に係る半導体発光装置に比べて、P−N接合の段差が少ないため、第2の蛍光体層14をより高精度に配置することができる。
(Second Embodiment)
As shown in FIG. 4, in the semiconductor light emitting device according to the second embodiment, a plurality of via electrodes (not shown) penetrating the light emitting layer 11a are arranged in the light emitting element 11, and the light from the light emitting layer 11a is emitted. A flip chip type semiconductor light emitting device having light emitting surfaces to be formed on the upper surface and side surfaces is applied. By applying such a semiconductor light emitting element, the non-light emitting portion is small, current diffusion efficiency is good, and the back electrode pattern is stepped as compared with the case where the flip chip type light emitting element in the first embodiment is applied. Can be arranged symmetrically. For this reason, an Au bump bonding method is not required, and more inexpensive mounting such as eutectic bonding is possible. In addition, since the step of the PN junction is small as compared with the semiconductor light emitting device according to the first embodiment, the second phosphor layer 14 can be arranged with higher accuracy.

発光素子11の上面には、発光素子11と同等の大きさの第1の蛍光体層12、第1の蛍光体層12よりもやや大きな矩形状の光透過性基板13が順に配置され、発光素子11および第1の蛍光体層12の側面及び光透過性基板13の下面の第1の蛍光体層12から露出した周縁部を覆うように第2の蛍光体層14が設けられている。また、光透過性基板13の側面と第2の蛍光体層14の側面とを覆うように光反射部材(光制御部材)15が設けられている。   On the upper surface of the light emitting element 11, a first phosphor layer 12 having the same size as the light emitting element 11 and a rectangular light-transmitting substrate 13 that is slightly larger than the first phosphor layer 12 are disposed in order. A second phosphor layer 14 is provided so as to cover the peripheral surfaces exposed from the first phosphor layer 12 on the side surfaces of the element 11 and the first phosphor layer 12 and the lower surface of the light-transmitting substrate 13. A light reflecting member (light control member) 15 is provided so as to cover the side surface of the light-transmitting substrate 13 and the side surface of the second phosphor layer 14.

次に、このように構成された図4に示す半導体発光装置10の製造方法について説明する。
従来の半導体発光装置の製造工程は、実装基板に発光素子を実装した後に、波長変換層(蛍光体層)や光反射部材を配置していくのが一般的である。これに対し、本実施形態に係る半導体発光装置10は、発光素子を実装基板に実装することなく製造する。このため、発光素子に設けられた裏面電極を露出させることができるという利点がある。
Next, a method for manufacturing the semiconductor light emitting device 10 configured as described above and shown in FIG. 4 will be described.
In a conventional manufacturing process of a semiconductor light emitting device, a wavelength conversion layer (phosphor layer) and a light reflecting member are generally arranged after mounting a light emitting element on a mounting substrate. On the other hand, the semiconductor light emitting device 10 according to this embodiment is manufactured without mounting the light emitting element on the mounting substrate. For this reason, there exists an advantage that the back surface electrode provided in the light emitting element can be exposed.

以下、図5を参照しつつ具体的な製造方法について説明する。
図5(a)は、上面からみて矩形状であり、半導体発光装置10を収容可能な大きさの第1の凹部21が複数形成された離形冶具20の断面図である。離形冶具は、半導体発光装置の個数に対応した複数の矩形状の第1の凹部21がマトリクス状に複数形成されたものであり、第1の凹部21の底面には光透過性基板13の大きさと略等しい大きさかつ、光透過性基板13の厚みよりも浅い第2の凹部22が形成され、第2の凹部22の中心に真空吸着用の吸着孔23が形成されている。
Hereinafter, a specific manufacturing method will be described with reference to FIG.
FIG. 5A is a cross-sectional view of a release tool 20 that is rectangular when viewed from above and has a plurality of first recesses 21 that are large enough to accommodate the semiconductor light emitting device 10. The release tool is formed by forming a plurality of rectangular first recesses 21 corresponding to the number of semiconductor light emitting devices in a matrix, and the bottom surface of the first recess 21 has a light transmitting substrate 13. A second recess 22 having a size substantially equal to the size and shallower than the thickness of the light-transmitting substrate 13 is formed, and a suction hole 23 for vacuum suction is formed at the center of the second recess 22.

図5(b)に示すように、予め所定サイズに加工された光透過性基板13と、光透過性基板13の中心部に第1の蛍光体層12が形成されたものを第1の凹部21の底面の中心位置に配置、すなわち、第2の凹部22に嵌め込み、吸着孔23を介して真空吸着する。   As shown in FIG. 5B, a light transmitting substrate 13 that has been processed in advance to a predetermined size, and the first recess 12 is formed by forming the first phosphor layer 12 at the center of the light transmitting substrate 13. Arranged at the center position of the bottom surface of 21, that is, fitted into the second recess 22, and vacuum suctioned through the suction hole 23.

第1の蛍光体層12は、例えば、蛍光体を半硬化性樹脂に分散したシート状のものを光透過性基板13に熱圧着させることで形成することができる。第2の凹部22は光透過性基板13と略等しい大きさに形成されているため、光透過性基板13を第2の凹部22に嵌め込むことで、光透過性基板13を搭載する際に位置ずれが生じないため、その後に積み上げる第1の蛍光体層14の光透過性基板13に対する位置ずれも抑制することができる。   The first phosphor layer 12 can be formed, for example, by thermocompression bonding a sheet-like material in which the phosphor is dispersed in a semi-curable resin to the light-transmitting substrate 13. Since the second recess 22 is formed to be approximately the same size as the light transmissive substrate 13, when the light transmissive substrate 13 is mounted by fitting the light transmissive substrate 13 into the second recess 22. Since the positional deviation does not occur, the positional deviation of the first phosphor layer 14 stacked thereafter with respect to the light transmissive substrate 13 can also be suppressed.

次に、図5(c)に示すように、発光素子11の上面(発光面:例えば、サファイア透明基板側)を下にして、第1の蛍光体層12の上に搭載し、加熱圧着することで部材間の接合を行う。
図5(d)に示すように、未硬化の第2の蛍光体層14を、光透過性基板13の露出した面と、第1の蛍光体層12の側面と、発光素子11側面とを覆うように、第1の凹部21の隙間からディスペンス装置等で塗布することによりフィレット形状に軽鎖させた形状に形成し、熱硬化させる。第2の蛍光体層14は、発光素子11の側面からの光を波長変換し、フィレット形状による傾斜によって光透過性基板13へ光を導く。第2の蛍光体層14の蛍光体濃度は第1の蛍光体層12の蛍光体濃度よりも低い濃度に調整する。
Next, as shown in FIG. 5C, the light-emitting element 11 is mounted on the first phosphor layer 12 with the upper surface (light-emitting surface: for example, sapphire transparent substrate side) facing down, and thermocompression-bonded. By doing so, the members are joined.
As shown in FIG. 5D, the uncured second phosphor layer 14 is formed by combining the exposed surface of the light-transmitting substrate 13, the side surface of the first phosphor layer 12, and the side surface of the light emitting element 11. As a cover, it is formed from a gap between the first recesses 21 with a dispensing device or the like to form a light chain in a fillet shape and is thermoset. The second phosphor layer 14 converts the wavelength of the light from the side surface of the light emitting element 11 and guides the light to the light transmissive substrate 13 by the inclination due to the fillet shape. The phosphor concentration of the second phosphor layer 14 is adjusted to be lower than the phosphor concentration of the first phosphor layer 12.

従来の半導体発光装置では、発光素子の上面に蛍光体層や光透過性基板を積み上げて順次配置するため、発光素子のサイズよりも大きい光透過性基板が干渉して、第2の蛍光体層の形成が困難となる。これに対し、本実施形態に係る半導体発光装置の製造方法によれば、積層順序が逆であるため、すなわち、光透過性基板13から積み上げていくので、第2の蛍光体層14を塗布するための隙間を確保することができ、安定して第2の蛍光体層14を形成することができる。   In the conventional semiconductor light emitting device, since the phosphor layer and the light transmissive substrate are stacked and sequentially arranged on the upper surface of the light emitting element, the light transmissive substrate larger than the size of the light emitting element interferes with the second phosphor layer. It becomes difficult to form. On the other hand, according to the manufacturing method of the semiconductor light emitting device according to the present embodiment, the second phosphor layer 14 is applied because the stacking order is reversed, that is, the layers are stacked from the light transmissive substrate 13. Therefore, the second phosphor layer 14 can be stably formed.

続いて、図5(e)に示すように、第1の凹部21の隙間に光反射部材15、例えばシリコーン樹脂に酸化チタンを混合したものをディスペンス装置等で塗布形成し、熱硬化させる。このとき、第1の凹部21の深さは、発光素子11裏面(図5の上側)に設けられた裏面電極11bが第1の凹部21上面から露出する高さとしている。従って、光反射部材15は、光透過性基板13の側面及び第2の蛍光体層14の側面を覆いながら、表面張力によって液面を高さ制御することで、発光素子11の裏面電極11bを含む発光素子を光反射部材15から露出させることができる。   Subsequently, as shown in FIG. 5 (e), a light reflecting member 15, for example, a mixture of silicone resin and titanium oxide is applied and formed in the gap between the first recesses 21 with a dispensing device or the like, and is thermally cured. At this time, the depth of the first recess 21 is set to a height at which the back electrode 11b provided on the back surface of the light emitting element 11 (upper side in FIG. 5) is exposed from the top surface of the first recess 21. Therefore, the light reflecting member 15 controls the height of the liquid surface by the surface tension while covering the side surface of the light transmissive substrate 13 and the side surface of the second phosphor layer 14, so that the back surface electrode 11 b of the light emitting element 11 is formed. The included light emitting element can be exposed from the light reflecting member 15.

次に、図5(f)に示したように光反射部材15の熱硬化後に離型冶具から個々の半導体発光装置を取り外す。このとき、冶具の第2の凹部22の中心設けられた吸着孔23から突き上げピンで押し上げることで、半導体発光装置を容易に離型させることができる。なお、離型冶具は、例えば、金型に離型コート処理したもの、テフロン(登録商標)成型品、耐熱性熱可塑樹脂成型品にフッ素コート処理したもの等を適宜用いることができる。   Next, as shown in FIG. 5F, the individual semiconductor light emitting devices are removed from the mold release jig after the light reflecting member 15 is thermally cured. At this time, the semiconductor light emitting device can be easily released by pushing up from the suction hole 23 provided at the center of the second recess 22 of the jig with a push-up pin. As the release jig, for example, a mold subjected to a release coating treatment, a Teflon (registered trademark) molded product, a heat-resistant thermoplastic resin molded product subjected to a fluorine coating treatment, or the like can be appropriately used.

このようにして離型した複数の半導体発光装置は、発光素子11の裏面電極11bが外部に露出した状態となり、半導体発光装置として完成した状態で、基板実装することができる。すなわち、従来の半導体発光装置に比べて、小型化が可能であり、離型冶具を用いていることから実装基板を用いることなく製造することができ、光透過性基板や第1の蛍光体層(光変換部材)の搭載位置ずれを抑制することができるので、半導体発光装置が発光する光の偏り及び色度のばらつきを抑制することができる。また、半導体発光装置を個々に製造しているため、ダイシング工程が不要となり、歩留まり向上やコストの低減を図ることができる。さらに、製造過程において、吸着孔23を介して半導体発光装置の発光状態を確認することができるという利点もある。   The plurality of separated semiconductor light emitting devices can be mounted on the substrate in a state where the back electrode 11b of the light emitting element 11 is exposed to the outside and completed as a semiconductor light emitting device. That is, it can be reduced in size as compared with a conventional semiconductor light emitting device, and can be manufactured without using a mounting substrate because a mold release tool is used. The light-transmitting substrate and the first phosphor layer can be manufactured. Since the mounting position shift of the (light converting member) can be suppressed, the deviation of light emitted from the semiconductor light emitting device and the variation in chromaticity can be suppressed. In addition, since the semiconductor light emitting devices are individually manufactured, a dicing process is not necessary, and yield can be improved and costs can be reduced. Furthermore, there is also an advantage that the light emitting state of the semiconductor light emitting device can be confirmed through the suction holes 23 in the manufacturing process.

(第2の実施形態の変形例1)
図6に示すように光反射部材15を設けない構造とすることもできる。このような構造にすることで、側面光も利用することができるので、発光の広がりが大きくなり、下地が白色系の基板に実装することで照明効率を向上させることができる。このような半導体発光装置は、主として、一般照明、Chip On Boad(COB)光源、LED電球等に適している。また、半導体発光装置を実装する際に、近接実装を可能とするため、間隙の暗線を目立たなくすることができる。
(Modification 1 of 2nd Embodiment)
As shown in FIG. 6, the light reflecting member 15 may not be provided. With such a structure, side light can also be used, so that the spread of light emission is increased, and lighting efficiency can be improved by mounting the base on a white substrate. Such a semiconductor light-emitting device is mainly suitable for general illumination, a chip on board (COB) light source, an LED bulb, and the like. Further, when mounting the semiconductor light emitting device, close mounting is possible, so that dark lines in the gap can be made inconspicuous.

このような光反射部材(光制御部材)15を設けない図6の半導体発光装置10は、第2の実施形態に係る半導体発光装置の製造工程である図5(a)〜(d)の工程に従って製造することができる。以下、このような図6の半導体発光装置の実装例について図7を参照して説明する。
図7(a)は、予め多層配線された回路基板40を実装基板として準備し、回路基板40の実装面における所定電極パターンに所定間隔で半導体発光装置を実装する。
図6の半導体発光装置は、外形サイズが離型治具の凹部によって定義されるので、寸法精度の高い凹部パターン加工によって、高精度の外形寸法を実現できる。このため、隣接する半導体発光装置同士の間隙を50μm以下に抑えることができる。
なお、従来の半導体発光装置は、外形サイズはダイシング工程に依存しているため、ダイシング装置のピッチ公差や削り幅公差が影響して、半導体発光装置同士の間隙を100μm以下に抑えることができない。
The semiconductor light emitting device 10 of FIG. 6 without the light reflecting member (light control member) 15 is a process of FIGS. 5A to 5D which is a manufacturing process of the semiconductor light emitting device according to the second embodiment. Can be manufactured according to. Hereinafter, a mounting example of the semiconductor light emitting device of FIG. 6 will be described with reference to FIG.
In FIG. 7A, a circuit board 40 that has been multilayered in advance is prepared as a mounting board, and semiconductor light emitting devices are mounted at predetermined intervals on a predetermined electrode pattern on the mounting surface of the circuit board 40.
In the semiconductor light emitting device of FIG. 6, since the outer size is defined by the recess of the release jig, a highly accurate outer dimension can be realized by processing the recess pattern with high dimensional accuracy. For this reason, the gap between adjacent semiconductor light emitting devices can be suppressed to 50 μm or less.
Since the conventional semiconductor light emitting device depends on the dicing process in terms of the outer size, the gap between the semiconductor light emitting devices cannot be suppressed to 100 μm or less due to the influence of the pitch tolerance and the cutting width tolerance of the dicing apparatus.

次に、図7(b)に示すように、光反射部材を隙間に流し込むためのダム枠41をディスペンス装置(図示せず)にて塗布形成、硬化させる。ダム枠41内と半導体発光装置の側面を埋める光反射部材15(白樹脂)を充填、硬化させることで(図7(c))、光透過性基板13の上面が露出した状態のマトリックス光源ユニットが得られる(図7(d))。   Next, as shown in FIG. 7 (b), the dam frame 41 for pouring the light reflecting member into the gap is coated and formed by a dispensing device (not shown). A matrix light source unit in which the upper surface of the light-transmitting substrate 13 is exposed by filling and curing the light reflecting member 15 (white resin) filling the inside of the dam frame 41 and the side surface of the semiconductor light emitting device (FIG. 7C). Is obtained (FIG. 7D).

図7の例では、3×3配列の光源ユニットの例を示したが、配列数はこれに限定されず、適用する光学系に応じて適宜選択される。例えば、車両用前照灯(ヘッドランプ)の場合は1×4〜5の配列、デイタイムランニングランプ(白色DRL)の場合は2×2、DRL兼ターンランプ光源(白色と橙色)の場合は3×3(白4、橙5)、アダプティブドライビングビーム(ADB)の場合は5×20、等の配列とすることができる。
また、図8に示すように、光透過性基板13および第2の蛍光体層14を設けない構造とすることもできる。このような構造にすることで、発光素子サイズに近い光源サイズにできる(チップサイズパッケージ:CSP)他、半導体発光装置の正面輝度を向上させることができる。正面輝度が向上した半導体発光装置は、例えば、ヘッドランプやDRLなどに適用することができる。
In the example of FIG. 7, an example of a 3 × 3 light source unit is shown, but the number of arrays is not limited to this, and is appropriately selected according to the optical system to be applied. For example, in the case of a vehicle headlamp (headlamp), a 1 × 4 to 5 array, in the case of a daytime running lamp (white DRL), 2 × 2, in the case of a DRL and turn lamp light source (white and orange) In the case of 3 × 3 (white 4 and orange 5) and adaptive driving beam (ADB), 5 × 20 or the like can be arranged.
Moreover, as shown in FIG. 8, it can also be set as the structure which does not provide the transparent substrate 13 and the 2nd fluorescent substance layer 14. As shown in FIG. With such a structure, the light source size close to the light emitting element size can be obtained (chip size package: CSP), and the front luminance of the semiconductor light emitting device can be improved. A semiconductor light-emitting device with improved front luminance can be applied to, for example, a headlamp or a DRL.

(第2の実施形態の変形例2)
以下に、図8に示す光透過性基板を設けない半導体発光装置の製造方法について図9を参照して説明する。
図9(a)は、上面からみて矩形状の収容可能な大きさの第1の凹部21が複数形成された離形冶具20の断面図である。第2の凹部22は第1の蛍光体層12の大きさと略等しい大きさ、かつ、第1の蛍光体層12の厚みよりも浅い第2の凹部22が形成され、第2の凹部22の中心に真空吸着用の吸着孔23が形成されている。
(Modification 2 of the second embodiment)
Hereinafter, a method for manufacturing the semiconductor light emitting device without the light transmissive substrate shown in FIG. 8 will be described with reference to FIG.
FIG. 9A is a cross-sectional view of the release tool 20 in which a plurality of first recesses 21 having a rectangular shape that can be accommodated as viewed from above are formed. The second recess 22 is formed with a second recess 22 having a size substantially equal to the size of the first phosphor layer 12 and shallower than the thickness of the first phosphor layer 12. A suction hole 23 for vacuum suction is formed at the center.

図9(b)は、第1の凹部21底面に形成されている第2の凹部22に蛍光体層を配置し、吸着孔23を介して真空吸着した状態を示している。第1の蛍光体層12としては、例えば、蛍光体セラミックプレートを用いることができる。第1の蛍光体層12の上面に所定量の接着剤16を塗布する(図9(c))。接着剤16としては、耐熱性、耐光性のある透明材料(例えばシリコーン樹脂、フッ素樹脂、ゾルゲル無機バインダーなど)を用いることができる。   FIG. 9B shows a state in which the phosphor layer is arranged in the second recess 22 formed on the bottom surface of the first recess 21 and vacuum-adsorbed through the suction hole 23. For example, a phosphor ceramic plate can be used as the first phosphor layer 12. A predetermined amount of adhesive 16 is applied to the upper surface of the first phosphor layer 12 (FIG. 9C). As the adhesive 16, a transparent material having heat resistance and light resistance (for example, silicone resin, fluororesin, sol-gel inorganic binder, etc.) can be used.

次に、図9(d)に示すように、フリップチップ型の発光素子11の上面(サファイア透明基板側)を下にして第1の蛍光体層12の上に搭載し、接着剤を加熱硬化させる。第1の凹部21の隙間に光反射部材15を塗布形成し、熱硬化させる(図9(e))。光反射部材15の熱硬化後に、離型冶具20から個々の半導体発光装置を取り外す(図9(f))。   Next, as shown in FIG. 9 (d), the flip chip type light emitting element 11 is mounted on the first phosphor layer 12 with the upper surface (sapphire transparent substrate side) facing down, and the adhesive is heated and cured. Let The light reflecting member 15 is applied and formed in the gap between the first recesses 21 and thermally cured (FIG. 9E). After the light reflecting member 15 is thermally cured, the individual semiconductor light emitting devices are removed from the release jig 20 (FIG. 9F).

このようにして製造された半導体発光装置は、光透過性基板13および第2の蛍光体層14を設けていないため、更に小型化が可能となる。また、上述した第1の実施形態に係る半導体発光装置と同様に、実装基板を用いていないため、ダイシング工程が不要であり、歩留まり向上や低コストにもなる。   Since the semiconductor light emitting device manufactured in this way is not provided with the light transmissive substrate 13 and the second phosphor layer 14, the semiconductor light emitting device can be further reduced in size. Further, like the semiconductor light emitting device according to the first embodiment described above, a mounting substrate is not used, so that a dicing process is not required, and the yield is improved and the cost is reduced.

(半導体発光装置の製造方法の変形例)
上述した、半導体発光装置の製造方法において、以下のようにすることで、色度ばらつきをより低減させることができる。
図10(a)に、上述した各実施形態における第1の蛍光体層12を選別する工程を示した。図10(a)に示すように、予め色度マッピング検査装置(図示せず)によって個々の色度ランク(青色光励起の黄色波長変換層であれば、青色目から黄色目まで(例えば相関色温度=6500K〜4000K程度の範囲))に選別し、色度ランク毎に分類して収容したトレー30を準備する。
(Modification of manufacturing method of semiconductor light emitting device)
In the semiconductor light emitting device manufacturing method described above, the chromaticity variation can be further reduced by the following.
FIG. 10A shows a process of selecting the first phosphor layer 12 in each embodiment described above. As shown in FIG. 10 (a), each chromaticity rank (from blue eyes to yellow eyes in the case of a blue wavelength-excited yellow wavelength conversion layer (for example, correlated color temperature) = The range of about 6500K to 4000K)), and the trays 30 that are classified and stored for each chromaticity rank are prepared.

図10(b)に、発光素子11を選別する工程を示した。図10(b)は、予めチップソーティング装置(図示せず)によって発光素子11を、ドミナント波長毎に分類して収容したトレーを準備する。   FIG. 10B shows a process of selecting the light emitting element 11. In FIG. 10B, a tray in which the light emitting elements 11 are classified and stored for each dominant wavelength by a chip sorting device (not shown) is prepared in advance.

上述した半導体発光装置の製造方法に適応させるため、第1の蛍光体層12の色度ランクと発光素子11のドミナント波長ランクの組み合わせにおいて、蛍光体などの波長変換部材が持つ励起波長特性に応じた組み合わせを決定する。この組み合わせに従って製造された最終的な半導体発光装置の色度は、同一範囲に収まることが分かっており、各分類数を管理することで、色度歩留まりを格段に向上させることができる。
なお、従来の製造工程では、発光素子のドミナント波長を2.5nm範囲に分類したものをまとめて製造するのが限界であり、蛍光体層のばらつきと相俟って、色度ばらつきを抑えることが困難であった。
In order to adapt to the manufacturing method of the semiconductor light emitting device described above, the combination of the chromaticity rank of the first phosphor layer 12 and the dominant wavelength rank of the light emitting element 11 depends on the excitation wavelength characteristic of the wavelength conversion member such as the phosphor. Determine the combination. The chromaticity of the final semiconductor light emitting device manufactured according to this combination is known to fall within the same range, and the chromaticity yield can be significantly improved by managing the number of each classification.
In addition, in the conventional manufacturing process, it is the limit to collectively manufacture the light emitting elements whose dominant wavelengths are classified into the 2.5 nm range, and it is possible to suppress variations in chromaticity in combination with variations in phosphor layers. It was difficult.

上述した各実施形態及びその変形例に係る半導体発光装置は一例であり、半導体発光装置に適用される各構成は以下のように適宜変更することができる。
光制御部材として、上述の例では、シリコーン樹脂に酸化チタンを混合した白色反射部材などの光反射部材を示したが、光反射部材に代えて、光透過性透明樹脂等の光制御部材を適用することで側面発光も可能な半導体発光装置を提供することができる。また、光制御部材として、波長変換機能を備えた第3の蛍光体層を適用することで、半導体発光装置を製造する際の最終工程の色度調整に適用することができる。
The semiconductor light emitting device according to each of the above-described embodiments and modifications thereof is an example, and each configuration applied to the semiconductor light emitting device can be appropriately changed as follows.
In the above example, a light reflecting member such as a white reflecting member in which titanium oxide is mixed with titanium oxide is shown as the light controlling member. However, instead of the light reflecting member, a light controlling member such as a light transmissive transparent resin is applied. Thus, it is possible to provide a semiconductor light emitting device capable of side light emission. Further, by applying a third phosphor layer having a wavelength conversion function as the light control member, it can be applied to chromaticity adjustment in the final process when manufacturing the semiconductor light emitting device.

上述の離型治具は、例えば、金型に離型コート処理したもの、テフロン(登録商標)成型品、耐熱性熱可塑樹脂成型品にフッ素コート処理したものを例示したが、これらの他、透明部材(例えば硬質ガラス、透明シリコーン樹脂、透明フッ素樹脂)を用いることができる。透明部材を用いることで、第1の蛍光体層12又は第2の蛍光体層14を配置した後に、発光素子11の裏面電極11bを導通、点灯させて、離型治具の透明下面側から発光を測定して色度調整(塗布量制御)が可能となるので、更に高精度に目標色度制御が可能となる。また、離型冶具が、第1の凹部21及び第2の凹部を有する例について説明したが、第2の凹部を形成しなくてもよい。   Examples of the above-mentioned release jigs include, for example, molds that have been mold-coated, Teflon (registered trademark) molded products, and heat-resistant thermoplastic resin molded products that have been fluorine-coated, A transparent member (for example, hard glass, transparent silicone resin, transparent fluororesin) can be used. By using the transparent member, after the first phosphor layer 12 or the second phosphor layer 14 is disposed, the back surface electrode 11b of the light emitting element 11 is turned on and turned on, and from the transparent lower surface side of the release jig. Since luminescence can be measured and chromaticity adjustment (application amount control) can be performed, target chromaticity control can be performed with higher accuracy. Moreover, although the mold release jig demonstrated the example which has the 1st recessed part 21 and the 2nd recessed part, it is not necessary to form a 2nd recessed part.

また、発光素子11として、サファイア透明基板上に半導体層を成長させたフリップチップ型素子を示したが、他には、SiC成長基板、GaN成長基板など、裏面からアノード電極とカソード電極を配置できる発光素子も適用することができる。   Moreover, although the flip chip type | mold element which grew the semiconductor layer on the sapphire transparent substrate was shown as the light emitting element 11, an anode electrode and a cathode electrode can be arrange | positioned from a back surface, such as a SiC growth substrate and a GaN growth substrate, others. A light-emitting element can also be used.

このように上述した各実施形態及びその変形例に係る半導体発光装置によれば、光変換部材の搭載精度を向上させることにより、照射させる光の偏り及び色度のばらつきを抑制し、延いては製造歩留まりを向上させることができる。上述した各実施形態及びその変形例に係る半導体発光装置は、DRLやADB等の車両用灯具に適用することができる。   As described above, according to the semiconductor light emitting device according to each of the embodiments and the modifications described above, by improving the mounting accuracy of the light conversion member, it is possible to suppress the unevenness of light to be irradiated and the variation in chromaticity, and to extend. The production yield can be improved. The semiconductor light emitting devices according to the above-described embodiments and modifications thereof can be applied to vehicle lamps such as DRL and ADB.

10・・・半導体発光装置、11・・・発光素子、11a・・・発光層、11b・・・裏面電極、12・・・第1の蛍光体層、13・・・光透過性部材、14・・・第2の蛍光体層、15・・・光反射部材、16・・・接着剤、20・・・離型冶具、21・・・第1の凹部、22・・・第2の凹部、23・・・吸着孔、40・・・回路基板、41・・・ダム枠

DESCRIPTION OF SYMBOLS 10 ... Semiconductor light-emitting device, 11 ... Light emitting element, 11a ... Light emitting layer, 11b ... Back electrode, 12 ... 1st fluorescent substance layer, 13 ... Light transmissive member, 14 ... 2nd fluorescent substance layer, 15 ... Light reflecting member, 16 ... Adhesive, 20 ... Release tool, 21 ... 1st recessed part, 22 ... 2nd recessed part , 23 ... Adsorption holes, 40 ... Circuit board, 41 ... Dam frame

Claims (10)

発光素子と、
該発光素子の下面に設けられた裏面電極と、
前記発光素子の上面に設けられた第1の蛍光体層と、
前記発光素子及び前記第1の蛍光体層の側面を覆う光制御部材と、を備え、
前記発光素子の下面及び前記裏面電極の少なくとも下面が、前記光制御部材に覆われずに露出している半導体発光装置。
A light emitting element;
A back electrode provided on the lower surface of the light emitting element;
A first phosphor layer provided on an upper surface of the light emitting element;
A light control member covering a side surface of the light emitting element and the first phosphor layer,
A semiconductor light emitting device in which a lower surface of the light emitting element and at least a lower surface of the back electrode are exposed without being covered with the light control member.
前記第1の蛍光体層の上面に設けられた光透過性基板を備えた請求項1記載の半導体発光装置。   The semiconductor light-emitting device according to claim 1, further comprising a light-transmitting substrate provided on an upper surface of the first phosphor layer. 前記発光素子及び前記第1の蛍光体層の側面と前記光制御部材との間に設けられた第2の蛍光体層を備えた請求項1又は請求項2記載の半導体発光装置。   3. The semiconductor light emitting device according to claim 1, further comprising a second phosphor layer provided between a side surface of the light emitting element and the first phosphor layer and the light control member. 前記光制御部材が、光反射部材である請求項1乃至請求項3の何れか1項記載の半導体発光装置。   The semiconductor light emitting device according to claim 1, wherein the light control member is a light reflecting member. 前記光制御部材が、光透過性部材である請求項1乃至請求項3の何れか1項記載の半導体発光装置。   The semiconductor light emitting device according to claim 1, wherein the light control member is a light transmissive member. 前記光制御部材が、第3の蛍光体層である請求項1乃至請求項3の何れか1項記載の半導体発光装置。   The semiconductor light emitting device according to claim 1, wherein the light control member is a third phosphor layer. 前記裏面電極の前記発光素子の下面から突出した部分が露出している請求項1乃至請求項6の何れか1項記載の半導体発光装置。   The semiconductor light emitting device according to any one of claims 1 to 6, wherein a portion of the back electrode protruding from the lower surface of the light emitting element is exposed. 矩形状の凹部を有する離型冶具を用い、
該離型冶具の底面に第1の蛍光体層を嵌め込み、
該第1の蛍光体層の上に、発光素子の上面と前記第1の蛍光体層とが接するように前記発光素子を搭載して、前記第1の蛍光体層と前記発光素子とを接合し、
光制御部材を、前記凹部と前記第1の蛍光体層の側面及び前記発光素子の側面と前記凹部との間に塗布形成し、硬化させる半導体発光装置の製造方法。
Using a mold release tool having a rectangular recess,
The first phosphor layer is fitted on the bottom surface of the release jig,
The light emitting element is mounted on the first phosphor layer so that the upper surface of the light emitting element is in contact with the first phosphor layer, and the first phosphor layer and the light emitting element are bonded. And
A method of manufacturing a semiconductor light-emitting device, in which a light control member is applied and formed between the recess and the side surface of the first phosphor layer, and the side surface of the light-emitting element and the recess.
前記第1の蛍光体層に代えて、
予め光透過性基板と第1の蛍光体層とを接合させた合成シートを嵌め込む請求項8記載の半導体発光装置の製造方法。
In place of the first phosphor layer,
9. The method of manufacturing a semiconductor light emitting device according to claim 8, wherein a synthetic sheet in which a light transmitting substrate and a first phosphor layer are bonded in advance is fitted.
前記離型冶具の凹部の底面に設けられた吸着孔から、前記第1の蛍光体層を真空吸着する請求項8又は請求項9記載の半導体発光装置の製造方法。   10. The method of manufacturing a semiconductor light emitting device according to claim 8, wherein the first phosphor layer is vacuum-adsorbed from an adsorption hole provided in a bottom surface of a concave portion of the mold release jig.
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