JP2018028009A - Resin composition and cured product thereof - Google Patents
Resin composition and cured product thereof Download PDFInfo
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- JP2018028009A JP2018028009A JP2016159959A JP2016159959A JP2018028009A JP 2018028009 A JP2018028009 A JP 2018028009A JP 2016159959 A JP2016159959 A JP 2016159959A JP 2016159959 A JP2016159959 A JP 2016159959A JP 2018028009 A JP2018028009 A JP 2018028009A
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- JP
- Japan
- Prior art keywords
- group
- general formula
- resin composition
- substituent
- oligomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011342 resin composition Substances 0.000 title claims abstract description 33
- 239000003822 epoxy resin Substances 0.000 claims abstract description 32
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 32
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 15
- 239000004721 Polyphenylene oxide Substances 0.000 claims abstract description 14
- 229920006380 polyphenylene oxide Polymers 0.000 claims abstract description 14
- 239000004643 cyanate ester Substances 0.000 claims abstract description 13
- 229920003048 styrene butadiene rubber Polymers 0.000 claims abstract description 10
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 8
- 229920005989 resin Polymers 0.000 claims abstract description 8
- 239000011347 resin Substances 0.000 claims abstract description 8
- 125000001424 substituent group Chemical group 0.000 claims description 20
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 9
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 9
- 125000002947 alkylene group Chemical group 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 8
- 125000003277 amino group Chemical group 0.000 claims description 7
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 5
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 5
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 2
- 125000005415 substituted alkoxy group Chemical group 0.000 claims description 2
- 125000004646 sulfenyl group Chemical group S(*)* 0.000 claims description 2
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 2
- 125000004149 thio group Chemical group *S* 0.000 claims description 2
- 239000010409 thin film Substances 0.000 abstract description 19
- 239000002904 solvent Substances 0.000 abstract description 15
- 238000006243 chemical reaction Methods 0.000 abstract description 5
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- -1 dimethylmethylene group Chemical group 0.000 description 15
- 239000000203 mixture Substances 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 229910052801 chlorine Inorganic materials 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 description 6
- 235000013824 polyphenols Nutrition 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
- 239000000460 chlorine Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 229920000768 polyamine Polymers 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 4
- 238000004448 titration Methods 0.000 description 4
- QCBSYPYHCJMQGB-UHFFFAOYSA-N 2-ethyl-1,3,5-triazine Chemical compound CCC1=NC=NC=N1 QCBSYPYHCJMQGB-UHFFFAOYSA-N 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 2
- 238000005160 1H NMR spectroscopy Methods 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- 238000005084 2D-nuclear magnetic resonance Methods 0.000 description 2
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N 4-methylimidazole Chemical compound CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 0 C*c(c(*)c(C)c(*)c1*)c1OC Chemical compound C*c(c(*)c(C)c(*)c1*)c1OC 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 229920002633 Kraton (polymer) Polymers 0.000 description 2
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 2
- LJCFOYOSGPHIOO-UHFFFAOYSA-N antimony pentoxide Chemical compound O=[Sb](=O)O[Sb](=O)=O LJCFOYOSGPHIOO-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate group Chemical group [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 2
- 239000000347 magnesium hydroxide Substances 0.000 description 2
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 150000003505 terpenes Chemical class 0.000 description 2
- 235000007586 terpenes Nutrition 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- JDIPZHAYUYYGSN-UHFFFAOYSA-N (4-propylphenyl) cyanate Chemical compound CCCC1=CC=C(OC#N)C=C1 JDIPZHAYUYYGSN-UHFFFAOYSA-N 0.000 description 1
- RUEBPOOTFCZRBC-UHFFFAOYSA-N (5-methyl-2-phenyl-1h-imidazol-4-yl)methanol Chemical compound OCC1=C(C)NC(C=2C=CC=CC=2)=N1 RUEBPOOTFCZRBC-UHFFFAOYSA-N 0.000 description 1
- NSGXIBWMJZWTPY-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropane Chemical compound FC(F)(F)CC(F)(F)F NSGXIBWMJZWTPY-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- XZKLXPPYISZJCV-UHFFFAOYSA-N 1-benzyl-2-phenylimidazole Chemical compound C1=CN=C(C=2C=CC=CC=2)N1CC1=CC=CC=C1 XZKLXPPYISZJCV-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- NWOMMWVCNAOLOG-UHFFFAOYSA-N 1h-imidazol-5-ylmethanediol Chemical compound OC(O)C1=CN=CN1 NWOMMWVCNAOLOG-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- XKZQKPRCPNGNFR-UHFFFAOYSA-N 2-(3-hydroxyphenyl)phenol Chemical compound OC1=CC=CC(C=2C(=CC=CC=2)O)=C1 XKZQKPRCPNGNFR-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- QXSNXUCNBZLVFM-UHFFFAOYSA-N 2-methyl-1h-imidazole;1,3,5-triazinane-2,4,6-trione Chemical compound CC1=NC=CN1.O=C1NC(=O)NC(=O)N1 QXSNXUCNBZLVFM-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- RJIQELZAIWFNTQ-UHFFFAOYSA-N 2-phenyl-1h-imidazole;1,3,5-triazinane-2,4,6-trione Chemical compound O=C1NC(=O)NC(=O)N1.C1=CNC(C=2C=CC=CC=2)=N1 RJIQELZAIWFNTQ-UHFFFAOYSA-N 0.000 description 1
- WJQOZHYUIDYNHM-UHFFFAOYSA-N 2-tert-Butylphenol Chemical compound CC(C)(C)C1=CC=CC=C1O WJQOZHYUIDYNHM-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- BVYPJEBKDLFIDL-UHFFFAOYSA-N 3-(2-phenylimidazol-1-yl)propanenitrile Chemical compound N#CCCN1C=CN=C1C1=CC=CC=C1 BVYPJEBKDLFIDL-UHFFFAOYSA-N 0.000 description 1
- SZUPZARBRLCVCB-UHFFFAOYSA-N 3-(2-undecylimidazol-1-yl)propanenitrile Chemical compound CCCCCCCCCCCC1=NC=CN1CCC#N SZUPZARBRLCVCB-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- ANOPCGQVRXJHHD-UHFFFAOYSA-N 3-[3-(3-aminopropyl)-2,4,8,10-tetraoxaspiro[5.5]undecan-9-yl]propan-1-amine Chemical compound C1OC(CCCN)OCC21COC(CCCN)OC2 ANOPCGQVRXJHHD-UHFFFAOYSA-N 0.000 description 1
- TWISHTANSAOCNX-UHFFFAOYSA-N 4-(1,1,1,3,3,3-hexafluoropropan-2-yl)phthalic acid Chemical compound OC(=O)C1=CC=C(C(C(F)(F)F)C(F)(F)F)C=C1C(O)=O TWISHTANSAOCNX-UHFFFAOYSA-N 0.000 description 1
- IGSBHTZEJMPDSZ-UHFFFAOYSA-N 4-[(4-amino-3-methylcyclohexyl)methyl]-2-methylcyclohexan-1-amine Chemical compound C1CC(N)C(C)CC1CC1CC(C)C(N)CC1 IGSBHTZEJMPDSZ-UHFFFAOYSA-N 0.000 description 1
- KXEPRLUGFAULQX-UHFFFAOYSA-N 4-[2,5-di(propan-2-yl)phenyl]aniline Chemical compound CC(C)C1=CC=C(C(C)C)C(C=2C=CC(N)=CC=2)=C1 KXEPRLUGFAULQX-UHFFFAOYSA-N 0.000 description 1
- PRWJPWSKLXYEPD-UHFFFAOYSA-N 4-[4,4-bis(5-tert-butyl-4-hydroxy-2-methylphenyl)butan-2-yl]-2-tert-butyl-5-methylphenol Chemical compound C=1C(C(C)(C)C)=C(O)C=C(C)C=1C(C)CC(C=1C(=CC(O)=C(C=1)C(C)(C)C)C)C1=CC(C(C)(C)C)=C(O)C=C1C PRWJPWSKLXYEPD-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- YKCCXOHQOVXCIG-UHFFFAOYSA-N 5-(1-cyanoethyl)-2-(2-phenylethoxymethyl)imidazole-1,4-dicarbonitrile Chemical compound C(#N)C(C)C=1N(C(=NC=1C#N)COCCC1=CC=CC=C1)C#N YKCCXOHQOVXCIG-UHFFFAOYSA-N 0.000 description 1
- TYOXIFXYEIILLY-UHFFFAOYSA-N 5-methyl-2-phenyl-1h-imidazole Chemical compound N1C(C)=CN=C1C1=CC=CC=C1 TYOXIFXYEIILLY-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- QDZXJOMXPRWGFG-UHFFFAOYSA-N CCC1=NC=NC=N1.O=C1NC(=O)NC(=O)N1 Chemical compound CCC1=NC=NC=N1.O=C1NC(=O)NC(=O)N1 QDZXJOMXPRWGFG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 108010029541 Laccase Proteins 0.000 description 1
- NJGBMPJXNMSGAE-UHFFFAOYSA-N NC1=CC=C(C=C1)C(C)(C)C1=CC=C(C=C1)N.C1(=CC(=CC=C1)N)N Chemical compound NC1=CC=C(C=C1)C(C)(C)C1=CC=C(C=C1)N.C1(=CC(=CC=C1)N)N NJGBMPJXNMSGAE-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 241000222644 Pycnoporus <fungus> Species 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
- QHWKHLYUUZGSCW-UHFFFAOYSA-N Tetrabromophthalic anhydride Chemical compound BrC1=C(Br)C(Br)=C2C(=O)OC(=O)C2=C1Br QHWKHLYUUZGSCW-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- XZAHJRZBUWYCBM-UHFFFAOYSA-N [1-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1(CN)CCCCC1 XZAHJRZBUWYCBM-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- JNCRKOQSRHDNIO-UHFFFAOYSA-N [4-[(4-cyanato-3,5-dimethylphenyl)methyl]-2,6-dimethylphenyl] cyanate Chemical compound CC1=C(OC#N)C(C)=CC(CC=2C=C(C)C(OC#N)=C(C)C=2)=C1 JNCRKOQSRHDNIO-UHFFFAOYSA-N 0.000 description 1
- AHZMUXQJTGRNHT-UHFFFAOYSA-N [4-[2-(4-cyanatophenyl)propan-2-yl]phenyl] cyanate Chemical compound C=1C=C(OC#N)C=CC=1C(C)(C)C1=CC=C(OC#N)C=C1 AHZMUXQJTGRNHT-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QBLDFAIABQKINO-UHFFFAOYSA-N barium borate Chemical compound [Ba+2].[O-]B=O.[O-]B=O QBLDFAIABQKINO-UHFFFAOYSA-N 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- XFWJKVMFIVXPKK-UHFFFAOYSA-N calcium;oxido(oxo)alumane Chemical compound [Ca+2].[O-][Al]=O.[O-][Al]=O XFWJKVMFIVXPKK-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000012952 cationic photoinitiator Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 239000002734 clay mineral Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- 150000001913 cyanates Chemical class 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
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- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
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- 229910002804 graphite Inorganic materials 0.000 description 1
- CAYGQBVSOZLICD-UHFFFAOYSA-N hexabromobenzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1Br CAYGQBVSOZLICD-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000012796 inorganic flame retardant Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 150000004658 ketimines Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 125000005498 phthalate group Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- CVNKFOIOZXAFBO-UHFFFAOYSA-J tin(4+);tetrahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[Sn+4] CVNKFOIOZXAFBO-UHFFFAOYSA-J 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
本発明は、樹脂組成物及びその硬化物に関する。 The present invention relates to a resin composition and a cured product thereof.
エポキシ樹脂などに代表される樹脂組成物は、耐熱性、接着性、耐水性、機械的強度及び電気特性等に優れていることから、様々の分野で使用されている。特に、電気・電子分野では、絶縁注型、積層材料、封止材料等において幅広く使用されており、これらの用途に用いる場合には、誘電率、密着性、耐溶剤性などの物性が良好であることが求められている。 Resin compositions represented by epoxy resins and the like are excellent in heat resistance, adhesiveness, water resistance, mechanical strength, electrical properties, and the like, and thus are used in various fields. In particular, in the electrical and electronic fields, it is widely used in insulation casting, laminate materials, sealing materials, etc. When used in these applications, it has good physical properties such as dielectric constant, adhesion, and solvent resistance. There is a need to be.
例えば、特許文献1では、骨格中に脂環式構造を導入したエポキシ樹脂を使用する方法が提案されている。また、特許文献2には、耐熱性、接着性、及び加工性を損なうことなく、耐湿性が良好で、低誘電率及び低誘電正接である硬化物を与えるオリゴマー変性エポキシ樹脂が開示されている。 For example, Patent Document 1 proposes a method of using an epoxy resin in which an alicyclic structure is introduced into the skeleton. Patent Document 2 discloses an oligomer-modified epoxy resin that gives a cured product having good moisture resistance, low dielectric constant, and low dielectric loss tangent without impairing heat resistance, adhesiveness, and workability. .
しかし、特許文献1で提案された方法では樹脂の難燃性が低下するため、より多くの難燃剤を添加する必要がある。このため、得られる硬化物の誘電率が増大するといった課題が生じていた。また、特許文献2で開示されたオリゴマー変性エポキシ樹脂を硬化させて得られる硬化物は、近年の電気・電子分野において要求される密着性を十分に発現することが困難であった。なかでも、このオリゴマー変性エポキシ樹脂を硬化させて得られる厚さ1μm以下の薄膜については、PET等の基材への密着性及び耐溶剤性が低いといった課題があった。以上より、密着性及び耐溶剤性に優れた厚さ1μm以下の薄膜を形成しうる樹脂組成物が望まれていた。 However, since the flame retardancy of the resin is reduced by the method proposed in Patent Document 1, it is necessary to add more flame retardant. For this reason, the subject that the dielectric constant of the hardened | cured material obtained increased occurred. Moreover, it is difficult for the cured product obtained by curing the oligomer-modified epoxy resin disclosed in Patent Document 2 to sufficiently exhibit the adhesion required in the recent electric / electronic field. In particular, a thin film having a thickness of 1 μm or less obtained by curing the oligomer-modified epoxy resin has a problem that adhesion to a substrate such as PET and solvent resistance are low. From the above, there has been a demand for a resin composition capable of forming a thin film having a thickness of 1 μm or less that is excellent in adhesion and solvent resistance.
したがって、本発明は上記問題を解決するためになされたものであり、その課題とするところは、密着性が良好であるとともに、耐溶剤性が劣化しにくい、厚さ1μm以下の薄膜を形成することが可能な樹脂組成物を提供することにある。また、本発明の課題とするところは、上記樹脂組成物を硬化させて得られる硬化物を提供することにある。 Accordingly, the present invention has been made to solve the above-mentioned problems, and the object of the present invention is to form a thin film having a thickness of 1 μm or less that has good adhesion and is resistant to deterioration of solvent resistance. It is in providing the resin composition which can be performed. Moreover, the place made into the subject of this invention is providing the hardened | cured material obtained by hardening the said resin composition.
本発明者等は、上記課題を解決すべく鋭意検討を重ねた結果、特定の樹脂成分を配合した樹脂組成物が上記の課題を解決しうることを見出し、本発明に至った。 As a result of intensive studies to solve the above-mentioned problems, the present inventors have found that a resin composition containing a specific resin component can solve the above-mentioned problems, and have reached the present invention.
すなわち、本発明によれば、(A)数平均分子量が800〜10,000であり、下記一般式(1)で表される構成単位の含有割合が全体の60質量%以上であり、1分子中に平均1.2個以上のフェノール性水酸基を有するポリフェニレンオキシドオリゴマーと、エポキシ樹脂と、を反応させたオリゴマー変性エポキシ樹脂成分、並びに(B)スチレンブタジエンゴム、シアネートエステル、及びこれらの誘導体から選ばれる少なくとも1種の樹脂成分を含有する樹脂組成物が提供される。 That is, according to the present invention, (A) the number average molecular weight is 800 to 10,000, the content of the structural unit represented by the following general formula (1) is 60% by mass or more, and one molecule Selected from an oligomer-modified epoxy resin component obtained by reacting a polyphenylene oxide oligomer having an average of 1.2 or more phenolic hydroxyl groups with an epoxy resin, and (B) styrene butadiene rubber, cyanate ester, and derivatives thereof A resin composition containing at least one resin component is provided.
(前記一般式(1)中、R1、R2、R3及びR4は、各々独立して、置換基を有していてもよいアルキル基、置換基を有していてもよいアルコキシ基、置換基を有していてもよいフェニル基、置換基を有していてもよいアミノ基、カルボキシ基、ニトロ基、ハロゲン原子、又は水素原子を表し、*は結合手を表す) (In said general formula (1), R < 1 >, R < 2 >, R < 3 > and R < 4 > are each independently the alkyl group which may have a substituent, the alkoxy group which may have a substituent. A phenyl group which may have a substituent, an amino group which may have a substituent, a carboxy group, a nitro group, a halogen atom or a hydrogen atom, and * represents a bond)
また、本発明によれば、上記の樹脂組成物を硬化させた硬化物が提供される。 Moreover, according to this invention, the hardened | cured material which hardened said resin composition is provided.
本発明によれば、密着性が良好であるとともに、耐溶剤性が劣化しにくい、厚さ1μm以下の薄膜を形成することが可能な樹脂組成物を提供することができる。また、本発明によれば、上記樹脂組成物を硬化させて得られる硬化物を提供することができる。 According to the present invention, it is possible to provide a resin composition capable of forming a thin film having a thickness of 1 μm or less, which has good adhesion and hardly deteriorates solvent resistance. Moreover, according to this invention, the hardened | cured material obtained by hardening the said resin composition can be provided.
以下、本発明の実施の形態について具体的に説明する。本発明の樹脂組成物は、(A)特定のオリゴマー変性エポキシ樹脂成分(以下、「(A)成分」とも記す)と、(B)スチレンブタジエンゴム、シアネートエステル、及びこれらの誘導体から選ばれる少なくとも1種の樹脂成分(以下、「(B)成分」とも記す)とを含有する。 Hereinafter, embodiments of the present invention will be specifically described. The resin composition of the present invention is at least selected from (A) a specific oligomer-modified epoxy resin component (hereinafter also referred to as “(A) component”), (B) a styrene butadiene rubber, a cyanate ester, and derivatives thereof. 1 type of resin component (henceforth "(B) component") is contained.
本発明の樹脂組成物に用いる(A)成分は、数平均分子量が800〜10,000であり、下記一般式(1)で表される構成単位の含有割合が全体の60質量%以上であり、1分子中に平均1.2個以上のフェノール性水酸基を有するポリフェニレンオキシドオリゴマーと、エポキシ樹脂と、を反応させたオリゴマー変性エポキシ樹脂成分である。なお、(A)成分の加水分解性塩素濃度は、1,000ppm未満であることが好ましく、500ppm未満であることがさらに好ましい。 The component (A) used in the resin composition of the present invention has a number average molecular weight of 800 to 10,000, and the content of the structural unit represented by the following general formula (1) is 60% by mass or more of the whole. It is an oligomer-modified epoxy resin component obtained by reacting an epoxy resin with a polyphenylene oxide oligomer having an average of 1.2 or more phenolic hydroxyl groups in one molecule. In addition, the hydrolyzable chlorine concentration of the component (A) is preferably less than 1,000 ppm, and more preferably less than 500 ppm.
一般式(1)中、R1、R2、R3及びR4は、各々独立して、置換基を有していてもよいアルキル基、置換基を有していてもよいアルコキシ基、置換基を有していてもよいフェニル基、置換基を有していてもよいアミノ基、カルボキシ基、ニトロ基、ハロゲン原子、又は水素原子を表す。 In general formula (1), R 1 , R 2 , R 3 and R 4 are each independently an alkyl group which may have a substituent, an alkoxy group which may have a substituent, or a substituent. It represents a phenyl group which may have a group, an amino group which may have a substituent, a carboxy group, a nitro group, a halogen atom, or a hydrogen atom.
アルキル基としては、例えば、メチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、t−ブチル基、シクロヘキシル基等の直鎖状、分岐状、又は環状のアルキル基を挙げることができる。アルコキシ基としては、例えば、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基等を挙げることができる。これらのアルキル基及びアルコキシ基の炭素数は、1〜4であることが好ましい。ハロゲン原子としては、例えば、フッ素原子、塩素原子、臭素原子、及びヨウ素原子を挙げることができる。また、アルキル基、アルコキシ基、フェニル基、及びアミノ基に結合しうる置換基としては、例えば、炭素数1〜4のアルキル基、炭素数1〜4のアルコキシ基、フェニル基、及びハロゲン原子等を挙げることができる。なかでも、一般式(1)中、R2及びR4がメチル基であり、R1及びR3が水素原子であることが好ましい。 Examples of the alkyl group include linear, branched, or cyclic alkyl groups such as a methyl group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, a t-butyl group, and a cyclohexyl group. Can be mentioned. As an alkoxy group, a methoxy group, an ethoxy group, a propoxy group, a butoxy group etc. can be mentioned, for example. These alkyl groups and alkoxy groups preferably have 1 to 4 carbon atoms. As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom can be mentioned, for example. Examples of the substituent that can be bonded to an alkyl group, an alkoxy group, a phenyl group, and an amino group include, for example, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a phenyl group, and a halogen atom. Can be mentioned. Among them, in the general formula (1), R 2 and R 4 are methyl groups, it is preferred that R 1 and R 3 are hydrogen atoms.
ポリフェニレンオキシドオリゴマーは、一般式(1)で表される構成単位を主構成単位とし、下記一般式(2)で表される構成単位を主構成単位中に含むオリゴマーであることが好ましい。下記一般式(2)で表される構成単位を主構成単位中に含むポリフェニレンオキシドオリゴマーと、(B)成分とを組み合わせて用いると、PET等の基材への密着性がより良好であるとともに、耐溶剤性にさらに優れた、厚さ1μm以下の薄膜(硬化物)を形成しうる樹脂組成物とすることができる。 The polyphenylene oxide oligomer is preferably an oligomer having a structural unit represented by the general formula (1) as a main structural unit and a structural unit represented by the following general formula (2) in the main structural unit. When the polyphenylene oxide oligomer containing the structural unit represented by the following general formula (2) in the main structural unit is used in combination with the component (B), the adhesion to a substrate such as PET is better. In addition, a resin composition that is further excellent in solvent resistance and can form a thin film (cured product) having a thickness of 1 μm or less can be obtained.
(前記一般式(2)中、R5、R6、R7、R8、R9、R10、R11及びR12は、各々独立して、置換基を有していてもよいアルキル基、置換基を有していてもよいアルコキシ基、置換基を有していてもよいフェニル基、置換基を有していてもよいアミノ基、カルボキシ基、ニトロ基、ハロゲン原子、又は水素原子を表し、Xは、置換基を有していてもよいアルキレン基、カルボニル基、チオ基、スルフェニル基、スルホニル基、又は直接結合を表し、*は結合手を表す) (In the general formula (2), R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 are each independently an alkyl group which may have a substituent. , An optionally substituted alkoxy group, an optionally substituted phenyl group, an optionally substituted amino group, a carboxy group, a nitro group, a halogen atom, or a hydrogen atom. X represents an alkylene group which may have a substituent, a carbonyl group, a thio group, a sulfenyl group, a sulfonyl group, or a direct bond, and * represents a bond.
アルキル基、アルコキシ基、及びハロゲン原子の具体例、並びにアルキル基、アルコキシ基、フェニル基、及びアミノ基に結合しうる置換基の具体例としては、前述の一般式(1)中のR1、R2、R3及びR4と同様のものを挙げることができる。なかでも、一般式(2)中、R5、R7、R10及びR12がメチル基であり、R6、R8、R9及びR11が水素原子であることが好ましい。 Specific examples of the alkyl group, alkoxy group, and halogen atom, and specific examples of the substituent that can be bonded to the alkyl group, alkoxy group, phenyl group, and amino group include R 1 in the general formula (1), The same thing as R < 2 >, R < 3 > and R < 4 > can be mentioned. Among these, in general formula (2), R 5 , R 7 , R 10 and R 12 are preferably methyl groups, and R 6 , R 8 , R 9 and R 11 are preferably hydrogen atoms.
一般式(2)中、Xで表されるアルキレン基としては、例えば、メチレン基、エチレン基、トリメチレン基、プロピレン基、テトラメチレン基、シクロヘキシレン基等の直鎖状、分岐状、又は環状のアルキレン基を挙げることができる。これらのアルキレン基の炭素数は、1〜4であることが好ましい。また、アルキレン基に結合しうる置換基としては、例えば、アルキル基、フェニル基等を挙げることができる。一般式(2)中のXは、置換基を有していてもよいアルキレン基が好ましく、炭素数1〜4のアルキレン基がさらに好ましく、メチレン基、エチレン基、又はジメチルメチレン基が特に好ましい。 In general formula (2), examples of the alkylene group represented by X include linear, branched, or cyclic groups such as a methylene group, an ethylene group, a trimethylene group, a propylene group, a tetramethylene group, and a cyclohexylene group. An alkylene group can be mentioned. These alkylene groups preferably have 1 to 4 carbon atoms. Examples of the substituent that can be bonded to the alkylene group include an alkyl group and a phenyl group. X in the general formula (2) is preferably an alkylene group which may have a substituent, more preferably an alkylene group having 1 to 4 carbon atoms, and particularly preferably a methylene group, an ethylene group or a dimethylmethylene group.
(A)成分のポリスチレン換算の数平均分子量は800〜10,000であり、好ましくは800〜8,000である。(A)成分の数平均分子量が800未満であると、形成される硬化物の誘電特性の改良効果不十分になる。一方、(A)成分の数平均分子量が10,000超であると、樹脂組成物の溶融粘度が高くなり、成形性が低下する。 The number average molecular weight in terms of polystyrene of the component (A) is 800 to 10,000, preferably 800 to 8,000. When the number average molecular weight of the component (A) is less than 800, the effect of improving the dielectric properties of the formed cured product becomes insufficient. On the other hand, when the number average molecular weight of the component (A) is more than 10,000, the melt viscosity of the resin composition is increased and the moldability is lowered.
(A)成分としては、周知のオリゴマー変性エポキシ樹脂を用いることができる。そのようなオリゴマー変性エポキシ樹脂は、例えば、特許文献1に記載の方法にしたがって製造することができる。より具体的には、酵素触媒を用いる方法、ラジカル開始剤を用いる方法、及び錯体触媒を用いる方法などにより、(A)成分を製造することができる。 As the component (A), a known oligomer-modified epoxy resin can be used. Such an oligomer-modified epoxy resin can be produced, for example, according to the method described in Patent Document 1. More specifically, the component (A) can be produced by a method using an enzyme catalyst, a method using a radical initiator, a method using a complex catalyst, or the like.
本発明の樹脂組成物中の(A)成分の含有量は、10〜90質量%であることが好ましく、40〜80質量%であることがさらに好ましい。(A)成分の含有量を上記の範囲内とすることで、PET等の基材への密着性がより良好であるとともに、耐溶剤性にさらに優れた、厚さ1μm以下の薄膜(硬化物)を形成しうる樹脂組成物とすることができる。 The content of the component (A) in the resin composition of the present invention is preferably 10 to 90% by mass, and more preferably 40 to 80% by mass. By setting the content of the component (A) within the above range, a thin film (cured product) having a thickness of 1 μm or less, which has better adhesion to a substrate such as PET and further excellent solvent resistance ) Can be formed.
本発明の樹脂組成物に用いる(B)成分は、スチレンブタジエンゴム、シアネートエステル、及びこれらの誘導体から選ばれる少なくとも1種の樹脂成分である。 The component (B) used in the resin composition of the present invention is at least one resin component selected from styrene butadiene rubber, cyanate ester, and derivatives thereof.
スチレンブタジエンゴム及びその誘導体としては、例えば、スチレンブタジエン、水素添加スチレンブタジエン、酸変性水素添加スチレンブタジエン等を挙げることができる。スチレンブタジエンゴム及びその誘導体のより具体的な例としては、以下商品名で、クレイトン(登録商標)Gシリーズ(クレイトンポリマージャパン社製);タフテック(登録商標)Hシリーズ(旭化成社製);タフテック(登録商標)Pシリーズ(旭化成社製);タフテック(登録商標)Mシリーズ(旭化成社製)等を挙げることができる。さらに、これらのスチレンブタジエンゴム及びその誘導体を、マレイン酸等の酸で酸変性したものを用いることもできる。 Examples of the styrene butadiene rubber and derivatives thereof include styrene butadiene, hydrogenated styrene butadiene, acid-modified hydrogenated styrene butadiene, and the like. More specific examples of styrene butadiene rubber and derivatives thereof are as follows: Kraton (registered trademark) G series (manufactured by Kraton Polymer Japan); Tuftec (registered trademark) H series (manufactured by Asahi Kasei); Tuftec ( (Registered trademark) P series (manufactured by Asahi Kasei Co., Ltd.); Tuftec (registered trademark) M series (manufactured by Asahi Kasei Co., Ltd.). Furthermore, those obtained by acid-modifying these styrene butadiene rubbers and derivatives thereof with an acid such as maleic acid can also be used.
シアネートエステル及びその誘導体としては、例えば、下記一般式(3)で表される化合物及び下記一般式(4)で表される化合物等を挙げることができる。また、下記一般式(3)及び(4)中のシアネート基の一部がトリアジン環を形成したプレポリマーを用いることもできる。このようなプレポリマーとしては、例えば、下記一般式(3)で表される化合物の一部又は全部が3量化したもの等を挙げることができる。 As cyanate ester and its derivative (s), the compound represented by following General formula (3), the compound represented by following General formula (4), etc. can be mentioned, for example. Moreover, the prepolymer in which some cyanate groups in the following general formulas (3) and (4) formed a triazine ring may be used. Examples of such a prepolymer include those in which a part or all of the compound represented by the following general formula (3) is trimerized.
(前記一般式(3)中、R21は非置換又はフッ素置換の2価の炭化水素基を表し、R22は、各々独立して、非置換又は1〜4個のアルキル基で置換されたフェニレン基を表す) (In the general formula (3), R 21 represents an unsubstituted or fluorine-substituted divalent hydrocarbon group, and each R 22 is independently unsubstituted or substituted with 1 to 4 alkyl groups. Represents a phenylene group)
(前記一般式(4)中、nは1以上の整数を表し、R24は水素原子又は炭素数1〜4のアルキル基を表す) (In the general formula (4), n represents an integer of 1 or more, and R 24 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms)
シアネートエステルのなかでも、下記一般式(5)で表される化合物及びそのプレポリマーが好ましく、4,4’−エチリデンビスフェニレンシアネート、2,2’−ビス(4−シアナトフェニル)プロパン及びビス(4−シアナト−3,5−ジメチルフェニル)メタンがさらに好ましい。 Among the cyanate esters, compounds represented by the following general formula (5) and prepolymers thereof are preferable, and 4,4′-ethylidenebisphenylene cyanate, 2,2′-bis (4-cyanatophenyl) propane and bis (4-Cyanato-3,5-dimethylphenyl) methane is more preferred.
(前記一般式(5)中、R25は、下記いずれかの式で表される2価の基を表し、R26、R27、R28及びR29は、各々独立して、水素原子、又は非置換若しくはフッ素置換のメチル基を表す) (In the general formula (5), R 25 represents a divalent group represented by any one of the following formulas, and R 26 , R 27 , R 28 and R 29 are each independently a hydrogen atom, Or represents an unsubstituted or fluorine-substituted methyl group)
(前記式中、nは4〜12の整数を表し、R30及びR31は、各々独立して、水素原子、又は非置換若しくはフッ素置換のメチル基を表し、*は結合手を表す) (In the above formula, n represents an integer of 4 to 12, R 30 and R 31 each independently represents a hydrogen atom or an unsubstituted or fluorine-substituted methyl group, and * represents a bond)
シアネートエステルは単独で用いてもよいし、2種以上を組み合わせて用いてもよい。シアネートエステルを(B)成分として用いると、形成される硬化物の加工性が良となるために好ましく、シアネートエステルのみを(B)成分として用いることがさらに好ましい。 Cyanate ester may be used independently and may be used in combination of 2 or more type. Use of a cyanate ester as the component (B) is preferable because the processability of the formed cured product is improved, and it is more preferable to use only the cyanate ester as the component (B).
本発明の樹脂組成物中の(B)成分の含有量は、10〜90質量%であることが好ましく、40〜60質量%であることがさらに好ましい。(B)成分の含有量を上記の範囲内とすることで、PET等の基材への密着性がより良好であるとともに、耐溶剤性にさらに優れた、厚さ1μm以下の薄膜(硬化物)を形成しうる樹脂組成物とすることができる。 The content of the component (B) in the resin composition of the present invention is preferably 10 to 90% by mass, and more preferably 40 to 60% by mass. (B) By making content of a component in said range, while being more adhesive to base materials, such as PET, the thin film (hardened | cured material) of thickness 1 micrometer or less which was further excellent in solvent resistance ) Can be formed.
本発明の樹脂組成物に含まれる、(A)成分と(B)成分の質量比は、(A)成分:(B)成分=90:10〜10:90の範囲であることが好ましく、80:20〜40:60の範囲内であることがさらに好ましい。(A)成分と(B)成分の質量比を上記の範囲内とすることで、PET等の基材への密着性がより良好であるとともに、耐溶剤性にさらに優れた、厚さ1μm以下の薄膜(硬化物)を形成しうる樹脂組成物とすることができる。 The mass ratio of the component (A) and the component (B) contained in the resin composition of the present invention is preferably in the range of (A) component: (B) component = 90: 10 to 10:90, : More preferably within the range of 20-40: 60. By making the mass ratio of the component (A) and the component (B) within the above range, the adhesiveness to a substrate such as PET is better, and the solvent resistance is further improved, and the thickness is 1 μm or less. It can be set as the resin composition which can form a thin film (hardened | cured material).
本発明の樹脂組成物の加水分解性塩素濃度は、0〜1,000ppmであることが好ましく、1〜500ppmであることがさらに好ましく、10〜300ppmであることが特に好ましい。加水分解性塩素濃度が上記の範囲内にあることで、PET等の基材への密着性がより良好であるとともに、耐溶剤性にさらに優れた硬化物を形成しうる樹脂組成物とすることができる。 The hydrolyzable chlorine concentration of the resin composition of the present invention is preferably 0 to 1,000 ppm, more preferably 1 to 500 ppm, and particularly preferably 10 to 300 ppm. When the hydrolyzable chlorine concentration is within the above range, the resin composition has better adhesion to a substrate such as PET and can form a cured product having further excellent solvent resistance. Can do.
本発明の樹脂組成物には、エポキシ樹脂に用いられる通常の硬化剤を用いることができる。硬化剤としては、潜在性硬化剤、酸無水物、ポリアミン化合物、ポリフェノール化合物、及びカチオン系光開始剤等を挙げることができる。 In the resin composition of the present invention, a normal curing agent used for epoxy resins can be used. Examples of the curing agent include a latent curing agent, an acid anhydride, a polyamine compound, a polyphenol compound, and a cationic photoinitiator.
潜在性硬化剤としては、例えば、ジシアンジアミド、ヒドラジド、イミダゾール化合物、アミンアダクト、スルホニウム塩、オニウム塩、ケチミン、酸無水物、三級アミン等を挙げることができる。これらの潜在性硬化剤を用いると一液型の硬化性組成物とすることが可能であり、取り扱いが容易になるので好ましい。 Examples of the latent curing agent include dicyandiamide, hydrazide, imidazole compound, amine adduct, sulfonium salt, onium salt, ketimine, acid anhydride, and tertiary amine. Use of these latent curing agents is preferable because it can be made into a one-component curable composition and is easy to handle.
イミダゾール化合物としては、例えば、2−メチルイミダゾール、2−フェニルイミダゾール、2−ウンデシルイミダゾール、2−ヘプタデシルイミダゾール、2−フェニル−4−メチルイミダゾール、1−ベンジル−2−フェニルイミダゾール、1−ベンジル−2−メチルイミダゾール、1−シアノエチル−2−メチルイミダゾール、1−シアノエチル−2−フェニルイミダゾール、1−シアノエチル−2−ウンデシルイミダゾール、2,4−ジアミノ−6(2’−メチルイミダゾール(1’))エチル−s−トリアジン、2,4−ジアミノ−6(2’−ウンデシルイミダゾール(1’))エチル−s−トリアジン、2,4−ジアミノ−6(2’−エチル,4−メチルイミダゾール(1’))エチル−s−トリアジン、2,4−ジアミノ−6(2’−メチルイミダゾール(1’))エチル−s−トリアジン・イソシアヌル酸付加物、2−メチルイミダゾールイソシアヌル酸の2:3付加物、2−フェニルイミダゾールイソシアヌル酸付加物、2−フェニル−3,5−ジヒドロキシメチルイミダゾール、2−フェニル−4−メチル−5−ヒドロキシメチルイミダゾール、1−シアノエチル−2−フェニル−3,5−ジシアノエトキシメチルイミダゾール等の各種イミダゾール類;これらの各種イミダゾール類と、フタル酸、イソフタル酸、テレフタル酸、トリメリット酸、ピロメリット酸、ナフタレンジカルボン酸、マレイン酸、及び蓚酸等の多価カルボン酸との塩類を挙げることができる。 Examples of the imidazole compound include 2-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-phenylimidazole, and 1-benzyl. 2-methylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazole, 2,4-diamino-6 (2′-methylimidazole (1 ′ )) Ethyl-s-triazine, 2,4-diamino-6 (2′-undecylimidazole (1 ′)) ethyl-s-triazine, 2,4-diamino-6 (2′-ethyl, 4-methylimidazole) (1 ′)) Ethyl-s-triazine, 2,4-diamino- (2'-methylimidazole (1 ')) ethyl-s-triazine isocyanuric acid adduct, 2-methylimidazole isocyanuric acid 2: 3 adduct, 2-phenylimidazole isocyanuric acid adduct, 2-phenyl-3, Various imidazoles such as 5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 1-cyanoethyl-2-phenyl-3,5-dicyanoethoxymethylimidazole; these various imidazoles and phthalates Examples thereof include salts with polyvalent carboxylic acids such as acid, isophthalic acid, terephthalic acid, trimellitic acid, pyromellitic acid, naphthalenedicarboxylic acid, maleic acid, and succinic acid.
酸無水物としては、例えば、フタル酸無水物、トリメリット酸無水物、ピロメリット酸無水物、テトラヒドロフタル酸無水物、ヘキサヒドロフタル酸無水物、マレイン酸無水物、コハク酸無水物、2,2−ビス(3,4−ジカルボキシフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン二無水物等を挙げることができる。 Examples of the acid anhydride include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, maleic anhydride, succinic anhydride, 2, Examples thereof include 2-bis (3,4-dicarboxyphenyl) -1,1,1,3,3,3-hexafluoropropane dianhydride.
ポリアミン化合物としては、例えば、エチレンジアミン、ジエチレントリアミン、トリエチレンテトラミン等の脂肪族ポリアミン;メンセンジアミン、イソホロンジアミン、ビス(4−アミノ−3−メチルシクロヘキシル)メタン、ビス(アミノメチル)シクロヘキサン、3,9−ビス(3−アミノプロピル)2,4,8,10−テトラオキサスピロ[5,5]ウンデカン等の脂環族ポリアミン;m−キシレンジアミン等の芳香環を有する脂肪族アミン;m−フェニレンジアミン、2,2−ビス(4−アミノフェニル)プロパン、ジアミノジフェニルメタン、ジアミノジフェニルスルホン、α,α−ビス(4−アミノフェニル)−p−ジイソプロピルベンゼン、2,2−ビス(4−アミノフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン等の芳香族ポリアミンを挙げることができる。 Examples of the polyamine compound include aliphatic polyamines such as ethylenediamine, diethylenetriamine, and triethylenetetramine; mensendiamine, isophoronediamine, bis (4-amino-3-methylcyclohexyl) methane, bis (aminomethyl) cyclohexane, 3,9 -Alicyclic polyamines such as bis (3-aminopropyl) 2,4,8,10-tetraoxaspiro [5,5] undecane; aliphatic amines having an aromatic ring such as m-xylenediamine; m-phenylenediamine 2,2-bis (4-aminophenyl) propane, diaminodiphenylmethane, diaminodiphenylsulfone, α, α-bis (4-aminophenyl) -p-diisopropylbenzene, 2,2-bis (4-aminophenyl)- 1,1,1,3,3,3-hexafluoro Aromatic polyamines such as propane can be mentioned.
ポリフェノール化合物としては、例えば、フェノールノボラック、o−クレゾールノボラック、t−ブチルフェノールノボラック、ジシクロペンタジエンクレゾール、テルペンジフェノール、テルペンジカテコール、1,1,3−トリス(3−第三ブチル−4−ヒドロキシ−6−メチルフェニル)ブタン、ブチリデンビス(3−第三ブチル−4−ヒドロキシ−6−メチルフェニル)、2,2−ビス(4−ヒドロキシフェニル)−1,1,1,3,3,3−ヘキサフルオロプロパン等を挙げることができる。 Examples of the polyphenol compound include phenol novolak, o-cresol novolak, t-butylphenol novolak, dicyclopentadiene cresol, terpene diphenol, terpene dicatechol, 1,1,3-tris (3-tert-butyl-4-hydroxy -6-methylphenyl) butane, butylidenebis (3-tert-butyl-4-hydroxy-6-methylphenyl), 2,2-bis (4-hydroxyphenyl) -1,1,1,3,3,3- Examples include hexafluoropropane.
本発明の樹脂組成物は、充填剤と組み合わせて用いることもできる。充填剤と組み合わせて用いると、得られる硬化物の熱膨張が小さくなるとともに、硬化物の硬度が良好となって傷を防ぐことができる。充填剤としては、例えば、溶融シリカ、溶融球状シリカ、結晶性シリカ、コロイダルシリカ、ヒュームドシリカ、シリカゲル等のシリカ類;アルミナ、酸化鉄、酸化チタン、酸化ジルコニウム、三酸化アンチモン等の金属酸化物;窒化ケイ素、窒化アルミニウム、窒化ホウ素、炭化ケイ素等のセラミックス;マイカ、モンモリロナイト等の鉱物;水酸化アルミニウム、水酸化マグネシウム等の金属水酸化物、及びこれらを有機変性処理等により改質したもの;炭酸カルシウム、ケイ酸カルシウム、炭酸マグネシウム、炭酸バリウム等の金属炭酸塩、及びこれらを有機変性処理等により改質したもの;金属ホウ酸塩、カーボンブラック等の顔料;炭素繊維、グラファイト、ウィスカ、カオリン、タルク、ガラス繊維、ガラスビーズ、ガラスマイクロスフィア、シリカガラス、層状粘土鉱物、クレー、炭化ケイ素、石英、アルミニウム、亜鉛等を挙げることができる。 The resin composition of the present invention can also be used in combination with a filler. When used in combination with a filler, the resulting cured product has a small thermal expansion, and the cured product has good hardness and can prevent scratches. Examples of the filler include silicas such as fused silica, fused spherical silica, crystalline silica, colloidal silica, fumed silica, and silica gel; metal oxides such as alumina, iron oxide, titanium oxide, zirconium oxide, and antimony trioxide. Ceramics such as silicon nitride, aluminum nitride, boron nitride and silicon carbide; minerals such as mica and montmorillonite; metal hydroxides such as aluminum hydroxide and magnesium hydroxide; and those modified by organic modification treatment; Metal carbonates such as calcium carbonate, calcium silicate, magnesium carbonate and barium carbonate, and those modified by organic modification treatment; pigments such as metal borate and carbon black; carbon fiber, graphite, whisker, kaolin , Talc, glass fiber, glass beads, glass my Rosufia, silica glass, may be mentioned layered clay mineral, clay, silicon carbide, quartz, aluminum, zinc and the like.
本発明の樹脂組成物には、その効果を阻害しない範囲で添加物を添加することができる。添加物としては、例えば、天然ワックス類、合成ワックス類、及び長鎖脂肪族酸の金属塩類等の可塑剤;酸アミド類、エステル類、パラフィン類等の離型剤;ニトリルゴム、ブタジエンゴム等の応力緩和剤;三酸化アンチモン、五酸化アンチモン、酸化錫、水酸化錫、酸化モリブデン、硼酸亜鉛、メタ硼酸バリウム、赤燐、水酸化アルミニウム、水酸化マグネシウム、アルミン酸カルシウム等の無機難燃剤;テトラブロモビスフェノールA、テトラブロモ無水フタル酸、ヘキサブロモベンゼン、ブロム化フェノールノボラック等の臭素系難燃剤;リン系化合物、シラン系カップリング剤、チタネート系カップリング剤、アルミニウム系カップリング剤等のカップリング剤;染料や顔料等の着色剤;酸化安定剤、光安定剤、耐湿性向上剤、チキソトロピー付与剤、希釈剤、消泡剤、他の各種樹脂、粘着付与剤、帯電防止剤、滑剤、紫外線吸収剤等を挙げることができる。 Additives can be added to the resin composition of the present invention as long as the effects thereof are not impaired. Examples of additives include plasticizers such as natural waxes, synthetic waxes, and metal salts of long-chain aliphatic acids; release agents such as acid amides, esters, and paraffins; nitrile rubber, butadiene rubber, and the like Inorganic flame retardants such as antimony trioxide, antimony pentoxide, tin oxide, tin hydroxide, molybdenum oxide, zinc borate, barium metaborate, red phosphorus, aluminum hydroxide, magnesium hydroxide, calcium aluminate; Brominated flame retardants such as tetrabromobisphenol A, tetrabromophthalic anhydride, hexabromobenzene, brominated phenol novolak; couplings such as phosphorus compounds, silane coupling agents, titanate coupling agents, aluminum coupling agents Agents; coloring agents such as dyes and pigments; oxidation stabilizers, light stabilizers, moisture resistance improvers, Tiki Toropi imparting agents, diluents can include defoamers, other various resins, tackifiers, antistatic agents, lubricants, UV absorbers.
さらに、本発明の樹脂組成物には、アルコール類、エーテル類、アセタール類、ケトン類、エステル類、アルコールエステル類、ケトンアルコール類、エーテルアルコール類、ケトンエーテル類、ケトンエステル類やエステルエーテル類、芳香族系溶剤等の有機溶剤等を配合することもできる。 Furthermore, the resin composition of the present invention includes alcohols, ethers, acetals, ketones, esters, alcohol esters, ketone alcohols, ether alcohols, ketone ethers, ketone esters and ester ethers, An organic solvent such as an aromatic solvent can also be blended.
上述の樹脂組成物を硬化させることで、本発明の硬化物硬化物を形成することができる。本発明の硬化物は、特に、フレキシブル基板の層間絶縁材、多層基板の層間絶縁材、薄膜接着シート、耐溶剤性コーティング、光学材料用シートなどの用途に好適に使用することができる。 The cured product of the present invention can be formed by curing the above resin composition. The cured product of the present invention can be suitably used for applications such as interlayer insulating materials for flexible substrates, interlayer insulating materials for multilayer substrates, thin film adhesive sheets, solvent-resistant coatings, and sheets for optical materials.
以下、実施例及び比較例により本発明を詳細に説明するが、これらによって本発明が限定されるものではない。 EXAMPLES Hereinafter, although an Example and a comparative example demonstrate this invention in detail, this invention is not limited by these.
<(A)成分>
(製造例1)オリゴマー変性エポキシ樹脂αの合成
アセトン1L、蒸留水1L、2価フェノール(3,3’,5,5’−テトラメチルビスフェノールA)80g、及び触媒(Pycnoporus cocineus由来のラッカーゼ(高研社製))200mgを反応容器に仕込み、30℃で24時間重合反応を行った。反応終了後、メタノール5Lを加えて析出したポリマーをろ過し、蒸留水及びメタノールで洗浄した後、真空乾燥して、ポリフェニレンオキシドオリゴマーα 35.8gを得た。ゲルパーミエーションクロマトグラフィーにより測定したポリフェニレンオキシドオリゴマーαの数平均分子量は1,900であった。また、滴定法により測定したポリフェニレンオキシドオリゴマーαの水酸基当量は1,290g/eq.であり、1分子中に平均1.47個のフェノール性水酸基を有することを確認した。さらに、1H−NMR、13C−NMR、及び2次元NMRで解析することにより、下記一般式(6)で表される構成単位と、下記一般式(7)で表される構成単位とを、7.5:1の平均モル比で有することを確認した。得られたポリフェニレンオキシドオリゴマーα 120g、ビスフェノールAノボラック型エポキシ樹脂(商品名「エピコート157S70」、ジャパンエポキシレジン社製、エポキシ当量=210g/当量)40g、シクロヘキサノン50g、及び50%テトラメチルアンモニウムクロライド水溶液0.02gを反応容器に仕込んだ。温度を135℃まで上げて3時間撹拌し、重合反応を行って、オリゴマー変性エポキシ樹脂αを得た。過塩素酸滴定法により測定したオリゴマー変性エポキシ樹脂αのエポキシ当量は、920g/当量であった。また、オリゴマー変性エポキシ樹脂αの加水分解性塩素濃度は250ppmであり、ゲルパーミエーションクロマトグラフィーにより測定した数平均分子量は2,850であり、軟化温度は165℃であった。得られたオリゴマー変性エポキシ樹脂αを、以下「A−1」とも記す。
<(A) component>
(Production Example 1) Synthesis of oligomer-modified epoxy resin α 1 L of acetone, 1 L of distilled water, 80 g of dihydric phenol (3,3 ′, 5,5′-tetramethylbisphenol A), and catalyst (Pycnoporus cocineus-derived laccase (high 200 mg) was charged into a reaction vessel, and a polymerization reaction was performed at 30 ° C. for 24 hours. After completion of the reaction, 5 L of methanol was added and the precipitated polymer was filtered, washed with distilled water and methanol, and then vacuum-dried to obtain 35.8 g of a polyphenylene oxide oligomer α. The number average molecular weight of the polyphenylene oxide oligomer α measured by gel permeation chromatography was 1,900. Further, the hydroxyl equivalent of the polyphenylene oxide oligomer α measured by a titration method is 1,290 g / eq. It was confirmed that 1 molecule had an average of 1.47 phenolic hydroxyl groups. Furthermore, by analyzing by 1 H-NMR, 13 C-NMR, and two-dimensional NMR, a structural unit represented by the following general formula (6) and a structural unit represented by the following general formula (7) are obtained. Having an average molar ratio of 7.5: 1. 120 g of the obtained polyphenylene oxide oligomer α, 40 g of bisphenol A novolak type epoxy resin (trade name “Epicoat 157S70”, manufactured by Japan Epoxy Resin, epoxy equivalent = 210 g / equivalent), 50 g of cyclohexanone, and 50% tetramethylammonium chloride aqueous solution 0 0.02 g was charged into the reaction vessel. The temperature was raised to 135 ° C. and stirred for 3 hours to carry out a polymerization reaction to obtain an oligomer-modified epoxy resin α. The epoxy equivalent of the oligomer-modified epoxy resin α measured by the perchloric acid titration method was 920 g / equivalent. Further, the hydrolyzable chlorine concentration of the oligomer-modified epoxy resin α was 250 ppm, the number average molecular weight measured by gel permeation chromatography was 2,850, and the softening temperature was 165 ° C. The obtained oligomer-modified epoxy resin α is hereinafter also referred to as “A-1”.
(製造例2)オリゴマー変性エポキシ樹脂βの合成
2価フェノールとして3,3’,5,5’−テトラメチルビスフェノールFを用いたこと以外は、前述の製造例1と同様にして、ポリフェニレンオキシドオリゴマーβ 34.6gを得た。得られたオリゴマー変性エポキシ樹脂は、クロロホルム及びテトラヒドロフランに可溶であり、ゲルパーミエーションクロマトグラフィーにより測定した数平均分子量は1,200であった。また、滴定法により測定したポリフェニレンオキシドオリゴマーβの水酸基当量は780g/eq.であり、1分子中に平均1.54個のフェノール性水酸基を有することを確認した。さらに、1H−NMR、13C−NMR、及び2次元NMRで解析することにより、前記一般式(6)で表される構成単位と、下記一般式(8)で表される構成単位とを、21:1の平均モル比で有することを確認した。得られたポリフェニレンオキシドオリゴマーβ 120g、ビスフェノールAノボラック型エポキシ樹脂(商品名「エピコート157S70」、ジャパンエポキシレジン社製、エポキシ当量=210g/当量)40g、シクロヘキサノン50g、及び50%テトラメチルアンモニウムクロライド水溶液0.02gを反応容器に仕込んだ。温度を135℃まで上げて3時間撹拌し、重合反応を行って、オリゴマー変性エポキシ樹脂βを得た。過塩素酸滴定法により測定したオリゴマー変性エポキシ樹脂βのエポキシ当量は、900g/当量であった。また、オリゴマー変性エポキシ樹脂βの加水分解性塩素濃度は280ppmであり、ゲルパーミエーションクロマトグラフィーにより測定した数平均分子量は1,620であり、軟化温度は155℃であった。得られたオリゴマー変性エポキシ樹脂βを、以下「A−2」とも記す。
(Production Example 2) Synthesis of oligomer-modified epoxy resin β A polyphenylene oxide oligomer was prepared in the same manner as in Production Example 1 except that 3,3 ′, 5,5′-tetramethylbisphenol F was used as the divalent phenol. β 34.6 g was obtained. The obtained oligomer-modified epoxy resin was soluble in chloroform and tetrahydrofuran, and the number average molecular weight measured by gel permeation chromatography was 1,200. Further, the hydroxyl equivalent of polyphenylene oxide oligomer β measured by titration was 780 g / eq. It was confirmed that each molecule had an average of 1.54 phenolic hydroxyl groups. Furthermore, by analyzing by 1 H-NMR, 13 C-NMR, and two-dimensional NMR, a structural unit represented by the general formula (6) and a structural unit represented by the following general formula (8) are obtained. And having an average molar ratio of 21: 1. 120 g of the obtained polyphenylene oxide oligomer β, 40 g of bisphenol A novolak type epoxy resin (trade name “Epicoat 157S70”, manufactured by Japan Epoxy Resin, epoxy equivalent = 210 g / equivalent), 50 g of cyclohexanone, and 50% tetramethylammonium chloride aqueous solution 0 0.02 g was charged into the reaction vessel. The temperature was raised to 135 ° C. and stirred for 3 hours to conduct a polymerization reaction, to obtain an oligomer-modified epoxy resin β. The epoxy equivalent of the oligomer-modified epoxy resin β measured by the perchloric acid titration method was 900 g / equivalent. Further, the hydrolyzable chlorine concentration of the oligomer-modified epoxy resin β was 280 ppm, the number average molecular weight measured by gel permeation chromatography was 1,620, and the softening temperature was 155 ° C. The obtained oligomer-modified epoxy resin β is hereinafter also referred to as “A-2”.
<(B)成分>
(B)成分として、以下に示すB−1〜B−5を用意した。
B−1:ビスフェノールAジシアネート
B−2:液状シアネートエステル、商品名「LECy」、ロンザジャパン社製
B−3:シアネートエステル、商品名「LVT−50」、ロンザジャパン社製
B−4:多官能シアネートエステル、商品名「PT−30」、ロンザジャパン社製
B−5:水添スチレンブタジエンゴム、商品名「タフテックM1913」、旭化成ケミカルズ社製
<(B) component>
As components (B), B-1 to B-5 shown below were prepared.
B-1: Bisphenol A dicyanate B-2: Liquid cyanate ester, trade name “LECy”, manufactured by Lonza Japan B-3: Cyanate ester, product name “LVT-50”, manufactured by Lonza Japan B-4: Multifunctional Cyanate ester, trade name “PT-30”, manufactured by Lonza Japan B-5: Hydrogenated styrene butadiene rubber, trade name “Tuftec M1913”, manufactured by Asahi Kasei Chemicals
<樹脂組成物>
(実施例1〜8)
表1に示す配合となるように(A)成分と(B)成分を混合して、実施例組成物No.1〜8を製造した。
<Resin composition>
(Examples 1-8)
(A) component and (B) component are mixed so that it may become the mixing | blending shown in Table 1, Example composition No. 1-8 were produced.
(比較例1〜5)
表2に示す配合の比較組成物1〜5を用意した。
(Comparative Examples 1-5)
Comparative compositions 1 to 5 having the formulations shown in Table 2 were prepared.
<薄膜(硬化物)の形成>
(実施例9〜16)
実施例組成物No.1〜No.8をキシレンとMEK混合溶媒でそれぞれ希釈するとともに、(A)成分と(B)成分の合計に対して5質量%の4,4’−ビフェノールを硬化剤として添加して液状組成物を得た。得られた液状組成物をPETフィルム上に塗布した後、180℃で乾燥して、厚さ約0.5μmの実施例薄膜No.1〜8を製造した。
<Formation of thin film (cured product)>
(Examples 9 to 16)
Example Composition No. 1-No. 8 was diluted with a mixed solvent of xylene and MEK, respectively, and 5% by mass of 4,4′-biphenol was added as a curing agent to the total of component (A) and component (B) to obtain a liquid composition. . The obtained liquid composition was applied onto a PET film, and then dried at 180 ° C., and an Example thin film No. 1-8 were produced.
(比較例6〜10)
比較組成物1〜5をキシレンとMEK混合溶媒でそれぞれ希釈するとともに、(A)成分と(B)成分の合計に対して5質量%の4,4’−ビフェノールを硬化剤として添加して液状組成物を得た。得られた液状組成物をPETフィルム上に塗布した後、180℃で乾燥して、厚さ約0.5μmの比較例薄膜1〜5を製造した。
(Comparative Examples 6 to 10)
The comparative compositions 1 to 5 were diluted with xylene and MEK mixed solvents, respectively, and 5% by mass of 4,4′-biphenol was added as a curing agent to the total of the components (A) and (B) to form a liquid. A composition was obtained. After apply | coating the obtained liquid composition on PET film, it dried at 180 degreeC and manufactured the comparative example thin films 1-5 of thickness about 0.5 micrometer.
<評価>
(評価例1)密着性評価
実施例薄膜No.1〜8及び比較例薄膜1〜5の表面をそれぞれナイフでクロスカットし、テープ剥離して密着性を評価した。剥離しなかった場合を「+」と評価し、一部でも剥離した場合を「−」と評価した。評価結果を表3に示す。
<Evaluation>
(Evaluation example 1) Adhesion evaluation Example thin film No. The surfaces of 1 to 8 and comparative example thin films 1 to 5 were cross-cut with a knife, and the tape was peeled to evaluate the adhesion. The case where it did not peel was evaluated as “+”, and the case where even a part was peeled was evaluated as “−”. The evaluation results are shown in Table 3.
(評価例2)耐溶剤性評価
実施例薄膜No.1〜8及び比較例薄膜1〜5について、イソプロパノールを用いてそれぞれ100回ラビング処理して耐溶剤性を評価した。外観異常が発生しなかった場合を「+」と評価し、外観異常が発生した場合を「−」と評価した。評価結果を表3に示す。
(Evaluation example 2) Solvent resistance evaluation Example thin film No. About 1-8 and the comparative example thin films 1-5, each was rubbed 100 times using isopropanol, and solvent resistance was evaluated. The case where no appearance abnormality occurred was evaluated as “+”, and the case where appearance abnormality occurred was evaluated as “−”. The evaluation results are shown in Table 3.
表3に示す結果から、比較例薄膜1〜5は、いずれも密着性が不十分であることがわかる。これに対して、実施例組成物No.1〜8を用いて形成した薄膜は、膜厚が1μm以下であってもPETフィルムに対する密着性が良好であるとともに、耐溶剤性にも優れていることがわかる。 From the results shown in Table 3, it can be seen that Comparative Examples Thin Films 1 to 5 have insufficient adhesion. In contrast, Example Composition No. It can be seen that the thin film formed using 1 to 8 has good adhesion to the PET film and excellent solvent resistance even when the film thickness is 1 μm or less.
Claims (3)
(B)スチレンブタジエンゴム、シアネートエステル、及びこれらの誘導体から選ばれる少なくとも1種の樹脂成分
を含有する樹脂組成物。
(前記一般式(1)中、R1、R2、R3及びR4は、各々独立して、置換基を有していてもよいアルキル基、置換基を有していてもよいアルコキシ基、置換基を有していてもよいフェニル基、置換基を有していてもよいアミノ基、カルボキシ基、ニトロ基、ハロゲン原子、又は水素原子を表し、*は結合手を表す) (A) The number average molecular weight is 800 to 10,000, the content of the structural unit represented by the following general formula (1) is 60% by mass or more of the whole, and an average of 1.2 or more in one molecule An oligomer-modified epoxy resin component obtained by reacting a polyphenylene oxide oligomer having a phenolic hydroxyl group with an epoxy resin, and (B) at least one resin component selected from styrene butadiene rubber, cyanate ester, and derivatives thereof A resin composition to contain.
(In said general formula (1), R < 1 >, R < 2 >, R < 3 > and R < 4 > are each independently the alkyl group which may have a substituent, the alkoxy group which may have a substituent. A phenyl group which may have a substituent, an amino group which may have a substituent, a carboxy group, a nitro group, a halogen atom or a hydrogen atom, and * represents a bond)
(前記一般式(2)中、R5、R6、R7、R8、R9、R10、R11及びR12は、各々独立して、置換基を有していてもよいアルキル基、置換基を有していてもよいアルコキシ基、置換基を有していてもよいフェニル基、置換基を有していてもよいアミノ基、カルボキシ基、ニトロ基、ハロゲン原子、又は水素原子を表し、Xは、置換基を有していてもよいアルキレン基、カルボニル基、チオ基、スルフェニル基、スルホニル基、又は直接結合を表し、*は結合手を表す) The polyphenylene oxide oligomer is an oligomer having a structural unit represented by the general formula (1) as a main structural unit and a structural unit represented by the following general formula (2) in the main structural unit. The resin composition described in 1.
(In the general formula (2), R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 are each independently an alkyl group which may have a substituent. , An optionally substituted alkoxy group, an optionally substituted phenyl group, an optionally substituted amino group, a carboxy group, a nitro group, a halogen atom, or a hydrogen atom. X represents an alkylene group which may have a substituent, a carbonyl group, a thio group, a sulfenyl group, a sulfonyl group, or a direct bond, and * represents a bond.
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|---|---|
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2016
- 2016-08-17 JP JP2016159959A patent/JP2018028009A/en active Pending
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