JP2018014211A - Resistance paste and resistive element prepared from the resistance paste - Google Patents
Resistance paste and resistive element prepared from the resistance paste Download PDFInfo
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Abstract
【課題】 高い抵抗値を有しながら電流ノイズの小さい良好な電気的特性を有する鉛フリーの厚膜抵抗体及びその材料となる安価な鉛フリーの抵抗ペーストを提供する。【解決手段】 ルテニウムを含む鉛フリーの酸化物からなる導電性粒子と、鉛フリーのガラスフリットと、有機ビヒクルと、添加剤とで実質的に構成される抵抗ペーストであって、該添加剤として酸化錫、酸化ハフニウム及び酸化インジウムのうちの少なくとも1種を合計で0.2質量%以上7.0質量%以下含有している。【選択図】 なしA lead-free thick-film resistor having a high resistance value and good electrical characteristics with small current noise and an inexpensive lead-free resistor paste as a material thereof are provided. SOLUTION: A resistor paste substantially composed of conductive particles made of a lead-free oxide containing ruthenium, a lead-free glass frit, an organic vehicle, and an additive, wherein the additive is At least one of tin oxide, hafnium oxide and indium oxide is contained in a total amount of 0.2% by mass or more and 7.0% by mass or less. [Selection figure] None
Description
本発明は、厚膜チップ抵抗器やハイブリッドICなどの抵抗体の材料として使用される抵抗ペースト、特に鉛を含有しない抵抗ペースト、及びこれを焼成して作製される抵抗体に関するものである。 The present invention relates to a resistor paste used as a material for resistors such as thick film chip resistors and hybrid ICs, and more particularly to a resistor paste containing no lead, and a resistor produced by firing the paste.
電子部品の抵抗体被膜を形成する方法としては、膜形成材料を含む抵抗ペーストを用いて成膜する厚膜方式と膜形成材料をスパッタリング等することで成膜する薄膜方式が一般的に知られている。それらのうち、厚膜方式は抵抗ペーストをセラミック基板上に印刷した後、焼成することで抵抗体を形成するものであり、この方法は成膜に必要な設備が安価で生産性も高いことから、チップ抵抗器やハイブリッドICなどの電子部品が有する抵抗体の製造に広範に利用されている。 As a method for forming a resistor film of an electronic component, a thick film method for forming a film using a resistance paste containing a film forming material and a thin film method for forming a film by sputtering the film forming material are generally known. ing. Among them, the thick film method is to form a resistor by printing a resistor paste on a ceramic substrate and then firing it. This method is inexpensive and has high productivity required for film formation. It is widely used for manufacturing resistors included in electronic components such as chip resistors and hybrid ICs.
上記の厚膜方式に用いる抵抗ペーストは、導電性粒子及びガラスフリット、並びにそれらを印刷に適したペースト状にするための有機ビヒクルから実質的に構成される。導電性粒子としては、二酸化ルテニウム(RuO2)やパイロクロア型ルテニウム系酸化物(Pb2Ru2O7−X、Bi2Ru2O7)が一般に使われている。このように導電性粒子としてRu系酸化物を用いるのは、主に導電性粒子の濃度に対して抵抗値がなだらかに変化するためである。 The resistive paste used in the thick film system is substantially composed of conductive particles and glass frit, and an organic vehicle for making them suitable for printing. As the conductive particles, ruthenium dioxide (RuO 2 ) or pyrochlore-type ruthenium-based oxides (Pb 2 Ru 2 O 7 -X, Bi 2 Ru 2 O 7 ) are generally used. The reason why the Ru-based oxide is used as the conductive particles is mainly because the resistance value changes gently with respect to the concentration of the conductive particles.
また、ガラスフリットとしては、ホウケイ酸鉛ガラス(PbO−SiO2−B2O3)やアルミノホウケイ酸鉛ガラス(PbO−SiO2−B2O3−Al2O3)など、鉛を多量に含むホウケイ酸鉛系ガラスが使われている。このようにガラスフリットにホウケイ酸鉛系ガラスを用いるのは、Ru系酸化物との濡れ性が良く、熱膨張係数が基板のそれに近く、焼成時の粘性などが適しているからである。 In addition, as a glass frit, a large amount of lead such as lead borosilicate glass (PbO—SiO 2 —B 2 O 3 ) and lead aluminoborosilicate glass (PbO—SiO 2 —B 2 O 3 —Al 2 O 3 ) is used. Including lead borosilicate glass. The reason why the lead borosilicate glass is used for the glass frit in this way is that it has good wettability with the Ru-based oxide, has a thermal expansion coefficient close to that of the substrate, and has a suitable viscosity during firing.
上記の抵抗ペーストでは、成膜後の抵抗体の特性を改善するため、各種添加剤を含有させることが昔から行われている。例えば特許文献1には、耐電圧特性の改善のために酸化チタン(TiO2)を含有させる技術が開示されている。また、特許文献2には、抵抗温度係数の変化を小さくするために酸化ニオブ(Nb2O5)等を含有させる技術が開示されている。 In the above-described resistance paste, various additives have been included for a long time in order to improve the characteristics of the resistor after film formation. For example, Patent Document 1 discloses a technique of containing titanium oxide (TiO 2 ) for improving withstand voltage characteristics. Patent Document 2 discloses a technique for containing niobium oxide (Nb 2 O 5 ) or the like in order to reduce the change in resistance temperature coefficient.
更に、最近では環境を保護するため、電子部品の鉛フリー化が進んでおり、抵抗ペーストについても鉛のフリー化が提案されている。例えば特許文献3には、鉛フリーで高抵抗を実現しつつノイズを抑えるために導電性粒子に二酸化イリジウムを用いる技術が開示されている。 Furthermore, recently, in order to protect the environment, lead-free electronic components have been developed, and lead-free solder pastes have also been proposed. For example, Patent Document 3 discloses a technique of using iridium dioxide for conductive particles in order to suppress noise while realizing high resistance without lead.
近年、上記した抵抗ペーストを材料にして作製される電子部品等はますます小型化、高性能化する傾向にあり、そのため、抵抗ペーストには高抵抗値を有しながら抵抗温度係数が小さく、かつ電流ノイズの小さい抵抗体を作製できるものが求められている。しかしながら、添加剤として上記したようなTiO2やNb2O5を用いた場合は、少ない添加量で特性の向上が図れるものの、抵抗温度係数も大きく変わってしまうため、抵抗温度係数を小さくするのが難しいという問題点がある。 In recent years, electronic components and the like manufactured using the above-described resistance paste as a material tend to be smaller and have higher performance. Therefore, the resistance paste has a low resistance temperature coefficient while having a high resistance value, and What can produce a resistor with low current noise is desired. However, when TiO 2 or Nb 2 O 5 as described above is used as an additive, although the characteristics can be improved with a small addition amount, the resistance temperature coefficient also changes greatly, so the resistance temperature coefficient is reduced. There is a problem that is difficult.
加えて、特許文献1や特許文献2に記載されているように、従来の抵抗ペーストは鉛を含有するものがほとんどであり、抵抗ペーストを鉛フリー化する場合は、特許文献3のように高価なイリジウムを用いることが行われていた。本発明は、上記した従来の問題点に鑑みてなされたものであり、高い抵抗値を有しながら電流ノイズを小さく抑えることが可能な電気的特性に優れた鉛フリーの厚膜抵抗体及びその材料となる安価な鉛フリーの抵抗ペーストを提供することを目的とする。 In addition, as described in Patent Document 1 and Patent Document 2, most conventional resistor pastes contain lead, and when the resistor paste is made lead-free, it is expensive as in Patent Document 3. The use of new iridium has been performed. The present invention has been made in view of the above-described conventional problems, a lead-free thick film resistor excellent in electrical characteristics capable of suppressing current noise to a small value while having a high resistance value, and the same An object is to provide an inexpensive lead-free resistance paste as a material.
本発明者は、上記目的を達成可能な鉛フリーの抵抗ペーストについて検討を重ねた結果、抵抗ペーストに特定の添加剤を含有させることによって、導電性粒子にルテニウムを含む鉛フリーの酸化物を用いると共に、ガラスフリットにも鉛を含まないものを用いる場合であっても良好な電気的特性を有する抵抗体を形成できることを見出し、本発明を完成するに至った。 As a result of repeated studies on a lead-free resistance paste capable of achieving the above object, the present inventor uses a lead-free oxide containing ruthenium in conductive particles by including a specific additive in the resistance paste. At the same time, it has been found that a resistor having good electrical characteristics can be formed even when a glass frit containing no lead is used, and the present invention has been completed.
即ち、本発明が提供する抵抗ペーストは、ルテニウムを含む鉛フリーの酸化物からなる導電性粒子と、鉛フリーのガラスフリットと、有機ビヒクルとで実質的に構成される抵抗ペーストであって、更に添加剤として酸化錫、酸化ハフニウム及び酸化インジウムのうちの少なくとも1種を合計で0.2質量%以上7.0質量%以下含有していることを特徴としている。 That is, the resistance paste provided by the present invention is a resistance paste substantially composed of conductive particles made of a lead-free oxide containing ruthenium, a lead-free glass frit, and an organic vehicle, It is characterized by containing at least one of tin oxide, hafnium oxide and indium oxide as an additive in a total amount of 0.2% by mass or more and 7.0% by mass or less.
本発明によれば、鉛による環境汚染を引き起こすことなく、高い抵抗値を有しながら電流ノイズを小さく抑えることが可能な電気的特性に優れた厚膜抵抗体を安価に形成することができる。 According to the present invention, it is possible to inexpensively form a thick film resistor having excellent electrical characteristics that can suppress current noise while keeping a high resistance value without causing environmental pollution due to lead.
以下、本発明の抵抗ペーストの実施形態について説明する。この本発明の実施形態の抵抗ペーストは、ルテニウムを含む鉛フリーの酸化物からなる導電性粒子と、鉛フリーのガラスフリットと、有機ビヒクルとで実質的に構成される。これらのうち、酸化物については導電性を有するものであれば特に制限はなく、各種の製法で得られる酸化物を使用することができる。ただし、焼成により形成される厚膜抵抗体の抵抗値のばらつき及び電流ノイズの悪化を防ぐには、当該厚膜抵抗体中の導電パスを微細にするのが望ましく、そのためには酸化物の粒子のBET径による平均粒径が、1.0μm以下であるのが望ましい。 Hereinafter, embodiments of the resistance paste of the present invention will be described. The resistive paste according to the embodiment of the present invention is substantially composed of conductive particles made of a lead-free oxide containing ruthenium, a lead-free glass frit, and an organic vehicle. Among these, the oxide is not particularly limited as long as it has conductivity, and oxides obtained by various production methods can be used. However, in order to prevent variation in the resistance value of the thick film resistor formed by firing and deterioration of current noise, it is desirable to make the conductive path in the thick film resistor fine. It is desirable that the average particle diameter of the BET diameter is 1.0 μm or less.
上記抵抗ペーストを構成するガラスフリットは、鉛を含まないものであれば特にその組成に制限はない。例えば、ホウケイ酸ガラス、アルミノホウケイ酸ガラス、ホウケイ酸アルカリ土類ガラス、ホウケイ酸アルカリガラス、ホウケイ酸亜鉛ガラス、ホウケイ酸ビスマスガラスなどを用いることができる。前述したように、厚膜抵抗体の抵抗値のばらつき及び電流ノイズの悪化を防ぐには、厚膜抵抗体中の導電パスを微細にするのが望ましく、そのためにはガラスフリットのレーザー回折式粒度分布測定によるD50(メジアン径)が5μm以下であることが好ましい。 If the glass frit which comprises the said resistance paste does not contain lead, there will be no restriction | limiting in particular in the composition. For example, borosilicate glass, aluminoborosilicate glass, borosilicate alkaline earth glass, borosilicate alkali glass, borosilicate zinc glass, borosilicate bismuth glass, or the like can be used. As described above, in order to prevent variation in resistance value of the thick film resistor and deterioration of current noise, it is desirable to make the conductive path in the thick film resistor fine. It is preferable that D50 (median diameter) by distribution measurement is 5 μm or less.
上記抵抗ペーストを構成する有機ビヒクルは、抵抗ペーストに通常使用されているものであってよく、例えば、エチルセルロース、ブチラール、アクリルなどの樹脂をターピネオール、ブチルカルビトールアセテートなどの溶剤に溶解したものが好適に用いられる。 The organic vehicle constituting the resistance paste may be one normally used for the resistance paste, for example, a resin obtained by dissolving a resin such as ethyl cellulose, butyral, or acrylic in a solvent such as terpineol or butyl carbitol acetate. Used for.
上記抵抗ペーストは、更に添加剤として酸化錫(SnO2)、酸化ハフニウム(HfO2)及び酸化インジウム(In2O3)のうち少なくとも1種を合計で0.2質量%以上7.0質量%以下含有している。これら添加剤は、焼成により形成される抵抗体の抵抗値を上昇させて電流ノイズを小さくする役割を果たす。このように添加剤の合計含有量を抵抗ペーストに対して0.2質量%以上とするのは、0.2質量%未満では電流ノイズを小さくする効果が十分得られないからである。逆に、添加剤の合計含有量を7.0質量%以下とするのは、7.0質量%を超えると抵抗値が高くなり過ぎて、電流ノイズを小さくする効果が十分得られなかったり、抵抗温度係数が大きくなり過ぎてしまったりする場合があるからである。 The resistance paste further includes at least one of tin oxide (SnO 2 ), hafnium oxide (HfO 2 ) and indium oxide (In 2 O 3 ) as an additive in a total amount of 0.2% by mass or more and 7.0% by mass. Contains the following. These additives serve to increase the resistance value of the resistor formed by firing and reduce current noise. The reason why the total content of the additives is set to 0.2% by mass or more with respect to the resistance paste is that if the content is less than 0.2% by mass, the effect of reducing current noise cannot be obtained sufficiently. Conversely, if the total content of the additives is 7.0% by mass or less, if the content exceeds 7.0% by mass, the resistance value becomes too high, and the effect of reducing the current noise cannot be obtained sufficiently. This is because the temperature coefficient of resistance may become too large.
上記した本発明の実施形態の抵抗ペーストの製造法は特に制約がなく、ロールミルなどの市販の混練装置に、上記した抵抗ペーストの構成成分を装入して混練することで作製することができる。その際、導電性粒子とガラスフリットの混合割合は、質量基準による導電性粒子/ガラスフリットの比で5/95〜50/50程度であるのが好ましい。また、抵抗体の作製法も特に制約がなく、上記した本発明の実施形態の抵抗ペーストを材料として用いて従来と同様の方法で形成することができる。例えば、上記した抵抗ペーストをアルミナ基板などの通常の基板上にスクリーン印刷法などにより塗布し、乾燥した後、ベルト炉などを用いて800〜900℃程度のピーク温度で焼成することによって、鉛フリーの抵抗体を形成することができる。 There is no restriction | limiting in particular in the manufacturing method of the resistance paste of embodiment mentioned above, It can produce by charging and knead | mixing the component of resistance paste mentioned above to commercially available kneading apparatuses, such as a roll mill. At that time, the mixing ratio of the conductive particles and the glass frit is preferably about 5/95 to 50/50 in terms of the ratio of the conductive particles / glass frit on a mass basis. Further, the method for manufacturing the resistor is not particularly limited, and the resistor can be formed by the same method as the conventional one using the resistor paste of the embodiment of the present invention as a material. For example, the above-described resistance paste is applied to a normal substrate such as an alumina substrate by screen printing or the like, dried, and then fired at a peak temperature of about 800 to 900 ° C. using a belt furnace or the like, thereby lead-free. Can be formed.
以上説明したように、本発明の実施形態の抵抗ペーストは鉛を含まないため、従来の鉛を含む抵抗ペーストや抵抗体のような環境汚染を引き起こすことがなく、また、高価なイリジウムを含まないためコストを抑えることができる。そして、この抵抗ペーストを材料に用いて形成される抵抗体は、従来のものと同程度の良好な電気的特性を有しており、特に抵抗値のばらつきが少ない上、ノイズを小さく抑えることができる。尚、本発明の実施形態の抵抗ペーストは、上記した酸化錫などの添加剤の他に、厚膜抵抗体の電気的特性を調整するために従来から通常使用されている例えば分散剤、可塑剤などの種々の添加剤を必要に応じて添加してもよい。 As described above, since the resistive paste of the embodiment of the present invention does not contain lead, it does not cause environmental pollution like conventional resistive pastes and resistors containing lead, and does not contain expensive iridium. Therefore, the cost can be suppressed. A resistor formed by using this resistance paste as a material has good electrical characteristics similar to those of the conventional one, and in particular, there is little variation in resistance value, and noise can be kept small. it can. In addition to the above-described additives such as tin oxide, the resistor paste according to the embodiment of the present invention is conventionally used for adjusting the electrical characteristics of the thick film resistor, for example, a dispersing agent or a plasticizer. You may add various additives, such as, as needed.
導電性粒子、ガラスフリット、有機ビヒクル、及び添加剤を様々な配合割合で混合して複数の抵抗ペースト試料を調製し、それらを各々焼成することで作製した厚膜抵抗体に対して、抵抗値などの特性を評価した。具体的には、導電性粒子には水酸化ルテニウムを焙焼することによって作製したBET径40nmのRuO2粉末を用いた。ガラスフリットには一般的な方法で混合、溶融、急冷、粉砕することによって作製した10質量%SrO−43質量%SiO2−16質量%B2O3−4質量%Al2O3−20質量%ZnO−7質量%Na2Oの組成を有するレーザー回折式粒度分布測定によるD50が1.9μmのガラスフリットを用いた。添加剤には、SnO2、HfO2、In2O3、及びTiO2を準備し、有機ビヒクルにはエチルセルロースとターピネオールを主成分とするものを用いた。これらRuO2粉末、ガラスフリット、添加剤、及び有機ビヒクルを様々な配合割合となるように秤量し、三本ロールミルで混練した。これにより下記表1に示す組成を有する試料1〜16の抵抗ペーストを作製した。 Resistance value for thick film resistors prepared by mixing conductive particles, glass frit, organic vehicle, and additives at various blending ratios to prepare multiple resistance paste samples and firing them individually. Etc. were evaluated. Specifically, RuO 2 powder having a BET diameter of 40 nm prepared by roasting ruthenium hydroxide was used as the conductive particles. For glass frit, 10 mass% SrO-43 mass% SiO 2 -16 mass% B 2 O 3 -4 mass% Al 2 O 3 -20 mass produced by mixing, melting, quenching, and pulverizing by a general method. A glass frit having a composition of% ZnO-7 mass% Na 2 O and having a D50 of 1.9 μm as measured by laser diffraction particle size distribution was used. SnO 2 , HfO 2 , In 2 O 3 , and TiO 2 were prepared as additives, and the organic vehicle used was composed mainly of ethyl cellulose and terpineol. These RuO 2 powder, glass frit, additive, and organic vehicle were weighed so as to have various blending ratios and kneaded by a three-roll mill. As a result, resistance pastes of Samples 1 to 16 having the compositions shown in Table 1 below were produced.
次に、各試料の抵抗ペーストに対して、AgPdペーストを用いて電極間距離1mmの2つの電極が形成されたアルミナ基板を用意し、該アルミナ基板上において上記両電極を接続するように抵抗ペーストを幅1mmにスクリ−ン印刷し、150℃で10分間乾燥した後、ベルト炉にてピーク温度850℃で9分間焼成した。このようにして作製した厚膜抵抗体の電気的特性(抵抗値、電流ノイズ)を測定し、抵抗値を用いて抵抗温度係数を算出した。その結果を下記表2に示す。 Next, an alumina substrate on which two electrodes having an interelectrode distance of 1 mm are formed using AgPd paste is prepared for the resistance paste of each sample, and the two electrodes are connected on the alumina substrate. Was screen printed to a width of 1 mm, dried at 150 ° C. for 10 minutes, and then fired in a belt furnace at a peak temperature of 850 ° C. for 9 minutes. The electrical characteristics (resistance value, current noise) of the thick film resistor thus manufactured were measured, and the resistance temperature coefficient was calculated using the resistance value. The results are shown in Table 2 below.
尚、抵抗値はKEITHLEY社製のModel2001Multimeterを用いて4端子法にて測定し、電流ノイズはQuan−Tech社製のノイズメーターModel315Cを用いて1/10W印加で測定した。表2には、25℃における抵抗値を記載した。また、125℃及び−55℃における抵抗値も測定し、これら25℃、125℃、及び−55℃の抵抗値を用いて、下記式1及び式2により高温抵抗温度係数(HTCR)[ppm/℃]及び低温抵抗温度係数(CTCR)[ppm/℃]をそれぞれ算出した。ここで、R25は25℃での抵抗値、R125は125℃での抵抗値、R−55は−55℃での抵抗値である。 The resistance value was measured by a four-terminal method using a Model 2001 Multimeter manufactured by KEITHLEY, and the current noise was measured by applying 1/10 W using a noise meter Model 315C manufactured by Quan-Tech. Table 2 lists the resistance values at 25 ° C. In addition, the resistance values at 125 ° C. and −55 ° C. were also measured, and the high temperature resistance temperature coefficient (HTCR) [ppm / ° C] and low temperature resistance temperature coefficient (CTCR) [ppm / ° C], respectively. Here, R 25 is a resistance value at 25 ° C., R 125 is a resistance value at 125 ° C., and R −55 is a resistance value at −55 ° C.
[式1]
HTCR=[(R125−R25)/R25(125−25)]×106
[式2]
CTCR=[(R−55−R25)/R25(−55−25)]×106
[Formula 1]
HTCR = [(R 125 -R 25 ) / R 25 (125-25)] × 10 6
[Formula 2]
CTCR = [(R −55 −R 25 ) / R 25 (−55−25)] × 10 6
上記表2の結果から、添加剤としてSnO2、HfO2、In2O3を含有している本発明の試料1〜13の抵抗ペーストは、安価なRuO2の導電性粒子と鉛フリーのガラスフリットとを用いて抵抗値の高い厚膜抵抗体を形成した場合においても、抵抗温度係数を小さくかつ電流ノイズを小さくできることが分かる。 From the results of Table 2 above, the resistance pastes of Samples 1 to 13 of the present invention containing SnO 2 , HfO 2 , and In 2 O 3 as additives are inexpensive RuO 2 conductive particles and lead-free glass. It can be seen that even when a thick film resistor having a high resistance value is formed using a frit, the resistance temperature coefficient can be reduced and the current noise can be reduced.
一方、添加剤としてのSnO2、HfO2、及びInO3のうちのいずれも加えないか、もしくは従来から用いられているTiO2を添加剤として含有している試料14及び16の抵抗ペーストは、本発明の試料1〜13と同様にRuO2の導電性粒子及びガラスフリットを用いて抵抗値の高い厚膜抵抗体を形成した場合、電流ノイズ又は抵抗温度係数を十分小さくすることができないことが分かる。また、SnO2の含有量が本発明の要件を超えている試料15の抵抗ペーストは、試料1〜13のいずれのものより抵抗温度係数が高くなっているのが分かる。
On the other hand, the resistance pastes of Samples 14 and 16 that do not add any of SnO 2 , HfO 2 , and InO 3 as additives, or contain conventionally used TiO 2 as additives, When a thick film resistor having a high resistance value is formed using conductive particles of RuO 2 and glass frit as in Samples 1 to 13 of the present invention, current noise or resistance temperature coefficient cannot be sufficiently reduced. I understand. The resistance paste sample 15 the content of SnO 2 exceeds the requirements of the present invention, it can be seen that the resistance temperature coefficient than that of any of the samples 1 to 13 is high.
Claims (4)
A method for producing a lead-free resistor, comprising producing a resistor by firing the resistor paste according to claim 1.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2021125303A (en) * | 2020-01-31 | 2021-08-30 | 住友金属鉱山株式会社 | Compositions for thick film resistors, pastes for thick film resistors, and thick film resistors |
| CN119786118A (en) * | 2025-02-28 | 2025-04-08 | 西安腾星电子科技有限公司 | A kind of resistor paste and its preparation method and application |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003007517A (en) * | 2001-06-19 | 2003-01-10 | Tdk Corp | Method of manufacturing resistor paste and thick film resistor |
| WO2016039108A1 (en) * | 2014-09-12 | 2016-03-17 | 昭栄化学工業株式会社 | Thin film resistive body and production method for same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003007517A (en) * | 2001-06-19 | 2003-01-10 | Tdk Corp | Method of manufacturing resistor paste and thick film resistor |
| WO2016039108A1 (en) * | 2014-09-12 | 2016-03-17 | 昭栄化学工業株式会社 | Thin film resistive body and production method for same |
Cited By (3)
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|---|---|---|---|---|
| JP2021125303A (en) * | 2020-01-31 | 2021-08-30 | 住友金属鉱山株式会社 | Compositions for thick film resistors, pastes for thick film resistors, and thick film resistors |
| JP7367547B2 (en) | 2020-01-31 | 2023-10-24 | 住友金属鉱山株式会社 | Thick film resistor composition, thick film resistor paste, and thick film resistor |
| CN119786118A (en) * | 2025-02-28 | 2025-04-08 | 西安腾星电子科技有限公司 | A kind of resistor paste and its preparation method and application |
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