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JP2018085978A - Culture vessel - Google Patents

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JP2018085978A
JP2018085978A JP2016232227A JP2016232227A JP2018085978A JP 2018085978 A JP2018085978 A JP 2018085978A JP 2016232227 A JP2016232227 A JP 2016232227A JP 2016232227 A JP2016232227 A JP 2016232227A JP 2018085978 A JP2018085978 A JP 2018085978A
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culture
partition wall
wells
culture container
container according
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龍腰 健太郎
Kentaro Tatsukoshi
健太郎 龍腰
大二郎 岩田
Daijiro Iwata
大二郎 岩田
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AGC Inc
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Asahi Glass Co Ltd
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Abstract

PROBLEM TO BE SOLVED: To provide a culture vessel that is capable of arranging substance to be cultured such as cells in a uniformly dispersed manner for a plurality of wells.SOLUTION: A culture vessel of the present invention comprises a plurality of wells and partition wall parts. The partition wall part has a shape in which the center is recessed in a height direction, and partitions the wells.SELECTED DRAWING: Figure 3A

Description

本発明は、細胞などの被培養物を培養するための培養容器に関する。   The present invention relates to a culture container for culturing a culture object such as a cell.

例えばヒトや動物由来の細胞を培養容器などで人工的に培養しつつ三次元的に凝集させるスフェロイド培養が知られている。スフェロイド培養は、生体内で細胞どうしが相互に作用する三次元的細胞構造に近い状態を構築できるため、単層培養などに比べて、より特異的な機能を引き出すことが可能となる。   For example, spheroid culture in which cells derived from humans or animals are three-dimensionally aggregated while being artificially cultured in a culture vessel or the like is known. Since spheroid culture can construct a state close to a three-dimensional cell structure in which cells interact with each other in a living body, a more specific function can be derived compared to monolayer culture or the like.

ここで、細胞の培養容器としては、細胞の収容部となる各ウェルの最下面に、細胞低接着性の表面を有する窪みを設けた培養容器などが提案されている(特許文献1参照)。また、複数のウェルと隣り合うウェル間に介在された土手部とを備え、このウェルと土手部とを連続的な曲面で構成した培養容器なども知られている(特許文献2参照)。   Here, as a cell culture vessel, a culture vessel or the like in which a depression having a cell low adhesion surface is provided on the lowermost surface of each well serving as a cell accommodating portion has been proposed (see Patent Document 1). There is also known a culture vessel or the like that includes a plurality of wells and a bank portion interposed between adjacent wells, and the well and the bank portion are configured by a continuous curved surface (see Patent Document 2).

特開2009−50194号公報JP 2009-50194 A 国際公開第2012/036011号International Publication No. 2012/036011

ところで、このような培養容器では、均一な大きさのスフェロイド(細胞凝集塊)を得るためにも、培養の対象となる複数の細胞を、培養容器内の各ウェルに対して均一に分散して配置することが重要であり、この点において改善が求められている。   By the way, in such a culture container, in order to obtain spheroids (cell aggregates) of uniform size, a plurality of cells to be cultured are uniformly dispersed in each well in the culture container. Arrangement is important and improvements are needed in this regard.

本発明は、上記課題を解決するためになされたものであり、細胞などの被培養物を複数のウェルに対して均一的に分散して配置することが可能な培養容器の提供を目的とする。   The present invention has been made to solve the above-described problem, and an object of the present invention is to provide a culture container capable of uniformly dispersing and arranging a culture object such as a cell in a plurality of wells. .

本発明の培養容器は、複数のウェル及び隔壁部を備えている。隔壁部は、高さ方向に中央が凹んだ形状を有しウェルどうしを区画する。   The culture container of the present invention includes a plurality of wells and a partition wall. The partition wall has a shape in which the center is recessed in the height direction and partitions the wells.

本発明によれば、細胞などの被培養物を、各ウェルに対して均一的に分散して配置することが可能な培養容器を提供することができる。   ADVANTAGE OF THE INVENTION According to this invention, the culture container which can disperse | distribute to-be-cultured objects, such as a cell, uniformly with respect to each well can be provided.

本発明の第1の実施形態に係る培養容器を概略的に示す平面図。The top view which shows roughly the culture container which concerns on the 1st Embodiment of this invention. 図1の培養容器の構造を概略的に示す垂直断面図。FIG. 2 is a vertical sectional view schematically showing the structure of the culture vessel of FIG. 1. 図1の培養容器が備える培養基材の構造を拡大して示す斜視図。The perspective view which expands and shows the structure of the culture base material with which the culture container of FIG. 1 is provided. 図3Aに示す培養基材のA−A断面図。3A is a cross-sectional view of the culture substrate shown in FIG. 図3Aに示す培養基材のB−B断面図。BB sectional drawing of the culture base material shown to FIG. 3A. 隔壁部をハニカム状に配列した培養基材の構造を拡大して示す斜視図。The perspective view which expands and shows the structure of the culture base material which arranged the partition part in the honeycomb form. 図4Aに示す培養基材のC−C断面図。CC sectional drawing of the culture | cultivation base material shown to FIG. 4A. 図3Aの培養基材の母材となるガラス基板を示す断面図。Sectional drawing which shows the glass substrate used as the base material of the culture base material of FIG. 3A. 図5Aのガラス基板に種穴を形成した状態を示す断面図。Sectional drawing which shows the state which formed the seed hole in the glass substrate of FIG. 5A. 図5Bの種穴を設けたガラス基板にエッチングを施してウェルを形成した状態を示す断面図。Sectional drawing which shows the state which etched the glass substrate which provided the seed hole of FIG. 5B, and formed the well. 図3Aの培養基材の製造方法を示すフローチャート。The flowchart which shows the manufacturing method of the culture base material of FIG. 3A. 本発明の第2の実施形態に係る培養容器を概略的に示す平面図。The top view which shows roughly the culture container which concerns on the 2nd Embodiment of this invention. 図7の培養容器の構造を概略的に示す垂直断面図。FIG. 8 is a vertical sectional view schematically showing the structure of the culture vessel of FIG. 7.

以下、本発明の実施の形態を図面に基づき説明する。
<第1の実施の形態>
図1、図2に示すように、本実施形態の培養容器10は、被培養物である細胞を培養しつつ、培養の過程で細胞を三次元的に凝集させたスフェロイド(細胞凝集塊)を得るための有底円筒状の細胞培養容器である。この培養容器10内には、細胞及び培養液(培地)が収容される。なお、培養容器10の形状は、有底円筒状に限らず、例えばプレート型やフラスコ型の形状を採用することも可能である。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
<First Embodiment>
As shown in FIGS. 1 and 2, the culture container 10 of the present embodiment spheroids (cell aggregates) obtained by three-dimensionally aggregating cells in the course of culturing while culturing cells to be cultured. It is a bottomed cylindrical cell culture container for obtaining. In this culture vessel 10, cells and a culture solution (medium) are accommodated. Note that the shape of the culture vessel 10 is not limited to a bottomed cylindrical shape, and for example, a plate shape or a flask shape may be employed.

図1〜図3Aに示すように、培養容器10は、円板状の底部12、周壁部11及び例えばリング状の脚部12bを含む樹脂製の容器本体(ディッシュ)16と、複数のウェル(well)21が形成された培養面15aを有するガラス製の培養基材15と、を備えている。培養基材15は、所定数のウェルを有する基材単体(単一の基材)として構成されていてもよいし、所定数のウェルを有する前記の基材単体を複数個まとめてユニット化したものを適用することも可能である。また、このような培養基材15は、矩形状に形成されている。一方、容器本体16の底部12には、培養基材15よりもわずかに小さいサイズの矩形状の貫通穴12aが穿孔されている。   As shown in FIGS. 1 to 3A, a culture vessel 10 includes a resin-made container main body (dish) 16 including a disc-shaped bottom portion 12, a peripheral wall portion 11, and a ring-shaped leg portion 12b, and a plurality of wells ( well) 21 made of glass having a culture surface 15a on which a well 21 is formed. The culture substrate 15 may be configured as a single substrate (single substrate) having a predetermined number of wells, or a plurality of the above-mentioned single substrates having a predetermined number of wells are unitized. It is also possible to apply things. Moreover, such a culture substrate 15 is formed in a rectangular shape. On the other hand, a rectangular through hole 12 a having a slightly smaller size than the culture substrate 15 is formed in the bottom 12 of the container body 16.

培養基材15は、その培養面15aが、貫通穴12aに臨む(貫通穴12aから露出する)ようにして、当該培養基材15における培養面15a側の周縁部15bが、底部12の下面における貫通穴12aの外縁部分に取り付けられている(接合されている)。培養基材15の周縁部15bは、ウェル21の形成されていない平坦部として構成されており、接合対象となる容器本体16の底部12との密着性が高められている。   The culture substrate 15 has a culture surface 15a facing the through hole 12a (exposed from the through hole 12a), and the peripheral portion 15b of the culture substrate 15 on the culture surface 15a side is on the bottom surface of the bottom 12 It is attached (joined) to the outer edge portion of the through hole 12a. The peripheral part 15b of the culture base material 15 is configured as a flat part in which the well 21 is not formed, and adhesion with the bottom part 12 of the container body 16 to be joined is enhanced.

周壁部11は、底部12の周縁部分から立ち上がった形状(周縁部分を起立させた状態)で構成されている。なお、容器本体16が備える底部12、周壁部11及び脚部12bは、一体部品によって構成されていてもよいし、それぞれが個別の部品で構成されていてもよい。また、培養容器10は、容器本体16の上端の開口部を覆うための蓋体などを備えることも可能である。また、図2に示すように、培養基材15よりも底部側に突出するリング状の脚部12bを位置合わせに利用することによって、複数の培養容器10を重ねた状態で保管することなどが可能となる。   The peripheral wall portion 11 is configured in a shape rising from the peripheral edge portion of the bottom portion 12 (a state in which the peripheral edge portion is erected). In addition, the bottom part 12, the surrounding wall part 11, and the leg part 12b with which the container main body 16 is provided may be comprised by integral components, and each may be comprised by an individual component. The culture vessel 10 can also include a lid for covering the opening at the upper end of the vessel body 16. In addition, as shown in FIG. 2, by using the ring-shaped legs 12 b that protrude toward the bottom of the culture substrate 15 for alignment, it is possible to store a plurality of culture vessels 10 in a stacked state. It becomes possible.

ここで、培養基材15の構造について詳述する。図3A〜図3Cに示すように、培養基材15の培養面15a上における複数のウェル21は、細胞を収容して培養し、スフェロイドを得るための隔室(窪み部)である。また、培養面15a上には、隣り合うウェル21どうしを区画する隔壁部22が設けられている。この隔壁部22は、中央(中央部分)が高さ方向に凹んだ形状を有する。   Here, the structure of the culture substrate 15 will be described in detail. As shown in FIGS. 3A to 3C, the plurality of wells 21 on the culture surface 15a of the culture substrate 15 are compartments (indentations) for accommodating and culturing cells to obtain spheroids. In addition, a partition wall 22 that partitions adjacent wells 21 is provided on the culture surface 15a. The partition wall portion 22 has a shape in which the center (center portion) is recessed in the height direction.

詳述すると、隔壁部22は、図3Bに示すように、当該隔壁部22の厚さ方向から観て(隔壁部22の稜線に沿って切断したA−A断面を観ると)円弧状に凹んでいる。また、図3B、図3Cに示すように、隔壁部22の先端部分は、とがった形状で(突起状に)構成されている。さらに、このような隔壁部22は、図3Aに示すように、格子状に配列されている。ここで、ウェル21内で培養される細胞を顕微鏡で観察する際に、図3Aに示す格子状に配列された隔壁部22の稜線を、顕微鏡の走査方向のX軸、Y軸の基準出しなどに利用することも可能である。また、ウェル21及び隔壁部22を含む培養基材15の材料をガラス製としたことで、光透過性が良好となり、顕微鏡による視認性を高めることができる。   More specifically, as shown in FIG. 3B, the partition wall 22 is recessed in an arc shape when viewed from the thickness direction of the partition wall 22 (when the AA cross section cut along the ridge line of the partition wall 22 is viewed). It is out. Further, as shown in FIGS. 3B and 3C, the distal end portion of the partition wall portion 22 is configured to have a sharp shape (in a protruding shape). Further, such partition walls 22 are arranged in a lattice pattern as shown in FIG. 3A. Here, when observing the cells cultured in the well 21 with a microscope, the ridgelines of the partition walls 22 arranged in a lattice form shown in FIG. 3A are used as reference for the X-axis and Y-axis in the scanning direction of the microscope. It is also possible to use it. Moreover, since the material of the culture substrate 15 including the well 21 and the partition wall 22 is made of glass, the light transmittance is improved, and the visibility with a microscope can be improved.

なお、格子状に配列された隔壁部22の稜線と矩形状の培養基材15本体のいずれかの辺部とは平行な位置関係を有する。また、図3A〜図3Cに示すように、格子状に配列されている隔壁部22は、交点部分22aの高さが最も高くなるように構成され、一方、交点部分22aどうしの間の中央部分の高さが最も低くなるように構成されている。   In addition, the ridgeline of the partition part 22 arranged in the grid | lattice form and any side part of the rectangular culture base material 15 main body have a parallel positional relationship. Further, as shown in FIGS. 3A to 3C, the partition wall portions 22 arranged in a lattice shape are configured so that the height of the intersection portion 22a is the highest, while the central portion between the intersection portions 22a. Is configured to be the lowest.

本実施形態の培養容器10では、培養の対象となる複数の細胞(細胞懸濁液)を当該培養容器10内に投入した後、培養容器10本体を揺動させることで、中央の凹んだ隔壁部22を介して複数のウェル21間を細胞が比較的容易に移動することになる。これにより、複数の細胞を、培養容器10内の各ウェル21に対して均一的に分散して配置することができる。この結果、各ウェル21内では、均一な大きさのスフェロイド(細胞凝集塊)を得ることが可能となる。なお、図3A〜図3Cでは、隔壁部22が格子状に配列されている例を示しているが、図4A及び図4Bに示すように、隔壁部22をハニカム状に配列させてもよい。   In the culture container 10 of the present embodiment, a plurality of cells (cell suspension) to be cultured are put into the culture container 10 and then the main body of the culture container 10 is swung so that a concave wall in the center is formed. The cells move relatively easily between the plurality of wells 21 via the portion 22. Thereby, a plurality of cells can be uniformly distributed and arranged in each well 21 in the culture vessel 10. As a result, spheroids (cell aggregates) having a uniform size can be obtained in each well 21. 3A to 3C show an example in which the partition walls 22 are arranged in a grid pattern, but the partition walls 22 may be arranged in a honeycomb pattern as shown in FIGS. 4A and 4B.

ここで、隔壁部22における円弧状に凹んでいる部位の深さhとウェル21の深さdの関係であるh/dが0.1以上、0.6以下であれば好ましく、h/dが0.2以上、0.5以下であればより好ましく、h/dが0.3以上、0.4以下であればさらに好ましい。
h/dが0.1以上であればウェル21間での細胞の移動がスムースに行われ、0.6以下であれば、スフェロイド培養時にウェル21間でのスフェロイド細胞の移動が容易に起こりにくく、スフェロイド細胞が安定するためである。
また、図3C、図4Bに示すように、隔壁部22における凹みの深さhが10μm以上600μm以下であれば好ましく、hが20μm以上500μm以下であればより好ましく、hが30μm以上300μm以下であればさらに好ましい。深さhは単細胞のサイズによって適宜選択されるが、深さhが10μm以上であれば単細胞が乗り越えやすくなり、深さhが600μm以下であればスフェロイド培養時にウェル21間でのスフェロイド細胞の移動が容易に起こりにくく、スフェロイド細胞が安定するためである。
上記した円弧状に凹んでいる部位の深さhは、複数形成されるウェルが略等間隔に形成されている場合には、個々のウェルで略同一の深さである。一方、等間隔でないときには、個々のウェルで深さhが異なる場合がある。このときは隔壁部全てでh/dが0.1以上、0.6以下を満たすことが好ましい。
Here, it is preferable that h / d, which is the relationship between the depth h of the arcuately recessed portion in the partition wall 22 and the depth d of the well 21, is 0.1 or more and 0.6 or less, and h / d Is more preferably 0.2 or more and 0.5 or less, and h / d is more preferably 0.3 or more and 0.4 or less.
If h / d is 0.1 or more, the cells are smoothly moved between the wells 21, and if it is 0.6 or less, the spheroid cells are not easily moved between the wells 21 during spheroid culture. This is because spheroid cells are stabilized.
Further, as shown in FIGS. 3C and 4B, the depth h of the recess in the partition wall 22 is preferably 10 μm or more and 600 μm or less, more preferably h is 20 μm or more and 500 μm or less, and h is 30 μm or more and 300 μm or less. More preferably. The depth h is appropriately selected depending on the size of the single cell, but if the depth h is 10 μm or more, the single cell can easily get over, and if the depth h is 600 μm or less, the spheroid cell moves between the wells 21 during spheroid culture. This is because spheroid cells are not easily generated and spheroid cells are stabilized.
The depth h of the portion recessed in the above-mentioned arc shape is substantially the same depth for each well when a plurality of wells are formed at substantially equal intervals. On the other hand, when the interval is not equal, the depth h may be different for each well. At this time, it is preferable that h / d satisfies 0.1 or more and 0.6 or less in all the partition walls.

また、上述したように、隔壁部22の先端部分は、図3C、図4Bに示すように、とがった形状で(突起状に)構成されている。つまり、隣り合うウェル21どうしの境界部分には平坦な面がないため、ウェル21の境界部分に細胞が留まることなどが抑制され(播種された細胞がウェル21内に確実に落ち込み)、これにより、細胞がスフェロイドにならないことを抑制することが可能となる。ここで、細胞がスフェロイドにならないという意味は、単層培養や単細胞浮遊培養、球状とならない積層培養、細胞が培養面に接着された状態の培養、スフェロイドに取り込まれずに単細胞の状態で死んでしまうものなどを含む。   Further, as described above, the distal end portion of the partition wall portion 22 is configured in a sharp shape (in a protruding shape) as shown in FIGS. 3C and 4B. That is, since there is no flat surface at the boundary portion between the adjacent wells 21, it is possible to prevent the cells from staying at the boundary portion of the well 21 (the seeded cells surely fall into the well 21). It becomes possible to suppress the cells from becoming spheroids. Here, the meaning that a cell does not become a spheroid means that it is a monolayer culture or a single cell suspension culture, a non-spherical layered culture, a culture in which cells are adhered to the culture surface, or a single cell that is not taken up by a spheroid Including things.

また、ウェル21は、培養面15aの単位面積あたり、10個/cm2〜20000個/cm2、形成することが好ましい。より好ましくは、15個/cm2〜10000個/cm2、さらに好ましくは、20個/cm2〜5000個/cm2である。なお、本実施形態において、数値範囲を示す「〜」は、その前後に記載された数値を下限値及び上限値として含む意味で使用している。 Moreover, it is preferable to form the wells 21 per unit area of the culture surface 15a at 10 pieces / cm 2 to 20000 pieces / cm 2 . More preferably, 15 / cm 2 to 10000 pieces / cm 2, more preferably, is 20 / cm 2 ~ 5000 pieces / cm 2. In the present embodiment, “˜” indicating a numerical range is used in the sense of including the numerical values described before and after the numerical value as a lower limit value and an upper limit value.

さらに、上記した複数のウェル21及び隔壁部22のそれぞれの表面(培養面15a)には、細胞の接着を抑制するための表面処理が施されている。具体的には、細胞接着抑制剤(タンパク質低接着剤)を用いた被膜(コート層)がウェル21及び隔壁部22の表面に形成されている。この細胞接着抑制剤としては、例えばリン脂質ポリマー(2−メタクリロイルオキシエチルホスホリルコリンなど)、ポリヒドロキシエチルメタアクリレート、フッ素含有化合物、若しくは、ポリエチレングリコールなどが挙げられる。ウェル21及び隔壁部22を含む培養面15aに、このような被膜が形成されていることで、細胞は培養面に接着することがないため、細胞どうしで凝集してスフェロイドを形成され、また、ウェル21内からのスフェロイドの取り出しも容易になる。   Further, the surface of each of the plurality of wells 21 and the partition wall 22 (culture surface 15a) is subjected to a surface treatment for suppressing cell adhesion. Specifically, a film (coat layer) using a cell adhesion inhibitor (protein low adhesive) is formed on the surfaces of the well 21 and the partition wall 22. Examples of the cell adhesion inhibitor include phospholipid polymers (such as 2-methacryloyloxyethyl phosphorylcholine), polyhydroxyethyl methacrylate, fluorine-containing compounds, and polyethylene glycol. Since such a coating is formed on the culture surface 15a including the well 21 and the partition wall 22, the cells do not adhere to the culture surface, so that the cells aggregate to form spheroids, The spheroid can be easily taken out from the well 21.

次に、培養容器10が備える培養基材15の製造方法を主に図5A〜図5Cに示す断面図及び図6に示すフローチャートに基づき説明する。図5A、図6に示すように、まず、培養基材15の母材となる矩形状のガラス基板(例えば縦75mm×横25mm[又は6インチ角]×厚さ0.5mmの無アルカリガラス基板)15cを用意する(S[ステップ]1)。   Next, the manufacturing method of the culture base material 15 with which the culture container 10 is provided is demonstrated mainly based on sectional drawing shown to FIG. 5A-FIG. 5C, and the flowchart shown in FIG. As shown in FIGS. 5A and 6, first, a rectangular glass substrate (for example, 75 mm long × 25 mm wide [or 6 inch square] × 0.5 mm thick non-alkali glass substrate serving as a base material of the culture substrate 15) ) 15c is prepared (S [Step] 1).

次に、ガラス基板15cの上下面(一方及び他方の主面)にPET(ポリエチレンテレフタレート)フィルムを貼り付ける(S2)。続いて、CO2レーザを用い、図5B、図6に示すように、ガラス基板15cの培養面の形成側(上面側)に、ウェルの基になる複数の種穴15dを所定のピッチ(例えば800μmピッチ)で穿孔する(S3)。種穴15dの形成後、PETフィルムをガラス基板15cから剥離し(S4)、例えば710℃の温度環境を1時間継続させる条件でアニールを行う(S5)。 Next, a PET (polyethylene terephthalate) film is attached to the upper and lower surfaces (one and the other main surfaces) of the glass substrate 15c (S2). Subsequently, using a CO 2 laser, as shown in FIGS. 5B and 6, a plurality of seed holes 15 d serving as a base of the well are formed at a predetermined pitch (for example, on the culture surface formation side (upper surface side) of the glass substrate 15 c (for example, Drilling is performed at a pitch of 800 μm (S3). After the formation of the seed hole 15d, the PET film is peeled from the glass substrate 15c (S4), and annealing is performed under the condition that the temperature environment of 710 ° C. is continued for 1 hour (S5).

次いで、ガラス基板15cの非培養面側(下面側)に保護フィルムを貼り付けた後(S6)、フッ酸のかけ流しによるシャワーエッチングを行う(S7)。これにより、図5Cに示すように、培養面15a上に複数のウェル21及び隔壁部22が形成される。この場合のエッチングは、等方エッチングであるため、ウェル21の深さは、種穴15dの深さとなり、ウェル21の幅方向のサイズは、エッチング時間に依存することになる。なお、シャワーエッチングでは、残渣(アルミニウムとフッ酸との反応による不要な生成物)の発生を抑える。また、このようなシャワーエッチングに代えて、エッチング液にガラス基板15c全体を浸漬させる一般的なエッチングを適用してもよい。なお、ここで用いることができるガラスは、ソーダ石灰ガラス、ホウ珪酸ガラス、石英ガラス、化学強化用ガラス等が挙げられる。   Next, after a protective film is attached to the non-culture surface side (lower surface side) of the glass substrate 15c (S6), shower etching is performed by pouring hydrofluoric acid (S7). Thereby, as shown to FIG. 5C, the several well 21 and the partition part 22 are formed on the culture surface 15a. Since the etching in this case is isotropic etching, the depth of the well 21 becomes the depth of the seed hole 15d, and the size of the well 21 in the width direction depends on the etching time. In the shower etching, generation of a residue (an unnecessary product due to a reaction between aluminum and hydrofluoric acid) is suppressed. Moreover, it may replace with such shower etching and may apply the general etching which immerses the whole glass substrate 15c in etching liquid. Examples of the glass that can be used here include soda lime glass, borosilicate glass, quartz glass, and glass for chemical strengthening.

この後、例えば培養基材の複数個取り用のガラス基板を適用している場合、このガラス基板を基材単位(培養基材15の単位)に切断し(S8)、さらに、検査、洗浄を行う(S9)。次いで、シランカップリング剤を加水分解した細胞非接着用のコーティング材料を培養面15aに室温で塗工した後、例えば120℃の温度環境を2時間継続させる加熱乾燥によって、細胞非接着コート層を培養面15a上に形成する(S10)。   Thereafter, for example, when a glass substrate for taking a plurality of culture substrates is applied, the glass substrate is cut into substrate units (units of the culture substrate 15) (S8), and further, inspection and cleaning are performed. Perform (S9). Next, after coating the cell surface non-adhesive coating material obtained by hydrolyzing the silane coupling agent on the culture surface 15a at room temperature, the cell non-adhesive coat layer is formed by, for example, heat drying for 2 hours in a 120 ° C temperature environment. It forms on the culture surface 15a (S10).

続いて、γ線による滅菌処理では、ガラス製の材料を変色させてしまうため、これを用いずに、細胞非接着コートを形成した上記のガラス製の基材に対して、EOG滅菌(60℃のエチレンオキサイドガスを用いた滅菌)又はオートクレーブ滅菌(121℃の飽和水蒸気中での20分間の滅菌)を施す(S11)。このような滅菌処理を経ることで、培養基材15を得ることができる(S12)。   Subsequently, since the glass material is discolored in the sterilization treatment with γ-rays, EOG sterilization (60 ° C.) is performed on the glass substrate on which the cell non-adhesive coat is formed without using this. Sterilization using ethylene oxide gas) or autoclave sterilization (sterilization for 20 minutes in 121 ° C. saturated steam) (S11). The culture substrate 15 can be obtained through such sterilization treatment (S12).

次に、本実施形態に係る培養容器10を用いたスフェロイドの形成方法について説明する。まず、培養の対象となる複数の細胞(細胞懸濁液)を培養容器10内に投入した後、培養容器10本体を揺動させることで、複数の細胞を、中央の凹んだ隔壁部22を介して、ウェル21どうしの間で移動させ、これによって、培養容器10内の各ウェル21に対して、複数の細胞を均一的に分散して配置する。   Next, a method for forming a spheroid using the culture vessel 10 according to the present embodiment will be described. First, a plurality of cells (cell suspension) to be cultured are put into the culture container 10 and then the main body of the culture container 10 is swung so that the plurality of cells are separated from the central recessed wall portion 22. Thus, the cells are moved between the wells 21, whereby a plurality of cells are uniformly distributed and arranged in the wells 21 in the culture vessel 10.

この後、培養液(培地)を添加した培養容器10は、数時間〜数日間、例えば37℃、飽和水蒸気下、5%炭酸ガス雰囲気に保たれた培養装置内で培養やインキュベートが行われる。ウェル21内の細胞は、ウェル21の内面に細胞接着抑制剤を用いた被膜が形成されているため、ウェル21や隔壁部22に接着することなく、細胞どうしが接着して、スフェロイド(細胞凝集塊)が形成される。この際、細胞は、ウェル21の形状及び大きさに対応して、三次元的に凝集する。この後、さらに培養を継続することにより、スフェロイドを構成する細胞は増殖及び分化して、任意の生理活性を示すようになる。   Thereafter, the culture vessel 10 to which the culture medium (medium) has been added is cultured or incubated for several hours to several days, for example, in a culture apparatus maintained in a 5% carbon dioxide gas atmosphere at 37 ° C. under saturated steam. Since the cells in the well 21 are coated with a cell adhesion inhibitor on the inner surface of the well 21, the cells adhere to each other without adhering to the well 21 or the partition wall 22, and spheroids (cell aggregation) Lump) is formed. At this time, the cells aggregate three-dimensionally according to the shape and size of the well 21. Thereafter, by further culturing, the cells constituting the spheroids proliferate and differentiate to display any physiological activity.

既述したように、本実施形態の培養容器10によれば、培養の対象となる細胞を、各ウェルに対して均一的に分散して配置することができる。これにより、大きさの均一化されたスフェロイドを得ることが可能となる。   As described above, according to the culture container 10 of the present embodiment, the cells to be cultured can be uniformly distributed and arranged in each well. This makes it possible to obtain a spheroid having a uniform size.

<第2の実施の形態>
次に、第2の実施形態を図7及び図8に基づき説明する。なお、図7及び図8において、図1及び図2に示した第1の実施形態中の構成要素と同一の構成要素については、同一の符号を付与し重複する説明を省略する。
<Second Embodiment>
Next, a second embodiment will be described based on FIGS. In FIGS. 7 and 8, the same components as those in the first embodiment shown in FIGS. 1 and 2 are given the same reference numerals and redundant description is omitted.

図7、図8に示すように、第2の実施形態に係る培養容器30は、第1の実施形態の培養容器10が備えていた容器本体16及び矩形状の培養基材15に代えて、容器本体36及び円板状のガラス製の培養基材35を備えている。培養容器30の容器本体36における底部32には、貫通穴が形成されておらず、図7、図8に示すように、円板状の培養基材35は、容器本体36の底部32の上面に接合されている。また、培養基材35には、培養基材15と同様に、図3Aに示した構造の複数のウェル21及び隔壁部22が培養面35aに設けられている。   As shown in FIGS. 7 and 8, the culture container 30 according to the second embodiment is replaced with the container body 16 and the rectangular culture substrate 15 provided in the culture container 10 of the first embodiment. A container body 36 and a disk-shaped glass culture substrate 35 are provided. A through hole is not formed in the bottom portion 32 of the container body 36 of the culture container 30, and the disc-shaped culture substrate 35 is formed on the top surface of the bottom portion 32 of the container body 36 as shown in FIGS. 7 and 8. It is joined to. In addition, the culture substrate 35 is provided with a plurality of wells 21 and partition walls 22 having the structure shown in FIG. 3A on the culture surface 35a, similarly to the culture substrate 15.

ここで、培養面15a側(培養基材15の平坦な周縁部15b)を容器本体16に接合していた培養容器10とは異なり、培養容器30は、培養面35aの背面側(非培養面側)が容器本体36と接合されている。このため、培養基材35の周縁部35bにもウェル21が形成されている。このようなスペースの有効的な活用により、効率的に細胞を培養することができる。   Here, unlike the culture vessel 10 in which the culture surface 15a side (flat peripheral edge 15b of the culture substrate 15) is joined to the container body 16, the culture vessel 30 is provided on the back side (non-culture surface) of the culture surface 35a. Side) is joined to the container body 36. For this reason, the well 21 is also formed in the peripheral portion 35 b of the culture substrate 35. By effectively using such a space, cells can be cultured efficiently.

なお、培養基材35の周縁部35bにウェルを形成することに代えて、培養基材35の周縁部35bを平坦部として構成することも可能である。この平坦な周縁部35bに、個々のウェルを特定するための識別番号など示す数字(番地)やマークを記すようにしてもよい。   In addition, it can replace with forming a well in the peripheral part 35b of the culture base material 35, and the peripheral part 35b of the culture base material 35 can also be comprised as a flat part. Numbers (addresses) or marks indicating identification numbers for specifying individual wells may be written on the flat peripheral edge 35b.

第2の実施形態に係る培養容器30によれば、第1の実施形態の培養容器10と同様に、培養の対象となる細胞を、各ウェルに対して均一的に分散して配置することが可能であると共に、培養容器本体の構造の簡略化や細胞を培養する際の効率化などを図ることができる。   According to the culture container 30 according to the second embodiment, similarly to the culture container 10 of the first embodiment, cells to be cultured can be uniformly distributed and arranged in each well. In addition, it is possible to simplify the structure of the main body of the culture container and improve the efficiency when culturing cells.

以上、本発明を実施の形態により具体的に説明したが、本発明はこの実施形態そのままに限定されるものではなく、実施段階ではその要旨を逸脱しない範囲で種々変更可能である。例えば、実施形態に示される全構成要素から幾つかの構成要素を削除してもよいし、上記実施形態に開示されている複数の構成要素を適宜組み合わせることも可能である。例えば、ガラス製の培養基材15、35に代えて、樹脂製の培養基材を適用してもよい。樹脂製の培養基材の場合、ウェルの種穴を、金型成形やリヒートプレス加工などによって形成することが可能となる。   Although the present invention has been specifically described above with reference to the embodiment, the present invention is not limited to the embodiment as it is, and various modifications can be made without departing from the scope of the invention at the implementation stage. For example, some constituent elements may be deleted from all the constituent elements shown in the embodiment, or a plurality of constituent elements disclosed in the above embodiments may be combined as appropriate. For example, instead of the glass culture substrates 15 and 35, resin culture substrates may be applied. In the case of a resin culture substrate, the well seed hole can be formed by die molding, reheat press processing, or the like.

10,30…培養容器、15,35…培養基材、15a,35a…培養基材の培養面、15b,35b…培養基材の周縁部、15c…ガラス基板、15d…種穴、16,36…容器本体、21…ウェル、22…隔壁部、22a…隔壁部の交点部分。   DESCRIPTION OF SYMBOLS 10,30 ... Culture container, 15, 35 ... Culture substrate, 15a, 35a ... Culture surface of culture substrate, 15b, 35b ... Periphery of culture substrate, 15c ... Glass substrate, 15d ... Seed hole, 16, 36 ... container body, 21 ... well, 22 ... partition wall, 22a ... intersection part of partition wall.

Claims (10)

複数のウェルと、
中央が高さ方向に凹んだ形状を有し前記ウェルどうしを区画する隔壁部と、
を備える培養容器。
Multiple wells,
A partition wall having a shape in which the center is recessed in the height direction and partitioning the wells;
A culture vessel comprising:
前記隔壁部は、円弧状に凹んでいる、
請求項1に記載の培養容器。
The partition wall is recessed in an arc shape,
The culture container according to claim 1.
前記隔壁部の先端部分は、とがった形状で構成されている、
請求項1又は2に記載の培養容器。
The tip of the partition wall is configured with a pointed shape,
The culture container according to claim 1 or 2.
前記隔壁部は、格子状またはハニカム状に配列されている、
請求項1から3までのいずれか1項に記載の培養容器。
The partition walls are arranged in a lattice shape or a honeycomb shape,
The culture container according to any one of claims 1 to 3.
前記隔壁部は、交点部分の高さが最も高い、
請求項4に記載の培養容器。
The partition wall has the highest intersection part height,
The culture container according to claim 4.
前記隔壁部における円弧状に凹んでいる部位の深さhとウェルの深さdの関係であるh/dが0.1以上0.6以下である、
請求項2から5までのいずれか1項に記載の培養容器。
H / d, which is the relationship between the depth h of the arc-shaped portion of the partition wall and the depth d of the well, is 0.1 or more and 0.6 or less.
The culture container according to any one of claims 2 to 5.
前記隔壁部における凹みの深さhが10μm以上600μm以下である、
請求項1から6までのいずれか1項に記載の培養容器。
The depth h of the recess in the partition wall is 10 μm or more and 600 μm or less.
The culture container according to any one of claims 1 to 6.
前記複数のウェル及び前記隔壁部を構成している材料は、ガラスである、
請求項1から7までのいずれか1項に記載の培養容器。
The material constituting the plurality of wells and the partition wall is glass.
The culture container according to any one of claims 1 to 7.
前記複数のウェル及び前記隔壁部は、所定の基材上に設けられており、
前記基材が取り付けられた容器本体をさらに備える、
請求項1から8までのいずれか1項に記載の培養容器。
The plurality of wells and the partition wall are provided on a predetermined base material,
A container body to which the substrate is attached;
The culture container according to any one of claims 1 to 8.
前記複数のウェル及び前記隔壁部のそれぞれの表面には、細胞の接着を抑制するための表面処理が施されている、
請求項1から9までのいずれか1項に記載の培養容器。
Each surface of the plurality of wells and the partition wall is subjected to a surface treatment for suppressing cell adhesion,
The culture container according to any one of claims 1 to 9.
JP2016232227A 2016-11-30 2016-11-30 Culture vessel Pending JP2018085978A (en)

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