JP2018084781A - Color filter, display device, and method of manufacturing color filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a color filter capable of eliminating roundness in a corner portion of an opening region and preventing a decrease in aperture ratio. A color filter used in a display device is provided with a first light-shielding pattern, a colored layer, and a second light-shielding pattern on a transparent substrate in this order, and the first light-shielding pattern is provided in this order. The opening area of the color filter is defined by the light-shielding pattern 1 and the second light-shielding pattern, and the opening area of the color filter is defined by the intersection of the first light-shielding pattern and the second light-shielding pattern. The above problem is solved by using a color filter in which the corner portion of the above is formed. [Selection diagram] Fig. 1

Description

  The present invention relates to a color filter used in a display device, a display device using the color filter, and a method for manufacturing the color filter.

  2. Description of the Related Art Conventionally, in a display device such as a liquid crystal display device, a pixel that is a minimum unit constituting an image is, for example, one pixel composed of three sub-pixels of red, green, and blue. The colored layer, the green colored layer, and the blue colored layer are respectively disposed in the corresponding subpixel regions. In addition, when a color filter is arrange | positioned at a display apparatus, it arrange | positions so that the transparent substrate side may become an observer side.

  FIG. 6 is a diagram illustrating an arrangement example of the color layers of the color filter. As shown in FIG. 6, a stripe type, a mosaic type, a triangle type, and a four-pixel arrangement type are known as arrangement examples. In FIG. 6, R, G, and B correspond to a red colored layer, a green colored layer, and a blue colored layer, respectively.

  Between the colored layers of the color filter, for the purpose of mainly preventing unnecessary light leakage, a black matrix layer having an opening region corresponding to the sub-pixel region and shielding the colored layers of the color filter is provided. Provided.

FIG. 7 is a diagram illustrating an example of a conventional color filter. Here, FIG. 7A shows a schematic plan view of the main part, FIG. 7B shows a cross-sectional view taken along the line CC in FIG. 7A, and FIG. 7C shows FIG. The DD sectional view taken on the line in (a) is shown.
FIG. 8 is a diagram showing a process example of a conventional color filter manufacturing method.

Conventionally, as a color filter for a display device, for example, as in the color filter 101 shown in FIG. 7, a black matrix layer 112 is provided on a transparent substrate 111 such as glass, and the transparent substrate 111 and the black matrix layer 112 are formed. A color filter having a plurality of colored layers 113 thereon and an overcoat layer 115 thereon has been used. The multi-color coloring layer 113 includes, for example, a red coloring layer 113R, a green coloring layer 113G, and a blue coloring layer 113B.
Although omitted in FIG. 7, columnar spacers may be provided on the overcoat layer 115.

  Then, as a method of manufacturing the color filter 101 shown in FIG. 7, for example, as shown in FIG. 8A, first, the black matrix layer 112 is formed on the transparent substrate 111, and thereafter, FIG. ), A method of forming a red colored layer 113R, a green colored layer 113G, and a blue colored layer 113B in accordance with each opening region 116 of the black matrix layer 112 has been used.

  Here, as a method for forming the black matrix layer 112, for example, a material obtained by dispersing a black color material in a photosensitive resin is applied onto the transparent substrate 111, and a desired opening region is included by photolithography. A method of forming a black matrix layer can be used.

  Although not shown in FIG. 8, normally, after the colored layer 113 is formed, an overcoat layer is formed. Moreover, columnar spacers are usually provided on the overcoat layer.

  Further, as shown in FIG. 8A, in the process of forming the black matrix layer 112, the alignment mark 117 and the outer periphery light shielding portion 118 are also usually formed. The alignment mark 117 is used for alignment when forming each colored layer.

  Further, in a display device having a large viewing angle, such as an organic EL (electroluminescence) display device that has been developed in recent years, a transparent substrate is used as a color filter capable of preventing color shift (parallax color mixing) of a display image. A color filter having a structure in which the black matrix layer is provided on the colored layer instead of between the colored layers has also been proposed (for example, Patent Document 1).

  Here, the above-mentioned parallax color mixing means that light in a certain sub-pixel area is directly incident on a colored layer in an adjacent sub-pixel area, or is transmitted through the colored layer in that sub-pixel area and is adjacent to the adjacent sub-pixel area. This is a phenomenon in which a color shift (parallax color mixing) of a display image occurs depending on a viewing direction due to light leakage to an adjacent sub-pixel region such as entering a colored layer.

FIG. 9 is a schematic cross-sectional view showing an example of a display device using a conventional color filter.
For example, as shown in FIG. 9, in the display device 102 using the conventional color filter 101 shown in FIG. 7, most of the light from the light emitting layer 123R of the organic EL element substrate 120 is colored red like the light ray L101. A part of the light that is transmitted through the layer 113R and emitted to the viewer side in an oblique direction from the light emitting layer 123R is a green colored layer 113G adjacent to the red colored layer 113R like the light ray L102. , And passes through the green colored layer 113G and exits to the viewer side. In particular, due to the light ray L102, a color shift (parallax color mixture) of the display image occurs when viewed from an oblique direction.

  Therefore, as a color filter capable of preventing color shift (parallax color mixture) due to light leakage as described above, a colored layer of a plurality of colors is first formed on a transparent substrate as in Patent Document 1, In addition, a color filter having a configuration in which a black matrix layer having a substantially T-shaped cross section is formed by filling between adjacent colored layers has been proposed.

FIG. 10 is a schematic sectional view showing another example of a display device using a conventional color filter. That is, FIG. 10 is a schematic cross-sectional view showing an example of a display device using a color filter having a configuration in which a black matrix layer is formed on a colored layer as described above.
For example, as shown in FIG. 10, in the display device 202 using the color filter 201 having a configuration in which the black matrix layer is formed on the colored layer as described above, the light emitting layer 223R of the organic EL element substrate 220 is used. The light beam L202 emitted obliquely is absorbed by the black matrix layer 212 that fills the space between the red colored layer 213R and the green colored layer 213G and has a substantially T-shaped cross section (inverted T-shaped in FIG. 10). The Therefore, it is possible to prevent the light beam L202 from passing through the green colored layer 213G and exiting to the viewer side, and to suppress a color shift (parallax color mixture) of the display image when viewed from an oblique direction.
Note that the light rays L201 and L202 in FIG. 10 correspond to the light rays L101 and L102 shown in FIG.

JP 2014-153519 A

However, a color filter in which a black matrix layer having an opening area corresponding to a sub-pixel area is formed as in the past, in other words, a black matrix layer having a corner portion of the opening area is formed as the same layer. However, the color filter has a problem that the shape of the corner portion is rounder than the design and the aperture ratio is lowered.
This is a problem that also occurs in the color filter having the above-described configuration in which the black matrix layer is provided on the colored layer.
Note that the aperture ratio refers to a ratio of a region (opening region) through which light passes in the color filter to the area of the sub-pixel of the display device.

  FIG. 11 is a diagram illustrating an example of a corner portion of an opening area of a conventional color filter. Here, Fig.11 (a) shows the schematic plan view of the principal part, FIG.11 (b) shows the enlarged view of the corner part of the opening area | region shown to Fig.11 (a). In FIG. 11, for ease of explanation, the form of the black matrix layer 112 as a main part is mainly shown, and other configurations such as a colored layer are omitted.

For example, in the example shown in FIG. 11, the corner portion of the opening region 116 of the black matrix layer 112 is rounded in the range of W _X in the X direction in the drawing and in the range of W _Y in the Y direction in the drawing. ing.
This is because the black matrix layer forming method in the conventional color filter uses a method of forming a patterned black matrix layer including a desired opening region as a photosensitive resin pattern by photolithography. .
That is, a method of forming a photosensitive resin pattern using a liquid, more specifically, a method of leaving a photosensitive resin pattern cured by exposure using a developer or the like, and removing an uncured photosensitive resin, It is difficult to completely eliminate the roundness of the corner of the opening area, which is a substantially rectangular opening pattern, and as the opening area becomes finer, this roundness cannot be ignored in terms of quality. .
For example, when the values of W _X and W _Y shown in FIG. 11 are both about 4 μm, the aperture ratio may decrease by about 2% to 5%.

  The present invention has been made in view of the above circumstances, a color filter capable of eliminating the roundness at the corner portion of the opening region and preventing a reduction in the aperture ratio, and a display device using the color filter Another object is to provide a method for producing the color filter.

  That is, the invention according to claim 1 of the present invention is a color filter used in a display device, wherein a first light-shielding pattern, a colored layer, and a second light-shielding pattern are arranged in this order on a transparent substrate. An opening area of the color filter is defined by the first light shielding pattern and the second light shielding pattern in plan view, and the first light shielding pattern and the second light shielding pattern are The color filter is characterized in that a corner portion of an opening region of the color filter is formed by intersecting.

  The color filter according to claim 1, wherein the line width of the first light-shielding pattern is larger than the line width of the second light-shielding pattern. It is.

  In the invention according to claim 3 of the present invention, in the plan view, the colored layer of the same color is provided in one direction of the transparent substrate, and the colored layer of the same color is provided in the direction. The color filter according to claim 1, wherein the second light shielding pattern is provided along the color filter.

  The invention according to claim 4 of the present invention is the color filter according to any one of claims 1 to 3, wherein the display device is an organic EL display device.

  According to a fifth aspect of the present invention, there is provided a display device characterized in that a display section is formed using the color filter according to any one of the first to fourth aspects. is there.

  The invention according to claim 6 of the present invention is a method for producing a color filter used in a display device, the step of forming a first light-shielding pattern on a transparent substrate, and the step of forming a colored layer. And a step of forming a second light-shielding pattern in order, and in plan view, an opening region of the color filter is defined by the first light-shielding pattern and the second light-shielding pattern, and the first The color filter manufacturing method is characterized in that a corner portion of an opening region of the color filter is formed by intersecting one light-shielding pattern and the second light-shielding pattern.

  The invention according to claim 7 of the present invention is characterized in that a line width of the first light shielding pattern is formed larger than a line width of the second light shielding pattern. It is a manufacturing method of a color filter.

  In the invention according to claim 8 of the present invention, the step of forming the colored layer includes a step of forming the colored layer of the same color in one direction of the transparent substrate in a plan view. The step of forming the second light-shielding pattern comprises the step of forming the second light-shielding pattern along the direction in which the colored layer of the same color is formed. 7. A method for producing a color filter according to 7.

  The invention according to claim 9 of the present invention is characterized in that the step of forming the first light shielding pattern includes a step of forming an alignment mark. 2. A method for producing a color filter according to claim 1.

  According to the color filter of the present invention, it is possible to eliminate the occurrence of roundness in the corner portion of the opening region and to prevent the opening ratio from being lowered.

  In addition, according to the display device of the present invention, it is possible to prevent the aperture ratio from being lowered due to the roundness in the corners of the color filter opening area, and the pixel size becomes finer due to higher definition. However, a display device with high luminance can be obtained.

  Further, according to the method for manufacturing a color filter according to the present invention, it is possible to eliminate the occurrence of roundness at the corner of the opening area of the color filter, and it is possible to manufacture a color filter that prevents a decrease in the aperture ratio. .

The figure which shows an example of the color filter which concerns on this invention The figure which shows the process example of the manufacturing method of the color filter which concerns on this invention The figure which shows an example of the corner part of the opening area | region of the color filter which concerns on this invention The figure which shows the comparison with the color filter which concerns on this invention, and the conventional color filter Schematic sectional view showing an example of a display device according to the present invention The figure which shows the example of arrangement | positioning of the colored layer of a color filter The figure which shows an example of the conventional color filter The figure which shows the example of a process of the manufacturing method of the conventional color filter Schematic sectional view showing an example of a display device using a conventional color filter Schematic sectional view showing another example of a display device using a conventional color filter The figure which shows an example of the corner part of the opening area | region of the conventional color filter

<Color filter and color filter manufacturing method>
(Color filter)
First, the color filter according to the present invention will be described.
FIG. 1 is a diagram showing an example of a color filter according to the present invention. Here, FIG. 1 (a) shows a schematic plan view of the main part, FIG. 1 (b) shows a cross-sectional view along the line AA in FIG. 1 (a), and FIG. 1 (c) shows FIG. The BB sectional view taken on the line in (a) is shown.

  As shown in FIG. 1, in the color filter 1, a first light shielding pattern 12, a plurality of colored layers 13, and a second light shielding pattern 14 are provided in this order on a transparent substrate 11. .

  More specifically, in the color filter 1, as shown in FIGS. 1A and 1C, the first light shielding pattern 12 is first provided on the transparent substrate 11, and then the transparent substrate 11. A plurality of colored layers 13 are provided on the first light shielding pattern 12. Further, as shown in FIGS. 1A and 1B, a second light-shielding pattern 14 having a substantially T-shaped cross section is provided on the colored layer 13 so as to fill the space between the adjacent colored layers 13. ing.

  In the example shown in FIG. 1A, the first light shielding pattern 12 is a line-and-space pattern extending in the X direction in the figure, and the second light-shielding pattern 14 is a line and space extending in the Y direction in the figure. Pattern.

  The multi-colored colored layer 13 includes a red colored layer 13R, a green colored layer 13G, and a blue colored layer 13B.

  In the color filter 1, an overcoat layer 15 is provided on the colored layer 13 and the second light shielding pattern 14 for the purpose of protecting the colored layer 13 and the second light shielding pattern 14.

  Although omitted in FIG. 1, columnar spacers may be provided on the overcoat layer 15.

  As shown in FIGS. 1A to 1C, the first light shielding pattern 12 and the second light shielding pattern 14 define an opening region 16 of the color filter 1, and the first light shielding pattern 12. And the second light-shielding pattern 14 intersect to form a corner portion of the opening region 16 of the color filter 1.

(Color filter manufacturing method)
Next, a method for manufacturing a color filter according to the present invention will be described.
As a method of manufacturing the color filter 1 shown in FIG. 1, for example, a step of forming a first light shielding pattern 12 on a transparent substrate 11, a step of forming a colored layer 13 of a plurality of colors, Forming a light shielding pattern 14 in order, and in plan view, an opening region 16 of the color filter 1 is defined by the first light shielding pattern 12 and the second light shielding pattern 14, and the first light shielding pattern A method of forming a corner portion of the opening region 16 of the color filter 1 by crossing 12 and the second light shielding pattern 14 can be used.

FIG. 2 is a diagram showing a process example of a method for manufacturing a color filter according to the present invention.
In order to manufacture the color filter 1 shown in FIG. 1, for example, as shown in FIG. 2A, first, the first light-shielding pattern 12 is formed on the transparent substrate 11, and then, FIG. 2), a red colored layer 13R, a green colored layer 13G, and a blue colored layer 13B are formed on the transparent substrate 11 and the first light shielding pattern 12, respectively, and then, as shown in FIG. As shown, a second light shielding pattern 14 having a shape intersecting with the first light shielding pattern 12 in plan view is formed.

  As a method of forming the first light-shielding pattern 12 and the second light-shielding pattern 14, for example, a method in which a black color material is dispersed in a photosensitive resin, as in the conventional method of forming a black matrix layer, A method of forming the first light-shielding pattern 12 and the second light-shielding pattern 14 having a desired pattern shape by photolithography can be used.

  Although not shown in FIG. 2, normally, after the second light shielding pattern 14 is formed, an overcoat layer is formed. Moreover, columnar spacers are usually provided on the overcoat layer.

In addition, as shown in FIG. 2A, it is preferable to form the alignment mark 17 and the outer periphery light shielding portion 18 in the step of forming the first light shielding pattern 12.
Without increasing the number of steps, the alignment mark 17 and the like can be formed. When this alignment mark 17 is used, alignment when forming the colored layer 13 of a plurality of colors and when forming the second light shielding pattern 14 are performed. This is because the positioning can be performed.

  Note that the present invention is not limited thereto, and in the present invention, the alignment mark 17 and the outer periphery light shielding portion 18 are formed on the transparent substrate 11 before the step of forming the colored layer 13 separately from the step of forming the first light shielding pattern 12. The process of forming may be provided. In addition, a transparent substrate on which the alignment mark 17 and the outer peripheral light shielding portion 18 are formed may be prepared as the transparent substrate 11.

(About the corner)
Next, the corner portion of the opening region of the color filter according to the present invention will be described.
FIG. 3 is a diagram illustrating an example of a corner portion of the opening region of the color filter according to the present invention. Here, FIG. 3A shows a schematic plan view of the main part, and FIG. 3B shows an enlarged view of the corner portion of the opening region shown in FIG. In FIG. 3, for ease of explanation, the first light shielding pattern 12 and the second light shielding pattern 14 which are main parts are mainly shown, and other configurations such as a colored layer are illustrated. Is omitted.

As shown in FIG. 3, in the color filter 1, an opening region 16 is defined by the first light shielding pattern 12 and the second light shielding pattern 14, and the first light shielding pattern 12 and the second light shielding pattern 14 are defined. Intersect each other to form a corner portion of the opening region 16.
And each of the 1st light shielding pattern 12 and the 2nd light shielding pattern 14 does not have a corner part.
Therefore, regardless of the method of forming the first light shielding pattern 12 and the second light shielding pattern 14, the corner portion cannot be rounded.

  For example, as a method of forming the first light shielding pattern 12 and the second light shielding pattern 14, a photolithography method similar to the method of forming a black matrix layer in a conventional color filter, more specifically, using a developer or the like. Even if a method of removing the uncured photosensitive resin while leaving the photosensitive resin pattern cured by exposure is used, the corner portion of the opening region 16 is not rounded.

Therefore, according to the color filter of the present invention, it is possible to eliminate the occurrence of roundness in the corner portion of the opening region and to prevent the opening ratio from being lowered.
Further, according to the method for manufacturing a color filter according to the present invention, it is possible to eliminate the occurrence of roundness at the corner of the opening area of the color filter, and it is possible to manufacture a color filter that prevents a decrease in the aperture ratio. .

(About other forms)
In the color filter 1 shown in FIG. 1, as an example of the color filter according to the present invention, the same color is colored in one direction of the transparent substrate 11 in plan view as in the stripe type shown in FIG. The mode in which the second light-shielding pattern 14 is provided along the direction in which the layer 13 is provided and the colored layer 13 of the same color is provided is illustrated, and the planar shape of the opening region 16 is also rectangular. However, the present invention is not limited to this form.
In the present invention, the opening area of the color filter is defined by the first light shielding pattern and the second light shielding pattern, and the corner portion of the opening area is obtained by intersecting the first light shielding pattern and the second light shielding pattern. Can be applied as long as the configuration is configured, and can be applied to various arrangement forms and various opening region shapes.

  Further, in the color filter 1 shown in FIG. 1, as an example of the color filter according to the present invention, an example in which the line width of the first light shielding pattern 12 is larger than the line width of the second light shielding pattern 14 is illustrated. The present invention is not limited to this form, and the first light-shielding pattern 12 may have a line width smaller than that of the second light-shielding pattern 14, or the first light-shielding pattern 12. The line width may be the same as the line width of the second light shielding pattern 14.

  However, in a liquid crystal display device or the like, the region where the gate line portion of the TFT is normally formed is wider than the region where the source line portion of the TFT is formed. It is preferable that the line width of the light shielding pattern corresponding to the formation region of the gate line portion is increased and the line width of the light shielding pattern corresponding to the formation region of the source line portion is decreased.

(Comparison with conventional)
FIG. 4 is a diagram showing a comparison between a color filter according to the present invention and a conventional color filter.
Here, the upper part in the figure relates to the color filter according to the present invention, (a-1) is a design form of the opening region, (a-2) is an overall photograph of the opening region of the present invention, (a- 3) shows enlarged photographs of the corners of the opening region shown in (a-2).
The lower part of the figure relates to a conventional color filter, (b-1) is a design form of the opening area, (b-2) is an overall photograph of the conventional opening area, and (b-3) is ( The corner part enlarged photograph of the opening area | region shown to b-2) is each shown.

  4A-1 and FIG. 4B-1 are the same. Further, the conventional color filter is a color filter in which a black matrix layer having a corner portion of an open region is formed on the transparent substrate as the same layer as the color filter 101 shown in FIG.

  As shown in FIGS. 4B-2 and 4B-3, in the conventional color filter, the shape of the corner is rounder than the design, and the aperture ratio is 5 than the design. %.

  On the other hand, as shown in FIGS. 4 (a-2) and (a-3), in the color filter according to the present invention, the corner portion is not rounded, and the designed aperture ratio can be achieved. It was a thing.

  Hereinafter, each configuration in the color filter according to the present invention will be described in detail.

(Transparent substrate)
The transparent substrate supports the first light shielding pattern, the colored layers of a plurality of colors, the second light shielding pattern, the overcoat layer, and the like.

  As the material of the transparent substrate, any material generally used for color filters can be used. For example, a non-flexible inorganic substrate such as quartz glass, Pyrex (registered trademark) glass, synthetic quartz plate, etc. And a flexible resin substrate such as a transparent resin film and an optical resin plate.

  For example, in the case of an inorganic substrate, it is preferable to use a non-alkali type glass substrate. The alkali-free type glass substrate is excellent in dimensional stability and workability in high-temperature heat treatment, and since it does not contain an alkali component in the glass, it can be suitably used as a transparent substrate for a color filter for a display device. Because.

(First light shielding pattern and second light shielding pattern)
The first light-shielding pattern and the second light-shielding pattern prevent unnecessary light leakage, and the material thereof can be the same as that of a black matrix layer used in a conventional color filter. What disperse | distributed the black color material in resin can be used.

  Examples of the black color material include carbon black and titanium black. The binder resin is appropriately selected according to the method for forming the first light shielding pattern and the second light shielding pattern.

  In the case of the photolithography method, as the binder resin, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used.

  In the case of a printing method or inkjet method, examples of the binder resin include polymethyl methacrylate resin, polyacrylate resin, polycarbonate resin, polyvinyl alcohol resin, polyvinyl pyrrolidone resin, hydroxyethyl cellulose resin, carboxymethyl cellulose resin, polyvinyl chloride resin, Examples include melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin and the like.

  In the first light-shielding pattern and the second light-shielding pattern, a photopolymerization initiator, a sensitizer, a coating property improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant and the like are included as necessary. It may be contained.

  The film thickness of the first light-shielding pattern and the second light-shielding pattern can be the same as the film thickness of a general black matrix layer in a color filter, and is set within a range of 0.5 μm to 2.5 μm, for example. can do.

  The shape of the opening area defined by the first light-shielding pattern and the second light-shielding pattern is not particularly limited. For example, the arrangement of the colored layers is changed such as a stripe shape, a dogleg shape, or a delta arrangement. There are also things.

(Colored layer)
The colored layer includes a red colored layer, a green colored layer, and a blue colored layer. However, the colored layer only needs to include at least the three colors of red, green, and blue. For example, red, green, and blue 3 The colors may be four colors of red, green, blue and yellow, or five colors of red, green, blue, yellow and cyan.

  The arrangement of the colored layers is not particularly limited, and may be a known arrangement such as a stripe type, a mosaic type, a triangle type, or a four-pixel arrangement type.

  The colored layer is, for example, a color material dispersed in a binder resin. Examples of the color material include pigments and dyes of each color.

  Examples of the coloring material used in the red coloring layer include perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, anthracene pigments, and isoindoline pigments.

  Examples of the colorant used in the green coloring layer include phthalocyanine pigments such as halogen polysubstituted phthalocyanine pigments or halogen polysubstituted copper phthalocyanine pigments, triphenylmethane basic dyes, isoindoline pigments, and isoindolinones. And pigments.

  Examples of the color material used in the blue colored layer include copper phthalocyanine pigments, anthraquinone pigments, indanthrene pigments, indophenol pigments, cyanine pigments, dioxazine pigments, and the like.

These pigments and dyes may be used alone or in combination of two or more.
As the binder resin, for example, a photosensitive resin having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber is used.

  The colored layer may contain a photopolymerization initiator and, if necessary, a sensitizer, a coatability improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like.

  The thickness of the colored layer can be the same as the thickness of a general colored layer in a color filter, and can be set, for example, within a range of 1 μm to 5 μm.

  The colored layer 13 may be formed by any method as long as a plurality of colored layers can be arranged on the same plane, and examples thereof include a photolithography method, an inkjet method, and a printing method.

  Further, on the same plane on which the colored layer is formed, a white layer that does not contain the color material but contains the binder resin and transmits light may be formed. Similar to the red, green and blue colored layers, this white layer is also arranged in the corresponding sub-pixel region. The film thickness and formation method of the white layer can be the same as those of the colored layer.

(Overcoat layer)
The material of the overcoat layer can be the same as that of the overcoat layer generally used for color filters, and any of organic materials and inorganic materials can be used.
Examples of the organic material include a thermosetting resin and a photocurable resin.

  The photocurable resin is the same as the binder resin used for the colored layer in the color filter, for example, a photosensitive vinyl group having a reactive vinyl group such as acrylate, methacrylate, polyvinyl cinnamate, or cyclized rubber. Resin is used. A photopolymerization initiator, a sensitizer, a coating property improver, a development improver, a crosslinking agent, a polymerization inhibitor, a plasticizer, a flame retardant, and the like may be added to the photosensitive resin as necessary.

  Examples of the thermosetting resin include those using an epoxy compound and those using a thermal radical generator. As an epoxy compound, the well-known polyvalent epoxy compound which can be hardened | cured with carboxylic acid, an amine compound, etc. can be mentioned. The thermal radical generator is at least one selected from the group consisting of persulfates, halogens such as iodine, azo compounds, and organic peroxides, more preferably azo compounds or organic peroxides. Examples of the azo compound include 1,1′-azobis (cyclohexane-1-carbonitrile, 1-[(1-cyano-1-methylethyl) azo] formamide, 2,2′-azobis- [N- (2-propenyl). ) -2-methylpropionamide], 2,2′-azobis (N-butyl-2-methylpropionamide), 2,2′-azobis (N-cyclohexyl-2-methylpropionamide) and the like, Examples of the organic peroxide include di (4-methylzenzoyl) peroxide, t-butylperoxy-2-ethylexanate, 1,1-di (t-hexylperoxy) cyclohexane, 1,1-di ( t-butylperoxy) cyclohexane, t-butylperoxybenzoate, t-butylperoxy-2-ethylhexyl monocarbonate, - butyl-4,4-di - (t-butylperoxy) Butaneto, and dicumyl peroxide.

The film thickness of the overcoat layer can be, for example, 0.5 μm or more and 3.5 μm or less.
The method for forming the overcoat layer can be the same as the method for forming the overcoat layer generally used for color filters. For example, the overcoat layer can be formed by applying a photosensitive resin composition by a spin coating method, drying, and baking.

<Display device>
Next, the display device according to the present invention will be described.
FIG. 5 is a schematic cross-sectional view showing an example of a display device according to the present invention. As shown in FIG. 5, the display device 2 includes a color filter 1 and an organic EL element substrate 20 in which a display unit is formed using the color filter 1. Although not shown, a sealing resin is usually filled between the color filter 1 and the organic EL element substrate 20.

  Note that the color filter 1 in FIG. 5 is arranged with the top and bottom (top and bottom) shown in FIG. 1 inverted. That is, the color filter 1 is disposed so that the overcoat layer 15 side faces the transparent electrode 24 side of the organic EL element substrate 20.

The organic EL element substrate 20 is provided on the support substrate 21, the back electrode 22 provided on the support substrate 21, the plurality of light emitting layers 23 provided on the back electrode 22, and the light emitting layer 23. And a transparent electrode 24 that transmits light from the light emitting layer 23.
The plurality of light emitting layers 23 include a red light emitting layer 23R, a green light emitting layer 23G, and a blue light emitting layer 23B. The red colored layer 13R, the green colored layer 13G, and the blue colored layer 13B of the color filter 1, respectively. Are arranged to face each other.

  The back electrode 22 is either an anode or a cathode, but is generally provided on the support substrate 21 as an anode. Examples of the forming material include metals such as gold, silver, and chromium. Therefore, the back electrode 22 can reflect light.

)
The transparent electrode 24 functions as a counter electrode for the back electrode 22. The transparent electrode 24 is either a cathode or an anode, but is generally provided as a cathode. As a material for forming the transparent electrode 24, a transparent conductive material such as ITO (indium tin oxide), indium oxide, IZO (indium zinc oxide), SnO ₂ , or ZnO is used.

  In the display device 2 shown in FIG. 5, as the light emitting layer 23 of the organic EL element substrate 20, a type in which a red light emitting layer 23R, a green light emitting layer 23G, and a blue light emitting layer 23B are arranged in a plane is illustrated. However, the light emitting layer 23 may be a white light emitting layer.

  As described above, in the display device 2, the display unit is formed using the color filter 1. Therefore, in the display device 2, it is possible to prevent a decrease in the aperture ratio due to rounding of the corner portion of the color filter opening region, and even if the pixel size becomes finer as high definition progresses, A display device with high luminance can be obtained.

  In the display device 2 shown in FIG. 5, the example in which the color filter 1 shown in FIG. 1 is used in an organic EL display device is shown. However, the color filter according to the present invention is used in a liquid crystal display device. However, the same effect can be obtained.

(About the effect of preventing parallax color mixing)
The color filter according to the present invention eliminates the occurrence of roundness at the corners of the opening region as described above, and can prevent a decrease in the aperture ratio, and also has an effect of preventing parallax color mixing. It is possible to play.
Hereinafter, the effect which prevents the parallax color mixing which the color filter concerning this invention can show | play is demonstrated.

(About stripe type)
First, the color filter used in the display device is provided with a colored layer 13 of the same color in one direction of the transparent substrate 11 in a plan view like the color filter 1 shown in FIG. A case in which the second light-shielding pattern 14 is provided along the direction in which the second light-shielding pattern is disposed, that is, a so-called stripe-type form will be described.

First, the function and effect in the X direction shown in FIG.
As shown in FIG. 5, in the display device 2, the second light shielding pattern 14 of the color filter 1 is positioned closer to the organic EL element substrate 20 than the colored layer 13.
Therefore, in the X direction shown in FIG. 1A, as shown in FIG. 5, the light ray L2 emitted in the oblique direction from the light emitting layer 23R of the organic EL element substrate 20 is absorbed by the second light shielding pattern 14. Thus, it is possible to prevent the light ray L2 from passing through the green colored layer 13G and exiting to the viewer side, and to suppress color shift (parallax color mixture) of the display image when viewed from an oblique direction.
Note that the light beams L1 and L2 in FIG. 5 correspond to the light beams L101 and L102 illustrated in FIG. 9 and the light beams L201 and L202 illustrated in FIG.

Next, the function and effect in the Y direction shown in FIG.
Since the first light shielding pattern 12 of the color filter 1 is provided between the transparent substrate 11 and the colored layer 13 as shown in FIG. 1, in principle, the black matrix layer of the conventional color filter 101 shown in FIG. As in the case of 112, it is impossible to prevent a light beam emitted in an oblique direction from passing through an adjacent colored layer and exiting to the viewer side.

However, as shown in FIG. 1, the color filter 1 is provided with a colored layer 13 of the same color in one direction of the transparent substrate 11 in plan view.
More specifically, in the color filter 1, the adjacent colored layers (colored layers in the Y direction shown in FIG. 1A) through the first light shielding pattern 12 have the same color.
Therefore, even if the light beam radiated in an oblique direction passes through the adjacent colored layer (colored layer in the Y direction shown in FIG. 1A) through the first light shielding pattern 12, it is emitted to the viewer side. However, no color mixing occurs.

  As described above, when the color filter according to the present invention has a stripe shape, it is possible to prevent parallax color mixing in both the X direction and the Y direction.

(About other arrangements)
On the other hand, in the mosaic type, the triangle type, and the four-pixel arrangement type shown in FIG. 6, since colored layers of different colors are adjacent to each other in the X direction and the Y direction, compared to the stripe type as described above. Therefore, it is difficult to prevent parallax color mixing.

  However, even if the first light-shielding pattern is provided between the transparent substrate 11 and the colored layer 13, as long as the line width of the first light-shielding pattern is large, the first light-shielding pattern is emitted in an oblique direction. Even if the incident light beam enters the adjacent colored layer via the first light shielding pattern, it can be absorbed by the first light shielding pattern and can be prevented from being emitted to the viewer side. Is possible.

  Here, as described above, in the liquid crystal display device or the like, normally, the formation area of the gate line portion of the TFT is larger than the formation area of the source line portion of the TFT. In order to increase the thickness, it is preferable to increase the line width of the light shielding pattern corresponding to the formation region of the gate line portion and reduce the line width of the light shielding pattern corresponding to the formation region of the source line portion.

  Therefore, in the color filter according to the present invention, a line width of the first light shielding pattern is formed larger than a line width of the second light shielding pattern, and the first light shielding pattern having a large line width is formed on the gate. By using a light-shielding pattern corresponding to the formation region of the line portion and a second light-shielding pattern having a small line width as the light-shielding pattern corresponding to the formation region of the source line portion, the aperture ratio can be reduced even in forms other than the stripe type It is possible to effectively suppress the parallax color mixture while preventing it.

  As mentioned above, although each embodiment was described about the color filter which concerns on this invention, a display apparatus, and the manufacturing method of a color filter, this invention is not limited to the said embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention and exhibits the same function and effect regardless of the case. Are included in the technical scope.

DESCRIPTION OF SYMBOLS 1 Color filter 2 Display apparatus 11 Transparent substrate 12 1st light shielding pattern 13 Colored layer 14 2nd light shielding pattern 15 Overcoat layer 16 Opening area 17 Alignment mark 18 Perimeter light shielding part 20 Organic EL element substrate 21 Support substrate 22 Back surface electrode 23 Light emitting layer 24 Transparent electrode 101, 201 Color filter 102, 202 Display device 111, 211 Transparent substrate 112, 212 Black matrix layer 113, 213 Colored layer 115, 215 Overcoat layer 116 Opening region 117 Alignment mark 118 Outer peripheral light shielding part 120, 220 Organic EL element substrate 121, 221 Support substrate 122, 222 Back electrode 123, 223 Light emitting layer 124, 224 Transparent electrode

Claims (9)

A color filter used in a display device,
On the transparent substrate, a first light shielding pattern, a colored layer, and a second light shielding pattern are provided in this order,
In plan view,
An opening area of the color filter is defined by the first light shielding pattern and the second light shielding pattern,
The color filter according to claim 1, wherein the first light-shielding pattern and the second light-shielding pattern intersect to form a corner portion of an opening region of the color filter.   2. The color filter according to claim 1, wherein a line width of the first light shielding pattern is larger than a line width of the second light shielding pattern. In plan view,
The colored layer of the same color is provided in one direction of the transparent substrate,
The color filter according to claim 1, wherein the second light shielding pattern is provided along a direction in which the colored layers of the same color are disposed.   The color filter according to any one of claims 1 to 3, wherein the display device is an organic EL display device.   A display device, wherein a display unit is formed using the color filter according to claim 1. A method of manufacturing a color filter used in a display device,
Forming a first light-shielding pattern on the transparent substrate; forming a colored layer; forming a second light-shielding pattern;
In order,
In plan view,
An opening region of the color filter is defined by the first light shielding pattern and the second light shielding pattern,
A method of manufacturing a color filter, wherein a corner portion of an opening region of the color filter is formed by intersecting the first light shielding pattern and the second light shielding pattern.   The color filter manufacturing method according to claim 6, wherein a line width of the first light shielding pattern is formed larger than a line width of the second light shielding pattern. Forming the colored layer comprises:
In a plan view, the method includes a step of forming the colored layer of the same color in one direction of the transparent substrate,
Forming the second light shielding pattern comprises:
The method for manufacturing a color filter according to claim 6, further comprising a step of forming the second light-shielding pattern along a direction in which the colored layer of the same color is formed. Forming the first light-shielding pattern comprises:
The method for producing a color filter according to claim 6, further comprising a step of forming an alignment mark.