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JP2017132033A - Grinding device and grinding method using the same - Google Patents

Grinding device and grinding method using the same Download PDF

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Publication number
JP2017132033A
JP2017132033A JP2017012097A JP2017012097A JP2017132033A JP 2017132033 A JP2017132033 A JP 2017132033A JP 2017012097 A JP2017012097 A JP 2017012097A JP 2017012097 A JP2017012097 A JP 2017012097A JP 2017132033 A JP2017132033 A JP 2017132033A
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grinding
grindstone
mounting
disk
rotating shaft
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JP2017012097A
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景星 周
Keisei Shu
景星 周
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Chin Hsin Chou
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Chin Hsin Chou
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Priority claimed from TW105102536A external-priority patent/TWI613039B/en
Priority claimed from TW105201241U external-priority patent/TWM524763U/en
Application filed by Chin Hsin Chou filed Critical Chin Hsin Chou
Publication of JP2017132033A publication Critical patent/JP2017132033A/en
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Abstract

PROBLEM TO BE SOLVED: To provide a grinding device capable of reducing total thickness fluctuation by generating a large grinding area on the surface of article to be ground, executing grinding with an equal quantity, and smoothly discharging chips.SOLUTION: This grinding device is provided with: a table 200 that has a mounting rotary shaft 220 and rotates around the mounting rotary shaft 220; an article 300 that is positioned on the table 200 to be ground; a grindstone base 400 that has a grindstone rotary shaft 420 and rotates around the grindstone rotary shaft 420; and grinding teeth 500 that are connected to the grindstone base 400 and that come into contact with the article 300 to grind the same, generate a corresponding grinding area by grinding the surface of the article 300, and cross virtual radiations intersecting the center of a grindstone disk 410 and the center of the grinding teeth 500 at the grinding angles of 0 to 35 degrees.SELECTED DRAWING: Figure 1

Description

本発明は、研削装置及びそれを用いた研削方法に関し、特に、研削後の被研削物の総厚変動を減少できる研削装置及び研削方法に関する。   The present invention relates to a grinding apparatus and a grinding method using the same, and more particularly, to a grinding apparatus and a grinding method capable of reducing a variation in the total thickness of an object to be ground after grinding.

製造加工又は精密研削分野において、研削加工は、かなり大切な工程の1つである。従来の砥石台は、一般的に、使用時、研削歯を組み合わせて砥石のグループを構成し、この砥石のグループを砥石回転軸を介して砥石回転モーターに接続して研削操作を行って、その研削歯が砥石台の中心に対応し且つ放射状となるように設置される。しかしながら、このような研削歯の変位方向と研削歯の研削側面の延び方向とが互いに垂直となるため、被研削物の屑が研削歯の変位方向に対向する研削側面に集まり堆積し、更に屑の排出の不良を招き、よって、一般的に、その研削の品質は高くない。また、研削屑が研削歯の側面にたまりやすいことで蓄熱という現象の発生を招き、研削機能を大幅に低下させ、使用寿命が少なくなってしまう。   Grinding is one of the most important processes in the manufacturing or precision grinding field. In general, a conventional grindstone head forms a grindstone group by combining grinding teeth when used, and this grindstone group is connected to a grindstone rotating motor via a grindstone rotating shaft to perform a grinding operation. The grinding teeth are installed so as to correspond to the center of the wheel head and to be radial. However, since the displacement direction of the grinding tooth and the extending direction of the grinding side surface of the grinding tooth are perpendicular to each other, the scrap of the object to be ground collects and accumulates on the grinding side facing the displacement direction of the grinding tooth. The quality of the grinding is generally not high. In addition, since the grinding scraps easily accumulate on the side surfaces of the grinding teeth, a phenomenon of heat storage is caused, the grinding function is greatly reduced, and the service life is shortened.

よく用いられる他の砥石台は、使用時、研削歯を組み合わせて砥石のグループを構成し、砥石のグループを砥石回転軸を介して砥石回転モーターに接続して研削操作を行って、その研削歯が特定の研削角度を持ち、工業によく用いられる研削角度は35〜45度である。このような構造は、屑の取り除きに寄与するが、常に摩擦接触の面積が小さすぎるため研削の効能及び品質の均一性が低下し、更に総厚変動(Total Thickness Variation;TTV)が大きすぎるためメーカーのニーズを満たさないこととなる。   Other commonly used wheel heads, when in use, combine grinding teeth to form a grinding wheel group, and connect the grinding wheel group to a grinding wheel rotation motor via a grinding wheel rotation shaft to perform grinding operations. Has a specific grinding angle, and the grinding angle often used in the industry is 35 to 45 degrees. Such a structure contributes to the removal of debris, but since the area of frictional contact is always too small, the effectiveness and quality of the grinding are reduced, and the total thickness variation (TTV) is too large. It will not meet the manufacturer's needs.

上記によると、現在の市場において順調に屑の排出を行い且つ研削後の被研削物の総厚変動を減少できる研削装置及び研削方法がまだないため、当業者なら誰でも、その解決手段に対する検討を行っている。   According to the above, since there is no grinding apparatus and grinding method that can smoothly discharge waste in the current market and reduce the total thickness fluctuation of the workpiece after grinding, any person skilled in the art can study the solution. It is carried out.

したがって、本発明は、特殊な研削角度によって回転速度及び回転方向の制御を合わせて、被研削物の表面に大きな研削面積を発生させ且つ等量で研削することができ、更に研削後の被研削物の総厚変動を減少する研削装置及びそれを用いた研削方法を提供する。また、一定範囲の研削角度と適切なパラメータの組合せによって、研削装置は研削中に順調に屑の排出を行うだけでなく、チッピング率を低下させることができる。なお、所定の陳列位置で同時に複数の被研削物を研削でき、大幅に生産量を高めるだけでなく、経済効果を向上させ生産コストを低下させることができる。   Therefore, according to the present invention, the rotation speed and the rotation direction can be controlled by a special grinding angle to generate a large grinding area on the surface of the object to be ground and to be ground in an equal amount. Provided are a grinding apparatus and a grinding method using the same, which reduce a total thickness variation of an object. In addition, by a combination of a certain range of grinding angles and appropriate parameters, the grinding apparatus can not only smoothly discharge waste during grinding but also reduce the chipping rate. In addition, it is possible to grind a plurality of objects to be ground at a predetermined display position at the same time, not only greatly increasing the production amount but also improving the economic effect and reducing the production cost.

本発明の一態様によれば、回転動作を行う載置盤と、載置盤に位置決めされる少なくとも1つの被研削物と、載置盤に対して回転動作を行う砥石ディスクと、砥石ディスクに接続されて、被研削物に接触し研削する複数の研削歯と、を備え、研削歯の各々は、被研削物の表面を研削して研削面積を生じさせ、砥石ディスクの中心及び研削歯の中心と交差する仮想放射線と、0度より大きく35度より小さい研削角度で交わる研削装置を提供する。   According to one aspect of the present invention, a mounting board that performs a rotation operation, at least one object to be ground positioned on the mounting board, a grindstone disk that performs a rotation operation on the mounting board, and a grindstone disk A plurality of grinding teeth that contact and grind the workpiece, each grinding tooth grinding the surface of the workpiece to produce a grinding area, Provided is a grinding device that intersects virtual radiation intersecting the center at a grinding angle greater than 0 degree and less than 35 degrees.

これによって、本発明の研削装置は、特殊な研削角度によって回転速度及び回転方向の制御を合わせて、被研削物の表面に大きな研削面積を発生させるとともに、同時に等量で研削を行い順調に屑の排出を行うことができ、更に研削後の被研削物の総厚変動を減少することができる。   As a result, the grinding apparatus of the present invention adjusts the rotation speed and the rotation direction with a special grinding angle to generate a large grinding area on the surface of the workpiece, and at the same time, grinds the same amount and smoothly performs the waste. Can be discharged, and the variation in the total thickness of the workpiece after grinding can be reduced.

前記の研削装置によれば、研削角度は、0度より大きく20度以下であってもよい。なお、前記載置盤と砥石ディスクは、円形である。研削歯の各々は、長方形又はアーチ形であり、螺旋状に配列される。被研削物は、円形、楕円形、正方形又は三角形であってもよい。また、前記載置盤は、時計回り又は反時計回りに回転してもよく、砥石ディスクも時計回り又は反時計回りに回転してもよい。載置回転軸と砥石回転軸とは互いに平行となり且つ載置盤の盤面と研削歯の各々の研削面とは互いに平行となり、載置回転軸と載置盤の盤面とは互いに垂直となる。なお、前記研削装置は、載置回転モーターと砥石回転モーターを備えてもよい。そのうち、載置回転モーターは、載置盤との間に接続される載置回転軸に接続されて、且つ載置盤を載置回転速度で回転させるように制御する。砥石回転モーターは、砥石ディスクとの間に接続される砥石回転軸に接続されて、砥石ディスクを砥石回転速度で回転させるように制御する。載置回転速度は、砥石回転速度以下である。また、研削歯の各々は、基端幅を有する基端と、先端幅を有する先端と、を有する。基端と砥石ディスクの中心とは、基端距離離れており、先端と砥石ディスクの中心とは、先端距離離れている。基端距離は先端距離より小さく、且つ基端幅は先端幅と異なる。なお、前記研削歯の各々は、第1の側辺と第2の側辺とを有してもよく、第1の側辺が第2の側辺に対応する。基端と先端は、平面状または曲面状であり、第1の側辺と第2の側辺は、平面状または曲面状である。第1の側辺の辺長は、第2の側辺の辺長以下で、且つ基端幅より大きい。   According to the grinding apparatus, the grinding angle may be greater than 0 degree and 20 degrees or less. In addition, the above-mentioned mounting plate and a grindstone disk are circular. Each of the grinding teeth is rectangular or arched and is arranged in a spiral. The workpiece may be circular, elliptical, square or triangular. In addition, the above-described mounting plate may rotate clockwise or counterclockwise, and the grindstone disk may also rotate clockwise or counterclockwise. The mounting rotating shaft and the grindstone rotating shaft are parallel to each other, the surface of the mounting plate and the grinding surface of each grinding tooth are parallel to each other, and the mounting rotating shaft and the surface of the mounting plate are perpendicular to each other. The grinding device may include a mounting rotation motor and a grindstone rotation motor. Among these, the mounting rotation motor is connected to a mounting rotation shaft connected to the mounting board and controls the mounting board to rotate at the mounting rotation speed. The grindstone rotating motor is connected to a grindstone rotating shaft connected between the grindstone disk and controls the grindstone disk to rotate at the grindstone rotating speed. The mounting rotation speed is equal to or lower than the grindstone rotation speed. Each of the grinding teeth has a proximal end having a proximal end width and a distal end having a distal end width. The proximal end and the center of the grindstone disk are separated from each other by a proximal distance, and the distal end and the center of the grindstone disk are separated from each other by the distal end distance. The proximal distance is smaller than the distal distance, and the proximal width is different from the distal width. Each of the grinding teeth may have a first side and a second side, and the first side corresponds to the second side. The proximal end and the distal end are planar or curved, and the first side and the second side are planar or curved. The side length of the first side is equal to or shorter than the side length of the second side and is larger than the base end width.

本発明の一態様の別の実施形態によれば、載置盤と載置回転軸とを有し、載置盤が載置回転軸に接続され且つ載置回転軸を中心にして回転する載置台と、載置盤に位置決めされる複数の被研削物と、砥石ディスクと砥石回転軸とを有し、砥石ディスクが砥石回転軸に接続され且つ砥石回転軸を中心にして回転する砥石台と、砥石ディスクに接続されて、被研削物に接触し研削する複数の研削歯と、を備え、研削歯の各々は、1つの被研削物の表面で研削面積を生じさせ、砥石ディスクの中心及び研削歯の中心と交差する仮想放射線と、0度より大きく35度より小さい研削角度で交わり、研削面積が研削角度に対応して、なお、載置盤は、時計回り又は反時計回りに回転し、且つ砥石ディスクは、時計回り又は反時計回りに回転し、載置回転軸と砥石回転軸とが互いに平行となり且つ載置盤の盤面と研削歯の各々の研削面とが互いに平行となり、載置回転軸と載置盤の盤面とが互いに垂直となる研削装置を提供する。   According to another embodiment of the aspect of the present invention, the mounting board includes a mounting board and a mounting rotating shaft, and the mounting board is connected to the mounting rotating shaft and rotates around the mounting rotating shaft. A grindstone base having a placing table, a plurality of objects to be positioned on the placing board, a grindstone disk and a grindstone rotating shaft, the grindstone disk being connected to the grindstone rotating shaft and rotating about the grindstone rotating shaft; A plurality of grinding teeth connected to the grinding wheel disk for contacting and grinding the workpiece, each of the grinding teeth generating a grinding area on a surface of the workpiece, the center of the grinding wheel and Virtual radiation that intersects the center of the grinding teeth intersects with a grinding angle greater than 0 degree and less than 35 degrees, the grinding area corresponds to the grinding angle, and the mounting board rotates clockwise or counterclockwise. And the grindstone disc rotates clockwise or counterclockwise and rotates And a grinding wheel rotating shaft are parallel to each other, a surface of the mounting board and each grinding surface of the grinding teeth are parallel to each other, and the mounting rotating shaft and the surface of the mounting board are perpendicular to each other. .

これによって、本発明の研削装置は、同時に複数の被研削物を研削でき、大幅に生産量を高めるだけでなく、経済効果を向上させ生産コストを低下させることができる。   As a result, the grinding apparatus of the present invention can grind a plurality of objects to be ground at the same time, not only greatly increasing the production amount but also improving the economic effect and reducing the production cost.

本発明の別の態様は、前記の研削装置を用いた研削方法を提供する。この研削方法は、載置盤と砥石ディスクを回転させる回転工程と、研削歯によって被研削物に接触し研削して、研削歯の各々は、被研削物の表面で研削して研削面積を生じさせ、砥石ディスクの中心及び1つの研削歯の中心と交差する仮想放射線と、0度より大きく35度より小さい研削角度で交わり、研削面積が研削角度に対応する研削工程と、を含む。   Another aspect of the present invention provides a grinding method using the above grinding apparatus. In this grinding method, a rotating process for rotating the mounting board and the grindstone disk, and the object to be ground are ground and ground by the grinding teeth, and each grinding tooth is ground on the surface of the object to be ground to generate a grinding area. And a virtual radiation that intersects the center of the grinding wheel disk and the center of one grinding tooth, and a grinding process that intersects at a grinding angle that is greater than 0 degree and less than 35 degrees, and whose grinding area corresponds to the grinding angle.

これによって、本発明の研削装置は、特殊な研削角度によって載置台と砥石台の回転速度及び研削面積の制御を合わせて、被研削物の表面に大きな研削面積を生じさせ、且つ等量で研削し順調に屑の排出を行い、更に研削後の被研削物の総厚変動を減少することができる。   As a result, the grinding apparatus of the present invention adjusts the rotation speed and grinding area of the mounting table and the grinding wheel table with a special grinding angle to produce a large grinding area on the surface of the work piece and grind with equal amount. Accordingly, the waste can be discharged smoothly, and the variation in the total thickness of the workpiece after grinding can be reduced.

前記の研削方法によれば、回転工程は、回転速度制御サブ工程を含んでもよい。この回転速度制御サブ工程は、載置回転モーターによって載置盤を載置回転速度で回転させるように制御し、且つ砥石回転モーターによって砥石ディスクを砥石回転速度で回転させるように制御し、載置回転速度が砥石回転速度以下である。また、回転工程は、回転方向制御サブ工程を含んでもよい。この回転方向制御サブ工程は、載置盤を載置回転方向に回転させるように制御し、且つ砥石ディスクを砥石回転方向に回転させるように制御し、載置回転方向が時計回り又は反時計回りであってもよく、砥石回転方向が時計回り又は反時計回りであってもよい。なお、前記研削方法は、軸方向制御工程を含んでもよい。この軸方向制御工程は、載置回転軸及び砥石回転軸の軸方向を制御するものであり、載置回転軸が載置盤に接続され、且つ砥石回転軸が砥石ディスクに接続され、載置回転軸と砥石回転軸とが互いに平行となり且つ載置盤と砥石ディスクとが互いに平行となる。なお、前記研削角度は、0度より大きく且つ20度以下であってもよい。前記研削歯の各々は、基端幅を有する基端と、先端幅を有する先端と、を有する。基端と砥石ディスクの中心とは、基端距離離れており、先端と砥石ディスクの中心とは、先端距離離れている。基端距離は先端距離より小さく、且つ基端幅は先端幅と異なる。なお、前記研削歯の各々は、第1の側辺と第2の側辺とを有してもよく、第1の側辺が第2の側辺に対応する。基端と先端は、平面状または曲面状であり、第1の側辺と第2の側辺は、平面状または曲面状である。第1の側辺の辺長は、第2の側辺の辺長以下で、且つ基端幅より大きい。   According to the grinding method, the rotation process may include a rotation speed control sub-process. In this rotational speed control sub-process, the mounting disk is controlled to rotate at the mounting rotational speed by the mounting rotational motor, and the grindstone disk is controlled to rotate at the grinding wheel rotational speed by the grinding wheel rotational motor. The rotational speed is equal to or lower than the grinding wheel rotational speed. Further, the rotation process may include a rotation direction control sub-process. This rotation direction control sub-process controls the mounting board to rotate in the mounting rotation direction and controls the grindstone disk to rotate in the grinding wheel rotation direction, and the mounting rotation direction is clockwise or counterclockwise. The grindstone rotation direction may be clockwise or counterclockwise. The grinding method may include an axial direction control step. This axial direction control step controls the axial direction of the mounting rotary shaft and the grindstone rotating shaft, the mounting rotating shaft is connected to the mounting board, and the grindstone rotating shaft is connected to the grindstone disk. The rotating shaft and the grindstone rotating shaft are parallel to each other, and the mounting board and the grindstone disk are parallel to each other. The grinding angle may be greater than 0 degree and 20 degrees or less. Each of the grinding teeth has a proximal end having a proximal end width and a distal end having a distal end width. The proximal end and the center of the grindstone disk are separated from each other by a proximal distance, and the distal end and the center of the grindstone disk are separated from each other by the distal end distance. The proximal distance is smaller than the distal distance, and the proximal width is different from the distal width. Each of the grinding teeth may have a first side and a second side, and the first side corresponds to the second side. The proximal end and the distal end are planar or curved, and the first side and the second side are planar or curved. The side length of the first side is equal to or shorter than the side length of the second side and is larger than the base end width.

本発明の一実施例の研削装置を示す斜視模式図である。It is a perspective schematic diagram which shows the grinding device of one Example of this invention. 図1の砥石ディスクを示す上面図である。It is a top view which shows the grindstone disk of FIG. 図2Aの砥石ディスクを示す断面図である。It is sectional drawing which shows the grindstone disk of FIG. 2A. 図1の載置盤と砥石ディスクとにより被研削物を研削することを示す上面図である。It is a top view which shows grinding a to-be-ground object with the mounting board and grindstone disk of FIG. 本発明の別の実施例の砥石ディスクを示す上面図である。It is a top view which shows the grindstone disk of another Example of this invention. 本発明の別の実施例の研削装置を示す斜視模式図である。It is a perspective schematic diagram which shows the grinding device of another Example of this invention. 本発明の一実施例の研削方法の流れを示す模式図である。It is a schematic diagram which shows the flow of the grinding method of one Example of this invention. 本発明の別の実施例の研削方法の流れを示す模式図である。It is a schematic diagram which shows the flow of the grinding method of another Example of this invention. 3枚の4インチウエハの254ミリメートルの砥石ディスク直径における研削角度に対応する総厚変動のデータ図である。FIG. 4 is a data diagram of total thickness variation corresponding to grinding angle at a 254 millimeter wheel disc diameter of three 4 inch wafers. 5枚の4インチウエハの304ミリメートルの砥石ディスク直径における研削角度に対応する総厚変動のデータ図である。FIG. 6 is a data diagram of total thickness variation corresponding to grinding angle at a grinding disk diameter of 304 millimeters for five 4-inch wafers. 本発明の他の実施例の研削装置の砥石ディスクを示す上面図である。It is a top view which shows the grindstone disk of the grinding apparatus of the other Example of this invention. 図10Aの研削歯を示す模式図である。It is a schematic diagram which shows the grinding tooth of FIG. 10A. 図10Aの載置盤と砥石ディスクとにより被研削物を研削することを示す上面図である。It is a top view which shows grinding a to-be-ground object with the mounting board of FIG. 10A, and a grindstone disk. 本発明の他の実施例の研削歯を示す模式図である。It is a schematic diagram which shows the grinding tooth of the other Example of this invention. 本発明の他の実施例の研削歯を示す模式図である。It is a schematic diagram which shows the grinding tooth of the other Example of this invention. 本発明の他の実施例の研削歯を示す模式図である。It is a schematic diagram which shows the grinding tooth of the other Example of this invention. 本発明の他の実施例の研削歯を示す模式図である。It is a schematic diagram which shows the grinding tooth of the other Example of this invention. 254ミリメートルの砥石ディスク直径における研削歯の歯型に対応する研削比のデータ図である。It is a data figure of the grinding ratio corresponding to the tooth type of the grinding tooth in the grinding wheel disk diameter of 254 millimeters. 304ミリメートルの砥石ディスク直径における研削歯の歯型に対応する研削比のデータ図である。It is a data figure of the grinding ratio corresponding to the tooth type of the grinding tooth in the grinding wheel disk diameter of 304 millimeters.

以下、図面で本発明の複数の実施例を説明し、明らかに説明するために、数多くの実際の細部を以下の説明で併せて説明する。しかしながら、これらの実際の細部は本発明を制限するためのものではないことを理解すべきである。つまり、本発明の一部の実施例において、これらの実際の細部は必要なものではない。そのほか、図面を簡略化するために、ある従来慣用の構造と素子は図面において簡単に模式的に示す。また、同一の素子は同一の番号で示すことがある。   In the following description, numerous practical details are set forth in the following description in order to explain and clearly explain several embodiments of the present invention with reference to the drawings. However, it should be understood that these actual details are not intended to limit the invention. That is, in some embodiments of the present invention, these actual details are not necessary. In addition, in order to simplify the drawings, some conventional and conventional structures and elements are schematically shown in the drawings. Moreover, the same element may be shown with the same number.

図1〜図3を併せて参照されたい。図1は、本発明の一実施例の研削装置100を示す斜視模式図である。図2Aは、図1の砥石ディスク410を示す上面図である。図2Bは、図2Aの砥石ディスク410を示す断面図である。図3は、図1の載置盤210と砥石ディスク410とにより被研削物300を研削することを示す上面図である。図面に示すように、研削装置100は、載置台200、複数の被研削物300、砥石台400及び複数の研削歯500、砥石回転モーター610及び載置回転モーター620を備える。   Please refer to FIGS. FIG. 1 is a schematic perspective view showing a grinding apparatus 100 according to an embodiment of the present invention. 2A is a top view showing the grindstone disk 410 of FIG. FIG. 2B is a cross-sectional view showing the grindstone disk 410 of FIG. 2A. FIG. 3 is a top view showing that the workpiece 300 is ground by the mounting board 210 and the grindstone disk 410 of FIG. As shown in the drawing, the grinding apparatus 100 includes a mounting table 200, a plurality of objects to be ground 300, a grindstone table 400 and a plurality of grinding teeth 500, a grindstone rotating motor 610 and a mounting rotating motor 620.

載置台200は、載置盤210と載置回転軸220とを有し、載置盤210が載置回転軸220に接続されて且つ載置回転軸220を中心にして回転する。載置盤210は、円形である。なお、載置盤210は時計回り又は反時計回りに回転してもよく、本実施例において、載置盤210は時計回りに回転する。載置回転軸220と載置盤210の盤面とは互いに垂直となる。また、研削装置100において、載置盤210の盤面は、水平面に対して傾斜角を持ち、径方向内側の部位が高く径方向外側の部位が低いわずかな突出状となり、本実施例においてこのような形構造によって屑の排出の効果が向上される。   The mounting table 200 includes a mounting board 210 and a mounting rotating shaft 220, and the mounting board 210 is connected to the mounting rotating shaft 220 and rotates around the mounting rotating shaft 220. The mounting board 210 is circular. The mounting board 210 may rotate clockwise or counterclockwise. In this embodiment, the mounting board 210 rotates clockwise. The mounting rotation shaft 220 and the surface of the mounting board 210 are perpendicular to each other. Further, in the grinding apparatus 100, the surface of the mounting board 210 has a slight protrusion with an inclination angle with respect to the horizontal plane, the radially inner portion is high, and the radially outer portion is low. The effect of discharging waste is improved by the simple shape structure.

被研削物300は載置盤210に位置決めされ、且つ載置盤210に被研削物300が5つ設けられる。本実施例の被研削物300は、4インチウエハであり円形である。もちろん、被研削物300は、形が円形、楕円形、正方形、三角形又は他の多角形を呈してもよく他の材質であってもよい。また、被研削物300は、等距離に分離されて載置盤210に固着され、ある厚さを有する。注意すべきなのは、一般的に研削技術の良否は総厚変動(Total Thickness Variation;TTV)の大きさによって決められ、それは被研削物300の最大厚さと最小厚さの差を示す。この総厚変動の最小化は、最終製品の厚さ公差を決める要件であり、且つこの数が更なる薄いウエハ及び素子の実現に影響をもたらすものであり、総厚変動が小さいほど後プロセスのチッピング率を低下させることができる。   The object to be ground 300 is positioned on the mounting board 210, and five objects to be ground 300 are provided on the mounting board 210. The workpiece 300 of this embodiment is a 4-inch wafer and is circular. Of course, the workpiece 300 may have a circular shape, an elliptical shape, a square shape, a triangular shape, other polygonal shapes, or other materials. In addition, the object to be ground 300 is separated into equal distances and fixed to the mounting board 210, and has a certain thickness. It should be noted that the quality of the grinding technique is generally determined by the magnitude of the total thickness variation (TTV), which indicates the difference between the maximum thickness and the minimum thickness of the workpiece 300. This minimization of total thickness variation is a requirement that determines the thickness tolerance of the final product, and this number has an impact on the realization of thinner wafers and devices. The chipping rate can be reduced.

砥石台400は、砥石ディスク410と砥石回転軸420とを有し、砥石ディスク410が砥石回転軸420に接続されて且つ砥石回転軸420を中心にして回転する。砥石ディスク410は、円形である。なお、砥石ディスク410は時計回り又は反時計回りに回転してもよく、本実施例において、砥石ディスク410は反時計回りに回転し、載置盤210は時計回りに回転する。言い換えれば、載置盤210と砥石ディスク410とは、研削面に対して同方向に作動する。また、載置回転軸220と砥石回転軸420とは互いに平行となり、且つ載置盤210の盤面と砥石ディスク410の盤面とは互いに平行となり且つ大きさが同じ平面面積を有する。なお、砥石ディスク410は、中空の環状構造であり且つ中環斜面412を有し、この構造によって砥石ディスク410と砥石回転軸420を安定的に締付けることができる。   The grindstone base 400 includes a grindstone disk 410 and a grindstone rotating shaft 420, and the grindstone disk 410 is connected to the grindstone rotating shaft 420 and rotates around the grindstone rotating shaft 420. The grindstone disk 410 is circular. The grindstone disk 410 may rotate clockwise or counterclockwise. In this embodiment, the grindstone disk 410 rotates counterclockwise, and the mounting board 210 rotates clockwise. In other words, the mounting board 210 and the grindstone disk 410 operate in the same direction with respect to the grinding surface. Further, the mounting rotary shaft 220 and the grindstone rotating shaft 420 are parallel to each other, and the surface of the mounting plate 210 and the surface of the grindstone disk 410 are parallel to each other and have the same planar area. The grindstone disk 410 has a hollow annular structure and has a middle ring inclined surface 412, and the grindstone disk 410 and the grindstone rotating shaft 420 can be stably tightened by this structure.

研削歯500は、砥石ディスク410に接続されて、被研削物300に接触し研削できる。研削歯500の各々は細長い形又はアーチ形であってもよく、本実施例の研削歯500は細長い形であり、且つ螺旋状に配列される。研削歯500の外端は砥石ディスク410の外縁に近い。研削歯500の各々は、砥石ディスク410の中心430及び1つの研削歯500の中心と交差する仮想放射線440と、研削角度θで交わる。研削歯500の各々の研削面と載置盤210の盤面とは互いに平行となる。なお、研削歯500の各々は、いずれかの被研削物300の表面を研削して研削面積を生じさせてもよい。この研削面積は、研削角度θに対応する。具体的には、研削角度θが変わると、研削面積も対応的に変わる。また、研削面積は、載置盤210と砥石ディスク410の回転速度、回転方向、回転半径、研削歯500の形のような数多くのパラメータと対応的な相関性がある。その中のいずれかのパラメータが変わると、研削面積もこれに伴い変わり、更に総厚変動の大きさに影響をもたらす。したがって、適切なパラメータを選択して好ましい研削品質と等量研削の効果が得られる。   The grinding teeth 500 are connected to the grinding wheel disk 410 and can contact and grind the workpiece 300. Each of the grinding teeth 500 may be elongated or arched, and the grinding teeth 500 of this embodiment are elongated and are arranged in a spiral. The outer end of the grinding tooth 500 is close to the outer edge of the grinding wheel disk 410. Each of the grinding teeth 500 intersects the center 430 of the grinding wheel disk 410 and the virtual radiation 440 that intersects the center of one grinding tooth 500 at a grinding angle θ. The ground surfaces of the grinding teeth 500 and the surface of the mounting plate 210 are parallel to each other. In addition, each of the grinding teeth 500 may grind the surface of one of the objects to be ground 300 to generate a grinding area. This grinding area corresponds to the grinding angle θ. Specifically, when the grinding angle θ changes, the grinding area also changes correspondingly. In addition, the grinding area has a corresponding correlation with many parameters such as the rotation speed, the rotation direction, the rotation radius, and the shape of the grinding tooth 500 of the mounting table 210 and the grinding wheel disk 410. If any of the parameters changes, the grinding area changes accordingly, which further affects the magnitude of the total thickness variation. Therefore, by selecting an appropriate parameter, a preferable grinding quality and an equivalent grinding effect can be obtained.

載置回転モーター620は、載置回転軸220に接続されて、且つ載置盤210を載置回転速度で回転させるように制御する。砥石回転モーター610は、砥石回転軸420に接続されて、且つ砥石ディスク410を砥石回転速度で回転させるように制御する。本発明の一つの好ましい実施例のパラメータは、以下の通りである。一、載置回転速度は砥石回転速度より小さい。二、研削角度θは−20度〜+20度の範囲(0度以外)にある。三、載置盤210の直径は187ミリメートル以上で、且つ550ミリメートル以下、砥石ディスク410の直径は200ミリメートル以上600ミリメートル以下である。四、研削歯500は細長い形又は長いアーチ形である。五、載置盤210に複数の被研削物300が設けられる。これによって、特殊な研削角度θによって適切な回転速度、載置盤210と砥石ディスク410の大きさ及び研削歯500の形を合わせて、被研削物300の表面に大きな研削面積を生じさせるだけでなく、研削装置100に順調に屑の排出を行わせて、更に研削後のウエハの総厚変動を減少することができる。   The placement rotation motor 620 is connected to the placement rotation shaft 220 and controls the placement board 210 to rotate at the placement rotation speed. The grindstone rotation motor 610 is connected to the grindstone rotation shaft 420 and controls the grindstone disk 410 to rotate at the grindstone rotation speed. The parameters of one preferred embodiment of the present invention are as follows. First, the mounting rotation speed is smaller than the grindstone rotation speed. Second, the grinding angle θ is in the range of −20 degrees to +20 degrees (other than 0 degrees). 3. The diameter of the mounting board 210 is 187 millimeters or more and 550 millimeters or less, and the diameter of the grindstone disk 410 is 200 millimeters or more and 600 millimeters or less. Fourth, the grinding tooth 500 has an elongated shape or a long arch shape. 5. A plurality of objects to be ground 300 are provided on the mounting board 210. Thus, by combining the appropriate rotation speed, the size of the mounting table 210 and the grinding wheel disk 410, and the shape of the grinding teeth 500 with a special grinding angle θ, a large grinding area is generated on the surface of the workpiece 300. In addition, it is possible to cause the grinding apparatus 100 to smoothly discharge waste, and to further reduce the variation in the total thickness of the wafer after grinding.

図4は、本発明の別の実施例の砥石ディスク410を示す上面図である。砥石ディスク410に研削歯500aが設けられ、この研削歯500aと図2Aの研削歯500との差異は形が異なることにある。上面図を見ると、研削歯500aは長いアーチ状であるが、研削歯500は長細い形状である。この2つの異なる研削歯500、500aの何れも研削後のウエハの総厚変動を効果的に減少し、且つ研削中に順調に屑の排出を行うことができる。   FIG. 4 is a top view showing a grindstone disk 410 according to another embodiment of the present invention. Grinding teeth 500a are provided on the grindstone disk 410, and the difference between the grinding teeth 500a and the grinding teeth 500 of FIG. When the top view is seen, the grinding tooth 500a has a long arch shape, but the grinding tooth 500 has a long and thin shape. Both of these two different grinding teeth 500 and 500a can effectively reduce the variation in the total thickness of the wafer after grinding, and can smoothly discharge waste during grinding.

図5は、本発明の別の実施例の研削装置100aを示す斜視模式図である。図面に示すように、載置台200の載置回転軸220の軸方向は砥石台400の砥石回転軸420の軸方向と平行となり、且つ載置回転軸220と砥石回転軸420の何れもX軸方向と平行となる。また、載置盤210、砥石ディスク410及びZ軸方向の三つはそれぞれ平行となる。本実施例は、特殊な研削角度θによって適切な回転速度、載置盤210と砥石ディスク410の大きさ及び研削歯500の形を合わせて、水平方向上の研削だけでなく、垂直方向上の研削にも用いられ、両方向の研削の何れも研削後のウエハの総厚変動を減少することができる。   FIG. 5 is a schematic perspective view showing a grinding apparatus 100a according to another embodiment of the present invention. As shown in the drawing, the axial direction of the mounting rotating shaft 220 of the mounting table 200 is parallel to the axial direction of the grinding wheel rotating shaft 420 of the grindstone table 400, and both the mounting rotating shaft 220 and the grindstone rotating shaft 420 are X-axis. Parallel to the direction. Further, the mounting board 210, the grindstone disk 410, and the three in the Z-axis direction are parallel to each other. In the present embodiment, an appropriate rotation speed, a size of the mounting plate 210 and the grinding wheel disk 410, and a shape of the grinding tooth 500 are adjusted according to a special grinding angle θ, not only in the horizontal direction but also in the vertical direction. It is also used for grinding, and both of the grinding directions in both directions can reduce the total thickness variation of the wafer after grinding.

図1と図2Aを併せて参照されたい。図6は、本発明の一実施例の研削方法700の流れを示す模式図である。図7は、本発明の別の実施例の研削方法700aの流れを示す模式図である。この研削方法700は、回転工程S11と研削工程S12とを含む。回転工程S11は、載置台200と砥石台400を回転させる。研削工程S12は、研削歯500によって被研削物300を研削する。研削歯500の各々は1つの被研削物300の表面を研削して研削面積を生じさせる。研削歯500の各々は、砥石ディスク410の中心430及び1つの研削歯500の中心と交差する仮想放射線440と、0度より大きく35度より小さい研削角度θで交わる。なお、研削面積は研削角度θに対応する。本発明の好ましい実施例の研削角度θは、0度より大きく且つ20度以下である。本発明の更に好ましい実施例の研削角度θは、10度以上20度以下である。また、研削方法700aは、軸方向制御工程S21、回転工程S22及び研削工程S23を含む。研削工程S23は、研削方法700の研削工程S12と同じであるため、説明しない。軸方向制御工程S21は、載置台200の載置回転軸220の軸方向及び砥石台400の砥石回転軸420の軸方向を制御する。この軸方向制御工程S21は、載置回転軸220と砥石回転軸420をX軸方向、Y軸方向又はZ軸方向と平行にすることができる。載置回転軸220と砥石回転軸420とが互いに平行のため、載置盤210と砥石ディスク410とも互いに平行となる。なお、回転工程S22は、回転速度制御サブ工程S221及び回転方向制御サブ工程S222を含む。回転速度制御サブ工程S221は、載置回転モーター620によって載置盤210を載置回転速度で回転させるように制御し、同時に砥石回転モーター610によって砥石ディスク410を砥石回転速度で回転させるように制御する。載置回転速度は、砥石回転速度以下であってもよい。また、回転方向制御サブ工程S222は、載置盤210を載置回転方向に回転させるように制御し、且つ制御砥石ディスク410を砥石回転方向に回転させるように制御する。載置回転方向は、時計回り又は反時計回りであってもよく、砥石回転方向も時計回り又は反時計回りであってもよい。本発明は、上記の回転方向、回転速度、研削角度θの特殊なパラメータの組合せによって、被研削物300の表面に大きな研削面積を生じさせ、更に研削後のウエハの総厚変動を減少しチッピング率を低下させることができる。   Please refer to FIG. 1 and FIG. 2A together. FIG. 6 is a schematic diagram showing a flow of a grinding method 700 according to an embodiment of the present invention. FIG. 7 is a schematic diagram showing the flow of a grinding method 700a according to another embodiment of the present invention. This grinding method 700 includes a rotation step S11 and a grinding step S12. In the rotation step S11, the mounting table 200 and the grindstone table 400 are rotated. In the grinding step S <b> 12, the workpiece 300 is ground with the grinding teeth 500. Each of the grinding teeth 500 grinds the surface of one workpiece 300 to generate a grinding area. Each of the grinding teeth 500 intersects the center 430 of the grinding wheel disk 410 and the virtual radiation 440 intersecting the center of one grinding tooth 500 at a grinding angle θ that is greater than 0 degree and less than 35 degrees. The grinding area corresponds to the grinding angle θ. The grinding angle θ of the preferred embodiment of the present invention is greater than 0 degrees and less than or equal to 20 degrees. In a further preferred embodiment of the present invention, the grinding angle θ is not less than 10 degrees and not more than 20 degrees. The grinding method 700a includes an axial direction control step S21, a rotation step S22, and a grinding step S23. Since the grinding step S23 is the same as the grinding step S12 of the grinding method 700, it will not be described. The axial direction control step S21 controls the axial direction of the mounting rotary shaft 220 of the mounting table 200 and the axial direction of the grindstone rotating shaft 420 of the grindstone table 400. In the axial direction control step S21, the mounting rotation shaft 220 and the grindstone rotation shaft 420 can be made parallel to the X-axis direction, the Y-axis direction, or the Z-axis direction. Since the mounting rotary shaft 220 and the grindstone rotating shaft 420 are parallel to each other, the mounting disc 210 and the grindstone disc 410 are also parallel to each other. The rotation step S22 includes a rotation speed control sub-step S221 and a rotation direction control sub-step S222. In the rotation speed control sub-step S221, the placement rotation motor 620 controls the placement board 210 to rotate at the placement rotation speed, and at the same time, the grinding wheel rotation motor 610 controls the grindstone disk 410 to rotate at the grinding wheel rotation speed. To do. The mounting rotation speed may be equal to or less than the grindstone rotation speed. In the rotation direction control sub-step S222, the mounting board 210 is controlled to rotate in the mounting rotation direction, and the control grindstone disk 410 is controlled to rotate in the grinding wheel rotation direction. The mounting rotation direction may be clockwise or counterclockwise, and the grindstone rotation direction may also be clockwise or counterclockwise. In the present invention, a large grinding area is generated on the surface of the object to be ground 300 by a combination of the above special parameters of the rotation direction, the rotation speed, and the grinding angle θ, and the total thickness variation of the wafer after grinding is further reduced to perform chipping. The rate can be reduced.

図8は、3枚の4インチウエハの254ミリメートルの砥石ディスク410の直径における研削角度θに対応する総厚変動のデータ図である。図9は、5枚の4インチウエハの304ミリメートルの砥石ディスク410の直径における研削角度θに対応する総厚変動のデータ図である。最も適切なパラメータを選択して最適な研削品質を得るために、本発明は、各種の異なるパラメータとデータを分析して、表1と表2に示される。そのうち、表1のパラメータは図8のデータに対応し、表2のパラメータは図9のデータに対応する。データ図に示すように、他のパラメータが同じな条件で、研削角度θが小さいほど、それによる総厚変動が小さくなることが分かる。注意すべきなのは、研削角度θが下限値より小さい場合、例えば0度に等しい場合、研削の効能、品質及び屑の排出の順調度が低下する。研削角度θが10度である場合、本実施例の研削装置100、100aは最小総厚変動を有し、且つ優れた屑の排出の効果を依然として維持する。

Figure 2017132033
Figure 2017132033
FIG. 8 is a data diagram of the total thickness variation corresponding to the grinding angle θ in the diameter of the 254 millimeter grinding wheel disk 410 of three 4-inch wafers. FIG. 9 is a data diagram of the total thickness variation corresponding to the grinding angle θ at the diameter of a 304 millimeter grinding wheel disk 410 of five 4-inch wafers. In order to select the most appropriate parameters to obtain the optimum grinding quality, the present invention analyzes various different parameters and data and is shown in Tables 1 and 2. Among them, the parameters in Table 1 correspond to the data in FIG. 8, and the parameters in Table 2 correspond to the data in FIG. As shown in the data diagram, it can be seen that the smaller the grinding angle θ is, the smaller the variation in the total thickness due to the other parameters being the same. It should be noted that when the grinding angle θ is smaller than the lower limit value, for example, equal to 0 degree, the grinding efficiency, quality, and smoothness of waste discharge decrease. When the grinding angle θ is 10 degrees, the grinding apparatus 100, 100a of this embodiment has a minimum total thickness variation and still maintains the excellent debris discharge effect.
Figure 2017132033
Figure 2017132033

第10A〜10I図を併せて参照されたい。図10Aは、本発明の他の実施例の研削装置100の砥石ディスク410を示す上面図である。図10Bは、図10Aの研削歯500bを示す模式図である。図10Cは、図10Aの載置盤210と砥石ディスク410とにより被研削物300を研削することを示す上面図である。図10D〜10G図は、本発明の他の各種の実施例の研削歯500c、500d、500e、500fを示す模式図である。図面に示すように、研削歯500b、500c、500d、500eの各々は、基端幅T1を有する基端510、先端幅T2を有する先端520、第1の側辺530及び第2の側辺540を有する。基端510と砥石ディスク410の中心430とは、基端距離D1離れており、先端520と砥石ディスク410の中心430とは、先端距離D2離れている。基端距離D1は先端距離D2より小さい。つまり、研削歯500の先端520は砥石ディスク410の外縁に近い。基端幅T1は先端幅T2より大きい。つまり、研削歯500は砥石ディスク410の径方向内側の部位の幅が広く径方向外側の部位の幅が狭い形である。本実施例において、研削歯500の径方向内側の部位が広く径方向外側の部位が狭い形によって、研削装置100は研削中に研削歯500の基端510の摩耗量が先端520より大きいという差異を補償して、研削後のウエハの総厚変動を効果的に減少することができる。具体的には、研削歯500について、研削歯500が被研削物300を研削する場合、砥石ディスク410の中心430の位置に近いほどその研削量が多くなり、つまり摩耗量が大きくなり、これは先端520が基端510より変位の距離が長く、先端520の冷却効果がよくて研削量が少なくなるが、基端510が冷却し温度が下がりにくくて研削量が多くなるためである。言い換えれば、研削量が多い基端510の基端幅T1を増加して、その研削量と先端520の研削量をバランスさせ且つ同じ状況を達成すると、この条件で研削された被研削物300の総厚変動が減少され、更に研削の品質と被研削物300の効能が改善される。   Please also refer to FIGS. 10A to 10I. FIG. 10A is a top view showing a grindstone disk 410 of a grinding apparatus 100 according to another embodiment of the present invention. FIG. 10B is a schematic diagram showing the grinding tooth 500b of FIG. 10A. FIG. 10C is a top view showing that the workpiece 300 is ground by the mounting board 210 and the grindstone disk 410 of FIG. 10A. 10D to 10G are schematic views showing grinding teeth 500c, 500d, 500e, and 500f of other various embodiments of the present invention. As shown in the drawing, each of the grinding teeth 500b, 500c, 500d, and 500e includes a proximal end 510 having a proximal end width T1, a distal end 520 having a distal end width T2, a first side 530, and a second side 540. Have The base end 510 and the center 430 of the grindstone disc 410 are separated from each other by a base end distance D1, and the tip end 520 and the center 430 of the grindstone disc 410 are separated from each other by a tip end distance D2. The proximal distance D1 is smaller than the distal distance D2. That is, the tip 520 of the grinding tooth 500 is close to the outer edge of the grindstone disk 410. The proximal end width T1 is larger than the distal end width T2. That is, the grinding tooth 500 has a shape in which the width of the radially inner portion of the grindstone disk 410 is wide and the width of the radially outer portion is narrow. In this embodiment, the grinding device 100 has a larger wear amount at the proximal end 510 of the grinding tooth 500 during grinding than the distal end 520 due to the shape in which the radially inner portion is wide and the radially outer portion is narrow. Can be compensated for and the total thickness variation of the wafer after grinding can be effectively reduced. Specifically, with respect to the grinding tooth 500, when the grinding tooth 500 grinds the workpiece 300, the closer to the position of the center 430 of the grindstone disk 410, the larger the grinding amount, that is, the greater the wear amount. This is because the distal end 520 has a longer displacement distance than the base end 510 and the cooling effect of the front end 520 is good and the amount of grinding is reduced, but the base end 510 is cooled and the temperature is hardly lowered and the amount of grinding is increased. In other words, when the base end width T1 of the base end 510 having a large amount of grinding is increased to balance the grinding amount and the grinding amount of the tip 520 and achieve the same situation, the workpiece 300 ground under this condition is obtained. The total thickness variation is reduced, and the quality of grinding and the effectiveness of the workpiece 300 are further improved.

また、研削角度θが0度より大きく且つ90度より小さいため、研削装置100は順調に屑の排出を行うことができる。研削歯500の各々の研削面と載置盤210の盤面とが互いに平行となり、且つ研削歯500の研削面と砥石ディスク410の盤面及び被研削物300の表面とが平行となり、この構造によって、更に被研削物300の総厚変動を低下させることができる。なお、基端510と先端520は、平面状または曲面状であってもよい。第1の側辺530は第2の側辺540に対応し、且つ第1の側辺530と第2の側辺540は、平面状または曲面状であってもよい。第1の側辺530の辺長は、第2の側辺540の辺長以下で、且つ基端幅T1より大きい。基端510、先端520、第1の側辺530又は第2の側辺540の形を問わず、基端幅T1が先端幅T2より大きいと、研削歯500全体の摩耗のバランスの向上を達成し、更に研削後の総厚変動を減少することができる。なお、第1の側辺530と第2の側辺540が何れも平面状である場合、研削歯500、500cと同じように、その上面図がテーパ状であり、図10Fに示すようなものとなる。第1の側辺530と第2の側辺540が何れも曲面状である場合、研削歯500aと同じように、その上面図が彎月状であり、図10Dに示すようなものとなる。もちろん、研削歯500fの異なる位置の摩耗量を補償してバランスさせるように、図10Gに示すように、研削歯500fは砥石ディスク410の径方向外側の部位の幅が広く径方向内側の部位の幅が狭い形であってもよく、異なる研削環境条件に用いられてもよい。また注意すべきなのは、研削中に、被研削物300の屑は研削歯500、500a、500b、500c、500d、500e、500fの走行方向すなわち回転方向に対応する側辺に堆積されやすい。図10Cを例として、砥石ディスク410が時計回りに走行すなわち回転し、被研削物300の屑が第2の側辺540に堆積されやすく、この堆積現象を改善するために、第2の側辺540の延び方向が仮想放射線440と一定の大きさの夾角で交わる必要がある。言い換えれば、第2の側辺540の延び方向が仮想放射線440と平行でなければ、研削装置100は研削中に順調に屑の排出を行い、屑を砥石ディスク410の外側又は内側へ排出することができる。なお、本発明の研削歯500、500a、500b、500cはテーパ状又は彎月状であり、その第1の側辺530又は第2の側辺540が仮想放射線440自体に対して夾角を持ち、この夾角が研削角度θを併せてより大きな角度変化を生じさせることができる。そのため、その構造は一層屑の排出に寄与し、屑の排出をさらに順調にする。   Further, since the grinding angle θ is larger than 0 degree and smaller than 90 degrees, the grinding apparatus 100 can smoothly discharge the waste. Each grinding surface of the grinding tooth 500 and the surface of the mounting board 210 are parallel to each other, and the grinding surface of the grinding tooth 500 is parallel to the surface of the grinding wheel disk 410 and the surface of the workpiece 300. Furthermore, the total thickness variation of the workpiece 300 can be reduced. Note that the proximal end 510 and the distal end 520 may be planar or curved. The first side 530 corresponds to the second side 540, and the first side 530 and the second side 540 may be planar or curved. The side length of the first side 530 is equal to or shorter than the side length of the second side 540 and is larger than the base end width T1. Regardless of the shape of the base end 510, the front end 520, the first side 530, or the second side 540, if the base end width T1 is larger than the front end width T2, an improvement in the wear balance of the entire grinding tooth 500 is achieved. In addition, the total thickness fluctuation after grinding can be reduced. When the first side 530 and the second side 540 are both planar, the top view is tapered like the grinding teeth 500 and 500c, as shown in FIG. 10F. It becomes. When the first side 530 and the second side 540 are both curved, the top view is an ugly shape, as shown in FIG. 10D, like the grinding tooth 500a. Of course, as shown in FIG. 10G, the grinding tooth 500f has a wide width in the radially outer portion of the grinding wheel disk 410 so as to compensate and balance the wear amount at different positions of the grinding tooth 500f. The shape may be narrow and may be used for different grinding environment conditions. It should also be noted that during grinding, the scraps of the object to be ground 300 are likely to be deposited on the sides corresponding to the traveling direction of the grinding teeth 500, 500a, 500b, 500c, 500d, 500e, and 500f, that is, the rotational direction. 10C as an example, the grindstone disk 410 travels or rotates in the clockwise direction, and the waste of the object to be ground 300 is likely to be deposited on the second side 540. In order to improve this accumulation phenomenon, The extending direction of 540 needs to intersect the virtual radiation 440 at a certain depression angle. In other words, if the extending direction of the second side 540 is not parallel to the virtual radiation 440, the grinding apparatus 100 smoothly discharges the waste during grinding and discharges the waste to the outside or the inside of the grindstone disk 410. Can do. In addition, the grinding teeth 500, 500a, 500b, and 500c of the present invention have a taper shape or a moon shape, and the first side 530 or the second side 540 has a depression angle with respect to the virtual radiation 440 itself, This depression angle can cause a larger angle change together with the grinding angle θ. Therefore, the structure further contributes to the discharge of waste, and makes the discharge of waste even more smooth.

図10Hと図10Iを併せて参照されたい。図10Hは、254ミリメートルの砥石ディスク410の直径における研削歯500の歯型に対応する研削比のデータ図である。図10Iは、304ミリメートルの砥石ディスク410の直径における研削歯500の歯型に対応する研削比のデータ図である。図10Hと図10Iの被研削物300はウエハである。図10Hにおいてテスト対象であるウエハは3、4及び5枚である。図10Iにおいてテスト対象であるウエハは5と7枚である。本発明に記載の研削比は研削歯500の摩耗の平均厚さを単位研削量で割る百分率であり、図面に示すように、ウエハの枚数を問わず、本発明の内方が広く外方が狭い研削歯500、すなわち径方向内側の部位の幅が広く径方向外側の部位の幅が狭い研削歯500の歯型による研削比は、何れも、伝統的な、すなわち、従来の径方向内側の部位と径方向外側の部位とが同じ幅の歯型の研削比より小さいことが分かる。言い換えれば、本発明の研削歯500の摩耗の平均厚さは、伝統的な歯型の摩耗の平均厚さより小さいため、研削歯500は基端510の摩耗量が先端520より大きいという差異を補償して研削表面全体の摩耗量をバランスさせ、更に総厚変動とチッピング率を低下させる。   Please refer to FIG. 10H and FIG. 10I together. FIG. 10H is a data diagram of the grinding ratio corresponding to the tooth profile of the grinding tooth 500 at a 254 millimeter grinding wheel disk 410 diameter. FIG. 10I is a data diagram of the grinding ratio corresponding to the tooth profile of the grinding tooth 500 at a diameter of the 304 millimeter grinding wheel disk 410. The object to be ground 300 in FIGS. 10H and 10I is a wafer. In FIG. 10H, there are 3, 4 and 5 wafers to be tested. In FIG. 10I, there are 5 and 7 wafers to be tested. The grinding ratio described in the present invention is a percentage obtained by dividing the average thickness of wear of the grinding teeth 500 by the unit grinding amount. As shown in the drawings, the inner side of the present invention is wide and the outer side is wide regardless of the number of wafers. The grinding ratios of the grinding teeth 500 of the narrow grinding teeth 500, that is, the width of the radially inner portion and the width of the radially outer portion are narrow. It can be seen that the portion and the radially outer portion are smaller than the grinding ratio of the tooth mold having the same width. In other words, since the average thickness of the wear of the grinding tooth 500 of the present invention is smaller than the average thickness of the wear of the traditional tooth mold, the grinding tooth 500 compensates for the difference that the wear amount of the base end 510 is larger than the tip 520. This balances the amount of wear on the entire grinding surface and further reduces the total thickness variation and chipping rate.

上記の実施形態によると、本発明は以下のメリットを有することが分かる。一、特殊な研削角度によって回転速度、回転方向及び関連パラメータの制御を合わせて、被研削物の表面に大きな研削面積を生じさせ、更に研削後のウエハの総厚変動を減少することができる。二、一定範囲の研削角度と適切な研削パラメータの組合せによって、研削装置は研削中に等量で研削し、順調に屑の排出を行うことができるだけでなく、且つチッピング率を低下させることができる。三、所定の陳列位置で同時に複数の被研削物を研削して、大幅に生産量を高めるだけでなく、経済効果を向上させ生産コストを低下させることができる。   According to the above embodiment, it can be seen that the present invention has the following merits. First, by controlling the rotation speed, the rotation direction, and related parameters according to a special grinding angle, a large grinding area can be generated on the surface of the object to be ground, and the variation in the total thickness of the wafer after grinding can be reduced. 2. By combining a certain range of grinding angles and appropriate grinding parameters, the grinding machine can not only grind the same amount during grinding and discharge waste smoothly, but also reduce the chipping rate . 3. A plurality of objects to be ground can be ground simultaneously at a predetermined display position, thereby not only greatly increasing the production volume but also improving the economic effect and reducing the production cost.

本発明を実施形態に上記の通り開示したが、本発明を限定するためのものではなく、当業者であれば、本発明の精神と範囲から逸脱しない限り、各種の変更や修正を加えることができる。従って、本発明の保護範囲は、特許請求の範囲で指定した内容を基準とするものである。   Although the present invention has been disclosed in the embodiments as described above, it is not intended to limit the present invention, and various changes and modifications can be made by those skilled in the art without departing from the spirit and scope of the present invention. it can. Therefore, the protection scope of the present invention is based on the contents specified in the claims.

100、100a 研削装置
200 載置台
210 載置盤
220 載置回転軸
300 被研削物
400 砥石台
410 砥石ディスク
412 中環斜面
420 砥石回転軸
430 中心
440 仮想放射線
500、500a、500b 研削歯
500c、500d、500e 研削歯
500f 研削歯
510 基端
520 先端
530 第1の側辺
540 第2の側辺
610 砥石回転モーター
620 載置回転モーター
700、700a 研削方法
S11、S22 回転工程
S12、S23 研削工程
S21 軸方向制御工程
S221 回転速度制御サブ工程
S222 回転方向制御サブ工程
θ 研削角度
T1 基端幅
T2 先端幅
D1 基端距離
D2 先端距離
100, 100a Grinding device 200 Placement table 210 Placement plate 220 Placement rotation shaft 300 Workpiece 400 Grinding wheel table 410 Grinding wheel disc 412 Middle ring inclined surface 420 Grinding wheel rotation shaft 430 Center 440 Virtual radiation 500, 500a, 500b Grinding teeth 500c, 500d, 500e Grinding tooth 500f Grinding tooth 510 Base end 520 Tip 530 First side 540 Second side 610 Grinding wheel rotation motor 620 Placement rotation motor 700, 700a Grinding method S11, S22 Rotation step S12, S23 Grinding step S21 Axial direction Control step S221 Rotational speed control sub-step S222 Rotation direction control sub-step θ Grinding angle T1 Base end width T2 Tip end width D1 Base end distance D2 Tip distance

Claims (14)

回転動作を行う載置盤と、
前記載置盤に位置決めされる少なくとも1つの被研削物と、
前記載置盤に対して回転動作を行う砥石ディスクと、
前記砥石ディスクに接続されて、前記被研削物に接触し研削する複数の研削歯と、を備え、
前記研削歯の各々は、前記被研削物の表面を研削して研削面積を生じさせ、前記砥石ディスクの中心及び前記研削歯の中心と交差する仮想放射線と、0度より大きく35度より小さい研削角度で交わる研削装置。
A mounting board that performs rotation,
At least one workpiece to be positioned on the table,
A grinding wheel disk that rotates relative to the mounting table, and
A plurality of grinding teeth connected to the grinding wheel disk and contacting and grinding the workpiece,
Each of the grinding teeth grinds the surface of the object to be ground to produce a grinding area, and the virtual radiation intersecting the center of the grinding wheel disk and the center of the grinding tooth, and grinding greater than 0 degrees and less than 35 degrees Grinding equipment that meets at an angle.
前記研削角度は、0度より大きく且つ20度以下である請求項1に記載の研削装置。   The grinding apparatus according to claim 1, wherein the grinding angle is greater than 0 degree and 20 degrees or less. 前記載置盤と前記砥石ディスクは、円形であり、前記研削歯の各々は、長方形又はアーチ形であり、螺旋状に配列され、前記被研削物は、円形、楕円形、正方形又は三角形である請求項1に記載の研削装置。   The mounting table and the grindstone disk are circular, and each of the grinding teeth is rectangular or arched and arranged in a spiral, and the workpiece is circular, elliptical, square or triangular. The grinding apparatus according to claim 1. 前記載置盤との間に接続される載置回転軸に接続されて、前記載置盤を載置回転速度で回転させるように制御する載置回転モーターと、
前記砥石ディスクとの間に接続される砥石回転軸に接続されて、前記砥石ディスクを砥石回転速度で回転させるように制御する砥石回転モーターと、を更に備え、
前記載置回転速度は、前記砥石回転速度以下である請求項1に記載の研削装置。
A mounting rotation motor that is connected to a mounting rotation shaft connected to the mounting table and controls the mounting table to rotate at a mounting rotation speed;
A grindstone rotating motor connected to a grindstone rotating shaft connected between the grindstone disc and controlling the grindstone disc to rotate at a grindstone rotating speed;
The grinding apparatus according to claim 1, wherein the mounting rotational speed is equal to or lower than the grinding wheel rotational speed.
前記研削歯の各々は、基端幅を有する基端と、先端幅を有する先端と、を有し、前記基端と前記砥石ディスクの中心とが基端距離離れており、前記先端と前記砥石ディスクの中心とが先端距離離れており、前記基端距離が前記先端距離より小さく、且つ前記基端幅が前記先端幅と異なる請求項1に記載の研削装置。   Each of the grinding teeth has a base end having a base end width and a tip end having a front end width, and the base end and the center of the grindstone disk are separated from each other by a base end distance. The grinding apparatus according to claim 1, wherein the center of the disc is separated from the tip distance, the base end distance is smaller than the tip distance, and the base end width is different from the tip width. 前記研削歯の各々は、第1の側辺と第2の側辺とを更に有し、前記第1の側辺が前記第2の側辺に対応して、前記基端と前記先端が平面状または曲面状であり、前記第1の側辺と前記第2の側辺が平面状または曲面状であり、前記第1の側辺の辺長が前記第2の側辺の辺長以下で、且つ前記第1の側辺の辺長が前記基端幅より大きい請求項5に記載の研削装置。   Each of the grinding teeth further has a first side and a second side, the first side corresponds to the second side, and the base end and the tip are flat. The first side and the second side are planar or curved, and the side length of the first side is equal to or less than the side length of the second side. The grinding apparatus according to claim 5, wherein a side length of the first side is larger than the base end width. 載置盤と載置回転軸とを有し、前記載置盤が前記載置回転軸に接続されて、前記載置回転軸を中心にして回転する載置台と、
前記載置盤に位置決めされる複数の被研削物と、
砥石ディスクと砥石回転軸とを有し、前記砥石ディスクが前記砥石回転軸に接続されて、前記砥石回転軸を中心にして回転する砥石台と、
前記砥石ディスクに接続されて、前記被研削物に接触し研削する複数の研削歯と、を備え、
前記研削歯の各々は、前記被研削物の表面を研削して研削面積を生じさせ、前記砥石ディスクの中心及び前記研削歯の中心と交差する仮想放射線と、0度より大きく35度より小さい研削角度で交わり、
前記載置盤は、時計回り又は反時計回りに回転し、前記砥石ディスクは、時計回り又は反時計回りに回転し、前記載置回転軸と前記砥石回転軸とが互いに平行となり且つ前記載置盤の盤面と前記研削歯の各々の研削面とが互いに平行となり、前記載置回転軸と前記載置盤の盤面とが互いに垂直となる研削装置。
A mounting table and a mounting rotating shaft, the mounting table is connected to the mounting rotating shaft, and the mounting table rotates about the mounting rotating shaft;
A plurality of objects to be ground positioned on the table,
A grindstone disk and a grindstone rotating shaft, the grindstone disk being connected to the grindstone rotating shaft, and a grindstone base that rotates about the grindstone rotating shaft;
A plurality of grinding teeth connected to the grinding wheel disk and contacting and grinding the workpiece,
Each of the grinding teeth grinds the surface of the object to be ground to produce a grinding area, and the virtual radiation intersecting the center of the grinding wheel disk and the center of the grinding tooth, and grinding greater than 0 degrees and less than 35 degrees Intersect at an angle,
The mounting table rotates clockwise or counterclockwise, the grindstone disk rotates clockwise or counterclockwise, the mounting rotating shaft and the grinding wheel rotating shaft are parallel to each other, and the mounting table is rotated. A grinding apparatus in which a board surface of the board and each grinding surface of the grinding teeth are parallel to each other, and the mounting rotary shaft and the board surface of the mounting board are perpendicular to each other.
前記載置盤と前記砥石ディスクを回転させる回転工程と、
前記研削歯によって前記被研削物に接触的し研削して、前記研削歯の各々は、前記被研削物の表面を研削して研削面積を生じさせ、前記砥石ディスクの中心及び1つの前記研削歯の中心と交差する仮想放射線と、0度より大きく35度より小さい研削角度で交わり、前記研削面積が前記研削角度に対応する研削工程と、
を含む請求項1に記載の研削装置を用いた研削方法。
A rotating step of rotating the mounting plate and the grinding wheel disc;
The grinding teeth are contacted and ground to the object to be ground, and each of the grinding teeth grinds the surface of the object to be ground to generate a grinding area, and the center of the grinding wheel disk and one of the grinding teeth. A virtual radiation that intersects the center of the substrate at a grinding angle greater than 0 degrees and less than 35 degrees, and the grinding area corresponding to the grinding angle,
A grinding method using the grinding apparatus according to claim 1.
前記回転工程は、
載置回転モーターによって前記載置盤を載置回転速度で回転させるように制御し、且つ砥石回転モーターによって前記砥石ディスクを砥石回転速度で回転させるように制御し、前記載置回転速度が前記砥石回転速度以下である回転速度制御サブ工程を更に含む請求項8に記載の研削方法。
The rotation process includes
The mounting rotation motor is controlled to rotate the mounting plate at the mounting rotational speed, and the grinding wheel rotating motor is controlled to rotate the grinding wheel disk at the grinding wheel rotational speed. The grinding method according to claim 8, further comprising a rotation speed control sub-step that is equal to or less than the rotation speed.
前記回転工程は、
前記載置盤を載置回転方向に回転させるように制御し、且つ前記砥石ディスクを砥石回転方向に回転させるように制御し、前記載置回転方向が時計回り又は反時計回りであり、前記砥石回転方向が時計回り又は反時計回りである回転方向制御サブ工程を更に含む請求項8に記載の研削方法。
The rotation process includes
The mounting table is controlled to rotate in the mounting rotation direction, and the grinding wheel disk is controlled to rotate in the rotation direction of the grinding wheel, and the mounting rotation direction is clockwise or counterclockwise, The grinding method according to claim 8, further comprising a rotation direction control sub-step in which the rotation direction is clockwise or counterclockwise.
載置回転軸の軸方向及び砥石回転軸の軸方向を制御するものであり、前記載置回転軸が前記載置盤に接続され、前記砥石回転軸が前記砥石ディスクに接続され、前記載置回転軸と前記砥石回転軸とが互いに平行となり且つ前記載置盤と前記砥石ディスクとが互いに平行となる軸方向制御工程を更に含む請求項8に記載の研削方法。   The axial direction of the mounting rotary shaft and the axial direction of the grindstone rotating shaft are controlled, the mounting rotary shaft is connected to the mounting plate, the grindstone rotating shaft is connected to the grindstone disk, The grinding method according to claim 8, further comprising an axial direction control step in which the rotating shaft and the grindstone rotating shaft are parallel to each other, and the mounting plate and the grindstone disk are parallel to each other. 前記研削角度は、0度より大きく且つ20度以下である請求項8に記載の研削方法。   The grinding method according to claim 8, wherein the grinding angle is greater than 0 degree and 20 degrees or less. 前記研削歯の各々は、基端幅を有する基端と、先端幅を有する先端と、を有し、前記基端と前記砥石ディスクの中心とが基端距離離れており、前記先端と前記砥石ディスクの中心とが先端距離離れており、前記基端距離が前記先端距離より小さく、且つ前記基端幅が前記先端幅と異なる請求項8に記載の研削方法。   Each of the grinding teeth has a base end having a base end width and a tip end having a front end width, and the base end and the center of the grindstone disk are separated from each other by a base end distance. The grinding method according to claim 8, wherein the center of the disk is separated from the tip distance, the base end distance is smaller than the tip distance, and the base end width is different from the tip width. 前記研削歯の各々は、第1の側辺と第2の側辺とを更に有し、前記第1の側辺が前記第2の側辺に対応し、前記基端と前記先端が平面状または曲面状であり、前記第1の側辺と前記第2の側辺が平面状または曲面状であり、前記第1の側辺の辺長が前記第2の側辺の辺長以下且つ前記基端幅より大きい請求項13に記載の研削方法。   Each of the grinding teeth further includes a first side and a second side, the first side corresponds to the second side, and the proximal end and the distal end are planar. Or a curved surface, the first side and the second side are planar or curved, and the side length of the first side is equal to or less than the side length of the second side, and The grinding method according to claim 13, wherein the grinding method is larger than a base end width.
JP2017012097A 2016-01-27 2017-01-26 Grinding device and grinding method using the same Pending JP2017132033A (en)

Applications Claiming Priority (4)

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Publication number Priority date Publication date Assignee Title
JP2018130791A (en) * 2017-02-14 2018-08-23 株式会社ディスコ Grinding Wheel
WO2019192144A1 (en) * 2018-04-03 2019-10-10 苏州浦灵达自动化科技有限公司 Polishing device for plates of robot parts

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JPH0482669A (en) * 1990-07-23 1992-03-16 Kanto Rika Kogyo Kk Grindwheel and grinding method using same
JPH10277896A (en) * 1997-03-31 1998-10-20 Nippei Toyama Corp Double-head grinding machine
JP2005022059A (en) * 2003-07-02 2005-01-27 Ebara Corp Grinding machine and grinding method
JP2008142857A (en) * 2006-12-12 2008-06-26 Oki Electric Ind Co Ltd Grinding head, grinding apparatus, grinding method, and semiconductor device manufacturing method
WO2009138435A1 (en) * 2008-05-13 2009-11-19 Micheal O'ceallaigh An abrasive material, wheel and tool for grinding semiconductor substrates, and method of manufacture of same

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Publication number Priority date Publication date Assignee Title
JPH0482669A (en) * 1990-07-23 1992-03-16 Kanto Rika Kogyo Kk Grindwheel and grinding method using same
JPH10277896A (en) * 1997-03-31 1998-10-20 Nippei Toyama Corp Double-head grinding machine
JP2005022059A (en) * 2003-07-02 2005-01-27 Ebara Corp Grinding machine and grinding method
JP2008142857A (en) * 2006-12-12 2008-06-26 Oki Electric Ind Co Ltd Grinding head, grinding apparatus, grinding method, and semiconductor device manufacturing method
WO2009138435A1 (en) * 2008-05-13 2009-11-19 Micheal O'ceallaigh An abrasive material, wheel and tool for grinding semiconductor substrates, and method of manufacture of same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018130791A (en) * 2017-02-14 2018-08-23 株式会社ディスコ Grinding Wheel
WO2019192144A1 (en) * 2018-04-03 2019-10-10 苏州浦灵达自动化科技有限公司 Polishing device for plates of robot parts

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