JP2017111243A - Stage apparatus, lithography apparatus, and article manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a technique that is advantageous in terms of the dustproof performance of a stage device.SOLUTION: A stage device disposed in an inner side of a chamber includes: a chuck configured to be movable while holding an object; a drive mechanism movable part which configures a driving mechanism for driving the chuck and changes its shape or moves in accordance with the move of the chuck; and a cover which covers a projected part of the drive mechanism movable part and expands/contracts in accordance with the move of the chuck. The cover has an outer cover and an inner cover inserted into an inner side of the outer cover, and it is configured to expand/contract by sliding actions of the outer cover or the inner cover in accordance with the move of the chuck. Further, in the stage device, an exhaust hole for communicating the inner side of the cover with an outer side of the chamber and a suction hole for communicating the inner side of the cover with the inner side of the chamber are formed.SELECTED DRAWING: Figure 3

Description

  The present invention relates to a stage apparatus, a lithographic apparatus, and an article manufacturing method.

  The exposure apparatus is an apparatus that transfers a pattern of an original (mask) to a substrate in a lithography process that is a manufacturing process of a semiconductor device, a liquid crystal display device, or the like. If exposure is performed in a state where dust adheres to the mask surface, a transfer defect problem at the time of exposure occurs. Dust proofing in the lithography process is an important requirement for realizing high-precision pattern transfer performance.

  In particular, since the stage apparatus that holds the original plate and the substrate is driven at high speed, wiring and piping connected to the stage apparatus are also routed together with the stage. At this time, dust generated due to rubbing of the wiring and the piping may be scattered along the flow of air accompanying driving and adhere to the surface of an object such as an original plate or a substrate. On the other hand, Patent Document 1 discloses a configuration in which a cover is provided in each of the reference optical path and the measurement optical path of the laser interferometer, and temperature-controlled air is supplied into each cover. Patent Document 2 discloses a configuration in which the mechanism movable portion is covered with a cover, and dust in the cover is sucked and exhausted to the outside.

JP-A-5-283313 JP 2003-284985 A

  However, in the configuration of Patent Document 1, it is inevitable that dust is scattered by blowing air for temperature control. Further, according to the configuration of Patent Document 2, although the mechanism movable part can be covered, the movable part including wiring and piping cannot always be covered, which is insufficient for preventing dust from being scattered. In addition, there is a method to collect floating dust generated from the vicinity of movable parts including wiring and piping with an exhaust box, but even if dust around the exhaust box can be collected, to prevent adhesion to the mask surface After all it is insufficient.

  An object of the present invention is to provide a technique advantageous in terms of dustproof performance of a stage apparatus.

  According to an aspect of the present invention, there is provided a stage device disposed inside a chamber, the chuck configured to hold and move an object, and a drive mechanism that is connected to the chuck and drives the chuck. A drive mechanism movable portion configured to deform or move with movement of the chuck, and a cover that covers a protruding portion of the drive mechanism movable portion and expands and contracts with movement of the chuck, the cover being an outer cover And an inner cover inserted through the inside of the outer cover, and the outer cover or the inner cover is configured to expand and contract as the chuck moves, and the inside of the cover and the chamber An exhaust hole for communicating with the outside and an intake hole for communicating the interior of the cover and the interior of the chamber are formed. Stage apparatus is provided, wherein.

  ADVANTAGE OF THE INVENTION According to this invention, the technique advantageous at the point of the dustproof performance of a stage apparatus is provided.

1 is a configuration diagram of an exposure apparatus in an embodiment. The top view and side view of the original stage in embodiment. The perspective view of the original stage apparatus in embodiment. Sectional drawing of the original stage apparatus in embodiment. The perspective view of the original stage apparatus which concerns on a modification. Sectional drawing of the original stage apparatus which concerns on a modification.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. In addition, this invention is not limited to the following embodiment, It shows only the specific example advantageous for implementation of this invention. Moreover, not all combinations of features described in the following embodiments are indispensable for solving the problems of the present invention.

  FIG. 1 shows a configuration of an exposure apparatus 1 that is an example of a lithography apparatus in which the stage apparatus according to the embodiment is employed. In the present embodiment, the stage apparatus according to the present invention is used for an exposure apparatus, but it can also be used for other lithography apparatuses such as an imprint apparatus for forming a pattern of an original on a substrate.

  For example, the exposure apparatus 1 employs a projection method in which a pattern of the original M is projected and exposed onto the substrate P using a lens or a mirror. The exposure apparatus 1 includes a main body unit 3, an illumination unit 4, an original plate transport unit 5, and an original plate storage container 6 in a chamber 2.

  The illumination unit 4 includes a light source 18 and an illumination optical system 12. The light source 18 includes, for example, a high pressure mercury lamp L. In the main body 3, the projection optical system 7 changes the pattern drawn on the irradiation area of the original M held by the original stage device 9 while changing the polarization characteristics of the exposure light emitted from the light source 18 by the reflecting mirror 8. An image is formed on the substrate P on the substrate stage device 10. A correction optical unit 11 is disposed between the original stage device 9 and the projection optical system 7 and between the projection optical system 7 and the substrate stage device 10.

  The original stage apparatus 9 is configured to be movable only in the Y direction, and the substrate stage apparatus 10 is configured to be movable in the XY direction. The pattern of the original M is transferred onto the substrate P on the substrate stage device 10 by synchronizing the original stage device 9 and the substrate stage device 10 in the Y direction. A photosensitive agent is applied on the substrate, and an original pattern can be formed on the substrate by performing development after exposure. After one exposure is completed, the exposure is performed again by moving the substrate stage apparatus 10 in the X direction. By repeating this cycle, a plurality of patterns can be transferred onto one substrate. The imaging optical system 13 forms an image of the light, which has been uniformly distributed by the illumination optical system 12, on the original M arranged in the original stage apparatus 9 by taking out a range necessary for exposure.

  The original transport unit 5 can include a hand 15, a loader 16, and an original temporary storage table 17. The original transport unit 5 transports the original M, which is unloaded from the original storage container 6 by a robot (not shown), onto the original stage device 9. The hand 15 grips the original M carried out by the robot. The loader 16 moves the original M held by the hand 15 from the position of the original storage container 6 to the upper part of the original stage device 9. The original temporary placement table 17 is disposed between the original storage container 6 and the original stage device 9, and waits for the original M for next exposure.

  In the chamber 2, the temperature-adjusted air is blown from the blower 21 through the pipe 19, and the air heated by the heat generated during the exposure is collected by the exhauster 23 and passes through the pipe 22 to the chamber. 2 is discharged to the outside. Thus, the temperature-controlled air circulates in the chamber 2 so that the chamber 2 is adjusted to a constant temperature. In the present embodiment, the original stage device 9 is connected to the exhaust device 23 via the exhaust duct 24. The control unit 20 performs overall control of each unit described above.

  2A and 2B are diagrams showing the configuration of the original stage device 9, wherein FIG. 2A is a plan view and FIG. 2B is a side view. The original stage device 9 includes a chuck 25 that holds the original M, an XYθ stage 26 that holds the chuck 25, a stage surface plate 27, and a Y-axis drive guide 28. The XYθ stage 26 can be driven to each axis of XYθ by a drive mechanism 45. The original M transferred from the original storage container 6 is disposed on the chuck 25. The chuck 25 fixes the original M by, for example, suction. The chuck 25 can be driven in the Y direction together with the XYθ stage 26 along the Y-axis drive guide 28 held by the stage surface plate 27 via the XYθ stage 26. Here, the drive mechanism 45 includes a drive mechanism movable portion 29 in addition to the actuator that drives the XYθ stage 26. The drive mechanism movable unit 29 can include wiring and piping for supplying utility. The drive mechanism movable unit 29 has, for example, one end connected to the XYθ stage 26 and the other end connected to the stage surface plate 27. Therefore, the drive mechanism movable portion 29 is deformed or moved as the chuck 25 is moved in the Y direction by the XYθ stage 26. In the present embodiment, the drive mechanism movable unit 29 is placed on the base unit 30.

  In the present embodiment, the protruding portion of the drive mechanism movable portion 29 is covered with the cover. In FIG. 2, the illustration of the cover is omitted to indicate the presence of the drive mechanism movable portion 29. FIG. 3 shows a perspective view of the original stage device 9 having a cover. FIG. 4A shows a cross-sectional view of the main part along the line A-A ′ in FIG. The original stage device 9 has a fully-closed cover 50 that covers the protruding portion of the drive mechanism movable portion 29 from above and from the side. The cover 50 is configured to expand and contract as the chuck 25 is reciprocated in the Y direction by the drive mechanism 45. Specifically, the cover 50 includes an outer cover 31 and an inner cover 32 that is inserted into the outer cover 31 and is slidable. As shown in FIG. 4A, the outer cover 31 is joined to the chuck 25, for example, and the inner cover 32 is joined to the base portion 30, for example.

  During the scanning exposure, the chuck 25 moves along the Y-axis drive guide 28 within the range from the -limit position in FIG. 3A to the + limit position in FIG. 3B through the XYθ stage 26 by the drive mechanism 45. Can move in the direction. As described above, since the XYθ stage 26 and the stage surface plate 27 are connected by the drive mechanism movable portion 29, the drive mechanism movable portion 29 is deformed or moved in accordance with the movement of the XYθ stage 26 in the Y direction. To do. The outer cover 31 is joined to the chuck 25, for example, and thus interlocks with the chuck 25. Therefore, the outer cover 31 always covers the drive mechanism movable portion 29.

  The internal volume of the cover 50 is minimum when the chuck 25 reaches the -limit position shown in FIG. 3A, and is maximum when the chuck 25 reaches the + limit position shown in FIG. 3B. . From the viewpoint of dust prevention, it is desired that the gap between the outer cover 31 and the inner cover 32 be as narrow as possible, but a certain gap (clearance) is necessary to ensure smooth sliding. Therefore, when the volume inside the cover 50 changes suddenly due to the movement of the chuck 25, dust may be scattered from the gap between the outer cover 31 and the inner cover 32. Therefore, it is necessary to appropriately control the air flow rate in the cover accompanying such a change in the volume in the cover 50.

  Therefore, the stage apparatus of the present embodiment is formed with an exhaust hole 51 that communicates the interior of the cover 50 and the outside of the chamber 2 and an intake hole 52 that communicates the interior of the chamber 2 and the interior of the cover 50. For example, as shown in FIG. 4A, the exhaust hole 51 is formed in the base portion 30, and the exhaust duct 24 is connected thereto. The intake hole 52 is formed above the outer cover 31.

  According to the present embodiment, the air inside the cover 50 is forcibly exhausted by the exhaust device 23 via the exhaust hole 51 and the exhaust duct 24. As a result, the inside of the cover is always in a negative pressure state, and air inside the chamber 2 is introduced into the cover 50 from the intake hole 52. In the present embodiment, the check valve 33 is provided in the intake hole 52. The check valve 33 can prevent the air inside the cover 50 from flowing out of the intake hole 52. According to such a configuration, even when the chuck 25 moves between the −limit position and the + limit position at the maximum speed assumed, dust is scattered from the gap between the outer cover 31 and the inner cover 32. Can be prevented.

  Here, FIG. 4B shows a cross-sectional view of the main part along the line B-B ′ of FIG. As shown in FIG. 4B, one or more cavities that receive the dust generated and dropped by the drive mechanism movable unit 29 on the upper surface of the base unit 30, that is, the mounting surface of the drive mechanism movable unit 29. 53 may be formed. Thereby, the stay of the dust near the drive mechanism movable part 29 can be suppressed.

  In the above example, the intake hole 52 is formed above the outer cover 31, but the intake hole may be formed on the side of the outer cover 31. FIG. 5 shows a perspective view of the original stage device 9 in which the intake holes 54 are formed on both side surfaces of the cover 50. FIG. 6A is a sectional view taken along the line AA ′ in FIG. 5, and FIG. 6B is a sectional view taken along the line BB ′ in FIG. Show. Each intake hole 54 formed on each side surface of the cover 50 is also provided with a check valve for preventing the air inside the cover 50 from flowing out of the intake hole 54. According to such a configuration, air inside the chamber 2 can be effectively sucked from both side surfaces of the cover 50 (arrow F in FIG. 6B), and dust stays on the drive mechanism movable portion 29. Can be suppressed.

  In the foregoing, various embodiments of the present invention have been described. In the above-described embodiment, the example in which the outer cover 31 is joined to the chuck 25 and the inner cover 32 is joined to the base portion 30 has been described. However, the relationship between the outer cover and the inner cover may be reversed. Needless to say. The cover 50 may be configured to expand and contract as the outer cover or the inner cover slides as the chuck 25 reciprocates.

  In the above-described embodiment, the example in which the stage apparatus according to the present invention is applied to an original stage apparatus that holds an original as an object has been described. However, the present invention can be similarly applied to a substrate stage apparatus that holds a substrate. . That is, the stage apparatus of the present invention can be applied to a stage apparatus that holds at least one of an original and a substrate as an object.

<Embodiment of Method for Manufacturing Article>
The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing an article such as a microdevice such as a semiconductor device or an element having a fine structure. The article manufacturing method of the present embodiment includes a step of transferring an original pattern onto a substrate using the above-described lithography apparatus (exposure apparatus, imprint apparatus, drawing apparatus, etc.), and a substrate on which the pattern is transferred in such a process. Process. Further, the manufacturing method includes other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like). The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

1: exposure apparatus, 2: chamber, 9: original stage apparatus, 10: substrate stage apparatus, 25: chuck, 29: drive mechanism movable section, 30: base section, 31: outer cover, 32: inner cover, 50: cover, 51: Exhaust hole, 52: Intake hole

Claims (7)

A stage device disposed inside the chamber,
A chuck configured to hold and move an object;
A driving mechanism that drives the chuck, and a driving mechanism movable portion that deforms or moves as the chuck moves;
A cover that covers the protruding portion of the drive mechanism movable portion and expands and contracts as the chuck moves;
Including
The cover includes an outer cover and an inner cover inserted into the outer cover, and is configured to expand and contract as the outer cover or the inner cover slides as the chuck moves.
An exhaust hole for communicating the inside of the cover and the outside of the chamber and an intake hole for communicating the inside of the cover and the inside of the chamber are formed.   The stage apparatus according to claim 1, wherein an exhaust device that discharges air inside the cover to the outside of the chamber under a negative pressure inside the cover is connected to the exhaust hole.   The stage apparatus according to claim 1, further comprising a check valve provided in the intake hole and preventing air inside the cover from flowing out of the intake hole.   The stage apparatus according to claim 3, wherein the intake holes are formed on both side surfaces of the cover, and the check valves are provided in the intake holes. A base portion on which the drive mechanism movable portion is placed;
5. The stage device according to claim 1, wherein one or more cavities for receiving dust are formed on a mounting surface of the drive mechanism movable portion in the base portion. . A lithographic apparatus for forming an original pattern on a substrate,
A lithographic apparatus comprising the stage apparatus according to claim 1, wherein the stage apparatus holds at least one of the original plate and the substrate. Forming a pattern on a substrate using the lithographic apparatus according to claim 6;
Processing the substrate on which the pattern is formed;
A method for producing an article comprising:

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