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JP2017042734A - Catalytic reaction control device - Google Patents

Catalytic reaction control device Download PDF

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JP2017042734A
JP2017042734A JP2015168584A JP2015168584A JP2017042734A JP 2017042734 A JP2017042734 A JP 2017042734A JP 2015168584 A JP2015168584 A JP 2015168584A JP 2015168584 A JP2015168584 A JP 2015168584A JP 2017042734 A JP2017042734 A JP 2017042734A
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catalyst material
control device
reaction control
catalytic reaction
counter electrode
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哲也 浅野
Tetsuya Asano
哲也 浅野
幸広 金子
Yukihiro Kaneko
幸広 金子
篤志 表
Atsushi Omote
篤志 表
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Panasonic Intellectual Property Management Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/36Hydrogen production from non-carbon containing sources, e.g. by water electrolysis
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/52Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts

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Abstract

【課題】気相反応において、外部電源による触媒活性の促進および制御が可能な触媒反応制御デバイスを提供する。【解決手段】触媒材料と、対向電極と、前記触媒材料と前記対向電極との間に配置された固体電解質層と、前記触媒材料と前記対向電極に電気的に接続され電圧を印加することのできる外部電源とを備え、前記触媒材料は前記電解質層の構成元素や構成イオン種を伝導しない緻密な膜状であり、前記触媒材料の厚みが12nm以下である。【選択図】図1AProvided is a catalytic reaction control device capable of promoting and controlling catalytic activity by an external power source in a gas phase reaction. SOLUTION: A catalyst material, a counter electrode, a solid electrolyte layer disposed between the catalyst material and the counter electrode, and a voltage electrically connected to the catalyst material and the counter electrode are applied. The catalyst material is a dense film that does not conduct the constituent elements and constituent ion species of the electrolyte layer, and the thickness of the catalyst material is 12 nm or less. [Selection] Figure 1A

Description

この発明は、気相反応において、多原子分子の乖離を伴う触媒反応を制御および促進するデバイスに関する。   The present invention relates to a device for controlling and accelerating a catalytic reaction accompanied by a dissociation of polyatomic molecules in a gas phase reaction.

気相反応には、化学合成や排ガス浄化反応など、産業上重要な反応が多く、反応の効率化のために、触媒材料の開発が精力的に行われている。   In the gas phase reaction, there are many industrially important reactions such as chemical synthesis and exhaust gas purification reaction, and in order to increase the efficiency of the reaction, the development of catalyst materials has been energetically performed.

気相反応における触媒の役割は、それ自体が安定な物質である反応物を触媒表面で乖離吸着させることにより、反応活性の高い吸着原子もしくは吸着分子を反応中間体として形成し、反応効率を高めることである。反応物の乖離吸着が反応速度を支配するため、触媒材料には乖離吸着を促進または制御する特性が求められる。反応物の乖離吸着は、触媒材料から反応物に電子が瞬間的に供与されることで促進するため、触媒材料の触媒活性の向上のためには、触媒材料の電子供与能の向上が必要であることがよく知られており、そのためには、触媒材料中の電子濃度を高めればよいことがよく知られている(非特許文献1)。そこで、触媒材料の電子濃度の増大、および、電子供与能の向上のための多くの開発が行われている。   The role of the catalyst in the gas phase reaction is to increase the reaction efficiency by forming adsorbed atoms or adsorbed molecules with high reaction activity as reaction intermediates by dissociating and adsorbing reactants, which are stable substances, on the catalyst surface. That is. Since the dissociative adsorption of the reactant dominates the reaction rate, the catalyst material is required to have characteristics that promote or control the dissociative adsorption. Since dissociative adsorption of the reactant is promoted by momentarily donating electrons from the catalyst material to the reactant, it is necessary to improve the electron donating ability of the catalyst material in order to improve the catalytic activity of the catalyst material. It is well known that there is a need to increase the electron concentration in the catalyst material (Non-patent Document 1). Thus, many developments have been made to increase the electron concentration of the catalyst material and improve the electron donating ability.

例えば、特許文献1や非特許文献2では、アンモニア生成用触媒における、触媒の電子供与能を向上させるために、鉄やルテニウムなどの触媒を電子供与能の高い12CaO・7Al23マイエナイト型化合物に担持させる触媒構造が開示されている。又、特許文献2では、一酸化炭素シフト反応における触媒活性を調整するために、白金触媒にモリブデン、レニウム、又はニオブを添加し、白金の電子濃度を調整した材料が開示されている。非特許文献3では、強誘電体PbTiO3上に白金触媒を形成することで、白金における電子の占有率、すなわち電子濃度を変化させることで、COの吸着エネルギーが変化し、反応速度が変化することが開示されている。 For example, in Patent Document 1 and Non-Patent Document 2, a catalyst such as iron or ruthenium is a 12CaO · 7Al 2 O 3 mayenite type compound having a high electron donating ability in order to improve the electron donating ability of the catalyst for ammonia generation. A catalyst structure to be supported on is disclosed. Patent Document 2 discloses a material in which molybdenum, rhenium, or niobium is added to a platinum catalyst to adjust the electron concentration of platinum in order to adjust the catalytic activity in the carbon monoxide shift reaction. In Non-Patent Document 3, by forming a platinum catalyst on the ferroelectric PbTiO 3 , by changing the occupancy rate of electrons in platinum, that is, by changing the electron concentration, the adsorption energy of CO changes and the reaction rate changes. It is disclosed.

国際公開第2012/077658号International Publication No. 2012/077658 特開2004−97948号公報JP 2004-97948 A

Surface Science 114、527(1982)Surface Science 114, 527 (1982) Nature Chemistry 4,934 (2012)Nature Chemistry 4,934 (2012) Physical Review Letters 98,166101(2007)Physical Review Letters 98,166101 (2007)

触媒反応において、温度・反応物濃度などの反応条件や、反応中間体の触媒表面被覆率などの触媒表面状態は、時間的および空間的に変化するため、最適な触媒活性を得るためには、触媒材料の電子供与能を反応条件に応じて変化させる必要がある。しかし、従来技術においては、触媒材料の混合比や構成などの材料合成によって電子供与能を調整していたため、反応条件の変化に応じた電子濃度の制御ができず、最適な触媒活性に制御することができないという課題があった。   In catalytic reactions, reaction conditions such as temperature and reactant concentration, and catalyst surface conditions such as catalyst surface coverage of reaction intermediates vary temporally and spatially, so in order to obtain optimal catalyst activity, It is necessary to change the electron donating ability of the catalyst material according to the reaction conditions. However, in the prior art, since the electron donating ability was adjusted by material synthesis such as the mixing ratio and composition of the catalyst material, the electron concentration could not be controlled according to the change of reaction conditions, and the optimum catalyst activity was controlled. There was a problem that it was not possible.

本開示の触媒反応制御デバイスは、
二原子以上から構成される分子を反応物として含む気相反応の触媒能を促進及び制御するデバイスであって、
触媒材料と
対向電極と
前記触媒材料と前記対向電極との間に配置された固体電解質層と
前記触媒材料と前記対向電極に電気的に接続され電圧を印加することのできる外部電源と
を備え、
前記触媒材料は前記電解質層の構成元素や構成イオン種を伝導しない緻密な膜状であり、
前記触媒材料の厚みが12nm以下であることを特徴とする。
The catalytic reaction control device of the present disclosure includes:
A device for promoting and controlling the catalytic ability of a gas phase reaction containing a molecule composed of two or more atoms as a reactant,
A catalyst material, a counter electrode, a solid electrolyte layer disposed between the catalyst material and the counter electrode, and an external power source that is electrically connected to the catalyst material and the counter electrode and can apply a voltage,
The catalyst material is a dense film that does not conduct constituent elements or constituent ion species of the electrolyte layer,
The catalyst material has a thickness of 12 nm or less.

本開示の触媒反応制御デバイスの一態様によれば、触媒材料に印加する電圧を制御することにより、触媒材料中の電子濃度および電子供与能を制御することができ、反応条件や触媒の表面状態に応じて、適した触媒活性を示す触媒デバイスを実現することができる。   According to one aspect of the catalytic reaction control device of the present disclosure, by controlling the voltage applied to the catalyst material, the electron concentration and the electron donating ability in the catalyst material can be controlled, and the reaction conditions and the surface state of the catalyst can be controlled. Accordingly, a catalyst device exhibiting suitable catalytic activity can be realized.

触媒反応制御デバイスの実施形態を例示する断面図。1 is a cross-sectional view illustrating an embodiment of a catalytic reaction control device. 触媒反応制御デバイスの実施形態を例示する断面図。1 is a cross-sectional view illustrating an embodiment of a catalytic reaction control device. 第1の実施形態の触媒反応制御デバイス101aの製造方法の一例を示す工程断面図。Process sectional drawing which shows an example of the manufacturing method of the catalytic reaction control device 101a of 1st Embodiment. 第1の実施形態の触媒反応制御デバイス101aの製造方法の一例を示す工程断面図。Process sectional drawing which shows an example of the manufacturing method of the catalytic reaction control device 101a of 1st Embodiment. 第1の実施形態の触媒反応制御デバイス101aの製造方法の一例を示す工程断面図。Process sectional drawing which shows an example of the manufacturing method of the catalytic reaction control device 101a of 1st Embodiment. 第2の実施形態の触媒反応制御デバイス101bの製造方法の一例を示す工程断面図。Process sectional drawing which shows an example of the manufacturing method of the catalytic reaction control device 101b of 2nd Embodiment. 第2の実施形態の触媒反応制御デバイス101bの製造方法の一例を示す工程断面図。Process sectional drawing which shows an example of the manufacturing method of the catalytic reaction control device 101b of 2nd Embodiment. 第2の実施形態の触媒反応制御デバイス101bの製造方法の一例を示す工程断面図。Process sectional drawing which shows an example of the manufacturing method of the catalytic reaction control device 101b of 2nd Embodiment. 第2の実施形態の触媒反応制御デバイス101bの製造方法の一例を示す工程断面図。Process sectional drawing which shows an example of the manufacturing method of the catalytic reaction control device 101b of 2nd Embodiment. 第2の実施形態の触媒反応制御デバイス101bの製造方法の一例を示す工程断面図。Process sectional drawing which shows an example of the manufacturing method of the catalytic reaction control device 101b of 2nd Embodiment. 実施例の触媒反応制御デバイス101bを示す上面図。The top view which shows the catalytic reaction control device 101b of an Example. 実施例の触媒反応制御デバイス101bを示す断面図。Sectional drawing which shows the catalytic reaction control device 101b of an Example. 実施例の触媒反応制御デバイス101bの製造方法を示す上面図。The top view which shows the manufacturing method of the catalytic reaction control device 101b of an Example. 実施例の触媒反応制御デバイス101bの製造方法を示す断面図。Sectional drawing which shows the manufacturing method of the catalytic reaction control device 101b of an Example. 実施例の触媒反応制御デバイス101bの製造方法を示す上面図。The top view which shows the manufacturing method of the catalytic reaction control device 101b of an Example. 実施例の触媒反応制御デバイス101bの製造方法を示す断面図。Sectional drawing which shows the manufacturing method of the catalytic reaction control device 101b of an Example. 実施例の触媒反応制御デバイス101bの製造方法を示す上面図。The top view which shows the manufacturing method of the catalytic reaction control device 101b of an Example. 実施例の触媒反応制御デバイス101bの製造方法を示す断面図。Sectional drawing which shows the manufacturing method of the catalytic reaction control device 101b of an Example. 実施例の触媒反応制御デバイス101bの製造方法を示す上面図。The top view which shows the manufacturing method of the catalytic reaction control device 101b of an Example. 実施例の触媒反応制御デバイス101bの製造方法を示す断面図。Sectional drawing which shows the manufacturing method of the catalytic reaction control device 101b of an Example. 実施例の触媒反応制御デバイス101bの製造方法を示す上面図。The top view which shows the manufacturing method of the catalytic reaction control device 101b of an Example. 実施例の触媒反応制御デバイス101bの製造方法を示す断面図。Sectional drawing which shows the manufacturing method of the catalytic reaction control device 101b of an Example. 実施例1−3および比較例1、2における、触媒材料102中の電圧印加による電子濃度の変化を示すグラフ。The graph which shows the change of the electron density by the voltage application in the catalyst material 102 in Example 1-3 and Comparative Examples 1 and 2. 実施例1における、電圧印加に対する触媒材料102中の電子濃度変化の応答性を示すグラフ。3 is a graph showing the responsiveness of changes in electron concentration in the catalyst material 102 with respect to voltage application in Example 1. 実施例1における、電圧印加による触媒材料102中の電子の仕事関数変化をX線光電子分光法を用いて評価したグラフ。The graph which evaluated the work function change of the electron in the catalyst material 102 by the voltage application in Example 1 using the X ray photoelectron spectroscopy. 実施例1―3、比較例1、2における、電圧印加による触媒材料102の電子供与能の変化を示すグラフ。The graph which shows the change of the electron donating ability of the catalyst material 102 by Example 1-3 and Comparative Examples 1 and 2 by voltage application.

本発明者らは、高い電子供与能を有する触媒反応制御デバイスを得るために、鋭意検討した結果、固体電解質層の一面上に緻密で薄い触媒膜を形成し、固体電解質層の他面上に対向電極を形成し、対向電極と触媒材料間に電圧を印加することで、触媒層の電子供与能を変調できることを見出した。   As a result of intensive studies to obtain a catalytic reaction control device having a high electron donating ability, the present inventors have formed a dense and thin catalyst film on one surface of the solid electrolyte layer, and on the other surface of the solid electrolyte layer. It was found that the electron donating ability of the catalyst layer can be modulated by forming a counter electrode and applying a voltage between the counter electrode and the catalyst material.

(実施の形態)
図面を参照しながら、第1の実施形態の触媒反応制御デバイスを説明する。
(Embodiment)
The catalytic reaction control device of the first embodiment will be described with reference to the drawings.

図1Aは、第1の本実施形態の触媒反応制御デバイス101aの模式的な断面図である。   FIG. 1A is a schematic cross-sectional view of the catalytic reaction control device 101a of the first embodiment.

触媒反応制御デバイス101aは、触媒材料102、対向電極104、および、触媒材料102と対向電極104との間に配置された固体電解質層103とを備える。固体電解質層103は、触媒材料102と対向電極104と接している。触媒材料102と対向電極104との間に電圧を印加するために、外部電源105の一端を触媒材料102に電気的に接続し、外部電源105の他端を対向電極104に電気的に接続している。触媒材料102への電気的接続の際、直列抵抗値の低減のために、触媒材料102上に低抵抗なバス電極107を形成し、バス電極107に電気的接続を形成することが好ましい。バス電極107は、触媒材料の102の表面積を大きく損なうことがないよう、グリッド状に形成することが好ましい。   The catalytic reaction control device 101 a includes a catalyst material 102, a counter electrode 104, and a solid electrolyte layer 103 disposed between the catalyst material 102 and the counter electrode 104. The solid electrolyte layer 103 is in contact with the catalyst material 102 and the counter electrode 104. In order to apply a voltage between the catalyst material 102 and the counter electrode 104, one end of the external power source 105 is electrically connected to the catalyst material 102, and the other end of the external power source 105 is electrically connected to the counter electrode 104. ing. At the time of electrical connection to the catalyst material 102, it is preferable to form a low resistance bus electrode 107 on the catalyst material 102 and to form an electrical connection to the bus electrode 107 in order to reduce the series resistance value. The bus electrode 107 is preferably formed in a grid shape so as not to greatly impair the surface area of the catalyst material 102.

図1Bのように、基板106上に、対向電極104、固体電解質層103、触媒材料102、バス電極107を、順に積層形成し、触媒材料102と対向電極104の間に直流電源105を接続してもよい。   As shown in FIG. 1B, a counter electrode 104, a solid electrolyte layer 103, a catalyst material 102, and a bus electrode 107 are sequentially stacked on a substrate 106, and a DC power source 105 is connected between the catalyst material 102 and the counter electrode 104. May be.

以下、各構成要素を詳細に説明する。   Hereinafter, each component will be described in detail.

(触媒材料102)
触媒材料102は、触媒活性を示し、かつ、電子伝導性を有する材料であればよい。種種の材料における触媒活性と電子伝導性を鑑みると、3d電子、4d電子、5d電子を最外殻に有する遷移金属を含む金属材料、又は遷移金属を含む酸化物、窒化物、硫化物が好ましい。さらに好ましくは、白金、ニッケル、鉄、コバルト、ルテニウム、ロジウム、パラジウム、銅、金、イリジウムを主成分として含む材料がよい。
(Catalyst material 102)
The catalyst material 102 may be any material that exhibits catalytic activity and has electron conductivity. In view of catalytic activity and electronic conductivity in various materials, a metal material containing a transition metal having 3d electrons, 4d electrons, and 5d electrons in the outermost shell, or an oxide, nitride or sulfide containing a transition metal is preferable. . More preferably, a material containing platinum, nickel, iron, cobalt, ruthenium, rhodium, palladium, copper, gold, or iridium as a main component is preferable.

触媒材料102は、固体電解質層103の伝導イオン種を伝導・透過せず、かつ、固体電解質層103の伝導イオン種と酸化還元反応を起こさない緻密な材料とする。   The catalyst material 102 is a dense material that does not conduct / permeate the conductive ion species of the solid electrolyte layer 103 and does not cause a redox reaction with the conductive ion species of the solid electrolyte layer 103.

本発明においては、固体電解質104と触媒材料102との間の界面に生じる巨大な電荷を利用して触媒材料102の表面で起きる化学反応を促進・制御する。そのため、触媒材料102は、界面側で生じた電荷の影響が表面側に及ぼすために十分薄い必要がある。触媒材料102の厚みは、12nm以下であることが好ましく、6nm以下であると、さらに好ましい。   In the present invention, a chemical reaction occurring on the surface of the catalyst material 102 is promoted / controlled using a huge charge generated at the interface between the solid electrolyte 104 and the catalyst material 102. Therefore, the catalyst material 102 needs to be sufficiently thin in order for the influence of the electric charge generated on the interface side to affect the surface side. The thickness of the catalyst material 102 is preferably 12 nm or less, and more preferably 6 nm or less.

(固体電解質層103)
固体電解質層103は、触媒反応条件において、イオン伝導を発現する材料であればなんでもよい。イオン伝導度の具体的な値は、10-7S/cm程度以上であれば良い。伝導イオン種としては、H+、H-、O2-、Li+、Na+、Mg2+、Ca2+、Ag+などがあるが、これらのイオン種に限定されない。固体電解質層103を構成する代表的な材料は、プロトン伝導体であるA(B1-xx)O3-x/2型ペロブスカイト型酸化物(A=SrやBaなどのアルカリ土類金属、B=ZrやCeなどの4価のカチオン材料、C=YやInやScなどの3価のカチオン材料)、酸素イオン伝導体であるイットリウム安定化ジルコニア(YSZ)やガドリニウムドープのセリア(GDC)、リチウムイオン伝導体である(La2/3-xLi3x)TiO3、Li7La3Zr212、β−アルミナ、MAg45(M=Rbなどの一価のアルカリ金属)などが挙げられる。
(Solid electrolyte layer 103)
The solid electrolyte layer 103 may be any material as long as it exhibits ionic conduction under catalytic reaction conditions. The specific value of the ionic conductivity may be about 10 −7 S / cm or more. Examples of conductive ionic species include H + , H , O 2− , Li + , Na + , Mg 2+ , Ca 2+ , and Ag + , but are not limited to these ionic species. A typical material composing the solid electrolyte layer 103 is a proton conductor A (B 1-x C x ) O 3-x / 2 type perovskite oxide (A = alkaline earth metal such as Sr or Ba) B = tetravalent cation materials such as Zr and Ce, C = trivalent cation materials such as Y, In and Sc), yttrium-stabilized zirconia (YSZ) which is an oxygen ion conductor, and gadolinium-doped ceria (GDC). ), Lithium ion conductor (La 2 / 3-x Li 3x ) TiO 3 , Li 7 La 3 Zr 2 O 12 , β-alumina, MAg 4 I 5 (monovalent alkali metal such as M = Rb) Etc.

固体電解質層103の厚みは、特に規定はされないが、触媒反応制御を行う上で十分に速い応答速度(0.1Hz程度以上)を得るためには、100um以下であることが好ましく、10um以下であることがさらに好ましい。一方、厚みが薄すぎると電子リークが発生しやすくなるため、100nm以上であることが好ましい。   The thickness of the solid electrolyte layer 103 is not particularly specified, but is preferably 100 um or less in order to obtain a sufficiently high response speed (about 0.1 Hz or more) for performing catalytic reaction control. More preferably it is. On the other hand, if the thickness is too thin, electron leakage is likely to occur.

(対向電極104)
対向電極104は、固体電解質層103と酸化還元反応を起こさない電子導電性材料であれば何でも良い。例えば、金、白金、銅、アルミニウム、ルテニウム酸ストロンチウム、NbまたはLaをドープしたチタン酸ストロンチウムや、これらを含む合金が好ましい。又、固体電解質層103との界面の密着強度を高めるための材料(チタン、ニッケル、クロム、コバルト、イリジウム等)を挟んでも良い。
(Counter electrode 104)
The counter electrode 104 may be any electronic conductive material that does not cause a redox reaction with the solid electrolyte layer 103. For example, gold, platinum, copper, aluminum, strontium ruthenate, strontium titanate doped with Nb or La, and alloys containing these are preferable. Further, a material (titanium, nickel, chromium, cobalt, iridium, etc.) for increasing the adhesion strength at the interface with the solid electrolyte layer 103 may be sandwiched.

(バス電極107)
バス電極107は、反応雰囲気で安定であって、良好な電子伝導性を示す材料であればよい。例えば、金、銀、銅、白金、ニッケル、アルミニウムなどが好ましい。
(Bus electrode 107)
The bus electrode 107 may be any material that is stable in the reaction atmosphere and exhibits good electron conductivity. For example, gold, silver, copper, platinum, nickel, aluminum and the like are preferable.

(触媒反応制御デバイス101aの製造方法)
以下、図2A〜図2Cを参照しながら第一の本実施の形態の触媒反応制御デバイス101aを製造する方法を説明する。
(Manufacturing method of catalytic reaction control device 101a)
Hereinafter, a method for manufacturing the catalytic reaction control device 101a of the first embodiment will be described with reference to FIGS. 2A to 2C.

まず、図2Aに示すように、固体電解質層103を形成する。固体電解質層103の形成には、例えば、固体電解質層103を形成する材料をボールミルなどで十分に粉砕・混合した後、プレス成型した上で1000℃から1500℃の高温で空気中で焼結する方法がある。   First, as shown in FIG. 2A, a solid electrolyte layer 103 is formed. For forming the solid electrolyte layer 103, for example, the material for forming the solid electrolyte layer 103 is sufficiently pulverized and mixed with a ball mill or the like, then press-molded, and then sintered in air at a high temperature of 1000 ° C to 1500 ° C. There is a way.

その後、表面を平坦化するため、固体電解質層103の両面を研磨処理することが好ましい。   Thereafter, in order to flatten the surface, it is preferable to polish both surfaces of the solid electrolyte layer 103.

次に、図2Bに示すように、固体電解質層103の一主面上に対向電極104を形成し、固体電解質層103の他の主面上に触媒材料102を形成する。対向電極104の形成には、例えば、スパッタ蒸着法、真空蒸着法、スクリーン印刷法などを用いることができる。もしくは、対向電極104を箔状もしくは板状に予め形成しておき、それを固体電解質103上に貼り付けても良い。   Next, as shown in FIG. 2B, the counter electrode 104 is formed on one main surface of the solid electrolyte layer 103, and the catalyst material 102 is formed on the other main surface of the solid electrolyte layer 103. For the formation of the counter electrode 104, for example, a sputter deposition method, a vacuum deposition method, a screen printing method, or the like can be used. Alternatively, the counter electrode 104 may be previously formed in a foil shape or a plate shape, and may be attached on the solid electrolyte 103.

触媒材料102の形成には、スパッタ蒸着法、真空蒸着法、化学気相堆積法(以下、CVD法)、パルスレーザー堆積法(以下、PLD法)、ゾル―ゲル法などを用いることができる。   For the formation of the catalyst material 102, a sputtering vapor deposition method, a vacuum vapor deposition method, a chemical vapor deposition method (hereinafter referred to as a CVD method), a pulse laser deposition method (hereinafter referred to as a PLD method), a sol-gel method, or the like can be used.

この後、図2Cに示すように、バス電極107を形成する。バス電極107の形成には、スパッタ蒸着法、真空蒸着法、スクリーン印刷法などを用いることができる。   Thereafter, as shown in FIG. 2C, a bus electrode 107 is formed. For the formation of the bus electrode 107, a sputter deposition method, a vacuum deposition method, a screen printing method, or the like can be used.

最後に、外部電源105の一端とバス電極107とを電気的に接続し、外部電源105の他端と対向電極104とを電気的に接続し、電圧を印加する。   Finally, one end of the external power source 105 and the bus electrode 107 are electrically connected, the other end of the external power source 105 and the counter electrode 104 are electrically connected, and a voltage is applied.

(触媒反応制御デバイス101bの製造方法)
以下、図3A〜図3Eを参照しながら第二の本実施の形態の触媒反応制御デバイス101bを製造する方法を説明する。
(Manufacturing method of catalytic reaction control device 101b)
Hereinafter, a method for manufacturing the catalytic reaction control device 101b of the second embodiment will be described with reference to FIGS. 3A to 3E.

まず、図3Aに示すように、予め準備した基板106の表面に、対向電極104を形成する。対向電極104の形成には、スパッタ蒸着法、真空蒸着法、CVD法、PLD法やゾル―ゲル法などを用いることができる。   First, as shown in FIG. 3A, the counter electrode 104 is formed on the surface of the substrate 106 prepared in advance. The counter electrode 104 can be formed by sputtering, vacuum deposition, CVD, PLD, sol-gel, or the like.

次に、図3Bに示すように、対向電極104の上に、固体電解質層103を形成する。例えば、スパッタ蒸着法、真空蒸着法、CVD法、PLD、ゾル―ゲル法などの薄膜形成法を用いることができる。   Next, as shown in FIG. 3B, the solid electrolyte layer 103 is formed on the counter electrode 104. For example, a thin film forming method such as a sputter deposition method, a vacuum deposition method, a CVD method, a PLD, or a sol-gel method can be used.

続いて、図3Cに示すように、固体電解質層103上に、触媒材料102を形成する。触媒材料102の形成には、スパッタ蒸着法、真空蒸着法、CVD法、PLD法、ゾルゲル法などを用いることができる。   Subsequently, as shown in FIG. 3C, the catalyst material 102 is formed on the solid electrolyte layer 103. For the formation of the catalyst material 102, a sputter deposition method, a vacuum deposition method, a CVD method, a PLD method, a sol-gel method, or the like can be used.

この後、図3Dに示すように、バス電極107を形成する。バス電極107の形成には、スパッタ蒸着法、真空蒸着法、スクリーン印刷法などを用いることができる。   Thereafter, as shown in FIG. 3D, the bus electrode 107 is formed. For the formation of the bus electrode 107, a sputter deposition method, a vacuum deposition method, a screen printing method, or the like can be used.

最後に、図3Eに示すように、外部電源105の一端とバス電極107とを電気的に接続し、外部電源105の他端と対向電極104とを電気的に接続し、電圧を印加する。   Finally, as shown in FIG. 3E, one end of the external power source 105 and the bus electrode 107 are electrically connected, the other end of the external power source 105 and the counter electrode 104 are electrically connected, and a voltage is applied.

(実施例)
触媒反応制御デバイス101bを作製し、デバイス性能を評価した結果を説明する。
(Example)
The result of producing the catalytic reaction control device 101b and evaluating the device performance will be described.

(実施例1)
(触媒反応制御デバイスの作製)
実施例1では、電圧印加による触媒材料102の電子濃度の変化、および、電子供与能の変化を測定するために、図4Aおよび図4Bに示すように、触媒材料102をチャネル状に形成し、バス電極107をその両端、および、交差するように形成した。
Example 1
(Production of catalytic reaction control device)
In Example 1, in order to measure the change in the electron concentration of the catalyst material 102 due to voltage application and the change in the electron donating ability, as shown in FIGS. 4A and 4B, the catalyst material 102 is formed in a channel shape, The bus electrode 107 was formed so as to intersect with both ends thereof.

まず、図5Aおよび図5Bに示すように、基板106として、SrTiO3(100)基板を使用し、基板106の上に、対向電極104として、SrRuO3膜をPLD法にて形成した。ターゲットには、SrRuO3焼結体を使用した。PLD法による成膜条件は、以下のとおりであった。 First, as shown in FIGS. 5A and 5B, an SrTiO 3 (100) substrate was used as the substrate 106, and an SrRuO 3 film was formed on the substrate 106 as the counter electrode 104 by the PLD method. A SrRuO 3 sintered body was used as a target. The film forming conditions by the PLD method were as follows.

レーザーパルスのエネルギー:100mJ
パルス周波数:5Hz
酸素分圧:10Pa
基板温度:700℃
ターゲットと基板の間の距離:40mm
成膜時に対向電極104のパターンを形成するために、100um厚のSUS板に貫通穴を形成したハードマスクを通して、対向電極104を成膜した。得られた対向電極104の厚さは100nm程度であった。
Laser pulse energy: 100 mJ
Pulse frequency: 5Hz
Oxygen partial pressure: 10 Pa
Substrate temperature: 700 ° C
Distance between target and substrate: 40mm
In order to form a pattern of the counter electrode 104 at the time of film formation, the counter electrode 104 was formed through a hard mask in which a through hole was formed in a 100-um thick SUS plate. The thickness of the obtained counter electrode 104 was about 100 nm.

次に、図5Cおよび図5Dに示すように、PLD法を用いて、La0.56Li0.33TiO3からなる固体電解質層103を形成した。ターゲットには、La0.56Li0.43TiO3の組成からなる焼結体を使用した。PLDによる成膜条件は、以下のとおりであった。 Next, as shown in FIGS. 5C and 5D, a solid electrolyte layer 103 made of La 0.56 Li 0.33 TiO 3 was formed using the PLD method. A sintered body having a composition of La 0.56 Li 0.43 TiO 3 was used as a target. The film formation conditions by PLD were as follows.

レーザーパルスのエネルギー:50mJ
パルス周波数:10Hz
酸素分圧:10Pa
基板温度:800℃
ターゲットと基板の間の距離:40mm
成膜時に固体電解質層103のパターンを形成するために、100um厚のSUS板に貫通穴を形成したハードマスクを通して、固体電解質層103を成膜した。得られた固体電解質層103の厚さは300nm程度であった。
Laser pulse energy: 50 mJ
Pulse frequency: 10Hz
Oxygen partial pressure: 10 Pa
Substrate temperature: 800 ° C
Distance between target and substrate: 40mm
In order to form a pattern of the solid electrolyte layer 103 at the time of film formation, the solid electrolyte layer 103 was formed through a hard mask in which a through hole was formed in a SUS plate having a thickness of 100 μm. The thickness of the obtained solid electrolyte layer 103 was about 300 nm.

続いて、図5Eおよび図5Fに示すように、固体電解質層103上に、金からなる触媒材料102をスパッタリング法で形成した。触媒材料102のパターンの形成には、リフトオフ法を用いた。得られた触媒材料102の厚さは3nmであった。   Subsequently, as shown in FIGS. 5E and 5F, a catalyst material 102 made of gold was formed on the solid electrolyte layer 103 by a sputtering method. A lift-off method was used to form the pattern of the catalyst material 102. The resulting catalyst material 102 had a thickness of 3 nm.

この後、図5Gおよび図5Hに示すように、チタン/白金の積層構造からなるバス電極107をスパッタリング法で形成した。バス電極107のパターンの形成には、リフトオフ法を用いた。   Thereafter, as shown in FIGS. 5G and 5H, a bus electrode 107 having a titanium / platinum laminated structure was formed by a sputtering method. A lift-off method was used to form the bus electrode 107 pattern.

最後に、図5Iおよび図5Jに示すように、外部電源105を、バス電極107、および対向電極104に電気的に接続し、バス電極107を接地した。   Finally, as shown in FIGS. 5I and 5J, the external power source 105 was electrically connected to the bus electrode 107 and the counter electrode 104, and the bus electrode 107 was grounded.

(電圧印加による電子濃度変化の評価)
次いで、上記方法で作製した実施例1の触媒反応制御デバイス101bの触媒材料102中の電子濃度変化を評価した。
(Evaluation of electron concentration change by voltage application)
Next, the change in the electron concentration in the catalyst material 102 of the catalytic reaction control device 101b of Example 1 produced by the above method was evaluated.

外部電源105を用いて電圧(VG)を印加し、異なるVGにおける触媒材料102の抵抗値を評価した。直流電圧VGの印加、および、触媒材料102の抵抗値の測定には、半導体パラメーターアナライザ(Agilent社製、HP4156B)を使用した。抵抗値の評価は四端子法を用い、抵抗値からの電子濃度変化Δneの換算には、下記の式を用いた。 A voltage (V G ) was applied using the external power source 105, and the resistance value of the catalyst material 102 at different V G was evaluated. Application of the DC voltage V G, and the measurement of the resistance of the catalyst material 102, a semiconductor parameter analyzer (Agilent Co., HP4156B) was used. Evaluation of resistance using a four-terminal method, the conversion of the electronic density change [Delta] n e from the resistance value, using the following formula.

Δne=(ρ(VG)−ρ(VG=0)/ρ(VG=0)×ne,Au
ρ(VG)=R(VG)×w×t/L
ここで、R(VG)は、電圧VGにおける触媒材料102の抵抗測定値、wは触媒材料102のチャネル幅、tは触媒材料102の厚み、Lは四端子測定における電圧測定用端子間の長さ、ρeAuは、金の電子濃度で、ρeAu=5.9×1022/cm3である。
Δn e = (ρ (V G ) -ρ (V G = 0) / ρ (V G = 0) × n e, Au
ρ (V G ) = R (V G ) × w × t / L
Here, R (V G ) is the resistance measurement value of the catalyst material 102 at the voltage V G , w is the channel width of the catalyst material 102, t is the thickness of the catalyst material 102, and L is between the voltage measurement terminals in the four-terminal measurement. The length of ρ e , Au is the electron concentration of gold, and ρ e , Au = 5.9 × 10 22 / cm 3 .

実施例1における、触媒材料102の電圧(VG)印加による電子濃度変化は図6のとおりであった。+1.0Vの電圧印加により、3.5×1020/cm3の電子濃度が増加し、−1.5Vの電圧印加により、3×1020/cm3の電子濃度が減少した。 In Example 1, the change in the electron concentration by applying the voltage (V G ) of the catalyst material 102 is as shown in FIG. By applying a voltage of +1.0 V, the electron concentration of 3.5 × 10 20 / cm 3 increased, and by applying a voltage of −1.5 V, the electron concentration of 3 × 10 20 / cm 3 decreased.

次に、実施例1において、触媒材料102の電子濃度変化の電圧印加に対する応答速度を評価した。印加電圧VGを、順に、0V、+1V、0V、−1V、0Vと変化させた際の電子濃度変化の時間応答は、図7のとおりであった。 Next, in Example 1, the response speed with respect to voltage application of the electron concentration change of the catalyst material 102 was evaluated. FIG. 7 shows time responses of changes in electron concentration when the applied voltage V G is sequentially changed to 0V, + 1V, 0V, −1V, and 0V.

(電圧印加に伴う触媒材料102の電子供与能変化の評価)
実施例1において、電圧印加に伴う触媒材料102の電子供与能の変化を評価した。電子供与能変化の評価には、X線光電子分光法(SPring−8、BL16XU)を用いて触媒材料102の仕事関数変化を測定した。
(Evaluation of change in electron donating ability of catalyst material 102 with voltage application)
In Example 1, the change in the electron donating ability of the catalyst material 102 with voltage application was evaluated. For the evaluation of the electron donating ability change, the work function change of the catalyst material 102 was measured using X-ray photoelectron spectroscopy (SPring-8, BL16XU).

触媒材料102の電子の仕事関数変化を測定した結果は、図8のとおりであった。電圧VG印加による仕事関数変化ΔΦは、図8中のΦ(VG)−Φ(VG=0)に相当し、ΔΦ=150meVであった。ΔΦが正であることは、仕事関数の減少を示し、電子供与能が向上していることを示す。 The result of measuring the change in the electron work function of the catalyst material 102 is as shown in FIG. The work function change ΔΦ due to the application of the voltage V G corresponds to Φ (V G ) −Φ (V G = 0) in FIG. 8, and ΔΦ = 150 meV. A positive ΔΦ indicates a decrease in work function and an improvement in electron donating ability.

(実施例2)
触媒材料102の厚みを変更した点以外は、実施例1と同様の方法で実施例2の触媒反応制御デバイスを作製した。実施例2では、得られた触媒材料102の厚さは6nmであった。
(Example 2)
A catalytic reaction control device of Example 2 was produced in the same manner as in Example 1 except that the thickness of the catalyst material 102 was changed. In Example 2, the obtained catalyst material 102 had a thickness of 6 nm.

実施例2において、VG=+1Vにおける触媒材料102の電子濃度変化は、2×1020/cm3程度であり、仕事関数変化量は、80meVの減少であった。 In Example 2, the change in the electron concentration of the catalyst material 102 at V G = + 1 V was about 2 × 10 20 / cm 3 , and the work function change amount was a decrease of 80 meV.

(実施例3)
触媒材料102の厚みを変更した点以外は、実施例1と同様の方法で実施例3の触媒反応制御デバイスを作製した。実施例3では、得られた触媒材料102の厚さは12nmであった。
(Example 3)
A catalytic reaction control device of Example 3 was produced in the same manner as in Example 1 except that the thickness of the catalyst material 102 was changed. In Example 3, the obtained catalyst material 102 had a thickness of 12 nm.

実施例3において、VG=+1Vにおける触媒材料102の電子濃度変化は、1×1020/cm3程度であり、仕事関数変化量は、60meVの減少であった。 In Example 3, the change in the electron concentration of the catalyst material 102 at V G = + 1 V was about 1 × 10 20 / cm 3 , and the work function change amount was a decrease of 60 meV.

(比較例1)
触媒材料102の厚みを変更した点以外は、実施例1と同様の方法で比較例1の触媒反応制御デバイスを作製した。比較例1では、得られた触媒材料102の厚さは20nmであった。
(Comparative Example 1)
A catalytic reaction control device of Comparative Example 1 was produced in the same manner as in Example 1 except that the thickness of the catalyst material 102 was changed. In Comparative Example 1, the thickness of the obtained catalyst material 102 was 20 nm.

比較例1において、VG=+1Vにおける仕事関数変化量は、10meV以下で、有意な差は認められなかった。 In Comparative Example 1, the work function change amount at V G = + 1 V was 10 meV or less, and no significant difference was observed.

(比較例2)
固体電解質層103の材料をSiO2へ変更した点以外は、実施例1と同様の方法で比較例2の触媒反応制御デバイスを作製した。SiO2膜の形成には、スパッタ法を用いて、下記条件にて成膜した。
(Comparative Example 2)
A catalytic reaction control device of Comparative Example 2 was produced in the same manner as in Example 1 except that the material of the solid electrolyte layer 103 was changed to SiO 2 . The SiO 2 film was formed by sputtering under the following conditions.

RFパワー 200W
基板温度 300℃
酸素分圧 1Pa
比較例2において、触媒材料102の電子濃度に電圧VG印加による有意な変化は無く、VG=+1Vにおける仕事関数変化量は、10meV以下で、有意な差は認められなかった。
RF power 200W
Substrate temperature 300 ° C
Oxygen partial pressure 1Pa
In Comparative Example 2, there was no significant change in the electron concentration of the catalyst material 102 due to the application of the voltage V G , and the work function change amount at V G = + 1 V was 10 meV or less, and no significant difference was observed.

(結果および考察)
上述した実施例1〜3および比較例1〜2の結果を図6、図7、図9に示す。
(Results and Discussion)
The results of Examples 1 to 3 and Comparative Examples 1 and 2 described above are shown in FIGS.

図6の結果より、実施例1−3においては、固体電解質層103上に触媒材料102を形成し、電圧VGを印加することで、触媒材料102中の電子濃度が1020/cm3のオーダーで変化した。又、電子濃度の変化量は、印加電圧の値に対して変化しており、制御可能である。一方、比較例2の結果のとおり、固体電解質層103にイオン伝導しない誘電材料であるSiO2を用いると、触媒材料102の電子濃度は変化しなかった。以上の結果より、固体イオン伝導体上に触媒材料102を形成し、電圧を印加することで、触媒材料102の電子濃度を制御可能であることがわかる。 From the results of FIG. 6, in Examples 1-3, the catalyst material 102 is formed over the solid electrolyte layer 103, by applying a voltage V G, the electron concentration in the catalyst material 102 is 10 20 / cm 3 It changed with the order. The amount of change in the electron concentration changes with respect to the value of the applied voltage and can be controlled. On the other hand, as shown in the result of Comparative Example 2, when SiO 2 , which is a dielectric material that does not conduct ions, is used for the solid electrolyte layer 103, the electron concentration of the catalyst material 102 did not change. From the above results, it can be seen that the electron concentration of the catalyst material 102 can be controlled by forming the catalyst material 102 on the solid ion conductor and applying a voltage.

図7の結果より、電圧印加による触媒材料102の電子濃度変化の応答速度は、1secのオーダーであり、気相反応の環境応答変化の速度(0.1Hz)に対して良好な応答速度を示した。   From the results shown in FIG. 7, the response speed of the change in the electron concentration of the catalyst material 102 due to voltage application is on the order of 1 sec. It was.

図9の結果より、実施例1から3においては、電圧VGの印加により、仕事関数が減少したが、比較例1においては、仕事関数の変化は、認められなかった。これは、電圧印加による電子濃度の変化が、固体電解質層103と触媒材料102との間の界面近傍で起こる現象であり、界面近傍の電子濃度変化が仕事関数変化、すなわち、表面での電子のフェルミレベル変化に寄与するためには触媒材料102の厚みが12nm以下である必要があることを示している。 From the results of FIG. 9, in Examples 1 to 3, the work function was decreased by applying the voltage V G , but in Comparative Example 1, no change in the work function was observed. This is a phenomenon in which a change in electron concentration due to voltage application occurs in the vicinity of the interface between the solid electrolyte layer 103 and the catalyst material 102, and a change in electron concentration in the vicinity of the interface results in a work function change, that is, the amount of electrons on the surface It shows that the thickness of the catalyst material 102 needs to be 12 nm or less in order to contribute to the Fermi level change.

本願に開示された触媒反応制御デバイスは、気相反応における触媒反応を電圧印加により促進・制御が可能で、アンモニアの生成・分解反応、合成ガスからの炭化水素生成、一酸化炭素の酸化反応などの用途として有用である。   The catalytic reaction control device disclosed in the present application can promote and control the catalytic reaction in the gas phase reaction by applying voltage, such as ammonia generation / decomposition reaction, hydrocarbon generation from synthesis gas, carbon monoxide oxidation reaction, etc. It is useful as an application.

101a 第1の実施の形態の触媒反応制御デバイス
101b 第2の実施の形態の触媒反応制御デバイス
102 触媒材料
103 固体電解質
104 対向電極
105 直流電源
106 基板
107 バス電極
101a Catalytic reaction control device of the first embodiment 101b Catalytic reaction control device of the second embodiment 102 Catalytic material 103 Solid electrolyte 104 Counter electrode 105 DC power source 106 Substrate 107 Bus electrode

Claims (4)

二原子以上から構成される分子を反応物として含む気相反応の触媒能を促進及び制御するデバイスであって、
触媒材料と
対向電極と
前記触媒材料と前記対向電極との間に配置された固体電解質層と
前記触媒材料と前記対向電極に電気的に接続され電圧を印加することのできる外部電源と
を備え、
前記触媒材料は前記電解質層の構成元素や構成イオン種を伝導しない緻密な膜状であり、
前記触媒材料の厚みが12nm以下であることを特徴とするデバイス。
A device for promoting and controlling the catalytic ability of a gas phase reaction containing a molecule composed of two or more atoms as a reactant,
A catalyst material, a counter electrode, a solid electrolyte layer disposed between the catalyst material and the counter electrode, and an external power source that is electrically connected to the catalyst material and the counter electrode and can apply a voltage,
The catalyst material is a dense film that does not conduct constituent elements or constituent ion species of the electrolyte layer,
A device having a thickness of the catalyst material of 12 nm or less.
請求項1記載の触媒反応制御デバイスであって、
前記触媒材料は、白金または金を含むことを特徴とする
触媒反応制御デバイス。
The catalytic reaction control device according to claim 1,
The catalyst reaction control device, wherein the catalyst material contains platinum or gold.
請求項2に記載のデバイスであって、
前記固体電解質は、La、Li、Tiを含む酸化物である
ことを特徴とする触媒反応制御デバイス。
The device of claim 2, comprising:
The said solid electrolyte is an oxide containing La, Li, and Ti. The catalytic reaction control device characterized by the above-mentioned.
請求項3記載の触媒反応制御デバイスであって、
前記気相反応が
窒素ガスと水素ガスを反応物として含むアンモニア生成反応、
アンモニアを反応物として含むアンモニア分解反応、
一酸化炭素と水を反応物として水素と二酸化炭素を生成する水性ガスシフト反応、
一酸化炭素と水素を反応物として炭化水素を生成する反応、
一酸化炭素と窒素酸化物と炭化水素のいずれか又は全てを反応物として含む排ガス浄化反応のいずれかであることを特徴とする触媒反応制御デバイス。
The catalytic reaction control device according to claim 3, wherein
The gas phase reaction is an ammonia generation reaction containing nitrogen gas and hydrogen gas as reactants;
Ammonia decomposition reaction containing ammonia as a reactant,
Water-gas shift reaction that produces hydrogen and carbon dioxide using carbon monoxide and water as reactants,
A reaction that produces hydrocarbons using carbon monoxide and hydrogen as reactants,
A catalytic reaction control device, characterized in that it is one of exhaust gas purification reactions containing any or all of carbon monoxide, nitrogen oxides and hydrocarbons as reactants.
JP2015168584A 2015-08-28 2015-08-28 Catalytic reaction control device Pending JP2017042734A (en)

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