JP2016218299A - Single aspherical common optical element exposure machine lens set - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a single aspherical common optical element exposure machine lens set which simplifies tuning factors of an optical system, achieves the functions of an exposure lens easily, reduces manufacturing costs, allows an optical member to be easily fabricated using a small number of elements, and which achieves aberration resistance, excellent numerical aperture ratio and cost reduction with simple calibration.SOLUTION: The single aspherical common optical element exposure machine lens set includes: a common optical element set composed of first to third lenses 11-13 sequentially arranged; and a plane reflection lens set 30 including a spherical mirror 20 arranged below the third lens 13 and first and second plane reflection mirrors 31, 32 respectively arranged obliquely above the first lens 11. Each optical lens set forms an equal-magnification exposure machine lens set, and a pattern on an apparatus 1 is focused by each optical lens set and then projected onto a photosensitive surface (wafer) 2.SELECTED DRAWING: Figure 1

Description

    The present invention relates to a single aspherical common optical element exposure machine lens set, and in particular, superimposes a single aspherical three lenses, a spherical reflector and two planar reflectors in a superposed combination with a single aspherical surface. In particular, the present invention relates to a single aspherical common optical element exposure device lens set that is composed of three single aspherical lenses and two types of optical materials.

    The exposure lens set is an important child system when manufacturing an exposure machine with electronic elements. Today, the exposure machine used by electronic element manufacturers has a total refraction type and an extension type, and the former. Has a large volume, and the latter has a reduced number of elements. However, since a large number of surfaces are used, it is very difficult to manufacture and combine them.

    The extension type exposure machine is, for example, a German ZEISS company-ASML type (German patents DE19355198, DE19922209) and a Japanese NIKON company, which uses a total of 25 overlapping asymptotic curvature methods (JP-2004-252119), and the exposure function ( For example, see FIG. 5 and FIG. 6), and to save material, France SAGEM is a DYSON catadioptric (China People's Republic of Patent CN 101171546), which reduces the light path and the light is in the lens set 40 50, the number of lenses is reduced by reciprocating, but two aspherical surfaces (for example, see FIG. 7) must be used for the lens sets 40 and 50 and the reflecting surfaces 21 and 22. , The exposure machine proposed by Shanghai Micromechanical Co., Ltd. (US Patent US7746571 B2) also uses a similar method (also called extension type) to achieve the exposure function, but also the number of lenses Too many (see, eg, FIG. 8).

    As described above, because too many lenses are used in the patented invention, not only do the functions overlap and the manufacturing cost increases, but the manufacturing becomes difficult, and moreover, a plurality of aspherical mirrors are used. The difficulty of fabrication and combination is increased, and the demand for the precision of the mechanism is increased at the time of combination, and the manufacturing cost is increased. Therefore, it cannot be said that the general conventional one is practical.

    The present inventor proposes the present invention in which the above-mentioned drawbacks are solved by careful research, and the above-mentioned drawbacks can be effectively eliminated by utilizing science, and the design is rational.

German patent DE19355198 German patent DE19922209 JP2004-252119 Chinese People's Republic Patent CN101171546 US patent US7746571 B2

    The main object of the present invention is to solve the above-mentioned problems of the prior art, using a single aspherical surface and a superposition type combination, three single aspherical lenses, one spherical reflector and two planes By superimposing the reflecting mirrors, a single aspherical common optical element exposure device lens set having an equal magnification is provided by combining two kinds of optical materials.

    Another object of the present invention is that a single aspheric optical axis allows light to march between each optical lens set, thereby simplifying the tuning factors of the optical system and easily realizing the function of the exposure lens, In addition, the manufacturing cost can be reduced, making optical members easy with a small number of elements (satisfied with the lens manufacturing experience formula), and easy calibration, but also with excellent aberration resistance and excellent numerical aperture ratio (F / #). ) And a single aspherical common optical element exposure machine lens set that can realize cost reduction.

    In order to achieve the above object, a single aspherical common optical element exposure device lens set according to the present invention is a combined lens comprising three lenses in which a first lens, a second lens, and a third lens are arranged in order. The first lens is aspheric, the first and third lenses are positive curvature, the second lens is negative curvature, and the curvature ratio of the first and third lenses is 3 to 4, the curvature ratio between the third lens and the second lens is in the range of -1 to -2.5, and the gap between each lens is smaller than the gap between the third lens and the reflective lens set. A common optical element set, a spherical reflector that is arranged below the third lens, reflects a light path, and controls an aperture ratio; a first planar reflector and a second planar reflector; Is obliquely installed above the first lens and is a plane reflection that guides the optical path. Each optical lens set described above forms an equal-magnification exposure device lens set, and the pattern of each device is focused by each optical lens set and projected onto the photosensitive surface. The

    According to the embodiment of the present invention, the common optical element set performs optical difference calibration with a single aspherical first lens.

    According to an embodiment of the present invention, the device is an exposure mask or a writing light source.

    According to the embodiment of the present invention, the pattern of the device is sequentially passed through the first planar reflecting mirror, the common optical element set, the spherical reflecting mirror, and the second planar reflecting mirror. The first plane reflecting mirror introduces one surface of the common optical element set to the first lens, the second lens, and the third lens, which are aspherical surfaces, and then the common reflector element is reversed in the reverse direction by the spherical reflecting mirror. After passing through the third lens, the second lens, and the first lens of the optical element, the pattern is projected onto the photosensitive surface by the second plane reflecting mirror.

    According to the embodiment of the present invention, the single aspherical common optical element exposure device lens set is applied to an image collimating projection apparatus.

    According to an embodiment of the present invention, the plane reflection lens set is replaced by a prism or a delay lens set.

    According to the embodiment of the present invention, the first lens, the second lens, and the third lens are replaced by a lens barrel to form an optical system of one child system.

    Hereinafter, the features and technical contents of the present invention will be described in detail with reference to the drawings. However, the drawings and the like are for reference and explanation, and the present invention is not limited thereby.

It is a conceptual cross-sectional view of a single aspherical common optical element exposure device lens set of the first better embodiment of the present invention. It is a diffraction modulation transfer function curve figure of the exposure machine lens set of the 1st better example of this invention. It is a cross-sectional conceptual diagram of the single aspherical common optical element exposure machine lens set of the second better example of the present invention. It is a diffraction modulation transfer function curve figure of the exposure machine lens set of the 2nd better example of this invention. It is a cross-sectional conceptual diagram of the conventional exposure machine lens set. It is a cross-sectional conceptual diagram of another conventional exposure machine lens set. It is a conceptual sectional view of still another conventional exposure apparatus lens set. It is a conceptual sectional view of still another conventional exposure apparatus lens set.

    1 to 4 are sectional conceptual views of a single aspherical common optical element exposure device lens set according to the first preferred embodiment of the present invention and an exposure device lens according to the first better embodiment of the present invention, respectively. FIG. 4 is a diffraction modulation transfer function curve diagram of the set, and is a cross-sectional conceptual diagram of a single aspherical common optical element exposure device lens set of the second better embodiment of the present invention and the exposure of the second better embodiment of the present invention. It is a diffraction modulation transfer function curve figure of an optical lens set. As shown in the figure, the present invention is a single aspherical common optical element exposure machine lens set, mainly using a single aspherical common optical element (Common Optical Componets) to reduce the number of elements, A common optical element set 10, a spherical reflecting mirror 20, and a plane reflecting lens set 30 are configured.

    In the common optical element set 10, the first lens 11, the second lens 12, and the third lens 13 are sequentially arranged to form a combination lens including three lenses, and is a single aspherical surface. The first lens 11 is aspheric, the first lens 11 and the third lens 13 are positive curvature, the second lens 12 is negative curvature, and The curvature ratio between the first lens 11 and the third lens 13 is in the range of 3 to 4, and the curvature ratio between the third lens 13 and the second lens 12 is in the range of -1 to -2.5. The gap between the lenses is smaller than the gap between the third lens and the reflecting lens set.

    The spherical reflecting mirror 20 is disposed below the third lens 13, reflects the optical path, and controls the size of the aperture ratio.

    The plane reflection lens set 30 includes a first plane reflection mirror 31 and a second plane reflection mirror 32 that guide the optical path, and is installed obliquely above the first lens 11, thereby Each optical lens set forms an equal-magnification exposure device lens set. The pattern on the apparatus 1 is focused by each optical lens set and then projected onto the photosensitive surface of the wafer 2. As described above, a novel single aspherical common optical element exposure device lens set is formed by the above structure.

    The first lens 11, the second lens 12, and the third lens 13 may be formed by a lens barrel, whereby an optical system of one child system is combined, and the plane reflection lens set is a prism or a delay. It may be replaced by a lens set.

    The single aspherical common optical element exposure device lens set according to the present invention is applied to an image collimating projection apparatus, and the apparatus is an exposure mask or other writing light source. The pattern is sequentially passed through the plane reflection lens set 30, the common optical element set 10, the spherical reflector 20, and the plane reflection lens set 30, and light is transmitted through the first plane of the plane reflection lens set 30. After being guided to the aspherical first lens 11, second lens 12, and third lens 13 on one surface of the common optical element set 10 by the reflecting mirror 31, the spherical reflecting mirror 20 reverses the common Traveling through the third lens 13, the second lens 12, and the first lens 11 of the optical element 10, and finally, via the second plane reflecting mirror 32 of the plane reflecting lens set 30, Turn is Isa movies on the photosensitive surface of the wafer 2.

    One of the main assemblies of the exposure machine stand is the exposure machine lens set. The function of the exposure machine lens set is to project the structure of the mask onto the photosensitive surface via the lens. However, the analytical ability of the standard of the optical lens is trained to the diffraction limit, and the distortion value is a maximum angle of view of 0.01% or less. On the other hand, there are a plurality of embodiments according to the present invention, and the properties of the diffraction modulation transfer function (MTF) were examined for each embodiment. 1 and 2 are a cross-sectional view and a diffraction modulation transfer function curve diagram of a single aspherical common optical element exposure device lens set in which the focal length of the common optical element set is 249 / -656 / 1565 mm, respectively. 3 and 4 are a cross-sectional view and a diffraction modulation transfer function curve diagram of a single aspherical common optical element exposure device lens set in which the focal length of the common optical element set is 979 / -640 / 586 mm, respectively. is there. From the above figures, according to the exposure apparatus lens set according to each embodiment of the present invention, each type of aberration is effectively calibrated, and its analysis ability can be achieved to the diffraction limit. Ability is realized.

    As described above, the present invention is a combination of a single aspherical surface and a superposition type, with a single 3in1 lens set, two 3in1 lens sets being replaced, and three single aspherical lenses and one spherical reflection. By combining two mirrors and two plane reflecting mirrors, and combining two kinds of optical materials, a single aspherical common optical element exposure device lens set with the same magnification is realized. By marching between each optical lens set, the tuning factor of the optical system is simplified, the function of the exposure lens is easily realized, the manufacturing cost can be reduced, and the optical member can be manufactured with a small number of elements. Easier (satisfied with the lens fabrication experience formula), easy to calibrate, but with low aberration, excellent numerical aperture (F / #) and cost reduction.

    As described above, the single aspherical common optical element exposure machine lens set according to the present invention can effectively eliminate the conventional disadvantages, and includes three single aspherical lenses, one spherical reflector, and two A single aspherical common optical element exposure machine lens set of equal magnification is realized by combining two kinds of optical materials by combining two plane reflecting mirrors, and each optical lens set has a single aspheric optical axis. Marching, the tuning factor of the optical system is simplified, the function of the exposure lens is easily realized, the manufacturing cost can be reduced, and the optical member can be easily manufactured with a small number of elements (lens Is satisfied with the manufacturing experience formula), while being easy to calibrate, it offers aberration resistance, excellent numerical aperture ratio (F / #) and cost reduction, which makes the present invention more progressive and practical. Apply for a patent according to

    The above is merely a better embodiment of the present invention, and the present invention is not limited thereby, and equivalent changes made based on the scope of the claims and the description of the present invention. All modifications are within the scope of the claims of the present invention.

(Invention)
1 Device 2 Wafer 10 Common Optical Element Set 11 First Lens 12 Second Lens 13 Third Lens 20 Spherical Reflector 30 Planar Reflective Lens Set 31 First Planar Reflector 32 Second Planar Reflector (Conventional)
21, 22 Reflective surface 40, 50 Lens set

In order to achieve the above object, a single aspherical common optical element exposure device lens set according to the present invention is a combined lens comprising three lenses in which a first lens, a second lens, and a third lens are arranged in order. The first lens is an aspheric surface, the first and third lenses are positive curvature lenses , the second lens is a negative curvature lens , and the first and third lenses are curvature ratio of the lens (curvature ratio) is within the range of 3-4, the curved ratio of the third and the second lens (curvature ratio) is within the range of -1 to 2.5, the lenses A common optical element set whose gap is smaller than the gap between the third lens and the reflecting lens set, a spherical reflector that is disposed below the third lens, reflects the optical path, and controls the aperture ratio; Having a one plane reflector and a second plane reflector, each of which is diagonal And a plane reflecting lens set that guides the light path, and is formed by each of these optical lens sets to form an exposure unit lens set of equal magnification. The device pattern is focused by each optical lens set and projected onto the photosensitive surface.

According to an embodiment of the present invention, the common optical element set for optical aberration (aberration of light) calibration (calibration) a first lens of a single aspheric.

According to an embodiment of the present invention, the single aspherical common optical element exposure device lens set is applied to an a collimated image projector .

According to an embodiment of the present invention, the planar reflective lens set is replaced by the prism or magnifying lens set (an extended image lens set).

Common optical element set 10 described above, in order, a first lens 11 and the second lens 12 and third lens 13 is arranged, the combination lens is formed consisting of three lenses, a single aspherical optical aberration calibration In addition, the first lens 11 is aspheric, the first lens 11 and the third lens 13 are positive refractive power , and the second lens 12 is negative refractive power , Further, in the range ratio of the refractive power of 3-4 between the first lens 11 and the third lens 13, the ratio of the refractive power between the third lens 13 and the second lens 12 -1 It is in the range of -2.5, and the gap between each lens is smaller than the gap between the third lens and the reflecting lens set.

Claims (7)

In order, the first lens, the second lens, and the third lens are arranged to form a combination lens composed of three lenses, the first lens is aspherical, the first and third lenses are positive curvatures, The second lens has a negative curvature, and the curvature ratio of the first and third lenses is in the range of 3 to 4, and the curvature ratio of the third and second lenses is -1 to A common optical element set that is in the range of -2.5, and the gap between the lenses is smaller than the gap between the third lens and the reflective lens set
A spherical reflector that is disposed below the third lens and reflects an optical path to control an aperture ratio;
A plane reflecting lens set having a first plane reflecting mirror and a second plane reflecting mirror, each of which is installed obliquely above the first lens and guides an optical path;
Contains,
A single aspherical common optical element exposure machine lens set characterized by the above. The optical element exposure machine lens set according to claim 1, wherein the common optical element set is a single aspherical first lens that performs optical row difference calibration. 2. The optical element exposure machine lens set according to claim 1, wherein the equipment property is an exposure mask or a writing light source. The pattern of the device is sequentially passed through the first planar reflecting mirror, the common optical element set, the spherical reflecting mirror, and the second planar reflecting mirror, in which light is reflected by the first planar reflecting mirror. After the one surface of the common optical element set is introduced into the first lens, the second lens, and the third lens, which are aspherical surfaces, the third lens and the second lens of the common optical element are reversed by the spherical reflector. 2. The optical element exposure apparatus lens set according to claim 1, wherein the pattern is projected onto the photosensitive surface by the second plane reflecting mirror after passing through the first lens. The optical element exposure machine lens set according to claim 1, which is applied to an image collimating projection apparatus. 2. The optical element exposure machine lens set according to claim 1, wherein the plane reflection lens set is replaced by a prism or a delay lens set. The optical element exposure apparatus lens set according to claim 1, wherein the first lens, the second lens, and the third lens are replaced by a lens barrel to form an optical system of one child system. .