JP2016186570A - Movable body apparatus, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a movable body apparatus with improved position control performance.SOLUTION: A substrate stage device 20 comprises: a fine movement stage 38 movable along an XY plane; an X mirror stage 60x and a Y mirror stage 60y provided separately from the fine movement stage 38 and movable along the XY plane; and a substrate position measurement system for determining the positional information of the fine movement stage 38 in the XY plane, based on output of a laser interferometer system which determines the X positional information of the X mirror stage 60x and the Y positional information of the Y mirror stage 60y, using an X bar mirror 64x mounted on the X mirror stage 60x and a Y bar mirror 64y mounted on the Y mirror stage 60y and on output of an X displacement gauge 70x which determines the displacement information of the fine movement stage 38 and the X mirror stage 60x in the X axis direction and output of a Y displacement gauge 70y which determines the displacement information of the fine movement stage 38 and the Y mirror stage 60y in the Y axis direction.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a moving body apparatus, an exposure apparatus, a flat panel display manufacturing method, and a device manufacturing method, and more specifically, a moving body apparatus including a moving body movable along a predetermined two-dimensional plane, The present invention relates to an exposure apparatus including a moving body apparatus, a flat panel display manufacturing method using the exposure apparatus, and a device manufacturing method using the exposure apparatus.

  Conventionally, in a lithography process for manufacturing electronic devices (microdevices) such as liquid crystal display elements, semiconductor elements (integrated circuits, etc.), a mask or reticle (hereinafter collectively referred to as “mask”), a glass plate or wafer (hereinafter referred to as “mask”). Step-and-scan exposure in which the pattern formed on the mask is transferred onto the substrate using an energy beam while the substrate is collectively moved along a predetermined scanning direction (scanning direction). An apparatus (a so-called scanning stepper (also called a scanner)) or the like is used.

  As this type of exposure apparatus, an exposure apparatus including an optical interferometer system that obtains position information in a horizontal plane of a substrate using a bar mirror (long mirror) included in the substrate stage apparatus is known (for example, Patent Documents). 1).

  Here, in the conventional optical interferometer system, the bar mirror is configured to be fixed to a table member that holds the substrate, and the weight of the table member increases, so that the position controllability of the substrate may be deteriorated. It was.

JP 2006-86442 A

  The present invention has been made under the circumstances described above. From the first viewpoint, the present invention can move along at least the first direction in a predetermined two-dimensional plane including the first and second directions orthogonal to each other. The first moving body and the first moving body are provided separately from each other, and a second moving body that is movable at least along the first direction and a reflective surface provided on the second moving body are used. Output of the laser interferometer system for obtaining the position information of the second moving body in the first direction, and displacement information along the first direction between the first moving body and the second moving body. And a measurement system for obtaining position information of the first moving body in the first direction based on an output of a displacement amount sensor to be obtained.

  Here, in this specification, the position information is not limited to information specifying the position of the moving body, such as relative position information and absolute position information, and includes, for example, displacement amount information before and after the movement of the moving body.

  According to this, the position information of the second moving body in the first direction is obtained by the laser interferometer system, and the displacement amount information along the first direction of the second moving body and the first moving body is obtained by the displacement amount sensor. The measurement system obtains position information of the first moving body in the first direction based on the outputs of the laser interferometer system and the displacement sensor. Here, since the second moving body is provided separately from the first moving body, it is not necessary to provide a reflecting surface for the laser interferometer system on the first moving body, and the first moving body is simplified. The weight can be reduced, and the position controllability of the first moving body is improved.

  According to a second aspect of the present invention, there is provided a moving body device according to the present invention in which a predetermined object is held on the first moving body, and a pattern forming apparatus that forms a predetermined pattern on the object using an energy beam. , An exposure apparatus.

  From a third aspect, the present invention is a method of manufacturing a flat panel display, which includes exposing the object using the exposure apparatus of the present invention and developing the exposed object.

  From a fourth viewpoint, the present invention is a device manufacturing method including exposing the object using the exposure apparatus of the present invention and developing the exposed object.

It is a figure which shows schematically the structure of the liquid-crystal exposure apparatus which concerns on 1st Embodiment. It is a top view of the substrate stage apparatus which the liquid crystal exposure apparatus of FIG. 1 has. It is the sectional view on the AA line of FIG. FIG. 4 is a partially enlarged view of FIG. 3. FIG. 5A shows a mirror stage drive system, and FIG. 5B shows a modification of the mirror stage drive system. It is a conceptual diagram of a board | substrate interferometer system. FIG. 7A is a view showing the X-bar mirror according to the first embodiment, and FIGS. 7B and 7C are views showing modified examples (No. 1 and No. 2) of the X-bar mirror. . It is a figure which shows the modification of the substrate stage apparatus which concerns on 1st Embodiment. It is a top view which shows the substrate stage apparatus which concerns on 2nd Embodiment. It is sectional drawing which shows the substrate stage apparatus which concerns on 2nd Embodiment. FIG. 11A shows a first modification of the substrate stage apparatus according to the second embodiment, and FIG. 11B shows a second modification of the substrate stage apparatus according to the second embodiment. It is. It is a side view which shows the 3rd modification of the substrate stage apparatus which concerns on 2nd Embodiment. It is a top view which shows the 3rd modification of the substrate stage apparatus which concerns on 2nd Embodiment. It is a side view which shows the substrate stage apparatus which concerns on 3rd Embodiment. It is a figure which shows the modification of the substrate stage apparatus which concerns on 3rd Embodiment.

<< First Embodiment >>
Hereinafter, the first embodiment and its modifications will be described with reference to FIGS.

  FIG. 1 schematically shows the configuration of a liquid crystal exposure apparatus 10 according to the first embodiment. The liquid crystal exposure apparatus 10 employs a step-and-scan method in which a rectangular (square) glass substrate P (hereinafter simply referred to as a substrate P) used in, for example, a liquid crystal display device (flat panel display) is an exposure object. A projection exposure apparatus, a so-called scanner.

  The liquid crystal exposure apparatus 10 has an illumination system 12, a mask stage 14 that holds a mask M on which a circuit pattern and the like are formed, a projection optical system 16, an apparatus body 18, and a resist (surface facing the + Z side in FIG. 1) ( A substrate stage device 20 that holds the substrate P coated with a sensitive agent), a control system thereof, and the like. Hereinafter, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system 16 at the time of exposure is defined as the X-axis direction, and the direction orthogonal to the X-axis in the horizontal plane is defined as the Y-axis direction, the X-axis, and the Y-axis. The description will be made assuming that the orthogonal direction is the Z-axis direction, and the rotation directions around the X-axis, Y-axis, and Z-axis are the θx, θy, and θz directions, respectively. Further, description will be made assuming that the positions in the X-axis, Y-axis, and Z-axis directions are the X position, the Y position, and the Z position, respectively.

  The illumination system 12 is configured similarly to the illumination system disclosed in, for example, US Pat. No. 5,729,331. The illumination system 12 irradiates light emitted from a light source (not shown) (for example, a mercury lamp) through exposure mirrors (not shown), dichroic mirrors, shutters, wavelength selection filters, various lenses, and the like. ) Irradiate the mask M as IL. As the illumination light IL, for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm), or the combined light of the i-line, g-line, and h-line is used.

  The mask stage 14 holds a light transmission type mask M. A predetermined circuit pattern (mask pattern) is formed on the lower surface of the mask M (the surface facing the −Z side). The mask stage 14 drives the mask M with a predetermined long stroke in the X-axis direction (scan direction) with respect to the illumination system 12 (illumination light IL) via, for example, a linear motor (not shown), and in the Y-axis direction, And slightly driven in the θz direction. The position information of the mask M in the horizontal plane is obtained by a mask stage position measurement system (not shown) including a laser interferometer, for example.

  The projection optical system 16 is disposed below the mask stage 14. The projection optical system 16 is a so-called multi-lens projection optical system having the same configuration as the projection optical system disclosed in, for example, US Pat. No. 6,552,775, and is a double-sided telecentric equal magnification system. A plurality of optical systems for forming a vertical image are provided.

  In the liquid crystal exposure apparatus 10, when the illumination area on the mask M is illuminated by the illumination light IL from the illumination system 12, the illumination light that has passed through the mask M causes the mask M in the illumination area to pass through the projection optical system 16. A projection image (partial upright image) of the circuit pattern is formed in an irradiation region (exposure region) of illumination light conjugate to the illumination region on the substrate P. Then, the mask M moves relative to the illumination area (illumination light IL) in the scanning direction, and the substrate P moves relative to the exposure area (illumination light IL) in the scanning direction. Scanning exposure of one shot area is performed, and the pattern formed on the mask M is transferred to the shot area.

  The apparatus main body 18 is installed on the floor 11 of the clean room via a plurality of vibration isolation devices 19. The apparatus main body 18 is configured in the same manner as the apparatus main body disclosed in, for example, US Patent Application Publication No. 2008/0030702, and an upper frame (not shown) that supports the mask stage 14 and the projection optical system 16. ), A pair of lower frame parts 18a, and a pair of middle frame parts 18b (not shown in FIG. 1, see FIG. 2).

  The substrate stage apparatus 20 includes a surface plate 22, a pair of base frames 24 (one is not shown in FIG. 1, refer to FIG. 2), a substrate stage 30, an X mirror stage 60x, and a Y mirror stage 60y.

  As shown in FIG. 2, the surface plate 22 is composed of a rectangular plate-shaped member (as viewed from the + Z side) formed of, for example, stone, and the upper surface thereof is finished with a very high flatness. Yes. The surface plate 22 is placed in a state of being bridged on the two lower mount parts 18a.

  One of the pair of base frames 24 is disposed on the + Y side of the surface plate 22, and the other is disposed on the −Y side of the surface plate 22. Returning to FIG. 1, the base frame 24 is made of a member extending in the X-axis direction, and is installed on the floor 11 in a state of being vibrationally insulated from the apparatus main body 18 (a state straddling the undercarriage 18 a). Yes. As shown in FIG. 2, an X linear guide 26 a extending parallel to the X axis is fixed to the upper end surface of the base frame 24. In addition, X stators 28 a including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction are fixed to both side surfaces of the base frame 24.

  As shown in FIG. 3, the substrate stage 30 includes an X coarse movement stage 32, a Y coarse movement stage 34, a weight cancellation device 36, and a fine movement stage 38 (substrate table 40, substrate holder 42).

  As shown in FIG. 2, the X coarse movement stage 32 has a pair of Y beams 44 a installed between the pair of base frames 24. The pair of Y beams 44a are each made of a member having a rectangular XZ section extending in the Y-axis direction, and are arranged in parallel to each other at a predetermined interval in the X-axis direction. A member called an X carriage 44b is fixed in the vicinity of both ends in the longitudinal direction of the Y beam 44a. The X carriage 44b is made of a member having an inverted U-shaped YZ cross section, and the base frame 24 is inserted between a pair of opposed surfaces. An X slide member (not shown) constituting an X linear guide device for linearly guiding the X carriage 44b in the X-axis direction together with the X linear guide 26a is disposed on the inner surface of the X carriage 44b. An X mover (not shown) constituting an X linear motor device for driving the carriage 44b in the X-axis direction is fixed. The pair of X carriages 44b on the + Y side and the pair of X carriages 44b on the -Y side are mechanically connected by a connection plate 44c, and the pair of Y beams 44a are integrally moved in the X-axis direction. The

  As shown in FIG. 4, a pair of Y linear guides 45a is fixed on the upper surface of the Y beam 44a. The pair of Y linear guides 45a are each composed of a member extending in the Y-axis direction, and are arranged in parallel to each other at a predetermined interval in the X-axis direction. A Y stator 46a including a plurality of permanent magnets arranged at predetermined intervals in the Y-axis direction is fixed in a region between the pair of Y linear guides 45a on the upper surface of the Y beam 44a. The X position information of the X coarse movement stage 32 is obtained by a main controller (not shown) via an X linear encoder system (not shown).

  The Y coarse movement stage 34 is made of a plate-like member and is placed on the X coarse movement stage 32. As shown in FIG. 5A, the Y coarse movement stage 34 is formed to protrude in the −Y direction from the main body portion 35a having a rectangular shape in plan view and the + X side and −Y side ends of the main body portion 35a. It has a protruding portion 35b and a protruding portion 35c formed by protruding in the −X direction from the −X side and + Y side ends of the main body portion 35a. The main body portion 35a, the protruding portion 35b, and the protruding portion 35c may be integrally formed or may be separate members. An opening 37 having a rectangular shape in plan view is formed at the center of the main body 35a. As shown in FIG. 2, the protrusion 35 b is positioned above the + X side Y beam 44 a of the X coarse movement stage 32, and the protrusion 35 c is from the −X side Y beam 44 a of the X coarse movement stage 32. Are also projected in the −X direction (outside the X coarse movement stage 32).

  Returning to FIG. 4, a plurality of Y slide members 45 b (overlapping in the depth direction of the drawing in FIG. 4) corresponding to the plurality of Y linear guides 45 a are fixed to the lower surface of the Y coarse movement stage 34. The Y slide member 45b, together with the corresponding Y linear guide 45a, constitutes a mechanical Y linear guide device 45 as disclosed in US Pat. No. 6,761,482, for example. 34 is guided straight on the X coarse movement stage 32 in the Y-axis direction. A Y mover 46b is fixed to the lower surface of the Y coarse movement stage 34 so as to face the Y stator 46a. The Y mover 46b includes a coil unit (not shown). The direction and magnitude of the current supplied to the coil unit are controlled by a main controller (not shown). The Y mover 46b, together with the corresponding Y stator 46a, constitutes a Y linear motor 46 as disclosed in, for example, US Pat. No. 8,030,804. The Y coarse movement stage 34 is linearly driven in the Y axis direction on the X coarse movement stage 32 via a pair of Y linear motors 46. The Y position information of the Y coarse movement stage 34 is obtained by a main controller (not shown) via a Y linear encoder system (not shown).

  The weight cancellation device 36 is inserted into the opening 37 of the Y coarse movement stage 34 and is disposed between the pair of Y beams 44a. The weight canceling device 36 includes a bottomed cylindrical casing 36a, an air spring 36b accommodated in the casing 36a, and a Z slide member 36c placed on the air spring 36b. The weight cancellation device 36 floats on the surface plate 22 with a predetermined clearance via a plurality of air bearings 36d attached to the lower surface of the housing 36a. A rectangular frame-shaped member 48 is suspended and fixed from the portion (opening end) defining the opening 37 of the Y coarse movement stage 34 described above, and the weight canceling device 36 is located at the height of the center of gravity. The rectangular frame-shaped member 48 is mechanically connected to the Y coarse movement stage 34 through a plurality of devices called flexures 49 and vibrationally separated in a direction crossing the XY plane. ing. The weight canceling device 36 is pulled by the Y coarse movement stage 34 through at least one of the plurality of flexures 49, thereby moving integrally with the Y coarse movement stage 34 in the X axis direction and / or the Y axis direction. . The configuration of the weight cancellation device 36 including the flexure 49 is disclosed in, for example, US Patent Application Publication No. 2010/0018950.

  The weight canceling device 36 supports the spherical bearing device 47 in a non-contact manner from below via an air bearing (not shown) attached to the upper surface of the Z slide member 36c. The spherical bearing device 47 supports the fine movement stage 38 from below so as to freely swing (tilt operation) in the θx and θy directions. The spherical bearing device 47 can move along the XY plane integrally with the fine movement stage 38, and the fine movement stage 38 and the weight cancellation device 36 can move relative to each other along the XY plane. In place of the spherical bearing device 47, for example, a pseudo spherical bearing device as disclosed in US 2010/0018950 may be used.

  The fine movement stage 38 has a substrate table 40 and a substrate holder 42. The substrate table 40 is formed of a plate-shaped (or box-shaped) member having a rectangular shape in plan view, and a central portion is supported from below by the weight canceling device 36 via the spherical bearing device 47 described above. The substrate holder 42 is made of a plate member having a rectangular shape in plan view, and is fixed to the upper surface of the substrate table 40. A substrate P is placed on the upper surface of the substrate holder 42. The substrate holder 42 sucks and holds the substrate P using a vacuum suction force supplied from a vacuum device (not shown) installed outside the substrate stage device 20.

  The fine movement stage 38 is slightly driven in the three degrees of freedom direction (X axis, Y axis, θz direction) on the Y coarse movement stage 34 by a fine movement stage drive system including a plurality of voice coil motors. In the present embodiment, the plurality of voice coil motors are arranged on the + X side of the substrate table 40, for example, two X voice coil motors 50x and the + Y side of the substrate table 40, as shown in FIG. For example, two Y voice coil motors 50y are included.

  As shown in FIG. 4, the X voice coil motor 50x is fixed to the Y coarse movement stage 34 via a support column 51 and a T-shaped stator 50a, and is fixed to the + X side of the substrate table 40. And a movable member 50b having a U-shaped cross section. The X voice coil motor 50x is a moving magnet type linear motor in which a coil unit (not shown) is provided on the stator 50a and a magnet unit (not shown) is provided on the mover 50b, and generates thrust in a direction parallel to the X axis. To do. The height position (Z position) of the X voice coil motor 50x substantially coincides with the height position of the center of gravity Gs of the fine movement stage 38, and the fine movement stage 38 is caused by the thrust applied from the X voice coil motor 50x. Rotation in the θy direction (generation of pitching moment) is suppressed. The Y voice coil motor 50y (not shown in FIG. 4, refer to FIG. 2) is a moving magnet type linear motor having substantially the same configuration as the X voice coil motor 50x except that it generates a thrust parallel to the Y axis. Therefore, explanation is omitted.

  A main controller (not shown), when driving the Y coarse movement stage 34 with a predetermined long stroke in the X-axis and / or Y-axis direction, causes the X-axis, And / or thrust in the Y-axis direction (electromagnetic force) is applied. As a result, the fine movement stage 38 supported in a non-contact manner by the weight cancellation device 36 moves integrally with the Y coarse movement stage 34 with a predetermined long stroke in the X-axis direction and / or the Y-axis direction. In addition, the main control device (not shown), for example, makes different outputs (thrusts) of the two X voice coil motors 50x (or the two Y voice coil motors 50y (not shown in FIG. 4; see FIG. 2)). The fine movement stage 38 is slightly driven in the θz direction with respect to the Y coarse movement stage 34.

  The fine movement stage drive system also includes a plurality of Z voices for finely driving the fine movement stage 38 in the Z-axis direction, θx direction, and θy direction (hereinafter referred to as Z / tilt direction) with respect to the Y coarse movement stage 34. A coil motor 50z is provided. In the present embodiment, a total of four Z voice coil motors 50z are arranged corresponding to the four corners of the substrate table 40, for example. The Z voice coil motor 50z is a moving magnet type linear motor having substantially the same configuration except that the arrangement is different from that of the X voice coil motor 50x described above, so that the description thereof is omitted. The main controller (not shown) appropriately moves the fine movement stage 38 using the plurality of Z voice coil motors 50z so that the surface of the substrate P is positioned within the depth of focus of the projection optical system 16 (see FIG. 1). Control to drive in the tilt direction (autofocus control) is performed. At this time, the weight cancellation device 36 described above cancels the weight of the fine movement stage 38 (downward (−Z direction) force due to weight acceleration), thereby reducing the load on the plurality of Z voice coil motors 50z. From the viewpoint of avoiding complications in the drawing, the weight canceling device 36 and a plurality of voice coil motors constituting the fine movement stage drive system are not shown in FIG.

  Next, a substrate position measurement system for obtaining position information in the direction of 6 degrees of freedom of fine movement stage 38 (that is, substrate P) will be described. As shown in FIG. 4, the Z / tilt position measurement system for obtaining positional information of the fine movement stage 38 in the Z / tilt direction includes a probe 52a attached to the lower surface of the substrate table 40 and a housing of the weight canceling device 36. A plurality of Z sensors 52 including a target 52b attached to the body 36a are provided. For example, four (at least three) Z sensors 52 are arranged at a predetermined interval around an axis parallel to the Z axis passing through the center of gravity Gs of the fine movement stage 38, for example. A main controller (not shown) obtains Z position information of the fine movement stage 38 and rotation amount information in the θx and θy directions based on the outputs of the plurality of Z sensors 52. The configuration of the Z / tilt position measurement system including the Z sensor 52 is disclosed in detail in, for example, US Patent Application Publication No. 2010/0018950.

  Position information of the fine movement stage 38 in the X-axis direction, Y-axis direction, and θz direction (hereinafter referred to as position information in the XY plane) is obtained by a substrate interferometer system. As shown in FIG. 2, the substrate interferometer system includes a pair of X laser interferometers 58x, a pair of Y laser interferometers 58y, an X mirror stage 60x, a Y mirror stage 60y, a pair of X displacement meters 70x, and a pair of Y displacement meter 70y is included.

  The pair of X laser interferometers 58x is fixed to the apparatus main body 18 via a member called an interferometer column 18c so that the Z position thereof is substantially the same as the Z position of the substrate holder 42. As shown in FIG. 3, the interferometer column 18 c is made of a member having an L-shaped XZ cross section, and is fixed to the −X side undercarriage portion 18 a of the apparatus main body 18. Returning to FIG. 2, the pair of X laser interferometers 58 x are arranged at a predetermined interval in the Y-axis direction. Further, the pair of Y laser interferometers 58y are fixed to the −Y side intermediate base portion 18b of the apparatus main body 18 so that the Z position thereof is substantially the same as the Z position of the substrate holder 42. The pair of Y laser interferometers 58y are arranged at a predetermined interval in the X-axis direction.

  The X mirror stage 60x is placed on the surface plate 22 in a state separated from the substrate stage 30, and is on the −X side of the X coarse movement stage 32, with a predetermined clearance between the X coarse movement stage 32 and a predetermined clearance. Has been placed. As shown in FIG. 1, the X mirror stage 60x includes a base member 62, a mirror support member 63, and an X bar mirror 64x. The base member 62 is formed in a circular shape in plan view (see FIG. 5A). A plurality of air bearings 61 are attached to the lower surface of the base member 62. The X mirror stage 60x floats on the surface plate 22 through a predetermined clearance by static pressure of pressurized gas (for example, air) ejected from the plurality of air bearings 61 to the upper surface of the surface plate 22. Independent. The mirror support member 63 is composed of an isosceles trapezoidal plate-like member having a lower bottom shorter than the upper base in a front view (as viewed from the −X side) (see the mirror support member 63 of the Y mirror stage 60y). A lower end portion is fixed to the upper surface of the base member 62.

  The X bar mirror 64 x is fixed to the upper end portion of the mirror support member 63. As shown in FIG. 2, the X bar mirror 64x is made of a rod-shaped member having a rectangular XZ section extending parallel to the Y axis, and the surfaces on the −X side and the + X side are mirror-finished. An X bar mirror 64x may be formed by fixing a mirror (for example, a plane mirror) on each of the −X side and + X side surfaces of a rod-shaped member having an XZ cross section that extends in the Y-axis direction. In this case, a mirror that is long in the Y-axis direction is provided on the surface on the −X side, and a mirror is provided on the surface on the + X side at a position where at least the measurement beam from the pair of X displacement meters 70x is irradiated. good. Since the X bar mirror 64x and the X displacement meter 70x are provided so as not to move relative to each other in the Y-axis direction, the mirror provided on the surface on the + X side is not necessarily a long mirror. The length in the longitudinal direction (Y-axis direction) of the X bar mirror 64x is preferably set to be approximately the same as the dimension of the side (short side) parallel to the Y-axis of the substrate holder 42 (in this embodiment, it is set somewhat longer). ing).

  As shown in FIG. 5A, the X mirror stage 60x is a Y voice coil motor including a stator fixed to the protruding portion 35c of the Y coarse movement stage 34 and a mover fixed to the mirror support member 63. A thrust in the Y-axis direction (+ Y direction or -Y direction) is applied from the Y coarse movement stage 34 through 66y. Further, the X mirror stage 60x is connected to a Y coarse coil via a pair of X voice coil motors 66x including a stator fixed to the main body 35a of the Y coarse movement stage 34 and a mover fixed to the mirror support member 63. Thrust in the X-axis direction (+ X direction or −X direction) and θz direction is applied from the moving stage 34. Each of the X voice coil motor 66x and the Y voice coil motor 66y is a moving magnet type linear motor having substantially the same configuration as the X voice coil motor 50x (see FIG. 4) described above, except that the arrangement is different. Therefore, detailed description is omitted.

  The main controller (not shown) appropriately applies thrust in the X axis, Y axis, and θz directions to the X mirror stage 60x using the Y voice coil motor 66y and the pair of X voice coil motors 66x. The position of the X mirror stage 60x in the XY plane is controlled. The height position (Z position) of each of the X voice coil motor 66x and the Y voice coil motor 66y substantially coincides with the height position of the center of gravity Gmx (see FIG. 4) of the X mirror stage 60x. The rotation of the X mirror stage 60x in the θx or θy direction (generation of pitching moment) due to the thrust applied through 66y and the pair of X voice coil motors 66x is suppressed.

  As shown in FIG. 6, the X position information (and the rotation amount information in the θz direction) of the X mirror stage 60x is obtained by using the -X reflecting surface of the X bar mirror 64x by the pair of X laser interferometers 58x described above. Desired. The X laser interferometer 58x irradiates a fixed reference mirror (not shown) with a reference beam, and also irradiates the X bar mirror 64x with a length measurement beam. The reflected light of the reference beam from the reference mirror and the length measurement beam X position information (displacement information in the X-axis direction) of the X bar mirror 64x (-X side reflection surface) based on the X position of the reference mirror based on interference with light reflected from the X bar mirror 64x Ask for. The output of the X laser interferometer 58x is supplied to a main controller (not shown).

  The pair of X displacement meters 70x is used to obtain the relative movement (displacement) amount between the substrate holder 42 and the X mirror stage 60x in the X axis direction. The pair of X displacement meters 70x is fixed to the −X side side surface of the substrate holder 42 so that the Z position is substantially the same as the Z position of the X bar mirror 64x (that is, the X laser interferometer 58x). The pair of X displacement meters 70x are arranged in the Y-axis direction at substantially the same interval as the above-described pair of X laser interferometers 58x. In the present embodiment, the X displacement meter 70x is a reflective laser displacement meter, which irradiates a length measuring beam on the reflection surface on the + X side of the X bar mirror 64x, and based on the reflected beam from the reflection surface. Then, the relative displacement amount between the substrate holder 42 and the X mirror stage 60x is obtained. Here, it is preferable that the X displacement meter 70x has a resolution (measurement accuracy) equivalent to (or higher than) the X laser interferometer 58x. The dimension (height) of the X bar mirror 64x in the Z direction is set so that the length measurement beam from the X displacement meter 70x does not deviate from the reflecting surface even when the fine movement stage 38 is driven in the Z / tilt direction.

  The X position information of the substrate holder 42 includes the output of the X laser interferometer 58x, the output of the X displacement meter 70x, the -X side reflection surface of the X bar mirror 64x (reflection surface for the X laser interferometer 58x), + X And the distance to the side reflection surface (the reflection surface for the X displacement meter 70x) (that is, the known thickness of the X bar mirror 64x). For this reason, the X bar mirror 64x is formed of a material having a low coefficient of thermal expansion (for example, Zerodur (registered trademark)) so that the thickness (dimension in the X-axis direction) does not change due to heat, for example. Similarly, the mirror support member 63 and the base member 62 (see FIG. 1) are also formed of a material having a low coefficient of thermal expansion. The X mirror stage 60x includes an X bar mirror 64x, and has a thermally symmetric structure when viewed from the front (viewed from the X axis direction) so that heat is evenly distributed, so that deformation of the X bar mirror 64x is suppressed. It has become. Further, the rotation amount information of the substrate holder 42 in the θz direction is obtained based on the output of the pair of X displacement meters 70x with reference to the X mirror stage 60x.

  As shown in FIG. 2, the Y mirror stage 60 y is placed on the surface plate 22 in a state separated from the substrate stage 30, and is on the −Y side of the Y coarse movement stage 34, and the X coarse movement stage 32. Is inserted between a pair of Y beams 44a. The configuration and function of the Y mirror stage 60y including the drive system and the measurement system are substantially the same as the X mirror stage 60x (however, the X mirror stage 60x is configured to be rotated approximately 90 ° around the Z axis). Have been). That is, as shown in FIG. 1, the Y mirror stage 60 y includes a base member 62, a mirror support member 63, and a Y bar mirror 64 y, and is placed on the surface plate 22 via a plurality of air bearings 61. Yes.

  As shown in FIG. 5 (A), the Y mirror stage 60y is arranged in the XY plane by the thrust applied from the Y coarse movement stage 34 via the X voice coil motor 66x and the pair of Y voice coil motors 66y. Position control is performed. As shown in FIG. 2, the dimension of the Y bar mirror 64y in the longitudinal direction (X axis direction) is almost the same as the dimension of the side (long side) parallel to the X axis of the substrate holder 42 (in this embodiment, it is somewhat Long) and is somewhat longer than the X bar mirror 64x.

  As shown in FIG. 6, the Y position information (and the rotation amount information in the θz direction) of the Y mirror stage 60y is obtained by using the reflection surface on the −Y side of the Y bar mirror 64y by the pair of Y laser interferometers 58y described above. Is required. Also, by a pair of Y displacement meters 70y fixed to the substrate holder 42, position information in the Y-axis direction of the Y mirror stage 60y with respect to the substrate holder 42 (and rotation amount information in the θz direction) is obtained on the + Y side of the Y bar mirror 64y. It is determined using a reflective surface. The position information (and the rotation amount information in the θz direction) of the substrate holder 42 includes the outputs of the pair of Y laser interferometers 58y, the outputs of the pair of Y displacement meters 70y, and a known Y bar mirror. It is determined based on the thickness direction (Y-axis direction) dimension of 64y.

  The relative position information about the Y-axis direction between the X mirror stage 60x and the Y coarse movement stage 34 and the relative position information about the X axis direction between the Y mirror stage 60y and the Y coarse movement stage 34 are as shown in FIG. Further, it is obtained based on the output of the displacement sensor 68a fixed to the Y coarse movement stage 34. In FIG. 1, only the X displacement sensor for obtaining the relative position information in the X-axis direction between the Y mirror stage 60y and the Y coarse movement stage 34 is shown, and the Y between the X mirror stage 60x and the Y coarse movement stage 34 is shown. The Y displacement sensor for obtaining the relative position information regarding the axial direction is hidden behind the mirror support member 63 of the X mirror stage 60x.

  Here, since the displacement sensor 68a is not used for obtaining position information of the fine movement stage 38 (substrate P), the resolution of the displacement sensor 68a is the above-mentioned X laser interferometer 58x, Y laser interferometer 58y, X It may be lower than the resolution of the displacement meter 70x and the Y displacement meter 70y (see FIG. 2 respectively). As the displacement sensor 68a, for example, a triangulation laser displacement meter, an overcurrent sensor, a capacitance sensor, a linear encoder, a laser interferometer, or the like can be used. In this case, the target 68b attached to the mirror support member 63 in a state of facing the displacement sensor 68a may be appropriately selected according to the type of the displacement sensor 68a.

  Further, as shown in FIG. 4, a gap sensor 69 a is attached to the Y coarse movement stage 34. The gap sensor 69a measures the distance in the X-axis direction between the Y coarse movement stage 34 and the X mirror stage 60x using the target 69b attached to the X mirror stage 60x. Although not shown, the Y coarse movement stage 34 is also provided with a gap sensor for measuring the distance in the Y-axis direction between the Y coarse movement stage 34 and the Y mirror stage 60y. The output of the gap sensor 69a is not used for obtaining the position information of the fine movement stage 38, and the position information of the fine movement stage 38 in the XY plane cannot be obtained with high accuracy mainly using the substrate interferometer system. In this case, it is used to prevent the X mirror stage 60x, Y mirror stage 60y and the Y coarse movement stage 34 (or the substrate holder 42) from colliding with each other. Therefore, the resolution of the gap sensor 69a may be lower than that of the displacement sensor 68a (see FIG. 1).

  Although not shown, the substrate stage device 20 (see FIG. 2) includes a connecting device that can mechanically connect the X mirror stage 60x and the Y mirror stage 60y to the Y coarse movement stage 34. . For example, when the position of the substrate holder 42 using a laser interferometer and a laser displacement meter cannot be controlled, such as when the substrate stage apparatus 20 is initialized, the Y mirror is used to move the Y coarse movement stage 34 using the above-described coupling device. It is preferable to prevent collision between the Y coarse movement stage 34 and the X mirror stage 60x and the Y mirror stage 60y by connecting the stage 60y and the X mirror stage 60x. Further, although not shown, the substrate stage device 20 includes a mechanical stopper device that defines the movable range of each of the Y mirror stage 60y and the X mirror stage 60x with respect to the Y coarse movement stage 34. Even if the position of the X mirror stage 60x and the Y mirror stage 60y (or the Y coarse movement stage 34) cannot be controlled by the action of the stopper device, the X mirror stage 60x, the Y mirror stage 60y and the Y mirror stage 60y Collision with coarse movement stage 34 (or substrate holder 42) is prevented.

  In the liquid crystal exposure apparatus 10 (see FIG. 1) configured as described above, the mask M is loaded onto the mask stage 14 by a mask loader (not shown) under the control of the main controller (not shown), and The substrate P is loaded onto the substrate stage device 20 by a substrate loader (not shown). Thereafter, the main controller performs alignment measurement using an alignment detection system (not shown), and after the alignment measurement is completed, a step-and-scan exposure operation is performed. Since this exposure operation is the same as the conventional step-and-scan method, its detailed description is omitted. During loading of the substrate P, alignment measurement, and step-and-scan exposure operation, the position of the fine movement stage 38 in the XY plane is appropriately controlled using the substrate interferometer system described above.

  According to the substrate stage apparatus 20 according to the first embodiment described above, the fine movement stage 38 (substrate stage 30) that holds the substrate P, and the X bar mirror 64x used to obtain positional information of the substrate P in the horizontal plane. , Y bar mirror 64y (X mirror stage 60x, Y mirror stage 60y) is arranged separately, so the fine movement stage 38 is lighter than the case where the bar mirror for the interferometer system is fixed to the fine movement stage 38 can do. Further, the weight balance of the fine movement stage 38 is improved. Therefore, the position controllability of the substrate P is improved, and high-precision exposure processing can be performed.

  Further, since the X mirror stage 60x and the Y mirror stage 60y are separated from the fine movement stage 38, the thermal balance of the substrate stage apparatus 20 is improved. As a result, for example, deformation of the X bar mirror 64x and the Y bar mirror 64y due to the generation of a bimetal effect or temperature distribution (temperature gradient) is suppressed. Therefore, high-precision positioning control of the substrate P can be performed for a long time using the interferometer system.

  Note that the configuration of the substrate stage apparatus 20 of the first embodiment can be changed as appropriate. For example, as in the substrate stage apparatus 120 shown in FIG. 5B, an X voice coil motor 66x that applies thrust in the X-axis direction to the Y mirror stage 60y is placed on the −X side of the Y mirror stage 60y, and the X mirror stage. A Y voice coil motor 66y that applies thrust in the Y-axis direction to 60x may be additionally arranged on the -Y side of the X mirror stage 60x. In addition, a pair of X voice coil motors 50x for applying thrust in the X-axis direction to the substrate table 40 are provided on the -X side of the substrate table 40, and a Y voice coil motor 50y for applying thrust in the Y-axis direction to the substrate table 40 is provided on the substrate table. A pair of 40 may be additionally arranged on the −Y side. In this case, the thermal balance of the substrate stage apparatus 120 can be further improved.

  Further, in the first embodiment, as shown in FIG. 7A, the length measurement beam from the X laser interferometer 58x is disposed at substantially the same height position on one surface and the other surface of the X bar mirror 64x, and Although the measurement beam from the X displacement meter 70x is irradiated, the position of the reflection surface is not limited to this. For example, as shown in FIG. 7B, another flat mirror 65a having a reflective surface on the + X side surface is fixed to the −X side surface of the X bar mirror 164x, and the length measurement from the X displacement meter 70x is performed. The flat mirror 65a may be irradiated with the beam through the through-hole 65b formed in the X-bar mirror 164x. In this case, the X position of the reflection surface of the X bar mirror 164x that reflects the measurement beam from the X laser interferometer 58x and the X position of the reflection surface of the plane mirror 65a that reflects the measurement beam from the X displacement meter 70x are as follows. Therefore, when determining the position of the substrate holder 42 (see FIG. 4), there is no need to consider the size (thickness) of the X bar mirror 164x in the X axis direction, and the X bar mirror 164x is deformed by heat, for example. However, the measurement accuracy is not affected. Further, as shown in FIG. 7C, another flat mirror 65c having a reflection surface on the + X side surface is fixed to the upper surface of the X bar mirror 64x, and the length measurement beam from the X displacement meter 70x is converted into the flat mirror 65c. May be irradiated. Also in this case, even if the X bar mirror 64x changes due to heat, for example, the measurement accuracy is not affected. The plane mirrors 65a and 65c only need to be arranged at a position where the length measurement beam from the pair of X displacement meters 70x is irradiated, and are not bar mirrors (in other words, long mirrors) like the X bar mirror 164x. May be. The modifications shown in FIGS. 7B and 7C can be applied to the Y bar mirror 64y (see FIG. 1).

  In the X mirror stage 60x and the Y mirror stage 60y, the base member 62 and the mirror support member 63 (portions excluding the X bar mirror 64x and the Y bar mirror 64y) may be formed solid or hollow. In the case of being hollow, a stiffening rib or the like may be disposed inside. Further, like the substrate stage apparatus 220 shown in FIG. 8, the X mirror stage 260x and the Y mirror stage 260y are made of rod-shaped members formed of a material that is less stretched by the influence of heat (for example, CFRP (Carbon Fiber Reinforced Plastics)). It is good also as a truss structure which combined two or more. From the viewpoint of avoiding complications in the drawing, in FIG. 8, the weight cancellation device 36 and a plurality of voice coil motors constituting the fine movement stage drive system are not shown.

<< Second Embodiment >>
Next, a liquid crystal exposure apparatus according to the second embodiment and its modification will be described with reference to FIGS. Since the configuration of the liquid crystal exposure apparatus according to the second embodiment is the same as that of the first embodiment except that a part of the configuration of the substrate stage apparatus 80 is different, only the differences will be described below. Elements having the same configuration and function as those of the first embodiment are denoted by the same reference numerals as those of the first embodiment, and description thereof is omitted.

  In the first embodiment, each of the Y mirror stage 60y and the X mirror stage 60x is placed on the surface plate 22 together with the weight canceling device 36 (see FIGS. 2 and 3, respectively). In the second embodiment, as shown in FIGS. 9 and 10, the weight canceling device 36 (not shown in FIG. 9) and the X mirror stage 60x are placed on the first step surface plate 96, and the Y mirror stage. The difference is that 60y is placed on the second step surface plate 98. Further, in the first embodiment, the Y coarse movement stage 34 is placed on the X coarse movement stage 32 (see FIG. 2 respectively), whereas in the second embodiment, it is shown in FIG. As described above, the X coarse movement stage 94 is placed on the Y coarse movement stage 92.

  As shown in FIG. 9, the substrate stage apparatus 80 includes a pair of base frames 82, a substrate stage 90, a first step surface plate 96, a second step surface plate 98, a Y mirror stage 60y, and an X mirror stage 60x. ing. The base frame 82 is a member having a configuration in which the base frame 24 (see FIG. 2) of the first embodiment is rotated by approximately 90 ° in the θz direction, and extends in the Y-axis direction. It has the same configuration and function as the base frame 24 except that the directional dimension is somewhat shorter. The substrate stage 90 includes a Y coarse movement stage 92, an X coarse movement stage 94, a weight cancellation device 36 (not shown in FIG. 9, refer to FIG. 10), and a fine movement stage 38.

  The Y coarse movement stage 92 is a member configured such that the X coarse movement stage 32 (see FIG. 2) according to the first embodiment is rotated by approximately 90 ° in the θz direction. A pair of X beams 93a is mounted on the base frame 82, and is driven on the pair of base frames 82 with a predetermined long stroke in the Y-axis direction. The X coarse movement stage 94 is a member having substantially the same configuration as the Y coarse movement stage 34 (see FIG. 2) according to the first embodiment, and is placed on the Y coarse movement stage 92. It is driven with a predetermined long stroke in the X-axis direction on 92. Since the drive system and measurement system of the Y coarse movement stage 92 and the X coarse movement stage 94 are the same as those in the first embodiment, description thereof will be omitted. The configurations of the weight cancellation device 36 (see FIG. 10) and the fine movement stage 38 (including the drive system) are also substantially the same as those in the first embodiment, and thus description thereof is omitted.

  The first step surface plate 96 is made of a member having a rectangular YZ section extending in the X-axis direction, and is disposed between the pair of X beams 93a. The dimension in the X-axis direction (longitudinal direction) of the first step surface plate 96 is set to be approximately the same as the dimension in the X-axis direction of the surface plate 22 (see FIG. 2) in the first embodiment. On the other hand, the dimension of the first step surface plate 96 in the Y-axis direction (width direction) is shorter than that of the surface plate 22, and is about the same as the footprint of the weight canceling device 36 (not shown in FIG. 9, see FIG. 10). Is set to As shown in FIG. 10, the first step surface plate 96 includes a Y linear guide 81a fixed to the upper surface of the lower base 18a, and a plurality of (in the depth direction of the drawing) fixed to the lower surface of the first step surface plate 96. It is guided in a straight line in the Y-axis direction via a plurality of Y linear guide devices 81 constituted by a Y slide member 81b.

  Returning to FIG. 9, the first step surface plate 96 is mechanically connected to the pair of X beams 93 a via a plurality of flexures 97, and moves in the Y axis direction integrally with the Y coarse movement stage 92. To do. Since the configuration of the X mirror stage 60x including the drive system and the measurement system is substantially the same as that of the first embodiment, the description thereof is omitted. When the X coarse movement stage 94 moves only in the X-axis direction, the weight cancellation device 36 (see FIG. 10) and the X mirror stage 60x move in the X-axis direction on the stationary first step surface plate 96, When the X coarse movement stage 94 moves in the Y-axis direction (including the case where movement in the X-axis direction is involved), the X coarse movement stage 94 moves in the Y-axis direction together with the first step surface plate 96. Therefore, the X mirror stage 60 x does not fall off from the first step surface plate 96 regardless of the position of the fine movement stage 38.

  Returning to FIG. 9, the second step surface plate 98 is made of a member having a rectangular YZ section extending in the X-axis direction, and is disposed on the -Y side of the -Y side X beam 93a. On the second step surface plate 98, a Y mirror stage 60y is placed. Since the configuration of the Y mirror stage 60y including the drive system and the measurement system is substantially the same as that of the first embodiment, the description thereof is omitted. The dimension of the second step surface plate 98 in the X-axis direction (longitudinal direction) is set shorter than that of the first step surface plate 96, and the vicinity of the end portion on the −X side of the first step surface plate 96 is the second. The step surface plate 98 extends (protrudes) to the −X side from the −X side end. This is because the first step surface plate 96 needs to guide the weight canceling device 36 (see FIG. 10) and the X mirror stage 60x, whereas the second step surface plate 98 only supports the Y mirror stage 60y. This is because it is only necessary to guide. In the first step surface plate 96, the protruding part (the part that guides only the X mirror stage 60x) is more rigid in the Z-axis direction than the other part (the part that needs to guide the weight cancellation device 36). May be low.

  The second step surface plate 98 is mechanically connected to the first step surface plate 96 via a plurality of flexures 99 and moves integrally with the first step surface plate 96 in the Y-axis direction. Accordingly, the Y mirror stage 60y does not fall off the second step surface plate 98 regardless of the position of the fine movement stage 38. The second step surface plate 98 may be connected to the Y coarse movement stage 92. Alternatively, the first step surface plate 96 and the second step surface plate 98 may be arranged separately from the Y coarse movement stage 92, and the Y position may be controlled by an independent drive system (for example, a linear motor). Also in the second embodiment described above, the same effect as in the first embodiment can be obtained.

  Note that the configuration of the substrate stage apparatus 80 of the second embodiment can be changed as appropriate, and can be changed, for example, as shown in FIGS. 11A to 12, the weight cancellation device 36 and the fine movement stage 38 (see FIG. 10 respectively) are omitted. In the modification shown in FIG. 11A, the base portions 362 of the X mirror stage 360x and the Y mirror stage 360y are formed in an inverted U shape in the YZ section. A first step surface plate 96 is inserted between a pair of opposing surfaces of the base portion 362 of the X mirror stage 360x, and a second step surface plate 98 is interposed between the pair of opposing surfaces of the base portion 362 of the Y mirror stage 360y. Has been inserted. An air bearing (not shown) is disposed on each of the pair of opposing surfaces and the ceiling surface of the base portion 362. From the air bearing, the upper surfaces of the first step surface plate 96 and the second step surface plate 98, and both side surfaces. A pressurized gas is ejected onto the first step surface plate 96 and the Y mirror stage 360y is placed on the second step surface plate 98 in a non-contact manner by the static pressure of the pressurized gas. Is placed. The X mirror stage 360x is restricted from moving relative to the first step surface plate 96 in the Y-axis direction by the action of the base portion 362, and the Y mirror stage 360y is moved relative to the second step surface plate 98 by the action of the base portion 362. The relative movement in the Y-axis direction is limited. Therefore, by moving the first step surface plate 96 and the second step surface plate 98 in the Y-axis direction, the X mirror stage 360x and the Y mirror stage 360y can be moved in the Y-axis direction. The actuator for driving the 360x, Y mirror stage 360y in the Y-axis direction (corresponding to the Y voice coil motor 66y (see FIG. 5A) of the first and second embodiments) is not necessary.

  Further, as in the modification example shown in FIG. 11B, the dimension (height) of the second step surface plate 498 in the Z-axis direction is made larger (higher) than that in the modification example shown in FIG. May be. In this case, the Z-axis direction dimension of the mirror support member 463 of the Y mirror stage 460y is shortened, and the Z position of the center of gravity Gmy of the Y mirror stage 460y is lowered (the center of gravity Gmy is within the base portion 462). Therefore, when the Y mirror stage 460y is moved in the Y-axis direction using the second step surface plate 498, the pitching moment acting on the Y mirror stage 460y can be reduced (note that the X mirror stage 360x has a slight angle in the θx direction). The rotation does not affect the measurement accuracy of the X position of the X mirror stage 360x).

  Further, as in the modification shown in FIGS. 12 and 13, each of the X mirror stage 60x and the Y mirror stage 60y is set to the X coarse movement stage 94 (for convenience, the same reference numerals as those in the second embodiment are used). Alternatively, they may be connected via a plurality of flexures 84 in a state of being mechanically separated and vibrationally separated in a direction intersecting the XY plane. As the flexure 84, a flexure having the same configuration as that of the flexure 49 (see FIG. 5A) for connecting the Y coarse movement stage 34 and the weight cancellation device 36 may be used. The plurality of flexures 84 has an X coarse movement stage via a column 85 such that the Z position substantially coincides with the Z position of the center of gravity height Gmx, Gmy (see FIG. 1 respectively) of the X mirror stage 60x and the Y mirror stage 60y. One end is attached to 94. Although not shown in FIG. 13, a flexure for pulling the Y mirror stage 60y in the Y-axis direction and a flexure for pulling the X mirror stage 60x in the X-axis direction include an X bar mirror 64x and a Y bar mirror 64y. It is arranged on the back side of the paper. In this case, since each of the X mirror stage 60x and the Y mirror stage 60y is pulled by the X coarse movement stage 94 via the flexure 84, an actuator for driving the X mirror stage 60x and the Y mirror stage 60y (the above-described first). The Y voice coil motors 66x and 66y (refer to FIG. 5A) of the first and second embodiments are not necessary. Therefore, the structure is simplified and the cost can be reduced. Further, since a voice coil motor as a heat source is not required, thermal deformation of the X bar mirror 64x and the Y bar mirror 64y can be suppressed.

  In addition, as a modification of the second embodiment, although not shown, a pair of X beams 93a are arranged apart from FIG. 9, and a first step surface plate is provided between the pair of X beams 93a. 96 and the second step surface plate 98 (or one step surface plate on which both the X mirror stage 60x and the Y mirror stage 60y are mounted) may be disposed.

<< Third Embodiment >>
Next, a liquid crystal exposure apparatus according to a third embodiment will be described with reference to FIG. The configuration of the liquid crystal exposure apparatus according to the third embodiment is the same as that of the first or second embodiment except that the configuration of a part of the position measurement system of the fine movement stage 38 is different. Only the points will be described, and elements having the same configurations and functions as those of the first or second embodiment are denoted by the same reference numerals as those of the first or second embodiment, and description thereof will be omitted.

  As described above, in the first embodiment, regarding the fine movement stage 38 and the X mirror stage 60x, the relative position information in the X-axis direction is obtained by the X displacement meter 70x, and the relative position information in the Y-axis direction is the displacement. Obtained indirectly by the sensor 68a via the Y coarse movement stage 34 (see FIG. 1 respectively). However, a displacement sensor for obtaining relative position information of the Y coarse movement stage 34 and the X mirror stage 60x in the Y-axis direction. 68a is not shown). In contrast, in the third embodiment, as shown in FIG. 14, XY2 including a reflective Y scale 72 included in the X mirror stage 60 x and a YX two-dimensional encoder head 74 fixed to the substrate holder 42. The relative position information of the substrate holder 42 and the X mirror stage 60x in the X axis direction and the Y axis direction is directly obtained by the dimension encoder system. Although not shown, the substrate holder 42 and the Y mirror stage 60y are formed by an XY two-dimensional encoder system including a reflective X scale of the Y mirror stage 60y and an XY two-dimensional encoder head fixed to the substrate holder 42. Relative position information in the X-axis direction and the Y-axis direction is obtained.

  The Y scale 72 is fixed to the + X side surface of the X bar mirror 64x. The surface (+ X side surface) of the Y scale 72 is a reflecting surface, and a diffraction grating having a periodic direction in the Y-axis direction is formed. The YX two-dimensional encoder head 74 is configured in the same manner as the encoder head disclosed in, for example, US Pat. No. 7,561,280, and the XY two-dimensional encoder system is configured by the Y scale 72 and the YX two-dimensional encoder head 74. Is configured. Here, instead of the two-dimensional encoder head 74, a combination of two one-dimensional encoder heads may be used as an encoder head for XY two-dimensional measurement. Although not shown, a diffraction grating having a periodic direction in the X-axis direction is formed on the X scale of the Y mirror stage 60y. From the viewpoint of avoiding complication of the drawings, the weight canceling device 36 and a plurality of voice coil motors constituting the fine movement stage drive system are not shown in FIG.

  According to the third embodiment, the relative position information in the XY plane with respect to the substrate holder 42, the X mirror stage 60x, and the Y mirror stage 60y is directly obtained by the XY two-dimensional encoder system. The displacement sensor 68a (see FIG. 1) as in the first embodiment is not necessary, and the apparatus configuration is simplified.

  In the third embodiment, the position information of the fine movement stage 38 in the Z / tilt direction is a plurality of Z sensors 52 (not shown in FIG. 14, not shown) as in the first and second embodiments. 15), as in the modification shown in FIG. 15, the substrate is formed using the two-dimensional scale 72a of the X mirror stage 60x and the Y mirror stage 60y (not shown in FIG. 15, see FIG. 14). It may be obtained by at least three two-dimensional encoder heads 74a (only one is shown in FIG. 15) fixed to the holder.

  In the modification shown in FIG. 15, a two-dimensional diffraction grating (Y / Z two-dimensional scale) having the Y-axis and Z-axis directions as periodic directions is formed on the + X side surface of the X-bar mirror 64x of the X mirror stage 60x. A reflection type two-dimensional scale 72a is attached. Although not shown, the reflective two-dimensional scale attached to the + Y side surface of the Y bar mirror 64y (respectively see FIG. 14) of the Y mirror stage 60y includes the X-axis and Z-axis directions in the periodic direction. A two-dimensional diffraction grating (X / Z two-dimensional scale) is formed. A pair of three-dimensional encoder heads 74a is fixed to the end portion on the −X side of the substrate holder 42 so as to face the two-dimensional scale 72 (one is not shown in FIG. 15). . Although not shown, similarly, a pair of three-dimensional encoder heads are fixed at the −Y side end of the substrate holder 42 so as to face the X / Z two-dimensional scale and are spaced apart in the X-axis direction. .

  When the fine movement stage 38 is driven in the Z / tilt direction by the plurality of Z voice coil motors 50z, the main controller (not shown) is based on the outputs of the plurality (at least three) of the three-dimensional encoder heads 74a. A displacement amount in the Z / tilt direction of the substrate holder 42 with respect to the X mirror stage 60x and the Y mirror stage 60y is obtained. Further, the main control device fixes the X axis and the Y axis of the substrate holder 42 with respect to the X mirror stage 60x based on outputs of, for example, two three-dimensional encoder heads 74a fixed to the −X side end of the substrate holder 42. Find the relative displacement in the direction. Similarly, the main controller controls the Y mirror stage 60y (not shown in FIG. 15, not shown in FIG. 14) based on outputs of, for example, two three-dimensional encoder heads fixed to the −Y side end of the substrate holder 42. The relative displacement amount of the substrate holder 42 in the X-axis and Y-axis directions is obtained. As described above, since the Z / tilt position information of the fine movement stage 38 is obtained by using the X mirror stage 60x and the Y mirror stage 60y, a plurality of Z sensors 52 as in the second embodiment (see FIG. 10). Is eliminated, and the fine movement stage 38 is reduced in weight. Instead of the three-dimensional encoder head 74a, a combination of three one-dimensional encoder heads may be used as an encoder head for three-dimensional measurement. Similarly, a combination of three one-dimensional encoder heads can be used as the three-dimensional encoder head fixed to the −Y side end of the substrate holder 42.

  In addition, the structure demonstrated in the 1st-3rd embodiment demonstrated above can be changed suitably. For example, in the first to third embodiments, in order to obtain the position information of the fine movement stage 38 in the biaxial directions orthogonal to each other, the X mirror stage 60x for measuring the X position information and the Y mirror stage for measuring the Y position information. However, the present invention is not limited to this. For example, the X position information of the fine movement stage 38 is obtained using the X mirror stage 60x as in the first to third embodiments, and the Y position of the fine movement stage 38 is obtained. The information may be obtained using a bar mirror fixed to fine movement stage 38 as in the conventional optical interferometer system (Y position information is obtained using Y mirror stage 60y, and X position information is obtained on fine movement stage 38). It may be obtained using a fixed bar mirror).

  In addition, the X voice coil motor 66x for driving the X mirror stage 60x and the Y mirror stage 60y in the X axis direction and the Y voice coil motor 66y for driving in the Y axis direction are individually arranged. For example, the X mirror stage 60x and the Y mirror stage 60y may be driven along the XY plane by an XY2 degree-of-freedom motor.

  The position information measurement target by the laser interferometer system is the fine movement stage 38 that holds the substrate P. However, the measurement object is not limited to this. For example, the mask stage 14, the X coarse movement stage 32, the Y coarse movement stage 34, and the like. Other moving bodies may also be used.

  Further, an X displacement meter 70x is provided on the X mirror stage 60x, and a Y displacement meter 70y is provided on the Y mirror stage 60y. A reflection surface corresponding to the X displacement meter 70x and the Y displacement meter 70y is provided on the substrate holder 42. Also good.

  Further, the X coarse movement stage 32 in the first embodiment and the Y coarse movement stage 92 in the second and third embodiments have a pair of beam-like members. It may be a plate-like member in which a long hole extending in the direction is formed. Further, the weight cancellation device 36 is disposed so as to be relatively movable in a direction parallel to the XY plane with respect to the fine movement stage 38, but is not limited thereto, and may be integrated with the fine movement stage 38. In this case, the flexure 49 for pulling the weight cancellation device 36 is not necessary. Further, the substrate holder 42 may be provided with a groove for accommodating a member for transporting a substrate (referred to as a substrate tray or the like), a lift pin for separating the substrate P from the substrate holder 42, or the like. The fine movement stage 38 may not have the substrate table 40.

The illumination light may be ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F ₂ laser light (wavelength 157 nm). As the illumination light, for example, a single wavelength laser beam oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium). In addition, harmonics converted into ultraviolet light using a nonlinear optical crystal may be used. A solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

  Although the case where the projection optical system 16 is a multi-lens projection optical system including a plurality of optical systems has been described, the number of projection optical systems is not limited to this, and one or more projection optical systems may be used. The projection optical system is not limited to a multi-lens projection optical system, and may be a projection optical system using an Offner type large mirror. Further, the projection optical system 16 may be an enlargement system or a reduction system.

  Further, the use of the exposure apparatus is not limited to the exposure apparatus for liquid crystal that transfers the liquid crystal display element pattern onto the square glass plate. For example, the exposure apparatus for manufacturing an organic EL (Electro-Luminescence) panel, the semiconductor manufacture The present invention can also be widely applied to an exposure apparatus for manufacturing an exposure apparatus, a thin film magnetic head, a micromachine, a DNA chip, and the like. Moreover, in order to manufacture not only microdevices such as semiconductor elements but also masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, etc., glass substrates, silicon wafers, etc. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern.

  The object to be exposed is not limited to a glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or mask blanks. Moreover, when the exposure target is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and includes, for example, a film-like (flexible sheet-like member). The exposure apparatus of the present embodiment is particularly effective when a substrate having a side length or diagonal length of 500 mm or more is an exposure target.

  For electronic devices such as liquid crystal display elements (or semiconductor elements), the step of designing the function and performance of the device, the step of producing a mask (or reticle) based on this design step, and the step of producing a glass substrate (or wafer) A lithography step for transferring a mask (reticle) pattern to a glass substrate by the exposure apparatus and the exposure method of each embodiment described above, a development step for developing the exposed glass substrate, and a portion where the resist remains. It is manufactured through an etching step for removing the exposed member of the portion by etching, a resist removing step for removing a resist that has become unnecessary after etching, a device assembly step, an inspection step, and the like. In this case, in the lithography step, the above-described exposure method is executed using the exposure apparatus of the above embodiment, and a device pattern is formed on the glass substrate. Therefore, a highly integrated device can be manufactured with high productivity. .

  As described above, the moving body device of the present invention is suitable for driving the moving body along a predetermined two-dimensional plane. The exposure apparatus of the present invention is suitable for forming a predetermined pattern on an object. Moreover, the manufacturing method of the flat panel display of this invention is suitable for production of a flat panel display. The device manufacturing method of the present invention is suitable for the production of micro devices.

  DESCRIPTION OF SYMBOLS 10 ... Liquid crystal exposure apparatus, 20 ... Substrate stage apparatus, 30 ... Substrate stage, 38 ... Fine movement stage, 42 ... Substrate holder, 58x ... X laser interferometer, 58y ... Y laser interferometer, 60x ... X mirror stage, 60y ... Y Mirror stage, 70x ... X displacement meter, 70y ... Y displacement meter, P ... substrate.

Claims (18)

A first moving body movable along at least the first direction in a predetermined two-dimensional plane including first and second directions orthogonal to each other;
A second moving body provided separately from the first moving body and movable along at least the first direction;
An output of a laser interferometer system for obtaining position information of the second moving body in the first direction using a reflecting surface provided on the second moving body; and the output of the first moving body and the second moving body. And a measurement system for obtaining position information of the first moving body in the first direction based on an output of a displacement amount sensor for obtaining displacement amount information along the first direction.   The mobile device according to claim 1, wherein the second mobile body has a thermally symmetric structure with respect to the second direction.   The mobile device according to claim 1, wherein the interferometer system and the displacement sensor have substantially the same resolution.   The mobile device according to claim 1, wherein a resolution of the displacement sensor is higher than a resolution of the interferometer system.   The displacement amount sensor is provided in the first moving body, and along the first direction between the first moving body and the second moving body using a measurement surface provided in the second moving body. The mobile device according to claim 1, wherein the displacement amount information is obtained.   The mobile device according to claim 5, wherein the measurement surface and the reflection surface have the same position in the first direction. A plurality of the displacement amount sensors are provided along the second direction,
The measurement system obtains rotation amount information about an axis orthogonal to the two-dimensional plane of the first moving body based on outputs of the displacement amount sensors at at least two points separated from each other along the second direction. The mobile body apparatus as described in any one of Claims 1-6. A third moving body that is movable in at least the first direction;
A position along the first direction of the first moving body is controlled by a first linear motor in which a stator is provided in the third moving body and a mover is provided in the first moving body. The position of the second moving body in the first direction is controlled by a second linear motor in which a stator is provided in the third moving body and a mover is provided in the second moving body. The moving body device according to claim 1, wherein the first and second moving bodies are driven along the first direction in synchronization. A third moving body that is movable in at least the first direction;
The second moving body is mechanically connected via a predetermined connecting member in a state of being vibrationally separated from the third moving body in a direction intersecting at least the two-dimensional plane, and the connecting member The moving body apparatus according to claim 1, wherein the moving body apparatus moves in the first direction integrally with the third moving body via a gap.   The said displacement amount sensor can further obtain | require the relative displacement amount along the said 2nd direction of a said 1st moving body and a said 2nd moving body. Mobile device.   The displacement amount sensor can further determine a relative movement amount in a direction orthogonal to the two-dimensional plane between the first moving body and the second moving body. The mobile device described. The first and second moving bodies are movably provided along the first and second directions;
A fourth moving body that is provided separately from the first moving body and is movable along the first and second directions;
The measurement system is
An output of a laser interferometer system for obtaining position information of the fourth moving body in the second direction using a reflecting surface provided on the fourth moving body; and the output of the first moving body and the fourth moving body. The position information of the second direction of the first moving body is obtained based on the output of a displacement amount sensor that obtains displacement amount information along the second direction. The mobile device described. A first guide member extending along the first direction and movable in the two directions in synchronization with the first moving body;
A second guide member extending along the first direction and movable in the two directions in synchronization with the first moving body;
The moving body apparatus according to claim 12, wherein the first and second moving bodies are placed on the first guide member, and the fourth moving body is placed on the second guide member. The moving body device according to any one of claims 1 to 13, wherein a predetermined object is held on the first moving body.
An exposure apparatus comprising: a pattern forming apparatus that forms a predetermined pattern on the object using an energy beam.   The exposure apparatus according to claim 14, wherein the object is a substrate used for a flat panel display.   The exposure apparatus according to claim 15, wherein the substrate has a length of at least one side or a diagonal length of 500 mm or more. Exposing the object using the exposure apparatus according to claim 15 or 16,
Developing the exposed object. A method of manufacturing a flat panel display. Exposing the object using the exposure apparatus of claim 14;
Developing the exposed object.

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