JP2016016641A - Laminate having functionality - Google Patents
Laminate having functionality Download PDFInfo
- Publication number
- JP2016016641A JP2016016641A JP2014142562A JP2014142562A JP2016016641A JP 2016016641 A JP2016016641 A JP 2016016641A JP 2014142562 A JP2014142562 A JP 2014142562A JP 2014142562 A JP2014142562 A JP 2014142562A JP 2016016641 A JP2016016641 A JP 2016016641A
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- group
- och
- metal
- compound
- organic
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- -1 salt compound Chemical class 0.000 claims abstract description 140
- 229910052751 metal Inorganic materials 0.000 claims abstract description 93
- 239000002184 metal Substances 0.000 claims abstract description 93
- 150000001875 compounds Chemical class 0.000 claims abstract description 67
- 150000002736 metal compounds Chemical class 0.000 claims abstract description 54
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 53
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 49
- 239000002131 composite material Substances 0.000 claims abstract description 38
- 239000010409 thin film Substances 0.000 claims abstract description 37
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 239000004094 surface-active agent Substances 0.000 claims abstract description 24
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 16
- 150000007524 organic acids Chemical class 0.000 claims abstract description 16
- 125000000962 organic group Chemical group 0.000 claims abstract description 12
- 150000008282 halocarbons Chemical group 0.000 claims description 15
- 125000001424 substituent group Chemical group 0.000 claims description 15
- 125000005647 linker group Chemical group 0.000 claims description 12
- 229910052719 titanium Inorganic materials 0.000 claims description 12
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 125000004429 atom Chemical group 0.000 claims description 10
- 230000003301 hydrolyzing effect Effects 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000007787 solid Substances 0.000 claims description 8
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical group [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 7
- 229910052726 zirconium Inorganic materials 0.000 claims description 7
- 229910052732 germanium Inorganic materials 0.000 claims description 6
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 6
- 238000009832 plasma treatment Methods 0.000 claims description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 5
- 229910052718 tin Inorganic materials 0.000 claims description 5
- 239000007859 condensation product Substances 0.000 claims description 3
- 108010009736 Protein Hydrolysates Proteins 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 230000007062 hydrolysis Effects 0.000 abstract description 28
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 28
- 150000003961 organosilicon compounds Chemical class 0.000 abstract description 24
- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 description 36
- 239000010410 layer Substances 0.000 description 36
- 125000000217 alkyl group Chemical group 0.000 description 34
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 32
- 150000002430 hydrocarbons Chemical group 0.000 description 29
- 150000004703 alkoxides Chemical class 0.000 description 25
- 238000000034 method Methods 0.000 description 22
- 239000002585 base Substances 0.000 description 21
- 239000010408 film Substances 0.000 description 19
- 239000000463 material Substances 0.000 description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 17
- 239000000047 product Substances 0.000 description 17
- 125000001153 fluoro group Chemical group F* 0.000 description 16
- 229920000642 polymer Polymers 0.000 description 15
- 125000003545 alkoxy group Chemical group 0.000 description 14
- 125000003118 aryl group Chemical group 0.000 description 14
- 239000010936 titanium Substances 0.000 description 14
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 12
- 125000003342 alkenyl group Chemical group 0.000 description 11
- 229910052731 fluorine Inorganic materials 0.000 description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 10
- 229910000077 silane Inorganic materials 0.000 description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 9
- 239000002253 acid Substances 0.000 description 9
- 125000005843 halogen group Chemical group 0.000 description 9
- 229910000000 metal hydroxide Inorganic materials 0.000 description 9
- 150000004692 metal hydroxides Chemical class 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 8
- 125000004423 acyloxy group Chemical group 0.000 description 8
- 150000001721 carbon Chemical group 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 239000003960 organic solvent Substances 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
- 125000000524 functional group Chemical group 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- 229930195733 hydrocarbon Natural products 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 5
- 239000004215 Carbon black (E152) Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 5
- 239000013522 chelant Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
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- 239000008199 coating composition Substances 0.000 description 5
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- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 239000011133 lead Substances 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 239000000049 pigment Substances 0.000 description 5
- 239000011701 zinc Substances 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 125000001309 chloro group Chemical group Cl* 0.000 description 4
- 239000008119 colloidal silica Substances 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 239000000123 paper Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 235000011054 acetic acid Nutrition 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000000304 alkynyl group Chemical group 0.000 description 3
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- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
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- 239000003054 catalyst Substances 0.000 description 3
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- 125000000392 cycloalkenyl group Chemical group 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
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- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 3
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 3
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 3
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- DVQHRBFGRZHMSR-UHFFFAOYSA-N sodium methyl 2,2-dimethyl-4,6-dioxo-5-(N-prop-2-enoxy-C-propylcarbonimidoyl)cyclohexane-1-carboxylate Chemical compound [Na+].C=CCON=C(CCC)[C-]1C(=O)CC(C)(C)C(C(=O)OC)C1=O DVQHRBFGRZHMSR-UHFFFAOYSA-N 0.000 description 3
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- 125000004191 (C1-C6) alkoxy group Chemical group 0.000 description 2
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- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 2
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- 125000004183 alkoxy alkyl group Chemical group 0.000 description 2
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- IRERQBUNZFJFGC-UHFFFAOYSA-L azure blue Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[Al+3].[S-]S[S-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-].[O-][Si]([O-])([O-])[O-] IRERQBUNZFJFGC-UHFFFAOYSA-L 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
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- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- 125000001298 n-hexoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004923 naphthylmethyl group Chemical group C1(=CC=CC2=CC=CC=C12)C* 0.000 description 1
- 125000005186 naphthyloxy group Chemical group C1(=CC=CC2=CC=CC=C12)O* 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- 229960003512 nicotinic acid Drugs 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 125000005295 norbornyloxy group Chemical group C12(CCC(CC1)C2)O* 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000012860 organic pigment Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- VASIZKWUTCETSD-UHFFFAOYSA-N oxomanganese Chemical compound [Mn]=O VASIZKWUTCETSD-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002958 pentadecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 125000004226 phenanthren-1-yl group Chemical group [H]C1=C([H])C([H])=C2C(C([H])=C([H])C3=C(*)C([H])=C([H])C([H])=C23)=C1[H] 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000002094 self assembled monolayer Substances 0.000 description 1
- 239000013545 self-assembled monolayer Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VUEONHALRNZYJM-UHFFFAOYSA-N silanetetramine Chemical compound N[Si](N)(N)N VUEONHALRNZYJM-UHFFFAOYSA-N 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- NVKTUNLPFJHLCG-UHFFFAOYSA-N strontium chromate Chemical compound [Sr+2].[O-][Cr]([O-])(=O)=O NVKTUNLPFJHLCG-UHFFFAOYSA-N 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- JKUYRAMKJLMYLO-UHFFFAOYSA-N tert-butyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OC(C)(C)C JKUYRAMKJLMYLO-UHFFFAOYSA-N 0.000 description 1
- BINKQJJWJHNOSQ-UHFFFAOYSA-N tetrabenzyl silicate Chemical compound C=1C=CC=CC=1CO[Si](OCC=1C=CC=CC=1)(OCC=1C=CC=CC=1)OCC1=CC=CC=C1 BINKQJJWJHNOSQ-UHFFFAOYSA-N 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- MMMQFRSATQXBFD-UHFFFAOYSA-N tetrakis(2-ethenoxybutyl) silicate Chemical compound C=COC(CC)CO[Si](OCC(CC)OC=C)(OCC(CC)OC=C)OCC(CC)OC=C MMMQFRSATQXBFD-UHFFFAOYSA-N 0.000 description 1
- GYFCHQAEKLEPAD-UHFFFAOYSA-N tetrakis(2-ethenoxyethyl) silicate Chemical compound C=COCCO[Si](OCCOC=C)(OCCOC=C)OCCOC=C GYFCHQAEKLEPAD-UHFFFAOYSA-N 0.000 description 1
- 125000005329 tetralinyl group Chemical group C1(CCCC2=CC=CC=C12)* 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ADLSSRLDGACTEX-UHFFFAOYSA-N tetraphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 ADLSSRLDGACTEX-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- QERYCTSHXKAMIS-UHFFFAOYSA-N thiophene-2-carboxylic acid Chemical compound OC(=O)C1=CC=CS1 QERYCTSHXKAMIS-UHFFFAOYSA-N 0.000 description 1
- LLZRNZOLAXHGLL-UHFFFAOYSA-J titanic acid Chemical class O[Ti](O)(O)O LLZRNZOLAXHGLL-UHFFFAOYSA-J 0.000 description 1
- 235000010215 titanium dioxide Nutrition 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- YZVRVDPMGYFCGL-UHFFFAOYSA-N triacetyloxysilyl acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)OC(C)=O YZVRVDPMGYFCGL-UHFFFAOYSA-N 0.000 description 1
- SGCFZHOZKKQIBU-UHFFFAOYSA-N tributoxy(ethenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C=C SGCFZHOZKKQIBU-UHFFFAOYSA-N 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- SBAXSWADRHOJCX-UHFFFAOYSA-N trimethoxy(oxan-2-yl)silane Chemical compound CO[Si](OC)(OC)C1CCCCO1 SBAXSWADRHOJCX-UHFFFAOYSA-N 0.000 description 1
- WREJUSSMWRBOJJ-UHFFFAOYSA-N trimethoxy(oxan-4-yl)silane Chemical compound CO[Si](OC)(OC)C1CCOCC1 WREJUSSMWRBOJJ-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 235000013311 vegetables Nutrition 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- NDKWCCLKSWNDBG-UHFFFAOYSA-N zinc;dioxido(dioxo)chromium Chemical compound [Zn+2].[O-][Cr]([O-])(=O)=O NDKWCCLKSWNDBG-UHFFFAOYSA-N 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Laminated Bodies (AREA)
- Silicon Polymers (AREA)
Abstract
Description
本発明は、機能性を有する積層体、特に、基材上に下地膜を介して設けた金属界面活性剤の加水分解縮合物を含有する層を有する積層体に関する。 The present invention relates to a functional laminate, and more particularly to a laminate having a layer containing a hydrolytic condensate of a metal surfactant provided on a base material via a base film.
従来より、金属、セラミック、ガラス、プラスチック、繊維、紙、木材等の表面を撥水撥油化させる方法として、それらの基材表面に自己組織化膜を形成する方法が検討されてきた(特許文献1)。これらの膜は基材表面の水酸基やイミノ基あるいはカルボキシル基と反応して、−SiO−または−SiN<結合を介して基材表面に化学結合した状態で形成されるため、表面に水酸基などの官能基を有する基材を用いる場合は、基材上に自己組織化膜を形成することが容易であった。しかし、樹脂や酸化し難い金属のような基材上に自己組織化膜を形成することは困難であった。
また、基材上に、第1層、第2層の順に形成された薄層積層体において、第1層が、a)式(I)RnSiX4−n(I)(式中、Rは、Siに炭素原子が直接結合した有機基を表し、Xは水酸基又は加水分解性基を表す。)で表される有機ケイ素化合物の縮合物、b)熱硬化性化合物の硬化物を含有する有機無機複合膜であって、第2層が、金属界面活性剤の加水分解縮合物である自己組織化膜を含有する層である薄層積層体が知られている(特許文献2)。このような構造にすることにより、基材との密着性に優れ、硬度、耐溶剤性、潤滑性、すべり性、低摩擦性などの機能に優れた成形体を比較的簡易な構造で提供することができることが記載されている。
また、上記と同様の式(I)で表される有機ケイ素化合物の縮合物、b)金属キレート化合物、金属有機酸塩化合物、2以上の水酸基若しくは加水分解性基を有する金属化合物、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも1種の350nm以下は波長の光に感応する光感応性化合物及び/又はそれから誘導される化合物、及びc)紫外線硬化性化合物の硬化物を含有する有機無機複合体が知られており、それら表面をシランカップリング剤にて表面処理して、表面を撥水撥油性に変えることできることが記載されている(特許文献3)。
Conventionally, a method of forming a self-assembled film on the surface of a base material has been studied as a method for making the surface of metal, ceramic, glass, plastic, fiber, paper, wood, etc. water and oil repellent (patents). Reference 1). Since these films react with hydroxyl groups, imino groups or carboxyl groups on the substrate surface and are chemically bonded to the substrate surface via —SiO— or —SiN <bond, When using a base material having a functional group, it was easy to form a self-assembled film on the base material. However, it has been difficult to form a self-assembled film on a substrate such as a resin or a metal that is difficult to oxidize.
Further, on the substrate, the first layer, in order to form a thin layer laminate of the second layer, the first layer, a) Formula (I) R n SiX 4- n (I) ( wherein, R Represents an organic group in which a carbon atom is directly bonded to Si, X represents a hydroxyl group or a hydrolyzable group, and a condensate of an organosilicon compound represented by b) and a cured product of a thermosetting compound. There is known a thin-layer laminate in which the second layer is a layer containing a self-assembled film that is a hydrolytic condensate of a metal surfactant (Patent Document 2). By adopting such a structure, a molded body having excellent functions such as hardness, solvent resistance, lubricity, slipperiness, low friction and the like is provided with a relatively simple structure. It is described that it can be.
Also, condensates of organosilicon compounds represented by the formula (I) as described above, b) metal chelate compounds, metal organic acid salt compounds, metal compounds having two or more hydroxyl groups or hydrolyzable groups, their hydrolysates A photo-sensitive compound and / or a compound derived therefrom that is sensitive to light having a wavelength of at least 350 nm selected from the group consisting of a decomposed product and a condensate thereof; and c) a cured product of an ultraviolet curable compound. An organic-inorganic composite containing benzene is known, and it is described that the surface can be surface-treated with a silane coupling agent to change the surface to water / oil repellency (Patent Document 3).
しかし、上記したいずれの積層体も、例えば、表面に凹凸がある基材の表面に撥水撥油性の膜を形成するためのプライマー層として応用した場合に、必ずしも、満足のいく機能性が得られないという問題があった。
本発明は上記事情に鑑みてなされたものであり、実用可能な機能性を有する積層体を提供することを課題とする。
However, any of the above-described laminates does not necessarily provide satisfactory functionality when applied as a primer layer for forming a water- and oil-repellent film on the surface of a substrate having uneven surfaces, for example. There was a problem that it was not possible.
This invention is made | formed in view of the said situation, and makes it a subject to provide the laminated body which has a practical function.
本発明者らは、上記課題に取り組み、鋭意研究した結果、有機ケイ素化合物及び/又はその縮合物と、金属キレート化合物または配位化合物等、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも一種の化合物を含有する有機無機複合薄膜形成用溶液を用いて基材上に下地膜を形成することで、より緻密な自己組織化単分子膜を形成することができ、実用可能な性能を有する積層体を得ることができることを見出し、本発明を完成するに至った。 As a result of tackling the above problems and earnestly studying the present inventors, the group consisting of an organosilicon compound and / or a condensate thereof, a metal chelate compound or a coordination compound and the like, a hydrolyzate thereof, and a condensate thereof. By forming a base film on a substrate using an organic / inorganic composite thin film forming solution containing at least one compound selected from the above, a denser self-assembled monolayer can be formed and is practical. The present inventors have found that a laminate having excellent performance can be obtained and have completed the present invention.
すなわち、本発明は、
(1)基材上に、第1層、第2層の順に形成された積層体において、
第1層が、式(I)
RnSiX4−n・・・(I)
(式中、Rは、式中のSiに炭素原子が直接結合するような有機基を表し、Xは、水酸基又は加水分解性基を表す。nは1又は2を表し、nが2のとき、Rは同一であっても異なっていてもよく、(4−n)が2以上のとき、Xは同一であっても異なっていてもよい。)で表される有機ケイ素化合物の縮合物を主成分とし、キレート化又は配位化された金属化合物、有機酸金属塩化合物、2以上の水酸基若しくは加水分解性基を有する金属化合物、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも1種の化合物、及び/又はそれから誘導される化合物を含有する有機無機複合薄膜であって、第2層が、金属界面活性剤の加水分解縮合物を含有する層である積層体、及び、
(2)金属系界面活性剤が、式(II)
R11 SM11X11 t−s (II)
〔式中、R11は、置換基を有していてもよい炭素数1〜30の炭化水素基、置換基を有していてもよい炭素数1〜30のハロゲン化炭化水素基、連結基を含む炭素数1〜30の炭化水素基、又は連結基を含む炭素数1〜30のハロゲン化炭化水素基を表し、M11は、ケイ素原子、ゲルマニウム原子、スズ原子、チタン原子、及びジルコニウム原子からなる群から選ばれる少なくとも1種の金属原子を表し、X11は、水酸基又は加水分解性基を表し、tはMの原子価を表す。sは、1から(t−1)のいずれかの正整数を表し、sが2以上の場合、R11は、互いに同一でも相異なっていてもよい。(t−s)が2以上の場合、X11は同一であっても、相異なっていてもよいが、X11のうち、少なくとも1個は加水分解性基である。〕で示される化合物である(1)に記載の積層体に関する。
That is, the present invention
(1) In the laminate formed in the order of the first layer and the second layer on the substrate,
The first layer is of formula (I)
R n SiX 4-n (I)
(In the formula, R represents an organic group in which a carbon atom is directly bonded to Si in the formula, X represents a hydroxyl group or a hydrolyzable group, n represents 1 or 2, and n is 2. , R may be the same or different, and when (4-n) is 2 or more, X may be the same or different.) From the group consisting of chelated or coordinated metal compounds, organic acid metal salt compounds, metal compounds having two or more hydroxyl groups or hydrolyzable groups, their hydrolysates, and their condensates as the main component A laminate comprising an organic-inorganic composite thin film containing at least one selected compound and / or a compound derived therefrom, wherein the second layer is a layer containing a hydrolysis condensate of a metal surfactant, as well as,
(2) The metal surfactant is represented by the formula (II)
R 11 S M 11 X 11 t -s (II)
[Wherein, R 11 represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, a halogenated hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, or a linking group. Represents a hydrocarbon group having 1 to 30 carbon atoms or a halogenated hydrocarbon group having 1 to 30 carbon atoms including a linking group, and M 11 represents a silicon atom, a germanium atom, a tin atom, a titanium atom, and a zirconium atom. Represents at least one metal atom selected from the group consisting of: X 11 represents a hydroxyl group or a hydrolyzable group, and t represents the valence of M. s represents any positive integer from 1 to (t−1), and when s is 2 or more, R 11 may be the same as or different from each other. When (ts) is 2 or more, X 11 may be the same or different, but at least one of X 11 is a hydrolyzable group. ] It is related with the laminated body as described in (1) which is a compound shown by these.
また、本発明は、
(3)(A)基材上に、式(I)
RnSiX4−n (I)
(式中、Rは、Siに炭素原子が直接結合する有機基を表し、Xは、水酸基又は加水分解性基を表す。nは1又は2を表し、nが2のとき各Rは同一でも異なっていてもよく、(4−n)が2以上のとき各Xは同一でも異なっていてもよい。)で表される有機ケイ素化合物及び/又はその縮合物、並びに、キレート化又は配位化された金属化合物、有機酸金属塩化合物、2以上の水酸基若しくは加水分解性基を有する金属化合物、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも1種の化合物を含有する固形分量が0.01〜20.0質量%である有機無機複合薄膜形成用組成物を塗布することにより有機無機複合薄膜を作製し、
(B)当該、有機無機複合薄膜にプラズマ処理又はUVオゾン処理を施した後、金属界面活性剤の加水分解縮合物である層を作製する積層体の製造方法に関する。
The present invention also provides:
(3) (A) On the substrate, the formula (I)
R n SiX 4-n (I)
(In the formula, R represents an organic group in which a carbon atom is directly bonded to Si, X represents a hydroxyl group or a hydrolyzable group. N represents 1 or 2, and when n is 2, each R may be the same. May be different, and when (4-n) is 2 or more, each X may be the same or different.) And / or its condensate, and chelation or coordination A metal compound, an organic acid metal salt compound, a metal compound having two or more hydroxyl groups or hydrolyzable groups, a hydrolyzate thereof, and at least one compound selected from the group consisting of condensates thereof An organic-inorganic composite thin film is prepared by applying a composition for forming an organic-inorganic composite thin film having a solid content of 0.01 to 20.0% by mass,
(B) It is related with the manufacturing method of the laminated body which produces the layer which is a hydrolysis-condensation product of a metal surfactant, after giving the said organic-inorganic composite thin film plasma treatment or UV ozone treatment.
本発明の積層体を用いることで、表面に凹凸のある基材でも実用可能な機能を有する積層体を提供することが可能となった。 By using the laminate of the present invention, it has become possible to provide a laminate having a function that can be used even on a substrate having an uneven surface.
本発明の積層体は、基材の少なくとも片面に、以下のA)基材、B)第1層及びC)第2層の各層がA)、B)及びC)の順に積層された構成からなる積層体である。本発明の積層体は、さらに、本発明の効果を奏する限り、他の層を1又は2以上積層する場合を包含してもよい。
以下に、詳細に説明する。
The laminate of the present invention has a configuration in which the following layers A), B) first layer, and C) second layer are laminated in the order of A), B), and C) on at least one surface of the substrate. It is a laminated body. The laminated body of the present invention may further include a case where one or more other layers are laminated as long as the effects of the present invention are exhibited.
This will be described in detail below.
A)基材
本発明の薄膜が形成可能な基材としては、金属、セラミックス、ガラス、プラスチック等が挙げられる。
金属製基材としては、特に制限はないが、アルミニウム、銅、ステンレス、ニッケル等を好ましく例示することができる。セラミック、紙、繊維等の表面に金属層または金属を主成分とする層を設けた基材でもよい。
プラスチック製基材としては、その素材が高分子である基材であれば、特に制限されず、具体的には、ポリカーボネート樹脂、アクリル樹脂、ポリイミド樹脂、ポリエステル樹脂、エポキシ樹脂、液晶ポリマー樹脂、ポリエーテルスルフォンが挙げられる。セラミック、紙、繊維、金属等の表面に高分子の層または高分子を主成分とする層を設けた基材でもよい。
ガラス製基材は、その素材が、酸化ケイ素を主とする成分の基材であれば、特に制限されず、プラスチック製基材と同様に、セラミック、紙、繊維等の表面に酸化ケイ素の層または酸化ケイ素を主成分とする層を設けた基材でもよい。
基材の大きさや形は特に制限されず、平板、立体物、フィルム等いずれも使用することができるが、特に表面に凹凸がある基材に本発明の積層体を適用した場合に、好適に用いることができる。
A) Substrate Examples of the substrate on which the thin film of the present invention can be formed include metals, ceramics, glass, and plastics.
Although there is no restriction | limiting in particular as a metal base material, Aluminum, copper, stainless steel, nickel etc. can be illustrated preferably. A base material in which a metal layer or a metal-based layer is provided on the surface of ceramic, paper, fiber, or the like may be used.
The plastic base material is not particularly limited as long as the material is a polymer base material, and specifically, polycarbonate resin, acrylic resin, polyimide resin, polyester resin, epoxy resin, liquid crystal polymer resin, polycrystal resin, Examples include ether sulfone. A base material in which a polymer layer or a polymer-based layer is provided on the surface of ceramic, paper, fiber, metal or the like may be used.
The glass base material is not particularly limited as long as the material is a base material mainly composed of silicon oxide, and a silicon oxide layer is formed on the surface of ceramic, paper, fiber, etc. in the same manner as a plastic base material. Or the base material which provided the layer which has a silicon oxide as a main component may be sufficient.
The size and shape of the substrate are not particularly limited, and any of a flat plate, a three-dimensional object, a film, and the like can be used, but particularly when the laminate of the present invention is applied to a substrate having uneven surfaces. Can be used.
B)第1層:有機無機複合薄膜
本発明の第1層である有機無機複合薄膜は、少なくとも有機ケイ素化合物の縮合物を主成分として含有し、キレート化又は配位化された金属化合物、有機酸金属塩化合物、2以上の水酸基若しくは加水分解性基を有する金属化合物、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも1種の化合物を必須成分として含有するが、その他の成分も副成分として含有してもよい。
B) First layer: Organic-inorganic composite thin film The organic-inorganic composite thin film as the first layer of the present invention contains at least a condensate of an organosilicon compound as a main component, and is a chelated or coordinated metal compound, organic It contains at least one compound selected from the group consisting of acid metal salt compounds, metal compounds having two or more hydroxyl groups or hydrolyzable groups, hydrolysates thereof, and condensates thereof as essential components. These components may also be contained as subcomponents.
1)有機ケイ素化合物の縮合物
本発明の有機ケイ素化合物は、以下の式(I)で表される。
RnSiX4−n (I)
式中、RはSiに炭素原子が直接結合する有機基を表し、Xは水酸基又は加水分解性基を表す。nは1又は2を表し、nが2のとき各Rは同一でも異なっていてもよく、(4−n)が2以上のとき各Xは同一でも異なっていてもよい。
1) Condensate of organosilicon compound The organosilicon compound of the present invention is represented by the following formula (I).
R n SiX 4-n (I)
In the formula, R represents an organic group in which a carbon atom is directly bonded to Si, and X represents a hydroxyl group or a hydrolyzable group. n represents 1 or 2, and when n is 2, each R may be the same or different, and when (4-n) is 2 or more, each X may be the same or different.
ここで、Rで表される「Siに炭素原子が直接結合する有機基」としては、置換されていてもよい炭化水素基、ポリマー部分を含む炭化水素基等を挙げることができる。
上記「置換されていてもよい炭化水素基」の炭化水素基としては、通常、炭素数1〜30の炭化水素基であり、例えば、アルキル基、シクロアルキル基、シクロアルキルアルキル基、アルケニル基、アルキニル基、アリール基、アリールアルキル基、アリールアルケニル基等が挙げられる。
Here, examples of the “organic group in which a carbon atom is directly bonded to Si” represented by R include an optionally substituted hydrocarbon group, a hydrocarbon group containing a polymer portion, and the like.
The hydrocarbon group of the “optionally substituted hydrocarbon group” is usually a hydrocarbon group having 1 to 30 carbon atoms, such as an alkyl group, a cycloalkyl group, a cycloalkylalkyl group, an alkenyl group, An alkynyl group, an aryl group, an arylalkyl group, an arylalkenyl group, etc. are mentioned.
また、上記「炭化水素基」は、酸素原子、窒素原子、又はケイ素原子を含んでいてもよい。 The “hydrocarbon group” may contain an oxygen atom, a nitrogen atom, or a silicon atom.
アルキル基として、炭素数1〜10の直鎖又は分岐したアルキル基が好ましく、例えば、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、t−ブチル基、n−ペンチル基、イソペンチル基、ネオペンチル基、n−ヘキシル基、イソヘキシル基、n−ヘプチル基、n−オクチル基、n−ノニル基、イソノニル基、n−デシル基等が挙げられ、さらに炭素数10を超える長鎖のアルキル基としては、ラウリル基、トリデシル基、ミリスチル基、ペンタデシル基、パルミチル基、ヘプタデシル基、ステアリル基等が挙げられる。 As the alkyl group, a linear or branched alkyl group having 1 to 10 carbon atoms is preferable. For example, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, t-butyl group, n -Pentyl group, isopentyl group, neopentyl group, n-hexyl group, isohexyl group, n-heptyl group, n-octyl group, n-nonyl group, isononyl group, n-decyl group, etc. Examples of the long-chain alkyl group exceeding the above include lauryl group, tridecyl group, myristyl group, pentadecyl group, palmityl group, heptadecyl group, stearyl group and the like.
シクロアルキル基として、炭素数3〜8のシクロアルキル基が好ましく、例えばシクロプロピル基、シクロブチル基、シクロペンチル基、シクロへキシル基、シクロヘプチル基、シクロオクチル基等が挙げられる。 The cycloalkyl group is preferably a cycloalkyl group having 3 to 8 carbon atoms, and examples thereof include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group.
アルケニル基として、炭素数2〜10の直鎖又は分岐したアルケニル基が好ましく、それは、いずれか1カ所以上に炭素−炭素二重結合を有する炭素数2〜10の直鎖又は分岐したアルケニル基を意味し、例えば、エテニル基、1−プロペン−1−イル基、2−プロぺン−1−イル基、1−プロペン−2−イル基、1−ブテン−1−イル基、2−ブテン−1−イル基、3−ブテン−1−イル基、1−ブテン−2−イル基、3−ブテン−2−イル基、1−ペンテン−1−イル基、4−ペンテン−1−イル基、1−ペンテン−2−イル基、4−ペンテン−2−イル基、3−メチル−1−ブテン−1−イル基、1−ヘキセン−1−イル基、5−ヘキセン−1−イル基、1−ヘプテン−1−イル基、6−ヘプテン−1−イル基、1−オクテン−1−イル基、7−オクテン−1−イル基、1,3−ブタジエン−1−イル基等が挙げられる。 As the alkenyl group, a linear or branched alkenyl group having 2 to 10 carbon atoms is preferable, and it is a linear or branched alkenyl group having 2 to 10 carbon atoms having a carbon-carbon double bond at any one or more positions. Meaning, for example, ethenyl group, 1-propen-1-yl group, 2-propen-1-yl group, 1-propen-2-yl group, 1-buten-1-yl group, 2-butene- 1-yl group, 3-buten-1-yl group, 1-buten-2-yl group, 3-buten-2-yl group, 1-penten-1-yl group, 4-penten-1-yl group, 1-penten-2-yl group, 4-penten-2-yl group, 3-methyl-1-buten-1-yl group, 1-hexen-1-yl group, 5-hexen-1-yl group, 1 -Hepten-1-yl group, 6-hepten-1-yl group, 1-octen-1-y Group, 7-octen-1-yl group, 1,3-butadiene-1-yl group.
シクロアルケニル基として、炭素数3〜8のシクロアルケニル基が好ましく、それは、いずれか1カ所以上に炭素−炭素二重結合を有しかつ環状部分を有する炭素数3〜8のアルケニル基を意味し、例えば、1−シクロペンテン−1−イル基、2−シクロペンテン−1−イル基、1−シクロヘキセン−1−イル基、2−シクロヘキセン−1−イル基、3−シクロヘキセン−1−イル基等が挙げられる。 As the cycloalkenyl group, a cycloalkenyl group having 3 to 8 carbon atoms is preferable, which means an alkenyl group having 3 to 8 carbon atoms having a carbon-carbon double bond at one or more positions and having a cyclic portion. For example, 1-cyclopenten-1-yl group, 2-cyclopenten-1-yl group, 1-cyclohexen-1-yl group, 2-cyclohexen-1-yl group, 3-cyclohexen-1-yl group and the like can be mentioned. It is done.
アルキニル基としては、炭素数2〜10のアルキニル基が好ましく、例えば、エチニル基、1−プロピン−1−イル基、2−プロピン−1−イル基、1−ブチン−1−イル基、3−ブチン−1−イル基、1−ペンチン−1−イル基、4−ペンチン−1−イル基、1−ヘキシン−1−イル基、5−ヘキシン−1−イル基、1−ヘプチン−1−イル基、1−オクチン−1−イル基、7−オクチン−1−イル基等が挙げられる。
シクロアルキルアルキル基としては、炭素数3〜10のシクロアルキル基と炭素数1〜10のアルキル基の結合した基が好ましく、例えば、シクロプロピルメチル基、シクロプロピルプロピル基、シクロブチルメチル基、シクロペンチルメチル基、シクロペンチルエチル基、シクロへキシルエチル基、シクロヘプチルメチル基等が挙げられる。
As the alkynyl group, an alkynyl group having 2 to 10 carbon atoms is preferable. For example, ethynyl group, 1-propyn-1-yl group, 2-propyn-1-yl group, 1-butyn-1-yl group, 3- Butyn-1-yl group, 1-pentyn-1-yl group, 4-pentyn-1-yl group, 1-hexyn-1-yl group, 5-hexyn-1-yl group, 1-heptin-1-yl Group, 1-octyn-1-yl group, 7-octyn-1-yl group and the like.
The cycloalkylalkyl group is preferably a group in which a cycloalkyl group having 3 to 10 carbon atoms and an alkyl group having 1 to 10 carbon atoms are bonded, for example, cyclopropylmethyl group, cyclopropylpropyl group, cyclobutylmethyl group, cyclopentyl. Examples thereof include a methyl group, a cyclopentylethyl group, a cyclohexylethyl group, and a cycloheptylmethyl group.
アリール基としては、単環又は多環のアリール基を意味し、多環アリール基の場合は、完全不飽和に加え、部分飽和の基も包含し、具体的には、フェニル基、ナフチル基、アズレニル基、インデニル基、インダニル基、テトラリニル基等が例示することができ、炭素数6〜10のアリール基が好ましい。
アリールアルキル基としては、炭素数6〜10のアリール基と炭素数1〜10のアルキル基が結合した基が好ましく、例えば、ベンジル基、フェネチル基、3−フェニル−n−プロピル基、4−フェニル−n−ブチル基、5−フェニル−n−ペンチル基、8−フェニル−n−オクチル基、ナフチルメチル基等が挙げられる。
アリールアルケニル基としては、炭素数6〜10のアリール基と炭素数2〜10のアルケニル基が結合した基が好ましく、例えば、スチリル基、3−フェニル−1−プロペン−1−イル基、3−フェニル−2−プロペン−1−イル基、4−フェニル−1−ブテン−1−イル基、4−フェニル−3−ブテン−1−イル基、5−フェニル−1−ペンテン−1−イル基、5−フェニル−4−ペンテン−1−イル基、8−フェニル−1−オクテン−1−イル基、8−フェニル−7−オクテン−1−イル基、ナフチルエテニル基等が挙げられる。
The aryl group means a monocyclic or polycyclic aryl group. In the case of a polycyclic aryl group, in addition to a fully unsaturated group, a partially saturated group is also included. Specifically, a phenyl group, a naphthyl group, Examples include an azulenyl group, an indenyl group, an indanyl group, and a tetralinyl group, and an aryl group having 6 to 10 carbon atoms is preferable.
The arylalkyl group is preferably a group in which an aryl group having 6 to 10 carbon atoms and an alkyl group having 1 to 10 carbon atoms are bonded, such as benzyl group, phenethyl group, 3-phenyl-n-propyl group, 4-phenyl group. -N-butyl group, 5-phenyl-n-pentyl group, 8-phenyl-n-octyl group, naphthylmethyl group and the like can be mentioned.
As the arylalkenyl group, a group in which an aryl group having 6 to 10 carbon atoms and an alkenyl group having 2 to 10 carbon atoms are bonded is preferable. For example, a styryl group, a 3-phenyl-1-propen-1-yl group, a 3- Phenyl-2-propen-1-yl group, 4-phenyl-1-buten-1-yl group, 4-phenyl-3-buten-1-yl group, 5-phenyl-1-penten-1-yl group, Examples include 5-phenyl-4-penten-1-yl group, 8-phenyl-1-octen-1-yl group, 8-phenyl-7-octen-1-yl group, and naphthylethenyl group.
「酸素原子を有する炭化水素基」としては、アルコキシアルキル基、エポキシ基、エポキシアルキル基、グリシドキシアルキル基等のオキシラン環(エポキシ基)を有する基、アクリロキシメチル基、メタクリロキシメチル基などが挙げられる。 Examples of the “hydrocarbon group having an oxygen atom” include a group having an oxirane ring (epoxy group) such as an alkoxyalkyl group, an epoxy group, an epoxyalkyl group, a glycidoxyalkyl group, an acryloxymethyl group, a methacryloxymethyl group, etc. Is mentioned.
ここで、アルコキシアルキル基としては、炭素数1〜6のアルコキシ基と炭素数1〜6のアルキル基が結合した基が好ましく、例えば、メトキシメチル基、2−メトキシエチル基、3−エトキシ−n−プロピル基等が挙げられる。
エポキシアルキル基としては、炭素数3〜10の直鎖又は分岐鎖のエポキシアルキル基が好ましく、例えばグリシジル基、グリシジルメチル基、2−グリシジルエチル基、3−グリシジルプロピル基、4−グリシジルブチル基、3,4−エポキシブチル基、4,5−エポキシペンチル基、5,6−エポキシヘキシル基等の直鎖状のエポキシ基を含むアルキル基;β−メチルグリシジル基、β−エチルグリシジル基、β−プロピルグリシジル基、2−グリシジルプロピル基、2−グリシジルブチル基、3−グリシジルブチル基、2−メチル−3−グリシジルプロピル基、3−メチル−2−グリシジルプロピル基、3−メチル−3,4−エポキシブチル基、3−エチル−3,4−エポキシブチル基、4−メチル−4,5−エポキシペンチル基、5−メチル−5,6−エポキシヘキシル基等の枝分かれ状のエポキシ基を含むアルキル基等が挙げられる。
グリシドキシアルキル基としては、グリシドキシメチル基、グリシドキシプロピル基等が挙げられる。
Here, the alkoxyalkyl group is preferably a group in which an alkoxy group having 1 to 6 carbon atoms and an alkyl group having 1 to 6 carbon atoms are bonded. For example, a methoxymethyl group, 2-methoxyethyl group, 3-ethoxy-n -Propyl group etc. are mentioned.
The epoxyalkyl group is preferably a linear or branched epoxyalkyl group having 3 to 10 carbon atoms, such as a glycidyl group, a glycidylmethyl group, a 2-glycidylethyl group, a 3-glycidylpropyl group, a 4-glycidylbutyl group, Alkyl groups containing linear epoxy groups such as 3,4-epoxybutyl group, 4,5-epoxypentyl group, 5,6-epoxyhexyl group; β-methylglycidyl group, β-ethylglycidyl group, β- Propyl glycidyl group, 2-glycidyl propyl group, 2-glycidyl butyl group, 3-glycidyl butyl group, 2-methyl-3-glycidyl propyl group, 3-methyl-2-glycidyl propyl group, 3-methyl-3,4- Epoxybutyl group, 3-ethyl-3,4-epoxybutyl group, 4-methyl-4,5-epoxypentyl group, 5- Such as an alkyl group containing branched epoxy groups, such as chill-5,6 epoxy hexyl group.
Examples of the glycidoxyalkyl group include a glycidoxymethyl group and a glycidoxypropyl group.
「窒素原子を有する炭化水素基」としては−NR’2(式中、R’は水素原子、アルキル基又はアリール基を表し、各R’は互いに同一でも相異なっていてもよい。)を有する基、又は−N=CR’’2(式中、R’’は水素原子、アルキル基またはアリール基を表し、各R’’は互いに同一でも相異なっていてもよい。)を有する基が好ましく、アルキル基としては上記と同じものが挙げられ、アリール基としてはフェニル基、ナフチル基、アントラセン−1−イル基、フェナントレン−1−イル基等が挙げられる。 The “hydrocarbon group having a nitrogen atom” has —NR ′ 2 (wherein R ′ represents a hydrogen atom, an alkyl group or an aryl group, and each R ′ may be the same as or different from each other). Or a group having —N═CR ″ 2 (wherein R ″ represents a hydrogen atom, an alkyl group or an aryl group, and each R ″ may be the same as or different from each other). Examples of the alkyl group include the same groups as described above, and examples of the aryl group include a phenyl group, a naphthyl group, an anthracen-1-yl group, and a phenanthren-1-yl group.
例えば、−NR’2を有する基としては、−CH2NH2基、−CH2(CH2)2NH2基、−CH2NHCH3基等が挙げられる。−N=CR’’2を有する基としては、−CH2N=CHCH3基、−CH2N=C(CH3)2基、−CH2CH2N=CHCH3基、−CH2N=CHPh基、−CH2N=C(Ph)CH3基等が挙げられる。 For example, the group having —NR ′ 2 includes a —CH 2 NH 2 group, a —CH 2 (CH 2 ) 2 NH 2 group, a —CH 2 NHCH 3 group, and the like. -N = Examples of the group having a CR '' 2, -CH 2 N = CHCH 3 group, -CH 2 N = C (CH 3) 2 group, -CH 2 CH 2 N = CHCH 3 group, -CH 2 N ═CHPh group, —CH 2 N═C (Ph) CH 3 group and the like.
上記「置換されていてもよい」の置換基としては、例えば、ハロゲン原子、アルキル基、アルケニル基、アリール基、メタクリロキシ基等を挙げることができる。アルキル基、アルケニル基、アリール基としては、Rにおけるものと同じものを例示することができる。 Examples of the “optionally substituted” substituent include a halogen atom, an alkyl group, an alkenyl group, an aryl group, and a methacryloxy group. Examples of the alkyl group, alkenyl group, and aryl group are the same as those in R.
上記のうち、ビニル基、オキシラン環を有する基、−NR’2を有する基、又は−N=CR’’2を有する基は、有機無機複合体の表面の無機化の観点からは、好ましい基である。 Among the above, vinyl group, a group having an oxirane ring, -NR 'group having 2 or -N = CR,' group with '2, from the viewpoint of mineralization of the surface of the organic-inorganic composite, preferred groups It is.
また、式(I)中、nは、1又は2を表し、n=1のものが特に好ましい。nが2のとき、各Rは同一でも相異なっていてもよい。また、これらは、1種単独又は2種以上を組み合わせて使用することができる。 In the formula (I), n represents 1 or 2, and n = 1 is particularly preferable. When n is 2, each R may be the same or different. Moreover, these can be used individually by 1 type or in combination of 2 or more types.
式(I)において、Xは、水酸基又は加水分解性基を表す。式(I)の(4−n)が2以上のとき、各Xは同一でも相異なっていてもよい。加水分解性基とは、例えば、無触媒、過剰の水の共存下、25℃〜100℃で加熱することにより、加水分解されてシラノール基を生成することができる基や、シロキサン縮合物を形成することができる基を意味し、具体的には、アルコキシ基、アシルオキシ基、ハロゲン基原子、イソシアネート基、無置換または置換アミノ基等を挙げることができ、炭素数1〜4のアルコキシ基又は炭素数1〜6のアシルオキシ基が好ましい。 In the formula (I), X represents a hydroxyl group or a hydrolyzable group. When (4-n) of formula (I) is 2 or more, each X may be the same or different. A hydrolyzable group is, for example, a group that can be hydrolyzed to form a silanol group or a siloxane condensate by heating at 25 ° C. to 100 ° C. in the presence of no catalyst and excess water. Specifically, an alkoxy group, an acyloxy group, a halogen atom, an isocyanate group, an unsubstituted or substituted amino group, and the like can be mentioned. The acyloxy group of number 1-6 is preferable.
炭素数1〜4のアルコキシ基としては、メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、イソブトキシ基、t−ブトキシ基等が挙げられ、炭素数1〜6のアシルオキシ基(ただし、炭素数にはカルボニル基の炭素を含まない)としては、アセトキシ基、ベンゾイルオキシ基等が挙げられる。ハロゲン原子としてはフッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられる。 Examples of the alkoxy group having 1 to 4 carbon atoms include a methoxy group, an ethoxy group, an n-propoxy group, an isopropoxy group, an n-butoxy group, an isobutoxy group, and a t-butoxy group. Examples of the group (however, the carbon number does not include carbon of the carbonyl group) include an acetoxy group and a benzoyloxy group. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
式(I)で表される化合物として、具体的には、メチルトリクロロシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、メチルトリブトキシシラン、エチルトリメトキシシラン、エチルトリイソプロポキシシラン、エチルトリブトキシシラン、ブチルトリメトキシシラン、ペンタフルオロフェニルトリメトキシシラン、フェニルトリメトキシシラン、ノナフルオロブチルエチルジメトキシシラン、トリフルオロメチルトリメトキシシラン、ジメチルジアミノシラン、ジメチルジクロロシラン、ジメチルジアセトキシシラン、ジメチルジメトキシシラン、ジフェニルジメトキシシラン、ジブチルジメトキシシラン、ビニルトリメトキシシラン、3−(メタ)アクリロキシプロピルトリメトキシシラン、3−(3−メチル−3−オキセタンメトキシ)プロピルトリメトキシシラン、4−オキサシクロヘキシルトリメトキシシラン、メチルトリス[(メタ)アクリロキシ]シラン、メチルトリス[2−(メタ)アクリロキシエトキシ]シラン、メチル−トリグリシジロキシシラン、メチルトリス(3−メチル−3−オキセタンメトキシ)シラン、ビニルトリクロロシラン、ビニルトリエトキシシラン、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、3−グリシドキシプロピルトリメトキシシラン、3−グリシドキシプロピルメチルジエトキシシラン、3−グリシドキシプロピルトリエトキシシラン、p−スチリルトリメトキシシラン、3−メタクリロキシプロピルメチルジメトキシシラン、3−メタクリロキシプロピルメチルジエトキシシラン、3−メタクリロキシプロピルトリエトキシシラン、N−(2−アミノエチル)−3−アミノプロピルメチルジメトキシシラン、N−(2−アミノエチル)−3−アミノプロピルトリメトキシシラン、N−(2−アミノエチル)−3−アミノプロピルトリエトキシシラン、3−アミノプロピルトリメトキシシラン、3−アミノプロピルトリエトキシシラン、3−トリエトキシシリル−N−(1,3−ジメチル−ブチリデン)プロピルアミン、3−アニリノプロピルトリメトキシシランを挙げることができる。これらは、1種単独又は2種以上を組み合わせて使用することができる。 Specific examples of the compound represented by the formula (I) include methyltrichlorosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltributoxysilane, ethyltrimethoxysilane, ethyltriisopropoxysilane, and ethyltributoxysilane. , Butyltrimethoxysilane, pentafluorophenyltrimethoxysilane, phenyltrimethoxysilane, nonafluorobutylethyldimethoxysilane, trifluoromethyltrimethoxysilane, dimethyldiaminosilane, dimethyldichlorosilane, dimethyldiacetoxysilane, dimethyldimethoxysilane, diphenyl Dimethoxysilane, dibutyldimethoxysilane, vinyltrimethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (3-methyl-3-oxy) Tanmethoxy) propyltrimethoxysilane, 4-oxacyclohexyltrimethoxysilane, methyltris [(meth) acryloxy] silane, methyltris [2- (meth) acryloxyethoxy] silane, methyl-triglycidyloxysilane, methyltris (3-methyl) -3-Oxetanemethoxy) silane, vinyltrichlorosilane, vinyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldi Ethoxysilane, 3-glycidoxypropyltriethoxysilane, p-styryltrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, 3-meta Acryloxypropyltriethoxysilane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, N- (2-aminoethyl)- 3-aminopropyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-triethoxysilyl-N- (1,3-dimethyl-butylidene) propylamine, 3-anilinopropyltri Mention may be made of methoxysilane. These can be used alone or in combination of two or more.
Rが、ポリマー部分を含む炭化水素基である有機ケイ素化合物とは、例えば、重合性官能基を有する有機ケイ素化合物を、必要に応じて他の重合性官能基を有する単量体と共重合させて得られるポリマーを表し、具体的には、3−メタクリロキシプロピルトリメトキシシランとメチルメタクリレート、ブチルメタクリレート等のメタクリル酸エステル、メタクリル酸等と共重合して得られるポリマーを例示することができる。また、ポリマー部分を含む炭化水素基である有機ケイ素化合物の別な例としては、高分子反応で、有機ケイ素部分を導入して得られるポリマーを示し、具体的には、ポリメタクリル酸に対して、3−グリシドキシプロピルトリメトキシシランを反応させて、側鎖にアルコキシシラン部位を導入したポリマーを例示することができる。
重合性官能基を有する有機ケイ素化合物と重合可能な単量体として、具体的には、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸ブチル、(メタ)アクリル酸2−エチルヘキシル、シクロヘキシル(メタ)アクリレートなどの(メタ)アクリル酸エステル;(メタ)アクリル酸、イタコン酸、フマル酸などのカルボン酸および無水マレイン酸などの酸無水物;グリシジル(メタ)アクリレートなどのエポキシ化合物;ジエチルアミノエチル(メタ)アクリレート、アミノエチルビニルエーテルなどのアミノ化合物;(メタ)アクリルアミド、イタコン酸ジアミド、α−エチルアクリルアミド、クロトンアミド、フマル酸ジアミド、マレイン酸ジアミド、N−ブトキシメチル(メタ)アクリルアミドなどのアミド化合物;アクリロニトリル、スチレン、α−メチルスチレン、塩化ビニル、酢酸ビニル、プロピオン酸ビニル等を例示することができる。
また、高分子反応により、有機ケイ素部位を導入することが可能なポリマーとして、具体的には、ポリ(メタ)アクリル酸、p−ヒドロキシスチレン、ポリブタジエン等を例示することができる。
なお、本発明の有機無機複合薄膜における主成分となる有機ケイ素化合物の縮合物は、これらの有機ケイ素化合物の縮合物及び/又は有機ケイ素化合物の縮合物のさらなる縮合物を意味する。
有機ケイ素化合物の縮合物の配合割合は、有機無機複合薄膜全体の固形分に対して2〜98質量%、好ましくは5〜50質量%、更に好ましくは5〜30質量%である。
An organosilicon compound in which R is a hydrocarbon group containing a polymer moiety is, for example, a copolymerization of an organosilicon compound having a polymerizable functional group with a monomer having another polymerizable functional group, if necessary. Specifically, a polymer obtained by copolymerizing 3-methacryloxypropyltrimethoxysilane with methacrylic acid esters such as methyl methacrylate and butyl methacrylate, methacrylic acid and the like can be exemplified. Another example of an organosilicon compound that is a hydrocarbon group containing a polymer moiety is a polymer obtained by introducing an organosilicon moiety in a polymer reaction, specifically, with respect to polymethacrylic acid. An example is a polymer obtained by reacting 3-glycidoxypropyltrimethoxysilane to introduce an alkoxysilane moiety in the side chain.
Specific examples of monomers that can be polymerized with an organosilicon compound having a polymerizable functional group include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, and (meth) acrylic acid 2. -(Meth) acrylic acid esters such as ethylhexyl and cyclohexyl (meth) acrylate; carboxylic acids such as (meth) acrylic acid, itaconic acid and fumaric acid and acid anhydrides such as maleic anhydride; epoxy such as glycidyl (meth) acrylate Compounds; amino compounds such as diethylaminoethyl (meth) acrylate and aminoethyl vinyl ether; (meth) acrylamide, itaconic acid diamide, α-ethylacrylamide, crotonamide, fumaric acid diamide, maleic acid diamide, N-butoxymethyl (meth) acrylamide Amides such as Compound; acrylonitrile, styrene, alpha-methyl styrene, vinyl chloride, vinyl acetate, can be exemplified vinyl propionate.
Specific examples of the polymer capable of introducing an organosilicon moiety by a polymer reaction include poly (meth) acrylic acid, p-hydroxystyrene, polybutadiene, and the like.
In addition, the condensate of the organosilicon compound used as the main component in the organic inorganic composite thin film of this invention means the further condensate of the condensate of these organosilicon compounds and / or the condensate of organosilicon compounds.
The blending ratio of the organosilicon compound condensate is 2 to 98 mass%, preferably 5 to 50 mass%, more preferably 5 to 30 mass%, based on the solid content of the whole organic-inorganic composite thin film.
本発明において使用される有機ケイ素化合物の好ましい態様として、具体的には、下記a−1)、a−2)、及びa−3)の混合物を例示することができる。
a−1) 式(I−1)
R1 nSiX4−n・・・(I−1)
(式中、nは1又は2を表し、nが2のときR1は同一であっても相異なってもよく、R1は有機基であって、R1のうち1以上はビニル基含有炭化水素基を表す。Xは水酸基又は加水分解性基を表し、互いに同一であっても相異なってもよい。)で表される化合物
a−2) 式(I−2)
R2 nSiX4−n・・・(I−2)
(式中、nは1又は2を表し、nが2のときR2は同一であっても相異なってもよく、R2は式中のSiに炭素原子が直接結合した、ビニル基含有炭化水素基以外の有機基を表す。Xは水酸基又は加水分解性基を表し、互いに同一であっても相異なってもよい。)で表される化合物
a−3) 存在するならば、それらの加水分解縮合物
Specific examples of preferred embodiments of the organosilicon compound used in the present invention include the following mixtures a-1), a-2) and a-3).
a-1) Formula (I-1)
R 1 n SiX 4-n (I-1)
(In the formula, n represents 1 or 2, and when n is 2, R 1 may be the same or different, R 1 is an organic group, and one or more of R 1 contains a vinyl group) Represents a hydrocarbon group, X represents a hydroxyl group or a hydrolyzable group, and may be the same or different from each other.) Compound a-2) Formula (I-2)
R 2 n SiX 4-n (I-2)
(In the formula, n represents 1 or 2, and when n is 2, R 2 may be the same or different, and R 2 is a vinyl group-containing carbonization in which a carbon atom is directly bonded to Si in the formula. Represents an organic group other than a hydrogen group, X represents a hydroxyl group or a hydrolyzable group, and may be the same or different from each other. Decomposition condensate
式(I−2)で表される化合物及びそれを単位として含有する加水分解縮合物は必ずしも存在しなくてもよい。加水分解縮合物とは、化合物同士が加水分解縮合してシロキサン結合を形成した2量体等であって、式(I)又は式(II)の化合物のみが加水分解縮合した物であってもよく、式(I)の化合物と式(II)の化合物とが加水分解縮合した物であってもよく、これらの2種以上が混在していてもよい。 The compound represented by the formula (I-2) and the hydrolysis condensate containing the compound as a unit do not necessarily exist. The hydrolysis condensate is a dimer or the like in which compounds are hydrolyzed and condensed to form a siloxane bond, and only a compound of formula (I) or formula (II) is hydrolyzed and condensed. It may be a product obtained by hydrolytic condensation of the compound of formula (I) and the compound of formula (II), or two or more of these may be mixed.
{〔式(I−1)の化合物〕+〔存在するならば、加水分解縮合物中の式(I−1)の化合物由来の単位〕}/{〔式(I−1)の化合物〕+〔式(I−2)の化合物〕+〔存在するならば、加水分解縮合物中の式(I−1)の化合物由来の単位〕+〔存在するならば、加水分解縮合物中の式(I−2)の化合物由来の単位〕}×100は、好ましくは30〜100モル%、より好ましくは30〜95モル%であり、
{〔式(I−2)の化合物〕+〔存在するならば、加水分解縮合物中の式(I−2)の化合物由来の単位〕}/{〔式(I−1)の化合物〕+〔式(I−2)の化合物〕+〔存在するならば、加水分解縮合物中の式(I−1)の化合物由来の単位〕+〔存在するならば、加水分解縮合物中の式(I−2)の化合物由来の単位〕}×100は、好ましくは0〜70モル%であり、より好ましくは5〜70モル%である。
また、加水分解縮合物の平均粒子径は2nm〜100nmが好ましく、5nm〜30nmであることがより好ましい。平均粒子径が100nmより大きいと膜が白濁し、溶液が不安定となりゲル化し易くなる。平均粒子径が2nmより小さいと塗膜性に悪影響が出る場合がある。
{[Compound of Formula (I-1)] + [If present, a unit derived from the compound of Formula (I-1) in the hydrolysis condensate]} / {[Compound of Formula (I-1)] + [Compound of formula (I-2)] + [if present, unit derived from compound of formula (I-1) in hydrolysis condensate] + [if present, formula (I in hydrolysis condensate) The unit derived from the compound of I-2)]} × 100 is preferably 30 to 100 mol%, more preferably 30 to 95 mol%,
{[Compound of formula (I-2)] + [if present, unit derived from compound of formula (I-2) in hydrolysis condensate]} / {[compound of formula (I-1)] + [Compound of formula (I-2)] + [if present, unit derived from compound of formula (I-1) in hydrolysis condensate] + [if present, formula (I in hydrolysis condensate) The unit derived from the compound of I-2)]} × 100 is preferably 0 to 70 mol%, more preferably 5 to 70 mol%.
The average particle size of the hydrolysis-condensation product is preferably 2 nm to 100 nm, and more preferably 5 nm to 30 nm. If the average particle size is larger than 100 nm, the film becomes cloudy, the solution becomes unstable, and gelation tends to occur. If the average particle size is smaller than 2 nm, the coating properties may be adversely affected.
上記R1中の有機基及び加水分解性基は、式(I)における有機基及び加水分解性基と同じものを例示することができる。
上記R1中のビニル基含有炭化水素基としては、例えば、ビニル基、アリル基、3−ブテニル基、4−ヘキセニル基等のアルケニル基(好ましくは、C2−8アルケニル基)、2−シクロプロペニル基、2−シクロペンテニル基、3−シクロヘキセニル基、4−シクロオクテニル基等のシクロアルケニル基(好ましくは、C3−8シクロアルケニル基)等が挙げられる。
Examples of the organic group and hydrolyzable group in R 1 are the same as the organic group and hydrolyzable group in formula (I).
Examples of the vinyl group-containing hydrocarbon group in R 1 include alkenyl groups (preferably C 2-8 alkenyl groups) such as vinyl group, allyl group, 3-butenyl group, 4-hexenyl group, 2-cyclopropenyl. Group, a cycloalkenyl group (preferably a C3-8 cycloalkenyl group) such as a 2-cyclopentenyl group, a 3-cyclohexenyl group, and a 4-cyclooctenyl group.
具体的に、式(I−1)で表される化合物としては、ビニルトリメトキシシラン、ビニルトリクロロシラン、ビニルトリエトキシシラン、ビニルトリブトキシシラン、ビニルトリイソプロポキシシラン、アリルトリメトキシシラン、3−ブテニルトリメトキシシラン、2−シクロプロぺニルトリメトキシシラン、2−シクロペンテニルトリメトキシシラン、2−シクロヘキセニルトリメトキシシラン、ジビニルジアミノシラン、ジビニルジクロロシラン、ジビニルジアセトキシシラン、ジビニルジメトキシシラン、ジアリルジメトキシシラン、ジ3-ブテニルジメトキシシラン、ビニルメチルジメトキシシラン、ビニルエチルジエトキシシラン、アリルメチルトリメトキシシラン、アリルエチルトリエトキシシラン等を挙げることができる。 Specifically, the compound represented by the formula (I-1) includes vinyltrimethoxysilane, vinyltrichlorosilane, vinyltriethoxysilane, vinyltributoxysilane, vinyltriisopropoxysilane, allyltrimethoxysilane, 3- Butenyltrimethoxysilane, 2-cyclopropenyltrimethoxysilane, 2-cyclopentenyltrimethoxysilane, 2-cyclohexenyltrimethoxysilane, divinyldiaminosilane, divinyldichlorosilane, divinyldiacetoxysilane, divinyldimethoxysilane, diallyldimethoxy Examples include silane, di-3-butenyldimethoxysilane, vinylmethyldimethoxysilane, vinylethyldiethoxysilane, allylmethyltrimethoxysilane, and allylethyltriethoxysilane.
式(I−2)で表される化合物としては、メチルトリクロロシラン、メチルトリメトキシシラン、メチルトリエトキシシラン、メチルトリブトキシシラン、エチルトリメトキシシラン、エチルトリイソプロポキシシラン、エチルトリブトキシシラン、ブチルトリメトキシシラン、ペンタフルオロフェニルトリメトキシシラン、フェニルトリメトキシシラン、ノナフルオロブチルエチルトリメトキシシラン、トリフルオロメチルトリメトキシシラン、ジメチルジアミノシラン、ジメチルジクロロシラン、ジメチルジアセトキシシラン、ジメチルジメトキシシラン、ジフェニルジメトキシシラン、ジブチルジメトキシシラン、トリメチルクロロシラン、3−(メタ)アクリロキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、3−(3−メチル−3−オキセタンメトキシ)プロピルトリメトキシシラン、オキサシクロヘキシルトリメトキシシラン、メチルトリ(メタ)アクリロキシシラン、メチル[2−(メタ)アクリロキシエトキシ]シラン、メチル−トリグリシジロキシシラン、メチルトリス(3−メチル−3−オキセタンメトキシ)シラン等を挙げることができる。 Examples of the compound represented by the formula (I-2) include methyltrichlorosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltributoxysilane, ethyltrimethoxysilane, ethyltriisopropoxysilane, ethyltributoxysilane, butyl Trimethoxysilane, pentafluorophenyltrimethoxysilane, phenyltrimethoxysilane, nonafluorobutylethyltrimethoxysilane, trifluoromethyltrimethoxysilane, dimethyldiaminosilane, dimethyldichlorosilane, dimethyldiacetoxysilane, dimethyldimethoxysilane, diphenyldimethoxy Silane, dibutyldimethoxysilane, trimethylchlorosilane, 3- (meth) acryloxypropyltrimethoxysilane, γ-glycidoxypropyltrimeth Sisilane, 3- (3-methyl-3-oxetanemethoxy) propyltrimethoxysilane, oxacyclohexyltrimethoxysilane, methyltri (meth) acryloxysilane, methyl [2- (meth) acryloxyethoxy] silane, methyl-triglycidyl Examples include loxysilane, methyltris (3-methyl-3-oxetanemethoxy) silane, and the like.
これらは、1種単独又は2種以上を組み合わせて使用することができる。
有機ケイ素化合物を組み合わせて使用する場合、例えば、ビニルトリメトキシシランと3−メタクリロキシプロピルトリメトキシシランの組み合わせ、ビニルトリメトキシシランと3−グリシドキシプロピルトリメトキシシランの組み合わせを好ましく例示できる。
These can be used alone or in combination of two or more.
When organic silicon compounds are used in combination, for example, a combination of vinyltrimethoxysilane and 3-methacryloxypropyltrimethoxysilane and a combination of vinyltrimethoxysilane and 3-glycidoxypropyltrimethoxysilane can be preferably exemplified.
また、式(I−1)で表される有機ケイ素化合物のうち、R1の炭素数が3以下であるものが、30モル%以上、好ましくは50〜100モル%であり、R1の炭素数が4以上であるものが、70モル%以下、好ましくは0〜50モル%である 。 Further, among the organosilicon compounds represented by the formula (I-1), those in which R 1 has 3 or less carbon atoms are 30 mol% or more, preferably 50 to 100 mol%, and the carbon of R 1 Those having a number of 4 or more are 70 mol% or less, preferably 0 to 50 mol%.
2)キレート化又は配位化された金属化合物、有機酸金属塩化合物、2以上の水酸基若しくは加水分解性基を有する金属化合物、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも1種の化合物
本発明の有機無機複合薄膜に使用される他の化合物は、キレート化又は配位化された金属化合物、有機酸金属塩化合物、2以上の水酸基若しくは加水分解性基を有する金属化合物、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも1種の化合物であり、加水分解物及び/又は縮合物であることが好ましく、特に、キレート化又は配位化された金属化合物の加水分解物及び/又は縮合物が好ましい。
これから誘導される化合物としては、例えば、キレート化又は配位化された金属化合物の縮合物等がさらに縮合されたもの等を挙げることができる。かかる光感応性化合物及び/又はその誘導体は、上述のように、有機ケイ素化合物と化学結合していてもよく、非結合状態で分散していてもよく、その混合状態のものであってもよい。
2) selected from the group consisting of chelated or coordinated metal compounds, organic acid metal salt compounds, metal compounds having two or more hydroxyl groups or hydrolyzable groups, hydrolysates thereof, and condensates thereof. At least one compound The other compound used in the organic-inorganic composite thin film of the present invention is a metal compound having a chelate or a coordination, an organic acid metal salt compound, a metal having two or more hydroxyl groups or hydrolyzable groups. It is at least one compound selected from the group consisting of compounds, their hydrolysates and their condensates, preferably hydrolysates and / or condensates, in particular chelated or coordinated. A hydrolyzate and / or condensate of a metal compound is preferred.
Examples of the compound derived therefrom include those obtained by further condensing a condensate or the like of a chelated or coordinated metal compound. As described above, the photosensitive compound and / or derivative thereof may be chemically bonded to the organosilicon compound, dispersed in a non-bonded state, or in a mixed state thereof. .
これら2以上の水酸基若しくは加水分解性基を有する金属化合物、キレート化又は配位化された金属化合物又は有機酸金属塩化合物における金属としては、チタン、ジルコニウム、アルミニウム、ケイ素、ゲルマニウム、インジウム、スズ、タンタル、亜鉛、タングステン、鉛等が挙げられ、これらの中でもチタン、ジルコニウム、アルミニウムが好ましく、特にチタン好ましい。これらは2種以上用いることもできる。 Examples of the metal in the metal compound having two or more hydroxyl groups or hydrolyzable groups, the chelated or coordinated metal compound, or the organic acid metal salt compound include titanium, zirconium, aluminum, silicon, germanium, indium, tin, Tantalum, zinc, tungsten, lead and the like can be mentioned. Among these, titanium, zirconium and aluminum are preferable, and titanium is particularly preferable. Two or more of these may be used.
キレート化又は配位化された金属化合物としては、水酸基若しくは加水分解性基を有するキレート化又は配位された金属化合物であることが好ましく、2以上の水酸基若しくは加水分解性基を有するキレート化又は配位された金属化合物であることがより好ましい。なお、2以上の水酸基若しくは加水分解性基を有するとは、加水分解性基及び水酸基の合計が2以上であることを意味する。また、前記金属キレート化合物又は金属配位化合物としては、β−ケトカルボニル化合物、β−ケトエステル化合物、及びα−ヒドロキシエステル化合物がキレート又は配位した化合物を例示することができ、より具体的には、アセト酢酸メチル、アセト酢酸n−プロピル、アセト酢酸イソプロピル、アセト酢酸n−ブチル、アセト酢酸sec−ブチル、アセト酢酸t−ブチル等のβ−ケトエステル類;アセチルアセトン、へキサン−2,4−ジオン、ヘプタン−2,4−ジオン、ヘプタン−3,5−ジオン、オクタン−2,4−ジオン、ノナン−2,4−ジオン、5−メチル−へキサン−2,4−ジオン等のβ−ジケトン類;グリコール酸、乳酸等のヒドロキシカルボン酸;等が配位した化合物を例示することができる。 The chelated or coordinated metal compound is preferably a chelated or coordinated metal compound having a hydroxyl group or a hydrolyzable group, or chelated or having two or more hydroxyl groups or hydrolyzable groups. More preferably, it is a coordinated metal compound. In addition, having two or more hydroxyl groups or hydrolyzable groups means that the sum of hydrolyzable groups and hydroxyl groups is 2 or more. Examples of the metal chelate compound or metal coordination compound include compounds in which a β-ketocarbonyl compound, a β-ketoester compound, and an α-hydroxyester compound are chelated or coordinated, more specifically. , Β-ketoesters such as methyl acetoacetate, n-propyl acetoacetate, isopropyl acetoacetate, n-butyl acetoacetate, sec-butyl acetoacetate, t-butyl acetoacetate; acetylacetone, hexane-2,4-dione, Β-diketones such as heptane-2,4-dione, heptane-3,5-dione, octane-2,4-dione, nonane-2,4-dione, 5-methyl-hexane-2,4-dione And hydroxycarboxylic acids such as glycolic acid and lactic acid; and the like.
有機酸金属塩化合物としては、金属イオンと有機酸から得られる塩からなる化合物であり、有機酸としては、酢酸、シュウ酸、酒石酸、安息香酸等のカルボン酸類;スルフォン酸、スルフィン酸、チオフェノール等の含硫黄有機酸;フェノール化合物;エノール化合物;オキシム化合物;イミド化合物;芳香族スルフォンアミド;等の酸性を呈する有機化合物が挙げられる。 The organic acid metal salt compound is a compound comprising a salt obtained from a metal ion and an organic acid. Examples of the organic acid include carboxylic acids such as acetic acid, oxalic acid, tartaric acid and benzoic acid; sulfonic acid, sulfinic acid and thiophenol. Organic compounds exhibiting acidity such as sulfur-containing organic acids such as phenol compounds, enol compounds, oxime compounds, imide compounds, aromatic sulfonamides, and the like.
また、2以上の水酸基若しくは加水分解性基を有する金属化合物は、上記キレート化又は配位化された金属化合物及び有機酸金属塩化合物を除くものであり、例えば、金属の水酸化物や、金属アルコラート等を挙げることができる。 Further, the metal compound having two or more hydroxyl groups or hydrolyzable groups excludes the chelated or coordinated metal compound and the organic acid metal salt compound. For example, a metal hydroxide or a metal Examples include alcoholates.
2以上の水酸基若しくは加水分解性基を有する金属化合物、又はキレート化又は配位化された金属化合物における加水分解性基としては、例えば、アルコキシ基、アシルオキシ基、ハロゲン基、イソシアネート基が挙げられ、炭素数1〜4のアルコキシ基、炭素数1〜4のアシルオキシ基が好ましい。なお、2以上の水酸基若しくは加水分解性基を有するとは、加水分解性基及び水酸基の合計が2以上であることを意味する。 Examples of the hydrolyzable group in a metal compound having two or more hydroxyl groups or hydrolyzable groups, or a chelated or coordinated metal compound include an alkoxy group, an acyloxy group, a halogen group, and an isocyanate group. A C1-C4 alkoxy group and a C1-C4 acyloxy group are preferable. In addition, having two or more hydroxyl groups or hydrolyzable groups means that the sum of hydrolyzable groups and hydroxyl groups is 2 or more.
2以上の水酸基若しくは加水分解性基を有する金属化合物の加水分解物及び/又は縮合物としては、2以上の水酸基若しくは加水分解性基を有する金属化合物1モルに対して、0.5モル以上の水を用いて加水分解したものであることが好ましく、0.5〜2モルの水を用いて加水分解したものであることがより好ましい。 As a hydrolyzate and / or condensate of a metal compound having two or more hydroxyl groups or hydrolyzable groups, 0.5 mol or more is used per 1 mol of a metal compound having two or more hydroxyl groups or hydrolyzable groups. It is preferably one that has been hydrolyzed with water, and more preferably one that has been hydrolyzed with 0.5 to 2 moles of water.
また、キレート化又は配位化された金属化合物の加水分解物及び/又は縮合物としては、キレート化又は配位化された金属化合物1モルに対して、5〜100モルの水を用いて加水分解したものであることがさらに好ましく、5〜20モルの水を用いて加水分解したものであることがより好ましい。 Further, as a hydrolyzate and / or condensate of a chelated or coordinated metal compound, 5 to 100 mol of water is added to 1 mol of the chelated or coordinated metal compound. It is more preferable that it is decomposed, and it is more preferable that it is hydrolyzed using 5 to 20 moles of water.
また、有機酸金属塩化合物の加水分解物及び/又は縮合物としては、有機酸金属塩化合物1モルに対して、5〜100モルの水を用いて加水分解したものであることがさらに好ましく、5〜20モルの水を用いて加水分解したものであることがより好ましい。 The hydrolyzate and / or condensate of the organic acid metal salt compound is more preferably hydrolyzed using 5 to 100 mol of water with respect to 1 mol of the organic acid metal salt compound. More preferably, it is hydrolyzed with 5 to 20 moles of water.
以上示したキレート化又は配位化された金属化合物等の含有量としては、その種類にもよるが、一般的に、有機ケイ素化合物中のSiに対して、金属化合物等中の金属原子が0.01〜0.5モル当量、好ましくは0.05〜0.2モル当量であることが好ましい。 The content of the chelated or coordinated metal compound or the like shown above depends on the type, but generally the metal atom in the metal compound or the like is 0 with respect to Si in the organosilicon compound. 0.01 to 0.5 molar equivalent, preferably 0.05 to 0.2 molar equivalent.
3)その他の添加剤
また、本発明の有機無機複合体薄膜には、得られる塗膜の硬度向上を目的として4官能シランやコロイド状シリカを添加することもできる。4官能シランとしては、例えば、テトラアミノシラン、テトラクロロシラン、テトラアセトキシシラン、テトラメトキシシラン、テトラエトキシシラン、テトラブトキシシラン、テトラベンジロキシシラン、テトラフェノキシシラン、テトラ(メタ)アクリロキシシラン、テトラキス[2−(メタ)アクリロキシエトキシ]シラン、テトラキス(2−ビニロキシエトキシ)シラン、テトラグリシジロキシシラン、テトラキス(2−ビニロキシブトキシ)シラン、テトラキス(3−メチル−3−オキセタンメトキシ)シランを挙げることができる。また、コロイド状シリカとしては、水分散コロイド状シリカ、メタノールもしくはイソプロピルアルコールなどの有機溶媒分散コロイド状シリカを挙げることができる。
3) Other additives In addition, tetrafunctional silane and colloidal silica can be added to the organic-inorganic composite thin film of the present invention for the purpose of improving the hardness of the resulting coating film. Examples of the tetrafunctional silane include tetraaminosilane, tetrachlorosilane, tetraacetoxysilane, tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane, tetrabenzyloxysilane, tetraphenoxysilane, tetra (meth) acryloxysilane, tetrakis [2 -(Meth) acryloxyethoxy] silane, tetrakis (2-vinyloxyethoxy) silane, tetraglycidyloxysilane, tetrakis (2-vinyloxybutoxy) silane, tetrakis (3-methyl-3-oxetanemethoxy) silane be able to. Examples of the colloidal silica include water-dispersed colloidal silica and organic solvent-dispersed colloidal silica such as methanol or isopropyl alcohol.
また、本発明の有機無機複合体形成用組成物には、得られる塗膜の着色、厚膜化、下地への紫外線透過防止、防蝕性の付与、耐熱性などの諸特性を発現させるために、別途、充填材を添加・分散させることも可能である。この充填材としては、例えば有機顔料、無機顔料などの非水溶性の顔料または顔料以外の粒子状、繊維状もしくは鱗片状の金属および合金ならびにこれらの酸化物、水酸化物、炭化物、窒化物、硫化物などが挙げられる。この充填材の具体例としては、粒子状、繊維状もしくは鱗片状の鉄、銅、アルミニウム、ニッケル、銀、亜鉛、フェライト、カーボンブラック、ステンレス鋼、二酸化ケイ素、酸化チタン、酸化アルミニウム、酸化クロム、酸化マンガン、酸化鉄、酸化ジルコニウム、酸化コバルト、合成ムライト、水酸化アルミニウム、水酸化鉄、炭化ケイ素、窒化ケイ素、窒化ホウ素、クレー、ケイソウ土、消石灰、石膏、タルク、炭酸バリウム、炭酸カルシウム、炭酸マグネシウム、硫酸バリウム、ベントナイト、雲母、亜鉛緑、クロム緑、コバルト緑、ビリジアン、ギネー緑、コバルトクロム緑、シェーレ緑、緑土、マンガン緑、ピグメントグリーン、群青、紺青、岩群青、コバルト青、セルリアンブルー、ホウ酸銅、モリブデン青、硫化銅、コバルト紫、マルス紫、マンガン紫、ピグメントバイオレット、亜酸化鉛、鉛酸カルシウム、ジンクエロー、硫化鉛、クロム黄、黄土、カドミウム黄、ストロンチウム黄、チタン黄、リサージ、ピグメントエロー、亜酸化銅、カドミウム赤、セレン赤、クロムバーミリオン、ベンガラ、亜鉛白、アンチモン白、塩基性硫酸鉛、チタン白、リトポン、ケイ酸鉛、酸化ジルコン、タングステン白、鉛亜鉛華、バンチソン白、フタル酸鉛、マンガン白、硫酸鉛、黒鉛、ボーンブラック、ダイヤモンドブラック、サーマトミック黒、植物性黒、チタン酸カリウムウィスカー、二硫化モリブデンなどを挙げることができる。 In addition, in the composition for forming an organic-inorganic composite of the present invention, in order to express various properties such as coloring of the obtained coating film, thickening of the coating film, prevention of UV transmission to the base, imparting corrosion resistance, and heat resistance. It is also possible to add and disperse the filler separately. Examples of the filler include water-insoluble pigments such as organic pigments and inorganic pigments, and particulate and fibrous or scale-like metals and alloys other than pigments, and oxides, hydroxides, carbides, nitrides thereof, and the like. Examples thereof include sulfides. Specific examples of this filler include particulate, fibrous or scale-like iron, copper, aluminum, nickel, silver, zinc, ferrite, carbon black, stainless steel, silicon dioxide, titanium oxide, aluminum oxide, chromium oxide, Manganese oxide, iron oxide, zirconium oxide, cobalt oxide, synthetic mullite, aluminum hydroxide, iron hydroxide, silicon carbide, silicon nitride, boron nitride, clay, diatomaceous earth, slaked lime, gypsum, talc, barium carbonate, calcium carbonate, carbonic acid Magnesium, Barium sulfate, Bentonite, Mica, Zinc green, Chrome green, Cobalt green, Viridian, Guinea green, Cobalt chromium green, Shale green, Green earth, Manganese green, Pigment green, Ultramarine, Bituminous, Rock ultramarine, Cobalt blue, Cerulean Blue, copper borate, molybdenum blue, copper sulfide, koval Purple, Mars Purple, Manganese Purple, Pigment Violet, Lead Oxide, Calcium Leadate, Zinc Yellow, Lead Sulfide, Chrome Yellow, Ocher, Cadmium Yellow, Strontium Yellow, Titanium Yellow, Resurge, Pigment Yellow, Cuprous Oxide, Cadmium Red, Selenium red, chrome vermilion, bengara, zinc white, antimony white, basic lead sulfate, titanium white, lithopone, lead silicate, zircon oxide, tungsten white, lead zinc white, bunchison white, lead phthalate, manganese white, sulfuric acid Examples thereof include lead, graphite, bone black, diamond black, thermostatic black, vegetable black, potassium titanate whisker, and molybdenum disulfide.
なお、本発明の有機無機複合体形成用組成物には、その他、オルトギ酸メチル、オルト酢酸メチル、テトラエトキシシランなどの公知の脱水剤、各種界面活性剤、前記以外のシランカップリング剤、チタンカップリング剤、染料、分散剤、増粘剤、レベリング剤などの添加剤を添加することもできる。 The composition for forming an organic-inorganic composite of the present invention includes other known dehydrating agents such as methyl orthoformate, methyl orthoacetate, tetraethoxysilane, various surfactants, silane coupling agents other than the above, titanium Additives such as coupling agents, dyes, dispersants, thickeners and leveling agents can also be added.
4)有機無機複合薄膜の製造法
4−1)有機無機複合薄膜形成用溶液の調製
本発明の有機無機複合薄膜形成用溶液は、溶媒中に式(I)で表される有機ケイ素化合物及び/又はその縮合物、及び、キレート化又は配位化された金属化合物、金属有機酸塩化合物、2以上の水酸基若しくは加水分解性基を有する金属化合物、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも1種の化合物を含有する。さらに、必要に応じて、水、他の添加物を含有していても良い。
4) Production method of organic-inorganic composite thin film 4-1) Preparation of organic-inorganic composite thin film forming solution The organic-inorganic composite thin film-forming solution of the present invention contains an organosilicon compound represented by the formula (I) and / or Or a condensate thereof, a chelated or coordinated metal compound, a metal organic acid salt compound, a metal compound having two or more hydroxyl groups or hydrolyzable groups, a hydrolyzate thereof, and a condensate thereof. At least one compound selected from the group consisting of: Furthermore, you may contain water and another additive as needed.
式(I)で表される有機ケイ素化合物としては、上述したものと同様であり、縮合物であることが好ましく、その平均粒径が、10nm以下であることが好ましく、4nm以下であることがより好ましい。また、キレート化又は配位化された金属化合物、金属有機酸塩化合物、2以上の水酸基若しくは加水分解性基を有する金属化合物、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも1種の化合物(以下、「金属化合物」ともいう)としては、上述したものと同様であり、加水分解物及び/又は縮合物であることが好ましく、特に、金属キレート化合物の加水分解物及び/又は縮合物が好ましく、その平均粒径としては、10nm以下であることが好ましく、7nm以下であることがより好ましい。これにより、有機無機複合体(薄膜)の透明性を向上させることができる。これらの平均粒子径は、例えば、Malvern Instruments Ltd製 HPPSを用いて測定することができる。 The organosilicon compound represented by the formula (I) is the same as described above, preferably a condensate, and preferably has an average particle size of 10 nm or less and 4 nm or less. More preferred. Also selected from the group consisting of chelated or coordinated metal compounds, metal organic acid salt compounds, metal compounds having two or more hydroxyl groups or hydrolyzable groups, hydrolysates thereof, and condensates thereof. The at least one compound (hereinafter also referred to as “metal compound”) is the same as described above, and is preferably a hydrolyzate and / or a condensate, and in particular, a hydrolyzate of a metal chelate compound and The average particle size is preferably 10 nm or less, and more preferably 7 nm or less. Thereby, the transparency of the organic-inorganic composite (thin film) can be improved. These average particle diameters can be measured using, for example, HPPS manufactured by Malvern Instruments Ltd.
用いる溶媒としては、特に制限されるものではなく、例えば、ベンゼン、トルエン、キシレン等の芳香族炭化水素類;ヘキサン、オクタン等の脂肪族炭化水素類;シクロヘキサン、シクロペンタン等の脂環族炭化水素類;アセトン、メチルエチルケトン、シクロヘキサノン等のケトン類;テトラヒドロフラン、ジオキサン等のエーテル類;酢酸エチル、酢酸ブチル等のエステル類;N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド等のアミド類;ジメチルスルホキシド等のスルホキシド類;メタノール、エタノール等のアルコール類;エチレングリコールモノメチルエーテル、エチレングリコールモノメチルエーテルアセテート等の多価アルコール誘導体類;等が挙げられる。これらの溶媒は1種単独で、あるいは2種以上を組み合わせて用いることができる。 The solvent to be used is not particularly limited. For example, aromatic hydrocarbons such as benzene, toluene and xylene; aliphatic hydrocarbons such as hexane and octane; alicyclic hydrocarbons such as cyclohexane and cyclopentane. Ketones such as acetone, methyl ethyl ketone and cyclohexanone; ethers such as tetrahydrofuran and dioxane; esters such as ethyl acetate and butyl acetate; amides such as N, N-dimethylformamide and N, N-dimethylacetamide; dimethyl sulfoxide And the like; alcohols such as methanol and ethanol; polyhydric alcohol derivatives such as ethylene glycol monomethyl ether and ethylene glycol monomethyl ether acetate; and the like. These solvents can be used alone or in combination of two or more.
本発明の有機無機複合薄膜形成用組成物中の固形分量(有機ケイ素成分及び金属化合物成分)としては、0.01〜20.0質量%であることが好ましく、0.01〜10.0質量%、0.01〜5.0質量%、0.01〜1.0質量%、0.01〜0.75質量%、0.01〜0.6質量であることがより好ましい。
有機ケイ素化合物に対する金属化合物の含有量は、有機無機複合薄膜中の含有量と同様である。
The solid content (organosilicon component and metal compound component) in the composition for forming an organic-inorganic composite thin film of the present invention is preferably 0.01 to 20.0% by mass, and 0.01 to 10.0% by mass. %, 0.01 to 5.0 mass%, 0.01 to 1.0 mass%, 0.01 to 0.75 mass%, and 0.01 to 0.6 mass% are more preferable.
The content of the metal compound relative to the organosilicon compound is the same as the content in the organic-inorganic composite thin film.
本発明の有機無機複合薄膜形成用組成物の調製方法としては、具体的には、金属化合物を溶媒に混合し、所定量の水を加え、(部分)加水分解を行い、続いて、有機ケイ素化合物を添加して(部分)加水分解する方法や、有機ケイ素化合物及び金属化合物を混合した後に、水を加えて(部分)加水分解する方法や、有機ケイ素化合物及び金属化合物を別々に(部分)加水分解したものを混合する方法を挙げることができる。水を加える必要は必ずしもないが、水を加えて(部分)加水分解物としておくことが好ましい。
水の量としては、金属化合物の種類にもよるが、例えば、金属化合物が2以上の水酸基若しくは加水分解性基を有する金属化合物の場合、金属化合物1モルに対して、0.5モル以上の水を用いることが好ましく、0.5〜2モルの水を用いることがより好ましい。また、金属化合物がキレート化又は配位化された金属化合物又は金属有機酸塩化合物の場合、キレート化又は配位化された金属化合物又は金属有機酸塩化合物1モルに対して、5〜100モルの水を用いることが好ましく、5〜20モルの水を用いることがより好ましい。
As a method for preparing the composition for forming an organic-inorganic composite thin film of the present invention, specifically, a metal compound is mixed with a solvent, a predetermined amount of water is added, (partial) hydrolysis is performed, and then organic silicon is synthesized. Method of adding (partial) hydrolysis by adding a compound, method of adding (partial) hydrolysis by adding water after mixing organosilicon compound and metal compound, or (partial) of organosilicon compound and metal compound separately The method of mixing the hydrolyzed thing can be mentioned. Although it is not always necessary to add water, it is preferable to add water to form a (partial) hydrolyzate.
The amount of water depends on the type of metal compound. For example, when the metal compound is a metal compound having two or more hydroxyl groups or hydrolyzable groups, 0.5 mol or more is used per 1 mol of the metal compound. It is preferable to use water, and it is more preferable to use 0.5 to 2 mol of water. In the case of a metal compound or metal organic acid salt compound in which the metal compound is chelated or coordinated, 5 to 100 mol per 1 mol of the chelated or coordinated metal compound or metal organic acid salt compound It is preferable to use 5 to 20 moles of water.
4−2)有機無機複合薄膜の製造法
本発明の有機無機複合薄膜は、(a)上述した有機無機複合薄膜形成用溶液を基材上に塗布し、乾燥及び/又は加熱する工程、(b)プラズマ処理もしくはUVオゾン処理を施す工程を経ることにより製造できる。
4-2) Manufacturing method of organic-inorganic composite thin film The organic-inorganic composite thin film of the present invention is obtained by (a) applying the above-described organic-inorganic composite thin film-forming solution on a substrate, drying and / or heating, (b ) It can be manufactured through a process of plasma treatment or UV ozone treatment.
有機無機複合薄膜形成用溶液の塗布方法としては、公知の塗布方法を用いることができ、例えば、ディッピング法、スプレー法、バーコート法、ロールコート法、スピンコート法、カーテンコート法、グラビア印刷法、シルクスクリーン法、インクジェット法等を挙げることができる。また、形成する膜厚としては、特に制限されるものではなく、具体的には、0.1〜200μmの範囲を例示することができる。 As a coating method of the organic / inorganic composite thin film forming solution, a known coating method can be used. For example, dipping method, spray method, bar coating method, roll coating method, spin coating method, curtain coating method, gravure printing method. , Silk screen method, ink jet method and the like. Moreover, it does not restrict | limit especially as a film thickness to form, Specifically, the range of 0.1-200 micrometers can be illustrated.
有機無機複合薄膜形成用溶液を塗布して形成した膜の乾燥・加熱処理としては、例えば、40〜200℃で、0.5〜120分程度行うことが好ましく、60〜160℃で、1〜60分程度行うことがより好ましく、60〜120℃で1〜60分程度行うことが更に好ましい。 For example, the drying / heating treatment of the film formed by applying the organic-inorganic composite thin film forming solution is preferably performed at 40 to 200 ° C for about 0.5 to 120 minutes, and at 60 to 160 ° C, 1 to More preferably, it is performed for about 60 minutes, more preferably about 60 to 120 ° C. for about 1 to 60 minutes.
加熱後の薄膜をガラス基材に形成したときの、JIS K 5600−5−4鉛筆法に規定する鉛筆硬度は、1H〜4H程度であり、基材との密着性及び硬度の点から、2H〜4Hであることが好ましい。 When the thin film after heating is formed on a glass substrate, the pencil hardness specified in the JIS K 5600-5-4 pencil method is about 1H to 4H. From the viewpoint of adhesion and hardness with the substrate, 2H It is preferably ˜4H.
本発明においてプラズマ処理とは、窒素ガス雰囲気でのコロナ放電処理、あるいはヘリウム、アルゴンなどの希ガス雰囲気でのグロープラズマ処理である。
より具体的には、電極対の少なくとも一方を誘電体で被覆した平行平板電極間に、高周波数の高電圧を印加することでプラズマを発生させ、該電極間に基材層を保持する方法、あるいは該電極間で該基材層を移動させる方法が挙げられる。プラズマ処理には、大気圧プラズマ処理と真空プラズマ処理があるが、大気圧プラズマ処理では真空プラズマ処理に比して活性種の密度が高いために、高速、高効率で電極表面の処理ができ、また処理時に真空にする必要がないために、少ない工程数で処理ができるといった利点がある。
In the present invention, the plasma treatment is a corona discharge treatment in a nitrogen gas atmosphere or a glow plasma treatment in a rare gas atmosphere such as helium or argon.
More specifically, a method of generating plasma by applying a high voltage at a high frequency between parallel plate electrodes in which at least one of the electrode pairs is coated with a dielectric, and holding a base material layer between the electrodes, Or the method of moving this base material layer between these electrodes is mentioned. Plasma processing includes atmospheric pressure plasma processing and vacuum plasma processing, but since the density of active species is higher in atmospheric pressure plasma processing than in vacuum plasma processing, electrode surfaces can be processed at high speed and high efficiency. In addition, since there is no need to use a vacuum during processing, there is an advantage that processing can be performed with a small number of steps.
大気圧プラズマ処理は、大気圧プラズマ発生装置(例えば、(株)魁半導体製の大気圧プラズマ装置S−5000、積水化学工業(株)製の常圧プラズマ表面処理装置RDシリーズ等)を用いて行うことができる。 The atmospheric pressure plasma treatment is performed using an atmospheric pressure plasma generator (for example, an atmospheric pressure plasma apparatus S-5000 manufactured by Sakai Semiconductor, an atmospheric pressure plasma surface treatment apparatus RD series manufactured by Sekisui Chemical Co., Ltd.). It can be carried out.
本発明においてUVオゾン処理とは、薄膜にUV(紫外線)を照射し、空気中の酸素をオゾンに変化させ、このオゾン及び紫外線により当該薄膜を改質することを意味する。 In the present invention, the UV ozone treatment means that the thin film is irradiated with UV (ultraviolet light), oxygen in the air is changed to ozone, and the thin film is modified by the ozone and the ultraviolet light.
UV光源は、UV照射により酸素をオゾンに変化させることができれば、特に制限されない。UV光源としては、低圧水銀ランプが挙げられる。低圧水銀ランプは185nmと254nmのUV光を発生し、185nm線が酸素をオゾンに変化させることができる。照射の際の照度は、用いる光源により異なるが、一般的に数十〜数百mW/cm2のものが使用されている。また、集光や拡散することで照度を変更することができる。照射時間は、ランプの照度及び前記未処理層の種類により異なるが、通常、1分〜24時間である。処理温度は、通常、10〜200℃である。また、UVの照射量(即ち、紫外線量)は、通常1000mJ/cm2以上であり、好ましくは1000〜100000mJ/cm2であり、より好ましくは1000〜30000mJ/cm2である。 The UV light source is not particularly limited as long as oxygen can be changed to ozone by UV irradiation. Examples of the UV light source include a low-pressure mercury lamp. Low pressure mercury lamps generate UV light at 185 nm and 254 nm, and the 185 nm line can convert oxygen to ozone. The illuminance upon irradiation varies depending on the light source used, but generally several tens to several hundreds mW / cm 2 are used. Moreover, illumination intensity can be changed by condensing or diffusing. The irradiation time varies depending on the illuminance of the lamp and the type of the untreated layer, but is usually 1 minute to 24 hours. Processing temperature is 10-200 degreeC normally. The irradiation amount of UV (i.e., ultraviolet amount) is usually 1000 mJ / cm 2 or more, preferably 1000~100000mJ / cm 2, more preferably 1000~30000mJ / cm 2.
C)第2層:金属界面活性剤の加水分解縮合物を含む層
また、本発明においては、上記有機無機複合薄膜の外側に、さらに金属界面活性剤の加水分解縮合物を含む層を設ける。当該層は、自己組織化膜であるのが好ましく、さらに、単分子膜であるのが好ましい。
C) Second layer: a layer containing a hydrolyzed condensate of a metal surfactant In the present invention, a layer containing a hydrolyzed condensate of a metal surfactant is further provided outside the organic-inorganic composite thin film. The layer is preferably a self-assembled film, and more preferably a monomolecular film.
金属界面活性剤の加水分解縮合物を含む層の製造方法は、特に限定されないが、具体的には、WO03/076064、WO2004/091810、WO2006/009292、WO2009/104424、WO2008/059840パンフレット等に記載されているように、「少なくとも1以上の加水分解性基を有する金属系界面活性剤」、「該金属系界面活性剤と相互作用し得る化合物」及び水を含む有機溶媒溶液に、前記有機無機複合薄膜が積層された基材を接触させる方法等を例示することができる。また、「少なくとも1以上の加水分解性基を有する金属系界面活性剤」、「該金属系界面活性剤と相互作用し得る化合物」及び水を含む有機溶媒溶液として、具体的には、日本曹達(株)製SAMLAY(登録商標)等を例示することができる。 The method for producing the layer containing the hydrolytic condensate of the metal surfactant is not particularly limited, and specifically, described in WO03 / 077604, WO2004 / 091810, WO2006 / 009292, WO2009 / 104424, WO2008 / 059840, etc. As described above, an organic solvent solution containing “a metal surfactant having at least one hydrolyzable group”, “a compound capable of interacting with the metal surfactant” and water is added to the organic inorganic solution. Examples thereof include a method of contacting a substrate on which a composite thin film is laminated. Further, as an organic solvent solution containing "a metal surfactant having at least one hydrolyzable group", "a compound capable of interacting with the metal surfactant" and water, specifically, Nippon Soda Examples thereof include SAMLAY (registered trademark) manufactured by Co., Ltd.
「少なくとも1以上の水酸基又は加水分解性基を有する金属系界面活性剤」としては、少なくとも1以上の水酸基又は加水分解可能な官能基と疎水性基とを同一分子内に有するものであれば、特に制限されないが、基材表面上の活性水素と反応して結合を形成することができる加水分解性基を有するものが好ましい。尚、水酸基、特に金属原子に直接結合している水酸基は、活性水素と反応して結合を形成することができる。
少なくとも1以上の水酸基又は加水分解性基を有する金属系界面活性剤として、具体的には、式(II)
R11 SM11X11 t−s (II)
〔式中、R11は、置換基を有していてもよい炭素数1〜30の炭化水素基、置換基を有していてもよい炭素数1〜30のハロゲン化炭化水素基、連結基を含む炭素数1〜30の炭化水素基、又は連結基を含む炭素数1〜30のハロゲン化炭化水素基を表し、M11は、ケイ素原子、ゲルマニウム原子、スズ原子、チタン原子、及びジルコニウム原子からなる群から選ばれる少なくとも1種の金属原子を表し、X11は、水酸基又は加水分解性基を表し、tはMの原子価を表す。sは、1から(t−1)のいずれかの正整数を表し、sが2以上の場合、R11は、互いに同一でも相異なっていてもよい。(t−s)が2以上の場合、X11は同一であっても、相異なっていてもよいが、X11のうち、少なくとも1個は加水分解性基である。〕で示される金属系界面活性剤を好ましく例示することができる。
As the “metal surfactant having at least one hydroxyl group or hydrolyzable group”, if it has at least one hydroxyl group or hydrolyzable functional group and hydrophobic group in the same molecule, Although it does not restrict | limit in particular, What has a hydrolysable group which can react with the active hydrogen on the base-material surface and can form a bond is preferable. A hydroxyl group, particularly a hydroxyl group directly bonded to a metal atom can react with active hydrogen to form a bond.
As the metal surfactant having at least one hydroxyl group or hydrolyzable group, specifically, the formula (II)
R 11 S M 11 X 11 t -s (II)
[Wherein, R 11 represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, a halogenated hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, or a linking group. Represents a hydrocarbon group having 1 to 30 carbon atoms or a halogenated hydrocarbon group having 1 to 30 carbon atoms including a linking group, and M 11 represents a silicon atom, a germanium atom, a tin atom, a titanium atom, and a zirconium atom. Represents at least one metal atom selected from the group consisting of: X 11 represents a hydroxyl group or a hydrolyzable group, and t represents the valence of M. s represents any positive integer from 1 to (t−1), and when s is 2 or more, R 11 may be the same as or different from each other. When (ts) is 2 or more, X 11 may be the same or different, but at least one of X 11 is a hydrolyzable group. The metal-type surfactant shown by this can be illustrated preferably.
前記「置換基を有していてもよい炭素数1〜30の炭化水素基」の炭化水素基としては、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、sec−ブチル基、t−ブチル基、n−ペンチル基、イソペンチル基、ネオペンチル基、t−ペンチル基、n−へキシル基、イソへキシル基、n−ヘプチル基、n−オクチル基、n−デシル基等の炭素数1〜30のアルキル基;ビニル基、アリル基、プロペニル基等の炭素数2〜30のアルケニル基;フェニル基、ナフチル基等のアリール基等が挙げられる。 Examples of the hydrocarbon group of the “optionally substituted hydrocarbon group having 1 to 30 carbon atoms” include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, t-butyl group, n-pentyl group, isopentyl group, neopentyl group, t-pentyl group, n-hexyl group, isohexyl group, n-heptyl group, n-octyl group, n-decyl An alkyl group having 1 to 30 carbon atoms such as a group; an alkenyl group having 2 to 30 carbon atoms such as a vinyl group, an allyl group and a propenyl group; and an aryl group such as a phenyl group and a naphthyl group.
前記「置換基を有していてもよい炭素数1〜30のハロゲン化炭化水素基」のハロゲン化炭化水素基としては、炭素数1〜30のハロゲン化アルキル基、炭素数1〜30のハロゲン化アルケニル基、ハロゲン化アリール基等が挙げられる。ハロゲン原子としては、フッ素原子、塩素原子、臭素原子等が挙げられ、フッ素原子が好ましい。具体的には、上記例示した炭化水素基中の水素原子の1個以上がフッ素原子、塩素原子又は臭素原子等のハロゲン原子に置換された基が挙げられる。 Examples of the halogenated hydrocarbon group of the “optionally substituted halogenated hydrocarbon group having 1 to 30 carbon atoms” include a halogenated alkyl group having 1 to 30 carbon atoms and a halogen having 1 to 30 carbon atoms. Alkenyl group, halogenated aryl group and the like. As a halogen atom, a fluorine atom, a chlorine atom, a bromine atom, etc. are mentioned, A fluorine atom is preferable. Specific examples include groups in which one or more of the hydrogen atoms in the hydrocarbon groups exemplified above are substituted with a halogen atom such as a fluorine atom, a chlorine atom or a bromine atom.
これらの中でも、前記炭素数1〜30のハロゲン化炭化水素基としては、炭素数1〜30のアルキル基中の水素原子の2個以上がハロゲン原子に置換された基が好ましく、炭素数1〜30のアルキル基中の水素原子の2個以上がフッ素原子に置換されたフッ素化アルキル基がより好ましい。また、フッ素化アルキル基が分岐構造を有する場合には、分岐部分は炭素数1〜4、好ましくは炭素数1〜2の短鎖であるのが好ましい。 Among these, the halogenated hydrocarbon group having 1 to 30 carbon atoms is preferably a group in which two or more hydrogen atoms in the alkyl group having 1 to 30 carbon atoms are substituted with halogen atoms. More preferred is a fluorinated alkyl group in which two or more of the hydrogen atoms in 30 alkyl groups are substituted with fluorine atoms. In addition, when the fluorinated alkyl group has a branched structure, the branched portion is preferably a short chain having 1 to 4 carbon atoms, preferably 1 to 2 carbon atoms.
フッ素化アルキル基としては、末端炭素原子にフッ素原子が1個以上結合した基が好ましく、末端炭素原子にフッ素原子が3個結合したCF3基部分を有する基がより好ましい。末端が、フッ素原子が置換しない炭化水素基であり、内部の炭素鎖にフッ素原子が置換した炭素鎖であっても構わない。末端部分に、アルキル基の全ての水素原子がフッ素原子に置換されたペルフルオロアルキル部分を有し、かつ後述する金属原子Mとの間に、−(CH2)h−(式中、hは1〜6の整数を表し、好ましくは2〜4の整数である。)で表されるアルキレン基を有する基が特に好ましい。 As the fluorinated alkyl group, a group in which one or more fluorine atoms are bonded to the terminal carbon atom is preferable, and a group having a CF 3 group portion in which three fluorine atoms are bonded to the terminal carbon atom is more preferable. The terminal may be a hydrocarbon group that is not substituted by a fluorine atom, and may be a carbon chain in which a fluorine atom is substituted on an internal carbon chain. The terminal portion has a perfluoroalkyl portion in which all the hydrogen atoms of the alkyl group are substituted with fluorine atoms, and-(CH 2 ) h- (wherein h is 1) with the metal atom M described later. Represents an integer of ˜6, preferably an integer of 2 to 4.), and particularly preferred is a group having an alkylene group.
フッ素化アルキル基中のフッ素原子数は、[(フッ素化アルキル基中のフッ素原子数)/(フッ素化アルキル基に対応する同一炭素数のアルキル基中に存在する水素原子数)×100]%で表現したときに、60%以上であることが好ましく、80%以上であることがより好ましい。 The number of fluorine atoms in the fluorinated alkyl group is [(number of fluorine atoms in the fluorinated alkyl group) / (number of hydrogen atoms present in the alkyl group having the same carbon number corresponding to the fluorinated alkyl group) × 100]%. Is preferably 60% or more, and more preferably 80% or more.
前記「置換基を有していてもよい炭素数1〜30の炭化水素基」又は「置換基を有していてもよい炭素数1〜30のハロゲン化炭化水素基」の置換基としては、カルボキシル基;アミド基;イミド基;エステル基;メトキシ基、エトキシ基等のアルコキシ基;または水酸基等が挙げられる。これらの置換基の数は0〜3であることが好ましい。 As the substituent of the “optionally substituted hydrocarbon group having 1 to 30 carbon atoms” or the “optionally substituted halogenated hydrocarbon group having 1 to 30 carbon atoms”, Examples thereof include a carboxyl group; an amide group; an imide group; an ester group; an alkoxy group such as a methoxy group and an ethoxy group; or a hydroxyl group. The number of these substituents is preferably 0-3.
前記「連結基を含む炭素数1〜30の炭化水素基」の炭化水素基としては、具体的には、前記「置換基を有していてもよい炭素数1〜30の炭化水素基」の炭化水素基として挙げたものと同様のものが挙げられる。 Specifically, the hydrocarbon group of the “hydrocarbon group having 1 to 30 carbon atoms including a linking group” is the “hydrocarbon group having 1 to 30 carbon atoms which may have a substituent”. The thing similar to what was mentioned as a hydrocarbon group is mentioned.
また、「連結基を含む炭素数1〜30のハロゲン化炭化水素基」のハロゲン化炭化水素基としては、具体的には、前記「置換基を有していてもよい炭素数1〜30のハロゲン化炭化水素基」のハロゲン化炭化水素基として挙げたものと同様のものが挙げられる。 In addition, as the halogenated hydrocarbon group of the “halogenated hydrocarbon group having 1 to 30 carbon atoms including a linking group”, specifically, the “optionally substituted substituent having 1 to 30 carbon atoms” may be used. The thing similar to what was mentioned as a halogenated hydrocarbon group of a "halogenated hydrocarbon group" is mentioned.
前記連結基は、炭化水素基若しくはハロゲン化炭化水素基の炭素−炭素結合間、又は炭化水素基の炭素と後述する金属原子Mとの間に存在するのが好ましい。 The linking group is preferably present between carbon-carbon bonds of a hydrocarbon group or a halogenated hydrocarbon group, or between carbon of the hydrocarbon group and a metal atom M described later.
連結基の具体例としては、−O−、−S−、−SO2−、−CO−、−C(=O)O−又は−C(=O)NR51−(式中、R51は、水素原子;メチル基、エチル基、n−プロピル基、イソプロピル基等のアルキル基を表す。)等が挙げられる。 Specific examples of the linking group include —O—, —S—, —SO 2 —, —CO—, —C (═O) O— or —C (═O) NR 51 — (wherein R 51 represents A hydrogen atom; an alkyl group such as a methyl group, an ethyl group, an n-propyl group or an isopropyl group).
これらの中でも、R11としては、撥水性、耐久性の観点から、炭素数1〜30のアルキル基、炭素数1〜30のフッ素化アルキル基、又は連結基を含むフッ素化アルキル基であるのが好ましい。 Among these, R 11 is a C 1-30 alkyl group, a C 1-30 fluorinated alkyl group, or a fluorinated alkyl group containing a linking group from the viewpoint of water repellency and durability. Is preferred.
R11のより好ましい具体例としては、CH3−、CH3CH2−、(CH3)2CH−、(CH3)3C−、CH3(CH2)2−、CH3(CH2)3−、CH3(CH2)4−、CH3(CH2)5−、CH3(CH2)6−、CH3(CH2)7−、CH3(CH2)8−、CH3(CH2)9−、CH3(CH2)10−、CH3(CH2)11−、CH3(CH2)12−、CH3(CH2)13−、CH3(CH2)14−、CH3(CH2)15−、CH3(CH2)16−、CH3(CH2)17−、CH3(CH2)18−、CH3(CH2)19−、CH3(CH2)20−、CH3(CH2)21−、CH3(CH2)22−、CH3(CH2)23−、CH3(CH2)24−、CH3(CH2)25−、CF3−、CF3CF2−、(CF3)2CF−、(CF3)3C−、CF3(CH2)2−、CF3(CF2)3(CH2)2−、CF3(CF2)5(CH2)2−、CF3(CF2)7(CH2)2−、CF3(CF2)3(CH2)3−、CF3(CF2)5(CH2)3−、CF3(CF2)7(CH2)3−、CF3(CF2)9(CH2)2−、CF3(CF2)6(CH2)2−、CF3(CF2)4O(CF2)2(CH2)2−、CF3(CF2)4O(CF2)2(CH2)3−、CF3(CF2)7O(CF2)2(CH2)2−、CF3(CF2)7CONH(CH2)2−、CF3(CF2)7CONH(CH2)3−、CF3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)CONH(CH2)3−、CH3(CF2)7(CH2)2−、CH3(CF2)8(CH2)2−、CH3(CF2)9(CH2)2−、CH3(CF2)10(CH2)2−、CH3(CF2)11(CH2)2−、CH3(CF2)12(CH2)2−、CH3(CF2)7(CH2)3−、CH3(CF2)9(CH2)3−、CH3(CF2)11(CH2)3−、CH3CH2(CF2)6(CH2)2−、CH3CH2(CF2)8(CH2)2−、CH3CH2(CF2)10(CH2)2−、CH3(CF2)4O(CF2)2(CH2)2−、CH3(CF2)7(CH2)2O(CH2)3−、CH3(CF2)8(CH2)2O(CH2)3−、CH3(CF2)9(CH2)2O(CH2)3−、CH3CH2(CF2)6(CH2)2O(CH2)3−、CH3(CF2)6CONH(CH2)3−、CH3(CF2)8CONH(CH2)3−、CH3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)CONH(CH2)3−、等が挙げられるが、これらに限定されるものではない。 More preferred specific examples of R 11 include CH 3 —, CH 3 CH 2 —, (CH 3 ) 2 CH—, (CH 3 ) 3 C—, CH 3 (CH 2 ) 2 —, CH 3 (CH 2 ) 3 -, CH 3 (CH 2) 4 -, CH 3 (CH 2) 5 -, CH 3 (CH 2) 6 -, CH 3 (CH 2) 7 -, CH 3 (CH 2) 8 -, CH 3 (CH 2) 9 -, CH 3 (CH 2) 10 -, CH 3 (CH 2) 11 -, CH 3 (CH 2) 12 -, CH 3 (CH 2) 13 -, CH 3 (CH 2) 14 -, CH 3 (CH 2 ) 15 -, CH 3 (CH 2) 16 -, CH 3 (CH 2) 17 -, CH 3 (CH 2) 18 -, CH 3 (CH 2) 19 -, CH 3 (CH 2) 20 -, CH 3 (CH 2) 21 -, CH 3 (C 2) 22 -, CH 3 ( CH 2) 23 -, CH 3 (CH 2) 24 -, CH 3 (CH 2) 25 -, CF 3 -, CF 3 CF 2 -, (CF 3) 2 CF-, (CF 3 ) 3 C—, CF 3 (CH 2 ) 2 —, CF 3 (CF 2 ) 3 (CH 2 ) 2 —, CF 3 (CF 2 ) 5 (CH 2 ) 2 —, CF 3 (CF 2 ) 7 (CH 2 ) 2 —, CF 3 (CF 2 ) 3 (CH 2 ) 3 —, CF 3 (CF 2 ) 5 (CH 2 ) 3 —, CF 3 (CF 2 ) 7 (CH 2 ) 3 — , CF 3 (CF 2 ) 9 (CH 2 ) 2 —, CF 3 (CF 2 ) 6 (CH 2 ) 2 —, CF 3 (CF 2 ) 4 O (CF 2 ) 2 (CH 2 ) 2 —, CF 3 (CF 2 ) 4 O (CF 2 ) 2 (CH 2 ) 3 —, CF 3 (CF 2 ) 7 O (C F 2 ) 2 (CH 2 ) 2 —, CF 3 (CF 2 ) 7 CONH (CH 2 ) 2 —, CF 3 (CF 2 ) 7 CONH (CH 2 ) 3 —, CF 3 (CF 2 ) 3 O [ CF (CF 3 ) CF (CF 3 ) O] 2 CF (CF 3 ) CONH (CH 2 ) 3 —, CH 3 (CF 2 ) 7 (CH 2 ) 2 —, CH 3 (CF 2 ) 8 (CH 2 ) 2− , CH 3 (CF 2 ) 9 (CH 2 ) 2 —, CH 3 (CF 2 ) 10 (CH 2 ) 2 —, CH 3 (CF 2 ) 11 (CH 2 ) 2 —, CH 3 (CF 2 ) 12 (CH 2 ) 2 —, CH 3 (CF 2 ) 7 (CH 2 ) 3 —, CH 3 (CF 2 ) 9 (CH 2 ) 3 —, CH 3 (CF 2 ) 11 (CH 2 ) 3 -, CH 3 CH 2 (CF 2) 6 (CH 2) 2 -, CH 3 CH 2 (CF 2 ) 8 (CH 2 ) 2 —, CH 3 CH 2 (CF 2 ) 10 (CH 2 ) 2 —, CH 3 (CF 2 ) 4 O (CF 2 ) 2 (CH 2 ) 2 —, CH 3 (CF 2 ) 7 (CH 2 ) 2 O (CH 2 ) 3 —, CH 3 (CF 2 ) 8 (CH 2 ) 2 O (CH 2 ) 3 —, CH 3 (CF 2 ) 9 (CH 2 ) 2 O (CH 2 ) 3 —, CH 3 CH 2 (CF 2 ) 6 (CH 2 ) 2 O (CH 2 ) 3 —, CH 3 (CF 2 ) 6 CONH (CH 2 ) 3 —, CH 3 (CF 2 ) 8 CONH (CH 2 ) 3 —, CH 3 (CF 2 ) 3 O [CF (CF 3 ) CF (CF 3 ) O] 2 CF (CF 3 ) CONH (CH 2 ) 3 —, and the like. However, it is not limited to these.
Mは、ケイ素原子、ゲルマニウム原子、スズ原子、チタン原子、及びジルコニウム原子からなる群から選ばれる1種の原子を表す。これらの中でも、原料の入手容易性、反応性等の観点からケイ素原子が特に好ましい。 M represents one kind of atom selected from the group consisting of a silicon atom, a germanium atom, a tin atom, a titanium atom, and a zirconium atom. Among these, a silicon atom is particularly preferable from the viewpoints of availability of raw materials and reactivity.
X11は、水酸基又は加水分解性基を表し、加水分解性基としては、水と反応して分解する基であれば特に制約されない。具体的には、置換基を有していてもよい炭素数1〜6のアルコキシ基;置換基を有していてもよい炭化水素オキシ基(ただし、アルコキシ基を除く);置換基を有していてもよいアシルオキシ基;フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン原子;イソシアネート基;シアノ基;アミノ基;又はアミド基等を例示することができる。 X 11 represents a hydroxyl group or a hydrolyzable group, and the hydrolyzable group is not particularly limited as long as it is a group that reacts with water and decomposes. Specifically, the C1-C6 alkoxy group which may have a substituent; The hydrocarbon oxy group (however, except an alkoxy group) which may have a substituent; An acyloxy group which may be present; halogen atoms such as fluorine atom, chlorine atom, bromine atom and iodine atom; isocyanate group; cyano group; amino group;
「炭素数1〜6のアルコキシ基」としては、メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、sec−ブトキシ基、t−ブトキシ基、n−ペンチルオキシ基、n−へキシルオキシ基等が挙げられる。 Examples of the “C 1-6 alkoxy group” include methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, sec-butoxy group, t-butoxy group, n-pentyloxy group, n -A hexyloxy group etc. are mentioned.
アルコキシ基以外の「炭化水素オキシ基」としては、シクロプロピルオキシ基、シクロプロピルメチルオキシ、シクロヘキシル基等の脂環式炭化水素オキシ基;ビニルオキシ基、アリルオキシ基、ノルボニルオキシ基等のアルケニルオキシ基;プロパルギルオキシ基等のアルキニルオキシ基;フェノキシ基、ナフチルオキシ基等のアリールオキシ基;ベンジルオキシ基、フェネチルオキシ基等のアリールアルキルオキシ基、
「アシルオキシ基」としては、アセトキシ基、プロピオニルオキシ基等のアルキルカルボニルオキシ基;(メタ)アクリロイオキシ基等のアルケニルカルボニルオキシ基;ベンゾイルオキシ基等のアリールカルボニルオキシ基等が挙げられる。
“Hydrocarbonoxy group” other than alkoxy group includes cycloaliphatic hydrocarbonoxy group such as cyclopropyloxy group, cyclopropylmethyloxy and cyclohexyl group; alkenyloxy group such as vinyloxy group, allyloxy group and norbornyloxy group An alkynyloxy group such as a propargyloxy group; an aryloxy group such as a phenoxy group or a naphthyloxy group; an arylalkyloxy group such as a benzyloxy group or a phenethyloxy group;
Examples of the “acyloxy group” include an alkylcarbonyloxy group such as an acetoxy group and a propionyloxy group; an alkenylcarbonyloxy group such as a (meth) acryloyloxy group; an arylcarbonyloxy group such as a benzoyloxy group.
X11中の「置換基を有しても良い」の置換基としては、カルボキシル基、アミド基、イミド基、エステル基、水酸基等が挙げられる。
X11としては、特に、水酸基、ハロゲン原子、炭素数1〜6のアルコキシ基、アシルオキシ基、又はイソシアネート基が好ましく、炭素数1〜4のアルコキシ基又はアシルオキシ基がより好ましい。
Examples of the substituent “may have a substituent” in X 11 include a carboxyl group, an amide group, an imide group, an ester group, and a hydroxyl group.
X 11 is particularly preferably a hydroxyl group, a halogen atom, an alkoxy group having 1 to 6 carbon atoms, an acyloxy group, or an isocyanate group, and more preferably an alkoxy group having 1 to 4 carbon atoms or an acyloxy group.
mは、金属原子Mの原子価を表す。
nは、1から(m−1)のいずれかの正の整数を表す。高密度の有機薄膜を製造する上では、nは1であるのが好ましい。nが2以上のとき、R1は同一であっても相異なっていてもよい。また、(m−n)が2以上のとき、X11は同一であっても相異なっていてもよいが、Xのうち少なくとも1個は水酸基又は加水分解性基である。
m represents the valence of the metal atom M.
n represents any positive integer from 1 to (m−1). In producing a high-density organic thin film, n is preferably 1. When n is 2 or more, R 1 may be the same or different. When (mn) is 2 or more, X 11 may be the same or different, but at least one of X is a hydroxyl group or a hydrolyzable group.
式(II)で表される化合物中、好ましい態様の一つとして、式(III)
(R23)(R22)(R21)C[C(R31)(R32)]p(R4)qM11YrX11 m−r−1 (III)
で表される化合物を例示することができる。
式中、M11、X11及びmは前記と同じ意味を表す。R21〜R23、R31及びR32は、それぞれ独立して水素原子又はフッ素原子を表し、R4は、アルキレン基、ビニレン基、エチニレン基、アリーレン基、又はケイ素原子及び/若しくは酸素原子を含む2価の連結基を表す。Yは、アルキル基、アルコキシ基、含フッ素アルキル基又は含フッ素アルコキシ基を表す。pは0又は自然数を表し、qは0又は1を表す。pが2以上のとき、式:C(R31)(R32)で表される基は同一であっても異なっていてもよい。rは0又は1から(m−2)のいずれかの正整数を表し、rが2以上のとき、Yは同一でも相異なっていてもよく、(m−r−1)が2以上のとき、X11は同一でも相異なっていてもよい。但し、Y及びX11のうち、少なくとも1個は水酸基又は加水分解性基である。
Among the compounds represented by formula (II), as one of preferred embodiments, formula (III)
(R 23) (R 22) (R 21) C [C (R 31) (R 32)] p (R 4) q M 11 Y r X 11 m-r-1 (III)
The compound represented by these can be illustrated.
In the formula, M 11 , X 11 and m represent the same meaning as described above. R 21 to R 23 , R 31 and R 32 each independently represent a hydrogen atom or a fluorine atom, and R 4 represents an alkylene group, a vinylene group, an ethynylene group, an arylene group, or a silicon atom and / or an oxygen atom. Represents a divalent linking group. Y represents an alkyl group, an alkoxy group, a fluorine-containing alkyl group or a fluorine-containing alkoxy group. p represents 0 or a natural number, and q represents 0 or 1. When p is 2 or more, the groups represented by the formula: C (R 31 ) (R 32 ) may be the same or different. r represents a positive integer from 0 or 1 to (m−2), and when r is 2 or more, Y may be the same or different, and (m−r−1) is 2 or more. , X 11 may be the same or different. However, at least one of Y and X 11 is a hydroxyl group or a hydrolyzable group.
式(III)中、R4として、具体的には、下記式に示す官能基を例示することができる。 Specific examples of R 4 in formula (III) include functional groups represented by the following formula.
上記式中、a及びbは1以上の任意の自然数を表す。
Yは、メチル基、エチル基、n−プロピル基、イソプロピル基、n−ブチル基、イソブチル基、sec−ブチル基、t−ブチル基、n−ペンチル基、イソペンチル基、ネオペンチル基、t−ペンチル基、n−へキシル基、イソへキシル基等のアルキル基;メトキシ基、エトキシ基、n−プロポキシ基、イソプロポキシ基、n−ブトキシ基、sec−ブトキシ基、t−ブトキシ基、n−ペンチルオキシ基、n−へキシルオキシ基等のアルコキシ基;アルキル基の一部又はすべての水素原子がフッ素原子に置換された含フッ素アルキル基;又はアルコキシ基の一部若しくはすべての水素原子がフッ素原子に置換された含フッ素アルコキシ基等を表す。
In the above formula, a and b represent an arbitrary natural number of 1 or more.
Y is methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, t-butyl group, n-pentyl group, isopentyl group, neopentyl group, t-pentyl group. Alkyl groups such as n-hexyl group and isohexyl group; methoxy group, ethoxy group, n-propoxy group, isopropoxy group, n-butoxy group, sec-butoxy group, t-butoxy group, n-pentyloxy Group, an alkoxy group such as n-hexyloxy group; a fluorinated alkyl group in which part or all of the hydrogen atoms in the alkyl group are substituted with fluorine atoms; or a part or all of the hydrogen atoms in the alkoxy group are substituted with fluorine atoms Represents a fluorine-containing alkoxy group.
rは、0又は1から(m−2)のいずれかの正整数を表すが、高密度の吸着膜を製造するためには、rは0であることが好ましい。rが2以上の場合に、Yは、それぞれ同一でも相異なっていてもよい。(m−r−1)が2以上の場合に、Xは、それぞれ同一でも相異なっていてもよい。但し、Y及びXのうち、少なくとも1個は水酸基又は加水分解性基である。 r represents a positive integer of 0 or 1 to (m−2), and r is preferably 0 in order to produce a high-density adsorbed film. When r is 2 or more, Y may be the same or different. When (m-r-1) is 2 or more, Xs may be the same or different from each other. However, at least one of Y and X is a hydroxyl group or a hydrolyzable group.
式(II)で表される化合物の具体例としては、下記に示すものが挙げられる。なお、以下においては、金属原子Mがケイ素原子である化合物を代表例として示しているが、本発明はこれらに限定されるものではない。また、加水分解性基についても、例示した官能基に限定されず他の加水分解性基が結合したものであってもよい。 Specific examples of the compound represented by the formula (II) include those shown below. In the following, compounds in which the metal atom M is a silicon atom are shown as representative examples, but the present invention is not limited to these. Also, the hydrolyzable group is not limited to the exemplified functional groups, and may be one in which another hydrolyzable group is bonded.
CH3CH2O(CH2)15Si(OCH3)3
CF3CH2O(CH2)15Si(OCH3)3
CH3(CH2)2Si(CH3)2(CH2)15Si(OCH3)3
CH3(CH2)6Si(CH3)2(CH2)9Si(OCH3)3
CH3COO(CH2)15Si(OCH3)3
CF3(CF2)5(CH2)2Si(OCH3)3
CF3(CF2)7−(CH=CH)3−Si(OCH3)3
CH3CH2O(CH2)15Si(OC2H5)3
CH3(CH2)2Si(CH3)2(CH2)15Si(OC2H5)3
CH3(CH2)6Si(CH3)2(CH2)9Si(OC2H5)3
CF3(CH2)6Si(CH3)2(CH2)9Si(OC2H5)3
CH3COO(CH2)15Si(OC2H5)3
CF3COO(CH2)15Si(OC2H5)3
CF3COO(CH2)15Si(OCH3)3
CF3(CF2)9(CH2)2Si(OC2H5)3
CF3(CF2)7(CH2)2Si(OC2H5)3
CF3(CF2)5(CH2)2Si(OC2H5)3
CF3(CF2)7(CH=CH)3Si(OC2H5)3
CF3(CF2)9(CH2)2Si(OCH3)3
CF3(CF2)5(CH2)2Si(OCH3)3
CF3(CF2)7(CH2)2Si(CH3)(OC2H5)2
CF3(CF2)7(CH2)2Si(CH3)(OCH3)2
CF3(CF2)7(CH2)2Si(CH3)2(OC2H5)
CF3(CF2)7(CH2)2Si(CH3)2(OCH3)
CH 3 CH 2 O (CH 2 ) 15 Si (OCH 3 ) 3
CF 3 CH 2 O (CH 2 ) 15 Si (OCH 3) 3
CH 3 (CH 2) 2 Si (CH 3) 2 (CH 2) 15 Si (OCH 3) 3
CH 3 (CH 2) 6 Si (CH 3) 2 (CH 2) 9 Si (OCH 3) 3
CH 3 COO (CH 2) 15 Si (OCH 3) 3
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (OCH 3 ) 3
CF 3 (CF 2) 7 - (CH = CH) 3 -Si (OCH 3) 3
CH 3 CH 2 O (CH 2 ) 15 Si (OC 2 H 5 ) 3
CH 3 (CH 2) 2 Si (CH 3) 2 (CH 2) 15 Si (OC 2 H 5) 3
CH 3 (CH 2) 6 Si (CH 3) 2 (CH 2) 9 Si (OC 2 H 5) 3
CF 3 (CH 2) 6 Si (CH 3) 2 (CH 2) 9 Si (OC 2 H 5) 3
CH 3 COO (CH 2) 15 Si (OC 2 H 5) 3
CF 3 COO (CH 2) 15 Si (OC 2 H 5) 3
CF 3 COO (CH 2 ) 15 Si (OCH 3 ) 3
CF 3 (CF 2 ) 9 (CH 2 ) 2 Si (OC 2 H 5 ) 3
CF 3 (CF 2 ) 7 (CH 2 ) 2 Si (OC 2 H 5 ) 3
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (OC 2 H 5 ) 3
CF 3 (CF 2 ) 7 (CH═CH) 3 Si (OC 2 H 5 ) 3
CF 3 (CF 2 ) 9 (CH 2 ) 2 Si (OCH 3 ) 3
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (OCH 3 ) 3
CF 3 (CF 2) 7 ( CH 2) 2 Si (CH 3) (OC 2 H 5) 2
CF 3 (CF 2) 7 ( CH 2) 2 Si (CH 3) (OCH 3) 2
CF 3 (CF 2) 7 ( CH 2) 2 Si (CH 3) 2 (OC 2 H 5)
CF 3 (CF 2 ) 7 (CH 2 ) 2 Si (CH 3 ) 2 (OCH 3 )
CF3(CH2)2Si(OCH3)3
CF3(CF2)3(CH2)2Si(OCH3)3
CF3(CF2)5(CH2)2Si(OCH3)3
CF3(CF2)7(CH2)2Si(OCH3)3
CF3(CF2)3(CH2)3Si(OCH3)3
CF3(CF2)5(CH2)3Si(OCH3)3
CF3(CF2)7(CH2)3Si(OCH3)3
CF3(CF2)4O(CF2)2(CH2)2Si(OCH3)3
CF3(CF2)4O(CF2)2(CH2)3Si(OCH3)3
CF3(CF2)7(CH2)2O(CH2)3Si(OCH3)3
CF3(CF2)7CONH(CH2)2Si(OCH3)3
CF3(CF2)7CONH(CH2)3Si(OCH3)3
CF3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)−
CONH(CH2)3Si(OCH3)3
CF 3 (CH 2 ) 2 Si (OCH 3 ) 3
CF 3 (CF 2 ) 3 (CH 2 ) 2 Si (OCH 3 ) 3
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (OCH 3 ) 3
CF 3 (CF 2 ) 7 (CH 2 ) 2 Si (OCH 3 ) 3
CF 3 (CF 2 ) 3 (CH 2 ) 3 Si (OCH 3 ) 3
CF 3 (CF 2 ) 5 (CH 2 ) 3 Si (OCH 3 ) 3
CF 3 (CF 2 ) 7 (CH 2 ) 3 Si (OCH 3 ) 3
CF 3 (CF 2 ) 4 O (CF 2 ) 2 (CH 2 ) 2 Si (OCH 3 ) 3
CF 3 (CF 2 ) 4 O (CF 2 ) 2 (CH 2 ) 3 Si (OCH 3 ) 3
CF 3 (CF 2 ) 7 (CH 2 ) 2 O (CH 2 ) 3 Si (OCH 3 ) 3
CF 3 (CF 2 ) 7 CONH (CH 2 ) 2 Si (OCH 3 ) 3
CF 3 (CF 2 ) 7 CONH (CH 2 ) 3 Si (OCH 3 ) 3
CF 3 (CF 2) 3 O [CF (CF 3) CF (CF 3) O] 2 CF (CF 3) -
CONH (CH 2 ) 3 Si (OCH 3 ) 3
CF3(CF2)3(CH2)2Si(CH3)(OCH3)2
CF3(CF2)5(CH2)2Si(CH3)(OCH3)2
CF3(CH2)2Si(CH3)(OCH3)2
CF3(CF2)3(CH2)3Si(CH3)(OCH3)2
CF3(CF2)5(CH2)3Si(CH3)(OCH3)2
CF3(CF2)7(CH2)3Si(CH3)(OCH3)2
CF3(CF2)4(CF2)2(CH2)2Si(CH3)(OCH3)2
CF3(CF2)4(CF2)2(CH2)3Si(CH3)(OCH3)2
CF3(CF2)4(CH2)2O(CH2)3Si(CH3)(OCH3)2
CF3(CF2)7CONH(CH2)2Si(CH3)(OCH3)2
CF3(CF2)7CONH(CH2)3Si(CH3)(OCH3)2
CF3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)−
CONH(CH2)3Si(CH3)(OCH3)2
CH3(CH2)7Si(OCH3)3
CH3(CF2)7(CH2)2Si(OCH3)3
CH3(CF2)7(CH2)2Si(CH3)(OCH3)2
CH3(CF2)7(CH2)2Si(OCH3)3
CH3(CF2)7(CH2)2Si(NCO)3
CH3(CF2)8(CH2)2Si(OCH3)3
CH3(CF2)8(CH2)2Si(NCO)3
CH3(CF2)9(CH2)2Si(OCH3)3
CH3(CF2)9(CH2)2Si(NCO)3
CH3CH2(CF2)6(CH2)2Si(OCH3)3
CH3CH2(CF2)6(CH2)2Si(NCO)3
CH3CH2(CF2)8(CH2)2Si(OCH3)3
CH3CH2(CF2)8(CH2)2Si(NCO)3
CH3CH2(CF2)10(CH2)2Si(OCH3)3
CH3(CF2)4O(CF2)2(CH2)2Si(OCH3)3
CH3(CF2)7(CH2)2O(CH2)3Si(OCH3)3
CH3(CF2)8(CH2)2O(CH2)3Si(OCH3)3
CH3(CF2)9(CH2)2O(CH2)3Si(OCH3)3
CH3CH2(CF2)6(CH2)2O(CH2)3Si(OCH3)3
CH3(CF2)6CONH(CH2)3Si(OCH3)3
CH3(CF2)8CONH(CH2)3Si(OCH3)3
CH3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)−
CONH(CH2)3Si(OCH3)3
CF 3 (CF 2) 3 ( CH 2) 2 Si (CH 3) (OCH 3) 2
CF 3 (CF 2) 5 ( CH 2) 2 Si (CH 3) (OCH 3) 2
CF 3 (CH 2) 2 Si (CH 3) (OCH 3) 2
CF 3 (CF 2 ) 3 (CH 2 ) 3 Si (CH 3 ) (OCH 3 ) 2
CF 3 (CF 2) 5 ( CH 2) 3 Si (CH 3) (OCH 3) 2
CF 3 (CF 2) 7 ( CH 2) 3 Si (CH 3) (OCH 3) 2
CF 3 (CF 2 ) 4 (CF 2 ) 2 (CH 2 ) 2 Si (CH 3 ) (OCH 3 ) 2
CF 3 (CF 2 ) 4 (CF 2 ) 2 (CH 2 ) 3 Si (CH 3 ) (OCH 3 ) 2
CF 3 (CF 2) 4 ( CH 2) 2 O (CH 2) 3 Si (CH 3) (OCH 3) 2
CF 3 (CF 2 ) 7 CONH (CH 2 ) 2 Si (CH 3 ) (OCH 3 ) 2
CF 3 (CF 2) 7 CONH (CH 2) 3 Si (CH 3) (OCH 3) 2
CF 3 (CF 2) 3 O [CF (CF 3) CF (CF 3) O] 2 CF (CF 3) -
CONH (CH 2 ) 3 Si (CH 3 ) (OCH 3 ) 2
CH 3 (CH 2 ) 7 Si (OCH 3 ) 3
CH 3 (CF 2 ) 7 (CH 2 ) 2 Si (OCH 3 ) 3
CH 3 (CF 2) 7 ( CH 2) 2 Si (CH 3) (OCH 3) 2
CH 3 (CF 2 ) 7 (CH 2 ) 2 Si (OCH 3 ) 3
CH 3 (CF 2 ) 7 (CH 2 ) 2 Si (NCO) 3
CH 3 (CF 2) 8 ( CH 2) 2 Si (OCH 3) 3
CH 3 (CF 2 ) 8 (CH 2 ) 2 Si (NCO) 3
CH 3 (CF 2 ) 9 (CH 2 ) 2 Si (OCH 3 ) 3
CH 3 (CF 2 ) 9 (CH 2 ) 2 Si (NCO) 3
CH 3 CH 2 (CF 2 ) 6 (CH 2 ) 2 Si (OCH 3 ) 3
CH 3 CH 2 (CF 2 ) 6 (CH 2 ) 2 Si (NCO) 3
CH 3 CH 2 (CF 2 ) 8 (CH 2 ) 2 Si (OCH 3 ) 3
CH 3 CH 2 (CF 2 ) 8 (CH 2 ) 2 Si (NCO) 3
CH 3 CH 2 (CF 2 ) 10 (CH 2 ) 2 Si (OCH 3 ) 3
CH 3 (CF 2) 4 O (CF 2) 2 (CH 2) 2 Si (OCH 3) 3
CH 3 (CF 2) 7 ( CH 2) 2 O (CH 2) 3 Si (OCH 3) 3
CH 3 (CF 2) 8 ( CH 2) 2 O (CH 2) 3 Si (OCH 3) 3
CH 3 (CF 2) 9 ( CH 2) 2 O (CH 2) 3 Si (OCH 3) 3
CH 3 CH 2 (CF 2) 6 (CH 2) 2 O (CH 2) 3 Si (OCH 3) 3
CH 3 (CF 2) 6 CONH (CH 2) 3 Si (OCH 3) 3
CH 3 (CF 2) 8 CONH (CH 2) 3 Si (OCH 3) 3
CH 3 (CF 2) 3 O [CF (CF 3) CF (CF 3) O] 2 CF (CF 3) -
CONH (CH 2 ) 3 Si (OCH 3 ) 3
CH3CH2O(CH2)15Si(OCH3)(OH)2
CF3CH2O(CH2)15Si(OCH3)(OH)2
CH3(CH2)2Si(CH3)2(CH2)15Si(OCH3)(OH)2
CH3(CH2)6Si(CH3)2(CH2)9Si(OCH3)(OH)2
CH3COO(CH2)15Si(OCH3)(OH)2
CF3(CF2)5(CH2)2Si(OCH3)(OH)2
CF3(CF2)7(CH=CH)3Si(OCH3)(OH)2
CH3CH2O(CH2)15Si(OC2H5)(OH)2
CH3(CH2)2Si(CH3)2(CH2)15Si(OC2H5)(OH)2
CH3(CH2)6Si(CH3)2(CH2)9Si(OC2H5)(OH)2
CF3(CH2)6Si(CH3)2(CH2)9Si(OC2H5)(OH)2
CH3COO(CH2)15Si(OC2H5)(OH)2
CF3COO(CH2)15Si(OC2H5)(OH)2
CF3COO(CH2)15Si(OCH3)(OH)2
CF3(CF2)9(CH2)2Si(OC2H5)(OH)2
CF3(CF2)7(CH2)2Si(OC2H5)(OH)2
CF3(CF2)5(CH2)2Si(OC2H5)(OH)2
CF3(CF2)7(CH=CH)3Si(OC2H5)(OH)2
CF3(CF2)9(CH2)2Si(OCH3)(OH)2
CF3(CF2)5(CH2)2Si(OCH3)(OH)2
CF3(CF2)7(CH2)2Si(CH3)(OH)2
CF3(CF2)9(CH2)2Si(CH3)(OH)2
CH 3 CH 2 O (CH 2 ) 15 Si (OCH 3) (OH) 2
CF 3 CH 2 O (CH 2 ) 15 Si (OCH 3) (OH) 2
CH 3 (CH 2) 2 Si (CH 3) 2 (CH 2) 15 Si (OCH 3) (OH) 2
CH 3 (CH 2) 6 Si (CH 3) 2 (CH 2) 9 Si (OCH 3) (OH) 2
CH 3 COO (CH 2) 15 Si (OCH 3) (OH) 2
CF 3 (CF 2) 5 ( CH 2) 2 Si (OCH 3) (OH) 2
CF 3 (CF 2 ) 7 (CH═CH) 3 Si (OCH 3 ) (OH) 2
CH 3 CH 2 O (CH 2 ) 15 Si (OC 2 H 5) (OH) 2
CH 3 (CH 2) 2 Si (CH 3) 2 (CH 2) 15 Si (OC 2 H 5) (OH) 2
CH 3 (CH 2) 6 Si (CH 3) 2 (CH 2) 9 Si (OC 2 H 5) (OH) 2
CF 3 (CH 2) 6 Si (CH 3) 2 (CH 2) 9 Si (OC 2 H 5) (OH) 2
CH 3 COO (CH 2) 15 Si (OC 2 H 5) (OH) 2
CF 3 COO (CH 2) 15 Si (OC 2 H 5) (OH) 2
CF 3 COO (CH 2 ) 15 Si (OCH 3 ) (OH) 2
CF 3 (CF 2) 9 ( CH 2) 2 Si (OC 2 H 5) (OH) 2
CF 3 (CF 2) 7 ( CH 2) 2 Si (OC 2 H 5) (OH) 2
CF 3 (CF 2) 5 ( CH 2) 2 Si (OC 2 H 5) (OH) 2
CF 3 (CF 2 ) 7 (CH═CH) 3 Si (OC 2 H 5 ) (OH) 2
CF 3 (CF 2 ) 9 (CH 2 ) 2 Si (OCH 3 ) (OH) 2
CF 3 (CF 2) 5 ( CH 2) 2 Si (OCH 3) (OH) 2
CF 3 (CF 2 ) 7 (CH 2 ) 2 Si (CH 3 ) (OH) 2
CF 3 (CF 2 ) 9 (CH 2 ) 2 Si (CH 3 ) (OH) 2
CH3CH2O(CH2)15Si(OCH3)2(OH)
CF3CH2O(CH2)15Si(OCH3)2(OH)
CH3(CH2)2Si(CH3)2(CH2)15Si(OCH3)2(OH)
CH3(CH2)6Si(CH3)2(CH2)9Si(OCH3)2(OH)
CH3COO(CH2)15Si(OCH3)2(OH)
CF3(CF2)5(CH2)2Si(OCH3)2(OH)
CH3CH2O(CH2)15Si(OC2H5)2(OH)
CF3(CF2)7(CH=CH)3Si(OCH3)2(OH)
CH3(CH2)2Si(CH3)2(CH2)15Si(OC2H5)2(OH)
CH3(CH2)6Si(CH3)2(CH2)9Si(OC2H5)2(OH)
CF3(CH2)6Si(CH3)2(CH2)9Si(OC2H5)2(OH)
CH3COO(CH2)15Si(OC2H5)2(OH)
CF3COO(CH2)15Si(OC2H5)2(OH)
CF3COO(CH2)15Si(OCH3)2(OH)
CF3(CF2)9(CH2)2Si(OC2H5)2(OH)
CF3(CF2)7(CH2)2Si(OC2H5)2(OH)
CF3(CF2)5(CH2)2Si(OC2H5)2(OH)
CH 3 CH 2 O (CH 2 ) 15 Si (OCH 3 ) 2 (OH)
CF 3 CH 2 O (CH 2 ) 15 Si (OCH 3) 2 (OH)
CH 3 (CH 2) 2 Si (CH 3) 2 (CH 2) 15 Si (OCH 3) 2 (OH)
CH 3 (CH 2) 6 Si (CH 3) 2 (CH 2) 9 Si (OCH 3) 2 (OH)
CH 3 COO (CH 2 ) 15 Si (OCH 3 ) 2 (OH)
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (OCH 3 ) 2 (OH)
CH 3 CH 2 O (CH 2 ) 15 Si (OC 2 H 5 ) 2 (OH)
CF 3 (CF 2 ) 7 (CH═CH) 3 Si (OCH 3 ) 2 (OH)
CH 3 (CH 2) 2 Si (CH 3) 2 (CH 2) 15 Si (OC 2 H 5) 2 (OH)
CH 3 (CH 2) 6 Si (CH 3) 2 (CH 2) 9 Si (OC 2 H 5) 2 (OH)
CF 3 (CH 2) 6 Si (CH 3) 2 (CH 2) 9 Si (OC 2 H 5) 2 (OH)
CH 3 COO (CH 2) 15 Si (OC 2 H 5) 2 (OH)
CF 3 COO (CH 2 ) 15 Si (OC 2 H 5 ) 2 (OH)
CF 3 COO (CH 2 ) 15 Si (OCH 3 ) 2 (OH)
CF 3 (CF 2) 9 ( CH 2) 2 Si (OC 2 H 5) 2 (OH)
CF 3 (CF 2 ) 7 (CH 2 ) 2 Si (OC 2 H 5 ) 2 (OH)
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (OC 2 H 5 ) 2 (OH)
CF3(CF2)7(CH=CH)3Si(OC2H5)2(OH)
CF3(CF2)9(CH2)2Si(OCH3)2(OH)
CF3(CF2)5(CH2)2Si(OCH3)2(OH)
CF3(CF2)7(CH2)2Si(CH3)(OC2H5)(OH)
CF3(CF2)7(CH2)2Si(CH3)(OCH3)(OH)
CF 3 (CF 2 ) 7 (CH═CH) 3 Si (OC 2 H 5 ) 2 (OH)
CF 3 (CF 2 ) 9 (CH 2 ) 2 Si (OCH 3 ) 2 (OH)
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (OCH 3 ) 2 (OH)
CF 3 (CF 2) 7 ( CH 2) 2 Si (CH 3) (OC 2 H 5) (OH)
CF 3 (CF 2) 7 ( CH 2) 2 Si (CH 3) (OCH 3) (OH)
CF3(CH2)2Si(OCH3)(OH)2
CF3(CF2)3(CH2)2Si(OCH3)(OH)2
CF3(CF2)5(CH2)2Si(OCH3)(OH)2
CF3(CF2)7(CH2)2Si(OCH3)(OH)2
CF3(CF2)5(CH2)3Si(OCH3)(OH)2
CF3(CF2)7(CH2)3Si(OCH3)(OH)2
CF3(CF2)4O(CF2)2(CH2)2Si(OCH3)(OH)2
CF3(CF2)4O(CF2)2(CH2)3Si(OCH3)(OH)2
CF3(CF2)7(CH2)2O(CH2)3Si(OCH3)(OH)2
CF3(CF2)7CONH(CH2)2Si(OCH3)(OH)2
CF3(CF2)7CONH(CH2)3Si(OCH3)(OH)2
CF3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)CONH(CH2)3Si(OCH3)(OH)2
CF 3 (CH 2) 2 Si (OCH 3) (OH) 2
CF 3 (CF 2 ) 3 (CH 2 ) 2 Si (OCH 3 ) (OH) 2
CF 3 (CF 2) 5 ( CH 2) 2 Si (OCH 3) (OH) 2
CF 3 (CF 2) 7 ( CH 2) 2 Si (OCH 3) (OH) 2
CF 3 (CF 2 ) 5 (CH 2 ) 3 Si (OCH 3 ) (OH) 2
CF 3 (CF 2) 7 ( CH 2) 3 Si (OCH 3) (OH) 2
CF 3 (CF 2) 4 O (CF 2) 2 (CH 2) 2 Si (OCH 3) (OH) 2
CF 3 (CF 2) 4 O (CF 2) 2 (CH 2) 3 Si (OCH 3) (OH) 2
CF 3 (CF 2) 7 ( CH 2) 2 O (CH 2) 3 Si (OCH 3) (OH) 2
CF 3 (CF 2) 7 CONH (CH 2) 2 Si (OCH 3) (OH) 2
CF 3 (CF 2) 7 CONH (CH 2) 3 Si (OCH 3) (OH) 2
CF 3 (CF 2) 3 O [CF (CF 3) CF (CF 3) O] 2 CF (CF 3) CONH (CH 2) 3 Si (OCH 3) (OH) 2
CF3(CH2)2Si(OCH3)2(OH)
CF3(CF2)3(CH2)2Si(OCH3)2(OH)
CF3(CF2)5(CH2)2Si(OCH3)2(OH)
CF3(CF2)7(CH2)2Si(OCH3)2(OH)
CF3(CF2)3(CH2)3Si(OCH3)2(OH)
CF3(CF2)5(CH2)3Si(OCH3)2(OH)
CF3(CF2)7(CH2)3Si(OCH3)2(OH)
CF3(CF2)4O(CF2)2(CH2)2Si(OCH3)2(OH)
CF3(CF2)4O(CF2)2(CH2)3Si(OCH3)2(OH)
CF3(CF2)7(CH2)2O(CH2)3Si(OCH3)2(OH)
CF3(CF2)7CONH(CH2)2Si(OCH3)2(OH)
CF3(CF2)7CONH(CH2)3Si(OCH3)2(OH)
CF3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)CONH(CH2)3Si(OCH3)2(OH)
CF 3 (CH 2 ) 2 Si (OCH 3 ) 2 (OH)
CF 3 (CF 2 ) 3 (CH 2 ) 2 Si (OCH 3 ) 2 (OH)
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (OCH 3 ) 2 (OH)
CF 3 (CF 2 ) 7 (CH 2 ) 2 Si (OCH 3 ) 2 (OH)
CF 3 (CF 2 ) 3 (CH 2 ) 3 Si (OCH 3 ) 2 (OH)
CF 3 (CF 2 ) 5 (CH 2 ) 3 Si (OCH 3 ) 2 (OH)
CF 3 (CF 2 ) 7 (CH 2 ) 3 Si (OCH 3 ) 2 (OH)
CF 3 (CF 2) 4 O (CF 2) 2 (CH 2) 2 Si (OCH 3) 2 (OH)
CF 3 (CF 2) 4 O (CF 2) 2 (CH 2) 3 Si (OCH 3) 2 (OH)
CF 3 (CF 2) 7 ( CH 2) 2 O (CH 2) 3 Si (OCH 3) 2 (OH)
CF 3 (CF 2 ) 7 CONH (CH 2 ) 2 Si (OCH 3 ) 2 (OH)
CF 3 (CF 2) 7 CONH (CH 2) 3 Si (OCH 3) 2 (OH)
CF 3 (CF 2 ) 3 O [CF (CF 3 ) CF (CF 3 ) O] 2 CF (CF 3 ) CONH (CH 2 ) 3 Si (OCH 3 ) 2 (OH)
CH3(CH2)7Si(OCH3)(OH)2
CH3(CF2)7(CH2)2Si(OCH3)(OH)2
CH3(CF2)7(CH2)2Si(NCO)(OH)2
CH3(CF2)8(CH2)2Si(OCH3)(OH)2
CH3(CF2)8(CH2)2Si(NCO)(OH)2
CH3(CF2)9(CH2)2Si(OCH3)(OH)2
CH3(CF2)9(CH2)2Si(NCO)(OH)2
CH3CH2(CF2)6(CH2)2Si(OCH3)(OH)2
CH3CH2(CF2)6(CH2)2Si(OCH3)(OH)2
CH3CH2(CF2)6(CH2)2Si(NCO)(OH)2
CH3CH2(CF2)8(CH2)2Si(OCH3)(OH)2
CH3CH2(CF2)8(CH2)2Si(NCO)(OH)2
CH3CH2(CF2)10(CH2)2Si(OCH3)(OH)2
CH3(CF2)4O(CF2)2(CH2)2Si(OCH3)(OH)2
CH3(CF2)7(CH2)2O(CH2)3Si(OCH3)(OH)2
CH3(CF2)8(CH2)2O(CH2)3Si(OCH3)(OH)2
CH3(CF2)9(CH2)2O(CH2)3Si(OCH3)(OH)2
CH3CH2(CF2)6(CH2)2O(CH2)3Si(OCH3)(OH)2
CH3(CF2)6CONH(CH2)3Si(OCH3)(OH)2
CH3(CF2)8CONH(CH2)3Si(OCH3)(OH)2
CH3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)CONH(CH2)3Si(OCH3)(OH)2
CH 3 (CH 2) 7 Si (OCH 3) (OH) 2
CH 3 (CF 2) 7 ( CH 2) 2 Si (OCH 3) (OH) 2
CH 3 (CF 2) 7 ( CH 2) 2 Si (NCO) (OH) 2
CH 3 (CF 2) 8 ( CH 2) 2 Si (OCH 3) (OH) 2
CH 3 (CF 2) 8 ( CH 2) 2 Si (NCO) (OH) 2
CH 3 (CF 2) 9 ( CH 2) 2 Si (OCH 3) (OH) 2
CH 3 (CF 2) 9 ( CH 2) 2 Si (NCO) (OH) 2
CH 3 CH 2 (CF 2) 6 (CH 2) 2 Si (OCH 3) (OH) 2
CH 3 CH 2 (CF 2) 6 (CH 2) 2 Si (OCH 3) (OH) 2
CH 3 CH 2 (CF 2) 6 (CH 2) 2 Si (NCO) (OH) 2
CH 3 CH 2 (CF 2) 8 (CH 2) 2 Si (OCH 3) (OH) 2
CH 3 CH 2 (CF 2) 8 (CH 2) 2 Si (NCO) (OH) 2
CH 3 CH 2 (CF 2) 10 (CH 2) 2 Si (OCH 3) (OH) 2
CH 3 (CF 2) 4 O (CF 2) 2 (CH 2) 2 Si (OCH 3) (OH) 2
CH 3 (CF 2) 7 ( CH 2) 2 O (CH 2) 3 Si (OCH 3) (OH) 2
CH 3 (CF 2) 8 ( CH 2) 2 O (CH 2) 3 Si (OCH 3) (OH) 2
CH 3 (CF 2) 9 ( CH 2) 2 O (CH 2) 3 Si (OCH 3) (OH) 2
CH 3 CH 2 (CF 2) 6 (CH 2) 2 O (CH 2) 3 Si (OCH 3) (OH) 2
CH 3 (CF 2) 6 CONH (CH 2) 3 Si (OCH 3) (OH) 2
CH 3 (CF 2) 8 CONH (CH 2) 3 Si (OCH 3) (OH) 2
CH 3 (CF 2) 3 O [CF (CF 3) CF (CF 3) O] 2 CF (CF 3) CONH (CH 2) 3 Si (OCH 3) (OH) 2
CF3(CF2)3(CH2)2Si(CH3)(OCH3)(OH)
CF3(CF2)5(CH2)2Si(CH3)(OCH3)(OH)
CF3(CH2)2Si(CH3)(OCH3)(OH)
CF3(CF2)3(CH2)3Si(CH3)(OCH3)(OH)
CF3(CF2)5(CH2)3Si(CH3)(OCH3)(OH)
CF3(CF2)7(CH2)3Si(CH3)(OCH3)(OH)
CF3(CF2)4(CF2)2(CH2)2Si(CH3)(OCH3)(OH)
CF3(CF2)4(CF2)2(CH2)3Si(CH3)(OCH3)(OH)
CF3(CF2)4(CH2)2O(CH2)3Si(CH3)(OCH3)(OH)
CF3(CF2)7CONH(CH2)2Si(CH3)(OCH3)(OH)
CF3(CF2)7CONH(CH2)3Si(CH3)(OCH3)(OH)
CF3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)CONH(CH2)3Si(CH3)(OCH3)(OH)
CH3(CH2)7Si(OCH3)2(OH)
CH3(CF2)7(CH2)2Si(OCH3)2(OH)
CH3(CF2)7(CH2)2Si(CH3)(OCH3)(OH)
CH3(CF2)7(CH2)2Si(NCO)2(OH)
CH3(CF2)8(CH2)2Si(OCH3)2(OH)
CH3(CF2)8(CH2)2Si(NCO)2(OH)
CH3(CF2)9(CH2)2Si(OCH3)2(OH)
CH3(CF2)9(CH2)2Si(NCO)2(OH)
CH3CH2(CF2)6(CH2)2Si(OCH3)2(OH)
CH3CH2(CF2)6(CH2)2Si(NCO)2(OH)
CH3CH2(CF2)8(CH2)2Si(OCH3)2(OH)
CH3CH2(CF2)8(CH2)2Si(NCO)2(OH)
CH3CH2(CF2)10(CH2)2Si(OCH3)2(OH)
CH3(CF2)4O(CF2)2(CH2)2Si(OCH3)2(OH)
CH3(CF2)7(CH2)2O(CH2)3Si(OCH3)2(OH)
CH3(CF2)8(CH2)2O(CH2)3Si(OCH3)2(OH)
CH3(CF2)9(CH2)2O(CH2)3Si(OCH3)2(OH)
CH3CH2(CF2)6(CH2)2O(CH2)3Si(OCH3)2(OH)
CH3(CF2)6CONH(CH2)3Si(OCH3)2(OH)
CH3(CF2)8CONH(CH2)3Si(OCH3)2(OH)
CH3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)CONH(CH2)3Si(OCH3)2(OH)
CF 3 (CF 2) 3 ( CH 2) 2 Si (CH 3) (OCH 3) (OH)
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (CH 3 ) (OCH 3 ) (OH)
CF 3 (CH 2) 2 Si (CH 3) (OCH 3) (OH)
CF 3 (CF 2 ) 3 (CH 2 ) 3 Si (CH 3 ) (OCH 3 ) (OH)
CF 3 (CF 2) 5 ( CH 2) 3 Si (CH 3) (OCH 3) (OH)
CF 3 (CF 2) 7 ( CH 2) 3 Si (CH 3) (OCH 3) (OH)
CF 3 (CF 2) 4 ( CF 2) 2 (CH 2) 2 Si (CH 3) (OCH 3) (OH)
CF 3 (CF 2) 4 ( CF 2) 2 (CH 2) 3 Si (CH 3) (OCH 3) (OH)
CF 3 (CF 2) 4 ( CH 2) 2 O (CH 2) 3 Si (CH 3) (OCH 3) (OH)
CF 3 (CF 2) 7 CONH (CH 2) 2 Si (CH 3) (OCH 3) (OH)
CF 3 (CF 2) 7 CONH (CH 2) 3 Si (CH 3) (OCH 3) (OH)
CF 3 (CF 2) 3 O [CF (CF 3) CF (CF 3) O] 2 CF (CF 3) CONH (CH 2) 3 Si (CH 3) (OCH 3) (OH)
CH 3 (CH 2) 7 Si (OCH 3) 2 (OH)
CH 3 (CF 2) 7 ( CH 2) 2 Si (OCH 3) 2 (OH)
CH 3 (CF 2) 7 ( CH 2) 2 Si (CH 3) (OCH 3) (OH)
CH 3 (CF 2) 7 ( CH 2) 2 Si (NCO) 2 (OH)
CH 3 (CF 2) 8 ( CH 2) 2 Si (OCH 3) 2 (OH)
CH 3 (CF 2) 8 ( CH 2) 2 Si (NCO) 2 (OH)
CH 3 (CF 2) 9 ( CH 2) 2 Si (OCH 3) 2 (OH)
CH 3 (CF 2) 9 ( CH 2) 2 Si (NCO) 2 (OH)
CH 3 CH 2 (CF 2) 6 (CH 2) 2 Si (OCH 3) 2 (OH)
CH 3 CH 2 (CF 2) 6 (CH 2) 2 Si (NCO) 2 (OH)
CH 3 CH 2 (CF 2) 8 (CH 2) 2 Si (OCH 3) 2 (OH)
CH 3 CH 2 (CF 2) 8 (CH 2) 2 Si (NCO) 2 (OH)
CH 3 CH 2 (CF 2) 10 (CH 2) 2 Si (OCH 3) 2 (OH)
CH 3 (CF 2) 4 O (CF 2) 2 (CH 2) 2 Si (OCH 3) 2 (OH)
CH 3 (CF 2) 7 ( CH 2) 2 O (CH 2) 3 Si (OCH 3) 2 (OH)
CH 3 (CF 2) 8 ( CH 2) 2 O (CH 2) 3 Si (OCH 3) 2 (OH)
CH 3 (CF 2) 9 ( CH 2) 2 O (CH 2) 3 Si (OCH 3) 2 (OH)
CH 3 CH 2 (CF 2) 6 (CH 2) 2 O (CH 2) 3 Si (OCH 3) 2 (OH)
CH 3 (CF 2) 6 CONH (CH 2) 3 Si (OCH 3) 2 (OH)
CH 3 (CF 2) 8 CONH (CH 2) 3 Si (OCH 3) 2 (OH)
CH 3 (CF 2) 3 O [CF (CF 3) CF (CF 3) O] 2 CF (CF 3) CONH (CH 2) 3 Si (OCH 3) 2 (OH)
CH3CH2O(CH2)15Si(OH)3
CF3CH2O(CH2)15Si(OH)3
CH3(CH2)2Si(CH3)2(CH2)15Si(OH)3
CH3(CH2)6Si(CH3)2(CH2)9Si(OH)3
CH3COO(CH2)15Si(OH)3
CF3(CF2)5(CH2)2Si(OH)3
CF3(CF2)7(CH=CH)3Si(OH)3
CH3CH2O(CH2)15Si(OH)3
CH3(CH2)2Si(CH3)2(CH2)15Si(OH)3
CH3(CH2)6Si(CH3)2(CH2)9Si(OH)3
CF3(CH2)6Si(CH3)2(CH2)9Si(OH)3
CH3COO(CH2)15Si(OH)3
CF3COO(CH2)15Si(OH)3
CF3(CF2)9(CH2)2Si(OH)3
CF3(CF2)7(CH2)2Si(OH)3
CF3(CF2)5(CH2)2Si(OH)3
CF3(CF2)7(CH=CH)3Si(OH)3
CF3(CF2)9(CH2)2Si(OH)3
CF3(CF2)5(CH2)2Si(OH)3
CF3(CF2)7(CH2)2Si(CH3)2(OH)
CF3(CH2)2Si(OH)3
CF3(CF2)3(CH2)2Si(OH)3
CF3(CF2)5(CH2)2Si(OH)3
CF3(CF2)7(CH2)2Si(OH)3
CF3(CF2)3(CH2)3Si(OH)3
CF3(CF2)5(CH2)3Si(OH)3
CF3(CF2)7(CH2)3Si(OH)3
CF3(CF2)4O(CF2)2(CH2)2Si(OH)3
CF3(CF2)4O(CF2)2(CH2)3Si(OH)3
CF3(CF2)7(CH2)2O(CH2)3Si(OH)3
CF3(CF2)7CONH(CH2)2Si(OH)3
CF3(CF2)7CONH(CH2)3Si(OH)3
CF3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)CONH(CH2)3Si(OH)3
CH3(CH2)7Si(OH)3
CH3(CF2)7(CH2)2Si(OH)3
CH3(CF2)8(CH2)2Si(OH)3
CH3(CF2)9(CH2)2Si(OH)3
CH3CH2(CF2)6(CH2)2Si(OH)3
CH3CH2(CF2)8(CH2)2Si(OH)3
CH3CH2(CF2)10(CH2)2Si(OH)3
CH3(CF2)4O(CF2)2(CH2)2Si(OH)3
CH3(CF2)7(CH2)2O(CH2)3Si(OH)3
CH3(CF2)8(CH2)2O(CH2)3Si(OH)3
CH3(CF2)9(CH2)2O(CH2)3Si(OH)3
CH3CH2(CF2)6(CH2)2O(CH2)3Si(OH)3
CH3(CF2)6CONH(CH2)3Si(OH)3
CH3(CF2)8CONH(CH2)3Si(OH)3
CH3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)CONH(CH2)3Si(OH)3
CF3(CF2)3(CH2)2Si(CH3)(OH)2
CF3(CF2)5(CH2)2Si(CH3)(OH)2
CF3(CH2)2Si(CH3)(OH)2
CF3(CF2)3(CH2)3Si(CH3)(OH)2
CF3(CF2)5(CH2)3Si(CH3)(OH)2
CF3(CF2)7(CH2)3Si(CH3)(OH)2
CF3(CF2)4(CF2)2(CH2)2Si(CH3)(OH)2
CF3(CF2)4(CF2)2(CH2)3Si(CH3)(OH)2
CF3(CF2)4(CH2)2O(CH2)3Si(CH3)(OH)2
CF3(CF2)7CONH(CH2)2Si(CH3)(OH)2
CF3(CF2)7CONH(CH2)3Si(CH3)(OH)2
CF3(CF2)3O[CF(CF3)CF(CF3)O]2CF(CF3)CONH(CH2)3Si(CH3)(OH)2
CH3(CF2)7(CH2)2Si(CH3)(OH)2
CH 3 CH 2 O (CH 2 ) 15 Si (OH) 3
CF 3 CH 2 O (CH 2 ) 15 Si (OH) 3
CH 3 (CH 2) 2 Si (CH 3) 2 (CH 2) 15 Si (OH) 3
CH 3 (CH 2) 6 Si (CH 3) 2 (CH 2) 9 Si (OH) 3
CH 3 COO (CH 2 ) 15 Si (OH) 3
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (OH) 3
CF 3 (CF 2 ) 7 (CH═CH) 3 Si (OH) 3
CH 3 CH 2 O (CH 2 ) 15 Si (OH) 3
CH 3 (CH 2) 2 Si (CH 3) 2 (CH 2) 15 Si (OH) 3
CH 3 (CH 2) 6 Si (CH 3) 2 (CH 2) 9 Si (OH) 3
CF 3 (CH 2) 6 Si (CH 3) 2 (CH 2) 9 Si (OH) 3
CH 3 COO (CH 2 ) 15 Si (OH) 3
CF 3 COO (CH 2 ) 15 Si (OH) 3
CF 3 (CF 2 ) 9 (CH 2 ) 2 Si (OH) 3
CF 3 (CF 2 ) 7 (CH 2 ) 2 Si (OH) 3
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (OH) 3
CF 3 (CF 2 ) 7 (CH═CH) 3 Si (OH) 3
CF 3 (CF 2 ) 9 (CH 2 ) 2 Si (OH) 3
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (OH) 3
CF 3 (CF 2 ) 7 (CH 2 ) 2 Si (CH 3 ) 2 (OH)
CF 3 (CH 2 ) 2 Si (OH) 3
CF 3 (CF 2 ) 3 (CH 2 ) 2 Si (OH) 3
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (OH) 3
CF 3 (CF 2 ) 7 (CH 2 ) 2 Si (OH) 3
CF 3 (CF 2 ) 3 (CH 2 ) 3 Si (OH) 3
CF 3 (CF 2 ) 5 (CH 2 ) 3 Si (OH) 3
CF 3 (CF 2 ) 7 (CH 2 ) 3 Si (OH) 3
CF 3 (CF 2) 4 O (CF 2) 2 (CH 2) 2 Si (OH) 3
CF 3 (CF 2 ) 4 O (CF 2 ) 2 (CH 2 ) 3 Si (OH) 3
CF 3 (CF 2 ) 7 (CH 2 ) 2 O (CH 2 ) 3 Si (OH) 3
CF 3 (CF 2 ) 7 CONH (CH 2 ) 2 Si (OH) 3
CF 3 (CF 2 ) 7 CONH (CH 2 ) 3 Si (OH) 3
CF 3 (CF 2 ) 3 O [CF (CF 3 ) CF (CF 3 ) O] 2 CF (CF 3 ) CONH (CH 2 ) 3 Si (OH) 3
CH 3 (CH 2 ) 7 Si (OH) 3
CH 3 (CF 2 ) 7 (CH 2 ) 2 Si (OH) 3
CH 3 (CF 2 ) 8 (CH 2 ) 2 Si (OH) 3
CH 3 (CF 2 ) 9 (CH 2 ) 2 Si (OH) 3
CH 3 CH 2 (CF 2 ) 6 (CH 2 ) 2 Si (OH) 3
CH 3 CH 2 (CF 2 ) 8 (CH 2 ) 2 Si (OH) 3
CH 3 CH 2 (CF 2 ) 10 (CH 2 ) 2 Si (OH) 3
CH 3 (CF 2) 4 O (CF 2) 2 (CH 2) 2 Si (OH) 3
CH 3 (CF 2) 7 ( CH 2) 2 O (CH 2) 3 Si (OH) 3
CH 3 (CF 2) 8 ( CH 2) 2 O (CH 2) 3 Si (OH) 3
CH 3 (CF 2) 9 ( CH 2) 2 O (CH 2) 3 Si (OH) 3
CH 3 CH 2 (CF 2) 6 (CH 2) 2 O (CH 2) 3 Si (OH) 3
CH 3 (CF 2 ) 6 CONH (CH 2 ) 3 Si (OH) 3
CH 3 (CF 2 ) 8 CONH (CH 2 ) 3 Si (OH) 3
CH 3 (CF 2) 3 O [CF (CF 3) CF (CF 3) O] 2 CF (CF 3) CONH (CH 2) 3 Si (OH) 3
CF 3 (CF 2 ) 3 (CH 2 ) 2 Si (CH 3 ) (OH) 2
CF 3 (CF 2 ) 5 (CH 2 ) 2 Si (CH 3 ) (OH) 2
CF 3 (CH 2) 2 Si (CH 3) (OH) 2
CF 3 (CF 2 ) 3 (CH 2 ) 3 Si (CH 3 ) (OH) 2
CF 3 (CF 2 ) 5 (CH 2 ) 3 Si (CH 3 ) (OH) 2
CF 3 (CF 2) 7 ( CH 2) 3 Si (CH 3) (OH) 2
CF 3 (CF 2) 4 ( CF 2) 2 (CH 2) 2 Si (CH 3) (OH) 2
CF 3 (CF 2 ) 4 (CF 2 ) 2 (CH 2 ) 3 Si (CH 3 ) (OH) 2
CF 3 (CF 2) 4 ( CH 2) 2 O (CH 2) 3 Si (CH 3) (OH) 2
CF 3 (CF 2 ) 7 CONH (CH 2 ) 2 Si (CH 3 ) (OH) 2
CF 3 (CF 2 ) 7 CONH (CH 2 ) 3 Si (CH 3 ) (OH) 2
CF 3 (CF 2 ) 3 O [CF (CF 3 ) CF (CF 3 ) O] 2 CF (CF 3 ) CONH (CH 2 ) 3 Si (CH 3 ) (OH) 2
CH 3 (CF 2) 7 ( CH 2) 2 Si (CH 3) (OH) 2
これらの化合物は1種単独で、あるいは2種以上を組み合わせて用いることができる。 These compounds can be used alone or in combination of two or more.
「金属系界面活性剤と相互作用し得る化合物」としては、金属酸化物;金属水酸化物;金属アルコキシド類;金属アルコキシド類部分加水分解生成物;金属アルコキシド類加水分解生成物;キレート化又は配位化された金属化合物;その他のシラノール縮合触媒から選ばれる少なくとも1種が使用される。 Examples of the “compound capable of interacting with a metal-based surfactant” include metal oxides; metal hydroxides; metal alkoxides; metal alkoxides partial hydrolysis products; metal alkoxides hydrolysis products; A coordinated metal compound; at least one selected from other silanol condensation catalysts is used.
金属酸化物としては、具体的には、メタノールシリカゾル、IPA−ST、IPA−ST−UP、IPA−ST−ZL、NPC−ST−30、DMAC−ST、MEK−ST、MIBK−ST、XBA−ST、PMA−ST(以上、いずれも日産化学工業(株)社製オルガノシリカゾルの商品名を表す。)等を例示することができる。 Specific examples of the metal oxide include methanol silica sol, IPA-ST, IPA-ST-UP, IPA-ST-ZL, NPC-ST-30, DMAC-ST, MEK-ST, MIBK-ST, XBA- Examples thereof include ST and PMA-ST (all of which represent trade names of organosilica sol manufactured by Nissan Chemical Industries, Ltd.).
金属水酸化物としては、金属の水酸化物であれば、どのような製造方法で得られたものであってもよい。金属水酸化物の製造方法としては、後述の金属アルコキシド類を加水分解する方法、金属塩を金属水酸化物と反応させる方法等が挙げられる。また、金属水酸化物として市販されているものを、所望により精製して使用することもできる。 As the metal hydroxide, any metal hydroxide may be used as long as it is a metal hydroxide. As a manufacturing method of a metal hydroxide, the method of hydrolyzing the below-mentioned metal alkoxide, the method of making a metal salt react with a metal hydroxide, etc. are mentioned. Moreover, what is marketed as a metal hydroxide can also be refine | purified and used if desired.
金属アルコキシド類としては、Si(OCH3)4、Si(OC2H5)4、Si(OC3H7−i)4、Si(OC4H9−t)4等のケイ素アルコキシド;Ti(OCH3)4、Ti(OC2H5)4、Ti(OC3H7−i)4、Ti(OC4H9)4等のチタンアルコキシド;Ti[OSi(CH3)3]4、Ti[OSi(C2H5)3]4等のテトラキストリアルキルシロキシチタン;Zr(OCH3)4、Zr(OC2H5)4、Zr(OC3H7)4、Zr(OC4H9)4等のジルコニウムアルコキシド;Al(OCH3)4、Al(OC2H5)4、Al(OC3H7−i)4、Al(OC4H9)3等のアルミニウムアルコキシド;Ge(OC2H5)4等のゲルマニウムアルコキシド;In(OCH3)3、In(OC2H5)3、In(OC3H7−i)3、In(OC4H9)3等のインジウムアルコキシド;Sn(OCH3)4、Sn(OC2H5)4、Sn(OC3H7−i)4、Sn(OC4H9)4等のスズアルコキシド;Ta(OCH3)5、Ta(OC2H5)5、Ta(OC3H7−i)5、Ta(OC4H9)5等のタンタルアルコキシド;W(OCH3)6、W(OC2H5)6、W(OC3H7−i)6、W(OC4H9)6等のタングステンアルコキシド;Zn(OC2H5)2等の亜鉛アルコキシド;Pb(OC4H9)4等の鉛アルコキシド;等が挙げられる。これらの金属アルコキシド類は1種単独で、あるいは2種以上を組み合わせて用いることができる。 Examples of metal alkoxides include silicon alkoxides such as Si (OCH 3 ) 4 , Si (OC 2 H 5 ) 4 , Si (OC 3 H 7 -i) 4 , Si (OC 4 H 9 -t) 4 ; Ti ( Titanium alkoxides such as OCH 3 ) 4 , Ti (OC 2 H 5 ) 4 , Ti (OC 3 H 7 -i) 4 , Ti (OC 4 H 9 ) 4 ; Ti [OSi (CH 3 ) 3 ] 4 , Ti Tetrakistrialkylsiloxytitanium such as [OSi (C 2 H 5 ) 3 ] 4 ; Zr (OCH 3 ) 4 , Zr (OC 2 H 5 ) 4 , Zr (OC 3 H 7 ) 4 , Zr (OC 4 H 9 ) 4 zirconium such alkoxide; Al (OCH 3) 4, Al (OC 2 H 5) 4, Al (OC 3 H 7 -i) 4, Al (OC 4 H 9) 3 such as aluminum alkoxide; Ge (OC H 5) 4 and the like of germanium alkoxide; In (OCH 3) 3, In (OC 2 H 5) 3, In (OC 3 H 7 -i) 3, In (OC 4 H 9) 3 , etc. of indium alkoxides; Sn Tin alkoxides such as (OCH 3 ) 4 , Sn (OC 2 H 5 ) 4 , Sn (OC 3 H 7 -i) 4 , Sn (OC 4 H 9 ) 4 ; Ta (OCH 3 ) 5 , Ta (OC 2 Tantalum alkoxides such as H 5 ) 5 , Ta (OC 3 H 7 -i) 5 , Ta (OC 4 H 9 ) 5 ; W (OCH 3 ) 6 , W (OC 2 H 5 ) 6 , W (OC 3 H 7- i) 6 , tungsten alkoxides such as W (OC 4 H 9 ) 6 ; zinc alkoxides such as Zn (OC 2 H 5 ) 2 ; lead alkoxides such as Pb (OC 4 H 9 ) 4 ; These metal alkoxides can be used alone or in combination of two or more.
金属アルコキシド類部分加水分解生成物は、金属アルコキシド類を完全に加水分解する前に得られるものであって、例えば、金属酸化物ゾルの前駆体、またはオリゴマーの状態で存在するもの等を挙げることができる。
金属アルコキシド類部分加水分解生成物としては、具体的には、有機溶媒中、酸、塩基及び分散安定化剤からなる群から選ばれる少なくとも1種の非存在下、凝集せずに安定に分散している性質を有する分散質を好ましく例示することができる。この場合、分散質とは、分散系中に分散している微細粒子のことをいい、具体的には、コロイド粒子等を例示することができる。ここで凝集せずに安定に分散している状態とは、有機溶媒中、酸、塩基及び/又は分散安定化剤の非存在下、加水分解生成物の分散質が、凝結して不均質に分離していない状態をいい、好ましくは透明で均質な状態をいう。また透明とは、可視光における透過率が高い状態をいい、具体的には、分散質の濃度を酸化物換算で0.5重量%とし、石英セルの光路長を1cmとし、対照試料を有機溶媒とし、光の波長を550nmとする条件で測定した分光透過率で表して、好ましくは80〜100%の透過率を表す状態をいう。加水分解生成物の分散質の粒子径は特に限定されないが、可視光における高い透過率を得るためには、1〜100nmの範囲であることが好ましく、1〜50nmの範囲であることがより好ましく、1〜10nmの範囲であることがさらに好ましい。
金属アルコキシド類の部分加水分解生成物の製造方法としては、有機溶媒中、酸、塩基、及び/又は分散安定化剤の非存在下、上記例示した金属アルコキシド類に対し0.5〜2.0倍モル未満の水を用い、−100℃から有機溶媒還流温度範囲で加水分解する方法を好ましく例示することができる。
The metal alkoxide partial hydrolysis product is obtained before the metal alkoxide is completely hydrolyzed, and examples thereof include a metal oxide sol precursor or an oligomer present in the state of oligomer. Can do.
Specifically, the metal alkoxide partial hydrolysis product is stably dispersed without aggregation in an organic solvent in the absence of at least one selected from the group consisting of acids, bases and dispersion stabilizers. Preferred examples include dispersoids having the above properties. In this case, the dispersoid refers to fine particles dispersed in the dispersion system, and specific examples include colloidal particles. Here, the state of stable dispersion without agglomeration means that in the absence of acid, base and / or dispersion stabilizer in the organic solvent, the dispersoid of the hydrolysis product coagulates and becomes heterogeneous. The state which is not isolate | separated is said, Preferably the transparent and homogeneous state is said. Transparent means a state in which the transmittance in visible light is high. Specifically, the concentration of the dispersoid is 0.5% by weight in terms of oxide, the optical path length of the quartz cell is 1 cm, and the control sample is organic. This is a state that represents a transmittance of 80 to 100%, preferably expressed as a spectral transmittance measured under the condition of using a solvent and a light wavelength of 550 nm. The particle size of the dispersoid of the hydrolysis product is not particularly limited, but in order to obtain high transmittance in visible light, it is preferably in the range of 1 to 100 nm, more preferably in the range of 1 to 50 nm. More preferably, it is in the range of 1 to 10 nm.
As a method for producing a partially hydrolyzed product of metal alkoxide, 0.5 to 2.0 with respect to the metal alkoxide exemplified above in the absence of an acid, a base, and / or a dispersion stabilizer in an organic solvent. A preferred example is a method of hydrolyzing in an organic solvent reflux temperature range from −100 ° C. using less than double moles of water.
本発明に用いられる金属アルコキシド加水分解生成物は、金属アルコキシド類の2倍当量以上の水で加水分解することによって得られる生成物である。該加水分解生成物は、金属アルコキシド類を該金属アルコキシド類の2倍当量以上の水で加水分解することによって得られたものであっても、金属アルコキシド類を該金属アルコキシド類の2倍当量未満の水で部分加水分解することによって、金属アルコキシド類の部分加水分解生成物を得た後、この部分加水分解生成物を、さらに所定量の水(先の部分加水分解に使用した水の量との合計で金属アルコキシド類の2倍当量以上となる量の水)で加水分解することによって得られたものであってもよい。 The metal alkoxide hydrolysis product used in the present invention is a product obtained by hydrolysis with water at least twice as much as the metal alkoxide. Even if the hydrolysis product is obtained by hydrolyzing a metal alkoxide with water at least twice as much as the metal alkoxide, the metal alkoxide is less than twice the equivalent of the metal alkoxide. The partial hydrolysis product of the metal alkoxides was obtained by partial hydrolysis with water, and the partial hydrolysis product was further mixed with a predetermined amount of water (the amount of water used in the previous partial hydrolysis and In a total amount of 2 times the equivalent of metal alkoxides).
キレート化又は配位化された金属化合物は、金属化合物の溶液に、該金属化合物の金属と錯体を形成し得るキレート化剤又は配位子を添加することで、調製することができる。キレート化剤又は配位子としては、金属水酸化物、金属アルコキシド類、又は金属アルコキシド類を水で処理して得られた加水分解生成物の金属にキレート化又は配位して、錯体を形成し得るものであれば特に限定されない。
キレート化剤又は配位子としては、酢酸、プロピオン酸、酪酸、吉草酸、ラウリン酸、ミリスチン酸、パルミチン酸、ステアリン酸等の飽和脂肪族カルボン酸類;シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライン酸、セバシン酸等の飽和脂肪族ジカルボン酸類;アクリル酸、メタクリル酸、クロトン酸、アレイン酸、マレイン酸等の不飽和カルボン酸類;安息香酸、トルイル酸、フタル酸等の芳香族カルボン酸類;クロロ酢酸、トリフルオロ酢酸等のハロゲノカルボン酸類;アセト酢酸メチル、アセト酢酸n−プロピル、アセト酢酸イソプロピル、アセト酢酸n−ブチル、アセト酢酸sec−ブチル、アセト酢酸t−ブチル等のβ−ケトエステル類;アセチルアセトン、へキサン−2,4−ジオン、ヘプタン−2,4−ジオン、ヘプタン−3,5−ジオン、オクタン−2,4−ジオン、ノナン−2,4−ジオン、5−メチル−へキサン−2,4−ジオン等のβ−ジケトン類;グリコール酸、乳酸等のヒドロキシカルボン酸;テトラヒドロフラン、フラン、フランカルボン酸、チオフェン、チオフェンカルボン酸、ピリジン、ニコチン酸、イソニコチン酸等の複素環化合物類;等が挙げられる。これらは1種単独で、あるいは2種以上を組み合わせて用いることができる。
The chelated or coordinated metal compound can be prepared by adding a chelating agent or a ligand capable of forming a complex with the metal of the metal compound to a solution of the metal compound. As a chelating agent or ligand, a metal hydroxide, metal alkoxide, or metal alkoxide is chelated or coordinated to the metal of the hydrolysis product obtained by treating with water to form a complex. If it can do, it will not specifically limit.
Examples of chelating agents or ligands include saturated aliphatic carboxylic acids such as acetic acid, propionic acid, butyric acid, valeric acid, lauric acid, myristic acid, palmitic acid, stearic acid; oxalic acid, malonic acid, succinic acid, glutaric acid Saturated aliphatic dicarboxylic acids such as adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid; unsaturated carboxylic acids such as acrylic acid, methacrylic acid, crotonic acid, array acid, maleic acid; benzoic acid, toluic acid, Aromatic carboxylic acids such as phthalic acid; halogenocarboxylic acids such as chloroacetic acid and trifluoroacetic acid; methyl acetoacetate, n-propyl acetoacetate, isopropyl acetoacetate, n-butyl acetoacetate, sec-butyl acetoacetate, t-acetoacetate Β-ketoesters such as butyl; acetylacetone, hexane-2,4-di Β-, such as benzene, heptane-2,4-dione, heptane-3,5-dione, octane-2,4-dione, nonane-2,4-dione, 5-methyl-hexane-2,4-dione Diketones; Hydroxycarboxylic acids such as glycolic acid and lactic acid; and heterocyclic compounds such as tetrahydrofuran, furan, furancarboxylic acid, thiophene, thiophenecarboxylic acid, pyridine, nicotinic acid, and isonicotinic acid; These can be used alone or in combination of two or more.
その他のシラノール縮合触媒としては、カルボン酸金属塩、カルボン酸エステル金属塩、カルボン酸金属塩ポリマー、カルボン酸金属塩キレート、チタン酸エステル及びチタン酸エステルキレート、酸触媒等を例示することができる。
具体的には、酢酸第一スズ、ジブチルスズジラウレート、ジブチルスズジオクテート、ジブチルスズジアセテート、ジオクチルスズジラウレート、ジオクチルスズジオクテート、ジオクチルスズジアセテート、ジオクタン酸第一スズ、ナフテン酸鉛、ナフテン酸コバルト、2−エチルヘキセン酸鉄、ジオクチルスズビスオクチリチオグリコール酸エステル塩、ジオクチルスズマレイン酸エステル塩、ジブチルスズマレイン酸塩ポリマー、ジメチルスズメルカプトプロピオン酸塩ポリマー、ジブチルスズビスアセチルアセテート、ジオクチルスズビスアセチルラウレート、チタンテトラエトキサイド、チタンテトラブトキサイド、チタンテトライソプロポキサイド、チタンビス(アセチルアセトニル)ジプロポキサイド等を例示することができる。
Examples of other silanol condensation catalysts include carboxylic acid metal salts, carboxylic acid ester metal salts, carboxylic acid metal salt polymers, carboxylic acid metal salt chelates, titanic acid esters and titanic acid ester chelates, and acid catalysts.
Specifically, stannous acetate, dibutyltin dilaurate, dibutyltin dioctate, dibutyltin diacetate, dioctyltin dilaurate, dioctyltin dioctate, dioctyltin diacetate, stannous dioctanoate, lead naphthenate, cobalt naphthenate , Iron 2-ethylhexenoate, dioctyltin bisoctylthioglycolate, dioctyltin maleate, dibutyltin maleate polymer, dimethyltin mercaptopropionate polymer, dibutyltin bisacetylacetate, dioctyltin bisacetyllaurate , Titanium tetraethoxide, titanium tetrabutoxide, titanium tetraisopropoxide, titanium bis (acetylacetonyl) dipropoxide, etc. .
また、上記酸触媒としては、塩酸、硝酸、ホウ酸、ホウフッ化水素酸等の鉱酸、酢酸、ギ酸、シュウ酸、炭酸、トリフルオロ酢酸、p−トルエンスルホン酸、メタンスルホン酸等の有機酸等を例示することができ、さらには、光照射によって酸を発生する光酸発生剤、具体的には、ジフェニルヨードニウムヘキサフルオロホスフェート、トリフェニルホスホニウムヘキサフルオロホスフェート等を例示することができる。 Examples of the acid catalyst include mineral acids such as hydrochloric acid, nitric acid, boric acid, and borofluoric acid, and organic acids such as acetic acid, formic acid, oxalic acid, carbonic acid, trifluoroacetic acid, p-toluenesulfonic acid, and methanesulfonic acid. In addition, photoacid generators that generate an acid upon irradiation with light, specifically, diphenyliodonium hexafluorophosphate, triphenylphosphonium hexafluorophosphate, and the like can be exemplified.
少なくとも1以上の加水分解性基を有する金属系界面活性剤、該金属系界面活性剤と相互作用し得る化合物及び水を含む有機溶媒溶液中における水の含有量は、10ppm〜2000ppmが好ましい。 The content of water in the organic solvent solution containing a metal-based surfactant having at least one hydrolyzable group, a compound capable of interacting with the metal-based surfactant, and water is preferably 10 ppm to 2000 ppm.
有機無機複合薄膜を有する有機無機複合薄膜上に金属界面活性剤の加水分解縮合物を含有する層を設けるには、上記有機溶媒溶液を、ディップ法、スピンコート法、スプレー法、ローラコート法、メイヤーバー法、スクリーン印刷、刷毛塗り法等の方法、好ましくはディップ法により、有機無機複合薄膜上の有機無機複合薄膜に接触させることにより行うことができる。 In order to provide a layer containing a hydrolytic condensate of a metal surfactant on an organic-inorganic composite thin film having an organic-inorganic composite thin film, the above organic solvent solution is prepared by dipping, spin coating, spraying, roller coating, It can be carried out by contacting the organic-inorganic composite thin film on the organic-inorganic composite thin film by a method such as the Mayer bar method, screen printing, brush coating method, etc., preferably by a dip method.
以下に本発明の実施例について記載するが、本発明の技術的範囲はこれらの実施例に限定されない。 Examples of the present invention will be described below, but the technical scope of the present invention is not limited to these examples.
実施例1
1.コーティング組成物の調製
ジイソポロポキシビスアセチルアセトナートチタン(T−50、日本曹達製)を、メチルイソブチルケトン77.76gとエタノール36.88gの混合溶媒に入れ、攪拌し溶解させた後、3−メタクリロキシプロピルトリメトキシシラン26.51g、次にビニルトリメトキシシラン36.90gを加え攪拌し溶解させた。この溶液にイオン交換水12.82gを加え、2時間攪拌し加水分解縮合反応を行うことで、固形分の質量換算濃度20%の組成物[B−1]を作製した。
[B−1]7.0gをメチルエチルケトン693.0gに溶解させ、固形分の質量換算濃度0.2%のコーティング剤700.0g[X−4]を作製した。
Example 1
1. Preparation of coating composition Diisoporopoxybisacetylacetonate titanium (T-50, manufactured by Nippon Soda Co., Ltd.) was placed in a mixed solvent of 77.76 g of methyl isobutyl ketone and 36.88 g of ethanol, and stirred to dissolve. -26.51 g of methacryloxypropyltrimethoxysilane and then 36.90 g of vinyltrimethoxysilane were added and stirred to dissolve. 12.82 g of ion-exchanged water was added to this solution, and the composition [B-1] having a solid content mass conversion concentration of 20% was prepared by stirring for 2 hours and performing a hydrolysis and condensation reaction.
[B-1] 7.0 g was dissolved in 693.0 g of methyl ethyl ketone to prepare 700.0 g [X-4] of a coating agent having a solid content mass conversion concentration of 0.2%.
2.下地処理基板の作製
予めアセトンで超音波洗浄した電解めっきニッケル基板(25mm×25mm)の表面を、10分間のUVオゾン洗浄(約12000mJ/cm2)により処理した。このニッケル基板にコーティング組成物[X−4]にディップコートした後、100℃で10分間加熱乾燥することで下地処理基板[Y−2]を作製した。
2. Preparation of Substrate Treated Substrate The surface of an electroplated nickel substrate (25 mm × 25 mm) previously ultrasonically cleaned with acetone was treated by UV ozone cleaning (about 12000 mJ / cm 2 ) for 10 minutes. The nickel substrate was dip-coated with the coating composition [X-4], and then heat-dried at 100 ° C. for 10 minutes to prepare a base treatment substrate [Y-2].
3.自己組織化膜(SAM)処理基板の作製
[Y−2]を10分間のUVオゾン洗浄(約12000mJ/cm2)により表面処理し、SAM形成溶液(SAMLAY(登録商標)、日本曹達製)に10分間浸漬し、その後、その表面を炭化水素系洗浄剤(NSクリーン100、JX日鉱日石エネルギー製)中で超音波洗浄することで、SAM処理基板[Z−4]を得た。
3. Preparation of self-assembled film (SAM) -treated substrate [Y-2] was surface treated by UV ozone cleaning (about 12000 mJ / cm 2 ) for 10 minutes to form a SAM-forming solution (SAMLAY (registered trademark), manufactured by Nippon Soda) After immersing for 10 minutes, the surface was ultrasonically cleaned in a hydrocarbon-based cleaning agent (NS Clean 100, manufactured by JX Nippon Mining & Energy) to obtain a SAM-treated substrate [Z-4].
4.撥液性の評価
得られた[Z−4]の静的接触角を接触角測定器(Drop Master 700、協和界面科学製)を用いて測定した。その結果を表1に示す。
4). Evaluation of liquid repellency The static contact angle of the obtained [Z-4] was measured using a contact angle measuring device (Drop Master 700, manufactured by Kyowa Interface Science). The results are shown in Table 1.
実施例2
実施例1で作製したコーティング組成物[B−1]7.0gを、メチルエチルケトン623.7gと1−メトキシ−2−プロパノール69.3gを混合した溶媒で希釈することで得た固形分の質量換算濃度0.2%のコーティング組成物[X−5]を使用すること以外は実施例1同様に、SAM処理基板[Z−5]を得た。
Example 2
Mass conversion of solid content obtained by diluting 7.0 g of coating composition [B-1] produced in Example 1 with a solvent obtained by mixing 623.7 g of methyl ethyl ketone and 69.3 g of 1-methoxy-2-propanol. A SAM-treated substrate [Z-5] was obtained in the same manner as in Example 1 except that the coating composition [X-5] having a concentration of 0.2% was used.
実施例3
組成物[B−1]7.0gを、ジイソプロピルエーテル693.0gで希釈することで得た固形分の質量換算濃度0.2%のコーティング組成物[X−6]を使用すること以外は実施例1と同様に、SAM処理基板[Z−6]を得た。
Example 3
Implemented except that 7.0 g of composition [B-1] was diluted with 693.0 g of diisopropyl ether, and coating composition [X-6] having a solid content concentration of 0.2% was used. In the same manner as in Example 1, a SAM-treated substrate [Z-6] was obtained.
比較例1
アセトンで超音波洗浄した電解めっきニッケル基板(25mm×25mm)の表面を、10分間のUVオゾン洗浄(約12000mJ/cm2)により処理し、SAM形成溶液(SAMLAY(登録商標)、日本曹達製)に10分間浸漬し、その後、その表面を炭化水素系洗浄剤(NSクリーン100、JX日鉱日石エネルギー製)中で超音波洗浄することで、SAM処理基板[Z−0]を得た。
Comparative Example 1
The surface of the electrolytically plated nickel substrate (25 mm × 25 mm) ultrasonically cleaned with acetone was treated with UV ozone cleaning (about 12000 mJ / cm 2 ) for 10 minutes to obtain a SAM forming solution (SAMLAY (registered trademark), manufactured by Nippon Soda). Then, the surface was ultrasonically cleaned in a hydrocarbon-based cleaning agent (NS Clean 100, manufactured by JX Nippon Oil & Energy Corporation) to obtain a SAM-treated substrate [Z-0].
Claims (3)
第1層が、式(I)
RnSiX4−n (I)
(式中、Rは、式中のSiに炭素原子が直接結合するような有機基を表し、Xは、水酸基又は加水分解性基を表す。nは1又は2を表し、nが2のとき、Rは同一であっても異なっていてもよく、(4−n)が2以上のとき、Xは同一であっても異なっていてもよい。)で表される有機ケイ素化合物の縮合物を主成分とし、キレート化又は配位化された金属化合物、有機酸金属塩化合物、2以上の水酸基若しくは加水分解性基を有する金属化合物、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも1種の化合物、及び/又はそれから誘導される化合物を含有する有機無機複合薄膜であって、第2層が、金属界面活性剤の加水分解縮合物を含有する層である積層体。 In the laminate formed in the order of the first layer and the second layer on the substrate,
The first layer is of formula (I)
R n SiX 4-n (I)
(In the formula, R represents an organic group in which a carbon atom is directly bonded to Si in the formula, X represents a hydroxyl group or a hydrolyzable group, n represents 1 or 2, and n is 2. , R may be the same or different, and when (4-n) is 2 or more, X may be the same or different.) From the group consisting of chelated or coordinated metal compounds, organic acid metal salt compounds, metal compounds having two or more hydroxyl groups or hydrolyzable groups, their hydrolysates, and their condensates as the main component A laminate comprising an organic-inorganic composite thin film containing at least one selected compound and / or a compound derived therefrom, wherein the second layer is a layer containing a hydrolytic condensate of a metal surfactant.
R11 SM11X11 t−s (II)
〔式中、R11は、置換基を有していてもよい炭素数1〜30の炭化水素基、置換基を有していてもよい炭素数1〜30のハロゲン化炭化水素基、連結基を含む炭素数1〜30の炭化水素基、又は連結基を含む炭素数1〜30のハロゲン化炭化水素基を表し、M11は、ケイ素原子、ゲルマニウム原子、スズ原子、チタン原子、及びジルコニウム原子からなる群から選ばれる少なくとも1種の金属原子を表し、X11は、水酸基又は加水分解性基を表し、tはMの原子価を表す。sは、1から(t−1)のいずれかの正整数を表し、sが2以上の場合、R11は、互いに同一でも相異なっていてもよい。(t−s)が2以上の場合、X11は同一であっても、相異なっていてもよいが、X11のうち、少なくとも1個は加水分解性基である。〕で示される化合物である請求項1に記載の積層体。 The metal surfactant is represented by the formula (II)
R 11 S M 11 X 11 t -s (II)
[Wherein, R 11 represents a hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, a halogenated hydrocarbon group having 1 to 30 carbon atoms which may have a substituent, or a linking group. Represents a hydrocarbon group having 1 to 30 carbon atoms or a halogenated hydrocarbon group having 1 to 30 carbon atoms including a linking group, and M 11 represents a silicon atom, a germanium atom, a tin atom, a titanium atom, and a zirconium atom. Represents at least one metal atom selected from the group consisting of: X 11 represents a hydroxyl group or a hydrolyzable group, and t represents the valence of M. s represents any positive integer from 1 to (t−1), and when s is 2 or more, R 11 may be the same as or different from each other. When (ts) is 2 or more, X 11 may be the same or different, but at least one of X 11 is a hydrolyzable group. The laminate according to claim 1, which is a compound represented by the formula:
RnSiX4−n (I)
(式中、RはSiに炭素原子が直接結合する有機基を表し、Xは水酸基又は加水分解性基を表す。nは1又は2を表し、nが2のとき各Rは同一でも異なっていてもよく、(4−n)が2以上のとき各Xは同一でも異なっていてもよい。)で表される有機ケイ素化合物及び/又はその縮合物、並びに、キレート化又は配位化された金属化合物、有機酸金属塩化合物、2以上の水酸基若しくは加水分解性基を有する金属化合物、それらの加水分解物、及びそれらの縮合物からなる群より選ばれる少なくとも1種の化合物を含有する固形分量が0.01〜20.0質量%である有機無機複合薄膜形成用組成物を塗布することにより有機無機複合薄膜を作製し、
(B)当該、有機無機複合薄膜にプラズマ処理又はUVオゾン処理を施した後、 金属界面活性剤の加水分解縮合物である層を作製する積層体の製造方法。
(A) On the substrate, the formula (I)
R n SiX 4-n (I)
(In the formula, R represents an organic group in which a carbon atom is directly bonded to Si, X represents a hydroxyl group or a hydrolyzable group. N represents 1 or 2, and when n is 2, each R is the same or different. And when the number of (4-n) is 2 or more, each X may be the same or different.) And / or a condensate thereof, and chelated or coordinated Solid content containing at least one compound selected from the group consisting of metal compounds, organic acid metal salt compounds, metal compounds having two or more hydroxyl groups or hydrolyzable groups, hydrolysates thereof, and condensates thereof An organic-inorganic composite thin film was prepared by applying a composition for forming an organic-inorganic composite thin film having a mass of 0.01-20.0% by mass,
(B) The manufacturing method of the laminated body which produces the layer which is the hydrolysis-condensation product of a metal surfactant, after giving the said organic-inorganic composite thin film plasma treatment or UV ozone treatment.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017204288A (en) * | 2004-06-02 | 2017-11-16 | インターデイジタル テクノロジー コーポレーション | Reporting for capability of terminal for supporting short message service |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0596679A (en) * | 1990-12-10 | 1993-04-20 | Matsushita Electric Ind Co Ltd | Adsorption monolayer and method for producing the same |
| JPH08337654A (en) * | 1995-06-14 | 1996-12-24 | Matsushita Electric Ind Co Ltd | Method for producing chemical adsorption film and chemical adsorption liquid used for the same |
| JP2001098388A (en) * | 1999-09-24 | 2001-04-10 | Matsushita Electric Ind Co Ltd | Antifouling reflector and cooking appliance or heating appliance having the same |
| JP2010059302A (en) * | 2008-09-03 | 2010-03-18 | Soft99 Corporation | Two-agent type water-repellent treatment agent for coating surface |
| JP2013220608A (en) * | 2012-04-17 | 2013-10-28 | Nippon Soda Co Ltd | Water repellent film |
-
2014
- 2014-07-10 JP JP2014142562A patent/JP2016016641A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0596679A (en) * | 1990-12-10 | 1993-04-20 | Matsushita Electric Ind Co Ltd | Adsorption monolayer and method for producing the same |
| JPH08337654A (en) * | 1995-06-14 | 1996-12-24 | Matsushita Electric Ind Co Ltd | Method for producing chemical adsorption film and chemical adsorption liquid used for the same |
| JP2001098388A (en) * | 1999-09-24 | 2001-04-10 | Matsushita Electric Ind Co Ltd | Antifouling reflector and cooking appliance or heating appliance having the same |
| JP2010059302A (en) * | 2008-09-03 | 2010-03-18 | Soft99 Corporation | Two-agent type water-repellent treatment agent for coating surface |
| JP2013220608A (en) * | 2012-04-17 | 2013-10-28 | Nippon Soda Co Ltd | Water repellent film |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017204288A (en) * | 2004-06-02 | 2017-11-16 | インターデイジタル テクノロジー コーポレーション | Reporting for capability of terminal for supporting short message service |
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