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JP2016080571A - Particle amount measuring device - Google Patents

Particle amount measuring device Download PDF

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JP2016080571A
JP2016080571A JP2014213555A JP2014213555A JP2016080571A JP 2016080571 A JP2016080571 A JP 2016080571A JP 2014213555 A JP2014213555 A JP 2014213555A JP 2014213555 A JP2014213555 A JP 2014213555A JP 2016080571 A JP2016080571 A JP 2016080571A
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periodic structure
light
light source
lens
mask
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貴秀 畠堀
Takahide Hatakebori
貴秀 畠堀
田窪 健二
Kenji Takubo
健二 田窪
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Shimadzu Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a particle amount measurement device capable of measuring amount of particles caught on a mesh at a low cost without using any conventional spectrometer or array type optical detector.SOLUTION: A mesh 43 which has a periodic structure is irradiated with a beam of collimated monochromatic light L. Only the light D0, D1, etc., which is diffracted by the periodic structure, is blocked from propagation by a mask 56. Particles caught by the mesh 43 scatters the collimated monochromatic light L in various directions. An optical detector 58 selectively detects the scattered light S only.SELECTED DRAWING: Figure 7

Description

本発明は、PM2.5等の浮遊微粒子や液滴中の懸濁粒子等の粒子の量を測定する装置に関する。   The present invention relates to an apparatus for measuring the amount of particles such as suspended fine particles such as PM2.5 and suspended particles in droplets.

空気中の浮遊微粒子や液滴中の懸濁粒子等の量を測定する方法の一つに、特許文献1に記載のような、メッシュにおける電磁波共鳴を用いた方法がある。この方法の概要は次の通りである。まず、図1(a)のような、測定しようとする微粒子の大きさに応じた開口102が周期的に配置された周期構造体(メッシュ)101を用意し、そのメッシュ101に向けて所定波長範囲の電磁波を放射して、メッシュ101を透過する電磁波の透過率スペクトルを測定する。この透過率スペクトル(図2の実線)には、開口102の周期に応じた周波数(波長)において電磁波共鳴による透過率の谷が生じる。次に、そのメッシュ101で空気中や液滴中の微粒子103を捕捉し、微粒子103が載置されたメッシュ101(図1(b))に同じ電磁波を照射して透過率スペクトル(図2の破線)を測定する。この透過率スペクトルにおける透過率の谷の位置(周波数)は、微粒子103が載置されていないメッシュ101の場合からシフト(Δf)している。また、谷の深さも変化する(図2)。予め様々な既知の微粒子の載置量とシフト(及び深さの変化)の関係を測定しておき、図3に示すような検量線を作成しておくことにより、未知の微粒子の捕捉量を決定することができる。   As one of methods for measuring the amount of suspended fine particles in air or suspended particles in droplets, there is a method using electromagnetic wave resonance in a mesh as described in Patent Document 1. The outline of this method is as follows. First, as shown in FIG. 1A, a periodic structure (mesh) 101 in which openings 102 corresponding to the size of fine particles to be measured are periodically arranged is prepared, and a predetermined wavelength is directed toward the mesh 101. The transmittance spectrum of the electromagnetic wave that radiates a range of electromagnetic waves and passes through the mesh 101 is measured. In this transmittance spectrum (solid line in FIG. 2), a trough of transmittance due to electromagnetic resonance occurs at a frequency (wavelength) corresponding to the period of the opening 102. Next, the fine particles 103 in the air or droplets are captured by the mesh 101, and the same electromagnetic wave is applied to the mesh 101 (FIG. 1 (b)) on which the fine particles 103 are placed to transmit a transmittance spectrum (in FIG. 2). Measure the broken line. The position (frequency) of the transmittance valley in the transmittance spectrum is shifted (Δf) from the case of the mesh 101 on which the fine particles 103 are not placed. Moreover, the depth of the valley also changes (FIG. 2). By measuring the relationship between the loading amount and shift (and change in depth) of various known fine particles in advance, and preparing a calibration curve as shown in FIG. Can be determined.

WO2012/132111号公報WO2012 / 132111 Publication

上記従来の方法においては、メッシュを通過してきた電磁波のスペクトルを得るため、分光器やアレイ型検出器が必要となる。また、透過率スペクトルに現れる谷の周波数はメッシュの周期によって決まるが、メッシュに流体を通過させる必要がある場合、機械的強度をもたせるために、メッシュの周期は数μm程度となる。これに対応する電磁波は中赤外線〜遠赤外線領域となるが、このような帯域において十分な強度を有する光源や十分な感度を有する検出器は、一般にコストの高いものとなる。   In the conventional method, a spectroscope or an array type detector is required to obtain a spectrum of electromagnetic waves that have passed through the mesh. Further, the frequency of the valleys appearing in the transmittance spectrum is determined by the period of the mesh, but when it is necessary to allow fluid to pass through the mesh, the period of the mesh is about several μm in order to give mechanical strength. Corresponding electromagnetic waves are in the mid-infrared to far-infrared region, but a light source having sufficient intensity in such a band and a detector having sufficient sensitivity are generally expensive.

本発明が解決しようとする課題は、より簡単な構造であって、低コストでメッシュ上に載置された粒子の量を測定することのできる装置を提供することである。   The problem to be solved by the present invention is to provide an apparatus having a simpler structure and capable of measuring the amount of particles placed on a mesh at a low cost.

上記課題を解決するために成された本発明に係る粒子量測定装置の第1の態様のものは、
a) 平行な単色光を発する光源と、
b) 前記光源に対向するように配置された面内に、前記単色光を透過する透過部と透過しない非透過部による周期構造が形成された周期構造体と、
c) 前記周期構造体を挟んで前記光源の反対側であって、前記周期構造による回折光の陰の位置に設けられた光検出器と
を備えることを特徴とする。
The thing of the 1st aspect of the particle amount measuring apparatus based on this invention made in order to solve the said subject is as follows.
a) a light source emitting parallel monochromatic light;
b) a periodic structure in which a periodic structure is formed by a transmitting portion that transmits the monochromatic light and a non-transmitting portion that does not transmit, in a plane arranged to face the light source;
and c) a photodetector provided on the opposite side of the light source with the periodic structure interposed therebetween and in a position behind the diffracted light by the periodic structure.

本発明の第1の態様に係る粒子量測定装置の概略構成を示すと図4のようになる。光検出器13は周期構造体12に関して光源11とは反対側の、光源11からの平行な単色光Lが周期構造体12の周期構造により回折して向かう光路D0、D1から外れた位置(「回折光の陰の位置」)に設けられている。なお、図4において周期構造体12(周期構造が形成された面)は光源11からの平行な単色光Lに垂直に配置されているが、これは斜めであっても構わない。   FIG. 4 shows a schematic configuration of the particle amount measurement apparatus according to the first aspect of the present invention. The light detector 13 is located on the opposite side of the light source 11 with respect to the periodic structure 12 and deviated from the optical paths D0 and D1 where the parallel monochromatic light L from the light source 11 is diffracted by the periodic structure of the periodic structure 12 (" It is provided at a position behind the diffracted light. In FIG. 4, the periodic structure 12 (the surface on which the periodic structure is formed) is disposed perpendicular to the parallel monochromatic light L from the light source 11, but this may be oblique.

光源11からの平行な単色光Lが周期構造体12に照射されると、単色光Lは、周期構造をそのまま通過する0次回折光D0の他に、周期構造により回折した1次回折光D1、2次回折光、…(いずれも実線)と、所定の角度をもって進んで行く光に分かれる。光検出器13は、これら回折光D0、D1、…の光路ではない位置(「回折光の陰の位置」)に設けられているため、通常の状態では、そこには光は入らない。   When the parallel monochromatic light L from the light source 11 is irradiated onto the periodic structure 12, the monochromatic light L is diffracted by the periodic structure in addition to the 0th-order diffracted light D0 passing through the periodic structure as it is. Next diffracted light,... (All solid lines) and light traveling at a predetermined angle. Since the photodetector 13 is provided at a position that is not the optical path of these diffracted lights D0, D1,... ("The position behind the diffracted light"), no light enters the light detector 13 in a normal state.

一方、周期構造体12上に図1(b)のように粒子Pが存在している場合、光源11からの平行な単色光Lはそれらの粒子Pにより散乱される。散乱された光S(破線)は前記のような回折光D0、D1、…とは別に様々な方向に進むため、前記位置にある光検出器13で検出することができる。この場合、光検出器13で検出される光の量は、周期構造体12上に存在する粒子Pの量に対応するため、予め検量線を作成しておくことにより、粒子Pの量を測定することができる。なお、図4では光検出器13は2個設けられているが、これはもちろん1個でも構わないし、感度を上げるためにそれ以上設けても良い。   On the other hand, when the particles P are present on the periodic structure 12 as shown in FIG. 1B, the parallel monochromatic light L from the light source 11 is scattered by the particles P. Since the scattered light S (broken line) travels in various directions separately from the diffracted light D0, D1,... As described above, it can be detected by the photodetector 13 at the position. In this case, since the amount of light detected by the photodetector 13 corresponds to the amount of particles P existing on the periodic structure 12, the amount of particles P is measured by preparing a calibration curve in advance. can do. In FIG. 4, two photodetectors 13 are provided. Of course, one photodetector may be provided, or more photodetectors 13 may be provided to increase sensitivity.

上記課題を解決するために成された本発明に係る粒子量測定装置の第2の態様のものは、
a) 平行な単色光を発する単色光源と、
b) 前記単色光源に対向するように配置された面内に、前記単色光を透過する透過部と透過しない非透過部による周期構造が形成された周期構造体と、
c) 前記周期構造体を挟んで前記光源の反対側に配置された、前記周期構造による回折光の光路の位置に遮光部を有するマスクと、
d) 前記マスクの後方に設けられた集光レンズと、
e) 前記集光レンズが前記周期構造体からの光を集光する位置に設けられた光検出器と
を備えることを特徴とする。
The thing of the 2nd aspect of the particle amount measuring apparatus based on this invention made in order to solve the said subject is as follows.
a) a monochromatic light source emitting parallel monochromatic light;
b) a periodic structure in which a periodic structure is formed by a transmitting portion that transmits the monochromatic light and a non-transmitting portion that does not transmit, in a plane arranged to face the single-color light source;
c) a mask having a light-shielding portion at the position of the optical path of the diffracted light by the periodic structure, disposed on the opposite side of the light source with the periodic structure interposed therebetween;
d) a condensing lens provided behind the mask;
e) The condensing lens includes a photodetector provided at a position for condensing light from the periodic structure.

本発明の第2の態様に係る粒子量測定装置の概略構成を示すと図5のようになる。マスク23は周期構造体22に関して光源21とは反対側に設けられ、光源21からの平行な単色光Lが周期構造体22の周期構造により回折して向かう光路D0、D1、…(実線)の位置に遮光部23aを有する。その他の箇所の光は透過させる。図4の場合と同様、図5でも周期構造体22(周期構造が形成された面)は光源21からの平行な単色光Lに垂直に配置されているが、これは斜めであっても構わない。また、マスク23も、回折光D0、D1、…を遮光しさえすれば、周期構造体22に対して斜めであっても構わない。集光レンズ24はマスク23の後方、すなわち、マスク23に関して周期構造体22とは反対側に設けられ、光検出器25はその集光レンズ24のさらに後方に配置されている。   FIG. 5 shows a schematic configuration of the particle amount measuring apparatus according to the second aspect of the present invention. The mask 23 is provided on the opposite side of the light source 21 with respect to the periodic structure 22, and the parallel monochromatic light L from the light source 21 is diffracted by the periodic structure of the periodic structure 22 along the optical paths D0, D1,. A light shielding part 23a is provided at the position. Light in other places is transmitted. 4, the periodic structure 22 (surface on which the periodic structure is formed) is arranged perpendicular to the parallel monochromatic light L from the light source 21 in FIG. 5, but this may be oblique. Absent. Further, the mask 23 may be inclined with respect to the periodic structure 22 as long as the diffracted light D0, D1,. The condensing lens 24 is provided behind the mask 23, that is, on the side opposite to the periodic structure 22 with respect to the mask 23, and the photodetector 25 is disposed further rearward of the condensing lens 24.

光源21からの平行な単色光Lが周期構造体22に照射されると、単色光Lは、周期構造をそのまま通過する0次回折光D0の他に、周期構造により回折した1次回折光D1、2次回折光、…と、所定の角度をもって進んで行く光に分かれる。マスク23は、これら回折光D0、D1、…の光路の位置に遮光部23aを有するため、これら回折光D0、D1、…は通過させない。   When the parallel monochromatic light L from the light source 21 is applied to the periodic structure 22, the monochromatic light L is diffracted by the periodic structure in addition to the 0th-order diffracted light D0 that passes through the periodic structure as it is. Next diffracted light,..., And light traveling at a predetermined angle. Since the mask 23 has a light shielding portion 23a at the position of the optical path of these diffracted lights D0, D1,..., These diffracted lights D0, D1,.

一方、周期構造体22上に図1(b)のように粒子Pが存在している場合、光源21からの平行な単色光Lはそれらの粒子Pにより散乱される。散乱された光S(破線)は前記のような回折光D0、D1、…とは別に様々な方向に進むため、マスク23の遮光部23a以外の部分を通過し、集光レンズ24に向かう。それら散乱光Sは集光レンズ24により集光され、光検出器25に入射する。従って、光検出器25では、周期構造体22上の粒子Pにより散乱された光Sのみを検出することができる。この光の量は、周期構造体22上に存在する粒子Pの量に対応するため、予め検量線を作成しておくことにより、粒子Pの量を測定することができる。   On the other hand, when the particles P are present on the periodic structure 22 as shown in FIG. 1B, the parallel monochromatic light L from the light source 21 is scattered by the particles P. Since the scattered light S (broken line) travels in various directions apart from the diffracted light D0, D1,... As described above, it passes through the portion other than the light shielding portion 23a of the mask 23 and travels toward the condenser lens 24. The scattered light S is collected by the condensing lens 24 and enters the photodetector 25. Therefore, the photodetector 25 can detect only the light S scattered by the particles P on the periodic structure 22. Since the amount of light corresponds to the amount of particles P existing on the periodic structure 22, the amount of particles P can be measured by preparing a calibration curve in advance.

上記課題を解決するために成された本発明に係る粒子量測定装置の第3の態様のものは、
a) 平行な単色光を発する単色光源と、
b) 前記単色光源に対向するように配置された面内に、前記単色光を透過する透過部と透過しない非透過部による周期構造が形成された周期構造体と、
c) 前記周期構造体を挟んで前記光源の反対側に配置された、前記周期構造体を焦点とする第1レンズと、
d) 前記第1レンズの後方に配置された、前記周期構造による回折光の焦点の位置に遮光部を有するマスクと、
e) 前記マスクの後方に設けられた第2レンズと、
f) 前記第2レンズの焦点の位置に設けられた光検出器と
を備えることを特徴とする。
The thing of the 3rd aspect of the particle amount measuring device based on this invention made in order to solve the said subject is as follows.
a) a monochromatic light source emitting parallel monochromatic light;
b) a periodic structure in which a periodic structure is formed by a transmitting portion that transmits the monochromatic light and a non-transmitting portion that does not transmit, in a plane arranged to face the single-color light source;
c) a first lens that is disposed on the opposite side of the light source with the periodic structure interposed therebetween and that focuses on the periodic structure;
d) a mask disposed behind the first lens and having a light-shielding portion at the position of the focal point of the diffracted light by the periodic structure;
e) a second lens provided behind the mask;
and f) a photodetector provided at the focal position of the second lens.

本発明の第3の態様に係る粒子量測定装置の概略構成を示すと図6のようになる。本態様では、周期構造体32の後方にまず第1レンズ33が設けられ、その後、マスク34、第2レンズ35、光検出器36が配置される。周期構造体32と第1レンズ33の間の距離は第1レンズ33の焦点距離fとされ、第1レンズ33とマスク34の間の距離も同じ距離fとされる。第1レンズ33、マスク34、第2レンズ35の傾斜については、前記2つの態様と同様、許容される。   FIG. 6 shows a schematic configuration of the particle amount measuring apparatus according to the third aspect of the present invention. In this aspect, the first lens 33 is first provided behind the periodic structure 32, and then the mask 34, the second lens 35, and the photodetector 36 are disposed. The distance between the periodic structure 32 and the first lens 33 is the focal length f of the first lens 33, and the distance between the first lens 33 and the mask 34 is also the same distance f. The inclination of the first lens 33, the mask 34, and the second lens 35 is allowed as in the above two aspects.

光源31からの平行な単色光Lが周期構造体32に照射されると、単色光Lは、周期構造をそのまま通過する0次回折光D0の他に、周期構造により回折した1次回折光D1、2次回折光、…(実線)と、所定の角度をもって進んで行く光に分かれる。これら回折光D0、D1、…はそれぞれ平行に各方向に進むため、第1レンズ33はこれら回折光D0、D1、…をマスク34の遮光部34a上に集光する。従って、回折光D0、D1、…は全てこのマスク34により遮光される。   When the parallel monochromatic light L from the light source 31 is irradiated on the periodic structure 32, the monochromatic light L is diffracted by the periodic structure in addition to the 0th-order diffracted light D0 passing through the periodic structure as it is. Next diffracted light, ... (solid line), and light traveling at a predetermined angle. Since these diffracted lights D0, D1,... Travel in parallel in the respective directions, the first lens 33 condenses these diffracted lights D0, D1,. Therefore, all of the diffracted light D0, D1,...

一方、周期構造体32上に図1(b)のように粒子Pが存在している場合、光源31からの平行な単色光Lはそれらの粒子Pにより散乱される。散乱された光S(破線)は前記のような回折光D0、D1、…とは別に様々な方向に進むが、周期構造体32を出発点とするため、第1レンズ33により平行光にされ、マスク34の遮光部34a以外の部分を透過して第2レンズ35に向かう。これら粒子Pからの散乱光は第2レンズ35で光検出器36に集光される。光検出器36で測定される光の量は、周期構造体32上に存在する粒子Pの量に対応するため、予め検量線を作成しておくことにより、粒子Pの量を測定することができる。   On the other hand, when the particles P are present on the periodic structure 32 as shown in FIG. 1B, the parallel monochromatic light L from the light source 31 is scattered by the particles P. The scattered light S (broken line) travels in various directions apart from the diffracted light D0, D1,... As described above, but is made parallel light by the first lens 33 since it starts from the periodic structure 32. Then, the light passes through a portion of the mask 34 other than the light shielding portion 34 a and travels toward the second lens 35. The scattered light from these particles P is collected by the second lens 35 onto the photodetector 36. Since the amount of light measured by the photodetector 36 corresponds to the amount of particles P existing on the periodic structure 32, the amount of particles P can be measured by preparing a calibration curve in advance. it can.

本発明に係る粒子量測定装置では、いずれの態様のものにおいても、従来のような分光器やアレイ型検出器が必要でなく、低コストで粒子量を測定することができる。   The particle amount measuring apparatus according to the present invention does not require a conventional spectroscope or array type detector in any aspect, and can measure the particle amount at low cost.

粒子量測定装置で用いる周期構造体(メッシュ)の一例の平面図(a)及び粒子が付着した状態の平面図(b)。The top view (a) of an example of the periodic structure (mesh) used with a particle amount measuring apparatus, and the top view (b) of the state which the particle | grains adhered. 周期構造体上への粒子付着による電磁波透過スペクトルのシフトの状態を示す説明図。Explanatory drawing which shows the state of the shift of the electromagnetic wave transmission spectrum by particle | grain adhesion on a periodic structure. 電磁波透過スペクトルの周波数シフトと付着粒子の量の関係を示す検量線の一例の図。The figure of an example of the analytical curve which shows the relationship between the frequency shift of an electromagnetic wave transmission spectrum, and the quantity of adhesion particle | grains. 本発明に係る粒子量測定装置の第1の態様の概略構成図。BRIEF DESCRIPTION OF THE DRAWINGS The schematic block diagram of the 1st aspect of the particle amount measuring apparatus which concerns on this invention. 本発明に係る粒子量測定装置の第2の態様の概略構成図。The schematic block diagram of the 2nd aspect of the particle amount measuring apparatus which concerns on this invention. 本発明に係る粒子量測定装置の第3の態様の概略構成図。The schematic block diagram of the 3rd aspect of the particle quantity measuring apparatus which concerns on this invention. 本発明の一実施例である粒子量測定装置の概略構成図。BRIEF DESCRIPTION OF THE DRAWINGS The schematic block diagram of the particle amount measuring apparatus which is one Example of this invention.

本発明に係る粒子量測定装置の一実施例を図7により説明する。この粒子量測定装置は、本発明の第3の態様に係るものの実施例である。
本実施例の粒子量測定装置40は、大別すると光源部41と測定部42から成り、測定部42の上部に周期構造体(メッシュ)43を載置するためのメッシュ載置部45が設けられている。本実施例の粒子量測定装置40で用いるメッシュ43は金属製の網であっても良いし、光を回折しさえすればプラスチック等の他の材料の網であっても良い。このメッシュ43を流体の流路中に置くことにより、流体中に浮遊する粒子を捕捉することができる。このようにしてメッシュ43上に捕捉された粒子の量は、空気中や流体中の浮遊粒子量と相関関係を有すると考えられる。
An embodiment of the particle amount measuring apparatus according to the present invention will be described with reference to FIG. This particle amount measuring apparatus is an example according to the third aspect of the present invention.
The particle amount measuring apparatus 40 of the present embodiment is roughly composed of a light source unit 41 and a measuring unit 42, and a mesh mounting unit 45 for mounting a periodic structure (mesh) 43 is provided on the upper part of the measuring unit 42. It has been. The mesh 43 used in the particle amount measuring apparatus 40 of the present embodiment may be a metal net, or may be a net of other materials such as plastic as long as light is diffracted. By placing the mesh 43 in the fluid flow path, particles floating in the fluid can be captured. The amount of particles trapped on the mesh 43 in this way is considered to have a correlation with the amount of suspended particles in the air or fluid.

光源部41には、レーザー光源51と、そのレーザー光源51からの光束をメッシュ43の大きさに応じて拡幅するための光学系52が備えられている。メッシュ43が小さい場合には、この拡幅光学系52は不要である。   The light source unit 41 includes a laser light source 51 and an optical system 52 for widening the light beam from the laser light source 51 in accordance with the size of the mesh 43. When the mesh 43 is small, this widening optical system 52 is not necessary.

測定部42には、上から順に、第1レンズ55、マスク56、第2レンズ57及び光検出器58が設けられており、それらは内面が吸光面である筒状の筐体59に収納されている。第1レンズ55は、メッシュ載置部45に載置されたメッシュ43の面(周期構造が形成されている面)よりも第1レンズ55の焦点距離fだけ下方に設けられ、マスク56は、第1レンズ55よりも同じ距離fだけ下方に設けられている。光検出器58は第2レンズ57の下方の焦点位置に設けられている。   The measurement unit 42 is provided with a first lens 55, a mask 56, a second lens 57, and a photodetector 58 in order from the top, and these are housed in a cylindrical housing 59 whose inner surface is a light absorption surface. ing. The first lens 55 is provided below the surface of the mesh 43 placed on the mesh placement unit 45 (the surface on which the periodic structure is formed) by the focal length f of the first lens 55, and the mask 56 is The first lens 55 is provided below the same distance f. The photodetector 58 is provided at a focal position below the second lens 57.

本実施例の粒子量測定装置40の作用は前記本発明の第3態様(図6)について述べた通りであるが、ここで、この光学系の回折光に関する計算を行う。レーザー光源51が発する光(単色光)Lの波長をλ、メッシュ43の開口の間隔(ピッチ)をdとすると、メッシュの面に対して単色光Lが入射角αで入射すると、m次(m=0, ±1, ±2, …)の回折光の回折角βは、
d・(sinα±sinβ)=m・λ … (1)
なる式から計算することができる。
The operation of the particle amount measuring apparatus 40 of the present embodiment is as described for the third aspect of the present invention (FIG. 6), and here, calculations relating to the diffracted light of this optical system are performed. Assuming that the wavelength of light (monochromatic light) L emitted from the laser light source 51 is λ and the interval (pitch) of the openings of the mesh 43 is d, when the monochromatic light L is incident on the mesh surface at an incident angle α, mth order ( The diffraction angle β of the diffracted light at m = 0, ± 1, ± 2,…) is
d ・ (sinα ± sinβ) = m ・ λ… (1)
It can be calculated from the following formula.

例えば、PM2.5を測定するためのメッシュとしてd=3μmのメッシュ43を使用し、レーザー光源51として波長λ=0.78 μmのものを使用するとすると(この光源はCD用として量産されており、低コストで入手することができる。)、入射角α=0の時、回折角βは
m=0(0次回折光):β=0°
m=±1(1次回折光):β=15.1°
m=±2(2次回折光):β=31.3°
m=±3(3次回折光):β=51.3°
となる。従って、0次回折光と1次回折光をマスク56の遮光部56aで遮光し、2次以上の回折光を筐体59の側壁で吸収することにすれば、本実施例の粒子量測定装置40の本体は比較的コンパクトな筐体で作製することができる。
For example, if a mesh 43 of d = 3 μm is used as a mesh for measuring PM2.5, and a laser light source 51 having a wavelength of λ = 0.78 μm is used (this light source is mass-produced for CD, low Can be obtained at a cost.) When the incident angle α = 0, the diffraction angle β is
m = 0 (0th order diffracted light): β = 0 °
m = ± 1 (first-order diffracted light): β = 15.1 °
m = ± 2 (2nd order diffracted light): β = 31.3 °
m = ± 3 (3rd order diffracted light): β = 51.3 °
It becomes. Therefore, if the 0th-order diffracted light and the 1st-order diffracted light are shielded by the light-shielding part 56a of the mask 56 and the second-order or higher-order diffracted light is absorbed by the side wall of the housing 59, The main body can be manufactured with a relatively compact housing.

101…メッシュ
102…開口
103…微粒子
11、21、31、51…光源
12、22、32、43…周期構造体
13、25、36、58…光検出器
23、34、56…マスク
23a,34a、56a…遮光部
24…集光レンズ
33、55…第1レンズ
35、57…第2レンズ
40…粒子量測定装置
41…光源部
42…測定部
45…メッシュ載置部
52…拡幅光学系
59…筐体
DESCRIPTION OF SYMBOLS 101 ... Mesh 102 ... Opening 103 ... Fine particle 11, 21, 31, 51 ... Light source 12, 22, 32, 43 ... Periodic structure 13, 25, 36, 58 ... Photodetector 23, 34, 56 ... Mask 23a, 34a , 56a, the light shielding unit 24, the condensing lenses 33, 55, the first lens 35, 57, the second lens 40, the particle amount measuring device 41, the light source unit 42, the measuring unit 45, the mesh placing unit 52, and the widening optical system 59. ... Case

Claims (4)

a) 平行な単色光を発する光源と、
b) 前記光源に対向するように配置された面内に、前記単色光を透過する透過部と透過しない非透過部による周期構造が形成された周期構造体と、
c) 前記周期構造体を挟んで前記光源の反対側であって、前記周期構造による回折光の陰の位置に設けられた光検出器と
を備えることを特徴とする粒子量測定装置。
a) a light source emitting parallel monochromatic light;
b) a periodic structure in which a periodic structure is formed by a transmitting portion that transmits the monochromatic light and a non-transmitting portion that does not transmit, in a plane arranged to face the light source;
and c) a photo detector provided on the opposite side of the light source across the periodic structure and at a position behind the diffracted light by the periodic structure.
a) 平行な単色光を発する単色光源と、
b) 前記単色光源に対向するように配置された面内に、前記単色光を透過する透過部と透過しない非透過部による周期構造が形成された周期構造体と、
c) 前記周期構造体を挟んで前記光源の反対側に配置された、前記周期構造による回折光の光路の位置に遮光部を有するマスクと、
d) 前記マスクの後方に設けられた集光レンズと、
e) 前記集光レンズが前記周期構造体からの光を集光する位置に設けられた光検出器と
を備えることを特徴とする粒子量測定装置。
a) a monochromatic light source emitting parallel monochromatic light;
b) a periodic structure in which a periodic structure is formed by a transmitting portion that transmits the monochromatic light and a non-transmitting portion that does not transmit, in a plane arranged to face the single-color light source;
c) a mask having a light-shielding portion at the position of the optical path of the diffracted light by the periodic structure, disposed on the opposite side of the light source with the periodic structure interposed therebetween;
d) a condensing lens provided behind the mask;
e) a light amount detector provided at a position where the condensing lens condenses light from the periodic structure.
a) 平行な単色光を発する単色光源と、
b) 前記単色光源に対向するように配置された面内に、前記単色光を透過する透過部と透過しない非透過部による周期構造が形成された周期構造体と、
c) 前記周期構造体を挟んで前記光源の反対側に配置された、前記周期構造体を焦点とする第1レンズと、
d) 前記レンズの後方に配置された、前記周期構造による回折光の焦点の位置に遮光部を有するマスクと、
e) 前記マスクの後方に設けられた第2レンズと、
f) 前記第2レンズの焦点の位置に設けられた光検出器と
を備えることを特徴とする粒子量測定装置。
a) a monochromatic light source emitting parallel monochromatic light;
b) a periodic structure in which a periodic structure is formed by a transmitting portion that transmits the monochromatic light and a non-transmitting portion that does not transmit, in a plane arranged to face the single-color light source;
c) a first lens that is disposed on the opposite side of the light source with the periodic structure interposed therebetween and that focuses on the periodic structure;
d) a mask disposed behind the lens and having a light shielding portion at the position of the focal point of the diffracted light by the periodic structure;
e) a second lens provided behind the mask;
and f) a photo detector provided at a focal position of the second lens.
前記周期構造体と前記第1レンズ、前記マスク、前記第2レンズ、前記光検出器が吸光性の筒で囲われていることを特徴とする請求項3に記載の粒子量測定装置。   4. The particle amount measuring apparatus according to claim 3, wherein the periodic structure, the first lens, the mask, the second lens, and the photodetector are surrounded by a light-absorbing cylinder.
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