JP2016065050A - Octreotide production method - Google Patents
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
【課題】液相合成法における、高収率で高純度のオクトレオチドを製造する方法の提供。【解決手段】式(3)で表わされるアセタール化合物又はその塩を中間体として用いて、アミノ保護基であるR1aを脱離させ、保護アミノ酸との縮合反応をと保護基の脱離とを繰り返し、更に酸化反応を行ってオクトレオチド又はその塩を製造する方法。【選択図】なしProvided is a method for producing octreotide having high yield and high purity in a liquid phase synthesis method. [MEANS FOR SOLVING PROBLEMS] Using an acetal compound represented by formula (3) or a salt thereof as an intermediate, R1a which is an amino protecting group is eliminated, and a condensation reaction with a protected amino acid and elimination of the protecting group are repeated. And a method for producing octreotide or a salt thereof by further conducting an oxidation reaction. [Selection figure] None
Description
本発明は、オクトレオチドの製造法及びその製造中間体に関する。 The present invention relates to a method for producing octreotide and a production intermediate thereof.
持続性ソマトスタチンアナログとして開発されたオクトレオチドは、成長ホルモンや甲状腺刺激ホルモン等の過剰な分泌を抑制する効果を有する。具体的には、消化管ホルモン産生腫瘍(カルチノイド腫瘍,VIP産生腫瘍,グルカゴノーマ,インスリノーマ,ガストリン産生腫瘍等)や先端巨大症・下垂体性巨人症に伴う諸症状の改善、更には進行・再発癌患者の緩和医療における消化管閉塞に伴う消化器症状の改善のための薬剤として使用されている。 Octreotide developed as a long-lasting somatostatin analog has the effect of suppressing excessive secretion of growth hormone, thyroid stimulating hormone and the like. Specifically, gastrointestinal hormone-producing tumors (carcinoid tumors, VIP-producing tumors, glucagonomas, insulinomas, gastrin-producing tumors) and various symptoms associated with acromegaly / pituitary giantism, as well as advanced / recurrent cancer It is used as a drug for the improvement of gastrointestinal symptoms associated with gastrointestinal obstruction in patient palliative medicine.
オクトレオチドは、次式(A) Octreotide has the following formula (A)
で表されるジオール環状オクタペプチドであり、その製造法としては、固相合成法による方法(特許文献1〜3)及び液相合成法(特許文献4、5)が知られている。 As a method for producing the diol cyclic octapeptide represented by the formula (Patent Documents 1 to 3) and a liquid phase synthesis method (Patent Documents 4 and 5).
固相合成法の場合には、一般的に粗体純度が低く、大量合成が困難であり、また高価な樹脂を使用していることから、医薬品の工業的生産には不向きである。
一方、液相合成法においては、C末端のスレオニン残基をジオール化するために、ペプチド合成後に還元反応を行っているが、当該還元反応の収率が低く、工業的に有利な方法とは言えなかった。
従って、本発明の課題は、液相合成法において、高収率で高純度のオクトレオチドを製造する方法を提供することにある。
In the case of the solid-phase synthesis method, generally, the crude purity is low, mass synthesis is difficult, and expensive resins are used, which is not suitable for industrial production of pharmaceuticals.
On the other hand, in the liquid phase synthesis method, a reduction reaction is performed after peptide synthesis in order to diolify the C-terminal threonine residue. However, the yield of the reduction reaction is low and the industrially advantageous method is I could not say.
Accordingly, an object of the present invention is to provide a method for producing octreotide having high yield and high purity in a liquid phase synthesis method.
そこで本発明者は、液相合成法によるオクトレオチドの合成について種々検討した結果、C末端残基原料として、ジオール化されたスレオニンを用い、かつジオール部分の保護基としてジ長鎖アルコキシベンズアルデヒドによるアセタール保護基を用いれば、当該アセタール保護化合物の晶析性が高く、固液分離により単離が容易であることを見出した。つまりアミノ保護基の脱離及び保護アミノ酸との縮合反応の繰り返しによるペプチド伸長工程が効率良く進行し、最後に当該アセタール保護基を脱離させ、酸化してジスルフィド結合を形成させれば、液相合成法でオクトレオチドが高収率、高純度で得られることを見出し、本発明を完成した。 Therefore, as a result of various studies on the synthesis of octreotide by a liquid phase synthesis method, the present inventor used a diolated threonine as a C-terminal residue raw material, and acetal protection with a dilong-chain alkoxybenzaldehyde as a protecting group for the diol moiety It was found that when the group was used, the crystallizing property of the acetal-protecting compound was high, and isolation by solid-liquid separation was easy. In other words, if the peptide elongation process by the elimination of the amino protecting group and the condensation reaction with the protected amino acid proceeds efficiently, and finally the acetal protecting group is eliminated and oxidized to form a disulfide bond, the liquid phase The present inventors have found that octreotide can be obtained in a high yield and high purity by a synthesis method.
すなわち、本発明は、次の〔1〕〜〔3〕を提供するものである。 That is, the present invention provides the following [1] to [3].
〔1〕次の式(B) [1] The following formula (B)
(式中、R1は、水素原子、アミノ保護基、保護基を有していてもよいアミノ酸残基又は保護基を有していてもよいペプチド残基を示し;
R2及びR3は、それぞれ独立して、炭素数14〜30のアルキル基を示し;
X、Y及びZは、それぞれ独立して、水素原子、ハロゲン原子、置換基を有していてもよい炭素数1〜10の炭化水素基又は置換基を有していてもよい炭素数1〜10のアシル基を示す)
で表されるアセタール化合物又はその塩。
〔2〕次の式(1)
(Wherein R 1 represents a hydrogen atom, an amino protecting group, an amino acid residue optionally having a protecting group or a peptide residue optionally having a protecting group;
R 2 and R 3 each independently represents an alkyl group having 14 to 30 carbon atoms;
X, Y and Z are each independently a hydrogen atom, a halogen atom, an optionally substituted hydrocarbon group having 1 to 10 carbon atoms or an optionally substituted carbon atom having 1 to 1 carbon atoms. Represents 10 acyl groups)
Or an acetal compound represented by the formula:
[2] The following formula (1)
(式中、R1aはアミノ保護基を示す。)
で表されるジオール化合物と式(2)
(In the formula, R 1a represents an amino protecting group.)
And a diol compound represented by formula (2)
(式中、R2及びR3は、それぞれ独立して、炭素数14〜30のアルキル基を示し;
X、Y及びZは、それぞれ独立して、水素原子、ハロゲン原子、置換基を有していてもよい炭素数1〜10の炭化水素基又は置換基を有していてもよい炭素数1〜10のアシル基を示す)
で表されるベンズアルデヒド化合物とを酸の存在下に反応させることを特徴とする、式(3)
(Wherein R 2 and R 3 each independently represents an alkyl group having 14 to 30 carbon atoms;
X, Y and Z are each independently a hydrogen atom, a halogen atom, an optionally substituted hydrocarbon group having 1 to 10 carbon atoms or an optionally substituted carbon atom having 1 to 1 carbon atoms. Represents 10 acyl groups)
And a benzaldehyde compound represented by the formula (3) is reacted in the presence of an acid:
(式中、R1a、R2、R3、X、Y及びZは前記と同じ)
で表されるアセタール化合物の製造法。
〔3〕前記〔2〕記載の製造法により得られたアセタール化合物(3)のアミノ保護基R1aを脱離させ、保護アミノ酸との縮合反応と保護基の脱離とを繰り返し、さらに酸化反応を行うことを特徴とする式(A)
(Wherein R 1a , R 2 , R 3 , X, Y and Z are the same as above)
The manufacturing method of the acetal compound represented by these.
[3] The amino protecting group R 1a of the acetal compound (3) obtained by the production method described in [2] above is eliminated, the condensation reaction with the protected amino acid and the elimination of the protecting group are repeated, and the oxidation reaction (A) characterized in that
で表されるオクトレオチド又はその塩の製造法。 The manufacturing method of the octreotide represented by these, or its salt.
式(3)のアセタール化合物は、晶析性が高く、固液分離により容易に単離できることから、ペプチド鎖形成反応後の各中間体の単離、精製も容易である。また、液相合成法によりペプチド伸長工程を行うため、通常の反応缶で合成可能である。 Since the acetal compound of the formula (3) has high crystallinity and can be easily isolated by solid-liquid separation, each intermediate after the peptide chain formation reaction can be easily isolated and purified. Moreover, since the peptide elongation process is performed by a liquid phase synthesis method, it can be synthesized in a normal reaction vessel.
本発明の式(A)で表されるオクトレオチド又はその塩は、次の反応式に従って、液相合成法により製造される。 Octreotide represented by the formula (A) of the present invention or a salt thereof is produced by a liquid phase synthesis method according to the following reaction formula.
(式中、R4はチオールの保護基を示し、R5は水酸基の保護基を示し、X、Y、Z、R1a、R2及びR3は前記と同じ。) (In the formula, R 4 represents a thiol protecting group, R 5 represents a hydroxyl protecting group, and X, Y, Z, R 1a , R 2 and R 3 are the same as above.)
すなわち、オクトレオチド又はその塩は、式(1)で表されるジオール化合物と式(2)で表されるベンズアルデヒド化合物とを酸の存在下に反応させて、式(3)で表されるアセタール化合物を得、当該化合物(3)のアミノ保護基を脱離させ、保護アミノ酸との縮合反応と保護基の脱離を繰り返して式(18)の化合物を得、次いで酸化反応を行うことにより製造される。ここで、保護アミノ酸の反応は、上記反応式の如く、保護Cys、保護Thr、保護Lys、保護Trp、保護Phe、保護Cys、保護Pheの順に反応させることにより行なわれる。 That is, octreotide or a salt thereof is obtained by reacting a diol compound represented by the formula (1) and a benzaldehyde compound represented by the formula (2) in the presence of an acid, and thereby representing an acetal compound represented by the formula (3). Prepared by removing the amino protecting group of the compound (3), repeating the condensation reaction with the protected amino acid and elimination of the protecting group to obtain the compound of formula (18), and then carrying out the oxidation reaction. The Here, the reaction of the protected amino acid is carried out by reacting in the order of protected Cys, protected Thr, protected Lys, protected Trp, protected Phe, protected Cys, and protected Phe as shown in the above reaction formula.
R1aは、アミノ保護基を示す。アミノ保護基としては、(1)酸で脱離できる保護基(例えば、t−ブトキシカルボニル基(Boc)、p−メトキシベンジルオキシカルボニル基(Moz)、ホルミル基(CHO)、2−(トリメチルシリル)エトキシカルボニル基(Teoc)、1−アダマンチルオキシカルボニル基(Adoc)、2−(p−ビフェニル)イソプロピルオキシカルボニル基(Bpoc)、トリフェニルメチル基(Tr)、メトキシメチル基(MOM));(2)還元で脱離できる保護基(例えば、ベンジルオキシカルボニル基(Cbz)、アリル基(Allyl)、N−ベンジルオキシメチル基(BOM));(3)塩基で脱離できる保護基(例えば、9−フルオレニルメチルオキシカルボニル基(Fmoc)、2−(4−ニトロフェニル)エトキシカルボニル基(Npeoc));(4)亜鉛末−酢酸などで脱離できる保護基(例えば、2,2,2−トリクロロエトキシカルボニル基(Troc)、N−ジチアスクシノイル基(Dts)、ベンゾチアゾール−2−スルホニル基(Betsyl)、1,1−ジメチル−2,2,2−トリクロロエトキシカルボニル基(TcBoc)、N−(ジフェニル−4−ピリジル)メチル基(Dppm));(5)パラジウム触媒下、アミンなどで脱離できる保護基(例えば、アリルオキシカルボニル基(Alloc))等が挙げられる。これらの保護基のうち、酸で脱離できる保護基、塩基で脱離できる保護基、または還元で脱離できる保護基を使用するのが好ましい。また、前記反応式中のR1aはそれぞれ同一でも異なっていてもよい。 R 1a represents an amino protecting group. As the amino protecting group, (1) a protecting group that can be removed with an acid (for example, t-butoxycarbonyl group (Boc), p-methoxybenzyloxycarbonyl group (Moz), formyl group (CHO), 2- (trimethylsilyl) (Ethoxycarbonyl group (Teoc), 1-adamantyloxycarbonyl group (Adoc), 2- (p-biphenyl) isopropyloxycarbonyl group (Bpoc), triphenylmethyl group (Tr), methoxymethyl group (MOM)); ) Protecting groups that can be eliminated by reduction (for example, benzyloxycarbonyl group (Cbz), allyl group, allyl group, N-benzyloxymethyl group (BOM)); (3) protecting groups that can be eliminated by a base (for example, 9 -Fluorenylmethyloxycarbonyl group (Fmoc), 2- (4-nitrophenyl) ethoxyca Bonyl group (Npeoc)); (4) Protecting groups that can be removed with zinc dust-acetic acid (for example, 2,2,2-trichloroethoxycarbonyl group (Troc), N-dithiasuccinoyl group (Dts), benzoic acid) Thiazole-2-sulfonyl group (Betsyl), 1,1-dimethyl-2,2,2-trichloroethoxycarbonyl group (TcBoc), N- (diphenyl-4-pyridyl) methyl group (Dppm)); (5) palladium Protecting groups that can be eliminated with an amine or the like under a catalyst (eg, allyloxycarbonyl group (Alloc)) and the like. Of these protecting groups, it is preferable to use a protecting group that can be eliminated with an acid, a protecting group that can be eliminated with a base, or a protecting group that can be eliminated by reduction. Further, R 1a in the reaction formulas may be the same or different.
R2及びR3は、それぞれ炭素数14〜30のアルキル基を示す。当該アルキル基としては、直鎖又は分岐鎖アルキル基のいずれでもよく、例えばテトラデシル基、ペンタデシル基、ヘキサデシル基、ヘプタデシル基、オクタデシル基、ノナデシル基、イコシル基、ヘンイコシル基、ドコシル基、トリコシル基、テトラコシル基等が挙げられる。 R 2 and R 3 each represent an alkyl group having 14 to 30 carbon atoms. The alkyl group may be a linear or branched alkyl group, such as a tetradecyl group, pentadecyl group, hexadecyl group, heptadecyl group, octadecyl group, nonadecyl group, icosyl group, heicosyl group, docosyl group, tricosyl group, tetracosyl group Groups and the like.
X、Y及びZは、水素原子、ハロゲン原子、置換基を有していてもよい炭素数1〜10の炭化水素基又は置換基を有していてもよい炭素数1〜10のアシル基を示す。ここで、ハロゲン原子としては、フッ素原子、塩素原子、臭素原子が挙げられる。置換基を有していてもよい炭素数1〜10の炭化水素基としては、炭素数1〜10のアルキル基が好ましく、メチル基、エチル基、n−プロピル基、イソプロピル基等の炭素数1〜6のアルキル基がより好ましい。置換基を有していてもよい炭素数1〜10のアシル基としては、炭素数2〜10のアルカノイル基が好ましく、アセチル基、プロピオニル基等の炭素数2〜6のアルカノイル基がより好ましい。
これらのX、Y、Zとしては、水素原子又はハロゲン原子が好ましく、特に水素原子が好ましい。
X, Y, and Z represent a hydrogen atom, a halogen atom, an optionally substituted hydrocarbon group having 1 to 10 carbon atoms, or an optionally substituted acyl group having 1 to 10 carbon atoms. Show. Here, examples of the halogen atom include a fluorine atom, a chlorine atom, and a bromine atom. As a C1-C10 hydrocarbon group which may have a substituent, a C1-C10 alkyl group is preferable, and C1-C10, such as a methyl group, an ethyl group, n-propyl group, an isopropyl group, is shown. An alkyl group of ˜6 is more preferred. As a C1-C10 acyl group which may have a substituent, a C2-C10 alkanoyl group is preferable and C2-C6 alkanoyl groups, such as an acetyl group and a propionyl group, are more preferable.
As these X, Y and Z, a hydrogen atom or a halogen atom is preferable, and a hydrogen atom is particularly preferable.
R4は、チオールの保護基であり、具体的には、トリチル(トリフェニルメチル)基、トリアルキルシリル基、p−メトキシベンジル基、t−ブチル基、アセトアミドメチル基等が挙げられる。 R 4 is a thiol protecting group, and specific examples include a trityl (triphenylmethyl) group, a trialkylsilyl group, a p-methoxybenzyl group, a t-butyl group, and an acetamidomethyl group.
R5は、水酸基の保護基であり、ベンジル基、p−メトキシベンジル基、t−ブチル基等が挙げられる。 R 5 is a hydroxyl-protecting group, and examples thereof include a benzyl group, a p-methoxybenzyl group, and a t-butyl group.
ジオール化合物(1)とベンズアルデヒド化合物(2)との反応は、酸の存在下に行なわれる。用いられる酸としては、カンファースルホン酸、p−トルエンスルホン酸等のスルホン酸;p−トルエンスルホン酸ピリジニウム等のスルホン酸の塩が挙げられる。
ジオール化合物(1)1モルあたり、0.3〜0.7モル、より好ましくは0.5モルのベンズアルデヒド化合物(2)を用い、0.01〜0.05モル、より好ましくは0.025モルの酸を添加し、有機溶媒中、100℃以上で還流させ反応を行うのが好ましい。有機溶媒としては、トルエン、シクロヘキサン等の炭化水素系溶媒が用いられる。反応終了後は、アミンを添加後濃縮し、濃縮残渣にアセトニトリルを加えることによりアセタール化合物(3)を固体として採取することができる。このように容易にアセタール化合物(3)が固体として分離できるのは、ベンズアルデヒド化合物のオルト位及びパラ位に炭素数14〜30の長鎖アルコキシ基を有するためである。
The reaction between the diol compound (1) and the benzaldehyde compound (2) is performed in the presence of an acid. Examples of the acid used include sulfonic acids such as camphorsulfonic acid and p-toluenesulfonic acid; and salts of sulfonic acids such as pyridinium p-toluenesulfonic acid.
0.3-0.7 mol, more preferably 0.5 mol of benzaldehyde compound (2) is used per mol of diol compound (1), 0.01-0.05 mol, more preferably 0.025 mol. It is preferable that the acid is added and the reaction is carried out by refluxing at 100 ° C. or higher in an organic solvent. As the organic solvent, hydrocarbon solvents such as toluene and cyclohexane are used. After completion of the reaction, the acetal compound (3) can be collected as a solid by adding an amine, concentrating, and adding acetonitrile to the concentrated residue. The reason why the acetal compound (3) can be easily separated as a solid is that the benzaldehyde compound has a long-chain alkoxy group having 14 to 30 carbon atoms at the ortho and para positions.
アセタール化合物(3)のアミノ保護基の脱離反応は、アミノ保護基(R1a)の種類による。アミノ保護基の種類により、酸、還元、塩基、亜鉛末−酢酸、パラジウム触媒下アミン等により脱離すればよい。例えば、アミノ保護基がFmocの場合には、ジエチルアミン等の塩基を用いてアミノ保護基を脱離させればよい。 The elimination reaction of the amino protecting group of the acetal compound (3) depends on the type of the amino protecting group (R 1a ). Depending on the type of amino protecting group, it may be eliminated with acid, reduction, base, zinc dust-acetic acid, amine under palladium catalyst, or the like. For example, when the amino protecting group is Fmoc, the amino protecting group may be eliminated using a base such as diethylamine.
保護Cys、保護Thr、保護Lys、保護Trp、保護Pheとしては、Boc保護又はFmoc保護が好ましい。これらの保護アミノ酸と各ペプチド〔(4)、(6)、(8)、(10)、(12)、(14)、(16)〕との縮合反応は、例えば、1−エチル−3−(3−ジメチルアミノプロピル)カルボジイミド塩酸塩(EDC・HCl)、N,N−ジシクロヘキシルカルボジイミド(DCC)、またはO-(ベンゾトリアゾール−1−イル)-N,N,N’,N’−テトラメチルウロニウムヘキサフルオロホスファート(HBTU)、4−(4,6−ジメトキシ−1,3,5−トリアジン−2−イル)−4−メチルモルホリニウムクロリドn水和物(DMT−MM)等の縮合剤の存在下に行うことができる。好ましくは、1−ヒドロキシベンゾトリアゾール(HOBt)、1−ヒドロキシ−7−アザベンゾトリアゾール(HOAt)等の縮合補助剤、ジイソプロピルエチルアミン(DIPEA)、トリエチルアミン等の塩基を添加し行うことが望ましい。具体的には、縮合剤の存在下、ハロゲン系または、エーテル系等の溶媒中、0〜40℃で1〜48時間反応させることにより縮合反応を行うことができる。 As the protection Cys, protection Thr, protection Lys, protection Trp, and protection Phe, Boc protection or Fmoc protection is preferable. The condensation reaction of these protected amino acids with each peptide [(4), (6), (8), (10), (12), (14), (16)]] is, for example, 1-ethyl-3- (3-Dimethylaminopropyl) carbodiimide hydrochloride (EDC.HCl), N, N-dicyclohexylcarbodiimide (DCC), or O- (benzotriazol-1-yl) -N, N, N ′, N′-tetramethyl Uronium hexafluorophosphate (HBTU), 4- (4,6-dimethoxy-1,3,5-triazin-2-yl) -4-methylmorpholinium chloride n hydrate (DMT-MM), etc. It can be carried out in the presence of a condensing agent. Preferably, it is desirable to add a condensation aid such as 1-hydroxybenzotriazole (HOBt) and 1-hydroxy-7-azabenzotriazole (HOAt), and a base such as diisopropylethylamine (DIPEA) and triethylamine. Specifically, the condensation reaction can be carried out by reacting at 0 to 40 ° C. for 1 to 48 hours in a halogen-based or ether-based solvent in the presence of a condensing agent.
また、各保護ペプチド〔(5)、(7)、(9)、(11)、(13)、(15)〕の脱保護反応は、前記アセタール化合物(3)の脱保護反応と同様にして行うことができる。 The deprotection reaction of each protected peptide [(5), (7), (9), (11), (13), (15)] is the same as the deprotection reaction of the acetal compound (3). It can be carried out.
ペプチド(17)の脱保護反応は、R1a、R4、R5及びアセタール基の全ての保護基を脱離させる反応である。これらの保護基の脱離反応を一工程で行うには、R1a、R4、R5及びアセタール基の全てが同様の処理で脱離できる保護基であるのが望ましい。このような保護基としては、R1aとして酸で脱離できる保護基、R4としてトリチル基、R5としてt−ブチル基を選択するのが好ましい。
具体的なペプチド(17)の脱保護方法としては、酸による脱保護、例えば無機酸やトリフルオロ酢酸等の存在下、エステル系またはエーテル系等の溶媒中、0〜40℃、1〜48時間反応させることで脱保護反応を行うことができる。
The deprotection reaction of peptide (17) is a reaction for removing all protecting groups of R 1a , R 4 , R 5 and the acetal group. In order to carry out the elimination reaction of these protecting groups in one step, it is desirable that all of R 1a , R 4 , R 5 and the acetal group are protecting groups that can be eliminated by the same treatment. As such a protecting group, it is preferable to select a protecting group that can be removed by an acid as R 1a , a trityl group as R 4 , and a t-butyl group as R 5 .
As a specific method for deprotecting peptide (17), deprotection with acid, for example, in the presence of an inorganic acid or trifluoroacetic acid, in an ester or ether solvent, 0 to 40 ° C., 1 to 48 hours. A deprotection reaction can be performed by reacting.
ペプチド(18)の酸化反応は、例えば酢酸アンモニウム、活性炭を用いた空気酸化、またはヨウ素等を用いて行うことができる。オクトレオチド(A)の塩としては、酢酸、塩酸、硫酸等の酸付加塩が好ましく、特に酢酸塩が好ましい。 The oxidation reaction of peptide (18) can be performed using, for example, air oxidation using ammonium acetate, activated carbon, iodine or the like. As the salt of octreotide (A), acid addition salts such as acetic acid, hydrochloric acid and sulfuric acid are preferable, and acetate is particularly preferable.
さらに、オクトレオチド(A)の好ましい化学構造は、下記である。 Furthermore, the preferable chemical structure of octreotide (A) is as follows.
また、上記の液相合成反応終了後の保護ペプチド(17)は、オルト位及びパラ位に長鎖アルコキシ基を有するベンズアルデヒドによるアセタール保護がされているため、容易に結晶化でき、分離・精製が極めて容易である。従って、当該保護ペプチド(17)を合成した時点で、洗浄、結晶化、再結晶等により、高純度に精製が可能である。 The protected peptide (17) after completion of the above liquid phase synthesis reaction is acetal protected by benzaldehyde having a long-chain alkoxy group at the ortho-position and para-position, so that it can be easily crystallized and separated and purified. Very easy. Therefore, when the protected peptide (17) is synthesized, it can be purified with high purity by washing, crystallization, recrystallization or the like.
前記反応式において、アセタール保護された中間体は、全て新規化合物である。これらを総合すると、中間体は、式(B)で表される。 In the above reaction scheme, the acetal protected intermediates are all novel compounds. When these are combined, the intermediate is represented by the formula (B).
(式中、R1は、水素原子、アミノ保護基、保護基を有していてもよいアミノ酸残基又は保護基を有していてもよいペプチド残基を示し、R2、R3、X、Y及びZは前記と同じ。) (In the formula, R 1 represents a hydrogen atom, an amino protecting group, an amino acid residue optionally having a protecting group or a peptide residue optionally having a protecting group; R 2 , R 3 , X , Y and Z are the same as above.)
ここで、保護基を有していてもよいアミノ酸残基、保護基を有していてもよいペプチド残基は、前記反応式中の基に該当する。式(B)の化合物の具体例としては、前記反応式中の(3)、(4)、(5)、(6)、(7)、(8)、(9)、(10)、(11)、(12)、(13)、(14)、(15)、(16)及び(17)が挙げられる。このうち、(3)、(4)及び(17)の化合物が特に合成中間体として重要である。 Here, the amino acid residue which may have a protecting group and the peptide residue which may have a protecting group correspond to the groups in the above reaction formula. Specific examples of the compound of the formula (B) include (3), (4), (5), (6), (7), (8), (9), (10), ( 11), (12), (13), (14), (15), (16) and (17). Of these, the compounds (3), (4) and (17) are particularly important as synthetic intermediates.
本発明方法によれば、前記の(3)、(4)、(17)の化合物の晶析性が良好であるため、洗浄、結晶化、再結晶等により容易に分離精製が可能である。また、本発明方法(液相合成法)によれば、固相合成法に比べ、ジアステレオマーや欠損ペプチドといった除去困難な不純物が生じにくく、またできたとしても、中間工程で除去できる。また、固相合成法に比べ、中間体化合物を単離できるため、スラリー法や再結晶法など、操作が比較的容易で高価な設備投資を要しない濾過的精製法が実施可能であり、高純度の目的物を得ることが容易である。
固相合成法では、塩化メチレン等、使用する溶媒が限定されるのに比べ、液相合成法では、工業化に適した安全で安価な溶媒を使用することが可能である。固相合成法に比べ、大量合成が容易である。固相合成法では最終化合物の精製に「分取HPLC法」(一般的に高額の設備、大量の有機溶媒を要する)を使用することが多いが、粗体純度が低いためにその精製収率は低いものである。本液相合成法では粗体純度が高いため精製収率が高い。
According to the method of the present invention, the compounds (3), (4), and (17) have good crystallinity, and thus can be easily separated and purified by washing, crystallization, recrystallization, and the like. In addition, according to the method of the present invention (liquid phase synthesis method), difficult-to-remove impurities such as diastereomers and defective peptides are less likely to be produced than in the solid phase synthesis method, and if possible, they can be removed in an intermediate step. In addition, since intermediate compounds can be isolated compared to solid phase synthesis methods, it is possible to carry out filtration purification methods such as slurry methods and recrystallization methods that are relatively easy to operate and do not require expensive capital investment. It is easy to obtain an object having a purity.
In the solid phase synthesis method, the solvent to be used is limited, such as methylene chloride, but in the liquid phase synthesis method, a safe and inexpensive solvent suitable for industrialization can be used. Large-scale synthesis is easier than solid-phase synthesis. In the solid-phase synthesis method, the “preparative HPLC method” (generally expensive equipment and a large amount of organic solvent is required) is often used for purification of the final compound, but the purification yield is low due to low crude purity. Is low. In this liquid phase synthesis method, the purification yield is high due to the high purity of the crude product.
次に実施例を挙げて本発明を更に詳細に説明する。 EXAMPLES Next, an Example is given and this invention is demonstrated still in detail.
略語:
bDまたはbDCHO:ビス(ドコシロキシ)ベンズアルデヒド
DIPEA:ジイソプロピルエチルアミン
THF:テトラヒドロフラン
DMF:ジメチルホルムアミド
HOBt・H2O:1−ヒドロキシベンゾトリアゾール一水和物
HBTU:O-(ベンゾトリアゾール−1−イル)-N,N,N’,N’−テトラメチルウロニウムヘキサフルオロホスファート
DODT:3,6−ジオキサ−1,8−オクタンジチオール
TIPS:トリイソプロピルシラン
TFA:トリフルオロ酢酸
Abbreviations:
bD or bDCHO: bis (docosyloxy) benzaldehyde DIPEA: diisopropylethylamine THF: tetrahydrofuran DMF: dimethylformamide HOBt · H 2 O: 1-hydroxybenzotriazole monohydrate HBTU: O- (benzotriazol-1-yl) -N, N, N ′, N′-tetramethyluronium hexafluorophosphate DODT: 3,6-dioxa-1,8-octanedithiol TIPS: triisopropylsilane TFA: trifluoroacetic acid
実施例
(1)Fmoc-Thr-acetal-bDの合成
Example (1) Synthesis of Fmoc-Thr-acetal-bD
bDCHO(30g;39.61mmol)、Fmoc−Thr−OL(26.08g;79.23mmol)、カンファースルホン酸(0.46g;1.98mmol)をトルエン(198mL)に溶解させ、ディーンスターク装置を用いて130℃で還流した。6時間後、反応液を冷却しDIPEA(0.51g;3.96mmol)を加え、減圧濃縮した。濃縮残渣にアセトニトリル(1.8L)を加え、析出した固体をろ過により単離し、Fmoc−Thr−acetal−bD(43.59g)を得た。
1H NMR (400 MHz, CDCl3) δ 7.76 (d, J = 7.3 Hz, 2H), 7.63 (d, J = 7.3 Hz, 2H), 7.47 (d, J = 8.2 Hz, 1 H), 7.40 (dd, J = 7.3, 7.3 Hz, 2H), 7.32 (dd, J = 7.3, 7.3Hz, 2H), 6.50 (dd, J = 8.2, 2.3 Hz, 1 H), 6.43 (d, J = 2.3 Hz, 1 H), 5.83 (s, 1H), 5.67 (d, J = 10.1 Hz, 1H), 4.47 (dd, J = 10.6, 6.9 Hz, 1H), 4.40 (dd, J = 106, 6.9 Hz, 1H), 4.27 (dd, J = 6.9, 6.9 Hz, 1H), 4.18-4.03 (m, 3 H), 4.00-3.85 (m, 4 H), 3.65 (dd, J = 10.1, 1.8, 1H), 1.82-1.70 (m, 4 H), 1.48-1.38 (m, 4H), 1.37-1.13 (m, 75H), 0.88 (dd, J = 6.8, 6.8 Hz, 6H)
bDCHO (30 g; 39.61 mmol), Fmoc-Thr-OL (26.08 g; 79.23 mmol), camphorsulfonic acid (0.46 g; 1.98 mmol) were dissolved in toluene (198 mL), and a Dean-Stark apparatus was used. At 130 ° C. After 6 hours, the reaction solution was cooled, DIPEA (0.51 g; 3.96 mmol) was added, and the mixture was concentrated under reduced pressure. Acetonitrile (1.8 L) was added to the concentrated residue, and the precipitated solid was isolated by filtration to obtain Fmoc-Thr-acetal-bD (43.59 g).
1 H NMR (400 MHz, CDCl 3 ) δ 7.76 (d, J = 7.3 Hz, 2H), 7.63 (d, J = 7.3 Hz, 2H), 7.47 (d, J = 8.2 Hz, 1 H), 7.40 ( dd, J = 7.3, 7.3 Hz, 2H), 7.32 (dd, J = 7.3, 7.3Hz, 2H), 6.50 (dd, J = 8.2, 2.3 Hz, 1 H), 6.43 (d, J = 2.3 Hz, 1 H), 5.83 (s, 1H), 5.67 (d, J = 10.1 Hz, 1H), 4.47 (dd, J = 10.6, 6.9 Hz, 1H), 4.40 (dd, J = 106, 6.9 Hz, 1H) , 4.27 (dd, J = 6.9, 6.9 Hz, 1H), 4.18-4.03 (m, 3 H), 4.00-3.85 (m, 4 H), 3.65 (dd, J = 10.1, 1.8, 1H), 1.82- 1.70 (m, 4 H), 1.48-1.38 (m, 4H), 1.37-1.13 (m, 75H), 0.88 (dd, J = 6.8, 6.8 Hz, 6H)
(2)H-Thr-acetal-bDの合成 (2) Synthesis of H-Thr-acetal-bD
Fmoc−Thr−acetal−bD(43.16g;40.54mmol)、THF(405mL)、DMF(405mL)の溶液にジエチルアミン(59.3g;810.78mmol)を加え室温で攪拌した。1時間後、減圧濃縮によりTHFと余剰のジエチルアミンを留去した。アセトニトリル(1.7L×2)を加えた後、ろ過により粗H−Thr−acetal−bD(31.7g)を単離した。粗体をヘキサン/THF(3:2)の混合液(95mL)に溶解させ、シリカゲルカラムにより精製を行った。シリカゲルカラムの移動相はヘキサン/THF(3:2)→(2:3)→(1:4)→100%THFの条件で実施した。濃縮後、濃縮残渣にアセトニトリル(400mL)を添加しろ過により精H−Thr−acetal−bD(22.55g)を2段階収率68%で得た。1H NMR (400 MHz, CDCl3) δ 7.48 (d, J = 8.2 Hz, 1 H), 6.47 (dd, J = 8.2, 2.3 Hz,1 H), 6.41 (d, J = 2.3 Hz, 1 H), 5.81 (s, 1 H), 4.13-4.04 (m, 3 H), 3.97-3.89 (m, 4 H), 2.53 (d, J = 1.4 Hz, 1 H), 1.82-1.70 (m, 4 H), 1.50-1.21 (m, 81 H), 0.88 (dd, J = 6.9, 6.9 Hz, 6H); 13C NMR (100 MHz, CDCl3) δ 160.8, 157.2, 127.7, 119.5, 105.3, 99.9, 97.7, 76.0, 74.2, 68.3, 68.1, 49.2, 31.9 (2C), 29.7 (28C), 29.40 (2C), 29.38 (2C), 29.23, 29.21, 26.1, 26.0, 22.7 (2C), 17.9, 14.1 (2C). Diethylamine (59.3 g; 810.78 mmol) was added to a solution of Fmoc-Thr-acetal-bD (43.16 g; 40.54 mmol), THF (405 mL), and DMF (405 mL), and the mixture was stirred at room temperature. After 1 hour, THF and excess diethylamine were distilled off by concentration under reduced pressure. Acetonitrile (1.7 L × 2) was added, and then crude H-Thr-acetal-bD (31.7 g) was isolated by filtration. The crude product was dissolved in a mixed solution (95 mL) of hexane / THF (3: 2) and purified by a silica gel column. The mobile phase of the silica gel column was carried out under the conditions of hexane / THF (3: 2) → (2: 3) → (1: 4) → 100% THF. After concentration, acetonitrile (400 mL) was added to the concentrated residue, and filtered to obtain purified H-Thr-acetal-bD (22.55 g) in a two-stage yield of 68%. 1 H NMR (400 MHz, CDCl 3 ) δ 7.48 (d, J = 8.2 Hz, 1 H), 6.47 (dd, J = 8.2, 2.3 Hz, 1 H), 6.41 (d, J = 2.3 Hz, 1 H ), 5.81 (s, 1 H), 4.13-4.04 (m, 3 H), 3.97-3.89 (m, 4 H), 2.53 (d, J = 1.4 Hz, 1 H), 1.82-1.70 (m, 4 H), 1.50-1.21 (m, 81 H), 0.88 (dd, J = 6.9, 6.9 Hz, 6H); 13 C NMR (100 MHz, CDCl 3 ) δ 160.8, 157.2, 127.7, 119.5, 105.3, 99.9, 97.7, 76.0, 74.2, 68.3, 68.1, 49.2, 31.9 (2C), 29.7 (28C), 29.40 (2C), 29.38 (2C), 29.23, 29.21, 26.1, 26.0, 22.7 (2C), 17.9, 14.1 (2C ).
(3)ペプチド鎖伸長工程
a)Fmoc基脱保護工程
Fmoc−ペプチド−アセタール−bD(1当量)をTHF/DMFの混合液(基質濃度50mMとなる液量;7:3)に溶解後、ジエチルアミン(20当量)を加え、反応が完結するまで室温で攪拌する。減圧濃縮後、残存するジエチルアミンをTHF(2×5v/w)で共沸し、H−ペプチド−アセタール−bDを得る。更なる精製は行わず次の縮合反応に用いる。
(3) Peptide chain extension step a) Fmoc group deprotection step Fmoc-peptide-acetal-bD (1 equivalent) was dissolved in a THF / DMF mixture (volume of the substrate concentration 50 mM; 7: 3), and then diethylamine (20 eq) is added and stirred at room temperature until the reaction is complete. After concentration under reduced pressure, the remaining diethylamine is azeotroped with THF (2 × 5 v / w) to obtain H-peptide-acetal-bD. It is used for the next condensation reaction without further purification.
b)縮合工程
余剰のジエチルアミンのTHF共沸による除去後、Fmoc脱保護工程で調製したH−ペプチド−アセタール−bDに対しBoc/Fmoc−AA−OH(1.2当量)、HOBt・H2O(1.2当量)、HBTU(1.2当量)、DIPEA(4.0当量)、THF(H−ペプチド−アセタール−bD濃度50mMとなる液量)を加える。反応終了後、反応液を減圧濃縮しアセトニトリル(1×60v/w;3×20v/w)を加え単離する。
a)Fmoc基脱保護工程とb)縮合工程を繰り返してアミノ酸を順次結合し、全保護体Boc-D-Phe-Cys(Trt)-Phe-D-Trp(Boc)-Lys(Boc)-Thr(tBu)-Cys(Trt)-Thr-acetal-bDを合成した。
1H NMR (400 MHz, CDCl3) δ 8.06 (m, 1H), 7.73 (m, 1H), 7.58-7.29 (m, 16H), 7.29-7.06 (m, 27H), 7.06-6.89 (m, 7H), 6.70 (m, 1H), 6.64 (brs, 1H), 6.50 (m, 1H), 6.45-6.38 (m, 2H), 5.80 (s, 1H), 4.90 (m, 1H), 4.61 (m, 1H), 4.35 (m, 1H), 4.30 (m, 1H), 4.21-4.02 (m, 5H), 4.02-3.82 (m, 7H), 3.37-3.11 (m, 4H), 3.11-2.92 (m, 3H), 2.91-2.74 (m, 2H), 2.60-2.38 (m, 3H), 1.81-1.72 (m, 4H), 1.69 (s, 18H), 1.65 (s, 9H), 1.48-1.20 (m, 82H), 1.18 (s, 9H), 1.14 (d, J = 6.4 Hz, 3H), 1.02 (d, J = 6.0 Hz, 3H), 0.88 (dd, J = 6.6, 6.6 Hz, 6H).
b) Condensation step After removal of excess diethylamine by THF azeotropy, Boc / Fmoc-AA-OH (1.2 equivalents), HOBt · H 2 O with respect to H-peptide-acetal-bD prepared in the Fmoc deprotection step (1.2 eq.), HBTU (1.2 eq.), DIPEA (4.0 eq.), THF (amount of liquid that results in an H-peptide-acetal-bD concentration of 50 mM) are added. After completion of the reaction, the reaction solution is concentrated under reduced pressure and isolated by adding acetonitrile (1 × 60 v / w; 3 × 20 v / w).
a) Fmoc group deprotection step and b) Condensation step are repeated to sequentially bind amino acids, and all the protected Boc-D-Phe-Cys (Trt) -Phe-D-Trp (Boc) -Lys (Boc) -Thr (tBu) -Cys (Trt) -Thr-acetal-bD was synthesized.
1 H NMR (400 MHz, CDCl 3 ) δ 8.06 (m, 1H), 7.73 (m, 1H), 7.58-7.29 (m, 16H), 7.29-7.06 (m, 27H), 7.06-6.89 (m, 7H ), 6.70 (m, 1H), 6.64 (brs, 1H), 6.50 (m, 1H), 6.45-6.38 (m, 2H), 5.80 (s, 1H), 4.90 (m, 1H), 4.61 (m, 1H), 4.35 (m, 1H), 4.30 (m, 1H), 4.21-4.02 (m, 5H), 4.02-3.82 (m, 7H), 3.37-3.11 (m, 4H), 3.11-2.92 (m, 3H), 2.91-2.74 (m, 2H), 2.60-2.38 (m, 3H), 1.81-1.72 (m, 4H), 1.69 (s, 18H), 1.65 (s, 9H), 1.48-1.20 (m, 82H), 1.18 (s, 9H), 1.14 (d, J = 6.4 Hz, 3H), 1.02 (d, J = 6.0 Hz, 3H), 0.88 (dd, J = 6.6, 6.6 Hz, 6H).
(4)H-D-Phe-Cys-Phe-D-Trp-Lys-Thr-Cys-Thr-OHの合成
Boc-D-Phe-Cys(Trt)-Phe-D-Trp(Boc)-Lys(Boc)-Thr(tBu)-Cys(Trt)-Thr-acetal-bD →H-D-Phe-Cys-Phe-D-Trp-Lys-Thr-Cys-Thr-OH
5℃に冷却したTFA/1−dodecanethiol/DODT/TIPS/H2O(80:9:9:1:1)の混合液154mLにBoc−8mer−acetal−bD(20g;7.69mmol)を加えた。5分後、反応液を室温まで昇温し、1.5時間攪拌した。TFAをジクロロメタン(100mL)で共沸した後、アセトニトリル(200mL)を加え30分間攪拌しろ過によりbDCHO残渣を除去した。このろ液を減圧濃縮後ジイソプロピルエーテル(2×200mL)を加え固体をろ過しH-D Phe-Cys-Phe-D-Trp-Lys-Thr-Cys-Thr-OH(11.71g)を得た。
(4) Synthesis of HD-Phe-Cys-Phe-D-Trp-Lys-Thr-Cys-Thr-OH
Boc-D-Phe-Cys (Trt) -Phe-D-Trp (Boc) -Lys (Boc) -Thr (tBu) -Cys (Trt) -Thr-acetal-bD → HD-Phe-Cys-Phe-D -Trp-Lys-Thr-Cys-Thr-OH
Boc-8mer-acetal-bD (20 g; 7.69 mmol) was added to 154 mL of a mixed solution of TFA / 1-dodecanethiol / DODT / TIPS / H 2 O (80: 9: 9: 1: 1) cooled to 5 ° C. It was. After 5 minutes, the reaction solution was warmed to room temperature and stirred for 1.5 hours. TFA was azeotroped with dichloromethane (100 mL), acetonitrile (200 mL) was added, and the mixture was stirred for 30 minutes, and the bDCHO residue was removed by filtration. The filtrate was concentrated under reduced pressure, diisopropyl ether (2 × 200 mL) was added, and the solid was filtered to obtain HD Phe-Cys-Phe-D-Trp-Lys-Thr-Cys-Thr-OH (11.71 g).
(4)オクトレオチドの合成
H-D-Phe-Cys-Phe-D-Trp-Lys-Thr-Cys-Thr-OH → octreotide
H-D-Phe-Cys-Phe-D-Trp-Lys-Thr-Cys-Thr-OH(7.0g;6.85mmol)をTHF(931mL)と0.1N酢酸アンモニウム水溶液(469mL)の溶液に加えた。ここに活性炭(0.7g)を加え室温で攪拌した。反応終了後、活性炭をろ過により除去した。THFを減圧濃縮により除き、残渣の水溶液を凍結乾燥し、HPLC純度85.6%で粗オクトレオチド(7.5g)を得た。これを分取HPLC精製に用いた。
ESI-MS: [M+H]+ 1019
(4) Synthesis of octreotide
HD-Phe-Cys-Phe-D-Trp-Lys-Thr-Cys-Thr-OH → octreotide
HD-Phe-Cys-Phe-D-Trp-Lys-Thr-Cys-Thr-OH (7.0 g; 6.85 mmol) was added to a solution of THF (931 mL) and 0.1 N aqueous ammonium acetate (469 mL). . Activated carbon (0.7 g) was added thereto and stirred at room temperature. After completion of the reaction, the activated carbon was removed by filtration. THF was removed by concentration under reduced pressure, and the residual aqueous solution was lyophilized to obtain crude octreotide (7.5 g) with an HPLC purity of 85.6%. This was used for preparative HPLC purification.
ESI-MS: [M + H] + 1019
Claims (3)
R2及びR3は、それぞれ独立して、炭素数14〜30のアルキル基を示し;
X、Y及びZは、それぞれ独立して、水素原子、ハロゲン原子、置換基を有していてもよい炭素数1〜10の炭化水素基又は置換基を有していてもよい炭素数1〜10のアシル基を示す)
で表されるアセタール化合物又はその塩。 The following formula (B)
R 2 and R 3 each independently represents an alkyl group having 14 to 30 carbon atoms;
X, Y and Z are each independently a hydrogen atom, a halogen atom, an optionally substituted hydrocarbon group having 1 to 10 carbon atoms or an optionally substituted carbon atom having 1 to 1 carbon atoms. Represents 10 acyl groups)
Or an acetal compound represented by the formula:
で表されるジオール化合物と式(2)
X、Y及びZは、それぞれ独立して、水素原子、ハロゲン原子、置換基を有していてもよい炭素数1〜10の炭化水素基又は置換基を有していてもよい炭素数1〜10のアシル基を示す)
で表されるベンズアルデヒド化合物とを、酸の存在下に反応させることを特徴とする、式(3)
で表されるアセタール化合物の製造法。 The following formula (1)
And a diol compound represented by formula (2)
X, Y and Z are each independently a hydrogen atom, a halogen atom, an optionally substituted hydrocarbon group having 1 to 10 carbon atoms or an optionally substituted carbon atom having 1 to 1 carbon atoms. Represents 10 acyl groups)
And a benzaldehyde compound represented by the formula (3), which is reacted in the presence of an acid:
The manufacturing method of the acetal compound represented by these.
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| CN117003792A (en) * | 2023-07-11 | 2023-11-07 | 西北工业大学 | A kind of phosphorized p-hydroxybenzaldehyde compound and its assisted method for preparing octreotide |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN117003792A (en) * | 2023-07-11 | 2023-11-07 | 西北工业大学 | A kind of phosphorized p-hydroxybenzaldehyde compound and its assisted method for preparing octreotide |
| CN117003792B (en) * | 2023-07-11 | 2025-11-07 | 西北工业大学 | P-hydroxybenzaldehyde compound and method for preparing octreotide with assistance of p-hydroxybenzaldehyde compound |
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