JP2015225760A - Transparent electrode, production method of transparent electrode and touch panel - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a transparent electrode which makes a pattern of conductive parts and a non-conductive parts invisible and is provided with a transparent conductive film having high hardness and a method of producing such a transparent electrode easily at low costs.SOLUTION: In a transparent electrode, an insulation coating film part (A) and a conductive coating film part (B) containing a conductive polymer are arranged adjacently on at least one side of a substrate, and the difference of the film thickness between the insulation coating film (A) and the conductive coating film (B) is 1-50 μm.

Description

The present invention relates to a transparent electrode, a method for manufacturing a transparent electrode, and a touch panel.

A transparent electrode for a display device such as a capacitive touch panel is required not to show a pattern of a conductive part and a non-conductive part. For example, when forming a transparent conductive film using ITO, the pattern is made invisible by providing a high refractive index matching layer between the glass substrate and the ITO film (transparent conductive film).

On the other hand, in the case of forming a transparent conductive film using a conductive polymer such as PEDOT / PSS, a patterned resist film is provided on the transparent conductive film and then impregnated with a conductive deactivator. The conductive part and the non-conductive part are patterned by deactivating (Patent Document 1). In this method, the pattern is invisible by minimizing the color difference between the conductive portion and the non-conductive portion.

JP 2013-239680 A

However, in order to impregnate the transparent conductive film with the conductive deactivator, it is necessary to keep the transparent conductive film soft, and thus there is a problem that the hardness of the transparent conductive film cannot be increased. Furthermore, the method described in Patent Document 1 has a problem that the number of steps is large and the manufacturing cost is high. For this reason, there has been an increasing demand for a transparent electrode including a transparent conductive film in which the pattern of the conductive portion and the non-conductive portion is invisible and has high hardness. In addition, a method for producing such a transparent electrode simply and inexpensively has also been demanded.

As a result of intensive studies to solve the above problems, the present inventors have made the pattern invisible by making the chromaticity of the insulating coating portion (non-conductive portion) equal to that of the conductive coating portion (conductive portion). Based on the technical idea, after forming the insulating coating part having the same chromaticity as the conductive coating part, it is possible to make the pattern invisible by a simple method by forming the conductive coating part. I found it. Further, it has been found that if the pattern is made invisible by such a method, it is not necessary to impregnate the conductive deactivator, so that the hardness of the insulating coating portion and the conductive coating portion can be improved. Furthermore, since the transparent electrode produced by such a method has a difference in film thickness between the insulating coating film portion and the conductive coating film portion, the contact area with the adhesive layer during device formation is large and the adhesiveness is excellent. And found that current leakage hardly occurs.

That is, the transparent electrode of the present invention is
A transparent electrode in which an insulating coating film part (A) and a conductive coating film part (B) containing a conductive polymer are disposed adjacent to each other on at least one surface of a substrate,
The difference in film thickness between the insulating coating portion (A) and the conductive coating portion (B) is 1 to 50 μm.

In the transparent electrode of the present invention, the conductive polymer is preferably a complex of poly (3,4-dialkoxythiophene) and a polyanion.

In the transparent electrode of the present invention, the pencil hardness of the conductive coating portion (B) is preferably 2H or more.

In the transparent electrode of the present invention, the water contact angle of the insulating coating film portion (A) is preferably 50 ° or more.

In the transparent electrode of the present invention, the insulating coating film portion (A) preferably contains 0.1% by weight or more of the fluorine-containing compound.

In the transparent electrode of the present invention, the difference in chromaticity (b ^* ) between the insulating coating portion (A) and the conductive coating portion (B) is preferably 1.0 or less.

The method for producing a transparent electrode of the present invention is characterized by producing the transparent electrode of the present invention.

In the manufacturing method of the transparent electrode of this invention, it is preferable to form a conductive-film part (B) after forming an insulating-film part (A).

In the manufacturing method of the transparent electrode of this invention, it is preferable to form an insulating coating-film part (A) by screen printing or gravure offset printing.

The touch panel of the present invention includes the transparent electrode of the present invention.

Since the transparent electrode of the present invention has a difference in film thickness between the insulating coating film part (A) and the conductive coating film part (B), the contact area with the adhesive layer during device formation is large and excellent in adhesion, Current leakage is unlikely to occur. Moreover, the pattern is invisible by setting the difference in chromaticity between the insulating coating film portion (A) and the conductive coating film portion (B) to a specific value.
In the method for producing a transparent electrode of the present invention, an insulating coating film part (A) and a conductive coating film part (B) are formed by forming a conductive coating film part (B) after forming an insulating coating film part (A). The transparent electrode whose pattern is made invisible can be easily and inexpensively manufactured with a small number of steps. Moreover, since it is not necessary to impregnate a conductive deactivator, the hardness of an insulating coating-film part (A) and a conductive coating-film part (B) can be improved.
In the touch panel of the present invention, the pattern of the insulating coating part (A) and the conductive coating part (B) is made invisible, and the difference in film thickness between the insulating coating part (A) and the conductive coating part (B). Since the transparent electrode of this invention which has this is provided, while being excellent in the adhesiveness of a transparent electrode and an adhesion layer, it is excellent also in the precision of a touch panel.

<< Transparent electrode >>
The transparent electrode of the present invention is a transparent electrode in which an insulating coating film part (A) and a conductive coating film part (B) containing a conductive polymer are arranged adjacent to each other on at least one surface of a substrate. Because
The difference in film thickness between the insulating coating portion (A) and the conductive coating portion (B) is 1 to 50 μm.

<Base material>
A transparent substrate is preferable as the substrate. The material of the transparent substrate is not particularly limited as long as it is transparent. For example, glass, polyethylene terephthalate (PET), polyethylene naphthalate, modified polyester and other polyester resins, polyethylene (PE) resin, and polypropylene (PP) resin. , Polyolefin resins such as polystyrene resin and cyclic olefin resin, vinyl resins such as polyvinyl chloride and polyvinylidene chloride, polyether ether ketone (PEEK) resin, polysulfone (PSF) resin, polyether sulfone (PES) resin , Polycarbonate (PC) resin, polyamide resin, polyimide resin, acrylic resin, triacetyl cellulose (TAC) resin, and the like.

Although the thickness of a transparent base material is not specifically limited, It is preferable that it is 10-10000 micrometers, and it is more preferable that it is 25-5000 micrometers. Further, the total light transmittance of the transparent substrate is not particularly limited, but is preferably 60% or more, and more preferably 80% or more.

<Insulating coating film part (A)>
The insulating coating film portion (A) is formed on the substrate using the insulating coating film forming composition.
The component contained in the composition for forming an insulating coating film is not particularly limited, and examples thereof include a binder, a colorant, a water repellent component, a solvent, a crosslinking agent, a catalyst, a surfactant and / or a leveling agent, and a water-soluble oxidation. Examples thereof include an inhibitor, a thickener, an antifoaming agent, a rheology control agent, and a neutralizing agent.

(binder)
By blending a binder in the composition for forming an insulating coating film, the compounds in the composition for forming an insulating coating film are bonded to each other, and the insulating coating film part (A) (insulating coating film part (A) and A pattern with a conductive coating film part (B) can be formed. Although it does not specifically limit as a binder, For example, a polyester-type resin, a polyacrylic acid-type resin, a polyurethane, an epoxy resin, an acrylic resin, an alkoxysilane oligomer, a polyolefin-type resin etc. are mentioned. These may be used alone or in combination of two or more.

The polyester-based resin is not particularly limited as long as it is a polymer compound obtained by polycondensation of a compound having two or more carboxyl groups in the molecule and a compound having two or more hydroxyl groups. Examples thereof include polyethylene terephthalate, polytrimethylene terephthalate, polybutylene terephthalate, polyethylene naphthalate, and polybutylene naphthalate. These may be used alone or in combination of two or more.

The polyacrylic acid resin is not particularly limited, and examples thereof include polyacrylic acid and sodium polyacrylate. These may be used alone or in combination of two or more.

The polyurethane is not particularly limited as long as it is a polymer compound obtained by copolymerizing an isocyanate group-containing compound and a hydroxyl group-containing compound. For example, ester / ether polyurethane, ether polyurethane, polyester polyurethane , Carbonate polyurethane, acrylic polyurethane and the like. These may be used alone or in combination of two or more.

The epoxy resin is not particularly limited. For example, a bisphenol A type, a bisphenol F type, a phenol novolak type, a tetrakis (hydroxyphenyl) ethane type or a tris (hydroxyphenyl) methane type which is a polyfunctional type having a large number of benzene rings. , Biphenyl type, triphenolmethane type, naphthalene type, orthonovolak type, dicyclopentadiene type, aminophenol type, alicyclic epoxy resin, silicone epoxy resin and the like. These may be used alone or in combination of two or more.

The acrylic resin is not particularly limited, and examples thereof include (meth) acrylic resins and vinyl ester resins. As these acrylic resins, for example, a polymer containing a polymerizable monomer having an acid group such as a carboxyl group, an acid anhydride group, a sulfonic acid group, or a phosphoric acid group as a constituent monomer may be used. Examples thereof include a single or copolymer of a polymerizable monomer having a group, a copolymer of a polymerizable monomer having a acid group and a copolymerizable monomer, and the like. These may be used alone or in combination of two or more.

The (meth) acrylic resin may be polymerized with a copolymerizable monomer as long as it contains a (meth) acrylic monomer as a main constituent monomer (for example, 50 mol% or more). It is sufficient that at least one of the (meth) acrylic monomer and the copolymerizable monomer has an acid group. Examples of (meth) acrylic resins include (meth) acrylic monomers having the above acid group [(meth) acrylic acid, sulfoalkyl (meth) acrylate, sulfonic acid group-containing (meth) acrylamide, etc.] or the like Copolymer, (meth) acrylic monomer optionally having acid group, and other polymerizable monomer having acid group [other polymerizable carboxylic acid, polymerizable polyvalent carboxylic acid or Anhydride, vinyl aromatic sulfonic acid, etc.] and / or the above copolymerizable monomers [e.g., (meth) acrylic acid alkyl ester, glycidyl (meth) acrylate, (meth) acrylonitrile, aromatic vinyl monomer, etc.] , Other polymer monomers having the above acid groups and (meth) acrylic copolymerizable monomers [for example, (meth) acrylic acid alkyl ester, hydroxyalkyl (meth) Acrylate, glycidyl (meth) acrylate, copolymers of (meth) acrylonitrile, etc.], rosin-modified urethane acrylate, special modified acrylic resins, urethane acrylates, epoxy acrylates, and urethane acrylates emulsion and the like.

Among these (meth) acrylic resins, (meth) acrylic acid- (meth) acrylic acid ester polymers (acrylic acid-methyl methacrylate copolymer etc.), (meth) acrylic acid- (meth) acrylic acid An ester-styrene copolymer (such as acrylic acid-methyl methacrylate-styrene copolymer) is preferred.

The alkoxysilane oligomer is, for example, a high molecular weight alkoxysilane formed by condensation of alkoxysilane monomers represented by the following formula (I), and has a siloxane bond (Si—O—Si). Examples include oligomers having one or more in one molecule.
SiR ₄ (I)
(In the formula, R represents hydrogen, a hydroxyl group, an alkoxy group having 1 to 4 carbon atoms, an alkyl group which may have a substituent, or a phenyl group which may have a substituent. At least one of R is an alkoxy group having 1 to 4 carbon atoms or a hydroxyl group)

The structure of the alkoxysilane oligomer is not particularly limited, and may be linear or branched. Moreover, as an alkoxysilane oligomer, the compound represented by Formula (I) may be used independently, and 2 or more types may be used together.
The weight average molecular weight of the alkoxysilane oligomer is not particularly limited, but is preferably greater than 152 and not greater than 4000, and more preferably 500-2500.
Here, the weight average molecular weight is a value measured by gel permeation chromatography (GPC).

The polyolefin resin is not particularly limited, and examples thereof include chlorinated polypropylene, non-chlorinated polypropylene, chlorinated polyethylene, and non-chlorinated polyethylene. These may be used alone or in combination of two or more.

When the composition for forming an insulating coating contains a binder, the content is not particularly limited, but is preferably 80% by weight or less, and preferably 60% by weight or less in the composition for forming an insulating coating. More preferred. When the content exceeds 80% by weight, the dispersibility deteriorates, the viscosity becomes too high, and the printability when the composition for forming an insulating coating film is applied onto a substrate by the printing means described below may be reduced. is there.

(Coloring agent)
By mix | blending a coloring agent with the composition for insulating coating-film formation, the insulating coating-film part (A) which has chromaticity equivalent to a conductive coating-film part (B) can be formed.
Although it does not specifically limit as a coloring agent, For example, luster pigments, such as aluminum, brass, vapor deposition powder, pearl pigments (each color, such as white and gold), rhodamine lake B, insoluble azo red pigment (naphthol type) (for example, Brilliant Carmel BS, Lake Carmel FB, Lake Red 4B, First Red FGR, Lake Bold 5B, Toluidine Marlon), insoluble azo red pigment (anilide type) (for example, pyrazole red), soluble azo red pigment (for example, lake orange, Red pigments such as Brilliant Carmel 3B, Brilliant Carmel 6B, Brilliant Scarlet G, Lake Red C, Lake Red D, Lake Red R, Lake Bold 10B, Bonmarlon L, Bonmarlon M), Heiza Yellow A, inert azo yellow pigment (A Lido) (for example, first yellow G, first yellow 10G, diazo orange), yellow pigments such as dye lake yellow pigments (for example, yellow lake), phthalocyanine blue pigments (for example, phthalocyanine blue, first sky blue), dyeing Blue pigments such as lake blue pigments (eg, violet lake, blue lake), other pigments (eg, alkali blue), black pigments such as carbon black, acetylene black, lamp black and aniline black, rutile titanium oxide and anatase Examples thereof include titanium oxide, silica, alumina, clay, talc, calcium carbonate, barium sulfate and other inorganic fillers, and white pigments such as zinc oxide. These colorants may be used by selecting an appropriate one according to the required color tone, may be used alone, or may be used by adjusting two or more kinds to a desired hue. good.

(Water repellent component)
By blending a water repellent component into the insulating coating forming composition, the insulating coating portion (A) can be provided with water repellency, and the conductive coating forming later described on the insulating coating portion (A). When the composition is applied, the composition for forming a conductive coating film is repelled, and a pattern can be easily formed without overlapping the insulating coating film portion (A) and the conductive coating film portion (B).
The water repellent component is not particularly limited. For example, perfluoroalkylethylene oxide adducts, fluorine-containing compounds such as fluorine-containing / lipophilic group-containing oligomers, natural fats and oils, silicones, wax-based non-fluorine-containing compounds, etc. Is mentioned. These water repellent components may be used alone or in combination of two or more.

When the composition for forming an insulating coating contains a water repellent component, the content thereof is not particularly limited, but is preferably 0.1 to 5% by weight in the composition for forming an insulating coating, 0.5 More preferably, it is ˜2% by weight. When the content is less than 0.1% by weight, the water repellency may not be exhibited. When the content exceeds 5% by weight, the dispersibility may be deteriorated.

(solvent)
The solvent is not particularly limited. For example, water; alcohols such as methanol, ethanol, 2-propanol, and 1-propanol; ethylene glycols such as ethylene glycol, diethylene glycol, triethylene glycol, and tetraethylene glycol; ethylene glycol monomethyl Glycol ethers such as ether, diethylene glycol monomethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether; Glycol ether acetates such as ethylene glycol monoethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate; propylene glycol, dipropylene glycol, Such as tripropylene glycol Propylene glycols; propylene such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, propylene glycol dimethyl ether, dipropylene glycol dimethyl ether, propylene glycol diethyl ether, dipropylene glycol diethyl ether Glycol ethers; Propylene glycol ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, dipropylene glycol monomethyl ether acetate, dipropylene glycol monoethyl ether acetate; diethyl ether, diisopropyl ether Ethers such as methyl-t-butyl ether and tetrahydrofuran; Ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; Carbonization such as toluene, xylene (o-, m-, or p-xylene), benzene, hexane, heptane, etc. Hydrogen: Esters such as ethyl acetate and butyl acetate: Halogens such as chloromethane (methyl chloride), dichloromethane (methylene chloride), trichloromethane (chloroform), tetrachloromethane (carbon tetrachloride), acetonitrile, water and these And a mixed solvent (hydrous organic solvent) with two or more organic solvents, and a mixed solvent of two or more organic solvents. These solvents may be used alone or in combination of two or more.

The solvent is preferably water, an organic solvent, or a mixed solvent of water and an organic solvent. When the composition for forming an insulating coating contains water as a solvent, the content of water is not particularly limited, but is preferably 70% by weight or less in the composition for forming an insulating coating, and is 50% by weight or less. More preferably. When content exceeds 70 weight%, a viscosity will fall and the printability at the time of apply | coating the composition for insulating coating film formation on a base material by the below-mentioned printing means may fall.

It is preferable that the solvent does not remain in the insulating coating film part (A) formed using the composition for forming an insulating coating film. In this specification, what completely dissolves all the components of the composition for forming an insulating coating film (that is, “solvent”) and what disperses insoluble components (that is, “dispersion medium”) Both are described as “solvent” without particular distinction.

(Crosslinking agent)
By blending the crosslinking agent, the binder can be crosslinked, and the strength of the insulating coating film portion (A) formed using the composition for forming an insulating coating film can be further improved.
Although it does not specifically limit as a crosslinking agent, For example, crosslinking agents, such as a melamine type, a polycarbodiimide type, a polyoxazoline type, a polyepoxy type, a polyisocyanate type, a polyacrylate type, are mentioned. These crosslinking agents may be used independently and may use 2 or more types together.

When the composition for forming an insulating coating film contains a crosslinking agent, the content is not particularly limited, but is preferably 30% by weight or less, and preferably 20% by weight or less in the composition for forming an insulating coating film. More preferred. When content exceeds 30 weight%, a viscosity will fall and the printability of screen printing may fall.

(catalyst)
When the composition for forming an insulating coating film contains a binder and a crosslinking agent, the catalyst for crosslinking the binder is not particularly limited, and examples thereof include a photopolymerization initiator and a thermal polymerization initiator. When the composition for forming an insulating coating film contains an acrylic resin as a binder, it is preferable to use a photopolymerization initiator.

(Surfactant and / or leveling agent)
By blending a surfactant and / or a leveling agent, the leveling property of the composition for forming an insulating coating film can be improved, and the insulating coating film portion (A) is formed using the composition for forming an insulating coating film. By doing so, a uniform insulating coating film part (A) can be obtained.

(Water-soluble antioxidant)
By adding a water-soluble antioxidant to the insulating coating forming composition, the heat resistance and heat and moisture resistance of the insulating coating portion (A) formed using the insulating coating forming composition can be improved. .
The water-soluble antioxidant is not particularly limited, and examples thereof include a reducing water-soluble antioxidant and a non-reducing water-soluble antioxidant.

(Thickener)
By mix | blending a thickener with the composition for insulating coating film formation, the viscosity and rheological characteristic of the composition for insulating coating film formation can be adjusted.
Although it does not specifically limit as a thickener, For example, polyacrylic acid-type resin, a cellulose ether resin, polyvinylpyrrolidone, a polyurethane, a carboxy vinyl polymer, polyvinyl alcohol etc. are mentioned. Examples of commercially available thickeners include CARBOPOL ETD-2623 (crosslinkable polyacrylic acid, manufactured by BF Goodrich), GE-167 (N-vinylacetamide and acrylic acid copolymer, Showa Denko Co., Ltd.) Company-made), dirimer (polyacrylic acid, manufactured by Nippon Pure Chemicals Co., Ltd.), polyvinylpyrrolidone K-90 (polyvinylpyrrolidone, manufactured by Nippon Shokubai Co., Ltd.), and the like. These may be used alone or in combination of two or more.

In the present invention, a screen paste may be used as the composition for forming an insulating coating film. The screen paste is not particularly limited, and commercially available products can be used. Specific examples of commercially available products include UPG930 (manufactured by Mino Group), 13-000 (manufactured by Teikoku Ink Manufacturing Co., Ltd.), HF, and the like. -GV2RX01 (made by Seiko Advance Co., Ltd.) etc. are mentioned. These may be used alone or in combination of two or more.
When a screen paste is used as the composition for forming an insulating coating film, the above-described components that can be used in the composition for forming an insulating coating film may optionally be added.

Although it does not specifically limit as a method of forming an insulation coating-film part (A) using the composition for insulation coating-film formation, For example, after apply | coating the composition for insulation coating-film formation on a base material, it heat-processes. Examples thereof include a method and / or a light irradiation treatment method.

The method for applying the insulating film-forming composition onto the substrate is not particularly limited. For example, the insulating film-forming composition can be applied to the substrate by printing means such as screen printing, offset printing (including gravure offset printing), and pad printing. Examples thereof include a method of directly drawing a pattern to be formed, a method of directly drawing a pattern by inkjet, and a method of drawing a pattern by etching after directly applying a composition for forming an insulating coating film to a substrate. Among these, from the viewpoint of simplicity, cost, and versatility of the substrate, a method for directly drawing a desired pattern on the substrate by printing means such as screen printing, offset printing (including gravure offset printing), and pad printing. Is preferred.
When the composition for forming an insulating coating film is applied on a substrate, a layer such as a primer layer may be formed on the substrate in advance, and the composition for forming an insulating coating film may be applied on the layer. Moreover, you may apply | coat the composition for insulating coating film formation, after giving surface treatment to the surface of a base material beforehand as needed. The surface treatment is not particularly limited, and examples thereof include corona treatment, plasma treatment, itro treatment, and flame treatment.

The insulating coating film portion (A) can be formed on at least one surface of the substrate by subjecting the composition for forming an insulating coating film applied on the substrate to a heat treatment, a light irradiation treatment, or the like.
The heat treatment is not particularly limited and may be performed by a known method. For example, the heat treatment may be performed using a blow oven, an infrared oven, a vacuum oven, or the like. In addition, when the composition for insulating coating film formation contains a solvent, a solvent is removed by heat processing.

Although heat processing is not specifically limited, It is preferable to perform on 150 degreeC or less temperature conditions. When the temperature of the heat treatment exceeds 150 ° C., the material of the base material to be used is limited. For example, a base material made of a material generally used for a transparent electrode film such as a PET film, a polycarbonate film, or an acrylic film cannot be used. . In this invention, even if it is heat processing on 150 degreeC or less temperature conditions, it has an advantage which can obtain the transparent electrode which has sufficient transparency and electroconductivity. The temperature of the heat treatment is preferably 50 to 140 ° C, and more preferably 60 to 130 ° C. Although the processing time of heat processing is not specifically limited, It is preferable that it is 0.1 to 60 minutes, and it is more preferable that it is 0.5 to 30 minutes.

The light irradiation treatment is not particularly limited, but mainly ultraviolet rays, visible light, electron beams, ionizing radiation, etc. are used. In the case of ultraviolet curing, ultraviolet rays emitted from a light source such as an ultra-high pressure mercury lamp, a high-pressure mercury lamp, a low-pressure mercury lamp, a carbon arc, a xenon arc, or a metal halide lamp can be used. Here, the irradiation amount of the energy ray source is about 50 to 5000 mJ / cm ² as an integrated exposure amount at an ultraviolet wavelength of 365 nm.

In the transparent electrode of the present invention, the water contact angle of the insulating coating portion (A) is not particularly limited, but is preferably 50 ° or more, more preferably 60 ° or more, and 70 ° or more. Is more preferable. When the water contact angle is less than 50 °, the conductive coating film-forming composition remains on the insulating coating film portion (A) when the conductive coating film portion (B) is printed, and the conductive coating film is unintended. Leakage may occur as a result of the formation of the portion (B).

In the transparent electrode of the present invention, the pencil hardness of the insulating coating part (A) is not particularly limited, but is preferably 2H or more, and more preferably 3H or more. If the pencil hardness is less than 2H, sufficient film resistance may not be obtained when a transparent electrode is used.

In the transparent electrode of the present invention, the surface resistivity of the insulating coating part (A) is not particularly limited, but is preferably 10 ¹⁰ Ω / □ or more, and more preferably 10 ¹⁴ Ω / □ or more. If the surface resistivity is less than 10 ¹⁰ Ω / □, the current may leak.

<Conductive coating film part (B)>
The conductive coating film portion (B) is formed on a substrate using a conductive coating film forming composition containing a conductive polymer.

(Conductive polymer)
The conductive polymer is a compound for imparting conductivity to the conductive coating film portion (B). The conductive polymer is not particularly limited, and a conventionally known conductive polymer can be used. Specific examples thereof include polythiophene, polypyrrole, polyaniline, polyacetylene, polyphenylene vinylene, polynaphthalene, and derivatives thereof. Can be mentioned. These may be used alone or in combination of two or more. Among these, a conductive polymer including at least one thiophene ring in the molecule is preferable in that a molecule having high conductivity can be easily formed by including a thiophene ring in the molecule. The conductive polymer may form a complex with a dopant such as polyanion.

Among conductive polymers containing at least one thiophene ring in the molecule, poly (3,4-disubstituted thiophene) is more preferable because it is extremely excellent in conductivity and chemical stability. When the composition for forming a conductive coating film contains poly (3,4-disubstituted thiophene) or a composite of poly (3,4-disubstituted thiophene) and polyanion (dopant), the temperature is low. And a conductive-film part (B) can be formed in a short time, and it will be excellent also in productivity. The polyanion is a conductive polymer dopant, and the content thereof will be described later.

Poly (3,4-disubstituted thiophene) is particularly preferably poly (3,4-dialkoxythiophene) or poly (3,4-alkylenedioxythiophene). As poly (3,4-dialkoxythiophene) or poly (3,4-alkylenedioxythiophene), the following formula (II):

A polythiophene in a cationic form consisting of repeating structural units represented by
Here, R ⁵ and R ⁶ each independently represent a hydrogen atom or a C _1-4 alkyl group, or, when R ⁵ and R ⁶ are bonded, a C _1-4 alkylene group. Represents. The C _1-4 alkyl group is not particularly limited, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a t-butyl group. .
In addition, when R ⁵ and R ⁶ are bonded, the C _1-4 alkylene group is not particularly limited, and examples thereof include a methylene group, 1,2-ethylene group, 1,3-propylene group, 1, 4-butylene group, 1-methyl-1,2-ethylene group, 1-ethyl-1,2-ethylene group, 1-methyl-1,3-propylene group, 2-methyl-1,3-propylene group, etc. Can be mentioned. Among these, a methylene group, 1,2-ethylene group, and 1,3-propylene group are preferable, and a 1,2-ethylene group is more preferable. In the C _1-4 alkyl group and the C _1-4 alkylene group, a part of hydrogen may be substituted. As the polythiophene having a C _1-4 alkylene group, poly (3,4-ethylenedioxythiophene) is particularly preferable.

Although the weight average molecular weight of a conductive polymer is not specifically limited, It is preferable that it is the range of 500-100000, It is more preferable that it is the range of 1000-50000, It is most preferable that it is the range of 1500-20000. If the weight average molecular weight is less than 500, the viscosity required for the composition cannot be secured, and the conductivity of the conductive coating portion (B) when the transparent electrode is used may be reduced. is there.

The dopant is not particularly limited, but a polyanion is preferable. The polyanion forms a complex by forming an ion pair with the polythiophene (derivative), and the polythiophene (derivative) can be stably dispersed in water. Although it does not specifically limit as a poly anion, For example, carboxylic acid polymers (for example, polyacrylic acid, polymaleic acid, polymethacrylic acid, etc.), sulfonic acid polymers (for example, polystyrene sulfonic acid, polyvinyl sulfonic acid, polyisoprene) Sulfonic acid etc.). These carboxylic acid polymers and sulfonic acid polymers are also copolymers of vinyl carboxylic acids and vinyl sulfonic acids with other polymerizable monomers such as aromatic vinyl compounds such as acrylates, styrene, vinyl naphthalene, etc. It may be. Among these, polystyrene sulfonic acid is particularly preferable.

The polystyrene sulfonic acid preferably has a weight average molecular weight of 20,000 to 500,000, more preferably 40,000 to 200,000. If polystyrene sulfonic acid having a molecular weight outside this range is used, the dispersion stability of the polythiophene-based conductive polymer in water may decrease. The weight average molecular weight is a value measured by gel permeation chromatography (GPC).

The composite of the conductive polymer and the polyanion is preferably a composite of poly (3,4-ethylenedioxythiophene) and polystyrenesulfonic acid because it is particularly excellent in transparency and conductivity. .

The conductivity of the conductive polymer is not particularly limited, but is preferably 0.01 S / cm or more and 0.05 S / cm from the viewpoint of imparting sufficient conductivity to the conductive coating film portion (B). More preferably.

The content of the conductive polymer in the composition for forming a conductive coating film is not particularly limited. However, when the conductive coating film portion (B) is used, an amount of 0.01 to 50.0 mg / m ² is preferable. More preferable is an amount of ¹ to 10.0 mg / m ² . If it is less than 0.01 mg / m ² , the proportion of the conductive polymer in the conductive coating portion (B) decreases, and the conductivity of the conductive coating portion (B) may not be sufficiently secured. On the other hand, if it exceeds 50.0 mg / m ² , the proportion of the conductive polymer in the conductive coating portion (B) increases, which may cause adverse effects on the strength and film formability of the coating film. Because there is.

As an example of a method for producing a conductive polymer, a method for producing an aqueous dispersion of a complex of polythiophene represented by formula (II) and a dopant will be described. 3,4-dialkoxythiophene represented by the following formula (III)

(Wherein R ⁷ and R ⁸ each independently represent a hydrogen atom or a C _1-4 alkyl group, or, when R ⁷ and R ⁸ are bonded, C _1-4 alkylene) The alkyl group of C _1-4 is not particularly limited, and examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, and a t-butyl group. In addition, when R ⁷ and R ⁸ are bonded, the C _1-4 alkylene group is not particularly limited, and examples thereof include a methylene group, 1,2-ethylene group, 1,3- Propylene group, 1,4-butylene group, 1-methyl-1,2-ethylene group, 1-ethyl-1,2-ethylene group, 1-methyl-1,3-propylene group, 2-methyl-1,3 -Propylene groups, etc. Among these, , Methylene group, 1,2-ethylene, 1,3-propylene group are preferred, 1,2-ethylene group is more preferred alkyl groups _{.C 1-4,} and _an alkylene group of _{C 1-4,} the A part of hydrogen may be substituted.) Is produced through a step of oxidative polymerization in an aqueous solvent using an oxidizing agent in the presence of a dopant.

In the production of polythiophene, a monomer is oxidatively polymerized by a chemical polymerization method using various oxidizing agents. Since the chemical polymerization method is simple and capable of mass production, it is a method suitable for an industrial production method as compared with the conventional electrolytic polymerization method.

Although it does not specifically limit as an oxidizing agent used for a chemical polymerization method, For example, the oxidizing agent which uses a sulfonic acid compound as an anion, and makes an expensive transition metal a cation etc. is mentioned. Examples of the expensive transition metal ions constituting this oxidant include Cu ²⁺ , Fe ³⁺ , Al ³⁺ , Ce ⁴⁺ , W ⁶⁺ , Mo ⁶⁺ , Cr ⁶⁺ , Mn ⁷⁺ and Sn ⁴⁺ . Among these, Fe ³⁺ and Cu ²⁺ are preferable. Specific examples of the oxidizing agent having a transition metal as a cation include FeCl ₃ , Fe (ClO ₄ ) ₃ , K ₂ CrO ₇ , alkali perborate, potassium permanganate, copper tetrafluoroborate and the like. It is done. Examples of the oxidizing agent other than the oxidizing agent having a transition metal as a cation include alkali persulfate, ammonium persulfate, and H ₂ O ₂ . Furthermore, hypervalent compounds represented by hypervalent iodine reactants can be mentioned.

The amount of dopant such as polyanion used is preferably in the range of 50 to 2000 parts by weight, more preferably in the range of 100 to 1000 parts by weight with respect to 100 parts by weight of 3,4-dialkoxythiophene.

In addition to the conductive polymer, the composition for forming a conductive coating film may optionally contain other components as long as the object of the present invention is not impaired. Examples of other components include, but are not limited to, conductivity improvers, binders, solvents, crosslinking agents, catalysts, surfactants and / or leveling agents, water-soluble antioxidants, metal nanowires, antifoaming agents, rheology A control agent, a thickener, a neutralizing agent, etc. are mentioned.

(Conductivity improver)
By mix | blending a conductivity improving agent with the composition for conductive film formation, the electroconductivity of the conductive film part (B) formed using the composition for conductive film formation can be improved. The conductivity improver evaporates by heating when the conductive coating part (B) is formed, and the conductivity of the conductive coating part (B) is improved by controlling the orientation of the conductive polymer at that time. It is estimated that In addition, when using a conductivity improver, compared to the case without using a conductivity improver, the amount of the conductive polymer can be reduced while maintaining the surface resistivity. As a result, there is an advantage that transparency can be improved. is there.

The conductivity improver may be at least one selected from the group consisting of (i) to (vii) below from the viewpoint of ensuring the conductivity required for the conductive coating film part (B). preferable.
(I) a compound having a boiling point of 60 ° C. or more and having at least one ketone group in the molecule (ii) a compound having a boiling point of 100 ° C. or more and having at least one ether group in the molecule (iii) a molecule having a boiling point of 100 ° C. or more Compound (iv) having at least one sulfinyl group in it (iv) Compound having a boiling point of 100 ° C. or more and at least one amide group in the molecule (v) Compound having a boiling point of 50 ° C. or more and having at least one carboxyl group in the molecule (Vi) a compound having a boiling point of 100 ° C. or more and having two or more hydroxyl groups in the molecule (vii) a compound having a boiling point of 100 ° C. or more and having at least one lactam group in the molecule

Examples of the compound (i) having a boiling point of 60 ° C. or higher and having at least one ketone group in the molecule include isophorone, propylene carbonate, γ-butyrolactone, β-butyrolactone, 1,3-dimethyl-2-imidazolidinone and the like. Is mentioned. These may be used alone or in combination of two or more.

Examples of the compound (ii) having a boiling point of 100 ° C. or higher and having at least one ether group in the molecule include diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, 2-phenoxyethanol, dioxane, morpholine, 4-acryloylmorpholine, N-methylmorpholine N-oxide, 4-ethylmorpholine, 2-methoxyfuran and the like can be mentioned. These may be used alone or in combination of two or more.

Examples of the compound (iii) having a boiling point of 100 ° C. or higher and having at least one sulfinyl group in the molecule include dimethyl sulfoxide and the like.

Examples of the compound (iv) having a boiling point of 100 ° C. or more and having at least one amide group in the molecule include N, N-dimethylacetamide, N-methylformamide, N, N-dimethylformamide, acetamide, N-ethylacetamide. N-phenyl-N-propylacetamide, benzamide and the like. These may be used alone or in combination of two or more.

Examples of the compound (v) having a boiling point of 50 ° C. or more and having at least one carboxyl group in the molecule include acrylic acid, methacrylic acid, methanoic acid, ethanoic acid, propanoic acid, butanoic acid, pentanoic acid, hexanoic acid, and octane. Acid, decanoic acid, dodecanoic acid, benzoic acid, p-toluic acid, p-chlorobenzoic acid, p-nitrobenzoic acid, 1-naphthoic acid, 2-naphthoic acid, phthalic acid, isophthalic acid, oxalic acid, malonic acid, Examples include succinic acid, adipic acid, maleic acid, fumaric acid and the like. These may be used alone or in combination of two or more.

Examples of the compound (vi) having a boiling point of 100 ° C. or more and having two or more hydroxyl groups in the molecule include ethylene glycol, diethylene glycol, propylene glycol, trimethylene glycol, β-thiodiglycol, triethylene glycol, and tripropylene. Glycol, 1,4-butanediol, 1,5-pentanediol, 1,3-butanediol, 1,6-hexanediol, neopentyl glycol, catechol, cyclohexanediol, cyclohexanedimethanol, glycerin, erythritol, glycerin, immutol , Lactitol, maltitol, mannitol, sorbitol, xylitol, sucrose and the like. These may be used alone or in combination of two or more.

Examples of the compound (vii) having a boiling point of 100 ° C. or higher and having at least one lactam group in the molecule include N-methylpyrrolidone, β-lactam, γ-lactam, δ-lactam, ε-caprolactam, laurolactam and the like. Can be mentioned. These may be used alone or in combination of two or more.

When the boiling point of the conductivity improver is equal to or higher than a specific temperature, the conductivity improver gradually volatilizes by heating during formation of the conductive coating film part (B). It is considered that the orientation is controlled to an orientation advantageous for conductivity, and as a result, the conductivity is improved. On the other hand, if the boiling point of the conductivity improver is less than a specific temperature, the conductivity improver rapidly evaporates, so the orientation of the conductive polymer is not sufficiently controlled and the conductivity is not improved. It is considered a thing.

Binders, solvents, crosslinking agents, catalysts, surfactants and / or leveling agents, water-soluble antioxidants, antifoaming agents, rheology control agents, thickeners and neutralizing agents that can be used in the composition for forming a conductive coating film Are binders, solvents, crosslinking agents, catalysts, surfactants and / or leveling agents, water-soluble antioxidants, antifoaming agents, rheology control agents, thickeners, and the like that can be used in the above-mentioned composition for forming an insulating coating film. The same as the neutralizing agent.

(Metal nanowires)
By mix | blending metal nanowire with the composition for conductive film formation, the electroconductivity of the conductive film part (B) formed using the composition for conductive film formation can be improved.
As metal nanowire, what consists of a metal simple substance or a metal containing compound is mentioned.
Although it does not specifically limit as a metal simple substance, For example, silver, copper, silver, iron, cobalt, nickel, zinc, ruthenium, rhodium, palladium, cadmium, osmium, iridium, platinum etc. are mentioned, As a metal content compound, Although it does not specifically limit, For example, what contains these metals is mentioned. These metal nanowires may be used alone or in combination of two or more.

Although it does not specifically limit as a method of forming a conductive-film part (B) using the composition for conductive-film formation, For example, by printing means, such as screen printing, offset printing (including gravure offset printing), and pad printing Examples thereof include a method of directly drawing a target pattern on a substrate, a method of directly drawing a pattern by inkjet, and a method of drawing a pattern by etching after directly applying a composition for forming a conductive coating film to a substrate. Among these, from the viewpoint of simplicity, cost, and versatility of the substrate, a method for directly drawing a desired pattern on the substrate by printing means such as screen printing, offset printing (including gravure offset printing), and pad printing. Is preferred.
In addition, when the conductive coating film portion (B) is formed after the insulating coating film portion (A) is formed, in addition to the above methods, a roll coating method, a bar coating method, a dip coating method, a spin coating method, a blade A coating method, a curtain coating method, a spray coating method, a doctor coating method, or the like can be used. Among these, the spray coating method is particularly preferable.

In the transparent electrode of the present invention, the pencil hardness of the conductive coating portion (B) is not particularly limited, but is preferably 2H or more, and more preferably 3H or more. When the pencil hardness is less than 2H, scratches may occur during the work process, and when the wiring is disconnected or a transparent electrode is formed, sufficient film resistance may not be obtained.

In the transparent electrode of the present invention, the surface resistivity of the conductive coating portion (B) is not particularly limited, but is preferably 5000Ω / □ or less, more preferably 1000Ω / □ or less, and 500Ω / □ or less. More preferably. If the surface resistivity exceeds 5000 Ω / □, it may not function as a transparent electrode. In addition, since it is so preferable that the surface resistivity of a conductive-film part (B) is small, the minimum is not specifically limited, For example, it is 0.1 ohm / square.

In the transparent electrode of the present invention, the difference in film thickness between the insulating coating portion (A) and the conductive coating portion (B) is 1 to 50 μm. The difference in film thickness is preferably 1 to 30 μm, and more preferably 1 to 10 μm.
When the difference in film thickness is less than 1 μm, the conductive coating film forming composition does not enter between the patterns of the insulating coating film portion (A) when the conductive coating film portion (B) is formed, and the pattern cannot be formed. If the thickness exceeds 50 μm, the pattern may appear as a bone due to the difference in film thickness.

In the transparent electrode of the present invention, the difference (absolute value) in chromaticity (b ^* ) between the insulating coating portion (A) and the conductive coating portion (B) is not particularly limited, but may be 1.0 or less. Preferably, it is 0.8 or less, more preferably 0.6 or less. If the difference in chromaticity exceeds 1.0, the pattern may be visible.
In the present specification, chromaticity (b ^* ) refers to the value of b ^* representing the hue and saturation in the L ^* a ^* b ^* color system.

The total light transmittance of the transparent electrode of the present invention is not particularly limited, but is preferably 50% or more, more preferably 60% or more, and further preferably 80% or more. On the other hand, the upper limit is 100%.

The application of the transparent electrode of the present invention is not particularly limited as long as transparency and conductivity are required. For example, various display systems such as liquid crystal, plasma, field emission, etc. Examples include a touch panel, a touch sensor of a device, and a transparent electrode in a display element. Moreover, it can also be used for uses, such as a transparent electrode in a solar cell, an electromagnetic wave shielding material, electronic paper, an electroluminescence light control element, a transparent heating element, and an electroplating primer. Among these applications, touch panels for various electronic devices, transparent electrodes for driving liquid crystals, transparent electrodes for driving EL, transparent electrodes for driving electrochromic elements, electromagnetic shielding materials, transparent heating elements, or electrolytic plating primers It is preferable to be used. Especially, it can use suitably for the touch panel and touch sensor of various electronic devices.

<< Method for producing transparent electrode >>
Although the manufacturing method of the transparent electrode of this invention will not be specifically limited if the transparent electrode of this invention can be manufactured, The process of forming an insulating coating-film part (A), and a conductive coating-film part (B) Preferably, the process of forming is included.
The method for forming the insulating coating film portion (A) using the insulating coating film forming composition and the method for forming the conductive coating film portion (B) using the conductive coating film forming composition are as described above. It is.

In the manufacturing method of the transparent electrode of this invention, it is preferable to form a conductive-film part (B) after forming an insulating-film part (A). From the viewpoint of simplifying the process, it is necessary to impart water repellency and good printability to the first pattern to be formed by adding a water repellent or a screen paste. When these components are added to the composition for forming a conductive coating film, problems such as a decrease in conductivity may occur, but there is no particular problem even if these components are added to the composition for forming an insulating coating film. Therefore, it is preferable to form the insulating coating film part (A) first.

In the manufacturing method of the transparent electrode of this invention, it is preferable to form an insulating coating-film part (A) by screen printing or gravure offset printing. The reason for this is that screen printing and gravure offset printing are simple steps, and a pattern can be drawn directly.

In the method for producing a transparent electrode of the present invention, an insulating coating film part (A) and a conductive coating film part (B) are formed by forming a conductive coating film part (B) after forming an insulating coating film part (A). The transparent electrode whose pattern is made invisible can be easily and inexpensively manufactured with a small number of steps. Moreover, since it is not necessary to impregnate a conductive coating part (B) with a conductive deactivator, the hardness of a conductive coating part (B) can be improved.

<< Touch panel >>
The touch panel of the present invention includes the transparent electrode of the present invention.
Since the touch panel of the present invention includes the transparent electrode of the present invention, the pattern of the insulating coating film part (A) and the conductive coating film part (B) is invisible, and the adhesion between the transparent electrode and the adhesive layer Excellent in properties.

EXAMPLES Hereinafter, although an Example is given and this invention is demonstrated, this invention is not limited to a following example. Hereinafter, “part” or “%” means “part by weight” or “% by weight”, respectively, unless otherwise specified.

1. Materials used 1-1. Screen paste ink for screen printing (Mino Group, UPG-930, colorless and transparent)
1-2. Colorant / Phthalocyanine pigment (GLO made by UNILEX COLORS AND CHEMICALS LIMITED)
1-3. Water repellent component / perfluoroalkylethylene oxide adduct (manufactured by DIC, MegaFuck F-444)
1-4. Conductive polymer / PEDOT / PSS aqueous dispersion (manufactured by Heraeus Co., Clevios PH1000)
・ PEDOT / PSS pellet (Agfa Corporation, Orgacon DRY)
1-5. Metal nanowire / silver nanowire dispersion (Starlight PMC Co., Ltd., T-YP808, aspect ratio 230, solid content 1.0%)
1-6. Binder / alkoxysilane oligomer (manufactured by Tama Chemical Co., Ltd., TEOS)
・ Polyester resin (Aronix M-6100, manufactured by Toagosei Co., Ltd.)
1-7. Conductivity improver, dimethyl sulfoxide (manufactured by Tokyo Chemical Industry Co., Ltd.)
1-8. Thickener, polyacrylic acid (Toagosei Co., Ltd., Junron PW-160)
1-9. Substrate / polyethylene terephthalate (PET) film (Lumirror T-60, manufactured by Toray Industries, Inc.)
1-10. Inactive material / conductive deactivator (Clevios Etch, manufactured by Heraeus Co., Ltd.)
・ Resist agent (manufactured by Heraeus Co., Clevios SET-S)

2. Evaluation method 2-1. The film thickness was measured using a stylus type surface shape measuring device (Dektak 6M, manufactured by ULVAC, Inc.).
2-2. Water contact angle 25 ° C, 50% RH environment, 25 ° C distilled water (manufactured by Wako Pure Chemical Industries, Ltd.) is dropped on the surface of the insulating coating part (A), and the contact angle after 10 seconds is measured as a contact angle meter. (Measured by Kyowa Interface Science Co., Ltd., CA-D type). It was measured.
2-3. Pencil hardness It measured using the pencil scratch hardness tester (made by Yasuda Seiki Seisakusyo Co., Ltd.) according to the test method of JIS-K5600-5-4.
2-4. Measurement was performed using a chromaticity spectrocolorimeter (Konica Minolta, CM3600d).
2-5. It measured using the surface resistivity resistivity meter (Mitsubishi Chemical Corporation make, Lorestar GP MCP-T600).
2-6. Three substrates (test pieces) on which a leak test line and a comb-shaped pattern each having a line width of 500 μm were formed were prepared and stored at 60 ° C. and 93% RH for 1000 hours. Next, a voltage of 5V was applied to the test piece using a DC power supply device (Matsusada Precision Co., Ltd., P4K-80M), and current was measured using an ammeter (Sanwa Electric Instruments Co., Ltd., CP-70). The value was measured and evaluated according to the following criteria.
A: A current of 0.005 mA or more is not detected in all the test pieces.
X: A current of 0.005 mA or more is detected in at least one test piece.
2-7. Adhesion (cross cut test)
A polarizing plate with a pressure-sensitive adhesive layer (NPF-F1205DU, manufactured by Nitto Denko Corporation) was attached to the surface of the patterning portion of the transparent electrode, and a cross-cut peel test was performed according to JIS K 5400.
2-8. Appearance (visual observation)
Whether a polarizing plate with an adhesive layer (manufactured by Nitto Denko Corporation, NPF-F1205DU) is attached to the patterning surface of the transparent electrode, and the illumination for visual inspection is placed on the back of the transparent electrode, and whether the pattern can be visually recognized or less Evaluation based on the criteria.
○: The pattern cannot be visually recognized.
X: A pattern can be visually recognized.

Example 1
Each component was mixed by the weight ratio described in Table 1, and the composition for insulating coating film formation and the composition for conductive coating film formation were produced. The insulating film forming composition is formed using a screen printer (CUBE-1515, manufactured by Mino Group Co., Ltd.) (hereinafter simply referred to as a screen printer) to form a pattern having a line width of 500 μm on the substrate. After printing, insulating coating film part by heat-treating at 120 ° C. for 10 minutes using a blast constant temperature dryer (Tokyo Rika Kikai Co., Ltd., WFO-401 type) (hereinafter simply referred to as blast dryer). (A) was formed. Thereafter, the composition for forming a conductive coating film was applied using a spray coater (K-IXS-SW, manufactured by Kinki Seisakusho Co., Ltd.) (hereinafter simply referred to as a spray coater), and 120 using a blower dryer. By conducting a heat treatment at 30 ° C. for 30 minutes, a patterned conductive coating film part (B) having a line width of 500 μm was formed to obtain a transparent electrode.

(Example 2)
Each component was mixed by the weight ratio described in Table 1, and the composition for insulating coating film formation and the composition for conductive coating film formation were produced. The composition for forming an insulating coating film is printed using a screen printer so as to form a pattern having a line width of 1000 μm, and then heat-treated at 120 ° C. for 10 minutes using a blower dryer. A film part (A) was formed. Thereafter, the conductive coating film-forming composition is printed using a screen printer to form a pattern having a line width of 1000 μm so as to fill a portion where the insulating coating film portion (A) is not formed, and then a blow dryer. Was used for heat treatment at 120 ° C. for 30 minutes to form a patterned conductive coating portion (B) having a line width of 1000 μm, and a transparent electrode was obtained.

(Example 3)
Each component was mixed by the weight ratio described in Table 1, and the composition for insulating coating film formation and the composition for conductive coating film formation were produced. The composition for forming an insulating coating film is printed using a screen printer so as to form a pattern having a line width of 500 μm, and then heat-treated at 120 ° C. for 10 minutes using an air dryer, thereby insulating coating. A film part (A) was formed. Thereafter, the conductive film-forming composition was applied using a spray coater, and heat-treated at 120 ° C. for 30 minutes using a blow dryer, thereby forming a patterned conductive film part (B) having a line width of 500 μm. And a transparent electrode was obtained.

Example 4
Each component was mixed by the weight ratio described in Table 1, and the composition for insulating coating film formation and the composition for conductive coating film formation were produced. The composition for forming an insulating coating film is printed using a screen printer so as to form a pattern having a line width of 500 μm, and then heat-treated at 120 ° C. for 10 minutes using an air dryer, thereby insulating coating. A film part (A) was formed. Thereafter, the conductive film-forming composition was applied using a spray coater, and heat-treated at 120 ° C. for 30 minutes using a blow dryer, thereby forming a patterned conductive film part (B) having a line width of 500 μm. And a transparent electrode was obtained.

(Comparative Example 1)
Each component was mixed by the weight ratio described in Table 1, and the composition for transparent conductive film formation (equivalent to the composition for insulating coating film formation of Example 1-4 and the composition for conductive coating film formation) was produced. By applying the composition for forming a transparent conductive film on a substrate using a wire bar (manufactured by Yasuda Seiki Seisakusho Co., Ltd., No. 579 Bar Coater) and then heat-treating it at 120 ° C. for 30 minutes using a blow dryer. The conductive coating film part (B) was formed. Then, after providing a resist film by applying a resist agent (manufactured by Heraeus Co., Clevios SET-S) in a pattern with a line width of 1000 μm on the conductive coating film part (B), a conductive deactivator ( A conductive coating film part (B) was impregnated with Herius Co., Ltd. (Clevios Etch), and a part of the conductive coating film part (B) was defined as an insulating coating film part (A). A transparent electrode was obtained by peeling the resist film with ethanol.

(Comparative Example 2)
Each component was mixed by the weight ratio described in Table 1, and the composition for insulating coating film formation and the composition for conductive coating film formation were produced. The composition for forming an insulating coating film is printed using a screen printer so as to form a pattern having a line width of 500 μm, and then heat-treated at 120 ° C. for 10 minutes using an air dryer, thereby insulating coating. A film part (A) was formed. Thereafter, the conductive film-forming composition was applied using a spray coater, and heat-treated at 120 ° C. for 30 minutes using a blow dryer, thereby forming a patterned conductive film part (B) having a line width of 500 μm. And a transparent electrode was obtained.

(Comparative Example 3)
Each component was mixed by the weight ratio described in Table 1, and the composition for insulating coating film formation and the composition for conductive coating film formation were produced. The composition for forming an insulating coating film is printed using a screen printer so as to form a pattern having a line width of 500 μm, and then heat-treated at 120 ° C. for 10 minutes using an air dryer, thereby insulating coating. A film part (A) was formed. Thereafter, the conductive film-forming composition was applied using a spray coater, and heat-treated at 120 ° C. for 30 minutes using a blow dryer, thereby forming a patterned conductive film part (B) having a line width of 500 μm. And a transparent electrode was obtained.

Using the transparent electrodes obtained in Examples 1 to 4 and Comparative Examples 1 to 3, the film thicknesses of the insulating coating film part (A) and the conductive coating film part (B), the water contact angle, the pencil, by the method described above. While evaluating hardness, chromaticity, surface resistivity, adhesion, and appearance, a leak test was conducted. The results are shown in Table 2.

Claims (10)

A transparent electrode in which an insulating coating film part (A) and a conductive coating film part (B) containing a conductive polymer are disposed adjacent to each other on at least one surface of a substrate,
A transparent electrode, wherein the difference in film thickness between the insulating coating portion (A) and the conductive coating portion (B) is 1 to 50 μm. The transparent electrode according to claim 1, wherein the conductive polymer is a complex of poly (3,4-dialkoxythiophene) and a polyanion. The transparent electrode according to claim 1 or 2, wherein the conductive film portion (B) has a pencil hardness of 2H or more. The transparent electrode according to any one of claims 1 to 3, wherein the water contact angle of the insulating coating film portion (A) is 50 ° or more. The transparent electrode according to any one of claims 1 to 4, wherein the insulating coating portion (A) contains 0.1% by weight or more of a fluorine-containing compound. The transparent electrode according to any one of claims 1 to 5, wherein a difference in chromaticity (b ^* ) between the insulating coating portion (A) and the conductive coating portion (B) is 1.0 or less. A method for producing a transparent electrode, comprising producing the transparent electrode according to claim 1. The manufacturing method of the transparent electrode of Claim 7 which forms a conductive-film part (B) after forming an insulating-film part (A). The method for producing a transparent electrode according to claim 7 or 8, wherein the insulating coating film portion (A) is formed by screen printing or gravure offset printing. A touch panel comprising the transparent electrode according to claim 1.