JP2015169741A - Optical deflection element - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an optical deflection element capable of controlling a progress direction in both directions in plan view to a progress direction of light.SOLUTION: An optical deflection element comprises: a base part electrode; a first clad layer formed on the base part electrode; a core layer laminated on the first clad layer and extending from one end side toward the other end side of the base par electrode in plan view; a second clad layer laminated on the core layer; a first electrode formed in a first area including a side on one end side of the core layer in plan view, among four triangular areas obtained by dividing into four pieces a rectangular area of the base part electrode in plan view with two diagonals, in a second surface opposite to the first surface of the second clad layer which is laminated on the core layer; and a second electrode and third electrode formed on a second area and third area adjacent to the first area in the second surface of the second clad layer. Either between the base part electrode and the first electrode and second electrode, or between the base part electrode and the first electrode and third electrode, voltage is applied. Therefore light incident to the core layer from one end side is deflected and then emitted from the other end side.

Description

  The present invention relates to an optical deflection element.

  Currently, there is an increasing demand for light control elements for deflecting highly coherent light in projectors and other video equipment, laser printers, high-resolution confocal microscopes, barcode readers, and the like. Conventionally, a technique for rotating a polygon mirror, a technique for controlling light deflection by a galvano mirror, a light diffraction technique using an acoustooptic effect, and a micromachine technique called MEMS (Micro Electro Mechanical Systems) have been proposed.

Furthermore, in recent years, organic electro-optic polymer materials that are smaller in size than conventional dielectric materials such as electro-optic (EO) crystal LiNbO ₃ and capable of ultra-high-speed modulation exceeding 100 GHz with low power are being developed ( For example, refer nonpatent literature 1).

  Unlike galvano mirrors, polygon mirrors, MEMS mirrors, etc., optical deflectors using these electro-optic materials do not have mechanically movable parts, enabling high-speed optical deflection and reducing the physical load of the device. Therefore, its practical application is expected.

  In addition, as the optical deflection element using the electro-optic polymer material described above, an element in which the surface of the element is cut to form a prism, or an optical device using a nonlinear optical material has been proposed (for example, see Patent Document 1). ).

  An optical device described in Patent Document 1 includes an optical waveguide layer having an electro-optic thin film formed on a substrate as a core layer, a refractive index control electrode formed on the optical path layer, and a substrate of the optical waveguide layer A full-surface electrode formed on the surface side, a driving power source for applying a voltage between these electrodes to generate an electric field in the electro-optic material, and a light beam input / output means.

  Here, as a refractive index control electrode, for example, when a triangular electrode is formed and a voltage is applied to the lower substrate electrode, the refractive index of the triangular prism portion below the electrode changes based on the electro-optic effect. Since the triangular prism portion functions as a prism, incident light can be deflected without actually processing the electro-optic material.

National Institute of Information and Communications Technology Vol. 59 No. 1 (2013)

JP 2003-084323 A

  However, since the optical device described in Patent Document 1 can control the traveling direction only on one side in a plan view with respect to the traveling direction of light, there is a limitation in using the optical device as a light deflection element, and the usability is not good. .

  Accordingly, an object of the present invention is to provide a light deflection element that can control the traveling direction in both directions in a plan view with respect to the traveling direction of light, and is easy to use.

  An optical deflection element according to an embodiment of the present invention includes a rectangular base electrode, a first cladding layer formed on one surface of the base electrode, and the first cladding layer stacked on the first cladding layer. A core layer extending from one end side of the electrode to the other end side, a second clad layer that is laminated on the core layer and covers the core layer together with the first clad layer, and a laminated layer on the core layer of the second clad layer One end of the core layer in plan view out of four triangular regions obtained by dividing the rectangular region of the base electrode into four diagonal lines in plan view on the second surface opposite to the first surface A first electrode formed in a first region including a side edge and a second region adjacent to the first region among the four triangular regions on the second surface of the second cladding layer. A second electrode formed on the second surface of the second cladding layer; A third electrode formed in a third region adjacent to the first region among the four triangular regions, and between the base electrode and the first electrode and the second electrode, or By applying a voltage between the base electrode and the first electrode and the third electrode, the light incident on the core layer from the one end side is deflected and emitted from the other end side. To do.

  The traveling direction can be controlled in both directions in a plan view with respect to the traveling direction of light, and a light deflection element that is easy to use can be provided.

It is a figure which shows the optical deflection | deviation element 100 of embodiment. It is a figure which shows the shape of the electrode of the optical deflection | deviation element 100 shown in FIG. 3 is a diagram for explaining the principle of deflection in the optical deflection element 100. FIG. It is a figure which shows the simulation result of the deflection | deviation operation | movement in the optical deflection | deviation element 100 of embodiment. It is a characteristic view which shows the comparison result of the theoretical value of a deflection angle, and the simulation value in the optical deflection | deviation element 100 of embodiment.

  Hereinafter, embodiments to which the optical deflection element of the present invention is applied will be described.

<Embodiment>
1A and 1B are diagrams showing an optical deflection element 100 according to an embodiment, where FIG. 1A is a plan view and FIG. 1B is a side view. FIG. 2 is a diagram showing the shape of the electrodes of the optical deflection element 100 shown in FIG. 1 and 2, description will be made using an XYZ coordinate system which is a common orthogonal coordinate system.

  As shown in FIG. 1, the optical deflection element 100 includes a substrate 10, a base electrode 20, a cladding layer 30, a core layer 40, a cladding layer 50, and electrodes 60 (61, 62, 63). 2A shows the shape and positional relationship of the electrodes 60 (61, 62, 63) on the cladding layer 50 (on the XY plane), and FIG. 2B shows the top of the substrate 10 (XY). The shape of the base electrode 20 in the plane) is shown. FIG. 2B is a diagram showing only the positional relationship between the substrate 10 and the base electrode 20 in the XY plane with the clad layer 30, the core layer 40, the clad layer 50, and the electrode 60 removed, for convenience of explanation.

As the substrate 10, for example, a silicon (Si) wafer substrate on which a silicon oxide (SiO ₂ ) layer is formed can be used. The substrate 10 is preferably a substrate on which the base electrode 20 can be easily formed on one surface, but is not limited to a silicon substrate, and may be a substrate made of an insulator such as a resin.

  Further, here, the substrate 10 has the same rectangular shape as the base electrode 20, the cladding layer 30, and the cladding layer 50 in plan view (XY plane view), and one optical path is formed on one substrate 10. The form to be performed will be described.

  However, the substrate 10 may be larger than the base electrode 20, the clad layer 30, and the clad layer 50 in plan view. In addition, a plurality of sets of the base electrode 20, the clad layer 30, the core layer 40, and the clad layer 50 may be formed on the single substrate 10 to form a plurality of optical paths.

  The base electrode 20 is a full-surface electrode formed on the entire surface of the substrate 10 on the positive side of the Z-axis (the surface of silicon oxide) (see FIG. 2B). The base electrode 20 is an electrode serving as a reference potential point when a voltage is applied to electrodes 60 (61, 62, 63) described later to control the refractive index of the core layer 40.

  The base electrode 20 has a rectangular shape in plan view, and FIGS. 1 and 2 show a rectangular base electrode 20 as an example. The width of the base electrode 20 in the X-axis direction is W1, and the length in the Y-axis direction is L (see FIG. 1A).

  The base electrode 20 is formed, for example, by sequentially forming a chromium (Cr) layer and a gold (Au) layer on the surface of the substrate 10 by vapor deposition or the like. The thickness of the chromium layer is 20 nm as an example, and the thickness of the gold layer is 200 nm as an example.

  Here, the base electrode 20 will be described in terms of a two-layer structure of a chromium layer and a gold layer. However, the base electrode 20 is disposed between the clad layer 30 and the electrodes 60 (61, 62, 63) described later. Any electrode that can apply an electric field E (see FIG. 1B) to the core layer 40 and the cladding layer 50 may be used. For this reason, the base electrode 20 may be a single-layer metal electrode made of a chromium layer or a gold layer, or may be a metal electrode constituted by a metal layer other than the chromium layer and the gold layer.

  The cladding layer 30 is formed on the surface of the base electrode 20 on the Z axis positive direction side. The clad layer 30 has a rectangular shape in plan view, and the size in plan view is equal to the base electrode 20. For this reason, the width of the cladding layer 30 in the X-axis direction is W1, and the length in the Y-axis direction is L. Moreover, the thickness of the clad layer 30 is 0.5 μm as an example.

  The clad layer 30 only needs to be formed of a material having a lower refractive index than that of the core layer 40, and a known clad layer material can be used. The clad layer 30 is formed on the surface on the positive side of the Z-axis of the base electrode 20 by, for example, producing a thin film for the clad layer by a spin coat method.

  The core layer 40 has one end of the cladding layer 30 in the Y-axis direction (Y) in a region having a width W2 including the central axis C in the longitudinal direction of the cladding layer 30 on the Z-axis positive direction side of the cladding layer 30. It is formed from the end portion on the negative axis direction side) to the other end (end portion on the Y axis positive direction side). Therefore, the length of the core layer 40 in the Y-axis direction is L, and the width W2 is about ３ of the width W1 of the base electrode 20 and the cladding layer 30. Moreover, the thickness of the core layer 40 is 1 micrometer as an example.

  The core layer 40 is made of an electro-optic polymer material. As the electro-optic polymer material, for example, tricyanofuran (TCF) having a refractive index n = 1.7 and an electro-optic constant r = 150 pm / V can be used. As long as the material of the core layer 40 is a core material having a higher refractive index than the cladding layers 30 and 50, other materials may be used.

  The core layer 40 is covered with the cladding layers 30 and 50 on the four side surfaces on the Z-axis positive direction side, the Z-axis negative direction side, the X-axis positive direction side, and the X-axis negative direction side. The core layer 40 may be formed to have the same width W1 in the X-axis direction as that of the base electrode 20. In this case, the width of the cladding layers 30 and 50 in the X-axis direction may be made wider than W1. In the simulation described later, the width W2 of the core layer 40 is made equal to the width W1 of the base electrode 20.

  The cladding layer 50 is formed on the surface of the core layer 40 on the Z axis positive direction side. Since the clad layer 50 has the same size in plan view as the clad layer 30, the clad layer 30 is directly bonded to the clad layer 30 in a portion where the core layer 40 does not exist on the surface on the positive side in the Z-axis direction. Is done. The clad layer 50 is formed, for example, by producing a thin film for the clad layer by spin coating. In addition, the thickness of the clad layer 50 is 0.5 μm as an example.

  Further, the total thickness d (see FIG. 1B) of the clad layer 30, the core layer 40, and the clad layer 50 set to the above-described thickness is 2 μm.

  The electrode 60 is divided into electrodes 61, 62 and 63. It is a refractive index control electrode for controlling the refractive indexes of the electrodes 61, 62, 63 and the core layer 40.

  For example, the electrodes 61, 62, and 63 are formed by forming a gold (Au) layer on one surface of the cladding layer 50 on the Z-axis positive direction side and positive portions in the Y-axis direction where the unnecessary portions (the electrodes 61, 62, and 63 do not exist) are formed. It is formed by dry etching the triangular portion on the direction side) and dividing the electrodes 61, 62, 63 by laser processing or the like. In addition, the thickness of the electrodes 61, 62, and 63 is 200 nm as an example.

  The electrode 61 is a core layer in plan view out of four triangular regions obtained by dividing the rectangular region of the base electrode 20 into four diagonal lines in plan view on the surface on the positive side of the Z-axis of the cladding layer 50. 40 is formed in a first region including a side 40A (see FIG. 1A) on one end side (X-axis negative direction side).

  The electrode 62 is formed in a second region adjacent to the first region among the four triangular regions on the surface of the cladding layer 50 on the positive side in the Z-axis direction. The second region is a region located on the Y axis positive direction side and the X axis negative direction side with respect to the first region.

  The electrode 63 is formed in a third region adjacent to the first region among the four triangular regions on the surface of the cladding layer 50 on the positive side in the Z-axis direction. The third region is a region located on the Y axis positive direction side and the X axis positive direction side with respect to the first region.

  Here, the electrodes 61, 62, 63 and the core layer 40 are arranged symmetrically with respect to the central axis C with respect to the Y axis.

  The electrode 61 is an isosceles triangular electrode in plan view with the central axis C as an axis of symmetry. The electrodes 62 and 63 are triangular electrodes arranged in line symmetry with respect to the central axis C in plan view.

  The region where the electrodes 61 and 62 are combined is a right triangle having a width W1 and a length L and the hypotenuse has a negative inclination in the XY plane, and the region where the electrodes 61 and 63 are combined is a width W1, It is a right triangle having a length L and a hypotenuse with a positive slope in the XY plane.

  After forming the laminated body as described above, orientation polarization treatment and thermosetting treatment are performed, whereby the optical deflection element 100 including the core layer 40 as a polyimide waveguide layer is completed.

また、コア層４０として用いるトリシアノフランの屈折率をｎ２とすると、屈折率制御電極（電極６１、６２）と全面電極（基部電極２０）との間に電圧を印加してプリズム部（電極６１、６２の三角形状に対応するコア層４０の一部）に式（１）で表される電界が印加されると、プリズム内のコア層４０の屈折率ｎ１は、次式（２）で表される。

また、図３に示すように角度θ_１を定義すると、角度θ１は、次式（３）で表される。

また、図３に示すようにコア層４０に光が入力される場合、光の入射方向に対して偏向する角度θ_ｃは、次式（４）で表される。

図１で、基部電極２０に対しＶａ＝Ｖｂ、Ｖｃ＝０Ｖとすると、プリズム内のコア層４０の屈折率ｎ１になり、最終的に入射方向に対して式（４）のθ_ｃだけ方向が変わる。このとき、加える電圧を変化させれば、出射光の偏向角度θ_ｃを連続的に制御することができる。 Here, FIG. 3 is a diagram for explaining the principle of deflection in the optical deflection element 100. 3A and 3B, the principle that light input to the core layer 40 enters and deflects into a region where the electrodes 61 and 62 shown in FIG. In FIG. 3, the electrodes 61 and 62 are shown as one triangular electrode.
First, assuming that the total thickness d of the cladding layer 30, the core layer 40, and the cladding layer 50, the electric field E generated in the cladding layer 30, the core layer 40, and the cladding layer 50 is expressed by the following equation (1).

Further, if the refractive index of tricyanofuran used as the core layer 40 is n2, a voltage is applied between the refractive index control electrodes (electrodes 61 and 62) and the entire surface electrode (base electrode 20) to form a prism portion (electrode 61). When the electric field expressed by the formula (1) is applied to a part of the core layer 40 corresponding to the triangular shape of 62, the refractive index n1 of the core layer 40 in the prism is expressed by the following formula (2). Is done.

Moreover, by defining the angle theta _1, as shown in FIG. 3, the angle θ1 is expressed by the following formula (3).

Also, when the light is input to the core layer 40 as shown in FIG. 3, to deflect relative to the direction of light angle theta _c is expressed by the following equation (4).

In Figure 1, Va = Vb to the base electrode 20, when Vc = 0V, become refractive index n1 of the core layer 40 of the prism, with respect to the final direction of incidence direction by theta _c of the formula (4) change. At this time, if by changing the voltage applied, it is possible to continuously control the deflection angle theta _c of the emitted light.

On the other hand, when Va = Vc and Vb = 0, the direction changes to θ _c on the opposite side with respect to the center line. When Va = Vb = Vc = 0, the light travels in the straight direction.

  In this way, the deflection of the emitted light can be controlled by the combination of the voltage and the size.

  That is, the electrodes 61, 62, and 63 change the refractive index of the prism portion of the core layer 40 by applying a positive voltage to any one of the electrodes 61 and 62 or any combination of the electrodes 61 and 63.

  When a positive voltage is applied to the electrodes 61 and 62, the refractive index of the core layer 40 existing in a right triangle region changes in a plan view defined by the electrodes 61 and 62, and the plan view defined by the electrodes 61 and 62. A prism corresponding to a right triangle is obtained.

  In addition, when a positive voltage is applied to the electrodes 61 and 63, the refractive index of the core layer 40 existing in a right triangle region in plan view defined by the electrodes 61 and 63 changes, and is defined by the electrodes 61 and 63. A prism corresponding to a right triangle in plan view is obtained.

  As shown in FIG. 1A, the optical deflection element 100 according to the embodiment has a DC power supply 71 connected to the output voltage Va between the electrode 61 and the base electrode 20, and between the electrode 62 and the base electrode 20. Is connected to a DC power source 72 having an output voltage Vb, and a DC power source 73 having an output voltage Vc is connected between the electrode 63 and the base electrode 20.

  The DC power supplies 71, 72, and 73 are power supplies that apply a positive voltage to the electrodes 61, 62, and 63 with respect to the base electrode 20, respectively, and the output voltages Va, Vb, and Vc are turned on / off independently. It is a power supply that can be switched to.

  When the voltages Va and Vb are applied to the electrodes 61 and 62 by turning on the DC power supplies 71 and 72 and turning off the DC power supply 73, respectively, from one end side (Y-axis negative direction side) of the core layer 40. The input light (see FIG. 1A) is deflected to the X axis positive direction side and output from the other end side (Y axis positive direction side) of the core layer 40.

  When the voltages Va and Vc are applied to the electrodes 61 and 63 by turning on the DC power supplies 71 and 73 and turning off the DC power supply 72, respectively, from one end side (Y-axis negative direction side) of the core layer 40. The input light (see FIG. 1A) is deflected in the X-axis negative direction side and output from the other end side (Y-axis positive direction side) of the core layer 40.

  Next, simulation results will be described with reference to FIG.

  FIG. 4 is a diagram illustrating a simulation result of the deflection operation in the optical deflection element 100 according to the embodiment. Here, the light deflection angle is represented by θ. θ represents the angle in the clockwise direction with respect to the positive Y-axis direction shown in FIGS. 1 and 2 as a positive angle.

  Under the simulation conditions, the chromium layer and the gold layer of the base electrode 20 have thicknesses of 20 nm and 200 nm, the cladding layers 30 and 50 have a thickness of 0.5 μm, the core layer 40 has a thickness of 1 μm, and the electrodes 61 and 62, respectively. 63 is set to 200 nm.

  Further, the width W1 in the X-axis direction of the base electrode 20 is 3 μm, the length L is 15 μm, the width W2 of the core layer 40 is 3 μm, which is the same as the width W1 of the base electrode 20, the cladding layer 30, the core layer 40, and the cladding layer The total thickness d of 50 was set to 2 μm, and laser light having a wavelength of 800 nm was incident from one end side of the core layer 40.

  As shown in FIG. 4A, when all the voltages applied to the electrodes 61, 62, and 63 are set to 0V and light is input to the core layer 40 from one end side (Y-axis negative direction side), the deflection angle θ is 0 °. .Met.

  As shown in FIG. 4B, the voltage applied to the electrodes 61 and 62 is set to 70V, the voltage applied to the electrode 63 is set to 0V, and light is applied to the core layer 40 from one end side (Y-axis negative direction side). When input, the deflection angle θ was 2.2 deg.

  As shown in FIG. 4C, the voltage applied to the electrodes 61 and 62 is set to 140 V and the voltage applied to the electrode 63 is set to 0 V, so that light is applied to the core layer 40 from one end side (Y-axis negative direction side). When input, the deflection angle θ was 5.1 deg.

  Thus, in a state where a positive voltage is applied to the electrodes 61 and 62 and no voltage is applied to the electrode 63 (a state where 0 V is applied), light input to the core layer 40 from one end side (Y-axis negative direction side). Was deflected rightward and output from the other end side (Y-axis positive direction side) of the core layer 40.

  It was also found that the deflection angle increases when the voltage applied to the electrodes 61 and 62 is increased.

  In addition, due to the symmetry of the electrodes 62 and 63, in a state where a positive voltage is applied to the electrodes 61 and 63 and no voltage is applied to the electrode 62 (a state where 0 V is applied), one end side (Y-axis negative direction) is applied to the core layer 40. It is considered that the light input from the side) is deflected leftward and output from the other end side (Y-axis positive direction side) of the core layer 40.

  Next, the theoretical value of the deflection angle and the simulation value are compared using FIG.

FIG. 5 is a characteristic diagram showing a comparison result between the theoretical value of the deflection angle and the simulation value in the optical deflection element 100 of the embodiment. Here, the value with a negative deflection angle represents the angle when deflecting counterclockwise with respect to the positive Y-axis direction in FIGS. The theoretical value was obtained using the refractive indexes n1 and n2 and the angle θ1 described with reference to FIG. The refractive index of the core layer 40 when an electric field is applied to the core layer 40 through the electrodes 61, 62, and 63 changes according to the strength of the electric field. Therefore, the theoretical characteristics shown in FIG. Obtained.
As shown in FIG. 5, as a result of setting the voltage value applied to the electrodes 61, 62 and 63 and comparing the theoretical value with the simulation value, the simulation value substantially coincided with the theoretical value.

  When a positive voltage was applied to the electrodes 61 and 62 and the electrode 63 was held at 0 V, the deflection angle took a positive value, and the deflection angle increased substantially linearly as the positive voltage increased.

  Further, when a positive voltage is applied to the electrodes 61 and 63 and the electrode 62 is held at 0 V, the deflection angle takes a negative value, and the deflection angle becomes almost linear (in absolute value) as the positive voltage increases. Increased.

  As described above, according to the embodiment, it is possible to continuously control the light beam direction in both directions with the traveling direction as a center with respect to the traveling direction of the light beam. be able to.

  In the optical deflecting element 100 of the embodiment, control voltages are applied to at least four electrodes (20, 61, 62, 63) formed on opposing surfaces of the core layer 40 formed of an electro-optic solid such as an electro-optic polymer material. When applied, the gradient of the refractive index distribution in the crystal of the electro-optic solid is generated by the electro-optic effect, so that incident light incident substantially perpendicular to the electric field formed by the control voltage can be deflected.

  In the above description, the positive voltage is applied from the power sources 71, 72, 73 to the electrodes 61, 62, 63. However, a negative voltage may be applied. Further, the positions of the electrode 20 and the electrodes 61, 62, 63 may be interchanged.

  In addition, the optical deflection element 100 including one core layer 40 has been described above. However, the plurality of core layers 40 are arranged in parallel, and the base electrode 20 and the electrodes 61, 62, 63 corresponding to the core layers are arranged. By providing this, the deflection angle can be controlled when light is transmitted through a plurality of channels. Further, in this case, the substrate 10 and / or the base electrode 20 can be a common electrode, and one common clad layer 30 and 50 may be used for the plurality of core layers 40. .

The light deflecting element 100 according to the embodiment is not limited to a polygon mirror, a galvanometer mirror, a light diffraction technique using an acoustooptic effect, a MEMS mirror, or the like. It can be used for a barcode reader or the like. Further, it is particularly suitable for a stereoscopic video display device. In an aerial image reproduction type stereoscopic image display apparatus that does not require glasses, such as a stereoscopic method called IP (Integral Photography) stereoscopic, it is necessary to emit light rays precisely and in multiple directions to reproduce an aerial image. In this case, one display pixel is assigned in one direction. However, in order to reproduce a natural-looking aerial image, it is difficult to realize this because too many light beams are required. By using the light deflection element 100 of the embodiment, it becomes possible to emit light rays from a single display pixel in multiple directions at high speed in a time-sharing manner, and the load for manufacturing a stereoscopic image display device can be reduced. it can.
Although the optical deflecting element of the exemplary embodiment of the present invention has been described above, the present invention is not limited to the specifically disclosed embodiment, and does not depart from the scope of the claims. Various modifications and changes are possible.

DESCRIPTION OF SYMBOLS 100 Optical deflection element 10 Board | substrate 20 Base electrode 30 Clad layer 40 Core layer 50 Clad layer 60, 61, 62, 63 Electrode

Claims (5)

A rectangular base electrode;
A first cladding layer formed on one surface of the base electrode;
A core layer stacked on the first cladding layer and extending from one end side to the other end side of the base electrode in plan view;
A second cladding layer laminated on the core layer and covering the core layer together with the first cladding layer;
Four triangular regions obtained by dividing the rectangular region of the base electrode into two diagonal lines in plan view on the second surface of the second cladding layer opposite to the first surface laminated on the core layer A first electrode formed in a first region including a side on one end side of the core layer in plan view,
A second electrode formed in a second region adjacent to the first region of the four triangular regions on the second surface of the second cladding layer;
A third electrode formed in a third region adjacent to the first region of the four triangular regions on the second surface of the second cladding layer; and
By applying a voltage between the base electrode and the first electrode and the second electrode, or between the base electrode and the first electrode and the third electrode, from the one end side An optical deflecting element that deflects light incident on the core layer and emits the light from the other end side.   The first electrode has an apex located on a central axis extending from the one end side to the other end side of the rectangular region of the base electrode in a plan view, and isosceles formed in the first region The light deflection element according to claim 1, wherein the light deflection element is a triangular electrode.   3. The optical deflection element according to claim 1, wherein the second electrode and the third electrode are triangular electrodes formed in the second region and the third region, respectively, in plan view.   The optical deflection element according to claim 1, wherein the core layer is formed of an electro-optic polymer material. Further comprising a substrate,
The optical deflection element according to claim 1, wherein the base electrode is formed on one surface of the substrate.

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