JP2015024941A - Hollow particle and production method thereof - Google Patents
Hollow particle and production method thereof Download PDFInfo
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- JP2015024941A JP2015024941A JP2013156892A JP2013156892A JP2015024941A JP 2015024941 A JP2015024941 A JP 2015024941A JP 2013156892 A JP2013156892 A JP 2013156892A JP 2013156892 A JP2013156892 A JP 2013156892A JP 2015024941 A JP2015024941 A JP 2015024941A
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- hollow particles
- phosphate
- layered silicate
- hollow
- ion
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- 239000002245 particle Substances 0.000 title claims abstract description 82
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims abstract description 28
- 238000005192 partition Methods 0.000 claims abstract description 18
- 238000001704 evaporation Methods 0.000 claims abstract description 8
- 230000008020 evaporation Effects 0.000 claims abstract description 8
- 238000001694 spray drying Methods 0.000 claims abstract description 8
- 150000003839 salts Chemical class 0.000 claims abstract description 4
- 239000002994 raw material Substances 0.000 claims description 26
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 13
- 239000006185 dispersion Substances 0.000 claims description 12
- 229910052816 inorganic phosphate Inorganic materials 0.000 claims description 12
- 229910019142 PO4 Inorganic materials 0.000 claims description 9
- 229940085991 phosphate ion Drugs 0.000 claims description 9
- 235000019354 vermiculite Nutrition 0.000 claims description 9
- 239000010452 phosphate Substances 0.000 claims description 8
- 230000008569 process Effects 0.000 claims description 8
- 239000011164 primary particle Substances 0.000 claims description 7
- 229910052902 vermiculite Inorganic materials 0.000 claims description 7
- 239000010455 vermiculite Substances 0.000 claims description 7
- 239000010445 mica Substances 0.000 claims description 6
- 229910052618 mica group Inorganic materials 0.000 claims description 6
- 238000005507 spraying Methods 0.000 claims description 6
- 239000001226 triphosphate Substances 0.000 claims description 6
- -1 Na-tetrasilicon mica Chemical compound 0.000 claims description 5
- 239000002612 dispersion medium Substances 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 5
- 229910000275 saponite Inorganic materials 0.000 claims description 4
- 229920000388 Polyphosphate Polymers 0.000 claims description 3
- RJDOZRNNYVAULJ-UHFFFAOYSA-L [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] Chemical compound [O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[O--].[F-].[F-].[Mg++].[Mg++].[Mg++].[Al+3].[Si+4].[Si+4].[Si+4].[K+] RJDOZRNNYVAULJ-UHFFFAOYSA-L 0.000 claims description 3
- VNSBYDPZHCQWNB-UHFFFAOYSA-N calcium;aluminum;dioxido(oxo)silane;sodium;hydrate Chemical compound O.[Na].[Al].[Ca+2].[O-][Si]([O-])=O VNSBYDPZHCQWNB-UHFFFAOYSA-N 0.000 claims description 3
- 150000001768 cations Chemical class 0.000 claims description 3
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 claims description 3
- 239000001177 diphosphate Substances 0.000 claims description 3
- 235000011180 diphosphates Nutrition 0.000 claims description 3
- 229910000271 hectorite Inorganic materials 0.000 claims description 3
- KWLMIXQRALPRBC-UHFFFAOYSA-L hectorite Chemical compound [Li+].[OH-].[OH-].[Na+].[Mg+2].O1[Si]2([O-])O[Si]1([O-])O[Si]([O-])(O1)O[Si]1([O-])O2 KWLMIXQRALPRBC-UHFFFAOYSA-L 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- 229910052901 montmorillonite Inorganic materials 0.000 claims description 3
- 229910000273 nontronite Inorganic materials 0.000 claims description 3
- 239000001205 polyphosphate Substances 0.000 claims description 3
- 235000011176 polyphosphates Nutrition 0.000 claims description 3
- 235000011178 triphosphate Nutrition 0.000 claims description 3
- UNXRWKVEANCORM-UHFFFAOYSA-N triphosphoric acid Chemical compound OP(O)(=O)OP(O)(=O)OP(O)(O)=O UNXRWKVEANCORM-UHFFFAOYSA-N 0.000 claims description 3
- 239000002356 single layer Substances 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 abstract description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 abstract 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 abstract 1
- 239000011162 core material Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 15
- 239000010409 thin film Substances 0.000 description 9
- 238000003917 TEM image Methods 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 238000002347 injection Methods 0.000 description 7
- 239000007924 injection Substances 0.000 description 7
- 239000002135 nanosheet Substances 0.000 description 7
- 235000021317 phosphate Nutrition 0.000 description 7
- 239000007921 spray Substances 0.000 description 7
- 239000000843 powder Substances 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 235000019832 sodium triphosphate Nutrition 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- LWIHDJKSTIGBAC-UHFFFAOYSA-K potassium phosphate Substances [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 4
- 239000001488 sodium phosphate Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 3
- 239000001506 calcium phosphate Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 239000002105 nanoparticle Substances 0.000 description 3
- 239000011257 shell material Substances 0.000 description 3
- 150000004760 silicates Chemical class 0.000 description 3
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 3
- MOMKYJPSVWEWPM-UHFFFAOYSA-N 4-(chloromethyl)-2-(4-methylphenyl)-1,3-thiazole Chemical compound C1=CC(C)=CC=C1C1=NC(CCl)=CS1 MOMKYJPSVWEWPM-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 238000000889 atomisation Methods 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- HWGNBUXHKFFFIH-UHFFFAOYSA-I pentasodium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O HWGNBUXHKFFFIH-UHFFFAOYSA-I 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 239000011163 secondary particle Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 235000019983 sodium metaphosphate Nutrition 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- UNXRWKVEANCORM-UHFFFAOYSA-I triphosphate(5-) Chemical compound [O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O UNXRWKVEANCORM-UHFFFAOYSA-I 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000005696 Diammonium phosphate Chemical group 0.000 description 1
- 235000019739 Dicalciumphosphate Nutrition 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- DHAHRLDIUIPTCJ-UHFFFAOYSA-K aluminium metaphosphate Chemical group [Al+3].[O-]P(=O)=O.[O-]P(=O)=O.[O-]P(=O)=O DHAHRLDIUIPTCJ-UHFFFAOYSA-K 0.000 description 1
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical group [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 1
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 1
- PYCBFXMWPVRTCC-UHFFFAOYSA-N ammonium metaphosphate Chemical compound N.OP(=O)=O PYCBFXMWPVRTCC-UHFFFAOYSA-N 0.000 description 1
- 229910000148 ammonium phosphate Inorganic materials 0.000 description 1
- ZRIUUUJAJJNDSS-UHFFFAOYSA-N ammonium phosphates Chemical group [NH4+].[NH4+].[NH4+].[O-]P([O-])([O-])=O ZRIUUUJAJJNDSS-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- YYRMJZQKEFZXMX-UHFFFAOYSA-L calcium bis(dihydrogenphosphate) Chemical compound [Ca+2].OP(O)([O-])=O.OP(O)([O-])=O YYRMJZQKEFZXMX-UHFFFAOYSA-L 0.000 description 1
- JUNWLZAGQLJVLR-UHFFFAOYSA-J calcium diphosphate Chemical compound [Ca+2].[Ca+2].[O-]P([O-])(=O)OP([O-])([O-])=O JUNWLZAGQLJVLR-UHFFFAOYSA-J 0.000 description 1
- 229940043256 calcium pyrophosphate Drugs 0.000 description 1
- VEJCUEBBRSCJRP-UHFFFAOYSA-L calcium;hydron;phosphonato phosphate Chemical compound [Ca+2].OP(O)(=O)OP([O-])([O-])=O VEJCUEBBRSCJRP-UHFFFAOYSA-L 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000002734 clay mineral Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000007771 core particle Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical group [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
- 229910000388 diammonium phosphate Inorganic materials 0.000 description 1
- 235000019838 diammonium phosphate Nutrition 0.000 description 1
- 235000019821 dicalcium diphosphate Nutrition 0.000 description 1
- NEFBYIFKOOEVPA-UHFFFAOYSA-K dicalcium phosphate Chemical compound [Ca+2].[Ca+2].[O-]P([O-])([O-])=O NEFBYIFKOOEVPA-UHFFFAOYSA-K 0.000 description 1
- 229910000390 dicalcium phosphate Inorganic materials 0.000 description 1
- 229940038472 dicalcium phosphate Drugs 0.000 description 1
- MHJAJDCZWVHCPF-UHFFFAOYSA-L dimagnesium phosphate Chemical compound [Mg+2].OP([O-])([O-])=O MHJAJDCZWVHCPF-UHFFFAOYSA-L 0.000 description 1
- XZTWHWHGBBCSMX-UHFFFAOYSA-J dimagnesium;phosphonato phosphate Chemical compound [Mg+2].[Mg+2].[O-]P([O-])(=O)OP([O-])([O-])=O XZTWHWHGBBCSMX-UHFFFAOYSA-J 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 1
- 235000019797 dipotassium phosphate Nutrition 0.000 description 1
- 229910000396 dipotassium phosphate Inorganic materials 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 235000019800 disodium phosphate Nutrition 0.000 description 1
- 229910000397 disodium phosphate Inorganic materials 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 238000001027 hydrothermal synthesis Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- QQFLQYOOQVLGTQ-UHFFFAOYSA-L magnesium;dihydrogen phosphate Chemical compound [Mg+2].OP(O)([O-])=O.OP(O)([O-])=O QQFLQYOOQVLGTQ-UHFFFAOYSA-L 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- RHJYKEDKMHDZBL-UHFFFAOYSA-L metaphosphoric acid (hpo3), magnesium salt Chemical compound [Mg+2].[O-]P(=O)=O.[O-]P(=O)=O RHJYKEDKMHDZBL-UHFFFAOYSA-L 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000006012 monoammonium phosphate Chemical group 0.000 description 1
- 235000019837 monoammonium phosphate Nutrition 0.000 description 1
- 235000019691 monocalcium phosphate Nutrition 0.000 description 1
- 229910000150 monocalcium phosphate Inorganic materials 0.000 description 1
- 229910000402 monopotassium phosphate Inorganic materials 0.000 description 1
- 235000019796 monopotassium phosphate Nutrition 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019831 pentapotassium triphosphate Nutrition 0.000 description 1
- ATGAWOHQWWULNK-UHFFFAOYSA-I pentapotassium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [K+].[K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O ATGAWOHQWWULNK-UHFFFAOYSA-I 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 235000007686 potassium Nutrition 0.000 description 1
- GNSKLFRGEWLPPA-UHFFFAOYSA-M potassium dihydrogen phosphate Chemical group [K+].OP(O)([O-])=O GNSKLFRGEWLPPA-UHFFFAOYSA-M 0.000 description 1
- OQZCJRJRGMMSGK-UHFFFAOYSA-M potassium metaphosphate Chemical compound [K+].[O-]P(=O)=O OQZCJRJRGMMSGK-UHFFFAOYSA-M 0.000 description 1
- 229940099402 potassium metaphosphate Drugs 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000003380 propellant Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910021647 smectite Inorganic materials 0.000 description 1
- 235000015424 sodium Nutrition 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 235000011008 sodium phosphates Nutrition 0.000 description 1
- 229940048086 sodium pyrophosphate Drugs 0.000 description 1
- 238000010532 solid phase synthesis reaction Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- VKFFEYLSKIYTSJ-UHFFFAOYSA-N tetraazanium;phosphonato phosphate Chemical group [NH4+].[NH4+].[NH4+].[NH4+].[O-]P([O-])(=O)OP([O-])([O-])=O VKFFEYLSKIYTSJ-UHFFFAOYSA-N 0.000 description 1
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- 235000019731 tricalcium phosphate Nutrition 0.000 description 1
- 229910000391 tricalcium phosphate Inorganic materials 0.000 description 1
- 229940078499 tricalcium phosphate Drugs 0.000 description 1
- 229910000404 tripotassium phosphate Inorganic materials 0.000 description 1
- 235000019798 tripotassium phosphate Nutrition 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- NCPXQVVMIXIKTN-UHFFFAOYSA-N trisodium;phosphite Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])[O-] NCPXQVVMIXIKTN-UHFFFAOYSA-N 0.000 description 1
- AZJYLVAUMGUUBL-UHFFFAOYSA-A u1qj22mc8e Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[F-].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Na+].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].O=[Si]=O.O=[Si]=O.O=[Si]=O.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3 AZJYLVAUMGUUBL-UHFFFAOYSA-A 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Silicates, Zeolites, And Molecular Sieves (AREA)
Abstract
【課題】コアとなる物質、例えば高分子粒子などを用いることなく、簡単な製造工程のみで中空状の粒子を提供すること
【解決手段】蒸発噴霧乾燥により形成される層状珪酸塩と無機リン酸塩からなる中空状粒子であって、その直径と隔壁の厚さとの比(直径/隔壁の厚さ)が、3/1〜20/1であることを特徴とする中空状粒子である。
【選択図】図1To provide hollow particles by a simple manufacturing process without using a core material such as polymer particles, etc. SOLUTION: Layered silicate and inorganic phosphoric acid formed by evaporation spray drying Hollow particles made of salt, characterized in that the ratio of diameter to partition wall thickness (diameter / partition wall thickness) is 3/1 to 20/1.
[Selection] Figure 1
Description
本発明は、ナノシートの隔壁を有する中空状粒子およびその製造方法に関する。 The present invention relates to hollow particles having nanosheet partition walls and a method for producing the same.
無機隔壁を有する中空状粒子は複合材料、触媒、医薬品などとして幅広い応用が期待できることから、様々な手法を用いて合成が試みられている。従来はポリマー球を鋳型としてその表面をナノ粒子などでコーティングしてコア・シェル構造体を合成すること、およびコアを除去して中空シェル材料を誘導することが、報告されている(特許文献1)。また、特許文献2には、中実ナノ粒子のコア部分が空洞になった中空ナノ粒子の製造方法が提案されている。 Since hollow particles having inorganic partition walls can be expected to have a wide range of applications as composite materials, catalysts, pharmaceuticals, etc., synthesis has been attempted using various methods. Conventionally, it has been reported that a polymer sphere is used as a template to coat the surface with nanoparticles or the like to synthesize a core / shell structure, and that the core is removed to induce a hollow shell material (Patent Document 1). ). Patent Document 2 proposes a method for producing hollow nanoparticles in which the core portion of solid nanoparticles is hollow.
しかしながら、ポリマー球の鋳型を用いた合成方法においては、無機ナノシートをコーティングした後、ポリマーを除去する工程が必要であり、プロセスが煩雑になるという欠点があった。さらに、溶媒による中核粒子を除去する場合、無機ナノシートで形成された隔壁を壊さずに、これを完全に除去することは不可能であり、加熱処理による方法の場合は、無機ナノシート自体が酸化物に変質することで本来の無機ナノシートの性質が損なわれる虞があった。
本発明は、このような実情に鑑み、ナノシートのみからなる隔壁により構成された中空状粒子およびその製造方法を実現することを目的とする。
However, the synthesis method using a polymer sphere template has a drawback in that a process of removing the polymer is required after coating the inorganic nanosheet, which makes the process complicated. Furthermore, when removing the core particles by the solvent, it is impossible to completely remove the partition walls formed by the inorganic nanosheets without breaking them. In the case of the method by heat treatment, the inorganic nanosheets themselves are oxides. There is a possibility that the properties of the original inorganic nanosheet may be impaired by the alteration.
An object of this invention is to implement | achieve the hollow particle comprised by the partition which consists only of nanosheets, and its manufacturing method in view of such a situation.
[1]蒸発噴霧乾燥により形成される層状珪酸塩と無機リン酸塩からなる中空状粒子であって、その直径と隔壁の厚さとの比(直径/隔壁の厚さ)が、3/1〜20/1であることを特徴とする中空状粒子。 [1] Hollow particles made of layered silicate and inorganic phosphate formed by evaporation spray drying, wherein the ratio of diameter to partition wall thickness (diameter / partition wall thickness) is 3/1 to Hollow particles characterized by being 20/1.
[2]前記層状珪酸塩が,モンモリロナイト、バイデライト、ノントロナイト、サポナイト、ヘクトライト、スチブンサイトに代表されるスメクタイト類、Na−四珪素雲母、Na−テニオライトなどの膨潤性合成雲母(マイカ)類、2−八面体型バーミキュライト、3−八面体型バーミキュライトなどのバーミキュライト類の群から選択される一つ層状珪酸塩であることを特徴とする[1]記載の中空状粒子。 [2] Swelling synthetic mica (mica) such as montmorillonite, beidellite, nontronite, saponite, hectorite, smectites represented by stevensite, Na-tetrasilicon mica, Na-teniolite, [1] The hollow particles according to [1], which are monolayer silicates selected from the group of vermiculites such as 2-octahedral vermiculite and 3-octahedral vermiculite.
[3]前記リン酸塩が、第一リン酸イオン(H2PO4 −)、第二リン酸イオン(HPO4 2−)、第三リン酸イオン(PO4 3−)、二リン酸イオン(P2O7 4−)、三リン酸(P3O10 5−)、ポリリン酸イオン(PnO3n+1 (n+2)−)のうちの少なくとも一つとカチオンとの塩であることを特徴とする[1]または[2]に記載の中空状粒子。 [3] The phosphate is a primary phosphate ion (H 2 PO 4 − ), a secondary phosphate ion (HPO 4 2− ), a tertiary phosphate ion (PO 4 3− ), or a diphosphate ion. It is a salt of at least one of (P 2 O 7 4− ), triphosphate (P 3 O 10 5− ), polyphosphate ion (P n O 3n + 1 (n + 2) − ) and a cation. The hollow particles according to [1] or [2].
[4]層状珪酸塩の原料一次粒子径は5nm以上、1μm以下の範囲であることを特徴とする[1]から[3]の何れか一つに記載の中空状粒子。 [4] The hollow particles according to any one of [1] to [3], wherein the layered silicate raw material primary particle diameter is in the range of 5 nm or more and 1 μm or less.
[5]前記中空状粒子の平均粒子径が20nm以上、500nm以下であることを特徴とする[1]から[4]の何れか一つに記載の中空状粒子。 [5] The hollow particles according to any one of [1] to [4], wherein an average particle diameter of the hollow particles is 20 nm or more and 500 nm or less.
[6]前記(A)層状珪酸塩と前記(B)無機リン酸塩の配合比が、前記(A)層状珪酸塩100質量部に対して、前記(B)無機リン酸塩が1〜20質量部であることを特徴とする[1]〜[5]の何れか一つに記載の中空状粒子。 [6] The mixing ratio of the (A) layered silicate and the (B) inorganic phosphate is 1 to 20 (B) inorganic phosphate with respect to 100 parts by mass of the (A) layered silicate. The hollow particle according to any one of [1] to [5], wherein the hollow particle is a mass part.
[7]前記中空状粒子の製造方法であって、層状珪酸塩およびリン酸塩を分散した分散液を、その分散媒が蒸発する雰囲気中で遠心噴霧して飛散させて、前記分散媒を蒸発除去することを特徴とする中空状粒子の製造方法。 [7] A method for producing the hollow particles, wherein the dispersion liquid in which the layered silicate and the phosphate are dispersed is dispersed by centrifugal spraying in an atmosphere in which the dispersion medium evaporates to evaporate the dispersion medium. A method for producing hollow particles, comprising removing the particles.
本発明の中空状粒子は、コロイド化した層状珪酸塩分散液を噴霧乾燥することで中空状粒子を形成させるものであり、コアとなる物質、例えば高分子粒子などを用いないため、乾燥工程のみで中空状の粒子を提供することが可能である。また本発明の中空状粒子の製造方法は溶媒洗浄工程や加熱燃焼工程が不要なため、低環境負荷プロセスとして期待できる。 The hollow particles of the present invention are those in which hollow particles are formed by spray-drying a colloidal layered silicate dispersion, and since no core substance, such as polymer particles, is used, only the drying process is performed. It is possible to provide hollow particles. Moreover, since the manufacturing method of the hollow particle of this invention does not require a solvent washing | cleaning process and a heating combustion process, it can anticipate as a low environmental impact process.
本発明は、コロイド化した層状珪酸塩分散液を噴霧乾燥することで中空状粒子を得るものであるが、その分散液が分散している無機リン酸塩と膨潤性層状珪酸塩との複合体を含んでいる点に本発明の第一の特徴がある。さらにコロイド化した層状珪酸塩分散液を遠心噴霧乾燥させる点に第二の特徴がある。そのそれらの分散液の原料となる、膨潤性(膨潤性とは、水中で結晶層間に水が侵入して膨潤する意味)層状珪酸塩、リン酸塩、溶媒、及び遠心噴霧乾燥の詳細は下記に示される。 The present invention is to obtain hollow particles by spray-drying a colloidal layered silicate dispersion, and a composite of an inorganic phosphate and a swellable layered silicate in which the dispersion is dispersed The first feature of the present invention is that Furthermore, the second feature is that the colloidal layered silicate dispersion is subjected to centrifugal spray drying. Swellability (swellability means that water penetrates between crystal layers in water and swells in water). Details of layered silicates, phosphates, solvents, and centrifugal spray drying are as follows. Shown in
本発明にかかる層状珪酸塩としては溶媒に膨潤するものであれば特に制限されないが、具体的には、モンモリロナイト、バイデライト、ノントロナイト、サポナイト、ヘクトライト、スチブンサイトに代表されるスメクタイト、Na−四珪素雲母、Na−テニオライトなどの膨潤性合成雲母(マイカ)類、2−八面体型バーミキュライト、3−八面体型バーミキュライトなどのバーミキュライト類が好適である。これらの層状珪酸塩は、天然鉱物であってもよく、水熱合成、溶融法、固相法等による合成物であってもよい。また、本発明では、上記の層状粘土鉱物のうちの1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。 The layered silicate according to the present invention is not particularly limited as long as it swells in a solvent. Specifically, smectite represented by montmorillonite, beidellite, nontronite, saponite, hectorite, stevensite, Na-4 Swelling synthetic mica (mica) such as silicon mica and Na-teniolite, vermiculite such as 2-octahedral vermiculite and 3-octahedral vermiculite are suitable. These layered silicates may be natural minerals or may be synthesized by hydrothermal synthesis, melting method, solid phase method or the like. Moreover, in this invention, 1 type in said layered clay mineral may be used independently, and may be used in combination of 2 or more type.
前記リン酸塩が、第一リン酸イオン(H2PO4 −)、第二リン酸イオン(HPO4 2−)、第三リン酸イオン(PO4 3−)、二リン酸イオン(P2O7 4−)、三リン酸(P3O10 5−)、ポリリン酸イオン(PnO3n+1 (n+2)−)のうちの少なくとも一つとカチオンとの塩をゲスト化合物とする包接水和物から選択される少なくとも1種であることを特徴とする。具体的には特に限定されるものではないが無機リン酸塩が、リン酸一カリウム、リン酸二カリウム、リン酸三カリウム、ピロリン酸カリウム、三リン酸五カリウム、トリポリリン酸カリウム、メタリン酸カリウム、リン酸一カルシウム、リン酸二カルシウム、リン酸三カルシウム、酸性ピロリン酸カルシウム、ピロリン酸カルシウム、リン酸一ナトリウム、リン酸二ナトリウム、リン酸三ナトリウム、ピロリン酸ナトリウム、三リン酸五ナトリウム、酸性ピロリン酸ナトリウム、トリポリリン酸ナトリウム、テトラポリリン酸ナトリウム、ペンタポリリン酸ナトリウム、メタリン酸ナトリウム、酸性メタリン酸ナトリウム、亜リン酸ナトリウム、次亜リン酸ナトリウム、第一リン酸マグネシウム、第二リン酸マグネシウム、第三リン酸マグネシウム、ピロリン酸マグネシウム、メタリン酸マグネシウム、第一リン酸アルミニウム、第二リン酸アルミニウム、第三リン酸アルミニウム、メタリン酸アルミニウム、リン酸一アンモニウム、リン酸二アンモニウム、リン酸三アンモニウム、ピロリン酸アンモニウム、トリポリリン酸アンモニウム、メタリン酸アンモニウム、及び重過石からなる群から選択される1種又は2種以上であることを特徴とする。 The phosphate is composed of a first phosphate ion (H 2 PO 4 − ), a second phosphate ion (HPO 4 2− ), a third phosphate ion (PO 4 3− ), a diphosphate ion (P 2). Inclusion hydration using a salt of at least one of O 7 4− ), triphosphate (P 3 O 10 5− ), and polyphosphate ion (P n O 3n + 1 (n + 2) − ) and a cation as a guest compound It is characterized by being at least 1 type selected from the thing. Although it is not specifically limited, inorganic phosphate is monopotassium phosphate, dipotassium phosphate, tripotassium phosphate, potassium pyrophosphate, pentapotassium triphosphate, potassium tripolyphosphate, potassium metaphosphate. , Monocalcium phosphate, dicalcium phosphate, tricalcium phosphate, calcium acid pyrophosphate, calcium pyrophosphate, monosodium phosphate, disodium phosphate, trisodium phosphate, sodium pyrophosphate, pentasodium triphosphate, acidic pyrolin Sodium phosphate, sodium tripolyphosphate, sodium tetrapolyphosphate, sodium pentapolyphosphate, sodium metaphosphate, acidic sodium metaphosphate, sodium phosphite, sodium hypophosphite, primary magnesium phosphate, secondary magnesium phosphate, Magnetriphosphate , Magnesium pyrophosphate, magnesium metaphosphate, primary aluminum phosphate, secondary aluminum phosphate, tertiary aluminum phosphate, aluminum metaphosphate, monoammonium phosphate, diammonium phosphate, triammonium phosphate, ammonium pyrophosphate , One or more selected from the group consisting of ammonium tripolyphosphate, ammonium metaphosphate, and bitumenite.
直径と隔壁の厚さとの比(直径/隔壁の厚さ)が,3/1以上、20/1以下であることを特徴とする中空状粒子であり、さらに好ましくは5/1以上、10/1以下である。この範囲の中空粒子がより安定して製造することができる。 Hollow particles characterized in that the ratio of diameter to partition wall thickness (diameter / wall thickness) is 3/1 or more and 20/1 or less, more preferably 5/1 or more, 10 / 1 or less. Hollow particles in this range can be produced more stably.
中空状粒子製造の原料として用いる層状珪酸塩の一次粒子径及び中空状粒子の平均粒子径は、レーザー回折式の粒度測定装置や、電子顕微鏡などによる画像を直接目視により観察して統計処理することによって求めることができる。レーザー回折式粒度計による測定では、入射レーザー光の凝集粒子による回折挙動と、孤立した一次粒子による回折挙動とでは大きな差異を生じないため、測定された粒径が、一次粒子単体で存在するものの粒径なのか、あるいはこれが凝集した二次粒子の粒径なのかが互いに区別されない。したがって、該方法で測定した平均粒径は、凝集を起こしていない孤立した一次粒子も広義に含めた二次粒子の平均粒径を反映した平均値になるので電子顕微鏡などによる画像を直接目視により観測して統計処理によって求める方法と併用することが好ましい。 The primary particle size and the average particle size of the layered silicate used as a raw material for the production of hollow particles should be statistically processed by directly observing images with a laser diffraction particle size measuring device or an electron microscope. Can be obtained. In the measurement with the laser diffraction particle size meter, there is no significant difference between the diffraction behavior of the incident laser beam due to the aggregated particles and the diffraction behavior of the isolated primary particles, so the measured particle size exists as a single primary particle. There is no distinction between the particle size or the size of the aggregated secondary particles. Therefore, the average particle size measured by this method is an average value reflecting the average particle size of the secondary particles including the isolated primary particles that have not been agglomerated in a broad sense. It is preferable to use together with the method of observing and obtaining by statistical processing.
原料一次粒子径は、5nm以上1μm以下の範囲が好ましく、さらに好適なのは10nm以上、100nm以下の範囲である。5nm未満では蒸発噴霧工程で粒子がシェルを形成しにくくなるため中空状の形態をとることが困難となり、1μmより大きいと蒸発工程で球形を形成しにくく、乾燥後に異方性粒子が形成される虞がある。 The raw material primary particle size is preferably in the range of 5 nm to 1 μm, and more preferably in the range of 10 nm to 100 nm. If it is less than 5 nm, it becomes difficult to form a hollow shape because the particles are difficult to form a shell in the evaporation spraying process, and if it is more than 1 μm, it is difficult to form a spherical shape in the evaporation process, and anisotropic particles are formed after drying. There is a fear.
中空状粒子の粒子サイズは、層状珪酸塩分散液の濃度、乾燥温度、製造装置によって制御可能であるが20nm以上500nm以下の範囲で形成される。また、その粒子径は、隔壁厚さの10〜100倍、好ましくは10〜50倍程度とするのが望ましい。隔壁厚さに比べ粒子径が過剰に大きいと、比表面積が減少するため機能特性が低減される。また、隔壁厚さに比べ粒子径が過剰に小さいと、中実状の粒子と変わらなくなる。 The particle size of the hollow particles can be controlled by the concentration of the layered silicate dispersion, the drying temperature, and the production apparatus, but is formed in the range of 20 nm to 500 nm. The particle diameter is 10 to 100 times, preferably about 10 to 50 times the partition wall thickness. When the particle diameter is excessively larger than the partition wall thickness, the specific surface area is reduced, so that the functional characteristics are reduced. In addition, when the particle diameter is excessively small compared to the partition wall thickness, it does not change from solid particles.
(A)層状珪酸塩と(B)無機リン酸塩の配合比は、(A)層状珪酸塩100質量部に対して、(B)無機リン酸塩が1〜20質量部であることが好ましく、さらに好適なのは(A)層状珪酸塩100質量部に対して、(B)無機リン酸塩が3〜10質量部の範囲である。100質量部の層状珪酸塩に対して無機リン酸塩が1質量部未満、及び20質量部超になると分散液中の層状珪酸塩粒子間の架橋構造が不安定となり、中実粒子が形成される虞がある。 The blending ratio of (A) layered silicate and (B) inorganic phosphate is preferably 1 to 20 parts by mass of (B) inorganic phosphate with respect to 100 parts by mass of (A) layered silicate. More preferably, (A) inorganic phosphate is in the range of 3 to 10 parts by mass with respect to 100 parts by mass of (A) layered silicate. When the inorganic phosphate is less than 1 part by mass and over 20 parts by mass with respect to 100 parts by mass of the layered silicate, the crosslinked structure between the layered silicate particles in the dispersion becomes unstable and solid particles are formed. There is a risk.
層状珪酸塩およびリン酸塩の分散に用いられる溶媒は、水がベースになるが、これにアルコール(メタノール、エタノール、プロパノール等の低級アルコール等)及び/又は多価アルコールが混合されていてもよい。 The solvent used for dispersion of the layered silicate and phosphate is based on water, but alcohol (lower alcohol such as methanol, ethanol, propanol, etc.) and / or polyhydric alcohol may be mixed therewith. .
本発明の製法に用いる遠心噴霧装置の基本構成について説明する(図1)。本装置は、噴霧処理を内部で行う円筒形のチャンバー(10)と、その内部に配置した、原料を遠心噴霧する遠心ディスク構造(30)と、前記遠心ディスク構造(30)に原料を供給する原料供給機構(20)により構成されている。 The basic configuration of the centrifugal spray device used in the production method of the present invention will be described (FIG. 1). This apparatus has a cylindrical chamber (10) in which the spraying process is performed, a centrifugal disk structure (30) disposed therein for centrifugally spraying the raw material, and the raw material is supplied to the centrifugal disk structure (30). It is comprised by the raw material supply mechanism (20).
前記原料供給機構(20)は、前記チャンバー(10)上方に配置されていて、下端に、前記受け面(34)の回転中心に向かって原料を流下させる流下口(23)を有する原料タンク(21)と、前記流下口(23)から流下した原料を受け面(34)に向かって噴射するガス噴霧ノズル(22)とから構成されている。 The raw material supply mechanism (20) is arranged above the chamber (10), and has a raw material tank (23) having a flow-down port (23) at the lower end for flowing the raw material toward the rotation center of the receiving surface (34). 21) and a gas spray nozzle (22) for injecting the raw material flowing down from the flow down port (23) toward the receiving surface (34).
このようにして、原料タンク(21)の流下口(23)から流下した液状の原料を、ガス噴霧ノズル(22)から噴出するガスにより数ミクロン〜10ミクロンの大きさに液滴化して、高速回転する前記受け面(34)に吹き付ける。当該受け面(34)に吹き付けられた原料は、薄い膜(50)となり、回転による遠心力で、図中(35)で示すように、その外周縁からチャンバー(10)に微細液滴として飛散される。チャンバー(10)に微細液滴とし飛散された原料は、チャンバー(10)の底部に落下する途中で、前記ヒータ(41)、(42)、(43)により制御された温度に温められ、その温度により、液分が蒸発除去されることとなる。このようして得られた粒子は、前記ガス噴霧ノズル(22)から噴射されたガスとともに、出口(44)を通ってチャンバー(10)の外部に取り出され回収される。 In this way, the liquid raw material flowing down from the flow outlet (23) of the raw material tank (21) is made into droplets of several microns to 10 microns by the gas ejected from the gas spray nozzle (22), and high speed Spray onto the rotating receiving surface (34). The raw material sprayed on the receiving surface (34) becomes a thin film (50), and is scattered as fine droplets from the outer periphery to the chamber (10) by centrifugal force due to rotation, as indicated by (35) in the figure. Is done. The raw material scattered as fine droplets in the chamber (10) is heated to a temperature controlled by the heaters (41), (42), and (43) in the middle of falling to the bottom of the chamber (10). Depending on the temperature, the liquid component is removed by evaporation. The particles thus obtained together with the gas injected from the gas spray nozzle (22) are taken out through the outlet (44) to the outside of the chamber (10) and collected.
前記薄膜(50)の厚さは、原料の供給量速度と、ガスの噴射速度と、ディスク(33)の回転速度により決定される。回転速度が速くなればなるほど、薄膜(50)の厚さが薄くなり、できる霧化粒子の大きさも小さくなる。ガスの噴射速度が速くなると、受け面(34)に吹き付つけられる液滴の大きさは小さくなる。そして、受け面(34)の回転速度が一定な場合は、過剰な高速で噴射すると受け面(34)から反射し、薄膜(50)を形成できなくなるので、受け面(34)の回転速度とガスの噴射速度とは、一定の関係を維持する必要がある。 The thickness of the thin film (50) is determined by the feed rate of raw materials, the gas injection speed, and the rotational speed of the disk (33). The faster the rotational speed, the thinner the thin film (50) and the smaller the size of the resulting atomized particles. As the gas injection speed increases, the size of the droplets sprayed on the receiving surface (34) decreases. If the rotational speed of the receiving surface (34) is constant, if it is ejected at an excessively high speed, it will be reflected from the receiving surface (34) and a thin film (50) cannot be formed. It is necessary to maintain a certain relationship with the gas injection speed.
また、原料の供給量速度が大きくなるほど、液滴が大きくなり、かつ、薄膜(50)も厚くなる。このため、この三者を、強調して調整することで、薄膜(50)の厚さと霧化粒子の大きさを調整することが可能になる。また、原料がどのように変性するかについては、受け面(34)及びその上方の領域(A1)での温度(T1)と、受け面(34)の外周縁より外側の領域(A2)での雰囲気温度(T2)と、原料中の揮発性成分の揮発温度(Tb)との関係により決定される。また、温度(T1)は、原料の流動性に影響を及ぼす可能性があるので、薄膜(50)の形成が可能な流動性を維持する温度(Ta)を超える必要がある。
さらに、温度(T2)は、ナノシートが変性し、隔壁が壊れることがないように、そのような変性温度(T0)未満である必要がある。本発明のような中空状粒子を製造する場合は、霧化するまでは、液状を維持し、霧化後に揮発性成分を蒸発させて固形化する必要があるので、前記三つの温度の関係は次の式1を満たす必要がある。
Further, as the feed rate of the raw material increases, the droplets become larger and the thin film (50) becomes thicker. For this reason, it is possible to adjust the thickness of the thin film (50) and the size of the atomized particles by adjusting these three elements with emphasis. Further, as to how the raw material is denatured, the temperature (T 1 ) at the receiving surface (34) and the region (A 1 ) above the receiving surface (34), and the region (A and ambient temperature (T 2) at 2), is determined by the relationship between the volatilization temperature of the volatile components in the raw material (T b). Further, the temperature (T 1), so can affect the fluidity of the raw material, it is necessary to exceed the temperature (Ta) to maintain fluidity capable of forming the thin film (50).
Furthermore, the temperature (T 2 ) needs to be lower than such a modification temperature (T 0 ) so that the nanosheet is not modified and the partition walls are not broken. When producing hollow particles as in the present invention, it is necessary to maintain a liquid state until atomization, and to evaporate volatile components after atomization to solidify, so the relationship between the three temperatures is The following formula 1 needs to be satisfied.
そして、このような温度条件となるように、原料及び噴射ガスの温度、及び前記ヒータ(41)、(42)、(43)による加熱条件を設定することとなる。霧化された粒子は、噴射ガスと共にチャンバー(10)を下方に向かって流れる。よって、領域(A1)を加熱範囲とする上部ヒータ(41)は、その温度(T1)が、原料の温度や噴射ガスの温度によっても前記式1を満たすように調整することとなる。また、領域(A2)を加熱範囲とする中部ヒータ(42)と下部ヒータ(43)とは、前記ガスの流れとともに移動して、領域(A2)内を移動する間に、その分散媒が蒸発除去されるように、温度(T2)となるように調整することとなる。 And the temperature of a raw material and injection gas, and the heating conditions by said heater (41), (42), (43) will be set so that it may become such temperature conditions. The atomized particles flow downward in the chamber (10) together with the propellant gas. Therefore, the upper heater (41) having the region (A 1 ) as the heating range is adjusted so that the temperature (T 1 ) satisfies the above-described formula 1 also depending on the temperature of the raw material and the temperature of the injection gas. Further, the middle heater (42) and the lower heater (43) having the region (A 2 ) as a heating range move along with the gas flow, and the dispersion medium is moved while moving in the region (A 2 ). Will be adjusted to the temperature (T 2 ) so that is removed by evaporation.
以上のような温度T1とT2、そして回転盤ディスクの回転速度は、溶媒、固形成分の種類と原材料としての溶液の濃度や粘度、受珪面の面積、薄膜の厚みと所望の固形粒子の粒径等を考慮して定める。また、回転盤ディスクの回転数としては、特に定めるところではないが、一般的には、10000rpm〜60000rpmの範囲内で運転する。 The temperatures T 1 and T 2 as described above, and the rotational speed of the rotating disk disc are the solvent, the type of solid components and the concentration and viscosity of the solution as the raw material, the area of the silica-receiving surface, the thickness of the thin film and the desired solid particles. It is determined in consideration of the particle size of the material. In addition, the rotational speed of the rotating disk is not particularly defined, but generally, it operates within a range of 10,000 rpm to 60000 rpm.
本発明を以下実施例によりさらに詳細に説明するが、これらの実施例に限定されるものではない。 The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these examples.
[評価項目]
・外観、及び粒子径測定
透過型電子顕微鏡(日本電子株式会社製)JEM−2000FXを用いて加速電圧160kVで観察を行い、隔壁厚さ及び平均粒子径を個数分布より測定した。
[Evaluation item]
-Appearance and particle size measurement Observation was performed at an acceleration voltage of 160 kV using a transmission electron microscope (manufactured by JEOL Ltd.) JEM-2000FX, and the partition wall thickness and average particle size were measured from the number distribution.
[実施例1]
500mL中の蒸留水に層状珪酸塩として合成サポナイト(クニミネ工業株式会社製)スメクトン(5g)を投入して、撹拌して懸濁液を調製した。さらに,リン酸塩として二リン酸ナトリウム(和光純薬工業株式会社製)を0.3g投入し、24時間、室温で撹拌し、均一な分散液を調製した。
この分散液を図1の遠心噴霧乾燥装置を用い、以下の製造条件にて試料を作製した。得られた試料の観察像を図2、評価した結果を表1に示す。図2は、表1の実施例1における中空状粒子を示す透過型電子顕微鏡写真である。
[Example 1]
Synthetic saponite (Kunimine Kogyo Co., Ltd.) smecton (5 g) was added as a layered silicate to distilled water in 500 mL and stirred to prepare a suspension. Further, 0.3 g of sodium diphosphate (manufactured by Wako Pure Chemical Industries, Ltd.) was added as a phosphate and stirred at room temperature for 24 hours to prepare a uniform dispersion.
A sample was prepared from the dispersion using the centrifugal spray dryer of FIG. 1 under the following production conditions. FIG. 2 shows an observation image of the obtained sample, and Table 1 shows the evaluation result. FIG. 2 is a transmission electron micrograph showing hollow particles in Example 1 of Table 1.
[製造条件]
噴射口細孔径:直径1.5mm
原料供給速度:1.5ml/s〜1.8ml/sの間で調整
ガス噴霧圧力:2MPa
噴射ガス:窒素ガス
使用した回転ディスク:材質:軟鋼(Fe)
回転盤直径:70mm
回転数: 30000rpm
チャンバー内雰囲気:大気圧
[Production conditions]
Injection hole pore diameter: 1.5mm diameter
Raw material supply rate: adjusted between 1.5 ml / s and 1.8 ml / s Gas spraying pressure: 2 MPa
Injection gas: Nitrogen gas Rotating disk used: Material: Mild steel (Fe)
Turntable diameter: 70mm
Rotation speed: 30000rpm
Chamber atmosphere: atmospheric pressure
[実施例2]
実施例1のリン酸塩に三リン酸五ナトリウムを使用した以外は全て実施例1と同様にして評価した。得られた粉末試料の評価の結果を表1に示す。図3は、表1の実施例2における中空状粒子を示す透過型電子顕微鏡写真である。また、実施例2で形成された粉末は、隔壁の厚さが2〜4層で、平均粒子径40nmの中空粒子が得られた。
[Example 2]
Evaluation was conducted in the same manner as in Example 1 except that pentasodium triphosphate was used as the phosphate salt of Example 1. The evaluation results of the obtained powder sample are shown in Table 1. FIG. 3 is a transmission electron micrograph showing hollow particles in Example 2 of Table 1. The powder formed in Example 2 was a hollow particle having a partition wall thickness of 2 to 4 layers and an average particle diameter of 40 nm.
[実施例3]
層状珪酸塩に二リン酸ナトリウムを4.5質量%含有する合成ヘクトライト(ラポルテ社製のラポナイトRDS)を使用した以外は全て実施例1と同様にして評価した。図4は、表1の実施例3における中空状粒子を示す透過型電子顕微鏡写真である。得られた粉末試料の評価の結果を表1に示す。また、実施例3で形成された粉末は、隔壁の厚さが3〜9層で、平均粒子径40nmの中空粒子が得られた。
[Example 3]
Evaluation was conducted in the same manner as in Example 1 except that synthetic hectorite (Laponte RDS manufactured by Laporte) containing 4.5% by mass of sodium diphosphate was used for the layered silicate. FIG. 4 is a transmission electron micrograph showing hollow particles in Example 3 of Table 1. The evaluation results of the obtained powder sample are shown in Table 1. Moreover, the powder formed in Example 3 was a hollow particle having a partition wall thickness of 3 to 9 layers and an average particle diameter of 40 nm.
[比較例1]
分散液にリン酸塩を添加しなかった以外は全て実施例1と同様にして評価した。比較例1で得られた粉末試料の透過型電子顕微鏡写真を図5に示す。評価の結果を表1に示す。全て中実粒子が得られた。
[Comparative Example 1]
Evaluation was performed in the same manner as in Example 1 except that no phosphate was added to the dispersion. A transmission electron micrograph of the powder sample obtained in Comparative Example 1 is shown in FIG. The evaluation results are shown in Table 1. All solid particles were obtained.
本発明の中空粒子は、複合材料、触媒、医薬等、各種分野において応用が期待され、各種分野の材料設計において、その技術進歩に役立つものと期待される。 The hollow particles of the present invention are expected to be applied in various fields such as composite materials, catalysts, and pharmaceuticals, and are expected to be useful for technological advancement in material design in various fields.
10 チャンバー
20 原料供給機構
21 原料タンク
22 ガス噴霧ノズル
23 流下口
30 遠心ディスク構造
31 カバー
32 回転モ−タ
33 ディスク
34 受け面
35 霧化粒子
41 上部ヒータ
42 中部ヒータ
43 下部ヒータ
44 出口
50 薄膜
A1 上方領域
A2 外側領域
Tb 揮発温度
T1 上方領域の雰囲気温度
T2 外側領域の雰囲気温度
10 Chamber 20 Raw Material Supply Mechanism 21 Raw Material Tank 22 Gas Spray Nozzle 23 Downstream Port 30 Centrifugal Disc Structure 31 Cover 32 Rotating Motor 33 Disc 34 Receiving Surface 35 Atomized Particle 41 Upper Heater 42 Middle Heater 43 Lower Heater 44 Outlet 50 Thin Film A 1 Upper region A 2 Outer region T b Volatilization temperature T 1 Upper region ambient temperature T 2 Outer region ambient temperature
Claims (7)
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