JP2015010002A - Manufacturing method of glass sheet and manufacturing apparatus of glass sheet - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of a glass sheet and a manufacturing apparatus of a glass sheet each capable of inhibiting glass sheet edge plane polishing costs.SOLUTION: The provided manufacturing method of a glass sheet includes a polishing step of polishing the edge plane 3a of a glass sheet 3. At this polishing step, a polishing wheel 21 provided by molding a slurry 21d including loose abrasive grains into a rotor is rotated around the rotation axis 21h of the rotor. At the polishing step, the edge plane 3a is polished by relatively mobilizing the rotated polishing wheel 21 and glass sheet 3 along the longitudinal direction of the edge plane 3a while the profile circumferential plane of the rotor is being contacted with the edge plane 3a of the glass sheet 3. At the polishing step, the longitudinal direction of the rotation axis 21h is slanted in relation to a first direction orthogonal to the main surface of the glass sheet 3. The number of loose abrasive grains contacted with the edge plane 3a at the polishing step is larger than that of a case where the rotation axis 21h is parallel to the first direction.

Description

  The present invention relates to a glass plate manufacturing method and a glass plate manufacturing apparatus.

  The manufacturing process of the glass plate used for flat panel displays (FPD), such as a liquid crystal display and a plasma display, includes the cutting process which cut | disconnects the glass shape | molded in plate shape to a predetermined size. In the cutting step, usually, a marking line is formed on a large glass plate called mother glass, and the glass plate is cut. A fine crack and a very sharp edge are usually formed on the cut surface of the glass plate. The cut surface is chamfered, for example, in an R shape, and is further polished into a mirror surface by polishing with a polishing wheel.

  Patent Document 1 (International Publication No. 2012/0667587) discloses a method of polishing an end face of a glass plate using a magnetic fluid. In the polishing process of the end face of the glass plate using magnetic fluid, magnetic slurry, which is a slurry-like magnetic fluid containing magnetic powder and non-magnetic free abrasive grains, is held in a space between a pair of magnets. And a glass plate end surface is grind | polished by moving a glass plate end surface and a magnetic body slurry relatively in the state which made the glass plate end surface contact the magnetic body slurry. In the end surface polishing using the magnetic slurry, the free abrasive grains can move following the shape of the workpiece, so that the damage caused by the free abrasive grains on the workpiece is small. Therefore, the quality of the glass plate polished using the magnetic slurry containing free abrasive grains is higher than the quality of the glass plate polished using a conventional polishing wheel containing fixed abrasive grains.

  As described above, in the polishing method of the glass plate end surface using the magnetic material slurry containing the loose abrasive grains, the magnetic material slurry held in the space between the pair of magnets is rotated on the glass plate end surface while rotating around the rotation axis. Make contact. Therefore, when using a magnetic slurry with low fluidity, if the polishing of the glass plate end face is performed for a long time without replacing or stirring the magnetic slurry, a part of the surface of the magnetic slurry in contact with the glass plate end face is used. Only the loose abrasive grains in contact with the glass plate end face and a part of the loose abrasive grains may not come into contact with the glass plate end face at all. In this case, the polishing ability of the loose abrasive grains that come into contact with the end face of the glass plate gradually decreases due to wear. Therefore, it is necessary to stir the magnetic slurry or periodically replace the magnetic slurry. However, in the polishing process of the end face of a large glass plate, the polishing ability of the loose abrasive grains can be reduced even during the processing of one end face, so the surface roughness of the polished end face is not constant, The quality of the product may not be stable. In addition, even when the polishing ability of only some of the free abrasive grains contained in the magnetic slurry is reduced, it is necessary to replace the magnetic slurry or to stop the operation and to stir the magnetic slurry. As a result, there is a risk of extra costs.

  The objective of this invention is providing the manufacturing method of the glass plate which can suppress the cost of the end surface grinding | polishing of a glass plate, and the manufacturing apparatus of a glass plate.

  The manufacturing method of the glass plate which concerns on this invention has a grinding | polishing process which grind | polishes the end surface of a glass plate. In the polishing step, a polishing wheel in which a slurry containing loose abrasive grains is formed on a rotating body is rotated about the rotation axis of the rotating body. In the polishing step, the end surface is polished by relatively moving the rotating polishing wheel and the glass plate along the longitudinal direction of the end surface while bringing the side peripheral surface of the rotating body into contact with the end surface of the glass plate. In the polishing step, the rotation axis is inclined in the longitudinal direction with respect to the first direction orthogonal to the main surface of the glass plate. Thereby, a grinding | polishing process increases the number of loose abrasive grains which contact an end surface compared with the case where a rotating shaft is parallel to a 1st direction.

  This glass plate manufacturing method includes a method of processing an end face of a glass plate which is formed by a downdraw method or the like and cut into a product size. On the end surface of the glass plate, which is the cut surface of the cut glass plate, minute irregularities and cracks that can cause cracking and chipping of the glass plate are easily formed. By performing a grinding process of chamfering the glass plate by grinding the end surface of the glass plate, generation of minute irregularities and cracks is suppressed. Further, by performing a polishing step of polishing the end face of the glass plate chamfered in the grinding step, the surface roughness of the end face of the glass plate is reduced, and a glass plate having a smoother end face is obtained.

  In the polishing step, for example, with the rotating polishing wheel pressed against the glass plate end surface, the polishing wheel is moved along the glass plate end surface to polish the glass plate end surface. The polishing wheel is obtained by molding a slurry containing loose abrasive grains into a cylindrical rotating body. In the polishing step, the abrasive wheel is rotated about the rotation axis of the rotating body, and the side peripheral surface of the rotating body is brought into contact with the end surface of the glass plate, so that the free abrasive grains present on the side peripheral surface of the rotating body are In contact, the end face of the glass plate is polished.

  In the polishing step, the number of free abrasive grains that are present on the side peripheral surface of the rotating body and that can come into contact with the glass plate end face is increased by inclining a polishing wheel containing free abrasive grains along the glass plate end face. To increase. Thereby, the work amount per loose abrasive grain, specifically, the polishing amount of the glass plate per loose abrasive grain is reduced, and the life of the loose abrasive grain is extended. Moreover, since the number of loose abrasive grains capable of polishing the glass plate end surface is increased, the overall polishing ability of the polishing wheel is improved, and the surface roughness of the polished glass plate end surface is further reduced. Moreover, by adjusting the inclination angle of the polishing wheel, the number of loose abrasive grains capable of polishing the glass plate end surface can be controlled, and the surface roughness of the polished glass plate end surface can be adjusted. Therefore, in this method for producing a glass plate, when the end surface of the glass plate is polished with free abrasive grains, the life of the free abrasive grains can be extended and the cost of polishing the end face of the glass plate can be suppressed. Moreover, since this glass plate manufacturing method can adjust the grinding | polishing capability of a grinding | polishing wheel only by inclining a grinding | polishing wheel, the apparatus for grind | polishing a glass plate end surface can be made compact.

  Moreover, in this glass plate manufacturing method, the polishing wheel is preferably formed by holding slurry containing magnetic powder that is free abrasive grains in a magnetic field forming space between a pair of magnetic field forming members. In the polishing step, it is preferable to polish the end surfaces by rotating the pair of magnetic field forming members around the rotation axis and bringing the slurry held in the magnetic field forming space into contact with the end surfaces of the glass plate. In the polishing process of the glass plate end face using a polishing wheel formed from a slurry containing magnetic powder, the magnetic powder that is free abrasive grains may move following the shape of the glass plate end face that is the workpiece. it can. Therefore, since the damage which a grinding | polishing wheel gives to a glass plate is suppressed, the fall of the quality of the glass plate by grinding | polishing of a glass plate end surface can be suppressed.

  In this method for producing a glass plate, the slurry preferably contains magnetic powder and water, and the concentration of the magnetic powder is at least 70 wt%.

  Moreover, in this glass plate manufacturing method, the polishing step preferably includes a first polishing step and a second polishing step. In the first polishing step, the end surface of the glass plate is polished using the first polishing wheel. In the second polishing step, the end surface polished in the first polishing step is polished using the second polishing wheel. In the first polishing step, the rotation axis of the first polishing wheel is inclined in the longitudinal direction. In the second polishing step, the rotation axis of the second polishing wheel is inclined in the direction opposite to the longitudinal direction. The inclination angle of the rotation axis of the first grinding wheel is preferably equal to the inclination angle of the rotation axis of the second grinding wheel. The whole glass plate end surface can be uniformly polished by polishing the glass plate end surface using two polishing wheels whose inclination directions are opposite to each other along the glass plate end surface.

  The manufacturing method of the glass plate which concerns on this invention has a grinding | polishing process which grind | polishes the end surface of a glass plate. In the polishing step, a polishing wheel in which a slurry containing loose abrasive grains is formed on a rotating body is rotated about the rotation axis of the rotating body. In the polishing step, the end surface is polished by relatively moving the rotating polishing wheel and the glass plate along the longitudinal direction of the end surface while bringing the side peripheral surface of the rotating body into contact with the end surface of the glass plate. In the polishing step, the rotation axis is inclined in the width direction with respect to a first direction orthogonal to the main surface of the glass plate. The width direction is a direction orthogonal to the first direction and the longitudinal direction. By inclining the polishing wheel in the width direction, the end of the glass plate enters deeper into the slurry of the polishing wheel. Therefore, the pressure that the end surface of the glass plate receives from the polishing wheel increases, and the end surface of the glass plate is easily polished.

  Moreover, in this glass plate manufacturing method, it is preferable that the polishing step further increases the number of free abrasive grains in contact with the end face by further tilting the rotation axis in the longitudinal direction with respect to the first direction.

  The glass plate manufacturing apparatus according to the present invention includes a polishing unit that polishes the end surface of the glass plate. The polishing unit includes a polishing wheel, a rotation mechanism, and a tilt mechanism. The polishing wheel is a member obtained by forming a slurry containing loose abrasive grains into a rotating body. The rotation mechanism rotates the polishing wheel around the rotation axis of the rotating body. An inclination mechanism inclines a rotating shaft with respect to the 1st direction orthogonal to the main surface of a glass plate. The polishing unit moves the polishing wheel and the glass plate relative to each other along the longitudinal direction of the end surface while bringing the side peripheral surface of the polishing wheel rotated by the rotation mechanism into contact with the end surface of the glass plate. To polish.

  The glass plate manufacturing method and the glass plate manufacturing apparatus according to the present invention can reduce the cost of polishing the end face of the glass plate.

It is a schematic diagram of a polish device concerning this embodiment. It is an external view of a grinding wheel. It is sectional drawing of a grinding | polishing wheel. It is a side view of the inclined grinding wheel. It is a figure which shows the area | region where the magnetic powder which is contained in the magnetic body grinding | polishing slurry of the inclined grinding | polishing wheel and has the effect | action which grind | polishes the end surface of a glass plate exists. It is a comparative example and is a figure which shows the area | region where the magnetic powder which has the effect | action which grind | polishes the end surface of a glass plate contained in the magnetic body polishing slurry of the grinding wheel which is not inclined exists. It is a comparative example, Comprising: It is sectional drawing which shows the force which the grinding wheel which is not inclined gives to the end surface of a glass plate. It is the schematic of the grinding | polishing apparatus based on the modification A. It is a side view of the inclined grinding wheel concerning modification A. 10 is a cross-sectional view of an inclined grinding wheel according to Modification C. FIG. 10 is a cross-sectional view of an inclined grinding wheel according to Modification C. FIG. 12 is a side view of an inclined grinding wheel according to Modification C. FIG. 10 is a plan view of a polishing mechanism according to Modification D. FIG. 10 is a side view of a polishing mechanism according to Modification D. FIG. 10 is a plan view of a polishing mechanism having an inclined polishing wheel according to Modification D. FIG. 10 is a side view of a polishing mechanism having an inclined polishing wheel according to Modification D. FIG.

(1) Configuration of Polishing Apparatus An embodiment of a glass plate manufacturing method and a glass plate manufacturing apparatus according to the present invention will be described with reference to the drawings. The glass plate manufacturing method and the glass plate manufacturing apparatus according to the present embodiment use a polishing apparatus that polishes the end face of the glass plate. FIG. 1 is a schematic view of a polishing apparatus 1. The polishing apparatus 1 performs a polishing process for polishing the end surface 3 a of the glass plate 3 while conveying the glass plate 3. The glass plate 3 polished by the polishing apparatus 1 is obtained by cutting a chamfered plate-shaped glass formed from a molten glass by a float method, a downdraw method, or the like into a predetermined dimension and chamfering it. The chamfering process is performed by grinding the corner of the glass plate into an arc shape or an R shape using a diamond wheel or the like. The glass plate 3 polished by the polishing apparatus 1 is shipped as a product through a cleaning process and an inspection process.

  As shown in FIG. 1, the polishing apparatus 1 mainly includes a transport mechanism 10 and a polishing mechanism 20. The transport mechanism 10 transports the glass plate 3 along the longitudinal direction of the end surface 3 a of the glass plate 3. The conveyance mechanism 10 conveys the glass plate 3 using a belt conveyor, a vacuum float panel, or the like. The vacuum float panel is a device that floats the glass plate 3 by blowing air onto the lower surface of the glass plate 3 and sucking air from the lower space of the glass plate 3. The polishing mechanism 20 is installed so as to face each of the pair of end surfaces 3 a of the glass plate 3. The polishing mechanism 20 has a polishing wheel 21. The polishing mechanism 20 presses the rotating polishing wheel 21 toward the end surface 3 a of the glass plate 3 to polish the end surface 3 a of the glass plate 3. In FIG. 1, the direction in which the glass plate 3 is conveyed and the direction in which the polishing wheel 21 rotates are indicated by arrows.

  Next, the configuration of the polishing wheel 21 will be described. In the following description, the “conveying direction” means the longitudinal direction of the end surface 3 a of the glass plate 3 and the direction in which the glass plate 3 is conveyed by the conveying mechanism 10. The “width direction” means a direction along the surface of the glass plate 3 and orthogonal to the transport direction. “Vertical direction” means a direction perpendicular to the surface of the glass plate 3. In the drawing, the conveyance direction is indicated by “y-axis”, the width direction is indicated by “x-axis”, and the vertical direction is indicated by “z-axis”. A plane perpendicular to the vertical direction is referred to as a “horizontal plane”. The surface of the glass plate 3 is parallel to the horizontal plane.

(2) Configuration of Polishing Wheel The polishing wheel 21 is used for polishing the end surface 3 a of the glass plate 3. FIG. 2 is an external view of the polishing wheel 21. The polishing wheel 21 includes a crankshaft 21a, a pair of magnetic field forming members 21b and 21c, and a magnetic material polishing slurry 21d. The polishing wheel 21 is inclined by a predetermined inclination angle along the conveyance direction.

  The crankshaft 21 a is a rotating shaft of the polishing wheel 21. The grinding wheel 21 rotates around the central axis 21h of the crankshaft 21a. As shown in FIG. 1, the rotation direction of the polishing wheel 21 is a direction in which the glass plate 3 is moved in the direction opposite to the direction in which the glass plate 3 is conveyed. FIG. 3 is a cross-sectional view of the polishing wheel 21. FIG. 3 is a cross-sectional view of the grinding wheel 21 taken along the xz plane including the central axis 21h of the crankshaft 21a. FIG. 3 shows a part of the cross section of the glass plate 3 polished by the polishing wheel 21 as a reference. The corners of the end surface 3a of the glass plate 3 are rounded as shown in FIG.

  The pair of magnetic field forming members 21b and 21c includes an upper magnetic field forming member 21b and a lower magnetic field forming member 21c. The upper magnetic field forming member 21b and the lower magnetic field forming member 21c are magnets such as permanent magnets and electromagnets each having a cylindrical shape. As shown in FIG. 3, the upper magnetic field forming surface 21e, which is the lower surface of the upper magnetic field forming member 21b, faces the lower magnetic field forming surface 21f, which is the upper surface of the lower magnetic field forming member 21c. A space between the upper magnetic field forming surface 21e and the lower magnetic field forming surface 21f is a magnetic field forming space 21g. The upper magnetic field forming member 21b and the lower magnetic field forming member 21c can form a magnetic field having a desired strength in the magnetic field forming space 21g. The direction of the magnetic field is a direction parallel to the central axis 21h of the crankshaft 21a. The magnetic material polishing slurry 21d contains magnetic powder and is held in the magnetic field forming space 21g by a magnetic field. As shown in FIG. 3, in the polishing step of the end surface 3a of the glass plate 3, the end surface 3a of the glass plate 3 is inserted into the magnetic material polishing slurry 21d from the slurry surface 21i which is the surface of the magnetic material polishing slurry 21d. Is done. The slurry surface 21i corresponds to the side peripheral surface of the polishing wheel 21 in the magnetic field forming space 21g. At this time, the end surface 3a of the glass plate 3 is located in the magnetic field formation space 21g.

  The magnetic material polishing slurry 21d is a mixture of magnetic powder and liquid. The magnetic material polishing slurry 21d may be held in the magnetic field forming space 21g even when no magnetic field is formed in the magnetic field forming space 21g. However, the magnetic material polishing slurry 21d is held in the magnetic field forming space 21g in a state where the slurry surface 21i is substantially flattened by the magnetic field formed in the magnetic field forming space 21g.

  The magnetic powder is a polishing abrasive for polishing a brittle material such as the glass plate 3. The magnetic powder is composed of magnetic particles such as iron oxide and ferrite. When ferrite is used as the magnetic powder, additives for preventing oxidation are unnecessary, or the amount of additives used for preventing oxidation is reduced. Can do.

  The liquid mixed with the magnetic powder is, for example, water, hydrocarbons, esters, ethers and hydrogen fluoride. The liquid mixed with the magnetic powder may be a liquid containing water as a main component and added with hydrocarbons, esters, ethers, hydrogen fluoride, and the like. The liquid mixed with the magnetic powder is preferably water. By using water, the temperature rise of the magnetic material polishing slurry 21d during polishing of the glass plate 3 can be suppressed.

  In order to suppress aggregation of the magnetic powder, 0.5 wt% or less of a surfactant may be added to the magnetic material polishing slurry 21d. The surfactant is, for example, a fatty acid ester. Moreover, in order to suppress the composition change of the magnetic material polishing slurry 21d, propylene glycol of less than 3.0 wt% may be added to the magnetic material polishing slurry 21d.

  From the viewpoint of the polishing ability of the glass plate 3 of the polishing wheel 21, the concentration of the magnetic powder contained in the magnetic material polishing slurry 21d is at least 70 wt%, preferably at least 80 wt%, more preferably at least 85 wt%. is there. When the concentration of the magnetic powder contained in the magnetic material polishing slurry 21d is 70 wt% or more, the magnetic material polishing slurry 21d becomes a paste. That is, the magnetic material polishing slurry 21d can maintain the shape in the magnetic field forming space 21g even in a state where no magnetic field is formed in the magnetic field forming space 21g, that is, in a state where there is no restriction by the magnetic field. The magnetic material polishing slurry 21d preferably contains a liquid such as water to such an extent that at least its shape can be maintained even in a state where it is not restricted by a magnetic field.

  The magnetic powder contained in the magnetic material polishing slurry 21d has a spherical shape or an indefinite shape having corners. Here, the spherical shape includes not only the case where the cross-sectional shape is a circle, but also the case where the cross-sectional shape is a rounded shape with no corners such as an ellipse and an oval. In addition, an indefinite shape having a corner includes a non-uniform solid shape having one or more sharp corners. The corner includes a portion that is thinner toward the edge, a portion in which a cross-sectional outline forms one or more acute or obtuse angles, and a portion that has a sharp edge.

  The average particle size of the magnetic powder may be 2 μm or less, may be greater than 2 μm and may be 6 μm or less, may be greater than 6 μm and may be 15 μm or less, and may be greater than 15 μm. The average particle diameter of the magnetic powder can be obtained, for example, by image analysis of the magnetic powder particles. Specifically, an image of magnetic powder particles is taken, and the diameter of a circle having an area equal to the projected area of the particles on the image is assumed to be the diameter of the particles. The particle size can be calculated.

  When the shape of the magnetic powder is an indefinite shape having corners, the average particle diameter of the magnetic powder is compatible from the viewpoint of achieving both the polishing ability of the glass plate 3 of the magnetic powder and the smoothness of the polished end face 3a. Is preferably 15 μm or less. When the shape of the magnetic powder is an indefinite shape having corners, the magnetic powder has a higher polishing ability of the glass plate 3 than a spherical magnetic powder having the same diameter. Therefore, if the average particle diameter of the magnetic powder is larger than 15 μm, it becomes difficult to improve the smoothness of the end surface 3 a of the glass plate 3.

  When the shape of the magnetic powder is a sphere, the average particle size of the magnetic powder is 2 μm or more from the viewpoint of achieving both the polishing ability of the glass plate 3 of the magnetic powder and the smoothness of the end face 3a to be polished. It is preferable that it is 20 micrometers or less. When the shape of the magnetic powder is a sphere, the magnetic powder has a lower polishing ability of the glass plate 3 than an indefinite shape magnetic powder having the same diameter and corners. Therefore, when the average particle diameter of the magnetic powder is less than 2 μm, the time required for polishing becomes so long that it is not suitable for mass production of the glass plate 3. Moreover, when the average particle diameter of magnetic powder exceeds 20 micrometers, it will become difficult to improve the smoothness of the end surface 3a of the glass plate 3. FIG.

  The magnetic powder preferably has a maximum magnetic flux density of 1.0 T or more and a maximum permeability of 3.0 H / m or more. When the concentration of the magnetic powder contained in the magnetic material polishing slurry 21d is less than 85%, it is preferable that the maximum magnetic flux density is 1.3 T or more and the maximum magnetic permeability is 3.3 H / m or more. The density is more preferably 1.6T or more. This is because, when the concentration of the magnetic powder contained in the magnetic material polishing slurry 21d is less than 85%, the higher the maximum magnetic flux density and the maximum magnetic permeability, the greater the magnetic field restraining force on the magnetic powder. This is because the polishing ability of the is improved.

(3) Operation of the polishing apparatus A process in which the polishing apparatus 1 polishes the end surface 3a of the glass plate 3 will be described. First, the chamfered glass plate 3 is transported by the transport mechanism 10. The glass plate 3 conveyed along the conveyance direction gradually approaches the polishing wheel 21 of the polishing mechanism 20. When the polishing mechanism 20 detects that the end surface 3a of the glass plate 3 is sufficiently close to the polishing wheel 21 or that the end surface 3a of the glass plate 3 is in contact with the polishing wheel 21 by a sensor or the like, the polishing mechanism 20 is rotating. The wheel 21 is moved toward the end surface 3 a of the glass plate 3. As a result, as shown in FIG. 3, the end surface 3a of the glass plate 3 is inserted into the magnetic material polishing slurry 21d from the slurry surface 21i. The glass plate 3 is transported in the transport direction by the transport mechanism 10 with the end surface 3a of the glass plate 3 being inserted into the magnetic material polishing slurry 21d. Thereby, the rotating grinding wheel 21 and the end surface 3a of the glass plate 3 move relatively along the conveyance direction. The end surface 3 a of the glass plate 3 is polished by colliding with the magnetic powder contained in the magnetic material polishing slurry 21 d of the polishing wheel 21.

  The polishing wheel 21 polishes the end surface 3a of the glass plate 3 and removes the work-affected layer or the brittle fracture layer of the end surface 3a. The polishing wheel 21 preferably polishes the end surface 3a of the glass plate 3 so that the arithmetic average roughness Ra of the end surface 3a of the glass plate 3 is less than 10 nm, for example.

(4) Features The polishing apparatus 1 polishes the end surface 3a of the glass plate 3 that is formed by a downdraw method or the like and cut into a product size. On the cut surface of the glass plate 3 cut out from the molded large mother glass, minute irregularities and cracks that can cause the glass plate 3 to crack and chip are easily formed. By performing the grinding process of chamfering the glass plate 3 by grinding the end surface 3a which is a cut surface of the glass plate 3, the occurrence of minute irregularities and cracks is suppressed. Furthermore, by performing a polishing step of polishing the end surface 3a of the chamfered glass plate 3 in the grinding step, the surface roughness of the end surface 3a is reduced, and the glass plate 3 having a smoother end surface 3a is obtained. In the polishing step, the end surface 3a of the glass plate 3 is preferably polished uniformly.

  The polishing apparatus 1 relatively moves the polishing wheel 21 and the glass plate 3 along the conveying direction in a state where the side peripheral surface of the rotating polishing wheel 21 is pressed against the end surface 3a of the glass plate 3. Then, the end face 3a is polished. The polishing wheel 21 holds a magnetic material polishing slurry 21d containing magnetic powder as loose abrasive grains in a magnetic field forming space 21g between a pair of magnetic field forming members 21b and 21c. The polishing apparatus 1 brings the end surface 3a of the glass plate 3 into the magnetic material polishing slurry 21d by bringing the slurry surface 21i of the magnetic material polishing slurry 21d closer to the end surface 3a of the glass plate 3. Thereby, the magnetic powder contained in the magnetic material polishing slurry 21d collides with the end surface 3a of the glass plate 3, and the end surface 3a of the glass plate 3 is polished. In the polishing process of the end surface 3a of the glass plate 3 using the polishing wheel 21 having the magnetic material polishing slurry 21d, the magnetic powder as the loose abrasive particles follows the shape of the end surface 3a of the glass plate 3 as the workpiece. Can move. For this reason, in the step of polishing the end surface 3 a of the glass plate 3, the damage given to the glass plate 3 by the polishing wheel 21 is small, so that deterioration of the quality of the glass plate 3 due to polishing of the end surface 3 a of the glass plate 3 is suppressed.

  FIG. 4 is a side view of the polishing wheel 21 inclined in the transport direction. FIG. 4 shows the glass plate 3 being polished by the polishing wheel 21. In FIG. 4, the inclination angle of the polishing wheel 21 is represented by θ. The inclination angle is an angle between the central axis 21h of the crankshaft 21a of the grinding wheel 21 and the vertical direction. FIG. 5 of the grinding wheel 21 is a side view of the grinding wheel 21 inclined in the conveying direction. In FIG. 5, the polishing is a region where the magnetic powder contained in the magnetic material polishing slurry 21 d is present and which can collide with the end surface 3 a of the glass plate 3 by the rotation of the polishing wheel 21. Region R1 is shown as a hatched region. FIG. 6 is a side view of a polishing wheel 21 that is not inclined in the transport direction as a comparative example. In FIG. 6, a polishing region R <b> 2, which is a region where magnetic powder that can collide with the end surface 3 a of the glass plate 3 by the rotation of the polishing wheel 21, is shown as a hatched region.

  As shown in FIG. 4, the polishing apparatus 1 tilts the polishing wheel 21 in the transport direction by a predetermined tilt angle. As can be seen from the comparison between the polishing region R1 shown in FIG. 5 and the polishing region R2 shown in FIG. 6, the magnetic powder contained in the polishing slurry 21d is a glass plate by the rotation of the polishing wheel 21. The area in which the magnetic powder that can collide with the end face 3a of the three exists is increased by inclining the polishing wheel 21 in the conveying direction. That is, when the polishing wheel 21 is inclined in the conveying direction, the number of magnetic powders having an action of polishing the end surface 3a of the glass plate 3 increases.

  When the polishing wheel 21 is not inclined in the conveying direction, as shown in FIG. 6, the polishing region R2 where the magnetic powder having the action of polishing the end surface 3a of the glass plate 3 is present is the central axis of the crankshaft 21a. In the 21h direction, only the central portion of the magnetic material polishing slurry 21d is occupied. The width of the polishing region R2 in the direction of the central axis 21h is substantially the same as the thickness of the glass plate 3. The magnetic powder contained in the magnetic material polishing slurry 21d generally has low fluidity. Therefore, most of the magnetic powder contained in the magnetic material polishing slurry 21 d may not have an action of polishing the end surface 3 a of the glass plate 3.

  On the other hand, when the polishing wheel 21 is inclined in the conveying direction, as shown in FIG. 5, the polishing region R1 in which the magnetic powder having the action of polishing the end surface 3a of the glass plate 3 is present on the crankshaft 21a. It occupies most of the magnetic material polishing slurry 21d in the direction of the central axis 21h. The width of the polishing region R1 in the direction of the central axis 21h is substantially the same as the thickness of the magnetic substance polishing slurry 21d in the direction of the central axis 21h. That is, most of the magnetic powder contained in the magnetic material polishing slurry 21 d has an action of polishing the end surface 3 a of the glass plate 3.

  And the work amount per magnetic powder decreases, so that the number of the magnetic powder which has the effect | action which grind | polishes the end surface 3a of the glass plate 3 is large. Therefore, even if the magnetic powder contained in the magnetic material polishing slurry 21d has low fluidity, the amount of polishing of the glass plate 3 per magnetic powder is reduced by inclining the polishing wheel 21 in the transport direction. Therefore, a decrease in the polishing ability of the magnetic powder is suppressed, and the life of the magnetic powder is extended.

  Further, since the number of magnetic powders having an action of polishing the end surface 3a of the glass plate 3 is increased by inclining the polishing wheel 21 in the conveying direction, the overall polishing ability of the polishing wheel 21 is improved, and the polishing wheel The surface roughness of the end surface 3a of the glass plate 3 polished by 21 is reduced.

  Further, by adjusting the inclination angle of the polishing wheel 21, the number of magnetic powders having an action of polishing the end surface 3 a of the glass plate 3 is controlled, and the end surface 3 a of the glass plate 3 polished by the polishing wheel 21 is controlled. The surface roughness can be adjusted.

  Therefore, the polishing apparatus 1 is included in the magnetic material polishing slurry 21d by inclining the polishing wheel 21 when the end surface 3a of the glass plate 3 is polished using the polishing wheel 21 having the magnetic material polishing slurry 21d. It is possible to extend the life of the magnetic powder and to reduce the cost of polishing the end surface 3a of the glass plate 3. Further, since the polishing apparatus 1 can easily adjust the polishing ability of the polishing wheel 21 by inclining the polishing wheel 21, the polishing apparatus 1 can be made compact. In other words, the polishing apparatus 1 does not need to use a plurality of magnetic material polishing slurries 21d including magnetic powders having various particle sizes.

  Furthermore, as shown in FIG. 6, in the method of polishing the end surface 3 a of the glass plate 3 with the polishing wheel 21 that is not inclined in the transport direction, the end surface 3 a of the glass plate 3 is subjected to a force in the width direction from the polishing wheel 21. Only receive. FIG. 7 is a cross-sectional view of the glass plate 3 polished by the polishing wheel 21 that is not inclined in the transport direction. The end surface 3a of the glass plate 3 is chamfered in an arc shape. In FIG. 7, the first polishing force that is the force in the width direction that the end surface 3 a of the glass plate 3 receives from the polishing wheel 21 is indicated by a white arrow. In FIG. 7, the second polishing force, which is the force that the end surface 3 a of the glass plate 3 receives from the polishing wheel 21 along the direction perpendicular to the end surface 3 a, is indicated by a black arrow. The magnitude of the first polishing force is constant in the vertical direction. The second polishing force is a component of the first polishing force in the direction perpendicular to the end surface 3a. Therefore, as shown in FIG. 7, the second polishing force is minimum at both ends in the vertical direction of the end surface 3 a of the glass plate 3 and is maximum at the center in the vertical direction. The greater the second polishing force, the greater the polishing amount of the end face 3a. Therefore, in the method of polishing the end surface 3a of the glass plate 3 with the polishing wheel 21 that is not inclined in the conveying direction, the surface roughness of both end portions in the vertical direction of the end surface 3a is larger than the surface roughness of the center portion in the vertical direction of the end surface 3a. There is a risk of growing. Therefore, it is difficult for the polishing wheel 21 that is not inclined in the transport direction to uniformly polish the end surface 3 a of the glass plate 3.

  On the other hand, as shown in FIG. 5, in the method of polishing the end surface 3 a performed by the polishing apparatus 1, the method of polishing the end surface 3 a of the glass plate 3 with the polishing wheel 21 inclined in the transport direction, the glass plate 3 Both end portions in the vertical direction of the end surface 3a can receive a certain amount of force in a direction perpendicular to the end surface 3a corresponding to the second polishing force. Therefore, the method of polishing the end surface 3a of the glass plate 3 with the polishing wheel 21 inclined in the conveying direction is compared with the method of polishing the end surface 3a of the glass plate 3 with the polishing wheel 21 not inclined in the conveying direction. The end surface 3a of the glass plate 3 can be more uniformly polished. Therefore, the surface roughness of the end surface 3 a of the glass plate 3 polished by the polishing apparatus 1 is stable from one main surface side to the other main surface side of the glass plate 3.

(5) Modification (5-1) Modification A
The polishing apparatus 1 according to this embodiment polishes the end surface 3 a of the glass plate 3 using one polishing wheel 21. However, the end surface 3 a of the glass plate 3 may be polished by two or more polishing wheels 21.

  FIG. 8 is a schematic view of a polishing apparatus 101 according to this modification. The polishing apparatus 101 performs a polishing process for polishing the end surface 3a of the glass plate 3 while conveying the glass plate 3 in the same manner as the polishing apparatus 1 according to the present embodiment. The polishing apparatus 101 uses the two polishing wheels 121 and 221 to polish the end surface 3a of the glass plate 3. The two grinding wheels 121, 221 are composed of a first grinding wheel 121 and a second grinding wheel 221. The first grinding wheel 121 and the second grinding wheel 221 are inclined in the transport direction, like the grinding wheel 21 in the present embodiment.

  FIG. 9 is a side view of the inclined first polishing wheel 121 and the inclined second polishing wheel 221. As shown in FIG. 9, the inclination direction of the first polishing wheel 121 is the opposite direction to the inclination direction of the second polishing wheel 221. The first polishing wheel 121 is inclined toward the conveyance direction, and the second polishing wheel 221 is inclined toward the direction opposite to the conveyance direction. The inclination angle of the first polishing wheel 121 is equal to the inclination angle of the second polishing wheel 221.

  The polishing process performed by the polishing apparatus 101 includes a first polishing process and a second polishing process. In the first polishing step, the end surface 3 a of the glass plate 3 is polished using the first polishing wheel 121. In the second polishing step, the end surface 3a polished in the first polishing step is polished using the second polishing wheel 221. The first polishing wheel 121 is inclined by a predetermined inclination angle in the transport direction. The second polishing wheel 221 is inclined by the same angle as the inclination angle of the first polishing wheel 121 in the direction opposite to the conveying direction. That is, as shown in FIG. 9, the rotating shaft 121h of the first polishing wheel 121 and the rotating shaft 221h of the second polishing wheel 221 are inclined by a predetermined angle with respect to the vertical direction. The first polishing wheel 121 includes a first upper magnetic field forming member 121b, a first lower magnetic field forming member 121c, and a first magnetic material polishing slurry 121d. The second polishing wheel 221 includes a second upper magnetic field forming member 221b, a second lower magnetic field forming member 221c, and a second magnetic material polishing slurry 221d.

  As shown in FIG. 9, in the first polishing step, the end surface 3a of the glass plate 3 is first polished by the first magnetic polishing slurry 121d close to the first lower magnetic field forming member 121c, and then the first polishing step is performed. Polishing is performed by the first magnetic material polishing slurry 121d close to the upper magnetic field forming member 121b. In the second polishing step, the end surface 3a of the glass plate 3 is first polished by the second magnetic material polishing slurry 221d close to the second upper magnetic field forming member 221b, and then the second surface close to the second lower magnetic field forming member 221c. 2. Polished with a magnetic polishing slurry 221d.

  That is, the change with time of the force received by the end surface 3a from the first polishing wheel 121 in the first polishing step is the reverse of the change with time of the force received by the end surface 3a from the second polishing wheel 221 in the second polishing step. . Therefore, the polishing apparatus 101 uses the first polishing wheel 121 and the second polishing wheel 221 whose inclination directions are opposite to each other along the transport direction, thereby polishing the entire end surface 3a of the glass plate 3 more uniformly. Can do.

  In this modification, if the inclination angle of the first polishing wheel 121 is equal to the inclination angle of the second polishing wheel 221, the first polishing wheel 121 is inclined in the direction opposite to the conveyance direction, The two polishing wheels 221 may be inclined toward the transport direction.

(5-2) Modification B
The polishing apparatus 1 according to the present embodiment transports the glass plate 3 in the transport direction in a state where the end surface 3a of the glass plate 3 is inserted in the magnetic material polishing slurry 21d. Thereby, the end surface 3a of the glass plate 3 is grind | polished by colliding with the magnetic powder contained in the magnetic substance polishing slurry 21d. However, the polishing apparatus 1 relatively moves the polishing wheel 21 and the end surface 3a of the glass plate 3 along the conveying direction in a state where the end surface 3a of the glass plate 3 is inserted into the magnetic material polishing slurry 21d. The end surface 3a of the glass plate 3 may be polished by moving. For example, the polishing apparatus 1 may polish the end surface 3a of the glass plate 3 by fixing the glass plate 3 and moving the polishing wheel 21 along the transport direction. Further, the polishing apparatus 1 may polish the end surface 3a of the glass plate 3 by moving the glass plate 3 and the polishing wheel 21 at different speeds along the conveying direction.

(5-3) Modification C
The polishing apparatus 1 according to this embodiment polishes the end surface 3a of the glass plate 3 using a polishing wheel 21 inclined in the longitudinal direction. However, the polishing apparatus 1 may polish the end surface 3a of the glass plate 3 using the polishing wheel 21 inclined in the width direction instead of the polishing wheel 21 inclined in the longitudinal direction.

  FIG. 10 is a cross-sectional view of the polishing wheel 321 in the present modification. FIG. 10 is a cross-sectional view of the grinding wheel 321 cut along an xz plane including the central axis 321h of the crankshaft 321a. FIG. 10 shows a part of the cross section of the glass plate 3 polished by the polishing wheel 321 as a reference. The polishing wheel 321 includes a crankshaft 321a, a pair of magnetic field forming members 321b and 321c, and a magnetic material polishing slurry 321d. The grinding wheel 321 rotates around the central axis 321h of the crankshaft 321a. As shown in FIG. 10, the central axis 321 h is inclined in the width direction of the glass plate 3. Specifically, the polishing wheel 321 is inclined downward in the vertical direction toward the end surface 3a of the glass plate 3. By inclining the polishing wheel 321 in the width direction, the boundary portion between the upper main surface of the glass plate 3 and the end surface 3a, that is, the upper corner portion of the glass plate 3, is the magnetic polishing slurry 321d of the polishing wheel 321. Deeper into the interior. Therefore, the pressure that the glass plate 3 receives from the polishing wheel 321 at the upper corner of the glass plate 3 is high. Thereby, the upper corner of the glass plate 3 is easily polished by the polishing wheel 321.

  FIG. 11 is a cross-sectional view of another grinding wheel 421 in this modification. FIG. 11 is a cross-sectional view of the grinding wheel 421 cut along an xz plane including the central axis 421h of the crankshaft 421a. FIG. 11 shows a part of a cross section of the glass plate 3 polished by the polishing wheel 421 as a reference. The polishing wheel 421 includes a crankshaft 421a, a pair of magnetic field forming members 421b and 421c, and a magnetic material polishing slurry 421d. The grinding wheel 421 rotates around the central axis 421h of the crankshaft 421a. As shown in FIG. 11, the central axis 421 h is inclined in the width direction of the glass plate 3. Specifically, the polishing wheel 421 is inclined upward in the vertical direction toward the end surface 3 a of the glass plate 3. By inclining the polishing wheel 421 in the width direction, the boundary portion between the lower main surface of the glass plate 3 and the end surface 3a, that is, the lower corner portion of the glass plate 3, is a magnetic material polishing slurry of the polishing wheel 421. It penetrates deeper into the interior of 421d. Therefore, the pressure that the glass plate 3 receives from the polishing wheel 421 is high at the lower corner of the glass plate 3. Thereby, the lower corner of the glass plate 3 is easily polished by the polishing wheel 421.

  FIG. 12 is a schematic diagram of a polishing apparatus that polishes the end surface 3a of the glass plate 3 using the polishing wheel 321 shown in FIG. 10 and the polishing wheel 421 shown in FIG. FIG. 12 is a side view of the grinding wheels 321 and 421 as seen along the x-axis. As shown in FIG. 12, by polishing the end surface 3a of the glass plate 3 using two types of polishing wheels 321 and 421 inclined in opposite directions along the width direction, the upper side of the glass plate 3 and The polishing ability of the polishing apparatus at the lower corner can be improved. Thereby, the polishing apparatus shown in FIG. 12 can polish the end surface 3a of the glass plate 3 uniformly.

  Note that the polishing wheels 321 and 421 according to the present modification may be further inclined along the longitudinal direction, similarly to the polishing wheel 21 of the present embodiment. In this case, the central axes 321h and 421h of the polishing wheels 321 and 421 are inclined along the longitudinal direction at the same time as being inclined along the width direction.

(5-4) Modification D
The polishing apparatus 1 according to this embodiment includes a polishing mechanism 20. The polishing mechanism 20 has a mechanism for pressing the polishing wheel 21 toward the end surface 3a of the glass plate 3, for example. Next, an example of a specific configuration of the polishing mechanism 20 will be described.

  The polishing mechanism 20 mainly includes a polishing wheel 21, a pair of front arms 22, a pair of rear arms 23, a drive motor 24, a tilt mechanism 25, a brake mechanism 26, a counterweight 27, and a base body 28. And a control unit (not shown). FIG. 13 is a plan view of a polishing mechanism 20 that polishes one end surface 3 a of the glass plate 3. FIG. 14 is a side view of the polishing mechanism 20 as seen from the direction of the arrow XIV shown in FIG. FIG. 13 shows the glass plate 3 processed by the polishing mechanism 20 as a reference. The polishing mechanism 20 shown in FIGS. 13 and 14 has the same configuration and operation as the polishing mechanism 20 that polishes the other end surface 3a of the glass plate 3. FIG. 15 is a plan view of a polishing mechanism 20 similar to FIG. FIG. 16 is a side view of the polishing mechanism 20 similar to FIG. 15 and 16 show a state in which the grinding wheel 21 is tilted by the tilt mechanism 25 in a plane orthogonal to the width direction. On the other hand, FIGS. 13 and 14 show a state in which the polishing wheel 21 is not inclined in a plane orthogonal to the width direction.

(5-4-1) Polishing Wheel The polishing wheel 21 is fixed to the base body 28 and connected to the tilt mechanism 25. The grinding wheel 21 can be tilted in the longitudinal direction by the tilt mechanism 25.

(5-4-2) Front Arm The pair of front arms 22 is installed above the grinding wheel 21 and below the grinding wheel 21 as shown in FIG. As shown in FIG. 13, one end of the front arm 22 is connected to the front arm first rotating shaft 22a, and the other end of the front arm 22 is connected to the front arm second rotating shaft 22b. Has been. The front arm first rotation shaft 22 a is connected to the base body 28. The front arm second rotation shaft 22 b is connected to the tilt mechanism 25.

  The front arm 22 rotates in a horizontal plane around the front arm first rotation shaft 22a. As the front arm 22 rotates, the angle of the front arm 22 with respect to the transport direction changes.

  As will be described later, the front arm 22 rotates by mechanical control using a counterweight 27. However, the front arm 22 may be rotated by electrical control. For example, by applying an electronic cam system, depending on the state of the magnetic powder contained in the magnetic material polishing slurry 21d of the polishing wheel 21 and the cross-sectional shape of the end surface 3a of the glass plate 3, the rotation of the front arm 22 can be performed. The movement may be appropriately controlled.

(5-4-3) Rear Arm As with the pair of front arms 22, the pair of rear arms 23 is installed above the grinding wheel 21 and below the grinding wheel 21. As shown in FIG. 13, one end of the rear arm 23 is connected to the rear arm first rotating shaft 23a, and the other end of the rear arm 23 is connected to the rear arm second rotating shaft 23b. The rear arm first rotation shaft 23 a is connected to the base body 28. The rear arm second rotation shaft 23 b is connected to the tilt mechanism 25.

  The rear arm 23 rotates in a horizontal plane about the rear arm first rotation shaft 23a. As the rear arm 23 rotates, the angle of the rear arm 23 with respect to the transport direction changes.

  The distance between the front arm first rotating shaft 22a and the rear arm first rotating shaft 23a and the distance between the front arm second rotating shaft 22b and the rear arm second rotating shaft 23b are equal to each other. And it is constant. Therefore, the front arm 22 and the rear arm 23 are parallel to each other regardless of the angle with respect to the transport direction. As the front arm 22 and the rear arm 23 rotate, the position of the polishing wheel 21 in the horizontal plane changes.

(5-4-4) Drive Motor The drive motor 24 is a motor that generates power for rotationally driving the polishing wheel 21. The drive motor 24 is connected to the polishing wheel 21 via a timing belt 25c described later. The drive motor 24 is attached to the tilt mechanism 25.

  When driving of the drive motor 24 starts, the pair of magnetic field forming members 21b and 21c rotate around the central axis 21h of the crankshaft 21a. Thereby, the magnetic material polishing slurry 21d held in the magnetic field forming space 21g also rotates around the central axis 21h.

(5-4-5) Inclination mechanism The inclination mechanism 25 rotates the grinding wheel 21 in a plane orthogonal to the width direction. The surface orthogonal to the width direction is a surface parallel to the paper surface of FIG. As shown in FIG. 14, the tilting mechanism 25 mainly includes a base portion 25a, a spindle 25b, and a timing belt 25c.

  The base portion 25a is connected to the front arm second rotating shaft 22b and the rear arm second rotating shaft 23b. That is, the tilt mechanism 25 is connected to the front arm 22 and the rear arm 23.

  The spindle 25b is a member that is connected to the base portion 25a and is rotatable in a plane orthogonal to the width direction. The spindle 25b rotates around the tilt axis 25d. As shown in FIGS. 13 and 14, the inclination axis 25 d is an axis parallel to the width direction and intersects with the central axis 21 h of the crankshaft 21 a of the grinding wheel 21. The vertical position of the intersection of the tilt axis 25d and the central axis 21h is the midpoint between the center of the upper magnetic field forming surface 21e and the center of the lower magnetic field forming surface 21f of the polishing wheel 21. The polishing wheel 21 is fixed to the spindle 25b.

  The timing belt 25 c is a belt for transmitting the power generated by the drive motor 24 to the polishing wheel 21. The polishing wheel 21 is rotated by driving the timing belt 25c.

  The tilt mechanism 25 can rotate the spindle 25b around the tilt axis 25d in a plane perpendicular to the width direction. As a result, the polishing wheel 21 connected to the spindle 25b also rotates in a plane perpendicular to the width direction about the inclined shaft 25d. As a result, the polishing wheel 21 is inclined along the longitudinal direction of the end surface 3a of the glass plate 3, that is, the conveying direction. The polishing wheel 21 is inclined by a predetermined inclination angle along the conveying direction by the inclination mechanism 25. In FIG. 16, the inclination angle of the polishing wheel 21 is represented by θ.

(5-4-6) Brake mechanism The brake mechanism 26 limits the rotation of the front arm 22. The brake mechanism 26 brakes the rotation of the front arm 22 and restricts the movement of the polishing wheel 21 connected to the tilt mechanism 25 in the horizontal plane. The brake mechanism 26 is, for example, the front arm 22 at the moment when the glass plate 3 conveyed by the conveying mechanism 10 contacts the polishing wheel 21 and at the moment when the glass plate 3 conveyed by the conveying mechanism 10 leaves the polishing wheel 21. Is temporarily limited. The brake mechanism 26 uses, for example, an air cylinder. The brake mechanism 26 is attached to the base body 28.

(5-4-7) Counterweight The counterweight 27 is a mechanism for rotating the front arm 22 by applying a force to the front arm 22. The counterweight 27 rotates the front arm 22 so that the polishing wheel 21 connected to the tilt mechanism 25 moves in a horizontal plane. The counterweight 27 is attached to the base body 28.

(5-4-8) Base The base 28 is a member to which the front arm 22, the rear arm 23, the tilt mechanism 25, the brake mechanism 26, the counterweight 27, and the like are coupled. The base 28 is fixed at the place where the polishing mechanism 20 is installed.

(5-4-9) Control Unit The control unit is a computer mainly composed of a CPU, ROM, RAM, hard disk, and the like. The control unit is connected to the drive motor 24, the tilt mechanism 25, the brake mechanism 26, the counterweight 27, and the like. The control unit controls components connected to the control unit based on programs and data stored in a ROM, RAM, hard disk, or the like. For example, the control unit controls the drive motor 24 to adjust the rotation speed of the polishing wheel 21. The control unit controls the tilt mechanism 25 to adjust the tilt angle of the polishing wheel 21. The control unit controls the brake mechanism 26 to limit the movement of the polishing wheel 21 in the horizontal plane. The control unit controls the counterweight 27 to adjust the position of the polishing wheel 21 in the horizontal plane and adjust the force that the polishing wheel 21 applies to the end surface 3 a of the glass plate 3.

1 Polishing device (polishing part)
3 Glass plate 3a End surface of glass plate 21 Polishing wheel 21b Upper magnetic field forming member (magnetic field forming member)
21c Lower magnetic field forming member (magnetic field forming member)
21d Magnetic polishing slurry (slurry)
21g Magnetic field forming space 21h Center axis of crankshaft (rotating shaft)
24 Drive motor (rotating mechanism)
25 Inclination mechanism

International Publication No. 2012/066757

Claims (7)

A polishing wheel in which a slurry containing loose abrasive grains is formed into a rotating body is rotated around a rotation axis of the rotating body, and the polishing wheel and the glass are brought into contact with an end surface of the glass plate while a side peripheral surface of the rotating body is in contact with the end surface of the glass plate. A polishing step of polishing the end face by relatively moving a plate along the longitudinal direction of the end face;
In the polishing step, the rotation axis is inclined in the longitudinal direction with respect to a first direction orthogonal to the main surface of the glass plate, and the rotation axis is parallel to the first direction. Increasing the number of loose abrasive grains in contact with the end face,
Manufacturing method of glass plate. The polishing wheel is formed by holding the slurry containing magnetic powder as the free abrasive grains in a magnetic field forming space between a pair of magnetic field forming members,
In the polishing step, the pair of magnetic field forming members are rotated around the rotation axis, the slurry held in the magnetic field forming space is brought into contact with the end surface of the glass plate, and the end surface is polished.
The manufacturing method of the glass plate of Claim 1. The slurry includes the magnetic powder and water, and the concentration of the magnetic powder is at least 70 wt%.
The manufacturing method of the glass plate of Claim 2. The polishing step includes
A first polishing step of polishing the end face of the glass plate using the first polishing wheel;
A second polishing step of polishing the end face polished in the first polishing step using the second polishing wheel;
Have
In the first polishing step, the rotation axis of the first polishing wheel is inclined in the longitudinal direction,
In the second polishing step, the rotation shaft of the second polishing wheel is inclined in a direction opposite to the longitudinal direction.
The manufacturing method of the glass plate of any one of Claim 1 to 3. A polishing wheel in which a slurry containing loose abrasive grains is formed into a rotating body is rotated around a rotation axis of the rotating body, and the polishing wheel and the glass are brought into contact with an end surface of the glass plate while a side peripheral surface of the rotating body is in contact with the end surface of the glass plate. A polishing step of polishing the end face by relatively moving a plate along the longitudinal direction of the end face;
In the polishing step, the rotation axis is inclined in the width direction orthogonal to the first direction and the longitudinal direction with respect to the first direction orthogonal to the main surface of the glass plate.
Manufacturing method of glass plate. In the polishing step, the rotation axis is further inclined in the longitudinal direction with respect to the first direction to increase the number of the free abrasive grains in contact with the end surface.
The manufacturing method of the glass plate of Claim 5. With a polishing part that polishes the end face of the glass plate,
The polishing section is
A polishing wheel in which a slurry containing loose abrasive grains is formed into a rotating body;
A rotation mechanism for rotating the grinding wheel around a rotation axis of the rotating body;
An inclination mechanism for inclining the rotation axis with respect to a first direction orthogonal to the main surface of the glass plate;
Have
The polishing unit relatively contacts the polishing wheel and the glass plate along the longitudinal direction while bringing a side peripheral surface of the polishing wheel rotated by the rotating mechanism into contact with the end surface of the glass plate. To polish the end face,
Glass plate manufacturing equipment.