JP2015082594A - Fluid supply system, exposure apparatus, fluid supply method, exposure method, and device manufacturing method - Google Patents

Abstract

A fluid supply system capable of suppressing the occurrence of exposure failure is provided.
A fluid supply system is supplied from a first temperature adjusting device capable of adjusting a temperature of a first fluid, a second temperature adjusting device capable of adjusting a temperature of a second fluid, and the first temperature adjusting device. A heat exchanger capable of exchanging heat between the first fluid and the second fluid supplied from the second temperature control device, and detecting the temperature of the first fluid via the heat exchanger to which the second fluid is supplied And a temperature sensor that detects the temperature of the first fluid supplied from the first temperature control device without passing through the heat exchanger.
[Selection] Figure 3

Description

  The present invention relates to a fluid supply system, an exposure apparatus, a fluid supply method, an exposure method, and a device manufacturing method.

  As an exposure apparatus used in a photolithography process, for example, an immersion exposure apparatus that exposes a substrate with exposure light via a liquid as disclosed in the following patent document is known.

US Patent Application Publication No. 2009/0046261

  In the immersion exposure apparatus, if the temperature difference between elements adjacent to each other among the substrate, the liquid, the gas, and the members of the exposure apparatus becomes large, exposure failure may occur. As a result, a defective device may occur.

  An object of an aspect of the present invention is to provide a fluid supply system, an exposure apparatus, a fluid supply method, and an exposure method that can suppress the occurrence of exposure failure. Moreover, the aspect of this invention aims at providing the device manufacturing method which can suppress generation | occurrence | production of a defective device.

  According to the first aspect of the present invention, there is provided a fluid supply system used in the exposure apparatus, the first temperature adjusting device capable of adjusting the temperature of the first fluid, and the second capable of adjusting the temperature of the second fluid. A temperature adjusting device, a heat exchanger capable of exchanging heat between the first fluid supplied from the first temperature adjusting device and the second fluid supplied from the second temperature adjusting device, and a second fluid supplied. And a temperature sensor that detects the temperature of the first fluid that has passed through the heat exchanger and detects the temperature of the first fluid that has been supplied from the first temperature control device without passing through the heat exchanger. A system is provided.

  According to the second aspect of the present invention, there is provided a fluid supply system used in the exposure apparatus, the first temperature adjusting device capable of adjusting the temperature of the first fluid, and the second capable of adjusting the temperature of the second fluid. A temperature adjusting device, a heat exchanger capable of exchanging heat between the first fluid supplied from the first temperature adjusting device and the second fluid supplied from the second temperature adjusting device, and the first fluid being supplied And a temperature sensor that detects a temperature of the second fluid that passes through the heat exchanger that is not supplied with the first fluid and that detects a temperature of the second fluid that passes through the heat exchanger that is not supplied with the first fluid. Is done.

  According to the third aspect of the present invention, there is provided a fluid supply system used in the exposure apparatus, the first temperature adjusting device capable of adjusting the temperature of the first fluid, and the second temperature capable of adjusting the temperature of the second fluid. A temperature adjusting device; a first temperature sensor for detecting a temperature of the first fluid from the first temperature adjusting device; a second temperature sensor for detecting a temperature of the second fluid from the second temperature adjusting device; and a first temperature. There is provided a fluid supply system including a flow path system that forms a flow path so that the first fluid from the adjusting device is sent to the first temperature sensor and then sent to the second temperature sensor.

  According to the fourth aspect of the present invention, there is provided a fluid supply system used in the exposure apparatus, the first temperature adjusting device capable of adjusting the temperature of the first fluid, and the second temperature capable of adjusting the temperature of the second fluid. A temperature adjusting device; a first temperature sensor for detecting a temperature of the first fluid from the first temperature adjusting device; a second temperature sensor for detecting a temperature of the second fluid from the second temperature adjusting device; and a first temperature. A flow path system that forms a flow path so that the second fluid from the second temperature adjustment device is sent to the first temperature sensor after the first fluid from the adjustment device is sent to the first temperature sensor. A fluid supply system is provided.

  According to the fifth aspect of the present invention, an exposure apparatus including the fluid supply system according to any one of the first to fourth aspects is provided.

  According to a sixth aspect of the present invention, there is provided a fluid supply method used for exposure, the temperature adjustment of the first fluid, the temperature adjustment of the second fluid, the temperature-adjusted first fluid, Performing heat exchange with the temperature-adjusted second fluid by means of a heat exchanger, detecting the temperature of the first fluid via the heat exchanger to which the second fluid is supplied, with a temperature sensor; Detecting a temperature of the first fluid not passing through the exchanger by a temperature sensor.

  According to a seventh aspect of the present invention, there is provided a fluid supply method used for exposure, the temperature adjustment of the first fluid, the temperature adjustment of the second fluid, the temperature-adjusted first fluid, Performing heat exchange with the temperature-adjusted second fluid by means of a heat exchanger, detecting the temperature of the second fluid via the heat exchanger to which the first fluid is supplied by means of a temperature sensor, Detecting a temperature of the second fluid via the heat exchanger to which the first fluid is not supplied by a temperature sensor.

  According to the eighth aspect of the present invention, there is provided a fluid supply method used for exposure, the temperature adjustment of the first fluid, the temperature adjustment of the second fluid, and the temperature-adjusted first fluid. After the temperature is detected by the first temperature sensor, the temperature of the temperature-adjusted second fluid is detected by the second temperature sensor, and the temperature-adjusted first fluid is sent to the first temperature sensor A fluid supply method comprising: sending to a second temperature sensor.

  According to a ninth aspect of the present invention, there is provided a fluid supply method used for exposure, the temperature adjustment of the first fluid, the temperature adjustment of the second fluid, and the temperature-adjusted first fluid. After detecting the temperature by the first temperature sensor, detecting the temperature of the temperature-adjusted second fluid by the second temperature sensor, and after the temperature-adjusted first fluid is sent to the first temperature sensor, Delivering a temperature-adjusted second fluid to a first temperature sensor.

  According to a tenth aspect of the present invention, there is provided an exposure method for exposing a substrate with exposure light through a liquid, the method including supplying a liquid by the fluid supply method according to any one of the sixth to tenth aspects. A method is provided.

  According to an eleventh aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure apparatus according to the fifth aspect and developing the exposed substrate.

  According to a twelfth aspect of the present invention, there is provided a device manufacturing method including exposing a substrate using the exposure method according to the tenth aspect and developing the exposed substrate.

  Aspects of the present invention can provide a fluid supply system, an exposure apparatus, a fluid supply method, and an exposure method that can suppress the occurrence of exposure failure. An aspect of the present invention can provide a device manufacturing method capable of suppressing the occurrence of defective devices.

It is a figure which shows the exposure apparatus which concerns on this embodiment. It is a figure which shows a part of exposure apparatus. It is a figure which shows the fluid supply system which concerns on this embodiment. It is a figure which shows the fluid supply system which concerns on this embodiment. It is a flowchart which shows operation | movement of a fluid supply system. It is a figure which shows an example of the detection result of a temperature sensor. It is a flowchart which shows the temperature adjustment operation | movement of exposure apparatus. (A), (B) is a figure which shows the structure of the fluid supply system which concerns on a modification. It is a figure which shows the fluid supply system which concerns on this embodiment. It is a figure which shows the fluid supply system which concerns on this embodiment. It is a figure which shows an example of the substrate stage which concerns on this embodiment. It is a flowchart which shows an example of the manufacturing method of a device.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a view showing an exposure apparatus EX according to this embodiment. The exposure apparatus EX of the present embodiment is an immersion exposure apparatus that exposes a substrate P with exposure light EL via a liquid LQ1. In the present embodiment, the immersion region LS is formed so that the optical path K of the exposure light EL irradiated to the substrate P is filled with the liquid LQ1. The liquid immersion area refers to a portion (space, area) filled with liquid. The substrate P is exposed with the exposure light EL through the liquid LQ1 in the liquid immersion area LS. In the present embodiment, water is used as the liquid LQ1.

  The exposure apparatus EX of the present embodiment is an exposure apparatus provided with a substrate stage and a measurement stage as disclosed in, for example, US Pat. No. 6,897,963 and European Patent Application Publication No. 1713113.

  In FIG. 1, an exposure apparatus EX measures a mask stage 1 that can move while holding a mask M, a substrate stage 2 that can move while holding a substrate P, and exposure light EL without holding the substrate P. A movable measuring stage 3 mounted with a measuring member (measuring instrument) C, a measuring system 4 for measuring the position of the substrate stage 2 and the measuring stage 3, and an illumination system IL for illuminating the mask M with the exposure light EL The projection optical system PL that projects an image of the pattern of the mask M illuminated with the exposure light EL onto the substrate P, the liquid immersion member 5 that forms the liquid immersion region LS of the liquid LQ1, and the fluid to each part of the exposure apparatus EX A fluid supply system 6 to be supplied, a control device 7 that controls the operation of the entire exposure apparatus EX, and a storage device 8 that is connected to the control device 7 and stores various types of information related to exposure.

  In addition, the exposure apparatus EX includes a chamber apparatus 9 that adjusts the environment (at least one of temperature, humidity, pressure, and cleanness) of the space CS in which the exposure light EL travels. In the space CS, at least the projection optical system PL, the liquid immersion member 5, the substrate stage 2, and the measurement stage 3 are arranged. In the present embodiment, the mask stage 1 and at least a part of the illumination system IL are also arranged in the space CS.

  The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The mask M includes a transmission type mask having a transparent plate such as a glass plate and a pattern formed on the transparent plate using a light shielding material such as chromium. A reflective mask can also be used as the mask M.

  The substrate P is a substrate for manufacturing a device. The substrate P includes, for example, a base material such as a semiconductor wafer and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material (photoresist). Further, the substrate P may include another film in addition to the photosensitive film. For example, the substrate P may include an antireflection film or a protective film (topcoat film) that protects the photosensitive film.

  The illumination system IL irradiates the illumination area IR with the exposure light EL. The illumination area IR includes a position where the exposure light EL emitted from the illumination system IL can be irradiated. The illumination system IL illuminates at least a part of the mask M arranged in the illumination region IR with the exposure light EL having a uniform illuminance distribution. As the exposure light EL emitted from the illumination system IL, for example, far ultraviolet light (DUV light) such as bright lines (g line, h line, i line) and KrF excimer laser light (wavelength 248 nm) emitted from a mercury lamp, ArF Excimer laser light (wavelength 193 nm), vacuum ultraviolet light (VUV light) such as F2 laser light (wavelength 157 nm), or the like is used. In the present embodiment, ArF excimer laser light, which is ultraviolet light (vacuum ultraviolet light), is used as the exposure light EL.

  The mask stage 1 can move while holding the mask M. The mask stage 1 is moved by the operation of a drive system 10 including a flat motor as disclosed in US Pat. No. 6,452,292, for example. In the present embodiment, the mask stage 1 can be moved in six directions of the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system 10. Note that the drive system 10 may not include a planar motor. The drive system 10 may include a linear motor.

  The projection optical system PL irradiates the projection area PR with the exposure light EL. The projection region PR includes a position where the exposure light EL emitted from the projection optical system PL can be irradiated. The projection optical system PL projects an image of the pattern of the mask M at a predetermined projection magnification onto at least a part of the substrate P arranged in the projection region PR. In the present embodiment, the projection optical system PL is a reduction system. The projection magnification of the projection optical system PL is ¼. The projection magnification of the projection optical system PL may be 1/5 or 1/8. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. In the present embodiment, the optical axis of the projection optical system PL is parallel to the Z axis. Projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, or a catadioptric system that includes a reflective optical element and a refractive optical element. The projection optical system PL may form either an inverted image or an erect image.

  Projection optical system PL includes a plurality of optical elements. The plurality of optical elements of the projection optical system PL are held by the lens barrel 11. The plurality of optical elements of the projection optical system PL includes a terminal optical element 13 having an exit surface 12 from which the exposure light EL is emitted. The last optical element 13 is an optical element closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL. The exit surface 12 emits the exposure light EL toward the image plane of the projection optical system PL.

  The projection region PR includes a position where the exposure light EL emitted from the emission surface 12 can be irradiated. In the present embodiment, the emission surface 12 faces the −Z direction. The exposure light EL emitted from the emission surface 12 travels in the −Z direction. The exit surface 12 is parallel to the XY plane. The exit surface 12 facing the −Z direction may be a convex surface or a concave surface. The exit surface 12 may be inclined with respect to the XY plane, or may include a curved surface. In the present embodiment, the optical axis of the last optical element 13 is parallel to the Z axis.

  With respect to the direction parallel to the optical axis of the last optical element 13, the exit surface 12 side is the -Z side, and the entrance surface side is the + Z side. Regarding the direction parallel to the optical axis of the projection optical system PL, the image plane side of the projection optical system PL is the −Z side, and the object plane side of the projection optical system PL is the + Z side.

  The substrate stage 2 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated while holding the substrate P. The measurement stage 3 is movable in an XY plane including a position (projection region PR) where the exposure light EL from the emission surface 12 can be irradiated with the measurement member (measuring instrument) C mounted. Each of the substrate stage 2 and the measurement stage 3 is movable on the guide surface 14G of the base member 14. The guide surface 14G and the XY plane are substantially parallel.

The substrate stage 2 includes, for example, a first holding unit that releasably holds the substrate P as disclosed in US Patent Application Publication No. 2007/0177125, US Patent Application Publication No. 2008/0049209, and the like. It has a 2nd holding part which is arranged around a holding part and holds cover member T so that release is possible. The first holding unit holds the substrate P so that the surface (upper surface) of the substrate P and the XY plane are substantially parallel to each other. The upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit are arranged substantially in the same plane.
Regarding the Z-axis direction, the distance between the emission surface 12 and the upper surface of the substrate P held by the first holding portion is substantially the same as the distance between the emission surface 12 and the upper surface of the cover member T held by the second holding portion. equal. Note that the distance between the emission surface 12 and the upper surface of the substrate P is substantially equal to the distance between the emission surface 12 and the upper surface of the cover member T with respect to the Z-axis direction. And the distance between the emission surface 12 and the upper surface of the cover member T is, for example, within 10% of the distance (so-called working distance) between the emission surface 12 and the upper surface of the substrate P when the substrate P is exposed. Including. Note that the upper surface of the substrate P held by the first holding unit and the upper surface of the cover member T held by the second holding unit may not be arranged in the same plane. For example, the position of the upper surface of the substrate P and the position of the upper surface of the cover member T may be different with respect to the Z-axis direction. For example, there may be a step between the upper surface of the substrate P and the upper surface of the cover member T. Note that the upper surface of the cover member T may be inclined with respect to the upper surface of the substrate P, or the upper surface of the cover member T may include a curved surface.

  The substrate stage 2 and the measurement stage 3 are moved by the operation of a drive system 15 including a planar motor as disclosed in US Pat. No. 6,452,292, for example. The drive system 15 includes a mover 2 </ b> C disposed on the substrate stage 2, a mover 3 </ b> C disposed on the measurement stage 3, and a stator 14 </ b> M disposed on the base member 14. Each of the substrate stage 2 and the measurement stage 3 can move in six directions on the guide surface 14G in the X axis, Y axis, Z axis, θX, θY, and θZ directions by the operation of the drive system 15. Note that the drive system 15 may not include a planar motor. The drive system 15 may include a linear motor.

  The measurement system 4 includes an interferometer system. The interferometer system includes a unit that irradiates the measurement mirror of the substrate stage 2 and the measurement mirror of the measurement stage 3 with measurement light and measures the positions of the substrate stage 2 and the measurement stage 3. Note that the measurement system may include an encoder system as disclosed in, for example, US Patent Application Publication No. 2007/0288121. Note that the measurement system 4 may include only one of the interferometer system and the encoder system.

  When executing the exposure process of the substrate P or when executing a predetermined measurement process, the control device 7 determines the substrate stage 2 (substrate P) and the measurement stage 3 (measurement member) based on the measurement result of the measurement system 4. The position control of C) is executed.

  FIG. 2 is a view showing a part of the exposure apparatus EX. The liquid immersion member 5 forms a liquid immersion region LS of the liquid LQ1 on an object that can move below the last optical element 13. An object that can move below the last optical element 13 can move in the XY plane including the position facing the exit surface 12. The object can face the emission surface 12 and can be arranged in the projection region PR. The object is movable below the liquid immersion member 5 and can be opposed to the liquid immersion member 5. In the present embodiment, the object is at least one of the substrate stage 2 (for example, the cover member T of the substrate stage 2), the substrate P held on the substrate stage 2 (first holding unit), and the measurement stage 3. Including one.

  In the following description, it is assumed that the object is the substrate P. However, the object may be at least one of the substrate stage 2 and the measurement stage 3, or an object different from the substrate P, the substrate stage 2, and the measurement stage 3. But you can.

  In the exposure of the substrate P, the immersion region LS is formed so that the optical path K of the exposure light EL between the exit surface 12 of the last optical element 13 and the substrate P is filled with the liquid LQ1. When the substrate P is irradiated with the exposure light EL, the liquid immersion region LS is formed so that only a partial region of the surface of the substrate P including the projection region PR is covered with the liquid LQ1. At least a part of the liquid immersion region LS is formed in a space between the last optical element 13 and the substrate P (object). At least a part of the liquid immersion region LS is formed in a space between the liquid immersion member 5 and the substrate P (object).

  The liquid immersion area LS may be formed so as to straddle two objects. For example, the liquid immersion region LS may be formed so as to straddle the cover member T and the substrate P of the substrate stage 2. The liquid immersion area LS may be formed so as to straddle the substrate stage 2 and the measurement stage 3.

  The fluid supply system 6 includes a fluid supply device 21 that supplies the liquid LQ1 in the immersion area LS and a fluid supply device 22 that supplies the liquid LQ2 used for temperature adjustment of the projection optical system PL. In the present embodiment, both the liquid LQ1 and the liquid LQ2 contain water. The liquid LQ2 is, for example, pure water, and the liquid LQ1 is, for example, ultrapure water having an impurity concentration lower (higher purity) than that of the liquid LQ2.

  The fluid supply device 21 supplies the temperature-controlled liquid LQ1 to the liquid immersion member 5. The liquid LQ1 supplied to the liquid immersion member 5 is supplied to the liquid immersion region LS via the flow path 20 provided in the liquid immersion member 5 and the liquid supply port 24 provided in the liquid immersion member 5. The The liquid LQ1 in the liquid immersion region LS is recovered by the liquid recovery device 23 through the liquid recovery port 25 provided in the liquid immersion member 5 and the flow path 26 provided in the liquid immersion member 5.

  In FIG. 2, the liquid immersion member 5 has a lower surface 27 that faces an object that can move below the terminal optical element 13, and an inner surface 29 that faces a side surface 28 around the exit surface 12 of the terminal optical element 13. . For example, the liquid supply port 24 is provided on the inner surface 29 of the liquid immersion member 5, but one or two or more liquid supply ports 24 may be provided on the lower surface 27 of the liquid immersion member 5 or other portions. The liquid immersion member 5 may not be provided on the liquid immersion member 5. The liquid recovery port 25 is provided, for example, on the lower surface 27 of the liquid immersion member 5, but one or two or more liquid recovery ports 25 may be provided on the inner surface 29 of the liquid immersion member 5 and other portions. The liquid immersion member 5 may not be provided on the liquid immersion member 5.

  The fluid supply device 22 sends the liquid LQ2 whose temperature has been adjusted to the holding member PLS that holds the plurality of optical elements of the projection optical system PL. In the present embodiment, the holding member PLS includes at least a part of the lens barrel 11 of FIG. Heat can be transferred between the liquid LQ2 from the fluid supply device 22 and the optical element of the projection optical system PL via the holding member PLS. The fluid supply device 22 can adjust at least one of the temperature of the plurality of optical elements of the projection optical system PL and the temperature of the space between the optical elements. The fluid supply device 22 can directly or indirectly adjust the temperature of the terminal optical element 13 closest to the image plane of the projection optical system PL among the plurality of optical elements of the projection optical system PL.

  In the present embodiment, at least a part of the terminal optical element 13 in the projection optical system PL is in contact with the liquid LQ1 in the immersion area LS supplied from the fluid supply device 21. The fluid supply device 22 supplies a liquid LQ2 used for temperature adjustment of a member in contact with the liquid LQ1 supplied from the fluid supply device 21.

  In FIG. 2, the fluid supply device 22 supplies the liquid LQ <b> 2 whose temperature is adjusted to the liquid immersion member 5. In the present embodiment, the liquid LQ2 flows through the flow path 30 provided in the liquid immersion member 5. Heat exchange can be performed between the liquid LQ2 flowing through the flow path 30 and the liquid immersion member 5, and the fluid supply device 22 can adjust the temperature of the liquid immersion member 5. At least a part of the flow path 30 is provided, for example, inside the liquid immersion member 5, but may be a flow path inside the tube member in contact with the liquid immersion member 5. In the liquid immersion member 5, the flow path 30 through which the liquid LQ2 flows is provided so as not to merge with either the flow path 20 or the flow path 26 through which the liquid LQ1 flows. The liquid LQ2 flows outside the liquid immersion member 5 after flowing through the flow path 30 without being mixed with the liquid LQ1.

  In the present embodiment, at least a part of the liquid immersion member 5 is in contact with the liquid LQ <b> 1 in the liquid immersion region LS supplied from the fluid supply device 21. That is, the fluid supply device 22 supplies the liquid LQ2 used for temperature adjustment of the member in contact with the liquid LQ1 supplied from the fluid supply device 21. As described above, the fluid supply device 22 supplies a fluid used for temperature adjustment of at least one member in contact with the liquid LQ <b> 1 supplied from the fluid supply device 21.

  In FIG. 2, the substrate stage 2 includes a substrate holder 31 that holds the substrate P, and a temperature adjustment device 32 that can adjust the temperature of the substrate holder 31. The control device 7 shown in FIG. 1 can adjust the temperature of at least the substrate holder 31 in the substrate stage 2 by using the temperature adjustment device 32. The temperature adjustment device 32 can adjust the temperature of the substrate P held by the substrate holder 31 by adjusting the temperature of the substrate holder 31. The temperature of the substrate P held by the substrate holder 31 is substantially the same as the temperature of the substrate holder 31.

  In the present embodiment, the temperature adjustment device 32 includes a flow path 33 formed inside the substrate stage 2 and a fluid supply device 34 for flowing a temperature-controlled fluid through the flow path 33. The temperature of the substrate holder 31 (substrate P) is adjusted by the fluid flowing through the flow path 33. The temperature adjustment device 32 may not include the flow path 33 and the fluid supply device 34, and may include one or both of a heater that heats the substrate holder 31 and a cooler that cools the substrate holder 31. May be. The heater includes, for example, a Peltier element or a heater. The cooler includes, for example, a Peltier element.

  In the present embodiment, the substrate P (object) is carried into the substrate stage 2 by the transport device 35. The transport device 35 includes a holding member 36 that holds the substrate P, and a temperature adjustment device 37 that can adjust the temperature of the substrate P held by the holding member 36. The temperature adjusting device 37 is controlled by the control device 7 shown in FIG. 1, for example, and can adjust the temperature of the substrate P held by the holding member 36 to be substantially the same as the temperature of the substrate holder 31 of the substrate stage 2. .

  3 and 4 are diagrams showing a fluid supply system 6 according to the present embodiment. The fluid supply device 21 includes a temperature adjusting device 40 that can adjust the temperature of the liquid LQ1, a channel 41 that connects the temperature adjusting device 40 and the liquid immersion member 5, and a temperature that detects the temperature of the liquid LQ1 that flows through the channel 41. Sensor 42.

  The temperature adjusting device 40 is connected to the heat exchanger 44 through the pipe member 43a. The liquid LQ1 from the temperature adjusting device 40 is sent to the heat exchanger 44 through the flow path inside the tube member 43a. The heat exchanger 44 has a flow path 44a provided therein. The liquid LQ1 from the tube member 43a flows through the flow path 44a of the heat exchanger 44. The heat exchanger 44 is connected to the liquid immersion member 5 through the pipe member 43b. The liquid LQ1 that has flowed through the flow path 44a of the heat exchanger 44 is sent to the liquid immersion member 5 through the flow path inside the pipe member 43b. The liquid LQ1 sent to the liquid immersion member 5 passes through the flow path 20 inside the liquid immersion member 5 and is supplied to the liquid immersion region.

  The temperature sensor 42 is provided in the pipe member 43b so that heat can be transmitted between the temperature sensor 42 and the pipe member 43b. The temperature sensor 42 detects the temperature of the liquid LQ1 flowing through the tube member 43b and supplies the result to the temperature adjustment device 40. The temperature adjustment device 40 can bring the temperature of the liquid LQ1 supplied from the outside of the temperature adjustment device 40 close to a desired value by using, for example, at least one of a heater and a cooler. The control unit of the temperature adjusting device 40 receives the set value of the temperature of the liquid LQ1 from the control device 7, and at least one of the heater and the cooler so that the temperature of the liquid LQ1 detected by the temperature sensor 42 approaches the set value. To control.

  In the present embodiment, the flow path 41 connecting the temperature adjusting device 40 and the liquid immersion member 5 includes a flow path inside the pipe member 43a, a flow path 44a inside the heat exchanger 44, and a flow inside the pipe member 43b. Including roads. The pipe member 43a, the heat exchanger 44, and the pipe member 43b are covered with a heat insulating member, and heat is prevented from being transmitted between the outside of these members and the liquid LQ1 flowing through the flow path 41. At least a part of the pipe member 43a, the heat exchanger 44, and the pipe member 43b may not be covered with the heat insulating member.

  The fluid supply device 22 includes a temperature adjusting device 45 that can adjust the temperature of the liquid LQ2, a flow path 46 that connects the temperature adjusting device 45 and the holding member PLS of the projection optical system PL, and a temperature of the liquid LQ2 that flows through the flow path 46. And a flow path 48 that connects the temperature adjusting device 45 and the liquid immersion member 5.

  The temperature adjusting device 45 is connected to the holding member PLS of the projection optical system PL via the tube member 49a. The flow path 46 includes a flow path inside the pipe member 49a, and the liquid LQ2 from the temperature adjustment device 45 is sent to the holding member PLS through the flow path inside the pipe member 49a. The liquid LQ2 sent to the holding member PLS flows through the flow path provided in the holding member PLS and is used for temperature adjustment of the optical elements of the projection optical system PL, and then is discharged from the flow path provided in the holding member PLS. Is done.

  The temperature sensor 47 is provided in the pipe member 49a so that heat can be transmitted between the temperature sensor 47 and the pipe member 49a. The temperature sensor 47 detects the temperature of the liquid LQ2 flowing through the tube member 49a and supplies the result to the temperature adjustment device 45. The temperature adjustment device 45 can bring the temperature of the liquid LQ2 delivered from the temperature adjustment device 45 close to a desired value using at least one of a heater and a cooler, for example. The control unit of the temperature adjusting device 45 receives the set value of the temperature of the liquid LQ2 from the control device 7, and at least one of the heater and the cooler so that the temperature of the liquid LQ2 detected by the temperature sensor 47 approaches the set value. To control.

  The temperature adjusting device 45 is connected to the valve 50 via a pipe member 49b branched from the pipe member 49a. The valve 50 includes, for example, a gas operated valve that opens and closes the flow path by gas pressure, but may include an electromagnetic valve that operates by electromagnetic force and a valve that operates by other force. A gas operated valve is less likely to be a heat source than an electromagnetic valve or the like.

  In the present embodiment, the valve 50 is a three-way valve having three ports. The pipe member 49 b is connected to the first port 50 a of the valve 50. The valve 50 has a first state in which the liquid LQ2 flowing into the first port 50a does not flow into either the second port 50b or the third port 50c, and the liquid LQ2 flowing into the first port 50a is in the second state. A second state in which the liquid LQ2 flows into the third port 50c and does not flow into the third port 50c, and a third state in which the liquid LQ2 flowing into the first port 50a flows into the third port 50c and does not flow into the second port 50b. Can be switched. FIG. 3 illustrates the flow of the second state, and FIG. 4 illustrates the flow of the third state.

  The second port 50b of the valve 50 is connected to the liquid immersion member 5 via a pipe member 49c. As shown in FIG. 3, the liquid LQ2 from the second port 50b is sent to the liquid immersion member 5 through the flow path inside the tube member 49c. The liquid LQ2 sent to the liquid immersion member 5 flows through the flow path 30 provided in the liquid immersion member 5, is used for temperature adjustment of the liquid immersion member 5, and is then discharged from the flow path 30.

  The third port 50c of the valve 50 is connected to the heat exchanger 44 via a pipe member 49d. As shown in FIG. 4, the heat exchanger 44 includes a flow path 44b provided therein. The liquid LQ2 from the third port 50c is sent to the heat exchanger 44 through the flow path inside the tube member 49d. In the heat exchanger 44, the flow path 44b through which the liquid LQ2 flows does not merge with the flow path 44a through which the liquid LQ1 flows. That is, in the heat exchanger 44, the liquid LQ2 can exchange heat with the liquid LQ1 flowing through the flow path 44a while flowing through the flow path 44b without being mixed with the liquid LQ1. The liquid LQ2 that has flowed through the flow path 44b of the heat exchanger 44 is discharged from the heat exchanger 44.

  In the present embodiment, the heat exchanger 44 is connected to the liquid immersion member 5 via a pipe member 49e. The liquid LQ2 discharged from the heat exchanger 44 is sent to the liquid immersion member 5 through the flow path inside the tube member 49e. The flow path inside the pipe member 49e merges with the flow path inside the pipe member 49c connected to the second port 50b of the valve 50. In the present embodiment, the pipe member 49c and the pipe member 49e are both connected to the first end of the pipe member 49f, and the second end of the pipe member 49f is connected to the flow path 30 of the liquid immersion member 5. . As described above, a part of the flow path from the heat exchanger 44 to the liquid immersion member 5 is common to a part of the flow path from the second port 50 b of the valve 50 to the liquid immersion member 5.

  The fluid supply device 22 in the present embodiment is a circulation system. The fluid supply device 22 collects the liquid LQ2 sent from the temperature adjustment device 45, adjusts the temperature of the collected liquid LQ2 by the temperature adjustment device 45, and then supplies it again. In the present embodiment, the liquid LQ2 that has flowed through the flow path of the holding member PLS of the projection optical system PL is sent to the temperature adjusting device 45 through the flow path inside the tube member 49g connected to the holding member PLS. In the present embodiment, the liquid LQ <b> 2 that has flowed through the flow path 30 of the liquid immersion member 5 passes through the flow path inside the tube member 49 h connected to the liquid immersion member 5 and is sent to the temperature adjustment device 45. The flow path inside the pipe member 49h is connected to the temperature adjustment device 45 after joining the flow path inside the pipe member 49g, for example, but is connected to the temperature adjustment device 45 without joining the flow path inside the pipe member 49g. 45 may be connected.

  In the present embodiment, the flow rate controller 51 is provided in the pipe member 49h. The flow controller 51 includes, for example, a mass flow controller having a solenoid valve. The flow rate controller 51 can control the flow rate of the liquid LQ2 flowing inside the tube member 49h. The flow controller 51 can be a heat source that changes the temperature of the liquid LQ2, but is provided on the downstream side of the liquid immersion member 5, and thus hardly affects the temperature of the liquid LQ2 when flowing through the liquid immersion member 5. .

  In the present embodiment, the flow rate controller 51 adjusts the flow rate of the liquid LQ2 flowing inside the tube member 49h under the control of the control device 7. The flow rate controller 51 can control the flow rate of the liquid LQ2 sent to the temperature sensor 52 (described later) without passing through the heat exchanger 44 in the second state of FIG. Further, the flow rate controller 51 can control the flow rate of the liquid LQ2 sent to the temperature sensor 52 via the heat exchanger 44 in the third state of FIG.

  In the present embodiment, the fluid supply system 6 includes a temperature sensor 52 that detects the temperature of the liquid LQ2 flowing through the tube member 49f. The temperature sensor 52 is provided in a common part between the flow path from the heat exchanger 44 to the liquid immersion member 5 and the flow path from the second port 50 b of the valve 50 to the liquid immersion member 5. The temperature sensor 52 is provided on the tube member 49f so that heat can be transmitted between the temperature sensor 52 and the tube member 49f.

  In the second state shown in FIG. 3, the liquid LQ2 from the temperature adjusting device 45 is sent to the valve 50, and then the temperature of the liquid LQ2 passes through the flow path inside the tube member 49c and the flow path inside the tube member 49f. It is sent to the sensor 52. That is, in the second state, the temperature sensor 52 detects the temperature of the liquid LQ2 supplied without passing through the heat exchanger 44.

  In the third state shown in FIG. 4, after the liquid LQ2 from the temperature adjusting device 45 is sent to the valve 50, the flow path inside the pipe member 49d, the flow path 44b inside the heat exchanger 44, and the pipe It is sent to the temperature sensor 52 via the flow path inside the member 49e and the flow path inside the pipe member 49f. That is, in the third state, the temperature sensor 52 detects the temperature of the liquid LQ2 supplied via the heat exchanger 44.

  In the present embodiment, the valve 50 has a flow path for sending the liquid LQ2 to the temperature sensor 52 without passing through the heat exchanger 44 and a flow path for sending the liquid LQ2 to the temperature sensor 52 via the heat exchanger 44. Switch. The control device 7 can switch between the second state in FIG. 3 and the third state in FIG. 4 by controlling the valve 50. The control device 7 can acquire the result of the temperature sensor 52 detecting the temperature of the liquid LQ2 that does not pass through the heat exchanger 44 by setting the second state. The control device 7 can acquire the result of the temperature sensor 52 detecting the temperature of the liquid LQ2 that has passed through the heat exchanger 44 by setting the third state.

  In the present embodiment, the pipe members 49a to 49f are covered with a heat insulating member, and heat is prevented from being transmitted between the outside of these members and the liquid LQ2 flowing through the flow path. At least a part of the pipe member 49a to the pipe member 49f may not be covered with the heat insulating member. For example, at least a part of the member forming the flow path from the temperature adjusting device to the temperature sensor is covered with the heat insulating member. It does not have to be. Further, at least a part of the pipe member 49g and the pipe member 49h may be covered with the heat insulating member or may not be covered with the heat insulating member.

  Next, the fluid supply method according to the present embodiment will be described based on the operation of the fluid supply system 6. The control device 7 shown in FIG. 3 controls the temperature adjusting device 45 of the fluid supply system 6 so that the projection optical system PL is maintained at a preset temperature at least during the exposure operation. The temperature of the liquid LQ2 sent to is controlled. Further, the control device 7 controls the valve 50 so as to be in the second state of FIG. 3 during the exposure operation, and sends a part of the liquid LQ2 from the temperature adjusting device 45 to the liquid immersion member 5. Since the liquid LQ2 from the temperature adjusting device 45 is sent to the projection optical system PL and the liquid immersion member 5, the temperature of the liquid immersion member 5 is substantially the same as the temperature of the projection optical system PL.

  Further, the control device 7 controls the temperature adjusting device 40 of the fluid supply system 6 so that the liquid LQ1 supplied to the liquid immersion region LS at least during the exposure operation is maintained at a preset temperature. Control the temperature of LQ1. The temperature of the liquid LQ1 delivered from the temperature adjustment device 40 is approximately the temperature of the terminal optical element 13 of the projection optical system PL that is temperature-adjusted by the liquid LQ2 and the temperature of the liquid LQ1 supplied to the liquid immersion area LS. Set to be the same. In the present embodiment, the exposure apparatus EX exposes the substrate P in a state where the temperature is adjusted so that the liquid LQ1 in contact with the terminal optical element 13 and the terminal optical element 13 are substantially the same. Therefore, the exposure apparatus EX can suppress the occurrence of exposure failure due to the temperature change of the projection optical system PL.

  By the way, the temperature sensor 42 capable of detecting the temperature of the liquid LQ1 supplied from the temperature adjusting device 40 is a temperature sensor different from the temperature sensor 47 and the temperature sensor 52 capable of detecting the temperature of the liquid supplied from the temperature adjusting device. is there. Such a plurality of temperature sensors may have different characteristics due to manufacturing errors, changes with time, and the like. When the difference in characteristics between the plurality of temperature sensors increases, an error may increase in the control of the temperature of the liquid whose temperature is adjusted based on the detection result of the temperature sensor. In the present embodiment, the fluid supply system 6 can detect a temperature difference between the temperature-adjusted liquid LQ1 and the temperature-adjusted liquid LQ2.

  Next, the operation of the fluid supply system 6 when detecting the temperature difference between the liquid LQ1 and the liquid LQ2 will be described. At least a part of this detection operation is executed, for example, during maintenance of the fluid supply system 6 (exposure apparatus EX).

  FIG. 5 is a flowchart showing the operation of the fluid supply system 6. In step S1 of FIG. 5, the flow path of the fluid supply system 6 is set to the second state of FIG. In step S1, the temperature adjusting device 45 supplies the temperature-adjusted liquid LQ2 to the temperature sensor 52 without passing through the heat exchanger 44. In step S2, the temperature sensor 52 does not pass through the heat exchanger 44. Detect the temperature. In step S3, the flow path of the fluid supply system 6 is set to the third state in FIG. In step S <b> 3, the temperature adjustment device 40 supplies the temperature-adjusted liquid LQ <b> 1 to the heat exchanger 44. In step S <b> 3, the temperature adjustment device 45 passes the temperature-adjusted liquid LQ <b> 2 via the heat exchanger 44 in parallel with at least part of the supply of the liquid LQ <b> 1 to the heat exchanger 44 by the temperature adjustment device 40. Supply to temperature sensor 52. That is, in step S3, the temperature adjustment device 45 supplies the temperature-adjusted liquid LQ2 to the temperature sensor 52 via the heat exchanger 44 to which the temperature-adjusted liquid LQ1 is supplied. In step S4, the temperature sensor 52 detects the temperature of the liquid LQ2 that has passed through the heat exchanger 44 to which the temperature-adjusted liquid LQ1 is supplied.

  FIG. 6 is a diagram illustrating an example of a detection result of the temperature sensor 52. Here, it is assumed that the temperature of the liquid LQ1 supplied to the heat exchanger 44 is higher than the temperature of the liquid LQ2 supplied to the heat exchanger 44.

  In FIG. 6, the temperature T <b> 1 indicates the detection result of the temperature detected by the temperature sensor 52 in step S <b> 2 of FIG. 5, that is, the temperature of the liquid LQ <b> 2 that does not pass through the heat exchanger 44. The temperature T2 indicates a detection result of the temperature detected by the temperature sensor 52 in step S4 of FIG. 5, that is, the temperature of the liquid LQ2 via the heat exchanger 44 to which the liquid LQ1 is supplied.

  In Step S4, the liquid LQ2 flowing through the heat exchanger 44 can exchange heat with the liquid LQ1 flowing through the heat exchanger 44. Therefore, when the temperature of the liquid LQ1 supplied to the heat exchanger 44 is higher than the temperature of the liquid LQ2, the temperature of the liquid LQ2 after flowing through the heat exchanger 44 is the liquid LQ2 before flowing through the heat exchanger 44. Higher than the temperature. In the present embodiment, the temperature of the liquid LQ2 before flowing through the heat exchanger 44 is substantially the same as the temperature of the liquid LQ2 sent to the temperature sensor 52 without passing through the heat exchanger 44 in step S1. That is, when there is a temperature difference between the liquid LQ1 and the liquid LQ2 supplied to the heat exchanger 44, the temperature T2 detected by the temperature sensor 52 in step S4 is the temperature T1 detected by the temperature sensor 52 in step S2. And different. The control device 7 in the present embodiment controls the flow rate controller 51 of FIG. 4 to make the flow rate of the liquid LQ2 in the heat exchanger 44 smaller than the flow rate of the liquid LQ1 in step S3. Thereby, when there is a temperature difference between the liquid LQ1 and the liquid LQ2 supplied to the heat exchanger 44, the amount of change in the temperature of the liquid LQ2 flowing through the heat exchanger 44 increases, and the temperature detected by the temperature sensor 52 The difference between T1 and temperature T2 increases. Therefore, it becomes easy to detect a temperature difference between the liquid LQ1 and the liquid LQ2 supplied to the heat exchanger 44.

  As described above, the fluid supply system 6 determines whether the temperature-adjusted liquid LQ1 and the temperature-adjusted liquid LQ2 are based on the detection result of the temperature sensor 52 in step S2 and the detection result of the temperature sensor 52 in step S4. Information on temperature difference can be acquired.

  In the present embodiment, the temperature difference information regarding the temperature difference acquired by the fluid supply system 6 includes information on the presence or absence of a temperature difference between the liquid LQ1 and the liquid LQ2 supplied to the heat exchanger 44, and information on the value of the temperature difference. , Information on the estimated value of the temperature of the liquid LQ1 and the temperature of the liquid LQ2 supplied to the heat exchanger 44, information on the relative level relationship between the temperature of the liquid LQ1 and the temperature of the liquid LQ2 supplied to the heat exchanger 44 Including at least one.

  In the present embodiment, the control device 7 acquires at least a part of the temperature difference information based on the detection result of the temperature sensor 52. The control device 7 stores at least a part of the acquired temperature difference information in the storage device 8 of FIG.

  The control device 7 compares the first temperature detected by the temperature sensor 52 in step S2 with the second temperature detected by the temperature sensor 52 in step S4, and the liquid LQ1 supplied to the heat exchanger 44 and the liquid The presence or absence of a temperature difference from LQ2 can be determined. For example, the control device 7 determines whether or not the difference between the first temperature and the second temperature is less than a threshold value, and if this difference is less than the threshold value, there is substantially no temperature difference, and this difference May be determined that there is a temperature difference. Further, the control device 7 compares the first temperature and the second temperature to determine which of the liquid LQ1 and the liquid LQ2 supplied to the heat exchanger 44 is higher or lower. You may judge. Further, the control device 7 is supplied to the heat exchanger 44 based on the first temperature, the second temperature, the flow rate of the liquid LQ1 in the heat exchanger 44, the flow rate of the liquid LQ2 in the heat exchanger 44, and the like. An estimated value of the temperature difference between the liquid LQ1 and the liquid LQ2 may be calculated. Further, the control device determines the temperature and liquid of the liquid LQ1 supplied to the heat exchanger 44 based on the estimated value of the temperature difference between the liquid LQ1 and the liquid LQ2 supplied to the heat exchanger 44, the first temperature, and the like. An estimated value of at least one of the temperatures of LQ2 may be calculated.

  In the present embodiment, the control device 7 controls the temperature adjustment device 40 based on the temperature difference information. The control device 7 controls the temperature adjustment device 40 so that the temperature of the liquid LQ1 supplied from the temperature adjustment device 40 is substantially the same as the temperature of the liquid LQ2 supplied from the temperature adjustment device 45. The control device 7 controls the temperature adjustment device 40 so that the temperature of the liquid LQ1 supplied to the liquid immersion area LS is the same as the temperature of the member in contact with the liquid LQ.

  For example, the control device 7 controls the temperature adjustment device 40 so that the second temperature detected by the temperature sensor 52 in step S4 approaches the first temperature detected by the temperature sensor 52 in step S2. When the second temperature is higher than the first temperature as shown in FIG. 6, the temperature of the liquid LQ1 supplied from the temperature adjustment device 40 is higher than the temperature of the liquid LQ2 supplied from the temperature adjustment device 45. Presumed. In this case, the control device 7 controls the temperature adjustment device 40 so as to lower the temperature of the liquid LQ1 supplied from the temperature adjustment device 40. Further, when the second temperature is lower than the first temperature, it is assumed that the temperature of the liquid LQ1 supplied from the temperature adjustment device 40 is lower than the temperature of the liquid LQ2 supplied from the temperature adjustment device 45. Is done. In this case, the control device 7 controls the temperature adjustment device 40 so as to increase the temperature of the liquid LQ1 supplied from the temperature adjustment device 40. The controller 7 controls one of the temperature adjusting device 40 and the temperature adjusting device 45 so that the temperature of the liquid LQ1 supplied from the temperature adjusting device 40 is substantially the same as the temperature of the liquid LQ2 supplied from the temperature adjusting device 45. May be controlled only, or both may be controlled.

  In the present embodiment, one or both of the temperature sensor 42 and the temperature sensor 47 is calibrated based on information on the difference between the temperature of the liquid LQ1 detected by the temperature sensor 52 and the temperature of the liquid LQ2 detected by the temperature sensor 52. Is done. For example, the fluid supply system 6 controls the temperature of the liquid LQ1 by the temperature sensor 42 in a state where the detection result of the temperature of the liquid LQ1 by the temperature sensor 52 and the detection result of the temperature of the liquid LQ2 are substantially the same. To detect. The temperature sensor 42 is calibrated using, for example, the result of the temperature sensor 42 detecting the temperature of the liquid LQ1 and the result of the temperature sensor 52 detecting the temperature of the liquid LQ1. The control device 7 may calculate the correction coefficient used for the calibration using the result of the temperature sensor 42 detecting the temperature of the liquid LQ1 and the result of the temperature sensor 52 detecting the temperature of the liquid LQ1. Calibration may be performed automatically by the control device 7 or manually by an operator.

  Next, the temperature adjustment operation in the exposure apparatus EX will be described. FIG. 7 is a flowchart showing the temperature adjustment operation of the exposure apparatus EX. In step S <b> 10, the control device 7 adjusts the relative relationship between the temperature of the liquid LQ <b> 1 supplied from the temperature adjustment device 40 and the temperature of the liquid LQ <b> 2 supplied from the temperature adjustment device 45. The temperature of the supplied liquid LQ1 (immersion liquid) is adjusted to the temperature of the projection optical system PL. In step S11, the control device 7 controls the temperature adjusting device 32 in FIG. 2 to adjust the temperature of the substrate P (substrate stage 2) to the temperature of the immersion liquid set in step S10. In step S12, the control device 7 controls the chamber device 9 in FIG. 1, and adjusts the temperature of the space in which the substrate stage 2 is arranged to the temperature of the substrate stage 2 set in step S11. Further, the control device 7 controls the temperature adjusting device 37 of FIG. 2 to adjust the temperature of the holding member 36 that carries the substrate P into the substrate stage 2 to the temperature of the substrate stage 2 set in step S11.

  Next, a modified example will be described. FIGS. 8A and 8B are diagrams showing a schematic configuration of a fluid supply system 6 according to a modification. In the third state shown in FIG. 8A, the temperature adjustment device 40 supplies the temperature-adjusted liquid LQ1 to the heat exchanger 44. The liquid LQ1 that has passed through the heat exchanger 44 is supplied to the liquid immersion region via the liquid immersion member 5, for example, as in FIG. The temperature sensor 42 can detect the temperature of the liquid LQ1 from the heat exchanger 44. Further, the temperature adjustment device 45 can supply the temperature-adjusted liquid LQ2 to the heat exchanger 44. The liquid LQ2 supplied to the heat exchanger 44 is sent to the liquid immersion member 5 and the projection optical system PL, for example, as in FIG.

  In the fourth state shown in FIG. 8B, the fluid supply system 6 stops the supply of the liquid LQ2 from the temperature adjustment device 45 to the heat exchanger 44. The fluid supply system 6 stops the supply of the liquid LQ2 from the temperature adjustment device 45 to the heat exchanger 44, for example, by controlling a valve provided in a flow path connecting the temperature adjustment device 45 and the heat exchanger 44. .

  In the third state of FIG. 8A, the temperature sensor 42 in the present modification detects the temperature of the liquid LQ1 that has passed through the heat exchanger 44 to which the temperature-adjusted liquid LQ2 is supplied. Further, the temperature sensor 42 detects the temperature of the liquid LQ1 that has passed through the heat exchanger 44 to which the liquid LQ2 is not supplied in the fourth state of FIG. 8B. In this fluid supply system 6, when there is a temperature difference between the temperature-adjusted liquid LQ1 and the temperature-adjusted liquid LQ2, the temperature detected by the temperature sensor 42 in the third state and the temperature sensor 42 in the fourth state Will differ from the detected temperature. Thus, the fluid supply system 6 according to the present modification can detect a temperature difference between the temperature-adjusted liquid LQ1 and the temperature-adjusted liquid LQ2 based on the detection result of the temperature sensor 42.

In this modification, the temperature sensor 52 of FIG. 3 may be provided or may not be provided. Moreover, the flow path which sends the liquid LQ2 from the temperature adjusting device 45 to the liquid immersion member 5 without passing through the heat exchanger 44 may be provided or may not be provided. Further, the flow path for sending the liquid LQ2 from the temperature adjusting device 45 to the projection optical system PL may be branched from the flow path between the temperature adjusting device 45 and the heat exchanger 44, as in FIG. The flow path downstream of the heat exchanger 44 may be branched from the flow path to the liquid immersion member 5.
Further, in this modification, in the state of FIG. 8A, the detection result of the temperature sensor 42 may or may not be used for control of the temperature adjustment device 40 as in the case of FIG. In the state of FIG. 8A, when the detection result of the temperature sensor 42 is used for control of the temperature adjusting device 40, the liquid LQ2 to the heat exchanger 44 is not changed before the state of FIG. Before stopping the supply, the control of the temperature adjustment device 40 based on the detection result of the temperature sensor 42 may be stopped. Thereby, the temperature of the liquid LQ1 (liquid LQ2) when the liquid LQ2 is supplied to the heat exchanger 44 (state of FIG. 8A) and the supply of the liquid LQ2 to the heat exchanger 44 are stopped. The temperature sensor 42 can accurately detect the difference from the temperature of the liquid LQ1 (state of FIG. 8B). Alternatively, in the state of FIG. 8A, when the detection result of the temperature sensor 42 is used for the control of the temperature adjustment device 40 so that the detection result of the temperature sensor 42 becomes a desired value, to the heat exchanger 44. The temperature of the liquid LQ1 (liquid LQ2) when the liquid LQ2 is supplied (state of FIG. 8A) and the supply of the liquid LQ2 to the heat exchanger 44 are stopped (state of FIG. 8B) ) May be estimated based on a change in the operating state of at least one of the heater and the cooler of the temperature adjustment device 40.

Second Embodiment
A second embodiment will be described. 9 and 10 are diagrams showing the fluid supply system 6 according to the present embodiment. In the present embodiment, the same reference numerals are assigned to configurations corresponding to the above-described embodiment, and the description thereof is simplified or omitted.

  In the present embodiment, the temperature adjustment device 40 is connected to the liquid immersion member 5 via a pipe member 55a. The liquid LQ1 from the temperature adjustment device 40 is sent to the liquid immersion member 5 through the flow path inside the tube member 55a, and is supplied to the liquid immersion region via the liquid immersion member 5. The temperature sensor 42 detects the temperature of the liquid LQ1 flowing through the flow path inside the tube member 55a.

  In the present embodiment, the temperature adjustment device 45 is connected to the holding member PLS of the projection optical system PL via the tube member 55b. The liquid LQ2 from the temperature adjustment device 45 is sent to the holding member PLS through the flow path inside the tube member 55b, and is used for temperature adjustment of the projection optical system PL. The temperature sensor 47 detects the temperature of the liquid LQ2 flowing through the flow path inside the tube member 55b. A tube member 55c that connects the tube member 55b and the liquid immersion member 5 is connected to the tube member 55b. The tube member 55c is connected to the tube member 55b between the temperature sensor 47 and the holding member PLS. A part of the liquid LQ2 from the temperature adjusting device 45 is sent to the liquid immersion member 5 through the flow path inside the pipe member 55c and used for temperature adjustment of the liquid immersion member 5.

  The fluid supply system 6 includes a pipe member 55d that connects a flow path from the temperature sensor 42 to the liquid immersion member 5 and a flow path from the temperature adjustment device 45 to the temperature sensor 47. The pipe member 55d includes a pipe member 55d. A valve for opening and closing the inner flow path is provided. This valve is, for example, at least one of a valve provided at the pipe member 55d, a three-way valve provided at a branch point between the pipe member 55a and the pipe member 55d, and a three-way valve provided at a branch point between the pipe member 55b and the pipe member 55d. Including one.

  FIG. 9 shows a fifth state in which the flow path inside the pipe member 55d is closed. In the fifth state, the liquid LQ1 from the temperature adjustment device 40 is suppressed or prevented from flowing into the tube member 55b via the tube member 55d. Further, in the fifth state, the liquid LQ2 from the temperature adjusting device 45 is suppressed or prevented from flowing into the tube member 55a via the tube member 55d.

  FIG. 10 is a diagram showing a sixth state in which the flow path inside the pipe member 55d is opened. In the sixth state, the liquid LQ1 from the temperature adjustment device 40 is sent to the temperature sensor 42 and then sent to the temperature sensor 47 through the flow path inside the pipe member 55d. The liquid LQ1 sent to the temperature sensor 47 is discharged from the drain port connected to the flow path between the temperature sensor 47 and the holding member PLS.

  The temperature sensor 47 detects the temperature of the liquid LQ2 from the temperature adjustment device 45 in the fifth state of FIG. Further, the temperature sensor 47 detects the temperature of the liquid LQ1 from the temperature adjustment device 40 in the sixth state of FIG. That is, the temperature sensor 47 detects the temperature of the temperature-adjusted liquid LQ1, and detects the temperature of the temperature-adjusted liquid LQ2.

  In the fluid supply system 6, when there is a temperature difference between the temperature-adjusted liquid LQ1 and the temperature-adjusted liquid LQ2, the temperature of the liquid LQ2 detected by the temperature sensor 47 in the fifth state and the temperature in the sixth state The temperature of the liquid LQ1 detected by the sensor 47 is different. Thus, the fluid supply system 6 can detect the temperature difference between the temperature-adjusted liquid LQ1 and the temperature-adjusted liquid LQ2 based on the detection result of the temperature sensor 47.

  In the present embodiment, one or both of the temperature adjustment device 40 and the temperature adjustment device 45 is based on information on the temperature difference between the temperature of the liquid LQ2 detected by the temperature sensor 47 and the temperature of the liquid LQ1 detected by the temperature sensor 47. Controlled. For example, the control device 7 illustrated in FIG. 1 controls the temperature adjustment device 40 so that the temperature of the liquid LQ1 detected by the temperature sensor 47 approaches the temperature of the liquid LQ2 detected by the temperature sensor 47.

  By the way, the temperature sensor 42 detects the temperature of the liquid LQ1 from the temperature adjusting device 40 in the fifth state of FIG. Further, the temperature sensor 47 detects the temperature of the liquid LQ1 from the temperature adjustment device 40 in the sixth state of FIG. That is, the fluid supply system 6 detects the temperature of the temperature-adjusted liquid LQ1 with the temperature sensor 42 and the temperature sensor 47, respectively. In the fluid supply system 6, at least one of the temperature sensor 42 and the temperature sensor 47 includes the temperature of the liquid LQ1 detected by the temperature sensor 42 in the fifth state and the temperature of the liquid LQ1 detected by the temperature sensor 47 in the sixth state. Calibration is performed using the temperature difference information.

  In the present embodiment, the control device 7 in FIG. 1 uses the detection result of the temperature sensor 42 so that the temperature of the liquid LQ1 detected by the temperature sensor 42 is the same as the temperature of the liquid LQ1 detected by the temperature sensor 47. At least one of the temperature sensors 47 is corrected. After the correction, the control device 7 controls the temperature adjustment device 40 so that the temperature of the liquid LQ1 detected by the temperature sensor 47 approaches the temperature of the liquid LQ2 detected by the temperature sensor 47.

  In the above embodiment, the fluid supply system 6 supplies the liquid LQ1 and the liquid LQ2, and the liquid LQ1 and the liquid LQ2 are both water and have different purity, but the liquid LQ1 and the liquid LQ2 have different purity. It may be the same, and at least a part of the flow path of the liquid LQ1 may merge with the flow path of the liquid LQ2. For example, in the liquid immersion member 5 of FIG. 2, the flow path 26 through which the liquid LQ1 recovered from the liquid immersion area LS passes may merge with the flow path 30 through which the liquid LQ2 passes, and is recovered from the liquid immersion area LS. At least a part of the liquid LQ1 may be collected through the flow path 30, or may be used as the liquid LQ2 in the circulating fluid supply device 22. The composition of the liquid LQ1 may be different from that of the liquid LQ2, for example, one main component of the liquid LQ1 and the liquid LQ2 may be water and the other main component may be a substance different from water. .

  In the above embodiment, the fluid supply system 6 supplies the liquid LQ1 and the liquid LQ2, but may supply a fluid in addition to the liquid LQ1 and the liquid LQ2, or one of the liquid LQ1 and the liquid LQ2 or It is not necessary to supply both. The fluid supply system 6 may supply a fluid used for adjusting the temperature of the substrate stage 2. The fluid supply system 6 supplies the first liquid to the first liquid immersion area, and supplies the second liquid to the second liquid immersion area having a position different from that of the first liquid immersion area. A temperature difference between the liquid and the second liquid may be detected.

  The fluid supply system 6 may supply a gas blown around the immersion area LS and detect a temperature difference between this gas and another fluid. This gas may be used to confine the liquid in the immersion area LS, or to control the environment (eg, including at least one of temperature, humidity, and pressure) around the immersion area LS. It may be used. The plurality of fluids supplied by the fluid supply system 6 includes at least one of a liquid and a gas, may include a mixed phase fluid including a solid, and may include a sol or gel fluid.

  In the above embodiment, the fluid supply device 22 supplies the temperature-adjusted liquid LQ2 to the projection optical system PL and supplies the temperature-adjusted liquid LQ2 to the liquid immersion member 5, but the temperature is adjusted. The liquid LQ2 may not be supplied to at least one of the projection optical system PL and the liquid immersion member 5, or the liquid LQ2 may be supplied to another member of the projection optical system PL and the liquid immersion member 5. The first supply device that supplies the temperature-adjusted fluid to the projection optical system PL may be a device different from the second supply device that supplies the temperature-adjusted fluid to the liquid immersion member 5. The system 6 may detect a temperature difference between the fluid supplied by the first supply device and the fluid supplied by the second supply device. The first supply device may supply liquid to the first member instead of the projection optical system PL. This second supply device may supply liquid to the second member instead of the liquid immersion member 5.

  At least a part of the temperature difference detection operation by the fluid supply system 6 may be executed during the exposure operation of the exposure apparatus EX. For example, the fluid supply system 6 uses the temperature sensor 52 to detect at least one of the temperature of the liquid LQ2 that has passed through the heat exchanger 44 and the temperature of the liquid LQ2 that has not passed through the heat exchanger 44 during exposure of the exposure apparatus EX. Also good. The fluid supply system 6 may detect the temperature of the liquid LQ2 via the heat exchanger 44 before or after detecting the temperature of the liquid LQ2 that does not pass through the heat exchanger 44. In the above embodiment, the temperature sensor that detects the temperature of the liquid LQ1 or the liquid LQ2 detects the temperature without contacting the liquid to be measured, but may detect the temperature by contacting the liquid to be detected.

  In the third state of FIG. 4, a part of the temperature-adjusted liquid LQ2 is sent to the temperature sensor 52 via the heat exchanger 44, and in parallel, the other part of the temperature-adjusted liquid LQ2 is However, when the liquid LQ2 is sent to the temperature sensor 52 via the heat exchanger 44, the liquid LQ2 does not have to be sent to the projection optical system PL.

  The fluid supply system 6 may include a circulation system that collects at least a part of the supplied fluid and supplies it again, or may include a non-circulation system that does not collect the supplied fluid.

  In the valve 50, when the liquid LQ2 flows through one port of the second port 50b and the third port 50c, the liquid LQ2 does not flow through the other port, but the liquid LQ2 passes through the other port. May flow. Further, the valve 50 may have a variable ratio between the flow rate of the liquid LQ2 from the second port 50b and the flow rate of the liquid LQ2 from the third port 50c.

  In each of the above-described embodiments, the control device 7 includes a computer system including a CPU and the like. Further, the control device 7 includes an interface capable of executing communication between the computer system and an external device. The storage device 8 includes, for example, a memory such as a RAM, a recording medium such as a hard disk and a CD-ROM. The storage device 8 is installed with an operating system (OS) for controlling the computer system, and stores a program for controlling the exposure apparatus EX.

  An input device that can input an input signal may be connected to the control device 7. The input device includes an input device such as a keyboard and a mouse, or a communication device that can input data from an external device. Further, a display device such as a liquid crystal display may be provided.

  Various kinds of information including programs recorded in the storage device 8 can be read by the control device (computer system) 7. In the storage device 8, immersion exposure is performed in which the control device 7 exposes the substrate with the exposure light through the liquid filled in the optical path of the exposure light between the exit surface of the optical member from which the exposure light is emitted and the substrate. A program for executing control of the apparatus is recorded.

  The program recorded in the storage device 8 may cause the control device 7 to execute control for executing at least one process of the exposure apparatus EX. When the program stored in the storage device 8 is read into the control device 7, the various devices of the exposure apparatus EX such as the substrate stage 2, the measurement stage 3, and the liquid immersion member 5 cooperate with each other in the liquid immersion region. Various processes such as immersion exposure of the substrate P are performed in a state where the LS is formed.

  In each of the above-described embodiments, the optical path K on the exit surface 12 side (image surface side) of the terminal optical element 13 of the projection optical system PL is filled with the liquid LQ1, but the projection optical system PL is, for example, an international The projection optical system in which the optical path on the incident side (object surface side) of the last optical element 13 is also filled with the liquid LQ1 as disclosed in the pamphlet of the publication No. 2004/019128.

  In each of the above-described embodiments, the liquid LQ1 is water, but a liquid other than water may be used. The liquid LQ1 is transmissive to the exposure light EL, has a high refractive index with respect to the exposure light EL, and forms a film such as a photosensitive material (photoresist) that forms the surface of the projection optical system PL or the substrate P. A stable material is preferred. For example, the liquid LQ1 may be a fluorinated liquid such as hydrofluoroether (HFE), perfluorinated polyether (PFPE), or fomblin oil. Further, the liquid LQ1 may be various fluids such as a supercritical fluid.

  In each of the above-described embodiments, the substrate P includes a semiconductor wafer for manufacturing a semiconductor device. For example, the substrate P is used in a glass substrate for a display device, a ceramic wafer for a thin film magnetic head, or an exposure apparatus. A mask or reticle master (synthetic quartz, silicon wafer) or the like may also be included.

  In each of the above-described embodiments, the exposure apparatus EX is a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously. However, for example, a step-and-repeat projection exposure apparatus (stepper) that performs batch exposure of the pattern of the mask M while the mask M and the substrate P are stationary and sequentially moves the substrate P stepwise may be used.

  In addition, the exposure apparatus EX transfers a reduced image of the first pattern onto the substrate P using the projection optical system while the first pattern and the substrate P are substantially stationary in the step-and-repeat exposure. Thereafter, with the second pattern and the substrate P substantially stationary, an exposure apparatus (stitch method) that collectively exposes a reduced image of the second pattern on the substrate P by partially overlapping the first pattern using a projection optical system. (Batch exposure apparatus). Further, the stitch type exposure apparatus may be a step-and-stitch type exposure apparatus in which at least two patterns are partially overlapped and transferred on the substrate P, and the substrate P is sequentially moved.

  Further, the exposure apparatus EX combines two mask patterns as disclosed in, for example, US Pat. No. 6,611,316 on the substrate via the projection optical system, and 1 on the substrate by one scanning exposure. An exposure apparatus that double-exposes two shot areas almost simultaneously may be used. Further, the exposure apparatus EX may be a proximity type exposure apparatus, a mirror projection aligner, or the like.

  In each of the above-described embodiments, the exposure apparatus EX is a twin stage type having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796, and the like. The exposure apparatus may be used. For example, as shown in FIG. 11, when the exposure apparatus EX includes two substrate stages 2001 and 2002, an object that can be arranged to face the emission surface 12 is one substrate stage and one substrate stage. At least one of the substrate held by the first holding unit, the other substrate stage, and the substrate held by the first holding unit of the other substrate stage.

  The exposure apparatus EX may be an exposure apparatus that includes a plurality of substrate stages and measurement stages.

  The exposure apparatus EX may be an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on the substrate P, an exposure apparatus for manufacturing a liquid crystal display element or a display, a thin film magnetic head, an image sensor (CCD). An exposure apparatus for manufacturing a micromachine, a MEMS, a DNA chip, or a reticle or mask may be used.

  In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. A variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed, as disclosed in No. 6778257 It may be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

  In each of the above embodiments, the exposure apparatus EX includes the projection optical system PL. However, the components described in the above embodiments are applied to an exposure apparatus and an exposure method that do not use the projection optical system PL. May be. For example, an exposure apparatus and an exposure method for forming an immersion region between an optical member such as a lens and a substrate and irradiating the substrate with exposure light via the optical member are configured as described in the above embodiments. Elements may be applied.

  The exposure apparatus EX exposes a line-and-space pattern on the substrate P by forming interference fringes on the substrate P as disclosed in, for example, WO 2001/035168. (Lithography system).

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the above-described components so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 12, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate which is a base material of the device. Substrate processing step 204, including substrate processing (exposure processing) including exposing the substrate with exposure light from the pattern of the mask and developing the exposed substrate according to the above-described embodiment, It is manufactured through a device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, an inspection step 206, and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. Some components may not be used. In addition, as long as permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above embodiments and modifications are incorporated herein by reference.

EX exposure apparatus, LS immersion area, P substrate, PL projection optical system, 5 immersion member,
6 fluid supply system, 32 temperature adjusting device, 37 temperature adjusting device, 40 temperature adjusting device, 42 temperature sensor, 45 temperature adjusting device, 47 temperature sensor, 50 valve,
51 Flow controller, 52 Temperature sensor

Claims (36)

A fluid supply system used in an exposure apparatus,
A first temperature adjusting device capable of adjusting the temperature of the first fluid;
A second temperature adjusting device capable of adjusting the temperature of the second fluid;
A heat exchanger capable of performing heat exchange between the first fluid supplied from the first temperature adjusting device and the second fluid supplied from the second temperature adjusting device;
The first fluid supplied from the first temperature adjustment device without passing through the heat exchanger, and detecting the temperature of the first fluid passing through the heat exchanger to which the second fluid is supplied. And a temperature sensor for detecting the temperature of the fluid supply system. A first flow path for sending the first fluid from the first temperature adjustment device to the temperature sensor via the heat exchanger;
A second flow path for sending the first fluid from the first temperature adjustment device to the temperature sensor without passing through the heat exchanger;
The fluid supply system according to claim 1, further comprising: a channel switching unit that switches between the first channel and the second channel. A fluid supply system used in an exposure apparatus,
A first temperature adjusting device capable of adjusting the temperature of the first fluid;
A second temperature adjusting device capable of adjusting the temperature of the second fluid;
A heat exchanger capable of performing heat exchange between the first fluid supplied from the first temperature adjusting device and the second fluid supplied from the second temperature adjusting device;
The temperature of the second fluid passing through the heat exchanger to which the first fluid is supplied is detected, and the temperature of the second fluid passing through the heat exchanger to which the first fluid is not supplied is determined. And a temperature sensor for detecting the fluid supply system.   The first fluid and the second fluid are liquids, and the flow rate of the fluid sent to the temperature sensor among the first fluid and the second fluid in the heat exchanger is the heat of the other fluid. The fluid supply system according to any one of claims 1 to 3, wherein the flow rate is smaller than a flow rate in the exchanger. A third flow path for sending the first fluid via the heat exchanger to the first temperature control device;
A fluid supply system according to any one of claims 1 to 4, further comprising a flow rate controller that controls a flow rate of the first fluid flowing through the third flow path. The first temperature adjusting device is controlled based on a detection result of a first temperature sensor that detects a temperature of the first fluid,
The second temperature adjusting device is controlled based on a detection result of a second temperature sensor that detects a temperature of the second fluid,
One or both of the first temperature adjustment device and the second temperature adjustment device are controlled based on information on a temperature difference between the first fluid and the second fluid acquired from a detection result of the temperature sensor. The fluid supply system according to any one of claims 1 to 5. A fluid supply system used in an exposure apparatus,
A first temperature adjusting device capable of adjusting the temperature of the first fluid;
A second temperature adjusting device capable of adjusting the temperature of the second fluid;
A first temperature sensor for detecting a temperature of the first fluid from the first temperature adjustment device;
A second temperature sensor for detecting the temperature of the second fluid from the second temperature adjustment device;
A fluid supply system comprising: a flow channel system that forms a flow channel so that the first fluid from the first temperature control device is sent to the first temperature sensor and then sent to the second temperature sensor.   Based on the information of the temperature difference between the temperature of the first fluid detected by the first temperature sensor and the temperature of the first fluid detected by the second temperature sensor, the first temperature adjusting device and the second temperature The fluid supply system of claim 7, wherein one or both of the regulators are controlled. A fluid supply system used in an exposure apparatus,
A first temperature adjusting device capable of adjusting the temperature of the first fluid;
A second temperature adjusting device capable of adjusting the temperature of the second fluid;
A first temperature sensor for detecting a temperature of the first fluid from the first temperature adjustment device;
A second temperature sensor for detecting the temperature of the second fluid from the second temperature adjustment device;
After the first fluid from the first temperature adjustment device is sent to the first temperature sensor, the flow path is such that the second fluid from the second temperature adjustment device is sent to the first temperature sensor. A fluid supply system.   Based on the temperature difference information between the temperature of the first fluid detected by the first temperature sensor and the temperature of the second fluid detected by the first temperature sensor, the first temperature adjusting device and the second temperature sensor The fluid supply system according to claim 9, wherein one or both of the temperature control devices are controlled.   One or both of the first temperature adjusting device and the second temperature adjusting device are the first fluid supplied from the first temperature adjusting device and the second fluid supplied from the second temperature adjusting device. The fluid supply system according to any one of claims 6, 8, and 10, which is controlled based on the information so that a temperature difference is reduced.   12. The fluid supply system according to claim 6, wherein one or both of the first temperature sensor and the second temperature sensor are calibrated based on the information.   The fluid supply according to any one of claims 1 to 12, wherein one of the first fluid and the second fluid is a liquid supplied for immersion exposure to an optical path of exposure light of the exposure apparatus. system.   14. The fluid supply system according to claim 13, wherein the other of the first fluid and the second fluid is supplied for temperature adjustment of a projection optical system of the exposure apparatus.   The fluid supply system according to claim 13 or 14, wherein the other of the first fluid and the second fluid is supplied for temperature adjustment of a liquid contact member in contact with the liquid in the exposure apparatus. The exposure apparatus includes:
An optical member having an exit surface for emitting the exposure light;
An immersion member that is disposed in at least a part of the periphery of the optical path of the exposure light and that can form an immersion region of the liquid on an object that can face the emission surface;
The fluid supply system according to claim 15, wherein the liquid contact member includes the liquid immersion member. An exposure apparatus that exposes a substrate with exposure light through a liquid,
An exposure apparatus comprising the fluid supply system according to claim 1. A fluid supply method used for exposure,
Adjusting the temperature of the first fluid;
Adjusting the temperature of the second fluid;
Performing heat exchange between the temperature-adjusted first fluid and the temperature-adjusted second fluid by a heat exchanger;
Detecting a temperature of the first fluid via the heat exchanger to which the second fluid is supplied with a temperature sensor;
Detecting the temperature of the first fluid not passing through the heat exchanger with the temperature sensor.   A first flow path for sending the temperature-adjusted first fluid to the temperature sensor via the heat exchanger, and a temperature-adjusted first fluid to the temperature sensor without going through the heat exchanger The fluid supply method according to claim 18, comprising switching between the second flow path to be sent. A fluid supply method used for exposure,
Adjusting the temperature of the first fluid;
Adjusting the temperature of the second fluid;
Performing heat exchange between the temperature-adjusted first fluid and the temperature-adjusted second fluid by a heat exchanger;
Detecting a temperature of the second fluid via the heat exchanger to which the first fluid is supplied by a temperature sensor;
Detecting a temperature of the second fluid that has passed through the heat exchanger to which the first fluid is not supplied by the temperature sensor.   The first fluid and the second fluid are liquids, and the flow rate of the fluid sent to the temperature sensor among the first fluid and the second fluid in the heat exchanger is the heat of the other fluid. The fluid supply method according to any one of claims 18 to 20, which is smaller than a flow rate in the exchanger. Flowing the first fluid through the heat exchanger through a third flow path;
Controlling the flow rate of the first fluid flowing through the third flow path;
The fluid supply method according to any one of claims 18 to 21, further comprising: adjusting a temperature of the first fluid that has flowed through the third flow path again. Controlling temperature adjustment of the first fluid based on a detection result of a first temperature sensor for detecting a temperature of the first fluid;
Controlling temperature adjustment of the second fluid based on a detection result of a second temperature sensor for detecting the temperature of the second fluid;
One or both of temperature adjustment of the first fluid and temperature adjustment of the second fluid is controlled based on information on a temperature difference between the first fluid and the second fluid acquired from a detection result of the temperature sensor. The fluid supply method according to any one of claims 18 to 22, further comprising: A fluid supply method used for exposure,
Adjusting the temperature of the first fluid;
Adjusting the temperature of the second fluid;
Detecting the temperature of the temperature-adjusted first fluid with a first temperature sensor;
Detecting the temperature of the temperature-adjusted second fluid with a second temperature sensor;
The fluid supply method comprising: sending the temperature-adjusted first fluid to the first temperature sensor and then sending the first fluid to the second temperature sensor.   Based on the temperature difference information between the temperature of the first fluid detected by the first temperature sensor and the temperature of the first fluid detected by the second temperature sensor, the temperature adjustment of the first fluid and the second temperature The fluid supply method according to claim 24, comprising controlling one or both of temperature adjustments of the fluid. A fluid supply method used for exposure,
Adjusting the temperature of the first fluid;
Adjusting the temperature of the second fluid;
Detecting the temperature of the temperature-adjusted first fluid with a first temperature sensor;
Detecting the temperature of the temperature-adjusted second fluid with a second temperature sensor;
A method of supplying a fluid, comprising: sending the temperature-adjusted second fluid to the first temperature sensor after the temperature-adjusted first fluid is sent to the first temperature sensor.   Based on the temperature difference information between the temperature of the first fluid detected by the first temperature sensor and the temperature of the second fluid detected by the first temperature sensor, the temperature adjustment of the first fluid and the first fluid 27. The fluid supply method according to claim 26, comprising controlling one or both of the temperature adjustments of the two fluids.   One or both of temperature adjustment of the first fluid and temperature adjustment of the second fluid is controlled based on the information so that a temperature difference between the first fluid and the second fluid becomes small. The fluid supply method according to any one of claims 23, 25, and 27.   The fluid supply method according to any one of claims 23, 25, 27, and 28, comprising calibrating one or both of the first temperature sensor and the second temperature sensor based on the information.   30. The fluid supply method according to any one of claims 18 to 29, wherein one of the first fluid and the second fluid is a liquid supplied for immersion exposure to an optical path of exposure light of an exposure apparatus. .   31. The fluid supply method according to claim 30, wherein the other of the first fluid and the second fluid is supplied for temperature adjustment of a projection optical system of the exposure apparatus.   32. The fluid supply method according to claim 30, wherein the other fluid of the first fluid and the second fluid is supplied for temperature adjustment of a liquid contact member in contact with the one liquid in the exposure apparatus. The exposure apparatus includes:
An optical member having an exit surface for emitting the exposure light;
An immersion member that is disposed in at least a part of the periphery of the optical path of the exposure light and that can form an immersion region of the liquid on an object that can face the emission surface;
The fluid supply method according to claim 32, wherein the liquid contact member includes the liquid immersion member. An exposure method for exposing a substrate with exposure light through a liquid,
An exposure method comprising supplying a liquid by the fluid supply method according to any one of claims 18 to 33. Exposing the substrate using the exposure apparatus according to claim 17;
Developing the exposed substrate. A device manufacturing method. Exposing the substrate using the exposure method of claim 34;
Developing the exposed substrate. A device manufacturing method.

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