JP2015069751A - Conductive paste, metallic thin film and method for producing the same - Google Patents
Conductive paste, metallic thin film and method for producing the same Download PDFInfo
- Publication number
- JP2015069751A JP2015069751A JP2013201256A JP2013201256A JP2015069751A JP 2015069751 A JP2015069751 A JP 2015069751A JP 2013201256 A JP2013201256 A JP 2013201256A JP 2013201256 A JP2013201256 A JP 2013201256A JP 2015069751 A JP2015069751 A JP 2015069751A
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- Prior art keywords
- thin film
- conductive
- conductive paste
- resin
- metal
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
本発明は、バインダーとしての特定の樹脂と、熱塩基発生剤を含有する導電性ペーストと、その導電性ペーストを用いて形成した塗膜を過熱水蒸気による焼成により製造する導電性に優れる金属薄膜に関する。 The present invention relates to a conductive thin film containing a specific resin as a binder, a conductive paste containing a thermal base generator, and a metal thin film excellent in conductivity produced by baking with superheated steam from a coating film formed using the conductive paste. .
近年、金属微粒子分散体を含む導電性ペーストを用いてスクリーン印刷法などの印刷法により所望のパターンを形成し、回路基板における配線等を形成する技術が注目を集めている。 In recent years, a technique of forming a desired pattern by a printing method such as a screen printing method using a conductive paste containing a metal fine particle dispersion and forming a wiring or the like on a circuit board has attracted attention.
導電性ペーストにおいて、金属微粒子としての金属は、銀、銅、ニッケルが一般的に用いられる。銀は、高価であるだけでなく、耐マイグレーション性が悪いため回路の微細化要求が高い場合には重大な欠陥となりうる。ニッケルは導電性が劣る。銅は、安価で、耐マイグレーション性が良いために、導電性ペースト用の金属微粒子として優れた特性を発揮することが期待される。しかし銅は酸化されやすく、できた酸化物は導電性が悪い。導電性銅ペースト製造時や保存時、導電性銅ペーストから銅薄膜形成する際の加熱処理時および銅薄膜保存時に銅表面に形成される酸化層により、導電性が悪くなる。 In the conductive paste, silver, copper, or nickel is generally used as the metal as the metal fine particles. Silver is not only expensive, but also has poor migration resistance, and can be a serious defect when there is a high demand for circuit miniaturization. Nickel has poor conductivity. Since copper is inexpensive and has good migration resistance, it is expected to exhibit excellent characteristics as metal fine particles for conductive paste. However, copper is easily oxidized, and the resulting oxide has poor conductivity. The conductivity deteriorates due to the oxide layer formed on the copper surface at the time of heat treatment when forming a copper thin film from the conductive copper paste and at the time of storage of the copper thin film during production and storage of the conductive copper paste.
銅微粒子を含有する導電性銅ペースト塗膜を還元性雰囲気にて処理する方法が開示されている。良く知られている水素ガス3%含有窒素ガス中での加熱処理(非特許文献1)のほかにも、いくつかの方法が開示されている。例えば、マイクロ波表面波プラズマ処理(特許文献1)では、処理できる塗膜の厚みが2μm以下に制限される。また、ガス状のギ酸および/又はホルムアルデヒドによる処理(特許文献2)では200℃以下の低温で処理できるが、ギ酸ガスおよびホルムアルデヒドガスの毒性や厚い塗膜での処理の困難性が懸念される。 A method for treating a conductive copper paste coating film containing copper fine particles in a reducing atmosphere is disclosed. In addition to the well-known heat treatment in nitrogen gas containing 3% of hydrogen gas (Non-patent Document 1), several methods are disclosed. For example, in the microwave surface wave plasma treatment (Patent Document 1), the thickness of the coating film that can be treated is limited to 2 μm or less. Further, the treatment with gaseous formic acid and / or formaldehyde (Patent Document 2) can be carried out at a low temperature of 200 ° C. or less, but there are concerns about the toxicity of formic acid gas and formaldehyde gas and the difficulty of treatment with a thick coating film.
高エネルギーのパルス光を照射して、基板の温度を上げずに、酸化銅を含有する塗膜のみを加熱して銅被膜を形成するフォトシンタリング法が開示されている。(たとえば、特許文献3)この方法では、室温で短時間に処理できる長所はあるが、照射装置が高価で、しかも基板を損傷しない条件が狭いという問題がある。 There has been disclosed a photosintering method in which only a coating film containing copper oxide is heated to form a copper coating without irradiating high-energy pulse light and raising the temperature of the substrate. (For example, Patent Document 3) Although this method has an advantage that it can be processed at room temperature in a short time, there is a problem that an irradiation apparatus is expensive and conditions for not damaging the substrate are narrow.
さらに、加熱時に加圧して焼成する方法が開示されている。例えば、特許文献4や特許文献5には、導電性微粒子の分散体を熱処理した後、加熱しつつ加圧して導電性膜を形成する方法が開示されている。これらの方法は、コスト的に有利であり、銀粒子では焼結が容易であるが、銅粒子の場合には、加熱加圧時に容易に酸化反応が進み、粒子表面の酸化被膜が焼結を阻害してしまうために、高い導電性を有する膜は得られない。 Furthermore, a method of applying pressure during heating and baking is disclosed. For example, Patent Document 4 and Patent Document 5 disclose a method of forming a conductive film by heat-treating a dispersion of conductive fine particles and then applying pressure while heating. These methods are advantageous in terms of cost and are easy to sinter with silver particles, but in the case of copper particles, the oxidation reaction proceeds easily during heating and pressurization, and the oxide film on the particle surface sinters. Therefore, a film having high conductivity cannot be obtained.
特許文献6では、銅粒子を含有する塗膜の直上に遮蔽物を配置して加熱加圧処理をして銅膜を得る方法が開示されている。この方法では、ある程度は外気中の酸素との反応を抑制できるが、限界があり、しかも遮蔽物がリサイクルできなければ、廃棄物の問題が生じる。 Patent Document 6 discloses a method of obtaining a copper film by placing a shielding object directly on a coating film containing copper particles and subjecting it to heat and pressure treatment. In this method, the reaction with oxygen in the outside air can be suppressed to some extent, but there is a limit, and if the shield cannot be recycled, a problem of waste arises.
特許文献7には、導電粉に銅を使用した導電性ペーストを基材に塗布した後に過熱水蒸気処理をすることにより、大気中で焼成処理をするよりも低酸素状態で、また、空気よりも比熱容量が大きい水蒸気を使用することで、安全にかつ、短時間に加熱焼成することができるので、塗布した金属薄膜の比抵抗を下げることができるという技術が開示されている。 In Patent Document 7, by applying a conductive paste using copper as a conductive powder to a base material and then performing a superheated steam treatment, it is in a lower oxygen state than in a firing treatment in the atmosphere, and more than air. By using water vapor having a large specific heat capacity, heat-firing can be performed safely and in a short time, and thus a technique has been disclosed in which the specific resistance of a coated metal thin film can be reduced.
金属粒子の粒径を低減することによって、金属粒子間の焼成温度を金属バルクの融点に比べて大幅に下げることができることが知られている。金属微粒子の平均粒子径が数nm〜数10nm程度であるとき、バルクの金属よりも融点が著しく降下し、低い温度で粒子同士の融着が起こることを利用し、金属微粒子を低温で焼結させて導電性薄膜を得るものである。 It is known that by reducing the particle size of the metal particles, the firing temperature between the metal particles can be significantly reduced compared to the melting point of the metal bulk. When the average particle size of metal fine particles is about several nanometers to several tens of nanometers, the melting point of the metal particles is significantly lower than that of bulk metal, and the particles are fused at a low temperature. Thus, a conductive thin film is obtained.
銅粒子を含有する銅ペーストにおいて、銅微粒子の粒子径低減による融点低下を生じさせようとした場合、銅微粒子は酸化されやすく、粒径がナノサイズの銅ナノ粒子ではその傾向がさらに顕著となる、との問題に直面する。酸化された銅微粒子では著しく導電性が低下するため、導電性銅ペーストとして用いるためには、分散性を維持しながら酸化を抑制することが大きな課題となっている。 In a copper paste containing copper particles, when trying to cause a melting point decrease due to a reduction in the particle size of the copper fine particles, the copper fine particles are easily oxidized, and the tendency becomes more remarkable in the case of copper nanoparticles having a nano-size particle size. , Face problems with. Since the conductivity of the oxidized copper fine particles is remarkably lowered, it is a big problem to suppress oxidation while maintaining dispersibility in order to use as a conductive copper paste.
導電性ペーストに適切な樹脂バインダーを配合すると、樹脂バインダーは、金属粒子への親和性を利用して分散工程において導電性金属粉を均一に分散させ、また形成した金属薄膜の導電性を向上させ、かつ金属薄膜と絶縁基材との密着性を向上させる、との効果を発揮する。しかし、樹脂バインダーは絶縁性であり、焼成時の導電性金属同士の融着を阻害して、金属薄膜の導電性の発現を阻害する場合がある。 When an appropriate resin binder is blended in the conductive paste, the resin binder uniformly disperses the conductive metal powder in the dispersion process by utilizing the affinity for the metal particles, and improves the conductivity of the formed metal thin film. And the effect of improving the adhesiveness of a metal thin film and an insulating base material is exhibited. However, the resin binder is insulative and may inhibit the fusion of the conductive metals during firing, thereby inhibiting the conductivity of the metal thin film.
銅微粒子を含む分散体を用いて導電性パターンを形成する際、良好な導電性を確保するためには、銅微粒子に吸着している樹脂バインダーを分解または脱離させ、銅微粒子相互を十分に接触させて融着を促す必要がある。しかしながら、これまで、樹脂バインダーの分解性や脱離性に関してあまり考慮なされておらず、焼成工程でポリマーの分解が十分に進行しない恐れがあり、形成した配線が良好な導電性を確保できない可能性がある。 When forming a conductive pattern using a dispersion containing copper fine particles, in order to ensure good conductivity, the resin binder adsorbed on the copper fine particles is decomposed or detached, and the copper fine particles are sufficiently separated from each other. It is necessary to contact and promote fusion. However, until now, there has not been much consideration regarding the decomposability and detachability of the resin binder, and there is a possibility that the polymer will not sufficiently decompose in the firing process, and the formed wiring may not be able to ensure good conductivity There is.
本発明は、かかる従来技術の課題を背景になされたものである。すなわち、本発明の目的は、過熱水蒸気処理により樹脂バインダーの一部を除去する焼成方法で導電性の金属薄膜を製造し、焼成温度を下げることが可能で、耐熱性を有しない基材にも広く適用することができる導電性ペーストを提供することにある。 The present invention has been made against the background of such prior art problems. That is, the object of the present invention is to produce a conductive metal thin film by a baking method in which a part of the resin binder is removed by superheated steam treatment, to lower the baking temperature, and to a substrate having no heat resistance. An object of the present invention is to provide a conductive paste that can be widely applied.
本発明者は、かかる目的を達成するために鋭意検討した結果、本発明の完成に至った。
すなわち本発明は、
(1) 導電性金属粉、樹脂バインダー、熱塩基発生剤、および溶剤を含有する導電性ペーストであって、該樹脂バインダーがエステル結合を主鎖に持つポリマーを含有する、過熱水蒸気処理用導電性ペースト。
(2) 前記エステル結合を主鎖に持つポリマーが、ポリエステル樹脂、ポリエステルウレタン樹脂、ポリカーボネート樹脂、ポリエステルエーテル樹脂、ポリエステルアミド樹脂から選択されてなる少なくとも1種以上を含有することを特徴とする(1)に記載の導電性ペースト。
(3) 前記熱塩基発生剤が、カルバメート誘導体、グアニジン誘導体から選ばれる少なくとも1種以上を含有することを特徴とする(1)または(2)に記載の導電性ペースト。
(4) 前記導電性金属粉が銅、銅酸化物、銅錯体のいずれか一種以上からなる金属粉を含有することを特徴とする(1)〜(3)のいずれかに記載の導電性ペースト。
(5) (1)〜(4)のいずれかに記載の導電性ペーストを用いて塗膜を形成し、次いで該塗膜に過熱水蒸気による焼成処理を行って金属薄膜を得る、金属薄膜の製造方法。
(6) (5)の方法によって製造された金属薄膜。
As a result of intensive studies in order to achieve this object, the present inventor has completed the present invention.
That is, the present invention
(1) A conductive paste containing a conductive metal powder, a resin binder, a thermal base generator, and a solvent, wherein the resin binder contains a polymer having an ester bond in the main chain, and the conductivity for superheated steam treatment paste.
(2) The polymer having an ester bond in the main chain contains at least one selected from a polyester resin, a polyester urethane resin, a polycarbonate resin, a polyester ether resin, and a polyesteramide resin (1 ) Conductive paste.
(3) The conductive paste according to (1) or (2), wherein the thermal base generator contains at least one selected from carbamate derivatives and guanidine derivatives.
(4) The conductive paste according to any one of (1) to (3), wherein the conductive metal powder contains a metal powder composed of one or more of copper, copper oxide, and copper complex. .
(5) Production of a metal thin film, wherein a coating film is formed using the conductive paste according to any one of (1) to (4), and then the coating film is subjected to baking treatment with superheated steam to obtain a metal thin film. Method.
(6) A metal thin film produced by the method of (5).
本発明の導電性ペーストにより、過熱水蒸気処理による焼成において導電性が発現する温度を下げることができるので、耐熱性を有しない基材にも広く適用することが可能である。 Since the conductive paste of the present invention can lower the temperature at which conductivity is exhibited in baking by superheated steam treatment, it can be widely applied to substrates that do not have heat resistance.
本発明の導電性ペーストは、導電性金属粉、樹脂バインダー、熱塩基発生剤、および溶剤を必須成分として含有する。各成分の割合は導電性金属粉100質量部に対し、溶剤の上限は好ましくは400質量部であり、より好ましくは350質量部であり、さらに好ましくは300質量部である。溶剤の下限は好ましくは20質量部であり、より好ましくは30質量部であり、さらに好ましくは50質量部である。樹脂バインダーの上限は15質量部であり、より好ましくは12質量部であり、さらに好ましくは10質量部である。樹脂バインダーの下限は好ましくは1質量部であり、より好ましくは2質量部であり、さらに好ましくは3質量部である。溶剤、樹脂バイダーの割合がこの範囲より少ないとうまく分散できない、焼成後の基材との密着性が悪くなる、などの不具合がある。これを超えると樹脂バインダーが熱分解されにくくなり、導電性が発現しない、または電気抵抗が大きくなる、などの不具合がある。 The conductive paste of the present invention contains conductive metal powder, a resin binder, a thermal base generator, and a solvent as essential components. The ratio of each component is preferably 400 parts by mass, more preferably 350 parts by mass, and even more preferably 300 parts by mass with respect to 100 parts by mass of the conductive metal powder. Preferably the minimum of a solvent is 20 mass parts, More preferably, it is 30 mass parts, More preferably, it is 50 mass parts. The upper limit of the resin binder is 15 parts by mass, more preferably 12 parts by mass, and still more preferably 10 parts by mass. Preferably the minimum of a resin binder is 1 mass part, More preferably, it is 2 mass parts, More preferably, it is 3 mass parts. If the ratio of the solvent and the resin binder is less than this range, there are problems such as inability to disperse well and poor adhesion to the base material after firing. If this is exceeded, the resin binder will not be thermally decomposed, and there will be problems such as no electrical conductivity or increased electrical resistance.
本発明で使用する導電性金属粉としては、加熱処理によって金属粉間が融着するものでも、融着しないものでも、いずれも使用可能である。本発明で使用する導電性金属粉に用いられる金属の種類としては、銅、ニッケル、コバルト、銀、白金、金、モリブデン、チタン等が挙げることができ、特に銅が好ましい。また、本発明における金属ナノ粒子は、金属、金属酸化物、金属錯体および金属合金のいずれか一種以上からなる金属粉を含有するものであり、銅粉、銅酸化物粉、銅錯体粉のいずれかを一つ以上を含有する金属粉が特に好ましい。また、表面の一部または全部が金属、金属酸化物、金属錯体および金属合金で被覆された金属粉、異種の金属を積層した構造のもの、有機物あるいは無機物に金属めっきを施したものでもかまわない。これらの導電性金属粉は、市販品を用いてもよいし、公知の方法を用いて調製することも可能である。 As the conductive metal powder used in the present invention, either a metal powder fused by heat treatment or a non-fused metal powder can be used. Examples of the metal used for the conductive metal powder used in the present invention include copper, nickel, cobalt, silver, platinum, gold, molybdenum, titanium, and the like, and copper is particularly preferable. In addition, the metal nanoparticles in the present invention contain metal powder composed of any one or more of metal, metal oxide, metal complex, and metal alloy, and any of copper powder, copper oxide powder, and copper complex powder A metal powder containing at least one of these is particularly preferred. In addition, metal powder with a part or all of the surface coated with metal, metal oxide, metal complex and metal alloy, a structure in which different kinds of metals are laminated, or an organic or inorganic material plated with metal may be used. . These conductive metal powders may be commercially available products or can be prepared using known methods.
本発明に用いられる導電性金属粉の平均粒径は5μm以下であることが好ましく、より好ましくは3μm以下、さらに好ましくは1μm以下、特に好ましくは800nm以下である。導電性金属粉の平均粒径が5μmより大きいと、分散体での金属粒子の沈降を生じたり、微細回路の印刷適性が劣ったりする。 The average particle size of the conductive metal powder used in the present invention is preferably 5 μm or less, more preferably 3 μm or less, still more preferably 1 μm or less, and particularly preferably 800 nm or less. When the average particle diameter of the conductive metal powder is larger than 5 μm, the metal particles are precipitated in the dispersion, and the printability of the fine circuit is inferior.
本発明の導電性ペーストに用いられる導電性金属粉の平均粒径の下限は特に限定されないが、10nm以上であることが好ましい。10nm未満では導電性金属粉の経済性の制限や、安定な分散物を得るためには多量の分散媒を必要とするため、高導電性の金属薄膜を得ることが困難になる場合がある。本発明で用いる導電性金属粉は、異なる粒径の物を混合して使用してもかまわない。 Although the minimum of the average particle diameter of the electroconductive metal powder used for the electroconductive paste of this invention is not specifically limited, It is preferable that it is 10 nm or more. If the thickness is less than 10 nm, it is difficult to obtain a highly conductive metal thin film because a large amount of dispersion medium is required in order to obtain economical restrictions on the conductive metal powder and to obtain a stable dispersion. The conductive metal powder used in the present invention may be used by mixing products having different particle diameters.
本発明の導電性ペーストに使用される樹脂バインダーは、エステル結合を主鎖に持つポリマーであれば特に制限されない。熱塩基発生剤の存在下で過熱水蒸気処理を施せば、熱の作用により塩基が発生し、かつその塩基の触媒作用で、過熱水蒸気中の水の作用によりエステル結合が加水分解を受け、エステル結合を主鎖に有するポリマーは分解して低分子量化する。その結果、金属微粒子表面を覆っていた樹脂バインダーは表面から離脱し、金属微粒子表面が露出して、お互いに接触して融着し易くなることが期待される。本発明の導電性ペーストに使用される樹脂バインダーの好ましい例としては、ポリエステル樹脂、ポリエステルウレタン樹脂、ポリカーボネート樹脂、ポリエステルエーテル樹脂、ポリエステルアミド樹脂などのエステル結合を主鎖に持つポリマーを挙げることができる。この中でもポリエステル樹脂およびポリエステルウレタン樹脂が好ましい。樹脂バインダーに用いられる樹脂がエステル結合を有することは、導電性金属微粒子分散体の安定性からも好ましい。 The resin binder used in the conductive paste of the present invention is not particularly limited as long as it is a polymer having an ester bond in the main chain. If superheated steam treatment is performed in the presence of a hot base generator, a base is generated by the action of heat, and the ester bond is hydrolyzed by the action of water in the superheated steam due to the catalytic action of the base. In the main chain decomposes to lower the molecular weight. As a result, it is expected that the resin binder that has covered the surface of the metal fine particles is detached from the surface, the surface of the metal fine particles is exposed, and is easily brought into contact with each other and fused. Preferable examples of the resin binder used in the conductive paste of the present invention include polymers having an ester bond in the main chain such as polyester resin, polyester urethane resin, polycarbonate resin, polyester ether resin, and polyesteramide resin. . Of these, polyester resins and polyester urethane resins are preferred. It is preferable from the stability of the conductive metal fine particle dispersion that the resin used for the resin binder has an ester bond.
ポリエステル、またはポリエステルポリウレタンを重合する際のモノマーの種類としては酸成分としてはテレフタル酸、イソフタル酸、ナフタレンジカルボン酸のごとき芳香族ジカルボン酸又はそのエステル、1,4−シクロヘキサンジカルボン酸(CHDA) 、cis−1,2−シクロヘキサンジカルボン酸無水物(HPPA)、アダマンタンジカルボン酸、トリシクロデカンジカルボン酸等が挙げられる。 As a kind of monomer in polymerizing polyester or polyester polyurethane, as an acid component, aromatic dicarboxylic acid or its ester such as terephthalic acid, isophthalic acid, naphthalenedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid (CHDA), cis Examples include -1,2-cyclohexanedicarboxylic anhydride (HPPA), adamantane dicarboxylic acid, tricyclodecanedicarboxylic acid and the like.
共重合可能なグリコール成分としては、エチレングリコール、ジエチレングリコール、1,4?ブタンジオール、ネオペンチルグリコールのごときグリコール、シクロヘキサンジメタノール(CHDM)、トリシクロデカンジメタノール、アダマンタンジメタノール等が挙げられる。 Examples of the copolymerizable glycol component include glycols such as ethylene glycol, diethylene glycol, 1,4-butanediol, neopentyl glycol, cyclohexanedimethanol (CHDM), tricyclodecane dimethanol, adamantane dimethanol, and the like.
ポリエステルポリウレタンの重合に使用出来るジイソシアネート成分としてはイソシアネート基を分子中に2個含有する公知の脂肪族、脂環族または芳香族の有機ポリイソシアネートが包含される。具体的には例えば4,4’−ジフェニルメタンジイソシアネート、p−フエニレンジイソシアネート、トルイレンジイソシアネート、1,5−ナフチレンジイソシアネート、キシリレンジイソシアネート、ヘキサメチジンジイソシアネート、イソホロンジイソシアネート(IPDI)、4,4’−ジシクロヘキシルメタンジイソシアネート等が挙げられる。とりわけ、イソホロンジイソシアネート、4,4’−ジフェニルメタンジイソシアネートもしくは2,4−トリレンジイソシアネートまたはそれらを主成分とする混合物が好ましい。 The diisocyanate component that can be used for polymerization of polyester polyurethane includes known aliphatic, alicyclic or aromatic organic polyisocyanates containing two isocyanate groups in the molecule. Specifically, for example, 4,4′-diphenylmethane diisocyanate, p-phenylene diisocyanate, toluylene diisocyanate, 1,5-naphthylene diisocyanate, xylylene diisocyanate, hexamethidine diisocyanate, isophorone diisocyanate (IPDI), 4,4 ′. -Dicyclohexyl methane diisocyanate etc. are mentioned. In particular, isophorone diisocyanate, 4,4'-diphenylmethane diisocyanate or 2,4-tolylene diisocyanate or a mixture containing them as a main component is preferable.
樹脂バインダーとして、エステル結合を主鎖に有するポリマーに加えて、エステル結合を主鎖に有しないポリマーを配合することができる。エステル結合を主鎖に有するポリマーの全樹脂バインダーに対する割合は熱塩基発生剤の種類や量、過熱水蒸気による焼成温度や時間などに依存し、特に限定するものではない。しかし、樹脂バインダーが焼成時に大部分が分解した場合には、使用する導電性金属粉の種類によっては焼成後に基材との密着性が良くなかったり、焼成後に得られる導電層に亀裂が入ったりする場合がある。このため、エステル結合を主鎖に有するポリマーの全樹脂バインダーに対する配合割合は、97重量%以下であることがより好ましく、さらに好ましくは95重量%以下、特に好ましくは90重量%以下である。エステル結合を主鎖に有するポリマーの全樹脂バインダーの割合が少なすぎると、焼成時に樹脂バインダーの熱分解および体積収縮が小さくなり、導電性金属粉同士の接触状態が良くないので、導電性が発現しにくくなる。エステル結合を主鎖に有するポリマーの好ましい配合割合は5重量%以上であり、さらに好ましくは10重量%以上であり、特に好ましくは20重量%以上である。 As the resin binder, in addition to the polymer having an ester bond in the main chain, a polymer having no ester bond in the main chain can be blended. The ratio of the polymer having an ester bond in the main chain to the total resin binder depends on the kind and amount of the thermal base generator, the firing temperature and time with superheated steam, and is not particularly limited. However, when the resin binder is mostly decomposed during firing, depending on the type of conductive metal powder used, the adhesion to the substrate is not good after firing, or the conductive layer obtained after firing is cracked. There is a case. For this reason, the blending ratio of the polymer having an ester bond in the main chain to the total resin binder is more preferably 97% by weight or less, further preferably 95% by weight or less, and particularly preferably 90% by weight or less. If the ratio of the total resin binder of the polymer having an ester bond in the main chain is too small, thermal decomposition and volume shrinkage of the resin binder during firing are reduced, and the contact state between the conductive metal powders is not good, so that conductivity is developed. It becomes difficult to do. A preferable blending ratio of the polymer having an ester bond in the main chain is 5% by weight or more, more preferably 10% by weight or more, and particularly preferably 20% by weight or more.
本発明に用いられる熱塩基発生剤としては、焼成時の温度で塩基性化合物を生成するものであれば特に限定されない。導電性ペーストの保存時と塗膜形成時には塩基を生成せず、焼成時の高温でのみ塩基を生成する化合物が望ましい。具体的には、1−メチル−1−(4−ビフェニルイル)エチルカルバメート、1,1−ジメチル−2−シアノエチルカルバメート、N−(イソプロポキシカルボニル)−2,6−ジメチルピペラジン、N−(ベンジロキシカルボニル)−2,6−ジメチルピペラジン、N−(2−ニトロベンジロキシカルボニル)シクロヘキシルアミンなどのカルバメート誘導体;尿素やN,N−ジメチル−N’−メチル尿素などの尿素誘導体;トリクロロ酢酸グアニジン、トリクロロ酢酸メチルグアニジン、フェニルスルホニル酢酸グアニジン、p−メタンスルホニル酢酸グアニジン、フェニルプロピオール酸グアニジン、p−フェニレン−ビス−フェニルプロピオール酸グアニジン、1,2−エタン−ビス(N,N’−ジエチルグアニジウム)4−フェニル(スルホニルフェニルスルホニル)酢酸、(1,4−ブタン−ビスグアニジウム)4−フェニル(スルホニルフェニルスルホニル)酢酸などのグアニジン誘導体;1,4−ジヒドロニコチンアミドなどのジヒドロピリジン誘導体;有機シランや有機ボランの4級アンモニウム塩、ジシアンアミド、フェニルスルホニル酢酸テトラアンモニウム、フェニルプロピオール酸テトラアンモニウムなどを挙げることができる。これらの中でも、特にカルバメート誘導体とグアニジン誘導体が塩基発生のし易さと保存安定性の点で好ましい。 The thermal base generator used in the present invention is not particularly limited as long as it generates a basic compound at the firing temperature. A compound that does not generate a base when the conductive paste is stored and when a coating film is formed but generates a base only at a high temperature during firing is desirable. Specifically, 1-methyl-1- (4-biphenylyl) ethyl carbamate, 1,1-dimethyl-2-cyanoethyl carbamate, N- (isopropoxycarbonyl) -2,6-dimethylpiperazine, N- (benzyl) Roxycarbonyl) -2,6-dimethylpiperazine, carbamate derivatives such as N- (2-nitrobenzyloxycarbonyl) cyclohexylamine; urea derivatives such as urea and N, N-dimethyl-N′-methylurea; guanidine trichloroacetate, Methylguanidine trichloroacetate, guanidine phenylsulfonylacetate, guanidine p-methanesulfonylacetate, guanidine phenylpropiolate, guanidine p-phenylene-bis-phenylpropiolate, 1,2-ethane-bis (N, N'-diethylguanidinium 4-Feni Guanidine derivatives such as (sulfonylphenylsulfonyl) acetic acid and (1,4-butane-bisguanidinium) 4-phenyl (sulfonylphenylsulfonyl) acetic acid; dihydropyridine derivatives such as 1,4-dihydronicotinamide; quaternary organic silanes and organic boranes Ammonium salts, dicyanamide, phenylsulfonylacetic acid tetraammonium, phenylpropiolic acid tetraammonium and the like can be mentioned. Among these, carbamate derivatives and guanidine derivatives are particularly preferable from the viewpoint of easy base generation and storage stability.
熱塩基発生剤の添加量は樹脂バインダーに対して、1重量%〜10重量%が好ましく、2重量%〜7重量%がより好ましい。熱塩基発生剤が多すぎると、未分解物や熱分解残渣が金属薄膜の導電性や基材との密着性に悪影響するおそれがある。 The amount of the heat base generator added is preferably 1% by weight to 10% by weight, and more preferably 2% by weight to 7% by weight with respect to the resin binder. When there are too many thermal base generators, there exists a possibility that an undecomposed thing and a thermal decomposition residue may have a bad influence on the electroconductivity of a metal thin film, and adhesiveness with a base material.
本発明の導電性ペーストに使用される溶媒は、バインダー樹脂を溶解するものから選ばれ、有機化合物であっても水であってもよい。溶媒は、分散体中で金属微粒子を分散させる役割に加えて、分散体の粘度を調整する役割がある。溶媒として好適に用いられる有機溶媒の例として、アルコール、エーテル、ケトン、エステル、芳香族炭化水素、アミド等が挙げられる。 The solvent used in the conductive paste of the present invention is selected from those that dissolve the binder resin, and may be an organic compound or water. The solvent has a role of adjusting the viscosity of the dispersion in addition to the role of dispersing the metal fine particles in the dispersion. Examples of the organic solvent suitably used as the solvent include alcohol, ether, ketone, ester, aromatic hydrocarbon, amide and the like.
本発明の導電性ペーストには、必要に応じ、硬化剤を配合しても良い。本発明に使用できる硬化剤としてはフェノール樹脂、アミノ樹脂、イソシアネート化合物、エポキシ樹脂等が挙げられる。硬化剤の使用量はバインダー樹脂の1〜100重量%の範囲が好ましい。 You may mix | blend a hardening | curing agent with the electrically conductive paste of this invention as needed. Examples of the curing agent that can be used in the present invention include phenol resins, amino resins, isocyanate compounds, and epoxy resins. The amount of the curing agent used is preferably in the range of 1 to 100% by weight of the binder resin.
本発明の導電性ペーストで導電性金属粉に銅粉等の空気中で酸化されやすい金属粉を用いる場合、還元剤を含有させてもかまわない。本発明において、還元剤とは金属の酸化物、水酸化物、または塩等の金属化合物から金属に還元する能力を有するものを言う。還元剤としては、例えば、水素化ホウ素ナトリウム、水素化ホウ素リチウム、ヒドラジン、ホルマリンやアセトアルデヒド等のアルデヒド;亜硫酸塩;蟻酸、蓚酸、コハク酸、アスコルビン酸等のカルボン酸;あるいはラクトン、エタノール、ブタノール、オクタノール等の脂肪族モノアルコール、ターピネオール等の脂環族モノアルコール、等のモノアルコール;エチレングリコール、プロピレングリコール、ジエチレングリコール、ジプロピレングリコール等の脂肪族ジオール;グリセリン、トリメチロールプロパン等の多価アルコール;ポリエチレングリコール、ポリプロピレングリコール等のポリエーテル;ジエタノールアミンやモノエタノールアミン等のアルカノールアミン;ハイドロキノン、レゾルシノール、アミノフェノール、ブドウ糖、あるいはクエン酸ナトリウム等が挙げられる。還元剤あるいは還元剤分解物の金属薄膜への残留は、得られた銅薄膜の特性の悪化を生じさせることがある。そのため、還元剤は過熱水蒸気処理により蒸発揮散するものが望ましい。このため、還元剤を本発明の導電性ペーストに配合する場合には、アルコール類や多価アルコール類を用いることが特に望ましい。還元剤の具体的な好ましい例としては、ターピネオール、エチレングリコール、プロピレングリコール、ジエチレングリコール、ジプロピレングリコール、アスコルビン酸、レゾルシノールを挙げることができる。 When using the metal paste which is easily oxidized in the air such as copper powder as the conductive metal powder in the conductive paste of the present invention, a reducing agent may be included. In the present invention, the reducing agent means an agent capable of reducing a metal compound such as a metal oxide, hydroxide, or salt to a metal. Examples of the reducing agent include sodium borohydride, lithium borohydride, hydrazine, aldehydes such as formalin and acetaldehyde; sulfites; carboxylic acids such as formic acid, succinic acid, succinic acid, and ascorbic acid; or lactone, ethanol, butanol, Monoalcohols such as aliphatic monoalcohols such as octanol and alicyclic monoalcohols such as terpineol; aliphatic diols such as ethylene glycol, propylene glycol, diethylene glycol and dipropylene glycol; polyhydric alcohols such as glycerin and trimethylolpropane; Polyethers such as polyethylene glycol and polypropylene glycol; Alkanol amines such as diethanolamine and monoethanolamine; Hydroquinone, resorcinol, aminophenol Glucose or sodium citrate, and the like. Residue of the reducing agent or the reducing agent decomposition product on the metal thin film may cause deterioration of properties of the obtained copper thin film. Therefore, it is desirable that the reducing agent is evaporated by superheated steam treatment. For this reason, when a reducing agent is blended in the conductive paste of the present invention, it is particularly desirable to use alcohols or polyhydric alcohols. Specific preferred examples of the reducing agent include terpineol, ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, ascorbic acid, and resorcinol.
導電性金属粉をペースト中に分散させる方法としては、粉体を液体に分散させる一般的な方法を用いることができる。例えば、導電性金属粉とバインダー樹脂溶液、必要により追加の溶媒からなる混合物を混合した後、超音波法、ミキサー法、3本ロール法、ボールミル法等で分散を施せばよい。これらの分散手段のうち、複数を組み合わせて分散を行うことも可能である。これらの分散処理は室温で行ってもよく、分散体の粘度を下げたり樹脂の溶解性を上げたりするために、加熱して行ってもよい。必要により使用する還元剤は導電性金属粉の分散前、分散中、分散後の任意の段階で添加しても良い。 As a method for dispersing the conductive metal powder in the paste, a general method for dispersing the powder in a liquid can be used. For example, after mixing a conductive metal powder and a binder resin solution and, if necessary, a mixture of an additional solvent, dispersion may be performed by an ultrasonic method, a mixer method, a three-roll method, a ball mill method, or the like. Of these dispersing means, a plurality of dispersing means can be combined for dispersion. These dispersion treatments may be performed at room temperature, or may be performed by heating in order to lower the viscosity of the dispersion or increase the solubility of the resin. If necessary, the reducing agent used may be added at any stage before, during, or after dispersion of the conductive metal powder.
本発明の導電性ペーストから塗膜を形成するには、分散体を絶縁性基材に塗布あるいは印刷する場合に用いられる一般的な方法を用いることができる。例えばスクリーン印刷法、ディップコーティング法、スプレー塗布法、スピンコーティング法、ロールコート法、ダイコート法、インクジェット法、凸版印刷法、凹版印刷法等の方法によって導電性ペーストを塗布または印刷し、次いで風乾、加熱あるいは減圧等により溶媒の少なくとも一部を蒸発させることにより、塗膜を形成することができる。塗膜は絶縁性基材上に全面に設けられたものでも部分的に設けられたものでもよく、また導電回路等のパターン形成物でもかまわない。 In order to form a coating film from the conductive paste of the present invention, a general method used when the dispersion is applied or printed on an insulating substrate can be used. For example, a conductive paste is applied or printed by a method such as a screen printing method, a dip coating method, a spray coating method, a spin coating method, a roll coating method, a die coating method, an ink jet method, a relief printing method, an intaglio printing method, and then air-dried. A coating film can be formed by evaporating at least a part of the solvent by heating or reduced pressure. The coating film may be provided on the entire surface of the insulating base material or may be provided partially, or may be a pattern formed product such as a conductive circuit.
本発明の金属薄膜の厚みは、電気抵抗や接着性等の必要特性にあわせて適宜設定することができ、特に限定されない。分散体組成や塗布または印刷の方法により、形成可能な導電性薄膜の厚みの範囲は異なるが、0.05〜40μmが好ましく、より好ましくは0.1〜20μm、さらに好ましくは0.2〜10μmである。厚い金属薄膜を得るためには塗膜を厚くする必要があり、溶剤の残留による弊害や塗膜形成速度を低速化する必要が生じる等の経済性の悪化が起こりやすい。一方、塗膜が薄すぎると、ピンホールの発生が顕著になる傾向がある。 The thickness of the metal thin film of the present invention can be appropriately set according to necessary characteristics such as electric resistance and adhesiveness, and is not particularly limited. The range of the thickness of the conductive thin film that can be formed varies depending on the dispersion composition and the method of coating or printing, but is preferably 0.05 to 40 μm, more preferably 0.1 to 20 μm, and still more preferably 0.2 to 10 μm. It is. In order to obtain a thick metal thin film, it is necessary to increase the thickness of the coating film, which is likely to cause economic deterioration such as an adverse effect due to residual solvent and a need to reduce the coating film forming speed. On the other hand, if the coating film is too thin, the occurrence of pinholes tends to be significant.
本発明の金属薄膜の形成に際し、重ね刷りや多層印刷を行なうことが可能である。ここで、重ね刷りとは、同じパターンを多数回重ねて印刷することを指し、これにより導電性薄膜の厚さを増すことができ、あるいはアスペクト比(膜厚と線幅の比)の高い導電性薄膜を得ることができる。また、多層印刷とは、異なるパターンを重ねて印刷することを指し、これにより層ごとに異なる機能を発揮させることができる。部分的に重ね刷りおよび/または多層印刷を行なうこと、また重ね刷りと多層印刷を複合的に行うことも差し支えない。また、本発明の導電性薄膜とは異なる薄膜、例えば絶縁層との多層印刷を行うことも可能である。 When forming the metal thin film of the present invention, it is possible to perform overprinting or multilayer printing. Here, overprinting refers to printing the same pattern a number of times, thereby increasing the thickness of the conductive thin film, or conducting with a high aspect ratio (ratio of film thickness to line width). Can be obtained. Multi-layer printing refers to printing different patterns in a superimposed manner, whereby different functions can be exhibited for each layer. Partial overprinting and / or multilayer printing may be performed, and overprinting and multilayer printing may be performed in combination. It is also possible to perform multilayer printing with a thin film different from the conductive thin film of the present invention, for example, an insulating layer.
本発明の導電性ペーストを用いて塗膜を形成し、次いで該塗膜に過熱水蒸気による加熱処理を行なうことにより、金属薄膜を製造することができる。過熱水蒸気とは、飽和水蒸気に二次的なエネルギーを加えることによって数百度まで加熱した高温蒸気のことである。過熱水蒸気は同じ温度の空気と比べて約4倍の熱容量を持っており、過熱水蒸気を用いて加熱すると短時間で物質を加熱することが知られている。本発明の導電性ペーストを用いて形成された塗膜は、乾燥処理を行った後に過熱水蒸気による焼成を行うことが好ましいい。好ましい乾燥温度は60℃〜120℃で、乾燥時間は3分〜20分である。乾燥処理と過熱水蒸気による焼成は連続して行っても、他の工程を介して行ってもよい。塗布後、乾燥工程無しで、過熱水蒸気による焼成を行うと突沸が起こりやすく好ましくない。乾燥処理と過熱蒸気処理は連続して行っても、間に他の処理を挟んで行ってもよい。乾燥処理と過熱水蒸気処理の間に挟む処理としては、例えば塗膜に還元剤を付与する処理を挙げることができる。この場合、塗膜には予め還元剤が含有されていても含有されていなくてもよく、含有されている場合には同種のもの、異種のものおよび同種のものと異種のものの混合物のいずれとすることも可能である。塗膜に還元剤を付与する処理により、塗膜の体積抵抗率の低下、過熱処理温度の低下、過熱処理時間の短縮、といった効果が発揮される場合がある。 A metal thin film can be produced by forming a coating film using the conductive paste of the present invention and then subjecting the coating film to heat treatment with superheated steam. Superheated steam is high-temperature steam heated to several hundred degrees by adding secondary energy to saturated steam. Superheated steam has a heat capacity approximately four times that of air at the same temperature, and it is known that when heated with superheated steam, the substance is heated in a short time. The coating film formed using the conductive paste of the present invention is preferably subjected to baking with superheated steam after drying. A preferable drying temperature is 60 to 120 ° C., and a drying time is 3 to 20 minutes. The drying treatment and baking with superheated steam may be performed continuously or may be performed through other steps. After coating, baking with superheated steam without a drying step is likely to cause bumping, which is not preferable. The drying process and the superheated steam process may be performed continuously or may be performed with another process interposed therebetween. Examples of the process sandwiched between the drying process and the superheated steam process include a process of applying a reducing agent to the coating film. In this case, the coating film may or may not contain a reducing agent in advance, and if it is contained, any of the same type, different type, and a mixture of the same type and different type It is also possible to do. By the treatment of applying a reducing agent to the coating film, effects such as a decrease in volume resistivity of the coating film, a decrease in overheat treatment temperature, and a decrease in overheat treatment time may be exhibited.
過熱水蒸気にメタノール、エタノール、エチレングリコール、プロピレングリコールを含有させると、導電性の向上が見られる場合がある。アルコール化合物を含有する過熱水蒸気を作る方法は、水にアルコール化合物を溶解させた溶液の飽和蒸気を加熱する方法、アルコール化合物と水、夫々の飽和蒸気を混合加熱する方法が挙げられる。過熱水蒸気中のアルコール化合物の含有率は化合物の種類により最適範囲は異なるが、0.01〜20重量%の範囲で用いる。アルコール化合物の含有率が0.01重量%未満では導電性改善効果が見られず、20重量%を超えるとバインダー樹脂の溶解や分解が顕著に起こることがある。好ましい範囲は0.1〜5重量%である。 When methanol, ethanol, ethylene glycol, or propylene glycol is contained in superheated steam, conductivity may be improved. Examples of the method for producing superheated steam containing an alcohol compound include a method of heating a saturated vapor of a solution in which an alcohol compound is dissolved in water, and a method of mixing and heating an alcohol compound and water, and each saturated vapor. The optimum range of the alcohol compound content in the superheated steam varies depending on the type of the compound, but is used in the range of 0.01 to 20% by weight. When the content of the alcohol compound is less than 0.01% by weight, the effect of improving the conductivity is not observed, and when it exceeds 20% by weight, the binder resin may be significantly dissolved or decomposed. A preferred range is from 0.1 to 5% by weight.
本発明の金属薄膜の製造方法で用いる過熱水蒸気の温度は、150℃以上、特に200℃以上が好ましく、温度の上限は用いる絶縁性基材やバインダー樹脂の耐熱特性等から決まるが、400℃以下が好ましい。加熱時間も被処理物の量や特性から選ばれるが、10秒〜30分間が好ましい。過熱水蒸気の温度が低すぎると、低比抵抗の導電層を得ることができない。過熱水蒸気の温度が高すぎると、バインダー樹脂の大半または全てが除去され、導電性薄膜と絶縁性基材の密着性が損なわれることがあり、また、絶縁性基材の劣化が生じる場合があり、特に有機材料からなる絶縁性基材を用いる場合には注意が必要である。 The temperature of the superheated steam used in the method for producing a metal thin film of the present invention is preferably 150 ° C. or higher, particularly preferably 200 ° C. or higher. The upper limit of the temperature is determined by the heat resistance characteristics of the insulating base material or binder resin used, but is 400 ° C. or lower. Is preferred. The heating time is also selected from the amount and characteristics of the object to be processed, but is preferably 10 seconds to 30 minutes. If the temperature of the superheated steam is too low, a conductive layer having a low specific resistance cannot be obtained. If the temperature of the superheated steam is too high, most or all of the binder resin is removed, the adhesion between the conductive thin film and the insulating substrate may be impaired, and the insulating substrate may be deteriorated. In particular, care must be taken when using an insulating substrate made of an organic material.
本発明の導電性ペーストで導電性金属粉に銅粉を使用する場合、銅粉表面は空気中で酸化されやすいので、薄膜層には、防錆処理が施すことができる。好ましい防錆処理方法としては、金属薄膜層の表面に銅に対して吸着能力のある有機化合物あるいは無機化合物の吸着層を設ける方法を挙げることができる。ここで、金属薄膜層に含まれる導電性金属粉が相互に融着していない導電性金属粉を含有する場合には、前記吸着層は個々の導電性金属粉の表面に形成されることが好ましい。また別の好ましい防錆処理方法としては、防水性のある絶縁樹脂層を金属薄膜層上に設ける方法を挙げることができる。金属薄膜層の表面に有機化合物あるいは無機化合物の吸着層を設け、さらに絶縁樹脂層で被覆する方法は、本発明の好ましい実施態様の一例である。 When copper powder is used as the conductive metal powder in the conductive paste of the present invention, the surface of the copper powder is easily oxidized in the air, so that the thin film layer can be subjected to rust prevention treatment. As a preferable rust prevention treatment method, a method of providing an adsorption layer of an organic compound or an inorganic compound capable of adsorbing copper on the surface of the metal thin film layer can be mentioned. Here, when the conductive metal powder contained in the metal thin film layer contains conductive metal powder that is not fused to each other, the adsorption layer may be formed on the surface of the individual conductive metal powder. preferable. Another preferred rust prevention treatment method is a method of providing a waterproof insulating resin layer on the metal thin film layer. The method of providing an organic compound or inorganic compound adsorption layer on the surface of the metal thin film layer, and further covering with an insulating resin layer is an example of a preferred embodiment of the present invention.
本発明における金属薄膜層の表面に吸着層を形成できる有機化合物あるいは無機化合物(以下、表面処理剤と称する場合がある)としては、ベンゾトリアゾール、トリルトリアゾール、テトラゾール等の含窒素複素環化合物、メルカプトプロピオン酸、メルカプト酢酸、チオフェノール、トリアジンジチオール等の含硫黄化合物、オクチルアミン、イソブチルアミン等のアミノ化合物、シランカップリング剤、チタンカップリング剤、クロメート処理剤等が挙げられる。表面処理剤を溶解した処理剤に金属薄膜を浸漬する、あるいは処理剤を金属薄膜に塗布することで、吸着層の形成がなされる。表面処理剤層の厚みが増すと導電性の低下や接着加工性の悪化を起こす場合があるので、表面処理層の厚みは0.05μm以下の薄層とすることが望ましい。表面処理剤層を薄層にする方法としては、処理液の濃度を下げる、表面処理剤を溶解する溶剤で余分の表面処理剤を除去する等が挙げられる。 Examples of organic compounds or inorganic compounds (hereinafter sometimes referred to as surface treatment agents) that can form an adsorption layer on the surface of the metal thin film layer in the present invention include nitrogen-containing heterocyclic compounds such as benzotriazole, tolyltriazole, and tetrazole, mercapto Examples thereof include sulfur-containing compounds such as propionic acid, mercaptoacetic acid, thiophenol and triazinedithiol, amino compounds such as octylamine and isobutylamine, silane coupling agents, titanium coupling agents and chromate treatment agents. The adsorption layer is formed by immersing the metal thin film in the treatment agent in which the surface treatment agent is dissolved or by applying the treatment agent to the metal thin film. When the thickness of the surface treatment agent layer is increased, the conductivity may be lowered or the adhesive processability may be deteriorated. Therefore, the thickness of the surface treatment layer is preferably a thin layer of 0.05 μm or less. Examples of the method for thinning the surface treatment agent layer include reducing the concentration of the treatment liquid and removing excess surface treatment agent with a solvent that dissolves the surface treatment agent.
本発明における金属薄膜層上に設ける防水性のある絶縁樹脂としては、ポリエステル樹脂、アクリル樹脂、ポリウレタン樹脂、ブチラール樹脂等が挙げられる。これらの樹脂の一種以上で金属薄膜層を被覆することにより防錆効果が発揮できる。防水性のある絶縁樹脂で導電性薄膜層を被覆する方法は特に限定されないが、樹脂溶液を金属薄膜層に塗布または印刷し次いで溶媒を揮散させる方法、樹脂フィルムに接着剤を塗布して導電性薄膜層に貼り合わせる方法を、好ましい方法として例示することができる。接着剤付きのポリイミドフィルムあるいはポリエステルフィルムを貼り合わせることは、特に好ましい実施態様の例である。絶縁樹脂層の厚みは1〜30μmが望ましい。 Examples of the waterproof insulating resin provided on the metal thin film layer in the present invention include polyester resin, acrylic resin, polyurethane resin, butyral resin, and the like. By coating the metal thin film layer with one or more of these resins, the rust prevention effect can be exhibited. The method of coating the conductive thin film layer with a waterproof insulating resin is not particularly limited. However, the method is a method in which a resin solution is applied or printed on a metal thin film layer and then the solvent is stripped off. A method of bonding to the thin film layer can be exemplified as a preferable method. Bonding a polyimide film or a polyester film with an adhesive is an example of a particularly preferred embodiment. The thickness of the insulating resin layer is desirably 1 to 30 μm.
本発明をさらに詳細に説明するために以下に実施例を挙げるが、本発明は実施例に何ら限定されるものではない。なお、実施例に記載された測定値は以下の方法によって測定したものである。 In order to describe the present invention in more detail, examples are given below, but the present invention is not limited to the examples. In addition, the measured value described in the Example is measured by the following method.
1.分子量の測定
GPC(ゲルパーミネーションクロマトグラフィー)によりポリスチレン換算の数平均分子量を測定した。
1. Measurement of molecular weight The number average molecular weight in terms of polystyrene was measured by GPC (gel permeation chromatography).
2.電気抵抗率(比抵抗)の測定
電気抵抗率は、低抵抗率計(商品名:ロレスタ−CP、三菱化学製)および四探針プローブ(NSCPプローブ)を用いた四端子法で測定した。
2. Measurement of electric resistivity (specific resistance) The electric resistivity was measured by a four-terminal method using a low resistivity meter (trade name: Loresta CP, manufactured by Mitsubishi Chemical) and a four-point probe (NSCP probe).
3.密着性の評価
ニチバン株式会社製セロテープ(登録商標)「CT405AP−15」の1cm幅のものを使用し、金属薄膜面にその接着テープを5cm長貼り付け、剥がした際に金属薄膜面が損傷を受けているかどうか、目視観察により判断した。金属薄膜に剥がれ、浮き、亀裂等の何らかの損傷が認められた場合には×、損傷が認められなかった場合には○と判定した。
3. Evaluation of adhesion Use 1cm width of cello tape (registered trademark) “CT405AP-15” manufactured by Nichiban Co., Ltd., and attach the adhesive tape to the metal thin film surface for 5cm long and damage the metal thin film surface when peeled off. Whether or not it was received was judged by visual observation. When some damage such as peeling, floating and cracking was observed on the metal thin film, it was judged as x, and when no damage was found, it was judged as ○.
実施例1
下記割合の組成物を3本ロールミルで分散し、分散ペースト1を得た。さらに、スクリーン印刷法でポリイミドフィルム上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体1Aを得た。
バインダー樹脂の溶液 2.5部
共重合ポリエステル1の35重量%n−ブチルカルビトールアセテート溶液)
なお、共重合ポリエステル1は、テレフタル酸/イソフタル酸/セバシン酸//エチレングリコール/ネオペンチルグリコール=50/20/30//70/30(モル比)、数平均分子量15000の共重合ポリエステルである。
銅微粒子 20部
RCA−16、DOWAエレクトロニクス株式会社製、平均粒径0.8μm)
熱塩基発生剤 0.03部
N−(イソプロポキシカルボニル)−2,6−ジメチルピペラジン
溶剤 4部
エチルカルビトールアセテート
Example 1
The composition of the following ratio was disperse | distributed with the 3 roll mill, and the dispersion paste 1 was obtained. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on a polyimide film with the screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 1A.
Binder resin solution 2.5 parts 35 wt% n-butyl carbitol acetate solution of copolymer polyester 1)
The copolyester 1 is a copolyester having terephthalic acid / isophthalic acid / sebacic acid // ethylene glycol / neopentyl glycol = 50/20/30 // 70/30 (molar ratio) and a number average molecular weight of 15,000. .
Copper fine particles 20 parts RCA-16, manufactured by DOWA Electronics Co., Ltd., average particle size 0.8 μm)
Thermal base generator 0.03 parts N- (isopropoxycarbonyl) -2,6-dimethylpiperazine Solvent 4 parts Ethyl carbitol acetate
実施例2
実施例1記載の熱塩基発生剤を、N−(ベンジロキシカルボニル)−2,6−ジメチルピペラジンに代えて分散ペーストを作製し、分散ペースト2を得た。さらにスクリーン印刷法でポリイミドフィルム上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体2Aを得た。
Example 2
A dispersion paste was prepared by replacing the thermal base generator described in Example 1 with N- (benzyloxycarbonyl) -2,6-dimethylpiperazine to obtain dispersion paste 2. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on a polyimide film with a screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 2A.
実施例3
実施例1記載の熱塩基発生剤をN−(2−ニトロベンジロキシカルボニル)シクロヘキシルアミンにして分散ペーストを作製し、分散ペースト3を得た。さらにスクリーン印刷法でポリイミドフィルム上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体3Aを得た。
Example 3
A dispersion paste was prepared using N- (2-nitrobenzyloxycarbonyl) cyclohexylamine as the thermal base generator described in Example 1, and dispersion paste 3 was obtained. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on a polyimide film with a screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 3A.
実施例4
実施例1記載の熱塩基発生剤を1,2−エタン−ビス(N,N’−ジエチルグアニジウム)4−フェニル(スルホニルフェニルスルホニル)酢酸にして分散ペーストを作製し、分散ペースト4を得た。さらにスクリーン印刷法でポリイミドフィルム上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体4Aを得た。
Example 4
A dispersion paste was prepared by using 1,2-ethane-bis (N, N′-diethylguanidinium) 4-phenyl (sulfonylphenylsulfonyl) acetic acid as the thermal base generator described in Example 1 to obtain dispersion paste 4. It was. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on a polyimide film with the screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 4A.
実施例5
実施例1記載の熱塩基発生剤を(1,4−ブタン−ビスグアニジウム)4−フェニル(スルホニルフェニルスルホニル)酢酸にして分散ペーストを作製し、分散ペースト5を得た。さらにスクリーン印刷法でポリイミドフィルム上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体5Aを得た。
Example 5
A dispersion paste was prepared by using (1,4-butane-bisguanidinium) 4-phenyl (sulfonylphenylsulfonyl) acetic acid as the thermal base generator described in Example 1, and dispersion paste 5 was obtained. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on a polyimide film with a screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 5A.
比較例1
実施例1において、熱塩基発生剤を添加しないで分散ペーストを作製し、分散ペースト6を得た。さらにスクリーン印刷法でポリイミドフィルム上に乾燥後の厚みが10μmになるように印刷して、80℃で5分熱風乾燥し、金属薄膜積層体6Aを得た。
Comparative Example 1
In Example 1, a dispersion paste was prepared without adding a hot base generator, and a dispersion paste 6 was obtained. Furthermore, it printed so that the thickness after drying might be set to 10 micrometers on a polyimide film with a screen printing method, and it dried with hot air at 80 degreeC for 5 minutes, and obtained metal thin film laminated body 6A.
続いて、金属薄膜積層体1Aの9枚について、150、180、200、230、250、270、300、320、350℃で10分間の過熱水蒸気による焼成処理を行い、9種の焼成温度の異なる金属薄膜積層体1Bを得た。過熱水蒸気の発生装置として蒸気過熱装置(第一高周波工業株式会社製「DHF Super-Hi 10」)を用い、10kg/時間の過熱水蒸気を供給する熱処理炉で行った。焼成温度の増加とともに金属薄膜積層体の比抵抗は減少する。金属薄膜積層体1Bについて、各処理温度での比抵抗をプロットし、比抵抗50μ(Ω×cm)を発現し始める温度(導電性発現焼成温度)および接着力を評価した。金属薄膜積層体2A〜6Aについても、金属薄膜積層体1Aと同様にして、金属薄膜積層体2B〜6Bの導電性発現温度と接着力を評価した。評価結果を表1に示した。本発明の導電性ペーストでは、過熱水蒸気処理による焼成において、より低い焼成温度で導電性が発現することが分かる。 Subsequently, nine sheets of the metal thin film laminate 1A were subjected to baking treatment with superheated steam for 10 minutes at 150, 180, 200, 230, 250, 270, 300, 320, and 350 ° C., and 9 kinds of baking temperatures were different. A metal thin film laminate 1B was obtained. A steam superheater (“DHF Super-Hi 10” manufactured by Daiichi High-Frequency Industry Co., Ltd.) was used as a superheated steam generator, and the heat treatment was performed in a heat treatment furnace supplying 10 kg / hour of superheated steam. As the firing temperature increases, the specific resistance of the metal thin film laminate decreases. About the metal thin-film laminated body 1B, the specific resistance in each process temperature was plotted, and the temperature (conducting expression baking temperature) which begins to express specific resistance 50micrometer (ohm * cm), and adhesive force were evaluated. For the metal thin film laminates 2A to 6A, the conductivity expression temperature and adhesive strength of the metal thin film laminates 2B to 6B were evaluated in the same manner as the metal thin film laminate 1A. The evaluation results are shown in Table 1. It can be seen that the conductive paste of the present invention exhibits conductivity at a lower firing temperature in firing by superheated steam treatment.
本発明により、過熱水蒸気処理で導電性銅薄膜を作製する方法において、従来よりも低温で焼成することができ、所定の比抵抗値を有する銅薄膜を形成することができる。また、絶縁性基材との接着力も有することから、フレキシブルな絶縁性基材に使用しても、経時変化で絶縁性基材からの剥がれや浮きなどの問題が発生しにくい。本発明の金属薄膜は、金属/樹脂積層体、電磁シールド金属薄膜等の金属薄膜形成材料、めっき用導電層、金属配線材料、導電材料等として有用であり、導電性回路、アンテナ、電磁波シールド体、電極等に応用することができる。 According to the present invention, in a method for producing a conductive copper thin film by superheated steam treatment, the copper thin film can be formed at a lower temperature than the conventional one and a predetermined specific resistance value can be formed. Moreover, since it has adhesive force with an insulating base material, even if it uses it for a flexible insulating base material, it is hard to generate | occur | produce problems, such as peeling from an insulating base material and a float, with a time-dependent change. The metal thin film of the present invention is useful as a metal thin film forming material such as a metal / resin laminate, an electromagnetic shielding metal thin film, a plating conductive layer, a metal wiring material, a conductive material, and the like. It can be applied to electrodes and the like.
Claims (6)
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| JP2013201256A JP2015069751A (en) | 2013-09-27 | 2013-09-27 | Conductive paste, metallic thin film and method for producing the same |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015069875A (en) * | 2013-09-30 | 2015-04-13 | 東洋紡株式会社 | Conductive paste, metal thin film, and manufacturing method thereof |
| JP2019203172A (en) * | 2018-05-23 | 2019-11-28 | 大陽日酸株式会社 | Joint material and method for producing joint material |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015069875A (en) * | 2013-09-30 | 2015-04-13 | 東洋紡株式会社 | Conductive paste, metal thin film, and manufacturing method thereof |
| JP2019203172A (en) * | 2018-05-23 | 2019-11-28 | 大陽日酸株式会社 | Joint material and method for producing joint material |
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