JP2014502570A - 多層フィルム及びこれを含む光電池モジュール - Google Patents
多層フィルム及びこれを含む光電池モジュール Download PDFInfo
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- JP2014502570A JP2014502570A JP2013547296A JP2013547296A JP2014502570A JP 2014502570 A JP2014502570 A JP 2014502570A JP 2013547296 A JP2013547296 A JP 2013547296A JP 2013547296 A JP2013547296 A JP 2013547296A JP 2014502570 A JP2014502570 A JP 2014502570A
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- multilayer film
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- acrylate
- fluorine
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Abstract
Description
剥離強度は、ASTM D1897に準拠して、試験片を10mmの幅で切断した後、4.2mm/secの速度及び180度の剥離角度で剥離しながら測定した。
クロスカット試験基準であるASTM D3002/D3359の規格に準拠して、クロスカットテストを行った。具体的に、試験片を1mmの間隔で横及び縦方向にそれぞれ11ラインずつブレードで引いて横と縦がそれぞれ1mmである100個の正方形格子を形成した。その後、Nichiban社のCT−24接着テープを上記切断面に付着した後、引き離す時に、一緒に脱落する面の状態を測定し、下記基準で評価した。
〈クロス−ハッチ接着力評価基準〉
5B:脱落した面がない場合
4B:脱落した面が全体面積に対して5%未満の場合
3B:脱落した面が全体面積に対して5%〜15%の場合
2B:脱落した面が全体面積に対して15%超過35%以下の場合
1B:脱落した面が全体面積に対して35%超過〜65%以下の場合
0B:ほとんど大部分が脱落する場合
実施例及び比較例で製造された多層フィルム(基材の両面をフッ素系高分子/オキサゾリン基含有高分子を含む樹脂層でコーティング)を85℃及び85%R.H.の条件が維持されるオーブンに1,000時間、2,000時間または3,000時間放置した後、接着力の変化を観察した。本明細書において単位「R.H.」は、相対湿度を意味する。
実施例及び比較例で製造された多層フィルム(基材の両面をフッ素系高分子/オキサゾリン基含有高分子を含む樹脂層でコーティング)を2気圧、121℃及び100%R.H.の条件が維持されるオーブンに25時間、50時間及び75時間放置した後、接着力の変化を観察した。
基材層の準備
両面にアクリルプライマ処理が行われたPET(poly(ethylene terephthalate)、厚さ:250μm)フィルム(コーロング社製)の表面上にコロナ処理を行った。
フッ素系高分子及びオキサゾリン基含有高分子の混合物を製造するために、下記表1のように多様なフッ素系高分子を準備した。下記表1には、実施例と比較例で使用されるフッ素系高分子の単量体成分、重量平均分子量、融点及び軟化点を記載した。
樹脂層用樹脂組成物の製造
ジメチルホルムアミド(DMF:N、N−dimethyl formamide)400gに上記製造例1で準備したフッ素系高分子A(ビニリデンフルオライド(VDF)及びクロロトリフルオロエチレン(CTFE)を85:15(VDF:CTFE)の重量比率で重合された形態で含む共重合体)70g;上記製造例1で準備したフッ素系高分子D(ビニリデンフルオライド(VDF)の重合体、PVDF)30g;及び重量平均分子量が7万であるオキサゾリン基含有アクリル系共重合体(WS−500(固形分40%))、日本触媒社製)1gをあらかじめ溶解させて第1コーティング液を準備した。
上記あらかじめ準備した基材上に上記樹脂層用樹脂組成物をコンマリバース(comma reverse)方式で塗布した。具体的に、乾燥後の厚さが約20μmになるように間隔を調節してコーティングした後、コーティングされた基材をそれぞれの長さが2mであり、温度が80℃、180℃及び180℃に調節された3個のオーブンに1m/minの速度で順次に通過させて、樹脂層を形成した。その後、基材の反対面に同一の方式で上記樹脂組成物をコーティングし、PETフィルム(基材)の両面にフッ素系高分子及びオキサゾリン基含有高分子 がコーティングされた多層フィルムを製造した。
重量平均分子量が7万であるオキサゾリン基含有アクリル系共重合体(WS−500(固形分40%)、日本触媒社製)の含量を下記表2に示されたように変更して使用したことを除いて、実施例1と同一の方法で多層フィルムを製造した。
重量平均分子量が7万であるオキサゾリン基含有アクリル系共重合体(WS−500(固形分40%)、日本触媒社製)1gの代わりに、重量平均分子量が4万であるオキサゾリン基含有アクリル系共重合体(WS−700(固形分25%)、日本触媒社製)5gを使用したことを除いて、実施例1と同一の方法で多層フィルムを製造した。
フッ素系高分子Aの代わりに、上記製造例1で準備したフッ素系高分子B(ビニリデンフルオライド(VDF)及びヘキサフルオロプロピレン(HFP)を85:15(VDF:HFP)の重量比率で重合された形態で含む共重合体)を使用したことを除いて、実施例3と同一の方法で多層フィルムを製造した。
フッ素系高分子A 70g及びフッ素系高分子D 30gの代わりに、上記製造例1で準備したフッ素系高分子C(ビニリデンフルオライド(VDF)の重合体、PVDF)100gを使用したことを除いて、実施例3と同一の方法で多層フィルムを製造した。
実施例1で樹脂組成物を準備するにあたって、上記製造例1で準備したフッ素系高分子Aのエマルジョン液(ビニリデンフルオライド(VDF)及びクロロトリフルオロエチレン(CTFE)を85:15(VDF:CTFE)の重量比率で重合された形態で含む共重合体エマルジョン液、水に固形分20%に分散された分散液)250g;上記製造例1で準備したフッ素系高分子Dのエマルジョン液(PVDFエマルジョン液、 水に固形分20%に分散された分散液)250g;重量平均分子量が7万であるオキサゾリン基含有アクリル系共重合体(WS−500(固形分40%)、日本触媒社製)10g;及び顔料である二酸化チタン(TiPure TS6200、デュポン社製)30gを攪拌器を用いて分散させて水分散組成物を製造したことを除いて、実施例1と同一の方法で多層フィルムを製造した。
商業的に販売されているTedlarフィルム/接着剤/PETフィルム/接着剤/Tedlarフィルムの積層構造体を多層フィルムとして使用した。上記積層構造体は、押出工程で製造されたデュポン社のTedlarフィルム(PVFフィルム、厚さ38μm)を接着剤を利用してPETフィルムの両面にラミネーションした製品である。
商業的に販売されているTedlarフィルム/接着剤/PETフィルム/接着剤/Tedlarフィルムの積層構造体を多層フィルムとして使用した。上記積層構造体は、キャスティング工程で製造されたデュポン社のTedlarフィルム(PVFフィルム、厚さ25μm)を接着剤を利用してPETフィルムの両面にラミネーションした製品である。
重量平均分子量が7万であるオキサゾリン基含有アクリル系共重合体(WS−500(固形分40%)、日本触媒社製)1gを使用する代わりに、 重量平均分子量が4万であるエポキシ基含有アクリル系共重合体(メチルメタクリレート:グリシジルメタクリレート:ブチルメタクリレート:スチレンの重量比が49.5:35.5:10.5であるアクリル系共重合体)2gを使用することを除いて、 実施例1と同一の方法で多層フィルムを製造した。
重量平均分子量が7万であるオキサゾリン基含有アクリル系共重合体(WS−500(固形分40%)、日本触媒社製)を使用しないことを除いて、実施例1と同一の方法で多層フィルムを製造した。
フッ素系高分子Cの代わりに、上記製造例1で準備したフッ素系高分子D(PVDF)100gを使用したことを除いて、実施例8と同一の方法で多層フィルムを製造した。
フッ素系高分子Cの代わりに、上記製造例1で準備したフッ素系高分子E(ビニリデンフルオライド(VDF)及びヘキサフルオロプロピレン(HFP)を90:10(VDF:HFP)の重量比率で重合された形態で含む共重合体)100gを使用したことを除いて、実施例8と同一の方法で多層フィルムを製造した。
上記実施例1〜9及び比較例1〜6の多層フィルムに対して、PCT(Pressure cooker test)を行った後、180゜剥離強度及びクロス−ハッチテストをそれぞれ行った。具体的には、それぞれの多層フィルムを2気圧、121℃及び100%R.H.の条件でそれぞれ25時間、50時間及び75時間放置した後、180゜剥離強度及びクロス−ハッチテストを行い、接着力の変化を評価した。評価結果は、下記表3に記載した。
上記実施例1〜9及び比較例1〜6の多層フィルムに対して、湿熱(damp heat)試験を行った後、180゜剥離強度及びクロス−ハッチテストをそれぞれ行った。具体的には、それぞれの多層フィルムを85℃及び85%R.H.の条件のオーブンでそれぞれ1000時間、2000時間及び3000時間放置した後、180゜剥離強度及びクロス−ハッチテストを行い、接着力の変化を評価した。上記評価結果を下記表4に記載した。
重量平均分子量が7万であるオキサゾリン基含有アクリル系共重合体(WS−500(固形粉40%)、日本触媒社製)の含量を下記表5に示されたように変更して使用し、ミルベース分散液の製造過程で、顔料として、二酸化チタン(TiPure TS6200、デュポン社製)を使用する代わりに、表5に示されたように、異なる顔料及び含量を使用したことを除いて、実施例1と同一の方法で多層フィルムを製造した。
重量平均分子量が7万であるオキサゾリン基含有アクリル系共重合体(WS−500(固形粉40%)、日本触媒社製)1gを使用する代わりに、重量平均分子量が4万であるエポキシ基含有アクリル系共重合体(メチルメタクリレート:グリシジルメタクリレート:ブチルメタクリレート:スチレンの重量比が49.5:35.5:10:5であるアクリル系共重合体)5gを使用し、顔料である二酸化チタン(TiPure TS6200、デュポン社製)を使用しないことを除いて、実施例1と同一の方法で多層フィルムを製造した。
重量平均分子量が7万であるオキサゾリン基含有アクリル系共重合体(WS−500(固形粉40%)、日本触媒社製)1gを使用する代わりに、重量平均分子量が4万であるエポキシ基含有アクリル系共重合体(メチルメタクリレート:グリシジルメタクリレート:ブチルメタクリレート:スチレンの重量比が49.5:35.5:10:5であるアクリル系共重合体)5gを使用し、ミルベース分散液の製造過程で、顔料として、二酸化チタン(TiPure TS6200、デュポン社製)の代わりに、下記表5に示されたように、異なる顔料及び含量を使用したことを除いて、実施例1と同一の方法で多層フィルムを製造した。
上記実施例10〜15及び比較例7、8の多層フィルムに対して、PCT(Pressure cooker test)を行った後、180゜剥離強度及びクロス−ハッチテストをそれぞれ行った。具体的には、それぞれの多層フィルムを2気圧、121℃及び100%R.H.の条件でそれぞれ25時間、50時間及び75時間放置した後、180゜剥離強度及びクロス−ハッチテストを行い、接着力の変化を評価した。上記評価結果を下記表6に記載した。
上記実施例10〜15及び比較例7、8の多層フィルムに対して、湿熱(damp heat)試験を行った後、180゜剥離強度及びクロス−ハッチテストをそれぞれ行った。具体的には、それぞれの多層フィルムを85℃及び85%R.H.の条件のオーブンでそれぞれ1000時間、2000時間及び3000時間放置した後、180゜剥離強度及びクロス−ハッチテストを行い、接着力の変化を評価した。上記評価結果を下記表7に記載した。
11 樹脂層
12 基材
20 ウェーハ系光電池モジュール
30 薄膜型光電池モジュール
21,31 受光シート
22,32 封止材層
22a 第1層
22b 第2層
23,33 裏面シート
24,34 光電池素子
Claims (32)
- 基材と;
上記基材上に形成され、フッ素系高分子及びオキサゾリン基含有高分子を含む樹脂層と;を含む多層フィルム。 - 上記基材は、金属フィルムまたは高分子フィルムである、請求項1に記載の多層フィルム。
- 前記高分子フィルムは、アクリルフィルム、ポリオレフィンフィルム、ポリアミドフィルム、ポリウレタンフィルム、ポリエチレンテレフタレート(PET)フィルム、ポリエチレンナフタレート(PEN)フィルム及びポリブチレンテレフタレート(PBT)フィルムよりなる群から選択された1つ以上である、請求項2に記載の多層フィルム。
- 上記基材の一面または両面にプラズマ、コロナ、プライマ、アンカー剤、カップリング剤処理及び熱処理のうち選択された1つ以上の処理が実施される、請求項1に記載の多層フィルム。
- 上記基材の一面または両面に無機酸化物蒸着層が形成される、請求項1に記載の多層フィルム。
- 上記基材の厚さは、50μm〜500μmである、請求項1に記載の多層フィルム。
- 上記フッ素系高分子は、ビニリデンフルオライド(VDF、Vinylidene Fluoride)、ビニルフルオライド(VF、Vinyl Fluoride)、テトラフルオロエチレン(TFE、Tetrafluoroethylene)、ヘキサフルオロプロピレン(HFP、Hexafluoropropylene)、クロロトリフルオロエチレン(CTFE、chlorotrifluoroethylene)、トリフルオロエチレン、ヘキサフルオロイソブチレン、ペルフルオロブチルエチレン、ペルフルオロメチルビニルエーテル(PMVE、perfluoro(methylvinylether))、ペルフルオロエチルビニルエーテル(PEVE、perfluoro(ethylvinylether))、ペルフルオロプロピルビニルエーテル(PPVE)、ペルフルオロヘキシルビニルエーテル(PHVE)、ペルフルオロ−2、2−ジメチル−1、3−ジオキソール(PDD)及びペルフルオロ−2−メチレン−4−メチル−1、3−ジオキソラン(PMD)よりなる群から選択された1つ以上の単量体を重合された形態で含む単独重合体、共重合体またはこれらの混合物である、請求項1に記載の多層フィルム。
- 上記フッ素系高分子は、ビニリデンフルオライド(VDF)またはビニルフルオライド(VF)と、テトラフルオロエチレン(TFE、Tetrafluoroethylene)、ヘキサフルオロプロピレン(HFP、Hexafluoropropylene)、クロロトリフルオロエチレン(CTFE、chlorotrifluoroethylene)、トリフルオロエチレン、ヘキサフルオロイソブチレン、ペルフルオロブチルエチレン、ペルフルオロメチルビニルエーテル(PMVE、perfluoro(methylvinylether))、ペルフルオロエチルビニルエーテル(PEVE、perfluoro(ethylvinylether))、ペルフルオロプロピルビニルエーテル(PPVE)、ペルフルオロヘキシルビニルエーテル(PHVE)、ペルフルオロ−2、2−ジメチル−1、3−ジオキソール(PDD)及びペルフルオロ−2−メチレン−4−メチル−1、3−ジオキソラン(PMD)よりなる群から選択された1つ以上の共単量体を含む共重合体またはこれらの混合物である、請求項1に記載の多層フィルム。
- 上記フッ素系共重合体に含まれた共単量体の含量は、フッ素系共重合体の全体重量に対して0.5重量%〜50重量%である、請求項8に記載の多層フィルム。
- 上記フッ素系高分子の重量平均分子量は、5万〜100万である、請求項1に記載の多層フィルム。
- 上記フッ素系高分子は、i)融点(melting point)が155℃以下であるか、または軟化点(softening point)が100℃以下である第1フッ素系高分子を含み、さらに、選択的にii)融点が155℃以上であり、軟化点が100℃以上である第2フッ素系高分子を含む、請求項1に記載の多層フィルム。
- 上記i)融点(melting point)が155℃以下であるか、または軟化点(softening point)が100℃以下である第1フッ素系高分子の全体のフッ素系高分子に対する比率が20重量%以上である、請求項11に記載の多層フィルム。
- 前記オキサゾリン基含有高分子は、オキサゾリン基含有単量体の単一重合体;オキサゾリン基含有単量体及び1つ以上の共単量体を含む共重合体;またはこれらの混合物である、請求項1に記載の多層フィルム。
- 上記オキサゾリン基含有単量体は、下記の化学式1で表示される化合物である、請求項13に記載の多層フィルム。
上記化学式1で、R1、R2、R3及びR4は、それぞれ独立的に、水素原子、アルキル基、ハロゲン、置換または非置換されたフェニル基を示し、R5は、不飽和結合を有する非環式炭化水素基を示す。 - 上記オキサゾリン基含有単量体は、2−ビニル−2−オキサゾリン、2−ビニル−4−メチル−2−オキサゾリン、2−ビニル−5−メチル−2−オキサゾリン、2−イソプロフェニル−2−オキサゾリン、2−イソプロフェニル−4−メチル−2−オキサゾリン及び2−イソプロフェニル−5−エチル−2−オキサゾリンよりなる群から選択された1つ以上である、請求項13に記載の多層フィルム。
- 上記共重合体に含まれたオキサゾリン基含有単量体の含量は、オキサゾリン基含有単量体及び1つ以上の共単量体を含む共重合体の全体重量に対して1重量%以上である、請求項13に記載の多層フィルム。
- 上記共重合体に含まれたオキサゾリン基含有単量体の含量は、オキサゾリン基含有単量体及び1つ以上の共単量体を含む共重合体の全体重量に対して5重量%〜95重量%である、請求項16に記載の多層フィルム。
- 上記共重合体に含まれた共単量体は、アルキル(メタ)アクリレート、アミド基含有単量体、不飽和ニトリル系単量体、ビニルエステル系単量体、ビニルエーテル系単量体、ハロゲン含有α、β−不飽和単量体及びα、β−不飽和芳香族単量体よりなる群から選択された1つ以上である、請求項13に記載の多層フィルム。
- 上記アルキル(メタ)アクリレートは、メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、n−ブチル(メタ)アクリレート、s−ブチル(メタ)アクリレート、t−ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、ヘキシル(メタ)アクリレート、2−エチルヘキシル(メタ)アクリレート、n−オクチル(メタ)アクリレート、イソオクチル(メタ)アクリレート、n−ノニル(メタ)アクリレート、イソノニル(メタ)アクリレート、n−デシル(メタ)アクリルレート、イソデシル(メタ)アクリレート、n−ドデシル(メタ)アクリレート、n−トリデシル(メタ)アクリレート及びn−テトラデシル(メタ)アクリレートよりなる群から選択された1つ以上である、請求項18に記載の多層フィルム。
- 上記オキサゾリン基含有高分子の重量平均分子量は、5,000〜50万である、請求項1に記載の多層フィルム。
- 上記樹脂層は、フッ素系高分子100重量部に対してオキサゾリン基含有高分子を0.1重量部〜50重量部で含む、請求項1に記載の多層フィルム。
- 上記樹脂層の厚さは、3μm〜50μmである、請求項1に記載の多層フィルム。
- 上記樹脂層は、顔料、充填剤、紫外線安定剤、熱安定剤及び障壁粒子よりなる群から選択される1つ以上の添加剤をさらに含む、請求項1に記載の多層フィルム。
- 上記樹脂層と隣接する基材の内部にフッ素原子が分布している、請求項1に記載の多層フィルム。
- 基材上にフッ素系高分子及びオキサゾリン基含有高分子を含む樹脂層を形成する段階を含む多層フィルムの製造方法。
- 上記フッ素系高分子及びオキサゾリン基含有高分子を含む樹脂層の形成段階は、フッ素系高分子、オキサゾリン基含有高分子及び沸点が200℃以下の溶媒を含む樹脂組成物またはフッ素系高分子、オキサゾリン基含有高分子及び水を含む水分散組成物を基材上にコーティングすることによって行われる、請求項25に記載の多層フィルムの製造方法。
- 上記沸点が200℃以下の溶媒は、アセトン、メチルエチルケトン、ジメチルホルムアミド及びジメチルアセトアミドよりなる群から選択された1つ以上である、請求項26に記載の多層フィルムの製造方法。
- 上記樹脂層を形成する前に、基材の一面または両面にプラズマ処理、コロナ処理、プライマ処理、アンカー剤処理、カップリング剤処理、蒸着処理及び熱処理よりなる群から選択された1つ以上の表面処理を行う段階をさらに含む、請求項25に記載の多層フィルムの製造方法。
- 上記樹脂組成物を基材上にコーティングする工程の後に、乾燥する工程をさらに行う、請求項26に記載の多層フィルムの製造方法。
- 上記乾燥する工程は、200℃以下の温度で30秒〜30分間行われる、請求項29に記載の多層フィルムの製造方法。
- 請求項1〜24のいずれかに記載の多層フィルムを含む光電池モジュール用裏面シート。
- 請求項31に記載の光電池モジュール用裏面シートを含む光電池モジュール。
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| KR20100138242 | 2010-12-29 | ||
| KR10-2010-0138242 | 2010-12-29 | ||
| KR1020110128415A KR101536381B1 (ko) | 2010-12-29 | 2011-12-02 | 다층 필름 및 이를 포함하는 광전지 모듈 |
| KR10-2011-0128415 | 2011-12-02 | ||
| PCT/KR2011/009336 WO2012091309A2 (ko) | 2010-12-29 | 2011-12-02 | 다층 필름 및 이를 포함하는 광전지 모듈 |
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| US (2) | US9099589B2 (ja) |
| EP (1) | EP2660050B1 (ja) |
| JP (1) | JP5769037B2 (ja) |
| KR (1) | KR101536381B1 (ja) |
| CN (1) | CN104220255B (ja) |
| TW (1) | TWI472432B (ja) |
| WO (1) | WO2012091309A2 (ja) |
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Also Published As
| Publication number | Publication date |
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| EP2660050A2 (en) | 2013-11-06 |
| US20130284245A1 (en) | 2013-10-31 |
| WO2012091309A3 (ko) | 2012-08-23 |
| KR101536381B1 (ko) | 2015-07-15 |
| TWI472432B (zh) | 2015-02-11 |
| US20150013765A1 (en) | 2015-01-15 |
| KR20120076304A (ko) | 2012-07-09 |
| CN104220255A (zh) | 2014-12-17 |
| WO2012091309A2 (ko) | 2012-07-05 |
| US9099589B2 (en) | 2015-08-04 |
| EP2660050B1 (en) | 2017-08-30 |
| JP5769037B2 (ja) | 2015-08-26 |
| CN104220255B (zh) | 2016-06-01 |
| TW201240816A (en) | 2012-10-16 |
| EP2660050A4 (en) | 2016-09-07 |
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