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JP2014208728A - Heat storable silicone material and method for producing the same - Google Patents

Heat storable silicone material and method for producing the same Download PDF

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JP2014208728A
JP2014208728A JP2013086012A JP2013086012A JP2014208728A JP 2014208728 A JP2014208728 A JP 2014208728A JP 2013086012 A JP2013086012 A JP 2013086012A JP 2013086012 A JP2013086012 A JP 2013086012A JP 2014208728 A JP2014208728 A JP 2014208728A
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知樹 松村
Tomoki Matsumura
知樹 松村
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Abstract

【課題】蓄熱性と熱伝導性が高い蓄熱性シリコーン材料及びその製造方法を提供する。【解決手段】本発明の蓄熱性シリコーン材料(20)は、オルガノポリシロキサン(21)と熱伝導性粒子(23,24)と蓄熱材を含み、蓄熱材は融点0〜100℃の蓄熱物質をマイクロカプセル化した蓄熱材粒子(22)であり、オルガノポリシロキサン100重量部に対して熱伝導性粒子(23,24)を100〜2000重量部含み、熱伝導率が0.2〜10W/m・Kである。この蓄熱性シリコーン材料(20)はシリコーンベースポリマー成分(A)と架橋成分(B)と触媒と熱伝導性粒子と、マイクロカプセル化した蓄熱材粒子(22)を(A+B)成分合計100重量部に対して100〜500重量部を混合し架橋させて得る。【選択図】図1A heat storage silicone material having high heat storage and thermal conductivity and a method for producing the same are provided. A heat storage silicone material (20) of the present invention includes an organopolysiloxane (21), heat conductive particles (23, 24), and a heat storage material, and the heat storage material contains a heat storage material having a melting point of 0 to 100 ° C. It is a microencapsulated heat storage material particle (22), containing 100 to 2000 parts by weight of heat conductive particles (23,24) per 100 parts by weight of organopolysiloxane, and having a thermal conductivity of 0.2 to 10 W / m · K. It is. This heat storage silicone material (20) comprises a silicone base polymer component (A), a crosslinking component (B), a catalyst, heat conductive particles, and microencapsulated heat storage material particles (22) with a total of 100 components (A + B). It is obtained by mixing 100 to 500 parts by weight with respect to parts by weight and crosslinking. [Selection] Figure 1

Description

本発明は蓄熱性シリコーン材料及びその製造方法に関する。さらに詳しくは、蓄熱性と熱伝導性を有するシリコーン材料及びその製造方法に関する。   The present invention relates to a heat storage silicone material and a method for producing the same. More specifically, the present invention relates to a silicone material having heat storage and thermal conductivity and a method for producing the same.

電子機器等に使用されている半導体は使用中に発熱し、電子部品の性能が低下することがある。そのため発熱するような電子部品には通常はゲル状又は軟質ゴム状の熱伝導性シートを介して金属製放熱体が取り付けられる。しかし、近年は発熱電子部品に蓄熱材シートを取り付け、蓄熱材シートに熱を蓄え、熱を伝える速度を遅らせる方法も採用されている。   A semiconductor used in an electronic device or the like generates heat during use, and the performance of the electronic component may deteriorate. For this reason, a metal radiator is usually attached to an electronic component that generates heat through a heat conductive sheet in the form of a gel or a soft rubber. However, in recent years, a method of attaching a heat storage material sheet to a heat generating electronic component, storing heat in the heat storage material sheet, and delaying the speed of transferring heat has also been adopted.

特許文献1〜2には蓄熱材を内包するマイクロカプセルを練り込んだ蓄熱性ゴムが提案されている。特許文献3にはパラフィンワックスポリマーと熱伝導フィラーを含むシリコーンエラストマーの全周囲をコート材によってコーティングした熱対策部材が提案されている。   Patent Documents 1 and 2 propose heat storage rubber in which microcapsules containing a heat storage material are kneaded. Patent Document 3 proposes a heat countermeasure member in which the entire circumference of a silicone elastomer containing a paraffin wax polymer and a heat conductive filler is coated with a coating material.

特開2010−184981号公報JP 2010-184981 A 特開2010−235709号公報JP 2010-235709 A 特開2012−102264号公報JP 2012-102264 A

しかし、前記特許文献1〜2の提案はゲル又は軟質ゴム自体が熱絶縁物質であることから、発熱部材から蓄熱材まで伝熱しにくいという問題があり、特許文献3の提案も蓄熱性と熱伝導性のさらなる改良が求められていた。   However, the proposals in Patent Documents 1 and 2 have a problem that heat transfer from the heat generating member to the heat storage material is difficult because the gel or the soft rubber itself is a heat insulating material. There was a need for further improvements in sex.

本発明は前記従来の問題を解決するため、蓄熱性と熱伝導性が高い蓄熱性シリコーン材料及びその製造方法を提供する。   In order to solve the above-mentioned conventional problems, the present invention provides a heat storage silicone material having high heat storage and thermal conductivity and a method for producing the same.

本発明の蓄熱性シリコーン材料は、オルガノポリシロキサンと熱伝導性粒子と蓄熱材を含む蓄熱性シリコーン材料であって、前記蓄熱材は融点0〜100℃の蓄熱物質をマイクロカプセル化した蓄熱材粒子であり、前記オルガノポリシロキサン100重量部に対して前記熱伝導性粒子を100〜2000重量部含み、熱伝導率が0.2〜10W/m・Kであることを特徴とする。   The heat storage silicone material of the present invention is a heat storage silicone material containing an organopolysiloxane, heat conductive particles, and a heat storage material, and the heat storage material is a heat storage material particle obtained by microencapsulating a heat storage material having a melting point of 0 to 100 ° C. And 100 to 2000 parts by weight of the thermally conductive particles with respect to 100 parts by weight of the organopolysiloxane, and the thermal conductivity is 0.2 to 10 W / m · K.

本発明の蓄熱性シリコーン材料の製造方法は、前記の蓄熱性シリコーン材料の製造方法であって、
下記組成のコンパウンドを架橋させたことを特徴とする。
(A)ベースポリマー成分:1分子中に平均2個以上かつ分子鎖両末端のケイ素原子に結合したアルケニル基を含有する直鎖状オルガノポリシロキサン。
(B)架橋成分:1分子中に平均2個以上のケイ素原子に結合した水素原子を含有するオルガノハイドロジェンポリシロキサンが、前記A成分中のケイ素原子結合アルケニル基1モルに対して、1モル未満の量。
(C)白金系金属触媒:A成分に対して重量単位で0.01〜1000ppm。
(D)熱伝導性粒子:A成分+B成分合計100重量部に対して100〜2000重量部。
(E)融点0〜100℃の蓄熱物質をマイクロカプセル化した蓄熱材粒子:A成分+B成分合計100重量部に対して100〜500重量部。
The method for producing a heat storage silicone material of the present invention is a method for producing the above heat storage silicone material,
A compound having the following composition is crosslinked.
(A) Base polymer component: a linear organopolysiloxane containing an alkenyl group bonded to silicon atoms at both ends of the molecular chain in an average of 2 or more in the molecule.
(B) Crosslinking component: 1 mole of the organohydrogenpolysiloxane containing hydrogen atoms bonded to an average of 2 or more silicon atoms in one molecule is 1 mole per mole of the silicon atom-bonded alkenyl group in the component A. Less than the amount.
(C) Platinum-based metal catalyst: 0.01 to 1000 ppm by weight with respect to component A.
(D) Thermally conductive particles: 100 to 2000 parts by weight with respect to 100 parts by weight of the total of component A and component B.
(E) Heat storage material particles obtained by microencapsulating a heat storage material having a melting point of 0 to 100 ° C .: 100 to 500 parts by weight with respect to 100 parts by weight of A component + B component in total.

本発明は、マトリックスポリマーのオルガノポリシロキサンに対して、熱伝導性粒子とマイクロカプセル化した蓄熱材粒子を含み、熱伝導粒子はオルガノポリシロキサン100重量部に対して100〜2000重量部含み、熱伝導率が0.2〜10W/m・Kである蓄熱性シリコーン材料としたことにより、蓄熱性と熱伝導性が高く、発熱部品と筐体との間に前記蓄熱性シリコーン材料を介在させた場合、より高い蓄熱効果が得られる。  The present invention includes thermally conductive particles and microencapsulated heat storage material particles with respect to organopolysiloxane as a matrix polymer, and the thermally conductive particles include 100 to 2000 parts by weight with respect to 100 parts by weight of organopolysiloxane, By using a heat storage silicone material having a conductivity of 0.2 to 10 W / m · K, heat storage and heat conductivity are high, and the heat storage silicone material is interposed between the heat-generating component and the housing. In this case, a higher heat storage effect can be obtained.

図1は一実施例における熱伝導性シリコーンシートの模式的断面図である。FIG. 1 is a schematic cross-sectional view of a thermally conductive silicone sheet in one embodiment. 図2は本発明の一実施例における熱伝導性シリコーン材料の蓄熱性評価試験の説明図である。FIG. 2 is an explanatory view of a heat storage evaluation test of a thermally conductive silicone material in one embodiment of the present invention. 図3A−Bは本発明の一実施例における熱伝導性シリコーン材料の熱伝導率及び熱抵抗値の測定方法を示す説明図である。3A-B are explanatory views showing a method for measuring the thermal conductivity and thermal resistance value of the thermally conductive silicone material in one embodiment of the present invention. 図4は本発明の一実施例の蓄熱性評価試験のグラフである。FIG. 4 is a graph of the heat storage evaluation test of one example of the present invention. 図5は図4のA部の拡大グラフである。FIG. 5 is an enlarged graph of part A in FIG.

本発明の蓄熱性シリコーン材料は、下記組成のコンパウンドを架橋して得られる。
(A)ベースポリマー成分:1分子中に平均2個以上かつ分子鎖両末端のケイ素原子に結合したアルケニル基を含有する直鎖状オルガノポリシロキサン。
(B)架橋成分:1分子中に平均2個以上のケイ素原子に結合した水素原子を含有するオルガノハイドロジェンポリシロキサンが、前記A成分中のケイ素原子結合アルケニル基1モルに対して、1モル未満の量。
(C)白金系金属触媒:A成分に対して重量単位で0.01〜1000ppm。
(D)熱伝導性粒子:A成分+B成分合計100重量部に対して100〜2000重量部。
(E)融点0〜100℃の蓄熱物質をマイクロカプセル化した蓄熱材粒子:A成分+B成分合計100重量部に対して100〜500重量部。
The heat storage silicone material of the present invention is obtained by crosslinking a compound having the following composition.
(A) Base polymer component: a linear organopolysiloxane containing an alkenyl group bonded to silicon atoms at both ends of the molecular chain in an average of 2 or more in the molecule.
(B) Crosslinking component: 1 mole of the organohydrogenpolysiloxane containing hydrogen atoms bonded to an average of 2 or more silicon atoms in one molecule is 1 mole per mole of the silicon atom-bonded alkenyl group in the component A. Less than the amount.
(C) Platinum-based metal catalyst: 0.01 to 1000 ppm by weight with respect to component A.
(D) Thermally conductive particles: 100 to 2000 parts by weight with respect to 100 parts by weight of the total of component A and component B.
(E) Heat storage material particles obtained by microencapsulating a heat storage material having a melting point of 0 to 100 ° C .: 100 to 500 parts by weight with respect to 100 parts by weight of A component + B component in total.

(1)蓄熱材
前記(E)成分の蓄熱材は、融点0〜100℃の物質をマイクロカプセル化した蓄熱材粒子を使用する。さらに好ましい蓄熱材は、融点35℃以上のパラフィン、融点45℃以上の高級アルコール及び融点が30℃以上のR1-COO-R2(但し、R1は炭素数16以上の炭化水素基、R2は炭素数1〜6の炭化水素基)で示されるエステル化合物から選ばれる少なくとも一つの化合物である。マイクロカプセルの皮膜樹脂は尿素ホルマリン樹脂及びメラミンホルマリン樹脂から選ばれる少なくとも一つの樹脂が好ましい。マイクロカプセルの平均粒子径は0.1〜100μmが好ましい。このような蓄熱材マイクロカプセルは、例えば三菱製紙社製、商品名“サーモメモリー”がある。前記蓄熱材マイクロカプセルは、オルガノポリシロキサン100重量部に対して100〜500重量部混合するのが好ましい。さらに好ましくは150〜250重量部である。
(1) Thermal storage material The thermal storage material of the said (E) component uses the thermal storage material particle which encapsulated the substance of melting | fusing point 0-100 degreeC. More preferable heat storage materials are paraffin having a melting point of 35 ° C. or higher, higher alcohol having a melting point of 45 ° C. or higher, and R 1 —COO—R 2 having a melting point of 30 ° C. or higher (where R 1 is a hydrocarbon group having 16 or more carbon atoms, R 2 is at least one compound selected from ester compounds represented by (C1-C6 hydrocarbon group). The film resin of the microcapsule is preferably at least one resin selected from urea formalin resin and melamine formalin resin. The average particle size of the microcapsules is preferably from 0.1 to 100 μm. Such a heat storage material microcapsule includes, for example, a product name “Thermo Memory” manufactured by Mitsubishi Paper Industries. The heat storage material microcapsules are preferably mixed in an amount of 100 to 500 parts by weight with respect to 100 parts by weight of the organopolysiloxane. More preferably, it is 150-250 weight part.

(2)ベースポリマー成分(A成分)
本発明のA成分は、一分子中にケイ素原子に結合したアルケニル基を2個以上含有するオルガノポリシロキサンであり、アルケニル基を2個含有するオルガノポリシロキサンは本発明のシリコーンゴム組成物における主剤(ベースポリマー成分)である。このオルガノポリシロキサンは、アルケニル基として、ビニル基、アリル基等の炭素原子数2〜8、特に2〜6の、ケイ素原子に結合したアルケニル基を一分子中に2個有する。粘度は25℃で10〜1000000mPa・s、特に100〜100000mPa・sであることが作業性、硬化性などから望ましい。
(2) Base polymer component (component A)
The component A of the present invention is an organopolysiloxane containing two or more alkenyl groups bonded to silicon atoms in one molecule, and the organopolysiloxane containing two alkenyl groups is the main agent in the silicone rubber composition of the present invention. (Base polymer component). This organopolysiloxane has, as an alkenyl group, two alkenyl groups bonded to a silicon atom having 2 to 8 carbon atoms, particularly 2 to 6 carbon atoms, such as vinyl group and allyl group, in one molecule. The viscosity is preferably 10 to 100000 mPa · s, particularly 100 to 100000 mPa · s at 25 ° C. from the viewpoint of workability and curability.

具体的には、下記一般式(化1)で表される1分子中に平均2個以上かつ分子鎖末端のケイ素原子に結合したアルケニル基を含有するオルガノポリシロキサンを使用する。側鎖はトリオルガノシロキシ基で封鎖された直鎖状オルガノポリシロキサンである。25℃における粘度は10〜1000000mPa・sのものが作業性、硬化性などから望ましい。なお、この直鎖状オルガノポリシロキサンは少量の分岐状構造(三官能性シロキサン単位)を分子鎖中に含有するものであってもよい。   Specifically, an organopolysiloxane containing an alkenyl group bonded to a silicon atom at the molecular chain terminal in an average of 2 or more in one molecule represented by the following general formula (Formula 1) is used. The side chain is a linear organopolysiloxane blocked with a triorganosiloxy group. A viscosity at 25 ° C. of 10 to 100000 mPa · s is desirable from the viewpoint of workability and curability. The linear organopolysiloxane may contain a small amount of a branched structure (trifunctional siloxane unit) in the molecular chain.

Figure 2014208728
Figure 2014208728

式中、R1は互いに同一又は異種の脂肪族不飽和結合を有さない非置換又は置換一価炭化水素基であり、R2はアルケニル基であり、kは0又は正の整数である。 In the formula, R 1 is an unsubstituted or substituted monovalent hydrocarbon group not having the same or different aliphatic unsaturated bond, R 2 is an alkenyl group, and k is 0 or a positive integer.

ここで、R1の脂肪族不飽和結合を有さない非置換又は置換の一価炭化水素基としては、例えば、炭素原子数1〜10、特に1〜6のものが好ましく、具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert−ブチル基、ペンチル基、ネオペンチル基、ヘキシル基、シクロヘキシル基、オクチル基、ノニル基、デシル基等のアルキル基、フェニル基、トリル基、キシリル基、ナフチル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基等のアラルキル基、並びに、これらの基の水素原子の一部又は全部をフッ素、臭素、塩素等のハロゲン原子、シアノ基等で置換したもの、例えばクロロメチル基、クロロプロピル基、ブロモエチル基、トリフロロプロピル基等のハロゲン置換アルキル基、シアノエチル基等が挙げられる。R2のアルケニル基としては、例えば炭素原子数2〜6、特に2〜3のものが好ましく、具体的にはビニル基、アリル基、プロペニル基、イソプロペニル基、ブテニル基、イソブテニル基、ヘキセニル基、シクロヘキセニル基等が挙げられ、好ましくはビニル基である。 Here, as the unsubstituted or substituted monovalent hydrocarbon group having no aliphatic unsaturated bond of R 1 , for example, those having 1 to 10 carbon atoms, particularly 1 to 6 carbon atoms are preferable, specifically Alkyl group such as methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, tert-butyl group, pentyl group, neopentyl group, hexyl group, cyclohexyl group, octyl group, nonyl group, decyl group, phenyl Group, tolyl group, xylyl group, aryl group such as naphthyl group, aralkyl group such as benzyl group, phenylethyl group, phenylpropyl group, and part or all of hydrogen atoms of these groups are fluorine, bromine, chlorine, etc. Substituted with a halogen atom, a cyano group, etc., such as a halogen atom such as chloromethyl group, chloropropyl group, bromoethyl group, trifluoropropyl group, etc. Alkyl, cyanoethyl group, and the like. As the alkenyl group for R 2 , for example, an alkenyl group having 2 to 6 carbon atoms, particularly 2 to 3 carbon atoms is preferable, and specifically, a vinyl group, allyl group, propenyl group, isopropenyl group, butenyl group, isobutenyl group, hexenyl group. And a cyclohexenyl group, and a vinyl group is preferable.

一般式(1)において、kは、一般的には0≦k≦10000を満足する0又は正の整数であり、好ましくは5≦k≦2000、より好ましくは10≦k≦1200を満足する整数である。   In general formula (1), k is generally 0 or a positive integer that satisfies 0 ≦ k ≦ 10000, preferably 5 ≦ k ≦ 2000, more preferably 10 ≦ k ≦ 1200. It is.

A成分のオルガノポリシロキサンとしては一分子中に例えばビニル基、アリル基等の炭素原子数2〜8、特に2〜6のケイ素原子に結合したアルケニル基を3個以上、通常、3〜30個、好ましくは、3〜20個程度有するオルガノポリシロキサンを併用しても良い。分子構造は直鎖状、環状、分岐状、三次元網状のいずれの分子構造のものであってもよい。好ましくは、主鎖がジオルガノシロキサン単位の繰り返しからなり、分子鎖両末端がトリオルガノシロキシ基で封鎖された、25℃での粘度が10〜1000000mPa・s、特に100〜100000mPa・sの直鎖状オルガノポリシロキサンである。   As the organopolysiloxane of component A, for example, 3 or more, usually 3 to 30, alkenyl groups bonded to silicon atoms having 2 to 8 carbon atoms, particularly 2 to 6 carbon atoms, such as vinyl groups and allyl groups, in one molecule. Preferably, an organopolysiloxane having about 3 to 20 may be used in combination. The molecular structure may be any of linear, cyclic, branched, and three-dimensional network structures. Preferably, the main chain is composed of repeating diorganosiloxane units, both ends of the molecular chain are blocked with triorganosiloxy groups, and the viscosity at 25 ° C. is 10 to 100000 mPa · s, particularly 100 to 100,000 mPa · s. An organopolysiloxane.

アルケニル基は少なくとも分子鎖末端のケイ素原子に結合している。さらに分子鎖非末端(分子鎖途中)のケイ素原子に結合しているものを含んでも良い。なかでも下記一般式(化2)で表される分子鎖両末端のケイ素原子上にそれぞれ1〜3個のアルケニル基を有し(但し、この分子鎖末端のケイ素原子に結合したアルケニル基が、両末端合計で3個未満である場合には、分子鎖非末端(分子鎖途中)のケイ素原子に結合したアルケニル基を、(例えばジオルガノシロキサン単位中の置換基として)、少なくとも1個有する直鎖状オルガノポリシロキサンであって、上記でも述べた通り25℃における粘度が10〜1,000,000mPa・sのものが作業性、硬化性などから望ましい。なお、この直鎖状オルガノポリシロキサンは少量の分岐状構造(三官能性シロキサン単位)を分子鎖中に含有するものであってもよい。   The alkenyl group is bonded to at least the silicon atom at the end of the molecular chain. Further, it may include those bonded to a silicon atom at the non-terminal end of the molecular chain (in the middle of the molecular chain). Among them, each having 1 to 3 alkenyl groups on the silicon atoms at both ends of the molecular chain represented by the following general formula (Chemical Formula 2) (provided that the alkenyl group bonded to the silicon atom at the molecular chain end is When the total number of both ends is less than 3, the alkenyl group bonded to the silicon atom at the non-end of the molecular chain (in the middle of the molecular chain) (for example, as a substituent in the diorganosiloxane unit) has at least one As described above, a linear organopolysiloxane having a viscosity of 10 to 1,000,000 mPa · s at 25 ° C. is desirable from the viewpoint of workability, curability, etc. Note that this linear organopolysiloxane has a small amount of branching. It may also contain a structure (trifunctional siloxane unit) in the molecular chain.

Figure 2014208728
Figure 2014208728

式中、R3は互いに同一又は異種の非置換又は置換一価炭化水素基であって、少なくとも1個がアルケニル基である。R4は互いに同一又は異種の脂肪族不飽和結合を有さない非置換又は置換一価炭化水素基であり、R5はアルケニル基であり、l,mは0又は正の整数である。 In the formula, R 3 is the same or different unsubstituted or substituted monovalent hydrocarbon group, and at least one is an alkenyl group. R 4 is an unsubstituted or substituted monovalent hydrocarbon group which does not have the same or different aliphatic unsaturated bond, R 5 is an alkenyl group, and l and m are 0 or a positive integer.

ここで、R3の一価炭化水素基としては、炭素原子数1〜10、特に1〜6のものが好ましく、具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert−ブチル基、ペンチル基、ネオペンチル基、ヘキシル基、シクロヘキシル基、オクチル基、ノニル基、デシル基等のアルキル基、フェニル基、トリル基、キシリル基、ナフチル基等のアリール基、ベンジル基、フェニルエチル基、フェニルプロピル基等のアラルキル基、ビニル基、アリル基、プロペニル基、イソプロペニル基、ブテニル基、ヘキセニル基、シクロヘキセニル基、オクテニル基等のアルケニル基や、これらの基の水素原子の一部又は全部をフッ素、臭素、塩素等のハロゲン原子、シアノ基等で置換したもの、例えばクロロメチル基、クロロプロピル基、ブロモエチル基、トリフロロプロピル基等のハロゲン置換アルキル基やシアノエチル基等が挙げられる。 Here, as the monovalent hydrocarbon group of R 3 , those having 1 to 10 carbon atoms, particularly 1 to 6 carbon atoms are preferable, and specifically, methyl group, ethyl group, propyl group, isopropyl group, butyl group, Alkyl group such as isobutyl group, tert-butyl group, pentyl group, neopentyl group, hexyl group, cyclohexyl group, octyl group, nonyl group, decyl group, aryl group such as phenyl group, tolyl group, xylyl group, naphthyl group, benzyl Group, aralkyl group such as phenylethyl group, phenylpropyl group, etc., alkenyl group such as vinyl group, allyl group, propenyl group, isopropenyl group, butenyl group, hexenyl group, cyclohexenyl group, octenyl group, and hydrogen of these groups Some or all of the atoms are substituted with halogen atoms such as fluorine, bromine and chlorine, cyano groups, etc., for example, chloromethyl , Chloropropyl group, bromoethyl group, and a halogen-substituted alkyl group or cyanoethyl group such trifluoropropyl group.

また、R4の一価炭化水素基としても、炭素原子数1〜10、特に1〜6のものが好ましく、上記R1の具体例と同様のものが例示できるが、但しアルケニル基は含まない。 Also, as the monovalent hydrocarbon group for R 4 , those having 1 to 10 carbon atoms, particularly 1 to 6 carbon atoms are preferable, and the same examples as the specific examples of R 1 can be exemplified, but an alkenyl group is not included. .

5のアルケニル基としては、例えば炭素数2〜6、特に炭素数2〜3のものが好ましく、具体的には前記式(化1)のR2と同じものが例示され、好ましくはビニル基である。 As the alkenyl group for R 5 , for example, those having 2 to 6 carbon atoms, particularly those having 2 to 3 carbon atoms are preferable, and specifically the same as R 2 in the above formula (Chemical Formula 1) are exemplified, preferably vinyl group It is.

l,mは、一般的には0<l+m≦10000を満足する0又は正の整数であり、好ましくは5≦l+m≦2000、より好ましくは10≦l+m≦1200で、0<l/(l+m)≦0.2、好ましくは、0.0011≦l/(l+m)0.1を満足する整数である。   l and m are generally 0 or a positive integer satisfying 0 <l + m ≦ 10000, preferably 5 ≦ l + m ≦ 2000, more preferably 10 ≦ l + m ≦ 1200, and 0 <l / (l + m). ≦ 0.2, preferably an integer satisfying 0.0011 ≦ l / (l + m) 0.1.

(3)架橋成分(B成分)
本発明のB成分のオルガノハイドロジェンポリシロキサンは架橋剤として作用するものであり、この成分中のSiH基とA成分中のアルケニル基とが付加反応(ヒドロシリル化)することにより硬化物を形成するものである。かかるオルガノハイドロジェンポリシロキサンは、一分子中にケイ素原子に結合した水素原子(即ち、SiH基)を2個以上有するものであればいずれのものでもよく、このオルガノハイドロジェンポリシロキサンの分子構造は、直鎖状、環状、分岐状、三次元網状構造のいずれであってもよいが、一分子中のケイ素原子の数(即ち、重合度)は2〜1000、特に2〜300程度のものを使用することができる。
(3) Crosslinking component (component B)
The B component organohydrogenpolysiloxane of the present invention acts as a crosslinking agent, and a cured product is formed by the addition reaction (hydrosilylation) of the SiH group in this component and the alkenyl group in the A component. Is. The organohydrogenpolysiloxane may be any organohydrogenpolysiloxane as long as it has two or more hydrogen atoms (that is, SiH groups) bonded to silicon atoms in one molecule. Any of linear, cyclic, branched, and three-dimensional network structures may be used, but the number of silicon atoms in one molecule (that is, the degree of polymerization) is about 2 to 1000, particularly about 2 to 300. Can be used.

水素原子が結合するケイ素原子の位置は特に制約はなく、分子鎖の末端でも非末端(途中)でもよい。また、水素原子以外のケイ素原子に結合した有機基としては、前記一般式(化1)のR1と同様の脂肪族不飽和結合を有さない非置換又は置換一価炭化水素基が挙げられる。 The position of the silicon atom to which the hydrogen atom is bonded is not particularly limited, and may be at the end of the molecular chain or at the non-terminal (midway). The organic groups bonded to silicon atoms other than hydrogen atom, a substituted or unsubstituted monovalent hydrocarbon group that does not have the same aliphatic unsaturation and R 1 in the general formula (Formula 1) .

B成分のオルガノハイドロジェンポリシロキサンとしては下記構造のものが例示できる。   Examples of the B component organohydrogenpolysiloxane include the following structures.

Figure 2014208728
Figure 2014208728

Figure 2014208728
Figure 2014208728

Figure 2014208728
Figure 2014208728

上記の式中、Phはフェニル基、エポキシ基、アクリロイル基、メタアクリロイル基、アルコキシ基の少なくとも1種を含む有機基である。Lは0〜1,000の整数、特には0〜300の整数であり、Mは1〜200の整数である。)   In the above formula, Ph is an organic group containing at least one of a phenyl group, an epoxy group, an acryloyl group, a methacryloyl group, and an alkoxy group. L is an integer of 0 to 1,000, particularly an integer of 0 to 300, and M is an integer of 1 to 200. )

このようなオルガノハイドロジェンポリシロキサンは、周知の方法により、例えば、R5SiHCl2、(R53SiCl、(R52SiCl2、(R52SiHCl(式中、R5は、メチル基、エチル基等のアルキル基又はフェニル基等のアリール基である)のようなクロロシランを加水分解縮合するか、加水分解して得られたシロキサンを平衡化することにより得ることができる。 Such an organohydrogenpolysiloxane can be obtained by a known method, for example, R 5 SiHCl 2 , (R 5 ) 3 SiCl, (R 5 ) 2 SiCl 2 , (R 5 ) 2 SiHCl (wherein R 5 is A chlorosilane such as a methyl group, an alkyl group such as an ethyl group, or an aryl group such as a phenyl group, or by equilibrating a siloxane obtained by hydrolysis.

(4)触媒成分
C成分の触媒成分は、本組成物の硬化を促進させる成分である。C成分としては、ヒドロシリル化反応に用いられる触媒として周知の触媒を用いることができる。例えば白金黒、塩化第2白金、塩化白金酸、塩化白金酸と一価アルコールとの反応物、塩化白金酸とオレフィン類やビニルシロキサンとの錯体、白金ビスアセトアセテート等の白金系触媒、パラジウム系触媒、ロジウム系触媒などの白金族金属触媒が挙げられる。C成分の配合量は、硬化に必要な量であればよく、所望の硬化速度などに応じて適宜調整することができる。A成分に対して重量単位で0.01〜1000ppm添加する。
(4) Catalyst component The catalyst component of component C is a component that promotes curing of the composition. As C component, a well-known catalyst can be used as a catalyst used for hydrosilylation reaction. For example, platinum black, secondary platinum chloride, chloroplatinic acid, a reaction product of chloroplatinic acid and a monohydric alcohol, a complex of chloroplatinic acid and olefins or vinyl siloxane, platinum-based catalysts such as platinum bisacetoacetate, palladium-based Examples thereof include platinum group metal catalysts such as catalysts and rhodium catalysts. The compounding amount of the component C may be an amount necessary for curing, and can be appropriately adjusted according to a desired curing rate. Add 0.01 to 1000 ppm by weight with respect to component A.

(5)熱伝導性粒子
D成分の熱伝導性粒子は、A成分+B成分合計100重量部に対して100〜2000重量部添加する。これにより熱伝導シートやパテ材の熱伝導率を0.2〜10W/m・Kの範囲とすることができる。熱伝導粒子としては、アルミナ,酸化亜鉛,酸化マグネシウム、窒化アルミ、窒化ホウ素、水酸化アルミ及びシリカから選ばれる少なくとも一つであることが好ましい。形状は球状,鱗片状,多面体状等様々なものを使用できる。アルミナを使用する場合は、純度99.5重量%以上のα−アルミナが好ましい。熱伝導性粒子の比表面積は0.06〜10m2/gの範囲が好ましい。比表面積はBET比表面積であり、測定方法はJIS R1626にしたがう。平均粒子径を用いる場合は、0.1〜100μmの範囲が好ましい。粒子径の測定はレーザー回折光散乱法により、50%粒子径を測定する。この測定器は例えば堀場製作所製社製のレーザー回折/散乱式粒子分布測定装置LA−950S2がある。
(5) Thermally conductive particles The thermally conductive particles of component D are added in an amount of 100 to 2000 parts by weight based on 100 parts by weight of the total of component A and component B. Thereby, the heat conductivity of a heat conductive sheet or a putty material can be made into the range of 0.2-10 W / m * K. The thermally conductive particles are preferably at least one selected from alumina, zinc oxide, magnesium oxide, aluminum nitride, boron nitride, aluminum hydroxide and silica. Various shapes such as a spherical shape, a scale shape, and a polyhedral shape can be used. When alumina is used, α-alumina having a purity of 99.5% by weight or more is preferable. The specific surface area of the heat conductive particles is preferably in the range of 0.06 to 10 m 2 / g. The specific surface area is a BET specific surface area, and the measuring method is in accordance with JIS R1626. When using an average particle diameter, the range of 0.1-100 micrometers is preferable. The particle diameter is measured by 50% particle diameter by a laser diffraction light scattering method. An example of this measuring instrument is a laser diffraction / scattering particle distribution measuring apparatus LA-950S2 manufactured by Horiba.

熱伝導性粒子は平均粒子径が異なる少なくとも2つの無機粒子を併用するのが好ましい。このようにすると大きな粒子径の間に小さな粒子径の熱伝導性無機粒子が埋まり、最密充填に近い状態で充填でき、熱伝導性が高くなるからである。相対的に平均粒子径の小さな無機粒子は、R(CH3aSi(OR’)3-a(Rは炭素数6〜20の非置換または置換有機基、R’は炭素数1〜4のアルキル基、aは0もしくは1)で示されるシラン化合物、もしくはその部分加水分解物で表面処理するのが好ましい。R(CH3aSi(OR’)3-a(Rは炭素数6〜20の非置換または置換有機基、R’は炭素数1〜4のアルキル基、aは0もしくは1)で示されるシラン化合物(以下単に「シラン」という。)は、一例としてヘキシルトリメトキシラン,ヘキシルトリエトキシシラン,オクチルトリメトキシシラン,オクチルトリエトキシラン,デシルトリメトキシシラン,デシルトリエトキシシラン,ドデシルトリメトキシシラン,ドデシルトリエトキシシラン,ヘキサドデシルトリメトキシシラン,ヘキサドデシルトリエトキシシシラン,オクタデシルトリメトキシシラン,オクタデシルトリエトキシシシラン等がある。前記シラン化合物は、一種又は二種以上混合して使用することができる。ここでいう表面処理とは共有結合のほか吸着なども含む。前記相対的に平均粒子径の大きな無機粒子は、例えば平均粒子径が2μm以上のものをいい、粒子全体を100重量%としたとき50重量%以上添加するのが好ましい。 The thermally conductive particles are preferably used in combination with at least two inorganic particles having different average particle sizes. This is because the heat conductive inorganic particles having a small particle diameter are buried between the large particle diameters and can be filled in a state close to the closest packing, and the heat conductivity is increased. Inorganic particles having a relatively small average particle size are R (CH 3 ) a Si (OR ′) 3 -a (R is an unsubstituted or substituted organic group having 6 to 20 carbon atoms, R ′ is 1 to 4 carbon atoms) It is preferable to surface-treat with an alkyl group in which a is 0 or 1), or a partial hydrolyzate thereof. R (CH 3 ) a Si (OR ′) 3-a (wherein R is an unsubstituted or substituted organic group having 6 to 20 carbon atoms, R ′ is an alkyl group having 1 to 4 carbon atoms, a is 0 or 1) Examples of silane compounds (hereinafter simply referred to as “silane”) include hexyltrimethoxysilane, hexyltriethoxysilane, octyltrimethoxysilane, octyltriethoxysilane, decyltrimethoxysilane, decyltriethoxysilane, and dodecyltrimethoxysilane. , Dodecyltriethoxysilane, hexadodecyltrimethoxysilane, hexadodecyltriethoxysilane, octadecyltrimethoxysilane, octadecyltriethoxysilane. The said silane compound can be used 1 type or in mixture of 2 or more types. Surface treatment here includes adsorption in addition to covalent bonds. The inorganic particles having a relatively large average particle diameter are, for example, those having an average particle diameter of 2 μm or more, and it is preferable to add 50% by weight or more when the entire particle is 100% by weight.

(6)その他の成分
本発明の組成物には、必要に応じて前記以外の成分を配合することができる。例えばベンガラなどの無機顔料、フィラーの表面処理等の目的でアルキルトリアルコキシシランなどを添加してもよい。
(6) Other components Components other than those described above can be blended in the composition of the present invention as necessary. For example, an inorganic trial pigment such as Bengala, an alkyltrialkoxysilane or the like may be added for the purpose of surface treatment of the filler.

本発明の熱伝導性シリコーン材料の熱伝導率は0.2〜10W/m・Kの範囲である。好ましくは0.5〜5W/m・K、さらに好ましくは1〜3W/m・Kである。前記の範囲であれば、発熱体からの熱を蓄熱材に効率よく熱伝導させることができる。蓄熱性の測定方法については実施例で説明する。   The thermal conductivity of the thermally conductive silicone material of the present invention is in the range of 0.2 to 10 W / m · K. Preferably it is 0.5-5W / m * K, More preferably, it is 1-3W / m * K. If it is the said range, the heat from a heat generating body can be efficiently thermally conducted to a thermal storage material. The heat storage measurement method will be described in Examples.

図1は一実施例における蓄熱性シリコーンシート20の模式的断面図である。このシート20は、架橋されたオルガノポリシロキサン21内に蓄熱材粒子22と熱伝導性大粒子23と熱伝導性小粒子24を含んでいる。蓄熱性と熱伝導性が高く、発熱部品と筐体との間に蓄熱性シリコーン材料を介在させた場合、より高い蓄熱効果が得られる。   FIG. 1 is a schematic cross-sectional view of a heat storage silicone sheet 20 in one embodiment. The sheet 20 includes heat storage material particles 22, heat conductive large particles 23, and heat conductive small particles 24 in a crosslinked organopolysiloxane 21. When the heat storage silicone material is interposed between the heat-generating component and the housing, a higher heat storage effect is obtained.

以下実施例を用いて説明する。本発明は実施例に限定されるものではない。
<蓄熱性評価試験>
蓄熱性評価試験装置10を図2に示す。熱絶縁性基台11の上に下記の部材を重ねた。熱電対の位置及びその他の条件とともに下記に示す。
(1)セラミックヒーター12(縦横各10mm、厚さ1.75mm)
(2)熱伝導性シート13(縦横各10mm、厚さ2mm)
(3)アルミ板14(縦横各22.5mm、厚さ4mm)
(4)シートサンプル15(縦横各20mm、厚さは1mmのものを2枚重ねとした。)
(5)ベーク板16(縦横各22.5mm、厚さ4mm)
(6)熱電対17:熱絶縁性基台11とセラミックヒーター12の間に挿入。
(7)熱電対18:アルミ板14の厚み方向の中央孔に挿入。
(8)熱電対19:ベーク板16の厚み方向の中央孔に挿入。
(9)セラミックヒーター12への印加電力:5W
This will be described below with reference to examples. The present invention is not limited to the examples.
<Heat storage evaluation test>
The heat storage evaluation test apparatus 10 is shown in FIG. The following members were stacked on the heat insulating base 11. It is shown below together with the position of the thermocouple and other conditions.
(1) Ceramic heater 12 (10mm in length and width, 1.75mm in thickness)
(2) Thermally conductive sheet 13 (10 mm in length and width, 2 mm in thickness)
(3) Aluminum plate 14 (vertical and horizontal 22.5mm each, thickness 4mm)
(4) Sheet sample 15 (20 mm in length and width and 1 mm in thickness were stacked in two)
(5) Bake plate 16 (vertical and horizontal 22.5mm each, thickness 4mm)
(6) Thermocouple 17: Inserted between the thermally insulating base 11 and the ceramic heater 12.
(7) Thermocouple 18: Inserted into the central hole in the thickness direction of the aluminum plate 14.
(8) Thermocouple 19: Inserted into the central hole in the thickness direction of the bake plate 16.
(9) Applied power to the ceramic heater 12: 5W

<熱抵抗値及び熱伝導率測定方法>
ASTM D5470に準拠したTIM-Tester(Analysis Tech社製)を使用して測定した。図3A-Bに熱抵抗測定装置1の概略図を示す。図3Aに示すように冷却プレート3の上に直径33mmのシートサンプル4を乗せる。上部にはヒーター5とロードセル6とシリンダー8がこの順番に組み込まれており、シリンダーの外側には円筒形の断熱材7が下に移動できる状態でセットされている。2は天板である。測定時には図3Bの状態とし、シリンダー8を駆動させて100kPaに加圧し、ヒーター5の温度T1と冷却プレート3の温度T2の温度差と、印加電力から次の式により熱抵抗値Rtを算出し、この熱抵抗値Rtとサンプルの厚みから熱伝導率を算出した。
Rt=[(T1−T2)/Q]×S
Rt:熱抵抗値
T1:ヒーター温度(℃)
T2:冷却プレート温度(℃)
Q:印加電力(W)
S:サンプル接触面積(cm2
<Method of measuring thermal resistance and thermal conductivity>
It measured using TIM-Tester (made by Analysis Tech) based on ASTM D5470. 3A and 3B are schematic views of the thermal resistance measuring device 1. FIG. As shown in FIG. 3A, a sheet sample 4 having a diameter of 33 mm is placed on the cooling plate 3. A heater 5, a load cell 6 and a cylinder 8 are incorporated in this order in the upper part, and a cylindrical heat insulating material 7 is set on the outside of the cylinder so that it can move downward. 2 is a top plate. At the time of measurement, the state shown in FIG. 3B is set, the cylinder 8 is driven and pressurized to 100 kPa, and the thermal resistance value Rt is calculated from the temperature difference between the temperature T1 of the heater 5 and the temperature T2 of the cooling plate 3 and the applied power by the following formula. The thermal conductivity was calculated from the thermal resistance value Rt and the thickness of the sample.
Rt = [(T1-T2) / Q] × S
Rt: Thermal resistance value T1: Heater temperature (° C)
T2: Cooling plate temperature (° C)
Q: Applied power (W)
S: Sample contact area (cm 2 )

(実施例1)
1.材料成分
(1)シリコーン成分
シリコーン成分として二液室温硬化シリコーンゴム(二液RTV)を使用した。なお、二液RTVにはベースポリマー成分(A成分)と架橋成分(B成分)と白金系金属触媒(C成分)が予め添加されている。
(2)マイクロカプセル化した蓄熱材粒子(E成分)
マイクロカプセル化した蓄熱材粒子は三菱製紙社製、商品名“サーモメモリー”、品番"FP-58"(平均粒径50μm、融点58℃、溶解熱量54.9J/g、嵩密度0.3〜0.4g/cm3)を前記シリコーン成分(A+B)成分100重量部に対して200重量部添加した。このマイクロカプセル化した蓄熱材粒子には融点58℃のパラフィンがメラミン系樹脂により封入されている。
(3)熱伝導性粒子(D成分)
(a)小粒径熱伝導性粒子
小粒径熱伝導性粒子は平均粒子径0.3μmのアルミナをシランカップリング剤で表面処理して使用した。
(b)中粒径熱伝導性粒子
中粒径熱伝導性粒子は平均粒子径3μmのアルミナをシランカップリング剤で表面処理して使用した。
(c)大粒径熱伝導性粒子
大粒径熱伝導性粒子は平均粒子径75μmのアルミナを使用した。
(d)熱伝導性粒子(D成分)の添加量
シリコーン成分(A+B)100重量部に対して小粒径熱伝導性粒子を100重量部、中粒径熱伝導性粒子を200重量部、大粒径熱伝導性粒子200重量部添加した。
2.シート成形加工方法
離型処理をしたポリエステルフィルム上に厚さ2mmの金枠を置きコンパウンドを流し込み、もう一枚の離型処理をしたポリエステルフィルムを載せた。これを5MPaの圧力で、120℃、10分硬化した。
Example 1
1. Material component (1) Silicone component Two-component room temperature curing silicone rubber (two-component RTV) was used as the silicone component. Note that a base polymer component (A component), a crosslinking component (B component), and a platinum-based metal catalyst (C component) are added in advance to the two-component RTV.
(2) Thermally encapsulated heat storage material particles (E component)
The microencapsulated heat storage material particles are manufactured by Mitsubishi Paper Industries Co., Ltd., trade name “Thermo Memory”, product number “FP-58” (average particle size 50 μm, melting point 58 ° C., heat of dissolution 54.9 J / g, bulk density 0.3 to 0.4 g / cm 3 ) was added in an amount of 200 parts by weight based on 100 parts by weight of the silicone component (A + B) component. The microencapsulated heat storage material particles are filled with paraffin having a melting point of 58 ° C. with melamine resin.
(3) Thermally conductive particles (component D)
(A) Small-diameter heat conductive particles The small-diameter heat conductive particles were used after surface-treating alumina having an average particle diameter of 0.3 μm with a silane coupling agent.
(B) Medium-diameter thermally conductive particles Medium-diameter thermally conductive particles were used after surface-treating alumina having an average particle diameter of 3 μm with a silane coupling agent.
(C) Large-diameter thermally conductive particles The large-diameter thermally conductive particles used were alumina having an average particle diameter of 75 μm.
(D) Addition amount of thermally conductive particles (component D) 100 parts by weight of small particle size thermally conductive particles and 200 parts by weight of medium particle size thermally conductive particles with respect to 100 parts by weight of silicone component (A + B) 200 parts by weight of thermally conductive particles having a particle size were added.
2. Sheet Molding Method A 2 mm thick metal frame was placed on the release-treated polyester film, the compound was poured, and another release-treated polyester film was placed. This was cured at 120 ° C. for 10 minutes at a pressure of 5 MPa.

得られたシリコーン材料の物性は表1にまとめて示す。   The physical properties of the obtained silicone material are summarized in Table 1.

(実施例2)
(1)シリコーン成分
実施例1と同一物を使用した。
(2)マイクロカプセル化した蓄熱材粒子(E成分)
マイクロカプセル化した蓄熱材粒子は三菱製紙社製、商品名“サーモメモリー”、品番"FP-58"を前記シリコーン成分(A+B)成分100重量部に対して250重量部添加した。
(3)熱伝導性粒子(D成分)
(a)小粒径熱伝導性粒子
小粒径熱伝導性粒子は平均粒子径0.3μmのアルミナをシランカップリング剤で表面処理して使用した。
(b)中粒径熱伝導性粒子
中粒径熱伝導性粒子は平均粒子径3μmのアルミナをシランカップリング剤で表面処理して使用した。
(c)熱伝導性粒子(D成分)の添加量
シリコーン成分(A+B)100重量部に対して小粒径熱伝導性粒子を150重量部、大粒径熱伝導性粒子200重量部添加した。
2.シート成形加工方法
実施例1と同様にシート成形した。
(Example 2)
(1) Silicone component The same component as in Example 1 was used.
(2) Thermally encapsulated heat storage material particles (E component)
The microencapsulated heat storage material particles were manufactured by Mitsubishi Paper Industries Co., Ltd., and trade name “Thermo Memory”, product number “FP-58” was added by 250 parts by weight to 100 parts by weight of the silicone component (A + B) component.
(3) Thermally conductive particles (component D)
(A) Small-diameter heat conductive particles The small-diameter heat conductive particles were used after surface-treating alumina having an average particle diameter of 0.3 μm with a silane coupling agent.
(B) Medium-diameter thermally conductive particles Medium-diameter thermally conductive particles were used after surface-treating alumina having an average particle diameter of 3 μm with a silane coupling agent.
(C) Addition amount of thermally conductive particles (component D) 150 parts by weight of small particle size thermally conductive particles and 200 parts by weight of large particle size thermally conductive particles were added to 100 parts by weight of the silicone component (A + B).
2. Sheet Forming Method A sheet was formed in the same manner as in Example 1.

得られたシリコーン材料の物性は表1にまとめて示す。   The physical properties of the obtained silicone material are summarized in Table 1.

(比較例1)
1.材料成分
(1)シリコーン成分
シリコーン成分として二液室温硬化シリコーンゴム(二液RTV)を使用した。なお、二液RTVにはベースポリマー成分(A)と架橋成分(B)と白金系金属触媒(C)が予め添加されている。
(2)マイクロカプセル化した蓄熱材粒子(E成分)
マイクロカプセル化した蓄熱材粒子は三菱製紙社製、商品名“サーモメモリー”、品番"FP-58"を前記シリコーン成分(A+B)成分100重量部に対して150重量部添加した。
2.シート成形加工方法
実施例1と同様にシート成形した。なお比較例1においては熱伝導性粒子は添加しなかった。
(Comparative Example 1)
1. Material component (1) Silicone component Two-component room temperature curing silicone rubber (two-component RTV) was used as the silicone component. Note that the base polymer component (A), the crosslinking component (B), and the platinum-based metal catalyst (C) are added in advance to the two-component RTV.
(2) Thermally encapsulated heat storage material particles (E component)
The microencapsulated heat storage material particles were manufactured by Mitsubishi Paper Industries Co., Ltd., and trade name “Thermo Memory”, product number “FP-58” was added in an amount of 150 parts by weight to 100 parts by weight of the silicone component (A + B) component.
2. Sheet Forming Method A sheet was formed in the same manner as in Example 1. In Comparative Example 1, no thermally conductive particles were added.

得られたシリコーン材料の物性は表1にまとめて示す。   The physical properties of the obtained silicone material are summarized in Table 1.

Figure 2014208728
Figure 2014208728

次に図2に示す蓄熱性評価試験を行った結果を図4及び図5のグラフに示す。図4のA部の拡大図が図5である。図5のB部から、蓄熱が開始される温度は、熱伝導率の高い実施例2品がもっとも早いことがわかる。図5のC部から、蓄熱される効果(蓄熱量)は、熱伝導率の高い方が大きいことがわかる。このことから、蓄熱材粒子を加えないと蓄熱される効果(蓄熱量)は低いことがわかる。すなわち、本発明の各実施例品の熱伝導率は高く(表1)、かつ蓄熱量も高いことが確認できた。   Next, the results of the thermal storage evaluation test shown in FIG. 2 are shown in the graphs of FIGS. FIG. 5 is an enlarged view of a portion A in FIG. From part B in FIG. 5, it can be seen that the temperature at which heat storage is started is the fastest in Example 2 product with high thermal conductivity. From part C in FIG. 5, it can be seen that the effect of storing heat (heat storage amount) is higher when the thermal conductivity is higher. From this, it can be seen that the effect of storing heat (heat storage amount) is low unless the heat storage material particles are added. That is, it was confirmed that the thermal conductivity of each example product of the present invention was high (Table 1) and the heat storage amount was also high.

本発明の蓄熱性シリコーン材料は、シート、パテ材など様々な形態の製品に適用できる。   The heat storage silicone material of the present invention can be applied to various forms of products such as sheets and putty materials.

1 熱抵抗測定装置
2 天板
3 冷却プレート
4 シートサンプル
5 ヒーター
6 ロードセル
7 断熱材
8 シリンダー
10 蓄熱性評価試験装置
11 熱絶縁性基台
12 セラミックヒーター
13 熱伝導性シート
14 アルミ板
15 シートサンプル
16 ベーク板
17,18,19 熱電対
20 蓄熱性シリコーンシート
21 オルガノポリシロキサン
22 蓄熱材粒子
23 熱伝導性大粒子
24 熱伝導性小粒子
DESCRIPTION OF SYMBOLS 1 Thermal resistance measuring apparatus 2 Top plate 3 Cooling plate 4 Sheet sample 5 Heater 6 Load cell 7 Thermal insulation material 8 Cylinder 10 Thermal storage evaluation test apparatus 11 Thermal insulation base 12 Ceramic heater 13 Thermal conductive sheet 14 Aluminum plate 15 Sheet sample 16 Bake plates 17, 18, 19 Thermocouple 20 Thermal storage silicone sheet 21 Organopolysiloxane 22 Thermal storage material particle 23 Thermal conductive large particle 24 Thermal conductive small particle

Claims (8)

オルガノポリシロキサンと熱伝導性粒子と蓄熱材を含む蓄熱性シリコーン材料であって、
前記蓄熱材は融点0〜100℃の蓄熱物質をマイクロカプセル化した蓄熱材粒子であり、
前記オルガノポリシロキサン100重量部に対して前記熱伝導性粒子を100〜2000重量部含み、
熱伝導率が0.2〜10W/m・Kであることを特徴とする蓄熱性シリコーン材料。
A heat storage silicone material comprising an organopolysiloxane, thermally conductive particles and a heat storage material,
The heat storage material is a heat storage material particle in which a heat storage material having a melting point of 0 to 100 ° C. is microencapsulated,
100 to 2000 parts by weight of the thermally conductive particles with respect to 100 parts by weight of the organopolysiloxane,
A heat storage silicone material having a thermal conductivity of 0.2 to 10 W / m · K.
前記蓄熱材粒子は、オルガノポリシロキサン100重量部に対して100〜500重量部含む請求項1に記載の蓄熱性シリコーン材料。   The heat storage silicone material according to claim 1, wherein the heat storage material particles include 100 to 500 parts by weight with respect to 100 parts by weight of the organopolysiloxane. 前記蓄熱材粒子は平均粒子径が0.1〜100μmである請求項1又は2に記載の蓄熱性シリコーン材料。   The heat storage silicone material according to claim 1, wherein the heat storage material particles have an average particle diameter of 0.1 to 100 μm. 前記熱伝導性粒子は平均粒子径が異なる少なくとも2つの無機粒子を含み、
相対的に平均粒子径の小さな無機粒子は、R(CH3aSi(OR’)3-a(Rは炭素数6〜20の非置換または置換有機基、R’は炭素数1〜4のアルキル基、aは0もしくは1)で示されるシラン化合物、もしくはその部分加水分解物で表面処理されている請求項1〜3のいずれか1項に記載の蓄熱性シリコーン材料。
The thermally conductive particles include at least two inorganic particles having different average particle sizes,
Inorganic particles having a relatively small average particle size are R (CH 3 ) a Si (OR ′) 3 -a (R is an unsubstituted or substituted organic group having 6 to 20 carbon atoms, R ′ is 1 to 4 carbon atoms) The heat storage silicone material of any one of Claims 1-3 currently surface-treated with the silane compound or its partial hydrolyzate shown by the alkyl group of a, a is 0 or 1).
前記熱伝導性粒子は平均粒子径が2μm以上の無機粒子と平均粒子径が2μm未満の無機粒子を含み、
前記平均粒子径が2μm以上の無機粒子は、粒子全体を100重量%としたとき50重量%以上である請求項1〜4のいずれか1項に記載の蓄熱性シリコーン材料。
The thermally conductive particles include inorganic particles having an average particle diameter of 2 μm or more and inorganic particles having an average particle diameter of less than 2 μm,
The heat storage silicone material according to any one of claims 1 to 4, wherein the inorganic particles having an average particle diameter of 2 µm or more is 50 wt% or more when the entire particle is 100 wt%.
前記熱伝導性粒子が、アルミナ、酸化亜鉛、酸化マグネシウム、窒化アルミ、窒化ホウ素、水酸化アルミ及びシリカから選ばれる少なくとも一つの粒子である請求項1〜6のいずれか1項に記載の性蓄熱性シリコーン材料。   The sex heat storage according to any one of claims 1 to 6, wherein the thermally conductive particles are at least one particle selected from alumina, zinc oxide, magnesium oxide, aluminum nitride, boron nitride, aluminum hydroxide, and silica. Silicone material. 前記熱伝導性シリコーン材料には、さらに無機粒子顔料が添加されている請求項1〜6のいずれか1項に記載の蓄熱性シリコーン材料。   The heat storage silicone material according to any one of claims 1 to 6, wherein an inorganic particle pigment is further added to the heat conductive silicone material. 請求項1〜7のいずれか1項に記載の蓄熱性シリコーン材料の製造方法であって、
前記シリコーン材料は、下記組成のコンパウンドを架橋させたことを特徴とする蓄熱性シリコーン材料の製造方法。
(A)ベースポリマー成分:1分子中に平均2個以上かつ分子鎖両末端のケイ素原子に結合したアルケニル基を含有する直鎖状オルガノポリシロキサン。
(B)架橋成分:1分子中に平均2個以上のケイ素原子に結合した水素原子を含有するオルガノハイドロジェンポリシロキサンが、前記A成分中のケイ素原子結合アルケニル基1モルに対して、1モル未満の量。
(C)白金系金属触媒:A成分に対して重量単位で0.01〜1000ppm。
(D)熱伝導性粒子:A成分+B成分合計100重量部に対して100〜2000重量部。
(E)融点0〜100℃の蓄熱物質をマイクロカプセル化した蓄熱材粒子:A成分+B成分合計100重量部に対して100〜500重量部。
It is a manufacturing method of the heat storage silicone material of any one of Claims 1-7,
The method for producing a heat storage silicone material, wherein the silicone material is obtained by crosslinking a compound having the following composition.
(A) Base polymer component: a linear organopolysiloxane containing an alkenyl group bonded to silicon atoms at both ends of the molecular chain in an average of 2 or more in the molecule.
(B) Crosslinking component: 1 mole of the organohydrogenpolysiloxane containing hydrogen atoms bonded to an average of 2 or more silicon atoms in one molecule is 1 mole per mole of the silicon atom-bonded alkenyl group in the component A. Less than the amount.
(C) Platinum-based metal catalyst: 0.01 to 1000 ppm by weight with respect to component A.
(D) Thermally conductive particles: 100 to 2000 parts by weight with respect to 100 parts by weight of the total of component A and component B.
(E) Heat storage material particles obtained by microencapsulating a heat storage material having a melting point of 0 to 100 ° C .: 100 to 500 parts by weight with respect to 100 parts by weight of A component + B component in total.
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