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JP2014200755A - Water treatment method and water treatment apparatus - Google Patents

Water treatment method and water treatment apparatus Download PDF

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JP2014200755A
JP2014200755A JP2013080196A JP2013080196A JP2014200755A JP 2014200755 A JP2014200755 A JP 2014200755A JP 2013080196 A JP2013080196 A JP 2013080196A JP 2013080196 A JP2013080196 A JP 2013080196A JP 2014200755 A JP2014200755 A JP 2014200755A
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JP6208968B2 (en
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デニス ルベッツ
Dennis Rubettes
デニス ルベッツ
ヴァレリー ヴェルボーフスキ
Valery Verbowski
ヴァレリー ヴェルボーフスキ
スタニスラブ ペトロフ
Stanilav Petrof
スタニスラブ ペトロフ
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GLOBAL ENERGY TRADE CO Ltd
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Abstract

【課題】有機物の分解による除去のみならず,重金属や放射性物質等の有機物以外の不純物についても同時に高除去率で除去できる水処理方法を提供する。【解決手段】処理対象水が導入される処理槽10内に複数の電極20を先端部を所定の間隔を介して配置する。この処理槽10内に電極20の先端部が浸漬するように処理対象水を導入し,導入された処理対象水中にガス導入路13を介して動作ガスを導入,噴射して,動作ガスの気泡と処理対象水から成る気液二相流であるバブル噴流を生成する。このバブル噴流を,交流電圧が印加された電極20の先端部に導入することで,前記電極20間にプラズマアーク放電を生じさせ,有機物を酸化分解し,また,処理対象水中にイオン化して溶け込む重金属を酸化等して除去可能な状態に固形化する活性物質を生成する【選択図】図1Provided is a water treatment method capable of removing not only organic substances by decomposition but also impurities other than organic substances such as heavy metals and radioactive substances at a high removal rate at the same time. A plurality of electrodes 20 are arranged at a tip portion with a predetermined interval in a treatment tank 10 into which water to be treated is introduced. The processing target water is introduced so that the tip of the electrode 20 is immersed in the processing tank 10, and the working gas is introduced and injected into the introduced processing target water through the gas introduction path 13, thereby causing bubbles of the working gas. And a bubble jet which is a gas-liquid two-phase flow consisting of water to be treated. By introducing this bubble jet into the tip of the electrode 20 to which an AC voltage is applied, a plasma arc discharge is generated between the electrodes 20 to oxidize and decompose organic matter and to ionize and dissolve in the water to be treated. Generates an active substance that solidifies it into a removable state by oxidizing heavy metal, etc. [Selection] Figure 1

Description

本発明は水処理方法及び水処理装置に関し,より詳細には,不純物を含む導電性の水を処理対象とし,この水にイオン化して含まれる重金属不純物を固形化させて除去する他,有機物の分解によるガス化,殺菌,洗浄,活性化等を行うための水処理方法,及び前記水処理方法の実施に使用する水処理装置に関する。   The present invention relates to a water treatment method and a water treatment apparatus. More specifically, the present invention is intended for treating conductive water containing impurities, solidifying and removing heavy metal impurities contained in the water by ionization, and removing organic substances. The present invention relates to a water treatment method for performing gasification, disinfection, cleaning, activation, and the like by decomposition, and a water treatment apparatus used for carrying out the water treatment method.

金属や有機物等の不純物を含む水の処理技術は,上下水道水の処理,工場排水の処理等において広く利用され,現在も発展を続けている。   Water treatment technology that includes impurities such as metals and organic substances is widely used in water and sewage water treatment, factory wastewater treatment, etc., and continues to develop.

このような水処理技術としては,オゾン処理や電気凝集法,促進酸化法(Advanced Oxidation Technologies :AOT's)等が公知であり,また,促進酸化法によっても分解・除去できない有機化合物を分解・除去することを目的として,処理対象とする水にプラズマ放電を行う水処理技術も提案されている(特許文献1参照)。   As such water treatment technology, ozone treatment, electrocoagulation method, advanced oxidation method (Advanced Oxidation Technologies: AOT's), etc. are known, and organic compounds that cannot be decomposed / removed by the accelerated oxidation method are decomposed / removed. For this purpose, a water treatment technique for performing plasma discharge on water to be treated has also been proposed (see Patent Document 1).

〔オゾン処理〕
上記従来の水処理方法のうち,オゾン処理は上下水等の処理に広く使用されている処理方法であり,処理対象水にオゾンを添加することで,オゾンの強い酸化作用を利用して殺菌,脱臭,脱色等を行うものである。
[Ozone treatment]
Among the above conventional water treatment methods, ozone treatment is a treatment method widely used for treatment of water and sewage, etc., and by adding ozone to the water to be treated, sterilization using the strong oxidizing action of ozone, Deodorizing, decolorizing, etc.

この方法では,オゾン発生器により空気中また酸素中で電気放電(グロー放電,誘電体バリア放電,コロナ放電)を行うことによりオゾンを発生させ,このようにして得たオゾンを汚染水中に酸化剤として導入する。   In this method, ozone is generated by performing an electrical discharge (glow discharge, dielectric barrier discharge, corona discharge) in the air or oxygen with an ozone generator, and the ozone thus obtained is oxidized into the contaminated water. Introduce as.

しかし,この方法では,オゾンと反応を起こさない物質も多数存在するため,これらの物質を不純物として含む汚染物質の処理に使用することができない。   However, in this method, since there are many substances that do not react with ozone, they cannot be used for the treatment of pollutants containing these substances as impurities.

また,酸化剤としてオゾンを使用することで,また,酸化剤として塩化物(クロール)を併用することで,二次化合物として発生するオゾニドや有機塩素化合物(トリハロメタン等)が,処理前の不純物よりも毒性の高い物質となる場合があるという欠点を有する。   In addition, by using ozone as the oxidant and using chloride (chlor) as the oxidant, ozonides and organochlorine compounds (trihalomethane, etc.) that are generated as secondary compounds can be removed from impurities before treatment. Also has the disadvantage of becoming a highly toxic substance.

〔電気凝集法〕
先に挙げた水処理技術中,電気凝集法は,処理槽の中に配置された電極間に汚染水を流すことで,汚染水中の不純物を凝集,沈殿させて除去する方法である。
[Electrocoagulation method]
Among the water treatment technologies mentioned above, the electrocoagulation method is a method for removing impurities by coagulating and precipitating impurities in the contaminated water by flowing contaminated water between the electrodes arranged in the treatment tank.

この方法では,電極のうち少なくとも陽極を鉄又はアルミによって製造し,電極間に電圧を印加した際にイオン化して汚染水中に電極を溶出させることで,溶出した電極を凝集剤として利用する。   In this method, at least the anode of the electrodes is made of iron or aluminum, and when the voltage is applied between the electrodes, the electrode is ionized to elute the electrode in the contaminated water, thereby using the eluted electrode as a flocculant.

すなわち,電極が汚染水中に溶出して生成されるアルミ又は鉄の水酸化物は,汚染水に溶解した不純物と反応して不溶解性の化合物を生成し,このようにして生成された化合物が凝集して沈殿することで,取り除きやすい状態となるのである。   That is, the aluminum or iron hydroxide produced when the electrode elutes in the contaminated water reacts with the impurities dissolved in the contaminated water to form an insoluble compound, and the compound thus produced By aggregating and precipitating, it becomes easy to remove.

この電気凝集法によって,水に含まれる重金属イオン,石油製品,ポリマー,脂肪類,オイル類などの乳化・分散した不純物を取り除くことができる。   This electrocoagulation method can remove emulsified and dispersed impurities such as heavy metal ions, petroleum products, polymers, fats and oils contained in water.

〔促進酸化法〕
促進酸化法(Advanced Oxidation Technologies, AOT's)は,オゾン,紫外線,過酸化水素という複数の酸化剤を2種以上併用することにより,これらの酸化剤と水との反応によって強力な酸化作用を持つOHラジカルを生成することで,汚染物質である有機物を酸化分解反応によって除去しようというものである。
[Promoted oxidation method]
Accelerated oxidation (Advanced Oxidation Technologies, AOT's) is a combination of two or more oxidants such as ozone, ultraviolet light, and hydrogen peroxide. By generating radicals, organic substances that are pollutants are removed by an oxidative decomposition reaction.

この方法では,酸化剤として使用したオゾンや紫外線,過酸化水素は,汚染物質の分解後は酸素や水となるため二次廃棄物の発生がなく,また,OHラジカルは酸化力が非常に強く有機物の完全分解が可能で,OHラジカルは選択性が低く,ダイオキシン類や環境ホルモン,農薬等の毒性の高い有機物の分解除去にも非常に高い効果を発揮し,しかも,汚染水の殺菌,脱色,脱臭,COD低減などの効果を同時に享受できるといった利点がある。   In this method, ozone, ultraviolet rays, and hydrogen peroxide used as oxidizing agents become oxygen and water after decomposition of pollutants, so there is no generation of secondary waste, and OH radicals have very strong oxidizing power. Organic substances can be completely decomposed, OH radicals have low selectivity, and are extremely effective in decomposing and removing highly toxic organic substances such as dioxins, environmental hormones, and agricultural chemicals. There is an advantage that effects such as deodorization and COD reduction can be enjoyed simultaneously.

〔プラズマによる処理(特許文献1)〕
なお,塩素,オゾン,OHラジカルなどの強酸化剤を用いても分解することができず,また,前述した促進酸化法により,オゾン,過酸化水素,紫外線照射を組み合わせてOHラジカルを生成しても全く分解しない,難分解性有機物である有機フッ素化合物を分解することを目的として,難分解性有機物を含む液体中にガスをバブリングする気液2相流装置において,バブリングした気体内に放電プラズマを発生する高電圧電源を備えた気液2相流プラズマ処理装置も提案されており(特許文献1参照),この装置によれば,この放電プラズマによって,有機フッ素化合物のような難分解性有機物についても直接分解可能であることが説明されている(特許文献1[0029]欄)。
[Treatment with plasma (Patent Document 1)]
It cannot be decomposed by using strong oxidants such as chlorine, ozone, and OH radicals, and OH radicals are generated by combining ozone, hydrogen peroxide, and ultraviolet irradiation by the above-mentioned accelerated oxidation method. In a gas-liquid two-phase flow device that bubbles gas into a liquid containing a hardly decomposable organic substance for the purpose of decomposing an organic fluorine compound that does not decompose at all, it is a discharge plasma in the bubbled gas. A gas-liquid two-phase flow plasma processing apparatus having a high-voltage power source for generating a gas has also been proposed (see Patent Document 1). According to this apparatus, the discharge plasma causes a hardly decomposable organic substance such as an organic fluorine compound. Is also described that it can be directly decomposed (Patent Document 1 [0029] column).

特開2011−56451号公報JP 2011-56451 A

以上で説明した従来技術中,促進酸化法は,オゾンや過酸化水素,紫外線照射を複合的に適用することで生成したOHラジカルを利用して不純物の分解や除去を行うものであることから,これらの酸化剤を単独で利用する場合に比較して効率的にOHラジカルを生成することが可能で,その結果,高い処理効率を得ることができるものとなっている。   Among the conventional technologies described above, the accelerated oxidation method uses OH radicals generated by the combined application of ozone, hydrogen peroxide, and ultraviolet irradiation to decompose and remove impurities. Compared with the case where these oxidizing agents are used alone, OH radicals can be generated more efficiently, and as a result, high processing efficiency can be obtained.

しかし,この方法では,高価なオゾン発生器を必要とするだけでなく,汚染水に過酸化水素を添加したり,UVランプを設けて紫外線の照射を行う必要があり,装置構成が大掛かりとなるため,多大な初期投資が必要となる。   However, this method requires not only an expensive ozone generator, but also the addition of hydrogen peroxide to the contaminated water or the provision of a UV lamp to irradiate ultraviolet rays, which makes the apparatus configuration large. Therefore, a large initial investment is required.

しかも,汚染水の処理能力はオゾンや過酸化水素の生成効率や,UVランプの発光効率に大きく依存するために,高い処理能力を維持しようとすれば消費電力が増大するため,ランニングコストも多大なものとなる。   In addition, the treatment capacity of contaminated water depends greatly on the generation efficiency of ozone and hydrogen peroxide and the light emission efficiency of the UV lamp. Therefore, if the high treatment capacity is maintained, the power consumption increases and the running cost is also large. It will be something.

これに対し,前掲の特許文献1として紹介した水処理方法では,酸素を泡の状態で導入して気液二相流体とした汚染水を電極間を通過させることで,気泡中にプラズマを生成し,このプラズマによって気泡中に発生した活性物質によって直接的に不純物の分解を行うことで,従来の水処理方法では分解できなかった難分解性の有機物についても分解できるものとなっている。   On the other hand, in the water treatment method introduced as the above-mentioned Patent Document 1, plasma is generated in bubbles by introducing contaminated water as gas-liquid two-phase fluid by introducing oxygen in the form of bubbles between the electrodes. However, by directly decomposing impurities with the active substance generated in the bubbles by this plasma, it is possible to decompose even the hardly decomposable organic substances that could not be decomposed by the conventional water treatment method.

しかし,特許文献1に記載の水処理装置では,陰極と陽極間に誘電体を介在させて放電を行っていることから,この絶縁体の存在により電荷が電極に流れ込むことがないために放電はアークとはならず,温度上昇を伴わず,強力な閃光や轟音が発生しない,「誘電体バリア放電」乃至は「無声放電」と呼ばれる放電を行うものとしているため(特許文献1[0024]欄),依然として処理能力には改善の余地がある。   However, in the water treatment apparatus described in Patent Document 1, since the discharge is performed with a dielectric interposed between the cathode and the anode, the electric charge does not flow into the electrode due to the presence of this insulator, so the discharge is It does not become an arc, does not cause a temperature rise, does not generate a powerful flash or noise, and performs a discharge called “dielectric barrier discharge” or “silent discharge” (Patent Document 1 [0024] column) However, there is still room for improvement in processing capacity.

即ち,プラズマ放電時の閃光は紫外線を含み,紫外線は汚染水中の微生物や藻類を死滅させる作用があるだけでなく,酸素に乖離反応を起こさせてオゾンの生成と,OHラジカルの生成にも寄与するものである。また,閃光と共に生じる轟音による衝撃波や発熱は,微生物や藻類の死滅や有機物の分解等にも寄与するものであることから,閃光,音,温度上昇が生じる放電形式とすることができれば処理能力の一層の向上が期待できる。   In other words, the flash light during plasma discharge contains ultraviolet light, which not only kills microorganisms and algae in contaminated water, but also contributes to the generation of ozone and OH radicals by causing a dissociation reaction with oxygen. To do. In addition, shock waves and heat generated by stuttering generated with flash light contribute to the killing of microorganisms and algae and decomposition of organic matter. Further improvement can be expected.

そこで本発明は,上記従来技術の欠点を解消するためになされたものであり,プラズマ放電を利用して行う水処理を,より経済的且つ効率的に行うことができ,しかも,有機物の分解による除去のみならず,重金属や放射性物質等の有機物以外の不純物についても同時に,高い除去率で除去することができる水処理方法,及び前記水処理方法の実施に使用する水処理装置を提供することを目的とする。   Therefore, the present invention has been made to solve the above-mentioned drawbacks of the prior art, and water treatment using plasma discharge can be performed more economically and efficiently, and further, by decomposition of organic matter. To provide a water treatment method capable of removing not only removal but also impurities other than organic substances such as heavy metals and radioactive substances at the same time with a high removal rate, and a water treatment apparatus used for carrying out the water treatment method. Objective.

以下に,課題を解決するための手段を,発明を実施するための形態で使用する符号と共に記載する。この符号は,特許請求の範囲の記載と発明を実施するための形態の記載との対応を明らかにするために記載したものであり,言うまでもなく,本願発明の技術的範囲の解釈に制限的に用いられるものではない。   Hereinafter, means for solving the problem will be described together with reference numerals used in the embodiment for carrying out the invention. This code is used to clarify the correspondence between the description of the scope of claims and the description of the mode for carrying out the invention. Needless to say, this code is limited to the interpretation of the technical scope of the present invention. Not used.

上記目的を達成するために,本発明の水処理方法は,先端部間が所定の間隔を介して配置された複数の棒状等の電極20と,前記各電極20を収容すると共に処理対象水を貯留又は通過させる処理槽10を設け,
前記処理槽10内に前記各電極20の少なくとも先端部が浸漬するように前記処理対象水を導入し,該導入された処理対象水中に動作ガスを噴射して,前記動作ガスの気泡と前記液体によって構成された気液二相流であるバブル噴流を生成し,
前記バブル噴流を,交流電圧が印加された前記電極20の先端部に導入することにより,前記電極20間にプラズマアーク放電を生じさせることを特徴とする(請求項1)。
In order to achieve the above object, the water treatment method of the present invention accommodates a plurality of rod-like electrodes 20 arranged between the tip portions with a predetermined interval, and each of the electrodes 20 and the water to be treated. A treatment tank 10 for storing or passing is provided,
The treatment target water is introduced so that at least the tip of each electrode 20 is immersed in the treatment tank 10, a working gas is injected into the introduced treatment target water, and the bubbles of the working gas and the liquid A bubble jet that is a gas-liquid two-phase flow composed of
A plasma arc discharge is generated between the electrodes 20 by introducing the bubble jet into the tip of the electrode 20 to which an AC voltage is applied (Claim 1).

なお,本発明において電極20とは,所定長さに形成された棒材の他,コイル状に巻き取った長尺のワイヤ等も含む。   In the present invention, the electrode 20 includes a rod formed in a predetermined length and a long wire wound in a coil shape.

上記水処理方法において,前記処理槽10内に前記電極20を長手方向に所定速度で給送し,前記電極20の先端部間の間隔を前記所定の間隔に維持するようにしても良い(請求項2)。   In the water treatment method, the electrode 20 may be fed into the treatment tank 10 in the longitudinal direction at a predetermined speed, and the interval between the tip portions of the electrode 20 may be maintained at the predetermined interval. Item 2).

また,前述の電極20としては,鉄又はアルミニウムを使用しても良いが,鉄やアルミニウムではプラズマアーク放電により早く溶ける為,長時間使用が出来ないことから,好ましくはこれをハフニウム合金によって形成する(請求項3)。   Further, iron or aluminum may be used as the electrode 20 described above. However, iron or aluminum dissolves quickly by plasma arc discharge and cannot be used for a long time. Therefore, it is preferably formed of a hafnium alloy. (Claim 3).

更に,前述のガスの噴射は,これをマッハ1.0〜1.5の超音速で行うと共に,処理対象水に噴射されたガス流を分散して,前記処理対象水中に微小な気泡を形成することが好ましい(請求項4)。   Further, the above-described gas injection is performed at a supersonic speed of Mach 1.0 to 1.5, and the gas flow injected into the water to be treated is dispersed to form minute bubbles in the water to be treated. (Claim 4).

このようにして行う気泡の分散は,分散後の気泡の直径が1〜2mmとなるように行うことが好ましい(請求項5)。   It is preferable that the bubbles are dispersed in this manner so that the diameter of the bubbles after dispersion is 1 to 2 mm.

更に,前記電極20に印加する交流電圧のピーク電圧に対し40〜70%の範囲にある放電開始電圧以上となったときに前記プラズマアーク放電が発生し,前記放電開始電圧未満の時,無放電で電極間電流が流れる電流密度となるよう,処理対象水に対する前記電極20の接触面積を調整する(請求項6)。   Furthermore, the plasma arc discharge occurs when the discharge start voltage is in the range of 40 to 70% of the peak voltage of the AC voltage applied to the electrode 20, and no discharge occurs when the discharge start voltage is less than the discharge start voltage. Then, the contact area of the electrode 20 with respect to the water to be treated is adjusted so that the current density at which the inter-electrode current flows is obtained (Claim 6).

また,前述のバブル噴流の流動速度は,噴射軸方向において10〜50m/秒の範囲とすることが好ましい(請求項7)。   Further, the flow velocity of the bubble jet described above is preferably in the range of 10 to 50 m / second in the injection axis direction.

更に,前述の動作ガスの噴射は,処理対象水のガス含有率が容積比で30〜90%となるよう行うことが好ましい(請求項8)。   Furthermore, it is preferable that the operation gas injection is performed so that the gas content of the water to be treated is 30 to 90% in volume ratio.

また,上記水処理方法に使用する本発明の水処理装置1は,処理対象水を入れる処理槽10に,該処理槽10内に複数本の電極20を先端部を相互に近付けるように固定するための複数の電極挿入孔15を設け,
前記電極20の先端部側に向かって前記処理槽10内に導入された処理対象水に動作ガスを噴射して,前記動作ガスの気泡と前記処理対象水によって構成された気液二相流であるバブル噴流を発生させるガス導入路13を設けると共に,
前記バブル噴流の発生下における前記電極20の先端部間にプラズマアーク放電を発生させるために必要な交流電圧を前記電極に印加する電圧源(図示せず)を備えることを特徴とする(請求項9)。
Moreover, the water treatment apparatus 1 of the present invention used in the above-described water treatment method fixes a plurality of electrodes 20 in the treatment tank 10 in which the water to be treated is placed so that the tip portions are close to each other. A plurality of electrode insertion holes 15 for providing
A working gas is injected into the water to be treated introduced into the treatment tank 10 toward the tip end side of the electrode 20, and a gas-liquid two-phase flow constituted by the bubbles of the working gas and the water to be treated While providing a gas introduction path 13 for generating a bubble jet,
A voltage source (not shown) for applying an AC voltage necessary for generating a plasma arc discharge between the tip portions of the electrode 20 under generation of the bubble jet is provided. 9).

前記処理槽10には,処理対象水を連続的に導入する給水口11と,処理後の水を連続的に排出する排水口12を設け,前記水処理装置1で連続した水処理を行えるように構成するものとしても良く(請求項10),この場合,処理槽内の流水速度は,放電範囲外の滞留時間0.5秒以下で,全工程で15秒以下とすることが好ましく,また,排水口12の排水温度は60℃以下であることが好ましい。   The treatment tank 10 is provided with a water supply port 11 for continuously introducing the water to be treated and a drain port 12 for continuously discharging the treated water so that the water treatment apparatus 1 can perform continuous water treatment. (Claim 10). In this case, the flow rate of water in the treatment tank is preferably 0.5 seconds or less of the residence time outside the discharge range and 15 seconds or less in all steps. The drain temperature of the drain port 12 is preferably 60 ° C. or lower.

更に,前述した電極挿入孔15を処理槽10の壁面を貫通して設け,該電極挿入孔15を介して前記電極20を長手方向に所定速度で前記処理槽10内に給送する電極給送装置30を設けるものとしても良い(請求項11)。   Further, the electrode insertion hole 15 described above is provided through the wall surface of the processing tank 10, and the electrode 20 is fed into the processing tank 10 at a predetermined speed in the longitudinal direction through the electrode insertion hole 15. The apparatus 30 may be provided (claim 11).

また,前記ガス導入路13の先端には,噴射ガスを前記処理対象水中に分散させる多孔体,例えば円筒状のメッシュ等によって構成されたガス気流分散器14を設ける(請求項12)。   In addition, a gas flow distributor 14 formed of a porous body, for example, a cylindrical mesh or the like, that disperses the injected gas in the water to be treated is provided at the tip of the gas introduction path 13 (claim 12).

以上で説明した本発明の構成により,本発明の水処理方法及び水処理装置1によれば,以下の顕著な効果を得ることができた。   According to the configuration of the present invention described above, according to the water treatment method and the water treatment apparatus 1 of the present invention, the following remarkable effects can be obtained.

処理対象水中に動作ガスを噴射してバブル噴流を形成し,このバブル噴流の発生下において絶縁破壊を生じ得る交流電圧を処理対象水と接触した電極20間に印加することで,処理水中でプラズマアーク放電を生じさせることができた。   Plasma is generated in the treated water by injecting an operating gas into the treatment target water to form a bubble jet, and applying an alternating voltage between the electrodes 20 in contact with the treatment target water to generate dielectric breakdown under the generation of the bubble jet. Arc discharge could be generated.

このプラズマアーク放電の発生により,気泡中に直接,高い活性状態の分子やラジカルを生成することで,有害な二次生成物を発生することなく,処理対象水中にイオン化して溶解している重金属を固形化することができると共に,処理対象水中の有機物の分解を同時に行うことができた。   The occurrence of this plasma arc discharge generates highly active molecules and radicals directly in the bubbles, thereby generating heavy metals that are ionized and dissolved in the water to be treated without generating harmful secondary products. Can be solidified and organic substances in the water to be treated can be decomposed at the same time.

しかも,本発明の方法で水処理を行う場合には,従来技術として説明した促進酸化法のように,オゾン発生装置や過酸化水素,UVランプ等を使用する必要が無くなり,促進酸化法等と比較して経済的に高効率の水処理を,薬剤を使用することなく,且つ,二次生成物等の発生なしに行うことができた。   In addition, when water treatment is performed by the method of the present invention, it is not necessary to use an ozone generator, hydrogen peroxide, a UV lamp, or the like as in the accelerated oxidation method described as the prior art. In comparison, economically high-efficiency water treatment could be performed without the use of chemicals and without generation of secondary products.

特に,本発明ではプラズマアーク放電を生じさせることから,誘電体バリア放電(無声放電)を行う特許文献1に記載の方法とは異なり,放電に発熱や,強烈な閃光,轟音を伴うものとなっている。   In particular, in the present invention, since plasma arc discharge is generated, unlike the method described in Patent Document 1 in which dielectric barrier discharge (silent discharge) is performed, the discharge is accompanied by heat generation, intense flashing, and noise. ing.

その結果,発熱,強力な紫外線照射,轟音に伴う衝撃波の発生に伴い処理対象水中の微生物や藻類の死滅,有機,無機不純物の分解等の効果についても複合的に享受することができると共に,閃光の発生の伴う強力な紫外線照射により,OHラジカル等の生成をより一層促進させることができ,プラズマアーク放電に伴い発生するエネルギーを包括的に水処理に利用することができた。   As a result, it is possible to enjoy combined effects such as the destruction of microorganisms and algae in the water to be treated and the decomposition of organic and inorganic impurities due to the generation of shock waves due to heat generation, intense ultraviolet irradiation, and noise. The generation of OH radicals and the like could be further promoted by the powerful ultraviolet irradiation accompanied by the generation of water, and the energy generated by the plasma arc discharge could be used comprehensively for water treatment.

なお,電極としてハフニウム合金電極を使用する場合,イオン化して溶解している重金属の固形化と有機物の分解が同時に得られるだけでなく,プラズマアーク放電の発生によっても電極が溶解し難く,長時間連続して安定的に処理を行うことができるためコスト面でも有利である。   In addition, when using a hafnium alloy electrode as an electrode, not only is it possible to simultaneously solidify heavy metals that are ionized and dissolve and decompose organic substances, but it is also difficult to dissolve the electrodes due to the occurrence of plasma arc discharge. Since processing can be performed continuously and stably, it is advantageous in terms of cost.

一方,鉄やアルミニウムなどの溶解性の電極を使用する場合には,プラズマアーク放電によって電極が溶解するものの,電極の成分が処理対象水中に溶出し,溶出した電極成分が処理対象水中に溶解している不純物に対する凝集剤の役割を果たすことで,遠心分離や濾過を行わない場合であっても,凝集と沈殿によって重金属や放射性物質等の有機物以外の不純物の除去速度を向上させることができた。   On the other hand, when a soluble electrode such as iron or aluminum is used, although the electrode is dissolved by plasma arc discharge, the electrode components are eluted in the water to be treated, and the eluted electrode components are dissolved in the water to be treated. By acting as a flocculant for impurities, the removal rate of impurities other than organic substances such as heavy metals and radioactive materials could be improved by agglomeration and precipitation even when centrifugation and filtration were not performed. .

なお,ハフニウム合金製の電極を使用する場合には,本発明の水処理装置を通過させて重金属の固形化を行った後,遠心分離や濾過により固形化した不純物を除去することで,固形化した不純物の自然な沈殿を待つ場合に比較して格段に処理速度を向上することができ,また,鉄やアルミニウム製の電極を使用する場合であっても,不純物の凝集後,遠心分離や濾過によって凝集した不純物を除去することで,より一層の処理時間の短縮を図ることができる。   When using an electrode made of a hafnium alloy, the heavy metal is solidified by passing through the water treatment device of the present invention, and then solidified by removing solidified impurities by centrifugation or filtration. Compared to waiting for the natural precipitation of impurities, the processing speed can be greatly improved. Even when using electrodes made of iron or aluminum, centrifugation and filtration are performed after the impurities are aggregated. The processing time can be further shortened by removing the agglomerated impurities.

ここで,従来技術として説明した「電気凝集法」においても,溶出した電極の成分によって液体中に溶解した不純物を凝集することができるものとなっているが,本発明の方法では,鉄やアルミニウムなどの溶解性の電極を使用する場合,電気凝集法とは異なり,交流電圧の印加に伴うプラズマアーク放電の発生により,各電極は,電圧の半周期において陽極となっている時に電気分解によって液体中に溶出するだけでなく,電圧の別の半周期において陰極になっている時にも,プラズマアーク放電に伴い蒸発して液体中に多量に溶出することから,電気凝集法とは比較にならない程の高い処理効率を実現できるものとなっている。   Here, even in the “electrocoagulation method” described as the prior art, impurities dissolved in the liquid can be aggregated by the eluted electrode components. However, in the method of the present invention, iron or aluminum is used. Unlike the electrocoagulation method, each electrode becomes a liquid by electrolysis when it becomes an anode during the half cycle of the voltage, unlike the electrocoagulation method. In addition to elution into the liquid, it also evaporates with the plasma arc discharge and dissolves in the liquid in large quantities when it becomes the cathode in another half cycle of the voltage. High processing efficiency can be realized.

更に,電極給送装置30を設け,処理槽10内に前記電極20を長手方向に所定速度で給送するようにした場合には,溶解性の電極を使用した場合であっても,電極20を所定速度で処理槽10内に送り込むことで,電極20の先端部間の間隔を一定の間隔に維持することができ,これによりプラズマアーク放電を安定的に行わせることができた。その結果,処理能力の安定した水処理方法及び水処理装置1を提供することができた。   Furthermore, when the electrode feeding device 30 is provided and the electrode 20 is fed into the processing tank 10 at a predetermined speed in the longitudinal direction, the electrode 20 can be used even when a soluble electrode is used. Was fed into the treatment tank 10 at a predetermined speed, so that the distance between the tip portions of the electrodes 20 could be maintained at a constant distance, and plasma arc discharge could be stably performed. As a result, it was possible to provide a water treatment method and a water treatment apparatus 1 with stable treatment capacity.

なお,本発明において電極給送装置30は必ずしも設ける必要は無く,電極20は位置固定した状態で取り付けるものとしても良い。この場合には,電極20はハフニウム合金を使用する事で長時間の使用に耐えることができる。また,鉄又はアルミニウム製の電極を使用した場合に於いては溶出や蒸発に伴う電極間距離の変動に対し,電極電圧を変化させることで対応するものとしても良い。   In the present invention, the electrode feeding device 30 is not necessarily provided, and the electrode 20 may be attached in a fixed position. In this case, the electrode 20 can withstand long-time use by using a hafnium alloy. Further, when an electrode made of iron or aluminum is used, the electrode voltage may be changed by changing the interelectrode distance due to elution or evaporation.

動作ガスの噴射をマッハ1.0〜1.5の超音速で行うと共に,ガス気流分散器14によって分散することで,バブル噴流を長距離安定的に維持することができ,電極20間に微細な気泡が形成された処理対象水を導入することができた。   The operating gas is injected at a supersonic speed of Mach 1.0 to 1.5 and dispersed by the gas flow distributor 14 so that the bubble jet can be stably maintained over a long distance. Water to be treated in which various bubbles were formed could be introduced.

気泡の直径を1〜2mmと比較的小さなものとすることで,気泡と処理対象水界面の表面積を増大させることができ,プラズマアーク放電によって気泡内に生成された活性物質が処理対象水中に拡散し易くなり,水処理効率を更に向上させることができる。   By making the bubble diameter as small as 1-2 mm, the surface area of the bubble and the water to be treated can be increased, and the active substance generated in the bubble by the plasma arc discharge diffuses into the water to be treated. Water treatment efficiency can be further improved.

絶縁破壊は,電流密度に関連し,電流密度は,処理対象水と電極20の接触面積と関連することから,電極20と処理対象水との接触面積を適切に調整することにより,プラズマアーク放電の開始電圧を,交流電圧のピーク値に対し40〜70%の電圧値の範囲で好適に設定することができる。   The dielectric breakdown is related to the current density, and the current density is related to the contact area between the water to be treated and the electrode 20, so that plasma arc discharge can be achieved by appropriately adjusting the contact area between the electrode 20 and the water to be treated. Can be suitably set within a voltage range of 40 to 70% with respect to the peak value of the AC voltage.

前記バブル噴流の移動速度を,10〜50m/秒の範囲で設定する場合には,絶縁破壊によるプラズマアーク放電が生じる電極20間のエリアに,バブル噴流を微細な気泡を含んだ状態で確実に導入することが可能である。   When the moving speed of the bubble jet is set in the range of 10 to 50 m / sec, the bubble jet is surely contained in the area between the electrodes 20 where plasma arc discharge due to dielectric breakdown occurs and includes fine bubbles. It is possible to introduce.

また,処理対象水のガス含有率を容積比で30〜90%の範囲とすることで,水処理時における有機物の高い分解能を発揮させることが可能である。   Moreover, it is possible to exhibit the high resolution | decomposability of the organic substance at the time of water treatment by making the gas content rate of process target water into the range of 30 to 90% by volume ratio.

本発明の水処理装置(装置構成1)の正面断面図。Front sectional drawing of the water treatment apparatus (apparatus structure 1) of this invention. 本発明の水処理装置(装置構成2)の正面断面図。Front sectional drawing of the water treatment apparatus (apparatus structure 2) of this invention. 図2のIII−III線断面図。III-III sectional view taken on the line of FIG. 本発明の水処理装置(装置構成3)の正面断面図。Front sectional drawing of the water treatment apparatus (apparatus structure 3) of this invention. 本発明の水処理装置(装置構成4)の正面断面図。Front sectional drawing of the water treatment apparatus (apparatus structure 4) of this invention. 図5のVI−VI線断面図。FIG. 6 is a sectional view taken along line VI-VI in FIG. 5. ガス噴流の噴射方向における圧力変化を示すグラフ。The graph which shows the pressure change in the injection direction of a gas jet. 電極間電圧,電極間電流のオシロ波形を示す図面代用写真。Drawing substitute photograph showing oscilloscope waveform of interelectrode voltage and interelectrode current. 電極間電圧,電極間電流のオシロ波形を示す図面代用写真。Drawing substitute photograph showing oscilloscope waveform of interelectrode voltage and interelectrode current. 電極間距離及び処理対象水の導電率と電極電圧の相関図。The correlation between electrode distance, electrical conductivity of water to be treated, and electrode voltage. 電流密度と絶縁破壊状態の関係を示した説明図。Explanatory drawing which showed the relationship between a current density and a dielectric breakdown state. 処理対象水のガス含有率と絶縁破壊電圧の相関図。The correlation figure of the gas content rate of a process target water, and a dielectric breakdown voltage. 処理対象水の脱色試験結果を示すグラフ。The graph which shows the decoloring test result of process target water.

次に,本発明の実施形態につき添付図面を参照しながら以下説明する。   Next, embodiments of the present invention will be described below with reference to the accompanying drawings.

〔水処理装置の構成〕
装置構成1(図1参照)
図1中の符号1は,本発明の水処理装置を示し,図示の実施形態にあっては,この水処理装置1を,流動する処理対象水に対し連続的に処理を行うことができる連続式のものとして構成しているが,例えば本発明の水処理装置1は,これをバッチ式のものとして構成しても良い。
[Configuration of water treatment equipment]
Device configuration 1 (see FIG. 1)
Reference numeral 1 in FIG. 1 indicates a water treatment apparatus of the present invention. In the illustrated embodiment, the water treatment apparatus 1 can continuously perform treatment on flowing target water. For example, the water treatment apparatus 1 of the present invention may be configured as a batch type.

この水処理装置1は,処理対象水が導入される処理槽10と,この処理槽10内に先端を鋭角又は円錐状とした棒状の電極20を給送するための電極給送装置30,及び,前記電極20に対し交流電圧を印加する,図示せざる交流電圧源によって構成されている。   The water treatment apparatus 1 includes a treatment tank 10 into which water to be treated is introduced, an electrode feeding apparatus 30 for feeding a rod-shaped electrode 20 having a sharp or conical tip in the treatment tank 10, and , And an AC voltage source (not shown) that applies an AC voltage to the electrode 20.

前述の処理槽10は,図示の実施形態にあっては両端が塞がれた円筒体によって構成されており,この円筒状の処理槽10の一端側(図1中の紙面下側)に,処理対象水を導入するための給水口11が設けられていると共に,処理槽10の他端側(図1中の紙面上側)に,処理槽10内を通過して処理された水を,反応によって生成された凝集物及び気泡と共に排出する排水口12が設けられており,処理槽10内に処理対象水を連続して給水すると共に排水することで,処理槽10内を軸線方向に処理対象水が通過するようになっている。   In the illustrated embodiment, the above-described processing tank 10 is configured by a cylindrical body whose both ends are closed, and on one end side (the lower side of the paper in FIG. 1) of the cylindrical processing tank 10, A water supply port 11 for introducing the water to be treated is provided, and water treated through the treatment tank 10 is reacted with the other end of the treatment tank 10 (upper side in FIG. 1). A drain port 12 is provided for discharging together with the aggregates and bubbles generated by the water, and the water to be treated is continuously supplied into the treatment tank 10 and drained, whereby the inside of the treatment tank 10 is treated in the axial direction. Water is supposed to pass through.

この処理槽10の前記給水口11を設けた側の端部には,給水口11を中心として対称の位置に,一対のガス導入路13,13が設けられており,このガス導入路13,13を介して,処理槽10内の処理対象水に,一例として空気や炭酸ガス,又はこれらの混合ガスを動作ガスとして吹き込むことにより,処理槽10内の水と動作ガスの気泡とによって構成された,気液二相流であるバブル噴流を生成することができるように構成している。   A pair of gas introduction paths 13 and 13 are provided at the end of the treatment tank 10 on the side where the water supply opening 11 is provided at symmetrical positions with respect to the water supply opening 11. For example, air, carbon dioxide gas, or a mixed gas thereof is blown into the water to be treated in the treatment tank 10 as the working gas via 13, thereby being constituted by water in the treatment tank 10 and bubbles of the working gas. In addition, it is configured to generate a bubble jet that is a gas-liquid two-phase flow.

このガス導入路13の先端には,多孔体,例えば円筒状のメッシュによって構成されたガス気流分散器14が取り付けられており,ガス導入路13を介して処理槽10内に噴射されたガスは,このガス気流分散器14を通過する際に細かな気泡に粉砕されて処理水中に分散できるように構成されている。   A gas flow distributor 14 composed of a porous material, for example, a cylindrical mesh, is attached to the tip of the gas introduction path 13, and the gas injected into the processing tank 10 through the gas introduction path 13 is The gas flow disperser 14 is crushed into fine bubbles and can be dispersed in the treated water.

このガス導入路13によるガスの噴射方向前方には,処理槽10の側壁を貫通して形成された電極挿入孔15が開口しており,この電極挿入孔15内に,処理槽10の外側から内部に向かって電極20を挿入することで,電極20の先端を,処理槽10内の空間に突出させることができようになっている。   An electrode insertion hole 15 formed through the side wall of the processing tank 10 is opened in front of the gas injection direction by the gas introduction path 13, and the electrode insertion hole 15 extends from the outside of the processing tank 10. By inserting the electrode 20 toward the inside, the tip of the electrode 20 can be protruded into the space in the processing tank 10.

この電極20は,一例として処理槽10の中心軸に対する角度θを30°〜90°,好ましくは45°〜90°の傾きで配置されており,図示の実施形態にあっては,処理槽10の中心軸に対し約70°の傾きで先端が上向きとなるように挿入されている。   As an example, the electrode 20 is disposed with an angle θ with respect to the central axis of the processing tank 10 of 30 ° to 90 °, preferably 45 ° to 90 °, and in the illustrated embodiment, the processing tank 10 It is inserted so that the tip is upward with an inclination of about 70 ° with respect to the central axis.

この電極挿入孔15は,平面視においてガス導入路の形成位置の真上に設けることが好ましく,従って電極挿入孔15を対象の位置に二箇所設けた図示の実施形態にあっては,ガス導入路13についても二箇所設け,処理槽10内に二筋のバブル噴流が生成されるように構成されている。   The electrode insertion hole 15 is preferably provided immediately above the formation position of the gas introduction path in plan view. Therefore, in the illustrated embodiment in which the electrode insertion holes 15 are provided at two positions at the target position, the gas introduction hole 15 is provided. The passage 13 is also provided at two locations, and is configured so that two bubble jets are generated in the treatment tank 10.

なお,図1中の符号30は,前述の電極20を処理槽10内に所定の速度で給送する電極給送装置であり,この電極給送装置30を処理槽10の外部に,各電極挿入孔15の形成位置に対応して設けている。   Reference numeral 30 in FIG. 1 denotes an electrode feeding device that feeds the electrode 20 into the processing tank 10 at a predetermined speed. The electrode feeding apparatus 30 is connected to the outside of the processing tank 10 to each electrode. It is provided corresponding to the position where the insertion hole 15 is formed.

図示の例では,一対のローラ31,32間に電極20を挟持すると共に,この状態でローラ31,32の少なくとも一方を図示せざるモータ等で回転駆動することで,ローラ31,32を駆動するモータの回転速度を制御することにより,電極20を所望の速度で処理槽10内に定量給送することができるようになっている。   In the illustrated example, the electrode 20 is sandwiched between the pair of rollers 31 and 32, and at this time, at least one of the rollers 31 and 32 is rotationally driven by a motor or the like (not shown) to drive the rollers 31 and 32. By controlling the rotation speed of the motor, the electrode 20 can be quantitatively fed into the processing tank 10 at a desired speed.

なお,前述した電極20は,図示の例では一定の長さに形成された円柱状の棒として表しているが,この構成に代え,例えばコイル状に巻かれた長尺のワイヤ状の電極を引き出しながら処理槽10内に給送するものとしても良い。   In the example shown in the figure, the electrode 20 described above is shown as a cylindrical rod formed in a certain length. However, instead of this configuration, for example, a long wire electrode wound in a coil shape is used. It is good also as what feeds in the processing tank 10, pulling out.

装置構成2(図2,3参照)
図1に示した水処理装置1にあっては,前述のガス導入路13,電極挿入孔15,及び電極給送装置30を,処理槽10の周方向に180°毎の等間隔でそれぞれ2個ずつ設けるものとしたが,例えば図2及び図3に示すように,これらの部材を120°毎の等間隔でそれぞれ3個ずつ設けるものとし,処理槽10内に三筋のバブル噴流を形成すると共に,電極挿入孔15に挿入された電極に三相交流電圧を印加するものとしても良く,更に,図示は省略するが,これらの部材は,3個以上設けるものであっても良く,この場合,単層交流電源を使用する場合には各部を2の倍数で,三相交流電源を使用する場合には3の倍数として設ける。
Device configuration 2 (see Figs. 2 and 3)
In the water treatment apparatus 1 shown in FIG. 1, the gas introduction path 13, the electrode insertion hole 15, and the electrode feeding apparatus 30 are respectively provided at equal intervals of 180 ° in the circumferential direction of the treatment tank 10. However, as shown in FIG. 2 and FIG. 3, for example, three of these members are provided at equal intervals of 120 ° to form a triple bubble jet in the processing tank 10. In addition, a three-phase AC voltage may be applied to the electrode inserted into the electrode insertion hole 15, and although not shown, three or more of these members may be provided. If a single-layer AC power supply is used, each part is provided as a multiple of 2, and if a three-phase AC power supply is used, it is provided as a multiple of 3.

装置構成3(図4参照)
以上,図1〜3を参照して説明した水処理装置1の構成例にあっては,電極20を処理槽10の側面より処理槽10の中心軸に先端を向けて挿入する構成例を説明したが,この構成に変え,図4に示すように,処理槽10の一端及び他端より,電極20を処理槽10の長手方向に挿入するように構成するものとしても良い。
Device configuration 3 (see FIG. 4)
As described above, in the configuration example of the water treatment apparatus 1 described with reference to FIGS. 1 to 3, the configuration example in which the electrode 20 is inserted from the side surface of the treatment tank 10 toward the central axis of the treatment tank 10 is described. However, instead of this configuration, as shown in FIG. 4, the electrode 20 may be inserted in the longitudinal direction of the processing bath 10 from one end and the other end of the processing bath 10.

図4に示す例では,処理槽10の下端に給水口11を,上端に排水口12を設けると共に,処理槽の下端側にガス導入路13を設け,このガス導入路13を電極20の先端間を介して,排水口12に向けて配置している。   In the example shown in FIG. 4, a water supply port 11 is provided at the lower end of the treatment tank 10, a drainage port 12 is provided at the upper end, a gas introduction path 13 is provided at the lower end side of the treatment tank, and this gas introduction path 13 is connected to the tip of the electrode 20. It arrange | positions toward the drain outlet 12 through the space.

装置構成4(図5,6参照)
なお,図4を参照して説明した水処理装置1にあっては,処理槽10の下端側にのみ単一のガス導入路13を設けた構成としているが,この構成に代え,図5及び図6に示すように,ガス導入路13を処理槽の上下端にそれぞれ設けるものとしても良い。
Device configuration 4 (see FIGS. 5 and 6)
In the water treatment apparatus 1 described with reference to FIG. 4, a single gas introduction path 13 is provided only on the lower end side of the treatment tank 10. As shown in FIG. 6, it is good also as what each provides the gas introduction path 13 in the upper and lower ends of a processing tank.

また,図4に示した構成では,処理対象水を,処理槽10の下端側から導入して上端側より排出するものとしていたが,図5,6に示す実施形態では,処理槽の上下端にそれぞれ給水口11を設けると共に,処理槽10の長手方向の中心位置の側壁より,処理槽10外に処理後の水を排出する排水口12を形成している。   In the configuration shown in FIG. 4, the water to be treated is introduced from the lower end side of the treatment tank 10 and discharged from the upper end side. However, in the embodiment shown in FIGS. In addition, a water supply port 11 is provided respectively, and a drainage port 12 for discharging the treated water is formed outside the processing tank 10 from the side wall at the center position in the longitudinal direction of the processing tank 10.

図5,6に示す実施形態にあっては,処理槽10の長手方向の中間位置において,処理槽10の内壁に周方向に連続する溝16を形成し,この溝16内に前述の排水口12を連通している。   In the embodiment shown in FIGS. 5 and 6, a groove 16 that is continuous in the circumferential direction is formed in the inner wall of the treatment tank 10 at an intermediate position in the longitudinal direction of the treatment tank 10, and the above-described drain outlet is formed in the groove 16. 12 is communicated.

〔水処理方法〕
以上で説明した本発明の水処理装置1を使用して,本発明の水処理方法を実施することができる。なお,以下の説明において,特に説明が無い場合,水処理装置1は図1に示した構成のものを使用することを前提として説明する。
[Water treatment method]
The water treatment method of the present invention can be carried out using the water treatment apparatus 1 of the present invention described above. In addition, in the following description, when there is no description in particular, the water treatment apparatus 1 demonstrates on the assumption that the thing of the structure shown in FIG. 1 is used.

処理槽10の下端側に設けた給水口11を介して処理槽10内に処理対象水を導入して処理槽10内を処理対象水で満たすと共に,この処理槽10内の処理対象水に対し,処理槽10の下端側に設けられたガス導入路13よりガス気流分散器14を介して動作ガス(例えば空気,炭酸ガスまたこれらの混合ガス)を噴射して供給する。   The processing target water is introduced into the processing tank 10 through the water supply port 11 provided on the lower end side of the processing tank 10 to fill the processing tank 10 with the processing target water, and with respect to the processing target water in the processing tank 10. The working gas (for example, air, carbon dioxide gas or a mixed gas thereof) is jetted and supplied from the gas introduction path 13 provided on the lower end side of the processing tank 10 through the gas flow distributor 14.

動作ガスの噴射は,処理対象水中のガス含有率が,容積比で30〜90%となるように行い,またガス気流分散器14に至る前の,ガス導入路13内におけるガスの流速が,マッハ1.0〜1.5となるように行う。   The operating gas is injected such that the gas content in the water to be treated is 30 to 90% by volume, and the gas flow velocity in the gas introduction path 13 before reaching the gas flow distributor 14 is It is performed so that Mach is 1.0 to 1.5.

このようにして,処理槽10内の処理対象水に動作ガスを噴射すると,ガス気流分散器14の前方には,処理槽10中の処理対象水と噴射されたガスの気泡によって形成された気液二相流であるバブル噴流が生成されると共に,このバブル噴流の流れは,処理槽10の内壁に沿って上昇し,電極20の先端部方向に向かう流れとなる。   In this way, when the working gas is injected into the water to be processed in the processing tank 10, the gas formed by the processing target water in the processing tank 10 and the bubbles of the injected gas is formed in front of the gas flow distributor 14. A bubble jet which is a liquid two-phase flow is generated, and the flow of the bubble jet rises along the inner wall of the processing tank 10 and becomes a flow toward the tip of the electrode 20.

電極20に向けたバブル噴流の噴射軸方向の速度は,好ましくは10〜50m/秒であり,バブル噴流は電極20を冷却しながら,電極20の先端部間の間隔に導入される。   The velocity in the jet axis direction of the bubble jet directed toward the electrode 20 is preferably 10 to 50 m / second, and the bubble jet is introduced into the interval between the tips of the electrode 20 while cooling the electrode 20.

このとき気泡は,処理槽10内の処理対象水中に均等に分散されており,電極20間に構成された放電エリアを連続的に通過し,処理槽10の上端部側に設けられた排水口12まで流れて,処理槽外に排出される。   At this time, the air bubbles are evenly dispersed in the water to be treated in the treatment tank 10, continuously pass through the discharge area formed between the electrodes 20, and the drain port provided on the upper end side of the treatment tank 10. It flows to 12 and is discharged out of the processing tank.

処理対象水中の気泡は,排水口12に到達する前に結合して大きくなり,ランダムな形状に変化する。   Bubbles in the water to be treated are combined and enlarged before reaching the drain 12 and change into a random shape.

本発明の方法では,多様な処理の組み合わせにより,物理的影響,運動条件の安定化を図ることで,水処理における経済性と処理能力の向上を図っている。その一例として,超音速のガス噴流において動作ガスの分散を生じさせている。   In the method of the present invention, the physical effect and the motion condition are stabilized by combining various treatments, thereby improving the economics and treatment capacity in water treatment. As an example, the working gas is dispersed in a supersonic gas jet.

このように,処理対象水に対して動作ガスを超音速で吹き込むことにより,気−液が一体化した噴流が成形され,動作ガスの移動速度減少と液体の摂動により,成形された噴流が粉砕される(図7)。   In this way, the working gas is blown into the water to be treated at supersonic speed to form a gas-liquid integrated jet, and the shaped jet is pulverized by reducing the moving speed of the working gas and perturbing the liquid. (FIG. 7).

処理対象水へ流れ込む動作ガスの速度が速い場合,ガス流入域における処理対象水の運動は激しくなり,ガス噴流の粉砕により気−液の混合が生じた二相流(処理対象水が不純物微粒子を含む場合には気−液−固体の三相流)が起きる。ガス気流分散器14の直前において形成される気泡の標準的な大きさはガス気流分散器14内に位置してノズル状に開口するガス導入路13の直径に比例し,動作ガスの噴流と液体との境界部分に生じる大きな乱流の発生を抑制するために,ガス導入路13の先端に,ガス気流分散器14となる円筒形のメッシュを取り付ける。   When the speed of the working gas flowing into the water to be treated is high, the movement of the water to be treated in the gas inflow region becomes intense, and a two-phase flow in which gas-liquid mixing occurs due to the gas jet crushing (the water to be treated contains particulate impurities). If included, gas-liquid-solid three-phase flow) occurs. The standard size of the bubbles formed immediately before the gas flow distributor 14 is proportional to the diameter of the gas introduction passage 13 located in the gas flow distributor 14 and opening in the shape of a nozzle. In order to suppress the occurrence of a large turbulent flow that occurs at the boundary portion, a cylindrical mesh serving as the gas flow distributor 14 is attached to the tip of the gas introduction path 13.

このとき,動作ガスの流入速度をマッハ1.0未満にすると,ガス噴流の流入部における速度が下がるため,バブル噴流の形成距離が急激に減少する。マッハ数が1.5を越える場合,ガス噴流の導入初期のエリアにおいて波動が増大することにより大きな乱流を起こし,この場合にもバブル噴流の形成距離が急激に減少することから,ガス流入速度はマッハ1.0〜1.5とすることが好ましい。   At this time, if the inflow speed of the working gas is less than Mach 1.0, the speed at the inflow portion of the gas jet decreases, and the formation distance of the bubble jet decreases rapidly. When the Mach number exceeds 1.5, a large turbulence occurs due to an increase in wave motion in the area where the gas jet is initially introduced. In this case as well, the formation distance of the bubble jet is drastically reduced. Is preferably Mach 1.0 to 1.5.

このように,バブル噴流の形成距離が減少することを防止する対策を行うことで,処理槽10内の電極20間を直径1〜2mm程度の気泡で均等的に埋め尽くすことができる。   In this way, by taking measures to prevent the formation distance of the bubble jet from decreasing, the space between the electrodes 20 in the treatment tank 10 can be filled uniformly with bubbles having a diameter of about 1 to 2 mm.

ガス気流分散器14により成形したバブル噴流は,処理槽10内の壁面に沿って広がるように電極20の方へ流れて行く(但し,処理槽10の内壁面周辺には気泡が集まらないため,壁面での気泡の通過頻度は略0となる)。   The bubble jet formed by the gas flow distributor 14 flows toward the electrode 20 so as to spread along the wall surface in the processing tank 10 (however, since bubbles do not collect around the inner wall surface of the processing tank 10, The frequency of bubbles passing through the wall surface is substantially zero).

噴流の特性(コアンダ効果)により,処理対象水は処理槽10の内壁面に沿って流れ,壁面より突出した電極20に当たり,電極20の表面に沿って流れる。その結果,処理対象水中の気泡は,電極20の先端部間に流れ込み,気泡が処理対象水を均質に埋めるようになる。   Due to the characteristics of the jet (Coanda effect), the water to be treated flows along the inner wall surface of the treatment tank 10, hits the electrode 20 protruding from the wall surface, and flows along the surface of the electrode 20. As a result, bubbles in the water to be treated flow between the tips of the electrodes 20, and the bubbles uniformly fill the water to be treated.

本発明の方法において,処理対象水が電極20の表面と接触し,また電極20の先端部間に気泡が存在する事により,水の分子構造を破壊することなく,液体から電極への連続的な電流をイオン化により無放電状態で発生させることができる。これにより,絶縁破壊を起こす前提条件を整える事ができる。   In the method of the present invention, the water to be treated comes into contact with the surface of the electrode 20 and the presence of bubbles between the tips of the electrode 20 allows the water to be continuously transferred from the liquid without destroying the molecular structure of the water. Current can be generated in a non-discharged state by ionization. This makes it possible to prepare the preconditions that cause dielectric breakdown.

電極部分に向けたバブル噴流の噴射軸方向の流動速度は10〜50m/秒の範囲となるように設定することが好ましく,その理由は,この流速範囲であれば絶縁破壊によるアーク放電が行われる電極間の領域に,気泡を含んだバブル噴流を確実に導入することができるためである。   It is preferable to set the flow velocity in the jet axis direction of the bubble jet toward the electrode portion to be in the range of 10 to 50 m / sec. The reason is that arc discharge due to dielectric breakdown is performed within this flow velocity range. This is because a bubble jet containing bubbles can be reliably introduced into the region between the electrodes.

処理槽10内に突出する電極20の先端間の間隔を適切に設定することで,プラズマアーク放電を制御して安定的に発生させることができる。また,電極として鉄やアルミニウムなどの溶解性の電極を使用する場合,電極20が交流電圧の半周期において陽極として作用するとき,電極材料は液体中に均等に溶出するだけでなく,更なる半周期において陰極として作用している時においても,プラズマアーク放電の発生に伴い電極材料が蒸発して液体中に溶出する。その結果,このようにして液体中に溶出した電極材料が,液体中に溶解している不純物を凝集,沈殿させる凝集剤として作用し,本発明の方法では,液体中に溶解している重金属や放射性物質等の無機不純物を固形化させるだけでなく,凝集,沈殿させることにより除去することが可能となっている。   By appropriately setting the interval between the tips of the electrodes 20 protruding into the processing tank 10, plasma arc discharge can be controlled and stably generated. In addition, when a soluble electrode such as iron or aluminum is used as the electrode, when the electrode 20 acts as an anode in a half cycle of the AC voltage, the electrode material is not only eluted evenly in the liquid, but also a further half. Even when acting as a cathode in the cycle, the electrode material evaporates and elutes into the liquid as the plasma arc discharge occurs. As a result, the electrode material eluted in the liquid in this way acts as an aggregating agent for aggregating and precipitating impurities dissolved in the liquid, and in the method of the present invention, heavy metals dissolved in the liquid and In addition to solidifying inorganic impurities such as radioactive substances, it is possible to remove them by agglomeration and precipitation.

交流電圧のピーク値に対し,40〜70%の電圧値である放電開始電圧以上となったとき,印加する交流電圧の半周期毎に絶縁破壊が起こりアーク放電が発生し,前記放電開始圧力未満の電圧の状態において,無放電による電極間電流の発生を確保する事は,本発明の重要な特徴である。   When the voltage exceeds 40% to 70% of the discharge start voltage with respect to the peak value of the AC voltage, dielectric breakdown occurs and arc discharge occurs every half cycle of the applied AC voltage, and is less than the discharge start pressure. It is an important feature of the present invention to ensure the generation of the inter-electrode current without discharge in the state of the voltage.

この条件は,印加する電圧の周波数に関係が無い事を,50−5000−30000Hzの周波数を使用して実験により確認している。   It has been confirmed by experiment using a frequency of 50-5000-30000 Hz that this condition is not related to the frequency of the applied voltage.

処理対象水の導電率は30〜500mS/mで,電圧の設定及び電極間距離は,処理対象水の導電率に関連して変化する。処理対象水と接触する電極の面積は,絶縁破壊の前提になる電流密度に関連して設定する。   The conductivity of the water to be treated is 30 to 500 mS / m, and the voltage setting and the distance between the electrodes change in relation to the conductivity of the water to be treated. The area of the electrode that comes into contact with the water to be treated is set in relation to the current density that is the premise of dielectric breakdown.

図8及び図9に,電源の周波数を50Hzとした水処理装置1における電圧及び電流のオシロ波形を示す。   8 and 9 show the oscilloscope waveforms of voltage and current in the water treatment apparatus 1 with a power supply frequency of 50 Hz.

図8及び図9中の電流波形より,絶縁破壊後の拡散放電が発生していることが確認できる。この放電では,電流が高パルス化し高周波成分を含むものとなる点に特徴がある。その理由は,気泡表面における0.00001〜0.000001秒アーク放電時間のアークが多数発生・消滅するためであり,このような気泡表面の超高速な局部加熱と冷却により,平均濃度よりかなり高濃度の励起子(分子が格子振動している変形可能な格子を伝播する)や遊離基が発生する。   It can be confirmed from the current waveforms in FIGS. 8 and 9 that diffusion discharge after dielectric breakdown has occurred. This discharge is characterized in that the current becomes a high pulse and contains a high frequency component. The reason is that many arcs with arc discharge time of 0.00001 to 0.000001 seconds are generated and disappeared on the bubble surface. By such ultra-fast local heating and cooling of the bubble surface, excitons with a concentration much higher than the average concentration are generated. (Propagating through a deformable lattice in which the molecule is vibrating) and free radicals are generated.

なお,図8及び図9の波形より,図示の例では放電開始電圧が,交流電圧のピーク値に対し約60%の電圧値となっていることが判る。   8 and 9, it can be seen that the discharge start voltage is about 60% of the peak value of the AC voltage in the illustrated example.

図10に,電極間距離及び処理対象水の導電率と電極電圧の相関図を示す。図10より電極間距離が増大する程,電極電圧は増大し,処理対象水の導電率が増大する程,電極電圧は低下する。   FIG. 10 shows a correlation diagram between the electrode distance, the conductivity of the water to be treated, and the electrode voltage. From FIG. 10, the electrode voltage increases as the distance between the electrodes increases, and the electrode voltage decreases as the conductivity of the water to be treated increases.

従って,処理対象とする液体の導電率との相対的な関係により電極間距離及び電圧値を調整することで,効率的且つ経済的に水処理を行うことができる。   Therefore, the water treatment can be performed efficiently and economically by adjusting the interelectrode distance and the voltage value according to the relative relationship with the conductivity of the liquid to be treated.

一例として,図10に示す例において,液体の伝導率が150mS/mの場合,電圧は1800Vであり,この電圧1800Vに対応する電極間距離は25mmである。   As an example, in the example shown in FIG. 10, when the liquid conductivity is 150 mS / m, the voltage is 1800 V, and the interelectrode distance corresponding to this voltage 1800 V is 25 mm.

また,電極給送装置30を設けることなく電極20を固定式とした場合には,ハフニウム合金によって構成された電極を使用して電極間距離が一定間隔となるようにしても良く,また,鉄やアルミニウム製の溶解性の電極を固定式で使用する場合には,上記の対応関係に従い,電極20の蒸発等に伴う電極間距離の増加に対応して電極電圧を上昇させる。   In addition, when the electrode 20 is fixed without providing the electrode feeding device 30, the distance between the electrodes may be fixed by using an electrode made of a hafnium alloy, When a soluble electrode made of aluminum or aluminum is used in a fixed manner, the electrode voltage is increased in accordance with the increase in the inter-electrode distance associated with the evaporation of the electrode 20 in accordance with the above correspondence.

図11は,電流密度と液体中の電極間に生じる絶縁破壊状態の相関図である。   FIG. 11 is a correlation diagram between a current density and a dielectric breakdown state generated between electrodes in a liquid.

絶縁破壊の様子は目視にて確認し,計算にあたり各パラメーターはオシロスコープの表示より求めた。   The state of dielectric breakdown was confirmed visually, and each parameter was obtained from the oscilloscope display for calculation.

電流密度の計算は,オシロスコープに表示された電流値を,処理対象水中に露出している電極の表面面積で割ることにより求めた。   The current density was calculated by dividing the current value displayed on the oscilloscope by the surface area of the electrode exposed in the water to be treated.

電極間と電極表面付近に起こる絶縁破壊条件は異なり,電極間の絶縁破壊はバブルガスの気泡内表面に起こり,次に,気泡内表面を通じて液体に繋がりながら広がっていく。   The dielectric breakdown conditions that occur between the electrodes and in the vicinity of the electrode surface are different, and the dielectric breakdown between the electrodes occurs on the inner surface of the bubble gas bubble, and then spreads while being connected to the liquid through the inner surface of the bubble.

気泡は電極表面で弾き返される為,電極付近の境界層にも絶縁破壊が起こる。電極付近の絶縁破壊は重要で,本発明の特徴にはこの点も含まれる。   Since bubbles are bounced back on the electrode surface, dielectric breakdown also occurs in the boundary layer near the electrode. The dielectric breakdown in the vicinity of the electrode is important, and this feature is included in the features of the present invention.

図11に示す結果は,直径2.5mmのスチールワイヤを電極として使用し,装置の稼動モードにおいて,電圧:1500〜2500V,電流:4А,液体の電気伝導率:150mS/m,電極間隔:35mm,液体中のガス体積含有率:75%とし,電極はバブルガス噴流と平行に配置し,液中に対する電極の露出長さを1mmから40mm(表面面積を7.85mm2から314mm2)まで変動させて,電流密度を0.51А/mm2から0.0127А/mm2まで変化させ,絶縁破壊状態を目視で確認したものである。 The results shown in FIG. 11 show that a steel wire having a diameter of 2.5 mm was used as an electrode, and in the operation mode of the apparatus, voltage: 1500 to 2500 V, current: 4 А, liquid electrical conductivity: 150 mS / m, electrode spacing: 35 mm Gas volume content in the liquid: 75%, the electrode is placed in parallel with the bubble gas jet, and the exposed length of the electrode in the liquid is varied from 1 mm to 40 mm (surface area from 7.85 mm 2 to 314 mm 2 ). The current density was changed from 0.51 А / mm 2 to 0.0127 А / mm 2 , and the dielectric breakdown state was visually confirmed.

図12に,液体のガス含有率と絶縁破壊電圧の相関図を示す。図12より,絶縁破壊の電圧は,実験を行ったガス含有率の範囲において殆ど変化が見られないことが確認された。   FIG. 12 shows a correlation diagram between the gas content of the liquid and the breakdown voltage. From FIG. 12, it was confirmed that the dielectric breakdown voltage hardly changed in the range of the gas content rate in which the experiment was performed.

本発明の水処理方法では,飽和状態を超える高活性物質を気泡内に大量に発生させる事により,気泡表面より液体中に高活性物質を拡散させ,これにより処理対象とする液体中にイオン化して溶け込む不純物を固形化して除去し易い状態にすると共に,有機化合物の分解によるガス化,殺菌,漂白等の処理を好適に行うことができる。   In the water treatment method of the present invention, a large amount of highly active substance exceeding the saturation state is generated in the bubbles, thereby diffusing the highly active substance into the liquid from the bubble surface, thereby ionizing into the liquid to be treated. In addition to solidifying the dissolved impurities, the impurities can be easily removed and gasification, sterilization, bleaching, and the like by decomposition of the organic compound can be suitably performed.

特に,電極として鉄又はアルミを使用して,プラズマアーク放電により電極を処理対象水中に凝集剤として大量に溶解させることで,不純物の凝集や沈殿をも伴う複合的な作用によって液体の処理を行うことができる。   In particular, by using iron or aluminum as an electrode and dissolving the electrode in a large amount as a coagulant in the water to be treated by plasma arc discharge, the liquid is treated by a complex action that also involves aggregation and precipitation of impurities. be able to.

その結果,本発明の方法では,従来の処理プロセスよりも処理能力が格段に向上することとなるため,本発明の方法は,液体の電気化学方式処理として万能な方法である。   As a result, in the method of the present invention, the processing capability is remarkably improved as compared with the conventional processing process. Therefore, the method of the present invention is a versatile method as a liquid electrochemical process.

また,本発明の方法による水処理では,副生成物(環境汚染を発生させる二次生成物)が発生しないことも特徴である。本発明の放電動作条件による場合,ガス相及び水溶液相におけるオゾン濃度は3%まで下がり,この数値は,商業化において非常に大事な数値となる。   In addition, the water treatment according to the method of the present invention is characterized in that no by-products (secondary products that cause environmental pollution) are generated. According to the discharge operating conditions of the present invention, the ozone concentration in the gas phase and aqueous solution phase drops to 3%, which is a very important value in commercialization.

オゾンは気泡中に発生し,気泡より水の中に入り込むが,1秒またそれ以下の短命であり,OHラジカル等を発生させるためには,放電を水溶液の気泡表面付近に発生させなければならない。   Ozone is generated in bubbles and enters water from bubbles, but it is short-lived for 1 second or less, and in order to generate OH radicals, discharge must be generated near the surface of bubbles in aqueous solution. .

本発明の方法で使用する拡散プラズマアーク放電によれば,寿命1秒以下となるオゾン化・水酸化混合物が発生する。従って,処理槽内における液体の滞留時間は1秒以上であれば良く,液体中に発生させる活性物質量が,本発明の水処理の経済性及び処理能力に影響を及ぼすため,本発明において活性物質の発生量向上は,重要な課題の1つである。   According to the diffusion plasma arc discharge used in the method of the present invention, an ozonation / hydration mixture having a lifetime of 1 second or less is generated. Therefore, the residence time of the liquid in the treatment tank may be 1 second or more, and the amount of active substance generated in the liquid affects the economics and treatment capacity of the water treatment of the present invention. Improving the amount of substances generated is an important issue.

ここで,プラズマアーク放電によって生成された活性物質には,気泡から処理対象水中に拡散して処理対象水に溶解した物質を酸化あるいは還元させるものと,ガスの気泡から出ることなく,従って,不純物を酸化等させることなくそのまま自然消滅してしまうものがある。   Here, active substances generated by plasma arc discharge include substances that oxidize or reduce substances that diffuse from bubbles into the water to be treated and dissolve in the water to be treated. Some of them disappear naturally without being oxidized.

そのため,ガスの気泡内で自然消滅してしまう活性物質を減らし,気泡内から液体中に拡散して不純物の酸化等を行う活性物質量を増加させる条件を見出すことができれば,本発明の水処理を,一層経済的且つ効率的に行うことが可能となる。   Therefore, the water treatment according to the present invention can be achieved by reducing the amount of the active substance that naturally disappears in the gas bubbles and increasing the amount of the active substance that diffuses from the bubbles into the liquid and oxidizes impurities. Can be performed more economically and efficiently.

図13は,上記発想の下,処理対象水のガス含有率を変化させることにより,液体中に溶解する有機物の分解時間がどのように変化するかを測定した結果を示したものである。   FIG. 13 shows the results of measuring how the decomposition time of the organic matter dissolved in the liquid changes by changing the gas content of the water to be treated based on the above idea.

この実験における処理対象水は,オレンジ色の着色剤を溶解した水(濃度0.5%以下のC161242S水溶液)であり,処理対象水のガス含有量を変化させて上記水溶液の脱色時間がどのように変化するかを測定した。 The water to be treated in this experiment is water in which an orange colorant is dissolved (C 16 H 12 O 4 N 2 S aqueous solution having a concentration of 0.5% or less), and the gas content of the water to be treated is changed. It was measured how the decolorization time of the aqueous solution changed.

図13の結果より,処理対象水に対して動作ガスの噴射を行っていない状態から,ガス含有率を徐々に上昇させていくと,脱色時間は徐々に減少し,従って,有機物の分解能が向上することが確認された。   From the result of FIG. 13, when the gas content is gradually increased from the state in which the operating gas is not injected into the water to be treated, the decolorization time is gradually decreased, and thus the organic matter resolution is improved. Confirmed to do.

この脱色時間の減少は,ガス含有率が約60%となった時にピークを迎え,その後,ガス含有率を増加させると,脱色時間は徐々に長くなり,有機物の分解能が低下することが確認された。   This decrease in decolorization time peaked when the gas content reached about 60%, and it was confirmed that if the gas content was increased thereafter, the decolorization time gradually increased and the resolution of organic matter decreased. It was.

上記の結果は,ガス含有率が60%に対して大幅に低い場合,気泡中の活性物質の濃度が高くなり過ぎ,活性物質の自然消滅速度が速くなって液体中の不純物の分解や固形化による除去に貢献しない活性物質が増える結果処理能力が低下する一方,ガス含有率60%に対し大幅に高いガス含有率とした場合には,個々の気泡中で生成される活性物質の濃度が低くなり過ぎ,気泡から液体中に拡散して入り込む活性物質の量が減少するため,液体中に溶解した物質を酸化等させる作用が低下するためであると考えられる。   The above results show that when the gas content is significantly lower than 60%, the concentration of the active substance in the bubbles becomes too high, and the spontaneous extinction rate of the active substance is increased, so that the impurities in the liquid are decomposed or solidified. As a result, the processing capacity decreases as a result of an increase in the amount of active substances that do not contribute to the removal, but when the gas content is significantly higher than the gas content of 60%, the concentration of the active substance generated in each bubble is low. This is considered to be because the amount of the active substance that diffuses and enters the liquid from the bubbles is reduced, and the action of oxidizing the substance dissolved in the liquid is reduced.

因って,液体中のガス含有量は,60%に近付く程高い効果を得ることかでき,ガス濃度の好適な範囲は,上記条件において一例として脱色時間16秒以下を達成できた30〜90%の範囲とすることが好ましい。   Therefore, as the gas content in the liquid approaches 60%, it is possible to obtain a high effect, and the preferred range of the gas concentration is 30 to 90. % Is preferable.

ここで,前述した液体のガス含有量からも判るように,液体の処理効率の向上を得ようとした場合,ガスの気泡中で発生した活性物質をより多く液体中に拡散させることが重要であることが判る。   Here, as can be seen from the gas content of the liquid described above, it is important to diffuse more active substance generated in the gas bubbles into the liquid in order to improve the processing efficiency of the liquid. I know that there is.

このような活性物質の拡散は,気泡と液体との境界の表面積に影響され,境界表面積が大きくなる程,活性物質は液体中に拡散し易いものとなる。   Such diffusion of the active substance is affected by the surface area of the boundary between the bubble and the liquid, and the larger the boundary surface area, the easier the active substance diffuses into the liquid.

そのため,本発明の水処理装置にあっては,ガス気泡の大きさを微小なものとすることで,気液界面の表面積を増大させるものとしており,このような微小な気泡を発生させることができるようにするために,ガス噴射口の前方に円筒状メッシュ等からなるガス気流分散器14を配置する等して,放電エリアや処理槽10内の液体の流れの中に於いてガス気泡の大きさが最小限のものとなるよう,装置構成についても工夫をすることで,液体の処理に貢献することなく消滅する活性物質を減少させて処理効率の向上を図っている。   Therefore, in the water treatment apparatus of the present invention, the surface area of the gas-liquid interface is increased by reducing the size of the gas bubbles, and such fine bubbles can be generated. In order to make it possible, gas gas dispersers 14 made of a cylindrical mesh or the like are arranged in front of the gas injection port, etc., so that the gas bubbles in the discharge area and the liquid flow in the treatment tank 10 In order to minimize the size, the device configuration is devised to reduce the amount of active substances that disappear without contributing to liquid processing, thereby improving processing efficiency.

また,処理槽10内で乱流により生じる気泡の粉砕,プラズマアーク放電によって生ずる気泡の熱膨張による表面張力の減少,気泡内圧力の増加等により,気泡の粉砕が活発化し,液体中に対する活性物質の拡散を促すことができるものとなっている。   In addition, pulverization of bubbles caused by turbulent flow in the treatment tank 10, reduction of surface tension due to thermal expansion of bubbles caused by plasma arc discharge, increase in pressure inside the bubbles, and the like, pulverization of bubbles is activated, and active substances in the liquid Can be promoted.

本発明の水処理方法では,前述したようにプラズマアーク放電によって気泡中に発生した活性物質を利用して有機物の分解を行うだけでなく,液体中に溶解している重金属や放射性物質等の不純物についても固形化して除去できるものである点を特徴の1つとするものであることは既に述べた。   In the water treatment method of the present invention, as described above, not only the organic substance is decomposed using the active substance generated in the bubbles by the plasma arc discharge, but also impurities such as heavy metals and radioactive substances dissolved in the liquid. It has already been described that one of the features is that it can be solidified and removed.

このように,本発明の水処理方法には重金属や放射性物質の除去能があることを確認するために,本発明の水処理装置を使用して,処理対象水中に溶解した重金属塩(表1参照)と,放射性物質(表2〜4)の除去試験を行った。   Thus, in order to confirm that the water treatment method of the present invention has the ability to remove heavy metals and radioactive substances, the heavy metal salt dissolved in the water to be treated (Table 1) using the water treatment device of the present invention. And a removal test for radioactive substances (Tables 2 to 4).

重金属の除去試験
重金属を含む水を,本発明の水処理装置を通過させて処理した結果を表1に示す。なお,本試験例ではハフニウム合金製の電極を備えた水処理装置を使用し,該水処理装置を通過させた後の処理対象水を濾材(綿製)にて濾過して固形化した重金属を除去した。
Removal test of heavy metal Table 1 shows the results of treating the water containing heavy metal through the water treatment device of the present invention. In this test example, a water treatment device equipped with an electrode made of hafnium alloy was used, and the water to be treated after passing through the water treatment device was filtered with a filter medium (made of cotton) to solidify heavy metal. Removed.

Figure 2014200755
Figure 2014200755

以上の結果から,本発明の水処理装置を使用して水処理を行う場合には,液体中に溶解した重金属についても極めて高い除去率で好適に除去できることが確認された。   From the above results, it was confirmed that when water treatment is performed using the water treatment apparatus of the present invention, heavy metals dissolved in the liquid can be suitably removed with an extremely high removal rate.

放射性物質の除去試験
放射性物質を含む水を処理対象とし,本発明の水処理装置を通過させて不純物を固形化し,除去した後の放射性物質残存状態を測定した結果を,表2〜4に示す。
Radioactive substance removal test Tables 2-4 show the results of measurement of the residual state of radioactive substances after treatment with water containing radioactive substances and solidification and removal of impurities through the water treatment device of the present invention. .

Figure 2014200755
Figure 2014200755

Figure 2014200755
Figure 2014200755
Figure 2014200755
Figure 2014200755

以上の結果,本発明の水処理方法によれば,液体中に含まれる放射性物質の除去についても好適に行うことができることが確認された。   As a result, it was confirmed that according to the water treatment method of the present invention, the removal of radioactive substances contained in the liquid can be suitably performed.

1 水処理装置
10 処理槽
11 給水口
12 排水口
13 ガス導入路
14 ガス気流分散器
15 電極挿入孔
16 溝
20 電極
30 電極給送装置
31,32 ローラ
DESCRIPTION OF SYMBOLS 1 Water treatment apparatus 10 Treatment tank 11 Water supply port 12 Drainage port 13 Gas introduction path 14 Gas flow dispersion device 15 Electrode insertion hole 16 Groove 20 Electrode 30 Electrode feeding device 31, 32 Roller

Claims (12)

先端部間が所定の間隔を介して配置された複数の電極と,前記各電極を収容すると共に処理対象水を貯留又は通過させる処理槽を設け,
前記処理槽内に前記各電極の少なくとも先端部が浸漬するように前記処理対象水を導入し,該導入された処理対象水中に動作ガスを噴射して,前記動作ガスの気泡と前記液体によって構成された気液二相流であるバブル噴流を生成し,
前記バブル噴流を,交流電圧が印加された前記電極の先端部に導入することにより,前記電極間にプラズマアーク放電を生じさせることを特徴とする水処理方法。
Provided with a plurality of electrodes disposed between the tip portions with a predetermined interval, and a treatment tank for storing or passing the treatment target water while accommodating each of the electrodes,
The treatment target water is introduced so that at least the tip portion of each electrode is immersed in the treatment tank, and a working gas is injected into the introduced treatment target water, and configured by bubbles of the working gas and the liquid A bubble jet, which is a gas-liquid two-phase flow,
A water treatment method, wherein a plasma arc discharge is generated between the electrodes by introducing the bubble jet into a tip portion of the electrodes to which an alternating voltage is applied.
前記処理槽内に前記電極を長手方向に所定速度で給送し,前記電極の先端部間の間隔を前記所定の間隔に維持することを特徴とする請求項1記載の水処理方法。   2. The water treatment method according to claim 1, wherein the electrode is fed into the treatment tank at a predetermined speed in a longitudinal direction, and an interval between tip portions of the electrode is maintained at the predetermined interval. 前記電極を,ハフニウム合金によって形成することを特徴とする請求項1又は2記載の水処理方法。   The water treatment method according to claim 1, wherein the electrode is formed of a hafnium alloy. 前記動作ガスの噴射を,マッハ1.0〜1.5の超音速で行うと共に,処理対象水に噴射されたガス流を分散して,前記処理対象水中に微小な前記気泡を形成することを特徴とする請求項1〜3いずれか1項記載の水処理方法。   Injecting the working gas at a supersonic speed of Mach 1.0 to 1.5 and dispersing the gas flow injected into the water to be treated to form the fine bubbles in the water to be treated. The water treatment method according to any one of claims 1 to 3, wherein the water treatment method is characterized. 前記分散後の気泡の直径を1〜2mmとしたことを特徴とする請求項4記載の水処理方法。   The water treatment method according to claim 4, wherein the diameter of the dispersed bubbles is 1 to 2 mm. 前記電極に印加する交流電圧のピーク電圧に対し40〜70%の範囲にある放電開始電圧以上となったときに前記プラズマアーク放電が発生し,前記放電開始電圧未満の時,無放電で電極間電流が流れる電流密度となるよう,処理対象水に対する前記電極の接触面積を調整することを特徴とする請求項1〜5いずれか1項記載の水処理方法。   The plasma arc discharge occurs when the discharge start voltage is in the range of 40 to 70% with respect to the peak voltage of the AC voltage applied to the electrodes, and when the discharge start voltage is less than the discharge start voltage, no discharge occurs between the electrodes. The water treatment method according to claim 1, wherein the contact area of the electrode with respect to the water to be treated is adjusted so as to obtain a current density at which a current flows. 前記バブル噴流の噴射軸方向における流動速度を10〜50m/秒の範囲とすることを特徴とする請求項1〜6いずれか1項記載の水処理方法。   The water treatment method according to any one of claims 1 to 6, wherein a flow velocity of the bubble jet flow in the injection axis direction is set in a range of 10 to 50 m / sec. 前記処理対象水のガス含有率が容積比で30〜90%となるよう前記ガスの噴射を行うことを特徴とする請求項1〜7いずれか1項記載の水処理方法。   The water treatment method according to any one of claims 1 to 7, wherein the gas is injected so that a gas content of the treatment target water is 30 to 90% in a volume ratio. 処理対象水を入れる処理槽に,該処理槽内に複数本の電極を先端部を相互に近付けるように固定するための複数の電極挿入孔を設け,
前記電極の先端部側に向かって前記処理槽内に導入された処理対象水に動作ガスを噴射して,前記動作ガスの気泡と前記処理対象水によって構成された気液二相流であるバブル噴流を発生させるガス導入路を設けると共に,
前記バブル噴流の発生下における前記電極の先端部間にプラズマアーク放電を発生させるために必要な交流電圧を前記電極に印加する電圧源を備えることを特徴とする水処理装置。
In the treatment tank into which the water to be treated is placed, a plurality of electrode insertion holes for fixing a plurality of electrodes in the treatment tank so that the tip portions are brought close to each other are provided,
A bubble that is a gas-liquid two-phase flow composed of bubbles of the working gas and the water to be treated by injecting a working gas into the water to be treated introduced into the treatment tank toward the tip end side of the electrode In addition to providing a gas introduction path that generates a jet,
A water treatment apparatus comprising: a voltage source that applies an AC voltage necessary for generating a plasma arc discharge between tip portions of the electrodes under generation of the bubble jet.
前記処理槽に処理対象水を導入する給水口と,処理後の水を排出する排水口を設けたことを特徴とする請求項9記載の水処理装置。   The water treatment apparatus according to claim 9, wherein a water supply port for introducing treatment target water into the treatment tank and a drainage port for discharging treated water are provided. 前記電極挿入孔を前記処理槽の壁面を貫通して設け,該電極挿入孔を介して前記電極を長手方向に所定速度で前記処理槽内に給送する電極給送装置を設けたことを特徴とする請求項9又は10記載の水処理装置。   The electrode insertion hole is provided through the wall of the processing tank, and an electrode feeding device is provided for feeding the electrode into the processing tank at a predetermined speed in the longitudinal direction through the electrode insertion hole. The water treatment apparatus according to claim 9 or 10. 前記ガス導入路の先端に,噴射ガスを前記処理対象水中に分散させるガス気流分散器を設けたことを特徴とする請求項9〜11いずれか1項記載の水処理装置。   The water treatment device according to any one of claims 9 to 11, wherein a gas air flow disperser for dispersing the injection gas in the water to be treated is provided at a tip of the gas introduction path.
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JPWO2016117048A1 (en) * 2015-01-21 2017-04-27 三菱電機株式会社 Water treatment apparatus and water treatment method
CN104828898A (en) * 2015-04-20 2015-08-12 南京大学 Submerged plate-plate discharge plasma wastewater treatment device
CN104843821A (en) * 2015-04-20 2015-08-19 南京大学 Immersion type needle-plate discharge plasma sewage treatment unit
CN118561456A (en) * 2024-06-07 2024-08-30 中国科学院生态环境研究中心 Oxidation water treatment device

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