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JP2014191928A - Manufacturing method of inter-cell connection member, inter-cell connection member, and cell for solid oxide type fuel battery - Google Patents

Manufacturing method of inter-cell connection member, inter-cell connection member, and cell for solid oxide type fuel battery Download PDF

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JP2014191928A
JP2014191928A JP2013064855A JP2013064855A JP2014191928A JP 2014191928 A JP2014191928 A JP 2014191928A JP 2013064855 A JP2013064855 A JP 2013064855A JP 2013064855 A JP2013064855 A JP 2013064855A JP 2014191928 A JP2014191928 A JP 2014191928A
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cell
connection member
coating film
base material
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JP5778711B2 (en
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Shuichi Inoue
修一 井上
Hidemasa Nonaka
英正 野中
Masakazu Yoda
将和 依田
Yuya Takuwa
雄也 宅和
Tei Saito
禎 齋藤
Takayuki Nakao
孝之 中尾
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Osaka Gas Co Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/50Fuel cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

PROBLEM TO BE SOLVED: To provide a technique for attaining improvement of durability by suppressing diffusion of Cr by forming a more uniform and dense protective film than conventional ones.SOLUTION: A manufacturing method of an inter-cell connection member for forming a protective film from a metal oxide over a base material formed from an alloy or an oxide containing Cr and Mn includes: a coating forming step of forming a non-sintered coating containing metal oxide fine particles as a main component on the base material; a calcination step of calcinating the coating under a condition that Mn contained in the base material reacts with a coating component; and a step of forming a dense layer which is generated by reacting the coating component and Mn, within the coating adhesively with a CrOlayer formed on a surface of the base material and growing the dense layer to thickness of 1 μm or more.

Description

本発明は、CrおよびMnを含有する合金または酸化物からなる基材に、金属酸化物からなる保護膜を形成するセル間接続部材の製造方法およびセル間接続部材および固体酸化物形燃料電池用セルに関する。   The present invention relates to a method for producing an inter-cell connecting member for forming a protective film made of a metal oxide on a base material made of an alloy or oxide containing Cr and Mn, an inter-cell connecting member, and a solid oxide fuel cell. Regarding cells.

かかるSOFC用セルは、電解質膜の一方面側に空気極を接合するとともに、同電解質膜の他方面側に燃料極を接合してなる単セルを、空気極または燃料極に対して電子の授受を行う一対の電子伝導性の基材(セル間接続部材)により挟み込んだ構造を有する。
そして、このようなSOFC用セルでは、例えば700〜900℃程度の作動温度で作動し、空気極側から燃料極側への電解質膜を介した酸化物イオンの移動に伴って、一対の電極の間に起電力が発生し、その起電力を外部に取り出し利用することができる。セル間接続部材にはインターコネクタやインターコネクタを介してセル間を電気的に接続する部材が該当する。
Such a SOFC cell has a single cell in which an air electrode is joined to one surface side of an electrolyte membrane and a fuel electrode is joined to the other surface side of the electrolyte membrane, and electrons are transferred to the air electrode or the fuel electrode. It has the structure pinched | interposed by a pair of electron conductive base material (inter-cell connection member) which performs.
And in such a cell for SOFC, for example, it operates at an operating temperature of about 700 to 900 ° C., and with the movement of oxide ions through the electrolyte membrane from the air electrode side to the fuel electrode side, the pair of electrodes An electromotive force is generated in the meantime, and the electromotive force can be taken out and used. The inter-cell connecting member corresponds to an interconnector or a member that electrically connects cells via the interconnector.

インターコネクタは燃料と空気の隔壁となる部材である。
近年の開発の進展に伴い、SOFCの作動温度が下がってきている。従来の作動温度は1000℃程度であり、耐熱性の観点から基材としてランタンクロマイトに代表される金属酸化物が使用されていたが、最近は作動温度が700℃〜800℃まで下がっており、合金が使用できるようになってきた。基材として合金を使用することにより、コストダウン、ロバスト性の向上が期待できる。
The interconnector is a member that serves as a partition wall for fuel and air.
With the progress of development in recent years, the operating temperature of SOFC is decreasing. The conventional operating temperature is about 1000 ° C., and metal oxides typified by lanthanum chromite have been used as a base material from the viewpoint of heat resistance, but recently the operating temperature has dropped to 700 ° C. to 800 ° C., Alloys have become available. By using an alloy as a base material, cost reduction and improvement in robustness can be expected.

前記合金としては、接合される金属酸化物の熱膨張率との整合性から、フェライト系ステンレス鋼が用いられることが多いが、耐熱性により優れたオーステナイト系ステンレス鋼であるFe−Cr−Ni合金や、ニッケル基合金であるNi−Cr合金などが用いられることもある。また、合金ではなく、(La,Ca)CrO3(カルシウムドープランタンクロマイト)に代表される金属酸化物が用いられることもある。 As the alloy, ferritic stainless steel is often used because of its consistency with the thermal expansion coefficient of the metal oxide to be joined, but an Fe-Cr-Ni alloy which is an austenitic stainless steel superior in heat resistance. In addition, a Ni-Cr alloy that is a nickel-based alloy may be used. In addition, instead of an alloy, a metal oxide typified by (La, Ca) CrO 3 (calcium dopeplank chromite) may be used.

これらの合金等は、ほぼ例外なくCrを含んでおり、作動環境である高温大気雰囲気で表面にCr23やMnCr24の酸化被膜を形成する。この酸化被膜は経時的に膜厚が厚くなり、電気抵抗が増大するとともに、作動環境である高温大気雰囲気で6価クロムの化合物として蒸発し、空気極を被毒させて劣化を引き起こすことが知られている(Cr被毒と呼ばれる)。また、(La,Ca)CrO3(カルシウムドープランタンクロマイト)を用いた場合でも合金を用いた場合よりも少ないが、Cr被毒が生じる場合がある。そこで、合金、(La,Ca)CrO3(カルシウムドープランタンクロマイト)の表面に耐熱性に優れた金属酸化物材料を保護して劣化を抑制する試みがなされている。また、これらの合金等としてMnを含む材料も一般的に用いられることがある。
また、合金はSOFCの他の構成材料との熱膨張率の整合性を取るため、フェライト系ステンレスが使用されることが多い。(例:日立金属社製 ZMG232L)フェライト系ステンレスはFe、Crの他にMnを0.1〜1重量%含むものが多い。
These alloys and the like almost always contain Cr, and an oxide film of Cr 2 O 3 or MnCr 2 O 4 is formed on the surface in a high-temperature air atmosphere that is an operating environment. It is known that this oxide film increases in thickness over time, increases electrical resistance, evaporates as a hexavalent chromium compound in a high-temperature atmospheric atmosphere, which is the working environment, and poisons the air electrode to cause deterioration. (Referred to as Cr poisoning). Further, even when (La, Ca) CrO 3 (calcium dope lanthanum chromite) is used, Cr poisoning may occur although it is less than when an alloy is used. Therefore, an attempt has been made to suppress deterioration by protecting a metal oxide material having excellent heat resistance on the surface of an alloy, (La, Ca) CrO 3 (calcium dopeplank chromite). In addition, a material containing Mn may be generally used as such an alloy.
In addition, ferritic stainless steel is often used for the alloy in order to ensure consistency in thermal expansion coefficient with other constituent materials of SOFC. (Example: ZMG232L manufactured by Hitachi Metals, Ltd.) Ferritic stainless steels often contain 0.1 to 1% by weight of Mn in addition to Fe and Cr.

また、SOFC用セルは、その製造工程において、セル間接続部材用の基材と空気極および燃料極との間の接触抵抗をできるだけ小さくするなどの目的で、それらを積層した状態で、作動温度よりも高い1000℃〜1250℃程度の焼成温度で焼成する焼成処理を行う場合がある(例えば、特許文献1、2を参照。)。   In addition, in the manufacturing process of the SOFC cell, in order to minimize the contact resistance between the base material for the inter-cell connecting member and the air electrode and the fuel electrode, the operating temperature is increased. In some cases, a baking treatment is performed in which baking is performed at a higher baking temperature of about 1000 ° C. to 1250 ° C. (see, for example, Patent Documents 1 and 2).

特開2004−259643号公報JP 2004-259634 A 国際公開WO2009/131180号パンフレットInternational Publication WO2009 / 131180 Pamphlet

上記実情から、SOFC合金インターコネクタに対して、スピネル系酸化物に代表されるSOFC作動温度付近において導電性を発現する金属酸化物材料からなる保護することは、SOFCの長期耐久性を確保する上で必須の技術となっている。スピネル系酸化物は特に緻密な構造を有するため、Crの飛散抑制効果が特に高いと考えられている。
保護膜材料としては、Co−Mn系スピネル、Zn−Co系スピネル、Zn−Co−Mn系スピネル、Zn−Mn系スピネル、スピネル酸化物でないものとしてもZnO等が用いられている。
From the above situation, protecting the SOFC alloy interconnector from a metal oxide material that exhibits conductivity in the vicinity of the SOFC operating temperature typified by spinel oxides ensures the long-term durability of the SOFC. It has become an essential technology. Since the spinel oxide has a particularly dense structure, it is considered that the effect of suppressing the scattering of Cr is particularly high.
As the protective film material, Co—Mn spinel, Zn—Co spinel, Zn—Co—Mn spinel, Zn—Mn spinel, ZnO or the like that is not a spinel oxide is used.

しかし、このような材料からなる保護膜によっても、Crの飛散抑制や、長期耐久性の向上について、さらなる改良が望まれていた。   However, even with a protective film made of such a material, further improvements have been desired for suppressing Cr scattering and improving long-term durability.

そこで、本発明は上記実状に鑑み、より均一でかつ緻密な保護膜を形成することにより、Crの飛散を抑制し、耐久性の向上を図る技術を提供することを目的とする。   In view of the above, the present invention has an object to provide a technique for suppressing the scattering of Cr and improving the durability by forming a more uniform and dense protective film.

〔構成1〕
上記目的を達成するための本発明の特徴構成は、CrおよびMnを含有する合金または酸化物からなる基材に、金属酸化物からなる保護膜を形成するセル間接続部材の製造方法であって、
前記基材上に、金属酸化物微粒子を主成分として含有する未焼結の塗膜を形成する塗膜形成工程を行い、前記基材に含まれるMnが前記塗膜成分と反応する条件下で、前記塗膜を焼成する焼成工程を行い、前記塗膜内に前記塗膜成分とMnとが反応して生じるMn含有緻密層(以下単に緻密層と称する)を、前記基材表面に形成されるCr23層と密着形成させ、前記緻密層の厚さを1μm以上に成長させる点にある。
[Configuration 1]
A characteristic configuration of the present invention for achieving the above object is a method for manufacturing an inter-cell connection member, in which a protective film made of a metal oxide is formed on a base material made of an alloy or oxide containing Cr and Mn. ,
On the base material, a coating film forming step for forming an unsintered coating film containing metal oxide fine particles as a main component is performed, and the Mn contained in the base material reacts with the coating film component. A baking step of baking the coating film is performed, and a Mn-containing dense layer (hereinafter simply referred to as a dense layer) generated by the reaction between the coating film component and Mn is formed in the coating film. The dense layer is formed in close contact with the Cr 2 O 3 layer, and the thickness of the dense layer is grown to 1 μm or more.

〔作用効果1〕
前記基材に塗膜形成工程を行うと、金属酸化物微粒子を主成分として含有する未焼結の塗膜が形成される。前記塗膜を熱処理すると、熱処理によって、ステンレスの表面に形成されるCr23酸化被膜と保護膜の間に緻密な膜が形成され、上記緻密層となる。前記熱処理は、保護膜の製造工程においても行われうるし、実使用時における発熱によっても自然に進行することが知られている。
[Operation effect 1]
When the coating film forming step is performed on the substrate, an unsintered coating film containing metal oxide fine particles as a main component is formed. When the coating film is heat-treated, a dense film is formed between the Cr 2 O 3 oxide film formed on the stainless steel surface and the protective film by the heat treatment, and the dense layer is formed. It is known that the heat treatment can be performed also in the manufacturing process of the protective film, and proceeds naturally due to heat generated during actual use.

この緻密層は基材中のMn成分と保護膜成分が相互拡散し、反応することでできた層であるため、非常に緻密であり、酸素のバリア性が高いと考えられる。緻密層の存在により、Crの飛散(Cr被毒)の抑制による空気極劣化の低減、Cr23酸化被膜の膜厚増大速度の抑制によるオーミック抵抗増加の抑制、などが実現できる。
そのため、この緻密層を十分機能させることによって、SOFCの耐久性を延長できると考えられる。そこで、本発明者らが検討した結果、前記基材表面に形成されるCr23層と密着形成させ、前記緻密層厚さ前記を1μm以上に成長させることによって、前記緻密層は十分なCrの飛散防止を実現できるとともに抵抗増加の抑制を実現でき、好適な耐久性向上効果が期待できることがわかる。
Since this dense layer is a layer formed by mutual diffusion and reaction of the Mn component and the protective film component in the base material, it is considered to be very dense and have a high oxygen barrier property. Due to the presence of the dense layer, it is possible to reduce the deterioration of the air electrode by suppressing the scattering of Cr (Cr poisoning), and to suppress the increase in ohmic resistance by suppressing the film thickness increase rate of the Cr 2 O 3 oxide film.
Therefore, it is considered that the durability of SOFC can be extended by sufficiently functioning this dense layer. Therefore, as a result of the study by the present inventors, the dense layer is sufficiently formed by forming the dense layer with a thickness of 1 μm or more by closely forming the Cr 2 O 3 layer formed on the substrate surface. It can be seen that Cr can be prevented from being scattered and resistance increase can be suppressed, and a suitable durability improvement effect can be expected.

なお、前記焼成工程により、前記基材表面には基材に含まれるCrに由来するCr23層が形成される。このCr23層は、通常前記緻密層との密着性が高く、緻密層と基材との間における層間剥離等を防止する効果も発揮している。 Incidentally, by the firing step, the substrate surface is Cr 2 O 3 layer derived from the Cr contained in the base material is formed. This Cr 2 O 3 layer usually has high adhesion to the dense layer, and also exhibits an effect of preventing delamination between the dense layer and the substrate.

〔構成2〕
また、前記保護膜がCo、Zn、Mnから選ばれる少なくとも一種の金属酸化物を含むことが好ましい。
[Configuration 2]
Further, it is preferable that the protective film contains at least one metal oxide selected from Co, Zn, and Mn.

〔作用効果2〕
保護膜材料としては、Co−Mn系スピネル、Zn−Co系スピネル、Zn−Co−Mn系スピネル、Zn−Mn系スピネル、ZnO等の、Co、Zn、Mnから選ばれる少なくとも一種の金属酸化物を含むものが有効に用いられる。
これらの金属酸化物成分を用いると、基材として用いられる種々材料との密着性が高く、受熱に対する耐久性が高く、かつ、緻密層を形成した際に、スピネル構造の酸素バリア性が高く、Cr飛散防止効果の高い保護膜に形成されることが明らかになっているので好ましい。本発明者らは、(ZnxCo1-x)Co24(0.45≦x≦1.00)等のZn−Co系材料や、Co1.5Mn1.54等のMn−Co系材料に代表されるものが特に有利に用いられることを既に見出している。さらに、複合酸化物として種々の化合物を検討したところ、Znx(CoyMn(1-y)(3-x)4(0<x<1、0<y×(3−x)≦2)を含む保護膜は、基材、空気極等との熱膨張率の不一致(差)が小さく、特に製造工程時(保護膜の焼成時)において、一度は晒される800℃〜1000℃の環境下においても基材、空気極等との熱膨張率の不一致(差)が小さいうえに、Crの飛散抑制効果がきわめて高いことを見出している。
[Operation effect 2]
As the protective film material, at least one metal oxide selected from Co, Zn, Mn, such as Co—Mn spinel, Zn—Co spinel, Zn—Co—Mn spinel, Zn—Mn spinel, ZnO, etc. Those containing are effectively used.
When these metal oxide components are used, the adhesion to various materials used as the base material is high, the durability against heat reception is high, and when the dense layer is formed, the oxygen barrier property of the spinel structure is high, It is preferable that it is formed on a protective film having a high Cr scattering prevention effect. The present inventors have made Zn-Co based materials such as (Zn x Co 1-x ) Co 2 O 4 (0.45 ≦ x ≦ 1.00) and Mn—Co based such as Co 1.5 Mn 1.5 O 4. It has already been found that those typified by materials are particularly advantageously used. Furthermore, when various compounds were examined as a composite oxide, Zn x (Co y Mn (1-y) ) (3-x) O 4 (0 <x <1, 0 <y × (3-x) ≦ The protective film containing 2) has a small mismatch (difference) in the thermal expansion coefficient with the base material, the air electrode, etc., and is particularly exposed to 800 ° C. to 1000 ° C. once during the manufacturing process (when the protective film is baked). It has been found that even in an environment, the thermal expansion coefficient mismatch (difference) with the base material, the air electrode, etc. is small, and the effect of suppressing Cr scattering is extremely high.

〔構成3〕
また、前記保護膜が、Znx(CoyMn(1-y)(3-x)4(0<x<1、0<y×(3−x)≦2)を含む場合、前記焼成工程において、前記塗膜を1000℃以上1100度以下で、2時間以上焼成することが好ましい。
[Configuration 3]
When the protective film contains Zn x (Co y Mn (1-y) ) (3-x) O 4 (0 <x <1, 0 <y × (3-x) ≦ 2), In the firing step, the coating film is preferably fired at 1000 ° C. to 1100 ° C. for 2 hours or longer.

〔作用効果3〕
上記緻密層を1μm以上に成長させるには、塗膜をある程度の高温で長時間焼成することが必要であると考えられるが、実際には、後述の実施の形態より800℃では全く緻密層の形成が見られないのに対し、1000℃以上で緻密層の形成が観測された。さらに1100℃においても比較的短時間で緻密層が成長することが確認されている。当然のことながら、1100℃を超える温度ではさらに短時間で緻密層を成長させることができると予想されるが、基板のステンレス部材の耐熱性の上限温度を超えてしまい、焼成時の酸化劣化が著しくなるため、1100℃以下とすることが望ましい。
なお、1000℃以上とした場合2時間以上の加熱で1μm以上の緻密層が成長するとともに、塗膜全体を均一に焼成することができるので好ましい。なお、さらに長時間焼成することを妨げるものではないが、塗膜全体が緻密層に成長してしまうと、それ以上の加熱は基板のステンレス部材の酸化劣化を促進するだけになるため、塗膜の厚さと、目標となる緻密層の厚さを勘案して、加熱時間を適宜設定することが好ましい。
[Operation effect 3]
In order to grow the dense layer to 1 μm or more, it is thought that the coating film needs to be baked for a long time at a certain high temperature. While no formation was observed, the formation of a dense layer was observed at 1000 ° C. or higher. Furthermore, it has been confirmed that a dense layer grows in a relatively short time even at 1100 ° C. As a matter of course, it is expected that a dense layer can be grown in a shorter time at a temperature exceeding 1100 ° C., but the temperature exceeds the upper limit of the heat resistance of the stainless steel member of the substrate, and oxidative deterioration during firing occurs. Since it becomes remarkable, it is desirable to set it as 1100 degrees C or less.
In addition, when it is 1000 degreeC or more, while the dense layer of 1 micrometer or more grows by heating for 2 hours or more, and the whole coating film can be baked uniformly, it is preferable. Although it does not prevent further baking for a long time, if the entire coating film grows into a dense layer, further heating only promotes oxidative deterioration of the stainless steel member of the substrate. It is preferable to appropriately set the heating time in consideration of the thickness of the film and the thickness of the target dense layer.

〔構成4〕
また、前記保護膜が、Co1.5Mn1.54などMn−Co系材料を含む場合、前記焼成工程において、前記塗膜を1050℃以上1100度以下で、焼成することが好ましい。
[Configuration 4]
Further, the protective film, if it contains Mn-Co-based material such as Co 1.5 Mn 1.5 O 4, in the firing step, the coating film 1100 degrees below 1050 ° C. or more, is preferably fired.

〔作用効果4〕
上記緻密層を1μm以上に成長させるには、塗膜をある程度の高温で長時間焼成することが必要であると考えられるが、実際には、後述の実施の形態より1000℃×2hrでは、緻密層の厚みが0.9μmと不十分な厚みでしか形成できていなかった。一方、1050℃×5hrの焼成では1.7μmの緻密層の形成が観測された。
さらに高温の1100℃ではより短時間で厚い緻密層の形成が期待できると考えられる。
当然のことながら、1100℃を超える温度ではさらに短時間で緻密層を成長させることができると予想されるが、基板のステンレス部材の耐熱性の上限温度を超えてしまい、焼成時の酸化劣化が著しくなるため、1100℃以下とすることが望ましい。
なお、1050℃以上とした場合5時間以上の加熱で1μm以上の緻密層が成長するとともに、塗膜全体を均一に焼成することができるので好ましい。なお、さらに長時間焼成することを妨げるものではないが、塗膜全体が緻密層に成長してしまうと、それ以上の加熱は基板のステンレス部材の酸化劣化を促進するだけになるため、塗膜の厚さと、目標となる緻密層の厚さを勘案して、加熱時間を適宜設定することが好ましい。
[Operation effect 4]
In order to grow the dense layer to 1 μm or more, it is considered that the coating film needs to be baked for a long time at a certain high temperature. However, in reality, the dense layer is formed at 1000 ° C. × 2 hr from the following embodiment. It was possible to form the layer only with an insufficient thickness of 0.9 μm. On the other hand, in the firing at 1050 ° C. × 5 hr, formation of a 1.7 μm dense layer was observed.
Further, it is considered that a thick dense layer can be expected in a shorter time at a high temperature of 1100 ° C.
As a matter of course, it is expected that a dense layer can be grown in a shorter time at a temperature exceeding 1100 ° C., but the temperature exceeds the upper limit of the heat resistance of the stainless steel member of the substrate, and oxidative deterioration during firing occurs. Since it becomes remarkable, it is desirable to set it as 1100 degrees C or less.
In addition, when it is 1050 degreeC or more, while the dense layer of 1 micrometer or more grows by heating for 5 hours or more, and the whole coating film can be baked uniformly, it is preferable. Although it does not prevent further baking for a long time, if the entire coating film grows into a dense layer, further heating only promotes oxidative deterioration of the stainless steel member of the substrate. It is preferable to appropriately set the heating time in consideration of the thickness of the film and the thickness of the target dense layer.

〔構成5〕
また、前記基材上に形成される塗膜がアニオン電着塗装法により形成することができる。
[Configuration 5]
Moreover, the coating film formed on the said base material can be formed by the anion electrodeposition coating method.

〔作用効果5〕
一般的な成膜法として、たとえば、ウエットコーティング法、あるいはドライコーティング法によって形成することができる。ウエットコーティング法としては、スクリーン印刷法、ドクターブレード法、スプレーコート法、インクジェット法、スピンコート法、ディップコート、電気めっき法、無電解めっき法、電着塗装法等が例示できる。また、ドライコーティング法としては、たとえば蒸着法、スパッタリング法、イオンプレーティング法、化学気相成長(CVD)法、電気化学気相成長(EVD)法、イオンビーム法、レーザーアブレーション法、大気圧プラズマ成膜法、減圧プラズマ成膜法、溶射法等が例示できる。ただし、ドライコーティング法は製造装置が複雑であることに加え、製造コストが高くなることから、ウエットコーティング法が推奨される。
ウエットコーティング法により金属酸化物被膜を成膜する場合、金属酸化物そのものには結着性がほとんどないので、金属酸化物微粒子と樹脂組成物との混合液を用いて、金属酸化物微粒子と樹脂からなる被膜を形成する被膜形成工程を行い、その被膜から樹脂成分を除去することにより金属酸化物を主成分とする手法が採用される。中でも、電着塗装法によると、アニオン電着を行うことによって、基材の表面には金属酸化物微粒子と樹脂組成物との混合液が付着した被膜が形成される。この被膜は、金属酸化物微粒子と樹脂組成物主成分となり、前記樹脂成分の重合に伴い、前記金属酸化物微粒子が凝集一体化されることにより形成されている。この被膜から樹脂成分を除去することによって、金属酸化物微粒子同士が凝集して被膜を形成した保護膜を形成することができる。すると、得られる保護膜は、たとえばディップコートに比べて比較的薄くて均一な塗膜を得ることができるので好ましい。
したがって、アニオン電着塗装を行うと、前記塗膜は基材の全領域に均一に製膜されるので望ましい。
[Operation effect 5]
As a general film forming method, for example, it can be formed by a wet coating method or a dry coating method. Examples of the wet coating method include a screen printing method, a doctor blade method, a spray coating method, an ink jet method, a spin coating method, a dip coating, an electroplating method, an electroless plating method, and an electrodeposition coating method. Examples of dry coating methods include vapor deposition, sputtering, ion plating, chemical vapor deposition (CVD), electrochemical vapor deposition (EVD), ion beam, laser ablation, and atmospheric pressure plasma. Examples thereof include a film forming method, a low pressure plasma film forming method, and a thermal spraying method. However, the dry coating method is recommended because the manufacturing apparatus is complicated and the manufacturing cost is high.
When a metal oxide film is formed by a wet coating method, the metal oxide itself has almost no binding property, so a mixed solution of metal oxide fine particles and a resin composition is used to form metal oxide fine particles and a resin. A method in which a metal oxide is used as a main component is employed by performing a film forming step for forming a film made of and removing a resin component from the film. In particular, according to the electrodeposition coating method, a film in which a mixed liquid of metal oxide fine particles and a resin composition is attached to the surface of the substrate is formed by performing anion electrodeposition. This coating film is formed by the metal oxide fine particles and the resin composition as main components, and the metal oxide fine particles are aggregated and integrated as the resin component is polymerized. By removing the resin component from the coating, a protective film in which the metal oxide fine particles aggregate to form a coating can be formed. Then, since the obtained protective film can obtain a comparatively thin and uniform coating film compared with dip coating, for example, it is preferable.
Therefore, anion electrodeposition coating is desirable because the coating film is uniformly formed on the entire area of the substrate.

〔構成6〕
また、本発明のセル間接続部材の特徴構成は、上記セル間接続部材の製造方法により製造された点にある。
[Configuration 6]
The characteristic configuration of the inter-cell connecting member of the present invention is that it is manufactured by the above-described method for manufacturing the inter-cell connecting member.

〔作用効果6〕
上記セル間接続部材の製造方法により製造されたセル間接続部材は、上述のごとく、均一で安定した塗膜に焼成による緻密層を1μm以上成長させて形成してあるとともに、その緻密層は前記塗膜に由来するから前記塗膜との一体性が高く、かつ基材表面のCr23に強固に密着するので受熱に対する耐久性が高く、その緻密層により抵抗増加が抑制され、Cr飛散抑制されたものとなっており、長期耐久性が期待できる。
[Operation effect 6]
As described above, the inter-cell connection member manufactured by the method for manufacturing an inter-cell connection member is formed by growing a dense layer by firing on a uniform and stable coating film by 1 μm or more. Since it is derived from the coating film, it is highly integrated with the coating film and strongly adheres to the Cr 2 O 3 on the substrate surface, so it has high durability against heat reception, and its dense layer suppresses the increase in resistance, Cr scattering Long-term durability can be expected.

〔構成7〕
また、前記基材がMnを含むフェライト系ステンレス鋼であってもよい。
[Configuration 7]
The base material may be ferritic stainless steel containing Mn.

〔作用効果7〕
また、前記基材にMnを含有するステンレス鋼を用い、保護膜としてスピネル型酸化物を主材とするものを用いる組み合わせにより、基材に対する密着性の高い緻密層を形成させることができ、安定して保護膜を形成させるとともにCrの飛散を抑えることができる。
なお、前記基材の合金をMn含有率0.3%以上とすることによって、Mnを確実に拡散させ緻密層を形成させることでCrの飛散を防止することができるが、Mn含有率の高い基材は、耐酸化力が低いと考えられている点から、1%以下とすることが好ましい。
[Operation effect 7]
In addition, a combination of using stainless steel containing Mn as the base material and using a spinel type oxide as the main material as a protective film can form a dense layer with high adhesion to the base material, which is stable. Thus, a protective film can be formed and Cr scattering can be suppressed.
In addition, by making Mn content 0.3% or more of the alloy of the base material, it is possible to prevent scattering of Cr by reliably diffusing Mn and forming a dense layer, but the Mn content is high. The base material is preferably 1% or less because it is considered that the oxidation resistance is low.

〔構成8〕
また、本発明の固体酸化物形燃料電池用セルの特徴構成は、上述のセル間接続部材を空気極と接合してなる点にある。
[Configuration 8]
Moreover, the characteristic structure of the cell for solid oxide fuel cells of this invention exists in the point formed by joining the above-mentioned connection member between cells with an air electrode.

〔作用効果8〕
上記セル間接続部材の製造方法により製造されたセル間接続部材は、上述のごとく、均一で安定した塗膜に焼成による緻密層を1μm以上成長させて形成してあるとともに、その緻密層は前記塗膜に由来するから前記塗膜との一体性が高く、かつ基材表面のCr23に強固に密着するので受熱に対する耐久性が高く、その緻密層により抵抗増加が抑制され、Cr飛散抑制されたものとなっており、長期耐久性が期待できる。したがって、このようなセル間接続部材を用いた固体酸化物形燃料電池用セルは、安定して長期耐久性を期待できるものと考えられる。
[Operation effect 8]
As described above, the inter-cell connection member manufactured by the method for manufacturing an inter-cell connection member is formed by growing a dense layer by firing on a uniform and stable coating film by 1 μm or more. Since it is derived from the coating film, it is highly integrated with the coating film and strongly adheres to the Cr 2 O 3 on the substrate surface, so it has high durability against heat reception, and its dense layer suppresses the increase in resistance, Cr scattering Long-term durability can be expected. Therefore, it is considered that the solid oxide fuel cell using such an inter-cell connecting member can stably expect long-term durability.

したがって、主に固体酸化物形燃料電池用セルに用いられるセル間接続部材をきわめて耐久性高く設けることができるので、長期使用によっても安定に動作しうるSOFCを提供することができる。   Therefore, since the inter-cell connection member mainly used for the solid oxide fuel cell can be provided with extremely high durability, it is possible to provide an SOFC that can operate stably even after long-term use.

固体酸化物形燃料電池の概略図Schematic diagram of solid oxide fuel cell 固体酸化物形燃料電池のセル接続部材の使用形態を示す図The figure which shows the usage condition of the cell connection member of a solid oxide fuel cell 保護膜を形成したセル接続部材試験片の断面図Sectional view of cell connection member test piece with protective film formed 基材上に形成された塗膜を焼成した後の層構造を示す概略図Schematic showing the layer structure after firing the coating film formed on the substrate

以下に、本発明のSOFCに用いられるCrを含有する合金または酸化物からなる基材の表面に、保護膜を形成する保護膜形成方法およびSOFC用セル接続部材およびSOFC用セルを説明する。なお、以下に好適な実施例を記すが、これら実施例は、本発明をより具体的に例示するために記載されたものであって、本発明の趣旨を逸脱しない範囲において種々変更が可能であり、本発明は、以下の記載に限定されるものではない。   Hereinafter, a protective film forming method, a SOFC cell connecting member, and a SOFC cell for forming a protective film on the surface of a base material made of an alloy or oxide containing Cr used in the SOFC of the present invention will be described. Preferred examples are described below, but these examples are described in order to more specifically illustrate the present invention, and various modifications can be made without departing from the spirit of the present invention. The present invention is not limited to the following description.

<固体酸化物形燃料電池>
本発明にかかるSOFC用セル接続部材およびその製造方法の実施の形態について、図面に基づいて説明する。
図1および図2に示すSOFC用セルCは、酸化物イオン電導性の固体酸化物の緻密体からなる電解質膜30の一方面側に、酸化物イオンおよび電子電導性の多孔体からなる空気極31を接合するとともに、同電解質膜30の他方面側に電子電導性の多孔体からなる燃料極32を接合してなる単セル3を備える。
<Solid oxide fuel cell>
Embodiments of a cell connection member for SOFC and a method for manufacturing the same according to the present invention will be described with reference to the drawings.
The SOFC cell C shown in FIG. 1 and FIG. 2 has an air electrode made of an oxide ion and an electron conductive porous body on one side of an electrolyte membrane 30 made of a dense oxide oxide conductive solid oxide. 31 and a single cell 3 formed by joining a fuel electrode 32 made of an electron conductive porous body to the other surface side of the electrolyte membrane 30.

さらに、SOFC用セルCは、この単セル3を、空気極31または燃料極32に対して電子の授受を行うとともに空気および水素を供給するための溝2が形成された一対の電子電導性の合金または酸化物からなる基材11に保護膜12を形成してあるセル接続部材1(図3に形状が断面長方形の単純形状である場合の模式図を示す)により、適宜外周縁部においてガスシール体を挟持した状態で挟み込んだ構造を有する。そして、空気極31側の上記溝2が、空気極31とセル接続部材1とが密着配置されることで、空気極31に空気を供給するための空気流路2aとして機能し、一方、燃料極32側の上記溝2が、燃料極32とセル接続部材1とが密着配置されることで、燃料極32に水素を供給するための燃料流路2bとして機能する。   Further, the SOFC cell C exchanges electrons with the single cell 3 with respect to the air electrode 31 or the fuel electrode 32, and at the same time, a pair of electronically conductive elements in which grooves 2 for supplying air and hydrogen are formed. The cell connecting member 1 in which the protective film 12 is formed on the base material 11 made of an alloy or oxide (a schematic diagram in the case where the shape is a simple shape having a rectangular cross section is shown in FIG. 3) is appropriately gas at the outer peripheral edge. It has a structure in which the sealing body is sandwiched. And the said groove | channel 2 by the side of the air electrode 31 functions as the air flow path 2a for supplying air to the air electrode 31, because the air electrode 31 and the cell connection member 1 are closely_contact | adhered, on the other hand, fuel The groove 2 on the electrode 32 side functions as a fuel flow path 2 b for supplying hydrogen to the fuel electrode 32 by arranging the fuel electrode 32 and the cell connecting member 1 in close contact with each other.

なお、上記SOFC用セルCを構成する各要素で利用される一般的な材料について説明を加えると、たとえば、上記空気極31の材料としては、LaMO3(たとえばM=Mn,Fe,Co)中のLaの一部をアルカリ土類金属AE(AE=Sr,Ca)で置換した(La,AE)MO3のペロブスカイト型酸化物を利用することができ、上記燃料極32の材料としては、Niとイットリア安定化ジルコニア(YSZ)とのサーメットを利用することができ、さらに、電解質膜30の材料としては、イットリア安定化ジルコニア(YSZ)を利用することができる。 In addition, when a general material used in each element constituting the SOFC cell C is described, for example, the material of the air electrode 31 is LaMO 3 (for example, M = Mn, Fe, Co). A perovskite oxide of (La, AE) MO 3 in which a part of La of Al is substituted with an alkaline earth metal AE (AE = Sr, Ca) can be used. And yttria-stabilized zirconia (YSZ) can be used, and yttria-stabilized zirconia (YSZ) can be used as the material of the electrolyte membrane 30.

さらに、これまで説明してきたSOFC用セルCでは、セル接続部材1の材料としては、CrおよびMnを含有する合金または酸化物を用いる。   Further, in the SOFC cell C described so far, as the material of the cell connection member 1, an alloy or oxide containing Cr and Mn is used.

そして、複数のSOFC用セルCが積層配置された状態で、複数のボルトおよびナットにより積層方向に押圧力を与えて挟持され、セルスタックとなる。
このセルスタックにおいて、積層方向の両端部に配置されたセル接続部材1は、燃料流路2bまたは空気流路2aの一方のみが形成されるものであればよく、その他の中間に配置されたセル接続部材1は、一方の面に燃料流路2bが形成され他方の面に空気流路2aが形成されるものを利用することができる。なお、かかる積層構造のセルスタックでは、上記セル接続部材1をセパレータと呼ぶ場合がある。
このようなセルスタックの構造を有するSOFCを一般的に平板型SOFCと呼ぶ。本実施の形態では、一例として平板型SOFCについて説明するが、本願発明は、その他の構造のSOFCについても適用可能である。
In a state where a plurality of SOFC cells C are arranged in a stacked manner, a pressing force is applied in the stacking direction by a plurality of bolts and nuts to form a cell stack.
In this cell stack, the cell connecting members 1 disposed at both ends in the stacking direction may be any one as long as only one of the fuel flow path 2b or the air flow path 2a is formed, and the cells disposed in the other middle. The connecting member 1 may be one in which the fuel flow path 2b is formed on one surface and the air flow path 2a is formed on the other surface. In the cell stack having such a laminated structure, the cell connecting member 1 may be called a separator.
An SOFC having such a cell stack structure is generally called a flat-plate SOFC. In this embodiment, a flat-plate SOFC is described as an example, but the present invention is applicable to SOFCs having other structures.

そして、このようなSOFC用セルCを備えたSOFCの作動時には、図2に示すように、空気極31に対して隣接するセル接続部材1に形成された空気流路2aを介して空気を供給するとともに、燃料極32に対して隣接するセル接続部材1に形成された燃料流路2bを介して水素を供給し、たとえば800℃程度の作動温度で作動する。すると、空気極31においてO2が電子e-と反応してO2-が生成され、そのO2-が電解質膜30を通って燃料極32に移動し、燃料極32において供給されたH2がそのO2-と反応してH2Oとe-とが生成されることで、一対のセル接続部材1の間に起電力Eが発生し、その起電力Eを外部に取り出し利用することができる。 When the SOFC having such a SOFC cell C is operated, air is supplied through the air flow path 2a formed in the cell connection member 1 adjacent to the air electrode 31, as shown in FIG. In addition, hydrogen is supplied through the fuel flow path 2b formed in the cell connection member 1 adjacent to the fuel electrode 32, and the fuel electrode 32 operates at an operating temperature of, for example, about 800 ° C. Then, the air electrode 31 O 2 electrons e - are reacting with O 2- is generated, the O 2- passes through the electrolyte membrane 30 to move to the fuel electrode 32, H 2 supplied in the fuel electrode 32 Reacts with the O 2− to generate H 2 O and e , so that an electromotive force E is generated between the pair of cell connecting members 1, and the electromotive force E is taken out and used. Can do.

<セル接続部材>
前記セル接続部材1は、図1、図3に示すように、セル接続部材用の基材11の表面に保護膜12を設けて構成してある。そして、前記各単セル3の間に空気流路2a、燃料流路2bを形成しつつ接続可能にする溝板状に形成してある。
<Cell connection member>
As shown in FIGS. 1 and 3, the cell connection member 1 is configured by providing a protective film 12 on the surface of a substrate 11 for a cell connection member. And it forms in the shape of a groove plate which can be connected, forming the air flow path 2a and the fuel flow path 2b between each said single cell 3. As shown in FIG.

前記保護膜12は、導電性セラミックス材料を含有する塗膜形成用材料を、前記基材11に電着塗装することにより保護膜12を厚膜として形成してある。   The protective film 12 is formed as a thick film by electrodeposition coating a base material 11 with a coating film-forming material containing a conductive ceramic material.

<保護膜>
前記保護膜12は、たとえば、Crを22%、Mnを約0.5%含むフェライト系ステンレス鋼(日立金属製ZMG232L)等からなる前記基材11の表面にたとえば、ZnCoMnO4等の金属酸化物微粒子とポリアクリル酸等のアニオン型樹脂とを質量比で(金属酸化物微粒子:アニオン型樹脂)=(0.5:1)〜(1.7:1)の割合で含有している混合液を用いて、アニオン電着塗装法により金属酸化物微粒子を主成分として含有する未焼結の塗膜を形成する塗膜形成工程を行い、前記塗膜を焼成して前記塗膜中の樹脂成分を焼失させた焼成被膜を形成し、さらに前記焼成被膜を前記基材に含まれるMnが前記塗膜成分と反応する条件下で焼成させて、前記基材11表面に形成されるCr23層11aと密着する金属酸化物からなる保護膜12を形成する焼成工程を行うことにより形成されている。
<Protective film>
The protective film 12 is formed, for example, on the surface of the base 11 made of ferritic stainless steel (ZMG232L made by Hitachi Metals) containing 22% Cr and about 0.5% Mn, for example, a metal oxide such as ZnCoMnO 4 . Liquid mixture containing fine particles and anionic resin such as polyacrylic acid in a mass ratio of (metal oxide fine particles: anionic resin) = (0.5: 1) to (1.7: 1) A coating film forming step of forming an unsintered coating film containing metal oxide fine particles as a main component by an anionic electrodeposition coating method, and baking the coating film to resin components in the coating film The fired film is burned off, and the fired film is further fired under the condition that Mn contained in the base material reacts with the paint film component to form Cr 2 O 3 formed on the surface of the base material 11. From the metal oxide in close contact with the layer 11a It forms by performing the baking process which forms the protective film 12 which becomes.

なお、前記塗膜形成工程はアニオン電着塗装法によったが、ディップコート、スプレーコート等他の方法によることも可能である。   In addition, although the said coating-film formation process was based on the anion electrodeposition coating method, it can also be based on other methods, such as a dip coat and a spray coat.

以下に前記保護膜12の具体的な製造方法を詳述するが、本発明は、以下の実施例に限定されるものではない。
<実施例>
前記ステンレス鋼材からなるインターコネクタ用の基材11表面にスピネル型の金属酸化物よりなる塗膜を設けた試験片を作成し、前記試験片を各種温度で、所定時間加熱する熱処理を行うことにより、前記塗膜を焼成し(焼成工程)、保護膜12を作成した。前記保護膜12は、各試験片とも保護膜の膜厚が5〜10μm程度になる条件でアニオン電着塗装し、前記保護膜12の表面に、接着層を接着して熱処理の試験を行った。各試験片について、前記保護膜12に占める緻密層12aの厚さをSEMにより測定し、熱処理による緻密層12aの変化を調べた。
Although the specific manufacturing method of the said protective film 12 is explained in full detail below, this invention is not limited to a following example.
<Example>
By preparing a test piece provided with a coating film made of a spinel type metal oxide on the surface of the substrate 11 for an interconnector made of the stainless steel material, and performing a heat treatment for heating the test piece at various temperatures for a predetermined time. The coating film was baked (baking step) to form a protective film 12. The protective film 12 was subjected to anion electrodeposition under the condition that the thickness of the protective film was about 5 to 10 μm for each test piece, and an adhesive layer was adhered to the surface of the protective film 12 to perform a heat treatment test. . For each test piece, the thickness of the dense layer 12a occupying the protective film 12 was measured by SEM, and changes in the dense layer 12a due to heat treatment were examined.

<実施例1>(B:参考)
前記金属酸化物としてZnCoMnO4を用い、アニオン電着塗装により前記基材上に塗膜を形成し、1000℃で2時間焼成して保護膜12のサンプルを作成した。保護膜12の断面形状を確認したところ、図4に示すように、基材11の表面にCr23層11aが形成されるとともに、形成された塗膜が、Cr23層11aに密着する緻密層12a(本願に言うMn含有緻密層)と、塗膜表面側の多孔層とからなる保護膜12に形成されていることが分かった。この緻密層12aの厚さは約2μmであった。
<Example 1> (B: Reference)
Using ZnCoMnO 4 as the metal oxide, a coating film was formed on the substrate by anionic electrodeposition coating, and baked at 1000 ° C. for 2 hours to prepare a sample of the protective film 12. When the cross-sectional shape of the protective film 12 was confirmed, as shown in FIG. 4, the Cr 2 O 3 layer 11a was formed on the surface of the substrate 11, and the formed coating film was formed on the Cr 2 O 3 layer 11a. It turned out that it forms in the protective film 12 which consists of the dense layer 12a (Mn containing dense layer said to this application) which adheres, and the porous layer of the coating-film surface side. The dense layer 12a had a thickness of about 2 μm.

(通電試験)
上記サンプルを空気極材料に埋め込み、1000℃×200hrの通電試験を行ったところ、初期の電圧降下は、55mV程度で200hr後の電圧降下増加量(劣化量)は3mV以下であり、抵抗増加が十分抑制されているとともに、長期耐久性が期待できることがわかった。
(Energization test)
When the sample was embedded in an air electrode material and a current test at 1000 ° C. × 200 hr was performed, the initial voltage drop was about 55 mV, the voltage drop increase (deterioration amount) after 200 hr was 3 mV or less, and the resistance increase was It was found that long-term durability can be expected while being sufficiently suppressed.

(Cr飛散数の測定)
なお、上記サンプルを切断して断面をEPMAにより観察し、Crの飛散状態を調べたところ、飛散カウント数が2945となっており、ZnCoMnO4に由来する高いCr飛散抑制効果を発揮していることもわかった。
(Measurement of Cr scattering number)
In addition, when the sample was cut and the cross section was observed with EPMA and the scattering state of Cr was examined, the scattering count number was 2945, and a high Cr scattering suppression effect derived from ZnCoMnO 4 was exhibited. I understand.

<実施例2>(A)
実施例1における焼成時間を200時間とした以外は、実施例1と同様にサンプルを形成し、通電試験およびCr飛散数の測定を行った。その結果を表1に示す。
<Example 2> (A)
A sample was formed in the same manner as in Example 1 except that the firing time in Example 1 was 200 hours, and an energization test and the number of Cr scattering were measured. The results are shown in Table 1.

<比較例3>(D)
実施例1における焼成温度を800℃に変更した以外は実施例1と同様にサンプルを形成し、通電試験を行った。その結果を表1に示す。
<Comparative Example 3> (D)
A sample was formed in the same manner as in Example 1 except that the firing temperature in Example 1 was changed to 800 ° C., and an energization test was performed. The results are shown in Table 1.

<実施例4〜7>(C)
実施例1における焼成温度と焼成時間を種々変更した以外は実施例1と同様にサンプルを形成し、通電試験を行った。その結果を表1に示す。
<Examples 4 to 7> (C)
A sample was formed in the same manner as in Example 1 except that the firing temperature and firing time in Example 1 were variously changed, and an energization test was performed. The results are shown in Table 1.

<実施例8>(E)
前記金属酸化物としてCo1.5Mn1.54を用い、アニオン電着塗装により前記基材上に塗膜を形成し、1050℃で5時間焼成して保護膜12のサンプルを作成し、実施例1と同様の試験を行った。その結果を表1に示す。
<Example 8> (E)
Using Co 1.5 Mn 1.5 O 4 as the metal oxide, a coating film was formed on the base material by anionic electrodeposition coating, and baked at 1050 ° C. for 5 hours to prepare a sample of the protective film 12, Example 1 The same test was conducted. The results are shown in Table 1.

<比較例9>(F)
前記金属酸化物としてCo1.5Mn1.54を用い、アニオン電着塗装により前記基材上に塗膜を形成し、1000℃で2時間焼成して保護膜12のサンプルを作成し、実施例1と同様の試験を行った。その結果を表1に示す。
<Comparative Example 9> (F)
Using Co 1.5 Mn 1.5 O 4 as the metal oxide, a coating film was formed on the substrate by anionic electrodeposition coating, and the sample was formed by baking at 1000 ° C. for 2 hours to prepare a sample of the protective film 12. The same test was conducted. The results are shown in Table 1.

Figure 2014191928
Figure 2014191928

<結果>
(焼成時間について)
実施例2では、焼成時間が十分長く、基材に含まれるMnが塗膜成分と十分に反応していると考えられ、塗膜がすべて緻密層となっており、その厚みが7μmであった。
また、初期の電圧降下は、55mV程度で200hr後の電圧降下増加量(劣化量)は3mV以下であり、実施例1と同等の性能を示すとともに、Cr飛散量が330(カウント)となっており、緻密層の膜厚が増加すると、さらに高いCr飛散抑制効果を発揮することがわかった。
<Result>
(About firing time)
In Example 2, it was considered that the firing time was sufficiently long, and Mn contained in the base material was sufficiently reacted with the coating film components, and the coating film was all a dense layer, and the thickness thereof was 7 μm. .
The initial voltage drop is about 55 mV, and the voltage drop increase (deterioration amount) after 200 hours is 3 mV or less, showing the same performance as in Example 1, and the Cr scattering amount being 330 (count). Thus, it was found that when the thickness of the dense layer is increased, a higher Cr scattering suppression effect is exhibited.

(緻密層の組成について)
また、実施例2において、緻密層の組成をEDX分析により調べたところ、Zn:Co:Mn=0.77:1.0:1.64(モル比)であった。なお、初期のモル比は1:1:1であるため、量が増えているMnは外部由来であることがわかる。
なお、実施例5,7において多孔層の組成を調べたところ、多孔層の組成はあまり変化しておらず(若干の変化は、組成のばらつき、あるいはZn、Co成分の飛散により相対的に他の成分量が増えたことによると予想される)、このMnが基材由来であることを示している。
(About the composition of the dense layer)
In Example 2, the composition of the dense layer was examined by EDX analysis and found to be Zn: Co: Mn = 0.77: 1.0: 1.64 (molar ratio). In addition, since the initial molar ratio is 1: 1: 1, it turns out that Mn which the quantity increases is derived from the outside.
In addition, when the composition of the porous layer was examined in Examples 5 and 7, the composition of the porous layer was not changed so much (the slight change is relatively different due to the dispersion of the composition or the scattering of the Zn and Co components). This is expected to be due to an increase in the amount of the component of), indicating that this Mn is derived from the base material.

(焼成温度について)
また、比較例3では焼成温度が低かったため、前記基材に含まれるMnが前記塗膜成分と反応する条件となっていなかったと考えられ、緻密層は観測できなかった。
また、このようにして得られた保護膜は、多孔層のみからなるため、通電試験において、初期の電圧降下は、55〜60mV程度で2500hr後の電圧降下増加量(劣化量)は5mV(評価区間1250hr〜2500hr)となっており、900℃、1310hrの評価値に換算すると41mV程度の電圧低下に相当すると考えられ、実施例4〜7に比べて長期耐久性が低くなっているものと考えられる。
(About firing temperature)
In Comparative Example 3, since the firing temperature was low, it was considered that Mn contained in the base material was not in a condition for reacting with the coating film component, and a dense layer could not be observed.
In addition, since the protective film thus obtained is composed of only a porous layer, in the energization test, the initial voltage drop is about 55 to 60 mV, and the voltage drop increase (deterioration amount) after 2500 hours is 5 mV (evaluation) It is considered that it corresponds to a voltage drop of about 41 mV when converted to an evaluation value of 900 ° C. and 1310 hr, and the long-term durability is considered to be lower than that of Examples 4 to 7. It is done.

(焼成工程について)
また、実施例1、5,7および比較例3を比較すると、焼成温度が高いほど、緻密層の厚さは増え、焼成工程を高温で行うほど緻密層が速く形成されることがわかり、基材に含まれるMnが前記塗膜成分と反応する条件は、1000℃以上でよいことがわかる。
また、実施例1、2、4を比較すると、焼成時間は2時間以上とすることにより、1μm以上の緻密層が得られ、十分なCr飛散防止効果が発揮されていることがわかる。
(About the firing process)
Further, comparing Examples 1, 5, 7 and Comparative Example 3, it can be seen that the higher the firing temperature, the thicker the dense layer, and the higher the firing process, the faster the dense layer is formed. It can be seen that the condition under which Mn contained in the material reacts with the coating film component may be 1000 ° C. or higher.
Further, when Examples 1, 2, and 4 are compared, it can be seen that a dense layer of 1 μm or more is obtained by setting the firing time to 2 hours or more, and a sufficient Cr scattering prevention effect is exhibited.

(塗膜組成について)
実施例1、比較例9を比較すると、塗膜の組成の違いにより緻密層厚さが1μm以上となる焼成条件が異なることがわかる。また、実施例8、比較例9を比較すると、塗膜の組成が異なっても、Co、Zn、Mnから選ばれる少なくとも一種の金属酸化物を含む保護膜を形成し、膜厚を1μm以上とすれば、長期使用による電圧低下が低く抑制されることがわかり、長期耐久性を向上できることがわかる。
(About coating composition)
Comparing Example 1 and Comparative Example 9, it can be seen that the firing conditions for the dense layer thickness to be 1 μm or more differ depending on the composition of the coating film. Moreover, when Example 8 and Comparative Example 9 are compared, even if the composition of the coating film is different, a protective film containing at least one metal oxide selected from Co, Zn, and Mn is formed, and the film thickness is 1 μm or more. As a result, it can be seen that voltage drop due to long-term use is suppressed to a low level, and long-term durability can be improved.

したがって、主に固体酸化物形燃料電池用セルに用いられるセル間接続部材をきわめて耐久性高く設けることができるので、長期使用によっても安定に動作しうるSOFCを提供することができる。
1 :セル接続部材
2 :溝
2a :空気流路
2b :燃料流路
3 :単セル
11 :基材
11a :Cr23
12 :保護膜
12a :緻密層
15 :接着層
30 :電解質膜
31 :空気極
32 :燃料極
C :SOFC用セル
Therefore, since the inter-cell connection member mainly used for the solid oxide fuel cell can be provided with extremely high durability, it is possible to provide an SOFC that can operate stably even after long-term use.
1: Cell connection member 2: Groove 2a: Air flow path 2b: Fuel flow path 3: Single cell 11: Base material 11a: Cr 2 O 3 layer 12: Protective film 12a: Dense layer 15: Adhesive layer 30: Electrolyte film 31 : Air electrode 32: Fuel electrode C: Cell for SOFC

Claims (8)

CrおよびMnを含有する合金または酸化物からなる基材に、金属酸化物からなる保護膜を形成するセル間接続部材の製造方法であって、
前記基材上に、金属酸化物微粒子を主成分として含有する未焼結の塗膜を形成する塗膜形成工程を行い、前記基材に含まれるMnが塗膜成分と反応する条件下で、前記塗膜を焼成する焼成工程を行い、前記塗膜内に前記塗膜成分とMnとが反応して生じるMn含有緻密層を、前記基材表面に形成されるCr23層と密着形成させ、前記Mn含有緻密層の厚さを1μm以上に成長させるセル間接続部材の製造方法。
A method for producing an inter-cell connecting member, wherein a protective film made of a metal oxide is formed on a base material made of an alloy or oxide containing Cr and Mn,
On the base material, a coating film forming step for forming an unsintered coating film containing metal oxide fine particles as a main component is performed, and under the condition that Mn contained in the base material reacts with the coating film component, A firing step of firing the coating film is performed, and a Mn-containing dense layer formed by the reaction between the coating film component and Mn in the coating film is formed in close contact with the Cr 2 O 3 layer formed on the substrate surface. And a method for producing an inter-cell connection member, wherein the thickness of the Mn-containing dense layer is grown to 1 μm or more.
前記保護膜がCo、Zn、Mnから選ばれる少なくとも一種の金属酸化物を含む請求項1に記載のセル間接続部材の製造方法。   The method for manufacturing an inter-cell connection member according to claim 1, wherein the protective film contains at least one metal oxide selected from Co, Zn, and Mn. 前記保護膜が、Znx(CoyMn(1-y)(3-x)4(0<x<1、0<y×(3−x)≦2)を含み、前記焼成工程において、前記塗膜を1000℃以上1100度以下で、2時間以上焼成する請求項2に記載のセル間接続部材の製造方法。 In the firing step, the protective film includes Zn x (Co y Mn (1-y) ) (3-x) O 4 (0 <x <1, 0 <y × (3-x) ≦ 2). The method for producing an inter-cell connection member according to claim 2, wherein the coating film is baked at 1000 ° C. to 1100 ° C. for 2 hours or more. 前記保護膜が、Co1.5Mn1.54を含み、前記焼成工程において、前記塗膜を1050℃以上1100℃以下で焼成する請求項2に記載のセル間接続部材の製造方法。 The method for producing an inter-cell connection member according to claim 2, wherein the protective film contains Co 1.5 Mn 1.5 O 4 , and the coating film is baked at 1050 ° C. or higher and 1100 ° C. or lower in the baking step. 前記基材上に形成される塗膜がアニオン電着塗装法により形成されたものである請求項1〜4のいずれか1項に記載のセル間接続部材の製造方法。   The method for producing an inter-cell connecting member according to any one of claims 1 to 4, wherein the coating film formed on the substrate is formed by an anionic electrodeposition coating method. 請求項1〜5のいずれか1項に記載のセル間接続部材の製造方法により製造されたセル間接続部材。   The inter-cell connection member manufactured by the manufacturing method of the inter-cell connection member according to claim 1. 前記基材がMnを含むフェライト系ステンレス鋼である請求項6に記載のセル間接続部材。   The inter-cell connection member according to claim 6, wherein the base material is ferritic stainless steel containing Mn. 請求項6または7に記載のセル間接続部材を空気極と接合してなる固体酸化物形燃料電池用セル。   A cell for a solid oxide fuel cell obtained by joining the inter-cell connecting member according to claim 6 or 7 to an air electrode.
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