JP2014036985A - Solder composition and printed wiring board using the same - Google Patents
Solder composition and printed wiring board using the same Download PDFInfo
- Publication number
- JP2014036985A JP2014036985A JP2012180633A JP2012180633A JP2014036985A JP 2014036985 A JP2014036985 A JP 2014036985A JP 2012180633 A JP2012180633 A JP 2012180633A JP 2012180633 A JP2012180633 A JP 2012180633A JP 2014036985 A JP2014036985 A JP 2014036985A
- Authority
- JP
- Japan
- Prior art keywords
- amide
- mass
- acid
- fine particles
- diamine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910000679 solder Inorganic materials 0.000 title claims abstract description 67
- 239000000203 mixture Substances 0.000 title claims abstract description 43
- -1 amide compound Chemical class 0.000 claims abstract description 39
- 239000010419 fine particle Substances 0.000 claims abstract description 37
- 150000001408 amides Chemical class 0.000 claims abstract description 33
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 claims abstract description 28
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 claims abstract description 28
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000011347 resin Substances 0.000 claims abstract description 20
- 229920005989 resin Polymers 0.000 claims abstract description 20
- 239000002904 solvent Substances 0.000 claims abstract description 20
- 239000000843 powder Substances 0.000 claims abstract description 17
- 150000004985 diamines Chemical class 0.000 claims abstract description 16
- 229920000642 polymer Polymers 0.000 claims abstract description 13
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 12
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 claims abstract description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 7
- 239000000539 dimer Substances 0.000 claims abstract description 7
- 150000001735 carboxylic acids Chemical class 0.000 claims abstract 2
- 239000012190 activator Substances 0.000 claims description 13
- 238000007665 sagging Methods 0.000 abstract description 15
- 150000001875 compounds Chemical class 0.000 abstract description 8
- 150000001412 amines Chemical class 0.000 abstract description 6
- 238000009833 condensation Methods 0.000 abstract description 5
- 230000005494 condensation Effects 0.000 abstract description 5
- 239000004094 surface-active agent Substances 0.000 abstract description 2
- 230000004907 flux Effects 0.000 description 12
- 239000006185 dispersion Substances 0.000 description 10
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 235000014113 dietary fatty acids Nutrition 0.000 description 7
- 239000000194 fatty acid Substances 0.000 description 7
- 229930195729 fatty acid Natural products 0.000 description 7
- 150000004665 fatty acids Chemical class 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 239000013008 thixotropic agent Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 239000001993 wax Substances 0.000 description 6
- 239000004202 carbamide Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 238000006482 condensation reaction Methods 0.000 description 5
- 150000007524 organic acids Chemical class 0.000 description 5
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 239000004359 castor oil Substances 0.000 description 4
- 235000019438 castor oil Nutrition 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000018044 dehydration Effects 0.000 description 4
- 238000006297 dehydration reaction Methods 0.000 description 4
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 4
- 235000005985 organic acids Nutrition 0.000 description 4
- ULQISTXYYBZJSJ-UHFFFAOYSA-N 12-hydroxyoctadecanoic acid Chemical compound CCCCCCC(O)CCCCCCCCCCC(O)=O ULQISTXYYBZJSJ-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 150000002896 organic halogen compounds Chemical class 0.000 description 3
- WQEPLUUGTLDZJY-UHFFFAOYSA-N pentadecanoic acid Chemical compound CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 2
- WCOXQTXVACYMLM-UHFFFAOYSA-N 2,3-bis(12-hydroxyoctadecanoyloxy)propyl 12-hydroxyoctadecanoate Chemical compound CCCCCCC(O)CCCCCCCCCCC(=O)OCC(OC(=O)CCCCCCCCCCC(O)CCCCCC)COC(=O)CCCCCCCCCCC(O)CCCCCC WCOXQTXVACYMLM-UHFFFAOYSA-N 0.000 description 2
- QKKSKKMOIOGASY-UHFFFAOYSA-N 2,3-dibromobut-1-ene-1,1-diol Chemical compound CC(Br)C(Br)=C(O)O QKKSKKMOIOGASY-UHFFFAOYSA-N 0.000 description 2
- KIHBGTRZFAVZRV-UHFFFAOYSA-N 2-Hydroxyoctadecanoic acid Natural products CCCCCCCCCCCCCCCCC(O)C(O)=O KIHBGTRZFAVZRV-UHFFFAOYSA-N 0.000 description 2
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 2
- ZEYHEAKUIGZSGI-UHFFFAOYSA-N 4-methoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C=C1 ZEYHEAKUIGZSGI-UHFFFAOYSA-N 0.000 description 2
- JOOXCMJARBKPKM-UHFFFAOYSA-N 4-oxopentanoic acid Chemical compound CC(=O)CCC(O)=O JOOXCMJARBKPKM-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- KEMQGTRYUADPNZ-UHFFFAOYSA-N heptadecanoic acid Chemical compound CCCCCCCCCCCCCCCCC(O)=O KEMQGTRYUADPNZ-UHFFFAOYSA-N 0.000 description 2
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- VKOBVWXKNCXXDE-UHFFFAOYSA-N icosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCC(O)=O VKOBVWXKNCXXDE-UHFFFAOYSA-N 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- 239000010954 inorganic particle Substances 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000002762 monocarboxylic acid derivatives Chemical class 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical compound OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- TYFQFVWCELRYAO-UHFFFAOYSA-N suberic acid Chemical compound OC(=O)CCCCCCC(O)=O TYFQFVWCELRYAO-UHFFFAOYSA-N 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- BEOUGZFCUMNGOU-UHFFFAOYSA-N tuberculostearic acid Chemical compound CCCCCCCCC(C)CCCCCCCCC(O)=O BEOUGZFCUMNGOU-UHFFFAOYSA-N 0.000 description 2
- 150000003672 ureas Chemical class 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- LNAZSHAWQACDHT-XIYTZBAFSA-N (2r,3r,4s,5r,6s)-4,5-dimethoxy-2-(methoxymethyl)-3-[(2s,3r,4s,5r,6r)-3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6r)-4,5,6-trimethoxy-2-(methoxymethyl)oxan-3-yl]oxyoxane Chemical compound CO[C@@H]1[C@@H](OC)[C@H](OC)[C@@H](COC)O[C@H]1O[C@H]1[C@H](OC)[C@@H](OC)[C@H](O[C@H]2[C@@H]([C@@H](OC)[C@H](OC)O[C@@H]2COC)OC)O[C@@H]1COC LNAZSHAWQACDHT-XIYTZBAFSA-N 0.000 description 1
- AOZVWUCYHOWWPH-UHFFFAOYSA-N 1,3-dioctadecylurea Chemical compound CCCCCCCCCCCCCCCCCCNC(=O)NCCCCCCCCCCCCCCCCCC AOZVWUCYHOWWPH-UHFFFAOYSA-N 0.000 description 1
- DJQAMASGWPHRSZ-UHFFFAOYSA-N 1-butyl-3-octadecylurea Chemical compound CCCCCCCCCCCCCCCCCCNC(=O)NCCCC DJQAMASGWPHRSZ-UHFFFAOYSA-N 0.000 description 1
- HXQHRUJXQJEGER-UHFFFAOYSA-N 1-methylbenzotriazole Chemical compound C1=CC=C2N(C)N=NC2=C1 HXQHRUJXQJEGER-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- GRYVQVCQOKBITE-UHFFFAOYSA-N 1-octadecyl-3-phenylurea Chemical compound CCCCCCCCCCCCCCCCCCNC(=O)NC1=CC=CC=C1 GRYVQVCQOKBITE-UHFFFAOYSA-N 0.000 description 1
- FYGFTTWEWBXNMP-UHFFFAOYSA-N 10-amino-10-oxodecanoic acid Chemical compound NC(=O)CCCCCCCCC(O)=O FYGFTTWEWBXNMP-UHFFFAOYSA-N 0.000 description 1
- 229940114072 12-hydroxystearic acid Drugs 0.000 description 1
- XHSVWKJCURCWFU-UHFFFAOYSA-N 19-[3-(19-amino-19-oxononadecyl)phenyl]nonadecanamide Chemical compound NC(=O)CCCCCCCCCCCCCCCCCCC1=CC=CC(CCCCCCCCCCCCCCCCCCC(N)=O)=C1 XHSVWKJCURCWFU-UHFFFAOYSA-N 0.000 description 1
- DKNLMUCCEFHGNE-UHFFFAOYSA-N 2,2-dihydroxy-3-methylideneoctadecanamide Chemical compound CCCCCCCCCCCCCCCC(=C)C(O)(O)C(N)=O DKNLMUCCEFHGNE-UHFFFAOYSA-N 0.000 description 1
- VESQWGARFWAICR-UHFFFAOYSA-N 2,2-dihydroxyoctadecanamide;ethene Chemical compound C=C.CCCCCCCCCCCCCCCCC(O)(O)C(N)=O VESQWGARFWAICR-UHFFFAOYSA-N 0.000 description 1
- FJWGRXKOBIVTFA-UHFFFAOYSA-N 2,3-dibromobutanedioic acid Chemical compound OC(=O)C(Br)C(Br)C(O)=O FJWGRXKOBIVTFA-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- GZMAAYIALGURDQ-UHFFFAOYSA-N 2-(2-hexoxyethoxy)ethanol Chemical compound CCCCCCOCCOCCO GZMAAYIALGURDQ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- OADIZUFHUPTFAG-UHFFFAOYSA-N 2-[2-(2-ethylhexoxy)ethoxy]ethanol Chemical compound CCCCC(CC)COCCOCCO OADIZUFHUPTFAG-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- VOIZNVUXCQLQHS-UHFFFAOYSA-N 3-bromobenzoic acid Chemical compound OC(=O)C1=CC=CC(Br)=C1 VOIZNVUXCQLQHS-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- AZXKGUVDIORSED-UHFFFAOYSA-N 4-bromophthalic acid Chemical compound OC(=O)C1=CC=C(Br)C=C1C(O)=O AZXKGUVDIORSED-UHFFFAOYSA-N 0.000 description 1
- FQIUCPGDKPXSLL-UHFFFAOYSA-N 5-bromopyridine-3-carboxylic acid Chemical compound OC(=O)C1=CN=CC(Br)=C1 FQIUCPGDKPXSLL-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 235000021357 Behenic acid Nutrition 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- RCTOADMVZRXKRX-UHFFFAOYSA-N C(CCCCCCCCCCC)NC(NCCCCCCCCCCCC)=O.C1(=CC=CC=C1)CC1=CC=CC=C1 Chemical compound C(CCCCCCCCCCC)NC(NCCCCCCCCCCCC)=O.C1(=CC=CC=C1)CC1=CC=CC=C1 RCTOADMVZRXKRX-UHFFFAOYSA-N 0.000 description 1
- OFCXCNYMFXFXRW-UHFFFAOYSA-N C(CCCCCCCCCCCCCCCCC)NC(=O)NCCCCCCCCCCCCCCCCCC.C1(=CC=CC=C1)CC1=CC=CC=C1 Chemical compound C(CCCCCCCCCCCCCCCCC)NC(=O)NCCCCCCCCCCCCCCCCCC.C1(=CC=CC=C1)CC1=CC=CC=C1 OFCXCNYMFXFXRW-UHFFFAOYSA-N 0.000 description 1
- 239000005632 Capric acid (CAS 334-48-5) Substances 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- QEVGZEDELICMKH-UHFFFAOYSA-N Diglycolic acid Chemical compound OC(=O)COCC(O)=O QEVGZEDELICMKH-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229920001479 Hydroxyethyl methyl cellulose Polymers 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- 235000021353 Lignoceric acid Nutrition 0.000 description 1
- CQXMAMUUWHYSIY-UHFFFAOYSA-N Lignoceric acid Natural products CCCCCCCCCCCCCCCCCCCCCCCC(=O)OCCC1=CC=C(O)C=C1 CQXMAMUUWHYSIY-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 229940114077 acrylic acid Drugs 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 235000013871 bee wax Nutrition 0.000 description 1
- 239000012166 beeswax Substances 0.000 description 1
- 229940116226 behenic acid Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 229960004365 benzoic acid Drugs 0.000 description 1
- MXJIHEXYGRXHGP-UHFFFAOYSA-N benzotriazol-1-ylmethanol Chemical compound C1=CC=C2N(CO)N=NC2=C1 MXJIHEXYGRXHGP-UHFFFAOYSA-N 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- GKAWAQNIMXHVNI-UHFFFAOYSA-N decanamide;ethene Chemical compound C=C.CCCCCCCCCC(N)=O.CCCCCCCCCC(N)=O GKAWAQNIMXHVNI-UHFFFAOYSA-N 0.000 description 1
- 150000001470 diamides Chemical class 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- VJJBJJBTUXPNEO-UHFFFAOYSA-N docosanamide;ethene Chemical compound C=C.CCCCCCCCCCCCCCCCCCCCCC(N)=O.CCCCCCCCCCCCCCCCCCCCCC(N)=O VJJBJJBTUXPNEO-UHFFFAOYSA-N 0.000 description 1
- GFQOFGWPGYRLAO-UHFFFAOYSA-N dodecanamide;ethene Chemical compound C=C.CCCCCCCCCCCC(N)=O.CCCCCCCCCCCC(N)=O GFQOFGWPGYRLAO-UHFFFAOYSA-N 0.000 description 1
- LJZKUDYOSCNJPU-UHFFFAOYSA-N dotetracontanediamide Chemical compound NC(=O)CCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCC(N)=O LJZKUDYOSCNJPU-UHFFFAOYSA-N 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- ZJOLCKGSXLIVAA-UHFFFAOYSA-N ethene;octadecanamide Chemical compound C=C.CCCCCCCCCCCCCCCCCC(N)=O.CCCCCCCCCCCCCCCCCC(N)=O ZJOLCKGSXLIVAA-UHFFFAOYSA-N 0.000 description 1
- TXLQIJBYHKQZME-UHFFFAOYSA-N ethene;octanamide Chemical compound C=C.CCCCCCCC(N)=O.CCCCCCCC(N)=O TXLQIJBYHKQZME-UHFFFAOYSA-N 0.000 description 1
- FARYTWBWLZAXNK-WAYWQWQTSA-N ethyl (z)-3-(methylamino)but-2-enoate Chemical compound CCOC(=O)\C=C(\C)NC FARYTWBWLZAXNK-WAYWQWQTSA-N 0.000 description 1
- 235000010944 ethyl methyl cellulose Nutrition 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229940051250 hexylene glycol Drugs 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229960000448 lactic acid Drugs 0.000 description 1
- 229940040102 levulinic acid Drugs 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- 239000001923 methylcellulose Substances 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 229920003087 methylethyl cellulose Polymers 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- FTQWRYSLUYAIRQ-UHFFFAOYSA-N n-[(octadecanoylamino)methyl]octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(=O)NCNC(=O)CCCCCCCCCCCCCCCCC FTQWRYSLUYAIRQ-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- LYRFLYHAGKPMFH-UHFFFAOYSA-N octadecanamide Chemical compound CCCCCCCCCCCCCCCCCC(N)=O LYRFLYHAGKPMFH-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- WOQDVIVTFCTQCE-UHFFFAOYSA-N pentacontanediamide Chemical compound NC(=O)CCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCCC(N)=O WOQDVIVTFCTQCE-UHFFFAOYSA-N 0.000 description 1
- MGDIOJPGJAGMGP-UHFFFAOYSA-N pentacosanediamide Chemical compound NC(=O)CCCCCCCCCCCCCCCCCCCCCCCC(N)=O MGDIOJPGJAGMGP-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229940081066 picolinic acid Drugs 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920001281 polyalkylene Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- PJANXHGTPQOBST-VAWYXSNFSA-N trans-stilbene Chemical group C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- UFTFJSFQGQCHQW-UHFFFAOYSA-N triformin Chemical compound O=COCC(OC=O)COC=O UFTFJSFQGQCHQW-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000003021 water soluble solvent Substances 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
- B23K35/262—Sn as the principal constituent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/24—Selection of soldering or welding materials proper
- B23K35/26—Selection of soldering or welding materials proper with the principal constituent melting at less than 400 degrees C
- B23K35/264—Bi as the principal constituent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/3612—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest with organic compounds as principal constituents
- B23K35/3613—Polymers, e.g. resins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
- B23K35/36—Selection of non-metallic compositions, e.g. coatings, fluxes; Selection of soldering or welding materials, conjoint with selection of non-metallic compositions, both selections being of interest
- B23K35/362—Selection of compositions of fluxes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/09—Carboxylic acids; Metal salts thereof; Anhydrides thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/42—Printed circuits
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Abstract
Description
本発明は、電子機器のプリント配線基板に部品を実装するはんだ組成物(いわゆるソルダーペースト)および、このはんだ組成物を用いて電子部品を実装したプリント配線基板に関する。 The present invention relates to a solder composition (so-called solder paste) for mounting a component on a printed wiring board of an electronic device, and a printed wiring board on which an electronic component is mounted using the solder composition.
ソルダーペーストは、はんだ粉末、ロジン系樹脂、活性剤、溶剤などを混練してペースト状にした混合物である。このソルダーペーストでは、印刷性やはんだ付性とともに、リフロー工程でのプリヒート時におけるダレ(プリヒート時にソルダーペーストの塗布膜の形が崩れること)を抑制する性質(ダレ性)が求められる。しかしながら、ソルダーペーストのダレ性を向上させるために、ソルダーペーストの粘度やチクソ性を高くすると、ソルダーペーストの印刷性が低下してしまう傾向にある。このように、印刷性とダレ性とは二律背反の関係にあり、これらを両立させることは困難である。 The solder paste is a mixture obtained by kneading solder powder, rosin resin, activator, solvent and the like into a paste. This solder paste is required to have printability and solderability, as well as a property (sagging property) that suppresses sagging during preheating in the reflow process (the shape of the coating film of the solder paste collapses during preheating). However, if the viscosity or thixotropy of the solder paste is increased in order to improve the sag of the solder paste, the printability of the solder paste tends to be lowered. Thus, printability and sag are in a trade-off relationship, and it is difficult to achieve both.
そこで、例えば、所定のブロックポリマーを含有するソルダーペーストが提案されている(特許文献1)。しかしながら、近年のはんだ粉末の鉛フリー化に伴い、プリヒート温度が上昇する傾向にあるため、ダレが発生しやすくなる。また、電子部品の小型化に伴い、端子同士の間隔が狭くなるため、ダレの更なる抑制が求められる。そのため、プリヒート時におけるダレ性の更なる向上が求められている。 Therefore, for example, a solder paste containing a predetermined block polymer has been proposed (Patent Document 1). However, since the preheating temperature tends to increase with the recent lead-free solder powder, sagging tends to occur. Moreover, since the space | interval of terminals becomes narrow with the miniaturization of an electronic component, the further suppression of sagging is calculated | required. Therefore, further improvement of sagging property at the time of preheating is required.
本発明は、印刷性を維持しつつ、プリヒート時におけるダレを十分に抑制できるはんだ組成物、並びにこのはんだ組成物を用いたプリント配線基板を提供することを目的とする。 An object of this invention is to provide the solder composition which can fully suppress dripping at the time of preheating, and a printed wiring board using this solder composition, maintaining printability.
本発明者らは、上記目的を達成すべく鋭意研究を重ねた結果、次の知見を見出した。すなわち、はんだ組成物のチクソ性を調整できる成分(いわゆるチクソ剤)は数多あるが、このように数多あるチクソ剤の中でも、特定の低分子量アミド化合物と特定の高分子量アミド化合物とを含有するアミド系縮合体微粒子を用いた場合には、驚くべきことに、印刷性を維持しつつ、プリヒート時におけるダレを十分に抑制できることがあることを見出し、本発明を完成するに至った。 As a result of intensive studies to achieve the above object, the present inventors have found the following knowledge. That is, there are many components (so-called thixotropic agents) that can adjust the thixotropy of the solder composition, and among such many thixotropic agents, a specific low molecular weight amide compound and a specific high molecular weight amide compound are contained. Surprisingly, when the amide-based condensate fine particles to be used are used, it has been surprisingly found that droop during preheating can be sufficiently suppressed while maintaining printability, and the present invention has been completed.
すなわち、本発明のはんだ組成物は、ロジン系樹脂と、アミド系縮合体微粒子と、溶剤と、活性剤と、アミン系化合物と、はんだ粉末とを含有し、前記アミド系縮合体微粒子は、ヒドロキシ脂肪族モノカルボン酸を含む炭素数2〜22の脂肪族カルボン酸、および炭素数2〜16のジアミンとダイマージアミンとの何れかのジアミンを縮合させた低分子量アミド化合物と、同種の該カルボン酸、同種の該ジアミンおよび重量平均分子量2000〜100000のカルボキシル基含有ポリマーを縮合させた高分子量アミド化合物とを含有する微粒子であり、前記アミド系縮合体微粒子の含有量は、前記ロジン系樹脂100質量部に対して、1.1質量部以上2.7質量部以下であることを特徴とするものである。 That is, the solder composition of the present invention contains a rosin resin, amide-based condensate fine particles, a solvent, an activator, an amine-based compound, and a solder powder. A C2-C22 aliphatic carboxylic acid containing an aliphatic monocarboxylic acid, a low-molecular weight amide compound obtained by condensing any diamine of C2-C16 diamine and dimer diamine, and the same carboxylic acid And a high molecular weight amide compound obtained by condensing the same kind of the diamine and a carboxyl group-containing polymer having a weight average molecular weight of 2000 to 100000, and the content of the amide-based condensate fine particles is 100 masses of the rosin-based resin. 1.1 parts by mass or more and 2.7 parts by mass or less with respect to parts.
本発明のプリント配線基板は、前記はんだ組成物を用いて電子部品をプリント配線基板に実装したことを特徴とするものである。 The printed wiring board of the present invention is characterized in that an electronic component is mounted on a printed wiring board using the solder composition.
本発明によれば、印刷性を維持しつつ、プリヒート時におけるダレを十分に抑制できるはんだ組成物、並びにこのはんだ組成物を用いたプリント配線基板を提供することが可能となる。 ADVANTAGE OF THE INVENTION According to this invention, it becomes possible to provide the solder composition which can fully suppress dripping at the time of preheating, and the printed wiring board using this solder composition, maintaining printability.
本発明のはんだ組成物は、以下説明するはんだ粉末と、以下説明するフラックスとを含有するものである。
本発明に用いるはんだ粉末は、無鉛のはんだ粉末であることが好ましいが、有鉛のはんだ粉末であってもよい。このはんだ粉末におけるはんだ合金としては、スズまたはビスマスを主成分とする合金が好ましい。また、この合金の第二元素としては、銀、銅、亜鉛、ビスマス、スズ、鉛などが挙げられる。さらに、この合金には、必要に応じて他の元素(第三元素以降)を添加してもよい。他の元素としては、銅、銀、ニッケル、コバルト、鉄、アンチモン、チタン、リン、ゲルマニウムなどが挙げられる。
このはんだ粉末の含有量は、はんだ組成物100質量%に対して、85質量%以上92質量%以下であることが好ましい。はんだ粉末の含有量が85質量%未満の場合(フラックスの含有量が15質量%を超える場合)には、得られるはんだ組成物を用いた場合に、十分なはんだ接合を形成できにくくなる傾向にあり、他方、はんだ粉末の含有量が92質量%を超える場合(フラックスの含有量が8質量%未満の場合)には、バインダーとしてのフラックスが足りないため、フラックスとはんだ粉末とを混合しにくくなる傾向にある。
The solder composition of this invention contains the solder powder demonstrated below and the flux demonstrated below.
The solder powder used in the present invention is preferably a lead-free solder powder, but may be a leaded solder powder. As the solder alloy in the solder powder, an alloy containing tin or bismuth as a main component is preferable. In addition, examples of the second element of the alloy include silver, copper, zinc, bismuth, tin, and lead. Furthermore, you may add another element (after 3rd element) to this alloy as needed. Examples of other elements include copper, silver, nickel, cobalt, iron, antimony, titanium, phosphorus, and germanium.
The content of the solder powder is preferably 85% by mass or more and 92% by mass or less with respect to 100% by mass of the solder composition. When the content of the solder powder is less than 85% by mass (when the content of the flux exceeds 15% by mass), when the obtained solder composition is used, it tends to be difficult to form a sufficient solder joint. On the other hand, when the content of the solder powder exceeds 92% by mass (when the content of the flux is less than 8% by mass), the flux as the binder is insufficient and it is difficult to mix the flux and the solder powder. Tend to be.
また、前記はんだ粉末の平均粒子径は、1μm以上40μm以下であることが好ましく、10μm以上35μm以下であることがより好ましく、15μm以上25μm以下であることが特に好ましい。平均粒子径が上記範囲内であれば、はんだ付ランドのピッチの狭くなってきている最近のプリント回路基板にも対応できる。なお、平均粒子径は、動的光散乱式の粒子径測定装置により測定できる。 The average particle size of the solder powder is preferably 1 μm or more and 40 μm or less, more preferably 10 μm or more and 35 μm or less, and particularly preferably 15 μm or more and 25 μm or less. If the average particle diameter is within the above range, it is possible to cope with recent printed circuit boards in which the pitch of the solder lands is narrow. The average particle size can be measured with a dynamic light scattering type particle size measuring device.
本発明に用いるフラックスは、ロジン系樹脂と、アミド系縮合体微粒子と、溶剤と、活性剤と、アミン系化合物とを含有するものである。
本発明に用いるロジン系樹脂としては、ロジンおよびロジン誘導体が挙げられる。ロジン誘導体としては、変性ロジン、重合ロジン、水添ロジンなどが挙げられる。これらのロジン系樹脂の中でも、活性作用の観点から、水添ロジンが好ましい。これらのロジン系樹脂は1種を単独で用いてもよく、2種以上を混合して用いてもよい。
The flux used in the present invention contains a rosin resin, amide condensate fine particles, a solvent, an activator, and an amine compound.
Examples of the rosin resin used in the present invention include rosin and rosin derivatives. Examples of the rosin derivative include modified rosin, polymerized rosin, and hydrogenated rosin. Among these rosin-based resins, hydrogenated rosin is preferable from the viewpoint of activity. These rosin resins may be used alone or in combination of two or more.
本発明に用いるアミド系縮合体微粒子は、ヒドロキシ脂肪族モノカルボン酸を含む炭素数2〜22の脂肪族カルボン酸、および炭素数2〜16のジアミンとダイマージアミンとの何れかのジアミンを縮合させた低分子量アミド化合物と、同種の該カルボン酸、同種の該ジアミンおよび重量平均分子量2000〜100000のカルボキシル基含有ポリマーを縮合させた高分子量アミド化合物とを含有する微粒子である。
前記アミド系縮合体微粒子は、質量比で、前記低分子量アミド化合物:前記高分子量アミド化合物の99〜50:1〜50を含有することが好ましい。
前記アミド系縮合体微粒子においては、前記脂肪族カルボン酸が、炭素数2〜12の脂肪族ジカルボン酸、または同種の該脂肪族ジカルボン酸とダイマー酸とを含んでいることが好ましい。
前記アミド系縮合体微粒子においては、前記ヒドロキシ脂肪族モノカルボン酸が、水素添加したひまし油の加水分解物であることが好ましい。
前記アミド系縮合体微粒子においては、前記カルボキシル基含有ポリマーが、ポリアルキレンを酸化した化合物と、カルボキシル基含有化合物モノマーを共存させつつ、共重合モノマーに共重合され、または重縮合モノマーに重縮合された化合物とから選ばれる酸化ポリアルキレンであることが好ましい。
The amide-based condensate fine particles used in the present invention are obtained by condensing an aliphatic carboxylic acid having 2 to 22 carbon atoms including a hydroxyaliphatic monocarboxylic acid, and any one of diamines having 2 to 16 carbon atoms and dimer diamine. And a high molecular weight amide compound obtained by condensing the same kind of the carboxylic acid, the same kind of the diamine, and a carboxyl group-containing polymer having a weight average molecular weight of 2000 to 100,000.
The amide-based condensate fine particles preferably contain 99 to 50: 1 to 50 of the low molecular weight amide compound: the high molecular weight amide compound in a mass ratio.
In the amide-based condensate fine particles, the aliphatic carboxylic acid preferably contains an aliphatic dicarboxylic acid having 2 to 12 carbon atoms, or the same kind of aliphatic dicarboxylic acid and dimer acid.
In the amide-based condensate fine particles, the hydroxy aliphatic monocarboxylic acid is preferably a hydrogenated castor oil hydrolyzate.
In the amide-based condensate fine particles, the carboxyl group-containing polymer is copolymerized with a copolymerization monomer or polycondensed with a polycondensation monomer in the presence of a compound obtained by oxidizing polyalkylene and a carboxyl group-containing compound monomer. A polyalkylene oxide selected from the above compounds is preferred.
前記アミド系縮合体微粒子は、分散液の形態として用いることが好ましい。また、アミド系縮合体微粒子の分散液は、例えば、以下のようにして作製することができる。
まず、脂肪族カルボン酸の1モル当量と、脂肪族ジアミンの0.5モル当量とを、無溶媒で、常圧または真空下で、160〜230℃に加熱しながら、2〜10時間、脱水縮合反応させる。すると、脂肪族カルボン酸と脂肪族ジアミンとが縮合し、酸価およびアミン価が20以下であり、淡黄色〜淡褐色の固体で、その融点が100〜160℃であって熱溶融している低分子量アミド化合物となる。それに対して少なくとも1質量%、好ましくは1〜50質量%、一層好ましくは1〜10質量%のカルボキシル基含有ポリマーを加え、さらに1〜5時間、脱水縮合反応させる。すると、その低分子量アミド化合物のうちの一部が、それの未反応のアミノ基と、カルボキシル基含有ポリマーのカルボキシル基との脱水縮合反応により、高分子量アミド化合物となる。その結果、高分子量アミド化合物と低分子量アミド化合物とを含有し、酸価が30以下、好ましくは5〜20で、アミン価が20以下好ましくは7以下であるワックスが得られる。次いで、このワックスを粉砕機でミクロンオーダー例えば20μm以下、好ましくは10μm以下に粉砕した微粒子にする。その微粒子と、溶媒とを配合し、その微粒子を、ディスパーを用いた機械的な分散方法により、またはガラスビーズなどのメディアを利用した湿式分散機を用いた分散方法により、溶媒へ分散させつつ、温熱下、例えば溶媒に応じ40〜100℃好ましくは50〜90℃に加熱しながら、加熱条件や溶媒に応じて適切な時間をかけて、その溶媒に含浸させる。すると、微粒子が膨潤し、アミド系縮合体微粒子の分散液が得られる。
なお、脂肪族カルボン酸と、脂肪族ジアミンとを脱水縮合させた後、カルボキシル基含有ポリマーを加えてさらに脱水縮合させた例を示したが、脂肪族カルボン酸と、脂肪族ジアミンと、カルボキシル基含有ポリマーとを同時に混合して脱水縮合させてもよい。
The amide-based condensate fine particles are preferably used in the form of a dispersion. Moreover, the dispersion liquid of amide-type condensate fine particles can be produced as follows, for example.
First, 1 molar equivalent of aliphatic carboxylic acid and 0.5 molar equivalent of aliphatic diamine are heated to 160-230 ° C. without solvent at normal pressure or under vacuum for 2-10 hours. Allow condensation reaction. Then, the aliphatic carboxylic acid and the aliphatic diamine are condensed, the acid value and the amine value are 20 or less, a light yellow to light brown solid having a melting point of 100 to 160 ° C. and melted by heat. It becomes a low molecular weight amide compound. On the other hand, at least 1% by mass, preferably 1 to 50% by mass, more preferably 1 to 10% by mass of a carboxyl group-containing polymer is added, and the dehydration condensation reaction is further performed for 1 to 5 hours. Then, a part of the low molecular weight amide compound becomes a high molecular weight amide compound by a dehydration condensation reaction between the unreacted amino group and the carboxyl group of the carboxyl group-containing polymer. As a result, a wax containing a high molecular weight amide compound and a low molecular weight amide compound, having an acid value of 30 or less, preferably 5 to 20, and an amine value of 20 or less, preferably 7 or less is obtained. Next, the wax is made into fine particles pulverized to a micron order, for example, 20 μm or less, preferably 10 μm or less by a pulverizer. The fine particles and the solvent are blended, and the fine particles are dispersed in the solvent by a mechanical dispersion method using a disper or a dispersion method using a wet disperser using a medium such as glass beads. Under heating, for example, while heating to 40 to 100 ° C., preferably 50 to 90 ° C., depending on the solvent, the solvent is impregnated over an appropriate time depending on the heating conditions and the solvent. Then, the fine particles swell and a dispersion of amide-based condensate fine particles is obtained.
In addition, although the dehydration condensation of the aliphatic carboxylic acid and the aliphatic diamine was performed, and the dehydration condensation was further performed by adding the carboxyl group-containing polymer, the aliphatic carboxylic acid, the aliphatic diamine, and the carboxyl group were shown. The containing polymer may be mixed and dehydrated and condensed at the same time.
前記アミド系縮合体微粒子の含有量は、前記ロジン系樹脂100質量部に対して、1.1質量%以上2.7質量%以下であることが必要である。含有量が前記下限未満では、印刷性も不十分であり、ダレも生じやすくなり、他方、前記上限を超えると、印刷性が不十分となる。また、印刷性を維持しつつ、プリヒート時におけるダレをさらに向上させるという観点から、前記アミド系縮合体微粒子の含有量は、前記ロジン系樹脂100質量部に対して、1.4質量%以上2.5質量%以下であることが好ましく、1.7質量%以上2.3質量%以下であることがより好ましく、1.9質量%以上2.2質量%以下であることが特に好ましい。 The content of the amide-based condensate fine particles needs to be 1.1% by mass or more and 2.7% by mass or less with respect to 100 parts by mass of the rosin-based resin. When the content is less than the lower limit, the printability is insufficient and sagging easily occurs. On the other hand, when the content exceeds the upper limit, the printability becomes insufficient. Further, from the viewpoint of further improving sagging during preheating while maintaining printability, the content of the amide-based condensate fine particles is 1.4% by mass or more and 2% by mass with respect to 100 parts by mass of the rosin-based resin. It is preferably 0.5% by mass or less, more preferably 1.7% by mass or more and 2.3% by mass or less, and particularly preferably 1.9% by mass or more and 2.2% by mass or less.
本発明に用いるフラックスでは、前記アミド系縮合体微粒子と、これ以外のチクソ剤とを併用してもよい。
このようなチクソ剤としては、例えば、オレフィン系ワックス、脂肪酸アミド、置換尿素ワックス、高分子化合物、無機粒子が挙げられる。
オレフィン系ワックスとしては、カスターワックス(硬化ひまし油=水添ひまし油)、蜜ロウ、カルナウバロウなどが挙げられる。
脂肪酸アミドとしては、ステアリン酸アミド、ヒドロキシステアリン酸ビスアミド、m−キシリレンビスステアリン酸アミド、N,N’−ジステアリルイソフタル酸アミド、N,N’−ジステアリルセバシン酸アミド、N,N’−ジステアリルアジピン酸アミド、ブチレンビスヒドロキシステアリン酸アミド、ヘキサメチレンビスヒドロキシステアリン酸アミド、ヘキサメチレンビスべヘン酸アミド、ヘキサメチレンビスステアリン酸アミド、エチレンビスべヘン酸アミド、エチレンビスヒドロキシステアリン酸アミド、エチレンビスステアリン酸アミド、エチレンビスラウリン酸アミド、エチレンビスカプリン酸アミド、エチレンビスカプリル酸アミド、メチレンビスヒドロキシステアリン酸アミド、メチレンビスラウリン酸アミド、メチレンビスステアリン酸アミドなどが挙げられる。
置換尿素ワックスとしては、N−ブチル−N’−ステアリル尿素、N−フェニル−N’−ステアリル尿素、N−ステアリル−N’−ステアリル尿素、キシリレンビスステアリル尿素、トルイレンビスステアリル尿素、ヘキサメチレンビスステアリル尿素、ジフェニルメタンビスステアリル尿素、ジフェニルメタンビスラウリル尿素などが挙げられる。
高分子化合物としては、1,2−ヒドロキシステアリン酸トリグリセリド、ポリエチレングリコール、ポリエチレンオキサイド、メチルセルロース、エチルセルロース、ヒドロキシエチルセルロースなどが挙げられる。
無機粒子としては、シリカ粒子、カオリン粒子などが挙げられる。
これらのチクソ剤は1種を単独で用いてもよく、2種以上を混合して用いてもよい。
In the flux used in the present invention, the amide condensate fine particles and other thixotropic agents may be used in combination.
Examples of such thixotropic agents include olefin waxes, fatty acid amides, substituted urea waxes, polymer compounds, and inorganic particles.
Examples of the olefin wax include castor wax (hardened castor oil = hydrogenated castor oil), beeswax, and carnauba wax.
Examples of fatty acid amides include stearic acid amide, hydroxystearic acid bisamide, m-xylylene bisstearic acid amide, N, N′-distearylisophthalic acid amide, N, N′-distearyl sebacic acid amide, N, N′— Distearyl adipic acid amide, butylene bishydroxystearic acid amide, hexamethylene bishydroxystearic acid amide, hexamethylene bisbehenic acid amide, hexamethylene bisstearic acid amide, ethylene bisbehenic acid amide, ethylene bishydroxystearic acid amide, Ethylene bis stearic acid amide, ethylene bis lauric acid amide, ethylene bis capric acid amide, ethylene bis caprylic acid amide, methylene bis hydroxy stearic acid amide, methylene bis lauric acid amide, methylene Such Susutearin acid amide.
Examples of substituted urea waxes include N-butyl-N′-stearyl urea, N-phenyl-N′-stearyl urea, N-stearyl-N′-stearyl urea, xylylene bisstearyl urea, toluylene bisstearyl urea, hexamethylene Examples thereof include bisstearyl urea, diphenylmethane bisstearyl urea, and diphenylmethane bislauryl urea.
Examples of the polymer compound include 1,2-hydroxystearic acid triglyceride, polyethylene glycol, polyethylene oxide, methyl cellulose, ethyl cellulose, and hydroxyethyl cellulose.
Examples of the inorganic particles include silica particles and kaolin particles.
These thixotropic agents may be used alone or in combination of two or more.
前記チクソ剤の含有量は、前記ロジン系樹脂100質量部に対して、1質量%以上10質量%以下であることが好ましい。含有量が前記下限未満では、チクソ性が得られず、ダレが生じやすくなる傾向にあり、他方、前記上限を超えると、チクソ性が高すぎて、塗布不良となりやすい傾向にある。 The thixotropic agent content is preferably 1% by mass or more and 10% by mass or less with respect to 100 parts by mass of the rosin resin. If the content is less than the lower limit, thixotropy cannot be obtained and the sagging tends to occur. On the other hand, if the content exceeds the upper limit, the thixotropy tends to be too high and the coating tends to be poor.
本発明に用いる溶剤としては、公知の溶剤を適宜用いることができる。前記溶剤としては、沸点170℃以上の水溶性溶剤を用いることが好ましい。
前記溶剤としては、例えば、ジエチレングリコール、ジプロピレングリコール、トリエチレングリコール、ヘキシレングリコール、ヘキシルジグリコール、1,5−ペンタンジオール、メチルカルビトール、ブチルカルビトール、2−エチルヘキシルジグリコール、オクタンジオール、フェニルグリコール、ジエチレングリコールモノヘキシルエーテルが挙げられる。これらの溶剤は1種を単独で用いてもよく、2種以上を混合して用いてもよい。
As the solvent used in the present invention, a known solvent can be appropriately used. As the solvent, a water-soluble solvent having a boiling point of 170 ° C. or higher is preferably used.
Examples of the solvent include diethylene glycol, dipropylene glycol, triethylene glycol, hexylene glycol, hexyl diglycol, 1,5-pentanediol, methyl carbitol, butyl carbitol, 2-ethylhexyl diglycol, octanediol, and phenyl. Glycol, diethylene glycol monohexyl ether. These solvents may be used alone or in combination of two or more.
前記溶剤の含有量は、前記ロジン系樹脂100質量部に対して、20質量部以上100質量部以下であることが好ましい。前記溶剤の含有量が前記範囲内であれば、得られるはんだ組成物の粘度を適正な範囲に適宜調整できる。 The content of the solvent is preferably 20 parts by mass or more and 100 parts by mass or less with respect to 100 parts by mass of the rosin resin. If content of the said solvent is in the said range, the viscosity of the solder composition obtained can be suitably adjusted to an appropriate range.
本発明に用いる活性剤としては、例えば、有機酸、有機ハロゲン化合物が挙げられる。これらの活性剤は1種を単独で用いてもよく、2種以上を混合して用いてもよい。
前記有機酸としては、例えば、モノカルボン酸、ジカルボン酸などの他に、その他の有機酸が挙げられる。これらの有機酸は1種を単独で用いてもよく、2種以上を混合して用いてもよい。
モノカルボン酸としては、ギ酸、酢酸、プロピオン酸、プチリック酸、バレリック酸、カプロン酸、エナント酸、カプリン酸、ラウリル酸、ミリスチン酸、ペンタデシル酸、パルミチン酸、マルガリン酸、ステアリン酸、ツベルクロステアリン酸、アラキジン酸、ベヘニン酸、リグノセリン酸、グリコール酸などが挙げられる。
ジカルボン酸としては、シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライン酸、セバシン酸、フマル酸、マレイン酸、酒石酸、ジグリコール酸などが挙げられる。
その他の有機酸としては、ダイマー酸、レブリン酸、乳酸、アクリル酸、安息香酸、サリチル酸、アニス酸、クエン酸、ピコリン酸などが挙げられる。
Examples of the activator used in the present invention include organic acids and organic halogen compounds. These activators may be used individually by 1 type, and may mix and use 2 or more types.
As said organic acid, other organic acids other than monocarboxylic acid, dicarboxylic acid, etc. are mentioned, for example. These organic acids may be used alone or in combination of two or more.
Monocarboxylic acids include formic acid, acetic acid, propionic acid, petric acid, valeric acid, caproic acid, enanthic acid, capric acid, lauric acid, myristic acid, pentadecylic acid, palmitic acid, margaric acid, stearic acid, tuberculostearic acid Arachidic acid, behenic acid, lignoceric acid, glycolic acid and the like.
Examples of the dicarboxylic acid include oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, fumaric acid, maleic acid, tartaric acid, diglycolic acid and the like.
Examples of other organic acids include dimer acid, levulinic acid, lactic acid, acrylic acid, benzoic acid, salicylic acid, anisic acid, citric acid, and picolinic acid.
前記有機ハロゲン化合物としては、例えば、ジブロモブテンジオール、ジブロモコハク酸、5−ブロモ安息香酸、5−ブロモニコチン酸、5−ブロモフタル酸が挙げられる。これらの有機ハロゲン化合物は1種を単独で用いてもよく、2種以上を混合して用いてもよい。 Examples of the organic halogen compound include dibromobutenediol, dibromosuccinic acid, 5-bromobenzoic acid, 5-bromonicotinic acid, and 5-bromophthalic acid. These organic halogen compounds may be used alone or in combination of two or more.
前記活性剤の含有量は、前記ロジン系樹脂100質量部に対して、2質量部以上20質量部以下であることが好ましく、5質量部以上10質量部以下であることがより好ましい。含有量が前記下限未満では、はんだボールが生じやすくなる傾向にあり、他方、前記上限を超えると、フラックスの絶縁性が低下する傾向にある。 The content of the activator is preferably 2 parts by mass or more and 20 parts by mass or less, and more preferably 5 parts by mass or more and 10 parts by mass or less with respect to 100 parts by mass of the rosin resin. If the content is less than the lower limit, solder balls tend to be easily formed. On the other hand, if the content exceeds the upper limit, the insulating properties of the flux tend to decrease.
本発明に用いるアミン系化合物としては、例えば、イミダゾール化合物、トリアゾール化合物が挙げられる。これらのアミン系化合物は1種を単独で用いてもよく、2種以上を混合して用いてもよい。
イミダゾール化合物としては、ベンゾイミダゾール、2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール、2−ウンデシルイミダゾールなどが挙げられる。
トリアゾール化合物としては、ベンゾトリアゾール、1H−ベンゾトリアゾール−1−メタノール、1−メチル−1H−ベンゾトリアゾールなどが挙げられる。
Examples of amine compounds used in the present invention include imidazole compounds and triazole compounds. These amine compounds may be used individually by 1 type, and 2 or more types may be mixed and used for them.
Examples of the imidazole compound include benzimidazole, 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, and 2-undecylimidazole.
Examples of the triazole compound include benzotriazole, 1H-benzotriazole-1-methanol, and 1-methyl-1H-benzotriazole.
前記アミン系化合物の含有量は、前記ロジン系樹脂100質量部に対して、0.1質量部以上5質量部以下であることが好ましく、0.3質量部以上1質量部以下であることがより好ましい。含有量が前記下限未満では、はんだの未溶融や基板ランドへの不ぬれが発生しやすくなる傾向にあり、他方、前記上限を超えると、得られるはんだ組成物の保存安定性が低下する傾向にある。 The content of the amine compound is preferably 0.1 parts by mass or more and 5 parts by mass or less, and 0.3 parts by mass or more and 1 part by mass or less with respect to 100 parts by mass of the rosin resin. More preferred. If the content is less than the above lower limit, solder tends to be unmelted and unwetting to the substrate land. On the other hand, if the content exceeds the upper limit, the storage stability of the resulting solder composition tends to decrease. is there.
本発明に用いるフラックスは、必要に応じて、前記の成分以外に、揺変剤、消泡剤、酸化防止剤、防錆剤、界面活性剤、熱硬化剤などの添加剤を含有していてもよい。これらの添加剤の含有量としては、前記ロジン系樹脂100質量部に対して、20質量部以下であることが好ましい。 The flux used in the present invention contains additives such as a thixotropic agent, an antifoaming agent, an antioxidant, a rust inhibitor, a surfactant, and a thermosetting agent in addition to the above components as necessary. Also good. The content of these additives is preferably 20 parts by mass or less with respect to 100 parts by mass of the rosin resin.
次に、本発明のプリント配線基板について説明する。本発明のプリント配線基板は、以上説明したはんだ組成物を用いて電子部品をプリント配線基板に実装したことを特徴とするものである。そのため、本発明のプリント配線基板でも、プリヒート時におけるダレを十分に抑制できる。 Next, the printed wiring board of the present invention will be described. The printed wiring board of the present invention is characterized in that an electronic component is mounted on a printed wiring board using the solder composition described above. Therefore, sagging during preheating can be sufficiently suppressed even with the printed wiring board of the present invention.
次に、本発明を実施例および比較例によりさらに詳細に説明するが、本発明はこれらの例によってなんら限定されるものではない。なお、実施例および比較例にて用いた材料を以下に示す。
ロジン系樹脂:水添ロジン、荒川化学工業社製
溶剤:ヘキシルジグリコール(DEH)、日本乳化剤社製
アミド系縮合体微粒子の分散液:下記製造例1参照、分散液中のアミド系縮合体微粒子の濃度は20質量%
チクソ剤A:脂肪酸アマイド(脂肪酸アミド)、商品名「スリパックスLA」、日本化成社製
チクソ剤B:脂肪酸アマイド(脂肪酸アミド)、商品名「スリパックスH」、日本化成社製
チクソ剤C:12−ヒドロキシステアリン酸トリグリセリド、日本化成社製
活性剤A:ジブロモブテンジオール、エア・ブラウン社製
活性剤B:アジピン酸、東京化成工業社製
活性剤C:マロン酸、東新化成社製
アミン系化合物:ベンゾイミダゾール、東京化成工業社製
鉛フリーはんだ粉末:平均粒子径は17μm、はんだの組成は96.5Sn/3Ag/0.5Cu
EXAMPLES Next, although an Example and a comparative example demonstrate this invention further in detail, this invention is not limited at all by these examples. In addition, the material used in the Example and the comparative example is shown below.
Rosin resin: hydrogenated rosin, solvent manufactured by Arakawa Chemical Industries, Ltd .: hexyl diglycol (DEH), dispersion of amide-based condensate fine particles manufactured by Nippon Emulsifier Co., Ltd .: See Production Example 1 below, amide-based condensate fine particles in dispersion The concentration of 20% by mass
Thixo Agent A: Fatty Acid Amide (Fatty Acid Amide), Trade Name “Sripax LA”, Nippon Kasei Co., Ltd. Thixo Agent B: Fatty Acid Amide (Fatty Acid Amide), Product Name “Sripac H”, Nippon Kasei Co., Ltd. Thixo Agent C: 12- Hydroxystearic acid triglyceride, Nippon Kasei Co., Ltd. activator A: Dibromobutenediol, Air Brown Co., Ltd. activator B: Adipic acid, Tokyo Chemical Industry Co., Ltd. activator C: Malonic acid, Toshin Kasei Co., Ltd. amine compound: Benzimidazole, lead-free solder powder manufactured by Tokyo Chemical Industry Co., Ltd .: average particle size is 17 μm, solder composition is 96.5Sn / 3Ag / 0.5Cu
[製造例1]
攪拌器、温度計、分水器を備えた反応装置に、水素添加ひまし油脂肪酸由来の12−ヒドロキシステアリン酸600.0質量部を加え、80〜100℃に加温して溶融させた。その後、ジアミンであるヘキサメチレンジアミン116.0質量部を加え、170℃で、窒素雰囲気下、5〜8時間、脱水しながら縮合反応を行いアミド化させ、酸価4.2、アミン価9.4の低分子量ジアミド化合物を得た。更に、重量平均分子量10000、酸価80mgKOH/gのプロピレン・無水マレイン酸共重合体であるカルボキシル基含有ポリマー68.0質量部を加え、170℃で1〜2時間、脱水しながら縮合反応を行い、低分子量ジアミド化合物の一部の未反応アミノ基に反応させてアミド化させ高分子量ジアミド化合物を生成させた。その結果、淡黄色で低分子量ジアミド化合物と高分子量ジアミド化合物との混合物(酸価6.0、アミン価4.2)をワックス状生成物として得た。得られた生成物を粉砕し、平均粒径7μmに微粒化したアミド系縮合体微粒子を得た。
次いで、密閉容器に、ミネラルターペン120質量部、ベンジルアルコール40質量部、および、得られたアミド系縮合体微粒子40質量部を加え、10〜20℃で十分に分散させ、懸濁液を得た。その後、この懸濁液の入った密閉容器を、公知の手法により加温処理すると、微粒子が膨潤し、アミド系縮合体微粒子の分散液が得られた。なお、この分散液中のアミド系縮合体微粒子の濃度は20質量%である。
[Production Example 1]
600.0 parts by mass of 12-hydroxystearic acid derived from hydrogenated castor oil fatty acid was added to a reaction apparatus equipped with a stirrer, a thermometer, and a water separator, and the mixture was heated to 80 to 100 ° C. and melted. Then, 116.0 parts by mass of hexamethylenediamine, which is a diamine, was added, and a condensation reaction was carried out while dehydrating at 170 ° C. in a nitrogen atmosphere for 5 to 8 hours, whereby an acid value of 4.2 and an amine value of 9. 4 low molecular weight diamide compounds were obtained. Furthermore, 68.0 parts by mass of a carboxyl group-containing polymer which is a propylene / maleic anhydride copolymer having a weight average molecular weight of 10,000 and an acid value of 80 mgKOH / g is added, and a condensation reaction is performed while dehydrating at 170 ° C. for 1 to 2 hours. Then, a part of the low molecular weight diamide compound was reacted with an unreacted amino group to be amidated to produce a high molecular weight diamide compound. As a result, a pale yellow mixture of a low molecular weight diamide compound and a high molecular weight diamide compound (acid number 6.0, amine number 4.2) was obtained as a wax-like product. The obtained product was pulverized to obtain amide-based condensate fine particles atomized to an average particle size of 7 μm.
Next, 120 parts by mass of a mineral terpene, 40 parts by mass of benzyl alcohol and 40 parts by mass of the obtained amide-based condensate fine particles were added to a sealed container and sufficiently dispersed at 10 to 20 ° C. to obtain a suspension. . Thereafter, when the sealed container containing the suspension was heated by a known method, the fine particles swelled, and a dispersion of amide-based condensate fine particles was obtained. The concentration of the amide-based condensate fine particles in this dispersion is 20% by mass.
[実施例1]
ロジン系樹脂100質量部、溶剤51質量部、アミド系縮合体微粒子の分散液6.3質量部、活性剤A1.8質量部、活性剤B4.5質量部、活性剤C1.2質量部、およびアミン系化合物0.4質量部を容器に投入し、らいかい機を用いて混合してフラックスを得た。
その後、得られたフラックス11質量%および鉛フリーはんだ粉末89質量%(合計で100質量%)を容器に投入し、混練機にて2時間混合することではんだ組成物を調製した。
[Example 1]
100 parts by mass of rosin resin, 51 parts by mass of solvent, 6.3 parts by mass of dispersion of amide-based condensate fine particles, 1.8 parts by mass of activator A, 4.5 parts by mass of activator B, 1.2 parts by mass of activator C, And 0.4 mass part of amine-type compounds were thrown into the container, and it mixed using the raking machine, and obtained the flux.
Thereafter, 11% by mass of the obtained flux and 89% by mass of the lead-free solder powder (100% by mass in total) were put into a container and mixed in a kneader for 2 hours to prepare a solder composition.
[実施例2〜9]
表1に示す組成に従い各材料を配合した以外は実施例1と同様にして、はんだ組成物を得た。
[比較例1〜5]
表2に示す組成に従い各材料を配合した以外は実施例1と同様にして、はんだ組成物を得た。
[Examples 2 to 9]
A solder composition was obtained in the same manner as in Example 1 except that each material was blended according to the composition shown in Table 1.
[Comparative Examples 1-5]
A solder composition was obtained in the same manner as in Example 1 except that each material was blended according to the composition shown in Table 2.
<はんだ組成物の評価>
はんだ組成物の評価(粘度、粘度指数、性状、加熱時のダレ性、印刷性)を以下のような方法で行った。得られた結果を表1および表2に示す。
(1)粘度および粘度指数
はんだ組成物を室温(25℃)で2〜3時間放置する。はんだ組成物の容器の蓋をあけ、スパチュラで空気の混入を避けるようにして丁寧に1〜2分間かき混ぜたものを試料とする。その後、試料をスパイラル型粘度計(マルコム社製、PCU−II型)にセットして、回転数を10rpm、温度を25℃にして、6分間ローターを回転させる。そして、一旦回転を停止させ、温度調整した後に、回転数を10rpmに調整し、3分後の粘度値を読み取る。
また、上記と同様にして、回転数を30rpmに調整した場合の粘度値(30rpm粘度)と、回転数を3rpmに調整した場合の粘度値(3rpm粘度)とを読み取る。そして、下記式:
(粘度指数)=log[(3rpm粘度)/(30rpm粘度)]
に基づいて、粘度指数を算出する。
(2)性状
はんだ組成物に光沢が有るか目視で確認する。その後、はんだ組成物をへらを用いて容器の中央と側面をかき混ぜ、滑らかさを確認する。
○:光沢および滑らかさに問題はない。
×:光沢および滑らかさの少なくともいずれか一方に問題がある。
<Evaluation of solder composition>
Evaluation of the solder composition (viscosity, viscosity index, properties, sagging property during heating, printability) was performed by the following method. The obtained results are shown in Tables 1 and 2.
(1) Viscosity and Viscosity Index The solder composition is allowed to stand at room temperature (25 ° C.) for 2 to 3 hours. Open the lid of the solder composition container, and use a spatula that is gently stirred for 1-2 minutes so as to avoid air contamination. Thereafter, the sample is set in a spiral viscometer (Malcom Corp., PCU-II type), and the rotor is rotated for 6 minutes at a rotation speed of 10 rpm and a temperature of 25 ° C. Then, once the rotation is stopped and the temperature is adjusted, the rotation number is adjusted to 10 rpm, and the viscosity value after 3 minutes is read.
Further, in the same manner as described above, the viscosity value when the rotation speed is adjusted to 30 rpm (30 rpm viscosity) and the viscosity value when the rotation speed is adjusted to 3 rpm (3 rpm viscosity) are read. And the following formula:
(Viscosity index) = log [(3 rpm viscosity) / (30 rpm viscosity)]
Based on the above, the viscosity index is calculated.
(2) Properties Visually confirm that the solder composition is glossy. Then, the solder composition is stirred with a spatula at the center and side of the container to check the smoothness.
○: There is no problem in gloss and smoothness.
X: There is a problem in at least one of gloss and smoothness.
(3)加熱時のダレ性
清浄したセラミック基板(サンユインダストリアル製:25mm×50mm×0.8mm)を準備する。3.0mm×1.5mmのパターン孔を有し、それを0.1mmから1.2mmまで0.1mmステップで配置しているパターン孔を有する厚み0.2mm(誤差は0.001mm以内)のメタルマスクを使用し、このセラミック基板上にはんだ組成物を印刷して試験板とする。なお、試験板は2枚作成する。そして、170℃に加熱された炉中に試験板を入れ、1分間加熱する。加熱後の試験板2枚をそれぞれ観察し、パターン孔のうち、印刷されたはんだ組成物が一体にならない最小間隔を測定する。
(4)印刷性
印刷機MK−878SV(ミナミ社製)と厚み0.1mmのメタルマスクとメタルスキージを使用し、印刷速度50mm/sでSP−TDC基板(100点のドットパターンを有する基板、ドットの直径:0.2mmφ〜0.5mmφ)にはんだ組成物を印刷する。20枚のSP−TDC基板に印刷した後、25℃、50%で1時間放置する。放置後、印刷を再開し、SP−TDC基板10枚にはんだ組成物を印刷する。その後、三次元形状解析装置にて、転写率(100ドット分の体積率の平均値)の測定を行う。
○:放置後の平均転写率(基板10枚の転写率の平均値)が放置前と同じ値になるのが3枚目以内である。
△:放置後の平均転写率が放置前と同じ値になるのが4または5枚目である。
×:放置後の平均転写率が放置前と同じ値になるのが6枚目以降である。
(3) Sag at heating A clean ceramic substrate (manufactured by Sanyu Industrial: 25 mm × 50 mm × 0.8 mm) is prepared. It has a pattern hole of 3.0 mm x 1.5 mm and has a pattern hole in which it is arranged in steps of 0.1 mm from 0.1 mm to 1.2 mm, with a thickness of 0.2 mm (error is within 0.001 mm) Using a metal mask, the solder composition is printed on this ceramic substrate to obtain a test plate. Two test plates are prepared. Then, the test plate is placed in a furnace heated to 170 ° C. and heated for 1 minute. Each of the two test plates after heating is observed, and the minimum interval at which the printed solder composition is not integrated is measured among the pattern holes.
(4) Printability Using a printing machine MK-878SV (manufactured by Minami Co., Ltd.), a 0.1 mm thick metal mask and a metal squeegee, a printing speed of 50 mm / s, an SP-TDC substrate (a substrate having a dot pattern of 100 points, The solder composition is printed on a dot diameter (0.2 mmφ to 0.5 mmφ). After printing on 20 SP-TDC substrates, it is left at 25 ° C. and 50% for 1 hour. After leaving, printing is resumed, and the solder composition is printed on 10 SP-TDC substrates. Thereafter, the transfer rate (average value of the volume rate for 100 dots) is measured with a three-dimensional shape analyzer.
○: The average transfer rate after being left (the average value of the transfer rate of 10 substrates) is the same as that before being left within 3rd.
(Triangle | delta): It is the 4th or 5th sheet that the average transfer rate after leaving becomes the same value as before leaving.
X: The average transfer rate after being left is the same as that before being left after the sixth sheet.
表1および表2に示す結果からも明らかなように、本発明のはんだ組成物を用いた場合(実施例1〜9)には、印刷性および加熱時のダレ性がともに優れていた。したがって、本発明のはんだ組成物によれば、印刷性を維持しつつ、プリヒート時におけるダレを十分に抑制できることが確認された。
一方で、アミド系縮合体微粒子を含有しないはんだ組成物を用いた場合(比較例1〜2)には、加熱時におけるダレ性が不十分であった。また、フラックス中のアミド系縮合体微粒子の含有量が適当でない場合(比較例3〜5)には、印刷性と、加熱時におけるダレ性とを両立することができなかった。
As is apparent from the results shown in Tables 1 and 2, when the solder composition of the present invention was used (Examples 1 to 9), both the printability and the sagging property during heating were excellent. Therefore, according to the solder composition of the present invention, it was confirmed that sagging during preheating can be sufficiently suppressed while maintaining printability.
On the other hand, when a solder composition containing no amide-based condensate fine particles was used (Comparative Examples 1 and 2), the sagging property during heating was insufficient. In addition, when the content of the amide-based condensate fine particles in the flux was not appropriate (Comparative Examples 3 to 5), it was impossible to achieve both printability and sagging property during heating.
本発明のはんだ組成物は、電子機器のプリント配線基板に部品を実装するための技術として好適に用いることができる。 The solder composition of the present invention can be suitably used as a technique for mounting a component on a printed wiring board of an electronic device.
Claims (2)
前記アミド系縮合体微粒子は、ヒドロキシ脂肪族モノカルボン酸を含む炭素数2〜22の脂肪族カルボン酸、および炭素数2〜16のジアミンとダイマージアミンとの何れかのジアミンを縮合させた低分子量アミド化合物と、同種の該カルボン酸、同種の該ジアミンおよび重量平均分子量2000〜100000のカルボキシル基含有ポリマーを縮合させた高分子量アミド化合物とを含有する微粒子であり、
前記アミド系縮合体微粒子の含有量は、前記ロジン系樹脂100質量部に対して、1.1質量部以上2.7質量部以下である
ことを特徴とするはんだ組成物。 Containing rosin resin, amide condensate fine particles, solvent, activator, amine compound, and solder powder;
The amide-based condensate fine particles have a low molecular weight obtained by condensing an aliphatic carboxylic acid having 2 to 22 carbon atoms including a hydroxy aliphatic monocarboxylic acid, and a diamine having 2 to 16 carbon atoms and dimer diamine. Fine particles containing an amide compound and a high molecular weight amide compound obtained by condensing the same kind of the carboxylic acid, the same kind of the diamine, and a carboxyl group-containing polymer having a weight average molecular weight of 2000 to 100,000.
A content of the amide-based condensate fine particles is 1.1 parts by mass or more and 2.7 parts by mass or less with respect to 100 parts by mass of the rosin resin.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012180633A JP5766668B2 (en) | 2012-08-16 | 2012-08-16 | Solder composition and printed wiring board using the same |
| KR1020130096280A KR102088652B1 (en) | 2012-08-16 | 2013-08-14 | Solder composition and printed circuit board using the same |
| CN201310357444.6A CN103586602B (en) | 2012-08-16 | 2013-08-16 | Solder composition and the printed circuit board using this solder composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012180633A JP5766668B2 (en) | 2012-08-16 | 2012-08-16 | Solder composition and printed wiring board using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2014036985A true JP2014036985A (en) | 2014-02-27 |
| JP5766668B2 JP5766668B2 (en) | 2015-08-19 |
Family
ID=50077034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012180633A Active JP5766668B2 (en) | 2012-08-16 | 2012-08-16 | Solder composition and printed wiring board using the same |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5766668B2 (en) |
| KR (1) | KR102088652B1 (en) |
| CN (1) | CN103586602B (en) |
Cited By (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016076220A1 (en) * | 2014-11-12 | 2016-05-19 | 千住金属工業株式会社 | Flux for solder paste, solder paste, and joined body |
| JP2017064783A (en) * | 2015-09-30 | 2017-04-06 | 株式会社タムラ製作所 | Flux composition and solder paste |
| WO2017065076A1 (en) * | 2015-10-14 | 2017-04-20 | 共栄社化学株式会社 | Thixotropic agent, and flux and solder paste both containing same |
| CN107206552A (en) * | 2015-06-12 | 2017-09-26 | 荒川化学工业株式会社 | Without lead solder solder flux and leadless solder paste |
| WO2017164194A1 (en) * | 2016-03-22 | 2017-09-28 | 株式会社タムラ製作所 | Lead-free solder alloy, flux composition, solder paste composition, electronic circuit board and electronic control device |
| JP2017209690A (en) * | 2016-05-24 | 2017-11-30 | 住友金属鉱山株式会社 | Solder flux, solder flux manufacturing method, and solder paste |
| JP2018122323A (en) * | 2017-01-31 | 2018-08-09 | 株式会社タムラ製作所 | Flux composition, solder paste and electronic circuit board |
| JP2018122324A (en) * | 2017-01-31 | 2018-08-09 | 株式会社タムラ製作所 | Solder paste, electronic circuit board and electronic control device |
| WO2019103090A1 (en) * | 2017-11-24 | 2019-05-31 | 千住金属工業株式会社 | Flux, and solder paste |
| JP2019147190A (en) * | 2019-04-23 | 2019-09-05 | 株式会社タムラ製作所 | Flux composition, solder paste and electronic circuit board |
| JP2019171467A (en) * | 2018-03-29 | 2019-10-10 | 株式会社タムラ製作所 | Solder composition for dispense coating |
| US10456872B2 (en) | 2017-09-08 | 2019-10-29 | Tamura Corporation | Lead-free solder alloy, electronic circuit substrate, and electronic device |
| JP2020049490A (en) * | 2018-09-21 | 2020-04-02 | 株式会社タムラ製作所 | Flux composition for soldering |
| JP2020142259A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142255A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142271A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142261A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Solder paste |
| JP2020142267A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142272A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142266A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142268A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142254A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142256A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142269A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142264A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| CN112570930A (en) * | 2019-09-27 | 2021-03-30 | 株式会社田村制作所 | Flux composition for soldering and soldering method |
| JP7620254B1 (en) * | 2024-07-11 | 2025-01-23 | 千住金属工業株式会社 | Manufacturing method of flux and joint body |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104999196A (en) * | 2015-07-29 | 2015-10-28 | 常州美欧电子有限公司 | Scaling powder and manufacturing method thereof |
| JP6310893B2 (en) * | 2015-09-30 | 2018-04-11 | 株式会社タムラ製作所 | Flux composition, solder composition, and method for manufacturing electronic substrate |
| CN108994485B (en) * | 2018-10-26 | 2021-01-05 | 众潮电科(深圳)有限公司 | Soldering flux and preparation method thereof |
| CN110328466B (en) * | 2019-07-06 | 2021-09-21 | 苏州龙腾万里化工科技有限公司 | Halogen-free cleaning-free soldering flux |
| CN111001965B (en) * | 2019-10-28 | 2022-03-11 | 东莞市吉田焊接材料有限公司 | A leaded solder paste flux and its preparation method and solder paste |
| CN116529021B (en) * | 2020-11-18 | 2024-03-08 | 千住金属工业株式会社 | Soldering flux and soldering paste |
| EP4230343B1 (en) | 2020-11-18 | 2025-02-26 | Senju Metal Industry Co., Ltd. | Flux and solder paste |
| KR102882331B1 (en) * | 2022-05-10 | 2025-11-06 | 한국화학연구원 | Solder Paste |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0775894A (en) * | 1993-09-03 | 1995-03-20 | Nippon Handa Kk | Solder paste |
| JPH1177377A (en) * | 1997-09-08 | 1999-03-23 | Sanei Kagaku Kk | Flux composition |
| JP2011121058A (en) * | 2009-12-08 | 2011-06-23 | Arakawa Chem Ind Co Ltd | Solder paste |
| JP2011136365A (en) * | 2009-12-29 | 2011-07-14 | Tamura Seisakusho Co Ltd | Solder paste and flux |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4348169B2 (en) | 2003-11-18 | 2009-10-21 | 伊藤製油株式会社 | Thixotropic agent for solder paste and solder paste |
| JP5001655B2 (en) * | 2004-09-30 | 2012-08-15 | 株式会社タムラ製作所 | Solder composition and solder layer forming method using the same |
| JP2008062240A (en) | 2006-09-04 | 2008-03-21 | Harima Chem Inc | Solder paste composition |
| CN101224528B (en) * | 2008-01-21 | 2010-11-17 | 广州瀚源电子科技有限公司 | A kind of flux for electronic mounting lead-free solder paste |
| CN102107340B (en) * | 2009-12-24 | 2015-10-21 | 汉高股份有限及两合公司 | A kind of paste composition, soldering paste and a kind of scaling powder |
-
2012
- 2012-08-16 JP JP2012180633A patent/JP5766668B2/en active Active
-
2013
- 2013-08-14 KR KR1020130096280A patent/KR102088652B1/en active Active
- 2013-08-16 CN CN201310357444.6A patent/CN103586602B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0775894A (en) * | 1993-09-03 | 1995-03-20 | Nippon Handa Kk | Solder paste |
| JPH1177377A (en) * | 1997-09-08 | 1999-03-23 | Sanei Kagaku Kk | Flux composition |
| JP2011121058A (en) * | 2009-12-08 | 2011-06-23 | Arakawa Chem Ind Co Ltd | Solder paste |
| JP2011136365A (en) * | 2009-12-29 | 2011-07-14 | Tamura Seisakusho Co Ltd | Solder paste and flux |
Cited By (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107000133A (en) * | 2014-11-12 | 2017-08-01 | 千住金属工业株式会社 | Soldering paste scaling powder, soldering paste and soldered joint body |
| JP2016093816A (en) * | 2014-11-12 | 2016-05-26 | 千住金属工業株式会社 | Solder paste flux, solder paste and solder joint |
| WO2016076220A1 (en) * | 2014-11-12 | 2016-05-19 | 千住金属工業株式会社 | Flux for solder paste, solder paste, and joined body |
| EP3219433A4 (en) * | 2014-11-12 | 2018-06-13 | Senju Metal Industry Co., Ltd | Flux for solder paste, solder paste, and joined body |
| CN107206552A (en) * | 2015-06-12 | 2017-09-26 | 荒川化学工业株式会社 | Without lead solder solder flux and leadless solder paste |
| EP3308901A4 (en) * | 2015-06-12 | 2018-12-12 | Arakawa Chemical Industries, Ltd. | Flux for lead-free solder, and lead-free solder paste |
| KR20170038675A (en) | 2015-09-30 | 2017-04-07 | 가부시키가이샤 다무라 세이사쿠쇼 | Flux composition and solder paste |
| JP2017064783A (en) * | 2015-09-30 | 2017-04-06 | 株式会社タムラ製作所 | Flux composition and solder paste |
| WO2017065076A1 (en) * | 2015-10-14 | 2017-04-20 | 共栄社化学株式会社 | Thixotropic agent, and flux and solder paste both containing same |
| JPWO2017065076A1 (en) * | 2015-10-14 | 2018-08-09 | 共栄社化学株式会社 | Thixotropic agent and flux and solder paste containing the same |
| WO2017164194A1 (en) * | 2016-03-22 | 2017-09-28 | 株式会社タムラ製作所 | Lead-free solder alloy, flux composition, solder paste composition, electronic circuit board and electronic control device |
| US10926360B2 (en) | 2016-03-22 | 2021-02-23 | Tamura Corporation | Lead-free solder alloy, solder joint, solder paste composition, electronic circuit board, and electronic device |
| EP3321025A4 (en) * | 2016-03-22 | 2018-08-22 | Tamura Corporation | Lead-free solder alloy, flux composition, solder paste composition, electronic circuit board and electronic control device |
| JP2017209690A (en) * | 2016-05-24 | 2017-11-30 | 住友金属鉱山株式会社 | Solder flux, solder flux manufacturing method, and solder paste |
| JP2018122324A (en) * | 2017-01-31 | 2018-08-09 | 株式会社タムラ製作所 | Solder paste, electronic circuit board and electronic control device |
| JP2018122323A (en) * | 2017-01-31 | 2018-08-09 | 株式会社タムラ製作所 | Flux composition, solder paste and electronic circuit board |
| US10456872B2 (en) | 2017-09-08 | 2019-10-29 | Tamura Corporation | Lead-free solder alloy, electronic circuit substrate, and electronic device |
| WO2019103090A1 (en) * | 2017-11-24 | 2019-05-31 | 千住金属工業株式会社 | Flux, and solder paste |
| JP2019093433A (en) * | 2017-11-24 | 2019-06-20 | 千住金属工業株式会社 | Flux and solder paste |
| US11130202B2 (en) | 2017-11-24 | 2021-09-28 | Senju Metal Industry Co., Ltd. | Flux, and solder paste |
| EP3715041A4 (en) * | 2017-11-24 | 2020-12-30 | Senju Metal Industry Co., Ltd | FLUX AND SOLDER PASTE |
| KR20200077603A (en) * | 2017-11-24 | 2020-06-30 | 센주긴조쿠고교 가부시키가이샤 | Flux and solder paste |
| CN111372718A (en) * | 2017-11-24 | 2020-07-03 | 千住金属工业株式会社 | Flux and Solder Paste |
| KR102139450B1 (en) | 2017-11-24 | 2020-07-29 | 센주긴조쿠고교 가부시키가이샤 | Flux and solder paste |
| JP2019171467A (en) * | 2018-03-29 | 2019-10-10 | 株式会社タムラ製作所 | Solder composition for dispense coating |
| JP2020049490A (en) * | 2018-09-21 | 2020-04-02 | 株式会社タムラ製作所 | Flux composition for soldering |
| JP2020142269A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142264A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142267A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142272A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142266A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142268A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142254A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142256A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142261A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Solder paste |
| JP2020142255A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142271A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2020142259A (en) * | 2019-03-05 | 2020-09-10 | 千住金属工業株式会社 | Flux and solder paste |
| JP2019147190A (en) * | 2019-04-23 | 2019-09-05 | 株式会社タムラ製作所 | Flux composition, solder paste and electronic circuit board |
| JP7089491B2 (en) | 2019-04-23 | 2022-06-22 | 株式会社タムラ製作所 | Flux composition, solder paste and electronic circuit board |
| CN112570930A (en) * | 2019-09-27 | 2021-03-30 | 株式会社田村制作所 | Flux composition for soldering and soldering method |
| CN112570930B (en) * | 2019-09-27 | 2023-10-27 | 株式会社田村制作所 | Soldering flux composition and soldering method |
| JP7620254B1 (en) * | 2024-07-11 | 2025-01-23 | 千住金属工業株式会社 | Manufacturing method of flux and joint body |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103586602A (en) | 2014-02-19 |
| JP5766668B2 (en) | 2015-08-19 |
| CN103586602B (en) | 2016-11-09 |
| KR102088652B1 (en) | 2020-03-13 |
| KR20140023220A (en) | 2014-02-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5766668B2 (en) | Solder composition and printed wiring board using the same | |
| JP6088204B2 (en) | Solder composition | |
| JP6310894B2 (en) | Solder composition and method for producing electronic substrate | |
| JP5667101B2 (en) | Solder composition, method for producing the same, and printed wiring board | |
| KR102181112B1 (en) | Solder composition | |
| JP5731555B2 (en) | Flux and solder paste | |
| JP5952448B2 (en) | Flux and solder paste | |
| JP6293514B2 (en) | Solder composition and printed wiring board manufacturing method | |
| JP6560283B2 (en) | Flux composition and solder paste | |
| JP6370324B2 (en) | Solder composition and method for producing electronic substrate | |
| JP2015131336A (en) | Solder composition and printed wiring board prepared using the same | |
| JP6932112B2 (en) | Flux and solder paste | |
| JP2015062913A (en) | Flux composition, solder composition and printed wiring board | |
| JP2005144520A (en) | Thixotropy application agent for solder paste, and solder paste | |
| JP7312534B2 (en) | Solder composition for microchip parts | |
| JP2024001726A (en) | Solder compositions and electronic substrates | |
| JP5635561B2 (en) | Solder composition | |
| JP7554218B2 (en) | Solder composition and electronic substrate | |
| JP7478173B2 (en) | Flux composition and solder composition | |
| JP7634044B2 (en) | Solder composition and electronic board | |
| JP7633975B2 (en) | Flux composition, solder composition, and electronic board | |
| JP2023051797A (en) | Flux composition, solder paste and electronic circuit mounting board | |
| KR20230157684A (en) | Solder Paste | |
| CN117644318A (en) | Solder composition and electronic substrate | |
| JP2024046455A (en) | Flux composition, solder composition, and electronic board |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20140625 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20140729 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140926 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150310 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150427 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20150609 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20150617 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5766668 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |