JP2014098187A - Copper-titanium-hydrogen alloy and method for producing the same - Google Patents
Copper-titanium-hydrogen alloy and method for producing the same Download PDFInfo
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Abstract
【課題】高強度、高導電率に加えて曲げ加工性も良好な銅−チタン−水素合金およびその製造方法を提供する。
【解決手段】銅−チタンを100at.%としたときにチタンを1at.%以上、7.5at.%以下含有し、残部銅からなる銅合金に、さらに水素を0.1at.%以上、チタンの含有率の2倍(at%換算)以下含有する銅−チタン−水素合金において、合金表面における{220}結晶面のX線回折積分強度をI{220}とし、純銅標準粉末の{220}結晶面のX線回折積分強度をI0{220}とすると、I{220}/I0{220}≦3.0を満たす結晶配向を有し、母相の双晶の幅の平均が10nm以下、双晶の密度が30ライン/μm以上であり、且つチタン−水素の化合物を有する銅−チタン−水素合金である。
【選択図】なしThe present invention provides a copper-titanium-hydrogen alloy having high strength, high conductivity, and good bending workability, and a method for producing the same.
Copper-titanium is added at 100 at. % Titanium at 1 at. % Or more, 7.5 at. % Or less, and hydrogen is added at 0.1 at. % Of copper and titanium-hydrogen alloy containing less than twice the content of titanium (at% conversion), the X-ray diffraction integrated intensity of {220} crystal plane on the alloy surface is I {220}, and pure copper standard powder When the X-ray diffraction integral intensity of the {220} crystal plane is I 0 {220}, the crystal has a crystal orientation satisfying I {220} / I 0 {220} ≦ 3.0, and the width of the twin of the parent phase The copper-titanium-hydrogen alloy has an average of 10 nm or less, a twin density of 30 lines / μm or more, and a titanium-hydrogen compound.
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Description
本発明は、導電性と強度に優れた銅−チタン−水素合金およびその製造方法に関する。 The present invention relates to a copper-titanium-hydrogen alloy excellent in conductivity and strength and a method for producing the same.
電気・電子機器等に用いられているリードフレームやコネクタなどの通電用接点部材には、導電率と強度のバランスに優れた銅−ベリリウム(Cu−Be)合金が汎用されている。しかし、ベリリウム(Be)は希少金属、有害物質であるためCu−Be合金の代替が切望されている。その候補に時効析出型銅−チタン(Cu−Ti)系合金が挙げられる。銅−チタン合金は時効により銅−ベリリウム合金に匹敵する力学性質が付与され、水素中での時効により高導電率化も期待できる(非特許文献1)。 A copper-beryllium (Cu-Be) alloy having a good balance between electrical conductivity and strength is widely used for energizing contact members such as lead frames and connectors used in electrical and electronic devices. However, since beryllium (Be) is a rare metal and a harmful substance, an alternative to a Cu-Be alloy is desired. The candidate is an aging precipitation type copper-titanium (Cu-Ti) alloy. The copper-titanium alloy is given mechanical properties comparable to the copper-beryllium alloy by aging, and high conductivity can be expected by aging in hydrogen (Non-patent Document 1).
時効析出型銅−チタン合金の高強度化は、水素中時効にともない銅とチタンの化合物(Cu4Ti)あるいはチタンと水素の化合物(TiH2)が微細かつ高密度に分散することに起因する。高導電率化は、水素中時効にともないCu4Ti相に加えてTiH2相が析出し、その結果、母相中のチタン濃度が著しく低下することに起因している。これまでの研究で、時効温度を低くすることより時効時間が必要となるが、最高硬さおよびその時に導電率が高くなることが示されている(非特許文献2)。ただし、時効温度が低くなると、特性を向上するには、長い時効時間が必要となる。例えば、水素分圧0.08MPaの水素雰囲気で時効する場合、通常の(水素中ではない)時効と同等強度を有し、導電率30%IACSを達成するために、400℃で360時間がかかる(非特許文献2)。 Strengthening of aging precipitation type copper-titanium alloy is caused by fine and high density dispersion of copper and titanium compound (Cu 4 Ti) or titanium and hydrogen compound (TiH 2 ) with aging in hydrogen. . The increase in conductivity is attributed to the fact that the TiH 2 phase precipitates in addition to the Cu 4 Ti phase with aging in hydrogen, and as a result, the titanium concentration in the matrix phase is significantly reduced. Previous studies have shown that aging time is required by lowering the aging temperature, but maximum hardness and electrical conductivity at that time are increased (Non-Patent Document 2). However, when the aging temperature is lowered, a long aging time is required to improve the characteristics. For example, when aging in a hydrogen atmosphere with a hydrogen partial pressure of 0.08 MPa, it takes 360 hours at 400 ° C. to achieve 30% IACS with the same strength as normal (not in hydrogen) aging. (Non-patent document 2).
また特許文献1には、過飽和固溶体Cu−Ti合金を水素雰囲気で時効析出硬化させることにより、導電率を向上させた銅−チタン−水素合金が開示されている。この特許文献1には、最高特性(引張強さと導電率のバランス)を引き出す時効時間が5時間程度と説明されており、このときの時効処理の水素分圧が20〜30MPa程度である。(特許文献2の段落[0031]、[0044]、[0045])。 Patent Document 1 discloses a copper-titanium-hydrogen alloy whose conductivity is improved by aging precipitation hardening of a supersaturated solid solution Cu-Ti alloy in a hydrogen atmosphere. This Patent Document 1 describes that the aging time for drawing out the highest characteristic (balance between tensile strength and electrical conductivity) is about 5 hours, and the hydrogen partial pressure of the aging treatment at this time is about 20 to 30 MPa. (Patent Document 2, paragraphs [0031], [0044], [0045]).
また特許文献2には、溶体化処理後に圧延率10%以上で冷間圧延した銅−チタン合金を水素分圧7.5MPaの水素雰囲気で概ね50時間以上時効処理して析出硬化させることにより、比較的短時間で高強度化、高導電率化された銅−チタン−水素合金が開示されている。また、合金の析出物相の分散状態などの組織構造については記述がない。 Patent Document 2 discloses that a copper-titanium alloy cold-rolled at a rolling rate of 10% or more after solution treatment is subjected to aging treatment in a hydrogen atmosphere at a hydrogen partial pressure of 7.5 MPa for approximately 50 hours or more to precipitate and harden, A copper-titanium-hydrogen alloy having high strength and high conductivity in a relatively short time is disclosed. Moreover, there is no description about the structure of the alloy such as the dispersion state of the precipitate phase.
上記の通り、Cu4TiおよびTiH2を析出させることで高強度化、高導電率化することがわかっているが、高圧の水素雰囲気下または長時間の時効処理が必要である。「高圧ガス保安法」では、高圧ガスの定義は1MPa以上であり、高圧ガスを使用する場合、特別な設備などを規制されている。一方、前記数百時間の時効処理では、(設備や)コストの面から工業的に量産化することは現実的には困難であった。 As described above, it is known that Cu 4 Ti and TiH 2 are deposited to increase the strength and conductivity, but a high-pressure hydrogen atmosphere or a long-term aging treatment is required. In the “High Pressure Gas Safety Law”, the definition of high pressure gas is 1 MPa or more, and special equipment is restricted when high pressure gas is used. On the other hand, in the aging treatment for several hundred hours, it is practically difficult to industrially mass-produce from the viewpoint of (equipment and cost).
本発明の目的は、高強度、かつ高導電率な銅−チタン−水素合金および低い圧力の水素雰囲気かつ短時間で製造可能な製造方法を提供することにある。 An object of the present invention is to provide a copper-titanium-hydrogen alloy having high strength and high conductivity, and a manufacturing method capable of manufacturing in a low-pressure hydrogen atmosphere in a short time.
本発明は、銅−チタンを100at.%としたときにチタンを1at.%以上、7.5at.%以下含有し、さらに、銅−チタン−水素を100at.%とした時に水素を0.1at.%以上、チタンの含有率の2倍(at%換算)以下含有する銅−チタン−水素合金において、合金表面における{220}結晶面のX線回折積分強度をI{220}とし、純銅標準粉末の{220}結晶面のX線回折積分強度をI0{220}とすると、I{220}/I0{220}≦3.0を満たす結晶配向を有し、母相の双晶の幅の平均が10nm以下、双晶境界の密度が30ライン/μm以上であり、且つチタン−水素の化合物を有する、銅−チタン−水素合金である。双晶境界の密度は40ライン/μm以上であることがより好ましい。なお、純銅標準粉末は、市販の純銅標準粉末であり、325メッシュ(JIS Z8801)の純度99.5%の銅粉末である。 The present invention relates to copper-titanium at 100 at. % Titanium at 1 at. % Or more, 7.5 at. % Or less, and further copper-titanium-hydrogen at 100 at. % Hydrogen at 0.1 at. % Of copper and titanium-hydrogen alloy containing less than twice the content of titanium (at% conversion), the X-ray diffraction integrated intensity of {220} crystal plane on the alloy surface is I {220}, and pure copper standard powder When the X-ray diffraction integral intensity of the {220} crystal plane is I 0 {220}, the crystal has a crystal orientation satisfying I {220} / I 0 {220} ≦ 3.0, and the width of the twin of the parent phase The copper-titanium-hydrogen alloy has an average of 10 nm or less, a twin boundary density of 30 lines / μm or more, and a titanium-hydrogen compound. The density of twin boundaries is more preferably 40 lines / μm or more. The pure copper standard powder is a commercially available pure copper standard powder, and is a 325 mesh (JIS Z8801) purity 99.5% copper powder.
双晶界面に10nm以下の大きさの銅−チタンの化合物あるいはチタン−水素の化合物が存在することが好ましく、引張強さで950MPa以上、導電率が15%IACS以上であることが好ましい。なお、引張強さが960MPa以上、導電率が18%IACS以上であることがより好ましく、導電率が20%IACS以上であることがさらに好ましい。また、90°W曲げ試験における最小曲げ半径Rと板厚の比R/tが2.0以下であっても良い。本発明の銅−チタン−水素合金は、さらに、前記銅−チタンを100at.%とした時にat.%で、Zr:0.5%以下、Cr:1.0%以下、Mg:0.5%以下、Ni:2.0%以下、Fe:0.5%以下、Co:1.0%以下、Si:1.0%以下、Sn:1.0%以下、Mn:1.0%以下、V:1.0%以下、P:0.1%以下、およびZn:2.0%以下の1種以上を含有しても良い。 It is preferable that a copper-titanium compound or a titanium-hydrogen compound having a size of 10 nm or less is present at the twin interface, and it is preferable that the tensile strength is 950 MPa or more and the conductivity is 15% IACS or more. In addition, it is more preferable that the tensile strength is 960 MPa or more, and the conductivity is 18% IACS or more, and it is more preferable that the conductivity is 20% IACS or more. Further, the ratio R / t of the minimum bending radius R to the plate thickness in the 90 ° W bending test may be 2.0 or less. The copper-titanium-hydrogen alloy of the present invention further comprises 100 at. %. At. %, Zr: 0.5% or less, Cr: 1.0% or less, Mg: 0.5% or less, Ni: 2.0% or less, Fe: 0.5% or less, Co: 1.0% or less Si: 1.0% or less, Sn: 1.0% or less, Mn: 1.0% or less, V: 1.0% or less, P: 0.1% or less, and Zn: 2.0% or less You may contain 1 or more types.
また、本発明は、銅−チタンを100at.%とした時にチタンを1at.%以上、7.5at.%以下含有し、残部銅および不可避不純物である組成を有する銅−チタン合金を溶体化処理した後、銅−チタンの化合物を析出させる予備時効処理を行い、次に冷間圧延を行った後、水素雰囲気中で時効処理する、銅−チタン−水素合金の製造方法である。 In the present invention, copper-titanium is added at 100 at. % Titanium at 1 at. % Or more, 7.5 at. %, And after the solution treatment of the copper-titanium alloy having the composition of the remaining copper and unavoidable impurities, a pre-aging treatment for precipitating a copper-titanium compound is performed, and then cold rolling is performed, This is a method for producing a copper-titanium-hydrogen alloy that is subjected to an aging treatment in a hydrogen atmosphere.
前記冷間圧延の圧延率が30%以下であることが好ましく、前記予備時効処理が300〜500℃の温度範囲で5〜240分、さらには10〜50分の実施されることが好ましく、さらに前記水素雰囲気中での時効処理温度が300〜400℃の範囲で実施されることが好ましい。また、前記銅−チタン合金は、銅−チタンを100at.%とした時に、さらに、at.%で、Zr:0.5%以下、Cr:1.0%以下、Mg:0.5%以下、Ni:2.0%以下、Fe:0.5%以下、Co:1.0%以下、Si:1.0%以下、Sn:1.0%以下、Mn:1.0%以下、V:1.0%以下、P:0.1%以下、およびZn:2.0%以下の1種以上を含有する銅−チタン合金を溶体化処理することもできる。 The rolling rate of the cold rolling is preferably 30% or less, and the preliminary aging treatment is preferably performed at a temperature range of 300 to 500 ° C. for 5 to 240 minutes, more preferably 10 to 50 minutes, The aging treatment temperature in the hydrogen atmosphere is preferably performed in the range of 300 to 400 ° C. The copper-titanium alloy may be copper-titanium at 100 at. %, And at. %, Zr: 0.5% or less, Cr: 1.0% or less, Mg: 0.5% or less, Ni: 2.0% or less, Fe: 0.5% or less, Co: 1.0% or less Si: 1.0% or less, Sn: 1.0% or less, Mn: 1.0% or less, V: 1.0% or less, P: 0.1% or less, and Zn: 2.0% or less A copper-titanium alloy containing one or more kinds can be solution-treated.
本発明によれば、従来に比べて短時間で高密度の銅−チタンの化合物(Cu4Ti)あるいはチタン−水素の化合物(TiH2)を双晶界面上に優先的に微細析出させることができ、導電性と強度に優れた銅−チタン−水素合金を短時間で得ることが可能となる。 According to the present invention, a high-density copper-titanium compound (Cu 4 Ti) or a titanium-hydrogen compound (TiH 2 ) can be preferentially finely precipitated on the twin interface in a short time compared to the conventional case. It is possible to obtain a copper-titanium-hydrogen alloy excellent in conductivity and strength in a short time.
以下、本発明の実施の形態について説明する。
本発明の銅−チタン−水素合金は、銅−チタン(銅とチタンの総量)を100at.%とした時にチタンを1at.%以上、7.5at.%以下含有し、さらに、銅−チタン−水素(銅とチタンと水素の総量)を100at.%とした時に水素を0.1at.%以上、チタンの含有率の2倍(at%換算)以下含有し、残部銅および不可避不純物である組成を有する。好ましくは、チタンは、銅−チタンを100at.%とした時に、1.0at.%から6.0at.%である。また、好ましくは、水素は、チタンの含有率の1.7倍(at.%換算)以下である。また、本発明の銅−チタン−水素合金は、銅−チタンを100at.%とした時に、さらに、at.%で、Zr:0.5%以下、Cr:1.0%以下、Mg:0.5%以下、Ni:2.0%以下、Fe:0.5%以下、Co:1.0%以下、Si:1.0%以下、Sn:1.0%以下、Mn:1.0%以下、V:1.0%以下、P:0.1%以下、およびZn:2.0%以下の1種以上を含有することができる。なお、本明細書および特許請求の範囲を通じて、「銅−チタン−水素合金」は、ZrとCrなどの元素を添加した合金を含むCu−Ti−H系合金の意味であり、「at.%」は、原子存在比(atomic%:アトミックパーセント)の意味である。
Embodiments of the present invention will be described below.
In the copper-titanium-hydrogen alloy of the present invention, copper-titanium (total amount of copper and titanium) is 100 at. % Titanium at 1 at. % Or more, 7.5 at. %, And further copper-titanium-hydrogen (total amount of copper, titanium and hydrogen) at 100 at. % Hydrogen at 0.1 at. % Of the content of titanium and not more than twice the content of titanium (at% conversion), and the composition is the balance copper and inevitable impurities. Preferably, the titanium is copper-titanium at 100 at. %, 1.0 at. % To 6.0 at. %. Preferably, the hydrogen content is 1.7 times or less (at.% Conversion) of titanium content. Moreover, the copper-titanium-hydrogen alloy of the present invention contains copper-titanium at 100 at. %, And at. %, Zr: 0.5% or less, Cr: 1.0% or less, Mg: 0.5% or less, Ni: 2.0% or less, Fe: 0.5% or less, Co: 1.0% or less Si: 1.0% or less, Sn: 1.0% or less, Mn: 1.0% or less, V: 1.0% or less, P: 0.1% or less, and Zn: 2.0% or less 1 or more types can be contained. Throughout the specification and claims, “copper-titanium-hydrogen alloy” means a Cu—Ti—H alloy including an alloy to which elements such as Zr and Cr are added, and “at.% "Means the atomic abundance ratio (atomic%: atomic percent).
本発明の銅−チタン−水素合金は、母材となる銅にチタンを過飽和に固溶させ、急冷して得た過飽和固溶体の銅−チタン合金を予備時効後、圧延率30%以下で加工した後、例えば水素雰囲気中で熱処理することにより、チタン−水素の化合物を時効析出させて水素を含有させることによって製造される。 The copper-titanium-hydrogen alloy of the present invention was processed at a rolling rate of 30% or less after pre-aging a supersaturated solid solution copper-titanium alloy obtained by super-saturating titanium in copper as a base material and quenching. After that, for example, by heat-treating in a hydrogen atmosphere, the titanium-hydrogen compound is aged to contain hydrogen.
まず、銅とチタン、または、銅とチタンに加え、Zr、Cr、Mg、Ni、Fe、Co、Si、Sn、Mn、V、P、Znの1種以上を溶製する。 First, in addition to copper and titanium or copper and titanium, at least one of Zr, Cr, Mg, Ni, Fe, Co, Si, Sn, Mn, V, P, and Zn is melted.
製造後の銅−チタン−水素合金の強度を高めるためには、できるだけCu4Tiの化合物相を高密度で微細析出することが好ましい。チタンの含有量が1.0at.%未満では化合物相による強化作用を充分に引き出すことが難しい。また、チタンの含有量が7.5at.%を超えて過剰になると、急冷して得られた過飽和固溶体中にCu4Tiが粗大に生成しやすく、その後の熱間加工や冷間加工において割れが生じやすく、生産性の低下を招きやすい。したがって、チタンの含有量は1.0at.%から7.5at.%の範囲であり、1.0at.%から6.0at.%の範囲であることが好ましく、2.0at%から5.0at%の範囲であることがさらに好ましい。 In order to increase the strength of the copper-titanium-hydrogen alloy after production, it is preferable to finely precipitate the Cu 4 Ti compound phase as densely as possible. The titanium content is 1.0 at. If it is less than%, it is difficult to sufficiently bring out the strengthening action by the compound phase. The titanium content is 7.5 at. If it exceeds C%, Cu 4 Ti tends to form coarsely in the supersaturated solid solution obtained by rapid cooling, and cracks are likely to occur in subsequent hot and cold working, leading to a decrease in productivity. . Therefore, the titanium content is 1.0 at. % To 7.5 at. %, 1.0 at. % To 6.0 at. %, Preferably in the range of 2.0 at% to 5.0 at%.
銅−チタン系合金は、Cu4Tiの不連続析出(粒界反応析出)が発生しやすいため、Zr、Cr、Mg、Ni、Fe、Coの微量添加により、粒界反応析出を抑制する効果がある。ただし、こちらの元素が粒界に偏析しやすく、添加量が高すぎると、鋳造性や熱間及び冷間加工性の低下を招く。必要に応じ、銅−チタンを100at.%としたときに、Zr:0.5%以下、Cr:1.0%以下、Mg:0.5%以下、Ni:2.0%以下、Fe:0.5%以下、Co:1.0%以下を添加することが好ましい。また、これらの各元素が少なすぎると、前記粒界反応析出を抑制する効果が小さいので、これらの各元素の下限は、0.01at.%以上であること好ましい。 Since copper-titanium alloys are susceptible to Cu 4 Ti discontinuous precipitation (grain boundary reaction precipitation), the effect of suppressing grain boundary reaction precipitation by adding a small amount of Zr, Cr, Mg, Ni, Fe, Co. There is. However, this element tends to segregate at the grain boundary, and if the addition amount is too high, the castability, hot and cold workability are reduced. If necessary, copper-titanium is added at 100 at. %: Zr: 0.5% or less, Cr: 1.0% or less, Mg: 0.5% or less, Ni: 2.0% or less, Fe: 0.5% or less, Co: 1. It is preferable to add 0% or less. Moreover, since the effect which suppresses the said grain boundary reaction precipitation is small when there are too few each of these elements, the minimum of each of these elements is 0.01 at. % Or more is preferable.
後に詳述のように、本発明の銅−チタン−水素合金は、時効中にチタン−水素の化合物(TiH2)の微細化または粗大化を抑制するために、時効前に変形双晶の多量導入が必要である。そのため、銅母相の積層欠陥エネルギーを低める効果を有する元素、Si、Sn、Mn、V、P、Znの添加が有効である。ただし、こちらの元素の添加量が高すぎると、導電性の低下を招く。必要に応じ、銅−チタンを100at.%としたときに、Si:1.0%以下、Sn:1.0%以下、Mn:1.0%以下、V:1.0%以下、P:0.1%以下、およびZn:2.0%以下の1種以上を添加することが好ましい。また、これらの各元素が少なすぎると、前記銅母相の積層欠陥エネルギーを低める効果が小さいので、これらの各元素は、少なくとも0.01at.%以上であること好ましい。 As described in detail later, the copper-titanium-hydrogen alloy of the present invention has a large amount of deformation twins before aging in order to suppress the refinement or coarsening of the titanium-hydrogen compound (TiH 2 ) during aging. Introduction is necessary. Therefore, it is effective to add an element having an effect of reducing stacking fault energy of the copper matrix phase, Si, Sn, Mn, V, P, and Zn. However, if the amount of the element added is too high, the conductivity is reduced. If necessary, copper-titanium is added at 100 at. %: Si: 1.0% or less, Sn: 1.0% or less, Mn: 1.0% or less, V: 1.0% or less, P: 0.1% or less, and Zn: 2 It is preferable to add one or more of 0.0% or less. Further, if these elements are too small, the effect of lowering the stacking fault energy of the copper matrix phase is small, so these elements are at least 0.01 at. % Or more is preferable.
溶製は、合金溶製法、アルゴンアーク溶解法など、一般に使われる方法を利用することができる。また、チタンは蒸気圧が高いため、溶融中で組成変化がほとんど起こらない。そのため、目標とする仕込み量で材料を仕込むことにより所定組成を有する銅−チタン合金が得られる。 For melting, a commonly used method such as an alloy melting method or an argon arc melting method can be used. In addition, since titanium has a high vapor pressure, the composition hardly changes during melting. Therefore, a copper-titanium alloy having a predetermined composition can be obtained by charging the material with a target charging amount.
溶製後の急冷は、銅にチタンが過飽和に固溶した状態(過飽和固溶体)を得る目的で行う。急冷には水冷、油冷、空冷といった方法が具体的に挙げられる。しかし、過飽和固溶体の状態が維持できればよく、これらに限定されるものではない。また、急冷はできるだけ体積に対する比表面積を大きくして行なうのがよい。比表面積が小さい状態で急冷しても内部はなかなか温度が下がらず、均質に急冷できない恐れがあるからである。 The rapid cooling after melting is performed for the purpose of obtaining a supersaturated solid solution (supersaturated solid solution) in copper. Specific examples of the rapid cooling include water cooling, oil cooling, and air cooling. However, it is only necessary to maintain the supersaturated solid solution state, and the present invention is not limited to these. In addition, the rapid cooling is preferably performed by increasing the specific surface area relative to the volume as much as possible. This is because even if it is rapidly cooled in a state where the specific surface area is small, the temperature does not decrease easily and there is a possibility that it cannot be rapidly cooled uniformly.
このようにして得られた鋳塊(インゴット)について、例えば所望の板厚を得るため、必要に応じて熱間圧延や冷間圧延等を行うことが好ましい。また、前記熱間圧延や冷間圧延の後に、溶質元素の母相中への再固溶と再結晶化を行う溶体化処理を施して、組織を均質化するのが良い。ただし、溶体化処理後の材料が柔らかいため、その後の冷間圧延では、変形双晶が生じにくい。従って、本発明においては溶体化処理後に予備時効処理(熱処理)を行った後、低い圧延率で冷間圧延を行い、その後に水素雰囲気中で時効処理する。 The ingot obtained in this way is preferably subjected to hot rolling, cold rolling or the like as necessary in order to obtain a desired thickness, for example. Further, after the hot rolling or cold rolling, it is preferable to perform a solution treatment for re-solution and recrystallization of the solute element in the matrix to homogenize the structure. However, since the material after the solution treatment is soft, deformation twinning hardly occurs in the subsequent cold rolling. Therefore, in the present invention, after the solution treatment, a preliminary aging treatment (heat treatment) is performed, followed by cold rolling at a low rolling rate, and then aging treatment in a hydrogen atmosphere.
予備時効処理では母相中から前記析出物(銅−チタンの化合物)を所定量析出させる。予備時効処理後は析出物の存在により硬度が高くなるが、硬度が高い状態で、次工程の冷間圧延を実施する。予備時効処理後に冷間圧延を実施することにより、圧延率が低くても幅の小さい双晶を発生しやすいことがわかる。具体的には圧延率が30%以下、さらには20%以下であることが好ましく、双晶の幅の小さい所定の双晶密度を有する銅合金を得ることができる。 In the pre-aging treatment, a predetermined amount of the precipitate (copper-titanium compound) is precipitated from the matrix. After the preliminary aging treatment, the hardness increases due to the presence of precipitates, but the next step of cold rolling is performed in a state where the hardness is high. By performing cold rolling after the preliminary aging treatment, it is understood that twins having a small width are likely to be generated even if the rolling rate is low. Specifically, the rolling rate is preferably 30% or less, more preferably 20% or less, and a copper alloy having a predetermined twin density with a small twin width can be obtained.
また、前記予備時効処理においては析出物を多量に析出させる必要はなく、具体的には、300〜500℃の温度範囲で5〜240分、さらには10〜50分の熱処理(予備時効処理)を行うことがより好ましい。
また、前記予備時効処理において、比較的低温または短時間で生成した析出物は、量が少ないが、微細かつ均一分散し、その後の水素雰囲気中での時効処理中に析出する析出物の「核」となる役割があり、最高特性(引張強さと導電率のバランス)を引き出す時効時間が大幅に短縮することができる。
In the preliminary aging treatment, it is not necessary to deposit a large amount of precipitates. Specifically, the heat treatment is performed at a temperature range of 300 to 500 ° C. for 5 to 240 minutes, and further 10 to 50 minutes (preliminary aging treatment). It is more preferable to carry out.
Further, in the preliminary aging treatment, although the amount of precipitates generated at a relatively low temperature or in a short time is small, it is finely and uniformly dispersed, and “nuclear” of precipitates precipitated during the subsequent aging treatment in a hydrogen atmosphere. The aging time for drawing out the highest properties (balance between tensile strength and conductivity) can be greatly shortened.
その後、銅−チタン合金への水素の導入は、例えば時効処理を水素雰囲気中で行なうことにより行われる。この時効処理は、水素圧が大気圧あるいは加圧の雰囲気中で熱処理する手法である。時効処理の雰囲気は、一度減圧してその後水素ガスを導入することで、還元雰囲気を作って行うのが好ましい。 Thereafter, introduction of hydrogen into the copper-titanium alloy is performed, for example, by performing an aging treatment in a hydrogen atmosphere. This aging treatment is a technique in which heat treatment is performed in an atmosphere where the hydrogen pressure is atmospheric or pressurized. The aging treatment atmosphere is preferably performed by reducing the pressure once and then introducing hydrogen gas to create a reducing atmosphere.
また、銅−チタン合金の組成、水素濃度、水素圧力、処理温度、処理時間などの要因で合金組織が変化するため、水素雰囲気中の時効処理の条件は、一様に特定する事はできない。製造目的毎に処理条件は絞り込むのが好ましい。一例として本願ではおよそ水素分圧が1.0MPa以下、好ましくは0.8MPa以下、時効処理(焼鈍)の温度が300〜400℃の範囲であって、380℃以下とすることが好ましい。また、時効処理時間は目的とする特性にもよるが、工場などで操業する場合は24h以下、さらには12h以下が好ましい。 In addition, since the alloy structure changes due to factors such as the composition of the copper-titanium alloy, hydrogen concentration, hydrogen pressure, processing temperature, and processing time, the conditions for aging treatment in a hydrogen atmosphere cannot be specified uniformly. It is preferable to narrow down processing conditions for each manufacturing purpose. As an example, in the present application, the hydrogen partial pressure is about 1.0 MPa or less, preferably 0.8 MPa or less, the aging treatment (annealing) temperature is in the range of 300 to 400 ° C., and preferably 380 ° C. or less. In addition, although the aging treatment time depends on the intended characteristics, it is preferably 24 h or less, more preferably 12 h or less when operating in a factory or the like.
時効析出硬化後の水素含有量は、チタン含有量の2倍までは含有させることができる。これは、導入される水素は銅−チタン合金中のチタンに対して水素化チタン(TiH2)という形態で取り込まれるからである。 The hydrogen content after age precipitation hardening can be contained up to twice the titanium content. This is because the introduced hydrogen is taken in the form of titanium hydride (TiH 2 ) with respect to titanium in the copper-titanium alloy.
本発明の銅−チタン−水素合金において、銅−チタン−水素を100at.%とした時に、水素の含有量は、0.1at.%以上であり、1.7at.%以上が好ましく、且つチタン含有量の2倍以下である。0.1at.%未満では導電性と強度を両立させることが困難であり、水素がチタン含有量の2倍を超えると、過剰な水素が遊離状態となり、板材の曲げ加工性が著しく悪くなるので2倍までとした。また、上述したように、水素は銅−チタン合金中のチタンに対して水素化チタン(TiH2)という形態で取り込まれるから、水素含有量は、チタン含有量の2倍までが好ましく、さらに1.7倍以下であることが好ましい。 In the copper-titanium-hydrogen alloy of the present invention, copper-titanium-hydrogen is added at 100 at. %, The hydrogen content is 0.1 at. % Or more and 1.7 at. % Or more is preferable and is not more than twice the titanium content. 0.1 at. If it is less than%, it is difficult to achieve both conductivity and strength. If hydrogen exceeds twice the titanium content, excess hydrogen will be in a free state, and the bending workability of the plate will be significantly deteriorated, so that it will be twice as much. did. Further, as described above, since hydrogen is taken in the form of titanium hydride (TiH 2 ) with respect to titanium in the copper-titanium alloy, the hydrogen content is preferably up to twice the titanium content, 0.7 or less is preferable.
水素中で時効析出硬化させると、強度と導電性が発現されるので、時効処理を行う前に製品などへ成型加工してもよい。 When aging precipitation hardening is carried out in hydrogen, strength and electrical conductivity are exhibited, and therefore, it may be molded into a product or the like before aging treatment.
この時効処理により、転位、双晶などの格子欠陥を核生成サイトにしてチタン−銅化合物あるいはチタン水素化合物が高密度に形成される。このため、強度をほとんど低下させることなく導電率を迅速に向上させることができる。なお、前述の通り、水素雰囲気中での時効熱処理温度が300〜400℃の範囲で実施されることが好ましい。 By this aging treatment, a titanium-copper compound or a titanium hydride compound is formed at a high density using lattice defects such as dislocations and twins as nucleation sites. For this reason, electrical conductivity can be improved rapidly, without reducing intensity | strength almost. In addition, as above-mentioned, it is preferable to implement in the range whose aging heat processing temperature in a hydrogen atmosphere is 300-400 degreeC.
また、予備時効処理後の圧延率が小さいため、圧延集合組織が過剰に発達せず、良好な曲げ加工性を維持することができる。銅合金の圧延集合組織の主方位はブラス方位であり、X線回折測定の場合には、{220}方位のX線回折積分強度で表すことができる。圧延集合組織の量は、X線回折積分強度の強弱、I{220}/I0{220}で表すことができる。ここで、板材表面における{220}結晶面のX線回折積分強度をI{220}とし、純銅標準粉末の{220}結晶面のX線回折積分強度をI0{220}とする。板材表面と純銅標準粉末のX線回折積分強度の比であるI{220}/I0{220}は高いほど、曲げ加工性が悪くなるので、3.0以下、さらには、2.3以下、2.0以下であることが望ましい。
具体的には、前述のとおり、予備時効処理を300〜400℃、10〜50分として、圧延率を20%以下とすることにより、高強度、高導電率で且つ曲げ加工性にも優れた銅−チタン−水素合金を得ることができる。
Moreover, since the rolling rate after the preliminary aging treatment is small, the rolling texture does not develop excessively, and good bending workability can be maintained. The main orientation of the rolled texture of the copper alloy is the brass orientation, and in the case of X-ray diffraction measurement, it can be expressed by the X-ray diffraction integrated intensity of the {220} orientation. The amount of the rolling texture can be expressed by the strength of the X-ray diffraction integral intensity, I {220} / I 0 {220}. Here, the X-ray diffraction integral intensity of the {220} crystal plane on the surface of the plate is I {220}, and the X-ray diffraction integral intensity of the {220} crystal plane of the pure copper standard powder is I 0 {220}. The higher I {220} / I 0 {220}, which is the ratio of the X-ray diffraction integrated intensity between the surface of the plate material and the pure copper standard powder, the worse the bending workability, so 3.0 or less, and 2.3 or less 2.0 or less.
Specifically, as described above, the pre-aging treatment is 300 to 400 ° C. and 10 to 50 minutes, and the rolling rate is 20% or less, so that the strength and conductivity are high and the bending workability is also excellent. A copper-titanium-hydrogen alloy can be obtained.
なお、本発明の銅−チタン−水素合金は、予備時効処理後に低い圧延率の冷間圧延を行うことにより幅の小さい双晶を導入させ、次に、水素雰囲気中の時効処理により双晶界面上にCu4TiおよびTiH2を優先的に析出させる点がポイントである。銅−チタン合金に導入される双晶は透過型電子顕微鏡により観察できる。また、水素中時効した後のCu4TiおよびTiH2も透過型電子顕微鏡により観察できる。後述の参考例、比較例においては透過型電子顕微鏡を使用して双晶面間隔(幅)、双晶境界の密度、および生成相の同定、分散状態などを測定した。 In addition, the copper-titanium-hydrogen alloy of the present invention introduces twins having a small width by performing cold rolling at a low rolling rate after the preliminary aging treatment, and then the twinning interface by aging treatment in a hydrogen atmosphere. The point is that Cu 4 Ti and TiH 2 are preferentially precipitated on top. Twins introduced into the copper-titanium alloy can be observed with a transmission electron microscope. Further, Cu 4 Ti and TiH 2 after aging in hydrogen can also be observed with a transmission electron microscope. In a reference example and a comparative example described later, a transmission electron microscope was used to measure twin plane spacing (width), twin boundary density, formation phase identification, dispersion state, and the like.
本発明の銅−チタン−水素合金において、チタンと水素の含有量は重要な制御パラメーターの1つである。これらの含有量の確認には、一般的な分析方法を適応することができる。例えば、チタンの含有量は、X線回折装置、エネルギー分散型蛍光X線分析装置、波長分散型蛍光X線分析装置、ICP−AES(Inductively
Coupled Plasma Atomic Emission Spectrometer:誘導結合高周波プラズマ発光分光分析)法を用いることができる。ICP−AES法は、試料の表層部分だけでなく、試料全体に対して定量測定ができるので、好適な定量測定である。この方法では、測定試料を溶液中に完全に溶かし、その溶液をプラズマで燃焼させ、試料中の元素を一端励起イオン状態にする。励起状態からよりエネルギーの低い状態に失活する際に放出する発光スペクトルの波長から元素の同定を行い、発光強度から定量分析する方法である。この方法では試料を溶液化する必要があるが、銅−チタン系の合金の場合、硝酸溶液などを用いる。市販されている測定装置もあり、例えばThermo−element社製のIRIS−Advantage
DUOなどがあり、後述の実施例、比較例においてはこれを使用して測定した。
In the copper-titanium-hydrogen alloy of the present invention, the content of titanium and hydrogen is one of the important control parameters. A general analytical method can be applied to confirm these contents. For example, the content of titanium is determined by X-ray diffractometer, energy dispersive X-ray fluorescence analyzer, wavelength dispersive X-ray fluorescence analyzer, ICP-AES (Inductively
(Coupled Plasma Atomic Emission Spectrometer) method can be used. The ICP-AES method is a suitable quantitative measurement because it can measure not only the surface layer portion of the sample but also the entire sample. In this method, a measurement sample is completely dissolved in a solution, the solution is combusted with plasma, and an element in the sample is once converted into an excited ion state. In this method, the element is identified from the wavelength of the emission spectrum emitted when the excited state is deactivated to the state of lower energy, and quantitative analysis is performed from the emission intensity. In this method, it is necessary to make a sample into a solution, but in the case of a copper-titanium alloy, a nitric acid solution or the like is used. There are also commercially available measuring devices, for example, IRIS-Advantage made by Thermo-element.
There are DUO and the like, and in the examples and comparative examples described later, this was used for measurement.
また、水素の含有量に関してはアルゴンガス搬送融解−熱伝導法によって測定することができる。これは、試料を融解させ、その際に試料中から水素、窒素といったガス元素を発生させ、その混合気体の熱伝導率を測定する方法であり、それぞれの気体が異なる熱伝導率を示すことを利用し、成分元素を定量化する方法である。試料の融解を不活性ガス中で行なうか、酸素残留雰囲気中で行なうかで、測定方法にも種類があるが、どちらの方法を用いてもよい。市販されている装置もあり、例えば堀場製作所製のEMGA−621「高感度水素分析装置」などがある。 Further, the hydrogen content can be measured by an argon gas transport melting-heat conduction method. This is a method in which a sample is melted, gas elements such as hydrogen and nitrogen are generated from the sample, and the thermal conductivity of the mixed gas is measured. Each gas exhibits different thermal conductivity. It is a method of using and quantifying component elements. There are various types of measurement methods depending on whether the sample is melted in an inert gas or in an oxygen residual atmosphere. Either method may be used. There are also commercially available devices such as EMGA-621 “High Sensitivity Hydrogen Analyzer” manufactured by HORIBA, Ltd.
純銅(99.99%)と純チタン(99.99%)をアルゴンガス雰囲気中で溶製し、合金組成: 4.2at.% Ti−残部Cu及び不可避不純物からなる銅−チタン合金インゴットを作製した。インゴットを厚さ 0.22 mmとなるまで圧延した後、溶体化のため真空中にて880℃で24 h保持した後、氷水中で焼き入れ、溶体化処理後の試験片を得た。その後、真空中にて 450℃で30minの予備時効を行った。 Pure copper (99.99%) and pure titanium (99.99%) were melted in an argon gas atmosphere, and the alloy composition was 4.2 at. A copper-titanium alloy ingot composed of% Ti-remainder Cu and inevitable impurities was produced. The ingot was rolled to a thickness of 0.22 mm and then held at 880 ° C. for 24 hours in a vacuum for solution treatment, and then quenched in ice water to obtain a test piece after solution treatment. Thereafter, preliminary aging was performed in vacuum at 450 ° C. for 30 minutes.
その後、圧延率10%で冷間圧延して参考例1のサンプルを得た。また、前記の予備時効を行わず、圧延率15%(比較例1)、30%(比較例2)、60%(比較例3)で冷間圧延して比較例のサンプルを得た。 Then, the sample of Reference Example 1 was obtained by cold rolling at a rolling rate of 10%. Moreover, the preliminary aging was not performed, and cold rolling was performed at a rolling rate of 15% (Comparative Example 1), 30% (Comparative Example 2), and 60% (Comparative Example 3) to obtain a sample of a comparative example.
次に、比較例のサンプルを、水素中にて温度380℃で時効した。水素の圧力は、0.8MPaであった。 Next, the sample of the comparative example was aged at a temperature of 380 ° C. in hydrogen. The hydrogen pressure was 0.8 MPa.
次に、比較例のサンプルを、予め時効曲線(硬さ−時効時間)により、ピ−ク硬さを達する時間での時効処理を終了後、各サンプルを取り出し、放置空冷した。具体的な水素時効時間は、比較例1および比較例2がそれぞれ48時間、比較例3が6時間であった。 Next, the sample of the comparative example was taken out in advance by the aging curve (hardness-aging time) and after the aging treatment at the time when the peak hardness was reached, each sample was taken out and left to cool by air. Specific hydrogen aging times were 48 hours for Comparative Examples 1 and 2 and 6 hours for Comparative Example 3, respectively.
出来上がった各サンプルの強度は、銅合金材の圧延方向の引張試験用試験片を採取し、JIS Z 2241に準拠した引張試験を行い、引張強さを求めた。導電率は、四端子法で抵抗値を測定して換算した。導電率の表記は、標準焼きなまし銅線の導電率を基準とした“%IACS”へ換算した。 The strength of each sample completed was obtained by taking a test piece for a tensile test in the rolling direction of a copper alloy material and performing a tensile test based on JIS Z 2241 to obtain a tensile strength. The conductivity was converted by measuring the resistance value by the four probe method. The conductivity notation was converted to “% IACS” based on the conductivity of the standard annealed copper wire.
X線回折強度(X線回折積分強度)の測定は、各サンプルの板面(圧延面)を#1500耐水ペーパーで研磨仕上げした試料を用意し、X線回折装置(XRD)を用いて、Mo−Kα線、管電圧40kV、管電流30mAの条件で、試料の研磨仕上げ面について{220}面のX線回折強度I{220}を測定することによって行った。一方、同じX線回折装置を用いて、同じ測定条件で、純銅標準粉末の{220}面のX線回折強度I0{220}を測定した。これらの測定値を用いて、X線回折強度比I{220}/I0{220}を求めた。 X-ray diffraction intensity (X-ray diffraction integrated intensity) is measured by preparing samples whose plate surfaces (rolled surfaces) are polished with # 1500 water-resistant paper and using an X-ray diffractometer (XRD). The measurement was performed by measuring the X-ray diffraction intensity I {220} of the {220} plane of the polished surface of the sample under the conditions of -Kα ray, tube voltage 40 kV, and tube current 30 mA. On the other hand, using the same X-ray diffractometer, the X-ray diffraction intensity I 0 {220} of the {220} plane of pure copper standard powder was measured under the same measurement conditions. Using these measured values, the X-ray diffraction intensity ratio I {220} / I 0 {220} was determined.
本発明において双晶境界の密度および双晶の幅の平均は、透過型電子顕微鏡(TEM)で各サンプルの写真を撮影し、写真上、双晶境界(直線状のライン)に直交する長さ300nmの線分に対し、交差する双晶境界(直線状のライン)の数をカウントし、1μm当たりに換算したものを双晶境界の密度とし、前記線分において検出された双晶領域の線分の長さを双晶の幅としてそれぞれ測定し、その幅を平均したものを双晶の幅の平均とした。 In the present invention, the twin boundary density and the average twin width are obtained by taking a photograph of each sample with a transmission electron microscope (TEM) and measuring the length perpendicular to the twin boundary (straight line). The number of twin boundaries (straight lines) intersecting the 300 nm line segment is counted, and the density of the twin boundary is calculated per 1 μm. The line in the twin region detected in the line segment The length of each minute was measured as the twin width, and the average of the widths was taken as the average twin width.
また、実施例1〜5として、参考例1の溶体化処理後の試験片について、予備時効処理を450℃、180分の条件で実施し、次に冷間圧延を圧延率15%として実施した。その後、水素の圧力を0.8MPaとして、水素雰囲気中の時効処理を実施例1は350℃で96時間、実施例2は350℃で24時間、実施例3は380℃で6h、実施例4は380℃で12時間、実施例5は380℃で24時間として水素時効処理を行った。得られた試験片の導電率、引張強さ、ビッカース硬さを測定した。 Moreover, as Examples 1-5, about the test piece after the solution treatment of Reference Example 1, the preliminary aging treatment was performed at 450 ° C. for 180 minutes, and then cold rolling was performed at a rolling rate of 15%. . Thereafter, the hydrogen pressure was set to 0.8 MPa, and the aging treatment in a hydrogen atmosphere was conducted at 350 ° C. for 96 hours, Example 2 at 350 ° C. for 24 hours, Example 3 at 380 ° C. for 6 hours, Example 4 Was aging at 380 ° C. for 12 hours, and Example 5 was hydrogen aging at 380 ° C. for 24 hours. The electrical conductivity, tensile strength, and Vickers hardness of the obtained test piece were measured.
測定結果を表1に示す。
参考例1の圧延率は10%であり、圧延率15%を有する比較例1と近いため、ほぼ同等なI{220}/I0{220}となった。しかし、参考例1は予備時効を実施しているため、小さい圧延率でも、双晶境界の密度が高くかつ双晶の幅が小さいことがわかった。
実施例1〜5はいずれも導電率が15%IACSを超え、ビッカース硬さHvが310以上であり、また、実施例1、3において引張強さがそれぞれ969MPa、960MPaであった。すなわち、高い導電率と高い強度と両立することがわかった。実施例1〜5において、水素時効の時間を6〜96時間で評価しているが、たとえば実施例2〜5のように24時間以下であれば、通常の製造工程に組み込むことが容易であり、水素の圧力が比較的低いこともあり、本発明の製造工程は十分に工業化できる条件である。また、双晶界面上に微細なCu4TiおよびTiH2の析出物が認められた。
これに対し、比較例1、2は導電率が15%IACS以下、ビッカース硬さがそれぞれ295、297、引張強さがそれぞれ880MPa、932MPaであって、導電率、硬さ(強度)ともに本発明に大きく劣る。比較例3はビッカース硬さHvが313、引張強さが982MPaと高いが、導電率が12.0%IACSと低く、強度と導電率が両立できていない。
以上より、溶体化処理の後に、予備時効処理、30%以下の圧延率の冷間圧延、水素雰囲気中の時効焼鈍を行うことで、短時間で高い導電率と高い強度(硬度)を有する銅−チタン−水素合金を、工業的に容易に得られることを確認された。
Since the rolling rate of Reference Example 1 was 10%, which was close to Comparative Example 1 having a rolling rate of 15%, it was almost equivalent I {220} / I 0 {220}. However, since Reference Example 1 was subjected to preliminary aging, it was found that even at a small rolling rate, the twin boundary density was high and the twin width was small.
In each of Examples 1 to 5, the electrical conductivity exceeded 15% IACS, the Vickers hardness Hv was 310 or more, and in Examples 1 and 3, the tensile strengths were 969 MPa and 960 MPa, respectively. That is, it was found that both high conductivity and high strength are compatible. In Examples 1 to 5, the hydrogen aging time is evaluated from 6 to 96 hours. However, if it is 24 hours or less as in Examples 2 to 5, for example, it can be easily incorporated into a normal production process. Since the hydrogen pressure is relatively low, the production process of the present invention is a condition that can be industrialized sufficiently. Fine Cu 4 Ti and TiH 2 precipitates were observed on the twin interface.
On the other hand, in Comparative Examples 1 and 2, the conductivity is 15% IACS or less, the Vickers hardness is 295 and 297, the tensile strength is 880 MPa and 932 MPa, respectively. Greatly inferior. In Comparative Example 3, the Vickers hardness Hv is as high as 313 and the tensile strength is as high as 982 MPa, but the electrical conductivity is as low as 12.0% IACS, and the strength and the electrical conductivity are not compatible.
As described above, after solution heat treatment, preliminary aging treatment, cold rolling at a rolling rate of 30% or less, and aging annealing in a hydrogen atmosphere, copper having high conductivity and high strength (hardness) in a short time. -It was confirmed that a titanium-hydrogen alloy can be easily obtained industrially.
双晶の幅の測定方法を明確にするため、測定のための撮ったTEM(透過電子顕微鏡)写真を図1、2に示す。また、双晶を有する組織の模式図を図3に示す。図1は、実施例1の双晶組織である。図2は、溶体化後、圧延、水素雰囲気中で時効処理した加工率(冷延率)がそれぞれ15%、30%、60%の比較例1〜3のものである。図3において、Bは双晶の幅である。知られているように双晶と母相の領域が交互に現れる。双晶と母相の界面が、双晶境界である。 In order to clarify the twin width measurement method, TEM (transmission electron microscope) photographs taken for measurement are shown in FIGS. FIG. 3 shows a schematic diagram of a structure having twins. FIG. 1 shows the twin structure of Example 1. FIG. 2 shows those of Comparative Examples 1 to 3 in which the processing rates (cold rolling rate) after rolling and aging treatment in a hydrogen atmosphere were 15%, 30%, and 60%, respectively. In FIG. 3, B is the twin width. As is known, twin and matrix regions appear alternately. The interface between the twin and the parent phase is the twin boundary.
なお、銅−チタン−水素を100at.%とした時の水素濃度は、実施例1は約0.58at%、実施例2は約0.13at%、実施例3は約0.12at%、実施例4は約0.38at%、実施例5は約0.24at%、比較例1は約0.05at%、比較例2は約0.07at%、比較例3は約0.04at%である。 Note that copper-titanium-hydrogen was added at 100 at. %, The hydrogen concentration in Example 1 was about 0.58 at%, Example 2 was about 0.13 at%, Example 3 was about 0.12 at%, and Example 4 was about 0.38 at%. Example 5 is about 0.24 at%, Comparative Example 1 is about 0.05 at%, Comparative Example 2 is about 0.07 at%, and Comparative Example 3 is about 0.04 at%.
本発明によって得られる銅−チタン−水素合金は、端子、コネクタ、スイッチなどの他の電気接続部品に利用可能である。 The copper-titanium-hydrogen alloy obtained by the present invention can be used for other electrical connection parts such as terminals, connectors, and switches.
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| JP2010126777A (en) * | 2008-11-28 | 2010-06-10 | Dowa Metaltech Kk | Copper alloy sheet, and method for producing the same |
| JP2010261066A (en) * | 2009-04-30 | 2010-11-18 | Jx Nippon Mining & Metals Corp | Manufacturing method of titanium copper for electronic parts |
| JP2011202261A (en) * | 2010-03-26 | 2011-10-13 | Osaka Prefecture Univ | Copper-titanium-hydrogen alloy and method for producing the same |
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| JP2010261066A (en) * | 2009-04-30 | 2010-11-18 | Jx Nippon Mining & Metals Corp | Manufacturing method of titanium copper for electronic parts |
| JP2011202261A (en) * | 2010-03-26 | 2011-10-13 | Osaka Prefecture Univ | Copper-titanium-hydrogen alloy and method for producing the same |
| JP2012097308A (en) * | 2010-10-29 | 2012-05-24 | Jx Nippon Mining & Metals Corp | Copper alloy, copper rolled product, electronic component and connector |
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