[go: up one dir, main page]

JP2014094350A - Vacuum deaeration apparatus - Google Patents

Vacuum deaeration apparatus Download PDF

Info

Publication number
JP2014094350A
JP2014094350A JP2012247622A JP2012247622A JP2014094350A JP 2014094350 A JP2014094350 A JP 2014094350A JP 2012247622 A JP2012247622 A JP 2012247622A JP 2012247622 A JP2012247622 A JP 2012247622A JP 2014094350 A JP2014094350 A JP 2014094350A
Authority
JP
Japan
Prior art keywords
water
treated water
vacuum
treated
deaeration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2012247622A
Other languages
Japanese (ja)
Inventor
Katsumi Yamamoto
克美 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nomura Micro Science Co Ltd
Original Assignee
Nomura Micro Science Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nomura Micro Science Co Ltd filed Critical Nomura Micro Science Co Ltd
Priority to JP2012247622A priority Critical patent/JP2014094350A/en
Publication of JP2014094350A publication Critical patent/JP2014094350A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Physical Water Treatments (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a vacuum deaeration apparatus allowing reduction of installation and apparatus costs in installing a vacuum deaeration apparatus.SOLUTION: A vacuum deaeration apparatus utilizing a water head pressure includes a deaeration tower body which is provided with a packed layer of a gas-liquid contact material in its gas-tight inside, supplies to-be-treated water from above the packed layer and discharges treated water from a treated water discharge outlet under the packed layer and also discharges the inside gas by evacuating means, a connection pipe discharging the treated water from the treated water discharge outlet and a treated water tank having a water level of stored water lower than the lower part of the packed layer by a height H corresponding to the height or higher at which the vacuum of the deaeration tower body is kept with respect to the atmospheric pressure, with the water level set constant above the lower end of the connection pipe.

Description

本発明は、水頭圧を利用した真空脱気装置に係り、特に、占有容積を削減するとともに重量を軽減した、省スペース型、低コスト型の、水頭圧を利用した真空脱気装置に関する。   The present invention relates to a vacuum deaeration device using water head pressure, and more particularly to a space-saving, low-cost vacuum deaeration device using water head pressure that reduces the occupied volume and weight.

従来、半導体製造分野、医薬品製造分野などでは非常に純度の高い純水が使用されている。このような純水を製造する設備として、原水から懸濁物質などを除去して前処理水とする前処理設備、前処理水からイオン、有機物、溶存ガスなどを除去して一次純水とする一次純水設備、一次純水を更に高純度とするための二次純水設備を備えた純水製造設備が用いられている。この純水製造設備は、製造された純水がユースポイントに供給され、ユースポイントで使用されない残部がリターン配管を介して一次純水設備の後段に設置された一次純水タンクに循環されるよう構成されている。   Conventionally, highly pure water has been used in the semiconductor manufacturing field, the pharmaceutical manufacturing field, and the like. As equipment for producing such pure water, pretreatment equipment that removes suspended solids from raw water to prepare pretreated water, and ions, organic substances, dissolved gases, etc. are removed from pretreated water to obtain primary pure water. A pure water production facility including a primary pure water facility and a secondary pure water facility for further purifying the primary pure water is used. In this deionized water production facility, the produced deionized water is supplied to the use point, and the remaining portion not used at the use point is circulated to the primary deionized water tank installed at the rear stage of the primary deionized water facility via the return pipe. It is configured.

このような純水製造設備の一次純水設備では、水中の溶存気体を除去するために真空脱気装置が用いられている。   In the primary pure water equipment of such pure water production equipment, a vacuum deaerator is used to remove dissolved gas in the water.

図6は、従来の真空脱気装置の一例を示す概略図である。同図に示すように、この真空脱気装置は、直立された円筒状の脱気塔本体1が地上に設けた基台上に据え付けられた構造とされており、脱気塔本体1内には、気液接触材の充填された充填層2が配置され、その下方に処理水貯溜部3が配置されている。被処理水は自動弁41の介装された給水管5を通じて供給されるようになっている。   FIG. 6 is a schematic view showing an example of a conventional vacuum degassing apparatus. As shown in the figure, this vacuum degassing apparatus has a structure in which an upright cylindrical deaeration tower body 1 is installed on a base provided on the ground, Is provided with a packed bed 2 filled with a gas-liquid contact material, and a treated water reservoir 3 is disposed therebelow. The water to be treated is supplied through a water supply pipe 5 provided with an automatic valve 41.

脱気処理は次のように行われる。すなわち、上方から真空ポンプ6により内部の気体が吸引されて減圧状態とされるとともに、被処理水は給水管5に接続されたノズル7から注下され、充填層2を流下する過程で溶存気体が除去されて処理水貯溜部3に貯溜される。処理水は処理水貯留部3から移送ポンプ8により排出される。処理水貯留部3には水位を常時検知する水位センサー9が設置されており、移送ポンプ8の下流に設置された水位コントロール弁42が水位センサー9の出力により制御装置10で制御されて、処理水貯溜部3の水位は所定の水位で維持されるようになっている。   The deaeration process is performed as follows. That is, the internal gas is sucked from above by the vacuum pump 6 to be in a reduced pressure state, and the water to be treated is poured from the nozzle 7 connected to the water supply pipe 5 and dissolved gas in the process of flowing down the packed bed 2. Is removed and stored in the treated water storage unit 3. The treated water is discharged from the treated water storage unit 3 by the transfer pump 8. A water level sensor 9 that constantly detects the water level is installed in the treated water storage unit 3, and a water level control valve 42 installed downstream of the transfer pump 8 is controlled by the control device 10 according to the output of the water level sensor 9, and treated. The water level of the water reservoir 3 is maintained at a predetermined water level.

また、脱気塔本体1の周辺には処理水貯留部3の水位を維持するために、水位センサー9や制御装置10以外にも、水位センサー9の検知信号を出力する各種計器類など周辺機器類が設置されている。   In addition to the water level sensor 9 and the control device 10, in order to maintain the water level of the treated water storage unit 3 in the vicinity of the deaeration tower body 1, peripheral devices such as various instruments that output detection signals of the water level sensor 9 Kind is installed.

この真空脱気装置では、処理水貯溜部3の上部容積が減圧されているため、処理水貯留部3の水位が低く有効吸込揚程が確保されていないと、処理水貯留部3から処理水を移送ポンプ8で排出する際に移送ポンプの吸込口で真空負圧に起因するキャビテーションが発生するおそれがある。このような理由に加え、実際には処理水の水位コントロールの安全マージンが考慮され、処理水貯溜部3の水位は6m程度以上になるのが普通である。   In this vacuum degassing apparatus, since the upper volume of the treated water reservoir 3 is reduced, if the water level of the treated water reservoir 3 is low and an effective suction head is not secured, treated water is removed from the treated water reservoir 3. When discharging with the transfer pump 8, there is a risk that cavitation due to vacuum negative pressure may occur at the suction port of the transfer pump. In addition to the above reasons, in practice, a safety margin for controlling the water level of the treated water is considered, and the water level of the treated water reservoir 3 is usually about 6 m or more.

このような従来の真空脱気装置は、真空脱気装置自体の強度に加え多量の処理水を保持するための強度が付与されるので重量が大きくなる上に、処理水の重量も加わる。そのため、これを設置する場合には、建造物の床面や構造物(基台等)の補強工事を行う必要があり、工事費用が増大するという問題があった。さらに、真空脱気装置の高さを確保するため2階のフロアの一部を貫通させる場合もあり、真空脱気装置の設置場所が著しく制限されるという問題もあった。   Such a conventional vacuum degassing apparatus is given a strength for holding a large amount of treated water in addition to the strength of the vacuum degassing apparatus itself, so that the weight is increased and the weight of the treated water is also added. Therefore, when installing this, it is necessary to reinforce the floor of the building and the structure (base, etc.), and there is a problem that the construction cost increases. Furthermore, in order to ensure the height of the vacuum degassing device, a part of the floor on the second floor may be penetrated, and there is a problem that the installation location of the vacuum degassing device is remarkably limited.

このような問題に対し、脱気塔本体の処理水排出口と移送ポンプの吸引口とを連結管により接続し、運転時の吸込水面を連結管内に位置するよう設定し、かつ、連結管内の水面と移送ポンプの軸中心間の高さが当該ポンプの有効吸込揚程より大きくされた真空脱気装置が知られている(特許文献1、参照)。   For such problems, the treated water discharge port of the deaeration tower body and the suction port of the transfer pump are connected by a connecting pipe, the suction water surface during operation is set to be located in the connecting pipe, and the inside of the connecting pipe A vacuum deaeration device is known in which the height between the water surface and the shaft center of the transfer pump is larger than the effective suction lift of the pump (see Patent Document 1).

特許第4119022号Japanese Patent No. 4119022

しかしながら、近年、純水水質への要求が厳しくなるに伴い、純水製造設備に設置される水処理装置の数や種類が増大し、純水製造設備全体としての建設費用が増大している。そのため、真空脱気装置や真空脱気装置を備える純水製造設備では、更なる省スペース化や、工事費用や設備費用を低減することが求められている。
さらに、純水製造設備は多様な地域に設置されるため、周囲の環境によっては、周辺機器類が例えば凍結することで故障するおそれがあった。特に、処理水貯留部3の水位をコントロールするための自動弁41、水位センサー9、水位コントロール弁42が故障するというトラブルへの対策が求められている。
However, in recent years, as the demand for pure water quality becomes severe, the number and types of water treatment devices installed in the pure water production facility have increased, and the construction cost of the pure water production facility as a whole has increased. For this reason, in a pure water production facility equipped with a vacuum deaeration device or a vacuum deaeration device, it is required to further reduce the space and to reduce construction costs and facility costs.
Furthermore, since the deionized water production facility is installed in various regions, depending on the surrounding environment, there is a risk that peripheral devices may break down due to, for example, freezing. In particular, a countermeasure is required for a trouble that the automatic valve 41, the water level sensor 9, and the water level control valve 42 for controlling the water level of the treated water storage unit 3 break down.

本発明は、かかる従来の問題を解消すべくなされたもので、真空脱気装置を設置する場合の工事費用や設備費用の削減を可能とした真空脱気装置を提供することを目的とする。   The present invention has been made to solve such a conventional problem, and an object of the present invention is to provide a vacuum deaeration device capable of reducing construction costs and equipment costs when installing the vacuum deaeration device.

さらに、真空脱気装置の占有容積を削減するとともに設置場所の自由度を顕著に増した省スペース型の真空脱気装置を提供することを目的とする。   It is another object of the present invention to provide a space-saving vacuum degassing device that reduces the occupied volume of the vacuum degassing device and significantly increases the degree of freedom of installation location.

さらに、連結管の周辺機器類を省略して、より安全な運転を可能とし、運転管理を容易とした低コスト型の真空脱気装置を提供することを目的とする。   It is another object of the present invention to provide a low-cost vacuum degassing device that omits the peripheral devices of the connecting pipe, enables safer operation, and facilitates operation management.

本発明の水頭圧を利用した真空脱気装置は、気密に形成された内部に気液接触材の充填層を備え、前記充填層の上方から被処理水を供給し、前記充填層の下方の処理水排出口から処理水を排出するとともに、真空手段により内部の気体を排出するようにした脱気塔本体と、前記処理水排出口から前記処理水を排出する連結管と、前記充填層の下部から大気圧に対し前記脱気塔本体内の真空が維持される高さ以上の高さHだけ下方に貯留水の水位を有し、前記連結管の下端より上に一定に前記水位を設定した処理水槽と、を有することを特徴とする。
本発明の真空脱気装置では、高さHを確保できれば、脱気塔本体と処理水槽の水平位置関係は問わず、また、連結管の配管経路を問わず、連結管の周辺機器類も必要がないから、設置容積を削減して設置場所や設置形態の自由度を増すことができる。
The vacuum deaeration device using the water head pressure of the present invention includes a gas-liquid contact material packed layer in an airtight interior, supplies water to be treated from above the packed layer, and is disposed below the packed layer. A degassing tower main body that discharges treated water from the treated water discharge port and discharges internal gas using vacuum means, a connecting pipe that discharges the treated water from the treated water discharge port, and a packed bed The lower part of the connecting pipe has a water level below the height H that is equal to or higher than the height at which the vacuum in the deaeration tower main body is maintained with respect to atmospheric pressure from the bottom, and the water level is set above the lower end of the connecting pipe. A treated water tank.
In the vacuum degassing apparatus of the present invention, if the height H can be secured, the horizontal positional relationship between the deaeration tower body and the treatment water tank is not required, and peripheral devices for the connecting pipe are also required regardless of the piping path of the connecting pipe. Therefore, it is possible to reduce the installation volume and increase the degree of freedom of the installation location and installation form.

本発明において、前記連結管は、前記処理水が連続的に自然流下するよう構成されていることが好ましい。この場合、連結管の周辺機器類が不要であり、より安全な運転を可能とするとともに、運転管理を容易とすることができる。   In this invention, it is preferable that the said connection pipe is comprised so that the said treated water may flow down naturally continuously. In this case, peripheral devices for the connecting pipe are unnecessary, and safer operation is possible and operation management can be facilitated.

また、本発明において、前記脱気塔本体下部には実質的に処理水貯溜部が設けられていないことが好ましい。この場合、真空脱気装置の重量をより軽減できるから、工事費用を削減することができる。   Moreover, in this invention, it is preferable that the treated water storage part is not provided substantially in the said deaeration tower main body lower part. In this case, since the weight of the vacuum deaerator can be further reduced, the construction cost can be reduced.

さらに、本発明において、前記脱気塔本体と前記処理水槽は、建造物の上階と下階に設置されていることが好ましい。この場合、真空脱気装置の設置場所をより自由にすることができる。   Furthermore, in this invention, it is preferable that the said deaeration tower main body and the said treated water tank are installed in the upper floor and lower floor of a building. In this case, the installation location of the vacuum deaerator can be made more free.

このように本発明の真空脱気装置によれば、設置容積を削減して設置場所の自由度を増すことができるから、大型の純水製造設備にも容易に適用することができる。
そして、本発明の真空脱気装置は、大型の純水製造設備に適用した場合にも、床を補強する大掛かりな工事が必要なく、連結管の周辺機器類を削減できるから、コストを低減することができる。
As described above, according to the vacuum degassing apparatus of the present invention, the installation volume can be reduced and the degree of freedom of the installation location can be increased. Therefore, the vacuum degassing apparatus can be easily applied to a large-scale pure water production facility.
The vacuum degassing apparatus of the present invention does not require a large-scale construction for reinforcing the floor even when applied to a large-scale pure water production facility, and can reduce the peripheral equipment of the connecting pipe, thereby reducing the cost. be able to.

本発明の真空脱気装置によれば、真空脱気装置の設置容積を削減して設置場所の自由度を増すことができる。
さらに、本発明の真空脱気装置によれば、脱気塔本体の重量を軽減して工事費用を削減することができる。
さらに、本発明の真空脱気装置によれば、処理水貯留部を実質備えていないため、その水位コントロールのための周辺機器類を削減することができる。
According to the vacuum degassing apparatus of the present invention, it is possible to reduce the installation volume of the vacuum degassing apparatus and increase the degree of freedom of the installation location.
Furthermore, according to the vacuum degassing apparatus of the present invention, the construction cost can be reduced by reducing the weight of the degassing tower body.
Furthermore, according to the vacuum degassing apparatus of the present invention, since the treated water reservoir is not substantially provided, peripheral devices for controlling the water level can be reduced.

本発明による実施形態の真空脱気装置を概略的に示す図である。It is a figure showing roughly the vacuum deaeration device of the embodiment by the present invention. 本発明による実施形態の純水製造設備を概略的に示すブロック図である。It is a block diagram showing roughly pure water manufacturing equipment of an embodiment by the present invention. 実施形態の純水製造設備の一例を示す概略図である。It is the schematic which shows an example of the pure water manufacturing equipment of embodiment. 実施例の純水製造設備の一例を示す概略図である。It is the schematic which shows an example of the pure water manufacturing equipment of an Example. 実施例の純水製造設備の一例を示す概略図である。It is the schematic which shows an example of the pure water manufacturing equipment of an Example. 従来の真空脱気装置の構成を概略的に示す図である。It is a figure which shows schematically the structure of the conventional vacuum deaeration apparatus. 比較例の純水製造設備の一例を示す概略図である。It is the schematic which shows an example of the pure water manufacturing equipment of a comparative example.

以下、本発明の実施形態について、図面を参照して説明する。本発明は以下の実施形態に限定されるものではない。なお、各図において同様の機能をもつ部分には同一の符号を付して説明を省略する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. The present invention is not limited to the following embodiments. In addition, in each figure, the same code | symbol is attached | subjected to the part which has the same function, and description is abbreviate | omitted.

(第1の実施形態)
図1は、本発明による第1の実施形態の構成を概略的に示す図である。
図1に示される真空脱気装置11の脱気塔本体12内には、空隙率の大きい気液接触材が多数充填された充填層13が配設されている。充填層13の下部は脱気塔本体12の底部を構成する鏡板による容積であり、鏡板の中央部には処理水排水口14が開口している。このように、充填層13の下方には従来の真空脱気装置に設けられているような処理水貯溜部は実質的に設けられていない。
(First embodiment)
FIG. 1 is a diagram schematically showing a configuration of a first embodiment according to the present invention.
In the degassing tower body 12 of the vacuum degassing apparatus 11 shown in FIG. 1, a packed bed 13 filled with a large number of gas-liquid contact materials having a large porosity is disposed. The lower part of the packed bed 13 is the volume of the end plate constituting the bottom of the deaeration tower body 12, and the treated water drain port 14 is opened at the center of the end plate. Thus, the treated water reservoir as provided in the conventional vacuum degassing apparatus is not substantially provided below the packed bed 13.

符号15は給水管であり、被処理水は給水管15から供給され、充填層13上に設置された図示を省略したシャワーヘッドから充填層13に注下されるようになっている。処理水中の溶存気体濃度をより低減するために、このシャワーヘッドと充填層の組は複数段設けられていてもよい。   Reference numeral 15 denotes a water supply pipe, and the water to be treated is supplied from the water supply pipe 15 and is poured into the packed bed 13 from a shower head (not shown) installed on the packed bed 13. In order to further reduce the dissolved gas concentration in the treated water, a plurality of sets of the shower head and the packed bed may be provided.

符号16は真空引き用の脱気管であり、真空ポンプ17により脱気塔本体12内の気体を吸引脱気するようになっている。真空ポンプ17により脱気塔本体12内は被処理水が沸騰しない圧力以上、例えば、3.1〜26.7kPa(23〜200Torr)程度の真空とされる。   Reference numeral 16 is a deaeration pipe for evacuation, and the vacuum pump 17 sucks and degass the gas in the deaeration tower body 12. The inside of the deaeration tower body 12 is evacuated by a vacuum pump 17 to a pressure higher than the pressure at which the water to be treated does not boil, for example, about 3.1 to 26.7 kPa (23 to 200 Torr).

この脱気塔本体12は、建造物のフロア18に設置固定されており、このフロア18より下のフロア19には処理水槽20が設置されている。脱気塔本体12の処理水排水口14に接続された連結管22が処理水槽20の入水口21を通じて処理水槽20に挿入されている。
このとき、脱気塔本体12と処理水槽20は、同一建造物又は隣接する建造物の上階及び下階にそれぞれ設置することができる。また、脱気塔本体12を建造物の外に設置した基台等の構造物上に設置することもできる。
The deaeration tower main body 12 is installed and fixed on a floor 18 of a building, and a treated water tank 20 is installed on a floor 19 below the floor 18. A connecting pipe 22 connected to the treated water drain port 14 of the deaeration tower body 12 is inserted into the treated water tank 20 through the water inlet 21 of the treated water tank 20.
At this time, the deaeration tower body 12 and the treated water tank 20 can be respectively installed on the upper floor and the lower floor of the same building or an adjacent building. Moreover, the deaeration tower main body 12 can also be installed on a structure such as a base installed outside the building.

処理水槽20の出水口には下流へ処理水を送り出すポンプ23が配置されている。   A pump 23 for sending treated water downstream is disposed at the outlet of the treated water tank 20.

処理水槽20の水面から充填層13の下部までの高さHは、処理水槽20の水面にかかる大気圧に対して脱気塔本体12内の真空が保持される高さ以上とされる。この高さHの上限は、脱気塔本体12が設置できる高さであれば限定されない。このように構成することで、連結管22内の水位は、脱気塔本体12内の真空度に応じた所定の高さhで維持される。   The height H from the water surface of the treated water tank 20 to the lower part of the packed bed 13 is set to be higher than the height at which the vacuum in the deaeration tower body 12 is maintained with respect to the atmospheric pressure applied to the water surface of the treated water tank 20. The upper limit of the height H is not limited as long as the deaeration tower body 12 can be installed. With this configuration, the water level in the connecting pipe 22 is maintained at a predetermined height h corresponding to the degree of vacuum in the deaeration tower body 12.

連結管22の内径は、処理水の水位を連結管22内に維持するように、脱気塔本体12内の真空度と高さHに応じて適宜設計することができる。連結管22の内径は、連結管22内の処理水の線流束が好ましくは10m/s以下、より好ましくは5m/s以下となるようにする。このようにして処理水が連続的に連結管22内を流下するようにすることが好ましい。そのため、脱気塔本体12内の真空度を安定に維持するとともに、処理水の水位を連結管22内の所定の上下範囲内に維持することができる。さらに、連結管22内の、水位より上方に逆止弁等を介設すれば、処理水槽20内の処理水の水位が連結管22の下端22aより低くなるというトラブルが起きても、処理水や、処理水槽をシールする不活性ガスなどの逆流を防ぐことができ、真空脱気装置の安全な運転が可能となる。   The inner diameter of the connection pipe 22 can be appropriately designed according to the degree of vacuum and the height H in the deaeration tower body 12 so that the water level of the treated water is maintained in the connection pipe 22. The inner diameter of the connecting pipe 22 is set so that the linear flux of the treated water in the connecting pipe 22 is preferably 10 m / s or less, more preferably 5 m / s or less. In this way, it is preferable that the treated water continuously flows down in the connecting pipe 22. Therefore, the degree of vacuum in the deaeration tower body 12 can be stably maintained, and the water level of the treated water can be maintained within a predetermined upper and lower range in the connection pipe 22. Further, if a check valve or the like is provided above the water level in the connecting pipe 22, the treated water in the treated water tank 20 can be treated even if there is a problem that the water level is lower than the lower end 22 a of the connecting pipe 22. In addition, the backflow of an inert gas or the like that seals the treatment water tank can be prevented, and the vacuum degassing apparatus can be operated safely.

処理水槽20の壁面にはレベルセンサー24が取り付けられている。そして、レベルセンサー24により検知される処理水槽20の水位が、連結管22の下端22a以上の所定の一定の高さを維持するように、図示しない制御装置がポンプ23の吐出量又はオン・オフを制御するようになっている。   A level sensor 24 is attached to the wall surface of the treated water tank 20. Then, a control device (not shown) controls the discharge amount of the pump 23 or on / off so that the water level of the treated water tank 20 detected by the level sensor 24 maintains a predetermined constant height above the lower end 22a of the connecting pipe 22. Is to control.

また、処理水槽20は処理水の汚染を抑制するためにその上部が窒素ガスなどの不活性ガスでシールされている。そのため、処理水槽20の近傍に、例えば不活性ガスボンベ26を設置して、ガス供給管27を介して処理水槽20へ不活性ガスを供給してもよい。
このとき、高さHが変動して大きくなり、処理水槽20の水位が連結管22の下端22aより低くならないように、処理水槽20内の不活性ガスの圧力は、正圧であればよく、0.1〜1.0kPaであることがより好ましい。
Further, the upper portion of the treated water tank 20 is sealed with an inert gas such as nitrogen gas in order to suppress the contamination of the treated water. Therefore, for example, an inert gas cylinder 26 may be installed in the vicinity of the treatment water tank 20 and the inert gas may be supplied to the treatment water tank 20 via the gas supply pipe 27.
At this time, the pressure of the inert gas in the treated water tank 20 may be a positive pressure so that the height H fluctuates and becomes large, and the water level of the treated water tank 20 does not become lower than the lower end 22a of the connecting pipe 22. More preferably, it is 0.1-1.0 kPa.

処理水槽20の容量は特に限定されず、従来の処理水貯留部と同程度の容量であってもよい。   The capacity | capacitance of the treated water tank 20 is not specifically limited, The capacity | capacitance comparable as the conventional treated water storage part may be sufficient.

本実施形態の脱気塔本体12は、上記した高さHで処理水槽20の上方に設置されているため、ポンプ23は、脱気塔本体12の真空度に依らず、処理流量に応じて揚程や吐出量を選択して用いることができる。さらに、ポンプ23の吸引側におけるキャビテーション発生のおそれがない。   Since the deaeration tower main body 12 of this embodiment is installed above the treatment water tank 20 at the above-described height H, the pump 23 depends on the treatment flow rate regardless of the degree of vacuum of the deaeration tower main body 12. The head and discharge amount can be selected and used. Furthermore, there is no risk of cavitation on the suction side of the pump 23.

本実施形態では、被処理水の流量が大きくなる程真空脱気装置の重量が大きくなるため、例えば、処理流量が50m/h以上であるとより顕著な効果が得られる。さらに、本実施形態では占有容積を大幅に削減することができるから、真空脱気装置を純水製造設備に備えられる他の水処理装置に対して適切な位置に設置することができる。 In this embodiment, since the weight of the vacuum degassing device increases as the flow rate of the water to be treated increases, for example, a more remarkable effect is obtained when the treatment flow rate is 50 m 3 / h or more. Furthermore, since the occupied volume can be significantly reduced in this embodiment, the vacuum deaeration device can be installed at an appropriate position with respect to other water treatment devices provided in the pure water production facility.

本実施形態では、被処理水は特に限定されず、市水、井水、工業用水等を脱気処理することができる。また、水処理設備や純水製造設備に組み込まれた各水処理装置の処理水を脱気処理することもできる。   In this embodiment, to-be-processed water is not specifically limited, City water, well water, industrial water, etc. can be deaerated. In addition, the treated water of each water treatment apparatus incorporated in the water treatment facility or the pure water production facility can be deaerated.

このように、本実施形態では、高さHさえ確保することができれば、連結管22内の水位をモニタリングしたり制御したりする格別の工夫は必要がない。そのため、連結管22は直管である必要がなく、どのような経路であってもよい。さらに、前後に配置される水処理装置との水平位置関係を問わないため、真空脱気装置の設置場所や配管経路などの自由度が大幅に増すことになる。さらに、本実施形態の真空脱気装置は、脱気塔本体12に処理水貯溜部を有していないため、真空脱気装置自体の重量を軽減して、脱気塔本体12を据え付ける基台など基礎の建設や建造物の補強工事などが軽減できるから、このための工事費用を削減することができる。   Thus, in this embodiment, as long as the height H can be ensured, there is no need for a special device for monitoring or controlling the water level in the connecting pipe 22. Therefore, the connecting pipe 22 does not need to be a straight pipe and may be any route. Furthermore, since it does not ask | require horizontal positional relationship with the water treatment apparatus arrange | positioned forward and backward, the freedom degree, such as an installation place of a vacuum deaeration apparatus and a piping path | route, increases significantly. Furthermore, since the vacuum deaeration apparatus of this embodiment does not have a treated water storage part in the deaeration tower body 12, the base for installing the deaeration tower body 12 while reducing the weight of the vacuum deaeration apparatus itself. Since construction of foundations and reinforcement work for buildings can be reduced, construction costs for this can be reduced.

(第2の実施形態)
次に、第1の実施形態の真空脱気装置を備えた純水製造設備の実施形態について以下に説明する。
(Second Embodiment)
Next, an embodiment of a pure water production facility provided with the vacuum degassing apparatus of the first embodiment will be described below.

図2は本発明による第2の実施形態を示すブロック図である。
図2に示される純水製造設備30は、前処理設備31、前処理設備31の後段に配置され、前処理水を貯留するタンクT1、タンクT1の後段の一次純水設備32、一次純水を貯留するタンクT3、タンクT3の後段の二次純水設備33を備えている。
FIG. 2 is a block diagram showing a second embodiment according to the present invention.
A pure water production facility 30 shown in FIG. 2 is arranged at the rear stage of the pretreatment facility 31 and the pretreatment facility 31, and the tank T1 for storing the pretreatment water, the primary pure water facility 32 at the rear stage of the tank T1, and the primary pure water. Are stored in the tank T3 and the secondary pure water equipment 33 downstream of the tank T3.

一次純水設備は、活性炭装置(AC)321、陽イオン交換装置(SC)322、脱気装置(DG)323、陰イオン交換装置(SA)324、タンクT2、ポンプP、逆浸透膜装置(RO)325、紫外線酸化装置(TOC−UV)326、混床式イオン交換装置(MB)327、膜脱気装置(MDG)328を順に備えている。二次純水設備33は、タンクT3の後段にポンプPを介して、熱交換器(HEX)331、紫外線酸化装置(TOC−UV)332、ポリッシャー333、膜脱気装置(MDG)334、限外ろ過膜装置(UF)335をこの順に備えている。   The primary deionized water equipment includes activated carbon device (AC) 321, cation exchange device (SC) 322, degassing device (DG) 323, anion exchange device (SA) 324, tank T2, pump P, reverse osmosis membrane device ( RO) 325, an ultraviolet oxidizer (TOC-UV) 326, a mixed bed ion exchanger (MB) 327, and a membrane degasser (MDG) 328 are provided in this order. The secondary pure water equipment 33 includes a heat exchanger (HEX) 331, an ultraviolet oxidizer (TOC-UV) 332, a polisher 333, a membrane deaerator (MDG) 334, a limiter, via a pump P at the rear stage of the tank T3. An outer filtration membrane device (UF) 335 is provided in this order.

この純水製造設備では、50〜500m/h程度で純水がユースポイント(POU)に供給されるが、例えば、膜脱気装置328に替えて第1の実施形態の真空脱気装置を用いることができる。第1の実施形態によれば、上記したように高さHを確保できればその設置位置や配管経路は問わないだけでなく、連結管に周辺機器類を設置する必要がない。そのため、純水製造設備に容易に適用することができる。さらに、処理流量に合わせて脱気塔本体12の大きさを容易に変更することができる。 In this pure water production facility, pure water is supplied to the use point (POU) at about 50 to 500 m 3 / h. For example, instead of the membrane deaerator 328, the vacuum deaerator of the first embodiment is used. Can be used. According to the first embodiment, as long as the height H can be ensured as described above, the installation position and the piping path are not limited, and it is not necessary to install peripheral devices on the connecting pipe. Therefore, it can be easily applied to a pure water production facility. Furthermore, the size of the deaeration tower body 12 can be easily changed according to the processing flow rate.

また、この場合には、被処理水は前段の水処理設備で処理されており、溶存炭酸濃度は1mg/L以下、比抵抗18.0MΩ・cm以上とされている。脱気塔本体12内を3.1〜20.0kPa(23〜150Torr)に減圧して、この被処理水を供給することで、処理水中の溶存酸素濃度を1μg/L以下とすることができる。脱気塔本体12の下部にガス供給管を設置して、窒素ガスなどの不活性ガスを脱気塔本体内に少量注入すれば、酸素の除去効率を高め、例えば、処理水中の溶存酸素濃度を0.5μg/L以下とすることができる。   Moreover, in this case, the water to be treated is treated by the water treatment facility in the previous stage, the dissolved carbonic acid concentration is 1 mg / L or less, and the specific resistance is 18.0 MΩ · cm or more. By depressurizing the inside of the deaeration tower body 12 to 3.1 to 20.0 kPa (23 to 150 Torr) and supplying the water to be treated, the dissolved oxygen concentration in the treated water can be 1 μg / L or less. . If a gas supply pipe is installed in the lower part of the degassing tower main body 12 and an inert gas such as nitrogen gas is injected into the degassing tower main body in a small amount, the oxygen removal efficiency can be improved, for example, the dissolved oxygen concentration in the treated water Can be 0.5 μg / L or less.

また、図3は、脱気装置323として第1の実施形態の真空脱気装置を設置する場合の概略図である。図2に示されるような純水製造設備では、脱気装置323として空気曝気により脱気する常圧又は有圧の脱炭酸塔を屋外に設置している。
これに対し、第1の実施形態の真空脱気装置によれば、建造物内に真空脱気装置を構成する脱気塔本体12及び連結管22を他の水処理装置の設置場所に応じて好適な位置に設置することができるし、従来の脱炭酸塔に替えて真空脱気装置を備える場合でも建造物の補強工事を行う必要がない。
FIG. 3 is a schematic view when the vacuum degassing apparatus according to the first embodiment is installed as the degassing apparatus 323. In the deionized water production facility as shown in FIG. 2, a normal pressure or pressurized decarbonation tower that deaerates by air aeration is installed outdoors as the deaerator 323.
On the other hand, according to the vacuum deaeration apparatus of 1st Embodiment, the deaeration tower main body 12 and the connecting pipe 22 which comprise a vacuum deaeration apparatus in a building are set according to the installation place of another water treatment apparatus. It can be installed in a suitable position, and even if a vacuum degassing device is provided instead of the conventional decarboxylation tower, there is no need to reinforce the building.

純水製造設備30において、脱気装置323として第1の実施形態の真空脱気装置を用いる場合には、前段の陽イオン交換装置に充填される樹脂としてH型の強酸性イオン交換樹脂を用い、この陽イオン交換装置で処理されて液性がpH4〜5程度の酸性となった供給水が脱気塔本体12内に注下される。同時に、真空ポンプ17により脱気塔本体12内を3.1〜20.0kPa(23〜150Torr)に減圧する。また、供給水の流量に対し0.5〜5%の窒素ガスなどの不活性ガスを注入させることで、溶存炭酸濃度を低減してもよい。このように本実施形態の真空脱気装置を用いることで、溶存炭酸濃度は10mg/L以下とすることができる。   In the pure water production facility 30, when the vacuum degassing apparatus of the first embodiment is used as the degassing apparatus 323, an H-type strongly acidic ion exchange resin is used as the resin charged in the cation exchange apparatus in the previous stage. The feed water that has been treated with this cation exchange device and has become acidic with a liquidity of about pH 4 to 5 is poured into the deaeration tower body 12. At the same time, the inside of the deaeration tower body 12 is depressurized to 3.1 to 20.0 kPa (23 to 150 Torr) by the vacuum pump 17. Moreover, you may reduce dissolved carbonic acid density | concentration by inject | pouring inert gas, such as 0.5-5% of nitrogen gas with respect to the flow volume of supply water. Thus, the dissolved carbonic acid concentration can be made 10 mg / L or less by using the vacuum deaerator of this embodiment.

このようにして一次純水設備で製造された一次純水はそのまま医療用水、医薬製造用水、半導体製造装置の冷却用水などとして使用することができる。一次純水を二次純水設備33でさらに処理して比抵抗18.2MΩ・cm以上、溶存酸素濃度1μg/L以下の高純度の純水とすれば、半導体製造工程におけるウェハー洗浄用水などとして好適に使用することができる。   Thus, the primary pure water manufactured by the primary pure water facility can be used as it is as medical water, pharmaceutical manufacturing water, cooling water for semiconductor manufacturing equipment, and the like. If the primary pure water is further processed by the secondary pure water facility 33 to obtain high-purity pure water having a specific resistance of 18.2 MΩ · cm or more and a dissolved oxygen concentration of 1 μg / L or less, it can be used as wafer cleaning water in the semiconductor manufacturing process. It can be preferably used.

以上のように第1の実施形態の真空脱気装置を用いて純水製造設備を構成する場合には、設置容積や工事費用を削減するとともに従来の真空脱気装置に必要であった周辺機器類が不要であるから、設置や設計の自由度を高め、コストを削減することができる。   As described above, when the pure water production facility is configured using the vacuum degassing apparatus according to the first embodiment, the peripheral equipment required for the conventional vacuum degassing apparatus is reduced while reducing the installation volume and the construction cost. Since no kind is required, the degree of freedom of installation and design can be increased and the cost can be reduced.

なお、本発明の真空脱気装置は上記した実施形態に限定されることなく、本発明の効果を損なわない範囲で、各種の純水製造設備や水処理設備に適用することができる。   The vacuum degassing apparatus of the present invention is not limited to the above-described embodiment, and can be applied to various types of pure water production equipment and water treatment equipment as long as the effects of the present invention are not impaired.

次に本発明の実施例について説明する。
(実施例1)
図2の純水製造設備において、混床式イオン交換装置327から熱交換器331までを、第1の実施形態の真空脱気装置328aを用いて同一の建造物100内に設置する。実施例1の純水製造設備の一部の概略構成図を図4に示す。
建造物は地下1階を有する2階建であり、2階部分(符号18)に第1の実施形態の真空脱気装置328aの脱気塔本体12を設置し、地下のタンクT3を処理水槽20として用いている。
真空脱気装置328aにおいて、脱気塔本体12の高さは4.5m、タンクT3の容量は200mである。
Next, examples of the present invention will be described.
Example 1
In the pure water production facility of FIG. 2, the mixed bed type ion exchange device 327 to the heat exchanger 331 are installed in the same building 100 using the vacuum deaeration device 328a of the first embodiment. FIG. 4 shows a schematic configuration diagram of a part of the pure water production facility according to the first embodiment.
The building is a two-story building with a first basement floor, the deaeration tower body 12 of the vacuum deaeration device 328a of the first embodiment is installed on the second floor part (reference numeral 18), and the underground tank T3 is treated as a treated water tank. 20 is used.
In the vacuum degassing apparatus 328a, the height of the degassing tower body 12 is 4.5 m, the capacity of the tank T3 is 200 meters 3.

実施例1では、脱気塔本体12を建造物内に設置することができるので、この場合、真空脱気装置前後で従来の真空脱気装置を用いた場合に比べおおよそ30〜50%の容積を削減することができる。また連結管22に周辺機器類を設置する必要もない。   In Example 1, since the deaeration tower main body 12 can be installed in a building, in this case, the volume is approximately 30 to 50% compared with the case where a conventional vacuum deaeration device is used before and after the vacuum deaeration device. Can be reduced. Further, there is no need to install peripheral devices in the connecting pipe 22.

(実施例2)
実施例1において、真空脱気装置328aを建造物100の屋上101に設置する。実施例2の純水製造設備の一部の概略構成図を図5に示す。
実施例2のように、実施形態の真空脱気装置は、従来の真空脱気装置に比べて重量を軽減できるだけでなく、連結管22に周辺機器類を設置する必要がないため、脱気塔本体12を建造物の屋上に設置することができる。
(Example 2)
In the first embodiment, the vacuum deaerator 328 a is installed on the roof 101 of the building 100. FIG. 5 shows a schematic configuration diagram of a part of the pure water production facility according to the second embodiment.
As in Example 2, the vacuum degassing apparatus according to the embodiment can not only reduce the weight as compared with the conventional vacuum degassing apparatus, but also does not need to install peripheral devices in the connecting pipe 22, and thus the degassing tower. The main body 12 can be installed on the roof of a building.

(比較例1)
実施例1において、図6に示されるような全高10.5mの従来の真空脱気装置328bを建造物外に設置する。比較例1の純水製造設備の一部の概略構成図を図7に示す。
比較例1では、脱気塔本体1を建造物外に配置された基台の上に据え付けるため、基台の補強工事が必要である。さらに、建造物内に設置された前段の水処理装置の出水口と脱気塔本体1の給水管5を配管により接続するとともに、処理水貯溜部3を建造物内に設置された後段の水処理装置の入水口に処理水移送ポンプ8を介して配管により接続する。したがって、真空脱気装置の直前後に配置される水処理装置の建造物内の位置によっては配管経路が煩雑となってしまう。また、屋外に配置するため、環境によっては脱気塔本体1の水位コントロールのための周辺機器類の故障への対策が望まれる。
(Comparative Example 1)
In Example 1, a conventional vacuum deaerator 328b having a total height of 10.5 m as shown in FIG. 6 is installed outside the building. A schematic configuration diagram of a part of the pure water production facility of Comparative Example 1 is shown in FIG.
In Comparative Example 1, since the deaeration tower main body 1 is installed on the base placed outside the building, the base must be reinforced. Further, the outlet of the preceding water treatment apparatus installed in the building and the water supply pipe 5 of the deaeration tower body 1 are connected by piping, and the water in the latter stage in which the treated water reservoir 3 is installed in the building. It connects to the water inlet of a processing apparatus by piping via the treated water transfer pump 8. FIG. Therefore, depending on the position in the building of the water treatment device arranged immediately before and after the vacuum degassing device, the piping path becomes complicated. Moreover, since it arrange | positions outdoors, the countermeasure against the failure of peripheral equipment for the water level control of the deaeration tower main body 1 is desired depending on an environment.

11…真空脱気装置、12…脱気塔本体、13…充填層、14…処理水排水口、15…給水管、16…脱気管、17…真空ポンプ、18…フロア、19…フロア、20…処理水槽、21…入水口、22…連結管、23…ポンプ、24…レベルセンサー、25…ガス供給管、26…不活性ガスボンベ。 DESCRIPTION OF SYMBOLS 11 ... Vacuum deaeration apparatus, 12 ... Deaeration tower main body, 13 ... Packing bed, 14 ... Treated water drain, 15 ... Supply pipe, 16 ... Deaeration pipe, 17 ... Vacuum pump, 18 ... Floor, 19 ... Floor, 20 A treatment water tank, 21 a water inlet, 22 a connecting pipe, 23 a pump, 24 a level sensor, 25 a gas supply pipe, 26 an inert gas cylinder.

Claims (4)

気密に形成された内部に気液接触材の充填層を備え、前記充填層の上方から被処理水を供給し、前記充填層の下方の処理水排出口から処理水を排出するとともに、真空手段により内部の気体を排出するようにした脱気塔本体と、
前記処理水排出口から前記処理水を排出する連結管と、
前記充填層の下部から大気圧に対し前記脱気塔本体内の真空が維持される高さ以上の高さHだけ下方に貯留水の水位を有し、前記連結管の下端より上に一定に前記水位を設定した処理水槽と、
を有することを特徴とする水頭圧を利用した真空脱気装置。
A gas-liquid contact material filling layer is provided in an airtight interior, water to be treated is supplied from above the filling layer, treated water is discharged from a treated water discharge port below the filling layer, and vacuum means A degassing tower main body adapted to discharge the internal gas,
A connecting pipe for discharging the treated water from the treated water discharge port;
The lower part of the packed bed has a water level below the height H that is equal to or higher than the height at which the vacuum in the deaeration tower body is maintained with respect to atmospheric pressure, and is constant above the lower end of the connecting pipe. A treated water tank in which the water level is set;
A vacuum deaerator using water head pressure characterized by comprising:
前記連結管は、前記処理水が連続的に自然流下するよう構成されていることを特徴とする請求項1記載の真空脱気装置。   The vacuum degassing apparatus according to claim 1, wherein the connection pipe is configured such that the treated water continuously flows down naturally. 前記脱気塔本体下部には実質的に処理水貯溜部が設けられていないことを特徴とする請求項1又は2記載の真空脱気装置。   The vacuum degassing apparatus according to claim 1 or 2, wherein a treated water reservoir is substantially not provided at a lower portion of the degassing tower main body. 前記脱気塔本体と前記処理水槽は、建造物の上階と下階に設置されていることを特徴とする請求項1乃至3のいずれか1項記載の真空脱気装置。   The vacuum degassing apparatus according to any one of claims 1 to 3, wherein the deaeration tower body and the treatment water tank are installed on an upper floor and a lower floor of a building.
JP2012247622A 2012-11-09 2012-11-09 Vacuum deaeration apparatus Pending JP2014094350A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2012247622A JP2014094350A (en) 2012-11-09 2012-11-09 Vacuum deaeration apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012247622A JP2014094350A (en) 2012-11-09 2012-11-09 Vacuum deaeration apparatus

Publications (1)

Publication Number Publication Date
JP2014094350A true JP2014094350A (en) 2014-05-22

Family

ID=50937921

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012247622A Pending JP2014094350A (en) 2012-11-09 2012-11-09 Vacuum deaeration apparatus

Country Status (1)

Country Link
JP (1) JP2014094350A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111549204A (en) * 2020-05-30 2020-08-18 唐山文丰特钢有限公司 Round billet vacuum degassing device for forging

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6082184A (en) * 1980-03-24 1985-05-10 ヘンリィ シー・ラサター Device and method of deaerating water
JPH09299710A (en) * 1996-03-14 1997-11-25 Japan Organo Co Ltd Vacuum deaeration device
JP2000153267A (en) * 1998-11-24 2000-06-06 Nomura Micro Sci Co Ltd Vacuum deaeration device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6082184A (en) * 1980-03-24 1985-05-10 ヘンリィ シー・ラサター Device and method of deaerating water
JPH09299710A (en) * 1996-03-14 1997-11-25 Japan Organo Co Ltd Vacuum deaeration device
JP2000153267A (en) * 1998-11-24 2000-06-06 Nomura Micro Sci Co Ltd Vacuum deaeration device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111549204A (en) * 2020-05-30 2020-08-18 唐山文丰特钢有限公司 Round billet vacuum degassing device for forging

Similar Documents

Publication Publication Date Title
JP5961756B2 (en) Biological sewage treatment apparatus and method
KR101138382B1 (en) Electric type deionized water production apparatus operating method, electric type deionized water production system, and electric type deionized water production apparatus
JP5341862B2 (en) Water electrolysis system
JP5139924B2 (en) Operation method of hydrogen generation system
JP5910675B2 (en) Pure water production apparatus and pure water production method
KR20200031649A (en) Water treatment membrane cleaning device and cleaning method
JP2014094350A (en) Vacuum deaeration apparatus
JPS62273095A (en) Water treatment plant
US9452943B2 (en) Anaerobic water purification system and method for treating a liquid
JPH06254538A (en) Removing device for dissolving oxygen
CN100540483C (en) Vacuum self-control type membrane biological reactor
JP3912067B2 (en) Primary pure water production equipment
JP6105879B2 (en) Decarboxylation device
WO2012164948A1 (en) Hydrogen peroxide decomposition device and decomposition method for hydrogen peroxide
ES1076679U (en) Domestic plant of wastewater treatment (Machine-translation by Google Translate, not legally binding)
US20140042074A1 (en) Filtration system
JP2021016813A (en) Oxygen gas supply apparatus and sewage treatment system
US20240417288A1 (en) Electrode water recovery method and method for producing ultrapure water or pharmaceutical water
JP2016083641A (en) Reverse osmosis treatment apparatus and reverse osmosis membrane cleaning method
JP2008086984A (en) Apparatus for continuously producing and supplying deaerated water
JPH01315301A (en) Device for removing dissolved gas in pure water
CN103979752A (en) Sewage treatment method
JP2004160380A (en) Pure water production equipment
JP2007319843A (en) Gas dissolution module
KR20160099129A (en) Movable apparatus for purifying water

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20151015

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20160607

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160614

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160728

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20161011