JP2014093283A - Charged particle beam device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To identify an outer shape size of an observation sample in a state where a sample stage is stationary using one camera and set a stage movement limit range.SOLUTION: In the charged particle beam device, a plurality of reflectors 6 are provided in a sample room, and image data at a plurality of positions of an observation sample 4 is obtained with one camera 1. By performing image processing, an outer shape size of the observation sample is obtained by recognizing as image data from a plurality of positions of the observation sample, and a stage movement limit range is automatically set.

Description

  The present invention relates to a charged particle beam apparatus such as a scanning electron microscope, and more particularly to a charged particle beam apparatus having a function of setting a stage movement restriction range.

  A charged particle beam apparatus typified by an electron microscope includes a sample moving apparatus that moves a charged particle beam irradiation position on a mounted sample and moves an observation field of view and the like. The movement direction of the sample can be a five-axis movement direction: horizontal X-axis and Y-axis direction movement, vertical Z-axis direction movement, inclined T-axis movement, and R-axis movement for rotating the sample.

  The motor drive stage that moves the observation sample is provided with a stage movement restriction so that the observation sample does not come into contact with the inside of the sample chamber. Since general-purpose SEM (Scanning Electron Microscope) uses observation samples of various shapes, the sample external size is not uniform. Therefore, conventionally, the user manually measures the height of the observation sample using the size of the sample stage and the gauge, specifies the sample external size (the width and height of the sample), and manually inputs it from the input unit. The stage movement limit range for each observation sample is set. Then, by controlling the stage movement restriction range for each observation sample based on the setting, the observation sample is prevented from coming into contact with the inside of the sample chamber. (Patent Document 1)

  However, if the user cannot correctly specify (measure) the sample external size, or if the user enters the sample external size incorrectly (human error), the stage movement limit range for each observation sample is not set correctly, and the observation sample May come into contact with the inside of the sample chamber.

  In recent years, scanning electron microscopes have been used in various fields. From observation of conventional secondary electron images, observation of backscattered electron images, energy dispersive X-ray spectroscopy (EDS), and the like. There is a growing need for a scanning electron microscope that can be used for various purposes. For this reason, various detectors are installed in the sample chamber of the scanning electron microscope. If an appropriate stage movement limit range is not set, the observation sample may come into contact with the detector during stage movement, and the detector may be damaged.

  Therefore, the stage movement limit range is automatically set for each observation sample without manual operation by the user, so that the observation sample is not in contact with the structure in the sample chamber such as the sample chamber wall, objective lens, or detector during the stage movement. There is a need to prevent contact.

  In Patent Document 2, there is provided measurement means for measuring or sorting at least one of information on the position, dimension, and shape in the height direction, width direction, and depth direction of the sample when the sample is inserted into the sample chamber. A charged particle beam irradiation apparatus (Claim 2) that limits the movement range of the sample movement mechanism based on the measurement result of the measurement means is disclosed.

  Further, Patent Document 3 includes sample height detection means for detecting the height of the sample placed on the sample placement means, and moves the sample placement means on which the sample is placed in one direction within a plane. The scanning electron microscope (Claim 1) is disclosed in which the height of the sample placed on the sample placing means is detected by repeatedly executing the above-described steps while the height of the sample placing means is sequentially changed.

Japanese Patent No. 2607731 Japanese Patent Laid-Open No. 11-354059 JP 2011-228170 A

  Patent Document 2 discloses that the dimensions of an observation sample are measured, but the sample chamber entrance portion is provided with a measuring means composed of a plurality of photoelectric detector light projecting portions and photoelectric detector light receiving portions. Therefore, there is a high possibility that the size of the apparatus and the apparatus cost will increase.

  Further, Patent Document 3 discloses that the height of an observation sample is automatically detected. However, the height of the sample is detected repeatedly by changing the height of the sample mounting means sequentially. It takes time to detect the height.

  Since the sample chamber of the scanning electron microscope is kept in a vacuum, it is a sealed space, and the space inside the sample chamber is also limited. In addition, since the CCD camera cannot be placed in a vacuum, the CCD camera is installed at a port opened in each part of the sample chamber. For this reason, the installation of the CCD camera in the sample chamber is limited. When a CCD camera is installed at a specific location in the sample chamber, when the sample outer shape of the observation sample is captured as image data, the information is limited to information from one direction of the observation sample. In order to specify the sample outer shape, image data of the sample outer shape of the observation sample from multiple directions is required.

  If the number of CCD camera installation locations is increased, it becomes possible to capture information on the observation sample from various angular directions. However, the cost of the additional CCD camera increases, and a dedicated port is required for installing a plurality of CCD cameras in the sample chamber. Further, there is a problem that the control of the CCD camera becomes complicated (complex).

  When the number of CCD cameras is limited to one, it is necessary to take image data of sample outlines of a plurality of observation samples by rotating or tilting the observation sample while moving the sample stage. At this time, if the sample external size is not set (the stage movement restriction range is not set), the observation sample may come into contact with the inside of the sample chamber when moving the stage when acquiring information on multiple locations of the observation sample . For this reason, it is necessary to capture one set of CCD camera at a specific position (port) in the sample chamber and capture image data at a plurality of positions of the observation sample while the observation sample is stationary.

  An object of the present invention is to specify a sample outer size of an observation sample and set a stage movement restriction range using a single camera in a charged particle beam apparatus while the sample stage is stationary.

  In order to solve the above problems, in the present invention, a plurality of reflecting mirrors are provided in the sample chamber, and image data of a plurality of locations of the observation sample is acquired by one camera. Then, by performing image processing, it is regarded as image data from a plurality of positions of the observation sample, the sample outer size of the observation sample is obtained, and the stage movement restriction range is set.

  To describe a representative example of the present invention, in a charged particle beam apparatus having a sample stage on which an observation sample is mounted, a sample chamber in which the sample stage is disposed, and a stage moving device that moves the sample stage, In the sample chamber, based on the reflection mirror disposed around the observation sample, one camera that captures images from a plurality of directions of the observation sample reflected by the reflection mirror, and the captured image data, A sample outer shape specifying processing unit for obtaining an outer size of the observation sample, and a stage control unit for setting a movement restriction range of the stage moving device in the sample chamber based on the outer size of the observation sample. is there.

  According to the present invention, in the charged particle beam apparatus, it is possible to specify the sample outer size of the observation sample with a sample stage stationary using a single camera, and set the stage movement limit range.

The figure which shows the structure in the sample chamber of the scanning electron microscope of Example 1 of this invention. The figure which shows the system configuration | structure of the scanning electron microscope of Example 1 of this invention. The figure which shows the optical path of the observation sample upper surface of Example 1 of this invention. The figure which shows the optical path of the observation sample side surface of Example 1 of this invention. The figure which shows arrangement | positioning of the three reflective mirrors in the sample chamber of Example 1 of this invention. The figure which shows the image data example of the observation sample of Example 1 of this invention. The figure which shows the trimming position of the image data of the observation sample of Example 1 of this invention. The figure which shows the processing flow of this invention. The figure which shows the data flow of the sample external size identification process of this invention. The figure which shows the setting flow of the restriction | limiting of the stage movement range of this invention. The figure which shows the sample external size of the observation sample of this invention. The figure which shows the reflective mirror which mirror-processed the sample chamber wall surface of Example 2 of this invention (five surfaces). The figure which shows the reflective mirror which mirror-processed the sample chamber wall surface of Example 3 of this invention (curved surface).

  Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 shows a schematic configuration of a sample chamber of a scanning electron microscope as an example of the charged particle beam apparatus of the present invention.
In the sample chamber 5, an electron optical system (lens barrel) 10 including an objective lens 11 is attached to the sample chamber. A BSE (backscattered electron) detector 12 is provided on the observation sample 4 side of the electron optical system. A CCD camera 1, a secondary electron detector 7, and an EDS detector 8 are attached to the port of the sample chamber.

  A reflecting mirror 6 is installed on the opposite side of the CCD camera 1. The reflecting mirror 6 is arranged behind the observation sample 4 in order to reflect the observation sample 4. The illumination light 9 is disposed on the upper surface of the sample chamber so as to illuminate the observation sample 4 and reflect the observation sample 4 on the reflecting mirror 6.

  The observation sample 4 is mounted on the sample stage 3. The sample stage 3 is moved in a horizontal direction, a vertical direction, or the like by a stage moving device (not shown). The observation sample 4 is taken in and out by pulling out the sample chamber opening / closing lid 2 together with the sample stage unit. At this time, the height and width of the entrance of the sample chamber 5 are such that the observation sample 4 is inside the sample chamber, the reflecting mirror 6, the detector (secondary electron detector 7, EDS detector 8, BSE detector 12), and the objective lens 11. The size of the opening is limited so as not to touch the surface.

  The position of the sample stage 3 at the time of exchanging the sample is always the stage origin position (the X-axis center position, the Y-axis center position, the height is the bottom surface, the position without tilting, and hereinafter referred to as “home position”). By measuring the position from the stage reference position to the reflecting mirror, the optical path and reflection angle of the reflecting mirror can be obtained and used as parameters for image processing of the reflected image data.

FIG. 2 shows a system configuration of the scanning electron microscope.
The scanning electron microscope of this embodiment includes a scanning electron microscope main body 50, a control unit 18, and a computer 15. The control unit 18 includes a stage control unit 21 that controls the sample stage 3, and an evacuation control unit 22 that controls the vacuum pump 14 and the valve 13. The computer 15 includes a stage control unit 23, an evacuation control unit 24, an image data A / D conversion unit 25, a sample outer size specification processing unit 26, a stage movement restriction range data table 16, and a storage device 17.

  The operation of the scanning electron microscope and the display of the apparatus state are performed from the computer 15. The sample stage 3 is also operated by the stage control unit 23 of the computer 15, and the stage movement restriction range is also set by the stage control unit 23. In the present invention, processing for acquiring image data of the observation sample 4 from the CCD camera 1 from the CCD camera 1, performing image processing, obtaining the sample external size, and automatically setting the stage movement restriction range is added to the computer 15.

  The stage control unit 23 performs a stage moving operation by a user operation. A command is issued from the stage controller 23 to the stage controller 21 of the control unit 18 to drive the sample stage 3. Further, the stage control unit 21 notifies the stage control unit 23 of the stage position information and displays the current stage position information.

  Regarding the setting of the stage movement restriction range, an image signal acquired from the CCD camera 1 is converted into image data by an image data conversion (A / D conversion) unit 25. The image data is transmitted to the sample external size specifying processing unit 26. The sample outer size specification processing unit 26 acquires image data, performs image processing, and obtains the sample outer size. Then, the stage control unit 23 automatically sets a stage movement restriction range suitable for the current observation sample with reference to the stage movement restriction range data table 16 of a known observation sample size. The stage movement restriction range is displayed on the stage control unit 23.

  The computer 15 includes an evacuation control unit 24, and performs an air release / evacuation operation in the sample chamber 5 by a user operation. A command is issued from the evacuation control unit 24 to the evacuation control unit 22 of the control unit 18 to control the operation of the vacuum pump 14 and open / close the valve 13. Further, the evacuation control unit 22 notifies the evacuation control unit 24 of the operation state of the vacuum pump 14 and the open / closed state of the valve 13, and displays the current vacuum state on the evacuation control unit 24. Further, when the evacuation control unit 24 starts evacuation of the sample chamber 5, the evacuation control unit 24 notifies the stage control unit 23 that the evacuation has started.

  Initial setting is performed to match the image data of the observation sample acquired from the CCD camera 1 with the actual observation sample size. The set value is held on the computer.

  An observation sample having a known size and shape (cylindrical observation sample) is mounted on the sample stage 3, and image data is acquired from the CCD camera 1. At this time, the stage position is the home position. The pixel of the image data is set by setting the size of the observation sample from the image data, that is, by specifying the width (pixel value) of the observation sample reflected on the image data and setting the width (mm value) of the actual observation sample. The size can be converted to the actual size.

3 and 4 show a configuration in which three reflecting mirrors are arranged inside the sample chamber and the external shape information of the observation sample reflected by the mirror surface is acquired in this embodiment. 3 is a plan view thereof, and FIG. 4 is a side view thereof.
In FIG. 3, the CCD camera 1 is disposed in front of the observation sample 4, and the reflecting mirror 101 is disposed on the back surface of the observation sample 4. The reflecting mirror 101 is arranged at a front position with respect to the CCD camera 1 and the observation sample 4. Each of the reflecting mirror 102 and the reflecting mirror 103 is disposed on the side surface of the observation sample 4 so as to have the same opening angle with respect to the reflecting mirror 101 on the left and right.

  FIG. 4 shows the installation position in the height direction of the CCD camera 1 as seen from the side. Information including the upper surface of the observation sample 4 can be acquired by installing the CCD camera 1 at a position where the observation sample 4 is slightly looked down from above. The illumination light 9 serving as a light source is illuminated from above the observation sample 4.

  FIG. 5 shows a plan view in which the reflecting mirrors 101, 102, 103 and the CCD camera 1 are arranged inside the sample chamber 5.

  As shown in FIG. 6, the position of the observation sample 4 is the front image 210 of the observation sample 4 from the CCD camera 1, the rear image 211 of the observation sample reflected by the reflecting mirror 101, and the observation sample reflected by the reflecting mirror 102. The reflection image 212 on the right side surface and the reflection image 213 on the left side surface of the observation sample reflected by the reflecting mirror 103 are installed at a position where the reflection image is reflected.

  In FIGS. 3 to 5, the reflecting mirrors are arranged on three surfaces, but four or more surfaces may be used. Alternatively, only the right-side reflecting mirror 102 and the left-side reflecting mirror 103 may be disposed without providing the back-side reflecting mirror 101.

FIG. 8 shows a flow of acquiring the sample outer size of the observation sample of the present invention and automatically setting the stage movement restriction range.
First, the observation sample 4 is attached to the sample stage 3 (the stage position of the observation sample is the home position), and the observation sample 4 is placed in the sample chamber 5. At this time, by providing a size restriction at the entrance of the sample chamber, if the observation sample is larger than the size (horizontal width, vertical direction) of the entrance of the sample chamber, the observation sample is not placed in the sample chamber.
The observation sample is put into the sample chamber and evacuation is started (S410), and at the same time, acquisition of image data of the observation sample is started (S420). The evacuation state of the sample chamber is monitored by the evacuation control unit 24. When the evacuation of the sample chamber is started, the evacuation control unit 24 notifies the stage control unit 23 that the evacuation has started, and the stage control unit 23 acquires the image data of the observation sample from the CCD camera 1. Start. Further, the stage control unit 23 prohibits the stage operation and the stage drive until the stage movement restriction range is set during evacuation, and the stage is in a stationary state.

Next, a sample external size specifying process is performed in S430. Details of the sample outer size specifying process are shown in S431 to S435 on the right side of FIG. 8 and FIG.
The actual image of the observation sample and the reflection image of the observation sample by the reflecting mirror are captured as image data in the same frame of the CCD camera 1 (S431). The acquired image data 200 is as shown in FIG. This image data is assumed to be I1.

  In FIG. 6, 201 is a reflection mirror image from the back surface, 202 is a reflection mirror image from the right side surface, 203 is a reflection mirror image from the left side surface, 210 is a real image of the observation sample, 211 is reflection from the back surface of the observation sample. Reference numeral 212 denotes an image reflected from the right side of the observation sample, and reference numeral 213 denotes an image reflected from the left side of the observation sample.

As shown in FIG. 7, each image exists in a specific area in the acquired image data from the position of the sample. For this reason, in S432 and S510, each image is divided into four areas and trimmed. The trimming position of each image is calculated from the distance from the sample to the mirror surface and the reflection angle.
The image data trimmed from the real image area portion 304 on the front is I2-0.
The image data trimmed from the back-reflected image area portion 301 is I2-1.
The image data trimmed from the image area portion 302 reflected from the right side is defined as I2-2.
The image data trimmed from the image area portion 303 reflected from the left side is defined as I2-3.

In the reflection image by the reflecting mirror, left and right are converted or the depth direction is deformed. Therefore, in S433 and S520, image processing is performed using parameters for performing inverse transformation from the known reflection angle distance and the reflection angle of the reflecting mirror, and each reflected image data I2-1, I2-2, I2- Inverse 3 As a result, the reflected image data is converted into image data I3-1, I3-2, and I3-3 that are equivalent to the real image data, respectively.
The reflection image data I2-1 from the back surface is converted, and image data equivalent to an image photographed from the back surface of the observation sample is I3-1.
-The reflection image data I2-2 from the right side is converted, and the image data equivalent to the image taken from the right side of the observation sample is I3-2.
-The reflection image data I2-3 from the left side is converted, and image data equivalent to an image taken from the left side of the observation sample is I3-3.

In S434 and S530, from the image data I2-0 and the converted image data I3-1, I3-2, I3-3. Using image processing (shape recognition), the maximum width value and the maximum height value of the observed sample image are measured.
From the real image data I2-0, the maximum width (pixel size) I2-0-W and the maximum height (pixel size) I2-0-H of the observation sample image are set.
-From the equivalent image data I3-1 of the rear image, the maximum value (pixel size) I3-1-W and the maximum value (pixel size) I3-1-H of the horizontal width of the observation sample image are set.
-From the equivalent image data I3-2 of the right side image, the maximum value (pixel size) I3-2-W and the maximum value (pixel size) I3-2-H of the horizontal width of the observation sample image are set.
From the equivalent image data I3-3 of the left-side image, the maximum value (pixel size) I3-3-W and the maximum value (pixel size) I3-3-H of the horizontal width of the observation sample image are set.

  In S435 and S540, the maximum width value and the maximum height value of each observed specimen image are compared, and the maximum width value (pixel size) IW and the maximum height value (pixel size) IH are obtained. Ask.

  In S550, the pixel size is converted into the actual image size, so that the lateral width W (mm) and the height H (mm) of the sample external size are obtained.

  As shown in FIG. 11, the outer shape of the sample is a cylindrical outline that includes the observation sample 602 from the maximum width W (mm) and the maximum height H (mm) of the observation sample taken from a plurality of locations. The shape 601 is obtained.

Returning to FIG. 8, data of the sample outer size (width mm, height mm) is set in the stage controller 23.
The stage control unit 23 refers to the stage movement restriction range data table 16 of a known observation sample size (S440). Then, a stage movement range limit suitable for the current observation sample is automatically set (S450).

FIG. 10 shows processing in the stage control unit 23.
In S560, the maximum values of the lateral width and height of the sample external shape are received from the sample external size specifying processing unit 26.
In S570, a stage movement restriction range data table corresponding to the condition is selected. Since a plurality of stage movement restriction range data tables corresponding to the sample shape (rectangular, circular, etc.) and the detector configuration (number, arrangement, etc.) are provided, the data table is selected according to these conditions.
In S580, based on the selected data table, a stage movement restriction range corresponding to the maximum width and height of the sample outer shape is obtained.
In S590, the stage movement range limit is set from the obtained stage movement limit range.

  According to the present embodiment, in the charged particle beam apparatus, it is possible to specify the sample outer size of the observation sample while setting the stage movement restriction range using a single camera while the stage is stationary.

  In the present embodiment, the stage movement restriction range is obtained from the sample outer size using the data table 16, but the stage movement restriction range may be obtained from the sample outer size using a calculation formula.

Regarding the installation of the reflecting mirror, in order to install the reflecting mirror in advance during the processing of the sample chamber, the reflecting mirror can be easily installed and adjusted by inclining the inside of the sample chamber.
FIG. 12 shows a second embodiment in which a reflecting mirror is installed. In this embodiment, the inner wall surface of the sample chamber 705 is mirror-finished into five mirror surfaces. A reflected image of the back surface, the right side surface, and the left side surface of the observation sample 704 can be captured by the CCD camera 701 from the reflecting mirror 706 obtained by processing the sample chamber wall surface. The number of mirror surfaces is not limited to five and may be a plurality of surfaces.

  According to the present embodiment, the interior of the sample chamber is tilted and used as a reflecting mirror, thereby facilitating installation and adjustment of the reflecting mirror. In addition, the sample chamber can be prevented from becoming large.

FIG. 13 shows a third embodiment in which a reflecting mirror is installed. In this embodiment, the inner wall surface of the sample chamber 805 is mirror-finished into an elliptical curved surface. A reflected image from the back surface of the observation sample 804 to the right side surface and the left side surface can be picked up by the CCD camera 801 from the reflecting mirror 806 in which the wall surface of the sample chamber is processed.
According to the present embodiment, it is possible to capture images from multiple directions where the curved surface is located.

  According to the present invention, it is possible to specify a sample outer size of an observation sample with a sample stage stationary using a single camera and set a stage movement restriction range. It can be used for all charged particle beam devices such as a scanning electron microscope (SEM), a scanning transmission electron microscope (STEM), an ion microscope, and a decoding device with FIB.

1 CCD camera
2 Opening / closing lid of sample chamber
3 Sample stage
4 Observation sample
5 Sample room
6 Reflector
7 Secondary electron detector
8 EDS detector
9 Lighting light
10 Electro-optic system (lens barrel)
11 Objective lens
12 BSE detector
13 Sample chamber valve
14 Vacuum pump
15 computer
16 Stage movement limit range data table
17 Storage device
18 Control unit
21 Stage controller
22 Vacuum exhaust control unit
23 Stage control section
24 Vacuum exhaust control section
25 Image data A / D converter
26 Sample external size specification processing section
50 Scanning electron microscope body
101 Reflector (rear)
102 Reflector (right side)
103 Reflector (left side)
104 Real image light path
105 Reflected image optical path (rear)
106 Reflected image light path (right side)
107 Reflected image light path (left side)
200 image data
201 Reflector image (back)
202 Reflector image (right side)
203 Reflector image (left side)
210 Real image of observation sample
211 Reflection image of observation sample (back)
212 Reflected image of the observation sample (right side)
213 Reflected image of observation sample (left side)
300 image data
220 Real image of observation sample
221 Reflected image of the observation sample (back)
222 Reflected image of observation sample (right side)
223 Reflected image of observation sample (left side)
301 Trimming position of reflected image (back)
302 Trimming position of reflected image (right side)
303 Trimming position of reflected image (left side)
304 Real image trimming position
500 Sample chamber
501 Opening / closing lid of sample chamber
502 CCD camera
503 Observation sample
504 Reflector (rear)
505 Reflector (right side)
506 Reflector (left side)
601 Sample outline
602 Observation sample
701 CCD camera
704 Observation sample
705 Sample room
706 Reflector (Sample chamber wall processing)
801 CCD camera
804 Observation sample
805 Sample room
806 Reflector (Sample chamber wall processing)

Claims (15)

In a charged particle beam apparatus having a sample stage on which an observation sample is mounted, a sample chamber in which the sample stage is disposed, and a stage moving device that moves the sample stage,
A reflector disposed around the observation sample in the sample chamber;
One camera that captures images from a plurality of directions of the observation sample reflected by the reflecting mirror;
Based on the imaged image data, a sample external size specification processing unit for determining the external size of the observation sample;
A charged particle beam apparatus comprising: a stage control unit that sets a movement restriction range of the stage moving device in the sample chamber based on an outer size of the observation sample. The charged particle beam apparatus according to claim 1,
The charged particle beam apparatus, wherein the camera also captures an image from the front of the observation sample. The charged particle beam apparatus according to claim 1,
The charged particle beam apparatus, wherein the reflecting mirror is a plurality of plane mirrors arranged around an observation sample. In the charged particle beam device according to claim 3,
A charged particle beam apparatus, wherein the reflecting mirror is disposed on the opposite side of the observation sample from the camera. In the charged particle beam device according to claim 3,
A charged particle beam apparatus, wherein the reflecting mirror is disposed on a side surface of the observation sample. The charged particle beam apparatus according to claim 1,
The charged particle beam apparatus according to claim 1, wherein the reflecting mirror is a single curved mirror disposed around an observation sample. The charged particle beam apparatus according to claim 1,
A charged particle beam apparatus characterized in that the inner wall surface of the sample chamber is mirror-finished and used as a reflecting mirror. The charged particle beam apparatus according to claim 1,
The charged particle beam apparatus according to claim 1, wherein the camera picks up images from a plurality of directions of the observation sample reflected by the reflecting mirror as one image. The charged particle beam apparatus according to claim 1,
The charged particle beam apparatus according to claim 1, wherein the camera is installed at a position where the observation sample is looked down from above. The charged particle beam apparatus according to claim 1,
An illumination light for illuminating the observation sample;
The charged particle beam apparatus, wherein the illumination light is disposed above the observation sample. The charged particle beam apparatus according to claim 1,
The sample external size specifying processing unit obtains the maximum value of the width and height of the observation sample in each image by shape recognition from the image data captured by the camera, and further, the sample external shape is determined from the maximum value of these values. A charged particle beam device characterized by obtaining maximum values of a lateral width and a height. The charged particle beam device according to claim 11,
The charged particle beam apparatus characterized in that the sample external shape size specifying unit converts image data of each reflection image into image data equivalent to actual image data. The charged particle beam device according to claim 11,
The sample external size specifying processing unit converts the maximum value of the horizontal width and height of a sample external shape expressed in pixel size into a horizontal width and height of an actual image size. The charged particle beam apparatus according to claim 1,
It has a stage movement limit range data table of known observation sample size,
The charged particle beam apparatus according to claim 1, wherein the stage control unit sets the movement restriction range based on an outer size of the observation sample with reference to the stage movement restriction range data table. The charged particle beam apparatus according to claim 1,
A charged particle beam apparatus characterized in that a movement restriction range of the stage moving device is automatically set while the sample chamber is evacuated.

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