JP2014085303A - Automatic analysis device - Google Patents

Abstract

The present invention provides an automatic analyzer capable of effectively cleaning the surface of a cuvette even when a structure having a larger width in the radial direction of a reaction line is disposed between cuvettes. .
A test container for storing a sample, a transport means for transporting a plurality of test containers arranged along a predetermined path along a predetermined path, and a liquid held at a constant temperature are stored. And a constant temperature bath 30 in which the cuvette is immersed in the liquid, and a cleaning means 28a for discharging the liquid for cleaning toward the outer wall of the cuvette.
[Selection] Figure 6

Description

  Embodiments described herein relate generally to an automatic analyzer.

  The automatic analyzer can measure the test liquid corresponding to the test item by, for example, optically measuring the test liquid obtained by mixing the test sample such as blood and the reagent corresponding to various test items (photometry). It is a device for analyzing components.

  The automatic analyzer performs dispensing of the test sample, dispensing of the reagent, stirring of the test liquid, photometry, and washing of the test container in accordance with the transport of the test containers aligned in a line along the annular reaction line.

  In general, in an automatic analyzer, it is necessary to keep the temperature of the test solution constant in order to increase the accuracy of analysis. Therefore, the inspection container is immersed in constant temperature water. However, when the cuvette is immersed in constant temperature water, bubbles, scales, and the like adhere to the cuvette surface, which becomes an obstacle to photometry. In the conventional automatic analyzer, as a cleaning means for the surface of the inspection container, a wiper is provided in a part of the constant temperature bath containing constant temperature water, and the wiper is pressed against the surface of the inspection container for cleaning (Patent Document 1). ).

Japanese Patent Publication No. 1-343268

  However, when structures having a reaction line radial width larger than the cuvette are arranged between the cuvettes, the wiper does not sufficiently press the surface of the cuvette in the cleaning means as in Patent Document 1. Therefore, the surface of the inspection container cannot be cleaned well. Moreover, the deterioration of the wiper due to the interference with the structure also becomes severe.

The problem to be solved by the present invention is that the surface of the cuvette can be effectively cleaned even when a structure having a larger width in the radial direction of the reaction line is arranged between the cuvettes. Is to provide a simple automatic analyzer.

  In order to solve the above-described problem, an automatic analyzer according to an embodiment transports a test container for containing a sample and a plurality of test containers aligned along a predetermined path along the predetermined path. A transport unit; and a cleaning unit that discharges a cleaning liquid toward the outer wall of the cuvette.

1 is an overview diagram of an automatic analyzer according to the present embodiment. The block diagram of the automatic analyzer in this embodiment. The top view of the arrangement | sequence of the test container and structure in this embodiment. The perspective view of the inspection container and structure in this embodiment. Sectional drawing of the washing | cleaning unit vicinity in this embodiment. The top view of the washing | cleaning unit vicinity in this embodiment. The top view 2 of the washing | cleaning unit vicinity in this embodiment. The time chart 1 of operation | movement of the reaction disk and washing | cleaning unit in this embodiment. The time chart 2 of the operation | movement of the reaction disk and washing | cleaning unit in this embodiment. The time chart 3 of the operation | movement of the reaction disk and washing | cleaning unit in this embodiment. Sectional drawing of the washing | cleaning unit vicinity in the modification of this embodiment.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings.

Example 1
1 and 2 are an external view and a block diagram of an automatic analyzer according to the present embodiment. The automatic analyzer according to this embodiment includes a reaction disk 5, a sample disk 6, a first reagent container 2, a second reagent container 3, a test container 4, a sample arm 10, a sample probe 16, a sample container 17, and a first reagent arm. 8, first reagent probe 14, first reagent container 7, second reagent arm 9, second reagent probe 15, second reagent container 27, stirring mechanism 11, photometric mechanism 13, washing mechanism 12, analysis mechanism control unit 21, An analysis unit 22, a display unit 23, an operation unit 24, a cleaning unit 28, and a constant temperature bath 30 are included.

  The reaction disk 5 holds a plurality of cuvettes 4 in an annular shape in a thermostatic bath 30 containing degassed isothermal water. The reaction disk 5 repeats rotation and stop alternately at predetermined time intervals according to instructions from the analysis mechanism control unit 21.

  The sample disk 6 is located in the vicinity of the reaction disk 5. The sample disk 6 holds a sample container 17 for accommodating a test sample. The sample disk 6 is rotated in accordance with an instruction from the analysis mechanism control unit 21 so as to place the sample container 17 containing the test sample to be dispensed at the sample suction position.

  The first reagent storage 2 is located in the vicinity of the reaction disk 5. The first reagent storage 2 holds a plurality of first reagent containers 7 for containing a first reagent that selectively reacts with an inspection item of an inspection sample. In accordance with an instruction from the analysis mechanism control unit 21, the first reagent container 2 rotates so as to place the first reagent container 7 containing the first reagent to be dispensed at the first reagent suction position.

  The second reagent storage 3 is located in the vicinity of the reaction disk 5. The second reagent storage 3 holds a plurality of second reagent containers 27 for accommodating the second reagent. In accordance with an instruction from the analysis mechanism control unit 21, the second reagent container 3 rotates so as to place the second reagent container 27 containing the second reagent to be dispensed at the second reagent suction position.

  The sample arm 10 is located between the reaction disk 5 and the sample disk 6. The sample arm 10 has a sample probe 16 at its tip. Further, the sample arm 10 is rotatable about an end portion that does not have the sample probe 16 as an axis.

  The sample arm 10 supports the sample probe 16 so as to be movable up and down. The analysis mechanism control unit 21 controls the amount and timing of vertical movement of the sample probe 16. The analysis mechanism control unit 21 controls the amount and timing of inhalation and ejection of the test sample.

  In accordance with an instruction from the analysis mechanism control unit 21, the sample probe 10 rotates so that the sample probe 16 reciprocates between the sample suction position on the sample disk 6 and the sample discharge position on the reaction disk 5. To do.

  When the sample probe 16 is located immediately above the sample suction position, the sample probe 16 moves downward. The sample probe 16 sucks a test sample to be dispensed from a sample container 17 at a sample suction position via a suction / discharge mechanism such as a pump (not shown). The sample probe 16 moves upward after inhalation of the test sample. Thereafter, the sample arm 10 rotates so that the sample probe 16 moves to a position immediately above the sample discharge position.

  When the sample probe 16 is located immediately above the sample discharge position, the sample probe 16 moves downward. The sample probe 16 discharges the test sample sucked at the sample suction position to the test container 4 at the sample discharge position via a suction / discharge mechanism such as a pump (not shown). The sample probe 16 moves upward after discharging the inspection sample. Thereafter, the sample arm 10 rotates so that the sample probe 16 moves to a position just above the sample suction position.

  The first reagent arm 8 is located near the outer periphery of the reaction disk 5. The first reagent arm 8 has a first reagent probe 14 at its tip. Further, the first reagent arm 8 is rotatable about an end portion that does not have the first reagent probe 14 as an axis.

  The first reagent arm 8 supports the first reagent probe 14 so as to be movable up and down. The analysis mechanism control unit 21 controls the amount and timing of vertical movement of the first reagent probe 14. The analysis mechanism control unit 21 controls the amount and timing of inhalation and ejection of the first reagent.

  In accordance with an instruction from the analysis mechanism control unit 21, the first reagent arm 8 has a first reagent probe 14 immediately above the first reagent suction position in the first reagent storage 2 and immediately above the first reagent discharge position in the reaction disk 5. It rotates to reciprocate between them.

  When the first reagent probe 14 is located immediately above the first reagent inhalation position, the first reagent probe 14 moves downward. The first reagent probe 14 sucks the first reagent from the first reagent container 7 at the first reagent suction position via a suction / discharge mechanism such as a pump (not shown). The first reagent probe 14 moves upward after inhalation of the first reagent. Thereafter, the first reagent arm 8 rotates so that the first reagent probe 14 moves to a position immediately above the first reagent discharge position.

  When the first reagent probe 14 is located immediately above the first reagent discharge position, the test sample sucked at the first reagent suction position into the test container 4 at the first reagent discharge position is passed through a suction / discharge mechanism such as a pump (not shown). To discharge. Thereafter, the first reagent arm 8 rotates so that the first reagent probe 14 moves to a position immediately above the first reagent suction position.

  The second reagent arm 9 is located between the reaction disk 5 and the second reagent storage 3. The second reagent arm 9 has a second reagent probe 15 at its tip. Further, the second reagent arm 9 is rotatable about an end portion that does not have the second reagent probe 15 as an axis.

  The second reagent arm 9 supports the second reagent probe 15 so as to be movable up and down. The analysis mechanism control unit 21 controls the amount and timing of vertical movement of the second reagent probe 15. The analysis mechanism controller 21 controls the amount and timing of the second reagent inhalation and ejection.

  In accordance with an instruction from the analysis mechanism control unit 21, the second reagent arm 9 includes the second reagent probe 15 directly above the second reagent suction position in the second reagent storage 3 and immediately above the second reagent discharge position in the reaction disk 5. Rotate to reciprocate between.

  When the second reagent probe 15 is positioned immediately above the second reagent suction position, the second reagent probe 15 moves downward. The second reagent probe 15 sucks the second reagent from the second reagent container 27 at the second reagent suction position via a suction / discharge mechanism such as a pump (not shown). The second reagent probe 15 moves upward after inhalation of the second reagent. Thereafter, the second reagent arm 9 rotates so that the second reagent probe 15 moves to a position immediately above the second reagent discharge position.

  When the second reagent probe 15 is positioned immediately above the second reagent discharge position, the test sample sucked at the second reagent suction position into the test container 4 at the second reagent discharge position is passed through a suction / discharge mechanism such as a pump (not shown). To discharge. Thereafter, the second reagent arm 9 rotates so that the second reagent probe 15 moves to a position immediately above the second reagent suction position.

  Hereinafter, the liquid mixture of the test sample and the reagent is referred to as a test liquid.

  The stirring mechanism 11 is located near the outer periphery of the reaction disk 5. The stirring mechanism 11 holds the stirring bar at its tip so that it can move up and down. Further, the stirring bar is located immediately above the stirring position of the reaction disk 5.

  The stirring mechanism 11 operates according to instructions from the analysis mechanism control unit 21. When the test container 4 containing the unstirred test liquid moves to the stirring position, the stirrer moves downward to stir the test liquid. After stirring, the stirring bar moves upward and stops at the original position.

  The photometric mechanism 13 includes a detection unit 25 and a light source 26. The photometric mechanism 13 is located in the vicinity of the reaction disk 5. The photometric mechanism 13 irradiates the cuvette 4 with light from the light source 26 in accordance with an instruction from the analysis mechanism control unit 21.

  The detection unit 25 detects light transmitted through the inspection container 4 and the inspection liquid, light reflected by the inspection container 4 and the inspection liquid, or light scattered by the inspection container 4 and the inspection liquid. The detection unit 25 generates data (photometry data) having a measurement value corresponding to the detected light intensity. The detection unit 25 transmits the photometric data to the analysis unit 22.

  The cleaning mechanism 12 is located near the outer periphery of the reaction disk 5. In accordance with an instruction from the analysis mechanism control unit 21, the cleaning mechanism 12 discards the test solution after photometry and cleans the inside of the test container 4 through a cleaning nozzle (not shown).

  The analysis mechanism control unit 21 rotates the reaction disk 5, the sample disk 6, the first reagent container 2, the second reagent container 3, and the sample arm 10 according to instructions from the operation unit 24. Rotation and vertical movement, suction and discharge of the sample probe 16, rotation and vertical movement of the first reagent arm 8, suction and discharge of the first reagent probe 14, rotation and vertical movement of the second reagent arm 9, The suction and discharge of the two-reagent probe 15, the operation of the stirring mechanism 11, the photometry by the photometry mechanism 13, the operation of the cleaning mechanism 12, and the operation (described later) of the cleaning unit 28 are controlled.

  The analysis unit 22 receives the photometric data transmitted from the detection unit 25, and creates analysis data using application software for analysis. The analysis unit 22 transmits the analysis data to the display unit 23.

  The display unit 23 displays analysis data received from the analysis unit 22 and a predetermined operation screen.

  The operation unit 24 includes operation means (such as a mouse, a trackball, and a keyboard) for an operator to give instructions to the analysis mechanism control unit 21 and the analysis unit 22.

  FIG. 3 is a plan view of the arrangement of the cuvette 4 and the structure 29 in the present embodiment. As shown in FIG. 3, in this embodiment, the reaction vessels 4 and the structures 29 are alternately and annularly aligned. The width of the structure 29 in the radial direction of the transport path of the cuvette 4 is larger than that of the cuvette 4. Therefore, when the inspection container 4 and the structure 29 are alternately arranged, the structure 29 protrudes from the inspection container 4 in the radial direction of the conveyance path of the inspection container 4.

  In the present embodiment, the structure 29 is intended to be a magnet, for example, shown in Japanese Patent Application No. 2012-192587 filed separately by the applicant of the present patent application. Magnets installed between the cuvettes 4 generate a predetermined magnetic field. Due to the influence of this magnetic field, the magnetic particles in the test solution and the molecules bound to the magnetic particles are separated from the other molecules in the test solution, and measurement is performed only on the molecules bound to the magnetic particles. It can be carried out.

  3 shows the arrangement of the detection unit 25, the light source 26, and the cleaning unit 28.

  In order to obtain an accurate analysis result by photometry, it is necessary to clean the surface of the cuvette 4 immediately before photometry, that is, in the vicinity of the photometry mechanism 13. However, if the cuvette 4 is washed too close to the photometric mechanism 13, an accurate analysis result cannot be obtained due to the influence of the water flow caused by washing or the dirt swept out by washing. Therefore, the cleaning unit 28 is a position where the surface of the cuvette 4 can be cleaned immediately before photometry, and the position where the influence on the photometry due to the change of the water flow in the thermostat 30 is small, for example, B- in FIG. It is preferable to arrange in the range of B.

  FIG. 4 is a perspective view of a part of the arrangement of the cuvette 4 and the structure 29. 3 and the subsequent drawings all share a coordinate system, the central direction of the reaction disk is the x direction, the rotation direction of the reaction disk 5 is the y direction, and the vertical upward direction of the reaction disk is the z direction. To do. Moreover, the area | region within the broken line in FIG. 4 is the photometry area | region 31 through which the light irradiated from the light source 26 in FIG. 3 passes.

  FIG. 5 is a cross-sectional view taken along the line AA in FIG. As shown in FIG. 5, the cleaning unit 28 in the present embodiment has a nozzle 28 a, and constant temperature water similar to the constant temperature water stored in the constant temperature bath 30 for cleaning the surface of the cuvette 4. Is discharged as indicated by a broken line arrow in FIG. 5 through a water flow adjusting means such as a pump (not shown). Note that a cleaning solution having a higher cleaning ability may be discharged instead of the constant temperature water, but it is necessary to sufficiently deaerate. The operator controls the timing and intensity of release via the operation unit 24 and the analysis mechanism control unit 21.

  As shown in FIG. 5, when the constant temperature water discharge trajectory by the nozzle 28 a is projected on a cross section (xz plane) passing through AA in FIG. 3, the constant temperature water discharge trajectory is an angle that is an elevation angle with respect to the x direction. θ1 is formed. Generally, bubbles are likely to move in the direction of the water surface (in the z direction) because of the specific gravity relative to the liquid. Therefore, it is easier to promote the movement of bubbles when a force having a component in the z direction is applied to the bubbles. Therefore, when the angle θ1 is set to an elevation angle as shown in FIG. 5, the bubbles move in the direction of the water surface of the information without drifting to the vicinity of the photometric region 31, so that the bubbles can be easily removed. On the other hand, when the discharge trajectory forms an dip or is oriented in the horizontal direction (θ = 0), the water surface of the constant temperature water stored in the constant temperature bath 30 is less likely to ripple, and the constant temperature is maintained in the cuvette 4. The possibility of entering water can be reduced.

  FIG. 6 is a plan view of the vicinity of the cleaning unit 28 in the present embodiment. As shown in FIG. 6, when the constant temperature water discharge trajectory by the nozzle 28 a is projected on the plan view (xy plane), the constant temperature water discharge trajectory forms an angle θ <b> 2 with respect to the x direction. At this time, since the angle θ2 has a component in the direction opposite to the y direction as shown in FIG. 6, the constant temperature water discharged from the nozzle 28a collides with the rotating cuvette 4 in a crossing manner. Become. In this case, the force of the constant temperature water that collides with the cuvette 4 is stronger than the force released by the nozzle 28a. Therefore, when a predetermined strength is required to clean the cuvette 4, even if the nozzle 28a discharges the constant temperature water with a force substantially weaker than the predetermined strength, the constant temperature water has the predetermined strength. Therefore, it will collide with the cuvette 4, so that power consumption can be reduced. Moreover, when the constant temperature water discharge trajectory has a component in the direction opposite to the y direction, the dirt accumulated between the lower structure 29 and the cuvette 4 in FIG. it can.

  On the other hand, when the constant temperature water discharge trajectory has a component in the y direction, the structure 29 on the upper side of FIG. In particular, dirt accumulated between the container 4 and the container 4 can be removed.

  When the constant temperature water discharge trajectory does not have a component in the y direction and a component in the direction opposite to the y direction (when θ2 = 0), the upper and lower structures 29 and the inspection container in FIG. Therefore, the inspection container 4 and the structure 29 can be cleaned without any unevenness.

  As shown in FIG. 7, a plurality of nozzles 28 may be installed on one wall surface of the constant temperature bath 30. In the case of FIG. 7, a strong detergency can be exhibited in the y direction and the direction opposite to the y direction.

  8, 9, and 10 are time charts showing the operation of the cleaning unit 28 with respect to the operation of the reaction disk 5. 8, 9, and 10, T <b> 1 corresponds to start-up (device activation and operation check state), T <b> 2 corresponds to device standby, and T <b> 3 corresponds to inspection.

  As shown in FIG. 8, the cleaning unit 28 in the present embodiment always discharges constant temperature water to the cuvette 4 while the reaction disk 5 is rotating and stopped. Accordingly, the specification shown in FIG. 8 exhibits a high cleaning power because the time for cleaning the cuvette 4 and the structure 29 becomes longer than the specification shown in FIGS. 9 and 10 described later. Further, the specification shown in FIG. 8 does not need to interlock the discharge and stop of the constant temperature water and the rotation and stop of the reaction disk 5 unlike the specification of FIG. 9 and FIG. This is possible, and the apparatus can be miniaturized.

  In the specification shown in FIG. 9, the washing unit 28 releases constant temperature water when the reaction disk 5 is rotating, and the washing unit 28 stops releasing constant temperature water when the reaction disk 5 is stopped. . If the cleaning unit 28 releases constant temperature water toward the predetermined position while the reaction disk 5 is rotating, the inspection container 4 to be cleaned automatically changes by the rotation of the reaction disk 5, so that the cleaning is performed. Efficiency is very high. On the contrary, even if the washing unit 28 discharges the constant temperature water toward the predetermined position when the reaction disk 5 is stopped, the constant temperature water always hits the same inspection container 4 or structure 29. , Cleaning efficiency is low. In the specification of FIG. 9, the cleaning unit 28 releases constant temperature water only when it has a high cleaning efficiency, so that power consumption can be reduced compared to the specification of FIG.

  In the specification shown in FIG. 10, the washing unit 28 strongly discharges constant temperature water when the reaction disk 5 is rotating, and the washing unit 28 weakly discharges constant temperature water when the reaction disk 5 is stopped. . If the constant temperature water is strongly released while the reaction disk 5 is rotating, dirt attached to the cuvette 4 and the structure 29 will float around the cleaning unit 28. If the constant temperature water is weakly released while the reaction disk 5 is stopped in such a state, the suspended dirt can be moved away from the periphery of the cleaning unit 28 without being pressed against the cuvette 4 and the structure 29. As a result, when the constant temperature water is strongly discharged again, it is possible to prevent the dirt that has once come out of the inspection container 4 and the structure 29 from being released again from the inspection container 4 and the structure 29.

  In the case of the specifications as shown in FIGS. 8 and 10, the cleaning effect is improved by changing the position where constant temperature water is applied while the reaction disk 5 is stopped. For example, since the photometry is not performed in the period of T1 and T2, it is not necessary to consider the influence on the photometry caused by the dirt that has come out from the constant temperature water drifting in the constant temperature bath 30. Therefore, in the period of T1 and T2, it is preferable to prioritize the removal of dirt that easily accumulates in the gap between the inspection container 4 and the structure 29 by applying constant temperature water between the inspection container 4 and the structure 29. On the contrary, since the photometry is performed during the period T3, it is necessary to consider the influence on the photometry caused by the dirt that has come out from the constant temperature water drifting in the thermostat 30. Therefore, in the period of T3, constant temperature water is applied to the photometric area 31 of FIG. 4 which becomes an obstacle to photometry, and only bubbles and scales adhering to the photometric area 31 are excluded.

  When changing the position where the constant temperature water is applied in this way, the cleaning unit 28 is not such that the constant temperature bath 30 and the nozzle 28a are integrated as shown in FIG. 5, but the external nozzle 28b as shown in FIG. It is preferable that it can be easily changed. Further, the tip of the external nozzle 28b may be made variable so that the function of changing the constant temperature water discharge angle may be provided. These can be changed automatically or manually, and when changing automatically, the analysis mechanism control unit 21 controls the position of the cleaning unit 28 and the angle of the external nozzle 28b. Alternatively, by controlling the stop position of the reaction disk 5, it is possible to change the position where the constant temperature water hits the cuvette 4 or the structure 29 at T1, T2, and T3 without changing the arrangement of the cleaning unit 28. is there.

  Moreover, in the period of T1 and T2, since the photometry is not performed in the period of T1 and T2, it is not necessary to consider the influence on the photometry due to the dirt that comes out from the constant temperature water drifting in the constant temperature bath 30. . Therefore, in the period of T1 and T2, it is good to discharge | release constant temperature water strongly. On the contrary, in the period of T3, since the photometry is performed, it is necessary to consider the influence on the photometry caused by the dirt that comes out from the constant temperature water drifting in the constant temperature bath 30. Therefore, in the period of T3, it is good to discharge | release constant temperature water weakly.

  As described above, in the present embodiment, even when the structure 29 having a larger width in the radial direction of the transport path of the cuvette 4 than the cuvette 4 is arranged between the cuvettes 4, the cuvette 4 is sufficient. Can be cleaned. Further, since the conventional wiper is not used for cleaning the cuvette 4, the problem of the wiper deterioration due to the interference with the structure 29 can be solved, and the rotation accuracy of the reaction disk 5 is also affected. Can be small.

  As mentioned above, although embodiment of this invention was described, these embodiment is shown as an example and is not intending limiting the range of invention. These novel embodiments can be implemented in various other forms, and various omissions, replacements, and changes can be made without departing from the spirit of the invention. These embodiments and modifications thereof are included in the scope and gist of the invention, and are included in the invention described in the claims and the equivalents thereof.

2 ... 1st reagent storage 3 ... 2nd reagent storage 4 ... Test container 5 ... Reaction disk 6 ... Sample disk 7 ... 1st reagent container 8 ... 1st reagent arm 9 ... Second reagent arm 10 ... Sample arm 11 ... Stirring mechanism 12 ... Cleaning mechanism 13 ... Photometric mechanism 14 ... First reagent probe 15 ... Second reagent probe 16 Sample probe 17 ... Sample container 21 ... Analysis mechanism control unit 22 ... Analysis unit 23 ... Display unit 24 ... Operation unit 25 ... Detection unit 26 ... Light source 27 ... Second reagent container 28 ... cleaning unit 28a ... nozzle 28b ... external nozzle 29 ... structure 30 ... constant temperature bath 31 ... photometric area

Claims (8)

A test container for containing the sample;
Transport means for transporting the plurality of cuvettes aligned along a predetermined path along the predetermined path;
A thermostatic chamber for storing a liquid held at a constant temperature, and immersing the inspection container in the liquid held at the constant temperature;
Cleaning means for discharging a cleaning liquid toward the outer wall of the inspection container;
Automatic analyzer equipped with.   The automatic analyzer according to claim 1, wherein the cleaning unit discharges the cleaning liquid during conveyance of the cuvette.   The automatic analyzer according to claim 1, wherein the cleaning unit discharges the cleaning liquid at an angle of elevation.   The automatic analyzer according to any one of claims 1 to 3, wherein the cleaning unit stops the discharge of the cleaning liquid when the inspection container is not being transported.   The automatic analyzer according to any one of claims 1 to 3, wherein the cleaning unit changes the strength of discharge of the cleaning liquid during transfer of the cuvette and during non-transport.   The said washing | cleaning means changes the strength of discharge | release of the said liquid for washing | cleaning with the state in which the said test container accommodates the said sample, and the state which does not accommodate the sample. Automatic analyzer. Comprising a photometric mechanism for optically measuring the components of the sample contained in the cuvette;
The automatic analyzer according to any one of claims 1 to 6, wherein the cleaning unit is disposed in front of the photometric mechanism with respect to a conveyance direction of the cuvette.   The automatic according to any one of claims 1 to 7, wherein the predetermined path is annular, and a structure in which a radial width of the predetermined path is larger than the inspection container is disposed between the inspection containers. Analysis equipment.

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