JP2014077076A - Benzotriazole compound - Google Patents
Benzotriazole compound Download PDFInfo
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- JP2014077076A JP2014077076A JP2012225862A JP2012225862A JP2014077076A JP 2014077076 A JP2014077076 A JP 2014077076A JP 2012225862 A JP2012225862 A JP 2012225862A JP 2012225862 A JP2012225862 A JP 2012225862A JP 2014077076 A JP2014077076 A JP 2014077076A
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- -1 Benzotriazole compound Chemical class 0.000 title claims abstract description 37
- 239000012964 benzotriazole Substances 0.000 title claims abstract description 22
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 13
- 150000003254 radicals Chemical group 0.000 claims abstract description 12
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims abstract description 11
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 9
- 239000002253 acid Substances 0.000 claims abstract description 6
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 5
- 150000001875 compounds Chemical class 0.000 claims description 53
- 239000004908 Emulsion polymer Substances 0.000 claims description 11
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 238000007720 emulsion polymerization reaction Methods 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 150000007513 acids Chemical class 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 11
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 abstract 1
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 18
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- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 2
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
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- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
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- 229940098779 methanesulfonic acid Drugs 0.000 description 2
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- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 1
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- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- FJGQBLRYBUAASW-UHFFFAOYSA-N 2-(benzotriazol-2-yl)phenol Chemical class OC1=CC=CC=C1N1N=C2C=CC=CC2=N1 FJGQBLRYBUAASW-UHFFFAOYSA-N 0.000 description 1
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- MGIAHHJRDZCTHG-UHFFFAOYSA-N benzene-1,3-dicarboxylic acid;terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1.OC(=O)C1=CC=CC(C(O)=O)=C1 MGIAHHJRDZCTHG-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
本発明は、特に乳化重合に好適に使用できる、ラジカル反応が可能で親水性基を有する新規ベンゾトリアゾール化合物に関する。 The present invention relates to a novel benzotriazole compound capable of radical reaction and having a hydrophilic group, which can be suitably used particularly for emulsion polymerization.
2−(2−ヒドロキシフェニル)ベンゾトリアゾール化合物は、高分子材料等の光照射による劣化を防止するために用いられる紫外線吸収剤として有用である。2−(2−ヒドロキシフェニル)ベンゾトリアゾール化合物の多くは、低分子量の化合物であることから、高分子材料を加熱加工する際の揮散や、加工後の高分子材料からのブリード等の欠点があった。このため、高分子材料に2−(2−ヒドロキシフェニル)ベンゾトリアゾール化合物を結合させ、揮散やブリードを防止することを目的として、ラジカル反応性基を有する2−(2−ヒドロキシフェニル)ベンゾトリアゾール化合物(例えば、特許文献1〜4を参照)が検討されている。 The 2- (2-hydroxyphenyl) benzotriazole compound is useful as an ultraviolet absorber that is used to prevent deterioration of a polymer material or the like due to light irradiation. Since many 2- (2-hydroxyphenyl) benzotriazole compounds are low molecular weight compounds, there are drawbacks such as volatilization when heat-treating the polymer material and bleeding from the polymer material after processing. It was. Therefore, a 2- (2-hydroxyphenyl) benzotriazole compound having a radical reactive group for the purpose of bonding a 2- (2-hydroxyphenyl) benzotriazole compound to a polymer material and preventing volatilization and bleeding. (See, for example, Patent Documents 1 to 4).
しかしながら、これらの化合物は、乳化重合時の水への分散性が不十分であることから高分子材料に均一に結合されず、紫外線の吸収効果が十分発揮できないという問題があった。 However, these compounds have a problem in that they are not uniformly bonded to the polymer material due to insufficient dispersibility in water at the time of emulsion polymerization, and the ultraviolet absorption effect cannot be sufficiently exhibited.
本発明者は、上記課題を解決すべく、水への分散性に優れたベンゾトリアゾール化合物について種々検討を進めた結果、本発明を完成するに至った。
即ち本発明は、下記一般式(1)で表されるベンゾトリアゾール化合物を提供するものである。
As a result of various investigations on benzotriazole compounds excellent in water dispersibility in order to solve the above problems, the present inventors have completed the present invention.
That is, the present invention provides a benzotriazole compound represented by the following general formula (1).
また、本発明は、上記ベンゾトリアゾール化合物と他のラジカル重合性化合物を乳化重合して得られる乳化重合物を提供するものである。 The present invention also provides an emulsion polymer obtained by emulsion polymerization of the above benzotriazole compound and another radical polymerizable compound.
本発明の効果は、ラジカル反応性基を有し、水分散性が良好な、ベンゾトリアゾール化合物を提供したことにある。 The effect of the present invention is to provide a benzotriazole compound having a radical reactive group and good water dispersibility.
本発明の前記一般式(1)で表されるベンゾトリアゾール化合物について説明する。
前記一般式(1)において、R1及びR2はそれぞれ独立して水素原子又は炭素数1〜5のアルキル基を表わす。炭素数1〜5のアルキル基としては、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、sec−ブチル基、t−ブチル基、イソブチル基、ペンチル基、sec−ペンチル基、t−ペンチル基、イソペンチル基等が挙げられる。R1としては、原料の入手が容易であり、紫外線吸収効果が大きいことから、水素原子、メチル基、t−ブチル基、t−ペンチル基が好ましく、メチル基、t−ブチル基が更に好ましく、t−ブチル基が最も好ましい。R2としては、原料の入手が容易であり、紫外線吸収効果が大きいことから、メチル基、t−ブチル基、t−ペンチル基が好ましく、メチル基、t−ブチル基が更に好ましく、メチル基が最も好ましい。R3は炭素数1〜4のアルキレン基を表わす。炭素数1〜4のアルキレン基としては、メチレン基、エチレン基、メチルメチレン基、プロピレン基、1−メチルエチレン基、2−メチルエチレン基、エチルメチレン基、ブチレン基、2−メチルプロピレン基等が挙げられる。R3としては、原料の入手が容易であり、副反応が少ないことから、エチレン基が好ましい。
The benzotriazole compound represented by the general formula (1) of the present invention will be described.
In the general formula (1), R 1 and R 2 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms. Examples of the alkyl group having 1 to 5 carbon atoms include methyl, ethyl, propyl, isopropyl, butyl, sec-butyl, t-butyl, isobutyl, pentyl, sec-pentyl, and t-pentyl. Group, isopentyl group and the like. R 1 is preferably a hydrogen atom, a methyl group, a t-butyl group or a t-pentyl group, more preferably a methyl group or a t-butyl group, since the raw materials are easily available and the ultraviolet absorption effect is great. A t-butyl group is most preferred. R 2 is preferably a methyl group, a t-butyl group, or a t-pentyl group, more preferably a methyl group or a t-butyl group, and more preferably a methyl group because the raw material is easily available and has a large ultraviolet absorption effect. Most preferred. R 3 represents an alkylene group having 1 to 4 carbon atoms. Examples of the alkylene group having 1 to 4 carbon atoms include methylene group, ethylene group, methylmethylene group, propylene group, 1-methylethylene group, 2-methylethylene group, ethylmethylene group, butylene group, and 2-methylpropylene group. Can be mentioned. R 3 is preferably an ethylene group because raw materials are easily available and there are few side reactions.
R4は直接結合又は炭素数3〜10の二塩基酸からカルボキシル基を除いた残基を表わす。炭素数3〜10の二塩基酸としては、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライン酸、セバシン酸、マレイン酸、フマル酸、イタコン酸、フタル酸、イソフタル酸、テレフタル酸、テトラヒドロフタル酸、1,2−シクロヘキサンジカルボン酸、1,3−シクロヘキサンジカルボン酸、1,4−シクロヘキサンジカルボン酸等が挙げられる。酸無水物を使用することが製造上有利であることから、R4としては、コハク酸、マレイン酸、フタル酸、テトラヒドロフタル酸、1,2−シクロヘキサンジカルボン酸からカルボキシル基を除いた残基が好ましく、コハク酸からカルボキシル基を除いた残基が更に好ましい。 R 4 represents a direct bond or a residue obtained by removing a carboxyl group from a dibasic acid having 3 to 10 carbon atoms. Examples of the dibasic acid having 3 to 10 carbon atoms include malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, maleic acid, fumaric acid, itaconic acid, phthalic acid, isophthalic acid Terephthalic acid, tetrahydrophthalic acid, 1,2-cyclohexanedicarboxylic acid, 1,3-cyclohexanedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid and the like. Since it is advantageous in production to use an acid anhydride, R 4 includes a residue obtained by removing a carboxyl group from succinic acid, maleic acid, phthalic acid, tetrahydrophthalic acid, and 1,2-cyclohexanedicarboxylic acid. A residue obtained by removing a carboxyl group from succinic acid is more preferable.
R5は水素原子又はメチル基を表わし、本発明のベンゾトリアゾール化合物の保存安定性が良好であることから、R5はメチル基が好ましい。 R 5 represents a hydrogen atom or a methyl group, and R 5 is preferably a methyl group since the storage stability of the benzotriazole compound of the present invention is good.
前記一般式(1)において、a及びcはa+cが2〜1000となる0〜1000の数を表わし、bは0又は1の数を表わす。但し、cが0の数の場合はbは0の数を表わす。水分散性の点からは、a+cは大きい数であることが好ましいが、あまりにも大きい場合には、分子内に占めるベンゾトリアゾール部分の割合が少なくなり本発明のベンゾトリアゾール化合物の紫外線吸収効果が低下することから、a+cは、3〜60の数であることが好ましく、4〜30の数であることが更に好ましく、5〜15の数であることが最も好ましい。なお、製造が容易であることから、aは0の数であることが好ましい。 In the said General formula (1), a and c represent the number of 0-1000 from which a + c will be 2-1000, b represents the number of 0 or 1. However, when c is a number of 0, b represents the number of 0. From the viewpoint of water dispersibility, a + c is preferably a large number, but if it is too large, the proportion of the benzotriazole moiety in the molecule decreases and the ultraviolet absorption effect of the benzotriazole compound of the present invention decreases. Therefore, a + c is preferably a number of 3 to 60, more preferably a number of 4 to 30, and most preferably a number of 5 to 15. In addition, since manufacture is easy, it is preferable that a is the number of 0.
本発明のベンゾトリアゾール化合物のうち、b及びcが0の数である化合物、即ち、下記一般式(2)で表わされる化合物は、下記の反応式で示すように一般式(3)で表わされる化合物の水酸基にエチレンオキシドを付加して一般式(4)で表される化合物とし、一般式(5)で表わされる酸クロライド化合物でエステル化することにより得ることができる。 Among the benzotriazole compounds of the present invention, a compound in which b and c are 0 numbers, that is, a compound represented by the following general formula (2) is represented by the general formula (3) as shown in the following reaction formula. It can be obtained by adding ethylene oxide to the hydroxyl group of the compound to obtain a compound represented by the general formula (4) and esterifying with an acid chloride compound represented by the general formula (5).
前記一般式(3)で表わされる化合物は、上記特許文献3(特開平2−142778号公報)に記載のベンゾトリアゾール化合物の製造方法により得ることができる。一般式(3)で表わされる化合物へのエチレンオキシドの付加は、公知の方法によればよく、例えば、水酸化ナトリウム、水酸化カリウム等を触媒として、80〜150℃で反応させればよい。前記一般式(4)で表わされる化合物と前記一般式(5)で表わされる酸クロライド化合物との反応は、ピリジン、トリエチルアミン、トリブチルアミン等の塩基性溶媒中で反応させればよい。 The compound represented by the general formula (3) can be obtained by the method for producing a benzotriazole compound described in Patent Document 3 (Japanese Patent Laid-Open No. 2-142778). The addition of ethylene oxide to the compound represented by the general formula (3) may be performed by a known method, for example, by reacting at 80 to 150 ° C. using sodium hydroxide, potassium hydroxide or the like as a catalyst. The reaction of the compound represented by the general formula (4) and the acid chloride compound represented by the general formula (5) may be performed in a basic solvent such as pyridine, triethylamine, tributylamine and the like.
本発明のベンゾトリアゾール化合物のうち、aが0の数であり、bが1の数である化合物、即ち、下記一般式(6)で表わされる化合物は、下記の反応式で示すように一般式(3)で表わされる化合物に一般式(7)で表わされる酸無水物を反応させて一般式(8)で表わされる化合物とし、一般式(8)で表わされる化合物のカルボキシル基を、カルボン酸クロライド基に変換して一般式(9)で表わされる化合物とし、一般式(9)で表わされる化合物と一般式(10)で表わされる化合物とを反応させることにより得ることができる。 Among the benzotriazole compounds of the present invention, a compound in which a is a number of 0 and b is a number of 1, that is, a compound represented by the following general formula (6) is represented by the following general formula: The compound represented by (3) is reacted with the acid anhydride represented by the general formula (7) to obtain a compound represented by the general formula (8), and the carboxyl group of the compound represented by the general formula (8) is converted into a carboxylic acid. It can be obtained by converting into a chloride group to obtain a compound represented by the general formula (9) and reacting the compound represented by the general formula (9) with the compound represented by the general formula (10).
前記一般式(3)で表わされる化合物と前記一般式(7)で表わされる酸無水物との反応は、トリエチルアミン等の塩基触媒、メタンスルホン酸、p−トルエンスルホン酸等の酸触媒を用いることにより反応することができる。前記一般式(8)で表わされる化合物は、塩化チオニル、三塩化リン等を用いることにより、カルボキシル基をカルボン酸クロライド基に変換できる。前記一般式(9)で表わされる化合物と前記一般式(10)で表わされる化合物の反応は、ピリジン、トリエチルアミン、トリブチルアミン等の塩基性溶媒中で行えばよい。 The reaction between the compound represented by the general formula (3) and the acid anhydride represented by the general formula (7) uses a base catalyst such as triethylamine, and an acid catalyst such as methanesulfonic acid and p-toluenesulfonic acid. Can react. The compound represented by the general formula (8) can convert a carboxyl group into a carboxylic acid chloride group by using thionyl chloride, phosphorus trichloride or the like. The reaction of the compound represented by the general formula (9) and the compound represented by the general formula (10) may be performed in a basic solvent such as pyridine, triethylamine, or tributylamine.
本発明のベンゾトリアゾール化合物のうち、a+cが2〜1000となる1〜1000の数であり、bが1の数である化合物、即ち、下記一般式(12)で表わされる化合物は、下記の反応式で示すように一般式(4)で表わされる化合物に二塩基酸の酸無水物を反応させて一般式(13)で表わされる化合物とし、一般式(13)で表わされる化合物のカルボキシル基を、カルボン酸クロライド基に変換して一般式(14)で表わされる化合物とし、一般式(14)で表わされる化合物と一般式(11)で表わされる化合物とを反応させることにより得ることができる。 Among the benzotriazole compounds of the present invention, a compound in which a + c is a number from 1 to 1000 and 2 is a number of 1, that is, a compound represented by the following general formula (12) is represented by the following reaction: As shown by the formula, the compound represented by the general formula (4) is reacted with an acid anhydride of a dibasic acid to obtain a compound represented by the general formula (13), and the carboxyl group of the compound represented by the general formula (13) is The compound represented by the general formula (14) can be converted into a carboxylic acid chloride group, and the compound represented by the general formula (14) can be reacted with the compound represented by the general formula (11).
前記一般式(4)で表わされる化合物と前記一般式(7)で表わされる酸無水物との反応は、トリエチルアミン等の塩基触媒、メタンスルホン酸、p−トルエンスルホン酸等の酸触媒を用いることにより反応することができる。前記一般式(13)で表わされる化合物は、塩化チオニル、三塩化リン等を用いることにより、カルボキシル基をカルボン酸クロライド基に変換できる。前記一般式(14)で表わされる化合物と前記一般式(11)で表わされる化合物を反応は、ピリジン、トリエチルアミン、トリブチルアミン等の塩基性溶媒中で行えばよい。 The reaction between the compound represented by the general formula (4) and the acid anhydride represented by the general formula (7) uses a base catalyst such as triethylamine, and an acid catalyst such as methanesulfonic acid and p-toluenesulfonic acid. Can react. The compound represented by the general formula (13) can convert a carboxyl group into a carboxylic acid chloride group by using thionyl chloride, phosphorus trichloride or the like. The reaction of the compound represented by the general formula (14) and the compound represented by the general formula (11) may be performed in a basic solvent such as pyridine, triethylamine, tributylamine and the like.
本発明のベンゾトリアゾール化合物は、ラジカル反応性基を有しており、他のラジカル反応性化合物と反応することが可能である。反応方式に制限はなく、塊状重合、溶液重合、懸濁重合、乳化重合の何れでも反応可能であるが、水への分散性に優れていることから、乳化重合で反応させることが好ましい。 The benzotriazole compound of the present invention has a radical reactive group and can react with other radical reactive compounds. There is no limitation on the reaction method, and any of bulk polymerization, solution polymerization, suspension polymerization, and emulsion polymerization can be used. However, because of its excellent dispersibility in water, the reaction is preferably carried out by emulsion polymerization.
本発明の乳化重合物は、本発明のベンゾトリアゾール化合物と本発明のベンゾトリアゾール化合物以外の他のラジカル重合性化合物を乳化重合して得られるものである。尚、乳化重合の反応条件は公知の方法によればよく特に制限されない。 The emulsion polymer of the present invention is obtained by emulsion polymerization of the benzotriazole compound of the present invention and another radical polymerizable compound other than the benzotriazole compound of the present invention. The reaction conditions for emulsion polymerization are not particularly limited as long as they are known methods.
本発明の乳化重合物に用いられるラジカル重合性化合物に特に制限はなく、アクリレート系エマルション、スチレン系エマルション、酢酸ビニル系エマルション、SBR(スチレン/ブタジエン)エマルション、ABS(アクリロニトリル/ブタジエン/スチレン)エマルション、BR(ブタジエン)エマルション、IR(イソプレン)エマルション、NBR(アクリロニトリル/ブタジエン)エマルション等のいずれでもよい。 The radical polymerizable compound used in the emulsion polymer of the present invention is not particularly limited, and is an acrylate emulsion, styrene emulsion, vinyl acetate emulsion, SBR (styrene / butadiene) emulsion, ABS (acrylonitrile / butadiene / styrene) emulsion, Any of a BR (butadiene) emulsion, an IR (isoprene) emulsion, an NBR (acrylonitrile / butadiene) emulsion, and the like may be used.
本発明の乳化重合物において、本発明のベンゾトリアゾール化合物の使用量は、通常の使用量の範囲で任意に使用することができるが、ラジカル重合性化合物100質量部に対して、好ましくは0.001〜10質量部、より好ましくは0.05〜7質量部、更に好ましくは0.01〜5質量部添加して使用することができる。 In the emulsion polymer of the present invention, the amount of the benzotriazole compound of the present invention can be arbitrarily used within the range of the usual amount of use, but is preferably 0.1% relative to 100 parts by mass of the radical polymerizable compound. 001-10 mass parts, More preferably, 0.05-7 mass parts, More preferably, 0.01-5 mass parts can be added and used.
本発明の乳化重合物に用いられる乳化剤に特に制限はなく、アルキルサルフェート、アルカンスルフォネート、アルキルベンゼンスルフォネート、ポリオキシエチレンアルキルエーテルサルフェート、ポリオキシエチレンアルキルフェニルエーテルサルフェート等のアニオン系乳化剤;ポリオキシエチレンアルキルエーテル、ポリオキシエチレンアルキルフェニルエーテル等のノニオン系乳化剤;ポリオキシエチレンアルケニルフェニルエーテルスルフォネート、2−ポリオキシエチレン(1−アリロキシ−3−アルキロキシ)プロピルエーテルスルフォネート、2−ポリオキシエチレン(1−アリロキシ−3−アルキルフェノキシ)プロピルエーテルスルフォネート等のアニオン系反応性乳化剤;ポリオキシエチレンアルケニルフェニルエーテル、2−ポリオキシエチレン(1−アリロキシ−3−アルキロキシ)プロピルエーテル、2−ポリオキシエチレン{1−アリロキシ−3−(4−アルキルフェノキシ)プロピルエーテル等のノニオン系反応性乳化剤等のいずれでもよく、乳化剤の使用量はラジカル反応性化合物100質量部に対して、0.05〜10質量部、より好ましくは0.1〜7質量部、更に好ましくは0.5〜5質量部添加して使用することができる。 The emulsifier used in the emulsion polymer of the present invention is not particularly limited, and anionic emulsifiers such as alkyl sulfates, alkane sulfonates, alkyl benzene sulfonates, polyoxyethylene alkyl ether sulfates, polyoxyethylene alkyl phenyl ether sulfates; Nonionic emulsifiers such as oxyethylene alkyl ether and polyoxyethylene alkyl phenyl ether; polyoxyethylene alkenyl phenyl ether sulfonate, 2-polyoxyethylene (1-allyloxy-3-alkyloxy) propyl ether sulfonate, 2-poly Anionic reactive emulsifiers such as oxyethylene (1-allyloxy-3-alkylphenoxy) propyl ether sulfonate; polyoxyethylene alkenyl phenyl ester Any of nonionic reactive emulsifiers such as tellurium, 2-polyoxyethylene (1-allyloxy-3-alkyloxy) propyl ether, 2-polyoxyethylene {1-allyloxy-3- (4-alkylphenoxy) propyl ether Well, the amount of the emulsifier used is 0.05 to 10 parts by mass, more preferably 0.1 to 7 parts by mass, and still more preferably 0.5 to 5 parts by mass with respect to 100 parts by mass of the radical reactive compound. Can be used.
得られた乳化重合物は、各種プラスチック製品、塗料、接着剤、粘着剤、インク、フィルム、コーティング剤、紙塗工剤、サイズ剤、シーラー等に使用することができるが、他の物質に塗布する用途や他の物質の塗布を補助する用途である、塗料、接着剤、粘着剤、コーティング剤や、紙塗工剤、シーラー等に使用することが好ましい。 The resulting emulsion polymer can be used for various plastic products, paints, adhesives, adhesives, inks, films, coating agents, paper coating agents, sizing agents, sealers, etc., but applied to other substances. It is preferably used for paints, adhesives, pressure-sensitive adhesives, coating agents, paper coating agents, sealers and the like, which are used to assist the application of other substances.
以下、実施例により本発明を更に説明するが、本発明はこれらの実施例によって限定されるものではない。尚、特に限定のない限り、実施例中の「部」や「%」は質量基準によるものである。 EXAMPLES Hereinafter, although an Example demonstrates this invention further, this invention is not limited by these Examples. Unless otherwise specified, “parts” and “%” in the examples are based on mass.
〔実施例1〕
撹拌装置及び温度計を備えたガラス製反応容器に、2−(2−ヒドロキシ−3−t−ブチル−5−メチルフェニル)−5−(2−ヒドロキシエチル)ベンゾトリアゾール6.5g(20mmol)、無水コハク酸2.1g(21mmol)、触媒としてp−トルエンスルホン酸40mg及び溶媒としてトルエン50gを仕込み、80℃で2時間加熱撹拌し反応させた。次いで、塩素化剤として塩化チオニル63g(250mmol)及び触媒としてN,N−ジメチルホルムアミド100mgを添加し50℃で30分間加熱攪拌し反応させた後、過剰の塩化チオニルを減圧により除去した。この後、ポリエチレングリコール400モノメタクリレート9.6g(24mmol)とトリエチルアミン2.53g(25mmol)の混合溶液を40℃で、30分かけて滴下し、更に40℃で1時間撹拌を続けた。トルエン50gを仕込み、水洗により副生成物を除去した後、減圧してトルエンと水を除去し、本発明の化合物A1を得た。なお、2−(2−ヒドロキシ−3−t−ブチル−5−メチルフェニル)−5−(2−ヒドロキシエチル)ベンゾトリアゾールは、上記特許文献3(特開平2−142778号公報)に記載の方法により製造した。化合物A1は、前記一般式(1)においてR1がt−ブチル基、R2及びR5がメチル基、R3がエチレン基、R4がコハク酸からカルボキシル基を除いた残基、aが0、bが1、cが10の数である化合物である。化合物A1の同定は、1H−NMR及びUVスペクトルにより行った。1H−NMRによる同定結果を〔図1〕に示し、UVスペクトルによる同定結果を〔図3〕に示す。
[Example 1]
In a glass reaction vessel equipped with a stirrer and a thermometer, 6.5 g (20 mmol) of 2- (2-hydroxy-3-tert-butyl-5-methylphenyl) -5- (2-hydroxyethyl) benzotriazole, 2.1 g (21 mmol) of succinic anhydride, 40 mg of p-toluenesulfonic acid as a catalyst and 50 g of toluene as a solvent were charged, and the mixture was heated and stirred at 80 ° C. for 2 hours to be reacted. Next, 63 g (250 mmol) of thionyl chloride as a chlorinating agent and 100 mg of N, N-dimethylformamide as a catalyst were added and reacted by heating and stirring at 50 ° C. for 30 minutes, and then excess thionyl chloride was removed under reduced pressure. Thereafter, a mixed solution of 9.6 g (24 mmol) of
〔実施例2〕
攪拌機、温度計及び窒素導入管を備えた金属製加圧反応装置に、2−(2−ヒドロキシ−3−t−ブチル−5−メチルフェニル)−5−(2−ヒドロキシエチル)ベンゾトリアゾール38g(0.1モル)、触媒として水酸化カリウム0.2g、溶媒としてグライム50gを仕込んだ。130℃でエチレンオキサイド44g(1mol)をフィードし、フィード終了後、130℃で2時間熟成した。反応物を、撹拌装置及び温度計を備えたガラス製反応容器に移し、三フッ化ホウ素ジエチルエーテル錯体3gを加えて80℃で3時間攪拌して、t−ブチル基を脱離させた。酸性物質の吸着剤(協和化学工業製、商品名:キョーワード500SH)を10g加え、80℃で1時間攪拌した後、ろ過して吸着剤を除去した。撹拌装置、温度計を備えたガラス製反応容器に、このろ液及びピリジン50gを仕込み、30℃でメタクリル酸クロライド15.6g(0.15モル)を加えて、30℃で1時間撹拌を続けた。トルエン100gを仕込み、水洗した後、減圧して溶媒及び水を除去し、本発明の化合物A2を得た。化合物A2は、一般式(1)においてR1がt−ブチル基、R2及びR5がメチル基、R3がエチレン基、aが10、b及びcが0の数である化合物である。化合物A2の同定は、1H−NMR及びUVスペクトルにより行った。1H−NMRによる同定結果を〔図2〕に示す。尚、UVスペクトルによる同定結果については、化合物A1と実質的に同様であるため省略した。
[Example 2]
In a metal pressure reactor equipped with a stirrer, a thermometer and a nitrogen introduction tube, 38 g of 2- (2-hydroxy-3-tert-butyl-5-methylphenyl) -5- (2-hydroxyethyl) benzotriazole ( 0.1 mol), 0.2 g of potassium hydroxide as a catalyst, and 50 g of glyme as a solvent were charged. Ethylene oxide (44 g, 1 mol) was fed at 130 ° C., and after completion of the feeding, the mixture was aged at 130 ° C. for 2 hours. The reaction product was transferred to a glass reaction vessel equipped with a stirrer and a thermometer, 3 g of boron trifluoride diethyl ether complex was added, and the mixture was stirred at 80 ° C. for 3 hours to desorb the t-butyl group. 10 g of an acidic material adsorbent (trade name: KYOWARD 500SH, manufactured by Kyowa Chemical Industry Co., Ltd.) was added and stirred at 80 ° C. for 1 hour, followed by filtration to remove the adsorbent. A glass reaction vessel equipped with a stirrer and a thermometer was charged with 50 g of this filtrate and pyridine, 15.6 g (0.15 mol) of methacrylic acid chloride was added at 30 ° C., and stirring was continued at 30 ° C. for 1 hour. It was. After adding 100 g of toluene and washing with water, the solvent and water were removed under reduced pressure to obtain Compound A2 of the present invention. Compound A2 is a compound in which R 1 is a t-butyl group, R 2 and R 5 are methyl groups, R 3 is an ethylene group, a is 10, b and c are 0 in general formula (1). Compound A2 was identified by 1 H-NMR and UV spectrum. The identification result by 1 H-NMR is shown in FIG. In addition, about the identification result by UV spectrum, since it was substantially the same as that of compound A1, it abbreviate | omitted.
比較化合物として、下記の比較の化合物B1、B2及びB3、乳化剤として、下記の乳化剤Cを用意した。尚、比較の化合物B2は、上記特許文献3(特開平2−142778号公報)の実施例1に準じて製造したものであり、また比較の化合物B3は、上記特許文献4(特表2002−514662号公報)の実施例1に準じて製造したものである。 The following comparative compounds B1, B2 and B3 were prepared as comparative compounds, and the following emulsifier C was prepared as an emulsifier. Comparative compound B2 was prepared according to Example 1 of Patent Document 3 (Japanese Patent Laid-Open No. 2-142778), and Comparative Compound B3 was prepared from Patent Document 4 (Special Table 2002). No. 5,146,62)).
〔実施例3〜6及び比較例1〜4〕
実施例の化合物A1及びA2、比較の化合物B1〜B3、乳化剤C、重合性モノマーとしてアクリル酸ブチル、アクリル酸メチル又はアクリル酸を用いて、〔表1〕に示す質量比にて配合し実施例3〜6及び比較例1〜4のモノマー溶液を調製し、下記の乳化重合方法にて乳化重合を行い乳化重合物を得た。各乳化重合物は下記の方法にて光沢保持率を測定した。結果を〔表1〕に示す。なお、光沢保持率が高いほど、紫外線吸収効果が優れ、長期間維持されることを示す。
[Examples 3 to 6 and Comparative Examples 1 to 4]
Examples Compound A1 and A2, Comparative Compounds B1 to B3, Emulsifier C, Butyl Acrylate, Methyl Acrylate, or Acrylic Acid as Polymerizable Monomer and Blended in Mass Ratios Shown in Table 1 3-6 and the monomer solution of Comparative Examples 1-4 were prepared, the emulsion polymerization was performed with the following emulsion polymerization method, and the emulsion polymer was obtained. Each emulsion polymer was measured for gloss retention by the following method. The results are shown in [Table 1]. In addition, it shows that an ultraviolet absorption effect is excellent and it is maintained for a long time, so that a gloss retention is high.
〔乳化重合方法〕
撹拌機及び温度計および窒素導入管を備えたガラス製反応容器に、脱イオン水120gを仕込み、系内を窒素ガスで置換した。モノマー溶液10gと過硫酸アンモニウム0.08gとを添加した後60℃に昇温し、モノマー溶液90gを2時間かけて滴下し、滴下終了後、更に60℃で2時間撹拌して熟成し乳化重合物を得た。
[Emulsion polymerization method]
A glass reaction vessel equipped with a stirrer, a thermometer, and a nitrogen introduction tube was charged with 120 g of deionized water, and the system was replaced with nitrogen gas. After adding 10 g of the monomer solution and 0.08 g of ammonium persulfate, the temperature was raised to 60 ° C., 90 g of the monomer solution was added dropwise over 2 hours, and after completion of the dropwise addition, the mixture was further aged by stirring for 2 hours at 60 ° C. Got.
〔光沢保持率〕
上記乳化重合物を、50mm×70mmのガラス板に厚さ1mmになるように塗布し、12時間風乾後、100℃恒温槽で1時間乾燥したものを試験片とした。各試験片の光沢を測定した後、促進耐候性試験を行い、促進耐候性試験後の各試験片の光沢を測定した。この促進耐候性試験前の光沢に対する促進耐候性試験後の光沢の100分率を光沢保持率とした。
光沢の測定 使用機器:精密光沢計(村上色彩技術研究所製、型式:GM26D)、測定角:60°
促進耐候性試験 使用機器:サンシャインウエザオメーター(スガ試験機製、型式:WEL−SUN−HCH−B)、試験条件:温度:63±3℃、サイクル:120分中18分降雨、試験時間:2,000時間
[Gloss retention]
The emulsion polymer was applied to a 50 mm × 70 mm glass plate to a thickness of 1 mm, air-dried for 12 hours, and then dried in a 100 ° C. constant temperature bath for 1 hour to obtain a test piece. After measuring the gloss of each test piece, an accelerated weather resistance test was performed, and the gloss of each test piece after the accelerated weather resistance test was measured. The gloss retention after 100 minutes of the gloss after the accelerated weather resistance test with respect to the gloss before the accelerated weather resistance test was determined.
Gloss measurement Equipment used: Precision gloss meter (Murakami Color Research Laboratory, Model: GM26D), Measurement angle: 60 °
Accelerated weather resistance test Equipment used: Sunshine weatherometer (manufactured by Suga Test Instruments, model: WEL-SUN-HCH-B), test conditions: temperature: 63 ± 3 ° C., cycle: rain for 18 minutes in 120 minutes, test time: 2 , 000 hours
上記〔表1〕の結果から、実施例3〜6の試験片は光沢保持率が高く、本発明のベンゾトリアゾール化合物を使用した乳化重合物から得られる塗膜が、厳しい自然環境の条件下においても長期間、優れた紫外線吸収効果を維持できることを示している。これは、本発明のベンゾトリアゾール化合物が、ラジカル重合性基により他のモノマーと反応して塗膜を形成しているだけでなく、乳化重合において、反応系で分散することにより塗膜中に均一に存在するためと考えられる。 From the results of the above [Table 1], the specimens of Examples 3 to 6 have high gloss retention, and the coating film obtained from the emulsion polymer using the benzotriazole compound of the present invention has a severe natural environment. It also shows that an excellent ultraviolet absorption effect can be maintained for a long time. This is because not only the benzotriazole compound of the present invention reacts with other monomers by a radical polymerizable group to form a coating film, but also in emulsion polymerization, it is uniform in the coating film by being dispersed in the reaction system. It is thought that it exists in.
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| JPH02142778A (en) * | 1988-11-24 | 1990-05-31 | Adeka Argus Chem Co Ltd | Benzotriazole compound |
| JPH10251591A (en) * | 1997-03-14 | 1998-09-22 | Nippon Shokubai Co Ltd | Aqueous resin dispersion for thermosensitive recording material, production of the dispersion and thermosensitive recording material by using the dispersion |
| WO2007108347A1 (en) * | 2006-03-20 | 2007-09-27 | Konica Minolta Opto, Inc. | Cellulose acylate optical film, method for producing same, polarizing plate using same, and liquid crystal display |
| JP2009013337A (en) * | 2007-07-06 | 2009-01-22 | Nippon Shokubai Co Ltd | Water dispersion type composition and method for producing the same |
| JP2012025811A (en) * | 2010-07-21 | 2012-02-09 | Shinnakamura Kagaku Kogyo Kk | Ultraviolet absorptive benzotriazole-based (co)polymer, coating including the same, and film coated with the coating |
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| JPH02142778A (en) * | 1988-11-24 | 1990-05-31 | Adeka Argus Chem Co Ltd | Benzotriazole compound |
| JPH10251591A (en) * | 1997-03-14 | 1998-09-22 | Nippon Shokubai Co Ltd | Aqueous resin dispersion for thermosensitive recording material, production of the dispersion and thermosensitive recording material by using the dispersion |
| WO2007108347A1 (en) * | 2006-03-20 | 2007-09-27 | Konica Minolta Opto, Inc. | Cellulose acylate optical film, method for producing same, polarizing plate using same, and liquid crystal display |
| JP2009013337A (en) * | 2007-07-06 | 2009-01-22 | Nippon Shokubai Co Ltd | Water dispersion type composition and method for producing the same |
| JP2012025811A (en) * | 2010-07-21 | 2012-02-09 | Shinnakamura Kagaku Kogyo Kk | Ultraviolet absorptive benzotriazole-based (co)polymer, coating including the same, and film coated with the coating |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2022039120A1 (en) | 2020-08-21 | 2022-02-24 | 富士フイルム株式会社 | Polymerizable composition, polymer, ultraviolet shielding material, laminate, compound, ultraviolet absorbing agent, and method for producing compound |
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