JP2014070969A - Rate sensor, linear source and vapor deposition device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a rate sensor that reduces a time required for pre-coating and reduces production man-hours, a linear source, and a vapor deposition device.SOLUTION: In a rate sensor in which a predetermined number of crystal oscillators are arranged on a concentric circle, a first crystal oscillator is pre-coated at a higher temperature than a normal vapor deposition temperature. Since the rate sensor includes a cover having a first opening part provided so as to expose with respect to steam from an evaporation source and a second opening part adjacent to the first opening part, a second crystal oscillator is pre-coated simultaneously at normal vapor deposition while exposing the crystal oscillator of the second opening part.

Description

  The present invention relates to a thin film forming process in a flat panel production line, and more particularly to a technique for using a rate sensor and a linear source in a vapor deposition apparatus.

  In the manufacturing technology of a flat panel display (hereinafter referred to as FPD), a vapor deposition apparatus is routinely used as a general means for forming (forming) a thin film. The vapor deposition apparatus fills a crucible with a material to be deposited (deposition material vapor deposition), heats the crucible with a heating device such as a heater, and reaches the melting point or sublimation point of the filled material, so that the vapor deposition material is removed from the crucible. A thin film is formed by discharging after evaporation or sublimation and adhering (depositing) on a substrate to be deposited.

In the vapor deposition method in the vapor deposition apparatus, as a means for knowing the amount of vapor discharged from the crucible or the film thickness formed on the target substrate, the current discharge amount or always in real time by a crystal rate sensor (hereinafter referred to as a rate sensor). The most common method is monitoring the film thickness.
The rate sensor is provided in the vicinity of the film formation target substrate and utilizes the fact that the vapor deposition material discharged from the crucible is also deposited on the surface of the crystal unit. By exposing the surface of the crystal unit of the rate sensor to the discharge vapor, the degree of deposition on the surface of the crystal unit and its own natural frequency change, and based on this change, the volume per second: [A / s ], The discharge vapor amount (deposition rate) is calculated.
Using the deposition rate obtained by the rate sensor as an index, feedback control of the temperature controller of the heating device that heats the crucible controls the amount of deposition material discharged from the crucible to obtain the desired film thickness The deposition rate is adjusted so that

  Gold (hereinafter referred to as Au) is sputtered on the surface of the quartz vibrator of the rate sensor to form an Au thin film. The rate sensor measures the natural frequency (resonance frequency) of the quartz resonator body, which decreases as the vapor deposition material is deposited on the Au thin film, and the current vapor deposition rate and vapor volume are determined by the change in the measured frequency. know. For this reason, electrodes are provided on the back surface, and frequency is generated and detected by applying a voltage to the Au thin film on the front surface and the electrodes on the back surface.

In addition, the rate sensor using the crystal resonator has a short life in which the film thickness can be detected, and if the decrease in frequency is about 10% or less of the initial frequency, the film thickness cannot be accurately detected practically. . Therefore, a scale called Life is set for each crystal resonator as the degree of use. As described above, the frequency decreases as the deposition material is deposited on the surface of the crystal unit. However, when the decreased frequency decreases by 1% from the initial frequency (frequency at the start of measurement), Life advances “1”. Therefore, the Life when the frequency is reduced by 10% from the whole corresponds to “10”.
When the Life of one crystal resonator becomes “10”, the crystal resonator reaches the end of its life and is replaced (for example, refer to Patent Document 1 and Patent Document 2). However, since vapor deposition is performed in a vacuum, in order to extend the continuous operation time, an automatic crystal changer mechanism is usually installed in the retainer of the rate sensor in general vapor deposition equipment or rate sensors. Has been. In the retainer portion of the rate sensor, a plurality of disk-shaped crystal resonators are arranged concentrically with respect to the rotation center axis. Then, when Life, which is the degree of use of the crystal unit, becomes “10”, the rate sensor automatic exchange mechanism is operated to rotate the retainer unit, and the crystal unit for measuring the film thickness is changed to another crystal unit. Exchange for a child. In addition, regarding a rate sensor in which a plurality of crystal resonators are arranged, if 20 crystal resonators are arranged, it is called a 20-unit rate sensor, and if twelve crystal resonators are arranged, 12 This is called a continuous rate sensor.

As described above, an Au thin film is formed as an electrode on the surface of many common products of the respective crystal units used in the rate sensor.
The adhesion between the deposition material and the Au film on the surface of the rate sensor differs depending on the compatibility between the deposition material and Au. However, the rate sensor is usually installed in front of or near the nozzle that discharges the vapor deposition material from the crucible or the substrate. And the vapor deposition material adheres (deposits) by exposing the rate sensor surface to the vapor | steam of the vapor deposition material discharged from a crucible. As a result of this adhesion (deposition), the frequency of the crystal resonator decreases, and the amount of vapor desired to be detected can usually be detected immediately. However, the organic material used for vapor deposition is steadily changing, and the organic material is frequently changed and improved, and the adhesion between the changed or improved vapor deposition material and the Au film on the surface of the crystal unit is not so much. There are many materials that are not good.

Each quartz crystal resonator of the rate sensor can detect a rate for the first time by depositing a vapor deposition material on the surface of the crystal resonator.
Depending on the vapor deposition material, the adhesion with the Au film on the surface of the crystal unit is poor, and the vapor deposition material does not adhere to the Au film, so that the evaporation rate cannot be detected immediately.
Therefore, when using a material with poor adhesion to the Au film on the surface of the crystal unit as the vapor deposition material, before starting the film thickness detection on the Au film on the surface of the crystal unit, A step (pre-coating step) for forming the vapor deposition material is required. For this reason, a pre-coating process (pre-coating) may be required in the vapor deposition material.
The cause of this phenomenon is thought to be due to the adhesion between the surface of the crystal unit (usually an Au film) and the vapor deposition material. The melt-type material in which the properties of the vapor deposition material pass through the three states of the substance due to the change in the state of the substance, once turned into a gas (vapor), is cooled on the surface of the crystal unit and returned to the solid state. At this time, it is possible to detect the rate by reducing the frequency of the crystal unit by depositing it in close contact with the surface of the Au film.

This is not the case, but it is a material called a sublimation system. In general, sublimation means that when a vapor deposition material is heated and changed from a solid, the liquid state is skipped to change to a gas.
When such a material is rate-detected by the rate sensor, the vapor material does not readily adhere to the Au surface of the crystal resonator, and deposition does not proceed. For this reason, it takes a long time to detect the rate, or a phenomenon in which the rate cannot be detected continues.

For this reason, when using a material that is not very good in adhesion with the Au film on the surface of the crystal unit as a deposition material, before starting the film thickness detection on the Au film on the surface of the crystal unit, A step (pre-coating step) for forming the vapor deposition material is required.
In other words, the pre-coating step (pre-coating) is a step of predepositing a 10 minute amount of vapor deposition material on the surface of the crystal unit before actual vapor deposition. By pre-coating, rate detection can be started immediately from the moment when the quartz crystal whose rate is detected by the automatic quartz crystal exchange mechanism is replaced with a new quartz crystal.

There are several methods for this pre-coating, but the most common and typical method is to heat the crucible containing the material at a temperature higher than the deposition temperature.
That is, it is a method that intentionally creates a large amount of vapor above the target rate during normal production vapor deposition and forcibly deposits the vapor deposition material on the surface of the Au film of the crystal resonator.
However, even if this method is used, the time required for pre-coating per quartz crystal resonator is about 4 [h], and it is a very time-consuming process at present.

In the rate sensor in which a plurality of crystal resonators are connected by the automatic crystal exchange mechanism described above, it is necessary to pre-coat the surface individually before detecting the rate. The number of man-hours for this varies depending on the number of continuous installations, but requires about several tens of hours [h].
In mass production facilities, this man-hour is very pressure on production operation time. In addition, when pre-coating is performed by separate setup, another facility is required, which causes a problem that requires much labor and time. Assuming that the pre-coating time per crystal unit is 4 [h], a twelve continuous rate sensor requires 48 [h] man-hours.

JP-A-11-222670 JP 2007-24909 A

In the above-mentioned pre-coating, first, the temperature is controlled to exceed the normal vapor deposition temperature in the crucible, and a high-density vapor is generated by discharging a large amount of vapor deposition material. In this state, the Au film surface of the quartz vibrator of the rate sensor is exposed to high-density vapor for a long time, and the evaporation material is forcibly deposited on the Au film.
As described above, the deposition rate (film thickness) can be detected for the first time only by performing pre-coating with a material that does not have good adhesion with the Au film.
However, in this pre-coating, in order to increase the vapor density reaching the rate sensor, it is necessary to increase the amount of vapor by setting the crucible temperature to be significantly higher than in normal vapor deposition. For this reason, the time required for raising the temperature of the crucible to the pre-coating temperature, the time for pre-coating, the time for lowering the temperature of the crucible to the temperature for normal production vapor deposition, and the waiting time for stabilization of the normal production vapor deposition state are required. It takes a lot of time to reach production vapor deposition. For example, the time required for pre-coating varies depending on conditions such as the distance and angle from the crucible nozzle to the rate sensor, or the degree of vacuum, but by the time pre-coating is completed for one crystal resonator, It takes several hours.

Further, the lifetime of the crystal resonator used in this rate sensor is as short as about 10% in decrease from the initial frequency. Therefore, a rate sensor used for mass production equipment that requires continuous deposition in units of several hundred hours is generally connected (arranged) with a plurality of crystal resonators, and the crystal resonator used for rate detection is When it reaches the end of its life, it has an automatic crystal exchange mechanism that automatically replaces it with the next crystal resonator. This rate sensor having an automatic crystal exchange mechanism has a plurality of (for example, twelve) crystal resonators arranged on a circular holder (crystal holder) of a retainer section concentrically around the rotation axis. It is a set. The automatic crystal exchange mechanism is a new crystal unit that has a vapor deposition material deposited over a certain film thickness and has reached its end of life. The rotating shaft mounted at the center point of the crystal holder is rotated by the power of a servo motor, etc. This is to replace the quartz crystal. For example, if it takes 10 hours for one crystal unit to reach the end of its life, it is possible to continuously deposit 120 [h] by replacing 12 (12 × 10 [h] = 120 [h]). Become.
However, for continuous operation, if pre-coating is applied in advance to a plurality of continuous rate sensors in which a plurality of crystal resonators are arranged, for example, all of the crystal resonators in a rate sensor in which 12 crystal resonators are connected in series. To do. In this case, if the time required for pre-coating one crystal resonator is about 4 [h], several 10 [h] is required. Thus, when pre-coating is applied to all quartz resonators of rate sensors that are connected in series, such as 12 units for continuous operation, enormous man-hours are required for the pre-coating process before the start of production. Is greatly reduced.
In the production line of FPD, it is common to produce at a pace of several minutes per panel. Under such circumstances, the number 10 [h] before the start of production is a very large time that cannot be ignored.

  In view of the above problems, an object of the present invention is to shorten the time required for pre-coating and to reduce the number of production steps.

  In order to achieve the above object, a rate sensor according to the present invention is a rate sensor in which a predetermined number of crystal resonators are arranged concentrically, and is provided so as to be exposed to vapor from an evaporation source. A first feature is that a cover having a first opening and a second opening adjacent to the first opening is provided.

  In the rate sensor according to the first aspect of the present invention, the first film thickness detection means of the crystal resonator disposed in the first opening and the crystal resonator disposed in the second opening. A second film thickness detecting unit, and the first film thickness detecting unit and the second film thickness detecting unit provide a crystal resonator disposed in the first opening and the second opening. The second feature of the present invention is that the film thickness of the arranged crystal resonators can be detected simultaneously.

  The rate sensor according to the second aspect of the present invention further includes a pre-coated shutter that rotates to expose both the first opening and the first opening or only the first opening. The third feature of the present invention is that the precoat shutter rotates so as to expose both the first opening and the first opening when rate detection is started.

  In the rate sensor according to the third aspect of the present invention, when the pre-coating shutter detects the pre-coating end timing by the second film thickness detecting means, only the first opening is exposed. It is the fourth feature of the present invention that the motor rotates in the direction.

  In order to achieve the above object, the linear source of the present invention is a linear source including at least a crucible and a plurality of vapor deposition nozzles for discharging the vapor of the crucible, 5th characteristic of this invention that at least 1 was provided toward the said 1st opening part and the said 2nd opening part of the rate sensor in any one of Claim 1 thru | or 4. To do.

  The rate sensor according to any one of the first to fourth features of the present invention and the linear source according to the fifth feature of the present invention are provided, and vapor discharged from the linear source is deposited on a substrate. In addition, a sixth feature of the present invention is that a crystal resonator disposed in the second opening of the rate sensor is precoated.

  In the vapor deposition apparatus according to the sixth aspect of the present invention, the retainer portion of the rate sensor according to any one of the first to fourth characteristics of the present invention includes a crystal exchange mechanism, and the first sensor When it is detected by the film thickness detecting means that the crystal resonator that is currently detecting the rate has reached the end of its life, the crystal resonator disposed on the concentric circle is rotated, and the pre-coated crystal resonator is moved to the first crystal resonator. It is a seventh feature of the present invention to rotate to the opening.

  According to the present invention, pre-coating can be performed in parallel with actual production.

It is a figure which shows the relationship between the linear source of one Example of the vapor deposition apparatus of this invention, and a rate sensor. It is a figure which shows one Example of the retainer part of the rate sensor of this invention. It is a figure which shows one Example of the retainer part of the rate sensor of this invention. It is a figure which shows one Example of the retainer part of the rate sensor of this invention. It is a figure which shows one Example of the retainer part of the rate sensor of this invention. It is a figure which shows one Example of the drive part of the triaxial structure of the retainer part of the rate sensor of this invention. FIG. 2 is a developed perspective view including a partial cross-section for explaining the structure of the retainer part in the embodiment of the rate sensor of the present invention. It is the expansion | deployment perspective view containing the partial cross section which showed the detail of one Example of the crystal oscillator holder in the rate sensor of this invention. FIG. 3 is a circuit diagram showing an embodiment of a high-frequency resonance circuit formed by including the crystal resonator 50 of the crystal resonator holder 10 in the rate sensor of the present invention. It is a figure which shows the principal part structure of the vapor deposition apparatus which equipped the rate sensor of this invention inside. It is an expansion | deployment perspective view which shows one Example of the structure of the linear source of EL material provided in the inside of the vapor deposition apparatus of this invention. It is sectional drawing which shows the detailed structure of the linear source of the vapor deposition apparatus of this invention. In one Example of the vapor deposition apparatus of this invention, it is a figure explaining the structure which attached the rate sensor to the linear source of EL material of a vapor deposition apparatus.

The present invention relates to a crystal vibration that is first used for rate detection when a magnesium (hereinafter referred to as Mg) material is vapor-deposited in a rate sensor in which a plurality of crystal resonators are concentrically arranged in a retainer portion (for example, 12 consecutively mounted). As described in the prior art, the child is pre-coated with the temperature of the crucible set higher than that during normal production vapor deposition. In normal Mg vapor deposition, the set temperature is 350 to 400 [° C.] (normal production vapor deposition temperature). The temperature is raised to 400 to 450 [° C.] (pre-coating temperature), and coating is performed in as short a time as possible.
After the pre-coating is finished, the crucible temperature is lowered to the normal production vapor deposition temperature, and production is started while the rate is detected by this first crystal resonator (position # 1).
At this time, another inlet is provided separately from the inlet for detecting the normal rate, and the pre-coating of the second crystal resonator (position # 2) is performed in parallel with the normal production vapor deposition. Do it.
In this way, while performing normal mass production, the pre-coating of the crystal unit used for rate detection is performed simultaneously. As a result, it is not necessary to perform pre-coating separately from the crystal unit that is used for rate detection first (no pre-coating time is required). It is possible to finish a plurality of pre-coating operations without being applied.

Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
In addition, the following description is for describing one embodiment of the present invention, and does not limit the scope of the present invention. Accordingly, those skilled in the art can employ embodiments in which these elements or all of the elements are replaced with equivalent ones, and these embodiments are also included in the scope of the present invention.
Further, in the present description, in the description of each of the following drawings, components having a common function are denoted by the same reference numerals and description thereof is omitted.

  FIG. 1 is a diagram for explaining the relationship between a linear source and a rate sensor in the first embodiment of the vapor deposition apparatus of the present invention. 11 and 12 are rate sensors, 11 is referred to as a side sensor, and 12 is referred to as a bottom sensor. Further, 13 is a linear source, 14 is an evaporation source base for fixing the linear source 13, and 15 is a plurality of vapor deposition nozzles of the linear source 13. The discharge direction of the vapor deposition nozzle 15 is directed to a target substrate (not shown). Further, the vapor deposition nozzle 15 in the vicinity of both ends of the linear source 13 faces the side sensor 11 or the bottom sensor 12 in addition to the target substrate (not shown). Accordingly, the side sensor 11 or the bottom sensor 12 can detect the rate.

In FIG. 1, at the time of normal production vapor deposition, the vapor discharged from the vapor deposition nozzle 15 is caught by the side sensor 11 or the bottom sensor 12, and the current vapor amount is controlled and managed by the vapor deposition rate [A / s]. Do the membrane. That is, in the vapor deposition apparatus of the present invention, during normal production vapor deposition, the side sensor 11 or the bottom sensor 12 detects the film thickness of the vapor deposition material adhering to or depositing on the crystal unit located at # 1, and the current vapor deposition is performed. Detect the rate. Accordingly, the vapor deposition apparatus performs rate control (control and management) on the vapor deposition amount and vapor deposition rate of the target substrate.
There are various embodiments of rate sensor schemes and arrangements. For example, either a side sensor type arranged at both ends of the evaporation source or a bottom sensor type arranged at the evaporation source base 14 in front of the evaporation source may be used, or a combination thereof may be used. To draw both to do.)
This rate sensor is provided with a crystal resonator (see FIG. 2 described later) as a single unit or connected, and the vapor discharged from the vapor deposition nozzle 15 adheres (deposits) to the surface of the crystal resonator. The frequency of the crystal unit decreases. The current vapor amount (deposition rate [A / s]) can be detected based on the frequency difference.
The shortening of the pre-coating time by the rate sensor in which a plurality of crystal resonators described in FIG. 1 are connected will be described below.

2A to 2D are views showing an embodiment of the retainer portion of the rate sensor of the present invention.
FIG. 2A is a diagram illustrating a retainer portion of a 12-row rate sensor. FIG. 2B is a diagram for explaining the pre-coated shutter of the rate sensor in FIG. 2A. FIG. 2C is a diagram illustrating the second crystal resonator while the first crystal resonator of the rate sensor is detecting a normal rate. It is a figure for demonstrating that is pre-coated. 2D is a diagram for explaining the pre-coated shutter of the rate sensor in FIG. 2A, as in FIG. 2B.
In FIG. 2A, FIG. 2B, and FIG. 2C, the upper figure is the top view seen from the top, and the lower figure is sectional drawing seen from the side. FIG. 2D is a plan view seen from above. Reference numerals 50 and 51 denote crystal resonators. Reference numeral 111 denotes a rotation axis of the rate sensor, 10 denotes a quartz crystal holder, 40 denotes a precoat shutter, 20 denotes a retainer cover, 21 denotes a rate detection opening, 23 denotes a precoat opening, 22 denotes a shutter opening, and 41 denotes This is an opening of the precoat shutter 40.
In FIG. 2A, the positions of the twelve crystal units set in the retainer unit 10 are compared to the hour hand of the dial of the watch, and the crystal unit at the twelve o'clock position is set to position # 1, and the position of the eleven o'clock position is set. The crystal oscillator is at position # 2, the crystal oscillator at the 10 o'clock position is at position # 3, ... the crystal oscillator at the 2 o'clock position is at position # 11, and the crystal oscillator at the 1 o'clock position is This will be described as position # 12.

The rate detection opening 21 of the retainer cover 20 is provided so as to expose the crystal resonator 50 at the position # 1 to the vapor from the evaporation source, and the precoat opening 23 is at the position # 2. A certain crystal resonator 51 is provided so as to be exposed. Therefore, the crystal resonator 50 at the position # 1 is used for rate detection, and the crystal resonator 51 at the position # 2 is precoated.
The upper diagram in FIG. 2B is an example in which the precoat shutter 40 rotates and its opening 41 is in a position where the rate detection opening 21 and the precoat opening 23 of the retainer cover 20 are exposed. FIG. 2D shows an example in which the precoat shutter 40 rotates and its opening 41 is in a position where only the rate detection opening 21 of the retainer cover 20 is exposed and the precoat opening 23 is shielded.
Moreover, although the retainer cover 20 and the precoat shutter 40 are put on the upper side of the retainer part 10, either may be on top. Further, there may be a chopper plate for reducing the amount of vapor adhering to the crystal resonator (not shown).

As shown in FIG. 2A, this rate sensor is a 12-connected rate sensor in which 12 crystal resonators are connected in series. The twelve crystal resonators are arranged (set) on the retainer portion 10 at equal intervals on a concentric circle having the rotation axis 111 as the center (angle 30 [°]). In addition, each of the crystal resonators is pressed by a crystal resonator holder from above, and is sandwiched and fixed between the retainer from below.
In one embodiment of the rate sensor of the present invention, as shown in FIG. 2C, two adjacent crystal units are separated from the evaporation source by two openings 21 and 23 provided in the retainer cover 20. Is exposed to.
Further, a precoat shutter 40 is placed on the retainer cover 20, and the opening and closing of the two adjacent openings 21 and 23 are controlled by the shutter opening 22 provided in the precoat shutter 40.

During normal production vapor deposition, in FIG. 2C, the crystal resonator 50 of the rate detection opening 21 at position # 1 is used for rate detection. That is, the vapor deposition rate is controlled by rate-detecting the film thickness of the vapor deposition material adhering to or depositing on the crystal resonator 50 at position # 1 (rate control). At the same time, the pre-coated shutter 40 is so exposed that the crystal unit 52 offset (offset) to a position 30 ° left of this position (counterclockwise as viewed from above) (position # 2) is exposed. Rotate. That is, in the opening 41 of the precoat shutter 40, both the rate detection opening 21 and the precoat opening 23 are opened, and the crystal resonator 50 in the position # 1 and 51 in the position # 2 are set in both. Is controlled to be exposed to the vapor from the evaporation source.
Accordingly, the vapor discharged from the vapor deposition nozzle 15 is simultaneously attached (deposited) to the rate detection (vapor deposition control) crystal resonator 50 and the precoat crystal resonator 51. As a result, the vapor is attached (deposited) to the crystal resonator 51 to be precoated at the position # 2 at the same time while performing the normal production vapor deposition by controlling the rate using the rate detecting crystal resonator 50 at the position # 1. To do. That is, during normal production vapor deposition using one (position # 1) crystal resonator, the other (position # 2) crystal resonator can be pre-coated.
Thereafter, when the pre-coating is completed, the pre-coating shutter 40 is rotated, the pre-coating opening 23 is hidden, and the crystal oscillator 51 to be pre-coated at the position # 2 is shielded against the vapor from the evaporation source. (See FIG. 2D.)

The crystal resonator 51 for which pre-coating has been completed stands by until the Life of the rate detecting crystal resonator 50 becomes “10” (life is reached).
Life “10” of the crystal resonator 50 for rate detection is reached (when the end of the life is detected, the retainer unit 10 in FIG. 2A is moved 30 [clockwise] to the right (clockwise) by the automatic crystal exchange mechanism. As a result of the rotation, the crystal unit 51 that has already been pre-coated moves to a deposition rate (for rate control) position # 1 as a new rate detection crystal unit 50. At the same time, The new crystal resonator set in # 3 moves to position # 2 as a new precoat crystal resonator 51.
As described above, the crystal resonator 50 that has moved to the position # 1 is used for rate control, and the quartz resonator 51 that has moved to the position # 2 at the same time or later starts pre-coating. That is, the rotation of the precoat shutter 40 is controlled so that both the rate detection opening 21 and the precoat opening 23 are exposed to the vapor from the evaporation source during rate control and precoating. After the pre-coating of the crystal resonator 51 at the position # 2, the pre-coating shutter 40 is exposed to the rate detection opening 21 and the pre-coating opening 23 with respect to the vapor from the evaporation source. The rotation is controlled so as to be shielded.
Subsequent operations are repeated until all the crystal resonators for the number of connected units reach the end of their lives.

Note that the end of pre-coating is automatically determined based on the decrease in the frequency and the life of the crystal unit. Usually, a rate sensor used for vapor deposition has a function of detecting a vapor deposition rate in real time, a detection of Life indicating the life of a crystal unit during rate control (rate detection), and a function of detecting a frequency. Yes.
This function is usually provided only in the crystal resonator for rate control (that is, the crystal resonator at position # 1). The rate sensor of the present invention also has this function in a pre-coating crystal resonator (a crystal resonator at position # 2). For this reason, the crystal resonator at the position # 2 can detect the deposition rate [A / s], the frequency, and the Life during the pre-coating. As a result, the rate sensor, the linear source, and the vapor deposition apparatus of the present invention detect the pre-coating end timing, control the rotation of the pre-coating shutter, shield the rate control crystal resonator, and discharge from the evaporation source. It is possible to prevent further vapor deposition.

As a structural feature for providing the above function, the retainer portion of the rate sensor of the present invention has a triaxial drive unit 306 as shown in FIG. 3, and the retainer portion 10, the precoat shutter 40, and the chopper. Move the plate to rotate.
In order to drive the precoat shutter 40, a dedicated cylinder 305 is provided to control rotation.

  According to the first embodiment, the time required for pre-coating can be shortened and the number of production steps can be reduced.

  First, an embodiment of the rate sensor of the present invention will be described with reference to FIG. FIG. 4 is an exploded perspective view including a partial cross-section for explaining the structure of the retainer part in an embodiment of the rate sensor of the present invention. Reference numeral 10 denotes a crystal oscillator holder, 441 denotes a roller bearing, 414 denotes a pressing plate, 30 denotes a rotating shaft, 22 denotes an opening provided at the center of rotation of the retainer cover 20, and 42 denotes a screw.

As is clear from FIG. 4, the retainer portion has a substantially disk shape, and includes a crystal resonator holder 10 and a retainer cover (cover portion) 20. The crystal resonator holder 10 has a shape in which an outer peripheral portion (for example, outside of approximately half of the radius) is conically recessed inward by a predetermined angle θ ₁ (see FIG. 5 described later). Further, it is formed so as to cover the entire crystal unit holder 10. Thereby, the retainer cover 20 covers the surface of the crystal unit holder 10 (that is, the outer peripheral portion is recessed in a conical shape), and a circular rate detection opening 21 and a precoat are formed at a part (for example, the top). The opening 23 for use and the opening 22 are formed.
The retainer portion of FIG. 4 has the shape of a concave mirror whose central portion is approximately concave, but may be the shape of a convex mirror whose central portion is approximately convex.

  In FIG. 4, a roller bearing 411 is attached to the center of the crystal unit holder 10, and a rotating shaft 30 for rotating the precoat shutter 40 via the roller bearing 411 is rotatable. Has been planted. Further, the rotating shaft 30 is rotatably attached to the retainer cover 20 via a roller bearing 411 attached to the central portion of the retainer cover 20. The outer end of the rotating shaft 30 that protrudes from the roll bearing 411 has a substantially disk shape, and the outer peripheral portion is recessed in a conical shape, and an opening (for example, for example) A precoat shutter 40 having a hole 41 or a notch 41 is fixed at the center thereof so as to be integrally rotatable with, for example, a screw 42.

FIG. 5 is a diagram showing a more detailed configuration of one embodiment of the crystal unit holder 10 described in FIG. FIG. 5 shows a more detailed configuration of the crystal unit holder 10 described above. Reference numeral 412 denotes a recess recessed downward, 413 denotes an opening provided in the pressing plate 414, 415 denotes a contact electrode plate, and 450 denotes an electrode.
The crystal resonator holder 10 of FIG. 5 is formed of a metal such as stainless steel or aluminum, for example, similarly to the retainer cover 20 and the precoat shutter 40. The quartz crystal resonator holder 10 has a plurality of (eight in this example) concave portions 412, 412,... Formed on a concave surface (that is, on a conical surface) of the outer peripheral portion thereof. The concave portions 412, 412,... Are formed on the depressed surface of the outer peripheral portion of the crystal resonator holder 10 at an equal distance on the circumference. A plurality (eight in this example) of external disk-shaped crystal resonators 50 are set inside these recesses 412, 412,. Further, a pressing plate 414 having a plurality of (eight in this example) openings 413, 413,... Formed on a ring-shaped and conically recessed surface is attached from the upper part of the crystal unit 50. The crystal resonator 50 is fixed.

In addition, an electrode made of, for example, a leaf spring is attached to the concave portion 411 and the pressing plate 414 of the crystal resonator holder 10. Further, it is electrically guided to the outside of the retainer portion through a pair of contact electrode plates 415, 415,. An electrode 450 is formed on the surface of the crystal unit 50.
FIG. 6 is a circuit diagram showing an embodiment of a high-frequency resonance circuit formed by including the crystal resonator 50 of the crystal resonator holder 10 in the rate sensor of the present invention.
A high frequency signal from a high frequency transmission source (high frequency transmitter) 55 is applied, thereby forming a so-called resonance circuit. That is, a so-called crystal oscillation type film thickness monitor (rate sensor) is formed by utilizing the phenomenon that the resonance frequency changes when a substance containing vapor of EL material adheres to the surface of the crystal unit 50. . When the substance adhering to the surface of the crystal unit 50 reaches a certain film thickness (ie, life), the crystal unit holder 10 is rotated by a predetermined angle (360/8 = 40 degrees in this example). Therefore, it is replaced with a new quartz plate crystal resonator 50 (that is, the index function, see the arrow in FIG. 4).

That is, in FIG. 4, the crystal unit 50 having the electrode exposed to the outside is sandwiched through the circular rate detection opening 21 of the retainer cover 20 constituting the retainer unit.
On the other hand, the pre-coating shutter 40 is driven to rotate with the rotation of the rotary shaft 30 so that only the precoat opening 23 is shielded and the rate detection opening 21 is not shielded (so-called measurement position: see FIG. 2D). Then, a position where both the rate detection opening 21 and the precoat opening 23 are not shielded (so-called pre-coating position: see the diagram on FIG. 2B) is taken (see the arrow in FIG. 4).

When the precoat shutter 40 is at the measurement position (during rate control), the vapor deposition material passes through the precoat opening 21 and adheres to the surface of the crystal unit 50, and the crystal unit 51 to be used next has Vapor deposition material does not adhere.
When the precoat shutter 40 is in the precoat position, the vapor deposition material passes through the precoat opening and adheres to the surface of the crystal unit 50, and passes through the precoat opening 23 and the surface of the crystal unit 51 to be used next. (So-called pre-coating).

Subsequently, a structure for attaching the retainer portion of the rate sensor, whose detailed configuration is described above, together with its rotation drive mechanism in a vapor deposition apparatus for manufacturing an organic EL device will be described below with reference to FIGS. Will be described in detail with reference to FIG. FIG. 7 is a diagram showing a configuration of a main part such as a vacuum chamber of an embodiment of the vapor deposition apparatus of the present invention. FIG. 8 is a developed perspective view showing an embodiment of the structure of the evaporation source device (linear source) of the EL material provided in the vapor deposition device of the present invention. Moreover, FIG. 9 is sectional drawing which shows the detailed structure of the linear source of the vapor deposition apparatus of this invention. Moreover, FIG. 10 is a figure explaining the structure which attached the rate sensor to the linear source of EL material of a vapor deposition apparatus in one Example of the vapor deposition apparatus of this invention.
100 is a vacuum chamber of an embodiment of the vapor deposition apparatus of the present invention, 110 is a substrate to be vapor-deposited, 200 is a linear source of EL material, 201 is a housing, 202 is an EL material, 203 is a crucible, 204 is a heater, 204 is a vapor deposition A nozzle 206 is a gas discharge surface. Reference numeral 500 denotes a rate sensor, 600 denotes a guide member, and 700 denotes a control device. Furthermore, 16 and 31 are pulleys, 550 is a drive unit of a rotating mechanism, 553 and 554 are electric motors, and 555 and 556 are belts.
As is apparent from FIGS. 7 and 8, in this embodiment, the retainer portion constituting the rate sensor is configured integrally with the rotation drive mechanism, and extends so as to extend in the horizontal direction. A structure attached to an evaporation source of EL material called a linear source will be described.

First, in FIG. 7, in the vacuum chamber 100 of the embodiment of the vapor deposition apparatus of the present invention, a vapor deposition substrate 110 such as a glass plate introduced into the surface and manufacturing an organic EL device on its surface is a holding device (not shown). Therefore, it is held in a substantially upright state.
8 and 9, the EL material linear source 200 includes a casing (water-cooled shield box) 201 that extends long in one horizontal direction. A crucible 203 containing an EL material 202 for forming an (EL layer) and a heating device (heater) 204 for heating the crucible at a predetermined temperature are provided. Further, a plurality of vapor deposition nozzles 205, 205... Are arranged on the surface facing the substrate 110 to be vapor-deposited (hereinafter also referred to as “gas release surface 206”) in the horizontal direction or at both ends thereof. The distance is formed closer to the center.
The linear source 200 is movable in the vertical direction as indicated by solid arrows in the figure. According to this, the linear source 200 moves up and down and passes through the discharge holes 205, 205... Formed in the gas discharge surface 206, and the gaseous organic EL material evaporated by heating by the heater 204. As a result, a large amount of vapor is deposited on the surface of the opposite substrate 110 to be deposited.

  In this embodiment, the deposition target substrate 110 stands upright, and on the other hand, the linear source 200 of the EL material that extends horizontally is moved up and down with its gas release surface 206 close to the surface of the substrate. However, (see the arrow in the figure), it was described as manufacturing an organic EL device on the surface, but the present invention is not limited to this, for example, to hold the deposition substrate 110 horizontally, The linear source 200 may be moved in the horizontal direction while being close to the lower surface of the substrate. In such a case, the plurality of discharge holes 205, 205... Are formed on the upper surface, which is a surface facing the substrate 110 of the housing 202.

In the present invention, the retainer portion constituting the rate sensor whose detailed configuration is described above and the rotation drive mechanism are integrally housed in a substantially box-shaped housing 501, and the rate sensor 500 is mounted. The surface on which the rate detection opening 21 of the retainer cover 20 that is the top of the retainer portion constitutes the casing 201 of the linear source 200, on which a plurality of vapor deposition nozzles 205, 205. that is, on at least one face of the four faces adjacent to the gas discharge surface 206 is disposed is attached to desire at a predetermined angle theta ₂ with respect to the gas discharge surface 206.
That is, the rate sensor 500 is attached to the side surfaces of both ends of the housing 201 of the linear source 200 as shown by a solid line in FIG. 7, or to the upper and lower surfaces of the housing 201 as shown by a broken line in FIG. .

That is, according to the mounting structure of the above-described rate sensor 500 to the housing 201 of the linear source 200, as described above, the rate sensor 500 can be attached to the side surfaces at both ends of the housing 201 of the linear source 200 or the upper and lower sides. Attached along the surface.
Further, as shown in detail in FIG. 10, the quartz crystal resonator 50 held in the concave portion 412 formed in the concave conical surface of the outer peripheral portion of the quartz crystal resonator holder 10 constituting the retainer portion is formed from the surface thereof. extended perpendicular line is disposed so as to be inclined at a predetermined angle theta ₁ with respect to the rotation axis of the disc-shaped holder. Therefore, the rate sensor 500 is further mounted with the top of the monitor surface protruding from the gas discharge surface 206 to the deposition target substrate 110 side. The monitor surface is a surface perpendicular to the rotation axis of the disk-shaped crystal resonator holder 10. The top of the monitor surface is a portion where the rate detection opening 21 of the retainer cover 20 is formed.

In this way, the attached state of the rate sensor 500 along the side surfaces at both ends of the housing 201 of the linear source 200 or the upper and lower surfaces is shown in FIG. That is, according to the above configuration, as shown by a broken line in FIG. 8, the linear source 200 is simply tilted by a predetermined angle θ _{2 with} respect to the gas discharge surface 206 of the linear source 200 that is a linear source. It becomes possible to attach to.
As can be seen from FIG. 8, the quartz resonator 50, which is positioned at the top of the retainer portion and monitors the film thickness, has a perpendicular line extending from the surface to form the discharge hole of the casing 201 of the linear source 200. It is set so as to be inclined by a predetermined angle θ _{2 with} respect to the discharge hole 205 formed in the surface 202. According to this, the discharge amount of the gaseous organic EL material 202 from the discharge hole 205 of the linear source 200 having a distribution as indicated by a plurality of arrows in the broken-line circle in the figure is set at a predetermined ratio. It becomes possible to monitor accurately.

In addition, in the rate sensor 500 of the present invention, when the substance adhering to the surface of the crystal unit 50 reaches a certain film thickness (that is, the lifetime is exhausted) with the monitoring operation, the crystal unit holder 10 is rotated. Therefore, it is necessary to replace the crystal unit 50 with a new one (that is, move to the rate detection opening 21 of the retainer cover 20). Incidentally, the retainer portion of the rate sensor 500 is provided with a rotation mechanism (automatic crystal exchange function) for rotating the crystal resonator holder 10. As shown in FIG. 10, this rotation mechanism is attached to the end portion of the cylindrical portion where the pulley 16 extends from the retainer holder, and also to the other end of the rotation shaft 30 for rotationally driving the precoat shutter 40. Similarly, the pulley 32 is attached.
The drive unit 550 is also provided with electric motors 553 and 554 to which pulleys 551 and 552 are attached, respectively, at the tip of the rotation shaft, and between these two sets of pulleys 16 and 551, 31 and 552. The bell rods 555 and 556 are wound around, so that the crystal resonator holder 10 and the precoat rod shutter 40 are driven to rotate.

  That is, as shown by an arrow or a broken line block in FIG. 10, the rotation mechanism (including the drive unit 550 described above) including a bell rod or an electric motor using vacuum is in relation to the rotation axis of the crystal unit holder 10. Are provided in a direction perpendicular to each other, that is, in a direction along the side surfaces at both ends of the casing 201 of the linear source 200 or the upper and lower surfaces. According to the configuration of such a rotation mechanism, only the top portion of the retainer portion (that is, the retainer cover 20 including the rate detection opening 21) is slightly protruded from the gas discharge surface 206 constituting the casing 201. Thus, the linear source 200 can be attached. As a result, the position of the linear source 200, that is, the formation surface (gas emission surface) 206 of the emission hole is arranged very close to the counter substrate 110 on which the evaporated gaseous organic EL material is deposited on the surface. It becomes possible. That is, “W” in the figure can be set very small. Thereby, the vapor deposition efficiency of the gaseous organic EL material on the substrate 110 can be improved, and the production speed (efficiency) can be increased.

  In the above description, a mechanism including a pulley, a bell rod, an electric motor, and the like as described above has been described as an example of a rotation mechanism for rotationally driving the crystal resonator holder 10 and the pre-coating shutter 40. However, the present invention is not limited to this. For example, by using a bevel gear or the like, a rotation mechanism provided in a direction along the side surfaces at both ends of the housing 201 or the upper and lower surfaces is realized. It is also possible to do.

  In addition, in the above description, the rate sensor 500 of the present invention has been described as being fixedly installed on a part of the horizontally long casing 201 constituting the linear source 200, but the present invention is not limited thereto. Never. For example, as shown by the broken line in FIG. 7, a guide member 600 such as a pair of rails is provided on the upper surface or the lower surface of the horizontal casing 201, and a crystal oscillation type film thickness monitor is provided on the guide member 600. It is also possible to attach the device 500. In this case, although not shown here, for example, by using a moving mechanism such as an electric motor or a rack and pinion mechanism, the crystal oscillation type film thickness monitoring device 500 can be freely moved on the guiding member 600. (See the broken arrow in the figure). According to this, the emission of the gaseous organic EL material from the emission hole forming surface (gas emission surface) 206 of the horizontally long linear source 200 is moved while moving the monitor device or to a desired position. Accordingly, it becomes possible to monitor a necessary film thickness as appropriate.

The detection signals (that is, film thickness monitor signals) detected by the above-described various rate sensors are the elements constituting the above-described vapor deposition apparatus, particularly the linear source 200, as shown in FIG. For example, the data is transferred to the control device 700 configured by an arithmetic processing device such as a CPU (Central Processing Unit).
In the control device 700, arithmetic processing is executed in accordance with software stored in advance in the memory, so that the current supplied to the heater 204 for heating and evaporating the EL material 202 accommodated therein is supplied. (Power) is controlled.
According to this, it becomes possible to accurately control the vapor deposition amount of the gaseous organic EL material on the deposition target substrate to a desired value, so that an organic EL device having excellent display performance can be efficiently produced. Can be manufactured. It is also possible to control the position of the crystal oscillation type film thickness monitor device 500 on the guide member 600 by the rotation of the electric motor constituting the moving mechanism.

Although not described in detail here, the CPU constituting the control device 700 may monitor the resonance frequency fraction of the resonance circuit including the crystal resonator 50 and the high-frequency oscillator 55 shown in FIG. According to this, it is possible to easily detect the amount of the EL material attached to the quartz crystal unit 50.
In addition, the time until the crystal resonator 50 reaches the end of life is calculated from the detected amount of deposition material adhering to the crystal resonator 50 with calculation in the control device 700, and the crystal resonator 50 reaches the end of the end of life. By starting pre-coating for a predetermined time, when the crystal resonator 50 reaches the end of its life, the crystal resonator 52 to be used next can be brought into an optimum state for monitoring (so-called pre-coating completed state).

  10: Crystal resonator holder, 11: Side sensor, 12: Bottom sensor, 13: Linear source, 14: Evaporation source base, 15: Deposition nozzle, 20: Retainer cover (cover), 16, 31: Pulley, 21: Rate detection opening, 22: opening, 23: precoat opening, 30: rotating shuffle rod, 40: precoat shutter, 41: opening, 42: screw, 50, 51: crystal resonator, 100: vacuum chamber 110: Deposition substrate, 111: Rotating shaft, 200: Linear source, 201: Housing, 202: EL material, 203: Crucible, 204: Heater, 205: Deposition nozzle, 206: Gas discharge surface, 305: Cylinder, 306: driving unit, 412: concave portion, 413: opening, 414: pressing plate, 415: contact electrode plate, 441: Roller bearing, 450: Electrode, 500: Rate sensor, 550: Drive unit, 553, 554: Electric motor, 555, 556: Belt, 600: Induction member, 700: Control device.

Claims (7)

  In a rate sensor in which a predetermined number of crystal resonators are arranged concentrically, a first opening and a second adjacent to the first opening are provided to be exposed to the vapor from the evaporation source. A rate sensor comprising a cover having an opening.   2. The rate sensor according to claim 1, wherein the first film thickness detecting means of the crystal resonator disposed in the first opening and the second film of the crystal resonator disposed in the second opening. Thickness detecting means is provided, and the first vibrator and the second film thickness detecting means are arranged in the first opening and the quartz crystal placed in the second opening. A rate sensor capable of simultaneously detecting the thickness of a vibrator.   3. The rate sensor according to claim 2, further comprising a precoat shutter that rotates so as to expose both the first opening and the first opening, or only the first opening. Is a rate sensor that rotates to expose both the first opening and the first opening at the start of rate detection.   4. The rate sensor according to claim 3, wherein the precoat shutter further rotates so as to expose only the first opening when the second coating thickness detection means detects the end timing of precoating. A rate sensor. A linear source comprising at least a crucible and a plurality of vapor discharge nozzles for discharging the vapor of the crucible,
At least one of the vapor deposition nozzles is provided toward the first opening and the second opening of the rate sensor according to any one of claims 1 to 4. Source. A rate sensor according to any one of claims 1 to 4 and a linear source according to claim 5,
The vapor deposition apparatus characterized by depositing vapor discharged from the linear source on a substrate and pre-coating a crystal resonator disposed in the second opening of the rate sensor.   7. The vapor deposition apparatus according to claim 6, wherein the retainer portion of the rate sensor according to any one of claims 1 to 4 is equipped with a crystal exchange mechanism and is currently detecting a rate by the first film thickness detecting means. When it is detected that the crystal unit has reached the end of its life, the crystal unit disposed on the concentric circle is rotated, and the pre-coated unit is rotated to the first opening. Vapor deposition equipment.

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