JP2014069171A - Film forming device and atomizer - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a film forming device and an atomizer, much in a mist-forming quantity of a liquid material, short in an atomization time, long in the service life of an ultrasonic vibration element and capable of stably forming a film on a substrate.SOLUTION: The film forming device is constituted of an atomizer 100, an atomization guide tube 300 for passing mist of the liquid material and a film forming chamber 200. In the film forming device, the atomizer comprises a container for accommodating the liquid material, a solution tank for accommodating the container and an intermediate solution and immersing a bottom surface part of the container in the intermediate solution and an ultrasonic vibrator part 113 disposed in the solution tank and irradiating the bottom surface part of the container with an ultrasonic wave, and the ultrasonic vibrator part is constituted of a substrate and a plurality of ultrasonic vibrators arranged in a circumferential part on the substrate, and among the plurality of ultrasonic vibrators, a driven ultrasonic vibrator is driven by being successively and repeatedly switched in clockwise rotation or counterclockwise rotation of the circumferential part, and the film forming chamber is constituted of the container, a substrate holder and a straightening plate 400 connected to the atomization guide tube.

Description

  The present invention relates to a film forming apparatus and an atomizing apparatus, and more particularly, a film forming apparatus characterized in that a mist of a raw material liquid from an atomizing apparatus is sent to a film forming chamber by an atomizing guide tube and film forming is performed. It relates to an atomizer.

  In a technique for forming a film after atomizing a liquid material, such as MOCVD (metal organic chemical vapor deposition), a technique using a carrier gas is common. Such techniques are disclosed in, for example, Patent Document 1 and Patent Document 2.

  The technology described in Patent Document 1 is provided with a vaporizer nozzle provided separately from the raw material container, and after the liquid material is sprayed from the nozzle into the vaporizer to form a mist, it is heated and vaporized by a heater, An apparatus for obtaining a thin film by a CVD method by introducing the vaporized source gas through a source gas transport pipe into a reaction furnace heated by a heating means and reacting with a reaction gas sent from the reaction gas transport pipe on a deposition substrate. . Patent Document 2 discloses a technique of shearing and atomizing a liquid material with a carrier gas.

  However, these techniques require the use of a carrier gas and have problems such as difficulty in controlling the pressure. Moreover, the structure of the apparatus is complicated.

  On the other hand, there is provided a technique for applying an ultrasonic vibration to a raw material liquid to thereby atomize the raw material liquid. In this technique, carrier gas is used, but fine adjustment is not necessary, and the structure of the apparatus can be simplified.

  As such a technique, for example, Patent Document 3 discloses an atomizing apparatus for film formation shown in FIG. This film-forming atomizer contains an atomizing liquid 4, a container 8 whose bottom member 8 b is formed of a thin film of a polymer material, a container 8 and an intermediate solution 6. A solution tank 7 in which the bottom surface member 8 b of the container 8 is immersed, and an ultrasonic vibrator 13 that is provided in the solution tank 7 and radiates ultrasonic waves to the bottom surface member 8 b of the container 8 are provided.

However, the atomization technique using ultrasonic vibration exemplified in Patent Document 3 has a problem that it takes time to form a film. Furthermore, there is a problem that the lifetime of the ultrasonic vibration element is short.
Therefore, it is desired to develop an atomizing apparatus for film formation with a short film formation time, a short life of the ultrasonic vibration element, and a simple structure.

JP-A-6-310444 Japanese Patent Laid-Open No. 11-14970 JP 2005-305233 A

  The problem of the present invention is that the amount of mist of the liquid material is large, the atomization time is short, the life of the ultrasonic vibration element is long, and the atomized raw material from the atomization apparatus having a simple structure is used. It is an object to provide a film forming apparatus and an atomizing apparatus that can stably form a film on a substrate.

  A film forming apparatus according to claim 1 of the present invention includes an atomization apparatus, an atomization guide pipe through which a mist of liquid material from the atomization apparatus passes, and a film formation chamber to which the atomization guide pipe is connected. A film forming apparatus configured, wherein the atomizer includes a container that stores an atomizing liquid material, a solution that stores the container and an intermediate solution, and immerses at least the bottom surface of the container in the intermediate solution. A tank, and an ultrasonic transducer unit that is disposed in the solution bath and radiates ultrasonic waves to the bottom surface of the container. The ultrasonic transducer unit includes a substrate and a circumferential portion on the substrate. Of the plurality of ultrasonic transducers, and the driven ultrasonic transducer among the plurality of ultrasonic transducers is sequentially switched clockwise or counterclockwise in the circumferential direction. Driven, the film forming chamber includes a container, a substrate holder, and the atomization guide tube. It is film forming apparatus according to claim which is composed of sintered the rectifying plate.

  A film forming apparatus according to claim 2 of the present invention includes an atomization apparatus, an atomization guide pipe through which the mist of the liquid material from the atomization apparatus passes, and a film formation chamber to which the atomization guide pipe is connected. A film forming apparatus configured, wherein the atomizer includes a container that stores an atomizing liquid material, a solution that stores the container and an intermediate solution, and immerses at least the bottom surface of the container in the intermediate solution. A tank, and an ultrasonic transducer unit that is disposed in the solution bath and radiates ultrasonic waves to the bottom surface of the container. The ultrasonic transducer unit includes a substrate and a circumferential portion on the substrate. Among the plurality of ultrasonic transducers, two ultrasonic elements facing each other are sequentially and repeatedly switched between the two ultrasonic elements. The film formation chamber is a container, a substrate holder, and the atomization guide It is composed of the rectifying plate which is connected with a film-forming apparatus according to claim.

  The film forming apparatus according to claim 2 → 3 of the present invention has a configuration in which the plurality of ultrasonic transducers are arranged with eight electrodes radially, and the rectifying plate has an expansion angle of 100. The film forming apparatus according to claim 1, wherein a mesh plate is disposed in a cross section of a joint portion with the atomization induction tube at a temperature of less than or equal to 0 °.

  The film forming apparatus according to claim 4 of the present invention is characterized in that a heater is disposed in the vicinity of the junction of the atomization guide tube with the film forming chamber. A film forming apparatus.

  A film forming apparatus according to claim 5 of the present invention includes an atomizing apparatus, a pipe through which mist of the liquid material from the atomizing apparatus passes, and a film forming chamber to which the pipe is connected. The atomizing device includes a container for storing the atomizing liquid material, a solution tank for storing the container and the intermediate solution, and dipping at least the bottom surface of the container in the intermediate solution, and the solution tank. And an ultrasonic transducer unit that irradiates the bottom surface of the container with ultrasonic waves. The ultrasonic transducer unit includes a substrate, a central portion on the substrate on the substrate, and a circle thereof. It is composed of a plurality of ultrasonic transducers arranged on the periphery, and the driven ultrasonic transducer among the plurality of ultrasonic transducers is the central portion and the circumferential portion clockwise or counterclockwise. The film formation chamber is driven by repeatedly switching to a container and a substrate holder. When it is film-forming apparatus according to claim which is composed of a rectifying plate that is connected to the atomizing induction tube.

  The film forming apparatus according to claim 6 of the present invention is a configuration in which the plurality of ultrasonic transducers are arranged with one electrode in the center and seven electrodes in the periphery. 6. The film forming apparatus according to claim 5, wherein a spread angle is set to 100 [deg.] Or less, and a mesh plate is disposed in a cross section of a joint portion with the atomization guide tube.

  The film forming apparatus according to claim 7 of the present invention is the film forming apparatus according to claim 5 or 6, wherein a heater is disposed in the vicinity of the junction of the atomization guide tube with the film forming chamber. .

  An atomization apparatus according to claim 8 of the present invention includes a container for storing an atomizing liquid material, a container for storing the container and the intermediate solution, and dipping at least the bottom surface of the container in the intermediate solution, An atomizing device that is disposed in the solution tank and includes an ultrasonic transducer unit that irradiates ultrasonic waves to the bottom surface of the container, the ultrasonic transducer unit comprising: a substrate; Of the plurality of ultrasonic transducers, and the driven ultrasonic transducer among the plurality of ultrasonic transducers is clockwise or counterclockwise of the circumferential portion. The atomizing device is characterized in that it is driven by being sequentially switched in a clockwise direction.

An atomization apparatus according to claim 9 of the present invention includes a container for storing an atomizing liquid material, a container for storing the container and the intermediate solution, and dipping at least the bottom surface of the container in the intermediate solution,
An atomizing device that is disposed in the solution tank and includes an ultrasonic transducer unit that irradiates ultrasonic waves to the bottom surface of the container, the ultrasonic transducer unit comprising: a substrate; Of the plurality of ultrasonic transducers arranged on the circumference of the substrate, and the driven ultrasonic transducers of the plurality of ultrasonic transducers are two ultrasonic transducers facing each other. The atomizing device is characterized in that the acoustic wave element is sequentially switched and driven.

  The atomization apparatus according to claim 10 of the present invention is characterized in that the plurality of ultrasonic transducers have a configuration in which eight electrodes are arranged radially. It is.

  The inventor has sought the cause of the occurrence of the above-described problem in the conventional atomizer. In particular, we investigated the cause of atomization and the time required for film formation. As a result, it has been found that the reason why it takes a long time for film formation is that the amount of atomized mist is small. Further investigation of the cause revealed that heat was generated in the ultrasonic vibrator. I thought that the amount of mist was decreasing because of the heat generation. Furthermore, it was also found that the sound pressure amplitude in the raw material solution was small, and this was considered to be the cause of the small amount of mist.

  Therefore, eagerly searching for means for preventing heat generation. In the process, the ultrasonic transducers are divided, and as a first example, a plurality of ultrasonic transducers are arranged on the circumferential portion, and as a second example, a plurality of ultrasonic transducers are arranged on the central portion and the circumferential portion thereof, and a plurality of ultrasonic transducers are further provided. The ultrasonic transducer to be driven is switched from the central part to the circumferential part, and in the circumferential part, it is sequentially switched clockwise or counterclockwise and then switched to the central part for repeated driving. However, it was discovered that heat generation was reduced. It was also found that the sound pressure amplitude can be maintained higher than in the case of a single ultrasonic transducer. The present invention has been made based on such findings.

  According to the present invention, a plurality of ultrasonic transducers are provided, and the ultrasonic transducer to be driven among the plurality of ultrasonic transducers is switched from the central portion to the circumferential portion, and the circumferential portion is rotated clockwise or counterclockwise. By sequentially switching clockwise and switching to the center, it is possible to suppress the heat generation of each ultrasonic vibrator and to keep the sound pressure amplitude in the atomizing liquid high. it can. As a result, the amount of mist generated can be increased. Furthermore, the load on each ultrasonic transducer is reduced, and the life of the ultrasonic transducer can be extended. Switching is performed at a cycle of 30 to 200 Hz.

  According to the film forming apparatus according to the first, second, third, and fourth aspects, the power consumption is reduced and the heat generation of the vibrator is prevented, and an efficient mist can be achieved. As a result, the amount of mist generated is increased. For example, a film forming apparatus in which the film forming time is shortened is achieved.

  According to the film forming apparatus according to the fifth, sixth, and seventh aspects, reduction of power consumption and prevention of heat generation of the vibrator can be achieved, and it is possible to achieve efficient mist generation. A film forming apparatus in which the film forming time is shortened is achieved.

  According to the atomization device according to the eighth, ninth, and tenth aspects, the power consumption can be reduced, the heat generation of the vibrator can be prevented, and an efficient mist can be achieved. It is possible to provide a neutralization apparatus in which the film formation time is shortened.

  According to the present invention, the amount of mist of the raw material liquid is large, the atomization time is short, the lifetime of the ultrasonic vibration element is long, and the atomized raw material from the atomization device having a simple structure is used. In this state, it is possible to provide a film formation apparatus and an atomization apparatus that can stably form a film on a substrate.

It is a figure of the film-forming apparatus which concerns on Example 1 of this invention. It is a figure of the film-forming apparatus which concerns on Example 2 of this invention. It is an enlarged view of the atomization apparatus used for the film forming apparatus of this invention. It is a top view which shows the ultrasonic vibration part which concerns on the Example of this invention. 4A shows the front surface, and FIG. 4B shows the back surface. It is a top view which shows the ultrasonic vibration part of the other example which concerns on the Example of this invention. FIG. 5A is the front surface, and FIG. 5B is the back surface. It is a figure of the mesh board used for the film-forming apparatus of this invention. It is the figure which showed the effect of the mesh board of this invention. FIG. 7A shows the experimental results, and FIG. 7B shows the measurement results.

  A film forming apparatus according to the present invention includes an atomization apparatus, an atomization guide pipe through which a mist of the liquid material from the atomization apparatus passes, and a film formation chamber to which the atomization guide pipe is connected. The atomization device includes a container for storing the atomizing liquid material, a solution tank for storing the container and the intermediate solution, and dipping at least the bottom surface of the container in the intermediate solution, and the solution. An ultrasonic transducer unit that is disposed in the tank and that irradiates the bottom surface of the container with ultrasonic waves, and the ultrasonic transducer unit includes a substrate and a plurality of circumferential units disposed on the substrate. The ultrasonic transducer to be driven among the plurality of ultrasonic transducers is sequentially switched clockwise and counterclockwise and driven, and the above-described ultrasonic transducers are driven. The membrane chamber includes a container, a substrate holder, and a current plate connected to the atomization guide tube It is configured as a film forming apparatus according to claim.

(Add double)
Furthermore, the film forming apparatus of the present invention includes an atomization apparatus, an atomization induction pipe through which the mist of the liquid material from the atomization apparatus passes, and a film formation chamber to which the atomization induction pipe is connected. A film forming apparatus,
The atomizing device is disposed in a container for storing an atomizing liquid material, a solution tank for storing the container and an intermediate solution, and immersing at least a bottom surface of the container in the intermediate solution, and the solution tank. An ultrasonic transducer unit that irradiates the bottom surface of the container with ultrasonic waves, and the ultrasonic transducer unit includes a substrate and a plurality of ultrasonic transducers disposed on a circumferential portion of the substrate. The ultrasonic transducer to be driven among the plurality of ultrasonic transducers is driven by sequentially switching two ultrasonic elements facing each other, and the film formation chamber is A film forming apparatus comprising a container, a substrate holder, and a current plate connected to the atomization guide tube.

  In this configuration, eight electrodes are arranged radially, and the rectifying plate has a spread angle of 100 ° or less, and a mesh plate is arranged in a cross section of a joint portion with the atomization guide tube. ing. In addition, a heater is disposed in the vicinity of the junction of the atomization guide tube with the film forming chamber.

  Further, the film forming apparatus of the present invention is a film forming apparatus comprising an atomizing device, a pipe through which the mist of the liquid material from the atomizing apparatus passes, and a film forming chamber to which the pipe is connected. The atomization device is disposed in the solution tank, a container for storing the atomizing liquid material, a solution tank for storing the container and the intermediate solution, and immersing at least the bottom surface of the container in the intermediate solution. An ultrasonic transducer unit that irradiates the bottom surface of the container with ultrasonic waves, and the ultrasonic transducer unit includes a substrate and a plurality of ultrasonic transducer units arranged on a circumferential portion of the substrate on the substrate. The ultrasonic transducer to be driven among the plurality of ultrasonic transducers is repeatedly switched between the central portion and the circumferential portion clockwise or counterclockwise and driven. The film formation chamber includes a container, a substrate holder, and the atomization guide tube. It is film forming apparatus according to claim which is composed of sintered the rectifying plate.

  Here, each of the plurality of ultrasonic transducers has a configuration in which one electrode in the center and seven electrodes in the periphery are arranged, and the rectifying plate has a spread angle of 100 ° or less, A mesh plate is disposed in a cross section of a joint portion with the atomization guide tube. In addition, a heater is disposed in the vicinity of the junction of the atomization guide tube with the film forming chamber.

  Moreover, the atomization apparatus of the present invention includes a container for storing the atomizing liquid material, a solution tank for storing the container and the intermediate solution, and dipping at least the bottom surface of the container in the intermediate solution, and the solution tank. An atomizing device that is disposed on the bottom surface of the container and radiates ultrasonic waves to the bottom surface of the container, wherein the ultrasonic transducer unit includes a substrate and the substrate on the substrate. It is composed of a plurality of ultrasonic transducers arranged in the upper circumferential portion, and the driven ultrasonic transducer among the plurality of ultrasonic transducers is clockwise or counterclockwise in the circumferential portion. It is an atomizing device characterized by being sequentially switched and driven. Here, the plurality of ultrasonic transducers have a configuration in which eight electrodes are radially arranged, but the present invention is not limited thereto.

  Furthermore, the atomization apparatus of the present invention includes a container for storing the atomizing liquid material, a solution tank for storing the container and the intermediate solution, and dipping at least the bottom surface of the container in the intermediate solution, and the solution tank. An atomizing device that is disposed on the bottom surface of the container and radiates ultrasonic waves to the bottom surface of the container, wherein the ultrasonic transducer unit includes a substrate and the substrate on the substrate. The ultrasonic transducer is composed of a plurality of ultrasonic transducers arranged on the upper circumferential portion, and two ultrasonic transducers that are driven among the plurality of ultrasonic transducers are opposed to each other. The atomizing device is characterized in that it is driven by being repeatedly switched sequentially. Here, the plurality of ultrasonic transducers have a configuration in which eight electrodes are radially arranged, but the present invention is not limited thereto.

  Here, a small ultrasonic vibrator uses a small amount of energy to vibrate, and its own mass is also small, so the energy for vibration is small. Therefore, a small ultrasonic transducer has good energy transmission efficiency. As a result, compared to the case where a single ultrasonic transducer is driven continuously, a plurality of ultrasonic transducers are provided, and each ultrasonic transducer is switched and driven intermittently. The input power can be reduced. Furthermore, since the ultrasonic transducer to be driven is driven by switching between the central portion and the circumferential portion among the ultrasonic transducers, heat generation of each ultrasonic transducer can be suppressed.

  In general, an ultrasonic transducer having a large size has a small directivity angle (an angle at which the sound pressure is reduced to 1/2 with respect to the sound pressure of the central axis), and an ultrasonic transducer having a small size has a large directivity angle. Therefore, when using a single ultrasonic pendulum, it is necessary to increase the size of the ultrasonic transducer in order to propagate a strong sound pressure wave widely to the atomizing liquid. It is necessary to take a long distance with the liquid for use, and the installation space becomes wide. However, since the ultrasonic transducer with a small size has a large directivity angle, it is not necessary to increase the size of the ultrasonic transducer by using a plurality of ultrasonic transducers with a small size. As a result, space saving can be achieved.

  By switching from the central portion to the circumferential portion and sequentially switching in the clockwise direction or the counterclockwise direction in the circumferential portion, standing waves on the vibration surface can be avoided and the waves can be dispersed. As a result, since the wave does not propagate locally in the atomizing liquid, the amount of mist generated can be increased as compared with the case where a single ultrasonic transducer is used.

  Examples of the film forming apparatus and the atomizing apparatus of the present invention will be described below.

Example 1
FIG. 1 is a diagram of a film forming apparatus according to Embodiment 1 of the present invention. The film forming apparatus of FIG. 1 has a configuration in which an atomizing apparatus 100 and a film forming chamber 200 are connected by an atomizing guide pipe 300. The film forming chamber 200 includes a container 210, a substrate holder 220, and a current plate 310 arranged in a cross-section inside the atomization guide tube 300.

The atomizing device 100 contains a container 8 for storing the atomizing liquid 4, a container 8 for storing the container 8 and the intermediate solution 4, and a solution tank 7 for immersing the bottom surface portion 8 c of the container 8 in the intermediate solution 4. And an ultrasonic transducer unit 113 that irradiates the bottom surface 8c of the container 8 with ultrasonic waves.
FIG. 3 is a diagram of a single atomizer 100 used in the film forming apparatus of the present invention.

  FIG. 4 is a plan view illustrating an ultrasonic vibration unit according to an embodiment of the present invention. 4A shows the front surface, and FIG. 4B shows the back surface. The surface of the ultrasonic transducer unit is affixed with an electrode on one surface and grounded from a part of the electrode, while the back surface is composed of a plurality of ultrasonic transducers CH-1 to CH-8. The ultrasonic transducers to be driven can be sequentially switched among the plurality of ultrasonic transducers CH-1 to CH-8. That is, the voltage applied to the electrodes is sequentially applied while switching in the order of CH-1, CH-2, CH-3, CH-4, CH-5, CH-6, CH-7, and CH-8. . After applying to CH-8, repeat from CH-1.

  Further, the atomizing device 100 has a discharge port 110 for discharging the atomized mist while containing the atomizing liquid 4 above the container 8. The container 8 further has a gas supply port 9c for introducing gas on the side surface.

  The gas supply port 9c is connected to a nitrogen gas cylinder through a flow control valve. The nitrogen gas cylinder supplies the carrier gas into the container with a supply amount corresponding to the opening degree of the flow control valve 2. In addition, as carrier gas, nitrogen, oxygen, air etc. can be used, for example. The discharge port 110 is connected to the atomization guide pipe 300 so that the mist generated by atomizing the atomization liquid 4 flows out into the film forming chamber 200 together with nitrogen gas.

The operation of the film forming apparatus of the present invention will be described below. The mist discharged from the discharge port 110 of the atomization apparatus 100 passes through the atomization guide pipe 300 and is introduced into the film forming chamber. In this case, the mist passes through the mesh plate 400, reaches the substrate 230 via the rectifying plate 310, and a target film formation is performed. FIG. 6 is a diagram of a mesh plate 400 used in the film forming apparatus of the present invention. The mesh plate 400 has holes of 1 μm to several 100 μm in the thickness direction, and the flow is uniform when the mist passes. Further, the rectifying plate 310 is set to have a spread angle of 94 °, whereby mist flows on the substrate 203 at a uniform density.
FIG. 7 shows the effect of the mesh plate.

(Example 2)
FIG. 2 is a diagram of a film forming apparatus according to Embodiment 2 of the present invention. The film forming apparatus in FIG. 2 has a configuration in which the atomizing apparatus 100 and the film forming chamber 200 are connected by an atomizing guide pipe 300. The film formation chamber 200 includes a container 210, a substrate holder 220, a rectifying plate 310 disposed in a cross-section inside the atomization induction pipe 300, and a film formation chamber 200 of the atomization induction pipe 300. A heater 500 is disposed in the vicinity. When the heater 500 has a long mist flow,
Although droplets adhere to the inside of the atomization guide tube 300, there is an effect that the droplets can be prevented from adhering by energizing and heating the heater 500.

The atomizing device 100 contains a container 8 for storing the atomizing liquid 4, a container 8 for storing the container 8 and the intermediate solution 4, and a solution tank 7 for immersing the bottom surface portion 8 c of the container 8 in the intermediate solution 4. And an ultrasonic transducer unit 113 that irradiates the bottom surface 8c of the container 8 with ultrasonic waves.
FIG. 3 is a diagram of a single atomizer 100 used in the film forming apparatus of the present invention.

  FIG. 4 is a plan view illustrating an ultrasonic vibration unit according to an embodiment of the present invention. 4A shows the front surface, and FIG. 4B shows the back surface. The surface of the ultrasonic transducer unit is affixed with an electrode on one surface and grounded from a part of the electrode, while the back surface is composed of a plurality of ultrasonic transducers CH-1 to CH-8. The ultrasonic transducers to be driven can be sequentially switched among the plurality of ultrasonic transducers CH-1 to CH-8. That is, the voltage applied to the electrodes is sequentially applied while switching in the order of CH-1, CH-2, CH-3, CH-4, CH-5, CH-6, CH-7, and CH-8. . In this embodiment, the driving was performed at 50 Hz. After applying to CH-8, repeat from CH-1.

  Further, by the same application method, CH-1 and CH-5, CH-2 and CH-6, CH-3 and CH-7, and CH-4 and CH-8 are paired and sequentially applied while switching. There is also a method.

  Further, the atomizing device 100 has a discharge port 110 for discharging the atomized mist while containing the atomizing liquid 4 above the container 8. The container 8 further has a gas supply port 9c for introducing gas on the side surface. The bottom surface of the container 8 is formed of a polymer material that easily transmits ultrasonic waves.

  The gas supply port 9c is connected to a nitrogen gas cylinder through a flow control valve. The nitrogen gas cylinder supplies the carrier gas into the container with a supply amount corresponding to the opening degree of the flow control valve 2. In addition, as carrier gas, nitrogen, oxygen, air etc. can be used, for example. The discharge port 110 is connected to the atomization guide pipe 300 so that the mist generated by atomizing the atomization liquid 4 flows out into the film forming chamber 200 together with nitrogen gas.

  The operation of the film forming apparatus of the present invention will be described below. The mist discharged from the discharge port 110 of the atomization apparatus 100 passes through the atomization guide pipe 300 and is introduced into the film forming chamber. In this case, the mist passes through the mesh plate 400, reaches the substrate 230 via the rectifying plate 310, and a target film formation is performed. FIG. 6 is a diagram of a mesh plate 400 used in the film forming apparatus of the present invention. The mesh plate 400 has holes of 1 μm to several 100 μm in the thickness direction, and the flow is uniform when the mist passes. Further, the rectifying plate 310 is set to have a spread angle of 94 °, whereby mist flows on the substrate 203 at a uniform density.

(Example 3)
In the film forming apparatus of Example 3 of the present invention, the ultrasonic transducer unit 113 of the atomization apparatus has a plurality of ultrasonic waves arranged on the substrate, the central portion of the substrate on the substrate, and the circumferential portion thereof. It is composed of a vibrator, and the ultrasonic vibrator to be driven among the plurality of ultrasonic vibrators is driven by being repeatedly switched sequentially between the central portion and the circumferential portion clockwise or counterclockwise. It is characterized by.
FIG. 5 is a plan view illustrating an ultrasonic vibration unit according to an embodiment of the present invention. FIG. 5A is the front surface, and FIG. 5B is the back surface. The surface of the ultrasonic transducer unit is affixed with an electrode on one surface and grounded from a part of the electrode, while the back surface is composed of one ultrasonic transducer CH-8 at the center and seven peripheral components. The ultrasonic transducers CH-1 to CH-7 can be sequentially switched among the plurality of ultrasonic transducers CH-1 to CH-8. That is, the voltage applied to the electrodes is sequentially applied while switching in the order of CH-1, CH-2, CH-3, CH-4, CH-5, CH-6, CH-7, and CH-8. . After applying to CH-8, repeat from CH-1.

  Alternatively, CH-1 and CH-5, CH-2 and CH-6, CH-3 and CH-7, CH-4 and CH-8 are paired in this way, According to the method in which the sonic elements are sequentially applied while sequentially switching, the amount of mist to be atomized further increases, the film formation time is shortened, and the productivity is improved.

The structure of the film forming apparatus is the same as that of the first embodiment or the second embodiment.
Table 1 shows that when a plurality of vibrators CH-1 to CH8 are driven one by one (denoted as single), CH-1 and CH-5, CH-2 and CH-6, CH-3 and CH-7, This is an example of a method (denoted as double) in which CH-4 and CH-8 are paired and applied sequentially while switching in order.

  According to Table 1, when each of the plurality of vibrators CH-1 to CH8 according to the present invention is driven one by one, the temperature rise of the intermediate treatment liquid is suppressed to be low, so that the heat generation amount is low, and therefore the loss. Is low.

  Further, a plurality of vibrators CH-1 and CH-5, CH-2 and CH-6, CH-3 and CH-7, and CH-4 and CH-8 are paired and sequentially applied while sequentially switching. According to (indicated as “double”), although the temperature rise of the intermediate treatment liquid is slightly higher than that of the single, the chemical consumption is 85% higher than that of the single, and the amount of mist generated can be greatly increased. it can.

  Although the invention has been described with reference to the above-described embodiments and examples, the technical scope of the invention is not limited thereto. It will be understood that various other embodiments may be made without departing from the spirit and scope of the invention. Furthermore, in this embodiment, although the effect | action and effect by the structure of this invention are described, these effect | actions and effects are examples and do not limit this invention.

  According to the film formation apparatus and the atomization apparatus of the present invention, the atomization from the atomization apparatus having a simple structure with a large amount of mist of the raw material liquid, a short atomization time, a long life of the ultrasonic vibration element, and Since a stable film can be formed on a substrate at room temperature using the prepared raw material, it contributes to improving the quality and productivity of a film in a film forming process in the semiconductor industry.

DESCRIPTION OF SYMBOLS 1 Film formation atomizer 4 Atomization liquid material 6 Intermediate solution 7 Solution tank 8 Container 8c Bottom face part 9c Gas supply port 10 Outlet 11 Mist 110 of liquid material Exhaust port 113 Ultrasonic vibrator part 120 Self-propelled robot CH -1 to CH-8 Ultrasonic vibrator 200 Deposition chamber 210 Deposition chamber container 220 Substrate holder 230 Substrate 240 Exhaust port 300 Atomization guide tube 310 Rectification plate 315 Spreading angle 400 Mesh plate 500 Heater

Claims (10)

A film forming apparatus comprising: an atomization apparatus; an atomization induction pipe through which a mist of liquid material from the atomization apparatus passes; and a film formation chamber to which the atomization induction pipe is connected;
The atomizing device includes a container for storing an atomizing liquid material,
A solution tank containing the container and the intermediate solution, and dipping at least the bottom surface of the container in the intermediate solution;
An ultrasonic transducer that is disposed in the solution tank and radiates ultrasonic waves to the bottom surface of the container;
The ultrasonic transducer unit includes a substrate and a plurality of ultrasonic transducers arranged on a circumferential portion on the substrate, and is driven among the plurality of ultrasonic transducers. Are sequentially switched and driven clockwise or counterclockwise at the circumference,
The film forming chamber is composed of a container, a substrate holder, and a current plate connected to the atomization guide tube. A film forming apparatus comprising: an atomization apparatus; an atomization induction pipe through which a mist of liquid material from the atomization apparatus passes; and a film formation chamber to which the atomization induction pipe is connected;
The atomizing device includes a container for storing an atomizing liquid material,
A solution tank containing the container and the intermediate solution, and dipping at least the bottom surface of the container in the intermediate solution;
An ultrasonic transducer that is disposed in the solution tank and radiates ultrasonic waves to the bottom surface of the container;
The ultrasonic transducer unit includes a substrate and a plurality of ultrasonic transducers arranged on a circumferential portion on the substrate, and is driven among the plurality of ultrasonic transducers. But,
Two ultrasonic elements facing each other are sequentially switched and driven,
The film forming chamber is composed of a container, a substrate holder, and a current plate connected to the atomization guide tube. The plurality of ultrasonic transducers has a configuration in which eight electrodes are arranged radially,
The film forming apparatus according to claim 1, wherein the rectifying plate has a spread angle of 100 ° or less, and a mesh plate is disposed on a cross section of a joint portion with the atomization guide tube.   The film forming apparatus according to claim 1, wherein a heater is disposed in the vicinity of the junction of the atomization guide tube with the film forming chamber. A film forming apparatus comprising an atomizing device, a pipe through which mist of the liquid material from the atomizing apparatus passes, and a film forming chamber to which the pipe is connected,
The atomizing device includes a container for storing an atomizing liquid material,
A solution tank containing the container and the intermediate solution, and dipping at least the bottom surface of the container in the intermediate solution;
An ultrasonic transducer that is disposed in the solution tank and radiates ultrasonic waves to the bottom surface of the container;
The ultrasonic transducer unit is configured by a substrate, a plurality of ultrasonic transducers arranged on a central portion of the substrate on the substrate, and a circumferential portion thereof, and the ultrasonic transducers of the plurality of ultrasonic transducers Among them, the ultrasonic transducer to be driven is driven by being repeatedly switched sequentially between the central portion and the circumferential portion clockwise or counterclockwise,
The film forming chamber is composed of a container, a substrate holder, and a current plate connected to the atomization guide tube. The plurality of ultrasonic transducers have a configuration in which one electrode is arranged at the center and seven electrodes are arranged around the center,
6. The film forming apparatus according to claim 5, wherein the rectifying plate has a spread angle of 100 [deg.] Or less, and a mesh plate is disposed on a cross section of a joint portion with the atomization guide tube.   The film forming apparatus according to claim 5, wherein a heater is disposed in the vicinity of the junction of the atomization guide tube with the film forming chamber. A container for storing the atomizing liquid material;
A solution tank containing the container and the intermediate solution, and dipping at least the bottom surface of the container in the intermediate solution;
An atomizing device that is disposed in the solution tank and includes an ultrasonic transducer unit that radiates ultrasonic waves to the bottom surface of the container,
The ultrasonic transducer unit includes a substrate and a plurality of ultrasonic transducers arranged on a circumferential portion of the substrate on the substrate, and is driven among the plurality of ultrasonic transducers. An atomizing device, wherein the ultrasonic vibrator is driven by being repeatedly switched in the clockwise or counterclockwise direction of the circumference. A container for storing the atomizing liquid material;
A solution tank containing the container and the intermediate solution, and dipping at least the bottom surface of the container in the intermediate solution;
An atomizing device that is disposed in the solution tank and includes an ultrasonic transducer unit that radiates ultrasonic waves to the bottom surface of the container,
The ultrasonic transducer unit includes a substrate and a plurality of ultrasonic transducers arranged on a circumferential portion of the substrate on the substrate, and is driven among the plurality of ultrasonic transducers. An atomizing apparatus, wherein two ultrasonic elements whose ultrasonic transducers face each other are sequentially switched and driven.   The atomizing apparatus according to claim 8 or 9, wherein the plurality of ultrasonic transducers have a configuration in which eight electrodes are radially arranged.

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