JP2014040350A - Optical ceramics and production method of the same - Google Patents
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Abstract
Description
本発明はレーザーロッド等の光学用セラミックスの粗面化に関する。 The present invention relates to roughening of optical ceramics such as laser rods.
出願人は、単結晶と同等の透光度を有する多結晶の光学用セラミックスを製造することに成功した。例えば特許文献1(JP4878343B)で、透明な希土類ガリウムガーネット(Ln3Gd5O12:Lnは希土類元素)の製造方法を開示した。また特許文献2(JP2003-20288A)で、透明な希土類アルミニウムガーネット(Ln3Al5O12)の製造方法を開示した。ところで光学用セラミックスは全ての面が透明であることが望まれるのではなく、一部の面を粗面化して不透明にすることが望まれることがある。例えばレーザーロッドの場合、側面を粗面化して寄生発振を防止することが望まれる。 The applicant has succeeded in producing polycrystalline optical ceramics having a light transmission equivalent to that of a single crystal. For example, Patent Document 1 (JP4878343B) discloses a method for producing a transparent rare earth gallium garnet (Ln 3 Gd 5 O 12 : Ln is a rare earth element). Patent Document 2 (JP2003-20288A) disclosed a method for producing a transparent rare earth aluminum garnet (Ln 3 Al 5 O 12 ). By the way, not all surfaces of optical ceramics are desired to be transparent, but it may be desired to make some surfaces rough and opaque. For example, in the case of a laser rod, it is desired to roughen the side surface to prevent parasitic oscillation.
特許文献3(JPS63-211779A)は、Ndドープのレーザー用ガラスを1000メッシュのアルミナ粒子によりラッピングして表面を粗面化し、次いで100μm深さまで化学エッチングすることにより、粗面化により生じたマイクロクラックを除去することを開示している。なおラッピングは、液体に研磨剤を分散させ、研磨する面と基台との間に研磨剤を分散させた液を置き、研磨する面と基台との相対運動により研磨を行うこと等を意味する。そしてエッチングによりマイクロクラックを除去することにより、レーザーを高出力で動作させても、レーザー用ガラスが破壊されなくなると、特許文献3は記載している。 Patent Document 3 (JPS63-211779A) describes a microcrack caused by roughening by wrapping Nd-doped laser glass with 1000 mesh alumina particles to roughen the surface and then chemically etching to a depth of 100 μm. Is disclosed. Lapping means that the abrasive is dispersed in the liquid, the liquid in which the abrasive is dispersed is placed between the surface to be polished and the base, and polishing is performed by relative movement between the surface to be polished and the base. To do. Patent Document 3 describes that by removing microcracks by etching, the laser glass is not broken even when the laser is operated at a high output.
しかしながらセラミックスに化学エッチングを施すと、マイクロクラックの除去に対して粒界へのエッチングが先行してしまい、粗面部分の粒子に脱粒が起こってしまう。それにより、表面の平滑度が良好となってしまう問題が発生する。発明者の実験では、多結晶セラミックスのNd-YAGレーザーロッドの側面を粗面化した後、エッチングを施すと、表面粗さRaは0.2μm程度と小さくなってしまった。表面粗さは0.3μm以上から効果があり、好ましくは0.5μm以上である。また、化学エッチングはセラミックスの通常の製造プロセスとは異なるプロセスなので、エッチングプロセスの導入はセラミックスメーカーにとって負担になる。また適切なエッチング条件の選定が難しい。 However, when chemical etching is performed on ceramics, etching to the grain boundary precedes the removal of microcracks, and grain breakage occurs in the particles on the rough surface portion. Thereby, the problem that the smoothness of the surface becomes good occurs. In the experiments by the inventors, when the side surface of the polycrystalline ceramic Nd-YAG laser rod was roughened and then etched, the surface roughness Ra was as small as about 0.2 μm. The surface roughness is effective from 0.3 μm or more, preferably 0.5 μm or more. Moreover, since chemical etching is a process different from the normal manufacturing process of ceramics, the introduction of an etching process is a burden for ceramic manufacturers. It is also difficult to select appropriate etching conditions.
本発明の課題は、エッチングを用いずかつ簡単に、光学用セラミックスの表面を粗面化することにある。 An object of the present invention is to roughen the surface of an optical ceramic without using etching.
本発明の光学用セラミックスは多結晶の焼結体からなり、表面の一部が研磨剤により粗面化された後に、熱処理されることによりマイクロクラックが除去されると共に、表面のグレインが凸化している。 The optical ceramic of the present invention is made of a polycrystalline sintered body. After a part of the surface is roughened with an abrasive, the microcracks are removed by heat treatment, and the surface grains become convex. ing.
本発明の光学用セラミックスの製造方法では、粉体を成型及び焼結することにより多結晶の焼結体からなる光学用セラミックスを製造する工程と、
光学用セラミックスの表面の一部を、研磨剤により粗面化する工程と、
粗面化後の光学用セラミックスを熱処理することにより、前記表面の一部を粗面に保ちながら、粗面化により生じたマイクロクラックの除去及び表面グレインを凸化する工程と、 光学用セラミックスの表面の他の一部を鏡面研磨する工程、とをこの順に行う。
In the method for producing an optical ceramic of the present invention, a step of producing an optical ceramic comprising a polycrystalline sintered body by molding and sintering a powder;
A step of roughening a part of the surface of the optical ceramic with an abrasive;
The step of heat-treating the optical ceramic after the roughening to remove the microcracks caused by the roughening and to make the surface grains convex while keeping a part of the surface rough; The process of mirror-polishing the other part of the surface is performed in this order.
本発明では、化学エッチングではなく、熱処理により、マイクロクラックを解消する。このためエッチング用の設備も、エッチング条件の選定も不要で、腐食性のエッチング液を取り扱う必要もない。なおこの明細書において、光学用セラミックスの製造方法に関する記載はそのまま光学用セラミックスにも当てはまる。研磨剤はアルミナ,SiC,ダイアモンド等を用い、サンドブラスト、研磨剤の押し付け、研磨剤を付着させたシートによる研磨等により粗面化し、サンドブラスト及び研磨剤の押し付けが特に好ましい。 In the present invention, microcracks are eliminated not by chemical etching but by heat treatment. Therefore, neither etching equipment nor etching conditions need to be selected, and there is no need to handle a corrosive etching solution. In this specification, the description relating to the method for producing optical ceramics also applies to optical ceramics as they are. As the polishing agent, alumina, SiC, diamond or the like is used, and sandblasting, pressing of the polishing agent, roughening by polishing with a sheet to which the polishing agent is attached, etc., and sandblasting and pressing of the polishing agent are particularly preferable.
好ましくは、光学用セラミックスは希土類アルミニウムガーネット、希土類ガリウムガーネットもしくは希土類酸化物であり、平均粒径が20μm以上の研磨剤により粗面化を行い、かつ1300℃以上1700℃以下で熱処理する。なおこの明細書では、粗面化した面の表面粗さを算術平均表面粗さRaで表す。表面粗さRaは一般に研磨剤の平均粒径よりも小さく、Raを1μm以上にするには、希土類を構成元素とするガーネットもしくは希土類酸化物の場合、平均粒径が20μm以上の研磨剤が必要である。また希土類を構成元素とするガーネットもしくは希土類酸化物の場合、セラミックスの表面で原子が自由に移動する温度(サーマルエッチングが始まる温度)が熱処理温度に適し、この温度は1300℃以上である。この一方で熱処理温度が1700℃を越えると、粗面化の効果が失われることがある。なおこの明細書では、希土類はYを含むものとする。 Preferably, the optical ceramic is a rare earth aluminum garnet, a rare earth gallium garnet, or a rare earth oxide, roughened with an abrasive having an average particle size of 20 μm or more, and heat-treated at 1300 ° C. or higher and 1700 ° C. or lower. In this specification, the surface roughness of the roughened surface is represented by an arithmetic average surface roughness Ra. The surface roughness Ra is generally smaller than the average particle size of the abrasive, and in order to make Ra 1 μm or more, in the case of garnet or rare earth oxide containing rare earths, an abrasive with an average particle size of 20 μm or more is required. It is. In the case of garnet or rare earth oxide having rare earth as a constituent element, the temperature at which atoms freely move on the surface of the ceramic (the temperature at which thermal etching starts) is suitable for the heat treatment temperature, and this temperature is 1300 ° C. or higher. On the other hand, when the heat treatment temperature exceeds 1700 ° C., the effect of roughening may be lost. In this specification, the rare earth includes Y.
特に好ましくは、平均粒径が30μm〜300μmの研磨剤を光学用セラミックスの表面にサンドブラストもしくは押し付けることにより粗面化し、かつ真空中もしくは水素中1300℃〜1500℃で熱処理する。この時、粗面化した表面グレインが半球状に凸化する。これにより、サンドブラストもしくは押し付けることにより大きく粗面化した部分に、更に細かく粗面を形成することができ、より効率的に粗面化を行うことができる。希土類アルミニウムガーネット、希土類ガリウムガーネットもしくは希土類酸化物のセラミックス表面に、平均粒径が30μm〜300μmの研磨剤をサンドブラストもしくは押し付けることにより、表面粗さRaが1.5〜3μm程度に粗面化ができ、これを1300℃〜1500℃ですることにより、マイクロクラックを消滅させることができる。 Particularly preferably, an abrasive having an average particle size of 30 μm to 300 μm is roughened by sandblasting or pressing the surface of the optical ceramic, and heat treatment is performed in vacuum or in hydrogen at 1300 ° C. to 1500 ° C. At this time, the roughened surface grain is convexed into a hemisphere. Thereby, a rough surface can be formed more finely in a portion roughened by sandblasting or pressing, and roughening can be performed more efficiently. The surface roughness Ra can be roughened to about 1.5 to 3 μm by sandblasting or pressing an abrasive with an average particle size of 30 μm to 300 μm on the surface of rare earth aluminum garnet, rare earth gallium garnet or rare earth oxide ceramics. Microcracks can be eliminated by setting the temperature to 1300 ° C to 1500 ° C.
以下に本発明を実施するための最適実施例を示すが、本発明は実施例に制約されるものではなく、実施例を特許文献1等の公知技術と当業者に周知の事項に従って変更できる。 Although the optimal example for implementing this invention is shown below, this invention is not restrict | limited to an Example, Example can be changed according to well-known techniques, such as patent document 1, and those well-known to those skilled in the art.
図1〜図5に実施例を示す。図1はレーザーロッド2の形状を示し、丸棒状でその両端面が鏡面4,4で、側面が粗面6をなしている。なお側面全体でなくその一部が粗面化されていても良い。また光学用セラミックスはレーザーロッド2に限らず、ディスク状、プリズム状、レンズ状等でも良く、粗面化する面は例えば側面であるが、これ以外の面でも良い。光学用セラミックスの用途はレーザー媒体に限らない。レーザーロッド2は例えばNd-YAGの多結晶セラミックスで、Y原子の1atm%がNd原子で置換され、セラミックスの平均粒子径は例えば1.3μm、焼成条件は例えば真空中で最高焼成温度が1800℃である。粗面6はRaが少なくとも0.3μm以上で、例えば0.5μm以上、好ましくは1μm以上必要である。Raを5μm超にするには研磨剤の粒径を大きくする必要があり、これはサンドブラスト、研磨剤の押し付け等の際にレーザーロッド2に深いクラックを発生させるので、Raは5μm以下が好ましい。Raは例えば0.3μm以上5μm以下で、好ましくは0.5μm以上5μm以下、特に好ましくは1μm以上3μm以下である。 1 to 5 show an embodiment. FIG. 1 shows the shape of the laser rod 2, which has a round bar shape, both end surfaces of which are mirror surfaces 4 and 4, and the side surfaces thereof are rough surfaces 6. A part of the side surface may be roughened instead of the entire side surface. Further, the optical ceramics are not limited to the laser rod 2, but may be a disk shape, a prism shape, a lens shape, or the like. Applications of optical ceramics are not limited to laser media. The laser rod 2 is made of, for example, Nd-YAG polycrystalline ceramics, 1 atm% of Y atoms are replaced with Nd atoms, the average particle diameter of the ceramics is, for example, 1.3 μm, and the firing conditions are, for example, a maximum firing temperature of 1800 ° C. in vacuum. is there. The rough surface 6 requires Ra of at least 0.3 μm, for example, 0.5 μm or more, preferably 1 μm or more. In order to increase Ra to more than 5 μm, it is necessary to increase the particle size of the abrasive. This causes deep cracks in the laser rod 2 during sandblasting, pressing of the abrasive, etc., so Ra is preferably 5 μm or less. Ra is, for example, from 0.3 μm to 5 μm, preferably from 0.5 μm to 5 μm, particularly preferably from 1 μm to 3 μm.
図2はレーザー10を示し、レーザーロッド2と対向してXeランプ、LED等の励起光源14を配置し、内面を反射面とした容器14内にレーザーロッド2と励起光源14とを配置し、共振ミラー16,18を鏡面4,4と向かい合うように配置する。共振ミラー16は全反射用,共振ミラー18は部分反射用で、一部の光をレーザービームとして出力する。 FIG. 2 shows a laser 10, an excitation light source 14 such as an Xe lamp or an LED is disposed facing the laser rod 2, the laser rod 2 and the excitation light source 14 are disposed in a container 14 having an inner surface as a reflection surface, The resonant mirrors 16 and 18 are arranged so as to face the mirror surfaces 4 and 4. The resonant mirror 16 is for total reflection, and the resonant mirror 18 is for partial reflection, and outputs a part of light as a laser beam.
レーザーロッド2の製造例を示す。特許文献2に準拠してYAGの多結晶光学用セラミックスを製造した。硝酸イットリウムと硝酸アルミニウムと硝酸ネオディウム(Y:Al:Ndはモル比で297:500:3)とを含む水溶液に、コロイダルシリカ(SiO2としてY3Al5O12 100wt%に対して0.04wt%)と尿素と濃硫酸とを加え、100℃で撹拌下に沈殿させ、濾過と水洗を繰り返してYAGの原料粉末を得た。なおYの1atm%がNdで置換されている。原料粉末に分散媒とバインダーとを加えて、直径4mm、長さ12mmのロッド状に成型し、1100℃で脱脂し、1800℃で真空中で10時間焼成して、光学用セラミックスとした。このセラミックスは、顕微鏡で破断面を観察した際の平均粒径が1.3μmであった。 An example of manufacturing the laser rod 2 will be shown. In accordance with Patent Document 2, YAG polycrystalline optical ceramics were produced. In an aqueous solution containing yttrium nitrate, aluminum nitrate and neodymium nitrate (Y: Al: Nd is a molar ratio of 297: 500: 3), colloidal silica (as SiO 2 is 0.04 wt% with respect to 100 wt% of Y 3 Al 5 O 12 ), Urea and concentrated sulfuric acid were added, and the mixture was precipitated at 100 ° C. with stirring. Filtration and washing were repeated to obtain a YAG raw material powder. Note that 1 atm% of Y is replaced with Nd. A dispersion medium and a binder were added to the raw material powder, molded into a rod shape with a diameter of 4 mm and a length of 12 mm, degreased at 1100 ° C., and fired in vacuum at 1800 ° C. for 10 hours to obtain an optical ceramic. This ceramic had an average particle diameter of 1.3 μm when the fracture surface was observed with a microscope.
セラミックスの側面にサンドブラストあるいは研磨剤の押しつけを行って粗面化した。次いで真空中で最高焼成温度に1時間保つように熱処理して、粗面化に伴うマイクロクラックを除去した。真空中に変えて水素中でも良い。焼成後に、セラミックスの両端面を表面粗さRa=0.1〜0.5nm、平坦度=λ/10(λ=633nm)に鏡面研磨し、図1に示すレーザーロッド2とした。各試料の表面粗さとレーザーロッドとしての性能を、表1に示す。試料1の表面粗さ計のデータを図3に(縦倍率2800倍)、試料3の表面粗さ計のデータを図4に(縦倍率1400倍)に示す。また試料1の表面の電子顕微鏡写真を図5に示す。図5のスケール全体が50μmで、セラミックスの表面には粗面化により大きな凹凸が生じると共に、表面のグレインが半球状に凸化していることが分かる。 The surface of the ceramic was roughened by sandblasting or pressing an abrasive. Next, heat treatment was performed in vacuum so as to maintain the maximum firing temperature for 1 hour to remove microcracks associated with roughening. Change to vacuum or use hydrogen. After firing, both end faces of the ceramic were mirror-polished to a surface roughness Ra = 0.1 to 0.5 nm and a flatness = λ / 10 (λ = 633 nm) to obtain a laser rod 2 shown in FIG. Table 1 shows the surface roughness of each sample and the performance as a laser rod. The data of the surface roughness meter of sample 1 is shown in FIG. 3 (vertical magnification 2800 times), and the data of the surface roughness meter of sample 3 is shown in FIG. 4 (vertical magnification 1400 times). An electron micrograph of the surface of Sample 1 is shown in FIG. It can be seen that the entire scale of FIG. 5 is 50 μm, large irregularities are generated on the surface of the ceramic by roughening, and the grains on the surface are convex in a hemispherical shape.
表中、アルミナ170μm等は用いた研磨剤とその平均粒径を、レーザー発振性能での0.3W等はレーザーの発振閾値となる励起光源の出力を示す。24.8%等は発振閾値から励起光源の出力を増した際のスロープ効率を示し、これは励起光源出力の増加分当たりの発振出力の増加分である。また14W等はシングルモードでの最大出力を、40W等はマルチモードでの最大出力を示す。熱処理の欄が…の試料5に対しては粗面化処理のみを行い、熱処理を行わなかった。また試料6では、粗面化した側面を、エッチング液を濃硫酸と濃リン酸の1:1混合液として、170℃で120分間エッチングした。 In the table, alumina 170 μm or the like indicates the abrasive used and its average particle diameter, and 0.3 W in the laser oscillation performance indicates the output of the excitation light source that becomes the laser oscillation threshold. 24.8% or the like indicates the slope efficiency when the output of the excitation light source is increased from the oscillation threshold, which is an increase in the oscillation output per increase of the excitation light source output. Moreover, 14W etc. show the maximum output in the single mode, and 40W etc. show the maximum output in the multi mode. For the sample 5 in which the heat treatment column is ..., only the roughening treatment was performed, and no heat treatment was performed. In Sample 6, the roughened side surface was etched at 170 ° C. for 120 minutes using an etching solution of 1: 1 mixture of concentrated sulfuric acid and concentrated phosphoric acid.
粗面化後に化学エッチングを行うと、粗面化した面がRaが0.2μmまで平滑化され、これに伴ってレーザー発振でのスロープ効率と最大出力とが低下した。また、粗面化のみを行い、熱処理を行わない場合は、表面グレインが凸化しなかったため、レーザー発振でのスロープ効率と最大出力とが少し低下した。これに対して、粗面化後に熱処理を行うと表面のグレインが半球状に凸化した。このためセラミックスの表面はサンドブラスト等により大きく粗面化し、グレインの凸化によりさらに細かく粗面化する構造となった。なお粗面化後に熱処理を施しても、表面粗さRaは基本的に粗面化時のままであった。そしてレーザー発振でのスロープ効率と最大出力性能において、最良の結果が得られた。また熱処理は焼成炉で行えるので、追加の設備が不要である。さらに熱処理では、化学エッチングとは異なり、毒性の蒸気が発生したり、腐食性の液体を使用したりすることがない。サンドブラスト、研磨剤の押し付け等により粗面化した面を熱処理すると、その後の鏡面研磨時にレーザーロッドに欠けが発生したり、最大出力での発振時に割れが発生したりすることがなかった。 When chemical etching was performed after roughening, the roughened surface was smoothed to Ra of 0.2 μm, and along with this, the slope efficiency and maximum output in laser oscillation decreased. In addition, when only the surface roughening was performed and the heat treatment was not performed, the surface grain did not become convex, and the slope efficiency and maximum output in laser oscillation were slightly reduced. On the other hand, when the heat treatment was performed after the roughening, the surface grains became hemispherical. For this reason, the surface of the ceramic was greatly roughened by sand blasting or the like, and the structure was further finely roughened by the grain convexity. Even when heat treatment was performed after roughening, the surface roughness Ra basically remained as it was during roughening. The best results were obtained in terms of slope efficiency and maximum output performance in laser oscillation. Further, since the heat treatment can be performed in a baking furnace, no additional equipment is required. Furthermore, unlike chemical etching, heat treatment does not generate toxic vapors or use corrosive liquids. When the surface roughened by sandblasting, pressing of an abrasive or the like was heat-treated, the laser rod was not chipped during subsequent mirror polishing or cracked during oscillation at the maximum output.
2 レーザーロッド
4 鏡面
6 粗面
10 レーザー
12 励起光源
14 容器
16,18 共振ミラー
2 Laser rod 4 Mirror surface 6 Rough surface 10 Laser 12 Excitation light source 14 Container 16, 18 Resonant mirror
Claims (5)
光学用セラミックスの表面の一部を、研磨剤により粗面化する工程と、
粗面化後の光学用セラミックスを熱処理することにより、前記表面の一部を粗面に保ちながら、粗面化により生じたマイクロクラックの除去及び表面グレインを凸化する工程と、
光学用セラミックスの表面の他の一部を鏡面研磨する工程、とをこの順に行う光学用セラミックスの製造方法。 A process for producing optical ceramics comprising a polycrystalline sintered body by molding and sintering powder;
A step of roughening a part of the surface of the optical ceramic with an abrasive;
A step of heat-treating the optical ceramic after the roughening to remove the microcracks caused by the roughening and to make the surface grains convex while keeping a part of the surface rough;
A method for producing an optical ceramic, wherein the other part of the surface of the optical ceramic is mirror-polished in this order.
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| EP3354627A1 (en) * | 2017-01-27 | 2018-08-01 | Shin-Etsu Quartz Products Co., Ltd. | Method of producing porous quartz glass preform |
| JP2019179780A (en) * | 2018-03-30 | 2019-10-17 | 住友大阪セメント株式会社 | Manufacturing method of electrostatic chuck device |
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