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JP2013123741A - Pb-free solder alloy having excellent plastic deformation property - Google Patents

Pb-free solder alloy having excellent plastic deformation property Download PDF

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JP2013123741A
JP2013123741A JP2011274443A JP2011274443A JP2013123741A JP 2013123741 A JP2013123741 A JP 2013123741A JP 2011274443 A JP2011274443 A JP 2011274443A JP 2011274443 A JP2011274443 A JP 2011274443A JP 2013123741 A JP2013123741 A JP 2013123741A
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solder
solder alloy
alloy
free solder
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Takashi Izeki
隆士 井関
Masahito Takamori
雅人 高森
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Sumitomo Metal Mining Co Ltd
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    • H10W72/30
    • H10W72/352

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Abstract

【課題】 300〜400℃程度の融点を有し、濡れ性及び信頼性に優れ、特に加工性及び応力緩和性に優れた、Znを主成分とする高温用のPbフリーはんだ合金を提供する。
【解決手段】 伸び率が50%以上、引張強度が70MPa以上のPbフリーはんだ合金であって、Alを1.0質量%以上15.0質量%以下、好ましくは2.0質量%以上9.0質量%以下含有し、必要に応じてGe、Cu、Ag、Ni、及びPの内の少なくともいずれかを含有しており、残部が不可避的に含まれる元素を除きZnからなる。
【選択図】 なし
PROBLEM TO BE SOLVED: To provide a high-temperature Pb-free solder alloy mainly composed of Zn having a melting point of about 300 to 400 ° C., excellent wettability and reliability, particularly excellent workability and stress relaxation properties.
A Pb-free solder alloy having an elongation of 50% or more and a tensile strength of 70 MPa or more, and Al is 1.0% by mass or more and 15.0% by mass or less, preferably 2.0% by mass or more and 9. It is contained in an amount of 0% by mass or less, and contains at least one of Ge, Cu, Ag, Ni, and P as required, and is made of Zn except for elements that are inevitably contained in the balance.
[Selection figure] None

Description

本発明は、Pbを含まないいわゆるPbフリーはんだ合金に関し、特に、塑性変形性に優れ且つ高温用として好適なZnを主成分とするPbフリーはんだ合金に関する。   The present invention relates to a so-called Pb-free solder alloy that does not contain Pb, and particularly relates to a Pb-free solder alloy that is excellent in plastic deformability and that is suitable for high temperature use and contains Zn as a main component.

パワートランジスタ用素子のダイボンディングを始めとして、各種電子部品の組立工程におけるはんだ付では高温はんだ付が行われており、300〜400℃程度の比較的高温の融点を有するはんだ合金(以下、「高温用はんだ合金」とも称する)が用いられている。このような高温用はんだ合金としては、Pb−5質量%Sn合金に代表されるPb系はんだ合金が従来から主に用いられている。   Starting with die bonding of power transistor elements, high temperature soldering is performed in soldering in the assembly process of various electronic components, and a solder alloy having a relatively high melting point of about 300 to 400 ° C. (hereinafter referred to as “high temperature”). Also referred to as “solder alloy”. As such a high-temperature solder alloy, a Pb-based solder alloy represented by a Pb-5 mass% Sn alloy has been mainly used conventionally.

しかし、近年では環境汚染に対する配慮からPbの使用を制限する動きが強くなってきており、例えばRoHS指令などではPbは規制対象物質になっている。こうした動きに対応して、電子部品などの組立の分野においても、Pbを含まない(無鉛)はんだ合金、即ちPbフリーはんだ合金の提供が求められている。   However, in recent years, there has been a strong movement to limit the use of Pb due to consideration for environmental pollution. For example, Pb is a regulated substance in the RoHS directive. Corresponding to such a movement, in the field of assembling electronic components and the like, it is required to provide a Pb-free (lead-free) solder alloy, that is, a Pb-free solder alloy.

中低温用(約140〜230℃)のはんだ合金に関しては、Snを主成分とするPbフリーのはんだ合金が既に実用化されている。例えば、特許文献1には、Snを主成分とし、Agを1.0〜4.0質量%、Cuを2.0質量%以下、Niを0.5質量%以下、Pを0.2質量%以下含有するPbフリーのはんだ合金が記載されている。また、特許文献2には、Agを0.5〜3.5質量%、Cuを0.5〜2.0質量%含有し、残部がSnからなるPbフリーのはんだ合金が記載されている。   As for a solder alloy for medium and low temperatures (about 140 to 230 ° C.), a Pb-free solder alloy containing Sn as a main component has already been put into practical use. For example, in Patent Document 1, Sn is the main component, Ag is 1.0 to 4.0 mass%, Cu is 2.0 mass% or less, Ni is 0.5 mass% or less, and P is 0.2 mass%. Pb-free solder alloys containing up to 10% are described. Patent Document 2 describes a Pb-free solder alloy containing 0.5 to 3.5% by mass of Ag, 0.5 to 2.0% by mass of Cu, and the balance being Sn.

一方、高温用のはんだ合金に関しても、Pbフリーを実現するため、Bi系はんだ合金やZn系はんだ合金などがさまざまな機関で開発されている。例えばBi系はんだ合金では、特許文献3に、Biを30〜80質量%含有し、溶融温度が350〜500℃であるBi/Ag系のろう材が開示されている。また、特許文献4には、Biを含む共晶合金に2元共晶合金を加え、更に添加元素を加えることによって、液相線温度の調整とばらつきの減少が可能な生産方法が開示されている。   On the other hand, Bi-based solder alloys, Zn-based solder alloys, and the like have been developed by various organizations in order to realize Pb-free soldering alloys for high temperatures. For example, for a Bi-based solder alloy, Patent Document 3 discloses a Bi / Ag-based brazing material containing 30 to 80% by mass of Bi and having a melting temperature of 350 to 500 ° C. Patent Document 4 discloses a production method in which a binary eutectic alloy is added to a Bi-containing eutectic alloy and an additive element is further added to adjust the liquidus temperature and reduce variations. Yes.

また、Zn系はんだ合金では、例えば特許文献5に、Znに融点を下げるべくAlが添加されたZn−Al合金を基本とし、これにGe又はMgを添加した高温用Zn系はんだ合金が記載されている。特許文献5には、更にSn又はInを添加することによって、より一層融点を下げる効果があることも記載されている。   As for a Zn-based solder alloy, for example, Patent Document 5 describes a high-temperature Zn-based solder alloy based on a Zn—Al alloy in which Al is added to lower the melting point of Zn, and Ge or Mg is added thereto. ing. Patent Document 5 also describes that there is an effect of further lowering the melting point by further adding Sn or In.

具体的には、特許文献5には、Alを1〜9質量%、Geを0.05〜1質量%含み、残部がZn及び不可避不純物からなるZn合金;Alを5〜9質量%、Mgを0.01〜0.5質量%含み、残部がZn及び不可避不純物からなるZn合金;Alを1〜9質量%、Geを0.05〜1質量%、Mgを0.01〜0.5質量%含み、残部がZn及び不可避不純物からなるZn合金;Alを1〜9質量%、Geを0.05〜1質量%、Sn及び/又はInを0.1〜25質量%含み、残部がZn及び不可避不純物からなるZn合金;Alを1〜9質量%、Mgを0.01〜0.5質量%、Sn及び/又はInを0.1〜25質量%含み、残部がZn及び不可避不純物からなるZn合金;Alを1〜9質量%、Geを0.05〜1質量%、Mgを0.01〜0.5質量%、Sn及び/又はInを0.1〜25質量%含み、残部がZn及び不可避不純物からなるZn合金が記載されている。   Specifically, in Patent Document 5, a Zn alloy containing 1 to 9% by mass of Al and 0.05 to 1% by mass of Ge, with the balance being Zn and inevitable impurities; 5 to 9% by mass of Al, Mg Zn alloy composed of 0.01 to 0.5% by mass with the balance being Zn and inevitable impurities; Al is 1 to 9% by mass, Ge is 0.05 to 1% by mass, Mg is 0.01 to 0.5% Zn alloy containing Zn and the balance consisting of Zn and unavoidable impurities; Al containing 1 to 9% by mass; Ge containing 0.05 to 1% by mass; Sn and / or In containing 0.1 to 25% by mass and the balance being Zn alloy composed of Zn and inevitable impurities; Al 1-9 mass%, Mg 0.01-0.5 mass%, Sn and / or In 0.1-25 mass%, the balance Zn and inevitable impurities Zn alloy comprising: Al 1-9 mass%, Ge 0.05-1 mass%, Mg 0.01-0.5 The amount%, Sn and / or In includes 0.1 to 25 wt%, and the balance are described Zn alloy consisting of Zn and unavoidable impurities.

ところで、はんだには一般的に熱応力の緩和性が要求される。その理由は、例えば半導体チップをはんだで基板に接合して得られる接合体はさまざまな環境下で使用されるため、温度変化によって生じる基板と半導体チップの熱膨張・収縮による応力をはんだで吸収しなくてはならないからである。例えば、特許文献6には、熱応力の緩和性に優れた特性を示すはんだ材料として、17〜30wt%Al−0〜1.5wt%Cu−0〜0.5wt%Mg−Zn系からなるZn−Al共析系合金接合材が記載されている。この接合材は、超塑性現象を利用して対象物を接合することを特徴とするものである。   By the way, the solder is generally required to relax thermal stress. The reason is that, for example, since a joined body obtained by joining a semiconductor chip to a substrate with solder is used in various environments, the stress caused by thermal expansion / contraction of the substrate and the semiconductor chip caused by temperature changes is absorbed by the solder. It is necessary. For example, in Patent Document 6, as a solder material exhibiting excellent thermal stress relaxation properties, Zn containing 17 to 30 wt% Al-0 to 1.5 wt% Cu-0 to 0.5 wt% Mg—Zn is used. -Al eutectoid alloy bonding materials are described. This bonding material is characterized by bonding a target object using a superplastic phenomenon.

特開1999−077366号公報Japanese Patent Laid-Open No. 1999-077366 特開平8−215880号公報JP-A-8-215880 特開2002−160089号公報JP 2002-160089 A 特開2006−167790号公報JP 2006-167790 A 特許第3850135号Patent No. 3850135 特開2009−113050号公報JP 2009-1113050 A

一般的な電子部品の基板材料には熱可塑性樹脂や熱硬化性樹脂などが多用されているため、はんだ接合時の作業温度は400℃未満が望ましく、370℃以下がより望ましい。しかしながら、特許文献3のBi/Ag系ろう材は、液相線温度が400〜700℃と高いため、接合時の作業温度も400〜700℃以上になると推測され、使用される基板材料が耐えうる温度を超えていると考えられる。また、特許文献4の方法は、液相線の温度調整のみで4元系以上の多元系はんだ合金になるうえ、Biの脆弱な機械的特性については効果的な改善がされていない。   Thermoplastic resins and thermosetting resins are often used as substrate materials for general electronic components, so that the working temperature during soldering is preferably less than 400 ° C., more preferably 370 ° C. or less. However, since the Bi / Ag brazing material of Patent Document 3 has a high liquidus temperature of 400 to 700 ° C., it is presumed that the working temperature at the time of bonding is 400 to 700 ° C. or higher, and the substrate material used is durable. It is considered that the temperature exceeds the allowable temperature. In addition, the method of Patent Document 4 becomes a quaternary or higher multi-component solder alloy only by adjusting the temperature of the liquidus, and the fragile mechanical characteristics of Bi are not effectively improved.

更に、特許文献5に開示されているZn系はんだ合金は、その組成の範囲内では合金の濡れ性が不十分である場合が多い。つまり、主成分であるZnは還元性が強いため自らは酸化されやすく、その結果、濡れ性が極めて悪くなることが問題となっている。そしてAlはZnよりも還元性が強いため、例えば1重量%以上添加した場合、濡れ性を低下させてしまうことがある。   Furthermore, the Zn-based solder alloy disclosed in Patent Document 5 often has insufficient wettability within the composition range. That is, Zn, which is the main component, has a strong reducibility, so that it is easily oxidized by itself, and as a result, the wettability is extremely deteriorated. And since Al is more reducible than Zn, for example, when 1 wt% or more is added, the wettability may be lowered.

また、これら酸化されたZnやAlに対しては、熱力学の平衡論的にはGeやSnが添加されていても還元することができず、濡れ性を向上させることはできないと考えられる。ただし、はんだ接合のように非常に短い時間で溶融、固化をする場合、金属反応は非平衡的な反応が支配的な場合も多く、必ずしも平衡論で全てが説明できるわけではない。   Moreover, it is considered that these oxidized Zn and Al cannot be reduced even if Ge or Sn is added in terms of thermodynamic equilibrium, and the wettability cannot be improved. However, when melting and solidifying in a very short time, such as soldering, the metal reaction is often a non-equilibrium reaction, and not all can be explained by equilibrium theory.

特許文献5に開示されているZn系はんだ合金は、濡れ性の問題に加え、はんだ接合における更に重要な課題として、加工性や応力緩和性に対する課題もある。即ち、ZnとAlは共晶合金を作り、ある程度の柔軟性を持った柔らかい合金となる。しかし、接合温度が比較的高い(Zn−Al合金の共晶温度:381℃)ため、接合後、Siを主成分とする半導体素子やCuを主成分とする基板が常温まで冷却される際、温度差が大きいため、熱膨張による応力の影響を大きく受けてしまう。従って、中低温用のはんだに比較してより一層優れた応力緩和性が要求される。   In addition to the problem of wettability, the Zn-based solder alloy disclosed in Patent Document 5 also has problems with workability and stress relaxation as further important problems in solder bonding. That is, Zn and Al make a eutectic alloy and become a soft alloy with a certain degree of flexibility. However, since the bonding temperature is relatively high (eutectic temperature of Zn—Al alloy: 381 ° C.), after bonding, the semiconductor element mainly composed of Si and the substrate mainly composed of Cu are cooled to room temperature. Since the temperature difference is large, it is greatly affected by the stress due to thermal expansion. Therefore, much better stress relaxation properties are required as compared with the solder for medium and low temperatures.

このように、Zn−Al系合金は、融点については300〜400℃程度(Zn−Al共晶温度:381℃)と好ましい範囲にあるものの、加工性等の観点から必ずしも最適と言える合金ではない。更にZn−Al合金にMgなどが添加されると金属間化合物を生成して極めて硬くなり、良好な加工性や応力緩和性が得られない場合が生じ得る。例えばMgを5質量%以上含有した場合、加工の困難なワイヤ状やシート状などに加工することが実質的にできなくなる。   As described above, the Zn—Al-based alloy has a preferable melting point of about 300 to 400 ° C. (Zn—Al eutectic temperature: 381 ° C.), but is not necessarily an optimum alloy from the viewpoint of workability. . Further, when Mg or the like is added to the Zn—Al alloy, an intermetallic compound is formed and becomes extremely hard, and there may be a case where good workability and stress relaxation properties cannot be obtained. For example, when Mg is contained in an amount of 5% by mass or more, it is practically impossible to process into a wire shape or a sheet shape that is difficult to process.

更に特許文献6に記載のZn−Al共析系合金接合材は超塑性現象を利用しており、加工性や応力緩和性には優れると考えられるが、Alを17wt%以上含むため液相線温度が460℃を超えてしまい、半導体接合用はんだとしては接合温度が高すぎて使用できない。具体的に説明すると、はんだを用いて半導体素子や基板などを接合する場合、その接合面とはんだを十分に反応させて接合界面にはんだと接合面の合金を作る必要がある。このために接合温度ははんだの融点より50℃程度高くするのが一般的である。このようなことから、特許文献6のはんだを用いて半導体素子などを接合する場合の温度は500℃を超えることが予想され、半導体素子やその周辺部品の耐熱温度を超えてしまうので、半導体接合用はんだとしては接合温度が高すぎて使用できないと言えるのである。   Furthermore, although the Zn-Al eutectoid alloy bonding material described in Patent Document 6 uses a superplastic phenomenon and is considered to be excellent in workability and stress relaxation properties, it contains liquid in an amount of 17 wt% or more. Since the temperature exceeds 460 ° C., the bonding temperature is too high to be used as a semiconductor bonding solder. More specifically, when a semiconductor element or a substrate is bonded using solder, it is necessary to sufficiently react the bonding surface with the solder to form an alloy of the solder and the bonding surface at the bonding interface. For this reason, the joining temperature is generally about 50 ° C. higher than the melting point of the solder. For this reason, the temperature in the case of joining a semiconductor element or the like using the solder of Patent Document 6 is expected to exceed 500 ° C. and exceeds the heat resistance temperature of the semiconductor element or its peripheral components. It can be said that the soldering temperature is too high to be used as a solder.

以上述べたように、高温用のPbフリーはんだ合金、特にZnを主成分とするPbフリーはんだ合金については、濡れ性等の諸特性とのバランスをとりながら、主として加工性、応力緩和性を改善することが大きな課題となっているが、未だこの課題は解決されていない。このように、従来のPb−5質量%Sn合金に代表されるPb系はんだ合金を代替できる高温用はんだ合金は未だ実用化されていないのが実状である。   As described above, Pb-free solder alloys for high temperatures, especially Pb-free solder alloys containing Zn as the main component, mainly improve workability and stress relaxation while balancing with various properties such as wettability. It has become a big issue, but this issue has not been solved yet. Thus, the actual situation is that a high-temperature solder alloy that can replace a Pb-based solder alloy typified by a conventional Pb-5 mass% Sn alloy has not yet been put into practical use.

本発明はかかる事情に鑑みてなされたものであり、各種電子部品の組立などで用いるのに好適な300〜400℃程度の融点を有し、濡れ性及び信頼性に優れ、特に加工性及び応力緩和性に優れた、Pbを含まずにZnを主成分とする高温用のPbフリーZn−Al系はんだ合金を提供することを目的としている。   The present invention has been made in view of such circumstances, has a melting point of about 300 to 400 ° C. suitable for use in assembling various electronic components, and has excellent wettability and reliability, particularly workability and stress. An object of the present invention is to provide a Pb-free Zn—Al solder alloy for high temperature, which has excellent relaxation properties and does not contain Pb but contains Zn as a main component.

上記目的を達成するため、本発明が提供するZnを主成分とするPbフリーはんだ合金は、伸び率が50%以上、引張強度が70MPa以上であり、Alを1.0質量%以上15.0質量%以下含有し、残部が不可避的に含まれる元素を除きZnからなることを特徴としている。   In order to achieve the above-mentioned object, the Zn-based Pb-free solder alloy provided by the present invention has an elongation of 50% or more, a tensile strength of 70 MPa or more, and Al of 1.0% by mass or more and 15.0. It is characterized by being composed of Zn except for elements that are contained by mass% or less and the remainder is unavoidably contained.

また、上記本発明のZnを主成分とするPbフリーはんだ合金は、Geが8.00質量%を超えて含まれておらず、Cuが3.00質量%を超えて含まれておらず、Agが4.00質量%を超えて含まれておらず、Niが0.80質量%を超えて含まれておらず、Pが0.5000質量%を超えて含まれていないのが好ましく、また、塑性変形を伴う製造方法によって製造されることが好ましい。これにより加工性や応力緩和性等において更に優れたはんだ合金となり得る。   The Pb-free solder alloy containing Zn as a main component of the present invention does not contain Ge in excess of 8.00% by mass and Cu does not contain in excess of 3.00% by mass. Preferably, Ag is not included in excess of 4.00 mass%, Ni is not included in excess of 0.80 mass%, and P is not included in excess of 0.5000 mass%, Moreover, it is preferable to manufacture by the manufacturing method accompanied by plastic deformation. As a result, the solder alloy can be further improved in workability and stress relaxation properties.

更に、上記本発明のZnを主成分とするPbフリーはんだ合金は、Alを2.0質量%以上9.0質量%以下含有し、Ge、Cu、Ag、Ni、及びPの内の少なくともいずれかを、Geの場合は0.01質量%以上8.00質量%以下、Cuの場合は0.01質量%以上3.00質量%以下、Agの場合は0.10質量%以上4.00質量%以下、Niの場合は0.01質量%以上0.80質量%以下、Pの場合は0.0005質量%以上0.500質量%以下含有していることが好ましい。   Furthermore, the Pb-free solder alloy containing Zn as a main component according to the present invention contains Al in an amount of 2.0% by mass to 9.0% by mass and includes at least one of Ge, Cu, Ag, Ni, and P. In the case of Ge, 0.01 mass% to 8.00 mass%, in the case of Cu, 0.01 mass% to 3.00 mass%, and in the case of Ag, 0.10 mass% to 4.00 mass%. In the case of Ni, it is preferable to contain 0.01 mass% or more and 0.80 mass% or less, and in the case of P, 0.0005 mass% or more and 0.500 mass% or less is preferable.

本発明によれば、濡れ性、接合性及び信頼性等に優れていることに加えて、加工性や応力緩和性に特に優れ、300℃程度のリフロー温度にも十分耐え得るPbフリーはんだ合金を提供することができる。これにより、Pbフリーはんだ合金を用いてパワートランジスタ用素子のダイボンディングなど各種電子部品の組立工程における高温用はんだ付けを好適に行うことが可能となる。   According to the present invention, in addition to being excellent in wettability, bondability, reliability, etc., a Pb-free solder alloy that is particularly excellent in workability and stress relaxation properties and can sufficiently withstand a reflow temperature of about 300 ° C. Can be provided. Accordingly, it becomes possible to suitably perform high-temperature soldering in an assembly process of various electronic components such as die bonding of power transistor elements using a Pb-free solder alloy.

本発明によるZnを主成分とするPbフリーはんだ合金は、Pbを含んでおらず、所定の含有量のAlを含有し、残部が製造上、不可避的に含まれる元素を除きZnからなり、伸び率が50%以上、引張強度が70MPa以上である。このPbフリーはんだ合金は塑性変形を伴う製造方法によって製造されることが好ましく、また、必要に応じてGe、Cu、Ag、Ni、及びPの内の少なくともいずれかを含んでいるのが好ましい。   The Pb-free solder alloy containing Zn as a main component according to the present invention does not contain Pb, contains a predetermined content of Al, and the balance is made of Zn except for elements that are inevitably contained in production. The rate is 50% or more, and the tensile strength is 70 MPa or more. This Pb-free solder alloy is preferably manufactured by a manufacturing method involving plastic deformation, and preferably contains at least one of Ge, Cu, Ag, Ni, and P as required.

Znは融点が419℃と電子部品等の接合温度である300〜400℃に対し高すぎるという欠点がある。このようなZnの欠点に対して、本発明においては、Alを含有させることにより融点をはんだとして使いやすい温度まで下げている。更に、はんだでの接合において、はんだの溶融後、冷却固化するときに共晶温度(381℃)を経て共析温度(277℃)以下に冷却される際、微細な結晶を形成させて、加工性及び応力緩和性を向上させている。   Zn has a disadvantage that its melting point is 419 ° C., which is too high for 300 to 400 ° C., which is the bonding temperature of electronic components and the like. In order to cope with such a defect of Zn, in the present invention, the melting point is lowered to a temperature that is easy to use as solder by containing Al. Further, in the joining with solder, when the solder is melted and then cooled and solidified, when it is cooled to the eutectoid temperature (277 ° C.) through the eutectic temperature (381 ° C.), a fine crystal is formed and processed. And stress relaxation properties are improved.

このように、Alを含有することによって、Znとの共晶合金を形成させて融点を約400℃以下に下げると同時に、結晶を微細化させて加工性や応力緩和性を向上させるという効果を得ることができる。これら加工性と応力緩和性は、以下に説明するように、Alの添加に加えて更に種々の限定を加えることによって、より一層向上させることができる。   Thus, by containing Al, an eutectic alloy with Zn is formed to lower the melting point to about 400 ° C. or less, and at the same time, the crystal is refined to improve workability and stress relaxation. Can be obtained. These processability and stress relaxation properties can be further improved by adding various limitations in addition to the addition of Al, as will be described below.

即ち、はんだの製造方法を考慮することによって、十分な加工性や応力緩和性を得ることができる場合がある。具体的には、はんだの製造に際して、圧延などの塑性変形を伴う加工法で製造することで加工性等を高めることができる。これは、塑性変形により組織が微細化し、優れた加工性や応力緩和性が得られるからである。   That is, there are cases where sufficient workability and stress relaxation properties can be obtained by considering the solder manufacturing method. Specifically, at the time of manufacturing the solder, workability and the like can be improved by manufacturing by a processing method involving plastic deformation such as rolling. This is because the structure is refined by plastic deformation, and excellent workability and stress relaxation properties are obtained.

塑性変形させるにはプレス加工、引張加工、又は圧延加工など様々な加工方法があるが、特に圧延加工は圧延速度、圧下率(加工材を圧延して薄くしていく際、厚みを薄くしていく割合)、圧延温度等、調整できるパラメーターが多く、結晶粒径や結晶構造等を制御し易く好ましい。圧延温度は高すぎると再結晶して結晶粒が大きくなり過ぎ、逆に低すぎると結晶が破壊されてしまう。以上を踏まえ、好ましい圧延温度は40〜300℃、さらに好ましくは60〜230℃程度である。このような温度範囲で圧延すれば、高い伸び率を示すだけでなく、バリやソリも発生しづらく、高い収率を得ることができる。   There are various processing methods, such as press working, tensile working, or rolling work, to make plastic deformation, but in particular, the rolling work is performed at a rolling speed and a reduction ratio (when the work material is rolled and thinned, the thickness is reduced. Many ratios that can be adjusted, such as rolling temperature, and the like, and it is easy to control the crystal grain size and crystal structure. If the rolling temperature is too high, recrystallization will cause the crystal grains to become too large. Conversely, if the rolling temperature is too low, the crystals will be destroyed. Based on the above, a preferable rolling temperature is about 40 to 300 ° C, more preferably about 60 to 230 ° C. If rolling is performed in such a temperature range, not only a high elongation rate is exhibited, but also burrs and warps are hardly generated, and a high yield can be obtained.

また、Zn−Alの2元系合金の加工性や応力緩和性を更に改善したい場合や、融点、濡れ性、接合強度、そして信頼性等を目的に合わせて適宜調整したい場合など、更に使い易いはんだ材料とするためには、このZn−Al合金にGe、Cu、Ag、及びNiの内の少なくともいずれかを所定の範囲内で含有させることが有効である。また、特に濡れ性の観点においてはんだ合金の特性を改善したい場合は、Pを所定の範囲内で含有させることが有効である。   In addition, it is easier to use when you want to further improve the workability and stress relaxation of a binary alloy of Zn-Al, or when you want to adjust the melting point, wettability, bonding strength, reliability, etc. as appropriate. In order to obtain a solder material, it is effective to contain at least one of Ge, Cu, Ag, and Ni within a predetermined range in the Zn—Al alloy. Further, when it is desired to improve the properties of the solder alloy particularly from the viewpoint of wettability, it is effective to contain P within a predetermined range.

即ち、Ge、Cu、Ag、及びNiの内の少なくともいずれかを少量含有させることにより、はんだが溶融した後、冷却固化時に先ずこれらの元素が析出し、それを核として結晶が形成される。その結果、結晶が微細化し、はんだの柔軟性が格段に向上する。一方、Pは還元性が高いので、はんだ合金等の酸化を抑制して濡れ性を向上させることができる。このような本発明のZnを主成分とするZn−Al系はんだ合金に添加される各元素について、以下に詳細に説明する。   That is, by containing a small amount of at least one of Ge, Cu, Ag, and Ni, after the solder is melted, these elements are first deposited at the time of cooling and solidification, and crystals are formed using the elements as nuclei. As a result, the crystal becomes finer and the flexibility of the solder is remarkably improved. On the other hand, since P is highly reducible, the wettability can be improved by suppressing oxidation of the solder alloy or the like. Each element added to the Zn—Al based solder alloy mainly composed of Zn of the present invention will be described in detail below.

<Al>
Alは本発明のZnを主成分とするPbフリーはんだ合金において重要な役割を果たす必須元素であり、その含有量は、1.0質量%以上15.0質量%以下である。Alをこの範囲内で含有する合金は特に伸び率に優れ、Al以外の添加元素にも依存するが、概ね50%を超える伸び率を示す。Alの含有量が1.0質量%未満では、他の元素を添加したとしても融点の低下が不十分となるため、接合性が低下してしまい、共晶組成からかなり外れた組成となるため加工性向上が期待できない。
<Al>
Al is an essential element that plays an important role in the Pb-free solder alloy containing Zn as a main component of the present invention, and its content is 1.0 mass% or more and 15.0 mass% or less. An alloy containing Al in this range is particularly excellent in elongation and depends on an additive element other than Al, but exhibits an elongation exceeding approximately 50%. If the Al content is less than 1.0% by mass, the melting point is not sufficiently lowered even if other elements are added, so that the bonding property is lowered and the composition is considerably deviated from the eutectic composition. No improvement in workability can be expected.

一方、Alの含有量が15.0質量%を超えると、Zn−Al合金の液相線温度が高くなりすぎ、電子部品等の実際の接合温度では十分に溶融せず、ボイドの発生率が高くなりすぎたり接合部の合金化が不十分となったりするため、実用に耐えうる接合ができなくなる。更に、当然のことながら、Alの割合が多いため結晶粒が粗大化してしまい、必要とされる加工性を得ることが難しくなる。   On the other hand, if the Al content exceeds 15.0% by mass, the liquidus temperature of the Zn-Al alloy becomes too high, and it does not melt sufficiently at the actual bonding temperature of electronic parts, etc. Since it becomes too high or alloying of the joint portion becomes insufficient, joining that can withstand practical use cannot be performed. Furthermore, as a matter of course, since the proportion of Al is large, the crystal grains become coarse, and it becomes difficult to obtain the required workability.

Alの含有量は、2.0質量%以上9.0質量%以下であると更に好ましい。なぜなら、Alの含有量がこの範囲内であれば、Zn−Al二元系合金の共晶点の組成(Zn=95質量%、Al=5質量%)に近くなって液相線温度が下がるうえ、結晶も微細化して加工性が向上し、使いやすいはんだにより一層近づくからである。   The Al content is more preferably 2.0% by mass or more and 9.0% by mass or less. This is because if the Al content is within this range, the eutectic point composition (Zn = 95% by mass, Al = 5% by mass) of the Zn—Al binary alloy is obtained, and the liquidus temperature decreases. In addition, the crystal is also refined to improve workability, and it is closer to an easy-to-use solder.

Alを含有させる効果は、上記のように主に融点の調整、つまりはZn−Al合金として固相線温度の381℃まで融点を下げること、そして、共晶合金になるため金属が柔らかくなり、伸び率、加工性及び応力緩和性を向上させることにある。ただし、高温用はんだは中低温用はんだに比べて高い接合温度が要求されるため、温度差による熱応力に対し、より一層高い応力緩和性を求められる。そのため、以下に述べる各元素を適宜添加して、更に優れた材料としている。   The effect of containing Al is mainly the adjustment of the melting point as described above, that is, the melting point is lowered to the solidus temperature of 381 ° C. as a Zn—Al alloy, and the metal becomes soft because it becomes a eutectic alloy, The purpose is to improve elongation, workability and stress relaxation. However, since a high-temperature solder requires a higher bonding temperature than a medium-low temperature solder, a higher stress relaxation property is required for thermal stress due to a temperature difference. Therefore, each element described below is appropriately added to make a further excellent material.

<Ge>
Geは本発明のZnを主成分とするPbフリーはんだ合金において、濡れ性に加え、加工性や応力緩和性を向上させたい場合に好適に添加される元素である。具体的に説明すると、Zn−Al合金にGeを少量含有させると、比重の小さいGeははんだ溶融時に浮いてZnより優先的に酸化される。熱力学の平衡論においてはZnやAlの方が酸化されやすいのであるが、比重の関係からGeははんだの表面部に比較的多く存在するため、Geが酸化される割合が多くなり、よって、主成分のZnの酸化を抑制し、濡れ性が向上するのである。
<Ge>
Ge is an element that is preferably added to improve the workability and stress relaxation properties in addition to wettability in the Pb-free solder alloy of the present invention containing Zn as a main component. More specifically, when a small amount of Ge is contained in a Zn—Al alloy, Ge having a small specific gravity floats during solder melting and is preferentially oxidized over Zn. In the thermodynamic equilibrium theory, Zn and Al are more likely to be oxidized. However, since Ge is present in a relatively large amount on the surface of the solder due to the specific gravity, the rate at which Ge is oxidized increases. Oxidation of the main component Zn is suppressed and wettability is improved.

更に、Geの含有量が少ない場合は、はんだ合金が微結晶化する。具体的には、GeはZnやAlに比べて融点が高く(Znの融点:419℃、Alの融点:660℃、Geの融点:938℃)、本発明のはんだ合金が溶融後、冷却過程で固化する際、この融点の高いGeが最初に析出し、これが核となって結晶が成長するため、はんだ合金が微結晶化する。   Furthermore, when the content of Ge is small, the solder alloy is microcrystallized. Specifically, Ge has a higher melting point than Zn or Al (Zn melting point: 419 ° C., Al melting point: 660 ° C., Ge melting point: 938 ° C.), and after the solder alloy of the present invention is melted, a cooling process When solidifying at this time, this high melting point Ge is precipitated first, and this serves as a nucleus to grow crystals, so that the solder alloy is microcrystallized.

これにより、下記<Cu>において詳述するように、伸び率、加工性及び応力緩和性が向上する。一方、Geの含有量が比較的多い場合は共晶点の組成に近づき、伸び率、加工性及び応力緩和性が向上する。以上のようにGeを所定の範囲内で含有することにより、濡れ性、伸び率、応力緩和性等を向上させることが可能となる。   Thereby, as will be described in detail in <Cu> below, the elongation, workability, and stress relaxation properties are improved. On the other hand, when the Ge content is relatively large, the composition approaches the eutectic point, and the elongation, workability, and stress relaxation properties are improved. As described above, by including Ge within a predetermined range, it becomes possible to improve wettability, elongation, stress relaxation, and the like.

Geの含有量は、具体的には0.01質量%以上8.00質量%以下が好ましい。この量が8.00質量%を超えると、結晶粒が大きく成長してしまったりして伸び率が低下する可能性が高い。一方、0.01質量%未満では含有量が少なすぎて上記の効果が現れない。   Specifically, the Ge content is preferably 0.01% by mass or more and 8.00% by mass or less. If this amount exceeds 8.00% by mass, there is a high possibility that the crystal grains will grow greatly and the elongation will decrease. On the other hand, if it is less than 0.01% by mass, the content is too small and the above effect does not appear.

<Cu>
Cuは、本発明のZnを主成分とするPbフリーはんだ合金において、伸び率、応力緩和性及び加工性の向上において重要な役割を担う元素である。CuはZnやAlに比べて融点が高く(Znの融点:419℃、Alの融点:660℃、Cuの融点:1084℃)、はんだ合金の溶融後の冷却過程で固化する際に融点の高いCuが先ず析出し、これが核となって結晶が形成される。そのため、はんだ合金の結晶が微細化する。この結晶の微細化によって、クラックが進展し難い柔らかいはんだとすることが可能となる。
<Cu>
Cu is an element that plays an important role in improving elongation, stress relaxation, and workability in the Pb-free solder alloy containing Zn as a main component of the present invention. Cu has a higher melting point than Zn and Al (Zn melting point: 419 ° C., Al melting point: 660 ° C., Cu melting point: 1084 ° C.), and has a high melting point when solidified in the cooling process after melting of the solder alloy. Cu is precipitated first, and this serves as a nucleus to form a crystal. Therefore, the crystal of the solder alloy becomes finer. By making the crystal finer, it becomes possible to obtain a soft solder in which cracks are difficult to progress.

このような柔軟な性質を有するはんだ合金は、加工性や応力緩和性において非常に優れた性質を示す。即ち、ワイヤやシートなどに加工する際、はんだが柔らかいためクラックや欠けなどが発生し難く、硬いはんだ材料に比べてワイヤへの押出速度やシートへの圧延速度等、各種加工速度を速くできる。これにより生産性に優れる上、不良品が発生しにくくなるので、収率を高めることができる。   A solder alloy having such a flexible property exhibits very excellent properties in workability and stress relaxation properties. That is, when processing into a wire, a sheet, or the like, since the solder is soft, cracks and chips are hardly generated, and various processing speeds such as an extrusion speed to the wire and a rolling speed to the sheet can be increased as compared with a hard solder material. Thereby, it is excellent in productivity, and it becomes difficult to generate defective products, so that the yield can be increased.

更に、プリフォーム材等に加工する際にバリや反りが少なくて加工しやすくなるので、単位量当りの品質検査コストも少なくて済む。また、柔らかいはんだ合金は容易に変形し、半導体素子の接合時にはんだの反りなどが少なくなるため、実質的な接触面積を大きくとることができる。これにより、極めて高い接合性を得ることが可能になる。   Furthermore, since it is easy to process with few burrs and warping when processing into a preform material, the quality inspection cost per unit amount can be reduced. In addition, since the soft solder alloy is easily deformed and the warpage of the solder is reduced when the semiconductor elements are joined, the substantial contact area can be increased. This makes it possible to obtain extremely high bondability.

また、Cu自身も金属の中で非常に柔らかい金属であり、このCu自身の柔らかさがZn−Al合金中においても発揮される。そして、はんだ接合は非常に短時間で行われることから、非平衡的な現象が起こるため、Cu含有量がZnやAlより圧倒的に少なくても、はんだ組成や接合条件によってCuのリッチ相が生成される。   Also, Cu itself is a very soft metal among metals, and the softness of Cu itself is exhibited in the Zn-Al alloy. And since solder bonding is performed in a very short time, a non-equilibrium phenomenon occurs. Therefore, even if the Cu content is overwhelmingly smaller than Zn or Al, a Cu rich phase is formed depending on the solder composition and bonding conditions. Generated.

Cu−Zn及びCu−Alの各2元系状態図から分かるように、CuはAl及びZnの固溶量が多いため、Cuリッチ相は多少ZnやAlを含有するが、この場合でもCu自身の柔軟性が維持され、かかるCuリッチ相において、はんだに加わる応力を吸収することができる。その結果、はんだ合金が更に柔らかくなる。   As can be seen from the binary phase diagrams of Cu-Zn and Cu-Al, Cu has a large amount of Al and Zn, so the Cu-rich phase contains some Zn and Al. Thus, the stress applied to the solder can be absorbed in the Cu-rich phase. As a result, the solder alloy becomes softer.

そして、本発明のはんだ合金の柔軟な性質が最も顕著に現れるのが応力緩和性である。つまり、半導体素子を基板にはんだ接合して得られる電子部品等の接合体は、自動車や家電などの各種装置に搭載されるが、その使用時に接合体には電流が流れて発熱したり、あるいは外気温が変化したりなどにより膨張・収縮し、熱応力が加わる。例えば、Cuを主成分とする基板とSiを主成分とする半導体素子で組み立てられた電子部品では熱膨張率が5倍程度異なるため、繰り返し加わる熱応力も大きい。本発明のはんだ合金は、このような大きな熱応力を吸収する応力緩和性に優れ、厳しい環境下における電子部品の長期使用を可能にするものである。   And it is stress relaxation that the flexible property of the solder alloy of the present invention appears most remarkably. In other words, a joined body such as an electronic component obtained by soldering a semiconductor element to a substrate is mounted on various devices such as automobiles and home appliances. Thermal stress is applied due to expansion and contraction due to changes in the outside air temperature. For example, an electronic component assembled with a substrate containing Cu as a main component and a semiconductor element containing Si as a main component has a coefficient of thermal expansion that is different by about five times, so that repeated thermal stress is also large. The solder alloy of the present invention is excellent in stress relaxation property that absorbs such a large thermal stress, and enables long-term use of electronic components in a severe environment.

Cuの含有量は0.01質量%以上3.00質量%以下が好ましい。Cuの添加による効果は、上記の通りはんだ合金の微細化とCuリッチ相生成による加工性や柔軟性等の向上である。従って、微細化効果を優先させる場合、Cu含有量は微量でよく、その下限値は0.01質量%で十分である。一方、Cuリッチ相生成による効果を優先する場合、Cu含有量は多いほどよいが、限度を超えると液相線温度が高くなりすぎて良好な接合ができなくなるため、その上限値を3.00質量%としている。更に、Cu含有量が0.03質量%以上1.00質量%以下であれば、上記効果がより一層現れ易くなるためより好ましい。   The Cu content is preferably 0.01% by mass or more and 3.00% by mass or less. As described above, the effect of addition of Cu is improvement of workability, flexibility, and the like by miniaturization of a solder alloy and generation of a Cu rich phase. Therefore, when giving priority to the refinement effect, the Cu content may be very small, and a lower limit of 0.01% by mass is sufficient. On the other hand, when giving priority to the effect of Cu-rich phase generation, the higher the Cu content, the better. However, if the limit is exceeded, the liquidus temperature becomes too high and good bonding cannot be performed. Mass%. Furthermore, if the Cu content is 0.03 mass% or more and 1.00 mass% or less, the above effect is more likely to appear, which is more preferable.

<Ag>
Agは、本発明のZnを主成分とするPbフリーはんだ合金の諸特性を目的に合わせて調整する際に適宜添加される元素であり、その添加による主な効果は濡れ性の向上にある。即ち、Agは基板や半導体素子のメタライズの最上層に用いられることからも分かるように、濡れ性を向上させる効果が大きい。これはAgの酸化しづらい性質に起因するものである。また、Zn−Ag合金においてZnリッチ側でAg含有量を増やしていくと液相温度は単調に増加するため、Agは本発明のはんだ合金の融点に影響を与える。
<Ag>
Ag is an element that is appropriately added when adjusting the various characteristics of the Pb-free solder alloy containing Zn as a main component of the present invention in accordance with the purpose, and the main effect of the addition is to improve wettability. In other words, as can be seen from the fact that Ag is used for the uppermost layer of the metallization of the substrate or semiconductor element, the effect of improving the wettability is great. This is due to the property of Ag that is difficult to oxidize. In addition, when the Ag content is increased on the Zn-rich side in the Zn-Ag alloy, the liquidus temperature increases monotonically, so Ag affects the melting point of the solder alloy of the present invention.

このように、Agは濡れ性向上の面からすると多い方がよいが、融点から考えれば少ない方がよい。従って、融点と濡れ性のバランスを考えてAgを含有させることになるが、Agが4.00質量%を超えて多くなると、Alを含有していても液相温度が高くなりすぎて良好な接合を得ることが難しくなるため、Agの含有量は4.0質量%以下とする。一方、0.10質量%未満では少なすぎてAg添加の効果が期待できない。   As described above, it is better to increase the amount of Ag in terms of improving wettability, but it is preferable to reduce the amount of Ag in view of the melting point. Accordingly, Ag is contained in consideration of the balance between the melting point and the wettability, but if Ag exceeds 4.00% by mass, the liquidus temperature becomes too high even if Al is contained. Since it becomes difficult to obtain bonding, the Ag content is set to 4.0% by mass or less. On the other hand, if it is less than 0.10% by mass, the effect of adding Ag cannot be expected.

<Ni>
Niは本発明のZnを主成分とするPbフリーはんだ合金において、伸び率、応力緩和性及び加工性の向上において重要な役割を担う元素である。NiはZnやAlに比較して融点が高く(Znの融点:419℃、Alの融点:660℃、Niの融点:1455℃)、本発明のはんだ合金が溶融後、冷却過程で固化する際、この融点の高いNiがまず析出し、これが核となって結晶が形成されるため、はんだ合金が微結晶化する。これによって、柔らかいはんだとすることが可能となる。これにより、上記<Cu>で述べたように、加工性や応力緩和性において非常に優れた性質を示す。
<Ni>
Ni is an element that plays an important role in improving elongation, stress relaxation, and workability in the Pb-free solder alloy containing Zn as a main component of the present invention. Ni has a higher melting point than Zn and Al (Zn melting point: 419 ° C., Al melting point: 660 ° C., Ni melting point: 1455 ° C.), and when the solder alloy of the present invention is solidified in the cooling process after melting. First, Ni having a high melting point is precipitated first, and this serves as a nucleus to form crystals, so that the solder alloy is microcrystallized. As a result, soft solder can be obtained. As a result, as described in the above <Cu>, very excellent properties in workability and stress relaxation properties are exhibited.

Zn−Al系合金にこのような優れた特性を与えるNiの含有量は0.01質量%以上0.80質量%以下である。Niを含有させる目的は、前述したようにはんだ合金の微細化であるため、多量に含有させる必要はなく、逆に0.80質量%を超えて含有させるとNiが偏析したり液相温度が高くなったりして接合性、応力緩和性、そして信頼性などを低下させてしまう。ただし、0.01質量%未満では含有量が少なすぎて効果が現れない。   The content of Ni that gives such excellent characteristics to the Zn—Al-based alloy is 0.01% by mass or more and 0.80% by mass or less. Since the purpose of containing Ni is to refine the solder alloy as described above, it is not necessary to contain a large amount. Conversely, if Ni is contained in an amount exceeding 0.80% by mass, Ni is segregated or the liquidus temperature is low. If it becomes high, the bondability, stress relaxation property, reliability, etc. will be lowered. However, if the content is less than 0.01% by mass, the content is too small and the effect does not appear.

<P>
Pは本発明のZnを主成分とするPbフリーはんだ合金の諸特性を目的に合わせて調整する際に適宜添加される元素であり、その添加による効果は濡れ性の向上にある。即ち、Pは還元性が強く、自ら酸化されることによりはんだ合金表面の酸化を抑制する。特に本発明では酸化されやすいZnが主成分であり、更にZnより酸化されやすいAlが含有されているため、濡れ性が不足する場合においてPの含有による濡れ性向上の役割は大きい。
<P>
P is an element added as appropriate when adjusting the various characteristics of the Pb-free solder alloy containing Zn as a main component of the present invention in accordance with the purpose, and the effect of the addition is in improving wettability. That is, P is highly reducing and suppresses oxidation of the solder alloy surface by being oxidized by itself. In particular, in the present invention, Zn that is easily oxidized is a main component, and Al that is more easily oxidized than Zn is contained. Therefore, when wettability is insufficient, the role of improving wettability by containing P is significant.

また、Pの含有により接合時にボイドの発生を低減させる効果も得られる。即ち、すでに述べたようにPは自らが酸化されやすいため、接合時にはんだ合金の主成分であるZnやAlよりも優先的に酸化が進む。その結果、はんだ母相の酸化を防ぎ、半導体素子や基板の接合面を還元して濡れ性を確保することができる。そしてこの接合の際、はんだ表面や半導体素子等の接合面表面の酸化物がなくなるため、酸化膜によって形成される隙間(ボイド)が発生しにくくなり、接合性や信頼性等を向上させることができる。   Moreover, the effect of reducing the generation | occurrence | production of a void at the time of joining by containing P is also acquired. That is, as described above, P is easily oxidized by itself, and therefore, oxidation proceeds preferentially over Zn and Al, which are the main components of the solder alloy, at the time of bonding. As a result, it is possible to prevent the solder mother phase from being oxidized and reduce the bonding surface of the semiconductor element or the substrate to ensure wettability. At the time of this joining, oxides on the joining surface such as the solder surface and the semiconductor element are eliminated, so that voids formed by the oxide film are less likely to be generated, thereby improving the joining property and reliability. it can.

尚、Pは、上記のごとくはんだ合金や基板等の接合面を還元して酸化物になると、気化して雰囲気ガスに流されるため、はんだや基板表面等に残らない。このため、Pの残渣が信頼性等に悪影響を及ぼす可能性はなく、この点からも優れた添加元素と言える。   As described above, P is not left on the surface of the solder or the substrate because it vaporizes and flows into the atmospheric gas when the joint surface of the solder alloy or the substrate is reduced to an oxide as described above. For this reason, there is no possibility that the residue of P adversely affects reliability and the like, and it can be said that this is an excellent additive element.

Pを含有する場合は、その含有量が0.0005質量%以上0.5000質量%以下であることが好ましい。これは、前述したようにPは非常に還元性が強いため、微量を含有させれば濡れ性向上の効果が得られるからである。ただし、Pの含有量が0.0005重量%未満では含有量が少なすぎて効果が現われない。一方、0.500質量%を超えて含有しても、濡れ性向上の効果はあまり変わらず、過剰な含有によってPやP酸化物の気体が多量に発生してボイドの発生率を上げてしまったり、Pが脆弱な相を形成して偏析したりして、はんだ接合部を脆化して信頼性を低下させる恐れがある。特にワイヤなどの形状に加工する場合、断線の原因になりやすいことが確認されている。   When it contains P, it is preferable that the content is 0.0005 mass% or more and 0.5000 mass% or less. This is because, as described above, P has a very strong reducibility, and if a trace amount is contained, an effect of improving wettability can be obtained. However, if the content of P is less than 0.0005% by weight, the content is too small and the effect does not appear. On the other hand, even if the content exceeds 0.500% by mass, the effect of improving the wettability is not much changed, and excessive inclusion increases the generation rate of voids by generating a large amount of P and P oxide gases. There is a risk that P may form a fragile phase and segregate, embrittle the solder joint and reduce reliability. In particular, it has been confirmed that when processing into a shape such as a wire, it is likely to cause disconnection.

以上説明したように、本発明のPbフリーはんだ合金を、半導体素子と基板との接合に使用することによって、ヒートサイクルが繰り返される環境などの過酷な条件下で使用される場合であっても、耐久性のある信頼性の高い接合体を提供することができる。よって、この接合体を、例えば、サイリスタやインバータなどのパワー半導体装置、自動車などに搭載される各種制御装置、太陽電池などの過酷な条件下で使用される装置に搭載することによって、それら各種装置の信頼性をより一層高めることができる。   As described above, by using the Pb-free solder alloy of the present invention for joining a semiconductor element and a substrate, even when used under severe conditions such as an environment in which a heat cycle is repeated, A durable and highly reliable bonded body can be provided. Therefore, by mounting this joined body on, for example, power semiconductor devices such as thyristors and inverters, various control devices mounted on automobiles, devices used under harsh conditions such as solar cells, these various devices Can be further improved in reliability.

原料として、それぞれ純度99.9質量%以上のZn、Al、Ge、Cu、Ag、Ni、及びPを準備した。大きな薄片やバルク状の原料については、溶解後の合金においてサンプリング場所による組成のバラツキがなく、均一になるように留意しながら、切断及び粉砕などにより3mm以下の大きさに細かくした。次に、これら原料から所定量を秤量して、高周波溶解炉用のグラファイト製坩堝に入れた。   As raw materials, Zn, Al, Ge, Cu, Ag, Ni, and P each having a purity of 99.9% by mass or more were prepared. Large flakes and bulk-shaped raw materials were reduced to a size of 3 mm or less by cutting and crushing while paying attention to ensure that the alloy after melting did not vary in composition depending on the sampling location. Next, a predetermined amount of these raw materials was weighed and put into a graphite crucible for a high-frequency melting furnace.

上記各原料の入った坩堝を高周波溶解炉に入れ、酸化を抑制するために窒素を原料1kg当たり0.7リットル/分以上の流量で流した。この状態で溶解炉の電源を入れ、原料を加熱溶融させた。金属が溶融しはじめたら混合棒でよく撹拌し、局所的な組成のばらつきが起きないように均一に混ぜた。十分溶融したことを確認した後、高周波電源を切り、速やかに坩堝を取り出し、坩堝内の溶湯をはんだ母合金の鋳型に流し込んだ。鋳型は、はんだ母合金の製造の際に一般的に使用している形状と同様のものを使用した。   The crucible containing the raw materials was placed in a high-frequency melting furnace, and nitrogen was flowed at a flow rate of 0.7 liter / min or more per kg of the raw materials in order to suppress oxidation. In this state, the melting furnace was turned on to heat and melt the raw material. When the metal began to melt, it was stirred well with a mixing rod and mixed uniformly so as not to cause local compositional variations. After confirming sufficient melting, the high frequency power supply was turned off, the crucible was quickly taken out, and the molten metal in the crucible was poured into the mold of the solder mother alloy. A mold having the same shape as that generally used in the production of a solder mother alloy was used.

このようにして、上記各原料の混合比率を変えることにより、試料1〜24のZn−Al系はんだ母合金を作製した。得られた試料1〜24の各はんだ母合金の組成をICP発光分光分析器(SHIMAZU S−8100)を用いて分析した。得られたはんだ組成の分析結果を下記表1に示す。   Thus, the Zn-Al type solder mother alloy of samples 1-24 was produced by changing the mixing ratio of each above-mentioned raw material. The composition of each solder mother alloy of the obtained samples 1 to 24 was analyzed using an ICP emission spectroscopic analyzer (SHIMAZU S-8100). The analysis results of the obtained solder composition are shown in Table 1 below.

Figure 2013123741
Figure 2013123741

次に、上記試料1〜24の各はんだ母合金に対して、塑性変形を伴わない旋盤機か、又は塑性変形を伴う圧延機を用いて所定の厚さのシート状に加工し、下記の方法により引張試験機を用いて機械的特性(引張強度、伸び率)を測定した。更に、シート状に加工した各はんだ合金について、下記の方法により濡れ性(接合性)の評価及びヒートサイクル試験による信頼性の評価を行った。尚、はんだの濡れ性ないし接合性等の評価は、はんだ形状に依存しないためワイヤ、ボール、ペーストなどの形状で評価してもよいが、本実施例においてはシートの形状で評価した。   Next, each solder mother alloy of Samples 1 to 24 is processed into a sheet with a predetermined thickness using a lathe without plastic deformation or a rolling mill with plastic deformation, and the following method The mechanical properties (tensile strength, elongation) were measured using a tensile tester. Further, for each solder alloy processed into a sheet shape, wettability (joinability) was evaluated by the following method and reliability was evaluated by a heat cycle test. The evaluation of solder wettability or bondability does not depend on the solder shape, and may be evaluated by the shape of a wire, a ball, a paste, or the like.

<機械的特性の評価>
機械的特性を評価するため、上記の通り旋盤機又は圧延機を用いて試料1〜24のはんだ母合金(厚さ5mmの板状インゴット)を各々厚さ0.5mmまで加工し、得られたシート状の試料1〜24のZn−Al系はんだ合金を、スリッターで3mmの幅に加工し、長さを約15cmに切断した。このようにして機械的特性を測定するための試験片を作製した。得られた各試験片に対して目視にて傷やクラックの有無を確認した後、引張試験機(テンシロン万能試験機)により引張強度及び伸び率を測定した。加工方法及び機械的特性の評価結果を下記表2に示す。
<Evaluation of mechanical properties>
In order to evaluate the mechanical properties, as described above, using a lathe or a rolling mill, the solder mother alloys (plate ingots with a thickness of 5 mm) of Samples 1 to 24 were each processed to a thickness of 0.5 mm. The sheet-like samples 1 to 24 of Zn-Al solder alloys were processed into a width of 3 mm by a slitter, and the length was cut to about 15 cm. In this way, a test piece for measuring the mechanical properties was produced. After visually confirming the presence or absence of scratches and cracks on each of the obtained test pieces, the tensile strength and elongation were measured with a tensile tester (Tensilon universal tester). Table 2 below shows the processing method and the evaluation results of the mechanical properties.

<濡れ性(接合性)の評価>
上記のごとくシート状に加工した各はんだ合金を、濡れ性試験機(装置名:雰囲気制御式濡れ性試験機)を用いて評価した。即ち、濡れ性試験機のヒーター部に2重のカバーをして、ヒーター部の周囲4箇所から窒素を12リットル/分の流量で流しながら、ヒーター設定温度を各試料の融点より約10℃高い温度に設定して加熱した。設定したヒーター温度が安定した後、Cu基板(板厚:約0.70mm)をヒーター部にセッティングして25秒間加熱した。
<Evaluation of wettability (bondability)>
Each solder alloy processed into a sheet shape as described above was evaluated using a wettability tester (device name: atmosphere control type wettability tester). In other words, a double cover is applied to the heater section of the wettability tester, and the heater set temperature is about 10 ° C. higher than the melting point of each sample while flowing nitrogen from four locations around the heater section at a flow rate of 12 liters / minute. Heated to set temperature. After the set heater temperature was stabilized, a Cu substrate (plate thickness: about 0.70 mm) was set in the heater section and heated for 25 seconds.

次に、各試料のはんだ合金をCu基板の上に載せ、25秒加熱した。加熱が完了した後、Cu基板をヒーター部から取り上げ、その横の窒素雰囲気が保たれている場所に一旦設置して冷却した。十分に冷却した後、大気中に取り出して接合部分を確認した。各試料のはんだ合金とCu基板との接合部分を目視で確認し、接合できなかった場合を「×」、接合できたが濡れ広がりが悪い場合(はんだが広がらなかった場合)を「△」、接合でき且つ濡れ広がりがよい場合(はんだが薄く濡れ広がった場合)を「○」と評価した。この評価結果を下記表2に示す。   Next, the solder alloy of each sample was placed on a Cu substrate and heated for 25 seconds. After the heating was completed, the Cu substrate was taken up from the heater part, and once installed in a place where the nitrogen atmosphere next to it was kept, it was cooled. After sufficiently cooling, it was taken out into the atmosphere and a joint portion was confirmed. The joint between the solder alloy of each sample and the Cu substrate is visually checked, and “X” indicates that the bonding cannot be performed, “△” indicates that the bonding is successful but the wetting spread is poor (the solder does not spread), The case where bonding was possible and the wet spread was good (when the solder was thin and spread) was evaluated as “◯”. The evaluation results are shown in Table 2 below.

<ヒートサイクル試験>
はんだ接合の信頼性を評価するためにヒートサイクル試験を行った。尚、この試験は、上記した濡れ性の評価においてはんだ合金がCu基板に接合できた試料(濡れ性の評価が「○」又は「△」の試料)を各々2個ずつ用いて行った。即ち、各試料のはんだ合金が接合されたCu基板2個のうちの1個に対しては、−40℃の冷却と+150℃の加熱を1サイクルとするヒートサイクル試験を途中確認のため300サイクルまで繰り返し、残る1個に対しては同様のヒートサイクル試験を500サイクルまで繰り返した。
<Heat cycle test>
A heat cycle test was conducted to evaluate the reliability of solder joints. This test was performed using two samples each having a solder alloy bonded to the Cu substrate in the above-described wettability evaluation (samples having a wettability evaluation of “◯” or “Δ”). That is, for one of the two Cu substrates to which the solder alloy of each sample is bonded, 300 cycles are required for confirming the heat cycle test in which one cycle includes cooling at −40 ° C. and heating at + 150 ° C. The same heat cycle test was repeated up to 500 cycles for the remaining one.

その後、300サイクル及び500サイクルのヒートサイクル試験を実施した各試料について、はんだ合金が接合されたCu基板を樹脂に埋め込み、断面研磨を行い、SEM(装置名:HITACHI S−4800)により接合面の観察を行った。この観察の結果、接合面に剥がれが生じるか又ははんだにクラックが入っていた場合を「×」、そのような不良がなく、初期状態と同様の接合面を保っていた場合を「○」とした。これらの評価結果を下記の表2に示す。   Then, about each sample which performed the heat cycle test of 300 cycles and 500 cycles, Cu board | substrate with which the solder alloy was joined was embedded in resin, cross-sectional grinding | polishing was performed, and SEM (device name: HITACHI S-4800) performed the joining surface. Observations were made. As a result of this observation, the case where the joint surface is peeled off or the solder is cracked is indicated as “X”, and the case where there is no such defect and the same joint surface as in the initial state is maintained as “O”. did. The evaluation results are shown in Table 2 below.

Figure 2013123741
Figure 2013123741

上記の表1〜2から分かるように、本発明の要件を満たす試料1〜13の各はんだ合金は、全ての評価項目において良好な特性を示している。即ち、50%以上の伸び率と70MPa以上の引張強度とを有しており、塑性変形性に優れていることが分かった。また、シート状に加工しても傷やクラックの発生がなく、濡れ性及び信頼性も非常に良好であった。   As can be seen from Tables 1 and 2 above, the solder alloys of Samples 1 to 13 that satisfy the requirements of the present invention exhibit good characteristics in all evaluation items. That is, it has been found that it has an elongation of 50% or more and a tensile strength of 70 MPa or more and is excellent in plastic deformability. Further, even when processed into a sheet shape, no scratches or cracks were generated, and the wettability and reliability were very good.

上記のように非常に高い伸び率が得られた理由は、Zn−Al合金の特有の効果によるものと考えられ、特に試料7〜13においては、Ge、Cu、Ag、Ni、及びPのうち1種類以上を含有したことより結晶の微細化がより一層促進され、これにより良好な効果が得られたものと考えられる。   The reason why the very high elongation rate was obtained as described above is considered to be due to the unique effect of the Zn-Al alloy. Especially in the samples 7 to 13, among Ge, Cu, Ag, Ni, and P It is considered that the inclusion of one or more types further promotes the refinement of crystals, and this has resulted in good effects.

また、ヒートサイクル試験においても500回まで割れなどが発生せず、良好な接合性と信頼性を示したが、この理由も柔らかさ(伸び率)の増したはんだ合金が繰り返し加わる熱応力を吸収・緩和したことによるものと考えられる。尚、圧延加工で作製した試料4〜13のはんだ合金は、旋盤加工で作製した試料1〜3のはんだ合金に比べて伸び率が約2倍以上大きくなった。これは、圧延による塑性変形により組織が微細化したことによるものと考えられる。   Also, in the heat cycle test, cracks etc. did not occur up to 500 times and showed good bondability and reliability, but this also absorbed the thermal stress repeatedly applied by the solder alloy with increased softness (elongation rate)・ It is thought to be due to the relaxation. In addition, the elongation rate of the solder alloys of Samples 4 to 13 produced by rolling was about twice or more larger than the solder alloys of Samples 1 to 3 produced by lathe processing. This is thought to be due to the refinement of the structure due to plastic deformation by rolling.

一方、本発明の要件を満たしていない試料14〜24の各はんだ合金は、Al、Ge、Cu、Ag、Ni、及びPのうちのいずれかの含有量が適切でなかったため、好ましくない評価結果となった。具体的には、伸び率は50%未満であり、引張強度も試料21〜24を除いて70MPa未満であった。濡れ性についても11個の試料中10個の試料が好ましくない結果となり、特にヒートサイクル試験では全ての試料(接合できなかった試料14、16、21、23、及び24を除く)で300回までに不良が発生した。   On the other hand, each solder alloy of Samples 14 to 24 that does not satisfy the requirements of the present invention was not suitable for the content of any of Al, Ge, Cu, Ag, Ni, and P. It became. Specifically, the elongation was less than 50%, and the tensile strength was less than 70 MPa except for the samples 21 to 24. Regarding the wettability, 10 samples out of 11 samples were unfavorable. Especially in the heat cycle test, all samples (except samples 14, 16, 21, 23, and 24 that could not be joined) were up to 300 times. A defect occurred.

Claims (6)

伸び率が50%以上、引張強度が70MPa以上であり、Alを1.0質量%以上15.0質量%以下含有し、残部が不可避的に含まれる元素を除きZnからなる
ことを特徴とするZnを主成分とするPbフリーはんだ合金。
Elongation rate is 50% or more, tensile strength is 70 MPa or more, Al is contained by 1.0 mass% or more and 15.0 mass% or less, and the balance is made of Zn except for elements inevitably contained. A Pb-free solder alloy mainly composed of Zn.
Geが8.00質量%を超えて含まれておらず、Cuが3.00質量%を超えて含まれておらず、Agが4.00質量%を超えて含まれておらず、Niが0.80質量%を超えて含まれておらず、Pが0.5000質量%を超えて含まれていないことを特徴とする、請求項1に記載のZnを主成分とするPbフリーはんだ合金。   Ge is not included in excess of 8.00 mass%, Cu is not included in excess of 3.00 mass%, Ag is not included in excess of 4.00 mass%, Ni is not included. 2. The Pb-free solder alloy containing Zn as a main component according to claim 1, wherein the Pb-free solder alloy is not contained in an amount exceeding 0.80 mass% and P is not contained in an amount exceeding 0.50 mass%. . 塑性変形を伴う加工法で製造されることを特徴とする、請求項1又は2に記載のZnを主成分とするPbフリーはんだ合金。   3. The Pb-free solder alloy containing Zn as a main component according to claim 1, wherein the Pb-free solder alloy is manufactured by a processing method involving plastic deformation. Alを2.0質量%以上9.0質量%以下含有し、Ge、Cu、Ag、Ni、及びPの内の少なくともいずれかを、Geの場合は0.01質量%以上8.00質量%以下、Cuの場合は0.01質量%以上3.00質量%以下、Agの場合は0.10質量%以上4.00質量%以下、Niの場合は0.01質量%以上0.80質量%以下、Pの場合は0.0005質量%以上0.5000質量%以下含有していることを特徴とする、請求項1〜3のいずれかに記載のZnを主成分とするPbフリーはんだ合金。   Al is contained in an amount of 2.0 to 9.0% by mass, and at least one of Ge, Cu, Ag, Ni, and P is contained. In the case of Ge, 0.01 to 8.0% by mass Hereinafter, in the case of Cu, 0.01 mass% to 3.00 mass%, in the case of Ag, 0.10 mass% to 4.00 mass%, and in the case of Ni, 0.01 mass% to 0.80 mass%. The Pb-free solder alloy containing Zn as a main component according to any one of claims 1 to 3, wherein the Pb-free solder alloy contains 0.0005 mass% or more and 0.5000 mass% or less in the case of P. . 請求項1〜4のいずれかに記載のZnを主成分とするPbフリーはんだ合金を使って接合されていることを特徴とする接合体。   A bonded body characterized by being bonded using a Pb-free solder alloy containing Zn as a main component according to any one of claims 1 to 4. 請求項5に記載の接合体が搭載されていることを特徴とする装置。   An apparatus comprising the joined body according to claim 5.
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JP2015042409A (en) * 2013-08-26 2015-03-05 住友金属鉱山株式会社 CLAD MATERIAL OF Pb-FREE-Zn-Al ALLOY SOLDER AND METAL BASE MATERIAL, AND MANUFACTURING METHOD THEREOF
WO2017018155A1 (en) * 2015-07-27 2017-02-02 住友金属鉱山株式会社 Coated solder wire and method for manufacturing same
JP2017024074A (en) * 2015-07-27 2017-02-02 住友金属鉱山株式会社 Coated solder wire and manufacturing method thereof

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JP2015042409A (en) * 2013-08-26 2015-03-05 住友金属鉱山株式会社 CLAD MATERIAL OF Pb-FREE-Zn-Al ALLOY SOLDER AND METAL BASE MATERIAL, AND MANUFACTURING METHOD THEREOF
WO2017018155A1 (en) * 2015-07-27 2017-02-02 住友金属鉱山株式会社 Coated solder wire and method for manufacturing same
JP2017024074A (en) * 2015-07-27 2017-02-02 住友金属鉱山株式会社 Coated solder wire and manufacturing method thereof

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