JP2013115083A - Semiconductor device and method of manufacturing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a high-quality and high-performance semiconductor device in which electrical defects are reduced.SOLUTION: A semiconductor device 10A comprises: a semiconductor element 12 arranged above a substrate 11; a thermally-conductive material 16 arranged above the semiconductor element 12; and a heat radiator 17 arranged on the thermally-conductive material 16. The heat radiator 17 includes a plurality of projections 17b arranged on an outer side of an opposite region to the semiconductor element 12 and protruding toward the substrate 11 side. Even when the thermally-conductive material 16 outflows from a surface of the semiconductor element 12 at the time of manufacturing, the projections 17b contribute to wetting and spreading of the outflowing thermally-conductive material 16 to the heat dissipator 17 side, thereby preventing the outflow or dispersion of the thermal conductive material 16 to the substrate 11 side and the occurrence of electrical defects caused thereby.

Description

  The present invention relates to a semiconductor device and a method for manufacturing the semiconductor device.

  In a semiconductor device including a semiconductor element, a heat radiator such as a heat spreader or a heat sink is connected to the semiconductor element via a heat conductive material such as solder or adhesive, and the heat generated in the semiconductor element using the heat radiator. A technology for radiating heat is known.

  Such a semiconductor device is, for example, solidified after heating and melting a heat conductive material such as solder disposed between the semiconductor element and the heat radiating body, and bonding the semiconductor element and the heat radiating material with a heat conductive material such as an adhesive. Assembled by the method of

  With respect to the semiconductor device assembled in this way, for example, a technique is known in which a heat-dissipating member is provided with a frame-shaped isolation part surrounding a semiconductor element, and a heat conduction material that flows during assembly is held inside the isolation part. . In addition, a technique is known in which a recess (groove) is provided in a region facing the semiconductor element of the heat radiating body or in the outer periphery thereof, and a heat conducting material flowing therethrough is received.

JP 2007-234781 A JP 2007-258448 A JP-A-10-294403 Japanese Utility Model Laid-Open No. 5-11470

  In a semiconductor device in which a semiconductor element and a radiator are connected by a heat conductive material, the heat conductive material that flows during assembly or the like may flow out to the outside of the semiconductor element or may burst and scatter after flowing out. The thermally conductive material that has flowed out and scattered may cause electrical problems such as a short circuit in the semiconductor device. Even when the heat sink is provided with a part that holds the heat conduction material that flows and a part that receives it, the heat conduction material may flow out of the semiconductor element and scatter due to rupture. May be caused.

  According to one aspect of the present invention, a substrate, a semiconductor element disposed above the substrate, a heat conductive material disposed above the semiconductor element, and disposed above the heat conductive material. The semiconductor device includes a plurality of protrusions that are disposed outside a region facing the semiconductor element and protrude toward the substrate. Further, a method for manufacturing a semiconductor device having such a configuration is provided.

  According to another aspect of the present invention, a substrate, a semiconductor element disposed above the substrate, a heat conductive material disposed above the semiconductor element, and a heat conductive material disposed above the heat conductive material. A semiconductor device having a net-like wire rod disposed outside a region facing the semiconductor element is provided.

  According to the technology of the disclosure, the outflow and scattering of the heat conduction material are suppressed by the plurality of protrusions or the net-like wire rod of the heat radiating body, the outflow of the heat conduction material, and the occurrence of electrical problems due to scattering is suppressed, high quality, A high-performance semiconductor device can be realized.

It is a figure showing an example of a semiconductor device concerning a 1st embodiment. It is explanatory drawing of an example of the board | substrate preparation process which concerns on 1st Embodiment. It is explanatory drawing of an example of the semiconductor element and electronic component mounting process which concern on 1st Embodiment. It is explanatory drawing of an example of the underfill resin filling process which concerns on 1st Embodiment. It is explanatory drawing of an example of the sealing material position alignment process which concerns on 1st Embodiment. It is explanatory drawing of an example of the sealing process which concerns on 1st Embodiment. It is explanatory drawing of an example of the ball | bowl mounting process which concerns on 1st Embodiment. It is a figure (the 1) which shows an example of the outflow situation of the heat conductive material in a sealing process. It is a figure (the 2) which shows an example of the outflow situation of the heat conductive material in a sealing process. It is FIG. (3) which shows an example of the outflow situation of the heat conductive material in a sealing process. It is FIG. (4) which shows an example of the outflow situation of the heat conductive material in a sealing process. It is FIG. (5) which shows an example of the outflow situation of the heat conductive material in a sealing process. It is a cross-sectional schematic diagram which shows the assembly process of the semiconductor device of another form. It is a plane schematic diagram of the semiconductor device of another form. It is FIG. (1) which shows an example of the condition of the heat conductive material in the assembly process of the semiconductor device of another form. It is FIG. (2) which shows an example of the condition of the heat conductive material in the assembly process of the semiconductor device of another form. It is FIG. (3) which shows an example of the condition of the heat conductive material in the assembly process of the semiconductor device of another form. It is FIG. (4) which shows an example of the condition of the heat conductive material in the assembly process of the semiconductor device of another form. It is a cross-sectional schematic diagram which shows an example of an assembly process. It is a cross-sectional schematic diagram of another example of a semiconductor device. It is explanatory drawing (the 1) at the time of using a nonelectroconductive material for a heat conductive material. It is explanatory drawing (the 2) at the time of using a nonelectroconductive material for a heat conductive material. It is a figure (the 1) which shows an example of the form of the protrusion provided in a heat radiator. It is FIG. (2) which shows an example of the form of the protrusion provided in a heat radiator. It is a figure which shows the example of the semiconductor device from which the height of the protrusion of a heat radiator differs. It is a figure which shows an example of the semiconductor device which concerns on 2nd Embodiment. It is a cross-sectional schematic diagram which shows an example of the assembly process of the semiconductor device which concerns on 2nd Embodiment. It is a figure which shows an example of the semiconductor device which concerns on 3rd Embodiment. It is a figure which shows another example of the semiconductor device which concerns on 3rd Embodiment. It is a figure which shows an example of the semiconductor device which concerns on 4th Embodiment. It is a figure which shows an example of the semiconductor device which concerns on 5th Embodiment. It is a cross-sectional schematic diagram which shows an example of the assembly process of the semiconductor device which concerns on 5th Embodiment. It is FIG. (1) which shows another example of the semiconductor device which concerns on 5th Embodiment. It is FIG. (2) which shows another example of the semiconductor device which concerns on 5th Embodiment. It is a figure which shows an example of the semiconductor device using a plate-shaped heat radiator.

First, the first embodiment will be described.
FIG. 1 is a diagram illustrating an example of a semiconductor device according to the first embodiment. 1, (A) is a schematic cross-sectional view, (B) is a schematic plan view, and (A) is a schematic L1-L1 cross-sectional view of (B).

The semiconductor device 10 </ b> A according to the first embodiment includes a substrate (wiring substrate) 11, a semiconductor element (semiconductor chip) 12 and an electronic component 13 mounted on the substrate 11.
The substrate 11 and the semiconductor element 12 are each provided with an electrode pad (not shown in FIG. 1) on the opposing surfaces. The electrode pad of the substrate 11 is electrically connected to a conductive portion (wiring, via) (not shown) provided in the substrate 11. The electrode pad of the semiconductor element 12 is connected to the electrode pad of the substrate 11 via the bumps 14 and is flip-chip mounted on the substrate 11.

  One or more electronic components 13 are provided outside the region where the semiconductor element 12 is mounted (eight as an example here). The electronic component 13 is mounted on an electrode pad (not shown in FIG. 1) provided outside the mounting region of the semiconductor element 12 on the substrate 11 using a bonding member such as solder. As the electronic component 13, a passive component such as a chip capacitor, an LC filter, or a ferrite bead is used.

Underfill resin 15 is provided between the substrate 11 and the semiconductor element 12 and on the outer periphery of the semiconductor element 12.
A heat radiating body 17 is provided on the mounting surface side of the semiconductor element 12 of the substrate 11 via a heat conductive material 16. The semiconductor element 12 and the heat radiating body 17 are thermally connected via the heat conductive material 16.

  A material having thermal conductivity is used for the heat conductive material 16. It is preferable to use a material with good workability for the heat conductive material 16. For the heat conductive material 16, for example, a metal material such as solder is used. When solder is used for the heat conductive material 16, various materials and compositions can be used for the solder. For example, indium (In), indium-silver (In-Ag), tin-lead (Sn-Pb), tin-bismuth (Sn-Bi), tin-silver (Sn-Ag), tin- Antimony (Sn—Sb) -based solder, tin-zinc (Sn—Zn) -based solder, or the like can be used. In addition, a non-conductive material such as a resin can be used for the heat conductive material 16.

  A bonding layer 18 is provided on the upper surface of the semiconductor element 12. The heat conductive material 16 is bonded to the semiconductor element 12 via the bonding layer 18. A metallized layer can be used for the bonding layer 18. As the metallized layer, for example, a laminated structure (Ti / Au) of a titanium (Ti) layer and a gold (Au) layer can be used. In addition, as the metallized layer, a laminated structure (Ti / Ni-V / Au) of a Ti layer, a nickel-vanadium (Ni-V) layer, and an Au layer can be used. These laminated structures can be formed by a method such as sputtering. In addition, a nickel (Ni) -based plating layer can be used for the metallized layer as the bonding layer 18 as long as the bonding with the heat conductive material 16 is possible.

  By providing such a bonding layer 18 on the upper surface of the semiconductor element 12, the wettability of the heat conductive material 16 to the semiconductor element 12 (the bonding layer 18 on the upper surface) is improved. Effects such as an increase in bonding strength can be obtained.

  The heat radiating body 17 includes a concave portion 17a, and is provided on the substrate 11 so that the semiconductor element 12 and the electronic component 13 are accommodated in the concave portion 17a. The heat radiating body 17 is joined to the heat conductive material 16. As shown in FIG. 1, the radiator 17 is bonded to the heat conductive material 16 and bonded to the substrate 11 with an adhesive 19, for example.

  The heat radiator 17 includes a plurality of protrusions 17b in the recess 17a. The protrusion 17b is provided outside the region where the heat radiating body 17 is opposed to the semiconductor element 12 so as not to reach the substrate 11 so as to protrude toward the substrate 11 side. As shown in FIG. 1A, the protrusion 17 b is provided at a height that does not reach the electronic component 13 when the electronic component 13 is mounted in the protruding direction.

  A material having good thermal conductivity and heat dissipation is used for the radiator 17. For example, copper (Cu), aluminum (Al), aluminum silicon carbide (AlSiC), aluminum carbon (AlC), silicon rubber, or the like can be used for the radiator 17. The heat radiating body 17 can be formed by press working or a molding method.

  A bonding layer may be provided in a region of the radiator 17 including a region facing the semiconductor element 12 (a bonding region of the heat conducting material 16). A metallized layer can be used for this bonding layer. As the metallized layer, for example, a stacked structure of Ni layer and Au layer (Ni / Au) can be used. The Ni / Au laminated structure can be formed by a plating method or the like. In addition, if bonding to the heat conductive material 16 is possible, an Sn layer, an Ag layer, or a Ni layer formed by a plating method or the like may be used as a metallized layer as a bonding layer. Furthermore, a Cu layer, an Al layer, or the like may be used depending on the material of the radiator 17.

  In the case where such a bonding layer is provided on the heat radiating body 17, the bonding layer is provided on the surface of the protrusion 17b provided on the outer side of the facing region and on the region where the protrusion 17b is provided, in addition to the region facing the semiconductor element 12. Also good.

  By forming such a bonding layer in a predetermined region of the heat radiating body 17, the bonding strength between the heat conducting material 16 and the heat radiating body 17 increases the wettability of the heat conducting material 16 to the heat radiating body 17 (its bonding layer). It is possible to obtain an effect such as increasing

The heat radiating body 17 is joined to the semiconductor element 12 (joining layer 18) by the heat conducting material 16, whereby the heat radiating body 17 and the semiconductor element 12 are thermally connected via the heat conducting material 16.
Although not shown here, an electrode pad electrically connected to the conductive portion in the substrate 11 is provided on the surface of the substrate 11 opposite to the mounting surface of the semiconductor element 12. The semiconductor device 10A is mounted on another substrate (wiring substrate) such as a mother board or an interposer via a connection member such as a socket or a solder ball connected to the electrode pad.

A conductive material such as Cu or Al can be used for the electrode pad provided in the substrate 11 and the internal conductive portion (wiring, via).
During operation of the semiconductor device 10A having the above configuration, the semiconductor element 12 generates heat. In the semiconductor device 10 </ b> A, the semiconductor element 12 and the heat radiating body 17 are thermally connected via the heat conducting material 16 or the like, and the heat generated in the semiconductor element 12 is efficiently transmitted to the heat radiating body 17 via the heat conducting material 16. Heat is transmitted. Therefore, overheating of the semiconductor element 12 is suppressed, and malfunctions and damages of the semiconductor element 12 due to overheating are suppressed.

  Further, in the semiconductor device 10A having the above-described configuration, even if the heat conduction material 16 such as solder having fluidity flows out during the assembly or the like, the outflowing heat conduction material 16 is used as the protrusion 17b of the radiator 17. It becomes possible to spread out on the side of the arrangement surface. Therefore, a short circuit of the semiconductor device 10 </ b> A caused by the outflowing heat conduction material 16 adhering to the electronic component 13 or the substrate 11, or the heat conduction material 16 bursting and scattering adhering to the electronic component 13 or the substrate 11, etc. It is possible to effectively suppress electrical failures. Hereinafter, this point will be described in more detail together with an example of a method of forming (assembling) the semiconductor device 10A.

  FIG. 2 is an explanatory diagram of an example of a substrate preparation process according to the first embodiment. 2, (A) is a schematic cross-sectional view, (B) is a schematic plan view, and (A) is a schematic L2-L2 cross-sectional view of (B).

  In forming the semiconductor device 10A, first, a substrate 11 as shown in FIG. 2 is prepared. Inside the substrate 11, there are provided conductive portions such as wiring of a predetermined pattern (not shown) and vias for connecting the wirings. On one main surface of the substrate 11, an electrode pad 11a and an electrode pad 11b are provided as shown in FIG. The electrode pad 11a is provided in a region where the semiconductor element 12 is mounted. The electrode pad 11b is provided in a region where the electronic component 13 is mounted outside the region where the semiconductor element 12 is mounted. In addition, an electrode pad for external connection of the semiconductor device 10A is provided on the other main surface of the substrate 11 (FIG. 7). In addition, the substrate 11 may be provided with a predetermined pattern of wiring and an electrode pad such as a test pad on the surface thereof.

A semiconductor element 12 and an electronic component 13 are mounted on such a substrate 11.
FIG. 3 is an explanatory diagram of an example of the semiconductor element and electronic component mounting process according to the first embodiment. 3A is a schematic sectional view, FIG. 3B is a schematic plan view, and FIG. 3A is a schematic L3-L3 sectional view of FIG.

  As the semiconductor element 12 to be mounted, a semiconductor element 12 is prepared in which a bump 14 is mounted on an electrode pad provided there, and a bonding layer 18 is provided on the surface side opposite to the mounting surface side of the bump 14. The semiconductor element 12 is flip-chip mounted on the substrate 11 by aligning the bumps 14 with the electrode pads 11a of the substrate 11 and connecting the bumps 14 to the electrode pads 11a. For mounting the semiconductor element 12, for example, a flip chip bonder can be used.

  Although depending on the type of the semiconductor element 12, the mounting height of the semiconductor element 12 on the substrate 11 is, for example, 0.610 mm (the thickness of the semiconductor element 12 is 0.550 mm and the thickness of the bump 14 is 0.060 mm). .

  As the electronic component 13 to be mounted, a chip capacitor is used here as an example. The substrate 11 is provided with the electrode pads 11b according to the pair of electrodes 13a of the chip capacitor. The electrode 13a of the electronic component 13 is connected to the electrode pad 11b using a conductive bonding member such as solder (not shown in FIG. 5) and mounted on the substrate 11.

After the semiconductor element 12 and the electronic component 13 are mounted, the underfill resin 15 is filled.
FIG. 4 is an explanatory diagram of an example of the underfill resin filling step according to the first embodiment. 4A is a schematic sectional view, FIG. 4B is a schematic plan view, and FIG. 4A is a schematic L4-L4 sectional view of FIG.

  An underfill resin 15 is supplied, filled, and cured between the substrate 11 and the semiconductor element 12 mounted on the substrate 11. The underfill resin 15 can also be formed on the outer periphery of the semiconductor element 12. By providing the underfill resin 15, the substrate 11 and the semiconductor element 12 are firmly connected, and the connection reliability between the two is improved.

Next, the sealing material for sealing the periphery of the semiconductor element 12 and the electronic component 13 mounted on the substrate 11 in this way is aligned.
FIG. 5 is an explanatory diagram of an example of a sealing material positioning step according to the first embodiment. 5A is a schematic cross-sectional view, FIG. 5B is a schematic plan view, and FIG. 5A is a schematic L5-L5 cross-sectional view of FIG.

  In this sealing material alignment step, the substrate 11 on which the semiconductor element 12 and the electronic component 13 are mounted and the heat radiating body 17 are arranged with the heat conducting material 16 interposed therebetween. The heat conductive material 16 is disposed between the semiconductor element 12 (bonding layer 18) on the substrate 11 and the heat radiating body 17 (inside the region where the plurality of protrusions 17b are disposed). An adhesive 19 is provided between the end of the radiator 17 and the substrate 11. For the adhesive 19, for example, a thermosetting resin is used.

  Here, the case where the heat conductive material 16 made of solder is used will be described as an example. In this case, a material that has been processed in advance into a shape corresponding to the planar (outer shape) size of the semiconductor element 12 is prepared as the heat conductive material 16. As the heat dissipating body 17, a recess 17 a that can accommodate the semiconductor element 12 and the electronic component 13 is provided, and a plurality of protrusions 17 b are provided outside the region of the recess 17 a that faces the semiconductor element 12. Is prepared. Although not shown here, the region of the heat radiating body 17 facing the semiconductor element 12 and the surface of the protrusion 17b are in accordance with the heat conducting material 16, the heat radiating body 17, the material of the protrusion 17b, and the like. Alternatively, a bonding layer using a predetermined material may be provided in advance.

After arrange | positioning the heat conductive material 16, the heat radiator 17, and the adhesive agent 19 like FIG. 5, sealing by them is performed.
FIG. 6 is an explanatory diagram of an example of a sealing process according to the first embodiment. 6A is a schematic cross-sectional view, FIG. 6B is a schematic plan view, and FIG. 6A is a schematic L6-L6 cross-sectional view of FIG.

  At the time of sealing, the heat dissipating body 17 arranged by interposing the solder heat conductive material 16 between the semiconductor element 12 mounted on the substrate 11 as described above is pressed to the substrate 11 side while heating. . Moreover, the board | substrate 11 is pressed to the heat radiator 17 side. The heating temperature when pressing the radiator 17 and the substrate 11 is set to a temperature at which the heat conductive material 16 of solder is melted. By thus pressing the heat radiating body 17 and the substrate 11 while heating, the semiconductor element 12 and the heat radiating body 17 are joined by the heat conducting material 16 and the heat radiating body 17 is adhered to the substrate 11 by the adhesive 19. .

  In addition, although illustration is abbreviate | omitted here, the semiconductor element 12 may bend | curve (the curvature which becomes convex shape in the heat radiator 17 side) from the difference in the thermal expansion coefficient with the board | substrate 11. Even in such a case, in order to join the heat conducting material 16 to the entire surface of the semiconductor element 12, the semiconductor element 12 is pressed from above and below as shown in FIG. The height of the heat conductive material 16 (thickness after assembly of the semiconductor device 10A) is, for example, 0.280 mm.

  After sealing is performed as described above, the sealed assembly is cooled to, for example, room temperature, and the solder heat conductive material 16 is solidified. Thereby, one form of the semiconductor device 10A (LGA (Land Grid Array) type semiconductor device 10A) is obtained. In such a semiconductor device 10A, solder balls 20 may be further mounted as shown in FIG.

  FIG. 7 is an explanatory diagram of an example of a ball mounting process according to the first embodiment. 7A is a schematic sectional view, FIG. 7B is a schematic plan view viewed from the ball mounting surface side, and FIG. 7A is a schematic L7-L7 sectional view of FIG.

  As shown in FIG. 7, the solder balls 20 are mounted on the electrode pads 11 c provided on the surface of the substrate 11 opposite to the mounting surface of the semiconductor element 12. In this manner, the solder balls 20 may be mounted on the substrate 11 to obtain a BGA (Ball Grid Array) type semiconductor device 10A.

  The semiconductor device 10A can be assembled by the method as described above. However, in such an assembly, after the alignment as shown in FIG. 5 above, the heat conductive material 16 having fluidity on the semiconductor element 12 is sealed when heated and pressed as shown in FIG. Spills may occur.

  8-12 is a figure which shows an example of the outflow situation of the heat conductive material in a sealing process. 8A is a schematic sectional view, FIG. 8B is a schematic plan view, and FIG. 8A is a schematic L8-L8 sectional view of FIG. 9A is a schematic cross-sectional view, FIG. 9B is a schematic plan view, and FIG. 9A is a schematic cross-sectional view taken along line L9-L9 in FIG. 10A is a schematic sectional view, FIG. 10B is a schematic plan view, and FIG. 10A is a schematic L10-L10 sectional view of FIG. 11, (A) is a schematic cross-sectional view, (B) is a schematic plan view, and (A) is a schematic cross-sectional view taken along line L11-L11 in (B). 12A is a schematic cross-sectional view, FIG. 12B is a schematic plan view, and FIG. 12A is a schematic cross-sectional view taken along line L12-L12 in FIG.

  As shown in FIG. 8, a state in which a thermal conductive material 16 of solder is interposed between the semiconductor element 12 on the substrate 11 and the radiator 17, and an adhesive 19 is interposed between the end of the radiator 17 and the substrate 11. From FIG. 9 to FIG. 12, the heat radiating body 17 and the substrate 11 are pressed toward each other while heating.

  Here, it is assumed that outflow (jumping out) starts to occur from a part of the heat conductive material 16 melted by heating at a relatively early stage of pressing as shown in FIG. 9 (outflow portion 16b). For example, with heating and pressing, the oxide film formed on the surface of the thermal conductive material 16 of solder is broken, and clean solder that is inside the oxide film flows out from the oxide film. May occur.

  When the pressing is further performed while heating from the state as shown in FIG. 9, the heat conducting material 16 is pushed from both sides of the radiator 17 and the semiconductor element 12 (substrate 11) as shown in FIG. The outflow amount of the material 16 increases. At this time, the flowing out heat conduction material 16 comes into contact with the protrusions 17b provided on the heat radiating body 17, and gets wet with the protrusions 17b. As shown in FIG. 11, if the pressure further advances, the outflow amount of the heat conducting material 16 also increases. However, the outflowing heat conducting material 16 wets and spreads between the protrusions 17b of the radiator 17 due to a capillary phenomenon. . By further pressing and cooling in this state, as shown in FIG. 12, the heat conducting material 16 spreads between the protrusions 17b and is solidified.

  As described above, the protrusion 17b is provided on the heat radiating body 17, so that the heat conduction material 16 flowing out with heating and pressing is wetted and spread in the region of the protrusion 17b of the heat radiating body 17 by using a capillary phenomenon. Can be made. Therefore, in the semiconductor device 10 </ b> A, the outflow of the heat conduction material 16 that has flowed out to the electronic component 13 or the substrate 11, and the occurrence of an electrical failure due to such adhesion can be effectively suppressed.

  Further, the heat conduction material 16 comes into contact with the protrusion 17b of the heat radiating body 17 at a relatively early stage after the start of the outflow from the semiconductor element 12, and gets wet with the protrusion 17b. For this reason, in the semiconductor device 10A, the oxide film on the surface of the heat conduction material 16 does not break even after the start of the outflow of the heat conducting material 16 from the semiconductor element 12, and the oxide film is broken after a certain amount of outflow, so to speak, the flowing heat conduction. It is also possible to avoid the phenomenon that the material 16 is ruptured and scattered around. Therefore, it is possible to effectively suppress the scattered heat conduction material 16 from adhering to the electronic component 13 and the substrate 11 and the occurrence of electrical problems due to such adhesion.

  When the heat conductive material 16 flows out, the heat conductive material 16 gradually wets and spreads while entering the gaps of the protrusions 17b by capillary action. Therefore, it is difficult for air to be taken into the outflow portion of the heat conducting material 16 and voids to occur. Even if a void (a void that does not cause rupture) occurs in the portion of the heat conductive material 16 that has flowed out into the region of the protrusion 17b, the outflow portion including the void generates the semiconductor element 12 that generates heat during the operation of the semiconductor device 10A. Located outside of. Therefore, compared to the case where a void exists in the portion of the heat conducting material 16 sandwiched between the semiconductor element 12 and the heat radiating body 17, the influence on the heat transfer from the semiconductor element 12 to the heat radiating body 17, and further from the heat radiating body 17 to the outside The influence on the heat radiation to can be suppressed.

In this way, it is possible to realize a high-quality and high-performance semiconductor device 10A in which the occurrence of electrical problems due to the outflow and rupture of the heat conductive material 16 is suppressed.
In FIGS. 5 and 6 and FIGS. 8 to 12, the substrate 11 is disposed on the lower side and the heat radiating body 17 is disposed on the upper side, and the heat conducting material 16 is interposed therebetween for assembly. Was illustrated. In addition, it is also possible to perform assembly by disposing the heat radiator 17 on the lower side and the substrate 11 on the upper side and interposing the heat conductive material 16 therebetween.

  In this case, for example, first, the heat conductive material 16 is disposed on the heat dissipating body 17 in which the recesses 17a and the protrusions 17b are arranged upward, inside the region of the protrusions 17b. Thus, the board | substrate 11 which mounted the semiconductor element 12 and the electronic component 13, and arrange | positioned the adhesive agent 19 on the heat radiator 17 which has arrange | positioned the heat conductive material 16 is arrange | positioned. Then, while heating at a predetermined temperature, the substrate 11 and the radiator 17 are pressed in the directions of each other. The semiconductor device 10A can be assembled also by such a method. At that time, the protrusion 17b of the heat dissipating body 17 suppresses the flow of the heat conductive material 16 and the scattering due to the burst as in the case described above, and the heat generated by the heat conductive material 16 adhering to the electronic component 13 or the substrate 11. Can be effectively suppressed.

Here, for comparison, an example of another type of semiconductor device using a heat radiator that is not provided with a projection as described above and an assembling method thereof will be described.
FIG. 13 is a schematic cross-sectional view showing an assembling process of a semiconductor device according to another embodiment, FIG. 14 is a schematic plan view of the semiconductor device according to another embodiment, and FIGS. It is a figure which shows an example. FIG. 13D is a schematic cross-sectional view taken along line L13-L13 in FIG. 15 to 18 are schematic cross-sectional views in the vicinity of the heat conductive material outflow portion.

  First, as shown in FIG. 13A, a substrate 11 on which a semiconductor element 12 and an electronic component 13 (here, a chip capacitor as an example) are respectively mounted, and a heat dissipating body 170 having no protrusions, for example, solder. Positioning is performed with the heat conducting material 16 interposed. For example, a thermosetting adhesive 19 is provided in a region on the substrate 11 where the end of the heat radiating body 170 is bonded.

  Next, as shown in FIG. 13B, the heat conductive material 16 of solder is sandwiched between the radiator 170 and the semiconductor element 12 and fixed. An oxide film 16a is usually formed on the surface of the solder heat conductive material 16 as shown in FIG. In FIG. 15, the oxide film 16 a is illustrated only on the side surface of the heat conductive material 16, but the oxide film 16 a includes the heat conductive material 16, the bonding layer 18, and the radiator 17 (if the bonding layer is formed). It can also exist between the bonding layer).

  Next, as shown in FIG. 13C, while heating at a temperature at which the solder heat conductive material 16 melts, the radiator 170 is pressed against the substrate 11 and the substrate 11 is pressed toward the radiator 170, respectively. By performing such heating and pressing, the heat radiating body 170 and the semiconductor element 12 (bonding layer 18) are bonded together by the heat conductive material 16, and the heat radiating body 170 is bonded to the substrate 11 by the adhesive 19.

  In this heating and pressing stage, when the heat conductive material 16 of solder melts, the oxide film 16a formed on the surface is broken as shown in FIG. 16 due to the shape change and the pushing force from the inside. Then, as shown in FIG. 17, the clean solder inside flows out from the broken portion of the oxide film 16a (outflow portion 16b). The outflow of the heat conductive material 16 from the broken portion of the oxide film 16a may cause heating and pressing as shown in FIG. 18, an excessive pressing force applied, and the heat sink 170 and the substrate 11 being inclined. If this happens, it will increase. As a result of such a phenomenon, as shown in FIGS. 13D and 14, the heat conduction material 16 that has flowed out (flow portion 16 b) flows to the substrate 11 side, and the electronic component 13 provided around the semiconductor element 12. Or adheres to the substrate 11 (wirings, pads, etc. provided on the surface), causing electrical problems.

  Even when the assembly is performed with the substrate 11 on which the semiconductor element 12 and the electronic component 13 are mounted on the upper side and the radiator 170 on the lower side and the heat conducting material 16 interposed therebetween, the heating and pressing are accompanied. An electrical failure may occur due to outflow of the heat conductive material 16 and scattering due to explosion.

FIG. 19 is a schematic sectional view showing an example of the assembly process. 19A and 19B are schematic plan views of the assembly process.
As shown in FIG. 19, when heating and pressing are performed with the substrate 11 on the upper side and the radiator 170 on the lower side, the oxide film on the surface of the heat conducting material 16 is broken as described above, and the internal heat conduction from there. The material 16 flows out. For example, as shown in FIG. 19A, the air 100 may be contained in the outflow part 16b of the heat conducting material 16, or the air 100 may be taken in during the outflow process. In that case, due to the expansion of the air 100 due to the heating and the compression due to the pressing, the outflow portion 16b may burst as shown in FIG. 19B, and the heat conducting material 16 may be scattered around. The scattered heat conducting material 16 can adhere to the side surface of the semiconductor element 12 near the outflow portion 16 b and the surface (fillet portion) of the underfill resin 15 as well as the electronic component 13 and the substrate 11. Depending on the location and amount of the heat conductive material 16 scattered and adhered, an electrical failure such as a short circuit may occur.

  Electronic components 13 such as chip capacitors provided around the semiconductor element 12 are electrically connected to the semiconductor element 12 through wiring (not shown) in the substrate 11. The electronic component 13 is preferably arranged in the vicinity of the semiconductor element 12 in order to suppress the inductance of the wiring that causes switching noise.

  However, when the electronic component 13 is arranged in the vicinity of the semiconductor element 12 using the heat dissipating body 170 having no projection as described above, the heat conductive material 16 that flows out during heating and pressing during assembly adheres to the electronic component 13. It is easy to cause an electrical failure such as a short circuit. Adopting a design and structure in which the electronic component 13 is arranged further away from the semiconductor element 12 so that the flowing out heat conduction material 16 does not adhere increases the inductance between the semiconductor element 12 and the electronic component 13 and causes switching noise. The influence of will become large. Further, when such a design and structure are adopted, the arrangement space of the electronic component 13 may be limited, or the size of the semiconductor device may be increased.

In addition, there is a semiconductor device that does not use the underfill resin 15 as described above.
FIG. 20 is a schematic cross-sectional view of another example of a semiconductor device.

  A semiconductor device in which the semiconductor element 12 and the substrate 11 are simply connected by the bumps 14 can be assembled without using the underfill resin 15 as shown in FIG. However, in such a semiconductor device, when the heat dissipating body 170 having no protrusion is used, when the heat conducting material 16 flows out during assembly or the like, the flowing out heat conducting material 16 (outflow portion 16 b) There is a case where a short circuit occurs due to a downward contact with the bump 14.

  Note that the outflow of the heat conductive material 16 and the occurrence of a short circuit due to the outflow of the heat conducting material 16 as shown in FIGS. 13D, 14, 19, and 20 are not limited to the time of assembling the semiconductor device. The same may occur when mounting on other boards such as a mother board. For example, a solder ball is attached to the substrate 11 of the semiconductor device, the solder ball is heated and melted (reflowed), and the semiconductor device is mounted on the mother board. During the reflow, if the heat conduction material 16 melts in addition to the solder balls, the above-described outflow may occur. If the semiconductor device is tilted or shaken when mounted on the mother board, the heat conduction material 16 is more likely to flow out.

  In the above description, a conductive material such as solder is used for the heat conductive material 16, and an electrical problem that may occur when such a conductive heat conductive material 16 melts and flows out has been described. In addition, a non-conductive material such as a resin can be used for the heat conductive material 16, and even when such a material is used, an electrical failure may occur due to the outflow.

21 and 22 are explanatory diagrams when a non-conductive material is used as the heat conductive material. 21 and 22, (A) is a schematic cross-sectional view, and (B) is a schematic plan view.
A resin material such as underfill resin can be used for the heat conductive material 16. Also in this case, for example, the semiconductor device can be assembled according to the flow shown in FIGS. 13A to 13C, and the heat conductive material 16 made of resin is heated and pressed. At the time of this heating and pressing, as shown in FIG. 13D and the like, the uncured resin thermal conductive material 16 may be pushed out and flow out of the semiconductor element 12. .

  For example, as shown in FIGS. 21A and 21B, the resin thermal conductive material 16 that has flowed out of the semiconductor element 12 is bonded (mounted) to the electrode pad 11b of the substrate 11 using a bonding member 30 such as solder. The entire electronic component 13 covered may be covered and cured in that state. As described above, the electronic component 13 is covered with the heat conductive material 16 made of resin, so that a sealed void 31 is formed between the electronic component 13 and the substrate 11. In such a case, when a heating process (such as a mounting process of a semiconductor device on a mother board) is performed thereafter, the solder joining member 30 may be melted by heating and flow out into the void 31. Then, the bonding member 30 (outflow portion 30a) flowing out from the one electrode pad 11b side contacts the bonding member 30 (outflow portion 30a) flowing out from the other electrode pad 11b side, or the other electrode pad 11b, A short circuit occurs when the bonding member 30 or the electrode 13a of the electronic component 13 connected to the electrode 13a is contacted.

  Further, as shown in FIG. 22, the resin thermal conductive material 16 that has flowed out of the semiconductor element 12 may cover the bonding member 30 with a part thereof exposed, and may be cured in that state. In such a case, when a heating step is performed thereafter, the solder joining member 30 may be melted by heating and may flow out from a portion not covered with the heat conductive material 16. When the outflow (outflow portion 30b) of the joining member 30 occurs, the joining member 30 that connects the electrode pad 11b of the substrate 11 and the electrode 13a of the electronic component 13 is reduced, and the connection reliability may be reduced. . Moreover, the joining member 30 (outflow part 30b) that has flowed out may drop or scatter and come into contact with other electronic components 13 or the substrate 11 to cause an electrical failure.

  As described above, in the semiconductor device using the heat dissipating body 170 having no protrusion, the heat conduction material 16 flows out from the semiconductor element 12 during or after assembly, and the outflow heat conduction material 16 causes a short circuit or the like. May cause electrical failures.

  On the other hand, in the semiconductor device 10A according to the first embodiment, by using the radiator 17 provided with the protrusions 17b, the heat conductive material 16 flowing out during or after assembly is brought into contact with the protrusions 17b. The heat spreader 17 side can be wet and spread. As a result, electrical troubles such as adhesion of the flowing out heat conducting material 16 to the electronic component 13 and the substrate 11 and short circuit due to such adhesion are effectively suppressed. Furthermore, since the heat conducting material 16 comes into contact with the protrusions 17b and spreads out at a relatively early stage after the start of outflow, air is not easily taken into the outflow portion, and scattering to the surroundings due to the rupture of the outflow portion is also effective. Is suppressed.

  As described above, in the semiconductor device 10 </ b> A, the outflow of the heat conduction material 16 to the electronic component 13 and the substrate 11 can be suppressed, so that the electronic component 13 can be disposed in the vicinity of the semiconductor element 12. Therefore, inductance reduction and switching noise reduction between the semiconductor element 12 and the electronic component 13 can be achieved.

Various protrusions 17b can be used as the protrusions 17b provided on the heat radiating body 17 of the semiconductor device 10A.
23 and 24 are views showing an example of the form of protrusions provided on the heat radiating body.

  The protrusion 17b of the heat radiating body 17 can have a cylindrical shape as shown in FIG. Furthermore, the root portion 17c of the cylindrical protrusion 17b can be tapered as shown in FIG. 23B, or the protrusion 17b can be truncated cone-shaped as shown in FIG. In this way, by making the root portion 17c of the cylindrical protrusion 17b into a tapered shape or the protrusion 17b into a truncated cone shape, air is more effectively taken in between the flowing heat conductive material 16 and the protrusion 17b. Can be suppressed.

  In addition, the protrusion 17b can have a quadrangular prism shape as shown in FIG. 24A, and the root portion thereof as shown in FIG. 23B from the viewpoint of more effectively suppressing the intake of air. 17c can be tapered or a truncated pyramid shape as shown in FIG.

  The heat radiating body 17 can be formed by press working or a molding method depending on the material, and the protrusion 17b can be formed together with the recess 17a at the time of the press working or molding. Further, of the recesses 17a and the projections 17b, the radiator 17 having only the recesses 17a is formed by press working or molding method or the like, and the projections 17b separately formed by press working or molding method or the like are formed on the formed recesses 17a. It is also possible to connect by an appropriate method such as adhesion, joining, or welding.

  When the semiconductor device 10A is assembled (and after assembly), the height of the protrusion 17b is such that the protrusion 17b does not interfere with the electronic component 13 and the substrate 11 arranged in the protrusion direction, and the flowing out heat conduction material 16 protrudes from the protrusion 17b. There is no particular limitation as long as it can be wet and spread. For the semiconductor device 10A to be formed, the height of the protrusion 17b can be set by obtaining an appropriate value in advance through experiments or the like. For example, the height can be set based on the mounting height of the electronic component 13 arranged in the protruding direction of the protrusion 17b, the distance to the substrate 11, and the like.

FIG. 25 is a diagram illustrating an example of a semiconductor device in which the height of the protrusion of the heat radiating body is different.
As shown in FIG. 25A, when the mounting height of the electronic component 13 arranged in the protruding direction of the protrusion 17b in the vicinity of the semiconductor element 12 is relatively high, the height of the protrusion 17b is set to be equal to that of the electronic component 13. The heat conduction material 16 that flows out without interfering is set relatively low as long as the heat conduction material 16 can be spread. As shown in FIG. 25B, when the mounting height of the electronic component 13 arranged in the protruding direction of the protrusion 17b in the vicinity of the semiconductor element 12 is relatively low, the height of the protrusion 17b is set to be equal to that of the electronic component 13. The heat conduction material 16 that flows out without interfering is set relatively high as long as the heat conduction material 16 can be spread. Further, as shown in FIG. 25C, when the electronic component 13 is not arranged in the projecting direction of the protrusion 17b, the height of the protrusion 17b interferes with the substrate 11 (the conductive portion 11d such as the surface wiring or pad). Without setting, the heat conduction material 16 that flows out is set relatively high as long as the heat conduction material 16 can be spread.

  In the semiconductor device 10A according to the first embodiment described above, the number and arrangement of the protrusions 17b of the heat radiating body 17 are merely examples, and if the flowing out heat conducting material 16 can be wetted and spread, The number and arrangement are not limited to the above examples.

Next, a second embodiment will be described.
FIG. 26 is a diagram illustrating an example of a semiconductor device according to the second embodiment. 26A is a schematic cross-sectional view, FIG. 26B is a schematic plan view, and FIG. 26A is a schematic cross-sectional view taken along line L14-L14 in FIG.

  In the semiconductor device 10B according to the second embodiment, the protrusion 17b of the heat radiating body 17 is provided closer to the semiconductor element 12 (here, in contact with the side surface of the semiconductor element 12). This is different from the semiconductor device 10A according to the first embodiment.

  By providing the protrusion 17b close to the semiconductor element 12, the flowing out heat conducting material 16 can easily come into contact with the protrusion 17b at an earlier stage. For example, the heat conducting material 16 can be brought into contact with the protrusion 17b when it starts to flow out. By making the heat conductive material 16 easily contact with the projections 17b in this way, the outflow of the heat conductive material 16 to the electronic component 13 and the substrate 11 and the occurrence of electrical problems due to such adhesion are effectively prevented. It becomes possible to suppress.

In the case of the arrangement of the protrusions 17b as in the semiconductor device 10B, there are the following advantages in the assembly.
FIG. 27 is a schematic cross-sectional view showing an example of the assembly process of the semiconductor device according to the second embodiment.

  When assembling the semiconductor device 10B, for example, as shown in FIG. 27, the heat conductive material 16 is disposed on the heat dissipating body 17 with the recesses 17a and the protrusions 17b facing upward, inside the region of the protrusions 17b. To do. Thus, the board | substrate 11 which mounted the semiconductor element 12 and the electronic component 13, and arrange | positioned the adhesive agent 19 on the heat radiator 17 which has arrange | positioned the heat conductive material 16 is arrange | positioned. Then, while heating at a predetermined temperature, the substrate 11 and the radiator 17 are pressed in the directions of each other.

  In such an assembly, since the protrusion 17b is disposed at a position close to the assembled semiconductor element 12, the heat conductive material 16 disposed on the inner side of the region of the protrusion 17b is provided in the semiconductor element 12. Will be aligned with high accuracy. Therefore, it is possible to bond the heat conducting material 16 and the semiconductor element 12 while suppressing the positional deviation between them.

  In the assembly of the semiconductor device using the heat dissipating body 170 not provided with the protrusions 17b, the thermal conductive material 16 and the semiconductor element 12 are relatively easily displaced. When the heat conductive material 16 and the semiconductor element 12 are joined in a misaligned state, a region that is not covered with the heat conductive material 16 is formed on the upper surface side of the semiconductor element 12, and transmission from the semiconductor element 12 to the radiator 17 during operation is performed. There is a possibility that the thermal properties are lowered (heat resistance is increased). As a result, the semiconductor element 12 may be overheated and the semiconductor element 12 may malfunction, and the assembly yield of the semiconductor device is also reduced.

  On the other hand, when the radiator 17 having the protrusion 17b disposed at a position close to the assembled semiconductor element 12 as described above, the protrusion 17b serves as a guide for the heat conducting material 16, and heat conduction during assembly. The positional deviation of the material 16 can be suppressed. Therefore, the heat conducting material 16 can be bonded to the upper surface of the semiconductor element 12 with high accuracy as a whole, and the decrease in heat transfer from the semiconductor element 12 to the radiator 17 can be effectively suppressed.

Next, a third embodiment will be described.
FIG. 28 is a diagram illustrating an example of a semiconductor device according to the third embodiment. 28A is a schematic sectional view, FIG. 28B is a schematic plan view, and FIG. 28A is a schematic L15-L15 sectional view of FIG.

  The semiconductor device 10C according to the third embodiment is different from the semiconductor device according to the first embodiment in that the protrusion 17b of the heat dissipator 17 is selectively provided in a region facing the electronic component 13. Different from 10A. The semiconductor device 10C according to the third embodiment can be said to have a configuration in which a part of the protrusion 17b of the semiconductor device 10A according to the first embodiment is thinned out.

  In the semiconductor device 10 </ b> C, even if the heat conductive material 16 flows out, it can be spread and spread on the protrusions 17 b selectively provided in the region facing the electronic component 13. As a result, it is possible to effectively suppress adhesion of the flowing out heat conducting material 16 to the electronic component 13 and the like, and occurrence of electrical problems due to such adhesion.

  Further, in the semiconductor device 10C, since the protrusions 17b are selectively provided (thinned out) according to the arrangement of the electronic components 13, the excessive outflow of the heat conduction material 16 to the region where the protrusions 17b are provided is suppressed. be able to.

  That is, the heat conductive material 16 flowing out from the semiconductor element 12 wets and spreads in the region where the protrusions 17b are provided due to capillary action, but if this causes excessive outflow, the heat conductive material remaining on the semiconductor element 12 remains. 16 may be reduced. When the heat conductive material 16 on the semiconductor element 12 is reduced, the heat transfer between the semiconductor element 12 and the heat radiating body 17 is lowered (heat resistance is increased), and the semiconductor element 12 may be overheated. . In the semiconductor device 10 </ b> C, the protrusion 17 b is selectively provided according to the arrangement of the electronic components 13 as described above, thereby suppressing such excessive outflow of the heat conductive material 16.

  In addition, by selectively providing the projections 17b according to the arrangement of the electronic components 13 in this way, the number of projections 17b is reduced, the material cost and manufacturing cost of the radiator 17 are reduced, and further, the radiator 17 and the It is possible to reduce the weight of the used semiconductor device 10C.

  FIG. 29 is a diagram illustrating another example of the semiconductor device according to the third embodiment. 29A is a schematic sectional view, FIG. 29B is a schematic plan view, and FIG. 29A is a schematic L16-L16 sectional view of FIG.

  As shown in FIG. 29, when the number of electronic components 13 is small (here, one electronic component 13 is used as an example), a protrusion 17b may be selectively provided in a region corresponding to the electronic component 13. Good. Even when the protrusions 17b are provided in this manner, it is possible to suppress the outflow of the heat conducting material 16 to the electronic component 13 or the like. Further, when the protrusions 17b are provided in this way, it is possible to reduce the material cost and manufacturing cost of the heat radiating body 17, and it is possible to reduce the weight of the heat radiating body 17 and the semiconductor device 10C using the heat radiating body 17. .

  In the semiconductor device 10C, the protrusions 17b that are selectively provided according to the arrangement of the electronic components 13 may be provided close to the semiconductor element 12 as in the second embodiment. As a result, the same effect as described in the second embodiment can be obtained.

Next, a fourth embodiment will be described.
FIG. 30 is a diagram illustrating an example of a semiconductor device according to the fourth embodiment. In FIG. 30, (A) is a schematic cross-sectional view, (B) is a schematic plan view, and (A) is a schematic cross-sectional view taken along line L17-L17 of (B).

  The semiconductor device 10D according to the fourth embodiment is the same as the first embodiment in that the protrusion 17b of the heat radiating body 17 is provided so as to extend from the semiconductor element 12 side toward the outside thereof. This is different from the semiconductor device 10A according to FIG.

  FIG. 30 illustrates a semiconductor device 10D in which a plate-like protrusion 17b is provided so as to extend from the semiconductor element 12 side toward the outside thereof. In the semiconductor device 10D, the heat conductive material 16 flowing out from the semiconductor element 12 comes into contact with such a plate-like protrusion 17b and spreads by wetting due to a capillary phenomenon.

  In the semiconductor device 10D, the surface area of the protrusion 17b is smaller than that in the case where a plurality of pin-shaped members are provided as described above. Therefore, it is possible to suppress the excessive outflow of the heat conductive material 16 from the semiconductor element 12, and a decrease in heat conductivity (increase in thermal resistance) between the semiconductor element 12 and the heat radiating body 17, thereby resulting in the semiconductor element 12. It becomes possible to suppress overheating.

  In the semiconductor device 10D, the protrusion 17b provided so as to extend toward the outside of the semiconductor element 12 may be provided close to the semiconductor element 12 as in the second embodiment. As a result, the same effect as described in the second embodiment can be obtained.

  Similarly to FIG. 29 described above, when the number of the electronic components 13 is small, the projections 17b are selectively formed in the regions corresponding to the electronic components 13 so as to extend toward the outside of the semiconductor element 12. You may make it provide.

Although the first to fourth embodiments have been described above, the arrangement and configuration of the protrusions 17b described in each embodiment can be combined.
Next, a fifth embodiment will be described.

  FIG. 31 is a diagram illustrating an example of a semiconductor device according to the fifth embodiment. In FIG. 31, (A) is a schematic sectional view, (B) is a schematic plan view, and (A) is a schematic L18-L18 sectional view of (B).

  The semiconductor device 10E according to the fifth embodiment is different from the first embodiment in that a net-like wire 40 is provided outside the region of the heat radiating member 17 facing the semiconductor element 12 in place of the protrusion 17b. This is different from the semiconductor device 10A according to the embodiment.

  As the mesh-like wire rod 40, a braided metal wire such as Cu can be used. For example, a solder sucking wire can be used for the wire 40. By providing such a wire 40 on the heat radiating body 17 having the recess 17a, the heat conductive material 16 flowing out from the semiconductor element 12 is spread and wetted on the wire 40, as in the case where the protrusion 17b is provided. be able to. As a result, it is possible to effectively suppress adhesion of the flowing out heat conducting material 16 to the electronic component 13 and the like, and occurrence of electrical problems due to such adhesion.

Next, a method for assembling the semiconductor device 10E using such a wire 40 will be described.
FIG. 32 is a schematic cross-sectional view showing an example of the assembly process of the semiconductor device according to the fifth embodiment. 32A and 32B are schematic cross-sectional views of the assembly process.

  When assembling the semiconductor device 10E, for example, as shown in FIG. 32A, the wire 40 is disposed on the heat dissipating body 17 with the concave portion 17a facing upward. At this time, the wire 40 is not necessarily fixed to the heat radiating body 17. For example, the wire 40 may be placed on the heat radiating body 17 or temporarily connected.

  While arrange | positioning the wire 40, the heat conductive material 16 is arrange | positioned on the heat radiator 17 so that it may be arrange | positioned inside the wire 40. FIG. Thus, the board | substrate 11 which mounted the semiconductor element 12 and the electronic component 13, and arrange | positioned the adhesive agent 19 is arrange | positioned on the heat radiator 17 which has arrange | positioned the wire 40 and the heat conductive material 16. FIG. Then, while heating at a predetermined temperature, the substrate 11 and the radiator 17 are pressed in the directions of each other.

  As shown in FIG. 32B, the heat conduction material 16 flowing out during heating and pressing wets and spreads on the wire 40, thereby suppressing adhesion of the heat conduction material 16 flowing out to the electronic component 13 or the like. Can do. Furthermore, when the heat conductive material 16 wet and spread on the wire 40 is solidified, the wire 40 is joined to the radiator 17 by the solidified heat conductive material 16. Therefore, it is not necessary to fix the wire 40 to the heat radiating body 17 in advance, and therefore the cost and man-hour required for manufacturing the heat radiating body 17 can be reduced.

  FIG. 33 shows another example of the semiconductor device according to the fifth embodiment. 33, (A) is a schematic cross-sectional view, (B) is a schematic plan view, and (A) is a schematic cross-sectional view taken along line L19-L19 in (B).

  In the semiconductor device 10E using the net-like wire rod 40 as described above, the wire rod 40 can be provided close to the semiconductor element 12 as in the second embodiment. As a result, in the same manner as described in the second embodiment, the flowing out heat conducting material 16 is brought into contact with the wire 40 at an early stage, and the occurrence of electrical problems due to the flowing out heat conducting material 16 is effectively prevented. It becomes possible to suppress.

  FIG. 34 is a diagram showing another example of the semiconductor device according to the fifth embodiment. 34A is a schematic cross-sectional view, FIG. 34B is a schematic plan view, and FIG. 34A is a schematic L20-L20 cross-sectional view of FIG.

  In the semiconductor device 10E using the net-like wire rod 40 as described above, the wire rod 40 can be selectively provided in a region facing the electronic component 13 as in the third embodiment. Accordingly, as described in the third embodiment, excessive outflow of the heat conductive material 16 (too much absorption of the heat conductive material 16 by the wire 40) can be suppressed. As a result, it is possible to suppress a decrease in heat conductivity (increase in thermal resistance) between the semiconductor element 12 and the heat radiating body 17 and thereby overheating of the semiconductor element 12.

The net-like wire 40 described in the fifth embodiment can be used in place of a part of the protrusion 17b described in the first to fourth embodiments.
Next, a sixth embodiment will be described.

  In the above description, the semiconductor devices 10A to 10E using the heat radiating body 17 having the concave portion 17a have been illustrated. It is also possible to form a semiconductor device by providing the wire rods 17b or nets.

FIG. 35 is a diagram illustrating an example of a semiconductor device using a plate-like heat radiator. Note that FIG. 35 schematically illustrates a cross section of a semiconductor device using a plate-like heat radiator.
A semiconductor device 10F shown in FIG. 35 has a configuration in which the heat dissipating body 17 having the recess 17a of the semiconductor device 10A according to the first embodiment is replaced with a plate-like heat dissipating body 17F. The plate-like heat radiating body 17F has a plurality of protrusions 17b outside the region facing the semiconductor element 12 in the same manner as the heat radiating body 17 described above. The plate-like radiator 17F is bonded to the semiconductor element 12 (bonding layer 18) on the substrate 11 by the heat conductive material 16. The semiconductor device 10F has a structure that eliminates the need for the adhesive 19 and can reduce the cost required for forming the heat radiator as compared with the heat radiator 17 having the concave portion 17a as described above. Even when the plate-like radiator 17F is used, the heat conduction material 16 flowing out from the semiconductor element 12 during or after assembly spreads between the protrusions 17b and flows out to the substrate 11 side. 11 and the electronic component 13 are suppressed. Accordingly, it is possible to obtain the semiconductor device 10F in which the occurrence of an electrical failure due to the adhesion of the flowing out heat conducting material 16 is suppressed.

  Here, the case where the radiator 17 of the semiconductor device 10A according to the first embodiment is replaced with the plate-like radiator 17F is exemplified, but the semiconductor device 10B according to the second to fifth embodiments is illustrated. It is also possible to replace each of the radiators 17 to 10E with such a plate-like radiator 17F. Even in that case, the same effect as described above can be obtained.

  As described above, in the semiconductor device having a configuration in which the semiconductor element and the heat radiating member are thermally connected by interposing a heat conducting material therebetween, a plurality of protrusions are formed outside the region facing the semiconductor element of the heat radiating member. Alternatively, a net-like wire is provided. Thereby, the heat conductive material flowing out from the semiconductor element at the time of assembling or after assembling the semiconductor device can be brought into contact with the protrusions or the net-like wire, and can be spread and spread in the region where the protrusions or the wires are arranged. As a result, heat conduction material flowing out from the semiconductor element is prevented from adhering to the substrate on which the semiconductor element is mounted and the electronic component mounted on the substrate together with the semiconductor element, and is caused by such adhesion. It is possible to effectively suppress the occurrence of electrical problems. Therefore, a high-quality and high-performance semiconductor device in which the occurrence of electrical defects due to the outflow and scattering of the heat conducting material is suppressed can be realized.

Regarding the embodiment described above, the following additional notes are further disclosed.
(Appendix 1) a substrate,
A semiconductor element disposed above the substrate;
A heat conducting material disposed above the semiconductor element;
A heat dissipator disposed above the heat conducting material,
The heat radiator has a plurality of protrusions that are disposed outside a region facing the semiconductor element and protrude toward the substrate.

(Supplementary note 2) The semiconductor device according to supplementary note 1, wherein the plurality of protrusions are disposed along an outer periphery of the facing region.
(Additional remark 3) It further includes the electronic component arrange | positioned above the said board | substrate above the said semiconductor element,
The semiconductor device according to appendix 1, wherein the plurality of protrusions are selectively disposed above the electronic component so as not to contact the electronic component.

(Additional remark 4) The electronic component further arrange | positioned above the said board | substrate above the said semiconductor element,
The semiconductor device according to appendix 1, wherein the plurality of protrusions are disposed in a position between the semiconductor element and the electronic component in a non-contact manner with the substrate.

  (Supplementary Note 5) The semiconductor device according to any one of Supplementary Notes 1 to 4, wherein the plurality of protrusions include a protrusion having a side end on the semiconductor element side corresponding to a side end of the semiconductor element. .

(Supplementary note 6) The semiconductor device according to any one of supplementary notes 1 to 5, wherein the plurality of protrusions include protrusions extending from the semiconductor element toward an outside of the semiconductor element.
(Additional remark 7) The said heat conductive material is arrange | positioned between the said semiconductor element and the said opposing area | region, and between the said some protrusion, The semiconductor device in any one of Additional remark 1 thru | or 6 characterized by the above-mentioned. .

(Appendix 8) A step of disposing a semiconductor element on a substrate;
A step of disposing a radiator on the surface of the substrate on which the semiconductor element is disposed via a heat conductive material between the semiconductor element;
And pressing the heat radiator to the substrate side and heating the heat conducting material,
The method of manufacturing a semiconductor device, wherein the heat dissipating member has a plurality of protrusions that are disposed outside a region facing the semiconductor element and protrude toward the substrate.

  (Supplementary note 9) The semiconductor device according to supplementary note 8, wherein in the step of heating the thermal conductive material, the thermal conductive material flows out from the facing region and is received between the plurality of protrusions. Manufacturing method.

(Supplementary Note 10) a substrate;
A semiconductor element disposed above the substrate;
A heat conducting material disposed above the semiconductor element;
A heat dissipator disposed above the heat conducting material,
The heat radiator includes a net-like wire disposed outside a region facing the semiconductor element. The semiconductor device.

(Supplementary note 11) The semiconductor device according to supplementary note 10, wherein the mesh wire is disposed along an outer periphery of the facing region.
(Additional remark 12) The electronic component arrange | positioned on the outer side of the said semiconductor element above the said board | substrate is further included,
11. The semiconductor device according to appendix 10, wherein the mesh wire is selectively disposed above the electronic component so as not to contact the electronic component.

(Supplementary note 13) The semiconductor device according to supplementary note 10, wherein the net-like wire has a side end on the semiconductor element side corresponding to a side end of the semiconductor element.
(Additional remark 14) The said heat conductive material is arrange | positioned between the said semiconductor element and the said opposing area | region, and in the said net-like wire rod, The semiconductor device in any one of Additional remark 10 thru | or 13 characterized by the above-mentioned. .

10A, 10B, 10C, 10D, 10E, 10F Semiconductor device 11 Substrate 11a, 11b, 11c Electrode pad 11d Conductive part 12 Semiconductor element 13 Electronic component 13a Electrode 14 Bump 15 Underfill resin 16 Thermal conductive material 16a Oxide film 16b Outflow part 17 , 17F, 170 Radiator 17a Recess 17b Protrusion 17c Root part 18 Joining layer 19 Adhesive 20 Solder ball 30 Joining member 30a, 30b Outflow part 31 Void 40 Wire material 100 Air

Claims (10)

A substrate,
A semiconductor element disposed above the substrate;
A heat conducting material disposed above the semiconductor element;
A heat dissipator disposed above the heat conducting material,
The heat radiator has a plurality of protrusions that are disposed outside a region facing the semiconductor element and protrude toward the substrate.   The semiconductor device according to claim 1, wherein the plurality of protrusions are disposed along an outer periphery of the facing region. Further comprising an electronic component disposed outside the semiconductor element above the substrate;
The semiconductor device according to claim 1, wherein the plurality of protrusions are selectively disposed above the electronic component so as not to contact the electronic component.   4. The semiconductor device according to claim 1, wherein the plurality of protrusions include a protrusion whose side end on the semiconductor element side is located at a position corresponding to the side end of the semiconductor element. 5.   5. The semiconductor device according to claim 1, wherein the plurality of protrusions include protrusions extending from the semiconductor element toward an outside of the semiconductor element.   6. The semiconductor device according to claim 1, wherein the heat conductive material is disposed between the semiconductor element and the facing region and between the plurality of protrusions. Arranging a semiconductor element on a substrate;
A step of disposing a radiator on the surface of the substrate on which the semiconductor element is disposed via a heat conductive material between the semiconductor element;
And pressing the heat radiator to the substrate side and heating the heat conducting material,
The method of manufacturing a semiconductor device, wherein the heat dissipating member has a plurality of protrusions that are disposed outside a region facing the semiconductor element and protrude toward the substrate.   8. The method of manufacturing a semiconductor device according to claim 7, wherein, in the step of heating the heat conductive material, the heat conductive material flows out from the facing region and is received between the plurality of protrusions. . A substrate,
A semiconductor element disposed above the substrate;
A heat conducting material disposed above the semiconductor element;
A heat dissipator disposed above the heat conducting material,
The heat radiator includes a net-like wire disposed outside a region facing the semiconductor element. The semiconductor device.   The semiconductor device according to claim 9, wherein the heat conductive material is disposed between the semiconductor element and the facing region and in the mesh wire.

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