JP2013101840A - Charged particle beam device and article manufacturing method using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a charged particle beam device that is advantageous for stabilization of a trajectory of a charged particle beam.SOLUTION: A charged particle beam device includes: a first enclosure 10 in which at least a part of an electronic optical system that leads a charged particle beam to a workpiece is accommodated; a second enclosure 11 in which a substrate holding part that holds the workpiece and is movable is accommodated; an insulator 31 that is provided at a connection part between the first enclosure 10 and the second enclosure 11 and reduces a current flowing from the second enclosure 11 to the first enclosure 10; and mechanisms 20 and 30 that form a closed magnetic circuit passing through the first and second enclosures 10 and 11 and reduce an electromagnetic wave directed from the outside to the inside of the first and second enclosures 10 and 11 through the connection part.

Description

  The present invention relates to a charged particle beam apparatus and an article manufacturing method using the same.

  2. Description of the Related Art In recent years, drawing apparatuses used for manufacturing devices such as semiconductor integrated circuits have been required to be improved in drawing accuracy due to miniaturization of elements, complicated circuit patterns, or increased pattern data capacity. As a method for realizing this, there is known a drawing apparatus as a charged particle beam apparatus that performs drawing on a substrate by controlling deflection scanning and blanking of a charged particle beam such as an electron beam. Since this drawing apparatus has high resolution and excellent productivity, it has been adopted as one of the pattern forming techniques that replaces the light exposure method in the production of memory devices after 4GDRAM whose line width is 0.1 μm or less. obtain.

For example, in a drawing apparatus using an electron beam, an electron beam emitted from an electron source is irradiated onto a substrate while its trajectory is appropriately controlled. Specifically, the controller of the drawing apparatus adjusts the trajectory, beam diameter, irradiation position, or irradiation time of the electron beam by controlling the electric field and magnetic field of the electron optical system as the trajectory control. Here, when a disturbance electromagnetic field from inside and outside the drawing apparatus is applied to the electron optical system, the electron beam may be bent and deviate from a desired trajectory. The electromagnetic field generated from the ground current flowing in the casing of the vacuum vessel that houses the electron optical system is particularly significant as the disturbance electromagnetic field. Usually, a rotary pump is used to stably maintain an ultra-high vacuum of up to about 10 ⁻⁸ Pa in a portion where an electron beam passes through a first vacuum vessel (column) that accommodates an electron source, an electron optical system, and the like. Various vacuum pumps such as turbo molecular pumps and ion pumps are used in combination. A second vacuum container (main body structure) that houses a substrate stage for holding the substrate is also connected to a vacuum pump such as a turbo molecular pump or an ion pump in order to maintain a high vacuum. Among the earth currents flowing through the housings of these vacuum vessels, when a current that changes in a pulse shape with an AC component flows, the direction of the magnetic field generated by the earth current changes, which affects the trajectory of the electron beam. In general, the capacity of the turbo molecular pump differs depending on the volume in the casing of the vacuum vessel to be evacuated and the desired degree of vacuum. For example, the larger the volume in the housing, the greater the power consumed by the turbo molecular pump employed. In particular, in the drawing apparatus as described above, since the volume in the housing of the second vacuum container is larger than that of the first vacuum container, the one that employs the vacuum pump to be exhausted from the second vacuum container, Power consumption increases. Therefore, as a device (noise source) for generating a ground current, a turbo molecular pump connected to the second vacuum vessel can be considered, and a vacuum gauge in the second vacuum vessel, a motor constituting the substrate stage, and the like. Can also be. On the other hand, Patent Document 1 discloses an exposure apparatus that employs a technique that makes it difficult to transmit conduction noise from a vacuum vessel (housing) including a noise source to a connected vacuum vessel.

JP 2007-88061 A

  Here, as in the exposure apparatus shown in Patent Document 1, in the drawing apparatus, if each housing of the first vacuum container and the second vacuum container is simply separated by an insulator, an earth current generated from the second vacuum container side is obtained. And the influence on the first vacuum vessel side can be suppressed. However, when the first vacuum vessel and the second vacuum vessel are separated by an insulator at the connection portion of each housing, the closed magnetic path formed along the inside of the first vacuum vessel and the second vacuum vessel is interrupted. When the magnetic path is interrupted, the magnetic flux lines generated from the location where the magnetic path of the first vacuum vessel and the insulator or the insulator and the second vacuum vessel are interrupted leak (invade) on the orbit of the electron beam. Will also affect the trajectory. Furthermore, since the insulator transmits the electromagnetic field, the insulator is easily affected by other electromagnetic fields from the outside through the insulating portion.

  The present invention has been made in view of such circumstances, and an object of the present invention is to provide a charged particle beam apparatus that is advantageous for stabilizing the trajectory of a charged particle beam.

  In order to solve the above-described problems, the present invention provides a charged particle beam apparatus that processes a target object using a charged particle beam, and includes at least a part of an electron optical system that guides the charged particle beam to the target object. A first housing for housing, a second housing for housing a movable substrate holding portion that holds the object to be processed, and a connection portion between the first housing and the second housing; , An insulator that reduces a current flowing from the second casing to the first casing, a closed magnetic path through the first and second casings, and the first and second via the connecting portion. And a mechanism for reducing electromagnetic waves from the outside to the inside of the housing.

  ADVANTAGE OF THE INVENTION According to this invention, the charged particle beam apparatus advantageous for stabilization of the track | orbit of a charged particle beam can be provided.

It is a figure which shows the structure of the drawing apparatus which concerns on 1st Embodiment of this invention. It is a figure which shows the structural example of the structure which concerns on 1st Embodiment. It is a figure which shows the magnetic path etc. in the vacuum vessel in the drawing apparatus concerning 1st Embodiment. It is a figure which shows the structural example of the structure which concerns on 2nd Embodiment. It is a figure explaining the generation | occurrence | production state of the disturbance electromagnetic field in the conventional drawing apparatus. It is a figure which shows the influence which the open magnetic path in the conventional drawing apparatus has on an electron beam track.

  Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings.

(First embodiment)
First, the charged particle beam apparatus according to the first embodiment of the present invention will be described. In particular, the charged particle beam apparatus according to the present embodiment deflects (scans) an electron beam (charged particle beam) and individually controls blanking of the electron beam (irradiation OFF), thereby providing predetermined drawing data. Is a drawing apparatus that draws the image on a predetermined position of the substrate to be processed (object to be processed). Here, the charged particle beam is not limited to the electron beam as in the present embodiment, and may be another charged particle beam such as an ion beam (ion beam). In the following drawings, the electron beam is described as a single line for convenience, but the drawing apparatus of the present embodiment may be a multi-beam system using a plurality of electron beams.

  FIG. 1 is a schematic diagram illustrating a configuration of a drawing apparatus 1 according to the present embodiment. In each of the following drawings, the Z-axis is taken in the electron beam radiation direction with respect to the substrate to be processed, and the X-axis and Y-axis perpendicular to each other are taken in a plane perpendicular to the Z-axis. The drawing apparatus 1 includes an electron source 2, an electron optical system 4 that guides an electron beam emitted from the electron source 2 onto the substrate 3 to be processed, a substrate stage 5 that holds the substrate 3 to be processed, and the drawing apparatus 1. The control part 6 which controls operation | movement etc. of each component of these is provided. The substrate to be processed 3 is a wafer made of, for example, single crystal silicon, and a photosensitive resist is applied on the surface.

  The electron source (charged particle beam source) 2 emits an electron beam 7 by application of heat or an electric field. The electron optical system 4 appropriately deflects and images the electron beam 7 emitted from the electron source 2. Although not shown, the electron optical system 4 includes an electrostatic lens that converges the beam diameter of the electron beam 7 and a deflector that shields the deflected desired electron beam 7. The substrate stage (substrate holding unit) 5 includes a stage motor 5a, and is movable in at least two directions of the XY axes while holding the substrate 3 to be processed by, for example, electrostatic adsorption. The position of the substrate stage 5 is measured in real time by an unillustrated interferometer (laser length measuring device) or the like. Furthermore, the control unit 6 is configured by, for example, a computer and is connected to each component of the drawing apparatus 1 via a line, and can control each component according to a program or the like. The control unit 6 of the present embodiment controls the operation of each evacuation system 12, 13 used for evacuation in each vacuum vessel described later that houses at least the above-described components. The control unit 6 may be configured integrally with other parts of the drawing apparatus 1 (in a common housing), or separate from the other parts of the drawing apparatus 1 (in a separate housing). It may be configured.

Here, the electron beam 7 is immediately attenuated in an atmospheric pressure atmosphere. It is also necessary to prevent discharge due to high voltage. Therefore, the above-described components excluding the control unit 6 are accommodated in two vacuum vessels whose internal pressure (vacuum pressure) is adjusted by a vacuum exhaust system. As these vacuum containers, the drawing apparatus 1 includes a first vacuum container (column) 10 that houses at least a part of the electron source 2 and the electron optical system 4, and at least a substrate stage 5 as shown in FIG. And a second vacuum container (main body structure) 11 that is accommodated while being movable in the direction. First, the housing (first housing) 10a of the first vacuum vessel 10 is formed of a metal material, and the inside thereof is 10 ⁻⁸ Pa at maximum by the first vacuum exhaust system 12 installed outside. A high degree of vacuum is maintained. As a vacuum pump which comprises the 1st vacuum exhaust system 12, there may be a combination of a dry pump and an ion pump, for example. On the other hand, the housing (second housing) 11a of the second vacuum vessel 11 is also formed of a metal material, and the inside of the second vacuum vessel 11 is formed by the second vacuum exhaust system 13 installed outside. Although the degree of vacuum is lower than the inside, it is maintained at about 10 ⁻⁵ Pa level. As a vacuum pump which comprises the 2nd vacuum exhaust system 13, there may be a combination of a turbo molecular pump and a dry pump, for example.

  In particular, in the drawing apparatus 1, the first housing 10a and the second housing 11a are connected via a structure 15 as shown in FIG. The structure 15 electrically insulates the first casing 10a and the second casing 11a and shields an electromagnetic field (electromagnetic wave) while forming a closed magnetic path. The structure 15 will be described in detail below.

  Furthermore, the drawing apparatus 1 has a ground wire for fixing the potential of the first housing 10a and the second housing 11a and preventing charging. First, the first ground wire 16 connected to the first casing 10 a is grounded to the ground through the first ground point 17. On the other hand, the second ground wire 18 connected to the second housing 11 a is grounded to the ground through the second ground point 19 that exists at a position different from the first ground point 17. Thus, by making the 1st grounding point 17 and the 2nd grounding point 19 independent, transmission of the noise through an earth wire can be suppressed. Further, a third ground wire 20 different from the first ground wire 16 and the second ground wire 18 is also connected to the structure 15 (a high permeability member 30 described later). The third ground wire 20 is also connected to the first contact. The ground is grounded through the third grounding point 21 that exists at a position different from the point 17 and the second grounding point 19. As will be described later, since the method of grounding differs depending on the structure of the structure 15, the third ground wire 20 may be unnecessary.

  Next, the operation of the drawing apparatus 1 by adopting the structure 15 will be described. First, for comparison, a description will be given of the state of generation of a disturbance electromagnetic field in a vacuum vessel in a conventional drawing apparatus and the influence of an open magnetic path on the trajectory of an electron beam. FIG. 5 is a schematic cross-sectional view for explaining the state of generation of a disturbance electromagnetic field in the first vacuum vessel 102 by the noise source 101 in the conventional drawing apparatus 100. The drawing apparatus 100 includes a first vacuum container 102 and a second vacuum container 103 as in the drawing apparatus 1 according to the present embodiment shown in FIG. However, the structure 15 is not adopted here, and the housing 102a of the first vacuum vessel 102 and the housing 103a of the second vacuum vessel 103 are connected directly or via a conductive connecting member. ing. In FIG. 5, the shapes of the respective housings 102 a and 103 a are shown as schematic shapes in which the width in the space is exaggerated in order to clearly show the occurrence of magnetic paths and disturbance electromagnetic fields formed inside the housing to be described later. Yes. Although not shown, the drawing apparatus 100 evacuates the first evacuation system for evacuating the inside of the first vacuum container 102 and the evacuation inside the second vacuum container 103 as in the drawing apparatus 1. A second evacuation system to perform. Since the second vacuum vessel 103 has a larger internal volume than the first vacuum vessel 102, the second vacuum pumping system employs a vacuum pump having a larger pumping capacity than that of the first vacuum pumping system.

  Here, the main noise source 101 can be a vacuum pump that constitutes the second evacuation system and a stage motor that constitutes a substrate stage (not shown) installed in the second vacuum vessel 103. The vacuum pump constituting the second evacuation system is electrically directly connected to the second vacuum vessel 103 (housing 103a). Therefore, when the vacuum pump is operated, an alternating leakage current flowing from the casing of the vacuum pump is transmitted to the casing 103 a of the second vacuum vessel 103. Similarly, when the stage motor is driven, a large amount of drive current flows in a pulsed manner, and leakage current also flows through the housing 103 a of the second vacuum vessel 103. Note that the magnitude of the drive current and the flow direction generally vary depending on the pulse shape, the drive speed or drive direction of the substrate stage. Further, since the housing 102 a and the housing 103 a are electrically integrated, the current flowing through the housing 103 a of the second vacuum container 103 is transmitted to the housing 102 a of the first vacuum container 102 and flows as the ground current 104. . On the other hand, in each case 102a and 103a as a continuous body, a magnetic field is generated due to an unillustrated electron optical system installed in the first vacuum vessel 102, a stage motor in the second vacuum vessel 103, or the like. Thus, a closed magnetic path 105 (closed magnetic path) is formed. At this time, when the above-described ground current 104 acts on the magnetic path 105, a new magnetic field 106 centering on the wall surface region of the housing 102a of the first vacuum vessel 102 is newly generated as shown in FIG. Occur. As the noise source 101 is actuated (driven), the magnitude and direction of the ground current 104 change, so the magnitude and direction of the magnetic field 106 also change. Therefore, the change in the magnetic field 106 has an influence such as shifting the trajectory of the electron beam 108 emitted from the electron source 107.

  Further, in order to suppress the influence of the ground current 104 on the first vacuum vessel 102 side, an insulator for separating the ground current 104 from the second vacuum vessel 103 side is installed on the conventional drawing apparatus 100. think about. FIG. 6 is a diagram for explaining the influence of an open magnetic path (open magnetic path) on the trajectory of the electron beam 108 by installing the insulator 110 in the conventional drawing apparatus corresponding to FIG. In FIG. 6, as an example, an insulator 110 is installed at a connection portion between the housings 102 a and 103 a of the first vacuum container 102 and the second vacuum container 103. Due to the presence of the insulator 110, the ground current 104 does not flow from the second vacuum vessel 103 side (noise source 101 side) to the first vacuum vessel 102 side. Therefore, the first vacuum vessel 102 is caused by the noise source 101. Not affected by the magnetic field. However, the magnetic paths 105 in the housings 102 a and 103 a of the first vacuum container 102 and the second vacuum container 103 are open magnetic paths because no current flows at the position of the insulator 110. Therefore, the magnetic flux line 111 leaks at the position of the insulator 110, and the trajectory of the electron beam 108 is bent under the influence of the magnetic flux line 111. Further, since the insulator 110 is not conductive, it cannot be charged by attaching a ground wire. Further, the insulator 110 transmits a disturbance 112 such as geomagnetism in the installation environment of the drawing apparatus 100 or an electromagnetic field generated by another electronic device from the outside to the inside of the connection portion and enters the orbit of the electron beam 108. There is a possibility.

  Therefore, the drawing apparatus 1 of the present embodiment connects the first casing 10a and the second casing 11a via the structure 15 as described above. FIG. 2 is a schematic cross-sectional view showing a configuration of the structure 15 that can be employed in the drawing apparatus 1, and FIGS. 2A to 2C show configuration examples, respectively. First, as a first example of the structure 15, the structure 15 a illustrated in FIG. 2A has a shape of a connection portion with the second housing 11 a when the first housing 10 a is cylindrical. And a ring shape (hollow shape) having a rectangular cross section. The structure 15a includes a high permeability body 30 formed of a high permeability metal material, and an insulator 31a installed (covered) so as to cover the entire inner side surface, outer side surface, and upper and lower plane surfaces. It consists of. As a metal material that can be used for the high magnetic permeability body 30, for example, a material having a relative permeability in the range of 8000 to 200,000, such as permalloy (relative permeability 100000) or pure iron (relative permeability 200000) is desirable. The insulator 31a reduces the flow of ground current that can flow from the second casing 11a to the first casing 10a. As a material that can be used for the insulator 31a, there is a ceramic material such as zirconia having properties such as high strength, high fracture toughness, or non-dielectric property. In addition, the insulator 31a may be a diamond-like carbon (DLC) film. The thickness d of the insulator 31a is preferably thinner than the thickness of the high magnetic permeability body 30, and specifically, for example, in the range of 10 μm to 0.1 mm. If the thickness d of the insulator 31a is appropriately adjusted, the magnetic path can be connected (closed magnetic path) inside the housings 10a and 11a of the first vacuum container 10 and the second vacuum container 11. . Furthermore, the structure 15a includes a connection metal fitting 32 for connecting the third magnetic wire 20 shown in FIG. Thus, by grounding the third ground wire 20 to the high magnetic permeability body 30, the potential is maintained at the ground installation potential. That is, since the structure 15a can maintain the potential difference close to 0 V, the transmission (penetration) of the electric field from the outside (outside) to the inside (inside) can be suppressed. As described above, the third ground wire 20 is grounded to the ground through the third ground point 21 that exists at a position different from the first ground point 17 and the second ground point 19. 17 or the second grounding point 19 may be connected.

  On the other hand, as the second and third examples of the structure 15, the structures 15 b and 15 c shown in FIGS. 2B and 2C are grounded differently from the structure 15 a shown in FIG. Adopted. Specifically, each of the structural bodies 15b and 15c is obtained by coating the high permeability body 30 with an insulator in the same manner as the structural body 15a of the first example, but the structural body 15b shown in FIG. Then, the insulator 31b has a shape that does not cover only the connection surface with the first housing 10a. That is, the high magnetic permeability body 30 inside the structure 15b is in direct electrical contact with the first housing 10a and can conduct. Therefore, the high magnetic permeability body 30 is grounded via the first housing 10a, and the structure 15b includes the third ground wire 20 required for the structure 15a of the first example, The accompanying connection metal fitting 32 is not required. On the other hand, in the structure 15c shown in FIG. 2C, the insulator 31c has a shape that does not cover only the connection surface with the second housing 11a. In this case, the high magnetic permeability body 30 is grounded via the second casing 11a, and the structure 15c is connected to the third ground wire 20 and the connection stopper as in the structure 15b of the second example. The metal fitting 32 is not required.

  FIG. 3 is a diagram for explaining a magnetic path and the like by installing the structure 15 in the drawing apparatus 1 according to this embodiment corresponding to FIG. 6 used in the description of the conventional drawing apparatus 100. First, the ground current 22 generated on the second vacuum vessel 11 side has electrical continuity between the first casing 10a and the second casing 11a due to the presence of the structure 15 including the insulator 31. Low and difficult to flow to the first vacuum vessel 10 side. Therefore, the fluctuation of the magnetic field based on the fluctuation of the ground current 22 caused by the noise source 23 (corresponding to the conventional noise source 101) is suppressed. Further, the insulator 31 constituting the structure 15 is installed after the thickness d of the insulator 31 is appropriately adjusted with respect to the high permeability body 30 as described above, so that the magnetic path 24 is closed. Therefore, leakage of the magnetic flux lines 111 as shown in FIG. 6 can be suppressed. Further, the high magnetic permeability body 30 as a mechanism constituting the structure 15 can shield the electromagnetic field disturbance 112 in the installation environment of the drawing apparatus 1 as shown in FIG. Can also reduce the effects of. As described above, the drawing apparatus 1 suppresses the influence of the electromagnetic field caused by the ground current 22 from the second housing 11a of the second vacuum vessel 11 including the noise source 23 on the trajectory of the electron beam 7, and also provides disturbance. The influence of the electromagnetic field 112 can also be suppressed. Thereby, the drawing apparatus 1 can obtain highly accurate drawing performance.

  As described above, according to the present embodiment, it is possible to provide a charged particle beam apparatus that is advantageous for stabilizing the trajectory of a charged particle beam such as an electron beam.

(Second Embodiment)
Next, a charged particle beam device according to a second embodiment of the present invention will be described. The charged particle beam apparatus according to the present embodiment also relates to a drawing apparatus similar to that of the first embodiment, and the feature thereof is that the configuration of the structure 15 in the drawing apparatus 1 according to the first embodiment is changed. FIG. 4 is a schematic cross-sectional view showing the configuration of the structure 40 of the present embodiment. In addition, the external shape of the structure 40 shall be ring shape similarly to the structure 15 which concerns on 1st Embodiment. The structure 40 includes a first member (first engagement portion) 41 located at the end of the first housing 10a and a second member (at the end of the second housing 11a). Second engaging portion) 42 and an insulator 43 installed at a position where the first member 41 and the second member 42 come into contact with each other. If the first member 41 and the second member 42 are formed integrally with the respective housings 10a and 11a, they are made of the same metal material as the respective housings 10a and 11a. The first member 41 and the second member 42 extend toward the other members 41 and 42 that face each other in the connection direction, and travel toward the trajectory of the electron beam 7 that passes through the central space of the structure 40. at direction has a wall portion 41a, 42a overlapping alternately while keeping a clearance (gap) _{L 1.} The wall portion 41a, at 42a, respectively toward the tip portion 41b to the other members 41 and 42 opposed to each other in the connecting direction, 42b also takes a clearance (gap) _{L 2} between the opposing members 41 and 42, contact each other Not done. On the other hand, the first member 41 and the second member 42 further have one connection wall 41c, 42c installed in parallel to the wall portions 41a, 42a, and this connection wall 41c, It connects via the insulator 43 at the front-end | tip with 42c. The insulator 43 is formed of the same material as that of the insulator 31 according to the first embodiment, and the dimension in the connection direction is preferably smaller than the dimension in the connection direction of the wall portions 41a and 42a.

According to the structure of the structure 40, first, the first member 41 and the second member 42 are connected via the insulator 43, so that the ground current 22 is supplied from the second vacuum vessel 11 side to the first. 1 It is difficult to flow toward the vacuum container 10 side. Then, to reduce the size of the insulator 43, and, by appropriately adjusting the size of the gap L ₂ of the connection direction, the first vacuum chamber 10 as in the first embodiment of the second vacuum chamber 11 The magnetic path 24 formed in each housing 10a, 11a can be a closed magnetic path. In this case, the size of the gap _{L 2} of the connection direction, for example, is desirable in the range of 0.01 to 0.1 mm. Incidentally, according to the shape of the structure 40, the gap than the gap L ₂ to form the magnetic path 24 does not form a magnetic path. Further, the structure 40 forms a gap space by the walls 41a and 42a, and defines a path of the electromagnetic field in a direction from the outside toward the orbit of the electron beam 7. Since the opening direction of the flow path of the electromagnetic field changes with respect to the X-axis direction, the magnetic flux lines can be absorbed in the gap space. That is, the structure 40 has a shielding effect as in the first embodiment. Thus, according to the drawing apparatus having the structure 40, the same effects as those of the first embodiment can be obtained.

  In the structure 40 shown in FIG. 4, the first member 41 and the second member 42 are respectively integrated with the first housing 10 a or the second housing 11 a, but each has a high magnetic permeability. The metal material (similar to the high permeability body 30 of the first embodiment) may be formed as a separate body. Thereby, the shielding effect of the structure 40 can be further improved. In addition, the shapes of the first member 41 and the second member 42, for example, the installation positions and the installation numbers of the wall portions 41a and 42a and the connection walls 41c and 42c are not limited to those described above. In the structure 40 shown in FIG. 4, connection walls 41c and 42c are provided at positions matching the wall surfaces of the first housing 10a and the second housing 11a, and the connection walls 41c and 42c are used as a reference. One wall portion 41a, 42a is provided on each of the inner side and the outer side. On the other hand, the wall portions 41a and 42a may be installed, for example, on the inside or the outside of the connection walls 41c and 42c, and the number of installation may be two or more on the inside or outside. Furthermore, the installation positions of the connection walls 41c and 42c may be shifted from the wall surfaces of the first housing 10a and the second housing 11a toward the walls 41a and 42a, and the number of the installation walls is two. It may be the above.

(Other embodiments)
The configuration of the drawing apparatus described as the above embodiment can be applied to other charged particle beam apparatuses such as an electron microscope. For example, the electron microscope can obtain a stable high-definition sample image by applying the above configuration to an electron microscope for observing the object instead of the substrate as the object to be processed.

(Product manufacturing method)
The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing an article such as a micro device such as a semiconductor device or an element having a fine structure. The manufacturing method includes a step of forming a latent image pattern on the photosensitive agent on the substrate coated with the photosensitive agent using the above drawing apparatus (a step of drawing on the substrate), and the latent image pattern is formed in the step. Developing the substrate. Further, the manufacturing method may include other well-known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like). The method for manufacturing an article according to the present embodiment is advantageous in at least one of the performance, quality, productivity, and production cost of the article as compared with the conventional method.

  As mentioned above, although preferable embodiment of this invention was described, this invention is not limited to these embodiment, A various deformation | transformation and change are possible within the range of the summary.

DESCRIPTION OF SYMBOLS 1 Drawing apparatus 2 Electron source 3 Substrate 4 Electron optical system 5 Substrate stage 7 Electron beam 10a 1st housing | casing 11a 2nd housing | casing 20 3rd earth wire 22 Earth current 24 Magnetic path 30 High permeability body 31 Insulation body

Claims (17)

A charged particle beam apparatus that performs processing on an object to be processed using a charged particle beam,
A first housing that houses at least a part of an electron optical system that guides the charged particle beam to the object;
A second housing for holding a movable substrate holding unit that holds the object to be processed;
An insulator that is provided at a connection portion between the first casing and the second casing, and that reduces current flowing from the second casing to the first casing;
A mechanism for forming a closed magnetic path through the first and second housings and reducing electromagnetic waves traveling from the outside to the inside of the first and second housings through the connection portion. Charged particle beam device characterized by the above.   The charged particle beam apparatus according to claim 1, wherein the first casing and the second casing are electrically grounded independently. The insulator is coated on the entire surface of a high permeability body made of a high permeability metal material,
3. The charge according to claim 1, wherein the high magnetic permeability body is electrically grounded independently of at least one of the first casing and the second casing. Particle beam device.   The insulator is covered on the surface of a high permeability body made of a high permeability metal material, leaving a portion that is electrically conductive to one of the first casing or the second casing. The charged particle beam apparatus according to claim 1, wherein the charged particle beam apparatus is one.   5. The charged particle beam apparatus according to claim 1, wherein the insulator is formed of a ceramic material or a diamond-like carbon film. 6.   The charged particle beam device according to claim 3 or 4, wherein the insulator has a thickness in a range of 10 µm to 0.1 mm.   5. The charged particle beam device according to claim 3, wherein a relative permeability of the metal material is in a range of 8000 to 200,000.   The mechanism has a first member extending from the first housing side and a second member extending from the second housing side facing each other with a gap therebetween, The charged particle beam apparatus according to claim 1, wherein either the first member or the second member is configured to face a side surface of the insulator. The first member and the second member are respectively
Extending toward the other first member or the second member facing each other in the connecting direction;
There is a gap between the tip and the other first member or the second member facing each other, and
Alternately overlapping with a gap in the direction from the mechanism toward the trajectory of the charged particle beam passing through the central space of the mechanism,
The charged particle beam apparatus according to claim 8, further comprising a wall portion having a structure of:   The dimension of the said clearance gap between the said front-end | tip part and the said other said 1st member or said 2nd member which opposes exists in the range of 0.01-0.1 mm, It is characterized by the above-mentioned. Charged particle beam equipment.   Each of the first member and the second member has a connection wall installed in parallel to the wall portion, and is connected to each other via the insulator at the tip of the connection wall. The charged particle beam apparatus according to claim 9.   The charged particle beam device according to claim 11, wherein a dimension of the insulator in the connection direction is smaller than a dimension of the wall portion in the connection direction.   The charged particle beam device according to claim 8, wherein the first member and the second member are integral with the first housing and the second housing, respectively.   The first member and the second member are respectively separate in the first housing and the second housing, and are made of a metal material having a high magnetic permeability. 8. The charged particle beam apparatus according to 8. The substrate to be processed is a substrate to be processed,
The charged particle beam apparatus according to claim 1, wherein the charged particle beam apparatus is a drawing apparatus that performs drawing on the substrate to be processed with the charged particle beam. The object to be processed is a subject,
The charged particle beam apparatus according to claim 1, wherein the charged particle beam apparatus is an electron microscope that observes the subject with the charged particle beam. Drawing on a substrate using the charged particle beam device according to claim 15;
Developing the substrate on which the drawing has been performed in the step;
A method for producing an article comprising:

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