JP2013100238A - Triazole derivative, intermediate compound, method for producing triazole derivative, agricultural and horticultural chemical, and industrial material protective agent - Google Patents
Triazole derivative, intermediate compound, method for producing triazole derivative, agricultural and horticultural chemical, and industrial material protective agent Download PDFInfo
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- JP2013100238A JP2013100238A JP2011243951A JP2011243951A JP2013100238A JP 2013100238 A JP2013100238 A JP 2013100238A JP 2011243951 A JP2011243951 A JP 2011243951A JP 2011243951 A JP2011243951 A JP 2011243951A JP 2013100238 A JP2013100238 A JP 2013100238A
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- triazole derivative
- intermediate compound
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- Agricultural Chemicals And Associated Chemicals (AREA)
Abstract
Description
本発明は、新規なトリアゾール誘導体、その中間体化合物、およびトリアゾール誘導体の製造方法に関する。また、該トリアゾール誘導体を有効成分として含有する農園芸用薬剤および工業用材料保護剤に関する。 The present invention relates to a novel triazole derivative, an intermediate compound thereof, and a method for producing a triazole derivative. The present invention also relates to an agricultural and horticultural agent and an industrial material protective agent containing the triazole derivative as an active ingredient.
従来、植物病害防除剤の有効成分として多数のアゾリルメチルシクロペンタノール誘導体が開発されてきており、例えば、2−(ハロゲン化炭化水素置換)−5−ベンジル−1−アゾリルメチルシクロペンタノール誘導体(例えば、特許文献1参照)、および2−(炭化水素置換)−5−ベンジリデン−1−アゾリルメチルシクロペンタノール誘導体(例えば、特許文献2参照)が開発されている。 Conventionally, many azolylmethylcyclopentanol derivatives have been developed as active ingredients of plant disease control agents, such as 2- (halogenated hydrocarbon substitution) -5-benzyl-1-azolylmethylcyclopentanol. Derivatives (for example, see Patent Document 1) and 2- (hydrocarbon-substituted) -5-benzylidene-1-azolylmethylcyclopentanol derivatives (for example, see Patent Document 2) have been developed.
従来、人畜に対する毒性が低く取扱い安全性に優れ、かつ広範な植物病害に対して高い防除効果を示す植物病害防除剤が求められている。また、植物の健全な生育に対する悪影響を最小限に抑えることができる、すなわち薬害が軽い病害防除剤が求められている。 Conventionally, there has been a demand for a plant disease control agent that has low toxicity to human livestock, is excellent in handling safety, and exhibits a high control effect on a wide range of plant diseases. In addition, there is a need for a disease control agent that can minimize adverse effects on the healthy growth of plants, that is, has low phytotoxicity.
そこで、本発明は上記の問題点に鑑みてなされたものであり、その目的は、上記の要望に応える化合物を提供することにある。 Therefore, the present invention has been made in view of the above problems, and an object of the present invention is to provide a compound that meets the above-mentioned needs.
上記課題解決のため、本発明者らが鋭意検討した結果、下記一般式(I)で示されるトリアゾール誘導体が優れた活性を有するとともに、植物に対する薬害が低減していることを見出し、本発明を完成させるにいたった。 As a result of intensive studies by the present inventors for solving the above-mentioned problems, the present inventors have found that the triazole derivative represented by the following general formula (I) has excellent activity and reduced phytotoxicity to plants. To complete.
すなわち、本発明は、係る新規知見に基づいてなされたものであり、以下の発明を包含する。 That is, this invention is made | formed based on the novel knowledge which concerns, and includes the following inventions.
下記一般式(I)で示されるトリアゾール誘導体。 A triazole derivative represented by the following general formula (I).
(一般式(I)中、R1は、炭素原子数1〜4のアルキル基を表し、R2は、水素原子、ハロゲン原子、炭素原子数1〜4のアルキル基、炭素原子数1〜4のハロアルキル基、炭素原子数1〜4のアルコキシ基または炭素原子数1〜4のハロアルコキシ基を表し、Lはハロゲン原子を表している。)
また、本発明に係るトリアゾール誘導体において、R2はハロゲン原子、炭素原子数1〜2のハロアルキル基または炭素原子数1〜2のハロアルコキシ基であることが好ましい。
(In General Formula (I), R 1 represents an alkyl group having 1 to 4 carbon atoms, and R 2 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 4 carbon atoms, or 1 to 4 carbon atoms. Haloalkyl group, an alkoxy group having 1 to 4 carbon atoms, or a haloalkoxy group having 1 to 4 carbon atoms, and L represents a halogen atom.)
In the triazole derivative according to the present invention, R 2 is preferably a halogen atom, a haloalkyl group having 1 to 2 carbon atoms, or a haloalkoxy group having 1 to 2 carbon atoms.
また、本発明に係るトリアゾール誘導体において、R2はハロゲン原子であることが好ましい。 In the triazole derivative according to the present invention, R 2 is preferably a halogen atom.
また、本発明に係るトリアゾール誘導体において、Lは塩素原子または臭素原子であることが好ましい。 In the triazole derivative according to the present invention, L is preferably a chlorine atom or a bromine atom.
さらに本発明は、上述のトリアゾール誘導体の中間体化合物であって、下記一般式(II)で示される中間体化合物も包含する。 Furthermore, the present invention also includes an intermediate compound of the above-described triazole derivative, which is an intermediate compound represented by the following general formula (II).
(上記式(II)中、R1およびR2は、上記式(I)中のR1およびR2と同一であり、R3は、水素原子が置換されていてもよい炭素原子数1〜3のアルキル基、フェニル基またはナフチル基を表している。)
また、本発明は、上述のトリアゾール誘導体の中間体化合物であって、下記一般式(III)で示される中間体化合物も包含する。
(In the formula (II), R 1 and R 2 are the same as R 1 and R 2 in the formula (I), R 3 is good number of carbon atoms 1 to be a hydrogen atom be substituted 3 represents an alkyl group, a phenyl group or a naphthyl group.)
The present invention also includes an intermediate compound of the above-described triazole derivative, which is an intermediate compound represented by the following general formula (III).
(上記式(III)中、R1およびR2は、上記式(I)中のR1およびR2と同一である。)
また、本発明は、上述のトリアゾール誘導体の中間体化合物であって、下記一般式(IV)で示される中間体化合物も包含する。
(In the above formula (III), R 1 and R 2 are the same as R 1 and R 2 in the formula (I).)
The present invention also includes an intermediate compound of the above-described triazole derivative, which is an intermediate compound represented by the following general formula (IV).
(上記式(IV)中、R1およびR2は、上記式(I)中のR1およびR2と同一であり、R4は、炭素原子数1〜4のアルキル基を表している。)
また、本発明は、上述のトリアゾール誘導体の中間体化合物であって、下記一般式(V)で示される中間体化合物も包含する。
(In the formula (IV), R 1 and R 2 are the same as R 1 and R 2 in the above formula (I), R 4 represents an alkyl group having 1 to 4 carbon atoms. )
The present invention also includes an intermediate compound of the above-described triazole derivative, which is an intermediate compound represented by the following general formula (V).
(上記式(V)中、R1およびR2は、上記式(I)中のR1およびR2と同一であり、R4は、炭素原子数1〜4のアルキル基を表している。)
また、本発明は、上述のトリアゾール誘導体の中間体化合物であって、下記一般式(VI)で示される中間体化合物も包含する。
(In the formula (V), R 1 and R 2 are the same as R 1 and R 2 in the above formula (I), R 4 represents an alkyl group having 1 to 4 carbon atoms. )
The present invention also includes an intermediate compound of the above-described triazole derivative, which is an intermediate compound represented by the following general formula (VI).
(上記式(VI)中、R1およびR2は、上記式(I)中のR1およびR2と同一であり、R4は、炭素原子数1〜4のアルキル基を表している。)
さらに、本発明は、上記トリアゾール誘導体の製造方法であって、下記一般式(II)で示す中間体化合物において−OSO2R3で示される置換スルホニルオキシ基をハロゲン原子に置換することにより、上記一般式(I)で示すトリアゾール誘導体を得る工程を含む、トリアゾール誘導体の製造方法も包含する。
(In the formula (VI), R 1 and R 2 are the same as R 1 and R 2 in the above formula (I), R 4 represents an alkyl group having 1 to 4 carbon atoms. )
Furthermore, the present invention provides a method for producing the above triazole derivative, wherein the substituted sulfonyloxy group represented by —OSO 2 R 3 in the intermediate compound represented by the following general formula (II) is substituted with a halogen atom. A method for producing a triazole derivative including a step of obtaining a triazole derivative represented by the general formula (I) is also included.
(上記式(II)中、R1およびR2は、上記式(I)中のR1およびR2と同一であり、R3は、水素原子が置換されていてもよい炭素原子数1〜3のアルキル基、フェニル基またはナフチル基を表している。)
また、本発明は、上記トリアゾール誘導体の製造方法であって、下記一般式(III)で示される中間体化合物をスルホニル化することにより、下記一般式(II)で示される中間体化合物を得る工程を含む、トリアゾール誘導体の製造方法も包含する。
(In the formula (II), R 1 and R 2 are the same as R 1 and R 2 in the formula (I), R 3 is good number of carbon atoms 1 to be a hydrogen atom be substituted 3 represents an alkyl group, a phenyl group or a naphthyl group.)
The present invention also provides a method for producing the triazole derivative, wherein the intermediate compound represented by the following general formula (II) is obtained by sulfonylating the intermediate compound represented by the following general formula (III): The manufacturing method of the triazole derivative containing this is also included.
(上記式(III)中、R1およびR2は、上記式(I)中のR1およびR2と同一である。) (In the above formula (III), R 1 and R 2 are the same as R 1 and R 2 in the formula (I).)
(上記式(II)中、R1およびR2は、上記式(I)中のR1およびR2と同一であり、R3は、水素原子が置換されていてもよい炭素原子数1〜3のアルキル基、フェニル基またはナフチル基を表している。)
また、本発明は、上記トリアゾール誘導体の製造方法であって、下記一般式(IV)で示される中間体化合物を還元することにより、下記一般式(III)で示される中間体化合物を得る工程を含む、トリアゾール誘導体の製造方法も包含する。
(In the formula (II), R 1 and R 2 are the same as R 1 and R 2 in the formula (I), R 3 is good number of carbon atoms 1 to be a hydrogen atom be substituted 3 represents an alkyl group, a phenyl group or a naphthyl group.)
The present invention also provides a method for producing the above triazole derivative, comprising the step of obtaining an intermediate compound represented by the following general formula (III) by reducing an intermediate compound represented by the following general formula (IV): And a method for producing a triazole derivative.
(上記式(IV)中、R1およびR2は、上記式(I)中のR1およびR2と同一であり、R4は、炭素原子数1〜4のアルキル基を表している。) (In the formula (IV), R 1 and R 2 are the same as R 1 and R 2 in the above formula (I), R 4 represents an alkyl group having 1 to 4 carbon atoms. )
(上記式(III)中、R1およびR2は、上記式(I)中のR1およびR2と同一である。)
また、本発明は、上記トリアゾール誘導体の製造方法であって、下記一般式(VI)で示される中間体化合物をオキシラン化して得られる下記一般式(V)で示される中間体化合物と、下記一般式(IX)で示される化合物とを反応させることにより、下記一般式(IV)で示す中間体化合物を得る工程を含む、トリアゾール誘導体の製造方法も包含する。
(In the above formula (III), R 1 and R 2 are the same as R 1 and R 2 in the formula (I).)
The present invention also provides a method for producing the triazole derivative, wherein the intermediate compound represented by the following general formula (V) obtained by oxirane conversion of the intermediate compound represented by the following general formula (VI): A method for producing a triazole derivative including a step of obtaining an intermediate compound represented by the following general formula (IV) by reacting with a compound represented by the formula (IX) is also included.
(上記式(VI)中、R1およびR2は、上記式(I)中のR1およびR2と同一であり、R4は、炭素原子数1〜4のアルキル基を表している。) (In the formula (VI), R 1 and R 2 are the same as R 1 and R 2 in the above formula (I), R 4 represents an alkyl group having 1 to 4 carbon atoms. )
(上記式(V)中、R1およびR2は、上記式(I)中のR1およびR2と同一であり、R4は、上記式(VI)中のR4と同一である。) (In the formula (V), R 1 and R 2 are the same as R 1 and R 2 in the above formula (I), R 4 is identical to R 4 in the formula (VI). )
(上記式(IX)中、Mは水素原子またはアルカリ金属を表している。) (In the above formula (IX), M represents a hydrogen atom or an alkali metal.)
(上記式(IV)中、R1およびR2は、上記式(I)中のR1およびR2と同一であり、R4は、上記式(VI)中のR4と同一である。)
また、本発明は、上述のトリアゾール誘導体を有効成分として含有することを特徴とする農園芸用薬剤または工業用材料保護剤も包含する。
(In the formula (IV), R 1 and R 2 are the same as R 1 and R 2 in the above formula (I), R 4 is identical to R 4 in the formula (VI). )
Moreover, this invention also includes the agricultural and horticultural chemical | medical agent or industrial material protecting agent characterized by containing the above-mentioned triazole derivative as an active ingredient.
本発明に係るアゾール誘導体は、植物に病害を引き起こす多くの菌に対して優れた殺菌作用を有するとともに、植物に対する薬害が低く抑えられている。したがって、本発明に係るアゾール誘導体を有効成分として含む薬剤は、広範な植物病害に対して高い防除効果を発揮するとともに、薬害を低く抑えることができる効果を奏する。 The azole derivative according to the present invention has an excellent bactericidal action against many fungi that cause diseases on plants, and has low phytotoxicity on plants. Therefore, the chemical | medical agent which contains the azole derivative which concerns on this invention as an active ingredient has the effect which can suppress a chemical damage low while exhibiting the high control effect with respect to a wide range of plant diseases.
本発明に係るトリアゾール誘導体の一実施形態について説明する。 One embodiment of the triazole derivative according to the present invention will be described.
〔1.トリアゾール誘導体〕
本発明に係るトリアゾール誘導体は、下記一般式(I)で示されるトリアゾール誘導体(以下、トリアゾール誘導体(1)と称する)である。
[1. Triazole derivative)
The triazole derivative according to the present invention is a triazole derivative represented by the following general formula (I) (hereinafter referred to as triazole derivative (1)).
一般式(I)中、R1は、炭素原子数1〜4のアルキル基を表している。炭素原子数1〜4のアルキル基としては、例えば、メチル基、エチル基、n−プロピル基、イソプロピル基、1−メチルプロピル基、2−メチルプロピル基、n−ブチル基、および1,1−ジメチルエチル基等が挙げられる。なかでも、炭素原子数1〜3のアルキル基が好ましく、メチル基およびエチル基がより好ましく、メチル基が特に好ましい。 In general formula (I), R 1 represents an alkyl group having 1 to 4 carbon atoms. Examples of the alkyl group having 1 to 4 carbon atoms include methyl group, ethyl group, n-propyl group, isopropyl group, 1-methylpropyl group, 2-methylpropyl group, n-butyl group, and 1,1- A dimethylethyl group etc. are mentioned. Of these, an alkyl group having 1 to 3 carbon atoms is preferable, a methyl group and an ethyl group are more preferable, and a methyl group is particularly preferable.
R2は、水素原子、ハロゲン原子、炭素原子数1〜4のアルキル基、炭素原子数1〜4のハロアルキル基、炭素原子数1〜4のアルコキシ基または炭素原子数1〜4のハロアルコキシ基を表している。なかでも、水素原子、ハロゲン原子、炭素原子数1〜3のアルキル基、炭素原子数1〜3のハロアルキル基、炭素原子数1〜3のアルコキシ基および炭素原子数1〜3のハロアルコキシ基が好ましく、ハロゲン原子、炭素原子数1〜2のハロアルキル基および炭素原子数1〜2のハロアルコキシ基がより好ましく、ハロゲン原子であることが特に好ましい。 R 2 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 4 carbon atoms, a haloalkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, or a haloalkoxy group having 1 to 4 carbon atoms. Represents. Among these, a hydrogen atom, a halogen atom, an alkyl group having 1 to 3 carbon atoms, a haloalkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, and a haloalkoxy group having 1 to 3 carbon atoms. A halogen atom, a haloalkyl group having 1 to 2 carbon atoms, and a haloalkoxy group having 1 to 2 carbon atoms are more preferable, and a halogen atom is particularly preferable.
R2における炭素原子数1〜4のアルキル基としては、R1で表される有機基の例示として挙げたアルキル基を挙げることができる。 Examples of the alkyl group having 1 to 4 carbon atoms in R 2 include the alkyl groups mentioned as examples of the organic group represented by R 1 .
炭素原子数1〜4のハロアルキル基としては、例えば、クロロメチル基、ジクロロメチル基、トリクロロメチル基、2−クロロエチル基、1−クロロエチル基、2,2−ジクロロエチル基、1,2−ジクロロエチル基、2,2,2−トリクロロエチル基、3−クロロプロピル基、2,3−ジクロロプロピル基、1−クロロ−1−メチルエチル基、2−クロロ−1−メチルエチル基、2−クロロプロピル基、4−クロロブチル基、フルオロメチル基、ジフルオロメチル基、トリフルオロメチル基、2−フルオロエチル基、1−フルオロエチル基、2,2−ジフルオロエチル基、1,2−ジフルオロエチル基、2,2,2−トリフルオロエチル基、1,1,2,2,2−ペンタフルオロエチル基、3−フルオロプロピル基、2,3−ジフルオロプロピル基、1−フルオロ−1−メチルエチル基、2−フルオロ−1−メチルエチル基、2−フルオロプロピル基、3,3,3−トリフルオロプロピル基、2,2,3,3−テトラフルオロプロピル基、2,2,3,3,3−ペンタフルオロプロピル基、4−フルオロブチル基、ブロモメチル基、ジブロモメチル基、トリブロモメチル基、2−ブロモエチル基、1−ブロモエチル基、2,2−ジブロモエチル基、1,2−ジブロモエチル基、2,2,2−トリブロモエチル基、3−ブロモプロピル基、2,3−ジブロモプロピル基、1−ブロモ−1−メチルエチル基、2−ブロモ−1−メチルエチル基、2−ブロモプロピル基、4−ブロモブチル基、ヨードメチル基、ジヨードメチル基、2−ヨードエチル基、1−ヨードエチル基、2,2−ジヨードエチル基、1,2−ジヨードエチル基、2,2,2−トリヨードエチル基、3−ヨードプロピル基、2,3−ジヨードプロピル基、1−ヨード−1−メチルエチル基、2−ヨード−1−メチルエチル基、2−ヨードプロピル基、および4−ヨードブチル基等が挙げられる。なかでも、炭素原子数1〜2のハロアルキル基が好ましく、トリフルオロメチル基、1,1,2,2,2−ペンタフルオロエチル基、クロロメチル基、トリクロロメチル基、およびブロモメチル基がより好ましい。 Examples of the haloalkyl group having 1 to 4 carbon atoms include a chloromethyl group, a dichloromethyl group, a trichloromethyl group, a 2-chloroethyl group, a 1-chloroethyl group, a 2,2-dichloroethyl group, and 1,2-dichloroethyl. Group, 2,2,2-trichloroethyl group, 3-chloropropyl group, 2,3-dichloropropyl group, 1-chloro-1-methylethyl group, 2-chloro-1-methylethyl group, 2-chloropropyl Group, 4-chlorobutyl group, fluoromethyl group, difluoromethyl group, trifluoromethyl group, 2-fluoroethyl group, 1-fluoroethyl group, 2,2-difluoroethyl group, 1,2-difluoroethyl group, 2, 2,2-trifluoroethyl group, 1,1,2,2,2-pentafluoroethyl group, 3-fluoropropyl group, 2,3-difluoropropyl Pyl group, 1-fluoro-1-methylethyl group, 2-fluoro-1-methylethyl group, 2-fluoropropyl group, 3,3,3-trifluoropropyl group, 2,2,3,3-tetrafluoro Propyl group, 2,2,3,3,3-pentafluoropropyl group, 4-fluorobutyl group, bromomethyl group, dibromomethyl group, tribromomethyl group, 2-bromoethyl group, 1-bromoethyl group, 2,2- Dibromoethyl group, 1,2-dibromoethyl group, 2,2,2-tribromoethyl group, 3-bromopropyl group, 2,3-dibromopropyl group, 1-bromo-1-methylethyl group, 2-bromo -1-methylethyl group, 2-bromopropyl group, 4-bromobutyl group, iodomethyl group, diiodomethyl group, 2-iodoethyl group, 1-iodoethyl group, 2,2-di Dodoethyl group, 1,2-diiodoethyl group, 2,2,2-triiodoethyl group, 3-iodopropyl group, 2,3-diiodopropyl group, 1-iodo-1-methylethyl group, 2-iodo- Examples include 1-methylethyl group, 2-iodopropyl group, and 4-iodobutyl group. Of these, a haloalkyl group having 1 to 2 carbon atoms is preferable, and a trifluoromethyl group, 1,1,2,2,2-pentafluoroethyl group, a chloromethyl group, a trichloromethyl group, and a bromomethyl group are more preferable.
炭素原子数1〜4のアルコキシ基としては、例えば、メトキシ基、エトキシ基、およびn−プロポキシ基等を挙げることができる。 Examples of the alkoxy group having 1 to 4 carbon atoms include a methoxy group, an ethoxy group, and an n-propoxy group.
炭素原子数1〜4のハロアルコキシ基としては、例えば、トリフルオロメトキシ基、ジフルオロメトキシ基、1,1,2,2,2−ペンタフルオロエトキシ基、および2,2,2−トリフルオロエトキシ基等を挙げることができる。 Examples of the haloalkoxy group having 1 to 4 carbon atoms include a trifluoromethoxy group, a difluoromethoxy group, a 1,1,2,2,2-pentafluoroethoxy group, and a 2,2,2-trifluoroethoxy group. Etc.
R2におけるハロゲン原子としては、塩素原子、フッ素原子、臭素原子、およびヨウ素原子を挙げることができる。中でも、フッ素原子および塩素原子が好ましく、塩素原子が特に好ましい。 Examples of the halogen atom in R 2 include a chlorine atom, a fluorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom and a chlorine atom are preferable, and a chlorine atom is particularly preferable.
R2の結合位置に特に制限はないが、ベンジル基の4位の位置に結合していることが好ましい。 Not particularly limited bonding position of R 2, but is preferably bonded to 4-position of the benzyl group.
Lは、ハロゲン原子を表している。ハロゲン原子としては、具体的には、塩素原子、フッ素原子、臭素原子、およびヨウ素原子を挙げることができ、塩素原子および臭素原子がより好ましく、塩素原子が特に好ましい。 L represents a halogen atom. Specific examples of the halogen atom include a chlorine atom, a fluorine atom, a bromine atom, and an iodine atom, a chlorine atom and a bromine atom are more preferable, and a chlorine atom is particularly preferable.
特に好ましいトリアゾール誘導体(I)の例としては、下記式(I−1)で示すトリアゾール誘導体が挙げられる。 Examples of particularly preferred triazole derivatives (I) include triazole derivatives represented by the following formula (I-1).
なお、一般式(I)中、二重結合を有する炭素原子における波線で示されるベンゼン環との結合は、二重結合における立体配置に関しE配置およびZ配置を区別していないことを意味している。すなわち、本実施の形態におけるトリアゾール誘導体(I)は、E異性体およびZ異性体の何れであってもよく、さらにはE異性体およびZ異性体の混合物でもあり得る。 In general formula (I), the bond with the benzene ring indicated by the wavy line in the carbon atom having a double bond means that the E configuration and the Z configuration are not distinguished from each other with respect to the configuration in the double bond. Yes. That is, the triazole derivative (I) in the present embodiment may be any of E isomer and Z isomer, and may also be a mixture of E isomer and Z isomer.
また、トリアゾール誘導体(I)には、シクロペンタン環に結合しているヒドロキシ基とシクロペンタン環に結合しているハロゲン化メチル基とがシス型である幾何異性体およびトランス型である幾何異性体が存在し得る。したがって、本実施の形態におけるトリアゾール誘導体(I)は、このような幾何異性体の何れか一方を単独で含むもの、および、各幾何異性体を任意の比率で含むもののいずれをも含むものである。 Further, the triazole derivative (I) includes geometric isomers in which a hydroxy group bonded to a cyclopentane ring and a methyl halide group bonded to a cyclopentane ring are cis-type and trans-type. Can exist. Therefore, the triazole derivative (I) in the present embodiment includes both those containing any one of such geometric isomers and those containing each geometric isomer in an arbitrary ratio.
トリアゾール誘導体(I)は、例えば以下に説明する製造方法により製造することができるが、この製造方法により製造される化合物に限定されるものではない。 The triazole derivative (I) can be produced, for example, by the production method described below, but is not limited to the compound produced by this production method.
〔2.トリアゾール誘導体の製造方法〕
トリアゾール誘導体(I)は、下記全体スキームに従って、公知の技術により得られる化合物から、製造することができる。
(全体スキーム)
[2. Method for producing triazole derivative]
The triazole derivative (I) can be produced from a compound obtained by a known technique according to the following overall scheme.
(Overall scheme)
以下、各工程について説明する。 Hereinafter, each step will be described.
(工程1:アルキル化)
工程1では、化合物(VIII)をアルキル化することにより、化合物(VII)を得る(反応式(1)参照)。
(反応式(1))
(Step 1: Alkylation)
In Step 1, compound (VII) is obtained by alkylating compound (VIII) (see reaction formula (1)).
(Reaction Formula (1))
化合物(VIII)におけるR4は、炭素原子数1〜4のアルキル基を表しており、具体的には、メチル基、エチル基、n−プロピル基、1−メチルエチル基、n−ブチル基、2−メチルプロピル基、1−メチルプロピル基および2,2−ジメチルエチル基が挙げられる。なかでも、炭素数1〜3のアルキル基が好ましく、メチル基およびエチル基がより好ましく、メチル基がさらに好ましい。 R 4 in the compound (VIII) represents an alkyl group having 1 to 4 carbon atoms, specifically, methyl group, ethyl group, n-propyl group, 1-methylethyl group, n-butyl group, Examples include 2-methylpropyl group, 1-methylpropyl group, and 2,2-dimethylethyl group. Especially, a C1-C3 alkyl group is preferable, a methyl group and an ethyl group are more preferable, and a methyl group is further more preferable.
化合物(VII)におけるR1は、上記したR1と同義である。より詳細には、トリアゾール誘導体(I)におけるR1と同一の基である。 R 1 in the compound (VII) has the same meaning as R 1 described above. More specifically, it is the same group as R 1 in the triazole derivative (I).
化合物(VIII)をアルキル化する方法としては、塩基の存在下、化合物(VIII)を、一般式:R1−L’で表されるハロゲン化アルキルと溶媒中で反応させる方法が挙げられる。ここで、L’はハロゲン原子を表しており、例えば、塩素原子、臭素原子またはヨウ素原子である。 Examples of the method of alkylating compound (VIII) include a method of reacting compound (VIII) with an alkyl halide represented by the general formula: R 1 -L ′ in a solvent in the presence of a base. Here, L ′ represents a halogen atom, for example, a chlorine atom, a bromine atom or an iodine atom.
反応に用いる塩基としては、炭酸ナトリウムおよび炭酸カリウム等のアルカリ金属の炭酸塩、水素化ナトリウムおよび水素化カリウム等の金属水素化物、ならびにナトリウムメトキド、ナトリウムエトキシドおよびカリウムt−ブトキシド等のアルカリ金属のアルコキシド等を挙げることができる。 Bases used in the reaction include alkali metal carbonates such as sodium carbonate and potassium carbonate, metal hydrides such as sodium hydride and potassium hydride, and alkali metals such as sodium methoxide, sodium ethoxide and potassium t-butoxide. The alkoxide of etc. can be mentioned.
溶媒は、非プロトン性の溶媒であれば特に限定されず、ベンゼン、トルエン、キシレンおよびクロロベンゼン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフランおよびジオキサン等のエーテル類、ならびにN,N−ジメチルホルムアミド、N,N−ジメチルアセトアミドおよびN−メチル−2−ピロリジノン等のアミド類等を挙げることができる。 The solvent is not particularly limited as long as it is an aprotic solvent, aromatic hydrocarbons such as benzene, toluene, xylene and chlorobenzene, ethers such as diethyl ether, tetrahydrofuran and dioxane, and N, N-dimethylformamide, Examples include amides such as N, N-dimethylacetamide and N-methyl-2-pyrrolidinone.
ハロゲン化アルキルとしては、例えば、ヨウ化メチル、臭化メチル、ヨウ化エチル、臭化エチルおよびヨウ化イソプロピル等が挙げられ、なかでも、ヨウ化メチルおよび臭化メチルが好ましい。 Examples of the alkyl halide include methyl iodide, methyl bromide, ethyl iodide, ethyl bromide and isopropyl iodide. Among them, methyl iodide and methyl bromide are preferable.
ハロゲン化アルキルの量は、化合物(VIII)に対して、例えば0.5〜2.0倍モルであり、好適には0.9〜1.5倍モルである。 The amount of the alkyl halide is, for example, 0.5 to 2.0 times mol, preferably 0.9 to 1.5 times mol for the compound (VIII).
反応温度および反応時間は、溶媒、ハロゲン化アルキルおよび塩基の種類によって適宜設定することができる。反応温度は、例えば−20℃〜100℃であり、好適には0℃〜50℃である。また、反応時間は、例えば0.5時間〜数日であり、好適には1時間〜24時間である。 The reaction temperature and reaction time can be appropriately set depending on the type of solvent, alkyl halide and base. The reaction temperature is, for example, -20 ° C to 100 ° C, preferably 0 ° C to 50 ° C. The reaction time is, for example, 0.5 hours to several days, and preferably 1 hour to 24 hours.
なお、化合物(VIII)は、公知の反応を利用してアジピン酸ジエステル類から容易に合成でき、あるいは市販されている2−オキソシクロペンタンカルボン酸エステル類を使用してもよい。 Compound (VIII) can be easily synthesized from adipic acid diesters using a known reaction, or commercially available 2-oxocyclopentanecarboxylic acid esters may be used.
(工程2:ベンジリデン化)
工程2では、化合物(VII)をベンジリデン化して化合物(VI)を得る(反応式(2)参照)。
(反応式(2))
(Process 2: benzylidene conversion)
In step 2, compound (VII) is benzylidene to obtain compound (VI) (see reaction formula (2)).
(Reaction Formula (2))
化合物(VII)をベンジリデン化する方法としては、塩基性の存在下、化合物(VII)を、置換または無置換のベンズアルデヒドと溶媒中で反応させる方法を挙げることができる。なお、化合物(VI)におけるR2は、上記したR2と同義である。より詳細には、トリアゾール誘導体(I)におけるR2と同一の基である。 Examples of the method for benzylidation of compound (VII) include a method in which compound (VII) is reacted with a substituted or unsubstituted benzaldehyde in a solvent in the presence of basicity. In the compound (VI), R 2 has the same meaning as R 2 described above. More specifically, it is the same group as R 2 in the triazole derivative (I).
置換または無置換のベンズアルデヒドとしては、クロロベンズアルデヒド、フルオロベンズアルデヒド、ブロモベンズアルデヒド、トリフルオロメトキシベンズアルデヒド、トリフルオロメチルベンズアルデヒドおよびメチルベンズアルデヒド等を挙げることができ、なかでも、p−クロロベンズアルデヒドおよびp−フルオロベンズアルデヒドが好ましい。 Examples of the substituted or unsubstituted benzaldehyde include chlorobenzaldehyde, fluorobenzaldehyde, bromobenzaldehyde, trifluoromethoxybenzaldehyde, trifluoromethylbenzaldehyde, and methylbenzaldehyde. Among them, p-chlorobenzaldehyde and p-fluorobenzaldehyde are included. preferable.
反応に用いる塩基としては、ナトリウムメトキシド、ナトリウムエトキシド、ナトリウムt−ブトキシドおよびカリウムt−ブトキシド等のアルカリ金属のアルコキシド等、炭酸ナトリウムおよび炭酸カリウム等のアルカリ金属の炭酸塩、水素化ナトリウム、水素化カリウム等の金属水素化物、ピリジン、トリエチルアミンおよび4−ジメチルアミノピリジン等の有機塩基、ならびに水酸化ナトリウム等のアルカリ金属水酸化物等を挙げることができる。 Examples of the base used in the reaction include sodium methoxide, sodium ethoxide, alkali metal alkoxides such as sodium t-butoxide and potassium t-butoxide, alkali metal carbonates such as sodium carbonate and potassium carbonate, sodium hydride, hydrogen Examples thereof include metal hydrides such as potassium hydroxide, organic bases such as pyridine, triethylamine and 4-dimethylaminopyridine, and alkali metal hydroxides such as sodium hydroxide.
反応に用いられる溶媒は特に限定されず、例えば、ベンゼン、トルエン、キシレンおよびクロロベンゼン等の芳香族炭化水素類、ジエチルエーテル、テトラヒドロフランおよびジオキサン等のエーテル類、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミドおよびN−メチル−2−ピロリジノン等のアミド類等、ならびにメタノール、エタノールおよびイソプロパノール等のアルコール類等を挙げることができる。 The solvent used in the reaction is not particularly limited. For example, aromatic hydrocarbons such as benzene, toluene, xylene and chlorobenzene, ethers such as diethyl ether, tetrahydrofuran and dioxane, N, N-dimethylformamide, N, N- Examples thereof include amides such as dimethylacetamide and N-methyl-2-pyrrolidinone, and alcohols such as methanol, ethanol and isopropanol.
反応温度および反応時間は、溶媒、化合物(VII)および塩基の種類によって適宜設定することができる。反応温度は、例えば−20℃〜200℃であり、好適には0℃〜100℃である。また、反応時間は、例えば0.5時間〜数日であり、好適には1時間〜24時間である。 The reaction temperature and reaction time can be appropriately set depending on the kind of the solvent, compound (VII) and base. The reaction temperature is, for example, -20 ° C to 200 ° C, preferably 0 ° C to 100 ° C. The reaction time is, for example, 0.5 hours to several days, and preferably 1 hour to 24 hours.
(工程3:オキシラン化)
工程3では、化合物(VI)をオキシラン化して化合物(V)を得る(反応式(3)参照)。
(反応式(3))
(Step 3: Oxiraneization)
In step 3, compound (VI) is oxiraneated to give compound (V) (see reaction formula (3)).
(Reaction Formula (3))
化合物(VI)をオキシラン化する方法としては、化合物(VI)を、ジメチルスルホニウムメチリド等の硫黄イリドと溶媒中で反応させる方法を挙げることができる。 Examples of the method for oxirane-izing compound (VI) include a method in which compound (VI) is reacted with a sulfur ylide such as dimethylsulfonium methylide in a solvent.
反応に用いられるスルホニウムメチリド類の量は、化合物(VI)に対して、例えば0.5〜5倍モルであり、好適には0.8〜2倍モルである。 The amount of the sulfonium methylide used in the reaction is, for example, 0.5 to 5 times mol, preferably 0.8 to 2 times mol for the compound (VI).
反応に用いられる溶媒は特に限定されず、例えば、ジメチルスルホキシド、N−メチルピロリドンおよびN,N−ジメチルホルムアミド等のアミド類、テトラヒドロフランおよびジオキサン等のエーテル類、ならびにこれらの混合溶媒等を挙げることができる。 The solvent used in the reaction is not particularly limited, and examples thereof include amides such as dimethyl sulfoxide, N-methylpyrrolidone and N, N-dimethylformamide, ethers such as tetrahydrofuran and dioxane, and mixed solvents thereof. it can.
反応温度および反応時間は、溶媒、化合物(VI)、およびスルホニウム塩の種類によって適宜設定することができる。反応温度は、例えば−100℃〜200℃であり、好適には−50℃〜150℃である。また、反応時間は、例えば0.1時間〜数日であり、好適には0.5時間〜2日である。 The reaction temperature and reaction time can be appropriately set depending on the type of the solvent, compound (VI), and sulfonium salt. The reaction temperature is, for example, −100 ° C. to 200 ° C., and preferably −50 ° C. to 150 ° C. The reaction time is, for example, 0.1 hour to several days, and preferably 0.5 hour to 2 days.
反応に用いられるスルホニウムメチリド類は、溶媒中、スルホニウム塩(例えば、トリメチルスルホニウムヨージドもしくはトリメチルスルホニウムブロミド等)を、塩基と反応させることにより生成させることができる。 The sulfonium methylides used in the reaction can be produced by reacting a sulfonium salt (for example, trimethylsulfonium iodide or trimethylsulfonium bromide) with a base in a solvent.
スルホニウムメチリド類の生成に用いられる塩基は、特に限定されず、例えば、水素化ナトリウム等の金属水素化合物ならびにナトリウムメトキシド、ナトリウムエトキシド、ナトリウムt−ブトキシドおよびカリウムt−ブトキシド等のアルカリ金属のアルコキシド等を挙げることができる。 The base used for the production of sulfonium methylides is not particularly limited, and examples thereof include metal hydride compounds such as sodium hydride and alkali metal such as sodium methoxide, sodium ethoxide, sodium t-butoxide and potassium t-butoxide. An alkoxide etc. can be mentioned.
(工程4:アゾール化)
工程4では、化合物(V)と、1,2,4−トリアゾール化合物(化合物(IX))とを反応させることにより、化合物(IV)を得る(反応式(4)参照)。
(反応式(4))
(Step 4: Azolation)
In step 4, compound (IV) is obtained by reacting compound (V) with a 1,2,4-triazole compound (compound (IX)) (see reaction formula (4)).
(Reaction Formula (4))
化合物(IX)におけるMは、水素原子またはアルカリ金属を表している。アルカリ金属としては、ナトリウムおよびカリウムが好ましい。 M in the compound (IX) represents a hydrogen atom or an alkali metal. As the alkali metal, sodium and potassium are preferable.
化合物(IV)は、化合物(V)と化合物(IX)とを溶媒中で混合することにより、化合物(V)においてオキシラン環を構成する炭素原子と化合物(IX)の窒素原子との間に炭素−窒素結合が生成することで製造される。 Compound (IV) is obtained by mixing compound (V) and compound (IX) in a solvent, so that carbon between the carbon atom constituting the oxirane ring in compound (V) and the nitrogen atom of compound (IX) is carbon. -Manufactured by the formation of nitrogen bonds.
溶媒は、特に限定されず、例えば、N,N−ジメチルアセトアミド、N−メチルピロリドンおよびN,N−ジメチルホルムアミド等のアミド類、ならびにジメチルスルホキシドを挙げることができる。 The solvent is not particularly limited, and examples thereof include amides such as N, N-dimethylacetamide, N-methylpyrrolidone and N, N-dimethylformamide, and dimethyl sulfoxide.
化合物(V)に対する化合物(IX)の使用量は、例えば0.5〜10倍モルであり、好適には0.8〜5倍モルである。 The usage-amount of compound (IX) with respect to compound (V) is 0.5-10 times mole, for example, and is 0.8-5 times mole suitably.
また、所望により塩基を添加してもよい。塩基としては、ナトリウムメトキシド、ナトリウムエトキシド、ナトリウムt−ブトキシドおよびカリウムt−ブトキシド等のアルカリ金属のアルコキシド、ならびに炭酸カリウム等を挙げることができる。 Moreover, you may add a base if desired. Examples of the base include alkali alkoxides such as sodium methoxide, sodium ethoxide, sodium t-butoxide and potassium t-butoxide, and potassium carbonate.
化合物(IX)に対する塩基の使用量は、例えば0〜5倍モル(ただし、0は除く)であり、0.5〜2倍モルであることがより好ましい。 The usage-amount of the base with respect to compound (IX) is 0-5 times mole (however, 0 is excluded), for example, and it is more preferable that it is 0.5-2 times mole.
反応温度は、溶媒および塩基等によって適宜設定することができる。反応温度としては、例えば0℃〜250℃であり、好適には10℃〜150℃である。また、反応時間は、溶媒および塩基等によって適宜設定することができる。反応時間としては、例えば0.1時間〜数日であり、好適には0.5時間〜2日である。 The reaction temperature can be appropriately set depending on the solvent, base and the like. The reaction temperature is, for example, 0 ° C to 250 ° C, preferably 10 ° C to 150 ° C. Moreover, reaction time can be suitably set with a solvent, a base, etc. The reaction time is, for example, 0.1 hour to several days, preferably 0.5 hour to 2 days.
(工程5:還元反応)
工程5では、化合物(IV)を還元することにより化合物(III)を得る(反応式(5)参照)。
(反応式(5))
(Step 5: Reduction reaction)
In step 5, compound (III) is obtained by reducing compound (IV) (see reaction formula (5)).
(Reaction Formula (5))
化合物(IV)を還元するための還元剤としては、ヒドリド型還元剤を挙げることができる。ヒドリド型還元剤としては、例えば、水素化ホウ素ナトリウム、水素化ホウ素カルシウム、水素化ホウ素リチウムおよび水素化リチウムアルミニウム等を挙げることができる。なかでも、水素化ホウ素ナトリウムおよび水素化ホウ素カルシウムが好適に用いられる。また、還元剤は必要に応じて系内で調製することも可能である。 Examples of the reducing agent for reducing compound (IV) include a hydride-type reducing agent. Examples of the hydride-type reducing agent include sodium borohydride, calcium borohydride, lithium borohydride, lithium aluminum hydride, and the like. Of these, sodium borohydride and calcium borohydride are preferably used. In addition, the reducing agent can be prepared in the system as necessary.
還元剤の量は、化合物(IV)に対して、例えば0.2倍モル〜50倍モルであり、好適には0.5倍モル〜20倍モルである。 The amount of the reducing agent is, for example, 0.2 to 50 times mol, preferably 0.5 to 20 times mol with respect to compound (IV).
溶媒としては、メタノール、エタノールおよびイソプロパノール等のアルコール類、ジエチルエーテル、テトラヒドロフランおよびジオキサン等のエーテル類、ならびにこれらの混合溶媒を挙げることができる。なかでも、メタノール、エタノールおよびテトラヒドロフランが好適に用いられる。 Examples of the solvent include alcohols such as methanol, ethanol and isopropanol, ethers such as diethyl ether, tetrahydrofuran and dioxane, and a mixed solvent thereof. Of these, methanol, ethanol and tetrahydrofuran are preferably used.
反応温度および反応時間は、用いられる溶媒、還元剤の種類、添加物の有無等によって適宜設定することができる。例えば、還元剤として水素化ホウ素ナトリウムを用いる場合の反応温度は、好適には−30℃〜70℃であり、より好適には−20℃〜50℃である。また、反応時間は、好適には0.5時間〜24時間であり、より好適には1時間〜8時間である。 The reaction temperature and reaction time can be appropriately set depending on the solvent used, the type of reducing agent, the presence or absence of additives, and the like. For example, the reaction temperature when sodium borohydride is used as the reducing agent is preferably −30 ° C. to 70 ° C., and more preferably −20 ° C. to 50 ° C. The reaction time is preferably 0.5 hours to 24 hours, and more preferably 1 hour to 8 hours.
(工程6:スルホニル化)
工程6では、化合物(III)を、一般式:R3SO2Clによって表される置換スルホニルクロリド(化合物(X))と反応させることによって、置換スルホニルオキシ基を有する化合物(II)を得る(反応式(6)参照)。
(反応式(6))
(Step 6: Sulfonylation)
In Step 6, compound (II) having a substituted sulfonyloxy group is obtained by reacting compound (III) with a substituted sulfonyl chloride represented by the general formula: R 3 SO 2 Cl (compound (X)) ( Reaction formula (6) reference).
(Reaction Formula (6))
化合物(X)におけるR3は水素原子が置換されていてもよい炭素原子数1〜3のアルキル基、フェニル基またはナフチル基を表している。水素原子が置換されていてもよい炭素原子数1〜3のアルキル基としては、例えば、メチル基、エチル基、n−プロピル基、イソプロピル基およびトリフルオロメチル基等を挙げることができる。水素原子が置換されていてもよいフェニル基およびナフチル基としては、例えば、4−メチルフェニル基、2−ニトロフェニル基および5−ジメチルアミノナフチル基等を挙げることができる。R3としては、このうち、メチル基および4−メチルフェニル基がより好ましい。 R 3 in the compound (X) represents an alkyl group having 1 to 3 carbon atoms, a phenyl group or a naphthyl group in which a hydrogen atom may be substituted. Examples of the alkyl group having 1 to 3 carbon atoms in which a hydrogen atom may be substituted include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, and a trifluoromethyl group. Examples of the phenyl group and naphthyl group in which a hydrogen atom may be substituted include a 4-methylphenyl group, a 2-nitrophenyl group, and a 5-dimethylaminonaphthyl group. Of these, methyl group and 4-methylphenyl group are more preferred as R 3 .
化合物(III)に対する化合物(X)の使用量は、例えば0.5〜10倍モルであり、好ましくは0.8〜5倍モルである。 The usage-amount of compound (X) with respect to compound (III) is 0.5-10 times mole, for example, Preferably it is 0.8-5 times mole.
また、塩基を添加しなくても反応が進行する場合もあるが、発生する塩化水素を除くために、塩基を添加することが好ましい。その場合、化合物(III)に対する塩基の使用量は、例えば0〜5倍モル(但し、0は除く)であり、好ましくは0.5〜3倍モルである。塩基としては特に限定されず、例えば、水素化ナトリウム、水素化カリウムおよび水素化リチウム等のアルカリ金属水素化合物、ならびにトリエチルアミン、ピリジン、4−ジメチルアミノピリジンおよびN,N−ジメチルアニリン等の有機アミン類等を挙げることができる。 Although the reaction may proceed without adding a base, it is preferable to add a base in order to remove generated hydrogen chloride. In that case, the usage-amount of the base with respect to compound (III) is 0-5 times mole (however, 0 is excluded), for example, Preferably it is 0.5-3 times mole. The base is not particularly limited, and examples thereof include alkali metal hydrogen compounds such as sodium hydride, potassium hydride and lithium hydride, and organic amines such as triethylamine, pyridine, 4-dimethylaminopyridine and N, N-dimethylaniline. Etc.
溶媒は、特に限定されず、例えば、ベンゼン、トルエンおよびキシレン等の芳香族炭化水素類、塩化メチレンおよびクロロホルム等のハロゲン化炭化水素、ならびにテトラヒドロフランおよびジエチルエーテル等のエーテル類等を用いることができる。 The solvent is not particularly limited, and for example, aromatic hydrocarbons such as benzene, toluene and xylene, halogenated hydrocarbons such as methylene chloride and chloroform, and ethers such as tetrahydrofuran and diethyl ether can be used.
反応温度は、用いられる溶媒および塩基等によって適宜設定することができる。反応温度は、例えば−50℃〜200℃であり、好適には−20℃〜150℃である。また、反応時間は、用いられる溶媒および塩基等によって適宜設定することができる。反応時間は、例えば0.1時間〜数日であり、好適には0.5時間〜1日である。 The reaction temperature can be appropriately set depending on the solvent and base used. The reaction temperature is, for example, −50 ° C. to 200 ° C., and preferably −20 ° C. to 150 ° C. Moreover, reaction time can be suitably set with the solvent, base, etc. which are used. The reaction time is, for example, 0.1 hour to several days, and preferably 0.5 hour to 1 day.
(工程7:ハロゲン化)
工程7では、化合物(II)における置換スルホニルオキシ基をハロゲン原子で置換することにより、化合物(I)(トリアゾール誘導体(I))を得る(反応式(7)参照)。
(反応式(7))
(Step 7: Halogenation)
In step 7, compound (I) (triazole derivative (I)) is obtained by substituting the substituted sulfonyloxy group in compound (II) with a halogen atom (see reaction formula (7)).
(Reaction Formula (7))
置換スルホニルオキシ基をハロゲン原子に置換する方法としては、溶媒中、ハロゲン化塩で置換する方法が挙げられる。この方法における反応は、例えば、化合物(II)とハロゲン化塩とを溶媒中で混合することにより行われる。 Examples of the method for substituting the substituted sulfonyloxy group with a halogen atom include a method for substituting with a halogenated salt in a solvent. The reaction in this method is performed, for example, by mixing compound (II) and a halide salt in a solvent.
ハロゲン化塩としては、フッ化カリウム、フッ化セシウム、塩化リチウム、塩化カリウム、臭化リチウム、臭化マグネシウムおよびヨウ化ナトリウム等を挙げることができ、なかでも、塩化リチウムおよび臭化リチウムが好ましい。 Examples of the halogenated salt include potassium fluoride, cesium fluoride, lithium chloride, potassium chloride, lithium bromide, magnesium bromide and sodium iodide. Of these, lithium chloride and lithium bromide are preferable.
化合物(II)に対するハロゲン化塩の使用量は、例えば0.1〜100倍モルであり、好適には0.8〜20倍モルである。また、反応温度としては、例えば0〜250℃であり、好適には室温〜200℃である。反応時間は、例えば0.1時間〜数日であり、好適には0.2時間〜2日である。 The usage-amount of the halogenated salt with respect to compound (II) is 0.1-100 times mole, for example, Preferably it is 0.8-20 times mole. Moreover, as reaction temperature, it is 0-250 degreeC, for example, It is room temperature-200 degreeC suitably. The reaction time is, for example, 0.1 hour to several days, and preferably 0.2 hour to 2 days.
なお、上述の工程2、3、4、5および6においてそれぞれ得られる化合物(VI)、化合物(V)、化合物(IV)、化合物(III)および化合物(II)は、トリアゾール誘導体(I)の中間体化合物として、トリアゾール誘導体(I)の製造に好適に用いられるため、これら中間体化合物もまた本願発明の範疇に含まれる。 In addition, the compound (VI), the compound (V), the compound (IV), the compound (III) and the compound (II) obtained in the above-mentioned steps 2, 3, 4, 5 and 6 are the triazole derivative (I). Since the intermediate compound is suitably used for the production of the triazole derivative (I), these intermediate compounds are also included in the category of the present invention.
さらに、上述の工程3、4、5、6および7の少なくとも何れか1つの工程を含むことにより、トリアゾール誘導体(I)を好適に製造できるため、工程3、4、5、6および7の少なくとも何れか1つの工程を含むトリアゾール誘導体(I)の製造方法もまた本願発明の範疇に含まれる。 Furthermore, since the triazole derivative (I) can be suitably produced by including at least any one of the above-mentioned steps 3, 4, 5, 6, and 7, at least steps 3, 4, 5, 6, and 7 are included. A method for producing the triazole derivative (I) including any one step is also included in the category of the present invention.
〔3.農園芸用薬剤〕
トリアゾール誘導体(I)は、1,2,4−トリアゾリルを有するので、無機酸および有機酸の酸付加塩、または金属錯体を形成する。したがって、酸付加塩および金属錯体の一部として、農園芸用薬剤等の有効成分として使用することができる。
[3. (Agricultural and horticultural chemicals)
Since triazole derivative (I) has 1,2,4-triazolyl, it forms an acid addition salt of an inorganic acid and an organic acid, or a metal complex. Therefore, it can be used as an active ingredient such as agricultural and horticultural agents as part of acid addition salts and metal complexes.
(1)植物病害防除効果
トリアゾール誘導体(I)は、広汎な植物病害に対して防除効果を呈する。適用病害の例として以下が挙げられる:ダイズさび病(Phakopsora pachyrhizi、Phakopsora meibomiae)、イネいもち病(Pyricularia grisea)、イネごま葉枯病(Cochliobolus miyabeanus)、イネ白葉枯病(Xanthomonas oryzae)、イネ紋枯病(Rhizoctonia solani)、イネ小黒菌核病(Helminthosporium sigmoideun)、イネばか苗病(Gibberella fujikuroi)、イネ苗立枯病(Pythium aphanidermatum)、リンゴうどんこ病(Podosphaera leucotricha)、リンゴ黒星病(Venturia inaequalis)、リンゴモリニア病(Monilinia mali)、リンゴ斑点落葉病(Alternaria alternata)、リンゴ腐乱病(Valsa mali)、ナシ黒斑病(Alternaria kikuchiana)、ナシうどんこ病(Phyllactinia pyri)、ナシ赤星病(Gymnosporangium asiaticum)、ナシ黒星病(Venturia nashicola)、ブドウうどんこ病(Uncinula necator)、ブドウべと病(Plasmopara viticola)、ブドウ晩腐病(Glomerella cingulata)、オオムギうどんこ病(Erysiphe graminis f. sp hordei)、オオムギ黒さび病(Puccinia graminis)、オオムギ黄さび病(Puccinia striiformis)、オオムギ斑葉病(Pyrenophora graminea)、オオムギ雲形病(Rhynchosporium secalis)、コムギうどんこ病(Erysiphe graminis f. sp tritici)、コムギ赤さび病(Puccinia recondita)、コムギ黄さび病(Puccinia striiformis)、コムギ眼紋病(Pseudocercosporella herpotrichoides)、コムギ赤かび病(Fusarium graminearum、Microdochium nivale)、コムギふ枯病(Phaeosphaeria nodorum)、コムギ葉枯病(Septoria tritici)、ウリ類うどんこ病(Sphaerotheca fuliginea)、ウリ類の炭疸病(Colletotrichum lagenarium)、キュウリべと病(Pseudoperonospora cubensis)、キュウリ灰色疫病(Phytophthora capsici)、トマトうどんこ病(Erysiphe cichoracearum)、トマト輪紋病(Alternaria solani)、ナスうどんこ病(Erysiphe cichoracearum)、イチゴうどんこ病(Sphaerotheca humuli)、タバコうどんこ病(Erysiphe cichoracearum)、テンサイ褐斑病(Cercospora beticola)、トウモロコシ黒穂病(Ustillaga maydis)、核果類果樹の灰星病(Monilinia fructicola)、種々の作物をおかす灰色かび病 (Botrytis cinerea)、および菌核病(Sclerotinia sclerotiorum)等。さらに、ブドウのさび病(Phakopsora ampelopsidis)、スイカのつる割病(Fusarium oxysporum f.sp.niveum)、キュウリのつる割病(Fusarim oxysporum f.sp.cucumerinum)、ダイコンの萎黄病(Fusarium oxysporum f.sp.raphani)、タバコの赤星病(Alternaria longipes)、ジャカイモの夏疫病(Alternaria solani)、ダイズの褐紋病(Septoria glycines)、およびダイズの紫斑病(Cercospora kikuchii)等が挙げられる。
(1) Plant disease control effect The triazole derivative (I) exhibits a control effect on a wide range of plant diseases. Examples of applicable diseases include: soybean rust (Phakopsora pachyrhizi, Phakopsora meibomiae), rice blast (Pyricularia grisea), rice sesame leaf (Cochliobolus miyabeanus), rice leaf blight (Xanthomonas oryzae), rice crest Blight (Rhizoctonia solani), rice black rot (Helminthosporium sigmoideun), rice seedling disease (Gibberella fujikuroi), rice seedling blight (Pythium aphanidermatum), apple powdery mildew (Podosphaera leucotricha), apple black astronomy inaequalis), apple morinia disease (Monilinia mali), apple spotted leaf disease (Alternaria alternata), apple rot disease (Valsa mali), pear black spot disease (Alternaria kikuchiana), pear powdery mildew (Phyllactinia pyri), pear red star disease (Gymnosporangium) asiaticum), pear scab (Venturia nashicola), grape powdery mildew (Uncinula necator), grape downy mildew (Plasmopara viticola), grape late rot Glomerella cingulata), barley powdery mildew (Erysiphe graminis f. Sp hordei), barley black rust (Puccinia graminis), barley yellow rust (Puccinia striiformis), barley leaf spot (Pyrenophora graminea), barley cloud sp ), Wheat powdery mildew (Erysiphe graminis f. Sp tritici), wheat red rust (Puccinia recondita), wheat yellow rust (Puccinia striiformis), wheat eye spot (Pseudocercosporella herpotrichoides), wheat red mold (Fusarium graminearum, Microdochium) nivale), wheat blight (Phaeosphaeria nodorum), wheat leaf blight (Septoria tritici), cucumber powdery mildew (Sphaerotheca fuliginea), cucumber anthracnose (Colletotrichum lagenarium), cucumber downy mildew (Pseudoperonospora cubensis), Cucumber gray plague (Phytophthora capsici), tomato powdery mildew (Erysiphe cichoracearum), tomato ring disease (Alternaria solani) , Eggplant powdery mildew (Erysiphe cichoracearum), strawberry powdery mildew (Sphaerotheca humuli), tobacco powdery mildew (Erysiphe cichoracearum), sugar beet brown spot (Cercospora beticola), corn smut (Ustillaga maydis), ash of fruit tree Star disease (Monilinia fructicola), gray mold disease (Botrytis cinerea) that causes various crops, and sclerotia disease (Sclerotinia sclerotiorum). In addition, grape rust (Phakopsora ampelopsidis), watermelon vine (Fusarium oxysporum f.sp.niveum), cucumber vine (Fusarim oxysporum f.sp.cucumerinum), radish yellow (Fusarium oxysporum f. sp. raphani), tobacco red star disease (Alternaria longipes), potato summer blight (Alternaria solani), soybean brown spot disease (Septoria glycines), soybean purple spot disease (Cercospora kikuchii), and the like.
また、適用植物の例としては、野生植物、植物栽培品種、異種交配もしくは原形質融合等の従来の生物育種によって得られる植物および植物栽培品種、ならびに遺伝子操作によって得られる遺伝子組み換え植物および植物栽培品種が挙げられる。遺伝子組み換え植物および植物栽培品種としては、例えば、除草剤耐性作物、殺虫性タンパク産生遺伝子を組み込んだ害虫耐性作物、病害に対する抵抗性誘導物質産生遺伝子を組み込んだ病害耐性作物、食味向上作物、収量向上作物、保存性向上作物および収量向上作物等が挙げられる。遺伝子組み換え植物栽培品種としては、具体的に、ROUNDUP READY、LIBERTY LINK、CLEARFIELD、YIELDGARD、HERCULEX、BOLLGARD等の登録商標を含むものが挙げられる。 Examples of applicable plants include wild plants, plant cultivars, plants and plant cultivars obtained by conventional biological breeding such as crossbreeding or protoplast fusion, and genetically modified plants and plant cultivars obtained by genetic manipulation. Is mentioned. Examples of genetically modified plants and plant cultivars include herbicide-tolerant crops, pest-tolerant crops incorporating insecticidal protein production genes, disease-resistant crops incorporating resistance-inducing substance production genes against diseases, food-enhancing crops, and yield improvement Examples include crops, crops with improved shelf life and crops with improved yield. Specific examples of genetically modified plant cultivars include those containing registered trademarks such as ROUNDUP READY, LIBERTY LINK, CLEARFIELD, YIELDGARD, HERCULEX, BOLLGARD, and the like.
(2)植物生長作用
また、トリアゾール誘導体(I)は、広汎な作物および園芸植物に対して、その成長を調節して収量を増加させる効果、およびその品質を高める効果等を示す。かかる作物の例として以下が挙げられる:コムギ・大麦・燕麦等の麦類、稲、ナタネ、サトウキビ、トウモロコシ、メイズ、大豆、エンドウ、落花生、シュガービート、キャベツ、ニンニク、ダイコン、ニンジン、リンゴ、ナシ、みかん・オレンジ・レモン等の柑橘類、モモ、桜桃、アボガド、マンゴー、パパイヤ、トウガラシ、キュウリ、メロン、イチゴ、タバコ、トマト、ナス、芝、菊、ツツジ、およびその他の観賞用植物。
(2) Plant Growth Action The triazole derivative (I) has an effect of increasing the yield by adjusting its growth and an effect of improving its quality, etc., for a wide variety of crops and horticultural plants. Examples of such crops include: wheat, barley, buckwheat and other wheat, rice, rapeseed, sugarcane, corn, maize, soybeans, peas, peanuts, sugar beet, cabbage, garlic, radish, carrots, apples, pears Citrus fruits such as oranges, oranges, lemons, peaches, cherry peaches, avocados, mangoes, papayas, peppers, cucumbers, melons, strawberries, tobacco, tomatoes, eggplants, grass, chrysanthemums, azaleas, and other ornamental plants.
(3)工業材料保護効果
さらに、トリアゾール誘導体(I)は、工業材料を侵す広汎な有害微生物から材料を保護する優れた効果を示す。かかる微生物の例として以下が挙げられる:紙・パルプ劣化微生物(スライム形成菌を含む)であるアスペルギルス(Aspergillus sp.)、トリコデルマ(Trichoderma sp.)、ペニシリウム(Penicillium sp.)、ジェオトリカム(Geotrichum sp.)、ケトミウム(Chaetomium sp.)、カドホーラ(Cadophora sp.)、セラトストメラ(Ceratostomella sp.)、クラドスボリウム(Cladosporium sp.)、コーティシウム(Corticium sp.)、レンティヌス(Lentinus sp.)、レンズィテス(Lenzites sp.)、フォーマ(Phoma sp.)、ポリスティクス(Polysticus sp.)、プルラリア(Pullularia sp.)、ステレウム(Stereum sp.)、トリコスポリウム(Trichosporium sp.)、アエロバクタ−(Aerobacter sp.)、バシルス(Bacillus sp.)、デスルホビブリオ(Desulfovibrio sp.)、シュードモナス(Pseudomonas sp.)、フラボバクテリウム(Flavobacterium sp.)、ミクロコツカス(Micrococcus sp.)等、繊維劣化微生物であるアスペルギルスAspergillus sp.)、ペニシリウム(Penicillium sp.)、ケトミウム(Chaetomium sp.)、ミロテシウム(Myrothecium sp.)、クルブラリア(Curvularia sp.)、グリオマスティックス、(Gliomastix sp.)、メンノニエラ(Memnoniella sp.)、サルコポディウム(Sarcopodium sp.)、スタキボトリス(Stschybotrys sp.)、ステムフィリウム(Stemphylium sp.)、ジゴリンクス(Zygorhynchus sp.)、バシルス(bacillus sp.)、スタフィロコッカス(Staphylococcus sp.)等、木材変質菌であるオオウズラタゲ(Tyromyces palustris)、カワラタケ(Coriolus versicolor)、アスペルギルス(Aspergillus sp.)、ペニシリウム(Penicillium sp.)、リゾプス(Rhizopus sp.)、オーレオバシディウム(Aureobasidium sp.)、グリオクラデイウム(Gliocladum sp.)、クラドスポリウム(Cladosporium sp.)、ケトミウム(Chaetomium sp.)、トリコデルマ(Trichoderma sp.)等、皮革劣化微生物であるアスペルギルス(Aspergillus sp.)、ペニシリウム(Penicillium sp.)、ケトミウム(Chaetomium sp.)、クラドスポリウム(Cladosporium sp.)、ムコール(Mucor sp.)、パエシロミセス(Paecilomyces sp.)、ピロブス(Pilobus sp.)、プルラリア(Pullularia sp.)、トリコスポロン(Trichosporon sp.)、トリコテシウム(Tricothecium sp.)等、ゴム・プラスチック劣化微生物であるアスペルギルス(Aspergillus sp.)、ペニシリウム(Penicillium sp.)、リゾプス(Rhizopus sp.)、トリコデルマ(Trichoderma sp.)、ケトミウム(Chaetomium sp.)、ミロテシウム(Myrothecium sp.)、ストレプトマイセス(Streptomyces sp.)、シュードモナス(Pseudomonas sp.)、バシルス(Bacillus sp.)、ミクロコツカス(Micrococcus sp.)、セラチア(Serratia sp.)、マルガリノマイセス(Margarinomyces sp.)、モナスクス(Monascus sp.)等、塗料劣化微生物であるアスペルギルス(Aspergillus sp.)、ペニシリウム(Penicillium sp.)、クラドスポリウム(Cladosporium sp.)、オーレオバシディウム(Aureobasidium sp.)、グリオクラディウム(Gliocladium sp.)、ボトリオディプロディア(Botryodiplodia sp.)、マクロスポリウム(Macrosporium sp.)、モニリア(Monilia sp.)、フォーマ(Phoma sp.)、プルラリア((Pullularia sp.)、スポロトリカム(Sporotrichum sp.)、トリコデルマ(Trichoderma sp.)、バシルス((bacillus sp.)、プロテウス(Proteus sp.)、シュードモナス(Pseudomonas sp.)、およびセラチア(Serratia sp.)。
(3) Industrial Material Protection Effect Furthermore, the triazole derivative (I) exhibits an excellent effect of protecting the material from a wide range of harmful microorganisms that invade the industrial material. Examples of such microorganisms include: Aspergillus sp., Trichoderma sp., Penicillium sp., Geotrichum sp., Which are paper and pulp-degrading microorganisms (including slime-forming bacteria). ), Ketomium (Caetomium sp.), Cadophora sp., Ceratostomella sp., Cladosporium sp., Corticium sp., Lentinus sp., Lenzites sp.), Forma sp., Polysticus sp., Pullularia sp., Stereum sp., Trichosporium sp., Aerobacter sp., Bacillus sp., Desulfovibrio sp., Pseudomonas sp., Flavobacterium ( Flavobacterium sp.), Micrococcus sp., And other fiber-degrading microorganisms such as Aspergillus sp., Penicillium (Penicillium sp.), Ketomium (Chaetomium sp.), Myrothecium sp., Curvularia sp. ), Gliomastix, (Gliomastix sp.), Mennoniella sp., Sarcopodium, Stschybotrys sp., Stemphylium sp., Zygorhynchus sp. , Bacillus sp., Staphylococcus sp., And other wood-modifying fungi Tyromyces palustris, Coriolus versicolor, Aspergillus sp., Penicillium sp. (Rhizopus sp.), Aureobasidium sp., Glyocladium Gliocladum sp.), Cladosporium sp., Ketomium (Chaetomium sp.), Trichoderma sp., Etc., Aspergillus sp., Penicillium sp. Chaetomium sp., Cladosporium sp., Mucor sp., Paecilomyces sp., Pilobus sp., Pullularia sp., Trichosporon sp., Trichosporon sp. (Tricothecium sp.), Etc. Aspergillus sp., Penicillium sp., Rhizopus sp., Trichoderma sp., Chaetomium sp., Milotesium (Myrothecium sp.), Streptomyces sp., Pseudomonas sp., Bacillus Bacillus sp.), Micrococcus sp., Serratia sp., Margarinomyces sp., Monascus sp., Etc., Aspergillus sp., Penicillium (Penicillium sp.), Cladosporium sp., Aureobasidium sp., Gliocladium sp., Botryodiplodia sp., Macrosporium sp.), Monilia sp., Forma (Phoma sp.), Pullularia (Pullularia sp.), Sporotrichum sp., Trichoderma sp., Bacillus (. bacillus sp.), Proteus ( Proteus sp.), Pseudomonas sp., And Serratia sp.
(4)製剤
トリアゾール誘導体(I)を農園芸用薬剤の有効成分として適用するには、他の何らかの成分も加えずそのままでもよいが、通常は固体担体または液体担体、界面活性剤およびその他の製剤補助剤等と混合して粉剤、水和剤、粒剤および乳剤等の種々の形態に製剤して使用する。
(4) Formulation In order to apply the triazole derivative (I) as an active ingredient of an agricultural and horticultural agent, it may be left as it is without adding any other components, but usually a solid carrier or a liquid carrier, a surfactant and other preparations. It is mixed with adjuvants and formulated into various forms such as powders, wettable powders, granules and emulsions.
これらの製剤には有効成分としてトリアゾール誘導体(I)を、0.1〜95重量%、好ましくは0.5〜90重量%、より好ましくは2〜80重量%含まれるように製剤する。 These preparations are formulated so that the triazole derivative (I) is contained as an active ingredient in an amount of 0.1 to 95% by weight, preferably 0.5 to 90% by weight, more preferably 2 to 80% by weight.
製剤補助剤として使用する坦体、希釈剤および界面活性剤を例示すれば、まず、固体坦体として、タルク、カオリン、ベンナイト、珪藻土、ホワイトカーボンおよびクレー等が挙げられる。液体希釈剤としては、水、キシレン、トルエン、クロロベンゼン、シクロヘキサン、シクロヘキサノン、ジメチルスルホキシド、ジメチルホルムアミドおよびアルコール等が挙げられる。界面活性剤は、その効果により使い分けるのがよく、乳化剤としては、ポリオキシエチレンアルキルアリールエーテルおよびポリオキシエチレンソルビタンモノラウレート等を挙げることができ、分散剤としては、リグニンスルホン酸塩およびジブチルナフタリンスルホン酸塩等を挙げることができ、湿潤剤としては、アルキルスルホン酸塩およびアルキルフェニルスルホン酸塩等を挙げることができる。 For example, talc, kaolin, bennite, diatomaceous earth, white carbon, and clay are listed as solid carriers. Examples of the liquid diluent include water, xylene, toluene, chlorobenzene, cyclohexane, cyclohexanone, dimethyl sulfoxide, dimethylformamide and alcohol. Surfactants should be properly used depending on their effects. Examples of emulsifiers include polyoxyethylene alkylaryl ether and polyoxyethylene sorbitan monolaurate. Dispersants include lignin sulfonate and dibutyl naphthalene. Examples of the wetting agent include alkyl sulfonates and alkyl phenyl sulfonates.
製剤には、そのまま使用するものと水等の希釈剤で所定濃度に希釈して使用するものとがある。希釈して使用するときのトリアゾール誘導体(I)の濃度は0.001〜1.0%の範囲が望ましい。 Some preparations are used as they are, while others are diluted to a predetermined concentration with a diluent such as water. The concentration of the triazole derivative (I) when used after dilution is preferably in the range of 0.001 to 1.0%.
また、トリアゾール誘導体(I)の使用量は、畑、田、果樹園および温室等の農園芸地1haあたり、20〜5000g、より好ましくは50〜2000gである。これらの使用濃度および使用量は剤形、使用時期、使用方法、使用場所および対象作物等によっても異なるため、上記の範囲にこだわることなく増減することが可能である。 Moreover, the usage-amount of a triazole derivative (I) is 20-5000g per agricultural / horticultural land 1ha, such as a field, a field, an orchard, and a greenhouse, More preferably, it is 50-2000g. Since these use concentrations and amounts vary depending on the dosage form, use time, use method, use place, target crop, etc., they can be increased or decreased without sticking to the above range.
さらに、トリアゾール誘導体(I)は他の有効成分、例えば以下に例示するような殺菌剤、殺虫剤、殺ダニ剤、および除草剤等と組み合わせ、農園芸用薬剤としての性能を高めて使用することもできる。 Further, the triazole derivative (I) should be used in combination with other active ingredients such as fungicides, insecticides, acaricides and herbicides as exemplified below to enhance performance as agricultural and horticultural agents. You can also.
<抗菌性物質>
アシベンゾラーSメチル、2−フェニルフェノール(OPP)、アザコナゾール、アゾキシストロビン、アミスルブロム、ビキサフェン、ベナラキシル、ベノミル、ベンチアバリカルブ−イソプロピル、ビカルボネイト、ビフェニル、ビテルタノール、ブラスチシジン−S、ボラックス、ボルドー液、ボスカリド、ブロムコナゾール、ブロノポール、ブピリメート、セックブチラミン、カルシウムポリスルフィド、カプタフォル、キャプタン、カルベンダジム、カルボキシン、カルプロパミド、キノメチオネート、クロロネブ、クロロピクリン、クロロタロニル、クロゾリネート、シアゾファミド、シフルフェナミド、シモキサニル、シプロコナゾール、シプロジニル、ダゾメット、デバカルブ、ジクロフルアニド、ジクロシメット、ジクロメジン、ジクロラン、ジエトフェンカルブ、ジフェノコナゾール、ジフルメトリン、ジメトモルフ、ジメトキシストロビン、ジニコナゾール、ジノカップ、ジフェニルアミン、ジチアノン、ドデモルフ、ドジン、エディフェンフォス、エポキシコナゾール、エタポキサム、エトキシキン、エトリジアゾール、エネストロブリン、ファモキサドン、フェナミドン、フェナリモル、フェンブコナゾール、フェンフラム、フェンヘキサミド、フェノキサニル、フェンピクロニル、フェンプロピジン、フェンプロピモルフ、フェンチン、フェルバム、フェリムゾン、フルアジナム、フルジオキソニル、フルモルフ、フルオロミド、フルオキサストロビン、フルキンコナゾール、フルシラゾール、フルスルファミド、フルトラニル、フルトリアフォル、フォルペット、フォセチル−アルミニウム、フベリダゾール、フララキシル、フラメトピル、フルオピコリド、フルオピラム、グアザチン、ヘキサクロロベンゼン、ヘキサコナゾール、ヒメキサゾール、イマザリル、イミベンコナゾール、イミノクタジン、イプコナゾール、イプロベンフォス、イプロジオン、イプロバリカルブ、イソプロチオラン、イソピラザム、イソチアニル、カスガマイシン、銅調製物例えば水酸化銅、ナフテン酸銅、オキシ塩化銅、硫酸銅、酸化銅、オキシン−銅、クレゾキシムメチル、マンコカッパー、マンコゼブ、マネブ、マンジプロパミド、メパニピリム、メプロニル、メタラキシル、メトコナゾール、メチラム、メトミノスウトロビン、ミルジオマイシン、ミクロブタニル、ニトロタル−イソプロピル、ヌアリモル、オフレース、オキサジキシル、オキソリニック酸、オキスポコナゾール、オキシカルボキシン、オキシテトラサイクリン、ペフラゾエート、オリサストロビン、ペンコナゾール、ペンシクロン、ペンチオピラド、ピリベンカルブ、フサライド、ピコキシストロビン、ピペラリン、ポリオキシン、プロベナゾール、プロクロラズ、プロシミドン、プロパモカルブ、プロピコナゾール、プロピネブ、プロキナジド、プロチオコナゾール、ピラクロストロビン、ピラゾフォス、ピリフェノックス、ピリメタニル、ピロキロン、キノキシフェン、キントゼン、シルチオファム、シメコナゾール、スピロキサミン、硫黄および硫黄調製物、テブコナゾール、テクロフタラム、テクナゼン、テトラコナゾール、チアベンダゾール、チフルザミド、チオファネート−メチル、チラム、チアジニル、トルクロフォス−メチル、トリルフルアニド、トリアジメフォン、トリアジメノール、トリアゾキシド、トリシクラゾール、トリデモルフ、トリフロキシストロビン、トリフルミゾール、トリホリン、トリチコナゾール、バリダマイシン、ビンクロゾリン、ジネブ、ジラム、ゾキサミド、アミスルブロム、セダキサン、フルチアニル、バリフェナール、アメトクトラジン、ジモキシストロビン、メトラフェノン、ヒドロキシイソキサゾールならびにメタスルホカルブ等。
<Antimicrobial substances>
Acibenzolar S-methyl, 2-phenylphenol (OPP), azaconazole, azoxystrobin, amisulbrom, bixaphene, benalaxyl, benomyl, bench avaricarb-isopropyl, bicarbonate, biphenyl, viteltanol, blasticidin-S, borax, Bordeaux, boscalid, Bromuconazole, bronopol, bupirimate, secbutyramine, calcium polysulfide, captafor, captan, carbendazim, carboxin, carpropamide, quinomethionate, chloronebu, chloropicrin, chlorothalonil, clozolinate, cyazofamide, cyflufenamide, simoxanil, cyproconil, cyprodiazole Dazomet, debacarb, diclofuranide, diclocimet, dicro Gin, Dichlorane, Dietofencarb, Difenoconazole, Diflumethrin, Dimethomorph, Dimethoxystrobin, Diniconazole, Dinocup, Diphenylamine, Dithianon, Dodemorph, Dodine, Edifenfoss, Epoxyconazole, Etapoxam, Ethoxyquin, Etridiodone, Enestropheline, Namidon Fenarimol, fenbuconazole, fenflam, fenhexamide, phenoxanyl, fenpicuronyl, fenpropidin, fenpropimorph, fentin, felvam, ferrimzone, fluazinam, fludioxonil, flumorph, fluoromide, floxastrobin, fluquinconazole, flusilazole, flusulfamide , Flutolanil, flutriafol, Olpetet, Focetyl-aluminum, Fuberidazole, Furaxil, Frametopyr, Fluopicolide, Fluopyram, Guazatine, Hexachlorobenzene, Hexaconazole, Himexazole, Imazalil, Imibenconazole, Iminocazine, Ipconazole, Iprobenfos, Iprodithiol, Isoprovalil , Kasugamycin, copper preparations such as copper hydroxide, copper naphthenate, copper oxychloride, copper sulfate, copper oxide, oxine-copper, crezoxime methyl, manco kappa, mancozeb, maneb, mandipropamide, mepanipyrim, mepronil, metalaxyl, metconazole , Methylam, metminosoutrobin, myrdiomycin, microbutanyl, nitrotal-isopropyl, nuari Mole, off-race, oxadixyl, oxolinic acid, oxpoconazole, oxycarboxyl, oxytetracycline, pefrazoate, orisatrobin, penconazole, pencyclon, penthiopyrad, pyribencarb, fusalide, picoxystrobin, piperalin, polyoxin, probenazole, prochloraz, procymidone , Propamocarb, propiconazole, propinebole, proquinazide, prothioconazole, pyraclostrobin, pyrazophos, pyrifenox, pyrimethanil, pyroxylone, quinoxyphene, quintozen, silthiofam, cimeconazole, spiroxamine, sulfur and sulfur preparation, tebuconazole, teclophthalam, , Tetraconazole, thiabendazole, tifluzamide, thi Phanate-Methyl, Tyram, Thiazinyl, Torcrofos-Methyl, Tolylfluanid, Triadimefone, Triadimenol, Triazoxide, Tricyclazole, Tridemorph, Trifloxystrobin, Triflumizole, Trifolin, Triticonazole, Validamycin, Vinclozoline, Zineb, ziram, zoxamide, amisulbrom, sedaxane, flutianil, varifenal, amethoctrazine, dimoxystrobin, metolaphenone, hydroxyisoxazole and metasulfocarb.
<殺虫剤/殺ダニ剤/殺線虫剤>
アバメクチン、アセフェート、アクリナトリン、アラニカルブ、アルジカルブ、アレトリン、アミトラズ、アベルメクチン、アザジラクチン、アザメチフォス、アジンフォス−エチル、アジンフォス−メチル、アゾサイクロチン、バシルス・フィルムス、バシルス・ズブチルス、バシルス・ツリンジエンシス、ベンジオカルブ、ベンフラカルブ、ベンスルタップ、ベンゾキシメイト、ビフェナゼイト、ビフェントリン、ビオアレトリン、ビオレスメトリン、ビストリフルロン、ブプロフェジン、ブトカルボキシン、ブトキシカルボキシン、カズサフォス、カルバリル、カルボフラン、カルボスルファン、カータップ、CGA50439、クロルデイン、クロレトキシフォス、クロルフェナピル、クロルフェンビンフォス、クロルフルアズロン、クロルメフォス、クロルピリフォス、クロルピリフォスメチル、クロマフェノザイド、クロフェンテジン、クロチアニジン、クロラントラリニプロール、コウンパフォス、クリオライト、シアノフォス、シクロプロトリン、シフルトリン、シハロトリン、シヘキサチン、シペルメトリン、シフェノトリン、シロマジン、シアザピル、シエノピラフェン、DCIP、DDT、デルタメトリン、デメトン−S−メチル、ジアフェンチウロン、ジアジノン、ジクロロフェン、ジクロロプロペン、ジクロルボス、ジコフォル、ジクロトフォス、ジシクラニル、ジフルベンズロン、ジメトエート、ジメチルビンフォス、ジノブトン、ジノテフラン、エマメクチン、エンドスルファン、EPN、エスフェンバレレート、エチオフェンカルブ、エチオン、エチプロール、エトフェンプロックス、エトプロフォス、エトキサゾール、ファムフル、フェナミフォス、フェナザキン、フェンブタチンオキシド、フェニトロチオン、フェノブカルブ、フェノチオカルブ、フェノキシカルブ、フェンプロパトリン、フェンピロキシメート、フェンチオン、フェンバレレート、フイプロニル、フロニカミド、フルアクロピリム、フルシクロクスロン、フルシトリネート、フルフェノクスロン、フルメトリン、フルバリネート、フルベンジアミド、フォルメタネート、フォスチアゼート、ハルフェンプロクス、フラチオカルブ、ハロヘノジド、ガンマ−HCH、ヘプテノフォス、ヘキサフルムロン、ヘキシチアゾックス、ヒドラメチルノン、イミダクロプリド、イミプロトリン、インドキサカルブ、イソプロカルブ、イソキサチオン、ルフェヌロン、マラチオン、メカルバム、メタム、メタミドフォス、メチダチオン、メチオカルブ、メトミル、メトプレン、メトスリン、メトキシフェノジド、メトルカルブ、ミルベメクチン、モノクロトフォス、ナレド、ニコチン、ニテンピラム、ノバルロン、ノビフルムロン、オメトエート、オキサミル、オキシデメトンメチル、パラチオン、パーメトリン、フェントエート、フォレート、フォサロン、フォスメット、フォスファミドン、フォキシム、ピリミカルブ、ピリミフォスメチル、プロフェノフォス、プロポクスル、プロチオフォス、ピメトロジン、ピラクロフォス、ピレスリン、ピリダベン、ピリダリル、ピリミジフェン、ピリプロキシフェン、ピリフルキナゾン、ピリプロール、キナルフォス、シラフルオフェン、スピノサド、スピロジクロフェン、スピロメシフェン、スピロテトラマット、スルフラミド、スルフォテップ、SZI−121、テブフェノジド、テブフェンピラド、テブピリムフォス、テフルベンズロン、テフルトリン、テメフォス、テルブフォス、テトラクロルビンフォス、チアクロプリド、チアメトキサム、チオジカルブ、チオファノックス、チオメトン、トルフェンピラド、トラロメトリン、トラロピリル、トリアザメート、トリアゾフォス、トリクロルフオン、トリフルムロン、バミドチオン、バリフェナル、XMC、キシリルカルブ、イミシアホスおよびレピメクチン等。
<Insecticide / acaricide / nematicide>
Abamectin, Acephate, Acrinathrin, Alanicarb, Aldicarb, Alletrin, Amitraz, Avermectin, Azadirachtin, Azamethyphos, Azinphos-ethyl, Azinphos-methyl, Azocycline, Bacillus filmus, Bacillus subtilis, Bacillus thuringibulbbenthulbenbencarben , Benzoxymate, Bifenazite, Bifenthrin, Bioarethrin, Bioresmethrin, Bistriflurone, Buprofezin, Butocaboxin, Butoxycarboxyne, Kazusafos, Carbaryl, Carbofuran, Carbosulfan, Cartap, CGA50439, Chlordein, Chloretifol, Chlorfenapyr Fenbinfoss, Chlorfluazuron Chlormefos, Chlorpyrifos, Chlorpyrifosmethyl, Chromaphenozide, Clofentedine, Clothianidin, Chloranthraliniprol, Counpafos, Cryolite, Cyanophos, Cycloproton, Cyfluthrin, Cyhalothrin, Cihexatin, Cipermethrin, Cifenotrin, Cyromazine, Ciazapyr, Sienopyrafen, DCIP, DDT, Deltamethrin, Demeton-S-methyl, Diafenthiuron, Diazinone, Dichlorophene, Dichloropropene, Dichlorvos, Dicophor, Dicrotophos, Dicyclanil, Diflubenzuron, Dimethoate, Dimethylvinphos, Dinobutone, Dinobutone , Emamectin, endosulfan, EPN, esfenvalerate, etiophencarb, ethion, Tiprol, etofenprox, etoprofos, etoxazole, famflu, fenamifos, phenazaquin, fenbutatin oxide, fenitrothion, fenocarb, phenothiocarb, phenoxycarb, fenpropatrine, fenpyroximate, fenthionate, fenvalerate, fipronil, flunipyamide Ron, flucitrinate, flufenoxuron, flumethrin, fulvalinate, fulvendiamide, formethanate, fostiazate, halfenprox, furthiocarb, halohenozide, gamma-HCH, heptenofos, hexaflumuron, hexithiazox, hydramethylnon , Imidacloprid, imiprothrin, indoxacarb, isoprocar Bu, isoxathion, lufenuron, malathion, mecarbam, metham, methamidophos, methidathione, metiocarb, methomyl, methoprene, methosrine, methoxyphenozide, metorcarb, milbemectin, monocrotofos, nared, nicotine, nitenpyram, novalflumetron, oxyflumetron Tonmethyl, parathion, permethrin, phentoate, folate, fosaron, phosmet, phosfamidone, foxim, pirimicarb, pirimiphos methyl, profenofos, propoxur, prothiophos, pymetrozine, pyracrofos, pyrethrin, pyridaben, pyridalyl, pyrimidifene, pyriproxy Fen, Pyrifluquinazone, Pyriprole, Quinarfos, Shirafu Ofen, Spinosad, Spirodiclofen, Spiromesifen, Spirotetramat, Sulfamide, Sulfotep, SZI-121, Tebufenozide, Tebufenpyrad, Tebupyrimfos, Teflubenzuron, Tefluthrin, Temefos, Terbufos, Tetrachlorbinfos, Thiacloprio, Thiamethioxam Fanox, thiometon, tolfenpyrad, tralomethrin, tralopyril, triazamate, triazophos, trichlorphone, triflumuron, bamidithione, varifenal, XMC, xylylcarb, imisiaphos and lepimectin.
<植物成長調節剤>
アンシミドール、6−ベンジルアミノプリン、パクロブトラゾール、ジクロブトラゾール、ウニコナゾール、メチルシクロプロペン、メピコートクロリド、エセフォン、クロルメコートクロライド、イナベンフィド、プロヘキサジオンおよびその塩、ならびにトリネキサパックエチル等。また、植物ホルモンとしてのジャスモン酸、ブラシノステロイドおよびジベレリン等。
<Plant growth regulator>
Ansimidol, 6-benzylaminopurine, paclobutrazole, diclobutrazole, uniconazole, methylcyclopropene, mepiquat chloride, ethephone, chlormequat chloride, inabenfide, prohexadione and salts thereof, and trinexa Pack ethyl etc. Also, jasmonic acid, brassinosteroid and gibberellin as plant hormones.
トリアゾール誘導体(I)を有効成分として含む工業用材料保護剤は、トリアゾール誘導体(I)以外にも種々の成分を含んでいてもよい。トリアゾール誘導体(I)を有効成分として含む工業用材料保護剤は、適当な液体担体に溶解させるか、もしくは分散させるか、または固体担体と混合して使用することができる。トリアゾール誘導体(I)を有効成分として含む工業用材料保護剤は、必要に応じて、さらに乳化剤、分散剤、展着剤、浸透剤、湿潤剤および安定剤等を含んでいてもよい。また、トリアゾール誘導体(I)を有効成分として含む工業用材料保護剤の剤型としては、水和剤、粉剤、粒剤、錠剤、ペースト剤、懸濁剤および噴霧材等を挙げることができる。トリアゾール誘導体(I)を有効成分として含む工業用材料保護剤は、他の殺菌剤、殺虫剤および劣化防止剤等を含んでいてもよい。 The industrial material protective agent containing the triazole derivative (I) as an active ingredient may contain various components in addition to the triazole derivative (I). The industrial material protective agent containing the triazole derivative (I) as an active ingredient can be used by being dissolved or dispersed in a suitable liquid carrier, or mixed with a solid carrier. The industrial material protective agent containing the triazole derivative (I) as an active ingredient may further contain an emulsifier, a dispersant, a spreading agent, a penetrating agent, a wetting agent, a stabilizer and the like, if necessary. Examples of the dosage form of the industrial material protective agent containing the triazole derivative (I) as an active ingredient include wettable powders, powders, granules, tablets, pastes, suspensions and sprays. The industrial material protective agent containing the triazole derivative (I) as an active ingredient may contain other fungicides, insecticides, deterioration inhibitors and the like.
液体担体としては、有効成分と反応しないものであれば特に限定されるものではない。液体担体としては、例えば、水、アルコール類(例えば、メチルアルコール、エチルアルコール、エチレングリコールおよびセロソルブ等)、ケトン類(例えば、アセトンおよびメチルエチルケトン等)、エーテル類(例えばジメチルエーテル、ジエチルエーテル、ジオキサンおよびテトラヒドロフラン等)、芳香族炭化水素類(例えば、ベンゼン、トルエン、キシレンおよびメチルナフタレン等)、脂肪族炭化水素類(例えばガソリン、ケロシン、灯油、機械油および燃料油等)、酸アミド類(例えばジメチルホルムアミドおよびN−メチルピロリドン等)ハロゲン化炭化水素類(例えば、クロロホルムおよび四塩化炭素等)、エステル類(例えば、酢酸エチルエステルおよび脂肪酸のグリセリンエステル等)、ニトリル類(例えば、アセトニトリル等)ならびにジメチルスルホキシド等を挙げることができる。 The liquid carrier is not particularly limited as long as it does not react with the active ingredient. Examples of the liquid carrier include water, alcohols (eg, methyl alcohol, ethyl alcohol, ethylene glycol and cellosolve), ketones (eg, acetone and methyl ethyl ketone), ethers (eg, dimethyl ether, diethyl ether, dioxane and tetrahydrofuran). Etc.), aromatic hydrocarbons (eg benzene, toluene, xylene and methylnaphthalene), aliphatic hydrocarbons (eg gasoline, kerosene, kerosene, machine oil and fuel oil), acid amides (eg dimethylformamide) And N-methylpyrrolidone) halogenated hydrocarbons (eg chloroform and carbon tetrachloride), esters (eg ethyl acetate and glycerin esters of fatty acids), nitriles (eg aceto Nitrile, etc.) as well as dimethyl sulfoxide and the like.
また、固体担体としては、カオリンクレー、ベントナイト、酸性白土、パイロフィライト、タルク、珪藻土、方解石、尿素および硫酸アンモニウム等の微粉末または粒状物が使用できる。 As the solid support, fine powders or granular materials such as kaolin clay, bentonite, acid clay, pyrophyllite, talc, diatomaceous earth, calcite, urea and ammonium sulfate can be used.
乳化剤および分散剤としては、石鹸類、アルキルスルホン酸、アルキルアリールスルホン酸、ジアルキルスルホコハク酸、第4級アンモニウム塩、オキシアルキルアミン、脂肪酸エステル、ポリアルキレンオキサイド系およびアンヒドロソルビトール系等の界面活性剤が使用できる。 As emulsifiers and dispersants, surfactants such as soaps, alkylsulfonic acids, alkylarylsulfonic acids, dialkylsulfosuccinic acids, quaternary ammonium salts, oxyalkylamines, fatty acid esters, polyalkylene oxides and anhydrosorbitols Can be used.
トリアゾール誘導体(I)を有効成分として製剤中に含有させる場合、その含有割合は、剤型および使用目的によっても異なるが、製剤の全量に対して、0.1〜99.9重量%とすればよい。なお、実際の使用時においては、その処理濃度は、例えば0.005〜5重量%、好ましくは0.01〜1重量%となるように適宜、溶剤、希釈剤および増量剤等を加えて調整するのが好ましい。 When the triazole derivative (I) is contained in the preparation as an active ingredient, the content ratio varies depending on the dosage form and purpose of use, but is 0.1 to 99.9% by weight with respect to the total amount of the preparation. Good. In actual use, the treatment concentration is adjusted by adding a solvent, a diluent, an extender, etc., as appropriate, for example, 0.005 to 5% by weight, preferably 0.01 to 1% by weight. It is preferable to do this.
以上説明したように、トリアゾール誘導体(I)は、植物病害を引き起こす多くの菌に対して優れた殺菌作用を示す。すなわち、トリアゾール誘導体(I)を有効成分として含む農園芸用病害防除剤は、人畜に対する毒性が低く取扱い安全性に優れ、かつ広範な植物病害に対して高い防除効果を示すとともに、薬害の小さな農園芸用病害防除剤を実現することができる。 As described above, the triazole derivative (I) exhibits an excellent bactericidal action against many bacteria that cause plant diseases. That is, an agricultural and horticultural disease control agent containing the triazole derivative (I) as an active ingredient is low in toxicity to human livestock, has excellent handling safety, exhibits a high control effect on a wide range of plant diseases, and has little phytotoxicity. A horticultural disease control agent can be realized.
以下に実施例を示し、本発明の実施の形態についてさらに詳しく説明する。もちろん、本発明は以下の実施例に限定されるものではなく、細部については様々な態様が可能であることはいうまでもない。さらに、本発明は上述した実施形態に限定されるものではなく、請求項に示した範囲で種々の変更が可能であり、それぞれ開示された技術的手段を適宜組み合わせて得られる実施形態についても本発明の技術的範囲に含まれる。また、本明細書中に記載された文献の全てが参考として援用される。 Examples will be shown below, and the embodiments of the present invention will be described in more detail. Of course, the present invention is not limited to the following examples, and it goes without saying that various aspects are possible in detail. Further, the present invention is not limited to the above-described embodiments, and various modifications can be made within the scope shown in the claims, and the present invention is also applied to the embodiments obtained by appropriately combining the disclosed technical means. It is included in the technical scope of the invention. Moreover, all the literatures described in this specification are used as reference.
〔製造例1:1−メチル−2−オキソ−シクロペンタンカルボン酸メチルの合成〕
モレキュラシーブ4A乾燥アセトン170mlに無水炭酸カリウム51.83gを加え、攪拌しながら、2−メトキシカルボニルシクロペンタノン35.54gおよびヨウ化メチル39.0gを順次添加した。反応途中で発熱したため氷水で冷却し、発熱が収まったのち室温下に戻し、終夜攪拌した。反応液を濾過し、残渣をアセトン洗浄した。濾過液を減圧濃縮し、残渣に水およびジエチルエーテルを加え分配した。有機層を飽和炭酸水素ナトリウム水溶液、水および飽和食塩水で順次洗浄し、無水硫酸ナトリウムで乾燥した。有機層を濾過、洗浄した後、減圧下、溶媒を留去して、1−メチル−2−オキソ−シクロペンタンカルボン酸メチル(以下、化合物(7)とする)の粗反応物を薄黄色液状物として35.02g(収率89.7%)得た。この粗反応物を単蒸留にて精製し、無色液状物26.86g(収率68.8%)を得た。
97−98℃/1.4kPa
1H-NMR(400MHz,CDCl3,δppm):
1.32(s,3H), 1.83-2.11(m,3H), 2.27-2.56(m,3H), 3.71(s,3H)
〔製造例2:3−(4−クロロベンジリデン)−1−メチル−2−オキソ−シクロペンタンカルボン酸メチルの合成1〕
製造例1で得た化合物(7)10.0gと、p−クロロベンズアルデヒド9.9gとをメタノール100mlに溶解し、0℃まで氷水冷却した後、28%ナトリウムメトキシド13.60gを添加した。同温で45分攪拌した後、減圧下で反応液を一部量留去し、残渣に冷水を加え、酢酸エチルで抽出した。有機層を、水および飽和食塩水で順次洗浄した後、無水硫酸ナトリウムで乾燥した。有機層を濾過、洗浄した後、減圧下、溶媒を留去して3−(4−クロロベンジリデン)−1−メチル−2−オキソ−シクロペンタンカルボン酸メチル(以下、化合物(6)とする)の粗反応物を黄色油状物として17.45g得た。この粗反応物をシリカゲルクロマトグラフィーにて精製し、化合物(6)を11.50g(収率64.4%)得た。
1H-NMR(400MHz,CDCl3,δppm):
1.43(s,3H), 1.87(ddd, 1H, J=7.6, 8.4, 13.1Hz), 2.65(ddd, 1H, J=4.7, 8.5, 13.2Hz), 2.89-3.08(m, 2H),3.72(s,3H), 7.39(dd, 2H, J=8.6Hz), 7.42(t-like, 1H, J=2.7Hz), 7.48(d,2H,J=8.5Hz)
〔製造例3:3−(4−クロロベンジリデン)−1−メチル−2−オキソ−シクロペンタンカルボン酸メチルの合成2〕
ナトリウムメトキシドの代わりに炭酸カリウムを用いて、製造例2と同様の反応を行い、化合物(6)を得た。収率を表1に示す。
[Production Example 1: Synthesis of methyl 1-methyl-2-oxo-cyclopentanecarboxylate]
51.83 g of anhydrous potassium carbonate was added to 170 ml of molecular sieve 4A dry acetone, and 35.54 g of 2-methoxycarbonylcyclopentanone and 39.0 g of methyl iodide were successively added with stirring. Since heat was generated during the reaction, the reaction solution was cooled with ice water. After the heat generation stopped, the temperature was returned to room temperature and stirred overnight. The reaction solution was filtered, and the residue was washed with acetone. The filtrate was concentrated under reduced pressure, and water and diethyl ether were added to the residue for partitioning. The organic layer was washed successively with saturated aqueous sodium hydrogen carbonate solution, water and saturated brine, and dried over anhydrous sodium sulfate. The organic layer was filtered and washed, and then the solvent was distilled off under reduced pressure to give a crude reaction product of methyl 1-methyl-2-oxo-cyclopentanecarboxylate (hereinafter referred to as compound (7)) as a pale yellow liquid. As a result, 35.02 g (yield 89.7%) was obtained. This crude reaction product was purified by simple distillation to obtain 26.86 g of colorless liquid (yield 68.8%).
97-98 ° C / 1.4kPa
1 H-NMR (400 MHz, CDCl 3 , δ ppm):
1.32 (s, 3H), 1.83-2.11 (m, 3H), 2.27-2.56 (m, 3H), 3.71 (s, 3H)
[Production Example 2: Synthesis 1 of methyl 3- (4-chlorobenzylidene) -1-methyl-2-oxo-cyclopentanecarboxylate]
10.0 g of the compound (7) obtained in Production Example 1 and 9.9 g of p-chlorobenzaldehyde were dissolved in 100 ml of methanol, cooled to 0 ° C. with ice water, and 13.60 g of 28% sodium methoxide was added. After stirring at the same temperature for 45 minutes, a part of the reaction solution was distilled off under reduced pressure, and cold water was added to the residue, followed by extraction with ethyl acetate. The organic layer was washed successively with water and saturated brine, and then dried over anhydrous sodium sulfate. The organic layer was filtered and washed, and then the solvent was distilled off under reduced pressure to remove methyl 3- (4-chlorobenzylidene) -1-methyl-2-oxo-cyclopentanecarboxylate (hereinafter referred to as compound (6)). Was obtained as a yellow oil. The crude reaction product was purified by silica gel chromatography to obtain 11.50 g (yield 64.4%) of compound (6).
1 H-NMR (400 MHz, CDCl 3 , δ ppm):
1.43 (s, 3H), 1.87 (ddd, 1H, J = 7.6, 8.4, 13.1Hz), 2.65 (ddd, 1H, J = 4.7, 8.5, 13.2Hz), 2.89-3.08 (m, 2H), 3.72 ( s, 3H), 7.39 (dd, 2H, J = 8.6Hz), 7.42 (t-like, 1H, J = 2.7Hz), 7.48 (d, 2H, J = 8.5Hz)
[Production Example 3: Synthesis 2 of methyl 3- (4-chlorobenzylidene) -1-methyl-2-oxo-cyclopentanecarboxylate 2]
The same reaction as in Production Example 2 was performed using potassium carbonate instead of sodium methoxide to obtain compound (6). The yield is shown in Table 1.
〔製造例4:3−(4−クロロベンジリデン)−2−ヒドロキシ−1−メチル−2−[1,2,4]トリアゾール−1−イルメチルシクロペンタンカルボン酸メチルの合成〕
(1)7−(4−クロロベンジリデン)−4−メチル−1−オキサスピロ[2.4]シクロペンタンカルボン酸メチルの合成
60%水素化ナトリウム0.260gを採り、ヘキサンで1回洗浄した。ここに無水DMSO5.0mlを加え、80℃まで昇温した後、80℃で3分間攪拌した。室温下に戻し、内温70℃のときに無水THF15mlを加え、ドライアイス−アセトン溶液を用いて−10℃まで冷却した。次いで、ここに、無水DMSO5mlに溶解したトリメチルスルホニウムヨージド1.15gを3分かけ滴下し、滴下後−10℃で15分攪拌した。この溶液に、無水THF4mlに溶解した製造例2で得た化合物(6)1.40gを滴下した。滴下後、室温下で3.5時間攪拌した。THFを留去した後、残渣に水を加え、酢酸エチルで抽出した。有機層を、水および飽和食塩水で順次洗浄した後、無水硫酸ナトリウムで乾燥した。有機層を濾過、洗浄した後、減圧下、溶媒を留去して7−(4−クロロベンジリデン)−4−メチル−1−オキサスピロ[2.4]シクロペンタンカルボン酸メチル(以下、化合物(5)とする)の粗反応物を橙色飴状物として0.933g得た。
[Production Example 4: Synthesis of methyl 3- (4-chlorobenzylidene) -2-hydroxy-1-methyl-2- [1,2,4] triazol-1-ylmethylcyclopentanecarboxylate]
(1) Synthesis of methyl 7- (4-chlorobenzylidene) -4-methyl-1-oxaspiro [2.4] cyclopentanecarboxylate 0.260 g of 60% sodium hydride was taken and washed once with hexane. To this, 5.0 ml of anhydrous DMSO was added, and the temperature was raised to 80 ° C., followed by stirring at 80 ° C. for 3 minutes. The temperature was returned to room temperature, 15 ml of anhydrous THF was added when the internal temperature was 70 ° C, and the mixture was cooled to -10 ° C using a dry ice-acetone solution. Next, 1.15 g of trimethylsulfonium iodide dissolved in 5 ml of anhydrous DMSO was added dropwise over 3 minutes, and the mixture was stirred at −10 ° C. for 15 minutes. To this solution, 1.40 g of the compound (6) obtained in Production Example 2 dissolved in 4 ml of anhydrous THF was added dropwise. After dropping, the mixture was stirred at room temperature for 3.5 hours. After THF was distilled off, water was added to the residue and the mixture was extracted with ethyl acetate. The organic layer was washed successively with water and saturated brine, and then dried over anhydrous sodium sulfate. The organic layer was filtered and washed, and then the solvent was distilled off under reduced pressure to obtain methyl 7- (4-chlorobenzylidene) -4-methyl-1-oxaspiro [2.4] cyclopentanecarboxylate (hereinafter referred to as compound (5). )) Was obtained as an orange-colored product.
(2)3−(4−クロロベンジリデン)−2−ヒドロキシ−1−メチル−2−[1,2,4]トリアゾール−1−イルメチルシクロペンタンカルボン酸メチルの合成
化合物(5)の粗反応物をDMF3mlに溶解し、これを、1,2,4−トリアゾール0.444gと炭酸カリウム1.74gとを加えたDMF6mlの溶液に添加した。添加後、90℃で2時間攪拌した。反応液に水を加え、酢酸エチルで抽出した。有機層を、水および飽和食塩水で順次洗浄し、無水硫酸ナトリウムで乾燥した。減圧下、溶媒を留去して3−(4−クロロベンジリデン)−2−ヒドロキシ−1−メチル−2−[1,2,4]トリアゾール−1−イルメチルシクロペンタンカルボン酸メチル(以下、化合物(4)とする)の粗反応物を暗褐色飴状物として0.881g得た。この粗反応物をシリカゲルクロマトグラフィーにて精製し、化合物(4)を2種の異性体混合物として0.200g(化合物(6)からの収率11.0%)得た。
異性体比 Isomer−I:Isomer−II=81:19
さらに、化合物(6)32.6gを用いて上記と同様の反応を別途行った。結果、上記で得た化合物(4)と合わせて、計4.2gの化合物(4)を得た。得られた化合物(4)に酢酸エチルを加え、70℃に加熱した後、超音波洗浄機を用いて固形物を分散粉砕させた。次いで、ヘキサンを加え、再度70℃まで加熱した後、室温下、終夜放置した。固形物をG4ガラスフィルターにて濾過し、酢酸エチル/ヘキサンの混合溶媒で洗浄した後、50℃で熱風乾燥し、白色粉末物を2.80g得た。
融点:152.9℃
異性体比 Isomer−I:Isomer−II=81.5:18.5
Isomer−I:
1H-NMR(400MHz,CDCl3,δppm)
1.24(s,3H), 1.84-1.92(m, 1H), 2.40-2.50(m, 1H), 2.61-2.74(m, 2H), 3.71(s,3H), 4.28(d, 1H, J=14.1Hz), 4.33(d, 1H, J=14.3Hz), 5.89(t-like, 1H, J=2.5Hz), 7.11(d, 2H, J=8.6Hz), 7.26(d, 2H, J=8.6Hz) 7.86(s, 1H),
8.09(s, 1H)
Isomer−II:
1H-NMR(400MHz,CDCl3,δppm)
1.42(s,3H), 1.78-1.92(m, 1H), 2.40-2.50(m, 1H), 2.61-2.74(m, 2H), 3.63 or 3.70(s,3H), 4.33(d, 1H, J=14.1Hz), 4.49(d, 1H, J=14.0Hz), 6.00(t-like, 1H, J=2.5Hz), 7.14(d, 2H, J=8.8Hz), 7.26(d, 2H, J=8.8Hz) 7.81(s, 1H), 8.29(s, 1H)
〔製造例5:5−(4−クロロベンジリデン)−2−ヒドロキシメチル−2−メチル−1−[1,2,4]トリアゾール−1−イルメチルシクロペンタノールの合成〕
製造例4で得た化合物(4)1.873gにTHF45mlおよびメタノール9mlを加えて溶解し、氷水冷却した。次いで、塩化カルシウム719mgおよび水素化ホウ素ナトリウム495mgを順次加え、1.5℃で3時間攪拌した。TLC分析により化合物(4)が残存していたため、塩化カルシウム701mgおよび水素化ホウ素ナトリウム503mgをさらに追加した。同温度で40分間攪拌した後、室温下に戻し、終夜攪拌した。反応液を水に注入し、クロロホルムで抽出した。有機層を、水および飽和食塩水で順次洗浄し、無水硫酸ナトリウムで乾燥した。有機層を濾過、洗浄した後、減圧下、溶媒を留去して5−(4−クロロベンジリデン)−2−ヒドロキシメチル−2−メチル−1−[1,2,4]トリアゾール−1−イルメチルシクロペンタノール(以下、化合物(3)とする)の粗反応物を白色固形物として1.78g得た。この固形物にクロロホルム15mlおよび酢酸エチル1.5mlを加え、超音波洗浄機を用いて分散し、冷蔵庫で1時間冷却した。固形物をG4ガラスフィルターにて濾過して、クロロホルム/酢酸エチルの混合溶媒で洗浄した後、50℃で熱風乾燥して化合物(3)を白色粉末固形物として1.313g得た(収率76%)。
融点:194.9℃
異性体比 Isomer−I:Isomer−II=93.8:6.2(NMRにおけるメチル基比に基づく)
1H-NMR(400MHz,CDCl3,δppm):
1.05(s,3H), 1.60-1.65(m, 1H), 1.77-1.86(m, 1H), 2.17(t, 1H, J=5.1Hz), 2.66-2.72(m, 2H), 3.60(s, 1H), 3.77(dd, 1H, J=5.3,10.9Hz), 3.85(dd, 1H, J=5.3, 10.9Hz), 4.40(d, 1H, J=14.1Hz), 4.57(d, 1H, J=14.1Hz), 5.65(t, 1H, J=2.6Hz), 7.07(d, 2H, J=8.5Hz), 7.24(d, 2H, J=8.6Hz) 7.86(s, 1H), 8.13(s, 1H)
〔製造例6:トルエン−4−スルホン酸3−(4−クロロベンジリデン)−2−ヒドロキシ−1−メチル−2−[1,2,4]トリアゾール−1−イルメチルシクロペンチルメチルエステルの合成1〕
アルゴン気流下、60%水素化ナトリウム60mgを採り、ヘキサンにて1回洗浄した。これに、脱水THF2mlを加え懸濁した。次いで、室温下で、THF4mlに懸濁したIsomer−Iが主成分の化合物(3)(以下、化合物(3a)とする)0.25gを発泡に注意しながら加えた後、30分間攪拌した。この溶液を氷水冷却し、2mlのTHFに溶解したp−トルエンスルホニルクロリド0.21gを添加し、同温度で5分攪拌した。室温下に戻し、さらに4時間攪拌した。反応液を水に注入し、クロロホルムを加え分配した。水層をさらにクロロホルムで抽出した。有機層を、水および飽和食塩水で順次洗浄し、無水硫酸ナトリウムで乾燥した。減圧下、溶媒を留去し、トルエン−4−スルホン酸3−(4−クロロベンジリデン)−2−ヒドロキシ−1−メチル−2−[1,2,4]トリアゾール−1−イルメチルシクロペンチルメチルエステル(以下、化合物(2a)とする)の粗反応物を淡黄色粘張固形物として0.41g得た。この粗反応物をWaters Sep−Pak Vac 35cc(SiO2,10g)を用いて精製し、化合物(3a)由来の異性体トルエン−4−スルホン酸3−(4−クロロベンジリデン)−2−ヒドロキシ−1−メチル−2−[1,2,4]トリアゾール−1−イルメチルシクロペンチルメチルエステル(以下、化合物(2a)とする)を白色固形物として0.32g(収率87.6%)得た。
(2) Synthesis of methyl 3- (4-chlorobenzylidene) -2-hydroxy-1-methyl-2- [1,2,4] triazol-1-ylmethylcyclopentanecarboxylate Crude reaction product of compound (5) Was dissolved in 3 ml of DMF, and this was added to a solution of 6 ml of DMF to which 0.444 g of 1,2,4-triazole and 1.74 g of potassium carbonate were added. After the addition, the mixture was stirred at 90 ° C. for 2 hours. Water was added to the reaction mixture, and the mixture was extracted with ethyl acetate. The organic layer was washed successively with water and saturated brine, and dried over anhydrous sodium sulfate. The solvent was distilled off under reduced pressure, and methyl 3- (4-chlorobenzylidene) -2-hydroxy-1-methyl-2- [1,2,4] triazol-1-ylmethylcyclopentanecarboxylate (hereinafter referred to as compound) 0.881 g of the crude reaction product of (4) was obtained as a dark brown rod-like product. The crude reaction product was purified by silica gel chromatography to obtain 0.200 g of compound (4) as a mixture of two isomers (yield 11.0% from compound (6)).
Isomeric ratio: Isomer-I: Isomer-II = 81: 19
Furthermore, the reaction similar to the above was separately performed using 32.6 g of compound (6). As a result, a total of 4.2 g of the compound (4) was obtained together with the compound (4) obtained above. Ethyl acetate was added to the obtained compound (4) and heated to 70 ° C., and then the solid was dispersed and ground using an ultrasonic cleaner. Next, hexane was added, and the mixture was heated again to 70 ° C., and then left overnight at room temperature. The solid was filtered through a G4 glass filter, washed with a mixed solvent of ethyl acetate / hexane, and then dried with hot air at 50 ° C. to obtain 2.80 g of a white powder.
Melting point: 152.9 ° C
Isomer ratio Isomer-I: Isomer-II = 81.5: 18.5
Isomer-I:
1 H-NMR (400 MHz, CDCl 3 , δ ppm)
1.24 (s, 3H), 1.84-1.92 (m, 1H), 2.40-2.50 (m, 1H), 2.61-2.74 (m, 2H), 3.71 (s, 3H), 4.28 (d, 1H, J = 14.1 Hz), 4.33 (d, 1H, J = 14.3Hz), 5.89 (t-like, 1H, J = 2.5Hz), 7.11 (d, 2H, J = 8.6Hz), 7.26 (d, 2H, J = 8.6 Hz) 7.86 (s, 1H),
8.09 (s, 1H)
Isomer-II:
1 H-NMR (400 MHz, CDCl 3 , δ ppm)
1.42 (s, 3H), 1.78-1.92 (m, 1H), 2.40-2.50 (m, 1H), 2.61-2.74 (m, 2H), 3.63 or 3.70 (s, 3H), 4.33 (d, 1H, J = 14.1Hz), 4.49 (d, 1H, J = 14.0Hz), 6.00 (t-like, 1H, J = 2.5Hz), 7.14 (d, 2H, J = 8.8Hz), 7.26 (d, 2H, J = 8.8Hz) 7.81 (s, 1H), 8.29 (s, 1H)
[Production Example 5: Synthesis of 5- (4-chlorobenzylidene) -2-hydroxymethyl-2-methyl-1- [1,2,4] triazol-1-ylmethylcyclopentanol]
To 1.873 g of the compound (4) obtained in Production Example 4, 45 ml of THF and 9 ml of methanol were added and dissolved, followed by cooling with ice water. Subsequently, 719 mg of calcium chloride and 495 mg of sodium borohydride were sequentially added, and the mixture was stirred at 1.5 ° C. for 3 hours. Since compound (4) remained by TLC analysis, 701 mg of calcium chloride and 503 mg of sodium borohydride were further added. After stirring at the same temperature for 40 minutes, the mixture was returned to room temperature and stirred overnight. The reaction solution was poured into water and extracted with chloroform. The organic layer was washed successively with water and saturated brine, and dried over anhydrous sodium sulfate. The organic layer was filtered and washed, and then the solvent was distilled off under reduced pressure to give 5- (4-chlorobenzylidene) -2-hydroxymethyl-2-methyl-1- [1,2,4] triazol-1-yl. 1.78 g of a crude reaction product of methylcyclopentanol (hereinafter referred to as compound (3)) was obtained as a white solid. To this solid, 15 ml of chloroform and 1.5 ml of ethyl acetate were added, dispersed using an ultrasonic cleaner, and cooled in a refrigerator for 1 hour. The solid was filtered through a G4 glass filter, washed with a mixed solvent of chloroform / ethyl acetate, and then dried with hot air at 50 ° C. to obtain 1.313 g of compound (3) as a white powder solid (yield 76). %).
Melting point: 194.9 ° C
Isomeric ratio: Isomer-I: Isomer-II = 93.8: 6.2 (based on methyl group ratio in NMR)
1 H-NMR (400 MHz, CDCl 3 , δ ppm):
1.05 (s, 3H), 1.60-1.65 (m, 1H), 1.77-1.86 (m, 1H), 2.17 (t, 1H, J = 5.1Hz), 2.66-2.72 (m, 2H), 3.60 (s, 1H), 3.77 (dd, 1H, J = 5.3, 10.9Hz), 3.85 (dd, 1H, J = 5.3, 10.9Hz), 4.40 (d, 1H, J = 14.1Hz), 4.57 (d, 1H, J = 14.1Hz), 5.65 (t, 1H, J = 2.6Hz), 7.07 (d, 2H, J = 8.5Hz), 7.24 (d, 2H, J = 8.6Hz) 7.86 (s, 1H), 8.13 (s , 1H)
[Production Example 6: Synthesis 1 of toluene-4-sulfonic acid 3- (4-chlorobenzylidene) -2-hydroxy-1-methyl-2- [1,2,4] triazol-1-ylmethylcyclopentylmethyl ester]
Under an argon stream, 60 mg of 60% sodium hydride was taken and washed once with hexane. To this, 2 ml of dehydrated THF was added and suspended. Next, at room temperature, 0.25 g of a compound (3) containing Isomer-I as a main component suspended in 4 ml of THF (hereinafter referred to as compound (3a)) was added while paying attention to foaming, followed by stirring for 30 minutes. This solution was cooled with ice water, 0.21 g of p-toluenesulfonyl chloride dissolved in 2 ml of THF was added, and the mixture was stirred at the same temperature for 5 minutes. The mixture was returned to room temperature and further stirred for 4 hours. The reaction solution was poured into water and partitioned by adding chloroform. The aqueous layer was further extracted with chloroform. The organic layer was washed successively with water and saturated brine, and dried over anhydrous sodium sulfate. The solvent was distilled off under reduced pressure, and toluene-4-sulfonic acid 3- (4-chlorobenzylidene) -2-hydroxy-1-methyl-2- [1,2,4] triazol-1-ylmethylcyclopentylmethyl ester 0.41 g of a crude reaction product (hereinafter referred to as compound (2a)) was obtained as a pale yellow viscous solid. The crude reaction product was purified using Waters Sep-Pak Vac 35 cc (SiO 2 , 10 g), and the isomer toluene-4-sulfonic acid 3- (4-chlorobenzylidene) -2-hydroxy- derived from the compound (3a) 0.32 g (yield: 87.6%) of 1-methyl-2- [1,2,4] triazol-1-ylmethylcyclopentylmethyl ester (hereinafter referred to as compound (2a)) was obtained as a white solid. .
別途、60%水素化ナトリウムの使用量を、化合物(3a)と等量にして、上記と同様の反応を行った。その結果、化合物(2a)の粗反応物を薄黄色粘張物として0.42g得た。この粗反応物をWaters Sep−Pak Vac 35cc(SiO2,10g)を用いて精製し、化合物(2a)を白色固形物として0.30g(収率82.1%)得た。 Separately, 60% sodium hydride was used in the same amount as the compound (3a), and the same reaction as described above was performed. As a result, 0.42 g of a crude reaction product of compound (2a) was obtained as a pale yellow viscous product. The crude reaction product was purified using Waters Sep-Pak Vac 35 cc (SiO 2 , 10 g) to obtain 0.30 g (yield 82.1%) of compound (2a) as a white solid.
上記したそれぞれの反応および精製により得られた化合物(2a)の白色固形物を合わせて、以後の反応に使用した。
融点:54.7℃
1H-NMR(400MHz,CDCl3,δppm):
0.90(s,3H), 1.62-1.71(m, 1H), 1.88-1.99(m, 1H), 2.47(s, 3H), 2.55-2.73(m, 2H), 3.64(s, 1H), 4.06(d, 1H, J=10.1Hz), 4.13(d, 1H, J=10.1Hz), 4.28(s, 2H), 5.61(t-like, 1H), 7.03(d, 2H, J=8.5Hz), 7.38(d, 2H, J=8.5Hz), 7.38(d, 2H, J=8.0Hz), 7.82(d, 2H, J=8.3Hz) 7.86(s, 1H), 8.04(s, 1H)
また、上記それぞれの反応におけるシリカゲルクロマトグラフィーにおいて化合物(2a)が溶出された後に溶出された成分を合わせ、計18mgの成分を得た。NMRにより、当該成分における主成分(以下成分Aとする)は、化合物(3)のIsomer−II(以下、化合物(3b)とする)より誘導されたトルエン−4−スルホン酸3−(4−クロロベンジリデン)−2−ヒドロキシ−1−メチル−2−[1,2,4]トリアゾール−1−イルメチルシクロペンチルメチルエステルと推測された。
1H-NMR(400MHz,CDCl3,δppm):
1.13(s,3H), 1.53-1.64(m, 1H), 2.03-2.11(m, 1H), 2.39(s, 3H), 2.32-2.50(m, 2H), 3.88(d, 1H, J=10.2Hz),3.92(d, 1H, J=10.5Hz), 4.09(s, 1H), 4.13(d, 1H, J=14.0Hz), 4.36(d, 1H, J=14.0Hz), 5.51(t-like, 1H), 6.97(d, 2H, J=8.5Hz), 7.21(d, 2H, J=8.5Hz), 7.23(d, 2H, J=8.5Hz), 7.69(d, 2H, J=8.3Hz) 7.91(s, 1H), 8.00(s, 1H)
〔製造例7:トルエン−4−スルホン酸3−(4−クロロベンジリデン)−2−ヒドロキシ−1−メチル−2−[1,2,4]トリアゾール−1−イルメチルシクロペンチルメチルエステルの合成2〕
アルゴン気流下、60%水素化ナトリウム67.1mgを採り、ヘキサンにて洗浄した。これに、脱水THF2mlを加え懸濁した。次いで、この溶液に、室温下で、THF4mlに懸濁した化合物(3b)0.28gを3分かけ滴下し、同温で30分間攪拌した。この溶液を氷水冷却し、2mlのTHFに溶解したp−トルエンスルホニルクロリド0.240gを2分かけ滴下した。同温で12分間攪拌した後、室温下に戻し、1.25時間攪拌した。反応液を水に注入し、酢酸エチルで抽出した。有機層を、水および飽和食塩水で順次洗浄し、無水硫酸ナトリウムで乾燥した。減圧下、溶媒を留去して化合物(3b)由来の異性体トルエン−4−スルホン酸3−(4−クロロベンジリデン)−2−ヒドロキシ−1−メチル−2−[1,2,4]トリアゾール−1−イルメチルシクロペンチルメチルエステル(以下、化合物(2b)とする)の粗反応物を橙色飴状物として0.444g得た。この粗反応物をWaters Sep−Pak Vac 20cc(SiO2,5g)を用いて精製し、化合物(2b)を淡黄白色固形物として0.327g得た。(ただし、NMR分析の結果、純度は85%,収率67.9%)。また、NMR分析の結果、得られた化合物(2b)は、製造例6において得られた成分Aと一致した。
The white solids of the compound (2a) obtained by each reaction and purification described above were combined and used in the subsequent reaction.
Melting point: 54.7 ° C
1 H-NMR (400 MHz, CDCl 3 , δ ppm):
0.90 (s, 3H), 1.62-1.71 (m, 1H), 1.88-1.99 (m, 1H), 2.47 (s, 3H), 2.55-2.73 (m, 2H), 3.64 (s, 1H), 4.06 ( d, 1H, J = 10.1Hz), 4.13 (d, 1H, J = 10.1Hz), 4.28 (s, 2H), 5.61 (t-like, 1H), 7.03 (d, 2H, J = 8.5Hz), 7.38 (d, 2H, J = 8.5Hz), 7.38 (d, 2H, J = 8.0Hz), 7.82 (d, 2H, J = 8.3Hz) 7.86 (s, 1H), 8.04 (s, 1H)
In addition, the components eluted after the compound (2a) was eluted in silica gel chromatography in each of the above reactions were combined to obtain a total of 18 mg of components. By NMR, the main component (hereinafter referred to as “component A”) in the component was toluene-4-sulfonic acid 3- (4-) derived from Isomer-II of compound (3) (hereinafter referred to as compound (3b)). Chlorobenzylidene) -2-hydroxy-1-methyl-2- [1,2,4] triazol-1-ylmethylcyclopentylmethyl ester.
1 H-NMR (400 MHz, CDCl 3 , δ ppm):
1.13 (s, 3H), 1.53-1.64 (m, 1H), 2.03-2.11 (m, 1H), 2.39 (s, 3H), 2.32-2.50 (m, 2H), 3.88 (d, 1H, J = 10.2 Hz), 3.92 (d, 1H, J = 10.5Hz), 4.09 (s, 1H), 4.13 (d, 1H, J = 14.0Hz), 4.36 (d, 1H, J = 14.0Hz), 5.51 (t- like, 1H), 6.97 (d, 2H, J = 8.5Hz), 7.21 (d, 2H, J = 8.5Hz), 7.23 (d, 2H, J = 8.5Hz), 7.69 (d, 2H, J = 8.3 Hz) 7.91 (s, 1H), 8.00 (s, 1H)
[Production Example 7: Synthesis 2 of 3- (4-chlorobenzylidene) -2-hydroxy-1-methyl-2- [1,2,4] triazol-1-ylmethylcyclopentylmethyl ester of toluene-4-sulfonic acid]
Under an argon stream, 67.1 mg of 60% sodium hydride was taken and washed with hexane. To this, 2 ml of dehydrated THF was added and suspended. Next, 0.28 g of the compound (3b) suspended in 4 ml of THF was dropped into this solution over 3 minutes at room temperature, and the mixture was stirred at the same temperature for 30 minutes. This solution was cooled with ice water, and 0.240 g of p-toluenesulfonyl chloride dissolved in 2 ml of THF was added dropwise over 2 minutes. After stirring at the same temperature for 12 minutes, the mixture was returned to room temperature and stirred for 1.25 hours. The reaction mixture was poured into water and extracted with ethyl acetate. The organic layer was washed successively with water and saturated brine, and dried over anhydrous sodium sulfate. Under reduced pressure, the solvent was distilled off, and the isomeric toluene-4-sulfonic acid 3- (4-chlorobenzylidene) -2-hydroxy-1-methyl-2- [1,2,4] triazole derived from the compound (3b) 0.444 g of a crude reaction product of -1-ylmethylcyclopentylmethyl ester (hereinafter referred to as compound (2b)) was obtained as an orange bowl. The crude reaction product was purified using Waters Sep-Pak Vac 20 cc (SiO 2 , 5 g) to obtain 0.327 g of compound (2b) as a pale yellowish white solid. (However, as a result of NMR analysis, the purity is 85% and the yield is 67.9%). As a result of NMR analysis, the obtained compound (2b) was in agreement with the component A obtained in Production Example 6.
〔製造例8:5−(4−クロロベンジリデン)−2−クロロメチル−2−メチル−1H−[1,2,4]トリアゾール−1−イルメチルシクロペンタノールの合成〕
製造例6で得られた化合物(2a)0.33gをDMF3.0mlに溶解し、ここに、リチウムクロリド0.340gおよびp−トルエンスルホン酸水和物0.156gを添加して、90℃のオイルバス中で2時間反応した。冷却後、反応液を水に注入し、クロロホルムで抽出した。有機層を、水および飽和食塩水で順次洗浄し、無水硫酸ナトリウムで乾燥した。減圧下、溶媒を留去し、5−(4−クロロベンジリデン)−2−クロロメチル−2−メチル−1H−[1,2,4]トリアゾール−1−イルメチルシクロペンタノール(以下、化合物(1)とする)の粗反応物を黄土色固形物として0.27g得た。この固形物をWaters Sep−Pak Vac 20cc(SiO2,5g)を用いて精製し、化合物(1)を淡黄土色固形物として0.203g(収率85.2%)得た。
[Production Example 8: Synthesis of 5- (4-chlorobenzylidene) -2-chloromethyl-2-methyl-1H- [1,2,4] triazol-1-ylmethylcyclopentanol]
0.33 g of the compound (2a) obtained in Production Example 6 was dissolved in 3.0 ml of DMF, and 0.340 g of lithium chloride and 0.156 g of p-toluenesulfonic acid hydrate were added thereto. It reacted for 2 hours in an oil bath. After cooling, the reaction solution was poured into water and extracted with chloroform. The organic layer was washed successively with water and saturated brine, and dried over anhydrous sodium sulfate. The solvent was distilled off under reduced pressure, and 5- (4-chlorobenzylidene) -2-chloromethyl-2-methyl-1H- [1,2,4] triazol-1-ylmethylcyclopentanol (hereinafter referred to as compound ( 0.27 g of the crude reaction product of 1) was obtained as an ocherous solid. The solid was purified using Waters Sep-Pak Vac 20 cc (SiO 2 , 5 g) to obtain 0.203 g (yield: 85.2%) of compound (1) as a light ocher solid.
さらに、別途、化合物(2a)0.253gを用い、シリカゲルクロマトグラフィー精製を省略した以外は同様に反応を行い、化合物(1)の粗反応物を黄土色固形物として0.16g得た。 Separately, 0.253 g of the compound (2a) was used, and the reaction was performed in the same manner except that the silica gel chromatography purification was omitted to obtain 0.16 g of a crude reaction product of the compound (1) as an ocher solid.
先に得た化合物(1)と合わせ、酢酸エチル/ヘキサンの混合溶媒で再結晶を行い、白色綿状結晶として化合物(1)0.257gを得た。
融点:157.0℃,
1H-NMR(400MHz,CDCl3,δppm):
1.11(s, 3H), 1.77-1.93(m, 2H), 2.63-2.72(m, 2H), 3.19(s, 1H), 3.70(d, 1H, J=11.3Hz), 3.79(d, 1H, J=11.3Hz), 4.36(d, 1H, J=14.0Hz), 4.47(d, 1H, J=14.0Hz), 5.69(t-like, 1H, J=2.6Hz), 7.07(d, 2H, J=8.5Hz), 7.24(d, 2H, J=8.5Hz), 7.86(s, 1H), 8.13(s, 1H)
<製剤例>
合成した化合物(1)を用いて水和剤、粉剤、粒剤および乳剤を製剤した。
(水和剤)
化合物(1) 50 部
リグニンスルホン酸塩 5 部
アルキルスルホン酸塩 3 部
珪藻土 42 部
を粉砕混合して水和剤とし、水で希釈して使用した。
(粉剤)
化合物(1) 3 部
クレー 40 部
タルク 57 部
を粉砕混合し、散粉として使用する粉剤とした。
(粒剤)
化合物(1) 5 部
ベンナイト 43 部
クレー 45 部
リグニンスルホン酸塩 7 部
を均一に混合しさらに水を加えて練り合わせ、押し出し式造粒機で粒状に加工乾燥して粒剤とした。
(乳剤)
化合物(1) 20 部
ポリオキシエチレンアルキルアリールエーテル 10 部
ポリオキシエチレンソルビタンモノラウレート 3 部
キシレン 67 部
を均一に混合溶解して乳剤とした。
The compound (1) obtained above was combined and recrystallized with a mixed solvent of ethyl acetate / hexane to obtain 0.257 g of compound (1) as white flocculent crystals.
Melting point: 157.0 ° C.,
1 H-NMR (400 MHz, CDCl 3 , δ ppm):
1.11 (s, 3H), 1.77-1.93 (m, 2H), 2.63-2.72 (m, 2H), 3.19 (s, 1H), 3.70 (d, 1H, J = 11.3Hz), 3.79 (d, 1H, J = 11.3Hz), 4.36 (d, 1H, J = 14.0Hz), 4.47 (d, 1H, J = 14.0Hz), 5.69 (t-like, 1H, J = 2.6Hz), 7.07 (d, 2H, J = 8.5Hz), 7.24 (d, 2H, J = 8.5Hz), 7.86 (s, 1H), 8.13 (s, 1H)
<Formulation example>
Using the synthesized compound (1), wettable powder, powder, granule and emulsion were prepared.
(Wettable powder)
Compound (1) 50 parts lignin sulfonate 5 parts alkyl sulfonate 3 parts diatomaceous earth 42 parts were pulverized and mixed to obtain a wettable powder and diluted with water for use.
(Powder)
Compound (1) 3 parts Clay 40 parts Talc 57 parts were pulverized and mixed to prepare a powder used as dust.
(Granule)
Compound (1) 5 parts Bennite 43 parts Clay 45 parts Lignin sulfonate 7 parts were mixed uniformly, water was added and kneaded, and processed and dried into granules with an extrusion granulator to give granules.
(emulsion)
Compound (1) 20 parts polyoxyethylene alkyl aryl ether 10 parts polyoxyethylene sorbitan monolaurate 3 parts xylene 67 parts were mixed and dissolved uniformly to prepare an emulsion.
<試験例1:コムギ種子に対する種子処理による生育抑制の薬害評価試験>
ポット試験により、種子処理による生育抑制の薬害を評価した。処理量が200g ai/100kg seedsまたは20g ai/100kg seedsとなるようにDMSOに溶解した化合物(1)をバイアル内でコムギ種子に塗沫した後、8粒のコムギ種子を80cm2ポットに播種した。温室内で下部給水管理し、播種27日後にコムギの生育程度を調査した。表2に示す基準から生育抑制指数を算出した。生育抑制指数が小さいほど、薬剤処理による生育抑制の薬害が小さいことを示している。なお、対照としては、化合物(1)の代わりに、5−(4−クロロベンジル)−2−クロロメチル−2−メチル−1−(1H−1,2,4−トリアゾール−1−イルメチル)シクロペンタノール(化合物(11))および2−(4−クロロベンジリデン)−5,5−ジメチル−1−(1H−1,2,4−トリアゾール−1−イルメチル)シクロペンタノール(Triticonazole:化合物(12))を用いて試験を行った。結果を表3に示す。
<Test Example 1: Evaluation test of phytotoxicity of wheat growth suppression by seed treatment>
By pot test, the phytotoxicity of growth suppression by seed treatment was evaluated. The compound (1) dissolved in DMSO was applied to the wheat seeds in a vial so that the treatment amount was 200 g ai / 100 kg seeds or 20 g ai / 100 kg seeds, and then 8 wheat seeds were seeded in 80 cm 2 pots. . The lower water supply was controlled in a greenhouse, and the degree of wheat growth was investigated 27 days after sowing. The growth inhibition index was calculated from the criteria shown in Table 2. It shows that the smaller the growth inhibition index, the smaller the phytotoxicity of growth inhibition by chemical treatment. As a control, instead of compound (1), 5- (4-chlorobenzyl) -2-chloromethyl-2-methyl-1- (1H-1,2,4-triazol-1-ylmethyl) cyclo Pentanol (compound (11)) and 2- (4-chlorobenzylidene) -5,5-dimethyl-1- (1H-1,2,4-triazol-1-ylmethyl) cyclopentanol (Triticazole): compound (12 )). The results are shown in Table 3.
なお、何れの処理量の化合物(1)を用いた場合にも、播種19日後の時点において、植物体にネクロシスは観察されなかった。
<試験例2:種子処理によるコムギ赤さび病の防除効果>
ポット試験により、種子処理によるコムギ赤さび病の防除効果を評価した。処理量が200g ai/100kg seedsまたは20g ai/100kg seedsとなるようにDMSOに溶解した化合物(1)をバイアル内でコムギ種子に塗沫した後、8粒のコムギ種子を80cm2ポットに播種した。温室内で下部給水管理し、播種27日後にコムギ赤さび病菌を接種し、湿箱に2日間保管した。その後、再び温室内で下部給水管理し、接種後12日目に、罹病面積率を調査し、下記式により防除価を算出した。
防除価(%)=(1−(処理区罹病面積率/無処理区罹病面積率))×100
なお、対照としては、化合物(1)の代わりに化合物(11)を用いて試験を行った。結果を表4に示す。
In addition, when using any amount of compound (1), necrosis was not observed in the plant body at the time point 19 days after sowing.
<Test Example 2: Control effect of wheat rust caused by seed treatment>
By pot test, the control effect of wheat red rust caused by seed treatment was evaluated. The compound (1) dissolved in DMSO was applied to the wheat seeds in a vial so that the treatment amount was 200 g ai / 100 kg seeds or 20 g ai / 100 kg seeds, and then 8 wheat seeds were seeded in 80 cm 2 pots. . The lower water supply was controlled in a greenhouse, and 27 days after sowing, wheat red rust fungus was inoculated and stored in a wet box for 2 days. Thereafter, the lower water supply was managed again in the greenhouse, and on the 12th day after inoculation, the diseased area ratio was investigated, and the control value was calculated by the following formula.
Control value (%) = (1− (Affected area ratio of treated area / Affected area ratio of untreated area)) × 100
As a control, a test was conducted using compound (11) instead of compound (1). The results are shown in Table 4.
<試験例3:茎葉散布処理によるキュウリ灰色かび病防除効果試験>
角型プラスチックポット(6cm×6cm)を用いて栽培した子葉期のキュウリ(品種:SHARP1)に、製剤例1のような化合物(1)の水和剤形態のものを、水で所定濃度(200mg/L)に希釈懸濁し、1,000L/haの割合で散布した。散布葉を風乾した後、灰色かび病菌の胞子液をしみこませたペーパーディスク(直径8mm)を乗せ、20℃高湿度条件下に保った。接種後4日目に、キュウリ灰色かび病の罹病度を調査して、防除価を下記式により算出した。
防除価(%)=(1−(散布区の平均罹病度/無散布区の平均罹病度))×100
その結果、防除価は80%以上であった。
<試験例4:茎葉散布処理によるコムギ赤さび病防除効果試験>
角型プラスチックポット(6cm×6cm)を用いて栽培した第2葉期のコムギ(品種:農林61号)に、製剤例1のような化合物(1)の水和剤形態のものを、水で所定濃度(12.5mg/L)に希釈懸濁し、1,000L/haの割合で散布した。散布葉を風乾した後、コムギ赤さび病菌の胞子(200個/視野に調整、60ppmとなるようにグラミンSを添加)を噴霧接種し、25℃高湿度条件下に48時間保った。その後は温室内で管理した。接種後10日目に、コムギ赤さび病の罹病度を調査して、試験例3と同様に防除価を算出した。なお、対照としては、化合物(1)の代わりに化合物(12)を用いて試験を行った。結果を表5に示す。
<Test Example 3: Cucumber gray mold control effect test by foliar spray treatment>
In a cotyledon cucumber (variety: SHARP1) cultivated using a square plastic pot (6 cm × 6 cm), a compound (1) in the form of a wettable powder as in Formulation Example 1 is added to water at a predetermined concentration (200 mg). / L) and suspended at a rate of 1,000 L / ha. The sprayed leaves were air-dried and then placed on a paper disk (diameter 8 mm) soaked with a spore solution of gray mold fungus and kept at 20 ° C. under high humidity. On the fourth day after inoculation, the morbidity of cucumber gray mold was investigated, and the control value was calculated by the following formula.
Control value (%) = (1− (average morbidity of sprayed area / average morbidity of non-sprayed area)) × 100
As a result, the control value was 80% or more.
<Test Example 4: Wheat red rust control effect test by foliar spray treatment>
In a second leaf stage wheat (cultivar: Norin 61) grown using a square plastic pot (6 cm × 6 cm), a compound (1) in the form of a wettable powder as in Formulation Example 1 is washed with water. The suspension was diluted to a predetermined concentration (12.5 mg / L) and sprayed at a rate of 1,000 L / ha. The sprayed leaves were air-dried and then spray-inoculated with spores of wheat red rust fungus (adjusted to 200 cells / field of view, added with Grameen S to 60 ppm), and kept at 25 ° C. under high humidity for 48 hours. After that, it was managed in the greenhouse. On the 10th day after inoculation, the morbidity of wheat red rust was investigated, and the control value was calculated in the same manner as in Test Example 3. As a control, the test was conducted using compound (12) instead of compound (1). The results are shown in Table 5.
<試験例5:病原菌に対する抗菌性試験1>
本試験例では、各種植物病原性糸状菌に対する抗菌性を試験した。
<Test Example 5: Antibacterial test 1 against pathogenic bacteria>
In this test example, antibacterial properties against various phytopathogenic fungi were tested.
化合物(1)をジメチルスルホキシドに溶解し、60℃前後のPDA培地(ポテト−デキストロース−アガー培地)に加えた。三角フラスコ内でよく混合した後、シャーレ内に流し固化させて、所定の濃度(5mg/L)で化合物(1)を含む平板培地を作製した。 Compound (1) was dissolved in dimethyl sulfoxide and added to PDA medium (potato-dextrose-aggar medium) at around 60 ° C. After mixing well in an Erlenmeyer flask, it was poured into a petri dish and solidified to prepare a plate medium containing the compound (1) at a predetermined concentration (5 mg / L).
一方、予め平板培地上で培養した供試菌(コムギふ枯病菌(Phaeosphaeria nodorum)、コムギ眼紋病菌(Pseudocercoporella herpotrichoides)、コムギ紅色雪腐病菌(Microdochium nivale)、コムギ立枯れ病菌(Gaeumannomyces graminis)、オオムギ斑葉病菌(Pyrenophora graminea)、コムギ赤かび病菌(Fusarium graminearum)、イネばか苗病菌(Gibberella fujikuroi)、菌核病菌(Sclerotinia sclerotiorum)、灰色かび病菌(Botrytis cinerea)、炭疽病菌(Glomerella cingurata)、キュウリつる割れ病菌(Fusarium oxysporum)、カンキツ青かび病菌(Penicillium Italicum)、テンサイ褐班病菌(Cercospora beticola)、コムギ葉枯れ病菌(Septoria tritici)、またはオオムギ雲形病菌(Rhynchosporium secalis))を直径4mmのコルクボーラーで打ち抜き,上記の薬剤含有平板培地上に接種した。接種後、各菌の生育適温(例えば、LIST OF CULTURES 1996 microorganisms 10th edition、財団法人発酵研究所等の文献を参照)にて1〜14日間培養し、菌の生育を菌そう直径で測定した。薬剤含有平板培地上で得られた菌の生育程度を、薬剤無添加区における菌の生育程度と比較して、下記式により菌糸伸長抑制率を求めた。なお、下記式中、Rは菌糸伸長抑制率(%)、dcは無処理平板上菌そう直径、dtは薬剤処理平板上菌そう直径を示している。
R=100(dc−dt)/dc
その結果、菌糸伸長抑制率Rは何れの菌に対しても80%以上であった。
On the other hand, test bacteria previously cultured on a plate medium (Phaeosphaeria nodorum), wheat eye spot fungus (Pseudocercoporella herpotrichoides), wheat red snow rot fungus (Microdochium nivale), wheat blight fungus (Gaeumannomyces graminis), Barley leaf mold (Pyrenophora graminea), wheat leaf mold (Fusarium graminearum), rice seedling fungus (Gibberella fujikuroi), mycorrhizal fungus (Sclerotinia sclerotiorum), gray mold fungus (Botrytis cinerea), anthracnose fungus (Glomerellacingur) Cucumber vines (Fusarium oxysporum), citrus blue mold (Penicillium Italicum), sugar beet brown fungus (Cercospora beticola), wheat leaf blight (Septoria tritici) or barley cloud fungus (Rhynchosporium secalis) And inoculated on the above-mentioned drug-containing plate medium. After inoculation, the cells were cultured for 1 to 14 days at a suitable temperature for growth of each fungus (for example, see LIST OF CULTURES 1996 microorganisms 10th edition, literature from the Institute for Fermentation, etc.), and the growth of the fungus was measured by the fungus diameter. The growth degree of the bacteria obtained on the drug-containing plate medium was compared with the growth degree of the bacteria in the drug-free group, and the mycelial elongation suppression rate was determined by the following formula. In the following formula, R represents the hyphal elongation inhibition rate (%), dc represents the diameter of the fungus on the untreated plate, and dt represents the diameter of the fungus on the drug-treated plate.
R = 100 (dc−dt) / dc
As a result, the mycelial elongation suppression rate R was 80% or more for all the bacteria.
<試験例6:病原菌に対する抗菌性試験2>
本試験例では、化合物(1)の代わりに化合物(12)を用いた対照を比較例として含めて、各種植物病原性糸状菌に対する抗菌性を試験した。
<Test Example 6: Antibacterial test 2 against pathogenic bacteria>
In this test example, a control using the compound (12) instead of the compound (1) was included as a comparative example to test antibacterial activity against various phytopathogenic fungi.
試験例5と同様にして、所定の濃度(1.25〜5mg/L)で化合物(1)または化合物(12)を含む平板培地を作製した。 In the same manner as in Test Example 5, a plate medium containing Compound (1) or Compound (12) at a predetermined concentration (1.25 to 5 mg / L) was prepared.
一方、予め平板培地上で培養した供試菌(コムギ紅色雪腐病菌、イネ苗立枯病菌、テンサイ褐班病菌、オオムギ雲形病菌、またはコムギ葉枯れ病菌)を直径4mmのコルクボーラーで打ち抜き,上記の薬剤含有平板培地上に接種した。接種後、各菌の生育適温にて1〜14日間培養した。菌の生育を菌そう直径で測定し、試験例5と同様にして菌糸伸長抑制率を求めた。結果を表6〜10に示す。 On the other hand, a test bacterium previously cultured on a plate medium (wheat red snow rot fungus, rice seedling blight fungus, sugar beet brown blight fungus, barley cloud fungus, or wheat leaf blight fungus) was punched out with a cork borer having a diameter of 4 mm. Were inoculated on a drug-containing plate medium. After inoculation, the cells were cultured for 1 to 14 days at the appropriate growth temperature for each fungus. The growth of the fungus was measured by the fungus diameter, and the hyphal elongation inhibition rate was determined in the same manner as in Test Example 5. The results are shown in Tables 6-10.
本発明は、植物に対する薬害が最小限に抑えられ、植物病害を防除できる防除剤の有効成分として好適に利用することができる。 INDUSTRIAL APPLICABILITY The present invention can be suitably used as an active ingredient of a control agent that can suppress phytotoxicity to plants and can control plant diseases.
Claims (14)
下記一般式(II)で示される中間体化合物。
An intermediate compound represented by the following general formula (II).
下記一般式(III)で示される中間体化合物。
An intermediate compound represented by the following general formula (III).
下記一般式(IV)で示される中間体化合物。
An intermediate compound represented by the following general formula (IV).
下記一般式(V)で示される中間体化合物。
The intermediate compound shown by the following general formula (V).
下記一般式(VI)で示される中間体化合物。
An intermediate compound represented by the following general formula (VI).
下記一般式(II)で示す中間体化合物において−OSO2R3で示される置換スルホニルオキシ基をハロゲン原子に置換することにより、上記一般式(I)で示すトリアゾール誘導体を得る工程を含む、トリアゾール誘導体の製造方法。
The triazole comprising the step of obtaining the triazole derivative represented by the above general formula (I) by substituting the substituted sulfonyloxy group represented by -OSO 2 R 3 with a halogen atom in the intermediate compound represented by the following general formula (II) A method for producing a derivative.
下記一般式(III)で示される中間体化合物をスルホニル化することにより、下記一般式(II)で示される中間体化合物を得る工程を含む、トリアゾール誘導体の製造方法。
The manufacturing method of a triazole derivative including the process of obtaining the intermediate compound shown by the following general formula (II) by sulfonylating the intermediate compound shown by the following general formula (III).
下記一般式(IV)で示される中間体化合物を還元することにより、下記一般式(III)で示される中間体化合物を得る工程を含む、トリアゾール誘導体の製造方法。
The manufacturing method of a triazole derivative including the process of obtaining the intermediate compound shown by the following general formula (III) by reducing the intermediate compound shown by the following general formula (IV).
下記一般式(VI)で示される中間体化合物をオキシラン化して得られる下記一般式(V)で示される中間体化合物と、下記一般式(IX)で示される化合物とを反応させることにより、下記一般式(IV)で示す中間体化合物を得る工程を含む、トリアゾール誘導体の製造方法。
By reacting an intermediate compound represented by the following general formula (V) obtained by oxiranating an intermediate compound represented by the following general formula (VI) with a compound represented by the following general formula (IX), The manufacturing method of a triazole derivative including the process of obtaining the intermediate compound shown by general formula (IV).
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103664561A (en) * | 2013-12-09 | 2014-03-26 | 江苏七洲绿色化工股份有限公司 | Preparation method of metconazole and intermediate thereof |
| CN104710372A (en) * | 2013-12-13 | 2015-06-17 | 上海交通大学 | High purity metconazole and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN103664561A (en) * | 2013-12-09 | 2014-03-26 | 江苏七洲绿色化工股份有限公司 | Preparation method of metconazole and intermediate thereof |
| CN103664561B (en) * | 2013-12-09 | 2015-11-18 | 江苏七洲绿色化工股份有限公司 | The preparation method of a kind of metconazole and intermediate thereof |
| CN104710372A (en) * | 2013-12-13 | 2015-06-17 | 上海交通大学 | High purity metconazole and preparation method thereof |
| CN104710372B (en) * | 2013-12-13 | 2017-12-15 | 上海交通大学 | Metconazole and preparation method thereof |
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