JP2013166830A - Surfactant, its production method and aqueous coating agent composition containing the surfactant - Google Patents
Surfactant, its production method and aqueous coating agent composition containing the surfactant Download PDFInfo
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- JP2013166830A JP2013166830A JP2012029852A JP2012029852A JP2013166830A JP 2013166830 A JP2013166830 A JP 2013166830A JP 2012029852 A JP2012029852 A JP 2012029852A JP 2012029852 A JP2012029852 A JP 2012029852A JP 2013166830 A JP2013166830 A JP 2013166830A
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- surfactant
- modified silicone
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- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002840 non-reducing disaccharides Chemical class 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
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- 125000004430 oxygen atom Chemical group O* 0.000 description 1
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- 239000000049 pigment Substances 0.000 description 1
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- 230000002265 prevention Effects 0.000 description 1
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- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
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- 230000004044 response Effects 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000000185 sucrose group Chemical group 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
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Images
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- Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
- Paints Or Removers (AREA)
Abstract
Description
本発明は界面活性剤、その製造方法及びこれを含有してなる水系コーティング剤組成物に関する。 The present invention relates to a surfactant, a method for producing the same, and an aqueous coating agent composition containing the same.
近年、パソコン等のOA機器用プリンターは、高速対応可能なインキ噴射式印刷が主流となっているが、これには高い湿潤性、レベリング性、浸透性等と共に優れた動的、静的表面張力低下能等が要望されている。このような用途において、ポリエーテル変性シリコーン等の変性シリコーンは優れたレベリング性、湿潤性、分散性等を持つものの、動的表面張力低下能は満足できるレベルではなかった。
また、インキ等のコーティング剤の用途において、変性シリコーンは、上記の欠点に加えて、ハジキ、ピンホール等に対する信頼性も低いため、これまでは敬遠される傾向があった。
また、高速印刷、高速塗工を必要とする印刷、製紙業界等の分野においても、上記と同様なニーズがあるが、いまだ不十分であった。
In recent years, printers for office automation equipment such as personal computers have been mainly ink jet printing capable of high-speed operation, which includes excellent dynamic and static surface tension as well as high wettability, leveling properties, and permeability. There is a demand for reducing ability. In such applications, modified silicones such as polyether-modified silicones have excellent leveling properties, wettability, dispersibility, etc., but their dynamic surface tension reducing ability is not at a satisfactory level.
In addition, in the use of coating agents such as inks, modified silicones have tended to be avoided in the past because they have low reliability with respect to repelling, pinholes and the like in addition to the above-mentioned drawbacks.
Further, in the fields such as high-speed printing, printing requiring high-speed coating, and paper industry, there are the same needs as described above, but they are still insufficient.
以上のニーズに対して、アセチレングリコールのエトキシ化体をシリコーン系界面活性剤に配合してなる界面活性剤組成物(特許文献1)等が提案されている。 In response to the above needs, a surfactant composition (Patent Document 1) obtained by blending an ethoxylated acetylene glycol with a silicone surfactant has been proposed.
特許文献1に記載の界面活性剤組成物は、レベリング性等に優れた成分(シリコーン界面活性剤)と動的表面張力低下能に優れた成分(アセチレングリコールのエトキシ化体)との配合したものであり、得られる性能としては配合したそれぞれ成分の性能の中間的レベルを大きく超えるものではなく、特に動的表面張力低下能等において問題があり、前述のニーズに十分な対応ができていなかった。
すなわち、本発明の目的は、高い表面張力低下能(動的表面張力低下能、静的表面張力低下能)を発揮する界面活性剤を提供することである。
The surfactant composition described in Patent Document 1 is a combination of a component having excellent leveling properties (silicone surfactant) and a component having excellent dynamic surface tension reducing ability (ethoxylated acetylene glycol). The obtained performance does not greatly exceed the intermediate level of the performance of each of the blended components, and there is a problem in the dynamic surface tension lowering ability, etc., and the above-mentioned needs have not been sufficiently met. .
That is, an object of the present invention is to provide a surfactant that exhibits high surface tension reducing ability (dynamic surface tension reducing ability, static surface tension reducing ability).
本発明者は前記課題を解決すべく鋭意検討を重ねた結果、本発明に達した。
すなわち、本発明の界面活性剤の特徴は、活性水素含有変性シリコーン(S)と、一般式(1)で表されるグリシジル化合物(G)とを化学反応させて得られたシリコーン変性体(Y)からなる点を要旨とする。
The inventor of the present invention has reached the present invention as a result of intensive studies to solve the above problems.
That is, the surfactant of the present invention is characterized by a modified silicone (Y) obtained by chemically reacting an active hydrogen-containing modified silicone (S) with a glycidyl compound (G) represented by the general formula (1). ).
{E(-OA)n}p-Q-{(AO-)nH}t−p (1)
{E (-OA) n} p -Q - {(AO-) n H} t-p (1)
一般式(1)において、Eはグリシジル(1,2−エポキシプロピル)基、Hは水素原子、Qは非還元性の二又は三糖類のt個の1級水酸基からそれぞれ水素原子を除いた反応残基、OA及びAO(以下、纏めてAOと呼称する)は炭素数2〜4のオキシアルキレン基、nは1〜40の整数、tは2〜4の整数、pは1〜3の整数を表し(但し、t≧p)、一般式(1)中のAOの総数は10〜80である。 In general formula (1), E is a glycidyl (1,2-epoxypropyl) group, H is a hydrogen atom, Q is a reaction in which a hydrogen atom is removed from t primary hydroxyl groups of a non-reducing di- or trisaccharide. Residues, OA and AO (hereinafter collectively referred to as AO) are oxyalkylene groups having 2 to 4 carbon atoms, n is an integer of 1 to 40, t is an integer of 2 to 4, and p is an integer of 1 to 3 (Where t ≧ p), and the total number of AO in the general formula (1) is 10-80.
本発明の界面活性剤の製造方法の特徴は、上記の界面活性剤を製造する方法であって、
反応溶媒及び反応触媒なしで、活性水素含有変性シリコーン(S)と、一般式(1)で表されるグリシジル化合物(G)とを化学反応させてシリコーン変性体(Y)を得る工程を含む点を要旨とする。
A feature of the method for producing the surfactant of the present invention is a method for producing the above surfactant,
The process includes a step of chemically reacting the active hydrogen-containing modified silicone (S) and the glycidyl compound (G) represented by the general formula (1) to obtain a silicone-modified product (Y) without a reaction solvent and a reaction catalyst. Is the gist.
本発明の水系コーティング剤組成物の特徴は、水系コーティング剤及び上記の界面活性剤とからなり、この界面活性剤を水系コーティング剤の重量に基づいて0.1〜5重量%含有してなる点を要旨とする。 The water-based coating composition of the present invention is characterized by comprising a water-based coating agent and the above-mentioned surfactant, and containing 0.1 to 5% by weight of this surfactant based on the weight of the water-based coating agent. Is the gist.
本発明の界面活性剤は、高い表面張力低下能(動的表面張力低下能、静的表面張力低下能)を発揮する。
本発明の界面活性剤の製造方法によると、上記の界面活性剤を容易に調製できる。
本発明のコーティング剤組成物は、水系コーティング剤及び上記の界面活性剤を含有するので、表面張力(動的表面張力、静的表面張力)が十分に低い。
The surfactant of the present invention exhibits high surface tension reducing ability (dynamic surface tension reducing ability, static surface tension reducing ability).
According to the method for producing a surfactant of the present invention, the above surfactant can be easily prepared.
Since the coating agent composition of the present invention contains an aqueous coating agent and the above surfactant, the surface tension (dynamic surface tension, static surface tension) is sufficiently low.
<活性水素含有変性シリコーン(S)>
活性水素含有変性シリコーン(S)としては、水酸基含有ポリエーテル変性シリコーン(S1)、アミノ基含有アミノ変性シリコーン(S2)、カルボキシ基含有カルボキシ変性シリコーン(S3)、水酸基含有カルビノール変性シリコーン(S4)、フェノール性水酸基含有フェノール変性シリコーン(S5)及びメルカプト基含有メルカプト変性シリコーン(S6)からなる群より選ばれる少なくとも1種が含まれる。
<Active hydrogen-containing modified silicone (S)>
The active hydrogen-containing modified silicone (S) includes a hydroxyl group-containing polyether-modified silicone (S1), an amino group-containing amino-modified silicone (S2), a carboxy group-containing carboxy-modified silicone (S3), and a hydroxyl group-containing carbinol-modified silicone (S4). And at least one selected from the group consisting of a phenolic hydroxyl group-containing phenol-modified silicone (S5) and a mercapto group-containing mercapto-modified silicone (S6).
活性水素含有変性シリコーン(S)は、シリコーンの変性位置により、側鎖型、両末端型及び片末端型に分類でき、これらの何れも使用できるが、好ましいのは側鎖型である。 The active hydrogen-containing modified silicone (S) can be classified into a side chain type, a both-end type, and a one-end type depending on the modification position of the silicone, and any of these can be used, but the side chain type is preferred.
水酸基含有ポリエーテル変性シリコーン(S1)とは、ポリエーテル由来の水酸基を含有するポリエーテル変性シリコーンであり、これらは市場から容易に入手でき、たとえば、以下の商品等が挙げられる。 The hydroxyl group-containing polyether-modified silicone (S1) is a polyether-modified silicone containing a polyether-derived hydroxyl group, which can be easily obtained from the market, and examples thereof include the following products.
側鎖型としては、KF−351A、KF−353、KF−354L、KF−615A、KF−640、KF−945、KF−6011、KF−6015、KF−6020及びX−22−2516等(以上、信越化学工業株式会社製);FZ2110、FZ2120、FZ2130、FZ2161、FZ2166、FZ2191、FZ7001、FZ7002、SF8428、SH3771、BY16−027及びBY16−036(以上、東レ・ダウコーニングシリコーン株式会社製);TSF4440、TSF4441、TSF4445、TSF4452及びTSF4460(以上、モメンティブ・パフォーマンス・マテリアルズ合同会社製);SN−WET123、SN−WET125(以上、サンノプコ株式会社製)等が挙げられる。 Side chain types include KF-351A, KF-353, KF-354L, KF-615A, KF-640, KF-945, KF-6011, KF-6015, KF-6020, and X-22-2516 (and above) FZ2110, FZ2120, FZ2130, FZ2161, FZ2166, FZ2191, FZ7001, FZ7002, SF8428, SH3771, BY16-027 and BY16-036 (above, manufactured by Toray Dow Corning Silicone); TSF4440 , TSF4441, TSF4445, TSF4452, and TSF4460 (manufactured by Momentive Performance Materials LLC); SN-WET123, SN-WET125 (manufactured by San Nopco Co., Ltd.), and the like.
両末端型としては、X−22−4952等(信越化学工業株式会社製);FZ2203等(東レ・ダウコーニングシリコーン株式会社製)等が挙げられ、片末端型としては、FZ2122等(東レ・ダウコーニングシリコーン株式会社製)等が挙げられる。 Examples of both terminal types include X-22-4952 (manufactured by Shin-Etsu Chemical Co., Ltd.); FZ2203 (manufactured by Toray Dow Corning Silicone Co., Ltd.) and the like. Examples of one terminal type include FZ2122 (Toray Dow). Corning Silicone Co., Ltd.).
これらの水酸基含有ポリエーテル変性シリコーンは幅広い曇点(1重量%水溶液法、始濁点)を持つが、たとえば、湿潤性に重点を置く場合、30〜90℃の曇点をもつもの、消泡性、浸透性に重点を置く場合、5〜50℃の曇点をもつものを選択すると、より効果的である。 These hydroxyl group-containing polyether-modified silicones have a wide cloud point (1% by weight aqueous solution method, initial turbid point), but for example, when emphasizing wettability, those having a cloud point of 30 to 90 ° C., defoaming properties When emphasizing the permeability, it is more effective to select one having a cloud point of 5 to 50 ° C.
アミノ基含有アミノ変性シリコーン(S2)としては、モノアミン又はジアミン等に由来するアミノ基を含有する変性シリコーンであり、市場から容易に入手でき、たとえば、以下の商品等が挙げられる。 The amino group-containing amino-modified silicone (S2) is a modified silicone containing an amino group derived from a monoamine or diamine and can be easily obtained from the market. Examples thereof include the following products.
側鎖型としては、KF868、KF880、KF8002及びX−22−3820W等(以上、信越化学工業株式会社製);FZ3504、FZ3705、FZ3760、SF8417、BY16−213、BY16−850及びBY16−890(以上、東レ・ダウコーニングシリコーン株式会社製);TSF4702、TSF4704及びTSF4706(以上、モメンティブ・パフォーマンス・マテリアルズ合同会社製)等が挙げられる。 As side chain types, KF868, KF880, KF8002 and X-22-3820W etc. (above, manufactured by Shin-Etsu Chemical Co., Ltd.); FZ3504, FZ3705, FZ3760, SF8417, BY16-850, BY16-850 and BY16-890 (above , Manufactured by Toray Dow Corning Silicone Co., Ltd.); TSF4702, TSF4704 and TSF4706 (manufactured by Momentive Performance Materials LLC).
両末端型としては、KF8010及びPAM−E等(以上、信越化学工業株式会社製)等が挙げられ、片末端型としてはTSF4700及びTSF4701(以上、モメンティブ・パフォーマンス・マテリアルズ合同会社製)等が挙げられる。 Examples of both end types include KF8010 and PAM-E (and above, manufactured by Shin-Etsu Chemical Co., Ltd.), etc., and examples of single end types include TSF4700 and TSF4701 (and above, manufactured by Momentive Performance Materials LLC). Can be mentioned.
カルボキシ基含有カルボキシ変性シリコーン(S3)としては、カルボン酸に由来するカルボキシ基を含有する変性シリコーンであり、市場から容易に入手でき、たとえば、以下の商品等が挙げられる。 The carboxy group-containing carboxy-modified silicone (S3) is a modified silicone containing a carboxy group derived from a carboxylic acid, and can be easily obtained from the market. Examples thereof include the following products.
側鎖型としては、X−22−3701E(信越化学工業株式会社製);BY16−880(東レ・ダウコーニングシリコーン株式会社製)等が挙げられ、両末端型としては、X−22−162C等(信越化学工業株式会社製);BY16−750(東レ・ダウコーニングシリコーン株式会社製);TSF4770(モメンティブ・パフォーマンス・マテリアルズ合同会社製)等が挙げられる。 Examples of the side chain type include X-22-3701E (manufactured by Shin-Etsu Chemical Co., Ltd.); BY16-880 (manufactured by Toray Dow Corning Silicone Co., Ltd.) and the like, and examples of both end types include X-22-162C and the like. (Manufactured by Shin-Etsu Chemical Co., Ltd.); BY16-750 (manufactured by Toray Dow Corning Silicone Co., Ltd.); TSF4770 (manufactured by Momentive Performance Materials LLC) and the like.
水酸基含有カルビノール変性シリコーン(S4)としては、アルコールに由来する水酸基を含有する変性シリコーンであり、市場から容易に入手でき、たとえば、以下の商品等が挙げられる。 The hydroxyl group-containing carbinol-modified silicone (S4) is a modified silicone containing a hydroxyl group derived from alcohol and can be easily obtained from the market. Examples thereof include the following products.
側鎖型としては、X−22−4015及びX−22−4039等(以上、信越化学工業株式会社製);SF8428(東レ・ダウコーニングシリコーン株式会社製);TSF4750(モメンティブ・パフォーマンス・マテリアルズ合同会社製)等が挙げられ、両末端型としては、X−22−160AS及びKF−6001等(以上、信越化学工業株式会社製);BY16−201及びSF8427等(以上、東レ・ダウコーニングシリコーン株式会社製);TSF4751(モメンティブ・パフォーマンス・マテリアルズ合同会社製)等が挙げられる。 As side chain types, X-22-4015, X-22-4039 and the like (manufactured by Shin-Etsu Chemical Co., Ltd.); SF8428 (manufactured by Toray Dow Corning Silicone Co., Ltd.); TSF4750 (Momentive Performance Materials Joint) As a double-ended type, X-22-160AS and KF-6001 (and above, manufactured by Shin-Etsu Chemical Co., Ltd.); BY16-201 and SF8427 (and above, Toray Dow Corning Silicone Co., Ltd.) Company-made); TSF4751 (made by Momentive Performance Materials GK) and the like.
フェノール性水酸基含有フェノール変性シリコーン(S5)としては、フェノールに由来する水酸基を含有する変性シリコーンであり、たとえば、以下の商品(両末端型)等が市場から容易に入手できる。 The phenolic hydroxyl group-containing phenol-modified silicone (S5) is a modified silicone containing a hydroxyl group derived from phenol. For example, the following products (both end types) can be easily obtained from the market.
X−22−1821(信越化学工業株式会社製);BY16−799及びBY16−150S等(以上、東レ・ダウコーニングシリコーン株式会社製)。 X-22-1821 (manufactured by Shin-Etsu Chemical Co., Ltd.); BY16-799, BY16-150S, etc. (above, manufactured by Toray Dow Corning Silicone Co., Ltd.).
メルカプト基含有メルカプト変性シリコーン(S6)としては、チオアルコールに由来するメルカプト基を含有する変性シリコーンであり、市場から容易に入手でき、たとえば、以下の商品等が挙げられる。 The mercapto group-containing mercapto-modified silicone (S6) is a modified silicone containing a mercapto group derived from thioalcohol and can be easily obtained from the market. Examples thereof include the following products.
側鎖型としては、KF−2001及びKF−2004等(以上、信越化学工業株式会社製);BX16−838A(東レ・ダウコーニングシリコーン株式会社製)等が挙げられ、両末端型としては、、X−22−167B(信越化学工業株式会社製)等が挙げられる。 Examples of the side chain type include KF-2001 and KF-2004 and the like (manufactured by Shin-Etsu Chemical Co., Ltd.); BX16-838A (manufactured by Toray Dow Corning Silicone Co., Ltd.) and the like. X-22-167B (manufactured by Shin-Etsu Chemical Co., Ltd.) and the like.
<一般式(1)で表されるグリシジル化合物(G)>
一般式(1)において、非還元性の二又は三糖類のt個の1級水酸基から水素原子を除いた反応残基(Q)を構成することができる二又は三糖類としては、蔗糖(サッカロース)、トレハロース、イソトレハロース、イソサッカロース、ゲンチアノース、ラフィノース、メレチトース及びプランテオース等が挙げられる。これらのうち、耐水性等の観点から、蔗糖、トレハロース、ゲンチアノース、ラフィノース及びプランテオースが好ましく、さらに好ましくは蔗糖及びラフィノースであり、供給性及びコスト等の観点から、特に好ましくは蔗糖である。
<Glycidyl compound (G) represented by general formula (1)>
In the general formula (1), the di- or trisaccharide capable of constituting the reaction residue (Q) obtained by removing a hydrogen atom from t primary hydroxyl groups of a non-reducing di- or trisaccharide is sucrose (saccharose). ), Trehalose, isotrehalose, isosaccharose, gentianose, raffinose, meretitol, planteose and the like. Of these, sucrose, trehalose, gentianose, raffinose and planteose are preferable from the viewpoint of water resistance and the like, more preferably sucrose and raffinose, and sucrose is particularly preferable from the viewpoint of supply ability and cost.
一般式(1)において、炭素数2〜4のオキシアルキレン基(AO)としては、オキシエチレン、オキシプロピレン、オキシブチレン及びこれらの混合等が挙げられる。これらのうち、表面張力低下能等の観点から、オキシプロピレン及びオキシブチレンが好ましい。また、n個のAOは、同じでも異なってもよく、また複数個の(−OA)n及び(AO−)n{以下、これらを纏めて(AO−)nと略する。}は同じでも異なってもよい。 In the general formula (1), examples of the oxyalkylene group (AO) having 2 to 4 carbon atoms include oxyethylene, oxypropylene, oxybutylene, and a mixture thereof. Of these, oxypropylene and oxybutylene are preferred from the viewpoint of the ability to reduce surface tension. The n AOs may be the same or different, and a plurality of (-OA) n and (AO-) n {hereinafter, these are collectively abbreviated as (AO-) n. } May be the same or different.
(AO−)n内に複数種類のオキシアルキレン基を含む場合、これらのオキシアルキレン基の結合順序(ブロック状、ランダム状及びこれらの組合せ)及び含有割合には制限ないが、ブロック状、又はブロック状とランダム状との組合せを含むことが好ましい。 When (AO-) n contains a plurality of types of oxyalkylene groups, the bonding order (block, random and combinations thereof) and content of these oxyalkylene groups are not limited, but block or block It is preferable to include a combination of a shape and a random shape.
(AO−)n内に複数種類のオキシアルキレン基を含み、オキシエチレンを含む場合、オキシエチレン基の含有割合(モル%)は、表面張力低下能及び耐水性等の観点からオキシアルキレン基の全モル数に基づいて、1〜30が好ましく、さらに好ましくは1〜25、特に好ましくは3〜25、最も好ましくは3〜20である。 When (AO-) n contains a plurality of types of oxyalkylene groups and oxyethylene is contained, the content ratio (mol%) of the oxyethylene groups is the total of oxyalkylene groups from the viewpoint of surface tension reducing ability and water resistance. Based on the number of moles, 1 to 30 is preferable, 1 to 25 is more preferable, 3 to 25 is particularly preferable, and 3 to 20 is most preferable.
(AO−)n内にオキシエチレン基とオキシプロピレン基及び/又はオキシブチレン基とを含む場合、耐水性の観点から、反応残基(Q)から離れた端部にオキシプロピレン又は/及びオキシブチレンが位置することが好ましい。すなわち、(AO−)nにオキシエチレン基とオキシプロピレン基及び/又はオキシブチレン基とを含む場合、反応残基(Q)にオキシエチレン基が直接的に結合していることが好ましい。 When (AO-) n contains an oxyethylene group and an oxypropylene group and / or oxybutylene group, from the viewpoint of water resistance, oxypropylene or / and oxybutylene is present at the end away from the reaction residue (Q). Is preferably located. That is, when (AO-) n contains an oxyethylene group and an oxypropylene group and / or oxybutylene group, it is preferable that the oxyethylene group is directly bonded to the reaction residue (Q).
nは、1〜40の整数であり、好ましくは2〜37の整数、さらに好ましくは2〜33の整数、特に好ましくは3〜30の整数である。この範囲であると、表面張力低下能等がさらに良好となる。複数個のnは異なっていても又は同じでも構わない。 n is an integer of 1 to 40, preferably an integer of 2 to 37, more preferably an integer of 2 to 33, and particularly preferably an integer of 3 to 30. Within this range, the surface tension reducing ability and the like are further improved. A plurality of n may be different or the same.
一般式(1)で表されるグリシジル化合物(G)中のオキシアルキレン基(AO)の総数は、10〜80の整数が好ましく、さらに好ましくは10〜70の整数、特に好ましくは20〜70の整数、最も好ましくは20〜60の整数である。この範囲であると、表面張力低下能がさらに良好となる。 The total number of oxyalkylene groups (AO) in the glycidyl compound (G) represented by the general formula (1) is preferably an integer of 10 to 80, more preferably an integer of 10 to 70, particularly preferably 20 to 70. An integer, most preferably an integer of 20-60. Within this range, the surface tension reducing ability is further improved.
tは、2〜4の整数であり、たとえば、蔗糖の場合は3、トレハロースの場合は2、メレチトースの場合は4である。
pは1〜3の整数である。
但し、tの値は、pの値以上である。すなわち、t≧pである。
t is an integer of 2 to 4, and is, for example, 3 for sucrose, 2 for trehalose, and 4 for meletitose.
p is an integer of 1 to 3.
However, the value of t is not less than the value of p. That is, t ≧ p.
なお、たとえば、pが1の化合物とpが2の化合物との等モル混合物では、見かけ上、p=1.5となるが、この場合であっても、上記の混合物として本発明に含まれる。このように混合物の場合、pは整数ではなく、実数で表すことができ、この実数(P”)としては、1.2〜2.5が好ましく、さらに好ましくは1.2〜2、特に好ましくは1.2〜1.8である。この範囲であると、表面張力低下能がさらに良好となる。 For example, an equimolar mixture of a compound having p = 1 and a compound having p = 2 is apparently p = 1.5, but even in this case, the mixture is included in the present invention. . Thus, in the case of a mixture, p is not an integer but can be represented by a real number, and the real number (P ″) is preferably 1.2 to 2.5, more preferably 1.2 to 2, particularly preferably. In this range, the surface tension reducing ability is further improved.
活性水素含有変性シリコーン(S)とグリシジル化合物(G)との化学反応において、グリシジル化合物(G)の使用量(重量%)は、活性水素含有変性シリコーン(S)の重量に基づいて、10〜200が好ましく、さらに好ましくは10〜150、特に好ましくは20〜150、最も好ましくは20〜100である。この範囲であると、表面張力低下能がさらに良好となる。 In the chemical reaction between the active hydrogen-containing modified silicone (S) and the glycidyl compound (G), the amount (% by weight) of the glycidyl compound (G) used is 10 to 10 based on the weight of the active hydrogen-containing modified silicone (S). 200 is preferable, more preferably 10 to 150, particularly preferably 20 to 150, and most preferably 20 to 100. Within this range, the surface tension reducing ability is further improved.
グリシジル化合物(G)の使用量をモル部で表すと、以下の通りであるが、重量%とモル部との量関係が齟齬する場合、重量%を優先する。
グリシジル化合物(G)の使用量(モル部)は、活性水素含有変性シリコーン(S)の活性水素1モル部当たり、0.1〜1.5が好ましく、さらに好ましくは0.1〜1.4、特に好ましくは0.3〜1、最も好ましくは0.3〜0.8である。この範囲であると、表面張力低下能がさらに良好となる。
When the amount of the glycidyl compound (G) used is expressed in mol parts, it is as follows. However, when the quantitative relationship between the wt% and the mol parts is inconsequential, the wt% is prioritized.
As for the usage-amount (mol part) of a glycidyl compound (G), 0.1-1.5 are preferable with respect to 1 mol part of active hydrogen of active hydrogen containing modified silicone (S), More preferably, it is 0.1-1.4. Particularly preferred is 0.3 to 1, and most preferred is 0.3 to 0.8. Within this range, the surface tension reducing ability is further improved.
一般式(1)で表されるグリシジル化合物としては次の化合物等が挙げられる。
なお、「P」はオキシプロピレン基、「E」はオキシエチレン基、「B」はオキシブチレン基を表し、これらの添え字(数字)はそれぞれの個数を表す。また、「Q1」は蔗糖から3個の1級水酸基の水素原子を除いた反応残基、「Q2」はトレハロースから2個の1級水酸基の水素原子を除いた反応残基、「Q3」はメレチトースから4個の1級水酸基の水素原子を除いた反応残基、「・」はこの・の前後のオキシアルキレン同士がランダム状に結合していること{たとえば、(−P5・B5)はオキシプロピレン基5個とオキシブチレン基5個がランダム状に結合していること}を、「/」はこの/の前後のオキシアルキレン同士がブロック状に逐次結合していること{たとえば、(−P20/B5)はまずオキシプロピレン基が20個、次いでオキシブチレン基が5個結合していること}を表す。
The following compounds etc. are mentioned as a glycidyl compound represented by General formula (1).
“P” represents an oxypropylene group, “E” represents an oxyethylene group, and “B” represents an oxybutylene group, and these subscripts (numbers) represent the number of each. “Q1” is a reaction residue obtained by removing three primary hydroxyl group hydrogen atoms from sucrose, “Q2” is a reaction residue obtained by removing two primary hydroxyl group hydrogen atoms from trehalose, and “Q3” is The reaction residue obtained by removing the hydrogen atoms of the four primary hydroxyl groups from meretitol, “•” means that oxyalkylenes before and after this • are bonded together in a random manner {for example, (−P5 • B5) is oxy That five propylene groups and five oxybutylene groups are bonded in a random manner}, “/” indicates that oxyalkylenes before and after this / are sequentially bonded in a block shape {for example, (−P20 / B5) represents that 20 oxypropylene groups and then 5 oxybutylene groups are bonded}.
これらのうち、No.1−1、3−1、4−2、6−1、8−1、13−2、16−1、18−2、24−1又は25−1で表される化合物が好ましく、さらに好ましくはNo.4−2、6−1、8−1、13−2又は24−1で表される化合物である。 Of these, No. The compound represented by 1-1, 3-1, 4-2, 6-1, 8-1, 13-2, 16-1, 18-2, 24-1 or 25-1 is preferable, and more preferably No. It is a compound represented by 4-2, 6-1, 8-1, 13-2 or 24-1.
一般式(1)で表されるグリシジル化合物(G)は、一般式(2)で表されるポリエーテル化合物(GP)とエピハロヒドリン(GE)との化学反応により得ることができる。 The glycidyl compound (G) represented by the general formula (1) can be obtained by a chemical reaction between the polyether compound (GP) represented by the general formula (2) and epihalohydrin (GE).
Q-{(AO-)nH}t (2)
Q-{(AO-) n H} t (2)
一般式(2)において、H、Q、t、AO、nは一般式(1)におけるそれぞれと同じであり、好ましい範囲も同じである。また、一般式(2)で表されるポリエーテル化合物中のオキシアルキレン基(AO)の総数は10〜80の整数が好ましく、さらに好ましくは10〜70の整数、特に好ましくは20〜70の整数、最も好ましくは20〜60の整数である。この範囲であると、表面張力低下能がさらに良好となる。 In the general formula (2), H, Q, t, AO, and n are the same as those in the general formula (1), and the preferred ranges are also the same. The total number of oxyalkylene groups (AO) in the polyether compound represented by the general formula (2) is preferably an integer of 10 to 80, more preferably an integer of 10 to 70, particularly preferably an integer of 20 to 70. Most preferably, it is an integer of 20 to 60. Within this range, the surface tension reducing ability is further improved.
エピハロヒドリン(GE)としては、エピクロルヒドリン、エピブロモヒドリン等が挙げられる。これらのうち、エピクロルヒドリンが好ましい。 Epihalohydrin (GE) includes epichlorohydrin, epibromohydrin, and the like. Of these, epichlorohydrin is preferred.
ポリエーテル化合物(GP)及びエピハロヒドリン(GE)の使用量は、ポリエーテル化合物(GP)/エピハロヒドリン(GE)のモル比が0.25〜1となる量が好ましく、さらに好ましくは0.33〜1となる量である。この比率にすると、後述する脱塩濾過工程が簡便に実施できる。 The amount of the polyether compound (GP) and epihalohydrin (GE) used is preferably such that the polyether compound (GP) / epihalohydrin (GE) molar ratio is 0.25 to 1, more preferably 0.33 to 1. This is the amount. If it is this ratio, the desalting filtration process mentioned later can be implemented simply.
一般式(2)で表されるポリエーテル化合物(GP)とエピハロヒドリン(GE)との化学反応によりグリシジル化合物(G)を製造する方法としては、アルカリ金属水酸化物(A)の存在下、ポリエーテル化合物(GP)とエピハロヒドリン(GE)とを反応させてグリシジル化合物(G)を得る製造方法において、
アルカリ金属水酸化物(A)、ポリエーテル化合物(GP)及びエピハロヒドリン(GE)の重量に基づいて水の含有量を2〜5重量%に調整して、この反応を開始する反応工程(1)を含むことが好ましい。
As a method for producing a glycidyl compound (G) by a chemical reaction between a polyether compound (GP) represented by the general formula (2) and an epihalohydrin (GE), poly (polysiloxane) in the presence of an alkali metal hydroxide (A) In a production method for obtaining a glycidyl compound (G) by reacting an ether compound (GP) with an epihalohydrin (GE),
Reaction step (1) in which the water content is adjusted to 2 to 5% by weight based on the weights of the alkali metal hydroxide (A), the polyether compound (GP) and the epihalohydrin (GE), and this reaction is started. It is preferable to contain.
このような反応工程(1)を含む製造方法によると、副成する中和塩の造粒を促し、中和塩粒子を増大化できるため、脱塩を簡便な濾過工程で実施できる。したがって、このような製造方法によると、特別な水洗処理装置を要せず、又、水洗処理による膨大な量の排水が生じることもなく、環境にもコスト的にも優位性が得られる。また、このような製造方法では、酸触媒を必要としないため、製造設備の腐食等に配慮する必要がない。さらに、このような製造方法により得られるグリシジル化合物(G)にはハロゲン原子(塩素原子等)の含有量が防錆面に影響ないレベルであるため、電子、電気、塗料等の分野に問題なく使用できる。 According to the production method including such a reaction step (1), granulation of the by-product neutralized salt can be promoted and the neutralized salt particles can be increased, and therefore, desalting can be performed by a simple filtration step. Therefore, according to such a manufacturing method, a special water washing treatment apparatus is not required, and a huge amount of drainage is not generated by the water washing treatment, and an advantage in terms of environment and cost can be obtained. In addition, such a manufacturing method does not require an acid catalyst, and therefore, it is not necessary to consider corrosion of manufacturing equipment. Furthermore, since the content of halogen atoms (chlorine atoms, etc.) in the glycidyl compound (G) obtained by such a production method is at a level that does not affect the rust prevention surface, there is no problem in the fields of electronics, electricity, paints, etc. Can be used.
アルカリ金属水酸化物(A)としては、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化ルビジウム及び水酸化セシウム等が挙げられる。これらのうち、水酸化ナトリウム及び水酸化カリウムが好ましく、中和塩の造粒(粒子の増大化)の観点からさらに好ましくは水酸化ナトリウムである。 Examples of the alkali metal hydroxide (A) include lithium hydroxide, sodium hydroxide, potassium hydroxide, rubidium hydroxide, and cesium hydroxide. Of these, sodium hydroxide and potassium hydroxide are preferable, and sodium hydroxide is more preferable from the viewpoint of granulation of neutralized salt (increase in particles).
アルカリ金属水酸化物(A)の使用量は、{アルカリ金属水酸化物(A)の塩基当量(eq.)/エピハロヒドリン(GE)のハロゲンの当量(eq.)}比が、0.7〜1.1となる量が好ましく、さらに好ましくは0.8〜1.0となる量である。この比率にすると、過剰のアルカリ金属水酸化物(A)の中和工程を省くことができ、また過剰のエピハロヒドリン(GE)は減圧下の脱水工程等で除去できる。 The amount of the alkali metal hydroxide (A) used is such that the ratio of {base equivalent of the alkali metal hydroxide (A) (eq.) / Equivalent of the halogen of the epihalohydrin (GE) (eq.)} Is 0.7 to An amount of 1.1 is preferable, and an amount of 0.8 to 1.0 is more preferable. With this ratio, the neutralization step of excess alkali metal hydroxide (A) can be omitted, and excess epihalohydrin (GE) can be removed by a dehydration step under reduced pressure or the like.
一般式(2)で表されるポリエーテル化合物(GP)は、公知の化学反応を適用して製造でき、たとえば、非還元性の二又は三糖類(a1)1モル部と、炭素数2〜4のアルキレンオキシド(a2)20〜80モル部との化学反応(1)から化合物(a12)を得る方法等により製造できる。 The polyether compound (GP) represented by the general formula (2) can be produced by applying a known chemical reaction, for example, 1 mol part of a non-reducing di- or trisaccharide (a1), and 2 to 2 carbon atoms. 4 can be produced by a method of obtaining compound (a12) from chemical reaction (1) with 20 to 80 parts by mole of alkylene oxide (a2).
非還元性の二又は三糖類(a1)としては、一般式(1)における反応残基(Q)を構成することができる二又は三糖類と同じものが使用でき、好ましい範囲も同じである。 As the non-reducing di- or trisaccharide (a1), the same disaccharide or trisaccharide that can constitute the reaction residue (Q) in the general formula (1) can be used, and the preferred range is also the same.
アルキレンオキシド(a2)としては、炭素数2〜4のアルキレンオキシド等が使用でき、エチレンオキシド(eo)、プロピレンオキシド(po)、ブチレンオキシド(bo)及びこれらの混合物等が挙げられる。これらのうち、得られる表面張力低下能及び耐水性の観点等から、eo、po及びeoとpoとの混合が好ましく、さらに好ましくはeoとpoとの混合である。 As alkylene oxide (a2), C2-C4 alkylene oxide etc. can be used, and ethylene oxide (eo), propylene oxide (po), butylene oxide (bo), these mixtures, etc. are mentioned. Among these, from the viewpoint of the surface tension reducing ability and water resistance obtained, eo, po, and eo and po are preferably mixed, and more preferably eo and po are mixed.
複数種類のアルキレンオキシドを用いる場合、反応させる順序(ブロック状、ランダム状及びこれらの組合せ)及び使用割合には制限ないが、ブロック状又はブロック状とランダム状の組合せを含むことが好ましくい。eoを使用する場合、eoの使用割合(モル%)は、アルキレンオキシドの全モル数に基づいて、1〜30が好ましく、さらに好ましくは1〜25、特に好ましくは3〜25、最も好ましくは3〜20である。eoと、po又は/及びboとを含む場合、非還元性の二又は三糖類(a1)へのeoの反応後にpo及び/又はboを反応させることが好ましい。 In the case of using a plurality of types of alkylene oxide, the order of reaction (block shape, random shape and combinations thereof) and the use ratio are not limited, but it is preferable to include a block shape or a combination of block shape and random shape. When eo is used, the use ratio (mol%) of eo is preferably 1 to 30, more preferably 1 to 25, particularly preferably 3 to 25, and most preferably 3 based on the total number of moles of alkylene oxide. ~ 20. When eo and po or / and bo are included, it is preferable to react po and / or bo after the reaction of eo to the non-reducing di- or trisaccharide (a1).
アルキレンオキシド(a2)の使用量(モル)は、非還元性の二又は三糖類(a1)1モル当たり、10〜80が好ましく、さらに好ましくは10〜70、特に好ましくは20〜70、最も好ましくは20〜60である。この範囲であると、表面張力低下能がさらに良好となる。 The amount (mole) of alkylene oxide (a2) used is preferably 10 to 80, more preferably 10 to 70, particularly preferably 20 to 70, most preferably per mole of non-reducing di- or trisaccharide (a1). Is 20-60. Within this range, the surface tension reducing ability is further improved.
非還元性の二又は三糖類(a1)と、アルキレンオキシド(a2)との付加反応には、公知の方法(特開2004−224945号公報等)等が適用でき、アニオン重合、カチオン重合又は配位アニオン重合等のいずれの形式で実施してもよい。また、これらの重合形式は単独でも、重合度等に応じて組み合わせて用いてもよい。 For the addition reaction between the non-reducing di- or trisaccharide (a1) and the alkylene oxide (a2), a known method (Japanese Patent Application Laid-Open No. 2004-224945) or the like can be applied, and anionic polymerization, cationic polymerization or coordination can be performed. You may implement in any forms, such as coordinate anionic polymerization. These polymerization forms may be used alone or in combination according to the degree of polymerization.
アルキレンオキシド(a2)の付加反応には公知の反応触媒(特開2004−224945号公報等)等が使用できる。なお、反応溶媒として以下に説明するアミドを用いる場合には反応触媒を用いる必要がない。 For the addition reaction of alkylene oxide (a2), a known reaction catalyst (JP 2004-224945 A) can be used. In addition, when using the amide demonstrated below as a reaction solvent, it is not necessary to use a reaction catalyst.
反応触媒を使用する場合、その使用量(重量%)は、非還元性の二又は三糖類(a1)とアルキレンオキシド(a2)との合計重量に基づいて、0.01〜1が好ましく、さらに好ましくは0.03〜0.8、特に好ましくは0.05〜0.6である。この範囲であると、経済性(製造の所要時間及び触媒コスト等)及び生成物の純度(単分散性等)等がさらに良好となる。 When the reaction catalyst is used, the amount used (% by weight) is preferably 0.01 to 1, based on the total weight of the non-reducing di- or trisaccharide (a1) and the alkylene oxide (a2). Preferably it is 0.03-0.8, Most preferably, it is 0.05-0.6. When it is within this range, the economy (required production time, catalyst cost, etc.), the purity of the product (monodispersity, etc.), etc. are further improved.
反応触媒を使用する場合、反応触媒は最終的に反応生成物から除去することが好ましく、除去方法としては、合成アルミノシリケート等のアルカリ吸着剤{たとえば、商品名:キョーワード700、協和化学工業(株)、「キョワード」は同社の登録商標である。}を用いる方法(特開昭53−123499号公報等)、キシレン又はトルエン等の溶媒に溶かして水洗する方法(特公昭49−14359号公報等)、イオン交換樹脂を用いる方法(特開昭51−23211号公報等)及び反応触媒を酸(鉱酸、炭酸ガス等)で中和して生じる中和塩(塩酸塩、硫酸塩、炭酸塩等)を濾過する方法(特公昭52−33000号公報等)等が挙げられる。 When a reaction catalyst is used, it is preferable to finally remove the reaction catalyst from the reaction product. As the removal method, an alkali adsorbent such as synthetic aluminosilicate {for example, trade name: Kyoward 700, Kyowa Chemical Industry ( Co., Ltd., "Kyoward" is a registered trademark of the company. } (JP-A-53-123499, etc.), a method of dissolving in a solvent such as xylene or toluene and washing with water (JP-B-49-14359, etc.), a method using an ion exchange resin (JP-A-51 No. 23211, etc.) and a method of filtering neutralized salts (hydrochloride, sulfate, carbonate, etc.) produced by neutralizing the reaction catalyst with an acid (mineral acid, carbon dioxide, etc.) (Japanese Patent Publication No. 52-33000) Publication etc.).
反応触媒の残存量は、JIS K1557−4:2007に記載のCPR(Controlled Polymerization Rate)値で管理でき、CPR値が20以下であることが好ましく、さらに好ましくは10以下、特に好ましくは5以下、最も好ましくは2以下である。 The remaining amount of the reaction catalyst can be managed by the CPR (Controlled Polymerization Rate) value described in JIS K1557-4: 2007, the CPR value is preferably 20 or less, more preferably 10 or less, particularly preferably 5 or less, Most preferably, it is 2 or less.
アルキレンオキシド(a2)の付加反応の工程には、反応溶媒を用いることができる。反応溶媒としては、活性水素を持たないものが好ましく、さらに好ましくは非還元性の二又は三糖類(a1)、アルキレンオキシド(a2)及び(a2)との反応により生成する生成物を溶解するものが好ましい。 A reaction solvent can be used in the step of the addition reaction of alkylene oxide (a2). As the reaction solvent, those having no active hydrogen are preferred, and more preferably those which dissolve the product produced by the reaction with the non-reducing disaccharide or trisaccharide (a1), alkylene oxide (a2) and (a2). Is preferred.
このような反応溶媒としては、炭素数3〜8のアルキルアミド及び炭素数5〜7の複素環式アミド等が使用できる。 As such a reaction solvent, alkyl amides having 3 to 8 carbon atoms and heterocyclic amides having 5 to 7 carbon atoms can be used.
アルキルアミドとしては、N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセトアミド、N,N−ジエチルアセトアミド、N−メチル−N−プロピルアセトアミド及び2−ジメチルアミノアセトアルデヒドジメチルアセタール等が挙げられる。 Examples of the alkylamide include N, N-dimethylformamide (DMF), N, N-dimethylacetamide, N, N-diethylacetamide, N-methyl-N-propylacetamide, 2-dimethylaminoacetaldehyde dimethylacetal and the like.
複素環式アミドとしては、N−メチルピロリドン、N−メチル−ε−カプロラクタム及びN,N−ジメチルピロールカルボン酸アミド等が挙げられる。 Examples of the heterocyclic amide include N-methylpyrrolidone, N-methyl-ε-caprolactam, and N, N-dimethylpyrrolecarboxylic acid amide.
これらのうち、アルキルアミド及びN−メチルピロリドンが好ましく、さらに好ましくはDMF、N,N−ジメチルアセトアミド及びN−メチルピロリドン、特に好ましくはDMF及びN−メチルピロリドン、最も好ましくはDMFである。 Of these, alkylamide and N-methylpyrrolidone are preferred, DMF, N, N-dimethylacetamide and N-methylpyrrolidone are more preferred, DMF and N-methylpyrrolidone are most preferred, and DMF is most preferred.
反応溶媒を用いる場合、その使用量(重量%)は、非還元性の二又は三糖類(a1)及びアルキレンオキシド(a2)の重量に基づいて、20〜200が好ましく、さらに好ましくは40〜180、特に好ましくは60〜150である。 When a reaction solvent is used, the amount used (% by weight) is preferably 20 to 200, more preferably 40 to 180, based on the weight of the non-reducing di- or trisaccharide (a1) and the alkylene oxide (a2). Especially preferably, it is 60-150.
反応溶媒を用いた場合、反応後に反応溶媒を除去することが好ましい。反応溶媒の残存量(重量%)は、非還元性の二又は三糖類(a1)及びアルキレンオキシド(a2)の重量に基づいて、0.1以下であることが好ましく、さらに好ましくは0.05以下、特に好ましくは0.01以下である。なお、反応溶媒の残存量は、内部標準物質を用いるガスクロマトグラフィー法にて求めることができる。 When a reaction solvent is used, it is preferable to remove the reaction solvent after the reaction. The residual amount (% by weight) of the reaction solvent is preferably 0.1 or less, more preferably 0.05 based on the weight of the non-reducing di- or trisaccharide (a1) and alkylene oxide (a2). Hereinafter, it is particularly preferably 0.01 or less. The residual amount of the reaction solvent can be determined by gas chromatography using an internal standard substance.
反応溶媒の除去方法としては、特開2005−132916号公報に記載の方法などが挙げられる。 Examples of the method for removing the reaction solvent include the method described in JP-A-2005-132916.
反応には公知の反応容器(特開2004−224945号公報等)等が使用できる。反応雰囲気としては、アルキレンオキシド(a2)を反応系に導入する前に反応装置内を真空又は乾燥した不活性気体(アルゴン、窒素及び二酸化炭素等)の雰囲気下とすることが好ましい。また、反応温度(℃)としては80〜150が好ましく、さらに好ましくは90〜130である。反応圧力(ゲージ圧:MPa、以下同じ)は0.8以下が好ましく、さらに好ましくは0.5以下である。 A known reaction vessel (JP 2004-224945 A) or the like can be used for the reaction. As the reaction atmosphere, it is preferable that the inside of the reaction apparatus is evacuated or dried in an inert gas (argon, nitrogen, carbon dioxide, etc.) atmosphere before introducing the alkylene oxide (a2) into the reaction system. Moreover, as reaction temperature (degreeC), 80-150 are preferable, More preferably, it is 90-130. The reaction pressure (gauge pressure: MPa, hereinafter the same) is preferably 0.8 or less, more preferably 0.5 or less.
反応終点の確認は、次の方法等により行うことができる。すなわち、反応温度を15分間一定に保ったとき、反応圧力の低下が0.001MPa以下となれば反応終点とする。所要反応時間は通常4〜12時間である。 The end point of the reaction can be confirmed by the following method. That is, when the reaction temperature is kept constant for 15 minutes, the reaction end point is determined when the decrease in the reaction pressure becomes 0.001 MPa or less. The required reaction time is usually 4 to 12 hours.
反応工程(1)の開始に先立ち、水の含有量(重量%)を、アルカリ金属水酸化物(A)、ポリエーテル化合物(GP)及びエピハロヒドリン(GE)の重量に基づいて、2〜5に調整することが好ましく、さらに好ましくは2.5〜4.5、特に好ましくは3〜4に調整することである。この範囲であると、生成した中和塩は、大きく結晶化し、脱塩濾過工程(例えば、濾紙No.2:ADVANTEC社製、保留粒子径:5μm)にて容易に除去できる。 Prior to the start of reaction step (1), the water content (% by weight) is reduced to 2-5 based on the weight of alkali metal hydroxide (A), polyether compound (GP) and epihalohydrin (GE). It is preferable to adjust, more preferably 2.5 to 4.5, and particularly preferably 3 to 4. Within this range, the produced neutralized salt crystallizes greatly and can be easily removed by a desalting filtration step (for example, filter paper No. 2: manufactured by ADVANTEC, reserved particle diameter: 5 μm).
反応工程(1)において、中和塩と共に水が副生するが、反応開始時に水の含有量が上記の範囲であれば、反応途中において、この範囲を上回っても何ら差し支えない。 In the reaction step (1), water is by-produced together with the neutralized salt. However, if the water content is within the above range at the start of the reaction, it may be exceeded in the middle of the reaction.
反応系内に水が存在すると、特開平5−163260号公報に記載の副反応が生じ、エーテル結合によりポリエーテル化合物(GP)に導入された一部のグリシジル基(エポキシ基)が他のポリエーテル化合物(GP)の水酸基と開環反応し、結果として部分的に多量体化しやすくなると考えられるが、もし、多量体化しても問題なく使用できる。 When water is present in the reaction system, a side reaction described in JP-A-5-163260 occurs, and some glycidyl groups (epoxy groups) introduced into the polyether compound (GP) by ether bonds are exchanged with other polyesters. Although it is considered that the ring-opening reaction with the hydroxyl group of the ether compound (GP) results in partial multimerization, it can be used without any problem even if it is multimerized.
反応工程(1)の反応終点の確認は、次の方法等により行うことができる。すなわち、反応液のpHを測定し7〜8となれば反応終点とする。所要反応時間は通常3〜12時間である。なお、pHは、反応液を直接リトマス試験紙に付着させて色の変化を観察することにより測定できる(20〜30℃)。 The confirmation of the reaction end point in the reaction step (1) can be performed by the following method or the like. That is, when the pH of the reaction solution is measured and becomes 7 to 8, the reaction end point is reached. The required reaction time is usually 3 to 12 hours. In addition, pH can be measured by attaching a reaction liquid directly to a litmus paper and observing a color change (20-30 degreeC).
反応工程(1)は、塩基による脱ハロゲン化水素反応(Willamson合成法:反応中に逐次生成するハロゲン化水素を塩基により中和することにより反応を駆動する)で適用される反応条件がそのまま適用できる。
反応容器としては、加熱・冷却、撹拌及び滴下(圧入)が可能な反応容器を用いることが好ましい。
反応温度(℃)としては、30〜90程度が好ましく、さらに好ましくは50〜70である。
反応雰囲気としては、エピハロヒドリンを反応系に導入する前に反応装置内を不活性ガス(アルゴン、窒素及び二酸化炭素等)の雰囲気とすることが好ましい。
In the reaction step (1), the reaction conditions applied in the dehydrohalogenation reaction with a base (Willson synthesis method: the reaction is driven by neutralizing the hydrogen halide sequentially generated during the reaction with a base) are applied as they are. it can.
As the reaction vessel, it is preferable to use a reaction vessel capable of heating / cooling, stirring and dropping (press-fitting).
As reaction temperature (degreeC), about 30-90 are preferable, More preferably, it is 50-70.
As the reaction atmosphere, it is preferable to make the inside of the reaction apparatus an atmosphere of inert gas (argon, nitrogen, carbon dioxide, etc.) before introducing epihalohydrin into the reaction system.
以上の好ましい製造方法には、反応工程(1)に引き続き、反応工程(1)で副生した中和塩を濾過処理により除去する脱塩濾過工程(2)を含むことが好ましく、さらに好ましくは反応工程(1)に引き続き、得られたグリシジル化合物(G)の重量に基づいて、水の含有量を0.2(好ましくは0.1、さらに好ましくは0.05)重量%以下にした後、反応工程(1)で副生した中和塩を濾過処理により除去する脱塩濾過工程(2)を含むことである。 The preferable production method described above preferably includes a desalting filtration step (2) for removing the neutralized salt by-produced in the reaction step (1) by filtration after the reaction step (1), and more preferably After the reaction step (1), based on the weight of the glycidyl compound (G) obtained, the water content is 0.2 (preferably 0.1, more preferably 0.05) wt% or less. And a desalting filtration step (2) for removing the neutralized salt by-produced in the reaction step (1) by filtration.
濾過は公知の方法が適用でき、通常の自然濾過でも、減圧濾過(吸引濾過)でもよい。濾材や濾過装置も公知のものをそのまま適用できる。
濾過温度(℃)としては、30〜100程度が好ましく、さらに好ましくは50〜90である。
A known method can be applied to the filtration, and normal natural filtration or vacuum filtration (suction filtration) may be used. Known filter media and filtration devices can be applied as they are.
As filtration temperature (degreeC), about 30-100 are preferable, More preferably, it is 50-90.
反応工程(1)に引き続き、水の含有量を、得られたグリシジル化合物(G)の重量に基づいて、0.2重量%以下にする場合、脱水方法に制限はないが、減圧留去(減圧下脱水)する方法が好ましい。減圧留去(減圧下脱水)すると、もし、過剰のエピハロヒドリン(GE)が残存していても、水と共に除去できる。
減圧留去する場合、圧力{ゲージ圧(以下同じ)}は、−0.05〜−0.098MPa程度が好ましく、温度は、60〜100℃程度が好ましい。
Subsequent to the reaction step (1), when the water content is 0.2% by weight or less based on the weight of the obtained glycidyl compound (G), the dehydration method is not limited, but the distillation under reduced pressure ( A method of dehydration under reduced pressure is preferred. Distillation under reduced pressure (dehydration under reduced pressure) can be removed together with water even if excess epihalohydrin (GE) remains.
When distilling off under reduced pressure, the pressure {gauge pressure (hereinafter the same)} is preferably about -0.05 to -0.098 MPa, and the temperature is preferably about 60 to 100 ° C.
水の含有量(重量%)は、公知の方法で測定することができ、たとえば、Karl Fischer法(JIS K0113:2005、電量滴定方法)により求めることができる。 The water content (% by weight) can be measured by a known method, for example, by the Karl Fischer method (JIS K0113: 2005, coulometric titration method).
反応工程(1)の終了時において、過剰のアルカリ金属水酸化物(A)が残存している場合、これを除去することが好ましい。除去方法としては、ポリエーテル化合物(GP)の製造方法で説明した「アルキレンオキシド(a2)の付加反応に用いることができる反応触媒」の除去方法等が適用できる。これらのうち、アルカリ金属水酸化物を酸(鉱酸、炭酸ガス等)で中和して生じる中和塩(塩酸塩、硫酸塩、炭酸塩等)を濾過する方法が好ましい。濾過する方法を適用すると、反応工程(1)で副生する中和塩と共に濾過することができるため効率がよい。濾過方法に置き換えて、または濾過方法と共に、アルカリ金属水酸化物(A)をアルカリ吸着剤で処理することにより、さらに残存量を低減させてもよい。 When excess alkali metal hydroxide (A) remains at the end of the reaction step (1), it is preferably removed. As the removal method, the removal method of “reaction catalyst that can be used for addition reaction of alkylene oxide (a2)” described in the production method of the polyether compound (GP) can be applied. Among these, a method of filtering a neutralized salt (hydrochloride, sulfate, carbonate, etc.) produced by neutralizing an alkali metal hydroxide with an acid (mineral acid, carbon dioxide, etc.) is preferable. If the method of filtering is applied, since it can filter with the neutralized salt byproduced by reaction process (1), it is efficient. The residual amount may be further reduced by treating the alkali metal hydroxide (A) with an alkali adsorbent instead of or together with the filtration method.
なお、アルカリ金属水酸化物を酸で中和する場合、酸としては、鉱酸(塩酸、硫酸、硝酸及び燐酸等)、有機酸(蟻酸、酢酸、プロピオン酸、安息香酸、サリチル酸、テレフタル酸、シュウ酸、マロン酸、アジピン酸、コハク酸、乳酸等)等が使用できる。 In addition, when neutralizing an alkali metal hydroxide with an acid, examples of acids include mineral acids (hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, etc.), organic acids (formic acid, acetic acid, propionic acid, benzoic acid, salicylic acid, terephthalic acid, Oxalic acid, malonic acid, adipic acid, succinic acid, lactic acid, etc.) can be used.
アルカリ金属水酸化物(A)の残存量は、JIS K1557−4:2007に記載のCPR(Controlled Polymerization Rate)値で管理することができる。CPR値は、20以下であることが好ましく、さらに好ましくは10以下、特に好ましくは5以下、最も好ましくは2以下である。 The remaining amount of the alkali metal hydroxide (A) can be managed by a CPR (Controlled Polymerization Rate) value described in JIS K1557-4: 2007. The CPR value is preferably 20 or less, more preferably 10 or less, particularly preferably 5 or less, and most preferably 2 or less.
<活性水素含有変性シリコーン(S)とグリシジル化合物(G)との化学反応>
本発明の界面活性剤を構成するシリコーン変性体(Y)は、活性水素含有変性シリコーン(S)と、一般式(1)で表されるグリシジル化合物(G)との化学反応により得られる。この反応(付加反応)には、公知の反応触媒(特開2004−224945号公報等)及び/又は公知の反応溶媒(特開2003−160752号公報等)等が使用できる。一方、この反応において、反応溶媒及び反応触媒なしでも製造できる。後者の場合、加熱、攪拌、密閉、脱水等可能な反応槽に所定量の活性水素含有変性シリコーン(S)とグリシジル化合物(G)とを仕込み、攪拌しつつ脱水、昇温し、120〜150℃、2〜8時間で反応が完結する。
<Chemical reaction between active hydrogen-containing modified silicone (S) and glycidyl compound (G)>
The silicone modified body (Y) constituting the surfactant of the present invention is obtained by a chemical reaction between the active hydrogen-containing modified silicone (S) and the glycidyl compound (G) represented by the general formula (1). For this reaction (addition reaction), a known reaction catalyst (Japanese Patent Laid-Open No. 2004-224945 and the like) and / or a known reaction solvent (Japanese Patent Laid-Open No. 2003-160752 and the like) can be used. On the other hand, in this reaction, it can be produced without a reaction solvent and a reaction catalyst. In the latter case, a predetermined amount of the active hydrogen-containing modified silicone (S) and the glycidyl compound (G) are charged into a reaction vessel that can be heated, stirred, sealed, dehydrated, etc., dehydrated and heated up while stirring, 120 to 150 The reaction is completed at 2 ° C. for 2 to 8 hours.
反応の終点は、エポキシ基の消滅により行うことができる。エポキシ基の定量としては、過塩素酸と第四級アンモニュウム塩(CTAB)とからハロゲン化水素(HB)を発生させてこれとエポキシ基とを反応させるセチルトリメチルアンモニュウムブロマイド(CTAB)法(JIS K7236:ISO3001:1999に準拠)が適用できる。 The end point of the reaction can be performed by the disappearance of the epoxy group. The epoxy group is quantified by cetyltrimethylammonium bromide (CTAB) method (JIS K7236) in which hydrogen halide (HB) is generated from perchloric acid and a quaternary ammonium salt (CTAB) and reacted with the epoxy group. : Conforming to ISO3001: 1999) is applicable.
動的表面(界面)張力低下能とは、界面活性剤等を添加することにより、新たな界面が形成された後、比較的短時間で表面張力を低下させる能力のことであり、ジェミニ型界面活性剤に代表される性能である。動的表面張力とは、新たな界面が形成されてから10分の1秒(100ミリ秒、または10Hzとも表記する)程度の後に測定される表面張力のことであり、通常の界面活性剤は動的表面張力低下能が低く、界面が新たに形成された場合、10分の1秒程度の経過では殆ど表面張力が低下しない(動的表面張力低下能が低い)。なお、動的表面張力の測定法としては、バブルプレッシャー法が一般的であり、例えばクルス社製のBP2バブルプレッシャー動的表面張力計等を用いて測定できる。 Dynamic surface (interface) tension reduction ability is the ability to reduce surface tension in a relatively short time after a new interface is formed by adding a surfactant or the like. It is the performance represented by the activator. The dynamic surface tension is a surface tension measured about a tenth of a second (also expressed as 100 milliseconds or 10 Hz) after a new interface is formed. When the dynamic surface tension reducing ability is low and a new interface is formed, the surface tension hardly decreases after about 1/10 second (dynamic surface tension reducing ability is low). As a method for measuring the dynamic surface tension, a bubble pressure method is generally used, and for example, it can be measured using a BP2 bubble pressure dynamic surface tension meter manufactured by Cruz.
本発明の界面活性剤の動的表面張力{mN/m、0.2重量%水溶液、25℃、表面寿命(泡寿命)100ミリ秒(10Hz)}は、30〜45を示し、さらに好ましくは30〜43、特に好ましくは30〜42、最も好ましくは30〜40を示す。 The dynamic surface tension {mN / m, 0.2 wt% aqueous solution, 25 ° C., surface life (foam life) 100 milliseconds (10 Hz)} of the surfactant of the present invention is 30 to 45, more preferably 30 to 43, particularly preferably 30 to 42, most preferably 30 to 40 is indicated.
静的表面張力は、例えば協和界面科学(株)製の自動表面張力計CBVP−Z型を用いて測定できる。本発明の界面活性剤の静的表面張力{mN/m、0.2重量%水溶液、25℃}は、20〜30を示し、さらに好ましくは20〜28、特に好ましくは20〜26、最も好ましくは20〜25を示す。 The static surface tension can be measured using, for example, an automatic surface tension meter CBVP-Z manufactured by Kyowa Interface Science Co., Ltd. The surfactant of the present invention has a static surface tension {mN / m, 0.2 wt% aqueous solution, 25 ° C.} of 20 to 30, more preferably 20 to 28, particularly preferably 20 to 26, and most preferably. Indicates 20-25.
先に述べたジェミニ型界面活性剤に於いては、一般的に動的表面張力低下能には優れるものの、静的表面張力低下能は通常の界面活性剤に劣る。本発明の界面活性剤は、動的表面張力低下能及び静的表面張力低下能の両方に優れており、水性コーティング剤組成物{界面活性剤、水、樹脂バインダー及び必要により着色剤を含有してなる。例えば、水性塗料、紙塗工塗料及び水性インキ等}用界面活性剤として適しており、高速塗工用水性コーティング剤組成物用界面活性剤として好適であり、特に、高速塗工用水性塗料(カーテンフローコート等)、高速塗工用紙塗工液、高速印刷用水性インキ又は噴射式インキ等用の界面活性剤として最適である。 In the above-mentioned Gemini type surfactant, although the dynamic surface tension reducing ability is generally excellent, the static surface tension reducing ability is inferior to ordinary surfactants. The surfactant of the present invention is excellent in both dynamic surface tension lowering ability and static surface tension lowering ability, and contains an aqueous coating agent composition {surfactant, water, resin binder and, if necessary, a colorant. It becomes. For example, it is suitable as a surfactant for water-based paints, paper coating paints, water-based inks, etc.} and is suitable as a surfactant for aqueous coating agent compositions for high-speed coating. Curtain flow coat, etc.), high-speed coating paper coating liquid, water-based ink for high-speed printing, or jet type ink and the like.
本発明の界面活性剤を水性コーティング剤組成物に適用した場合、ハジキ等の塗膜欠損を効果的に抑えることができる。また、水性コーティング剤組成物の高速塗工時における被塗布面へのなじみ、ぬれ性等を飛躍的に改善できるので、優れた塗工適性(膜切れ及び平滑性等の向上)を発揮する。 When the surfactant of the present invention is applied to an aqueous coating composition, film defects such as repelling can be effectively suppressed. In addition, since the conformity to the coated surface, wettability, etc. during the high-speed coating of the aqueous coating agent composition can be drastically improved, excellent coating suitability (improvement of film breakage, smoothness, etc.) is exhibited.
本発明の界面活性剤を水性コーティング剤組成物に適用する場合、本発明の界面活性剤は、水性コーティング剤組成物の製造工程のうち、顔料分散工程、レットダウン工程及び/又は各種調整剤(粘度調整剤、酸化防止剤、湿潤剤、紫外線吸収剤、消泡剤、分散剤、保水剤及び流動特性改質剤等)の添加工程等に添加してもよく、原料樹脂エマルションに添加しておいてもよく、また製造後の水性コーティング剤組成物に添加してもよい。 When the surfactant of the present invention is applied to an aqueous coating agent composition, the surfactant of the present invention is a pigment dispersion step, a letdown step and / or various regulators (among the production steps of the aqueous coating agent composition). Viscosity modifiers, antioxidants, wetting agents, UV absorbers, antifoaming agents, dispersants, water retention agents, fluidity modifiers, etc.) may be added, etc. It may also be added to the aqueous coating agent composition after production.
本発明の界面活性剤を水性コーティング剤組成物に適用する場合、本発明の界面活性剤の添加量(重量%)は、水性コーティング剤の重量に基づいて、0.1〜5が好ましく、さらに好ましくは0.1〜4、特に好ましくは0.2〜3.5、最も好ましくは0.5〜3である。 When the surfactant of the present invention is applied to an aqueous coating agent composition, the addition amount (% by weight) of the surfactant of the present invention is preferably 0.1 to 5, based on the weight of the aqueous coating agent. Preferably it is 0.1-4, Most preferably, it is 0.2-3.5, Most preferably, it is 0.5-3.
本発明の界面活性剤を含有する水性コーティング剤組成物は、通常の方法により被塗装体に塗装又は印刷することができ、ハケ塗り、ローラー塗装、エアスプレー塗装、エアレス塗装、ロールコート塗装、カーテンフローコート塗装、グラビア印刷及びインキ噴射式印刷等の塗装方法又は印刷方法等が適用できる。これらのうち、高速塗工性を発揮できるという観点から、カーテンフローコート塗装、グラビア印刷及びインキ噴射式印刷が好適である。 The aqueous coating agent composition containing the surfactant of the present invention can be applied or printed on a substrate by an ordinary method, and is applied by brush coating, roller coating, air spray coating, airless coating, roll coat coating, curtain. Coating methods or printing methods such as flow coat coating, gravure printing, and ink jet printing can be applied. Of these, curtain flow coat coating, gravure printing, and ink jet printing are preferred from the viewpoint that high-speed coating properties can be exhibited.
以下、実施例により本発明をさらに詳しく説明するが、本発明はこれに限定されるものではない。なお、特記しない限り、部は重量部、%は重量%を意味する。 EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited to this. Unless otherwise specified, “part” means “part by weight” and “%” means “% by weight”.
<製造例1>
加熱、攪拌、冷却、滴下、窒素による加圧及び真空ポンプによる減圧の可能な耐圧反応容器に、精製グラニュー糖{台糖(株)製}342部(1モル部)及びN,N−ジメチルホルムアミド(以下、DMFと略する。)800部を投入した後、窒素ガスを用いて、ゲージ圧で0.4MPaになるまで加圧し、次いで0.02MPaになるまで排出する操作を3回繰り返した(以下、窒素置換と略する。)。さらに、攪拌しつつ100℃まで昇温した後、この温度にてプロピレンオキシド(po)290部(5モル部)を4時間かけて滴下した。次いでこの温度にてブチレンオキシド(bo)360部(5モル部)を4時間かけて滴下し、引き続き同温度にて3時間攪拌を続けて残存するブチレンオキシド(bo)を反応させた。次いでDMFを減圧(−0.05〜−0.098MPa:以下、単に「減圧」と略する。)下に留去し、ポリエーテル化合物(GP1){蔗糖/(po)5モル/(bo)5モル付加物}を得た。
<Production Example 1>
In a pressure-resistant reaction vessel capable of heating, stirring, cooling, dropping, pressurizing with nitrogen, and depressurization with a vacuum pump, 342 parts (1 mol part) of purified granulated sugar {manufactured by Taiyo Co., Ltd.) and N, N-dimethylformamide ( Hereinafter, abbreviated as DMF.) After charging 800 parts, the operation of pressurizing with nitrogen gas to 0.4 MPa and then discharging to 0.02 MPa was repeated three times (hereinafter referred to as “DMF”). Abbreviated as nitrogen substitution). Furthermore, after heating up to 100 degreeC, stirring, 290 parts (5 mol parts) of propylene oxide (po) was dripped at this temperature over 4 hours. Subsequently, 360 parts (5 parts by mole) of butylene oxide (bo) was added dropwise at this temperature over 4 hours, followed by stirring at the same temperature for 3 hours to react the remaining butylene oxide (bo). Next, DMF was distilled off under reduced pressure (−0.05 to −0.098 MPa: hereinafter simply referred to as “reduced pressure”) to obtain a polyether compound (GP1) {sucrose / (po) 5 mol / (bo). 5 mol adduct} was obtained.
上記と同様な耐圧反応容器に、ポリエーテル化合物(GP1)992部(1モル部)及び水酸化ナトリウム{試薬特級、和光純薬工業(株)製、純度約97重量%、使用量は水分を除いた純分換算量で表示した。以下同じである。}40部(1モル部)及び水35部を仕込み、これらを60℃にて攪拌しながら、これらの混合物にエピクロルヒドリン(GE1){ダイソー(株)製、以下同じである。}111部(1.2モル部)を3時間で滴下した。次いで60℃にて5時間攪拌を続け、反応液のpHが7{リトマス試験紙(TOYO ROSHI CO.LTD製、製品名:UNIV PH 1−11)による。以下同じ。}となったのを確認した。次いで80℃にて減圧下、残存するエピクロルヒドリンの留去及び脱水(水分:0.03%以下、以下、単に減圧下脱水と略する。)した後、No.2濾紙{東洋濾紙(株)製、保留粒子径:5μm、以下同じである。}による吸引濾過を行い、グリシジル化合物(G1){蔗糖/(po)5モル/(bo)5モル/(GE1)1モル付加物}を得た。 In a pressure-resistant reaction vessel similar to the above, 992 parts (1 mole part) of a polyether compound (GP1) and sodium hydroxide {reagent special grade, manufactured by Wako Pure Chemical Industries, Ltd., purity of about 97% by weight, the amount used is water. It is displayed as the net equivalent converted amount. The same applies hereinafter. } 40 parts (1 mole part) and 35 parts of water were charged, and the mixture was stirred at 60 ° C., and epichlorohydrin (GE1) {manufactured by Daiso Co., Ltd., hereinafter the same. } 111 parts (1.2 mole parts) was added dropwise over 3 hours. Subsequently, stirring is continued at 60 ° C. for 5 hours, and the pH of the reaction solution is 7 {by litmus test paper (manufactured by TOYO ROSHI CO. LTD, product name: UNIV PH 1-11). same as below. } Was confirmed. Subsequently, the remaining epichlorohydrin was distilled off and dehydrated at 80 ° C. under reduced pressure (water content: 0.03% or less, hereinafter simply referred to as dehydration under reduced pressure). 2 filter paper {manufactured by Toyo Filter Paper Co., Ltd., reserved particle diameter: 5 μm, and so on. } To obtain a glycidyl compound (G1) {sucrose / (po) 5 mol / (bo) 5 mol / (GE1) 1 mol adduct)}.
<製造例2>
製造例1と同様な耐圧反応容器に、精製グラニュー糖342部(1モル部)及びDMF800部を投入した後、窒素置換を実施した。さらに、これらの混合物を攪拌しながら100℃まで昇温した後、この温度にてプロピレンオキシド(po)870部(15モル部)を7時間かけて滴下し、引き続き同温度にて3時間攪拌を続けて残存するプロピレンオキシド(po)を反応させた。次いでDMFを減圧下に留去し、ポリエーテル化合物(GP2){蔗糖/(po)15モル付加物}を得た。
<Production Example 2>
Into a pressure resistant reactor similar to Production Example 1, 342 parts (1 mol part) of purified granulated sugar and 800 parts of DMF were added, and then nitrogen substitution was performed. Further, the mixture was heated to 100 ° C. while stirring, and then 870 parts (15 mole parts) of propylene oxide (po) was added dropwise at this temperature over 7 hours, followed by stirring at the same temperature for 3 hours. Subsequently, the remaining propylene oxide (po) was reacted. Next, DMF was distilled off under reduced pressure to obtain a polyether compound (GP2) {sucrose / (po) 15 mol adduct}.
次いで、製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP2)1212部(1モル部)及び水酸化カリウム3部{試薬特級、和光純薬工業(株)製、使用量は水分を除いた純分換算量で表示した。以下同じである。}を仕込み、減圧下120℃にて1時間脱水した。次いで同減圧のまま100℃にてブチレンオキシド(bo)360部(5モル部)を3時間かけて滴下し、さらにこの温度にて2時間攪拌を続けて残存するブチレンオキシド(bo)を反応させて、粗反応液状物を得た。この粗反応液状物にイオン交換水30部を添加して、攪拌しながら90℃まで昇温した後、キョーワード700{協和化学工業(株)製}50部を加え、この温度にて1時間攪拌し、次いで濾紙を用いてキョーワード700を取り除き、さらに減圧下、120℃にて1時間脱水{以下、単にキョーワード処理と略する。}して、ポリエーテル化合物(GP3){蔗糖/(po)15モル/(bo)5モル付加物}を得た。 Next, in a pressure-resistant reaction vessel similar to Production Example 1, 1212 parts (1 mole part) of a polyether compound (GP2) and 3 parts of potassium hydroxide {reagent special grade, manufactured by Wako Pure Chemical Industries, Ltd. It is displayed as the net equivalent converted amount. The same applies hereinafter. } And dehydrated under reduced pressure at 120 ° C. for 1 hour. Next, 360 parts (5 parts by mole) of butylene oxide (bo) was added dropwise at 100 ° C. over 3 hours with the same reduced pressure, and the remaining butylene oxide (bo) was allowed to react by continuing stirring at this temperature for 2 hours. As a result, a crude reaction liquid was obtained. After adding 30 parts of ion-exchanged water to the crude reaction liquid and raising the temperature to 90 ° C. with stirring, 50 parts of Kyoward 700 (manufactured by Kyowa Chemical Industry Co., Ltd.) is added and this temperature is maintained for 1 hour. Then, the Kyodo 700 is removed using a filter paper, and further dehydrated at 120 ° C. for 1 hour under reduced pressure {hereinafter simply referred to as Kyoward treatment. } To obtain a polyether compound (GP3) {sucrose / (po) 15 mol / (bo) 5 mol adduct}.
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP3)1572部(1モル部)及び水酸化ナトリウム40部(1モル部)及び水70部を仕込み、これらを60℃にて攪拌しながら、エピクロルヒドリン(GE1)111部(1.2モル部)を3時間で滴下した。次いで60℃にて5時間攪拌を続け、反応液のpHが7となったのを確認した。次いで80℃にて減圧下脱水した後、濾紙による吸引濾過を行い、グリシジル化合物(G2){蔗糖/(po)15モル/(bo)5モル/(GE1)1モル付加物}を得た。 A pressure-resistant reaction vessel similar to Production Example 1 was charged with 1572 parts (1 mole part) of a polyether compound (GP3), 40 parts (1 mole part) of sodium hydroxide and 70 parts of water, and these were stirred at 60 ° C. Then, 111 parts (1.2 mol parts) of epichlorohydrin (GE1) was added dropwise over 3 hours. Subsequently, stirring was continued for 5 hours at 60 ° C., and it was confirmed that the pH of the reaction solution became 7. Subsequently, after dehydrating under reduced pressure at 80 ° C., suction filtration with filter paper was performed to obtain a glycidyl compound (G2) {sucrose / (po) 15 mol / (bo) 5 mol / (GE1) 1 mol adduct}.
<製造例3>
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP2){蔗糖/(po)15モル付加物}1212部(1モル部)及び水酸化カリウム4部を仕込み、減圧下120℃にて1時間脱水した。次いで同減圧のまま100℃にてプロピレンオキシド(po)870部(15モル部)を4時間かけて滴下し、さらにこの温度にて2時間攪拌を続けて残存するプロピレンオキシド(po)を反応させて、粗反応液状物を得た。この粗反応液状物にイオン交換水35部を添加して、攪拌しながら90℃まで昇温した後、60部のキョーワード700を加え、この温度にて1時間攪拌した。次いでキョーワード処理して、ポリエーテル化合物(GP4){蔗糖/(po)30モル付加物}を得た。
<Production Example 3>
A pressure-resistant reaction vessel similar to Production Example 1 was charged with 1212 parts (1 mol part) of a polyether compound (GP2) {sucrose / (po) 15 mol adduct} and 4 parts of potassium hydroxide at 120 ° C. under reduced pressure. Dehydrated for 1 hour. Next, 870 parts (15 mole parts) of propylene oxide (po) was added dropwise at 100 ° C. over 4 hours with the same reduced pressure, and the remaining propylene oxide (po) was reacted by continuing stirring at this temperature for 2 hours. As a result, a crude reaction liquid was obtained. 35 parts of ion-exchanged water was added to the crude reaction liquid, and the temperature was raised to 90 ° C. while stirring. Then, 60 parts of Kyoward 700 was added and stirred at this temperature for 1 hour. Next, Kyoward treatment was performed to obtain a polyether compound (GP4) {sucrose / (po) 30 mol adduct}.
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP4)2082部(1モル部)及び酸化ナトリウム48部(1.2モル部)及び水70部を仕込み、これらを60℃にて攪拌しながら、エピクロルヒドリン(GE1)139部(1.5モル部)を4時間で滴下した。次いでこの温度にて5時間攪拌を続け、反応液のpHが7となったのを確認した。次いで80℃にて減圧下脱水した後、濾紙による吸引濾過を行い、グリシジル化合物(G3){蔗糖/(po)30モル/(GE1)1モル付加物80モル%と、蔗糖/(po)30モル/(GE1)2モル付加物20モル%との混合物;P”=1.2}を得た。 A pressure-resistant reaction vessel similar to Production Example 1 was charged with 2082 parts (1 mole part) of a polyether compound (GP4), 48 parts (1.2 mole parts) of sodium oxide and 70 parts of water, and these were stirred at 60 ° C. Then, 139 parts (1.5 mole parts) of epichlorohydrin (GE1) was added dropwise over 4 hours. Subsequently, stirring was continued at this temperature for 5 hours, and it was confirmed that the pH of the reaction solution became 7. Subsequently, after dehydrating under reduced pressure at 80 ° C., suction filtration with filter paper is performed, and glycidyl compound (G3) {80 mol% of sucrose / (po) 30 mol / (GE1) 1 mol adduct and sucrose / (po) 30 A mixture with 20 mol% of mol / (GE1) 2 mol adduct; P ″ = 1.2} was obtained.
<製造例4>
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP2){蔗糖/(po)15モル付加物}1212部(1モル部)及び水酸化カリウム5部を仕込み、減圧下120℃にて1時間脱水した。次いで同減圧のまま100℃にてプロピレンオキシド(po)1450部(25モル部)を5時間かけて滴下し、さらにこの温度にて3時間攪拌を続けて残存するプロピレンオキシド(PO)を反応させて、粗反応液状物を得た。この粗反応液状物にイオン交換水45部を添加して、攪拌しながら90℃まで昇温した後、65部のキョーワード700を加え、この温度にて1時間攪拌した。次いでキョーワード処理して、ポリエーテル化合物(GP5){蔗糖/(PO)40モル付加物}を得た。
<Production Example 4>
A pressure-resistant reaction vessel similar to Production Example 1 was charged with 1212 parts (1 mol part) of a polyether compound (GP2) {sucrose / (po) 15 mol adduct} and 5 parts of potassium hydroxide at 120 ° C. under reduced pressure. Dehydrated for 1 hour. Next, 1450 parts (25 mole parts) of propylene oxide (po) was added dropwise at 100 ° C. over 5 hours with the same reduced pressure, and the remaining propylene oxide (PO) was reacted by continuing stirring at this temperature for 3 hours. As a result, a crude reaction liquid was obtained. 45 parts of ion-exchanged water was added to the crude reaction liquid, and the temperature was raised to 90 ° C. while stirring. 65 parts of Kyoward 700 was added and stirred at this temperature for 1 hour. Next, Kyoward treatment was performed to obtain a polyether compound (GP5) {sucrose / (PO) 40 mol adduct}.
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP5)2662部(1モル部)及び水酸化ナトリウム60部(1.5モル部)及び水110部を仕込み、これらを60℃にて攪拌しながら、エピクロルヒドリン(GE1)167部(1.8モル部)を4時間で滴下した。次いで60℃にて5時間攪拌を続け、反応液のpHが7となったのを確認した。次いで80℃にて減圧下脱水した後、濾紙による吸引濾過を行い、グリシジル化合物(G4){蔗糖/(po)40モル/(GE1)1モル付加物50モル%と、蔗糖/(po)40モル/(GE1)2モル付加物50モル%との混合物;P”=1.5}を得た。
A pressure-resistant reaction vessel similar to Production Example 1 was charged with 2662 parts (1 mole part) of a polyether compound (GP5), 60 parts (1.5 mole parts) of sodium hydroxide and 110 parts of water at 60 ° C. While stirring, 167 parts (1.8 mol parts) of epichlorohydrin (GE1) was added dropwise over 4 hours. Subsequently, stirring was continued for 5 hours at 60 ° C., and it was confirmed that the pH of the reaction solution became 7. Subsequently, after dehydrating under reduced pressure at 80 ° C., suction filtration with filter paper is performed, and glycidyl compound (G4) {sucrose / (po) 40 mol / (GE1) 1
<製造例5>
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP2){蔗糖/(po)15モル付加物}1212部(1モル部)及び水酸化カリウム7部を仕込み、減圧下120℃にて1時間脱水した。次いで同減圧のまま100℃にてプロピレンオキシド(po)2610部(45モル部)を7時間かけて滴下し、さらにこの温度にて3時間攪拌を続けて残存するプロピレンオキシド(po)を反応させて、粗反応液状物を得た。この粗反応液状物にイオン交換水80部を添加して、攪拌しながら90℃まで昇温した後、100部のキョーワード700を加え、この温度にて1時間攪拌した。次いでキョーワード処理して、ポリエーテル化合物(GP6){蔗糖/(po)60モル付加物}を得た。
<Production Example 5>
A pressure-resistant reaction vessel similar to Production Example 1 was charged with 1212 parts (1 mol part) of a polyether compound (GP2) {sucrose / (po) 15 mol adduct} and 7 parts of potassium hydroxide at 120 ° C. under reduced pressure. Dehydrated for 1 hour. Next, 2610 parts (45 mole parts) of propylene oxide (po) was added dropwise at 100 ° C. over 7 hours while maintaining the same reduced pressure, and the remaining propylene oxide (po) was reacted by continuing stirring at this temperature for 3 hours. As a result, a crude reaction liquid was obtained. After adding 80 parts of ion-exchanged water to the crude reaction liquid and raising the temperature to 90 ° C. with stirring, 100 parts of Kyoward 700 was added and stirred at this temperature for 1 hour. Next, Kyoward treatment was performed to obtain a polyether compound (GP6) {sucrose / (po) 60 mol adduct}.
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP6)3822部(1モル部)及び水酸化ナトリウム80部(2モル部)及び水140部を仕込み、これらを60℃にて攪拌しながら、エピクロルヒドリン(GE1)213部(2.3モル部)を5時間で滴下した。次いで60℃にて5時間攪拌を続け、反応液のpHが7となったのを確認した。次いで80℃にて減圧下脱水した後、濾紙による吸引濾過を行い、グリシジル化合物(G5){蔗糖/(po)60モル/(GE1)2モル付加物}を得た。 A pressure-resistant reaction vessel similar to Production Example 1 was charged with 3822 parts (1 mole part) of a polyether compound (GP6), 80 parts (2 mole parts) of sodium hydroxide and 140 parts of water, and these were stirred at 60 ° C. Then, 213 parts (2.3 mol parts) of epichlorohydrin (GE1) was added dropwise over 5 hours. Subsequently, stirring was continued for 5 hours at 60 ° C., and it was confirmed that the pH of the reaction solution became 7. Subsequently, after dehydrating under reduced pressure at 80 ° C., suction filtration using filter paper was performed to obtain a glycidyl compound (G5) {sucrose / (po) 60 mol / (GE1) 2 mol adduct}.
<製造例6>
製造例1と同様な耐圧反応容器に、精製グラニュー糖342部(1モル部)及びDMF800部を投入した後、窒素置換を実施した。さらに、これらの混合物を攪拌しながら100℃まで昇温した後、この温度にてエチレンオキシド(eo)440部(15モル部)を3時間かけて滴下し、次いでプロピレンオキシド(po)580部(10モル部)を6時間かけて滴下し、引き続き同温度にて3時間攪拌を続けて残存するプロピレンオキシド(PO)を反応させた。次いでDMFを減圧下に留去し、ポリエーテル化合物(GP7){蔗糖/(eo)10モル/(po)10モル付加物}を得た。
<Production Example 6>
Into a pressure resistant reactor similar to Production Example 1, 342 parts (1 mol part) of purified granulated sugar and 800 parts of DMF were added, and then nitrogen substitution was performed. Further, the temperature of the mixture was increased to 100 ° C. with stirring, and then 440 parts (15 mole parts) of ethylene oxide (eo) was added dropwise at this temperature over 3 hours, and then 580 parts (10 parts of propylene oxide (po)). Mol part) was added dropwise over 6 hours, followed by stirring at the same temperature for 3 hours to react with the remaining propylene oxide (PO). Next, DMF was distilled off under reduced pressure to obtain a polyether compound (GP7) {sucrose / (eo) 10 mol / (po) 10 mol adduct).
次いで、製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP7)1362部(1モル部)及び水酸化カリウム9部を仕込み、減圧下120℃にて1時間脱水した。次いで同減圧のまま100℃にてプロピレンオキシド(po)2900部(50モル部)を8時間かけて滴下し、さらにこの温度にて3時間攪拌を続けて残存するプロピレンオキシド(po)を反応させて、粗反応液状物を得た。次いでキョーワード処理して、ポリエーテル化合物(GP8){蔗糖/(eo)10モル/(po)60モル付加物}を得た。 Subsequently, 1362 parts (1 mol part) of a polyether compound (GP7) and 9 parts of potassium hydroxide were charged into the same pressure resistant reaction vessel as in Production Example 1, and dehydrated at 120 ° C. for 1 hour under reduced pressure. Next, 2100 parts (50 mole parts) of propylene oxide (po) was added dropwise at 100 ° C. over 8 hours with the same reduced pressure, and the remaining propylene oxide (po) was reacted by continuing stirring at this temperature for 3 hours. As a result, a crude reaction liquid was obtained. Next, Kyoward treatment was performed to obtain a polyether compound (GP8) {sucrose / (eo) 10 mol / (po) 60 mol adduct}.
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP8)4262部(1モル部)及び水酸化ナトリウム72部(1.8モル部)及び水180部を仕込み、これらを60℃にて攪拌しながら、エピクロルヒドリン(GE1)185部(2モル部)を4時間で滴下した。次いで60℃にて5時間攪拌を続け、反応液のpHが7となったのを確認した。次いで80℃にて減圧下脱水した後、濾紙による吸引濾過を行い、グリシジル化合物(G6){蔗糖/(eo)10モル/(po)60モル/(GE1)1モル付加物20モル%と、蔗糖/(eo)10モル/(po)60モル/(GE1)2モル付加物80モル%との混合物;P”=1.8}を得た。
In a pressure-resistant reaction vessel similar to Production Example 1, 4262 parts (1 mole part) of a polyether compound (GP8), 72 parts (1.8 mole parts) of sodium hydroxide and 180 parts of water were charged at 60 ° C. While stirring, 185 parts (2 mole parts) of epichlorohydrin (GE1) was added dropwise over 4 hours. Subsequently, stirring was continued for 5 hours at 60 ° C., and it was confirmed that the pH of the reaction solution became 7. Subsequently, after dehydrating under reduced pressure at 80 ° C., suction filtration with a filter paper was performed, and glycidyl compound (G6) {sucrose / (eo) 10 mol / (po) 60 mol / (GE1) 1
<製造例7>
製造例1と同様な耐圧反応容器に、トレハロース{試薬特級、和光純薬工業(株)製、以下同じである。}504部(1モル部)及びDMF1000部を投入した後、窒素置換を実施した。これらの混合物を攪拌しながら100℃まで昇温し、次いでこの温度にて、プロピレンオキシド(po)870部(15モル部)を6時間かけて滴下し、引き続きこの温度にて3時間攪拌を続けて残存するプロピレンオキシド(po)を反応させた。次いでDMFを減圧下に留去し、ポリエーテル化合物(GP9){トレハロース/(po)15モル付加物}を得た。
<Production Example 7>
The same pressure-resistant reaction vessel as in Production Example 1 is trehalose {reagent special grade, manufactured by Wako Pure Chemical Industries, Ltd., and so on. } After charging 504 parts (1 mole part) and 1000 parts of DMF, nitrogen substitution was performed. The mixture was heated to 100 ° C. while stirring, and then 870 parts (15 mole parts) of propylene oxide (po) was added dropwise over 6 hours at this temperature, and the stirring was continued at this temperature for 3 hours. The remaining propylene oxide (po) was reacted. Next, DMF was distilled off under reduced pressure to obtain a polyether compound (GP9) {trehalose / (po) 15 mol adduct}.
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP9)1374部(1モル部)及び水酸化カリウム3部を仕込み、減圧下120℃にて1時間脱水した。次いで同減圧のまま100℃にてブチレンオキシド(bo)360部(5モル部)を3時間かけて滴下し、さらにこの温度にて2時間攪拌を続けて残存するブチレンオキシド(bo)を反応させて、粗反応液状物を得た。次いでキョーワード処理して、ポリエーテル化合物(GP10){トレハロース/(po)15モル/(bo)5モル付加物}を得た。 A pressure-resistant reaction vessel similar to Production Example 1 was charged with 1374 parts (1 mole part) of a polyether compound (GP9) and 3 parts of potassium hydroxide, and dehydrated at 120 ° C. for 1 hour under reduced pressure. Next, 360 parts (5 parts by mole) of butylene oxide (bo) was added dropwise at 100 ° C. over 3 hours with the same reduced pressure, and the remaining butylene oxide (bo) was allowed to react by continuing stirring at this temperature for 2 hours. As a result, a crude reaction liquid was obtained. Next, it was treated with Kyoward to obtain a polyether compound (GP10) {trehalose / (po) 15 mol / (bo) 5 mol adduct}.
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP10)1734部(1モル部)及び水酸化ナトリウム60部(1.5モル部)及び水80部を仕込み、これらの混合物を60℃にて攪拌しながら、エピクロルヒドリン(GE1)167部(1.8モル部)を5時間で滴下した。次いで60℃にて5時間攪拌を続け、反応液のpHが7となったのを確認した。次いで80℃にて減圧下脱水した後、濾紙による吸引濾過を行い、グリシジル化合物(G7){トレハロース/(po)15モル/(bo)5モル/(GE1)1モル付加物50モル%と、トレハロース/(po)15モル/(bo)5モル/(GE1)2モル付加物50モル%との混合物;P”=1.5}を得た。
A pressure-resistant reaction vessel similar to Production Example 1 was charged with 1734 parts (1 mole part) of a polyether compound (GP10), 60 parts (1.5 mole parts) of sodium hydroxide and 80 parts of water. 167 parts (1.8 mole parts) of epichlorohydrin (GE1) was added dropwise over 5 hours while stirring at -5. Subsequently, stirring was continued for 5 hours at 60 ° C., and it was confirmed that the pH of the reaction solution became 7. Subsequently, after dehydrating under reduced pressure at 80 ° C., suction filtration with a filter paper was performed, and glycidyl compound (G7) {trehalose / (po) 15 mol / (bo) 5 mol / (GE1) 1
<製造例8>
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP9){トレハロース/(po)15モル付加物}1374部(1モル部)及び水酸化カリウム6部を仕込み、減圧下120℃にて1時間脱水した。次いで同減圧のまま100℃にてプロピレンオキシド(po)1450部(25モル部)を5時間かけて滴下し、さらにこの温度にて3時間攪拌を続けて残存するプロピレンオキシド(po)を反応させて、粗反応液状物を得た。次いでキョーワード処理して、ポリエーテル化合物(GP11){トレハロース/(po)40モル付加物}を得た。
<Production Example 8>
A pressure-resistant reaction vessel similar to Production Example 1 was charged with 1374 parts (1 mol part) of a polyether compound (GP9) {trehalose / (po) 15 mol adduct} and 6 parts of potassium hydroxide at 120 ° C. under reduced pressure. Dehydrated for 1 hour. Subsequently, 1450 parts (25 mole parts) of propylene oxide (po) was added dropwise over 5 hours at 100 ° C. with the same reduced pressure, and the remaining propylene oxide (po) was reacted by continuing stirring at this temperature for 3 hours. As a result, a crude reaction liquid was obtained. Next, it was subjected to Kyoward treatment to obtain a polyether compound (GP11) {trehalose / (po) 40 mol adduct}.
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP11)2824部(1モル部)と、水酸化ナトリウム60部(1.5モル部)及び水100部を仕込み、これらの混合物を60℃にて攪拌しながら、エピクロルヒドリン(GE1)167部(1.8モル部)を5時間で滴下した。次いで60℃にて5時間攪拌を続け、反応液のpHが7となったのを確認した。次いで80℃にて減圧下脱水した後、濾紙による吸引濾過を行い、グリシジル化合物(G8){トレハロース/(po)40モル/(GE)1モル付加物50モル%と、トレハロース/(po)40モル/(GE)2モル付加物50モル%との混合物;P”=1.5}を得た。
A pressure-resistant reaction vessel similar to Production Example 1 was charged with 2824 parts (1 mole part) of a polyether compound (GP11), 60 parts (1.5 mole parts) of sodium hydroxide and 100 parts of water. While stirring at ° C., 167 parts (1.8 mol parts) of epichlorohydrin (GE1) was added dropwise over 5 hours. Subsequently, stirring was continued for 5 hours at 60 ° C., and it was confirmed that the pH of the reaction solution became 7. Subsequently, after dehydrating under reduced pressure at 80 ° C., suction filtration with filter paper is performed, and glycidyl compound (G8) {trehalose / (po) 40 mol / (GE) 1
<製造例9>
製造例1と同様な耐圧反応容器に、メレチトース{試薬特級、和光純薬工業(株)製}504部(1モル部)及びDMF1000部を投入した後、窒素置換を行った。その後、これらの混合物を攪拌しながら110℃まで昇温した後、この温度にてエチレンオキシド(eo)440部(10モル部)とプロピレンオキシド(po)290部(5モル部)の混合液を3時間かけて滴下し、さらにこの温度にて2時間攪拌を続けて残存するエチレンオキシド(eo)及びプロピレンオキシド(po)を反応させた。次いでDMFを減圧下に留去し、ポリエーテル化合物(GP12){メレチトース/(eo)10モル・(po)5モルのランダム付加物}を得た。
<Production Example 9>
Into a pressure resistant reactor similar to Production Example 1, 504 parts (1 mole part) of Meletitose {reagent special grade, manufactured by Wako Pure Chemical Industries, Ltd.} and 1000 parts of DMF were added, and then nitrogen substitution was performed. Thereafter, the mixture was heated to 110 ° C. with stirring, and at this temperature, 440 parts (10 mole parts) of ethylene oxide (eo) and 290 parts (5 mole parts) of propylene oxide (po) were mixed. The mixture was added dropwise over a period of time, and stirring was continued at this temperature for 2 hours to react the remaining ethylene oxide (eo) and propylene oxide (po). Next, DMF was distilled off under reduced pressure to obtain a polyether compound (GP12) {meletitol / (eo) 10 mol · (po) 5 mol random adduct).
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP12)1234部(1モル部)及び水酸化カリウム9部を仕込み、減圧下120℃にて1時間脱水した。次いで同減圧のまま100℃にてプロピレンオキシド(po)2610部(45モル部)を7時間かけて滴下し、さらにこの温度にて3時間攪拌を続けて残存するプロピレンオキシド(po)を反応させて、粗反応液状物を得た。次いでキョーワード処理して、ポリエーテル化合物(GP13){メレチトース/(eo)10モル・(po)5モル/(po)45モル付加物}を得た。 A pressure-resistant reaction vessel similar to Production Example 1 was charged with 1234 parts (1 mole part) of a polyether compound (GP12) and 9 parts of potassium hydroxide, and dehydrated at 120 ° C. for 1 hour under reduced pressure. Next, 2610 parts (45 mole parts) of propylene oxide (po) was added dropwise at 100 ° C. over 7 hours while maintaining the same reduced pressure, and the remaining propylene oxide (po) was reacted by continuing stirring at this temperature for 3 hours. As a result, a crude reaction liquid was obtained. Next, Kyoward treatment was performed to obtain a polyether compound (GP13) {meletitol / (eo) 10 mol · (po) 5 mol / (po) 45 mol adduct)}.
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP12)3844部(1モル部)、水酸化ナトリウム80部(2モル部)及び水130部を仕込み、これらの混合物を60℃にて攪拌しながら、エピクロルヒドリン(GE1)213部(2.3モル部)を5時間で滴下した。次いで60℃にて6時間攪拌を続け、反応液のpHが7となったのを確認した。次いで80℃にて減圧下脱水した後、濾紙による吸引濾過を行い、グリシジル化合物(G9){メレチトース/(eo)10モル・(po)5モル/(po)45モル/(GE1)2モル付加物}を得た。 A pressure-resistant reaction vessel similar to Production Example 1 was charged with 3844 parts (1 mole part) of a polyether compound (GP12), 80 parts (2 mole parts) of sodium hydroxide and 130 parts of water, and the mixture at 60 ° C. While stirring, 213 parts (2.3 mol parts) of epichlorohydrin (GE1) was added dropwise over 5 hours. Subsequently, stirring was continued at 60 ° C. for 6 hours, and it was confirmed that the pH of the reaction solution became 7. Then, after dehydrating under reduced pressure at 80 ° C., suction filtration with filter paper is performed, and glycidyl compound (G9) {meletitol / (eo) 10 mol · (po) 5 mol / (po) 45 mol / (GE1) 2 mol addition Thing} was obtained.
<製造例10>
ポリエーテル化合物(GP12)1234部(1モル部)及び水酸化カリウム10部を仕込み、減圧下120℃にて1時間脱水した。次いで同減圧のまま100℃にてプロピレンオキシド(po)3770部(65モル部)を10時間かけて滴下し、さらにこの温度にて3時間攪拌を続けて残存するプロピレンオキシド(po)を反応させて、粗反応液状物を得た。次いでキョーワード処理して、ポリエーテル化合物(GP14){メレチトース/(eo)10モル・(po)5モル/(po)65モル付加物}を得た。
<Production Example 10>
1234 parts (1 mole part) of a polyether compound (GP12) and 10 parts of potassium hydroxide were charged and dehydrated at 120 ° C. under reduced pressure for 1 hour. Next, 3770 parts (65 mole parts) of propylene oxide (po) was added dropwise over 10 hours at 100 ° C. with the same reduced pressure, and the remaining propylene oxide (po) was reacted by continuing stirring at this temperature for 3 hours. As a result, a crude reaction liquid was obtained. Next, Kyoward treatment was carried out to obtain a polyether compound (GP14) {meletitol / (eo) 10 mol · (po) 5 mol / (po) 65 mol adduct}.
製造例1と同様な耐圧反応容器に、ポリエーテル化合物(GP14)5004部(1モル部)と、水酸化ナトリウム120部(3.0モル部)及び水150部を仕込み、これらの混合物を60℃にて攪拌しながら、エピクロルヒドリン(GE1)305部(3.3モル部)を5時間で滴下した。次いで60℃にて6時間攪拌を続け、反応液のpHが7となったのを確認した。次いで80℃にて減圧下脱水した後、濾紙による吸引濾過を行い、グリシジル化合物(G10){メレチトース/(eo)10モル・(po)5モル/(po)65モル/(GE1)3モル付加物}を得た。 A pressure-resistant reaction vessel similar to Production Example 1 was charged with 5004 parts (1 mole part) of a polyether compound (GP14), 120 parts (3.0 mole parts) of sodium hydroxide and 150 parts of water. While stirring at ° C., 305 parts (3.3 mol parts) of epichlorohydrin (GE1) was added dropwise over 5 hours. Subsequently, stirring was continued at 60 ° C. for 6 hours, and it was confirmed that the pH of the reaction solution became 7. Next, after dehydrating under reduced pressure at 80 ° C., suction filtration with filter paper is performed, and glycidyl compound (G10) {meletitol / (eo) 10 mol · (po) 5 mol / (po) 65 mol / (GE1) 3 mol addition Thing} was obtained.
<製造例11>
(1)ハイドロジェンポリシロキサン(HP1)の製造
加熱、攪拌、冷却、滴下、コンデンサー及び真空ポンプによる減圧の可能な反応容器に、オクタメチルシクロテトラシロキサン{試薬特級、東京化成工業(株)製}1628部(5.5モル部)、テトラメチルテトラハイドロシクロテトラシロキサン{試薬特級、東京化成工業(株)製}360部(1.5モル部)、ヘキサメチルジシロキサン{試薬特級、東京化成工業(株)製}210部(1.3モル部)及び水酸化ナトリウム1部(0.025モル部)を仕込み、90℃にて6時間攪拌を続けた。
<Production Example 11>
(1) Production of hydrogen polysiloxane (HP1) Octamethylcyclotetrasiloxane {reagent special grade, manufactured by Tokyo Chemical Industry Co., Ltd.} in a reaction vessel that can be heated, stirred, cooled, dripped, depressurized by a condenser and a vacuum pump 1628 parts (5.5 mole parts), tetramethyltetrahydrocyclotetrasiloxane {reagent special grade, manufactured by Tokyo Chemical Industry Co., Ltd.} 360 parts (1.5 mole parts), hexamethyldisiloxane {reagent special grade, Tokyo Chemical Industry Co., Ltd. 210 parts (1.3 parts by mole) manufactured by Co., Ltd. and 1 part (0.025 parts by mole) of sodium hydroxide were added and stirring was continued at 90 ° C. for 6 hours.
次いで、25℃に冷却し、蟻酸1.5部(0.025モル部)を仕込み、0.5時間攪拌した後、減圧しながら、20℃/1時間の割合で昇温させ、140℃/−0.095MPaにてさらに2時間ストリッピングして、ハイドロジェンポリシロキサン(HP1)を得た。1H−NMR分析及びIR分析により、ハイドロジェンポリシロキサン(HP1)が下記構造を有することを確認した{Meはメチル基、Siはケイ素原子、Oは酸素原子、Hは水素原子を表す。}。 Next, the mixture was cooled to 25 ° C., 1.5 parts (0.025 mol part) of formic acid was added, stirred for 0.5 hour, and then heated at a rate of 20 ° C./1 hour while reducing the pressure. Stripping was further performed at −0.095 MPa for 2 hours to obtain hydrogen polysiloxane (HP1). 1 H-NMR analysis and IR analysis confirmed that the hydrogen polysiloxane (HP1) had the following structure {Me represents a methyl group, Si represents a silicon atom, O represents an oxygen atom, and H represents a hydrogen atom. }.
(2)アリルアルコール/(eo)15モル/(po)2モル付加体(AA1)の製造
製造例1と同様な耐圧反応容器に、アリルアルコール{試薬特級、和光純薬工業(株)製}59部(1モル部)及び水酸化カリウム1.1部を仕込んだ後、液温20℃にて、0.4MPa(ゲージ圧)になるまで窒素による加圧と、0.02MPa(ゲージ圧)程度までの窒素の排出とを3回繰り返した。次いで100℃にて攪拌しつつ、エチレンオキシド(eo)660部(15モル部)を3時間かけて滴下した。次いでプロピレンオキシド(po)116部(2モル部)を2時間かけて滴下し、さらに120℃にて2時間反応させた。次いでキョーワード処理して、アリルアルコール/(eo)15モル/(po)2モル付加体(AA1)を得た。
(2) Production of allyl alcohol / (eo) 15 mol / (po) 2 mol adduct (AA1) In a pressure-resistant reaction vessel similar to Production Example 1, allyl alcohol {special reagent grade, manufactured by Wako Pure Chemical Industries, Ltd.} After charging 59 parts (1 mole part) and 1.1 parts of potassium hydroxide, pressurization with nitrogen at a liquid temperature of 20 ° C. until reaching 0.4 MPa (gauge pressure), 0.02 MPa (gauge pressure) The discharge of nitrogen to the extent was repeated three times. Subsequently, 660 parts (15 mol parts) of ethylene oxide (eo) was added dropwise over 3 hours while stirring at 100 ° C. Next, 116 parts (2 mole parts) of propylene oxide (po) was added dropwise over 2 hours, followed by further reaction at 120 ° C. for 2 hours. Next, Kyoward treatment was performed to obtain an allyl alcohol / (eo) 15 mol / (po) 2 mol adduct (AA1).
(3)水酸基含有ポリエーテル変性シリコーン(S101)の製造
加熱、攪拌、冷却、滴下、コンデンサー及び真空ポンプによる減圧の可能な反応容器に、上記(1)で得たハイドロジェンポリシロキサン(HP1)1186部(1モル部)、上記(2)で得たアリルアルコール/(eo)15モル/(po)2モル付加体(AA1)1670部(2モル部)、イソプロピルアルコール2000部及び塩化白金酸のイソプロピルアルコール溶液(塩化白金酸の含有量:5×10−6%)2部を仕込み、還流下7時間攪拌を続けた。次いで減圧下、90〜100℃にて脱溶剤を実施して、水酸基含有ポリエーテル変性シリコーン(S101)を得た。
(3) Production of hydroxyl group-containing polyether-modified silicone (S101) Hydrogenpolysiloxane (HP1) 1186 obtained in (1) above was placed in a reaction vessel capable of heating, stirring, cooling, dropping, depressurization with a condenser and a vacuum pump. Part (1 mole part), allyl alcohol obtained in (2) above / (eo) 15 mole / (po) 2 mole adduct (AA1) 1670 parts (2 mole parts), isopropyl alcohol 2000 parts and
<実施例1>
製造例1と同様な耐圧反応容器に、製造例11で得た水酸基含有ポリエーテル変性シリコーン(S101)100部(活性水素0.07モル部含有)と、製造例1で得たグリシジル化合物(G1)20部(0.019モル部)を仕込み、120℃にて1時間減圧脱水した。次いで130℃にて5時間攪拌を続けてエポキシ基の消失を確認し、本発明の界面活性剤(Y1)を得た。
<Example 1>
In a pressure resistant reactor similar to Production Example 1, 100 parts of the hydroxyl group-containing polyether-modified silicone (S101) obtained in Production Example 11 (containing 0.07 mol part of active hydrogen) and the glycidyl compound obtained in Production Example 1 (G1) ) 20 parts (0.019 mol part) were added and dehydrated under reduced pressure at 120 ° C. for 1 hour. Subsequently, stirring was continued at 130 ° C. for 5 hours to confirm the disappearance of the epoxy group, and the surfactant (Y1) of the present invention was obtained.
<実施例2>
製造例1と同様な耐圧反応容器に、水酸基含有変性シリコーン(S101)100部(活性水素0.07モル部含有)と、製造例5で得たグリシジル化合物(G5)150部(0.038モル部)を仕込み、120℃にて1時間減圧脱水した。次いで130℃にて5時間攪拌を続けて、エポキシ基の消失を確認し、本発明の界面活性剤(Y2)を得た。
<Example 2>
In a pressure resistant reactor similar to Production Example 1, 100 parts of hydroxyl group-containing modified silicone (S101) (containing 0.07 mol part of active hydrogen) and 150 parts of glycidyl compound (G5) obtained in Production Example 5 (0.038 mol) Part) was dehydrated under reduced pressure at 120 ° C. for 1 hour. Subsequently, stirring was continued at 130 ° C. for 5 hours to confirm the disappearance of the epoxy group, and the surfactant (Y2) of the present invention was obtained.
<実施例3>
製造例1と同様な耐圧反応容器に、水酸基含有変性シリコーン(S101)100部(活性水素0.07モル部含有)と、製造例2で得たグリシジル化合物(G2)50部(0.031モル部)を仕込み、120℃にて1時間減圧脱水した。次いで130℃にて5時間攪拌を続けて、エポキシ基の消失を確認し、本発明の界面活性剤(Y3)を得た。
<Example 3>
In a pressure resistant reactor similar to Production Example 1, 100 parts of hydroxyl group-containing modified silicone (S101) (containing 0.07 mol part of active hydrogen) and 50 parts of glycidyl compound (G2) obtained in Production Example 2 (0.031 mol) Part) was dehydrated under reduced pressure at 120 ° C. for 1 hour. Subsequently, stirring was continued at 130 ° C. for 5 hours to confirm the disappearance of the epoxy group, and the surfactant (Y3) of the present invention was obtained.
<実施例4>
製造例1と同様な耐圧反応容器に、水酸基含有ポリエーテル変性シリコーン(S102){SNウェット125、サンノプコ株式会社製}100部と、製造例3で得たグリシジル化合物(G3)100部を仕込み、120℃にて1時間減圧脱水した。次いで130℃にて5時間攪拌を続けて、エポキシ基の消失を確認し、本発明の界面活性剤(Y4)を得た。
<Example 4>
In a pressure-resistant reaction vessel similar to Production Example 1, 100 parts of hydroxyl group-containing polyether-modified silicone (S102) {SN Wet 125, manufactured by San Nopco Co., Ltd.} and 100 parts of the glycidyl compound (G3) obtained in Production Example 3 were charged. Dehydrated under reduced pressure at 120 ° C. for 1 hour. Subsequently, stirring was continued at 130 ° C. for 5 hours to confirm the disappearance of the epoxy group, and the surfactant (Y4) of the present invention was obtained.
<実施例5>
製造例1と同様な耐圧反応容器に、水酸基含有ポリエーテル変性シリコーン(S102)100部と、製造例1で得たグリシジル化合物(G1)10部を仕込み、120℃にて1時間減圧脱水した。次いで130℃にて5時間攪拌を続けて、エポキシ基の消失を確認し、本発明の界面活性剤(Y5)を得た。
<Example 5>
In a pressure-resistant reaction vessel similar to Production Example 1, 100 parts of a hydroxyl group-containing polyether-modified silicone (S102) and 10 parts of the glycidyl compound (G1) obtained in Production Example 1 were charged and dehydrated under reduced pressure at 120 ° C. for 1 hour. Subsequently, stirring was continued at 130 ° C. for 5 hours to confirm the disappearance of the epoxy group, and the surfactant (Y5) of the present invention was obtained.
<実施例6>
製造例1と同様な耐圧反応容器に、水酸基含有ポリエーテル変性シリコーン(S102)100部と、製造例4で得たグリシジル化合物(G4)40部を仕込み、120℃にて1時間減圧脱水した。次いで130℃にて6時間攪拌を続けて、エポキシ基の消失を確認し、本発明の界面活性剤(Y6)を得た。
<Example 6>
In a pressure resistant reaction vessel similar to Production Example 1, 100 parts of a hydroxyl group-containing polyether-modified silicone (S102) and 40 parts of the glycidyl compound (G4) obtained in Production Example 4 were charged and dehydrated under reduced pressure at 120 ° C. for 1 hour. Subsequently, stirring was continued at 130 ° C. for 6 hours to confirm the disappearance of the epoxy group, and the surfactant (Y6) of the present invention was obtained.
<実施例7>
水酸基含有ポリエーテル変性シリコーン(S103){SH3771、活性水素1モル当たりの分子量(水酸基当量=活性水素当量)800、東レ・ダウコーニング株式会社製}100部(活性水素0.125モル部含有)と、製造例8で得たグリシジル化合物(G8)100部(0.034モル部)を仕込み、120℃にて1時間減圧脱水した。次いで130℃にて7時間攪拌を続けてエポキシ基の消失を確認し、本発明の界面活性剤(Y7)を得た。
<Example 7>
Hydroxyl-containing polyether-modified silicone (S103) {SH3771, molecular weight per mole of active hydrogen (hydroxyl equivalent = active hydrogen equivalent) 800, manufactured by Toray Dow Corning Co., Ltd.} 100 parts (containing active hydrogen 0.125 moles) Then, 100 parts (0.034 mol part) of the glycidyl compound (G8) obtained in Production Example 8 was charged and dehydrated under reduced pressure at 120 ° C. for 1 hour. Subsequently, stirring was continued at 130 ° C. for 7 hours to confirm the disappearance of the epoxy group, and the surfactant (Y7) of the present invention was obtained.
<実施例8>
水酸基含有ポリエーテル変性シリコーン(S103)100部(活性水素0.125モル部含有)と、製造例7で得たグリシジル化合物(G7)80部(0.044モル部)を仕込み、120℃にて1時間減圧脱水した。次いで130℃にて5時間攪拌を続けてエポキシ基の消失を確認し、本発明の界面活性剤(Y8)を得た。
<Example 8>
100 parts of hydroxyl group-containing polyether-modified silicone (S103) (containing 0.125 mole part of active hydrogen) and 80 parts (0.044 mole part) of the glycidyl compound (G7) obtained in Production Example 7 were charged at 120 ° C. Dehydrated under reduced pressure for 1 hour. Subsequently, stirring was continued at 130 ° C. for 5 hours to confirm the disappearance of the epoxy group, and the surfactant (Y8) of the present invention was obtained.
<実施例9>
水酸基含有ポリエーテル変性シリコーン(S104){X−22−6266、活性水素1モル当たりの分子量(水酸基当量=活性水素当量)1200、信越化学工業株式会社製}100部(0.083モル部含有)と、製造例8で得たグリシジル化合物(G8)30部(0.01モル部)を仕込み、120℃にて1時間減圧脱水した。次いで130℃にて5時間攪拌を続けてエポキシ基の消失を確認し、本発明の界面活性剤(Y9)を得た。
<Example 9>
Hydroxyl-containing polyether-modified silicone (S104) {X-22-6266, molecular weight per mole of active hydrogen (hydroxyl equivalent = active hydrogen equivalent) 1200, manufactured by Shin-Etsu Chemical Co., Ltd.} 100 parts (containing 0.083 moles) Then, 30 parts (0.01 mol part) of the glycidyl compound (G8) obtained in Production Example 8 was charged and dehydrated under reduced pressure at 120 ° C. for 1 hour. Subsequently, stirring was continued at 130 ° C. for 5 hours to confirm the disappearance of the epoxy group, and the surfactant (Y9) of the present invention was obtained.
<実施例10>
水酸基含有ポリエーテル変性シリコーン(S104)100部(活性水素0.083モル部含有)と、製造例3で得たグリシジル化合物(G3)40部(0.019モル部)を仕込み、120℃にて1時間減圧脱水した。次いで130℃にて6時間攪拌を続けてエポキシ基の消失を確認し、本発明の界面活性剤(Y10)を得た。
<Example 10>
100 parts of hydroxyl group-containing polyether-modified silicone (S104) (containing 0.083 mole part of active hydrogen) and 40 parts (0.019 mole part) of the glycidyl compound (G3) obtained in Production Example 3 were charged at 120 ° C. Dehydrated under reduced pressure for 1 hour. Subsequently, stirring was continued at 130 ° C. for 6 hours to confirm the disappearance of the epoxy group, and the surfactant (Y10) of the present invention was obtained.
<実施例11>
アミノ基含有アミノ変性シリコーン(S201){KF−864、活性水素1モル当たりの分子量(活性水素当量)3800、信越化学工業株式会社製}100部(活性水素0.026モル部含有)と製造例10で得たグリシジル化合物(G10)200部(0.039モル部)を仕込み、80℃にて1時間減圧脱水した。次いで100℃にて2時間攪拌を続けてエポキシ基の消失を確認し、本発明の界面活性剤(Y11)を得た。
<Example 11>
Amino group-containing amino-modified silicone (S201) {KF-864, molecular weight per mole of active hydrogen (active hydrogen equivalent) 3800, manufactured by Shin-Etsu Chemical Co., Ltd.} 100 parts (containing active hydrogen 0.026 mole parts) and production examples 200 parts (0.039 mole part) of the glycidyl compound (G10) obtained in
<実施例12>
カルボキシ基含有カルボキシ変性シリコーン(S301){X−22−3701E、活性水素1モル当たりの分子量(カルボキシ当量=活性水素当量)4000、信越化学工業株式会社製}100部(活性水素0.025モル含有)と製造例6で得たグリシジル化合物(G6)150部(0.034モル部)を仕込み、100℃にて1時間減圧脱水した。次いで130℃にて6時間攪拌を続けてエポキシ基の消失を確認し、本発明の界面活性剤(Y12)を得た。
<Example 12>
Carboxy group-containing carboxy-modified silicone (S301) {X-22-3701E, molecular weight per mol of active hydrogen (carboxy equivalent = active hydrogen equivalent) 4000, manufactured by Shin-Etsu Chemical Co., Ltd.} 100 parts (containing 0.025 mol of active hydrogen) ) And 150 parts (0.034 mol part) of the glycidyl compound (G6) obtained in Production Example 6 were added and dehydrated under reduced pressure at 100 ° C. for 1 hour. Subsequently, stirring was continued at 130 ° C. for 6 hours to confirm the disappearance of the epoxy group, and the surfactant (Y12) of the present invention was obtained.
<実施例13>
水酸基含有カルビノール変性シリコーン(S401){SF8428、活性水素1モル当たりの分子量(水酸基当量=活性水素当量)1600、東レ・ダウコーニング株式会社製}100部(活性水素0.063モル部含有)と製造例9で得たグリシジル化合物(G9)180部(0.046モル部)を仕込み、100℃にて1時間減圧脱水した。次いで130℃にて6時間攪拌を続けてエポキシ基の消失を確認し、本発明の界面活性剤(Y13)を得た。
<Example 13>
Hydroxyl-containing carbinol-modified silicone (S401) {SF8428, molecular weight per mole of active hydrogen (hydroxyl equivalent = active hydrogen equivalent) 1600, manufactured by Toray Dow Corning Co., Ltd.} 100 parts (containing active hydrogen 0.063 moles) 180 parts (0.046 mol part) of the glycidyl compound (G9) obtained in Production Example 9 was charged and dehydrated under reduced pressure at 100 ° C. for 1 hour. Subsequently, stirring was continued at 130 ° C. for 6 hours to confirm the disappearance of the epoxy group, and the surfactant (Y13) of the present invention was obtained.
<実施例14>
フェノール性水酸基含有フェノール変性シリコーン(S501){BY16−150S、活性水素1モル当たりの分子量(水酸基当量=活性水素当量)1550、東レ・ダウコーニング株式会社製}100部(活性水素0.065モル部含有)と製造例9で得たグリシジル化合物(G9)200部(0.051モル部)を仕込み、100℃にて1時間減圧脱水した。次いで120℃にて6時間攪拌を続けてエポキシ基の消失を確認し、本発明の界面活性剤(Y14)を得た。
<Example 14>
Phenolic hydroxyl group-containing phenol-modified silicone (S501) {BY16-150S, molecular weight per mole of active hydrogen (hydroxyl equivalent = active hydrogen equivalent) 1550, manufactured by Toray Dow Corning Co., Ltd.} 100 parts (active hydrogen 0.065 moles) Content) and 200 parts (0.051 mol) of the glycidyl compound (G9) obtained in Production Example 9 were charged and dehydrated under reduced pressure at 100 ° C. for 1 hour. Subsequently, stirring was continued at 120 ° C. for 6 hours to confirm the disappearance of the epoxy group, and the surfactant (Y14) of the present invention was obtained.
<実施例15>
メルカプト基含有メルカプト変性シリコーン(S601){KF−2001、活性水素1モル当たりの分子量(メルカプト当量=活性水素当量)1900、信越化学工業株式会社製}100部(活性水素0.053モル部含有)と製造例10で得たグリシジル化合物(G10)150部(0.029モル部)を仕込み、80℃にて1時間減圧脱水した。次いで100℃にて4時間攪拌を続けてエポキシ基の消失を確認し、本発明の界面活性剤(Y15)を得た。
<Example 15>
Mercapto group-containing mercapto-modified silicone (S601) {KF-2001, molecular weight per mole of active hydrogen (mercapto equivalent = active hydrogen equivalent) 1900, manufactured by Shin-Etsu Chemical Co., Ltd.} 100 parts (containing active hydrogen 0.053 mole part) And 150 parts (0.029 mol part) of the glycidyl compound (G10) obtained in Production Example 10 were charged and dehydrated under reduced pressure at 80 ° C. for 1 hour. Subsequently, stirring was continued at 100 ° C. for 4 hours to confirm the disappearance of the epoxy group, and the surfactant (Y15) of the present invention was obtained.
<比較例1>
製造例11で得た水酸基含有ポリーテル変性シリコーン(S101)100部と、サーフィノール465{信越化学工業株式会社製、アセチレングリコールのエトキシ化体}100部を均一に混合して、比較用の界面活性剤(HY1)を得た。
<Comparative Example 1>
100 parts of the hydroxyl group-containing polytel-modified silicone (S101) obtained in Production Example 11 and 100 parts of Surfynol 465 {Shin-Etsu Chemical Co., Ltd., acetylene glycol ethoxylate} are uniformly mixed to obtain a comparative surface activity. An agent (HY1) was obtained.
<比較例2>
水酸基含有ポリーテル変性シリコーン(S101)100部と、製造例4で得たグリシジル化合物(G2)50部を均一に混合して、比較用の界面活性剤(HY2)を得た。
<Comparative example 2>
A comparative surfactant (HY2) was obtained by uniformly mixing 100 parts of a hydroxyl group-containing polytel-modified silicone (S101) and 50 parts of the glycidyl compound (G2) obtained in Production Example 4.
<比較例3>
水酸基含有ポリーテル変性シリコーン(S101)を比較用の界面活性剤(HY3)とした。
<Comparative Example 3>
Hydroxyl group-containing polytel-modified silicone (S101) was used as a comparative surfactant (HY3).
実施例1〜15で得た本発明の界面活性剤(Y1)〜(Y15)及び比較例1〜3で得た比較用の界面活性剤(H1Y)〜(HY3)について、次のようにして性能評価した。 The surfactants (Y1) to (Y15) of the present invention obtained in Examples 1 to 15 and the surfactants (H1Y) to (HY3) for comparison obtained in Comparative Examples 1 to 3 are as follows. The performance was evaluated.
1.表面張力の評価
動的表面張力、静的表面張力を以下の方法により測定した。
1. Evaluation of surface tension Dynamic surface tension and static surface tension were measured by the following methods.
<動的表面張力>
評価試料{本発明の界面活性剤(Y1)〜(Y15)及び比較例1〜3で得た比較用の界面活性剤(HY1)〜(HY3)}を脱イオン水に溶解して0.2%の水溶液を調製し、25±0.2℃(液温、室温)において、クルス社製のバブルプレッシャー型動的表面張力計クルスBP−2を用いて、表面寿命50Hz(20ミリ秒)〜0.1Hz(10秒)における表面張力を測定し、10Hz(100ミリ秒)における動的表面張力を表2に記載した。
また、実施例3で得た界面活性剤(Y3)、比較例1〜3で得た比較用の界面活性剤(HY1)〜(HY3)について、動的表面張力を計測した結果を図1(グラフ)に示した{横軸が表面寿命(ミリ秒)であり、縦軸が表面張力(mN/m)である}。
<Dynamic surface tension>
The evaluation samples {surfactants (Y1) to (Y15) of the present invention and comparative surfactants (HY1) to (HY3)} obtained in Comparative Examples 1 to 3) were dissolved in deionized water to obtain 0.2. % Aqueous solution at 25 ± 0.2 ° C. (liquid temperature, room temperature) using a bubble pressure type dynamic surface tension meter Cruz BP-2 manufactured by Cruz Co., Ltd., with a surface life of 50 Hz (20 milliseconds) to The surface tension at 0.1 Hz (10 seconds) was measured, and the dynamic surface tension at 10 Hz (100 milliseconds) is shown in Table 2.
The results of measuring the dynamic surface tension of the surfactant (Y3) obtained in Example 3 and the comparative surfactants (HY1) to (HY3) obtained in Comparative Examples 1 to 3 are shown in FIG. (The horizontal axis is the surface life (milliseconds) and the vertical axis is the surface tension (mN / m)}.
<静的表面張力>
評価試料を脱イオン水に溶解して0.2%の水溶液を調製し、25±0.2℃(液温、室温)において、協和界面科学(株)製の自動表面張力計CBVP−Z型を用いて表面張力を測定した。
<Static surface tension>
An evaluation sample is dissolved in deionized water to prepare a 0.2% aqueous solution. At 25 ± 0.2 ° C. (liquid temperature, room temperature), an automatic surface tension meter CBVP-Z type manufactured by Kyowa Interface Science Co., Ltd. Was used to measure the surface tension.
2.塗工液カーテンの耐膜切れ性及び平滑度の評価
評価試料を含むカーテン塗工液を次のようにして調製し、塗工液カーテンの耐膜切れ性及び平滑度を評価して、これらの結果を表4に示した。
2. Evaluation of film resistance and smoothness of coating liquid curtain Prepare a curtain coating liquid containing an evaluation sample as follows, and evaluate the film resistance and smoothness of the coating liquid curtain. The results are shown in Table 4.
(1)カーテン塗工液の調製
インペラー型羽根を装着したエクセルオートホモジナイザー{日本精器(株)製、モデルED}を用いて、表3の組成にて作成した。
(1) Preparation of curtain coating solution The composition shown in Table 3 was prepared using an Excel auto homogenizer equipped with impeller blades (Model ED manufactured by Nippon Seiki Co., Ltd.).
注1:重質炭酸カルシウム、(株)イメリスミネラルズ・ジャパン製
注2:1級カオリン、エンゲルハード(株)製
注3:2級カオリン、白石工業(株)製
注4:軽質炭酸カルシウム、白石工業(株)製
注5:分散剤、サンノプコ(株)製
注6:増粘剤、サンノプコ(株)製
注7:SBRラテックス、ジェイエスアール(株)製
注8:脱イオン水
注9:界面活性剤;評価試料{用界面活性剤(Y1)〜(Y15)及び(HY1)〜(HY3)}、なお、ブランクでは脱イオン水を用いた。
Note 1: Heavy calcium carbonate, manufactured by Imeris Minerals Japan Co., Ltd. Note 2: Grade 1 kaolin, Engelhard Co., Ltd. Note 3:
作成したカーテン塗工液は、JIS K5600−2−5:1999(ISO 1524:1983に対応する)に準拠して分散度を測定し、5ミクロン以上の粒の無いことを確認した。 The created curtain coating solution was measured for the degree of dispersion according to JIS K5600-2-5: 1999 (corresponding to ISO 1524: 1983), and it was confirmed that there were no particles of 5 microns or more.
(2)塗工液カーテンの耐膜切れ性
カーテン塗工液をカーテンフローコーター(フローコータ FL−W6G、アネスト岩田社製)にて塗工速度200m/分、塗工量(乾燥時の坪量)15g/m2の条件で、坪量64g/m2の上質巻き取りロール紙に塗工し、カーテン塗工する際に発生する膜切れの回数(1分間当たりの発生回数)を数え、膜切れ回数を表4に示した。数値が小さい程、耐膜切れ性(塗工性)に優れているといえる。
(2) Resistance to film breakage of coating liquid curtain Curing coating liquid was applied at a curtain flow coater (Flow coater FL-W6G, manufactured by Anest Iwata Co., Ltd.) at a coating speed of 200 m / min, coating amount (basis weight when dried) ) Under a condition of 15 g / m 2 , the number of film breaks (number of occurrences per minute) that occurred when coating on high-quality winding roll paper with a basis weight of 64 g / m 2 and curtain coating was performed. The number of cuts is shown in Table 4. It can be said that the smaller the numerical value, the better the resistance to film breakage (coating property).
(3)平滑度
カーテン塗工液を塗工した上質巻き取りロール紙をカレンダー処理(オートドライヤー L−3D、ジャポー社製、130℃、1分間、処理圧力0.3kg/cm2)して、カーテン塗工紙を得た。このカーテン塗工紙をスムースター平滑度試験機(東英電子工業(株)製、形式SM−6A)を用いて平滑度を25±0.2℃、50±5%相対湿度条件下にて、測定し、平滑度を表4に示した。数字が小さいほど平滑性に優れているといえる。
(3) Smoothness The high-quality roll-up roll paper coated with the curtain coating liquid is calendered (Auto Dryer L-3D, manufactured by Japoe, 130 ° C., 1 minute, treatment pressure 0.3 kg / cm 2 ), Curtain coated paper was obtained. The smoothness of the curtain-coated paper was measured at 25 ± 0.2 ° C. and 50 ± 5% relative humidity using a smoother smoothness tester (manufactured by Toei Denshi Kogyo Co., Ltd., model SM-6A). The smoothness was measured and shown in Table 4. It can be said that the smaller the number, the better the smoothness.
3.インキの耐ハジキ性の評価
(1)評価用インキの調製
スーパーエコビュア{水性グラビアインキ、プラスチックフィルム用、サカタインクス(株)製}100部に、評価試料{界面活性剤(Y1)〜(Y15)及び(HY1)〜(HY3)}を1部添加(ブランクは脱イオン水を1部添加した)し、インペラー型羽根を装着したエクセルオートホモジナイザーにて2000rpm×2分間攪拌した後、脱泡機{あわとり練太郎(株)製、モデルAR−250}にて1分間脱泡して評価用インキを調製した。
3. Evaluation of ink repellency (1) Preparation of
(2)耐ハジキ性の評価
評価用インキを、アセトンにて脱脂したポリエステルフィルム(縦:150mm、横:150mm、厚み:0.10mm、東レルミラーL−100T60、東レ(株)製)上にアプリケーターを用いてウェット膜厚0.076mmにて塗布(7cm×10cm)して、塗布直後のハジキ痕の数を数えて、この数を耐ハジキ性とした。これらの結果を表5に示した。
(2) Evaluation of repellency resistance An applicator on a polyester film (length: 150 mm, width: 150 mm, thickness: 0.10 mm, Toray Mirror L-100T60, manufactured by Toray Industries, Inc.) obtained by degreasing the evaluation ink with acetone. Was applied at a wet film thickness of 0.076 mm (7 cm × 10 cm), and the number of cissing marks immediately after coating was counted, and this number was defined as repellency resistance. These results are shown in Table 5.
本発明の界面活性剤は、比較用の界面活性剤に比較して、優れた表面張力低下能(動的表面張力低下能、静的表面張力低下能)を発揮し、膜切れ回数及び平滑度とも良好であり、さらに耐ハジキ性に優れていた。 The surfactant of the present invention exhibits superior surface tension lowering ability (dynamic surface tension lowering ability, static surface tension lowering ability), and the number of film breaks and smoothness compared to a comparative surfactant. Both were good and also excellent in repelling resistance.
本発明の界面活性剤は、あらゆる用途に用いることができるが、特に水性コーティング液用として適しており、さらに高速で塗工又は印刷される塗料、インキ等に好適である。 The surfactant of the present invention can be used for any application, but is particularly suitable for an aqueous coating solution, and further suitable for paints, inks and the like that are applied or printed at high speed.
Claims (7)
{E(-OA)n}p-Q-{(AO-)nH}t−p (1)
一般式(1)において、Eはグリシジル(1,2−エポキシプロピル)基、Hは水素原子、Qは非還元性の二又は三糖類のt個の1級水酸基から水素原子を除いた反応残基、OA及びAOは炭素数2〜4のオキシアルキレン基、nは1〜40の整数、tは2〜4の整数、pは1〜3の整数を表し(但し、t≧p)、一般式(1)で表されるグリシジル化合物(G)中のオキシアルキレン基(OA及びAO)の総数は10〜80の整数である。 A surfactant comprising a modified silicone (Y) obtained by chemically reacting an active hydrogen-containing modified silicone (S) with a glycidyl compound (G) represented by the general formula (1).
{E (-OA) n} p -Q - {(AO-) n H} t-p (1)
In general formula (1), E is a glycidyl (1,2-epoxypropyl) group, H is a hydrogen atom, Q is a reaction residue obtained by removing a hydrogen atom from t primary hydroxyl groups of a non-reducing di- or trisaccharide. Group, OA and AO are oxyalkylene groups having 2 to 4 carbon atoms, n is an integer of 1 to 40, t is an integer of 2 to 4, p is an integer of 1 to 3 (provided that t ≧ p), The total number of oxyalkylene groups (OA and AO) in the glycidyl compound (G) represented by the formula (1) is an integer of 10 to 80.
反応溶媒及び反応触媒なしで、活性水素含有変性シリコーン(S)と、一般式(1)で表されるグリシジル化合物(G)とを化学反応させてシリコーン変性体(Y)を得る工程を含むことを特徴とする界面活性剤の製造方法。 A method for producing the surfactant according to claim 1,
Including the step of chemically reacting the active hydrogen-containing modified silicone (S) and the glycidyl compound (G) represented by the general formula (1) to obtain a silicone-modified product (Y) without a reaction solvent and a reaction catalyst. A method for producing a surfactant, characterized in that
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